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WO2013008567A1 - Flexible printed circuit, method for manufacturing same, flexure and electronic device - Google Patents

Flexible printed circuit, method for manufacturing same, flexure and electronic device Download PDF

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Publication number
WO2013008567A1
WO2013008567A1 PCT/JP2012/064865 JP2012064865W WO2013008567A1 WO 2013008567 A1 WO2013008567 A1 WO 2013008567A1 JP 2012064865 W JP2012064865 W JP 2012064865W WO 2013008567 A1 WO2013008567 A1 WO 2013008567A1
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WO
WIPO (PCT)
Prior art keywords
layer
insulating layer
terminal
connection pad
base
Prior art date
Application number
PCT/JP2012/064865
Other languages
French (fr)
Japanese (ja)
Inventor
辰珠 朴
上田 宏
正也 柿本
Original Assignee
住友電工プリントサーキット株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電工プリントサーキット株式会社 filed Critical 住友電工プリントサーキット株式会社
Publication of WO2013008567A1 publication Critical patent/WO2013008567A1/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/4806Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed specially adapted for disk drive assemblies, e.g. assembly prior to operation, hard or flexible disk drives
    • G11B5/4846Constructional details of the electrical connection between arm and support
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/4806Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed specially adapted for disk drive assemblies, e.g. assembly prior to operation, hard or flexible disk drives
    • G11B5/4853Constructional details of the electrical connection between head and arm
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/4806Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed specially adapted for disk drive assemblies, e.g. assembly prior to operation, hard or flexible disk drives
    • G11B5/486Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed specially adapted for disk drive assemblies, e.g. assembly prior to operation, hard or flexible disk drives with provision for mounting or arranging electrical conducting means or circuits on or along the arm assembly
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/118Printed elements for providing electric connections to or between printed circuits specially for flexible printed circuits, e.g. using folded portions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452Solder masks

Definitions

  • the present invention relates to a flexible printed circuit (FPC), a manufacturing method thereof, a flexure, and an electronic device. More specifically, the present invention relates to a flexible printed wiring board having connection pads in which connection terminals are arranged at high density, a manufacturing method thereof, a flexure for transmitting signals of magnetic elements of a hard disk drive, and an electronic device. It is.
  • FPC flexible printed circuit
  • flexures which are flexible printed wiring boards that are used in hard disk drives (HDDs) and transmit signals from magnetic heads (for example, Patent Documents 1 to 3).
  • the flexure is required to have not only electrical properties, but also delicate elastic properties such as mechanical properties for using an airflow flowing through a minute space between a magnetic head and a CD.
  • the HDD is always required to be downsized in the electronic device. For this reason, the arrangement of magnetic heads is constantly increasing in density.
  • the flexure is composed of a suspension metal plate that is supported with a predetermined elasticity, a base insulating layer, a conductive layer that forms wiring and terminals, and a cover insulating layer.
  • an opening is formed in the connection pad to expose the terminal.
  • the terminal is exposed, and a two-layered plating layer including an Ni layer and an Au layer is formed on the exposed terminal, and is soldered to a terminal such as a head slider on which the magnetic head is disposed.
  • FIG. 5A is a plan view
  • FIG. 5B is a cross-sectional view taken along line VB-VB.
  • connection pad portion K all the terminals 103 are exposed from the insulating cover layer 104 and extend in parallel on the metal plate 101 / base insulating layer 102 toward the terminals on the head slider side.
  • the cover insulating layer 104 covers only the wiring pattern 111 connected to the terminal 103 in an extreme case.
  • the Ni / Au two-layer plating 103 a is formed on the entire terminal 103 exposed from the cover insulating layer 104.
  • 6A to 6C show a method of manufacturing the flexure shown in FIGS. 5A and 5B.
  • the base insulating layer 102 and the cover insulating layer 104 are in contact with each other. At that location, as shown in FIG.
  • connection structure of the flexible printed wiring board In electronic devices, there is always a demand for downsizing the connection structure of the flexible printed wiring board, and it is important to ensure insulation between the wirings in the connection pad portion, not limited to the above flexure. That is, generally, a flexible printed wiring board is required to have a structure that can reliably maintain insulation between terminals of the connection pad portion.
  • the present invention provides a flexible printed wiring board, a manufacturing method thereof, a flexure, and an electronic device that can ensure insulation between terminals in a connection pad portion in which a plurality of terminals are arranged at high density. Objective.
  • the flexible printed wiring board of the present invention includes a connection pad portion.
  • the flexible printed wiring board includes a metal plate, a base insulating layer, a wiring pattern for forming a wiring or the like in contact with the base insulating layer, and a cover insulating layer covering the wiring pattern.
  • a plurality of terminals extending from the wiring pattern and terminating on the base insulating layer are arranged.
  • the insulating cover layer covers the terminal end of the terminal and the wiring pattern on the base side of the terminal together with the surrounding insulating base layer, and the insulating cover layer corresponds to the terminal.
  • the terminal is exposed only in the opening that is opened at, and the bottom surface of the opening is constituted only by the upper surface of the terminal. Further, the end face of the insulating cover layer and the end face of the insulating base layer are aligned to form the end face of the connection pad portion.
  • connection pad part there is no common opening part in a connection pad part, and an opening part (window) is provided for every terminal. For this reason, one terminal is located in one opening, and the upper surface of the one terminal forms the bottom of the opening.
  • the connection partner is soldered to the bottom surface of the opening for each electrode, for example. Therefore, in the connection pad part, the opening part provided in one terminal is located in a line. As a result, even if the distance between the terminals is reduced to form a high-density array, it is possible to prevent a short circuit from occurring between adjacent terminals. Moreover, the durability of the entire connection pad portion can be improved.
  • the insulating cover layer is different from the insulating base layer in the cross-linked state (polymerization progress state), for example, so that it is not necessary to pattern only the insulating cover layer by development. That is, the insulating base layer need not be a removal (development) stopper for the removal (patterning) of the insulating cover layer.
  • the end of the connection pad portion may be removed by etching the cover insulating layer and the base insulating layer together. For this reason, it is not necessary to use photosensitive polyimide or a special developer for patterning the insulating cover layer, and the cost of the material can be reduced. A great man-hour reduction can be obtained in terms of man-hours.
  • the end of the metal plate is preferably located away from the end surface of the connection pad portion, and the back surface of the base insulating layer is exposed at the end of the back surface of the connection pad portion.
  • the openings may have an arrangement pitch of 150 ⁇ m or less and a length along the extending direction of the wiring of the openings of 75 ⁇ m or less.
  • the terminal arrangement of the connection pad portion is also increased in density, and the terminals are also miniaturized.
  • a flexible printed wiring board including the connection pad portion having the above-described structure is extremely effective in securing insulation between terminals. That is, in the case of the connection pads having the above arrangement pitch and terminal length, good insulation is secured in the flexible printed wiring board of the present invention, which is preferably applied.
  • the main component of the resin layer forming the cover insulating layer can be a non-photosensitive resin.
  • the insulating base layer as a stopper for removing the insulating cover layer with a developer in patterning the insulating cover layer.
  • a photosensitive resin for the cover insulating layer it is not necessary to use a photosensitive resin for the cover insulating layer.
  • the cover insulating layer and the base insulating layer can be patterned by etching in a simple and clear process using a non-photosensitive resin for the cover insulating layer. As a result, it is not necessary to use an expensive photosensitive resin or a developer thereof, and the manufacturing process can be simplified, so that material costs, man-hours, and manufacturing time can be reduced.
  • the insulating cover layer contains a non-photosensitive polyimide precursor ink as a non-photosensitive resin liquid.
  • the insulating cover layer contains 3,3 ′, 4,4′-biphenyltetracarboxylic anhydride (BPDA) as a main component, pyromellitic dianhydride (PMDA) as an acid component.
  • BPDA 4,4′-biphenyltetracarboxylic anhydride
  • PMDA pyromellitic dianhydride
  • the insulating cover layer has p-phenylenediamine (PDA), 2,2′-dimethyl-4,4′-diaminobiphenyl (mTBHG), and 2,2′-bis (trifluoromethyl) -4, as diamine components.
  • 4'-diaminobiphenyl (TFMB) can be included.
  • etching properties essential in the present manufacturing method by using a flexible polyimide resin and setting the thermal expansion coefficient within a predetermined range (15 ppm / ° C. to 20 ppm / ° C.).
  • Any property is a property of the polyimide resin after the curing treatment.
  • Etchability is very important because, at the same etching opportunity, an opening is provided in the insulating cover layer and the end face of the insulating cover layer / base insulating layer is formed. In particular, the opening can be formed on the terminal with high accuracy by ensuring good etching properties by the monomer composition and an etching stopper by metal (terminal).
  • the non-photosensitive polyimide precursor ink can include 1,3-bis (3-aminopropyl) tetramethyldisiloxane (APDS).
  • APDS 1,3-bis (3-aminopropyl) tetramethyldisiloxane
  • the flexure of the present invention is any one of the above-described flexible printed wiring boards, and is characterized in that it is connected to a magnetic head of a hard disk drive (HDD) at a connection pad portion.
  • HDD hard disk drive
  • the connection pads of the magnetic head and the connection pads of the flexure that are arranged in a high density are connected to each other by the corresponding terminals. It can be connected while securing. Moreover, it can be set as the flexure excellent in economical efficiency.
  • An electronic apparatus includes any one of the flexible printed wiring boards described above.
  • any of the flexible printed wiring boards described above good durability can be obtained while maintaining insulation between terminals arranged at high density. Moreover, since the structure of the connection pad portion itself and the manufacturing process are simplified, high economic efficiency can be obtained.
  • the method for producing a printed wiring board of the present invention produces a flexible printed wiring board having a connection pad portion.
  • the manufacturing method includes a step of preparing a base sheet having a base insulating layer on a metal plate, a step of forming a wiring pattern including a terminal in contact with the base insulating layer, and a cover insulation covering the wiring pattern including the terminal. Forming a layer, applying a non-photosensitive resin liquid so as to overlap the base insulating layer, drying the coated non-photosensitive resin liquid, and then thermally curing the base insulating layer and Etching the heat-cured insulating cover layer.
  • an opening is formed in the insulating cover layer so that the terminal serves as an etching stopper, the terminal forms the bottom surface of the opening, and the end surface of the insulating cover layer and the end surface of the insulating base layer are aligned.
  • the cover insulating layer and the base insulating layer are etched so that the metal plate serves as an etching stopper so as to form the end face of the connection pad portion.
  • the opening on the terminal with respect to the insulating cover layer and the patterning of the insulating base layer / cover insulating layer are performed by etching in parallel.
  • the opening etching stopper is in charge of the terminal, and the base insulating layer / cover insulating layer etching stopper is in charge of the metal plate. Since these stoppers are made of metal and the etching metal / resin selectivity is high, the base insulating layer and the cover insulating layer can be patterned with high accuracy. For this reason, it becomes possible to carry out fine processing (fine patterning) for forming an opening in the insulating cover layer for each terminal with high accuracy.
  • connection pad portion having an arrangement pitch of 200 ⁇ m or less and each terminal length of 75 ⁇ m or less as described above, the desired connection pad portion is obtained unless patterning is performed using such an etching method having high metal / resin selectivity. It ’s difficult.
  • the above etching method it is not necessary to pattern only the cover insulating layer in a region where the base insulating layer and the cover insulating layer are in contact with each other as in the conventional case. That is, the insulating cover layer is formed of a photosensitive resin to be a precursor that is not completely polymerized, the insulating base layer is kept in a stable state after completion of the polymerization, and it is not necessary to pattern only the insulating cover layer by development.
