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WO2018002977A1 - Dispositif de génération de rayon x et appareil d'analyse comportant le dispositif de génération de rayon x - Google Patents

Dispositif de génération de rayon x et appareil d'analyse comportant le dispositif de génération de rayon x Download PDF

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Publication number
WO2018002977A1
WO2018002977A1 PCT/JP2016/068945 JP2016068945W WO2018002977A1 WO 2018002977 A1 WO2018002977 A1 WO 2018002977A1 JP 2016068945 W JP2016068945 W JP 2016068945W WO 2018002977 A1 WO2018002977 A1 WO 2018002977A1
Authority
WO
WIPO (PCT)
Prior art keywords
power supply
filament
target
control circuit
voltage power
Prior art date
Application number
PCT/JP2016/068945
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English (en)
Japanese (ja)
Inventor
佑多 齋藤
Original Assignee
株式会社島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to JP2018524590A priority Critical patent/JP6873125B2/ja
Priority to PCT/JP2016/068945 priority patent/WO2018002977A1/fr
Publication of WO2018002977A1 publication Critical patent/WO2018002977A1/fr

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/26—Measuring, controlling or protecting
    • H05G1/30—Controlling
    • H05G1/34—Anode current, heater current or heater voltage of X-ray tube

Definitions

  • the present invention relates to an X-ray generator that emits characteristic X-rays, and more particularly to an analyzer equipped with an X-ray generator.
  • the base materials for example, Fe, Cu, Al, etc.
  • Etc. It has been required to strictly control the amount of trace components contained in it, especially elements such as C, Si, S, P, Mn, Ni, etc., and production plants for steel and non-ferrous metal materials, etc.
  • the steelmaking and refining processes such as, it is important to quantify the trace components contained in the base material.
  • fluorescent X-rays are used for qualitative and quantitative analysis of elements contained in a sample by irradiating the sample with characteristic X-rays and detecting the intensity of the fluorescent X-rays excited and emitted by the characteristic X-rays. Analyzing devices are becoming widely used in production factories and the like.
  • FIG. 4 is a diagram showing the configuration of the fluorescent X-ray analyzer
  • FIG. 5 is a circuit diagram of the X-ray generator 101 shown in FIG.
  • the X-ray fluorescence analyzer 160 includes an X-ray generator 101, a sample stage 61 on which a sample S is arranged, a detector 62 for detecting the energy and intensity of the fluorescent X-ray, an input device 71, a CPU 172, and the like. Having a computer 170.
  • the X-ray generator 101 applies an X-ray tube 10 that emits characteristic X-rays, a high voltage generation DC power source (high voltage power source) 20 for applying a high voltage V high , and a low voltage V low.
  • Filament power supply (low voltage power supply) 30, tube voltage control circuit (high voltage power supply control circuit) 140 for controlling the high voltage generating DC power supply 20, and filament current control circuit (low voltage power supply control circuit) for controlling the filament power supply 30 150) see, for example, Patent Document 1).
  • FIG. 6 is a cross-sectional view of the X-ray tube 10 shown in FIG.
  • the X-ray tube 10 includes a target 11 serving as an anode, a filament 12 serving as a cathode, and a substantially cylindrical housing 13 having the target 11 and the filament 12 therein.
  • a circular exit window 13 a is formed on the side wall of the housing 13, and the end surface 11 a of the target 11 is disposed at a position facing the exit window 13 a and the filament is disposed at a position facing the end surface 11 a of the target 11. 12 is arranged.
  • the filament power supply 30 and the filament current control circuit 150 are connected to the filament 12 via the low voltage cable 16.
  • the high voltage generation DC power supply 20 and the tube voltage control circuit 140 are connected to the target 11 via the high voltage cable 15.
  • the negative electrode of the high voltage generating DC power supply 20 is connected to one end of the filament 12.
  • the tube voltage control circuit 140 applies a high voltage V high to the target 11 based on an input signal from the input device 71. For example, when the analyst selects the tube voltage value V high from about 1 kV to 50 kV using the input device 71, the tube voltage control circuit 140 applies the selected tube voltage value V high to the target 11. As a result, the potential of the target 11 is set to the tube voltage value V high . At this time, the tube voltage control circuit 140 performs feedback control so that the potential of the target 11 does not deviate from the tube voltage value V high .
