+

WO2009066599A1 - Procédé de mesure d'aberration et son dispositif - Google Patents

Procédé de mesure d'aberration et son dispositif Download PDF

Info

Publication number
WO2009066599A1
WO2009066599A1 PCT/JP2008/070626 JP2008070626W WO2009066599A1 WO 2009066599 A1 WO2009066599 A1 WO 2009066599A1 JP 2008070626 W JP2008070626 W JP 2008070626W WO 2009066599 A1 WO2009066599 A1 WO 2009066599A1
Authority
WO
WIPO (PCT)
Prior art keywords
aberration
spot image
observation signal
light
optical
Prior art date
Application number
PCT/JP2008/070626
Other languages
English (en)
Japanese (ja)
Inventor
Kenji Amaya
Original Assignee
Tokyo Institute Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Institute Of Technology filed Critical Tokyo Institute Of Technology
Priority to JP2009542529A priority Critical patent/JPWO2009066599A1/ja
Publication of WO2009066599A1 publication Critical patent/WO2009066599A1/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested

Definitions

  • the present invention relates to an aberration measuring method for measuring an aberration of the optical system from a spot image detected by a photo detector, such as a photo detector or a CCD, in an optical pickup of an optical disk such as a CD or DVD and an imaging optical system. And the device.
  • a photo detector such as a photo detector or a CCD
  • an electrical evaluation method the electric signal obtained by reproducing the reference disk is measured and analyzed, and the error rate of the electric signal and the amount of jitter are mainly evaluated.
  • the cause of the error is in the electric circuit, in the irradiation optical system, in the recording medium, or in the reproduction optical system.
  • optical evaluation methods include a method of measuring the intensity distribution of spot images and a wavefront aberration measurement method using an interferometer. These methods have a more detailed It has the advantage that it can be priced and if there is a problem it is easy to identify the cause. However, measurement can not be performed in a short time, the measuring device is expensive, and there are problems with being vulnerable to external disturbances.
  • Patent Document 1 discloses a method of measuring the phase distribution of light by a simple method without using an expensive measuring device, but measures the aberration of the laser light detected at the position of the photodiode. There is no disclosure of a specific method to Therefore, there was a problem in measuring the aberration of the return light at the position of the photo detector practically.
  • the present invention has been made under the circumstances as described above, and it is an object of the present invention to analyze the aberration of the spot image of the laser beam received by the photodiode and evaluate the spot image of the laser beam at low cost.
  • Method and apparatus for aberration measurement that can be performed with various devices, and the measurement time can be shortened. Disclosure of the invention
  • the present invention relates to an apparatus for measuring an aberration of a spot image of light received by the light detection element, and the above object of the present invention is to project the spot image formed by the optical system to be measured onto the light detection element.
  • Means first moving means for relatively moving the spot image on the light detection element in a direction perpendicular to the optical axis, and A second moving means for moving the position of the spot image projected onto the light detection element relative to the light detection element in the optical axis direction; and an aberration based on an output signal from the light detection element. This is achieved by providing an aberration analysis means to analyze.
  • the second moving means controls the spot image and the position of the light detection element to at least two positions, and the first moving means generates an observation signal of the light intensity distribution formed by the spot image.
  • the aberration analysis means analyzes the aberration of the optical system for forming the spot image based on the observation signal and the model observation signal, or the second movement means performs the spot image and When the position of the light detection element is controlled to at least two positions, the light detection element is disposed before and after the imaging point of the spot image, or the aberration analysis means And determining an observation signal and a model observation signal of the spot image based on the output signal, and analyzing the aberration of the spot image based on the observation signal and the model observation signal.
  • the present invention relates to an aberration measuring method, and the above object of the present invention is to project a spot image formed by an optical system to be measured on a light detecting element, and to position the spot image on the light detecting element. And scan in the vertical direction to obtain the observation signal and the model observation signal, and then the spot image is relatively moved to another position in the optical axis direction to obtain the observation signal and the model observation signal. The above is achieved by analyzing the aberration of the spot image based on the observation signal and the model observation signal.
  • the model observation signal By calculating the model observation signal based on the intensity distribution of the spot image and the sensitivity distribution of the light receiving window of the light detection element, or the complex amplitude of the spot image of the laser light is expanded by a finite series.
  • the intensity distribution of the spot image is given by the square of the absolute value of the complex amplitude, the observation signal and the model observation signal are discretized, and the discretized observation signal and the discretized model observation signal are discretized.
  • FIG. 1 is a block diagram showing a first embodiment of an aberration measuring apparatus according to the present invention.
  • FIG. 2 is a flowchart showing an operation example of aberration analysis of a spot image in an aberration analysis unit.
  • FIG. 3 is a schematic view of a spot image in a focused image and a defocused image of each coefficient.
  • FIG. 4 is a block diagram showing a second embodiment of the aberration measuring apparatus according to the present invention.
  • FIG. 5 is a block diagram showing a third embodiment of the aberration measuring apparatus according to the present invention.
  • FIG. 6 is a block diagram showing a fourth embodiment in which an XY stage is attached to a photo detector.
  • FIG. 7 is a block diagram showing a fifth embodiment of the aberration measuring apparatus according to the present invention.