  • the base insulating layer functions as a development stopper.
  • photosensitive resin such as photosensitive polyimide is expensive, and the developer is also expensive.
  • the time restriction of the process is strong and the number of processes increases.
  • the conventional flexible printed wiring board having the structure of the connection pad portion has to be expensive.
  • etching with high metal / resin selectivity it is possible to reduce the material cost, the manufacturing cost, the manufacturing period, and the like while accurately forming the fine and high-density array of openings.
  • the flexible printed wiring board or the like of the present invention it is possible to ensure insulation between terminals in a connection pad portion in which a plurality of terminals are arranged with high density. Further, the material cost and the manufacturing cost can be reduced, and the manufacturing period can be shortened.
  • FIG. 2 is a plan view showing a connection pad portion on the head slider side of the flexure of FIG. 1.
  • FIG. 2 is a cross-sectional view taken along the line IIB-IIB, showing a connection pad portion on the head slider side of the flexure of FIG.
  • It is a perspective view showing the connection pads of the head slider and the flexure, and showing the positional relationship of the connection pads of the head slider and the flexure.
  • It is sectional drawing which shows the connection pad of a head slider and a flexure, and shows the state electrically connected by dripping a solder drop.
  • A is a cross-sectional view showing a state in which a wiring pattern is formed on a metal plate / base insulating layer
  • B is a non-photosensitive polyimide ink for forming a cover insulating layer.
  • Sectional drawing which shows the processed state C is sectional drawing which shows the state which patterned the cover insulating layer and the base insulating layer from the same etching process
  • D is sectional drawing which shows the state which etched the metal plate. It is a top view which shows the connection pad part of the conventional flexure.
  • FIG. 10 is a cross-sectional view taken along line VB-VB, showing a connection pad portion of a conventional flexure.
  • a conventional manufacturing method is shown, A is a cross-sectional view showing a state where a photosensitive polyimide ink for forming a cover insulating layer is applied, B is a cross-sectional view showing a state where the cover insulating layer is patterned by exposure and development, C FIG. 3 is a cross-sectional view showing a state where a base insulating layer is patterned by etching.
  • FIG. 1 is a diagram showing a flexure 10 and a head suspension assembly 50 including the flexure according to an embodiment of the present invention.
  • a head suspension assembly 50 is attached to a carriage arm 19 that rotates the magnetic head along a track of the HDD.
  • the flexure 10 that is a flexible printed wiring board is used to transmit a signal that is input and electromagnetically converted by a magnetic head. For this reason, the flexure 10 is provided from the head slider 20 on which the magnetic head is disposed to the outer peripheral surface of the support shaft at the base of the carriage arm (not shown), and is disposed over the connection substrate unit for connection to the outside.
  • a metal plate 1 having a certain spring elasticity is used for the flexure 10, and a wiring pattern 11 for signal transmission described above is included in an insulating layer.
  • the flexure 10 and other components of the head suspension assembly 50 are provided with a metal material having a certain elasticity so that the head slider 20 floats stably at a predetermined height when a magnetic disk (not shown) rotates and an air current flows. Yes.
  • the flexure 10 includes a connection pad portion K for connecting to an electrode in the magnetic head at an end facing the head slider 20.
  • the feature of this embodiment is the structure and manufacturing method of the connection pad portion K on the magnetic head side of the flexure 10.
  • FIG. 2A and 2B show the connection pad portion K of the flexure 10 in the present embodiment
  • FIG. 2A is a plan view
  • FIG. 2B is a cross-sectional view taken along the line IIB-IIB.
  • the connection pad portion K is covered with the insulating cover layer 4 except for the opening 7. That is, except for the small window 7, it is covered with the insulating cover layer 4.
  • a terminal 3 having an enlarged width is located at the tip of the wiring 11. Although one terminal 3 has one opening (window) 7, the entire area of the opening 7 is set within the area of the terminal 3 in plan view. This is because the terminal 3 is used as an etching stopper when the cover insulating layer 4 is etched, as will be described later in the manufacturing method.
  • connection pad part K is illustrated as follows. This is just an example. A higher density array may be used.
  • Pitch of the openings 7 The same pitch as the terminals, 150 ⁇ m or less, for example, about 100 ⁇ m.
  • Terminal 3 The length in the longitudinal (extending) direction, which is a direction orthogonal to the pitch direction, is, for example, about 100 ⁇ m and the width is about 50 ⁇ m.
  • Opening 7 The length in the longitudinal direction is about 50 ⁇ m, and the length in the width direction is 40 ⁇ m.
  • the arrangement of the terminals 3 and the openings 7 with a pitch of 150 ⁇ m or less is very high density, and is rare as a connection between connection pads of an electronic device that is conductively connected with solder. As can be seen from FIG.
  • connection pad portion K itself can be significantly improved as compared with the conventional connection pad portion shown in FIG.
  • the end surface E can also be made the end surface E by aligning the end surfaces of the cover insulating layer 4 and the base insulating layer 2 by etching using the metal plate 1 as an etching stopper.
  • the formation of the end surface E and the formation of the opening 7 can be performed simultaneously in the same etching opportunity. This etching process will be described in detail later.
  • (F3) As shown in FIG. 2B, the Ni / Au two-layer plating is limited to the bottom surface 7 b of the opening 7. For this reason, the material cost of expensive gold plating can be reduced significantly.
  • the flexure 10 of the present embodiment has many advantages as a manufacturing method including the above (F1) to (F3).
  • FIG. 3A and 3B are diagrams for explaining an example of conductive connection between the connection pad portion K of the flexure 10 and the connection pad 20k of the head slider 20.
  • FIG. FIG. 3A is a perspective view showing the relationship between the position and posture of the connection pad 20k of the head slider 20 and the connection pad portion K of the flexure 10
  • FIG. 3B is a conductive connection between the terminals 3 and 23 by solder 25. It is sectional drawing of the state which carried out.
  • FIGS. 3A and 3B show an example only.
  • the connection pad 20 k of the head slider 20 in the present embodiment is provided on a side surface facing the connection pad portion K of the flexure 10.
  • the terminal 23 of the connection pad 20k of the head slider 20 and the bottom surface 7b of the opening 7 of the flexure 10 or the terminal 3 (3a) are preferably arranged so as to form an intersection angle close to a right angle. As shown in FIG. 3B, when the solder droplets are dropped, the corner concave portion forming the crossing angle is set to the top side, and the molten solder droplet is dropped into the corner concave portion, so that the terminal 3 (3a) and the head slider are dropped.
  • the terminals 23 of the 20 connection pads 20k are conductively connected.
  • FIG. 4 is a diagram showing a method of manufacturing the flexure of the present embodiment, particularly a method of forming the connection pad portion K.
  • a laminate in which the base insulating layer 2 is disposed on the metal plate 1 is prepared, and a wiring pattern layer including the terminals 3 is formed on the base insulating layer 2.
  • a metal foil or a metal thin plate is used, for example, stainless steel, 42 alloy (Fe—Ni alloy) is preferably used.
  • the thickness of the metal plate 1 is preferably, for example, 10 ⁇ m to 60 ⁇ m, particularly 15 ⁇ m to 30 ⁇ m.
  • the base insulating layer 2 it is preferable to use a polyimide resin such as polyimide or polyamideimide, or a polyamide resin in consideration of flexibility, thermal expansion coefficient, and the like.
  • the insulating base layer 2 has a thickness of, for example, 2 ⁇ m to 30 ⁇ m, preferably 5 ⁇ m to 20 ⁇ m.
  • copper, nickel (Ni), gold, solder, or an alloy thereof is used as the conductor layer for forming the wiring pattern layer including the terminals 3, and copper is preferably used.
  • a subtractive method or an additive method may be used, but in order to form a fine pattern with high accuracy, it is preferable to form by an additive method.
  • a seed film made of a conductive thin film (not shown) is formed on the base insulating film 2 by a sputtering method or the like.
  • the seed film is preferably made of chromium or copper.
  • a chromium thin film and a copper thin film are preferably laminated sequentially by sputtering.
  • the thickness of the chromium thin film is preferably about 10 to 60 nm, for example, and the thickness of the copper thin film is preferably about 50 to 200 nm, for example.
  • a resist pattern for plating having a pattern opposite to the wiring pattern is formed on the seed film.
  • the plating resist is formed as a resist pattern by a known method using, for example, a dry film resist.
  • a wiring pattern including the terminals 3 is formed by plating in a region where the plating resist is not formed.
  • the plating may be electrolytic plating or electroless plating, but electrolytic plating is preferable, and electrolytic copper plating is particularly preferable.
  • the thickness of the wiring pattern layer including the terminal by plating, that is, the copper layer is, for example, 2 ⁇ m to 25 ⁇ m, preferably 5 ⁇ m to 20 ⁇ m.
  • the width of the wiring is, for example, 10 ⁇ m to 500 ⁇ m, preferably 30 ⁇ m to 300 ⁇ m.
  • the gap between the wirings is, for example, 10 ⁇ m to 1000 ⁇ m, preferably 10 ⁇ m to 500 ⁇ m.
  • the conventional flexure manufacturing method shown in FIG. 6 is the same as the manufacturing method of the present embodiment until this stage.
  • a cover insulating layer 4 for covering the wiring pattern layer is formed.
  • photosensitive polyimide has been used for the cover insulating layer 4.
  • non-photosensitive polyimide is used for the cover insulating layer 4.
  • the non-photosensitive polyimide ink is applied to the wiring pattern including the terminals 3 and the base insulating layer (polyimide layer) 2.
  • a polyimide layer (cover insulating layer 4) formed from this non-photosensitive polyimide ink through a drying and curing (heating) process has the following characteristics.
  • Diamine component PDA (p-phenylenediamine) and mTBHG (2,2'-dimethyl-4,4'-diaminobiphenyl), TFMB (2,2'-bis (trifluoromethyl) -4,4 ' -Diaminobiphenyl).
  • Component for improving adhesion APDS (1,3-bis (3-aminopropyl) tetramethyldisiloxane) was added.
  • the polyimide ink is coated and then dried and subjected to a thermosetting treatment. The thermal effect treatment is performed by heating to 250 ° C. or higher, for example, heating to 350 ° C.
  • the opening 7 is opened by the same etching, and the end surface E of the connection pad portion K is formed.
  • plasma etching, RIE (Reactive Ion Etching), dry etching such as sputtering, wet etching using a chemical solution, and laser processing can be used.
  • a photosensitive polyimide ink is applied and dried to form the cover insulating layer 104.
  • heating is performed at about 130 ° C. to 150 ° C. so that polyimide crosslinking (polymerization) is not completed in a predetermined region to be removed.
  • the region to be removed is removed and the cover insulating layer 104 is patterned (B in FIG. 6). By this exposure / development, the cover insulating layer 104 is almost removed except for the wiring pattern 111 as shown in FIG. 5A. All of the terminals 103 are exposed.
  • the developer it is preferable to use an organic one and adjust the blending so that the sharpness of patterning becomes high.
  • the insulating base layer 102 is a stable polyimide layer that has been polymerized, whereas the insulating cover layer 104 is an unstable precursor, Pattern.
  • the selectivity of the insulating base layer 102 functioning as a development stopper and the insulating cover layer 104 to be removed is not sufficiently high as the etching selectivity between the metal and the resin.
  • a sufficiently high dimensional accuracy could not be pursued in patterning. In other words, it has been difficult to cope with the recent trend of high-density terminal arrangement by this conventional method.
