+

WO2009082999A3 - Puce laser à semi-conducteur à émission par la tranche comprenant une bande de contact structurée - Google Patents

Puce laser à semi-conducteur à émission par la tranche comprenant une bande de contact structurée Download PDF

Info

Publication number
WO2009082999A3
WO2009082999A3 PCT/DE2008/002131 DE2008002131W WO2009082999A3 WO 2009082999 A3 WO2009082999 A3 WO 2009082999A3 DE 2008002131 W DE2008002131 W DE 2008002131W WO 2009082999 A3 WO2009082999 A3 WO 2009082999A3
Authority
WO
WIPO (PCT)
Prior art keywords
semiconductor laser
laser chip
edge
contact strip
emitting semiconductor
Prior art date
Application number
PCT/DE2008/002131
Other languages
German (de)
English (en)
Other versions
WO2009082999A2 (fr
Inventor
Harald Koenig
Christian Lauer
Peter Brick
Wolfgang Schmid
Robin Fehse
Uwe Strauss
Original Assignee
Osram Opto Semiconductors Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Opto Semiconductors Gmbh filed Critical Osram Opto Semiconductors Gmbh
Publication of WO2009082999A2 publication Critical patent/WO2009082999A2/fr
Publication of WO2009082999A3 publication Critical patent/WO2009082999A3/fr

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0425Electrodes, e.g. characterised by the structure
    • H01S5/04254Electrodes, e.g. characterised by the structure characterised by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/20Lasers with a special output beam profile or cross-section, e.g. non-Gaussian
    • H01S2301/206Top hat profile
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0421Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • H01S5/162Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions made by diffusion or disordening of the active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2036Broad area lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/305Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3095Tunnel junction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4031Edge-emitting structures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

L'invention concerne une puce laser à semi-conducteur à émission par la tranche comprenant une zone active (14) dans laquelle un rayonnement électromagnétique est généré pendant le fonctionnement de la puce laser à semi-conducteur (1), ainsi qu'au moins une bande de contact structurée (2) qui est structurée de sorte qu'une injection de porteurs de charge dans la zone active (14) diminue en allant vers le côté de la puce laser à semi-conducteur (1) où se trouve une facette de sortie (3) de la puce laser à semi-conducteur (1).
PCT/DE2008/002131 2007-12-27 2008-12-18 Puce laser à semi-conducteur à émission par la tranche comprenant une bande de contact structurée WO2009082999A2 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102007062788.4 2007-12-27
DE102007062788 2007-12-27
DE102008014092.9 2008-03-13
DE102008014092A DE102008014092A1 (de) 2007-12-27 2008-03-13 Kantenemittierender Halbleiterlaserchip mit einem strukturierten Kontaktstreifen

Publications (2)

Publication Number Publication Date
WO2009082999A2 WO2009082999A2 (fr) 2009-07-09
WO2009082999A3 true WO2009082999A3 (fr) 2009-12-03

Family

ID=40690875

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2008/002131 WO2009082999A2 (fr) 2007-12-27 2008-12-18 Puce laser à semi-conducteur à émission par la tranche comprenant une bande de contact structurée

Country Status (2)