  • FIG. 8 is a block diagram showing a sixth embodiment of the aberration measuring apparatus according to the present invention.
  • FIG. 9 is a configuration diagram for explaining an optical system aberration of the optical pickup before the objective lens module is attached.
  • FIG. 10 is a configuration diagram for explaining an optical system aberration of the optical pickup before the objective lens module is attached.
  • FIG. 11 is a configuration diagram showing a configuration example of focus scanning means for measuring the optical system aberration of the optical pickup before the objective lens module is attached.
  • FIG. 12 is a configuration diagram showing a configuration example of a focus scanning means for measuring an optical system aberration of the optical pickup before the objective lens module is attached.
  • FIG. 13 is a diagram for explaining optical system adjustment of a small camera.
  • FIG. 14 is a block diagram showing an example of a configuration in which the present invention is applied to the adjustment of the optical system of a small camera.
  • FIG. 15 is a characteristic diagram of the numbers and coefficients of the force coefficients calculated by changing the position of the initial point by the F G S method.
  • FIG. 16 is a characteristic diagram showing an ideal window function.
  • FIG. 17 is a characteristic diagram for explaining the sensitivity distribution of the light receiving window.
  • FIG. 18 is a characteristic diagram for explaining the sensitivity distribution of the light receiving window.
  • FIG. 19 is a characteristic diagram for explaining the sensitivity distribution of the light receiving window.
  • FIG. 20 is a characteristic diagram for explaining the sensitivity distribution of the light receiving window.
  • FIG. 25 is a diagram showing the values of the Zernike coefficients obtained by numerical simulation and the exact values of the Zernike coefficients.
  • Figures 26 ( ⁇ ) and ( ⁇ ) show the intensity distribution calculated by performing an inverse analysis from the correct solution of the intensity distribution of the observed signal of the photo detector and the results obtained by numerical simulation.
  • light for example, a laser
  • a light detection element such as an optical pickup, a photo detector of an imaging optical system, a CCD, or a CMOS device
  • a spot image is generated on the light detection element, and the spot image is scanned relatively (XY (horizontal) direction: perpendicular to the optical axis) on the light detection element.
  • the spot image of the light detection element is generated by adjustment in the Z (vertical) direction (optical axis direction), and the output signal of the light detection element is input to the aberration analysis unit.
  • the aberration analysis unit measures the aberration of the optical system from the spot image and evaluates the light spot image based on the observation signal of the spot image and the model observation signal.
  • the observation signal is acquired by relatively XY scanning the spot image of light on the light detection element, and this observation signal is acquired at at least two different focal positions, that is, at two focal positions adjusted in the Z direction. Do.
  • the model observed signal is by assuming the aberration It is calculated by convolution of the calculated intensity distribution of the spot image and a function that models the sensitivity distribution of the light receiving window of the light detection element.
  • aberration analysis of an optical system that forms a spot image based on an observation signal acquired from an output signal of a light detection element that receives a spot image of light and a model observation signal is described. Is going.
  • the model observation signal can be calculated based on the intensity distribution of the spot image and the sensitivity distribution of the light receiving window of the light detection element. Therefore, it is necessary to measure and evaluate the aberration of the optical system that forms the spot image using an inexpensive device. Can reduce the measurement time and evaluation time.
  • FIG. 1 is a block diagram showing a first embodiment of an aberration measuring apparatus according to the present invention, and shows an optical pickup 1 for performing time recording and reproduction on an optical disk such as a CD or DVD, and a spot image.
  • X-Z moving unit 10 for scanning and adjusting focal position
  • aberration analysis unit 9 for performing aberration analysis and evaluation of spot image of laser light, and CD or DVD was mounted.
  • a transparent correction plate 6 having optical characteristics corresponding to the CD or DVD is inserted at the CD or DVD mounting position of the optical pickup 1.
  • the optical pickup 1 comprises a laser diode 2 for irradiating a laser beam 8, a half mirror 3 for reflecting and transmitting the irradiated laser beam 8 A, an optical system 4 for condensing the laser beam 8 B, and a laser beam 8.
  • a photo detector 5 is provided which receives the spot image of D, converts it into an electric signal, and outputs an output signal ES.
  • the output signal E S from the photo detector 5 is input to the aberration analysis unit 9.
  • the XYZ moving unit 10 is a lens 1 1 that receives the laser beam 8 B transmitted through the optical system 4 of the optical pickup 1 and transmitted through the correction plate 6 to be collimated light; To move the flat mirror 12 reflecting the laser beam 8 C in the direction of entry, and the lens 11 or the mirror 12 in the X axis direction, the Y axis direction, and the Z axis direction, respectively. It consists of an XYZ stage 13 and a control unit 14 that controls the XYZ stage 13.
  • the X axis, the Y axis, and the Z axis are coordinate axes of the orthogonal coordinate system, and an XY plane is taken parallel to the light receiving window where the photo detector 5 receives the laser light 8D.
  • the correction plate 6 to be inserted into the CD or D V D mounting position of the optical pickup 1 will be described.
  • the substrates of D V D and C D use polycarbonate resin having a refractive index of about 1.55. Then, the laser light is condensed to one point through this substrate and the recording bit is read out. Therefore, the objective lens to be used is designed to have spherical aberration in advance so that it can be focused to one point through the substrate of a predetermined thickness in consideration of the thickness and refractive index of the disk substrate.