  • the photosensitive polyimide ink and the developer are considerably more expensive than the non-photosensitive polyimide ink and the etching liquid in the present embodiment, and in the method of the present embodiment, the material cost is in the cover insulating layer and the like. If limited, it can be reduced to about a fraction of the conventional material cost.
  • the base insulating layer 102 is patterned by etching using the metal plate 101 as an etching stopper.
  • the patterning of the base insulating layer 102 using the metal plate 101 as an etching stopper is the same as the patterning of the base insulating layer 2 in the present embodiment.
  • patterning of the insulating cover layer 104 by exposure / development and patterning of the insulating base layer 102 by etching are performed in two stages.
  • the base insulating layer 2 is also etched at the same etching opportunity as the patterning of the cover insulating layer 4 for forming the opening 7 to form the end surface E. Therefore, according to the present embodiment, not only the material cost but also the manufacturing process can be reduced and the manufacturing period can be shortened.
  • opening (window) 7 is formed by opening, for example, an opening (window) 7 having a width of 40 ⁇ m on terminal 3 having a width of 50 ⁇ m. That is, even if the opening 7 is opened without error, the allowable deviation in the width direction is only 5 ⁇ m.
  • Such high-accuracy patterning of the insulating cover layer 4 is impossible by conventional development using a base insulating layer as a stopper. This is possible only by etching using a metal as an etching stopper.
  • the excessively extending metal plate 1 is removed by etching.
  • the end surface 1 e of the metal plate 1 is positioned closer to the opening 7 than the end surface E of the base insulating layer 2 and the cover insulating layer 4.
  • the flexure is exemplified as the flexible printed wiring board.
  • the present invention is not limited to a flexure as long as it has constituent requirements, and may be any other flexible printed wiring board.
  • the flexible printed wiring board and the like of the present invention it is possible to secure insulation between the terminals and enhance the durability of the connection pad part itself in the connection pad part in which a plurality of terminals are arranged with high density.
  • a normal non-photosensitive polyimide or etching method is used without using photosensitive polyimide or a corresponding developer, the material cost can be greatly reduced.
  • the manufacturing process can be omitted, the manufacturing cost can be reduced and the manufacturing period can be shortened.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
  • Supporting Of Heads In Record-Carrier Devices (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

A cover insulating layer (4) covers the edge portion of each terminal (3) in an interconnection pad (K) and a wiring pattern (11) on the base side of the terminal together with a base insulating layer (2) therearound. The terminal is exposed only at an opening (7) which is opened at a position where the cover insulating layer faces the terminal and the bottom surface (7b) of the opening is comprised of only the upper surface (3a) of the terminal. The end face of the cover insulating layer (4) and the end face of the base insulating layer (2) are flush with each other so as to form an end face (E) of the interconnection pad.

Description

フレキシブルプリント配線板、その製造方法、フレキシャ、および電子機器Flexible printed wiring board, manufacturing method thereof, flexure, and electronic device
 本発明は、フレキシブルプリント配線板(FPC:Flexible Printed Circuit)、その製造方法、フレキシャ、および電子機器に関する。より具体的には本発明は、高密度に接続端子が配列された接続パッドを有するフレキシブルプリント配線板、その製造方法、ハードディスクドライブの磁気素子の信号を伝達するためのフレキシャ、および電子機器に関するものである。 The present invention relates to a flexible printed circuit (FPC), a manufacturing method thereof, a flexure, and an electronic device. More specifically, the present invention relates to a flexible printed wiring board having connection pads in which connection terminals are arranged at high density, a manufacturing method thereof, a flexure for transmitting signals of magnetic elements of a hard disk drive, and an electronic device. It is.
 携帯端末等の電子機器には、多数のフレキシブルプリント配線板が用いられ、その電子機器に適合した特性を有するものが開発されている。なかでもハードディスクドライブ(HDD)に用いられ、磁気ヘッドからの信号を伝達するフレキシブルプリント配線板であるフレキシャについては、多くの開発がなされている(たとえば特許文献1~3)。フレキシャでは、電気的性質だけでなく、磁気ヘッドとCD等との微小スペースを流れる気流などを利用するための機械的性質などについて微妙な弾性特性等が求められる。また、これらの微妙な特性を付与した上で、電子機器内においてHDDは、常に小型化が求められる。このため、磁気ヘッドの配列は高密度化の一途をたどっている。 A lot of flexible printed wiring boards are used for electronic devices such as portable terminals, and those having characteristics suitable for the electronic devices have been developed. In particular, many developments have been made on flexures, which are flexible printed wiring boards that are used in hard disk drives (HDDs) and transmit signals from magnetic heads (for example, Patent Documents 1 to 3). The flexure is required to have not only electrical properties, but also delicate elastic properties such as mechanical properties for using an airflow flowing through a minute space between a magnetic head and a CD. In addition, with these delicate characteristics, the HDD is always required to be downsized in the electronic device. For this reason, the arrangement of magnetic heads is constantly increasing in density.
特開2008-287835号公報JP 2008-287835 A 特開2009-223977号公報JP 2009-223777 A 特開2011-49316号公報JP 2011-49316 A
 フレキシャは、所定の弾性をもって支えるサスペンション金属板と、ベース絶縁層と、配線や端子を形成する導電層と、カバー絶縁層とから構成される。フレキシブルプリント配線板において接続パッドでは、端子を露出させるために開口部が形成される。その開口部では、上記端子が露出され、その露出された端子にNi層およびAu層を含む2層のめっき層が形成されて、磁気ヘッドが配置されるヘッドスライダなどの端子と半田接続されることになる。
 図5Aおよび図5Bは従来のフレキシャの接続パッド部Kを示し、図5Aは平面図であり、また図5BはVB-VB線に沿う断面図である。接続パッド部Kでは、端子103は、すべてカバー絶縁層104から露出されて、金属板101/ベース絶縁層102上においてヘッドスライダ側の端子に向かうように平行に延在する構成をとる。この構造では、カバー絶縁層104は極端にいえば端子103に連なる配線パターン111のみを覆っている。Ni/Au2層めっき103aはカバー絶縁層104から露出する端子103の全体に形成される。
 図6のA~Cに、図5A、図5Bのフレキシャの製造方法を示す。従来の端子構造では、図6のAに示すように、ベース絶縁層102とカバー絶縁層104とが相互に接触する箇所があった。その箇所において、図6のBに示すように、カバー絶縁層104のみを除去してベース絶縁層102を残して一定の長さの端子103を露出させるために、特殊な手法を用いていた。すなわち、図6のA~Cの状態において、カバー絶縁層104を形成する絶縁樹脂層を、架橋が完成する前の化学的に不安定な前駆体の状態にしておき、一方ベース絶縁層102は架橋を完成させて化学的に安定した樹脂層とする。そして、図6のCの状態にするために、露光/現像によってカバー絶縁層104のみを除去していた。この手法によって、各端子103は、ベース絶縁層102上、図示しないヘッドスライダに向かうように平行に延在する構造が実現されていた。製造方法については、後で本発明と比較しながら説明する。
 しかしながら、HDDの小型化が推進された結果、上記のフレキシャにおける接続パッド部の構造を採用したのでは、絶縁性を確保できない場合が生じる事態にいたった。
The flexure is composed of a suspension metal plate that is supported with a predetermined elasticity, a base insulating layer, a conductive layer that forms wiring and terminals, and a cover insulating layer. In the flexible printed wiring board, an opening is formed in the connection pad to expose the terminal. In the opening, the terminal is exposed, and a two-layered plating layer including an Ni layer and an Au layer is formed on the exposed terminal, and is soldered to a terminal such as a head slider on which the magnetic head is disposed. It will be.
5A and 5B show a connection pad portion K of a conventional flexure, FIG. 5A is a plan view, and FIG. 5B is a cross-sectional view taken along line VB-VB. In the connection pad portion K, all the terminals 103 are exposed from the insulating cover layer 104 and extend in parallel on the metal plate 101 / base insulating layer 102 toward the terminals on the head slider side. In this structure, the cover insulating layer 104 covers only the wiring pattern 111 connected to the terminal 103 in an extreme case. The Ni / Au two-layer plating 103 a is formed on the entire terminal 103 exposed from the cover insulating layer 104.
6A to 6C show a method of manufacturing the flexure shown in FIGS. 5A and 5B. In the conventional terminal structure, as shown in FIG. 6A, the base insulating layer 102 and the cover insulating layer 104 are in contact with each other. At that location, as shown in FIG. 6B, a special technique was used to remove only the cover insulating layer 104 and leave the base insulating layer 102 to expose the terminal 103 having a certain length. That is, in the states A to C of FIG. 6, the insulating resin layer forming the cover insulating layer 104 is in a state of a chemically unstable precursor before the crosslinking is completed, while the base insulating layer 102 is Crosslinking is completed to obtain a chemically stable resin layer. Then, only the insulating cover layer 104 was removed by exposure / development to obtain the state of FIG. 6C. With this method, the structure in which each terminal 103 extends in parallel on the insulating base layer 102 so as to face a head slider (not shown) has been realized. The manufacturing method will be described later in comparison with the present invention.
However, as a result of promoting the downsizing of the HDD, the use of the connection pad portion structure in the flexure described above has resulted in a situation where insulation cannot be ensured.
 また、電子機器において、フレキシブルプリント配線板の接続構造を小型化する要求は常にあり、上記のフレキシャに限らず、接続パッド部において、各配線間の絶縁性を確保することは重要である。すなわち、一般的に、フレキシブルプリント配線板において、接続パッド部の端子間の絶縁性を確実に保つことが可能な構造が求められている。 In electronic devices, there is always a demand for downsizing the connection structure of the flexible printed wiring board, and it is important to ensure insulation between the wirings in the connection pad portion, not limited to the above flexure. That is, generally, a flexible printed wiring board is required to have a structure that can reliably maintain insulation between terminals of the connection pad portion.
 本発明は、複数の端子が高密度に配列された接続パッド部において、端子間の絶縁性を確保することができる、フレキシブルプリント配線板、その製造方法、フレキシャ、および電子機器を提供することを目的とする。 The present invention provides a flexible printed wiring board, a manufacturing method thereof, a flexure, and an electronic device that can ensure insulation between terminals in a connection pad portion in which a plurality of terminals are arranged at high density. Objective.
 本発明のフレキシブルプリント配線板は、接続パッド部を備える。このフレキシブルプリント配線板は、金属板と、ベース絶縁層と、該ベース絶縁層に接する配線等を形成するための配線パターンと、配線パターンを覆うカバー絶縁層とを備え、接続パッド部には、ベース絶縁層上において配線パターンから延在して終端する端子が、複数、配列される。そして、各端子において、カバー絶縁層は、該端子の終端部、および該端子の根元側の配線パターンを、その周りのベース絶縁層とともに被覆しており、カバー絶縁層が該端子に対応する位置で開口する開口部においてのみ、該端子は露出し、該開口部の底面は該端子の上面のみで構成される。また、カバー絶縁層の端面とベース絶縁層の端面とは揃っており、接続パッド部の端面を形成していることを特徴とする。 The flexible printed wiring board of the present invention includes a connection pad portion. The flexible printed wiring board includes a metal plate, a base insulating layer, a wiring pattern for forming a wiring or the like in contact with the base insulating layer, and a cover insulating layer covering the wiring pattern. A plurality of terminals extending from the wiring pattern and terminating on the base insulating layer are arranged. In each terminal, the insulating cover layer covers the terminal end of the terminal and the wiring pattern on the base side of the terminal together with the surrounding insulating base layer, and the insulating cover layer corresponds to the terminal. The terminal is exposed only in the opening that is opened at, and the bottom surface of the opening is constituted only by the upper surface of the terminal. Further, the end face of the insulating cover layer and the end face of the insulating base layer are aligned to form the end face of the connection pad portion.
