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WO2009038114A1 - 光導波路の製造方法及び該製造方法により得られた光導波路 - Google Patents

光導波路の製造方法及び該製造方法により得られた光導波路 Download PDF

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Publication number
WO2009038114A1
WO2009038114A1 PCT/JP2008/066824 JP2008066824W WO2009038114A1 WO 2009038114 A1 WO2009038114 A1 WO 2009038114A1 JP 2008066824 W JP2008066824 W JP 2008066824W WO 2009038114 A1 WO2009038114 A1 WO 2009038114A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical waveguide
photosensitive resin
manufacturing
disclosed
manufactured
Prior art date
Application number
PCT/JP2008/066824
Other languages
English (en)
French (fr)
Inventor
Tatsuya Makino
Masatoshi Yamaguchi
Atsushi Takahashi
Original Assignee
Hitachi Chemical Company, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008060094A external-priority patent/JP5433959B2/ja
Priority claimed from JP2008060095A external-priority patent/JP2009093140A/ja
Application filed by Hitachi Chemical Company, Ltd. filed Critical Hitachi Chemical Company, Ltd.
Priority to EP08832369A priority Critical patent/EP2189826A4/en
Priority to US12/678,547 priority patent/US8938135B2/en
Priority to CN200880107301.7A priority patent/CN101802667B/zh
Priority to KR1020107004011A priority patent/KR101533470B1/ko
Publication of WO2009038114A1 publication Critical patent/WO2009038114A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Materials For Photolithography (AREA)

Abstract

　基材上に感光性樹脂組成物からなる感光性樹脂層を形成する工程、所望のパターンを露光する工程及び２価以上の金属イオンを含むアルカリ性現像液を用いて現像する工程を有する光導波路の製造方法、及び基材上に感光性樹脂組成物からなる感光性樹脂層を形成する工程、所望のパターンを露光する工程、アルカリ性現像液を用いて現像する工程及び２価以上の金属イオンを含む洗浄液又は酸性水溶液を用いて洗浄する工程を有する光導波路の製造方法である。 　透明性と信頼性に優れた光導波路の製造方法及び該製造方法により製造された光導波路を提供することができる。
PCT/JP2008/066824 2007-09-19 2008-09-18 光導波路の製造方法及び該製造方法により得られた光導波路 WO2009038114A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP08832369A EP2189826A4 (en) 2007-09-19 2008-09-18 METHOD FOR MANUFACTURING A LIGHT WAVEGUIDE AND LIGHT WAVE LADDER MADE IN THIS METHOD
US12/678,547 US8938135B2 (en) 2007-09-19 2008-09-18 Method for manufacturing optical waveguide and optical waveguide manufactured by the method
CN200880107301.7A CN101802667B (zh) 2007-09-19 2008-09-18 光波导的制造方法以及由该制造方法所得到的光波导
KR1020107004011A KR101533470B1 (ko) 2007-09-19 2008-09-18 광도파로의 제조방법 및 그 제조방법에 의해 얻어진 광도파로

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2007-242218 2007-09-19
JP2007242218 2007-09-19
JP2007-242219 2007-09-19
JP2007242219 2007-09-19
JP2008060094A JP5433959B2 (ja) 2007-09-19 2008-03-10 光導波路の製造方法及び該製造方法により得られた光導波路
JP2008060095A JP2009093140A (ja) 2007-09-19 2008-03-10 光導波路の製造方法及び該製造方法により得られた光導波路
JP2008-060094 2008-03-10
JP2008-060095 2008-03-10

Publications (1)

Publication Number Publication Date
WO2009038114A1 true WO2009038114A1 (ja) 2009-03-26

Family

ID=42111888

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066824 WO2009038114A1 (ja) 2007-09-19 2008-09-18 光導波路の製造方法及び該製造方法により得られた光導波路

Country Status (6)

Country Link
US (1) US8938135B2 (ja)
EP (1) EP2189826A4 (ja)
KR (1) KR101533470B1 (ja)
CN (1) CN101802667B (ja)
TW (2) TW200921166A (ja)
WO (1) WO2009038114A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014191052A (ja) * 2013-03-26 2014-10-06 Hitachi Chemical Co Ltd 光導波路の製造方法及び光導波路

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6566417B2 (ja) * 2015-06-18 2019-08-28 日東電工株式会社 光導波路形成用感光性エポキシ樹脂組成物および光導波路形成用感光性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
KR102786767B1 (ko) * 2019-03-29 2025-03-27 도레이 카부시키가이샤 도전 패턴의 제조 방법

