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WO2006106947A1 - Base d'abrasif dont la réaction avec un composé du fluor est inhibée et procédé servant à produire celle-ci - Google Patents

Base d'abrasif dont la réaction avec un composé du fluor est inhibée et procédé servant à produire celle-ci Download PDF

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Publication number
WO2006106947A1
WO2006106947A1 PCT/JP2006/306900 JP2006306900W WO2006106947A1 WO 2006106947 A1 WO2006106947 A1 WO 2006106947A1 JP 2006306900 W JP2006306900 W JP 2006306900W WO 2006106947 A1 WO2006106947 A1 WO 2006106947A1
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Prior art keywords
magnesium
phosphate
polyphosphate
containing compound
pyrophosphate
Prior art date
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PCT/JP2006/306900
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English (en)
Japanese (ja)
Inventor
Kazuo Yasuzawa
Koichi Tokudome
Hiroshi Kobayashi
Original Assignee
Tosoh Finechem Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Finechem Corporation filed Critical Tosoh Finechem Corporation
Priority to JP2007511187A priority Critical patent/JP5443687B2/ja
Publication of WO2006106947A1 publication Critical patent/WO2006106947A1/fr

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Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/24—Phosphorous; Compounds thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q11/00—Preparations for care of the teeth, of the oral cavity or of dentures; Dentifrices, e.g. toothpastes; Mouth rinses
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/16—Oxyacids of phosphorus; Salts thereof
    • C01B25/26—Phosphates
    • C01B25/32—Phosphates of magnesium, calcium, strontium, or barium
    • C01B25/327—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

Definitions

  • the present invention relates to a polishing base in which reactivity with a fluorine compound is suppressed and a method for producing the same.
  • Dicalcium phosphate has been used for many years as a dentifrice polishing base.
  • Patent Document 1 an average value force of crystallite size measured by X-ray diffractometry is obtained.
  • Hydrocalcium hydrogen phosphate having crystallites of S200-3500 angstroms An abrasive substrate obtained by firing a Japanese product at a temperature of 70 ° C to 1200 ° C is disclosed.
  • the invention described in this publication provides a polishing substrate that has a low polishing and high cleaning effect, is stable in a water suspension system, and prevents calcium ions from being eluted by water as much as possible. It is the purpose.
  • Patent Document 1 describes a toothpaste containing an abrasive base material and Na monofluorophosphate (MFP) which is a fluorinating agent in Examples.
  • MFP Na monofluorophosphate
  • DCP dicalcium phosphate
  • NaF Na fluoride
  • DCP dicalcium phosphate
  • Patent Document 1 Japanese Patent Publication No. 7-106970
  • Fluorinating agents for dentifrice mainly include Na monofluorophosphate (MFP) and Na fluoride (NaF), and NaF has a wide range of uses because of its rapid efficacy.
  • toothpaste bases such as DCP, calcium carbonate, and hydroxylated A1
  • NaF reactive with F ions
  • the dentifrice was unusable.
  • an F ion gradual MFP is used.
  • calcium hydrogen phosphate 'anhydrate can be used only in combination with monofluorophosphate Na (MFP).
  • MFP monofluorophosphate Na
  • DCP dicalcium phosphate
  • the present invention is to provide a polishing base that suppresses reactivity with NaF and a method for producing the same.
  • a method for producing a polishing base comprising heat-treating a dicalcium calcium phosphate anhydrate in the presence of a magnesium-containing compound and a condensed phosphate,
  • the abundance of the magnesium-containing compound is in the range of 1500 to 5000 ppm as a magnesium amount with respect to the dicalcium phosphate anhydrate,
  • the amount of condensed phosphate is such that the molar ratio of the cation component constituting the condensed phosphate to magnesium of the magnesium-containing compound is 0.4 Zn to 12 Zn (where n is the valence of the cation component) And)
  • the said manufacturing method whose heat processing conditions are the range of 100-300 degreeC.
