WO2005010525A1 - Vacuum-packed solid support array and process for producing the same - Google Patents
Vacuum-packed solid support array and process for producing the same Download PDFInfo
- Publication number
- WO2005010525A1 WO2005010525A1 PCT/JP2004/000595 JP2004000595W WO2005010525A1 WO 2005010525 A1 WO2005010525 A1 WO 2005010525A1 JP 2004000595 W JP2004000595 W JP 2004000595W WO 2005010525 A1 WO2005010525 A1 WO 2005010525A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solid support
- vacuum
- substrate
- packed
- nucleic acid
- Prior art date
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- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
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- 239000003575 carbonaceous material Substances 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
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- 239000003795 chemical substances by application Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
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- 239000011651 chromium Substances 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
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- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- YZUCHPMXUOSLOJ-UHFFFAOYSA-N ethyne;thorium Chemical compound [Th].[C-]#[C] YZUCHPMXUOSLOJ-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- ZDXPYRJPNDTMRX-UHFFFAOYSA-N glutamine Natural products OC(=O)C(N)CCC(N)=O ZDXPYRJPNDTMRX-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 description 1
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
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- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 150000003022 phthalic acids Chemical class 0.000 description 1
- JOHZPMXAZQZXHR-UHFFFAOYSA-N pipemidic acid Chemical compound N1=C2N(CC)C=C(C(O)=O)C(=O)C2=CN=C1N1CCNCC1 JOHZPMXAZQZXHR-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- MHMUCYJKZUZMNJ-OWOJBTEDSA-N trans-3-chloroacrylic acid Chemical compound OC(=O)\C=C\Cl MHMUCYJKZUZMNJ-OWOJBTEDSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- LESVOLZBIFDZGS-UHFFFAOYSA-N vamidothion Chemical compound CNC(=O)C(C)SCCSP(=O)(OC)OC LESVOLZBIFDZGS-UHFFFAOYSA-N 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00497—Features relating to the solid phase supports
- B01J2219/00527—Sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
- B01J2219/00608—DNA chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
- B01J2219/00623—Immobilisation or binding
- B01J2219/00626—Covalent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00659—Two-dimensional arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00718—Type of compounds synthesised
- B01J2219/0072—Organic compounds
- B01J2219/00722—Nucleotides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00718—Type of compounds synthesised
- B01J2219/0072—Organic compounds
- B01J2219/00725—Peptides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/508—Containers for the purpose of retaining a material to be analysed, e.g. test tubes rigid containers not provided for above
Definitions
- the present invention relates to a vacuum-packed solid support array, in which a plurality of solid supports are aligned and fixed on a substrate, and are vacuum-packed.
- PCR Polymerase Chain Reaction
- PCR it is possible to amplify a large number of target sequences with high accuracy, and to amplify efficiently in a short period of time. Widely used for inspection and inspection.
- the principle of PCR is based on temperature control, and the reaction is carried out by repeating heating and cooling (thermal cycle). That is, after the denatured double-stranded DNA molecule to be amplified is denatured to a single-stranded high-temperature, it is cooled and the primer selected to complement a part of the DNA is annealed, and then heated again. Then, the DNA polymerase is used to extend the DNA behind the primer. By repeating the denaturation, anneal, and elongation processes in multiple cycles, multiple double-stranded DNAs can be amplified.
- WO 00/22108, WO 02/12891, or JP-A-2002-82116 discloses that DNA can be easily immobilized and DNA is replicated by a DNA amplification reaction.
- a suitable support a solid support in which a surface treatment layer and a chemically modified layer having a functional group capable of covalently binding to a nucleic acid molecule are sequentially provided on the surface of a substrate is disclosed.
- Japanese Patent Application Publication No. 2000-516727 also discloses a solid support for immobilizing a protein for the purpose of comprehensively analyzing the protein.
- Such a solid support is usually commercially available in a container and sealed. Further, such solid supports are taken out one by one from a container and spotted separately, or detection by a hybridization reaction or the like is performed. Therefore, there is a problem in the analysis efficiency and convenience of the sample. Disclosure of the invention
- the present inventors have developed a solid having a functional group capable of covalently binding to a nucleic acid molecule or protein. After extensive studies on the storage stability of the support, solid supports having an active ester group as a functional group capable of covalently binding to nucleic acid molecules can be left in the air or simply sealed in a container. It has been found that storage alone significantly reduces the amount of nucleic acid molecules or proteins that can be immobilized.