  • the correction plate 6 is inserted for the purpose of correcting this spherical aberration. That is, by inserting a transparent plate having the same optical thickness as that of the substrate in order to simulate the substrate at the time of measurement, it is possible to simulate the state in which the optical pickup 1 reads out the focal point inside the disc of the normal DVD.
  • the laser beam 8 A emitted from the laser diode 2 of the optical pickup 1 is reflected by the mirror 1, becomes a laser beam 8 B and passes through the optical system 4.
  • the laser light 8 B transmitted through the optical system 4 is transmitted through the correction plate 6, passes through the lens 1 1, is reflected by the mirror 12, and the reflected laser light 8 C is output from the XYZ moving unit 10.
  • the laser light 8 C travels in the direction opposite to that of the incident laser light 8 B, passes through the correction plate 6 and the optical system 4, and further passes through the half mirror 3 to become laser light 8 D. Ha
  • the light is received by the auto detector 5.
  • the photo detector 5 converts the received laser light 8 D into an electric signal, and inputs the output signal ES to the aberration analysis unit 9.
  • the aberration analysis unit 9 obtains an observation signal p (X, Y) ((X, Y) is a relative position of the spot image) based on the output signal ES from the photo detector 5.
  • the observation signal p (X, Y) moves the lens 11 or Z and the mirror 12 in the XY direction by the XYZ stage 13.
  • the spot image of the laser beam 8 D received by the photo detector 5 is XY (X) Horizontal) Acquired by scanning in the plane.
  • the aberration analysis unit 9 When analyzing the spot image of the laser beam 8D, the aberration analysis unit 9 further calculates a model observation signal P (X, Y).
  • the model observation signal P (X, Y) is obtained from the intensity distribution s (x, y) of the spot image and the function W (x, y) that models the sensitivity distribution of the light receiving window of the photo detector 5. The following is calculated by convolution-integral number 1.
  • the convolution integral of the above equation 1 can be an integral of the rectangular wave region when the function W (x, y) is constant.
  • convolutional integration Fourier-transforms the function W (X, y) that models the sensitivity distribution of the photodiode 5 and the intensity distribution s (x, y) of the spot image, and reverses the product in frequency space It may be Fourier transformed.
  • the intensity distribution s of the spot image is given by the following equation 3, where f is the complex amplitude of the spot image of the laser beam 8D.
  • the complex amplitude f of the spot image of the laser beam 8 D is represented by the Nipoesernike series given by the following equation 4.
  • the spot image of the laser beam 8 D is analyzed by solving the nonlinear least squares problem of the above-mentioned 9 and determining the design variable K.
  • the observation signal p can be obtained by moving the lens 11 or Z and the mirror 12 in the Z direction by the XYZ stage 13. It is necessary to acquire (X, Y) for at least two different focal positions of the laser beam 8 and to improve the solution accuracy when analyzing the spot image of the laser beam 8 D
  • the nonlinear least squares problem may be solved using Tikonov's method with the following number 10 as the objective function.
  • the model observation signal is expanded in the two Poesernike series, but the present invention is not limited thereto, and general finite series expansion such as Fourier series expansion and Lagrange series expansion can be used.
  • FIG. 2 is a flow chart showing an example of the aberration analysis of the spot image of laser light 8 D in the aberration analysis unit 9.
  • the output signal ES from the photo detector 5 is input to the aberration analysis unit 9 (step S 1).
  • the aberration analysis unit 9 obtains an observation signal P (X, Y) from the output signal ES when the spot image of the laser light 8 D is scanned in the XY plane of the photo detector 5 (step S 2).
  • FIG. 3 is a schematic view of a spot image in a focused image and a defocused image of each coefficient amn,) 3 mn.
  • the solution lacks uniqueness, and correct analysis can not be performed. If it is considered to use two or more spot images by giving up analysis on only one plane, using "focus plane + defocus plane" or positive and negative defocus planes solves this problem. can do. That is, the influence of the expansion coefficients a mn and / 3 mn of the complex amplitude distribution, which is an unknown quantity in the present invention, on the intensity distribution of the spots differs in characteristics depending on the coefficients a mn and ⁇ mn.
  • the observation signal p (X, y) is acquired for two or more different focal positions in the Z direction. Although it is at least two or more, the spot image of two is optimal in terms of accuracy and processing speed.
  • the aberration analysis unit 9 next calculates a model observation signal P (X, Y) (step S 5).
  • a model observation signal P (X, Y) (step S 5).
  • the model observation first, it is hypothesized that the Nipoezelnike coefficient ⁇ K ⁇ , which is an aberration assumption, is assumed (step S3), and then the intensity distribution ⁇ s ⁇ of the spot image is calculated according to the equation 7 (step S4).
  • step S 5 Calculate the model observation signal ⁇ P ⁇ by Eq. 8 (step S 5).
  • the aberration analysis unit 9 minimizes the difference between the observation signal ⁇ p ⁇ and the model observation signal ⁇ P ⁇ based on the obtained observation signal ⁇ p ⁇ and the model observation signal ⁇ p ⁇ (step S6).
  • the objective function of the non-linear least squares problem used in performing this minimization is given by the above equation 9 or the above equation 10.
  • step S 7 it is judged whether the Nipoesernicke coefficient ⁇ K ⁇ which is a design variable of the nonlinear least squares problem has converged. If it is determined that convergence has not occurred, the intensity distribution ⁇ s ⁇ of the spot image and the model observation signal ⁇ P ⁇ are calculated again based on the Nivosezernike coefficient ⁇ K ⁇ obtained by the minimization, and the observation signal ⁇ Based on p ⁇ and the obtained model observation signal ⁇ P ⁇ And / /, to do.
  • the aberration distribution (the declination distribution) is easily determined from the determined two Boeselnike coefficients ⁇ K ⁇ . Can be calculated.
  • the calculated aberration distribution is output (step S 8), and the aberration analysis process is completed.
  • the aberration distribution can also be expressed as a Zernike coefficient, which is a commonly used aberration index, using a linear least squares problem.
  • an optical pickup 1 for recording and reproducing data on an optical disc such as a CD or a DVD, and scanning and adjustment of a spot image are also performed.