  • Magnesium-containing compound strength (1) Magnesium-containing compound contained in dicalcium phosphate anhydrate, (2) Magnesium-containing compound added to dicalcium phosphate anhydrate before heat treatment Or (3) a magnesium-containing compound contained in the anhydrous dibasic calcium phosphate and a magnesium-containing compound added to the anhydrous calcium phosphate before heat treatment [1 ] The manufacturing method of description.
  • Anhydrous dibasic calcium phosphate strength obtained by dehydrating a slurry of dicalcium phosphate dihydrate at 80 to 110 ° C.
  • the magnesium-containing compound is at least one selected from the group consisting of magnesium hydroxide, primary magnesium phosphate, dibasic magnesium phosphate, tertiary magnesium phosphate, and magnesium pyrophosphate [1] ] To [4].
  • the condensed phosphate is pyrophosphate, polyphosphate, metaphosphate or ultraphosphate, and the cationic component constituting the condensed phosphate is sodium, potassium, calcium, magnesium, aluminum, or The production method according to any one of [1] to [5], which is an amorphous.
  • the condensed phosphate is a pyrophosphate, and is a pyrophosphate added to dicalcium phosphate prior to heat treatment with pyrophosphate, according to any one of [1] to [5] Production method.
  • Pyrophosphate strength Sodium pyrophosphate, potassium pyrophosphate, calcium pyrophosphate, magnesium pyrophosphate and ammonium pyrophosphate group power is at least one selected from [6] or [7] Manufacturing method.
  • Polyphosphate strength Sodium polyphosphate, potassium polyphosphate, calcium polyphosphate, ammonium polyphosphate, and at least one kind of group strength including magnesium polyphosphate strength is selected. [9] .
  • a method for producing a polishing base comprising mixing a magnesium-containing compound and a condensed phosphate in a dicalcium phosphate non-hydrate that has been heat-treated until no endothermic peak is observed near 130 ° C,
  • the abundance of the magnesium-containing compound is in the range of 1500 to 5000 ppm as a magnesium amount with respect to the dicalcium phosphate anhydrate,
  • the amount of condensed phosphate is such that the molar ratio of the cation component constituting the condensed phosphate to magnesium of the magnesium-containing compound is 0.4 Zn to 12 Zn (where n is the valence of the cation component)
  • the production method is such that the molar ratio of the cation component constituting the condensed phosphate to magnesium of the magnesium-containing compound is 0.4 Zn to 12 Zn (where n is the valence of the cation component)
  • the magnesium-containing compound is magnesium hydroxide, primary magnesium phosphate, secondary The production method according to [11], which is at least one selected from the group power of magnesium diphosphate, magnesium triphosphate, and magnesium pyrophosphate.
  • the condensed phosphate is pyrophosphate, polyphosphate, metaphosphate or ultraphosphate, and the cationic component constituting the condensed phosphate is sodium, potassium, calcium, magnesium, aluminum, or The production method according to [11], which is an amorphous.
  • a polishing base which is obtained by the production method according to any one of [1] to [11] and has reduced reactivity with a fluorine compound.
  • the above-mentioned polishing base comprising a dibasic calcium phosphate anhydrate as a main component and containing magnesium and condensed phosphate and suppressing reactivity with a fluorine compound.
  • Magnesium content is in the range of 1500 to 5000 ppm, and abundance of condensed phosphate
  • the molar ratio of the cation component constituting the condensed phosphate to magnesium is in the range of 0.4 Zn to 12 Zn (provided that , N is the valence of the cationic component). [16].
  • the present invention provides a polishing base having an effect of suppressing reactivity with a fluorine compound, comprising heat-treating dicalcium phosphate anhydrate in the presence of a magnesium-containing compound and a condensed phosphate.
  • the present invention relates to a method for producing an agent (first embodiment).
  • the present invention has an effect of suppressing reactivity with a fluorine compound, including mixing a magnesium-containing compound and a condensed phosphate, which are heat-treated until no endothermic peak is observed at around 130 ° C.
  • the present invention relates to a method for producing a polishing base (second embodiment). [0011]
  • the first aspect will be described.