  • the filament current control circuit 150 applies a low voltage V low to the filament 12 based on an input signal from the input device 71. For example, when the analyst selects the tube current value I from the current value of about 5 mA to 100 mA using the input device 71, the filament current control circuit 150 causes the filament so that there is no deviation from the selected tube current value I. The feedback control is performed so that the filament current is supplied to 12.
  • a high voltage V high is applied to the target 11 to cause the potential of the target 11. with a tube voltage value V high and by passing a filament current by applying a low voltage V low to the filament 12, to accelerate thermal electrons e emitted from the filament 12 to collide with the end face 11a of the target 11
  • characteristic X-rays generated on the end surface 11a of the target 11 are emitted from the emission window 13a.
  • the intensity and energy of the characteristic X-ray are controlled by changing the tube voltage value V high and the tube current value I.
  • the X-ray generator 101 in order to stop the X-ray generator 101 after the analysis is completed, after applying the low voltage V low to the filament 12 is stopped, applying the high voltage V high to the target 11 is stopped.
  • the potential of the target 11 needs to be decreased from the tube voltage value V high to 0 V, but the waiting time for the potential of the target 11 to decrease to 0 V is long (for example, the rate of decrease of the tube voltage value V high is 1.8 kV / s). ).
  • the filament current control circuit 150 Since the filament current control circuit 150 performs feedback control so as not to deviate from the tube current value I, when the tube current stops flowing, the filament current becomes the maximum value and the temperature of the filament 12 becomes the maximum temperature. . As the temperature of the filament 12 increases, the filament 12 is consumed, so the life of the filament 12 is shortened. Therefore, when the input signal “OFF” for stopping the X-ray generator 101 is input, the filament current control circuit 150 stops applying the low voltage V low to the filament 12, and then the tube voltage control circuit 140 stops applying the high voltage V high to the target 11.
  • the present applicant examined a method for reducing the potential of the target 11 in a short time. After the application of the low voltage V low to the filament 12 is stopped, and the application of the high voltage V high to the target 11 is stopped, as shown in FIG. The tube voltage value V high is released by a very small current i flowing through the resistance of the insulator of the cable 15.
  • the tube current value I is not set to 0 A, but a filament current having an appropriate predetermined value (0.3 A or more and 5.0 A or less) is caused to flow through the filament 12. It has been found that by irradiating the target 11 with thermoelectrons e ′, the tube voltage value V high is released as the tube current I ′ (see FIG. 2B). As a result, the decrease rate of the tube voltage value V high became 3.0 kV / s, which was faster.
  • the X-ray generation apparatus of the present invention includes a casing, a target that is an anode disposed inside the casing, and a filament that is a cathode disposed inside the casing, and the filament
  • An X-ray tube that receives thermoelectrons radiated from the target and emits X-rays generated at the target, a high-voltage power source for applying a high voltage to the target, and a low voltage to the filament
  • An X-ray generator comprising: a low-voltage power supply for applying; a high-voltage power supply control circuit that controls the high-voltage power supply; and a low-voltage power supply control circuit that controls the low-voltage power supply.
  • the low voltage power supply control circuit applies a low voltage of a predetermined value to the filament for a predetermined time. It is to be pressurized.
  • the tube voltage value V high in order to reduce the tube voltage value V high target potential, for releasing the tube voltage value V high target potential as a tube current I ', the tube voltage value V high
  • the waiting time to escape can be shortened. Further, no mechanism or component (high voltage resistance or switch) for switching the circuit is required.
  • the predetermined time may be a time for the potential of the target to decrease.
  • the low voltage of the predetermined value may be a voltage for causing a filament current of 0.3 A or more and 5.0 A or less to flow through the filament.
  • the filament current of 0.3 A or more and 5.0 A or less prevents the filament from being consumed due to an appropriate temperature of the filament.
  • the analyzer of this invention is an analyzer provided with the above X-ray generators, a detector, and the input device into which the input signal for stopping the said X-ray generator is input,
  • the low voltage power supply control circuit applies a predetermined voltage to the filament.