- An object of the present invention is to improve the storage stability of a solid support having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein on a substrate, and further improve the storage stability of such a solid support. It is to improve efficiency and convenience.
- the present inventors have found that by vacuum-packing the solid support, a decrease in the storage stability of the solid support can be significantly prevented. Furthermore, it has been found that the efficiency and convenience in handling the solid support can be improved by aligning and fixing a plurality of the solid supports on a substrate and vacuum-packing the solid support.
- the present invention includes the following inventions.
- a solid support array in which a plurality of solid supports having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or protein are aligned and immobilized on a substrate, and are vacuum-packed.
- Vacuum-packed solid support array characterized by:
- the storage stability of a solid support having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or protein is improved, and a plurality of solid supports can be simultaneously treated.
- FIG. 1 is a plan view illustrating an embodiment of the solid support array of the present invention.
- FIG. 2A is a plan view illustrating an embodiment of the solid support array of the present invention.
- FIGS. (B) to (e) are perspective views showing a manufacturing process until a solid support array is formed from the substrate of the present invention.
- FIG. 3 is a diagram showing the results of Test Example 1. BEST MODE FOR CARRYING OUT THE INVENTION
- the solid support in the solid support array of the present invention has a structure having a surface treatment layer and / or an electrostatic layer on a substrate, if necessary.
- Examples of the material of the substrate used in the present invention include silicon, glass, fiber, wood, paper, ceramics, and plastics (eg, polyester resin, polyethylene Resin, polypropylene resin, ABS resin (Acrylonitrile Butadiene Styrene resin), nylon, acrylic resin, fluororesin, polycarbonate resin, polyurethane resin, methylpentene resin, phenol resin, melamine resin, epoxy resin, vinyl chloride resin), Metals (eg, stainless steel, nickel, titanium, aluminum).
- plastics eg, polyester resin, polyethylene Resin, polypropylene resin, ABS resin (Acrylonitrile Butadiene Styrene resin), nylon, acrylic resin, fluororesin, polycarbonate resin, polyurethane resin, methylpentene resin, phenol resin, melamine resin, epoxy resin, vinyl chloride resin
- Metals eg, stainless steel, nickel, titanium, aluminum).
- carbides such as hafnium carbide, niobium carbide, silicon carbide, tantalum carbide, thorium carbide, titanium carbide, uranium carbide, tungsten carbide, zirconium carbide, molybdenum carbide, chromium carbide, and vanadium carbide may be used.
- soft diamond is a general term for an incomplete diamond structure, which is a mixture of diamond and carbon, such as so-called diamond-like carbon (DLC), and the mixing ratio is not particularly limited.
- the surface-treated substrate there is a substrate in which soft diamond is formed on a slide glass.
- Such substrates may be diamond-like carbon, hydrogen gas 0 9 9 volume 0/0, the remaining methane 1 0 0 containing 1% by volume in the gas mixture, which was developed by ionization deposition Is preferred.
- the thickness of the surface treatment layer is preferably from 1 nm to 100 ⁇ m.
- the surface treatment layer of the substrate can be formed by a known method, for example, microwave plasma CVD (Chemical Vapor Deposit, method, ECRCVD (Electric Cvclotron Resonance Chemical Vapor Deposit) method, ICP (Inductive Coupled Plasma) method, DC sputtering method, ECR (Electric Cyclotron Resonance) sputtering method, ion plating method, arc ion plating method, EB (Electron Beam) evaporation method, resistance heating evaporation method It can be performed by ionization evaporation, arc evaporation, laser evaporation, or the like.