  • the anhydrous dibasic calcium phosphate used in the method for producing a polishing base of the present invention is not particularly limited as long as it is an anhydrous dibasic calcium phosphate.
  • dicalcium phosphate dihydrate can be performed, for example, at 100 to 200 ° C, and particularly preferably in the range of 150 to 170 ° C.
  • dibasic calcium phosphate anhydrate used in the manufacturing method of the polishing base of the present invention (3) the dicalcium phosphate dihydrate produced in the above (2) is heated to 80 ° C. or more in the form of a slurry.
  • An anhydrous dicalcium phosphate obtained by dehydration can also be mentioned. This heating is preferably performed at 110 ° C. or lower.
  • the magnesium-containing compound present together with the dicalcium phosphate anhydrate is contained in (1) the anhydrous calcium phosphate anhydrate containing the magnesium-containing compound.
  • This compound is a magnesium-containing compound added to a dicalcium phosphate anhydrous before heat treatment.
  • dibasic calcium phosphate anhydrate contains magnesium as an impurity as an impurity.
  • the magnesium-containing compound contained in (1) dicalcium phosphate non-hydrate is a magnesium compound contained as an impurity derived from the raw material.
  • the magnesium-containing compound in the present invention is a magnesium-containing compound newly added to the dicalcium phosphate anhydrous other than the magnesium compound derived from impurities. This is the magnesium-containing compound added to the dicalcium phosphate phosphate before the heat treatment of (2).
  • the magnesium-containing compound in the present invention is both the magnesium-containing compound and the magnesium-containing compound contained in the anhydrous dibasic calcium phosphate of (3) and before the heat treatment. It can also be a magnesium-containing compound added to anhydrous calcium diphosphate.
  • the “magnesium-containing compound contained in the dicalcium phosphate anhydrous” in (1) and (3) may be any compound. However, such a magnesium-containing compound is generally magnesium phosphate. However, it may be a magnesium-containing compound other than magnesium phosphate.
  • the magnesium-containing compound may be, for example, a solid (powder or granular). it can.
  • the magnesium-containing compound is, for example, hydroxyammonium, magnesium chloride, primary magnesium phosphate, secondary magnesium phosphate, tertiary magnesium phosphate, magnesium sulfate, acidic magnesium, nitric acid.
  • the magnesium-containing compound is preferably magnesium hydroxide, primary magnesium phosphate, secondary magnesium phosphate, tertiary magnesium phosphate, or magnesium pyrophosphate. Or it is especially preferable that it is tribasic magnesium phosphate.
  • the condensed phosphate used in the production method of the present invention can be, for example, pyrophosphate, polyphosphate, metaphosphate or ultraphosphate.
  • the cationic component constituting the condensed phosphate can be, for example, sodium, potassium, calcium, magnesium, aluminum, or ammonium.
  • the condensed phosphate may preferably be a pyrophosphate, which is, for example, sodium pyrophosphate, potassium pyrophosphate, calcium pyrophosphate, sodium hydrogen pyrophosphate, potassium hydrogen pyrophosphate, pyrophosphoric acid It can be aluminum, aluminum hydrogen pyrophosphate, magnesium pyrophosphate, ammonium pyrophosphate, or a mixture thereof.
  • the pyrophosphate is particularly preferably sodium pyrophosphate, preferably sodium pyrophosphate, potassium pyrophosphate, calcium pyrophosphate, magnesium pyrophosphate or ammonium pyrophosphate.
  • the condensed phosphate may preferably be a polyphosphate
  • examples of the polyphosphate include sodium polyphosphate, potassium polyphosphate, aluminum polyphosphate, magnesium polyphosphate, and ammonium polyphosphate.
  • examples of the metaphosphate include sodium metaphosphate, potassium metaphosphate, aluminum metaphosphate, magnesium metaphosphate, and ammonium metaphosphate.
  • examples of the ultraphosphate include sodium ultraphosphate, potassium ultraphosphate, aluminum ultraphosphate, magnesium ultraphosphate, and ammonium ultraphosphate.