  • a low voltage of a predetermined value may be applied for a time.
  • the circuit diagram of the X-ray generator shown in FIG. The flowchart for demonstrating the stop method.
  • the circuit diagram of the X-ray generator shown in FIG. Sectional drawing of the X-ray tube shown in FIG.
  • FIG. 1 is a diagram showing a configuration of a fluorescent X-ray analyzer according to the embodiment
  • FIG. 2 is a circuit diagram of the X-ray generator shown in FIG.
  • the same components as those of the fluorescent X-ray analyzer 160 are denoted by the same reference numerals.
  • the X-ray fluorescence analyzer 60 includes an X-ray generator 1, a sample stage 61 on which a sample S is arranged, a detector 62 that detects the energy and intensity of fluorescent X-rays, an input device 71, a CPU 72, and the like. And a computer 70.
  • the X-ray generator 1 applies an X-ray tube 10 that emits characteristic X-rays, a high voltage generation DC power source (high voltage power source) 20 for applying a high voltage V high , and a low voltage V low.
  • the filament current control circuit 50 applies a low voltage V low to the filament 12 based on an input signal from the input device 71. For example, when the analyst selects the tube current value I from the current value of about 5 mA to 100 mA using the input device 71, the filament current control circuit 50 ensures that the filament current control circuit 50 does not deviate from the selected tube current value I. The feedback control is performed so that the filament current is supplied to 12. In addition, when an input signal “OFF” for stopping the X-ray generator 1 is input to the filament current control circuit 50 according to the embodiment, the filament 12 is set to a predetermined value for a predetermined time (for example, 20 seconds or less).
  • a filament current of a predetermined value (0.3 A or more and 5.0 A or less) is caused to flow.
  • the predetermined value include not less than 0.3 A and not more than 5.0 A.
  • the predetermined value is set to 3.4 A in consideration of the circuit configuration.
  • the reduction speed also varies depending on the structure of the X-ray tube 10.
  • 50 kV (maximum tube voltage) / 3 kV (reduction speed per second) 16.6 s. The potential dropped in seconds.
  • the tube voltage control circuit 40 applies a high voltage V high to the target 11 based on an input signal from the input device 71. For example, when the analyst selects the tube voltage value V high from the voltage value of about 1 kV to 50 kV using the input device 71, the tube voltage control circuit 40 applies the selected tube voltage value V high to the target 11. As a result, the potential of the target 11 is set to the tube voltage value V high . At this time, the tube voltage control circuit 40 performs feedback control so that the potential of the target 11 does not deviate from the tube voltage value V high .
  • FIG. 3 is a flowchart for explaining the stopping method.
  • the CPU 72 determines whether or not an input signal “OFF” for stopping the X-ray generator 1 is input. If it is determined that the input signal “OFF” has not been input, the process of step S101 is repeated.
  • the filament current control circuit 50 applies a predetermined value of the low voltage V low ′ to the filament 12 in the process of step S102, thereby determining the predetermined value (3. 4A) is applied. At this time, since the temperature of the filament 12 does not reach the maximum temperature, it is possible to prevent the filament 12 from being consumed.
  • the tube voltage control circuit 40 stops applying the high voltage V high to the target 11.
  • step S104 the CPU 72 determines whether or not a predetermined time (20 seconds) has elapsed. When it is determined that the predetermined time has not elapsed, the process of step S104 is repeated. At this time, the tube voltage value V high escapes as the tube current I ′ (see FIG. 2B). Next, when it is determined that the predetermined time has elapsed, the filament current control circuit 50 stops applying the predetermined low voltage V low ′ to the filament 12 in the process of step S105. Then, when the process of step S105 ends, this flowchart is ended.
  • the fluorescent X-ray analysis apparatus 60 in order to reduce the tube voltage value V high potential of the target 11, the tube voltage value V high tube current I in the potential of the target 11 ' Therefore, the waiting time for releasing the tube voltage value V high can be shortened.
  • the fluorescent X-ray analysis apparatus 60 has been described as an example. The invention can be applied as well.
  • the fluorescent X-ray analyzer 60 using a relatively low tube voltage for surface analysis has been described as an example. You may apply.
  • the present invention can be used in a fluorescent X-ray analyzer or the like that calculates the concentration of an element contained in a sample.