  • an aberration analysis unit 9 for performing aberration analysis and evaluation of a spot image of a laser beam, and the correction plate 6 is inserted at the CD or DVD mounting position of the optical pickup 1.
  • the configuration and operation of the optical pickup 1, the correction plate 6 and the aberration analysis unit in the present embodiment are the same as those in the first embodiment.
  • the XYZ moving unit 20 of the second embodiment transmits the optical system 4 of the optical pickup 1 and further receives the laser beam 8 B transmitted through the correction plate 6 and transmits the laser beam 8 B in the direction in which the laser beam 8 B has entered. It consists of a reference spherical surface 2 1 that reflects light 8 C, an XYZ stage 2 2 for moving the reference spherical surface 2 1 in the X and Y directions, and a control unit 2 3 that controls the XYZ stage 2 2 .
  • the reference spherical surface 21 is a hemispherical concave mirror whose focal point is at the center of the hemisphere, and has the same function and effect as the lens 11 and the mirror 12 in the first embodiment.
  • the laser beam 8 A emitted from the laser diode 2 of the optical pickup 1 is reflected by the half mirror 1 and the laser beam 8 B
  • the laser light 8 B passes through the optical system 4 and the correction plate 6 and is received by the reference spherical surface 2 1.
  • the laser beam 8B received by the reference spherical surface 21 is reflected by the reference spherical surface 21 to become a laser beam 8C
  • the laser beam 8C passes through the correction plate 6 and the optical system 4, and further passes through the half mirror 3.
  • the output signal ES of the laser light 8 D received by the photo detector 5 is input to the aberration analysis unit 9.
  • the aberration analysis unit 9 acquires the observation signal p (X, Y) of the spot image of the laser light 8 D by scanning the light source with the focal position fixed.
  • the observation signal p (X, X at at least two different focal positions of the laser light 8 is obtained.
  • the calculation of the model observation signal P (X, Y) is performed in the same manner as in the first embodiment. Then, in the same procedure as shown in Fig. 2, the aberration of the spot image of the laser beam 8D is analyzed based on the observation signal ⁇ p ⁇ and the model observation signal ⁇ P ⁇ .
  • the aberration measuring apparatus of the third embodiment comprises an optical pickup 1, a reference light source 30 for irradiating a reference laser beam 33 whose aberration is known, and an XY Z stage 3 1 for moving the reference light source 30 in the XY Z direction. And a correction plate 6 inserted at the CD or DV D mounting position of the optical pickup 1, and an aberration analysis unit 9.
  • the reference light source 30 is installed so that the irradiated reference laser light 33 passes through the correction plate 6, the optical system 4 and the half mirror 1 and is received by the photo detector 5.
  • the configuration of the optical pickup 1 in the present embodiment is the same as in the first and second embodiments.
  • the reference laser beam 33 when performing the aberration measurement, is irradiated from the reference light source 30.
  • the irradiated reference laser light 33 is transmitted through the correction plate 6, and further transmitted through the optical system 4 and the half mirror 1 of the optical pickup 1 and received by the photo detector 5.
  • the reference laser beam 33 received by the photo detector 5 is converted into an electrical signal, and the output signal ES is input to the aberration analysis unit 9.
  • the observation signal p (X, Y) required to analyze the aberration in the aberration analysis unit 9 is moved by the reference light source 30 in the Z direction by the XYZ stage 31 and focused, and then the reference light source 3 By moving 0 in the X and Y directions, horizontal scanning is performed with the focal position of the spot image of the reference laser light 33 fixed, and light is received by the photo detector 5. Also, to perform aberration analysis, the reference light source 30 is moved again in the Z direction by the XY Z stage 31 and the observation signal p (X, Y) differs by at least two or more of the reference laser light 33. Acquire at the focus position.
  • the aberration analysis unit 9 acquires the model observation signal P (X, Y) in the same manner as in the first and second embodiments, and based on the observation signal ⁇ p ⁇ and the model observation signal ⁇ p ⁇ , FIG. Perform the aberration analysis in the same procedure as the flowchart.
  • the aberration of the reference laser beam 33 may be subtracted from the aberration obtained by the aberration analysis.
  • the lens 1 1 and the mirror 12 are moved in the XYZ directions by the XY Z stage 13.
  • the reference spherical surface 21 is moved in the XY Z direction by the XY Z stage 20.
  • the reference light source 30 is moved in the XY Z direction by the XY Z stage 31. It is done.
  • Such an XYZ stage is a Y stage that can move only in the Y direction, and it is possible to move both the lens 11, the mirror 12, the reference spherical surface 21 and the reference light source 30 only in the ⁇ direction.
  • the optical system 4 By allowing the optical system 4 to move in the X direction and the ⁇ direction by means of focus tracking correction (not shown), scanning of the spot image of the laser light in the ⁇ plane and the laser light You may move the focus position of the Also, in the manufacturing process of the optical pickup 1, before fixing the position of the photo detector 5, as shown in FIG. 6, the ⁇ stage 15 is attached to the photo detector 5 and the photo detector 5 is mounted. By moving in the ⁇ direction, ⁇ scanning of the spot image of the laser beam may be performed (fourth embodiment). In this case, the eyebrow stages (10, 20, 31) in the first to third embodiments can be moved only in the eyebrow direction. The focal position of the laser light is moved by moving both the reference sphere surface 2 1 and the reference light source 30 in the Z direction.
  • the aberration measuring apparatus of this embodiment moves a measured optical pickup 1 for measuring an aberration, a reference optical pickup 41 with known optical characteristics such as aberration, and a reference optical pickup 41 in the XYZ directions.
  • the analysis of the spot image of the laser beam 48 received by the XYZ stage 4 6, the control unit 4 7 that controls the XYZ stage 4 6, and the photo detector 5 of the measured light pickup 1 The aberration analysis unit 9 and the correction plate 6 inserted at the CD or DVD mounting position of the measured optical pickup 1 are provided.