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6381301A (ja) 1986-09-26 1988-04-12 Asahi Chem Ind Co Ltd 光学用感光性樹脂組成物
JPH06258537A (ja) 1993-03-08 1994-09-16 Mitsubishi Rayon Co Ltd ドライフィルムレジストおよびそれを用いたプリント配線板
JPH0736196A (ja) * 1993-07-23 1995-02-07 Mitsubishi Electric Corp パターン形成方法
JPH09311458A (ja) * 1996-05-24 1997-12-02 Kansai Paint Co Ltd レジストパターンの形成方法及びプリント基板の製造方法
JP2002162739A (ja) * 2000-11-27 2002-06-07 Hitachi Chem Co Ltd 永久マスクレジスト、永久マスクレジストの製造法及び永久マスクレジスト積層基板
JP2003195079A (ja) 2001-12-26 2003-07-09 Jsr Corp 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
WO2005006825A1 (ja) * 2003-07-10 2005-01-20 Nippon Mektron, Ltd. 回路基板及びその製造方法
JP2006030919A (ja) * 2004-07-22 2006-02-02 Kansai Paint Co Ltd 光導波路の作成方法
JP2006039154A (ja) * 2004-07-26 2006-02-09 Jsr Corp 感光性樹脂組成物、光導波路およびその製造方法
JP2007071966A (ja) * 2005-09-05 2007-03-22 Hitachi Chem Co Ltd 永久レジストの製造方法及びプリント配線板の製造方法

Family Cites Families (10)

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US6690868B2 (en) * 2001-05-30 2004-02-10 3M Innovative Properties Company Optical waveguide article including a fluorine-containing zone
US7410746B2 (en) * 2002-03-29 2008-08-12 Dai Nippon Printing Co., Ltd. Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
US8076782B2 (en) * 2002-04-01 2011-12-13 Ibiden Co., Ltd. Substrate for mounting IC chip
US6905904B2 (en) * 2002-06-24 2005-06-14 Dow Corning Corporation Planar optical waveguide assembly and method of preparing same
DE602004018304D1 (de) * 2003-05-02 2009-01-22 Toray Industries Polyesterharzzusammensetzung
KR100610230B1 (ko) * 2003-12-31 2006-08-08 주식회사 루밴틱스 Ｕｖ 몰딩방법을 이용한 고분자 광도파로의 제조방법
EP2368939A1 (en) * 2004-10-07 2011-09-28 Hitachi Chemical Co., Ltd. Resin composition for optical material, and resin film for optical material
JP4855667B2 (ja) * 2004-10-15 2012-01-18 ハリマ化成株式会社 樹脂マスク層の除去方法およびはんだバンプ付き基板の製造方法
US20060226583A1 (en) * 2005-04-04 2006-10-12 Marushin Patrick H Light directing film
KR101016871B1 (ko) * 2006-03-06 2011-02-22 히다치 가세고교 가부시끼가이샤 플렉서블 광도파로 및 그의 제조방법, 및 광모듈

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6381301A (ja) 1986-09-26 1988-04-12 Asahi Chem Ind Co Ltd 光学用感光性樹脂組成物
JPH06258537A (ja) 1993-03-08 1994-09-16 Mitsubishi Rayon Co Ltd ドライフィルムレジストおよびそれを用いたプリント配線板
JPH0736196A (ja) * 1993-07-23 1995-02-07 Mitsubishi Electric Corp パターン形成方法
JPH09311458A (ja) * 1996-05-24 1997-12-02 Kansai Paint Co Ltd レジストパターンの形成方法及びプリント基板の製造方法
JP2002162739A (ja) * 2000-11-27 2002-06-07 Hitachi Chem Co Ltd 永久マスクレジスト、永久マスクレジストの製造法及び永久マスクレジスト積層基板
JP2003195079A (ja) 2001-12-26 2003-07-09 Jsr Corp 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
WO2005006825A1 (ja) * 2003-07-10 2005-01-20 Nippon Mektron, Ltd. 回路基板及びその製造方法
JP2006030919A (ja) * 2004-07-22 2006-02-02 Kansai Paint Co Ltd 光導波路の作成方法
JP2006039154A (ja) * 2004-07-26 2006-02-09 Jsr Corp 感光性樹脂組成物、光導波路およびその製造方法
JP2007071966A (ja) * 2005-09-05 2007-03-22 Hitachi Chem Co Ltd 永久レジストの製造方法及びプリント配線板の製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2189826A4

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014191052A (ja) * 2013-03-26 2014-10-06 Hitachi Chemical Co Ltd 光導波路の製造方法及び光導波路

Also Published As

Publication number Publication date
EP2189826A4 (en) 2011-05-25
EP2189826A1 (en) 2010-05-26
US8938135B2 (en) 2015-01-20
US20100209042A1 (en) 2010-08-19
CN101802667A (zh) 2010-08-11
TWI502233B (zh) 2015-10-01
TW201426051A (zh) 2014-07-01
KR20100068372A (ko) 2010-06-23
TW200921166A (en) 2009-05-16
KR101533470B1 (ko) 2015-07-02
CN101802667B (zh) 2014-02-19

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