Country Link
DE (1) DE102008014092A1 (fr)
WO (1) WO2009082999A2 (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008058436B4 (de) 2008-11-21 2019-03-07 Osram Opto Semiconductors Gmbh Kantenemittierender Halbleiterlaserchip
DE102010020625B4 (de) * 2010-05-14 2024-02-22 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung eines kantenemittierenden Halbleiterlasers
DE102011055891B9 (de) * 2011-11-30 2017-09-14 Osram Opto Semiconductors Gmbh Halbleiterlaserdiode
DE102012111512B4 (de) 2012-11-28 2021-11-04 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterstreifenlaser
DE102015203113B4 (de) * 2015-02-20 2023-12-28 Ferdinand-Braun-Institut gGmbH, Leibniz- Institut für Höchstfrequenztechnik Laserdiode mit verbesserten elektrischen Leiteigenschaften
DE102015116336B4 (de) * 2015-09-28 2020-03-19 Osram Opto Semiconductors Gmbh Halbleiterlaser
DE102015119146A1 (de) * 2015-11-06 2017-05-11 Osram Opto Semiconductors Gmbh Halbleiterlaser und Verfahren zum Herstellen eines Halbleiterlasers sowie Wafer
DE102016106949B4 (de) * 2016-04-14 2020-07-02 Osram Opto Semiconductors Gmbh Kantenemittierender Halbleiterlaser
DE102016125430A1 (de) * 2016-12-22 2018-06-28 Osram Opto Semiconductors Gmbh Oberflächenmontierbarer Halbleiterlaser, Anordnung mit einem solchen Halbleiterlaser und Betriebsverfahren hierfür
DE102016125857B4 (de) * 2016-12-29 2022-05-05 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterlaserdiode
DE102017103789B4 (de) 2017-02-23 2024-02-22 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Laserdiode
EP3776762B1 (fr) * 2018-03-26 2024-09-04 Lawrence Livermore National Security, LLC Laser à diode à profil de densité de courant manipulé
US20220077657A1 (en) * 2018-12-31 2022-03-10 Nlight, Inc. Method, system and apparatus for differential current injection
DE102023102047B4 (de) * 2023-01-27 2024-12-12 Ferdinand-Braun-Institut gGmbH, Leibniz- Institut für Höchstfrequenztechnik Halbleiterlaserbarren mit verbesserter Strahlqualität

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4441187A (en) * 1980-07-31 1984-04-03 Bouley Jean Claude A semiconductor laser light source
US4831630A (en) * 1983-04-14 1989-05-16 Xerox Corporation Phased-locked window lasers
JPH09321379A (ja) * 1996-05-29 1997-12-12 Shimadzu Corp 半導体レーザ
US5794839A (en) * 1994-08-01 1998-08-18 Nippondenso Co., Ltd. Bonding material and bonding method for electric element
JPH1168225A (ja) * 1997-08-18 1999-03-09 Fuji Xerox Co Ltd 面発光型半導体レーザ
JP2003031894A (ja) * 2001-07-19 2003-01-31 Sony Corp 半導体レーザおよびその製造方法
WO2007000614A1 (fr) * 2005-06-28 2007-01-04 Bookham Technology Plc Dispositif optoélectronique à semi-conducteurs et puissance élevée
US20070165685A1 (en) * 2003-12-22 2007-07-19 Kiminori Mizuuchi Semiconductor laser device and laser projector
EP1903646A2 (fr) * 2006-09-20 2008-03-26 JDS Uniphase Corporation Diode laser à semiconducteur comprenant une structure de fenêtre avancée
US20090067464A1 (en) * 2007-09-05 2009-03-12 Kabushiki Kaisha Toshiba Semiconductor laser device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4791646A (en) * 1985-07-31 1988-12-13 California Institute Of Technology Method for tailoring the two-dimensional spatial gain distribution in optoelectronic devices and its application to tailored gain broad area semiconductor lasers capable of high power operation with very narrow single lobed farfield patterns
JPS6396988A (ja) * 1986-10-14 1988-04-27 Sony Corp 半導体レ−ザ
US5228049A (en) * 1991-08-27 1993-07-13 Xerox Corporation Beam control in integrated diode laser and power amplifier
AU4286499A (en) * 1998-06-18 2000-01-05 University College Cork A semi-conductor device and a method for varying current density in an active region of a junction of the semi-conductor device
DE10061701A1 (de) * 2000-12-12 2002-06-27 Osram Opto Semiconductors Gmbh Halbleiterlaser mit lateraler Stromführung und Verfahren zu dessen Herstellung
DE10208463B4 (de) 2002-02-27 2012-04-05 Osram Opto Semiconductors Gmbh Halbleiterlaservorrichtung und Verfahren zu deren Herstellung
DE102004036963A1 (de) * 2004-05-28 2005-12-22 Osram Opto Semiconductors Gmbh Optisch gepumpte oberflächenemittierende Halbleiterlaser-Vorrichtung