  • the configuration of the measured optical pickup 1 in the present embodiment is the same as that of the optical pickup 1 in the previous embodiment, and the same reference numerals are given to the respective constituent elements.
  • a reference optical pickup 41 comprises a laser diode 42 that emits a reference laser beam 48 whose aberration is known, a half mirror 43 that reflects or transmits the reference laser beam 48, and an optical that collects the reference laser beam.
  • the system comprises a system 4 4 and a photo detector 45 for receiving a reference laser beam 4 8.
  • the reference laser light 48 When measuring the aberration of the measured optical pickup 1, the reference laser light 48 is irradiated from the laser diode 42 of the reference light pickup 41. The irradiated reference laser light 48 is reflected by the half mirror 43, passes through the optical system 4 4 and the correction plate 6, and enters the measured optical pickup 1. The reference laser light 4 8 is transmitted through the optical system 4 and the half mirror 1 of the light pickup 1 and is received by the photo detector 5. The photo detector 5 converts the received reference laser light 48 into an electrical signal ES, and the electrical signal ES is input to the aberration analysis unit 9.
  • the observed signal p (X,; Y) for performing aberration analysis it is necessary to acquire.
  • the reference optical pickup 41 is moved in the Z direction by the XYZ stage 46 and focused
  • the reference laser light 4 received by the photo detector 5 is moved by moving the reference optical pickup 41 in the XY direction.
  • the spot image of 8 is scanned with the focal position of the reference laser beam fixed, and the observation signal p (X, Y) is acquired.
  • the observation signal p (for the focal position of at least two or more different reference laser lights 48) Get X, Y).
  • the aberration analysis unit 9 calculates the model observation signal P (X, Y) in the same manner as in the first embodiment, and the observation signal ⁇ p ⁇ and the model observation signal ⁇ P in the same procedure as the flowchart of FIG. Analyze the spot image of the reference laser beam 48 based on ⁇ .
  • the aberration produced by the optical system 4 etc. of the measured optical pickup 1 can be determined from the aberration obtained by the above-mentioned aberration analysis. It is derived by subtracting the aberration of 1 reference laser light 4 8 and the aberration generated by the optical system 4 4 etc.
  • the aberration measuring apparatus moves a measured light pickup 1 for measuring aberration, a reference optical pickup 41 with known optical characteristics such as aberration, and a reference optical pickup 41 in the XYZ directions.
  • the control unit 47 that controls the XYZ stage 46, and the photo detector 45 of the reference light pickup 41.
  • the aberration analysis unit 9 and the correction plate 6 inserted at the CD or DVD mounting position of the measured optical pickup 1 are provided.
  • the configuration of the present embodiment is the same as that of the fifth embodiment except that the aberration analysis unit 9 receives the output signal ES of the photo detector 45 of the reference optical pickup 41.
  • the corresponding components are denoted by the same reference numerals.
  • the laser light 8 is irradiated from the laser diode 2 of the measured light pick-up 1.
  • the irradiated laser light 8 is reflected by the half mirror 13, passes through the optical system 4 and the correction plate 6, and enters the reference optical pickup 41.
  • the laser beam 8 passes through the optical system 4 4 of the reference optical pickup 4 1 and the half mirror 4 3 and is received by the photo detector 45.
  • the photo detector 45 converts the received laser light 8 into an electrical signal, and inputs the output signal ES to the aberration analysis unit 9.
  • the aberration analysis unit 9 needs to acquire an observation signal p (X, Y) for performing the aberration analysis.
  • the ray is received by the photo detector 5 by moving the reference optical pickup 41 in the XY direction.
  • the spot image of the light 8 is scanned with the focal position of the laser light fixed, and the observation signal P (X, Y) is acquired.
  • the observation signal p (X, Y) is acquired from the output signal ES of the laser diode 45.
  • the reference optical pickup 41 is moved in the Z direction by the XYZ stage 46, and the observation signal p (X, Y) is acquired with respect to the focal position of at least two different laser beams 8. .
  • the aberration analysis unit 9 calculates the model observation signal in the same manner as in the first embodiment, and based on the observation signal ⁇ p ⁇ and the model observation signal ⁇ p ⁇ in the same procedure as the flowchart of FIG.
  • the aberration of the spot image of the light 8 is analyzed.
  • the aberration produced by the optical system 4 or the like of the measured optical pickup 1 can be derived by subtracting the aberration produced by the optical system 4 4 or the like of the reference optical pickup 4 1 from the aberration obtained by the above-described aberration solution.
  • an AS key cell optical element In order to cancel out the influence of the generating optical element, an AS key cell optical element may be provided.
  • the AS cancellation optical element corresponds, for example, to one in which the correction plate 6 is inclined. This is because when an inclined parallel plate is inserted into a light collecting or diverging ray, the optical distance in the inclined direction increases, and the optical distance in the direction orthogonal to the inclination is maintained, which causes astigmatism.
  • a laser diode is mentioned as an irradiation source of laser light, another laser generating element may be used.
  • the aberration measuring method using the aberration measuring apparatus shown in the first to sixth examples may be used as an optical pickup adjustment method for adjusting the aberration of the optical pickup to an optimum aberration.
  • the aberration measurement method may be used to adjust the aberration of the optical pickup so as to be optimal in the manufacturing process of the optical pickup.
  • the optical pickup may be composed of a collimator lens and an objective lens module. In that case, there is a need to inspect the optical system of the optical pickup before the objective lens module of the optical pickup is mounted. For example, as shown in FIG.
  • the optical pickup 1 00 when the optical pickup 1 00 has a collimator lens 1 0 1 and a photo detector 1 0 2 and the objective lens module 1 1 0 is attached later, the optical pickup 1 In the manufacturing process of 0 0, it is required to inspect other optical systems before attaching the objective lens module 1 1 0.