- microwave plasma CVD Chemical Vapor Deposit, method, ECRCVD (Electric Cvclotron Resonance Chemical Vapor Deposit) method, ICP (Inductive Coupled Plasma) method, DC sputtering method, ECR (Electric Cyclotron Resonance) sputtering method, ion plating method, arc ion plating method,
- the substrate used in the present invention not only the structure having the surface treatment layer formed as described above, but also synthetic diamond, high-pressure synthetic diamond, natural diamond, soft diamond (for example, diamond-like carbon), amorphous carbon Metals such as gold, silver, copper, aluminum, tungsten, and molybdenum; plastics (eg, polyester resin, polyethylene resin, polypropylene resin, ABS resin, nylon, acrylic resin, fluororesin, polycarbonate resin, polyurethane resin, methyl) Pentene resin, phenol resin, melamine resin, epoxy resin, vinyl chloride resin); a mixture of the above-mentioned metal powder, ceramic powder, etc., with the above-mentioned resin used as a binder, and bonding; raw materials of the above-mentioned metal powder, ceramic powder, etc.
- the And a sintered body at a high temperature, and a laminate or a composite of the above materials for example, a composite of diamond and another substance, (for example, a two-phase body) It may be
- the shape and size of the substrate are not particularly limited, examples of the shape include a flat plate, a thread, a sphere, a polygon, and a powder.
- the width is usually 0.:! ⁇ 10 Omm, length 0.1 ⁇ ; l O Omm, thickness 0.01 ⁇ : about 10mm.
- a single layer of Ti, Au, Pt, Nb, Cr, TiC, TiN, or the like or a composite film thereof may be formed as a reflective layer on the front or back surface of the substrate.
- the thickness of the reflective layer is preferably 10 nm or more, more preferably 100 nm or more, since it is necessary that the thickness of the reflective layer be uniform throughout.
- the surface is intentionally roughened in Ra (JISB 0601) in the range of 1 nm to 1000 nm. This Such a roughened surface is advantageous in that the surface area of the substrate increases and a large amount of DNA probes and the like can be immobilized at a high density.
- the solid support of the present invention may be provided with an electrostatic layer, if necessary, for electrostatically attracting nucleic acid molecules or proteins.
- Proteins have the property of being attracted to the cathode side on the acidic side and to the anode side on the basic side in an aqueous solution. Utilizing this property, various proteins can be selected by appropriately selecting the pH of the aqueous solution and the type of the electrostatic layer (either positively charged or negatively charged) according to the isoelectric point of the target protein. It can be attracted electrostatically.
- 3-lactoglobulin B isoelectric point 5 1
- calcium carbonate anhydrase isoelectric point 6.0
- human carbonic anhydrase isoelectric point 6.5
- the electrostatic layer is not particularly limited as long as the nucleic acid molecule or the protein is electrostatically attracted and the amount of the nucleic acid molecule or the protein immobilized is not particularly limited.
- the layer has a positive charge such as an amino group-containing compound. It can be formed using a compound.
- amino group-containing compound examples include a compound having an unsubstituted amino group (mono NH 2 ) or an amino group monosubstituted by an alkyl group having 1 to 6 carbon atoms (one NHR; R is a substituent);
- amino acid for example, ethanolamine
- the electrostatic layer may be formed without being covalently bonded to the substrate or the surface treatment layer, or may be formed to be covalently bonded to the substrate or the surface treatment layer.
- the amino group-containing compound is introduced into the film forming apparatus when the surface treatment layer is formed, whereby the amino group is formed. Is formed into a carbon-based film.
- Ammonia gas may be used as the compound to be introduced into the film forming apparatus.
- the surface treatment layer may be a multilayer in which a film containing an amino group is formed after forming the adhesion layer, and in this case, the surface treatment layer may be formed in an atmosphere containing ammonia gas.
- the electrostatic layer When the electrostatic layer is formed without being covalently bonded to the substrate or the surface treatment layer, the electrostatic layer is formed on the substrate in order to increase the affinity, that is, the adhesion between the electrostatic layer and the substrate or the surface treatment layer. It is preferable to introduce a functional group capable of covalently bonding to a nucleic acid molecule after depositing the compound having an unsubstituted or monosubstituted amino group and a carbon compound.
- the carbon compound used here is not particularly limited as long as it can be supplied as a gas. For example, methane, ethane, and propane, which are gases at normal temperature, are preferable.
- the ionization vapor deposition method As the method of vapor deposition, the ionization vapor deposition method is preferable, and the conditions of the ionization vapor deposition method are an operating pressure of 0.1 to 50 Pa and an acceleration voltage of 200 to 100 V. It is preferable.