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  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

La présente invention concerne un dispositif de génération de rayons X (1), lequel dispositif comporte : un tube à rayons X (10) muni d'un boîtier (13), une cible (11) qui est une anode disposée à l'intérieur du boîtier (13), et un filament (12) qui est une cathode disposée à l'intérieur du boîtier (13), le tube à rayons X (10) acceptant des électrons thermiques émis par le filament (12) au niveau de la cible (11) et émettant un rayon X généré au niveau de la cible (11) ; une alimentation électrique haute tension (20) permettant d'appliquer une tension élevée à la cible (11) ; une alimentation électrique basse tension (30) permettant d'appliquer une tension faible au filament (12) ; un circuit de commande d'alimentation électrique haute tension (40) qui commande l'alimentation électrique haute tension (20) ; et un circuit de commande d'alimentation électrique basse tension (50) qui commande l'alimentation électrique basse tension (30). Afin d'arrêter le dispositif de génération de rayons X (1), après que le circuit de commande d'alimentation électrique haute tension (40) a cessé d'appliquer une tension élevée à la cible (11), le circuit de commande d'alimentation électrique basse tension (50) applique une valeur prédéterminée de tension faible au filament (12) pendant une période de temps prédéterminée.
PCT/JP2016/068945 2016-06-27 2016-06-27 Dispositif de génération de rayon x et appareil d'analyse comportant le dispositif de génération de rayon x WO2018002977A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018524590A JP6873125B2 (ja) 2016-06-27 2016-06-27 Ｘ線発生装置及びそれを備える分析装置
PCT/JP2016/068945 WO2018002977A1 (fr) 2016-06-27 2016-06-27 Dispositif de génération de rayon x et appareil d'analyse comportant le dispositif de génération de rayon x

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PCT/JP2016/068945 WO2018002977A1 (fr) 2016-06-27 2016-06-27 Dispositif de génération de rayon x et appareil d'analyse comportant le dispositif de génération de rayon x

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10189286A (ja) * 1996-12-25 1998-07-21 Origin Electric Co Ltd 電子管用パルス電源装置
JP2001297893A (ja) * 2000-04-17 2001-10-26 Shimadzu Corp Ｘ線高電圧装置
JP2007059233A (ja) * 2005-08-25 2007-03-08 Toshiba Corp Ｘ線透視撮影装置
JP2010049974A (ja) * 2008-08-22 2010-03-04 Mikasa Kk Ｘ線発生装置及びｘ線管の駆動方法
JP2012109106A (ja) * 2010-11-17 2012-06-07 Canon Inc Ｘ線発生装置及びｘ線管の駆動方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4377646B2 (ja) * 2003-10-08 2009-12-02 株式会社東芝 画像診断装置、画像表示装置及び３次元画像表示方法
JP4744831B2 (ja) * 2004-09-09 2011-08-10 株式会社東芝 Ｘ線診断装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10189286A (ja) * 1996-12-25 1998-07-21 Origin Electric Co Ltd 電子管用パルス電源装置
JP2001297893A (ja) * 2000-04-17 2001-10-26 Shimadzu Corp Ｘ線高電圧装置
JP2007059233A (ja) * 2005-08-25 2007-03-08 Toshiba Corp Ｘ線透視撮影装置
JP2010049974A (ja) * 2008-08-22 2010-03-04 Mikasa Kk Ｘ線発生装置及びｘ線管の駆動方法
JP2012109106A (ja) * 2010-11-17 2012-06-07 Canon Inc Ｘ線発生装置及びｘ線管の駆動方法

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JPWO2018002977A1 (ja) 2018-11-29

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