  • the collimated light from the focus scanning means 120 is directly irradiated to the optical pickup 100 before the objective lens module 110 is attached, and the photo detector 10 By generating a focal point on the top and XY scanning the focal point, it is possible to measure the aberration of the optical system of the optical pickup 100 before the objective lens module 110 is attached.
  • FIGS. 11 and 12 A specific configuration example of the focus scanning means 120 is as shown in FIGS. 11 and 12.
  • the focus scanning means 120 is an optical system 1 2.
  • a laser light source 12 2 and a stage 1 2 3 for scanning the laser light source 1 2 2 are configured.
  • the laser light emitted from the laser light source 12 2 is collimated by the optical system 1 2 1 and incident on the optical pickup 1 0 0 0, and the spot image collected through the collimator lens 1 0 1 is Measured in Fortune mode.
  • XY scanning of the spot image on the photo detector 102 can be performed by moving the stage 1 2 3. Further, in the embodiment shown in FIG.
  • the focus scanning means 120A is an optical system, a laser light source 124 for irradiating a parallel laser beam, and a stage which can be tilted to scan the laser light source 124. It consists of 1 2 5
  • the parallel laser light emitted from the laser light source 124 is incident on the optical pickup 100, and the spot image collected through the collimating lens 101 is focused on the light source. Measured in T.12.
  • XY scanning of the spot image on the photo detector 102 can be performed by driving the stage 125. For example, it can be realized by changing the angle by a galvanomier or the like.
  • a small camera is mounted in the mobile phone, and the present invention can be applied to the adjustment request for such a small power camera.
  • a laser beam 200 from a laser light source is condensed by an optical system 201, and the laser spot is projected on C C D 2 10 as a light detection element. Then, by analyzing the output signal of the CCD 210 obtained by scanning the spot with respect to one pixel 21 of the CCD 210 according to the method of the present invention described above, an optical system 2 0 can be obtained. Aberration of 1 can be identified. It should be noted that one pixel of CCD 210 is in the order of lm, the spot of the laser is also in the order of submicron to micron, and the output from one pixel of CCD 210 integrates a part of the projected spot. The amount will be the same. The amount of movement of the scan is on the order of microns.
  • FIG. 14 shows a configuration example of measuring the aberration of the optical system 201 by finely scanning the camera optical system to be measured with the focus scanning means 220 described in the present invention.
  • the present invention is applied to the output data from the simulated photo detector for the assumed aberration, the aberration is identified, and the identified aberration is compared with the assumed aberration. The effectiveness of the present invention was verified. Measurement errors are also modeled and added to the simulated data. In the first to sixth embodiments, a plurality of hardware configurations for obtaining measurement data are shown. Since there is no difference in the errors included in the evening, it is verified by this simulation whether aberrations can be identified for all the examples.
  • the analysis conditions were as follows.
  • the optical pickup is a DVD optical pickup, the wavelength of the laser diode is 650 nm, the numerical aperture NA is 0.6, and the size of the photodiode is 7500 nm 7 It is assumed that 5 0 0 [nm] (discretized into 1 2 5 points X 1 2 5 points).
  • the analysis area covers 3 0 0 0 [nm] x 3 0 0 0 [nm] (discretized into 5 1 point X 5 1 point) that can cover approximately the primary ring when reconstructed. When the spot image of the laser light scans, scan is performed from the outside of this area.
  • the analysis aims to identify up to the 3rd-order spherical aberration, and makes the number of unknowns 18.
  • the BFGS method was used to calculate the coefficients by changing the position of the initial point. As a result, the characteristics as shown in FIG. 15 were obtained, and it could be shown that they were not multimodal. That is, the aberration can be stably identified as the only solution.
  • the BFGS method is one of the non-linear optimization methods announced by Broyden, Fletcher, Goldfarb, and Shannon. It is also called the quasi-Newton method. Next, an ideal window function is shown in FIG. In this characteristic chart, the sensitivity of the central part is 100% and the sensitivity of the other parts is shown.
  • the respective analysis results are shown in FIG. 18 in the case of FIG. 17 and in FIG. 20 in the case of FIG.
  • the identification is stable even if the sensitivity distribution of the photodetection window of the photodiode is depressed at the periphery.
  • Fig. 26 ( ⁇ ) shows the correct solution of the intensity distribution of the observed signal of the photodiode
  • Fig. 26 ( ⁇ ) is calculated by performing the inverse analysis from the results obtained by the numerical analysis. The intensity distribution is shown.
  • the observation signal is output based on the output signal of the photo detector.
  • the model observation signal is calculated on the basis of the intensity distribution of the spot image and the sensitivity distribution of the light receiving window of the photo detector, and the spot of the laser light received by the photo detector on the basis of the observation signal and the model observation signal. Since the analysis of the aberration of the projection image and the evaluation of the spot image of the laser light are performed, the analysis of the aberration of the spot image of the laser light and the evaluation of the spot image of the laser light can be performed using an inexpensive apparatus. And can reduce the measurement time.
  • the present invention is intended to perform aberration measurement, but can also be applied to measurement of optical evaluation amounts such as MTF (Modulation Transfer Function) 2 ⁇ 4 PSF (Point Spread Function), TF (Optical Transfer Function), and the like.
  • the present invention is mainly applicable to the optical evaluation of optical pickups such as DVD, but it is further equivalent to one pixel of a CCD for an optical system composed of a lens such as a camera and a CCD. It can also be applied to analyze the aberration of the spot size. That is, if the light sensitivity to one pixel of the CCD is used as a window function, the aberration can be identified by the same method.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2 0 6-2 3 4 3 8 9