 上記の構成によれば、接続パッド部では共通の開口部というものは存在せず、端子ごとに開口部(窓)が設けられる。このため、1つの開口部に1つの端子が位置して、その1つの端子の上面がその開口部の底面をなす。接続相手は、たとえば電極ごとに、この開口部の底面に半田付けされる。したがって接続パッド部では、1つの端子に1つ設けられる開口部が、並んでいる。
 この結果、端子の間隔が小さくなって、高密度配列になっても、隣の端子と短絡を生じることが防止される。また、接続パッド部の全体の耐久性を向上させることができる。
 また、カバー絶縁層は、従来のように、たとえばベース絶縁層との間で架橋状態(重合の進行状態)に相違を生じさせて、カバー絶縁層のみを現像によってパターニングする必要がなくなる。すなわちカバー絶縁層の除去(パターニング)に、ベース絶縁層を除去(現像)ストッパとしなくてもよくなる。本発明では、接続パッド部の端は、カバー絶縁層とベース絶縁層とをまとめてエッチングによって除去すればよい。このため、カバー絶縁層のパターニングに、感光性ポリイミドや特別な現像液を用いなくてもよくなり、材料の費用を低減することができる。工数的にも大きな工数削減を得ることができる。
According to said structure, there is no common opening part in a connection pad part, and an opening part (window) is provided for every terminal. For this reason, one terminal is located in one opening, and the upper surface of the one terminal forms the bottom of the opening. The connection partner is soldered to the bottom surface of the opening for each electrode, for example. Therefore, in the connection pad part, the opening part provided in one terminal is located in a line.
As a result, even if the distance between the terminals is reduced to form a high-density array, it is possible to prevent a short circuit from occurring between adjacent terminals. Moreover, the durability of the entire connection pad portion can be improved.
In addition, the insulating cover layer is different from the insulating base layer in the cross-linked state (polymerization progress state), for example, so that it is not necessary to pattern only the insulating cover layer by development. That is, the insulating base layer need not be a removal (development) stopper for the removal (patterning) of the insulating cover layer. In the present invention, the end of the connection pad portion may be removed by etching the cover insulating layer and the base insulating layer together. For this reason, it is not necessary to use photosensitive polyimide or a special developer for patterning the insulating cover layer, and the cost of the material can be reduced. A great man-hour reduction can be obtained in terms of man-hours.
 接続パッド部の端において、金属板の端は、該接続パッド部の端面から離れて位置し、ベース絶縁層の裏面を、該接続パッド部の裏面の端で露出させるのがよい。
 これによって、接続相手と半田等で接続するとき、半田の制御不具合が生じた場合でも、金属板と端子等とが半田で導電接続される事態を避けることができる。
At the end of the connection pad portion, the end of the metal plate is preferably located away from the end surface of the connection pad portion, and the back surface of the base insulating layer is exposed at the end of the back surface of the connection pad portion.
As a result, when the connection partner is connected with solder or the like, it is possible to avoid a situation in which the metal plate and the terminal or the like are conductively connected with the solder even if a solder control failure occurs.
 開口部は、配列のピッチが150μm以下、開口部の配線の延在方向に沿う長さが75μm以下とすることができる。
 近年の信号配線の高密度化を反映して接続パッド部の端子配列も高密度化し、端子も微小化している。このような微小な端子の高密度配列において、端子間の絶縁性を確保する上で、上述の構造の接続パッド部を備えるフレキシブルプリント配線板はきわめて効果的である。すなわち、上記の配列ピッチ、端子長さの接続パッドの場合、本発明のフレキシブルプリント配線板において良好な絶縁性を確保して、好適に適用される。
The openings may have an arrangement pitch of 150 μm or less and a length along the extending direction of the wiring of the openings of 75 μm or less.
Reflecting the recent increase in the density of signal wiring, the terminal arrangement of the connection pad portion is also increased in density, and the terminals are also miniaturized. In such a high-density arrangement of minute terminals, a flexible printed wiring board including the connection pad portion having the above-described structure is extremely effective in securing insulation between terminals. That is, in the case of the connection pads having the above arrangement pitch and terminal length, good insulation is secured in the flexible printed wiring board of the present invention, which is preferably applied.
 カバー絶縁層を形成する樹脂層の主成分を、非感光性樹脂とすることができる。
 上記接続パッド部の構造によれば、カバー絶縁層のパターニングにおいてベース絶縁層を現像液によるそのカバー絶縁層除去のストッパにする必要がない。これにより、感光性樹脂をカバー絶縁層に用いなくてすむ。カバー絶縁層に非感光性樹脂を用いて簡単明瞭な工程で、カバー絶縁層およびベース絶縁層をエッチングによってパターニングすることができる。この結果、高価な、感光性樹脂やその現像液などを用いる必要がなく、かつ製造工程も簡単化できるので、材料コスト、工数削減、および製造期間の短縮などを得ることができる。
The main component of the resin layer forming the cover insulating layer can be a non-photosensitive resin.
According to the structure of the connection pad portion, it is not necessary to use the insulating base layer as a stopper for removing the insulating cover layer with a developer in patterning the insulating cover layer. Thereby, it is not necessary to use a photosensitive resin for the cover insulating layer. The cover insulating layer and the base insulating layer can be patterned by etching in a simple and clear process using a non-photosensitive resin for the cover insulating layer. As a result, it is not necessary to use an expensive photosensitive resin or a developer thereof, and the manufacturing process can be simplified, so that material costs, man-hours, and manufacturing time can be reduced.
 カバー絶縁層が、非感光性樹脂液として非感光性ポリイミド前駆体インクを含む。またカバー絶縁層は酸成分として、ピロメリット酸二無水物(PMDA)を主成分に、3,3’,4,4’-ビフェニルテトラカルボン酸無水物(BPDA)を含む。またカバー絶縁層はジアミン成分として、p-フェニレンジアミン(PDA)、2,2’-ジメチル-4,4’-ジアミノビフェニル(mTBHG)、および2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル(TFMB)を含むことができる。
 これによって、柔軟性に富むポリイミド樹脂を用いた上で、熱膨張係数を所定範囲(15ppm/℃~20ppm/℃)として、本製造方法において必須の良好なエッチング性を付与することができる。いずれの性質も硬化処理後のポリイミド樹脂の性質である。エッチング性は、同じエッチング機会に、カバー絶縁層に開口部を設け、カバー絶縁層/ベース絶縁層の終端面を形成するので、非常に重要である。とくに開口部は、上記モノマー組成による良好なエッチング性、および金属(端子)によるエッチングストッパを確保して、高い精度で端子上に形成することができる。
The insulating cover layer contains a non-photosensitive polyimide precursor ink as a non-photosensitive resin liquid. The insulating cover layer contains 3,3 ′, 4,4′-biphenyltetracarboxylic anhydride (BPDA) as a main component, pyromellitic dianhydride (PMDA) as an acid component. The insulating cover layer has p-phenylenediamine (PDA), 2,2′-dimethyl-4,4′-diaminobiphenyl (mTBHG), and 2,2′-bis (trifluoromethyl) -4, as diamine components. 4'-diaminobiphenyl (TFMB) can be included.
This makes it possible to impart good etching properties essential in the present manufacturing method by using a flexible polyimide resin and setting the thermal expansion coefficient within a predetermined range (15 ppm / ° C. to 20 ppm / ° C.). Any property is a property of the polyimide resin after the curing treatment. Etchability is very important because, at the same etching opportunity, an opening is provided in the insulating cover layer and the end face of the insulating cover layer / base insulating layer is formed. In particular, the opening can be formed on the terminal with high accuracy by ensuring good etching properties by the monomer composition and an etching stopper by metal (terminal).
 非感光性ポリイミド前駆体インクに、1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン(APDS)を含むことができる。
 これによって、密着力を高くすることができ、開口部のずれなどを防止して高精度な開口部とするのに貢献できる。
The non-photosensitive polyimide precursor ink can include 1,3-bis (3-aminopropyl) tetramethyldisiloxane (APDS).
As a result, the adhesive force can be increased, and the opening can be prevented from being displaced and contributed to a highly accurate opening.
 本発明のフレキシャは、上述のいずれかのフレキシブルプリント配線板であって、接続パッド部においてハードディスクドライブ(HDD)の磁気ヘッドに接続されることを特徴とする。
 上記の構成によって、磁気ヘッドの小型化、信号の高密度化等に対応して、高密度配列された磁気ヘッドの接続パッドと、フレキシャの接続パッド部とを、対応する端子どうし、絶縁性を確保しながら接続することができる。また、経済性に優れたフレキシャとすることができる。
The flexure of the present invention is any one of the above-described flexible printed wiring boards, and is characterized in that it is connected to a magnetic head of a hard disk drive (HDD) at a connection pad portion.
With the above configuration, in order to reduce the size of the magnetic head and increase the signal density, etc., the connection pads of the magnetic head and the connection pads of the flexure that are arranged in a high density are connected to each other by the corresponding terminals. It can be connected while securing. Moreover, it can be set as the flexure excellent in economical efficiency.
 本発明の電子機器は、上記のいずれかのフレキシブルプリント配線板を備えることを特徴とする。
 上記のいずれかのフレキシブルプリント配線板を用いることで、高密度に配列された端子間の絶縁性を保持しながら、良好な耐久性を得ることができる。また、接続パッド部の構造そのもの及び製造工程が簡単化されるので、高い経済性を得ることができる。
An electronic apparatus according to the present invention includes any one of the flexible printed wiring boards described above.
By using any of the flexible printed wiring boards described above, good durability can be obtained while maintaining insulation between terminals arranged at high density. Moreover, since the structure of the connection pad portion itself and the manufacturing process are simplified, high economic efficiency can be obtained.
 本発明のプリント配線板の製造方法は、接続パッド部を備えるフレキシブルプリント配線板を製造する。この製造方法は、金属板上にベース絶縁層を備える基材シートを準備する工程と、ベース絶縁層に接して、端子を含む配線パターンを形成する工程と、端子を含む配線パターンを覆うカバー絶縁層を形成するために、非感光性樹脂液をベース絶縁層に重ねるように塗工する工程と、塗工された非感光樹脂液を、乾燥し、次いで熱硬化する工程と、ベース絶縁層および熱硬化したカバー絶縁層を、エッチングする工程とを備える。そしてエッチング工程では、端子がエッチングストッパとなるようにカバー絶縁層に開口部をあけ、該端子が該開口部の底面を形成し、かつ、該カバー絶縁層の端面およびベース絶縁層の端面が揃って、接続パッド部の端面を形成するように、金属板がエッチングストッパとなるように該カバー絶縁層およびベース絶縁層をエッチングすることを特徴とする。 The method for producing a printed wiring board of the present invention produces a flexible printed wiring board having a connection pad portion. The manufacturing method includes a step of preparing a base sheet having a base insulating layer on a metal plate, a step of forming a wiring pattern including a terminal in contact with the base insulating layer, and a cover insulation covering the wiring pattern including the terminal. Forming a layer, applying a non-photosensitive resin liquid so as to overlap the base insulating layer, drying the coated non-photosensitive resin liquid, and then thermally curing the base insulating layer and Etching the heat-cured insulating cover layer. In the etching step, an opening is formed in the insulating cover layer so that the terminal serves as an etching stopper, the terminal forms the bottom surface of the opening, and the end surface of the insulating cover layer and the end surface of the insulating base layer are aligned. Thus, the cover insulating layer and the base insulating layer are etched so that the metal plate serves as an etching stopper so as to form the end face of the connection pad portion.