  • the magnesium-containing compound and the condensed phosphate are, for example, a solid (powder or granular form) mixed with dicalcium phosphate anhydrous and then heat-treated.
  • aqueous solution or suspension containing the magnesium-containing compound and the condensed phosphate may be mixed with or sprayed with the dibasic calcium phosphate anhydrate, followed by heat treatment.
  • the abundance of the magnesium-containing compound is in the range of 1500 to 5000 ppm as a magnesium amount with respect to the dicalcium phosphate phosphate.
  • “As the amount of magnesium” means the total amount of magnesium derived from the magnesium-containing compound and the magnesium-containing compound contained in the anhydrous dibasic calcium phosphate.
  • the amount of magnesium derived from magnesium compounds contained as impurities in dibasic calcium phosphate anhydrate is also included.
  • the abundance of the magnesium-containing compound is preferably in the range of 1700 to 4000 ppm, more preferably in the range of 2000 to 3000 ppm as the amount of magnesium relative to the dicalcium phosphate phosphate.
  • Additive strength of magnesium-containing compounds If the amount of magnesium is less than 1500 ppm, the resulting F stability will not be sufficient. In other words, long-term F stability, which has a low level of F stability in the short term, is significantly reduced. Addition capacity of magnesium-containing compounds If the magnesium content exceeds 5000 ppm, the magnesium-containing compound reacts with F ions, and as a result, the stability tends to be lost.
  • the amount of the condensed phosphate is such that the molar ratio of the cation component constituting the condensed phosphate to magnesium of the magnesium-containing compound is in the range of 0.4 Zn to 12 Zn (where n is the cation component described above) Valence).
  • This molar ratio is preferably in the range of 0.6 Zn to: LOZn, more preferably in the range of 0.7 / n to 8 / n.
  • n is a cation component In the case of monovalent compounds such as potassium, potassium and ammonia, it is 1, and the molar ratio is in the range of 0.4-12.
  • N is 2 when the cation component is divalent, such as magnesimu, and the molar ratio is in the range of 0.2-6. Furthermore, n is 3 when the cation component is trivalent such as aluminum, and the molar ratio is in the range of 0.4Z3-4.
  • the amount of the condensed phosphate added is either short-term or long-term when the molar ratio of the cation component constituting the condensed phosphate to magnesium derived from the magnesium-containing compound is less than 0.4 Zn. F stability is also poor. If this molar specific force exceeds 12Zn, short-term stability is good, but long-term stability tends to decrease.
  • the heat treatment conditions of the dicalcium phosphate anhydrous to which the magnesium-containing compound and the condensed phosphate are added are such that the temperature is in the range of 100 to 300 ° C.
  • the heating temperature is preferably in the range of 150 to 250 ° C. It is appropriate that the heat treatment is performed at least until the crystal water of the added condensed phosphate hydrate is removed from the heat treatment.
  • the heat treatment time is, for example, in the range of 1 to 10 hours. However, it is not limited to this range.
  • the second aspect of the present invention includes mixing a magnesium-containing compound and a condensed phosphate with a dicalcium phosphate anhydrous heat-treated until no endothermic peak is observed at around 130 ° C.
  • the dicalcium phosphate anhydrate used in the method for producing the polishing base is a dicalcium phosphate anhydrate that has been heat-treated until no endothermic peak is observed at around 130 ° C.
  • Such an anhydrous dicalcium phosphate is the same as the anhydrous calcium phosphate (1) to (3) described in the first embodiment of the present invention at 100 to 300 ° C, preferably 150 to 250 ° C. Examples thereof include those heated with C for 1 to 10 hours.
  • the conditions for the heat treatment can be appropriately determined so as to obtain a dicalcium phosphate anhydrous that does not show an endothermic peak near 130 ° C as a result of thermal analysis by TG DAT.
  • magnesium-containing compound to be added to and mixed with the dicalcium phosphate anhydrous for example, a solid (powder or granular) can be used.