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Head (AREA)

Abstract

L'invention porte sur un procédé de mesure d'aberration servant à évaluer l'aberration d'une image d'un point lumineux détectée par un photodétecteur ainsi que l'image du point lumineux au moyen d'un instrument peu coûteux et à haute vitesse. A partir d'un signal d'observation modèle et d'un signal d'observation acquis d'un signal de sortie de balayage du photodétecteur recevant l'image de point lumineux, le procédé consiste à analyser l'aberration d'un système optique formant l'image de point lumineux en fonction de données recueillies en au moins deux emplacements.
PCT/JP2008/070626 2007-11-21 2008-11-06 Procédé de mesure d'aberration et son dispositif WO2009066599A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009542529A JPWO2009066599A1 (ja) 2007-11-21 2008-11-06 収差測定方法及びその装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007302211 2007-11-21
JP2007-302211 2007-11-21

Publications (1)

Publication Number Publication Date
WO2009066599A1 true WO2009066599A1 (fr) 2009-05-28

Family

ID=40667423

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070626 WO2009066599A1 (fr) 2007-11-21 2008-11-06 Procédé de mesure d'aberration et son dispositif

Country Status (3)

Country Link
JP (1) JPWO2009066599A1 (fr)
TW (1) TW200935414A (fr)
WO (1) WO2009066599A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2339317A3 (fr) * 2009-12-23 2011-07-20 Foxsemicon Integrated Technology, Inc. Procédé et système pour évaluer l'uniformité de la lumière à travers une lentille optique
CN108776005A (zh) * 2018-09-05 2018-11-09 武汉华工激光工程有限责任公司 一种光学元件像差检测装置及系统

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04113243A (ja) * 1990-09-03 1992-04-14 Toshiba Corp レンズ検査装置
JPH05110880A (ja) * 1991-10-18 1993-04-30 Fujitsu Ltd カラー読取装置
JP2001050862A (ja) * 1999-08-05 2001-02-23 Olympus Optical Co Ltd 光ピックアップ対物レンズの収差測定装置
WO2005038885A1 (fr) * 2003-10-16 2005-04-28 Nikon Corporation Dispositif et procede de mesure de caracteristiques optiques, systeme et procede d'exposition ainsi que procede de production d'un dispositif associe
JP2006108618A (ja) * 2004-09-09 2006-04-20 Nikon Corp 光学系の光学特性の計測方法、光学特性計測装置、露光装置並びにデバイスの製造方法
JP2006308556A (ja) * 2005-03-31 2006-11-09 Dainippon Screen Mfg Co Ltd ムラ検査装置およびムラ検査方法
WO2008072709A1 (fr) * 2006-12-14 2008-06-19 Panasonic Corporation Procédé de mesure des caractéristiques optiques d'un élément optique de diffraction et appareil permettant de mesurer les caractéristiques optiques d'un élément optique de diffraction