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4441187A (en) * 1980-07-31 1984-04-03 Bouley Jean Claude A semiconductor laser light source
US4831630A (en) * 1983-04-14 1989-05-16 Xerox Corporation Phased-locked window lasers
US5794839A (en) * 1994-08-01 1998-08-18 Nippondenso Co., Ltd. Bonding material and bonding method for electric element
JPH09321379A (ja) * 1996-05-29 1997-12-12 Shimadzu Corp 半導体レーザ
JPH1168225A (ja) * 1997-08-18 1999-03-09 Fuji Xerox Co Ltd 面発光型半導体レーザ
JP2003031894A (ja) * 2001-07-19 2003-01-31 Sony Corp 半導体レーザおよびその製造方法
US20070165685A1 (en) * 2003-12-22 2007-07-19 Kiminori Mizuuchi Semiconductor laser device and laser projector
WO2007000614A1 (fr) * 2005-06-28 2007-01-04 Bookham Technology Plc Dispositif optoélectronique à semi-conducteurs et puissance élevée
EP1903646A2 (fr) * 2006-09-20 2008-03-26 JDS Uniphase Corporation Diode laser à semiconducteur comprenant une structure de fenêtre avancée
US20090067464A1 (en) * 2007-09-05 2009-03-12 Kabushiki Kaisha Toshiba Semiconductor laser device

Also Published As

Publication number Publication date
WO2009082999A2 (fr) 2009-07-09
DE102008014092A1 (de) 2009-07-02

Similar Documents

Publication Publication Date Title
WO2009082999A3 (fr) Puce laser à semi-conducteur à émission par la tranche comprenant une bande de contact structurée
WO2006012842A3 (fr) Element optoelectronique emettant un rayonnement electromagnetique et module lumineux
WO2010057455A3 (fr) Puce à semi-conducteurs à émission par la tranche
WO2009006870A3 (fr) Corps semi-conducteur émetteur de rayonnement
WO2007025122A3 (fr) Diode électroluminescente à microcavité semi-conductrice
TW200638645A (en) Semiconductor laser device
WO2009080011A3 (fr) Source de lumière laser
TW200603132A (en) Optical pickup device, semiconductor laser device and housing usable for the optical pickup device, and method of manufacturing semiconductor laser device
WO2008106915A3 (fr) Système comprenant une puce semi-conductrice et une couche de guidage de la lumière
TW200605394A (en) Nitride semiconductor light emitting device
EP1453158A4 (fr) Laser a semi-conducteurs a base de nitrure et procede de production de ce laser
WO2003075425A1 (fr) Element laser a semi-conducteur a base de nitrure
TW200614547A (en) Package for semiconductor light emitting element and semiconductor light emitting device
WO2007098730A3 (fr) Dispositif laser a semi-conducteurs
ATE294457T1 (de) Oberflächenemittierender halbleiterlaser
ATE500568T1 (de) Vorrichtung umfassend ein substrat mit einem elektrischen kontakt und transponder
WO2005071762A3 (fr) Diode superluminescente non laser
WO2001063709A3 (fr) Composant semi-conducteur permettant l"emission de rayonnement electromagnetique et son procede de production
WO2006102686A3 (fr) Lasers a diode haute puissance
TW200644281A (en) Light-emitting device
WO2009083001A3 (fr) Corps émetteur de rayonnement et procédé pour produire un corps émetteur de rayonnement
WO2010030591A3 (fr) Oled avec talus de diffusion de lumière
TW200514273A (en) High-efficiency nitride series light-emitting device
KR101795660B1 (ko) 엘이디칩용 렌즈의 직진 공급장치
WO2009011184A1 (fr) Laser semi-conducteur et son procédé de fabrication

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08866605

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 08866605

Country of ref document: EP

Kind code of ref document: A2

点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载