 上記の製造方法では、カバー絶縁層に対する端子上の開口部の形成、およびベース絶縁層/カバー絶縁層のパターニング、を並行させてエッチングによって行う。開口部のエッチングのストッパは端子により、また、ベース絶縁層/カバー絶縁層のエッチングのストッパは金属板により、担当される。これらストッパは金属であり、エッチングの金属/樹脂の選択性は高いので、高精度でベース絶縁層およびカバー絶縁層をパターニングすることができる。このため、端子ごとにカバー絶縁層に開口部を形成する微細加工(微細パターニング)を高精度で行うことが可能になる。上述した、配列ピッチ200μm以下、各端子長さ75μm以下の接続パッド部の場合、このような金属/樹脂の高い選択性を有するエッチング法を用いてパターニングしない限り、狙い通りの接続パッド部を得ることは難しい。
 上記のエッチング法を用いる場合、従来のように、ベース絶縁層とカバー絶縁層とが接する領域で、カバー絶縁層のみをパターニングする必要がない。すなわち、カバー絶縁層を感光性樹脂で形成して重合が完成しない前駆体とし、ベース絶縁層は重合が完成した安定状態としておき、カバー絶縁層のみを現像によってパターニングする必要がない。このときベース絶縁層は現像のストッパとして機能させる。この従来の製造方法では、感光性樹脂たとえば感光性ポリイミドは高価であり、また現像液も高価である。製造工程についても、カバー絶縁層を前駆体の段階で現像するので、工程の時間的な制約が強く、かつ工程数も多くなる。この結果、従来の接続パッド部の構造を備えるフレキシブルプリント配線板は高価とならざるを得なかった。上記のように、金属/樹脂の選択性の高いエッチングを用いることで、微細で高密度配列の開口部を精度よく形成しながら、材料コストおよび製造コスト、製造期間等を低減することができる。
In the above manufacturing method, the opening on the terminal with respect to the insulating cover layer and the patterning of the insulating base layer / cover insulating layer are performed by etching in parallel. The opening etching stopper is in charge of the terminal, and the base insulating layer / cover insulating layer etching stopper is in charge of the metal plate. Since these stoppers are made of metal and the etching metal / resin selectivity is high, the base insulating layer and the cover insulating layer can be patterned with high accuracy. For this reason, it becomes possible to carry out fine processing (fine patterning) for forming an opening in the insulating cover layer for each terminal with high accuracy. In the case of the connection pad portion having an arrangement pitch of 200 μm or less and each terminal length of 75 μm or less as described above, the desired connection pad portion is obtained unless patterning is performed using such an etching method having high metal / resin selectivity. It ’s difficult.
When the above etching method is used, it is not necessary to pattern only the cover insulating layer in a region where the base insulating layer and the cover insulating layer are in contact with each other as in the conventional case. That is, the insulating cover layer is formed of a photosensitive resin to be a precursor that is not completely polymerized, the insulating base layer is kept in a stable state after completion of the polymerization, and it is not necessary to pattern only the insulating cover layer by development. At this time, the base insulating layer functions as a development stopper. In this conventional manufacturing method, photosensitive resin such as photosensitive polyimide is expensive, and the developer is also expensive. Also in the manufacturing process, since the insulating cover layer is developed at the precursor stage, the time restriction of the process is strong and the number of processes increases. As a result, the conventional flexible printed wiring board having the structure of the connection pad portion has to be expensive. As described above, by using etching with high metal / resin selectivity, it is possible to reduce the material cost, the manufacturing cost, the manufacturing period, and the like while accurately forming the fine and high-density array of openings.
 本発明のフレキシブルプリント配線板等によれば、複数の端子が高密度に配列された接続パッド部において、端子間の絶縁性を確保することができる。また、材料コスト、製造コストを低減し、かつ製造期間を短縮することができる。 According to the flexible printed wiring board or the like of the present invention, it is possible to ensure insulation between terminals in a connection pad portion in which a plurality of terminals are arranged with high density. Further, the material cost and the manufacturing cost can be reduced, and the manufacturing period can be shortened.
本発明の実施の形態におけるフレキシャを示す平面図である。It is a top view which shows the flexure in embodiment of this invention. 図1のフレキシャのヘッドスライダ側の接続パッド部を示し、平面図、である。FIG. 2 is a plan view showing a connection pad portion on the head slider side of the flexure of FIG. 1. 図1のフレキシャのヘッドスライダ側の接続パッド部を示し、IIB-IIB線に沿う断面図、である。FIG. 2 is a cross-sectional view taken along the line IIB-IIB, showing a connection pad portion on the head slider side of the flexure of FIG. ヘッドスライダおよびフレキシャの接続パッドを示し、ヘッドスライダおよびフレキシャの接続パッドの配置関係等を示す斜視図である。It is a perspective view showing the connection pads of the head slider and the flexure, and showing the positional relationship of the connection pads of the head slider and the flexure. ヘッドスライダおよびフレキシャの接続パッドを示し、半田滴を滴下して導電接続した状態を示す断面図である。It is sectional drawing which shows the connection pad of a head slider and a flexure, and shows the state electrically connected by dripping a solder drop. 本実施の形態のフレキシャの製造方法を示し、Aは金属板/ベース絶縁層上に配線パターンを形成した状態を示す断面図、Bはカバー絶縁層を形成するための非感光性ポリイミドインクを塗工した状態を示す断面図、Cはカバー絶縁層およびベース絶縁層を同じエッチング工程よりパターニングした状態を示す断面図、Dは金属板をエッチングした状態を示す断面図、である。1 shows a flexure manufacturing method of the present embodiment, in which A is a cross-sectional view showing a state in which a wiring pattern is formed on a metal plate / base insulating layer, and B is a non-photosensitive polyimide ink for forming a cover insulating layer. Sectional drawing which shows the processed state, C is sectional drawing which shows the state which patterned the cover insulating layer and the base insulating layer from the same etching process, D is sectional drawing which shows the state which etched the metal plate. 従来のフレキシャの接続パッド部を示し、平面図である。It is a top view which shows the connection pad part of the conventional flexure. 従来のフレキシャの接続パッド部を示し、VB-VB線に沿う断面図、である。FIG. 10 is a cross-sectional view taken along line VB-VB, showing a connection pad portion of a conventional flexure. 従来の製造方法を示し、Aはカバー絶縁層を形成するための感光性ポリイミドインクを塗工した状態を示す断面図、Bはカバー絶縁層を露光および現像によってパターニングした状態を示す断面図、Cはエッチングによってベース絶縁層をパターニングした状態、を示す断面図、である。A conventional manufacturing method is shown, A is a cross-sectional view showing a state where a photosensitive polyimide ink for forming a cover insulating layer is applied, B is a cross-sectional view showing a state where the cover insulating layer is patterned by exposure and development, C FIG. 3 is a cross-sectional view showing a state where a base insulating layer is patterned by etching.
 1 金属板、1e 金属板の端面、2 ベース絶縁層、3 端子、3a 端子の上面(またはNi/Auめっき層)、4 カバー絶縁層、7 開口部、7b 開口部の底面、10 フレキシャ、11 配線パターン、19 キャリッジアーム、20 ヘッドスライダ、20k ヘッドスライダの接続パッド、23 ヘッドスライダの端子、25 半田、50 ヘッドサスペンションアセンブリ、E 終端面、K 接続パッド部、P 端子間のピッチ、101 金属板、102 ベース絶縁層、103 端子、104 カバー絶縁層、111 配線パターン。
1 metal plate, 1e end face of metal plate, 2 base insulating layer, 3 terminal, 3a terminal upper surface (or Ni / Au plating layer), 4 cover insulating layer, 7 opening, 7b opening bottom, 10 flexure, 11 Wiring pattern, 19 Carriage arm, 20 Head slider, 20k Head slider connection pad, 23 Head slider terminal, 25 Solder, 50 Head suspension assembly, E Terminal plane, K Connection pad, P terminal pitch, 101 Metal plate , 102 Base insulating layer, 103 terminals, 104 cover insulating layer, 111 wiring pattern.
 図1は、本発明の実施の形態におけるフレキシャ10および該フレキシャが含まれるヘッドサスペンションアセンブリ50を示す図である。HDDのトラックに沿って磁気ヘッドを回動させるキャリッジアーム19に、ヘッドサスペンションアセンブリ50は取り付けられている。フレキシブルプリント配線板であるフレキシャ10は、磁気ヘッドが入力して電磁変換した信号を伝達するために用いられる。このためフレキシャ10は、磁気ヘッドが配置されるヘッドスライダ20から、図示しないキャリッジアーム根元の支軸の外周面に設けられ、外部と接続するための接続用基板ユニットにわたって配置される。フレキシャ10には、一定のばね弾性を有する金属板1が用いられ、その上に上記の信号伝達のための配線パターン11が絶縁層中に含まれている。図示しない磁気ディスクが回転して気流が流れるとき、ヘッドスライダ20は所定高さ安定して浮上するように、フレキシャ10、その他のヘッドサスペンションアセンブリ50の部品は一定の弾性を有する金属材を備えている。フレキシャ10は、ヘッドスライダ20に面する端において、磁気ヘッドにおける電極と接続するための接続パッド部Kを備える。本実施の形態における特徴は、フレキシャ10の磁気ヘッド側の接続パッド部Kの構造および製造方法にある。 FIG. 1 is a diagram showing a flexure 10 and a head suspension assembly 50 including the flexure according to an embodiment of the present invention. A head suspension assembly 50 is attached to a carriage arm 19 that rotates the magnetic head along a track of the HDD. The flexure 10 that is a flexible printed wiring board is used to transmit a signal that is input and electromagnetically converted by a magnetic head. For this reason, the flexure 10 is provided from the head slider 20 on which the magnetic head is disposed to the outer peripheral surface of the support shaft at the base of the carriage arm (not shown), and is disposed over the connection substrate unit for connection to the outside. A metal plate 1 having a certain spring elasticity is used for the flexure 10, and a wiring pattern 11 for signal transmission described above is included in an insulating layer. The flexure 10 and other components of the head suspension assembly 50 are provided with a metal material having a certain elasticity so that the head slider 20 floats stably at a predetermined height when a magnetic disk (not shown) rotates and an air current flows. Yes. The flexure 10 includes a connection pad portion K for connecting to an electrode in the magnetic head at an end facing the head slider 20. The feature of this embodiment is the structure and manufacturing method of the connection pad portion K on the magnetic head side of the flexure 10.