  • a solid powder or granular
  • Examples of the magnesium-containing compound in this case are the same as in the first embodiment.
  • Condensed phosphoric acid used in the second embodiment Examples of the salt are the same as in the first embodiment.
  • the magnesium-containing compound and the condensed phosphate are mixed with, for example, a solid (powder or granule) heat-treated dicalcium phosphate anhydrous.
  • Mixing can be performed using, for example, a commercially available powder mixing apparatus (for example, a ribbon mixer or a V-type mixer).
  • the mixing method is not limited to the above method.
  • mixing should be carried out so that the mixture of dibasic phosphate strength succinic anhydride and magnesium-containing compound and condensed phosphate strength is almost evenly mixed.
  • it can be determined appropriately in consideration of the particle size, mixing ratio, etc. of the dicalcium phosphate anhydrous, the magnesium-containing compound and the condensed phosphate.
  • An aqueous solution or suspension containing the magnesium-containing compound and the condensed phosphate may be mixed or sprayed with the heat-treated dicalcium phosphate anhydrous. In this case, after mixing or mixing after spraying, the mixture is dried.
  • the abundance of the magnesium-containing compound is in the range of 1500 to 5000 ppm as a magnesium amount with respect to the dicalcium phosphate phosphate. “As the amount of magnesium” means the total amount of magnesium derived from the magnesium-containing compound and the magnesium-containing compound contained in the anhydrous dibasic calcium phosphate. The amount of magnesium derived from the magnesium compound contained as an impurity in the heat-treated calcium phosphate anhydrous is also included. The abundance of the magnesium-containing compound is preferably in the range of 1700 to 4000 ppm, more preferably in the range of 2000 to 3000 ppm as the amount of magnesium relative to the dicalcium phosphate anhydrous.
  • the amount of the condensed phosphate is such that the molar ratio of the cation component constituting the condensed phosphate to magnesium of the magnesium-containing compound is in the range of 0.4 Zn to 12 Zn (where n is the cation component described above) Valence).
  • This molar ratio is preferably in the range of 0.6 Zn to: LOZn, more preferably in the range of 0.7 / n to 8 / n.
  • n is a cation component In the case of monovalent compounds such as potassium, potassium and ammonia, it is 1, and the molar ratio is in the range of 0.4-12.
  • N is 2 when the cation component is divalent, such as magnesimu, and the molar ratio is in the range of 0.2-6. Furthermore, n is 3 when the cation component is trivalent such as aluminum, and the molar ratio is in the range of 0.4Z3-4.
  • the amount of the condensed phosphate added is either short-term or long-term when the molar ratio of the cation component constituting the condensed phosphate to magnesium derived from the magnesium-containing compound is less than 0.4 Zn. F stability is also poor. If this molar specific force exceeds 12Zn, short-term stability is good, but long-term stability tends to decrease.
  • an abrasive base comprising dibasic calcium phosphate anhydrate as a main component and containing magnesium and a condensed phosphate.
  • This polishing base has a suppressed reactivity with a fluorine compound, particularly sodium fluoride.
  • the condensed phosphate is the same as that described in the above production method.
  • the polishing base of the present invention has a magnesium content in the range of 1500 to 5000 ppm, and the content of the cation component constituting the condensed phosphate is as a molar ratio to the magnesium content of 0.4 Zn to It is in the range of 12Zn.
  • the magnesium content is preferably in the range of 1700 to 4000 ppm, more preferably in the range of 2000 to 3000 ppm.
  • the magnesium content of the polishing base of the present invention includes the magnesium amount derived from the magnesium-containing compound newly added in the preparation of the polishing base and the magnesium compound contained as an impurity in the dicalcium phosphate anhydrous. This is the total amount of magnesium derived from the product.
  • the amount of magnesium derived from the magnesium compound contained as an impurity in dibasic calcium phosphate anhydrate depends on the type of CaO (origin) that is the raw material of the dibasic calcium phosphate anhydrate and the production of dibasic calcium phosphate anhydrate.