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04113243A (ja) * 1990-09-03 1992-04-14 Toshiba Corp レンズ検査装置
JPH05110880A (ja) * 1991-10-18 1993-04-30 Fujitsu Ltd カラー読取装置
JP2001050862A (ja) * 1999-08-05 2001-02-23 Olympus Optical Co Ltd 光ピックアップ対物レンズの収差測定装置
WO2005038885A1 (fr) * 2003-10-16 2005-04-28 Nikon Corporation Dispositif et procede de mesure de caracteristiques optiques, systeme et procede d'exposition ainsi que procede de production d'un dispositif associe
JP2006108618A (ja) * 2004-09-09 2006-04-20 Nikon Corp 光学系の光学特性の計測方法、光学特性計測装置、露光装置並びにデバイスの製造方法
JP2006308556A (ja) * 2005-03-31 2006-11-09 Dainippon Screen Mfg Co Ltd ムラ検査装置およびムラ検査方法
WO2008072709A1 (fr) * 2006-12-14 2008-06-19 Panasonic Corporation Procédé de mesure des caractéristiques optiques d'un élément optique de diffraction et appareil permettant de mesurer les caractéristiques optiques d'un élément optique de diffraction

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
MASASHI UESHIMA ET AL., TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS, vol. 72, no. 717, 25 May 2006 (2006-05-25), pages 82 - 87 *
MASASHI UESHIMA ET AL.: "Japan Society of Mechanical Engineers, Computational Mechanics Conference, 19th", 2 November 2006, pages: 417 - 418 *
MASASHI UESHIMA ET AL.: "Japan Society of Mechanical Engineers, Computational Mechanics Conference, 20th", 25 November 2007, pages: 453 - 454 *
YASUTAKA NISHII ET AL.: "Japan Society of Mechanical Engineers, Computational Mechanics Conference, 20th", 25 November 2007, pages: 443 - 444 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2339317A3 (fr) * 2009-12-23 2011-07-20 Foxsemicon Integrated Technology, Inc. Procédé et système pour évaluer l'uniformité de la lumière à travers une lentille optique
CN102109413B (zh) * 2009-12-23 2012-06-13 富士迈半导体精密工业（上海）有限公司 均匀度测量系统与方法
CN108776005A (zh) * 2018-09-05 2018-11-09 武汉华工激光工程有限责任公司 一种光学元件像差检测装置及系统

Also Published As

Publication number Publication date
JPWO2009066599A1 (ja) 2011-04-07
TW200935414A (en) 2009-08-16

Similar Documents

Publication Publication Date Title
KR20030035869A (ko) 광 디스크 장치 및 틸트 검출 방법
WO2009066599A1 (fr) Procédé de mesure d'aberration et son dispositif
US7613083B2 (en) Optical scanning device
CN109195735A (zh) 光学漂移校正系统以及方法
JP3441670B2 (ja) レンズ検査システム及びレンズ検査装置
JP2004177334A (ja) 複数段レンズの位置調整方法、レンズ組立装置、及び、レンズ検査装置
JP2720749B2 (ja) 光スポット歪測定調整装置
US5392115A (en) Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal
JP2003177292A (ja) レンズの調整装置および調整方法
JP2000113494A (ja) 収差発生装置、光ピックアップ、情報再生装置及び情報記録装置
CN112697397B (zh) 一种dmd杂散光检测装置及检测方法
JP4468394B2 (ja) 光情報処理装置および光情報処理方法
JP3547626B2 (ja) 光ピックアップ、情報再生装置及び情報記録装置
JP2010049766A (ja) 光ピックアップ用対物レンズの傾き測定方法及び装置
JP2009110639A (ja) 波面収差検査装置、光ピックアップ組立調整装置、レンズ評価装置、レンズ組立装置、対物レンズアクチュエータ組立調整装置、光ピックアップ、光ディスクドライブ、および、光情報記録再生装置
JPH0850731A (ja) 光ディスク装置
KR100609160B1 (ko) 광 픽업장치의 렌즈 조정장치 및 방법
CN1534640A (zh) 光拾取器的象散性的测定方法、调整方法和测定装置
JP4656880B2 (ja) 光ピックアップの出射光測定装置、及び調整方法
KR100570859B1 (ko) 광픽업장치의 조립공정에서 구면 수차 조정 방법
JPH0968477A (ja) 簡易波面収差検出方法
JP2004303403A (ja) 光ヘッド装置及び光情報再生装置
KR100607937B1 (ko) 광디스크 경사 보정장치 및 이를 채용한 광픽업장치
JPH06162530A (ja) 光ピックアップ装置
KR100510645B1 (ko) 근접장 광학계의 픽업 평가 장치

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08853010

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009542529

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08853010

Country of ref document: EP

Kind code of ref document: A1

点击 这是indexloc提供的php浏览器服务，不要输入任何密码和下载