 図2Aおよび図2Bは、本実施の形態におけるフレキシャ10の接続パッド部Kを示し、図2Aは平面図、図2BはIIB-IIB線に沿う断面図である。接続パッド部Kは、開口部7以外はカバー絶縁層4で覆われている。すなわち小さい窓7以外はカバー絶縁層4で覆われている。配線11の先端には、幅が拡大された端子3が位置している。一つの端子3には一つの開口部(窓)7があけられているが、平面的に見て、開口部7の全領域は端子3の領域内に収まるようにする。これは、このあと製造方法において説明するが、端子3が、カバー絶縁層4をエッチングする際にエッチングストッパとして用いられるためである。開口部7に露出する端子3の上面3aにはNi/Auの2層のめっき層が設けられている。本発明の説明では、端子3の上面3aとその面に形成されためっき層とは、とくに断らない限り、区別しないで、上面3aまたはそのめっき層3a、のように特定する。
 接続パッド部Kにおけるサイズは、次のように例示される。あくまで一例である。より高密度配列でもよい。
(1)端子3間のピッチP:150μm以下、たとえば100μm程度。これはHDDの設計サイドから求められる。図3Aおよび図3Bに示すように、当然、ヘッドスライダ20の端子配列に適合する。
(2)開口部7のピッチ:端子と同じピッチであり、150μm以下、たとえば100μm程度。
(3)端子3:ピッチ方向に直交する方向である長手(延在)方向の長さは例えば100μm程度、幅は50μm程度。
(4)開口部7:長手方向の長さは50μm程度、幅方向の長さは40μm。
 端子3および開口部7のピッチ150μm以下の配列は、非常に高密度であり、半田で導電接続する電子機器の接続パッドどうしの接続としては希である。
 図2Aから分かるように、端子3は開口部7においてのみ露出するので、高密度配列にも拘わらず、端子3の間の絶縁性を高めることができる。また、ヘッドスライダ20と導電接続する際、たとえば隣り合う端子間に短絡を生じにくくすることができる。また、図5に示す従来の接続パッド部に比べて、格段に接続パッド部Kそのものの耐久性を向上させることができる。
2A and 2B show the connection pad portion K of the flexure 10 in the present embodiment, FIG. 2A is a plan view, and FIG. 2B is a cross-sectional view taken along the line IIB-IIB. The connection pad portion K is covered with the insulating cover layer 4 except for the opening 7. That is, except for the small window 7, it is covered with the insulating cover layer 4. A terminal 3 having an enlarged width is located at the tip of the wiring 11. Although one terminal 3 has one opening (window) 7, the entire area of the opening 7 is set within the area of the terminal 3 in plan view. This is because the terminal 3 is used as an etching stopper when the cover insulating layer 4 is etched, as will be described later in the manufacturing method. Two plating layers of Ni / Au are provided on the upper surface 3 a of the terminal 3 exposed in the opening 7. In the description of the present invention, the upper surface 3a of the terminal 3 and the plating layer formed on the surface are specified as the upper surface 3a or the plating layer 3a without distinction unless otherwise specified.
The size in the connection pad part K is illustrated as follows. This is just an example. A higher density array may be used.
(1) Pitch P between terminals 3: 150 μm or less, for example, about 100 μm. This is required from the HDD design side. As shown in FIG. 3A and FIG. 3B, it naturally matches the terminal arrangement of the head slider 20.
(2) Pitch of the openings 7: The same pitch as the terminals, 150 μm or less, for example, about 100 μm.
(3) Terminal 3: The length in the longitudinal (extending) direction, which is a direction orthogonal to the pitch direction, is, for example, about 100 μm and the width is about 50 μm.
(4) Opening 7: The length in the longitudinal direction is about 50 μm, and the length in the width direction is 40 μm.
The arrangement of the terminals 3 and the openings 7 with a pitch of 150 μm or less is very high density, and is rare as a connection between connection pads of an electronic device that is conductively connected with solder.
As can be seen from FIG. 2A, since the terminals 3 are exposed only at the openings 7, the insulation between the terminals 3 can be enhanced regardless of the high-density arrangement. Further, when conducting conductive connection with the head slider 20, it is possible to make it difficult to cause a short circuit between adjacent terminals, for example. Further, the durability of the connection pad portion K itself can be significantly improved as compared with the conventional connection pad portion shown in FIG.
 図2Bの断面図から次の特徴が分かる。
(F1)カバー絶縁層4に開口部7をあける際に、エッチングにより、金属からなる導電層の端子3をエッチングストッパとして用いることができる。一般に、エッチングにおいて金属/樹脂は高い選択度でエッチングできるので、高精度のエッチングができる。
(F2)接続パッド部Kの終端面Eでは、カバー絶縁層4およびベース絶縁層2の端面が揃っている。金属板1は、製品とされた最終段階では終端面Eから内側に引っ込んだ位置にあるが、製造途中では、終端面Eよりも先に延在していたはずである。従って、終端面Eについても、金属板1をエッチングストッパに用いてエッチングによって、カバー絶縁層4およびベース絶縁層2の端面を揃えて、終端面Eとすることができる。
 上記の終端面Eの形成、および開口部7の形成、は同じエッチングの機会に同時並行的に行うことができる。このエッチングプロセルについては、あとで詳しく説明する。
(F3)図2Bに示すように、Ni/Auの2層めっきは、開口部7の底面7bに限定される。このため高価な金めっきの材料コストを大幅に減らすことができる。
 上記の他に、本実施の形態のフレキシャ10は、製造方法として、上記(F1)~(F3)も含めて多くの利点を有する。
The following features can be seen from the cross-sectional view of FIG. 2B.
(F1) When the opening 7 is opened in the insulating cover layer 4, the terminal 3 of the conductive layer made of metal can be used as an etching stopper by etching. In general, since metal / resin can be etched with high selectivity in etching, highly accurate etching can be performed.
(F2) At the end surface E of the connection pad portion K, the end surfaces of the cover insulating layer 4 and the base insulating layer 2 are aligned. Although the metal plate 1 is in a position retracted inward from the end surface E in the final stage of being a product, it should have been extended before the end surface E during manufacture. Accordingly, the end surface E can also be made the end surface E by aligning the end surfaces of the cover insulating layer 4 and the base insulating layer 2 by etching using the metal plate 1 as an etching stopper.
The formation of the end surface E and the formation of the opening 7 can be performed simultaneously in the same etching opportunity. This etching process will be described in detail later.
(F3) As shown in FIG. 2B, the Ni / Au two-layer plating is limited to the bottom surface 7 b of the opening 7. For this reason, the material cost of expensive gold plating can be reduced significantly.
In addition to the above, the flexure 10 of the present embodiment has many advantages as a manufacturing method including the above (F1) to (F3).
 図3Aおよび図3Bは、フレキシャ10の接続パッド部Kと、ヘッドスライダ20の接続パッド20kとの導電接続の一例を説明する図である。図3Aはヘッドスライダ20の接続パッド20kと、フレキシャ10の接続パッド部Kとの位置および姿勢の関係を示す斜視図であり、図3Bは、半田25によって両者の端子3,23どうしを導電接続した状態の断面図である。ヘッドスライダ20とフレキシャ10の接続の形態は多くあり、図3Aおよび図3Bはあくまで一例を示す。
 図3Aに示すように、本実施の形態におけるヘッドスライダ20の接続パッド20kは、フレキシャ10の接続パッド部Kに面する側面に設けられている。ヘッドスライダ20の接続パッド20kの端子23と、フレキシャ10の開口部7の底面7bまたは端子3(3a)とは、直角に近い交差角をなすように配置するのがよい。これは図3Bに示すように、半田滴を滴下する際、その交差角をなすコーナー凹部を天側にして、そのコーナー凹部に溶融した半田滴を滴下して、端子3(3a)とヘッドスライダ20の接続パッド20kの端子23とを導電接続する。半田滴を、上記のコーナー凹部に滴下する際に、その滴下対象の端子に集中するロート状の滴下具、または開口部7の間に遮断壁が挿入されて、隣の開口部に部分的にでも半田滴が入る余地のない治具、等を用いるのがよい。
3A and 3B are diagrams for explaining an example of conductive connection between the connection pad portion K of the flexure 10 and the connection pad 20k of the head slider 20. FIG. FIG. 3A is a perspective view showing the relationship between the position and posture of the connection pad 20k of the head slider 20 and the connection pad portion K of the flexure 10, and FIG. 3B is a conductive connection between the terminals 3 and 23 by solder 25. It is sectional drawing of the state which carried out. There are many forms of connection between the head slider 20 and the flexure 10, and FIGS. 3A and 3B show an example only.
As shown in FIG. 3A, the connection pad 20 k of the head slider 20 in the present embodiment is provided on a side surface facing the connection pad portion K of the flexure 10. The terminal 23 of the connection pad 20k of the head slider 20 and the bottom surface 7b of the opening 7 of the flexure 10 or the terminal 3 (3a) are preferably arranged so as to form an intersection angle close to a right angle. As shown in FIG. 3B, when the solder droplets are dropped, the corner concave portion forming the crossing angle is set to the top side, and the molten solder droplet is dropped into the corner concave portion, so that the terminal 3 (3a) and the head slider are dropped. The terminals 23 of the 20 connection pads 20k are conductively connected. When a solder drop is dropped on the corner recess, a funnel-shaped dropping tool that concentrates on the terminal to be dropped, or a blocking wall is inserted between the opening 7 and partially in the adjacent opening. However, it is better to use a jig with no room for solder drops.
 図4は、本実施の形態のフレキシャの製造方法、とくに接続パッド部Kの形成方法を示す図である。まず、金属板1にベース絶縁層2が配置された積層体を準備して、そのベース絶縁層2上に端子3を含む配線パターン層を形成する。
 金属板1には、金属箔または金属薄板を用い、例えばステンレススチール、42アロイ(Fe-Ni合金)を用いるのがよい。金属板1の厚みは、たとえば10μm~60μm、とくに15μm~30μmとするのがよい。
 ベース絶縁層2には、柔軟性、熱膨張率等を重視して、ポリイミド、ポリアミドイミドなどのポリイミド系樹脂、ポリアミド系樹脂を用いるのがよい。ベース絶縁層2の厚みは、たとえば2μm~30μm、好ましくは5μm~20μmとする。
 端子3を含む配線パターン層を形成する導体層としては、たとえば銅、ニッケル(Ni)、金、はんだ、またはこれらの合金等を用い、好ましくは銅を用いるのがよい。銅層の配線パターンを形成するには、サブトラクティブ法でもアディティブ法でもよいが、微細なパターンを高精度で形成するためにはアディティブ法で形成するのがよい。アディティブ法では、図示しない導体薄膜からなるシード膜(種膜)をスパッタリング法などでベース絶縁膜2に成膜する。シード膜はクロムや銅などが好ましく用いられる。とくにクロム薄膜と銅薄膜とを、順次スパッタリング法で積層するのがよい。ここで、クロム薄膜の厚みは例えば10nm~60nm程度、銅薄膜の厚みは例えば50nm~200nm程度とするのがよい。
 上記シード膜上に配線パターンと逆パターンのめっき用のレジストパターンを形成する。めっきレジストは、例えばドライフィルムレジスト等を用いて公知の方法によりレジストパターンとして形成する。次いで、めっきレジストが形成されていない領域に、めっきによって端子3を含む配線パターンを形成する。めっきは、電解めっきでも無電解めっきでもよいが、電解めっきがよく、とりわけ電解銅めっきが好ましい。めっきによる端子を含む配線パターン層、すなわち銅層の厚みは、例えば2μm~25μm、好ましくは5μm~20μmとする。また、配線の幅は、例えば10μm~500μm、好ましくは30μm~300μmとする。配線間の間隙は、例えば10μm~1000μm、好ましくは10μm~500μmとする。
 図6に示す従来のフレキシャの製造方法においても、この段階までは、本実施の形態の製造方法と同じである。
FIG. 4 is a diagram showing a method of manufacturing the flexure of the present embodiment, particularly a method of forming the connection pad portion K. First, a laminate in which the base insulating layer 2 is disposed on the metal plate 1 is prepared, and a wiring pattern layer including the terminals 3 is formed on the base insulating layer 2.