  • the content of the cation component constituting the condensed phosphate is the content of magnesium (magnesium derived from a magnesium-containing compound newly added in the preparation of the polishing base.
  • a molar ratio to the total amount of magnesium derived from the magnesium compound contained as an impurity in the dicalcium phosphate anhydrate) is in the range of 0.4 Zn to 12 Zn, preferably in the range of 0.6 Zn to LOZn. More preferably, it is in the range of 0.7 Zn to 8 Zn.
  • Reactivity with fluorine compounds, especially sodium fluoride, is suppressed for a long time because the content of the cation component constituting the condensed phosphate is in the range of 0.4 Zn to 12 Zn as a molar ratio to the magnesium content.
  • short-term and long-term F stability is also improved.
  • the polishing base of the present invention has a stability with a residual F concentration of 700 ppm or more at 50 ° C. for 30 days in the test method described later in the presence of lOOOppm sodium fluoride. That is, in the present invention, “in which the reactivity with sodium fluoride is suppressed” means that the residual F concentration shows 700 ppm or more in the test under the above conditions.
  • the mixed sample was heat-treated in an oven at 200 ° C. for 2 hours to obtain an abrasive base sample 1 of the present invention.
  • ICP inductively coupled radio frequency plasma spectroscopy
  • the existing amount of the magnesium-containing compound in the polishing base sample 1 obtained by the heat treatment was 3600 ppm as the amount of magnesium with respect to the dicalcium phosphate phosphate non-hydrate. there were.
  • the amount of sodium present was 4000 ppm as a result of ICP (inductively coupled radio frequency plasma spectroscopy) analysis as described above.
  • the molar ratio of sodium to magnesium was 1.17.
  • the sample was mixed by shaking for about 5 minutes by hand, and the mixed sample was heat-treated in an open system for 1 hour in a 230 ° C drier to prepare a comparative sample.
  • the abundance of magnesium and sodium in the comparative sample obtained by heat treatment was determined by ICP analysis in the same manner as described above.
  • the magnesium content power is 3600 ppm, which is in the range of 500 to 5000 ppm, and the sodium content is 1.17 in a molar ratio with respect to the magnesium content of 0.5 to 9.
  • Polishing base 1 based on dicalcium phosphate phosphate as the main component has excellent stability against fluoride fluoride that can be put to practical use with a residual F concentration of 700 ppm or more at 50 ° C for 30 days. It was a thing.
  • the present invention wherein the magnesium content is 2310ppm, which is in the range of 1500 to 5000ppm, and the sodium content is 2.42 in terms of a molar ratio to the magnesium content of 0.5-9.
  • Abrasive base 2 based on dicalcium phosphate dibasic acid as a main component has excellent residual F concentration with a residual F concentration of 700 ppm or more at 50 ° C for 30 days. I had it.
  • Magnesium content power of 2150 ppm which is in the range of 500 to 5000 ppm, and sodium content is 2.93 in a molar ratio with respect to magnesium content of 0.5-9.
  • Abrasive base 3 based on dibasic calcium phosphate anhydrate is excellent in practical use for sodium fluoride with a residual F concentration of 700 ppm or more at 50 ° C for 30 days. It was a thing.
  • the sodium content is in the range of 0.5 to 9 as a molar ratio to the magnesium content of 3.95, but the magnesium content is outside the range of 1500 to 5000 ppm. 1340ppm.
  • the residual F concentration at 50 ° C. for 30 days was 16 ppm, and the inhibitory effect on the reactivity with the fluorine compound was strong.
  • TFC Tosohichi's Finechem Co., Ltd. product DCP—C 100g, Mg (PO) ⁇ 8 ⁇ 0 (No. 3 Magnesium phosphate) 1.
  • Magnesium and sodium abundances were determined by ICP analysis as described above.
  • the F stability evaluation and composition analysis of this sample were performed in the same manner as described above. The results are shown in Table 2.
  • Patent Document 1 From the above results, it can be seen from Patent Document 1 that the polishing agent I described in the Examples is much more stable against sodium fluoride than the polishing base of the present invention. It can be seen that there is no stability against low and practical levels of fluorinated agents.