- the electrostatic layer is formed by covalent bonding to a substrate or a surface treatment layer
- the surface of the substrate or the substrate to which the surface treatment layer has been applied is chlorinated by irradiating ultraviolet rays in chlorine gas to chlorinate the surface.
- group-containing compounds for example, polyamines such as polyallylamine, polylysine, 4,4 ′, 4 "-triaminotriphenylmethane, and triamterene are reacted to form an amino group at the end not bonded to the substrate. By introducing, an electrostatic layer can be formed.
- a reaction for introducing a functional group capable of covalently binding to a nucleic acid molecule or a protein for example, introduction of a carboxyl group using a dicarboxylic acid or a polycarboxylic acid
- introduction of a carboxyl group using a dicarboxylic acid or a polycarboxylic acid into a substrate provided with an electrostatic layer
- the substrate is immersed in a solution containing the compound having an unsubstituted or monosubstituted amino group, and then a functional group capable of covalently bonding to a nucleic acid molecule or a protein is introduced.
- the solvent for the solution include water, N-methylpyrrolidone, and ethanol.
- the substrate When a carboxylic acid group is introduced into a substrate on which an electrostatic layer has been formed using a dicarboxylic acid or a polycarboxylic acid, the substrate is activated in advance with N-hydroxysuccinimide and / or carposimides. Alternatively, the reaction is preferably carried out in the presence of N-hydroxysuccinimide and Z or carposides.
- the thickness of the electrostatic layer is 1 ⁇ ⁇ ! Preferably it is ⁇ 500 ⁇ m.
- the surface of the substrate is coated with an electrostatic layer as described above, and then chemically modified to introduce a carboxyl group.
- the compound used to introduce a carboxyl group for example, the formula: X - R '- COOH (wherein, X is a halogen atom, R 1 represents a divalent hydrocarbon group of from 1 to 1 2 carbon atoms )),
- X is a halogen atom
- R 1 represents a divalent hydrocarbon group of from 1 to 1 2 carbon atoms
- R 2 represents a single bond or a divalent hydrocarbon group having 1 to 12 carbon atoms.
- a dicarboxylic acid represented by, for example, oxalic acid, malonic acid, succinic acid, maleic acid, fumaric acid, and phthalic acid Acids; polycarboxylic acids such as polyacrylic acid, polymethacrylic acid, trimellitic acid, butanetracarboxylic acid; formula: R 3 — CO— R 4 — COOH (wherein R 3 represents a hydrogen atom or a divalent hydrocarbon group having 1 to 12 carbon atoms, and R 4 represents a divalent hydrocarbon group having 1 to 12 carbon atoms.
- Monohalides of dicarboxylic acids such as succinic monochloride, malonic monochloride; acid anhydrides such as phthalic anhydride, succinic anhydride, anhydrous oxalic acid, maleic anhydride, and butanetetracarboxylic anhydride. are listed.
- the carboxyl group introduced as described above can be combined with a dehydrating condensing agent such as cyanamide-d-carboimide (eg, 11- [3- (dimethylamino) propyl] -13-ethylcarbodiimide) and N-hydroxy.
- cyanamide-d-carboimide eg, 11- [3- (dimethylamino) propyl] -13-ethylcarbodiimide
- Active esterification succinimidylation
- succinimidylation can be carried out with a compound of succinimide.
- X—C (R 6 ) H-COOR 7 (where X is a halogen atom, R 6 is a hydrogen atom, a phenyl group or an alkyl group having 1 to 12 carbon atoms, and R 7 is a monovalent carbon atom.
- the present invention enables simultaneous processing of a plurality of solid supports by aligning and immobilizing the plurality of solid supports on a substrate, thereby improving the efficiency and convenience in using the solid supports. It is to let.
- the material of the substrate 1 for aligning and fixing the solid support 2 is, for example, silicon, glass, fiber, wood, paper, ceramics, plastic (for example, polyester resin, polyethylene resin, polypropylene resin). , ABS resin ( Acrylonitrile Butadiene Styrene resin), Nylon, Acrylic resin, Fluororesin, Polycarbonate resin, Polyurethane resin, Methylpentene resin, Phenol resin, Melamine resin, Epoxy resin, Chloride chloride resin), Metal (for example, Stainless steel, Nickel, Titanium, Aluminum, aluminum alloys).