For the metal plate 1, a metal foil or a metal thin plate is used, for example, stainless steel, 42 alloy (Fe—Ni alloy) is preferably used. The thickness of the metal plate 1 is preferably, for example, 10 μm to 60 μm, particularly 15 μm to 30 μm.
For the base insulating layer 2, it is preferable to use a polyimide resin such as polyimide or polyamideimide, or a polyamide resin in consideration of flexibility, thermal expansion coefficient, and the like. The insulating base layer 2 has a thickness of, for example, 2 μm to 30 μm, preferably 5 μm to 20 μm.
For example, copper, nickel (Ni), gold, solder, or an alloy thereof is used as the conductor layer for forming the wiring pattern layer including the terminals 3, and copper is preferably used. In order to form the wiring pattern of the copper layer, either a subtractive method or an additive method may be used, but in order to form a fine pattern with high accuracy, it is preferable to form by an additive method. In the additive method, a seed film (seed film) made of a conductive thin film (not shown) is formed on the base insulating film 2 by a sputtering method or the like. The seed film is preferably made of chromium or copper. In particular, a chromium thin film and a copper thin film are preferably laminated sequentially by sputtering. Here, the thickness of the chromium thin film is preferably about 10 to 60 nm, for example, and the thickness of the copper thin film is preferably about 50 to 200 nm, for example.
A resist pattern for plating having a pattern opposite to the wiring pattern is formed on the seed film. The plating resist is formed as a resist pattern by a known method using, for example, a dry film resist. Next, a wiring pattern including the terminals 3 is formed by plating in a region where the plating resist is not formed. The plating may be electrolytic plating or electroless plating, but electrolytic plating is preferable, and electrolytic copper plating is particularly preferable. The thickness of the wiring pattern layer including the terminal by plating, that is, the copper layer is, for example, 2 μm to 25 μm, preferably 5 μm to 20 μm. The width of the wiring is, for example, 10 μm to 500 μm, preferably 30 μm to 300 μm. The gap between the wirings is, for example, 10 μm to 1000 μm, preferably 10 μm to 500 μm.
The conventional flexure manufacturing method shown in FIG. 6 is the same as the manufacturing method of the present embodiment until this stage.
 上記のめっきレジストを公知のエッチング法で除去した後、配線パターン層を被覆するためのカバー絶縁層4を形成する。カバー絶縁層4には、従来、感光性ポリイミドが用いられてきた。しかし、本実施の形態では、カバー絶縁層4に非感光性ポリイミドを用いる。まず非感光性ポリイミドインクを、端子3を含む配線パターンおよびベース絶縁層(ポリイミド層)2に塗工する。この非感光性ポリイミドインクから、乾燥および硬化(加熱)処理を経て形成されるポリイミド層(カバー絶縁層4)は、次の特徴を有する。
(A1)熱膨張係数(CTE:Coefficient of thermal expansion):15ppm/℃~20ppm/℃
(A2)良好な、エッチング性および密着力
 上記の熱膨張係数および良好なエッチング性を実現。
上記(A1)および(A2)を得るために、次のポリイミドのモノマー組成を合成してポリイミドインクを調合した。
<モノマー組成>:
(1)酸成分:PMDA(ピロメリット酸二無水物)を主成分として、BPDA(3,3’,4,4’-ビフェニルテトラカルボン酸無水物)を追加。
(2)ジアミン成分:PDA(p-フェニレンジアミン)およびmTBHG(2,2’-ジメチル-4,4’-ジアミノビフェニル)、TFMB(2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル)。
(3)密着力向上のための成分:APDS(1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン)を追加。
 上記のポリイミドインクを、図4のBに示すように、塗工した後、乾燥し、熱硬化処理を行う。熱効果処理は、250℃以上に加熱することで行い、例えば350℃に加熱する。その後、ドライフィルムレジストを用いて、エッチングによって、同じエッチングにより、開口部7をあけ、かつ接続パッド部Kの終端面Eを形成する。このエッチングでは、プラズマエッチング、RIE(Reactive Ion Etching)、スパッタリングなどのドライエッチング、薬液を用いるウエットエッチング、およびレーザ加工などいずれも用いることができる。
After the plating resist is removed by a known etching method, a cover insulating layer 4 for covering the wiring pattern layer is formed. Conventionally, photosensitive polyimide has been used for the cover insulating layer 4. However, in this embodiment, non-photosensitive polyimide is used for the cover insulating layer 4. First, the non-photosensitive polyimide ink is applied to the wiring pattern including the terminals 3 and the base insulating layer (polyimide layer) 2. A polyimide layer (cover insulating layer 4) formed from this non-photosensitive polyimide ink through a drying and curing (heating) process has the following characteristics.
(A1) Coefficient of thermal expansion (CTE): 15 ppm / ° C. to 20 ppm / ° C.
(A2) Good etching property and adhesion The above thermal expansion coefficient and good etching property are realized.
In order to obtain the above (A1) and (A2), the following polyimide monomer composition was synthesized to prepare a polyimide ink.
<Monomer composition>:
(1) Acid component: BPDA (3,3 ', 4,4'-biphenyltetracarboxylic anhydride) is added with PMDA (pyromellitic dianhydride) as the main component.
(2) Diamine component: PDA (p-phenylenediamine) and mTBHG (2,2'-dimethyl-4,4'-diaminobiphenyl), TFMB (2,2'-bis (trifluoromethyl) -4,4 ' -Diaminobiphenyl).
(3) Component for improving adhesion: APDS (1,3-bis (3-aminopropyl) tetramethyldisiloxane) was added.
As shown in FIG. 4B, the polyimide ink is coated and then dried and subjected to a thermosetting treatment. The thermal effect treatment is performed by heating to 250 ° C. or higher, for example, heating to 350 ° C. Thereafter, by using the dry film resist, the opening 7 is opened by the same etching, and the end surface E of the connection pad portion K is formed. In this etching, plasma etching, RIE (Reactive Ion Etching), dry etching such as sputtering, wet etching using a chemical solution, and laser processing can be used.
 従来のフレキシャの製造方法では、本実施の形態の図4のBに対応する工程では、図6のAに示すように、感光性ポリイミドインクを塗工して乾燥してカバー絶縁層104とする。乾燥では、ポジティブ型およびネガティブ型に応じて、除去対象の所定領域においてポリイミドの架橋(重合)が完成しないように、130℃~150℃程度に加熱する。次の露光および現像処理で除去対象領域を除去してカバー絶縁層104をパターニングする(図6のB)。この露光/現像によって、カバー絶縁層104は、図5Aに示すように配線パターン111以外の領域はほとんど除去される。端子103は、すべてが露出される。現像液は、有機系のものを用い、パターニングの鮮明度が高くなるように調合を調整するのがよい。
 上記の現像によるカバー絶縁層104のパターニングでは、ベース絶縁層102は重合が完成した安定したポリイミド層であるのに対して、カバー絶縁層104が不安定な前駆体であることを利用して、パターニングする。このとき、現像ストッパとして機能するベース絶縁層102と、除去対象のカバー絶縁層104の選択度は、金属と樹脂との間のエッチング選択度ほど十分高くない。この結果、パターニングにおいて、十分高い寸法精度を追求することはできなかった。換言すれば、この従来の方式によっては、近年の高密度な端子配列の傾向に対応することが難しかった。
 さらに、上記の感光性ポリイミドインクおよび上記現像液は、本実施の形態における非感光性ポリイミドインクおよびエッチング液よりも相当高価であり、本実施の形態の方式では、材料コストはカバー絶縁層等に限定すれば、従来の材料コストの数分の一程度に低減することができる。
In the conventional flexure manufacturing method, in the process corresponding to FIG. 4B of the present embodiment, as shown in FIG. 6A, a photosensitive polyimide ink is applied and dried to form the cover insulating layer 104. . In drying, depending on the positive type and the negative type, heating is performed at about 130 ° C. to 150 ° C. so that polyimide crosslinking (polymerization) is not completed in a predetermined region to be removed. In the next exposure and development process, the region to be removed is removed and the cover insulating layer 104 is patterned (B in FIG. 6). By this exposure / development, the cover insulating layer 104 is almost removed except for the wiring pattern 111 as shown in FIG. 5A. All of the terminals 103 are exposed. As the developer, it is preferable to use an organic one and adjust the blending so that the sharpness of patterning becomes high.
In the patterning of the insulating cover layer 104 by the above development, the insulating base layer 102 is a stable polyimide layer that has been polymerized, whereas the insulating cover layer 104 is an unstable precursor, Pattern. At this time, the selectivity of the insulating base layer 102 functioning as a development stopper and the insulating cover layer 104 to be removed is not sufficiently high as the etching selectivity between the metal and the resin. As a result, a sufficiently high dimensional accuracy could not be pursued in patterning. In other words, it has been difficult to cope with the recent trend of high-density terminal arrangement by this conventional method.
Further, the photosensitive polyimide ink and the developer are considerably more expensive than the non-photosensitive polyimide ink and the etching liquid in the present embodiment, and in the method of the present embodiment, the material cost is in the cover insulating layer and the like. If limited, it can be reduced to about a fraction of the conventional material cost.
 従来の製造方法では、このあと、図6のCに示すように、金属板101をエッチングストッパとして、ベース絶縁層102をエッチングによりパターニングする。この金属板101をエッチングストッパとするベース絶縁層102のパターニングは、本実施の形態におけるベース絶縁層2のパターニングと同じである。従来は、露光/現像によるカバー絶縁層104のパターニングと、エッチングによるベース絶縁層102のパターニング、の2段階のパターニングを行っていた。しかし、本実施の形態では、開口部7の形成のためのカバー絶縁層4のパターニングと同じエッチング機会にベース絶縁層2もエッチングして終端面Eを形成する。
 したがって、本実施の形態によれば、材料コストだけでなく、製造工程を削減して、製造期間を短縮することができる。
In the conventional manufacturing method, thereafter, as shown in FIG. 6C, the base insulating layer 102 is patterned by etching using the metal plate 101 as an etching stopper. The patterning of the base insulating layer 102 using the metal plate 101 as an etching stopper is the same as the patterning of the base insulating layer 2 in the present embodiment. Conventionally, patterning of the insulating cover layer 104 by exposure / development and patterning of the insulating base layer 102 by etching are performed in two stages. However, in the present embodiment, the base insulating layer 2 is also etched at the same etching opportunity as the patterning of the cover insulating layer 4 for forming the opening 7 to form the end surface E.
Therefore, according to the present embodiment, not only the material cost but also the manufacturing process can be reduced and the manufacturing period can be shortened.
<絶縁層のエッチング精度>
 上述のように、開口部7のエッチングストッパは銅層など金属層から形成される端子3であり、終端面Eのエッチングストッパはステンレス鋼などからなる金属板1である。金属と樹脂とのエッチング選択度は高いので、高い精度でエッチングすることができる。
 図2Aを参照して、本実施の形態では、開口部(窓)7は、例えば、幅50μmの端子3の上に、幅40μmの開口部(窓)7を、中心を合わせてあける。すなわち誤差なく開口部7をあけたとして、幅方向の許容できるずれは5μmしかない。このような高精度のカバー絶縁層4のパターニングは、従来のような、ベース絶縁層をストッパとする現像による除去では不可能である。金属をエッチングストッパとするエッチングによりはじめて可能となる。
<Insulating layer etching accuracy>
As described above, the etching stopper of the opening 7 is the terminal 3 formed of a metal layer such as a copper layer, and the etching stopper of the end surface E is the metal plate 1 made of stainless steel or the like. Since the etching selectivity between the metal and the resin is high, the etching can be performed with high accuracy.
