WO2003019168A1 - Metal oxide semiconductor gas sensor - Google Patents
Metal oxide semiconductor gas sensor Download PDFInfo
- Publication number
- WO2003019168A1 WO2003019168A1 PCT/JP2002/006808 JP0206808W WO03019168A1 WO 2003019168 A1 WO2003019168 A1 WO 2003019168A1 JP 0206808 W JP0206808 W JP 0206808W WO 03019168 A1 WO03019168 A1 WO 03019168A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- metal oxide
- gas sensor
- high frequency
- depressurizing
- Prior art date
Links
- 229910044991 metal oxide Inorganic materials 0.000 title abstract 4
- 150000004706 metal oxides Chemical class 0.000 title abstract 4
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 239000000843 powder Substances 0.000 abstract 4
- 239000000523 sample Substances 0.000 abstract 3
- 238000009413 insulation Methods 0.000 abstract 2
- 238000007751 thermal spraying Methods 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
A metal oxide semiconductor gas sensor and a method of manufacturing the gas sensor, the gas sensor comprising a guided plasma thermal spraying device (20) formed of a depressurizing tank (21) having an electrode (15) formed on a substrate (10) and incorporating an insulation board (22) for placing the substrate thereon and a plasma torch (24) connected to the depressurizing tank and having a powder leading probe (26) and a high frequency coil (25), the method comprising the steps of, by using the guided plasma thermal spraying device (20), placing the substrate on the insulation board, setting a clearance between the substrate side tip of the powder leading probe and the substrate to 1000 mm or shorter, depressurizing the depressurizing tank, supplying metal oxide powder from the powder leading probe while generating high frequency guided plasma from the high frequency coil, and depositing, on the surface of the substrate, the metal oxide formed of a large grain part with large gain sizes and a large number of small grain parts formed on the peripheral surface of the large grain part.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001255541A JP4659295B2 (en) | 2001-08-27 | 2001-08-27 | Metal oxide semiconductor gas sensor |
| JP2001-255541 | 2001-08-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2003019168A1 true WO2003019168A1 (en) | 2003-03-06 |
Family
ID=19083494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2002/006808 WO2003019168A1 (en) | 2001-08-27 | 2002-07-04 | Metal oxide semiconductor gas sensor |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4659295B2 (en) |
| WO (1) | WO2003019168A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006023224A (en) * | 2004-07-09 | 2006-01-26 | Uchiya Thermostat Kk | Gas detecting element and its manufacturing method |
| EP1820005B1 (en) * | 2004-11-24 | 2019-01-09 | Sensirion Holding AG | Method for applying selectively a layer to a structured substrate by the usage of a temperature gradient in the substrate |
| JP4845469B2 (en) * | 2005-10-07 | 2011-12-28 | 富士電機株式会社 | Thin film gas sensor |
| DE602006006897D1 (en) * | 2006-03-31 | 2009-07-02 | Sony Deutschland Gmbh | System for detecting a leak in a battery |
| JP2007322184A (en) * | 2006-05-31 | 2007-12-13 | Ngk Spark Plug Co Ltd | Ammonia gas sensor |
| JP5638765B2 (en) * | 2009-03-25 | 2014-12-10 | ウチヤ・サーモスタット株式会社 | Method for producing deposited film containing nanoparticles |
| JP6687931B2 (en) * | 2016-08-25 | 2020-04-28 | フィガロ技研株式会社 | SnO2-based gas sensor |
| CN113447530B (en) * | 2021-02-26 | 2022-09-09 | 河南大学 | a gas sensor |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59119253A (en) * | 1982-12-25 | 1984-07-10 | Ngk Spark Plug Co Ltd | Gas sensitive element |
| JPH055713A (en) * | 1991-10-31 | 1993-01-14 | New Cosmos Electric Corp | Manufacture of gas-detection element |
| JPH06160324A (en) * | 1992-10-23 | 1994-06-07 | Yamatake Honeywell Co Ltd | Nitrogen oxide detection element and manufacturing method thereof |
| JPH06288953A (en) * | 1993-02-05 | 1994-10-18 | Fuji Electric Co Ltd | Thick film gas sensor |
| JPH08109463A (en) * | 1994-10-12 | 1996-04-30 | Agency Of Ind Science & Technol | Ultra-high-speed plasma jet generator and method for producing thermal spray coating using the same |
| WO2001031324A1 (en) * | 1999-10-27 | 2001-05-03 | Ngk Spark Plug Co., Ltd. | Oxygen sensor and method for manufacturing sensor element |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58131551A (en) * | 1982-02-01 | 1983-08-05 | Shinei Kk | Sensor |
| JPS594113A (en) * | 1982-06-30 | 1984-01-10 | 松下電器産業株式会社 | Method of producing moisture detecting element |
| JPH0552790A (en) * | 1991-08-28 | 1993-03-02 | Ricoh Co Ltd | Gas sensor |
| JPH05322818A (en) * | 1992-05-25 | 1993-12-07 | Takeo Oki | Ceramic temperature/humidity sensor and its manufacture |
| DE69922776T2 (en) * | 1999-01-21 | 2005-12-08 | Sony International (Europe) Gmbh | Nanoparticle structure for use in an electronic device, in particular in a chemical sensor |
| JP3812215B2 (en) * | 1999-04-02 | 2006-08-23 | 富士電機機器制御株式会社 | Thin film gas sensor |
-
2001
- 2001-08-27 JP JP2001255541A patent/JP4659295B2/en not_active Expired - Lifetime
-
2002
- 2002-07-04 WO PCT/JP2002/006808 patent/WO2003019168A1/en active Application Filing
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59119253A (en) * | 1982-12-25 | 1984-07-10 | Ngk Spark Plug Co Ltd | Gas sensitive element |
| JPH055713A (en) * | 1991-10-31 | 1993-01-14 | New Cosmos Electric Corp | Manufacture of gas-detection element |
| JPH06160324A (en) * | 1992-10-23 | 1994-06-07 | Yamatake Honeywell Co Ltd | Nitrogen oxide detection element and manufacturing method thereof |
| JPH06288953A (en) * | 1993-02-05 | 1994-10-18 | Fuji Electric Co Ltd | Thick film gas sensor |
| JPH08109463A (en) * | 1994-10-12 | 1996-04-30 | Agency Of Ind Science & Technol | Ultra-high-speed plasma jet generator and method for producing thermal spray coating using the same |
| WO2001031324A1 (en) * | 1999-10-27 | 2001-05-03 | Ngk Spark Plug Co., Ltd. | Oxygen sensor and method for manufacturing sensor element |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003065989A (en) | 2003-03-05 |
| JP4659295B2 (en) | 2011-03-30 |
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| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
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| 122 | Ep: pct application non-entry in european phase |