- the substrate 1 of the present invention is usually in the form of a flat plate, and its size is not particularly limited as long as it can fix a plurality of solid supports 2, but it is usually 0.1 to 200 mm in width and 0.2 to 200 mm in length.
- the thickness is about 0.1 to 20 mm and the thickness is about 0.1 to 10 mm.
- the solid support 2 may be cut and divided and immobilized on a substrate.
- the substrate 1 preferably has a tackifier for immobilizing the solid support 2.
- the tackifier refers to a material having tackiness.
- the tackifier examples include Tatsukiroll 101 (Taoka Chemical), Hitachil 1501 (Hitachi Kasei), and denatured alkylphenol formaldehyde. Resin (Takikuronore 130), hitanol 501 and the like.
- the solid support 2, adhesive tape or acrylic as good D adhesive tape be immobilized by Ri substrate 1 in an adhesive, polyiso-butylene, SBR, butyl rubber, chloroprene rubber, chloride bi - Honoré - acetic acid Vinyl copolymer and polybutyral can be used, and benzoic acid resin, polybutene, and bamidothion can be used as the adhesive.
- a plurality of solid supports 2 are aligned and immobilized on a substrate.
- To be aligned and fixed means to be arranged in a certain order, for example, to be positionable in a device used in the art such as a spotting device. .
- a device used in the art such as a spotting device.
- the pitch between the supports is usually about 0 to 10 mm. Since a plurality of solid supports 2 are aligned and immobilized on the substrate, a plurality of types of solid supports 2 are installed at once in a spotting device or the like, and the positioning of the device is set.
- Nucleic acid molecules and the like can be spotted on a plurality of solid supports as they are, and the operation of immobilizing nucleic acid molecules or proteins on the solid support 2 can be performed efficiently and quickly.
- a plurality of solid supports 2 on a solid on which nucleic acid molecules or proteins are immobilized may be used as such for a hybridization reaction, an antigen-antibody reaction or a PCR reaction, or may be removed and used separately. Is also good.
- the base 1 has the concave portion 3, and the solid support 2 may be fixed in the concave portion 3.
- the black portion corresponds to the concave portion 3.
- the size of the concave portion 3 is not particularly limited as long as the solid support 2 can be held inside the solid support 2, but each of the recesses 3 has a width of about 0.1 to 0.5 depending on the width, length and thickness of the solid support 2. It is preferable that the diameter is about mm larger.
- the width is about 0.2 to: L 00.5 ram, the length is 0.2 to: L 00.5 mm, and the depth is about 0.01 to 10 mm.
- the base 1 may have a horizontal communication path composed of the recess 3 and the groove connecting the recess 3.
- the width of the horizontal communication channel is usually about 0.1 to 10 mm. This horizontal communication path facilitates the removal of each solid support 2 from the substrate 1.
- the horizontal communication path allows the solution used for the high pre-sidation reaction and the like to smoothly spread to the fixed support 2.
- the recess 3 can be made by a method usually used in the art. For example, it can be formed by forming a tackifier on the first layer and further forming a third layer having the concave portion 3 thereon.
- a three-layer substrate 1 can be manufactured by a method commonly used in the art, for example, a photolithography. It can be manufactured by methods, press molding, extrusion molding, die molding, three-layer bonding, injection molding, etc.
- the concave portion 3 can be formed by performing press molding on a metallic base. In this case, it is preferable that a tackifier for fixing the solid support 2 be present on the bottom surface of the concave portion 3 formed by pressing.
- the substrate 1 preferably has a through hole smaller than the size of the solid support 2 in a portion holding the solid support 2.
- the through hole facilitates drainage of the activating liquid and facilitates removal of the solid support 2.
- the solid support array 6 into which the active ester group has been introduced as described above is left alone in the air or simply sealed and stored in a container to reduce the amount of nucleic acid molecules or proteins that can be immobilized. Since the solid support 2 has a plurality of solid supports 2 immobilized on the substrate, the solid support array 6 is placed in a vacuum packing bag and vacuum-packed. By vacuum packing, it is possible to remarkably prevent a decrease in the amount of immobilized nucleic acid molecules and the like.
- the material of the vacuum-packing bag there is no particular limitation on the material of the vacuum-packing bag as long as it does not allow water and oxygen to pass through.