  • Patent Document 1 sodium monofluorophosphate is used as a fluorine agent, and its stability against sodium fluoride has been tested.
  • the heating conditions were 150 ° C. and 2 hours.
  • this condition is changed to 230 ° C, which is slightly higher than the processing temperature of Example 1 above, and when the amount of applied force of Z or Mg (PO) ⁇ 8 ⁇ 0 (tertiary magnesium phosphate) is increased.
  • Patent Document 1 the polishing agent I described in the Examples is still stable against sodium fluoride even when the temperature of the heat treatment and the amount of tribasic magnesium phosphate are changed. It can be seen that even if these polishing agents I are further modified compared to the polishing base of the present invention, the polishing agents I are further modified so that they do not have a practical level of stability to fluorine agents.
  • TFC product DCP-C Mg concentration: 1630ppm
  • sodium pyrophosphate 4.21wt% calorie put in screw cap type plastic container (0.3L), mix in the same way as in Example 1, then 230 ° C
  • heat treatment was performed for 1 hour to obtain an abrasive sample.
  • Evaluation of F stability of this sample was performed in the same manner as in Example 1 above. Magnesium and sodium abundances were determined by ICP analysis as described above. The results are shown in Table 4.
  • TFC product DCP-A (Mg concentration: 1710 ppm) 30 g of sodium pyrophosphate is added to a screw cap type plastic container (0.3 L) and mixed in the same manner as in Example 1, then 230 ° C. In the dryer, heat treatment was performed for 1 hour to obtain an abrasive sample. Evaluation of F stability of this sample was performed in the same manner as in Example 1 above. Magnesium and sodium abundances were determined by ICP analysis as described above. The results are shown in Table 5.
  • Dibasic calcium phosphate anhydrate was synthesized in the same manner as in Example 1. Second synthesized The Mg concentration of the anhydrous calcium phosphate was 1850 ppm.
  • the polishing base of the present invention can be used as a polishing base for brushing teeth.
  • FIG. 1 Thermal analysis of anhydrous dibasic calcium phosphate after heat treatment in Example 5 (TG).
  • FIG. 2 shows the result of thermal analysis (TG DTA) of dicalcium phosphate phosphate before heat treatment in Example 5.

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Abstract

Base d'abrasif dont la réaction avec NaF est inhibée ; et procédé servant à produire la base d'abrasif. Le procédé pour la production d'une base d'abrasif comprend le chauffage du phosphate secondaire de calcium anhydre en présence d'un composé du magnésium et d'un polyphosphate. La quantité du composé du magnésium devant être présent en termes de quantité de magnésium est comprise dans l'intervalle de 1 500-5 000 ppm par rapport au phosphate secondaire de calcium anhydre. La quantité du polyphosphate devant être présent est telle que le rapport molaire de l'ingrédient cation en tant que composant du polyphosphate sur le magnésium présent dans le composé du magnésium va de 0,4/n à 12/n (où n est la valence de l'ingrédient cation). On effectue le chauffage à une température comprise dans l'intervalle de 100-300°C. La base d'abrasif contient du magnésium et un polyphosphate et comprend, comme composant principal, du phosphate secondaire de calcium anhydre dont la réaction avec un composé du fluor est inhibée. La teneur du magnésium est de 1 500-5 000 ppm et le rapport molaire de l'ingrédient cation contenu en tant que composant du polyphosphate sur le magnésium contenu va de 0,4/n à 12/n.
PCT/JP2006/306900 2005-04-04 2006-03-31 Base d'abrasif dont la réaction avec un composé du fluor est inhibée et procédé servant à produire celle-ci WO2006106947A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007145287A1 (fr) * 2006-06-16 2007-12-21 Mandom Corporation Détachant oral et composition orale
WO2014188067A1 (fr) * 2013-05-20 2014-11-27 Kemira Oyj Composition anti-tartre et son utilisation

Citations (4)

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