Referring to FIG. 2A, in the present embodiment, opening (window) 7 is formed by opening, for example, an opening (window) 7 having a width of 40 μm on terminal 3 having a width of 50 μm. That is, even if the opening 7 is opened without error, the allowable deviation in the width direction is only 5 μm. Such high-accuracy patterning of the insulating cover layer 4 is impossible by conventional development using a base insulating layer as a stopper. This is possible only by etching using a metal as an etching stopper.
 カバー絶縁層4およびベース絶縁層2をエッチングして終端面Eを形成した後、余分に延在する金属板1をエッチングによって除去する。このエッチングにより、金属板1の端面1eをベース絶縁層2,カバー絶縁層4の終端面Eよりも開口部7に近い位置とする。これによって、ヘッドスライダとの半田接続の際に、短絡等の不具合を避けやすくできる。 After the insulating cover layer 4 and the insulating base layer 2 are etched to form the end surface E, the excessively extending metal plate 1 is removed by etching. By this etching, the end surface 1 e of the metal plate 1 is positioned closer to the opening 7 than the end surface E of the base insulating layer 2 and the cover insulating layer 4. As a result, it is possible to easily avoid problems such as short circuits when soldering to the head slider.
 上記の実施の形態では、フレキシブルプリント配線板としてフレキシャのみを例示して説明した。しかし、本発明は、構成要件を備えるものであればフレキシャに限定されず、任意の他のフレキシブルプリント配線板であってもよい。 In the above embodiment, only the flexure is exemplified as the flexible printed wiring board. However, the present invention is not limited to a flexure as long as it has constituent requirements, and may be any other flexible printed wiring board.
 上記において、本発明の実施の形態および実施例について説明を行ったが、上記に開示された本発明の実施の形態および実施例は、あくまで例示であって、本発明の範囲はこれら発明の実施の形態に限定されない。本発明の範囲は、特許請求の範囲の記載によって示され、さらに特許請求の範囲の記載と均等の意味および範囲内でのすべての変更を含むものである。 Although the embodiments and examples of the present invention have been described above, the embodiments and examples of the present invention disclosed above are merely examples, and the scope of the present invention is the implementation of these inventions. It is not limited to the form. The scope of the present invention is indicated by the description of the scope of claims, and further includes meanings equivalent to the description of the scope of claims and all modifications within the scope.
 本発明のフレキシブルプリント配線板等によれば、複数の端子が高密度で配列された接続パッド部において、端子間の絶縁性を確保し、かつ接続パッド部そのものの耐久性を高めることができる。また、感光性ポリイミドやそれに対応する現像液を用いずに、通常の非感光性ポリイミド、エッチング法を用いるので、材料コストを大きく低減できる。かつ製造工程の省略も実現するので、製造コストを低減し、かつ製造期間を短縮することができる。 According to the flexible printed wiring board and the like of the present invention, it is possible to secure insulation between the terminals and enhance the durability of the connection pad part itself in the connection pad part in which a plurality of terminals are arranged with high density. In addition, since a normal non-photosensitive polyimide or etching method is used without using photosensitive polyimide or a corresponding developer, the material cost can be greatly reduced. In addition, since the manufacturing process can be omitted, the manufacturing cost can be reduced and the manufacturing period can be shortened.

Claims (9)

  1.  接続パッド部を備えるフレキシブルプリント配線板であって、
     金属板と、ベース絶縁層と、該ベース絶縁層に接する配線等を形成するための配線パターンと、
     前記配線パターンを覆うカバー絶縁層とを備え、
     前記接続パッド部には、前記ベース絶縁層上において前記配線パターンから延在して終端する端子が、複数、配列され、
     各端子において、前記カバー絶縁層は、該端子の終端部、および該端子の根元側の前記配線パターンを、その周りの前記ベース絶縁層とともに被覆しており、前記カバー絶縁層が該端子に対応する位置で開口する開口部においてのみ、該端子は露出し、該開口部の底面は該端子の上面のみで構成され、
     前記カバー絶縁層の端面と前記ベース絶縁層の端面とは揃っており、前記接続パッド部の端面を形成していることを特徴とする、フレキシブルプリント配線板。
    A flexible printed wiring board having a connection pad portion,
    A metal plate, a base insulating layer, and a wiring pattern for forming a wiring in contact with the base insulating layer;
    A cover insulating layer covering the wiring pattern;
    In the connection pad portion, a plurality of terminals extending from the wiring pattern and terminating on the insulating base layer are arranged,
    In each terminal, the insulating cover layer covers the terminal portion of the terminal and the wiring pattern on the base side of the terminal together with the insulating base layer around the terminal, and the insulating cover layer corresponds to the terminal. The terminal is exposed only at the opening that opens at a position where the bottom surface of the opening is composed only of the upper surface of the terminal,
    An end face of the insulating cover layer and an end face of the insulating base layer are aligned to form an end face of the connection pad portion.
  2.  前記接続パッド部の端において、前記金属板の端は、該接続パッド部の端面から離れて位置し、前記ベース絶縁層の裏面を、該接続パッド部の裏面の端で露出させていることを特徴とする、請求項1に記載のフレキシブルプリント配線板。 At the end of the connection pad portion, the end of the metal plate is located away from the end surface of the connection pad portion, and the back surface of the base insulating layer is exposed at the end of the back surface of the connection pad portion. The flexible printed wiring board according to claim 1, wherein the flexible printed wiring board is characterized.
  3.  前記開口部は、配列のピッチが150μm以下、該開口部の前記配列ピッチ方向に直交する方向の長さが75μm以下であることを特徴とする、請求項1または2に記載のフレキシブルプリント配線板。 3. The flexible printed wiring board according to claim 1, wherein the openings have an arrangement pitch of 150 μm or less and a length of the openings in a direction orthogonal to the arrangement pitch direction is 75 μm or less. 4. .
  4.  前記カバー絶縁層を形成する樹脂層の主成分が、非感光性樹脂であることを特徴とする、請求項1~3のいずれか1項に記載のフレキシブルプリント配線板。 The flexible printed wiring board according to any one of claims 1 to 3, wherein a main component of the resin layer forming the cover insulating layer is a non-photosensitive resin.
  5.  前記カバー絶縁層が、非感光性樹脂液として非感光性ポリイミド前駆体インクを含み、酸成分として、ピロメリット酸二無水物(PMDA)を主成分に、3,3’,4,4’-ビフェニルテトラカルボン酸無水物(BPDA)を含み、またジアミン成分として、p-フェニレンジアミン(PDA)、2,2’-ジメチル-4,4’-ジアミノビフェニル(mTBHG)、および2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル(TFMB)を含むことを特徴とする、請求項4に記載のフレキシブルプリント配線板。 The cover insulating layer contains a non-photosensitive polyimide precursor ink as a non-photosensitive resin liquid, and has 3,3 ′, 4,4′- as a main component of pyromellitic dianhydride (PMDA) as an acid component. Biphenyltetracarboxylic anhydride (BPDA) is included, and p-phenylenediamine (PDA), 2,2′-dimethyl-4,4′-diaminobiphenyl (mTBHG), and 2,2′-bis are used as the diamine component. The flexible printed wiring board according to claim 4, comprising (trifluoromethyl) -4,4′-diaminobiphenyl (TFMB).
  6.  前記非感光性ポリイミド前駆体インクに、1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン(APDS)を含むことを特徴とする、請求項5に記載のフレキシブルプリント配線板。 6. The flexible printed wiring board according to claim 5, wherein the non-photosensitive polyimide precursor ink contains 1,3-bis (3-aminopropyl) tetramethyldisiloxane (APDS).
  7.  請求項1~6のいずれか1項に記載のフレキシブルプリント配線板であって、前記接続パッド部においてハードディスクドライブ(HDD)の磁気ヘッドに接続されることを特徴とする、フレキシャ。 7. The flexible printed wiring board according to claim 1, wherein the flexure is connected to a magnetic head of a hard disk drive (HDD) at the connection pad portion.
  8.  請求項1~6のいずれか1項に記載のフレキシブルプリント配線板を備えることを特徴とする、電子機器。 An electronic apparatus comprising the flexible printed wiring board according to any one of claims 1 to 6.
  9.  接続パッド部を備えるフレキシブルプリント配線板の製造方法であって、
     金属板上にベース絶縁層を備える基材シートを準備する工程と、
     前記ベース絶縁層に接して、端子を含む配線パターンを形成する工程と、
     前記端子を含む配線パターンを覆うカバー絶縁層を形成するために、非感光性樹脂液を前記ベース絶縁層に重ねるように塗工する工程と、
     前記塗工された非感光樹脂液を、乾燥し、次いで熱硬化する工程と、
     前記ベース絶縁層および熱硬化したカバー絶縁層を、エッチングする工程とを備え、
     前記エッチング工程では、前記端子がエッチングストッパとなるようにカバー絶縁層に開口部をあけ、該端子が該開口部の底面を形成し、かつ、該カバー絶縁層の端面および前記ベース絶縁層の端面が揃って、前記接続パッド部の端面を形成するように、前記金属板がエッチングストッパとなるように該カバー絶縁層およびベース絶縁層をエッチングすることを特徴とする、フレキシブルプリント配線板の製造方法。
    A method for producing a flexible printed wiring board comprising a connection pad portion,
    Preparing a base sheet comprising a base insulating layer on a metal plate;
    Forming a wiring pattern including terminals in contact with the base insulating layer;
    Applying a non-photosensitive resin liquid so as to overlap the base insulating layer in order to form a cover insulating layer covering the wiring pattern including the terminals;
    Drying the coated non-photosensitive resin liquid, and then thermosetting;
    Etching the base insulating layer and the heat-cured cover insulating layer,
    In the etching step, an opening is formed in the insulating cover layer so that the terminal serves as an etching stopper, the terminal forms a bottom surface of the opening, and an end face of the insulating cover layer and an end face of the base insulating layer And the insulating cover layer and the insulating base layer are etched so that the metal plate serves as an etching stopper so as to form an end face of the connection pad portion. .
PCT/JP2012/064865 2011-07-08 2012-06-11 Flexible printed circuit, method for manufacturing same, flexure and electronic device WO2013008567A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195032A (en) * 1998-12-28 2000-07-14 Sony Chem Corp Method of manufacturing suspension for magnetic head
JP2008172012A (en) * 2007-01-11 2008-07-24 Nitto Denko Corp Suspension substrate with circuit
JP2009088209A (en) * 2007-09-28 2009-04-23 Dainippon Printing Co Ltd Electronic circuit component and suspension for hard disk drive
JP2011129175A (en) * 2009-12-15 2011-06-30 Dainippon Printing Co Ltd Substrate for suspension, suspension, suspension with head, hard disk drive, and method for manufacturing substrate for suspension

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195032A (en) * 1998-12-28 2000-07-14 Sony Chem Corp Method of manufacturing suspension for magnetic head
JP2008172012A (en) * 2007-01-11 2008-07-24 Nitto Denko Corp Suspension substrate with circuit
JP2009088209A (en) * 2007-09-28 2009-04-23 Dainippon Printing Co Ltd Electronic circuit component and suspension for hard disk drive
JP2011129175A (en) * 2009-12-15 2011-06-30 Dainippon Printing Co Ltd Substrate for suspension, suspension, suspension with head, hard disk drive, and method for manufacturing substrate for suspension

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