- stacked or vapor-deposited the metal is mentioned.
- the thickness of the film used for the vacuum bag is not particularly limited, and a film having an appropriate mechanical strength can be used according to the weight of the contents. Thick ones are preferred. If it is less than 20 ⁇ , mechanical strength tends to be insufficient, and if it exceeds 300 / m, handleability is poor.
- a structure in which two films constituting the bag for vacuum packing are overlapped and three sides thereof are laminated is preferable.
- the solid support array 6 is preferably dried under reduced pressure before the solid support array 6 is vacuum-packed.
- the temperature during drying under reduced pressure is preferably _
- the temperature during vacuum packing is preferably 15 to 100 ° C, more preferably 25 to 50 ° C.
- the pressure at the time of vacuum packing is preferably 1 to 1 ⁇ 1 CT s torr, more preferably 1 ⁇ 10 ⁇ 1 to 1 ⁇ 1 CT 4 torr.
- the solid support 2 is directly sealed in the bag for vacuum packing so as to minimize the space volume.
- the vacuum-packed solid support 2 of the present invention can be used for immobilization of any nucleic acid molecule of DNA or RNA.
- the number of bases of DNA and RNA is usually 1 to 200, preferably 5 to 150.
- DNA can be immobilized in either single-stranded or double-stranded form. It can also be used for immobilizing various proteins.
- the solid support immobilized on a plurality of substrates may be directly subjected to the immobilization reaction, or the solid supports 2 may be separately removed from the substrate 1 and then individually subjected to the immobilization reaction. .
- the terminal base of the oligonucleic acid is immobilized to the active esterified carboxyl group by hydrogen bonding, and the DNA having a base sequence complementary to this oligonucleic acid is further immobilized. It can also be used as a DNA library chip. Also, instead of DNA, nucleotides, oligonucleotides, DNA fragments, proteins and the like can be immobilized to give a library.
- a plurality of solid supports 2 on which nucleic acid molecules or proteins are immobilized may be immobilized on a substrate and vacuum-packed.
- Such a solid support array 6 is open After the sealing, the solid support 2 can be used as it is or after removing each one of the solid supports 2 from the substrate and used for an elongation reaction or a hybridization reaction of a nucleic acid molecule or the like.
- a 0.46 mm deep grating groove (3 mm x 3 mm) was formed on a silicon wafer with a thickness of 0.625 mm and a diameter of 2.5 inch using an Nd-YAG laser.
- a DLC layer was formed to a thickness of 10 nm on this silicon wafer at an accelerating voltage of 0.5 kV using a gas mixture of 95% by volume of methane gas and 5% by volume of hydrogen as a raw material. Thereafter, ammonia gas was inserted into the first chamber at a rate of 5 cm 3 / min. Amination was performed by treating the DLC surface with ammonia plasma at an operating pressure of 2 Pa.
- a 5% aqueous solution of polyacrylic acid was applied to the slide glass and dried, and then insolubilized by ultraviolet irradiation for 60 minutes. Then, in 300 ml of 0.1M phosphate buffer (pH6), 0.1M of 1- [3- (dimethylamino) propyl] _3-ethylcarboimide and 1 ⁇ -hydroxysuccinyl of 20111] ⁇ to obtain a solid support having an active ester group by immersing for 30 minutes in the activation solution obtained by dissolving bromide was dried at 100 ° C, 1 X 10 _ 2 torr.
- polyacrylic acid was added as polyvalent carboxylic acid to the amino group of the surface treatment layer composed of methane and ethylenediamine in the presence of 0.1M 1- [3- (dimethylamino) propyl] -13-ethylcarpo- imide.
- 0.1 M phosphate buffer (pH 6) in 300 ml of 0.1 M 1- [3- (dimethylamino) propyl] -13-ethylcarbodiimide and 20 mM N-hydroxysuccinimide
- the solid support having an active ester group was obtained by immersing it in an activating solution in which the solid support was dissolved for 30 minutes, and dried at 100 ° C. and 1 ⁇ 1 O ′ 2 torr.
