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WO2008120391A1 - Multi-column electron beam exposure device and multi-column electron beam exposure method - Google Patents

Multi-column electron beam exposure device and multi-column electron beam exposure method Download PDF

Info

Publication number
WO2008120391A1
WO2008120391A1 PCT/JP2007/056974 JP2007056974W WO2008120391A1 WO 2008120391 A1 WO2008120391 A1 WO 2008120391A1 JP 2007056974 W JP2007056974 W JP 2007056974W WO 2008120391 A1 WO2008120391 A1 WO 2008120391A1
Authority
WO
WIPO (PCT)
Prior art keywords
electron beam
column
exposure
beam exposure
column electron
Prior art date
Application number
PCT/JP2007/056974
Other languages
French (fr)
Japanese (ja)
Inventor
Hiroshi Yasuda
Akio Yamada
Mitsuhiro Nakano
Takashi Kiuchi
Original Assignee
Advantest Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corporation filed Critical Advantest Corporation
Priority to PCT/JP2007/056974 priority Critical patent/WO2008120391A1/en
Priority to JP2009507379A priority patent/JPWO2008120391A1/en
Publication of WO2008120391A1 publication Critical patent/WO2008120391A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)

Abstract

[PROBLEMS] To provide a multi-column electron beam exposure device and a multi-column electron beam exposure method which can improve the exposure accuracy and adjust the calibration time so as to improve the exposure throughput. [MEANS FOR SOLVING PROBLEMS] A multi-column electron beam exposure device includes: a plurality of column cells; an electron beam characteristic detection unit; a deflector for deflecting the electron beam according to exposure data; and a control unit which uses the electron beam characteristic detection unit to calculate an electron beam characteristic prediction value by using a continuous function for smoothly connecting measurement values obtained at calibration times in the past, the function being a prediction function continuously changing the electron beam characteristic until the next calibration time together with the plotting time, thereby calculating a correction value for the exposure data on each column cell. The control unit adjusts the calibration time interval according to a difference between the measurement value and the prediction value of the electron beam characteristic.
PCT/JP2007/056974 2007-03-29 2007-03-29 Multi-column electron beam exposure device and multi-column electron beam exposure method WO2008120391A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/JP2007/056974 WO2008120391A1 (en) 2007-03-29 2007-03-29 Multi-column electron beam exposure device and multi-column electron beam exposure method
JP2009507379A JPWO2008120391A1 (en) 2007-03-29 2007-03-29 Multi-column electron beam exposure apparatus and multi-column electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/056974 WO2008120391A1 (en) 2007-03-29 2007-03-29 Multi-column electron beam exposure device and multi-column electron beam exposure method

Publications (1)

Publication Number Publication Date
WO2008120391A1 true WO2008120391A1 (en) 2008-10-09

Family

ID=39807982

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/056974 WO2008120391A1 (en) 2007-03-29 2007-03-29 Multi-column electron beam exposure device and multi-column electron beam exposure method

Country Status (2)

Country Link
JP (1) JPWO2008120391A1 (en)
WO (1) WO2008120391A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010106621A1 (en) * 2009-03-16 2010-09-23 株式会社アドバンテスト Multi-column electron beam lithography system and electron beam orbit adjusting method thereof
JP2013115148A (en) * 2011-11-25 2013-06-10 Canon Inc Scanner, drawing device, and method of manufacturing article
JP2014016470A (en) * 2012-07-09 2014-01-30 Dainippon Screen Mfg Co Ltd Position prediction device, position prediction method and substrate treatment apparatus
JP2015204404A (en) * 2014-04-15 2015-11-16 株式会社ニューフレアテクノロジー Multi-beam drawing method and multi-beam drawing apparatus
CN111781508A (en) * 2020-06-17 2020-10-16 金龙联合汽车工业（苏州）有限公司 Hybrid vehicle-mounted battery SOC estimation method and system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07142321A (en) * 1993-06-17 1995-06-02 Fujitsu Ltd Deflection amount correction method for electron beam exposure apparatus
JP2000133567A (en) * 1998-10-23 2000-05-12 Advantest Corp Electron beam exposing method and electron beam exposure system
JP2006278492A (en) * 2005-03-28 2006-10-12 Advantest Corp Electron beam exposure device and method of exposing electron beam
JP2007043083A (en) * 2005-07-04 2007-02-15 Nuflare Technology Inc Electron beam drift correction method and electron beam writing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07142321A (en) * 1993-06-17 1995-06-02 Fujitsu Ltd Deflection amount correction method for electron beam exposure apparatus
JP2000133567A (en) * 1998-10-23 2000-05-12 Advantest Corp Electron beam exposing method and electron beam exposure system
JP2006278492A (en) * 2005-03-28 2006-10-12 Advantest Corp Electron beam exposure device and method of exposing electron beam
JP2007043083A (en) * 2005-07-04 2007-02-15 Nuflare Technology Inc Electron beam drift correction method and electron beam writing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010106621A1 (en) * 2009-03-16 2010-09-23 株式会社アドバンテスト Multi-column electron beam lithography system and electron beam orbit adjusting method thereof
JP5475634B2 (en) * 2009-03-16 2014-04-16 株式会社アドバンテスト Multi-column electron beam drawing apparatus and its electron beam trajectory adjustment method
JP2013115148A (en) * 2011-11-25 2013-06-10 Canon Inc Scanner, drawing device, and method of manufacturing article
JP2014016470A (en) * 2012-07-09 2014-01-30 Dainippon Screen Mfg Co Ltd Position prediction device, position prediction method and substrate treatment apparatus
JP2015204404A (en) * 2014-04-15 2015-11-16 株式会社ニューフレアテクノロジー Multi-beam drawing method and multi-beam drawing apparatus
CN111781508A (en) * 2020-06-17 2020-10-16 金龙联合汽车工业（苏州）有限公司 Hybrid vehicle-mounted battery SOC estimation method and system
CN111781508B (en) * 2020-06-17 2022-10-11 金龙联合汽车工业（苏州）有限公司 Method and system for estimating SOC of hybrid vehicle-mounted battery

Also Published As

Publication number Publication date
JPWO2008120391A1 (en) 2010-07-15

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