- a 10-nm-thick DLC layer was formed at an accelerating voltage of 0.5 kV from a gas mixture of 95% by volume of methane gas and 5% by volume of hydrogen by ionization evaporation. Then, it was chlorinated by irradiating it with ultraviolet light for 30 minutes in chlorine gas. Thereafter, the substrate was immersed in an aqueous solution of polyallylamine (0.1 g / 1) to form an electrostatic layer.
- polyacrylic acid was polycondensed to the amino group of the electrostatic layer as a polyvalent carboxylic acid in the presence of 0.1 M of 111- [3- (dimethylamino) propyl]-(3-ethylcarbodiimide).
- 0.1 M phosphate buffer (pH 6) in 300 ml of an activation solution containing 0.11-11- [3- (dimethylamino) propyl] -13-ethylcarbodiimide and 20 mM N-hydroxysuccinimide a solid support having an active ester group by immersing 30 minutes, which was drying at 100 ° C, 1 X 10- 2 torr.
- a 5% aqueous solution of polyacrylic acid was applied to a slide glass on which DLC was formed to a thickness of 10 nm, dried and then insolubilized by irradiation with ultraviolet light for 60 minutes. Then, in 300 ml of 0.1 M phosphate buffer (pH 6), 0.1 M of 1- [3- (dimethylamino) propyl] -131-ethylcarbodiimide and 20 mM of N-hydroxysuccinimide
- the solid support having an active ester group was obtained by immersing the substrate in an activation solution in which the medium was dissolved for 30 minutes, and dried at 100 ° C. and 1 ⁇ 1 (T 2 torr).
- a plurality of holes slightly smaller than the solid support 2 obtained in the production example were punched out in a grid shape using a press machine on a 0.625 mm thick JIS 3004 aluminum alloy plate. In this way, an upper plate 5 having a plurality of through holes in a lattice was prepared.
- the solid support 2 of 3 mm square obtained in Production Example 1 was subjected to chip transfer equipment SCH (Sanyo High-Technology Co., Ltd.) as shown in FIGS. 2 (b) to 2 (c). It was arranged in the recess 3 of the substrate (FIG. 2 (a)).
- chip transfer equipment SCH Sanyo High-Technology Co., Ltd.
- FIGS. 2 (b) to 2 (c) It was arranged in the recess 3 of the substrate (FIG. 2 (a)).
- an upper plate 5 was placed as a cover on the substrate 1, and four end portions of each solid support 2 were pressed. Since the through-hole of the upper plate 5 is slightly smaller than the solid support 2 fixed on the base, the solid support 2 is fixed by pressing the end of the solid support 2 with the surface of the solid support 2 exposed. be able to. The surface of the solid support 2 is exposed as much as possible.
- the solid support array 6 shown in FIG. 2 (e) manufactured in Example 2 was individually placed in a polyethylene bag laminated with aluminum, and was evacuated using a vacuum packing device so that there was no space. X1 (packed after evacuation to T 2 torr. The substrate was stored for 30 days in an oven set at 40 ° C., and the amount of immobilized oligonucleotide was measured. The nucleotide immobilization performance was almost the same as the initial performance.
- the Cy3-labeled oligonucleotide was immobilized as follows.
- 0.1 ⁇ g / ⁇ 1 was prepared; about 1 n1 of 500 b ⁇ of Cy3-labeled double-stranded DNA amplified by PCR using LDNA as type ⁇ was cut into a substrate (opened) using a microarray maker. On a solid support). Then, after heating in an oven at 80 ° C. for 3 hours, the plate was washed with 2 ⁇ S SCZ0.2% SDS, and the fluorescence intensity of the spotted DNA was measured.
- the intensity immediately after activation or immediately after purchase is set to 1, and the intensity after 1 day, 10 days, or 30 days is divided by the intensity immediately after activation or immediately after purchase. Rate.
- the sample that was vacuum-packed directly into the film had the highest residual ratio, and hardly changed even after 30 days.
- the sample left in the air had the lowest residual rate and a large deterioration with time.
- the storage stability of the solid support 2 having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein on a substrate can be improved.
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Abstract
It is intended to improve the storage safety of a solid support which has an active ester group as a functional group capable of forming a covalent bond with a nucleic acid molecule or a protein on a substrate. It is also intended to improve the efficiency and convenience in using the above solid support. A vacuum-packed solid support array (6) wherein a plural number of solid supports (2) having an active ester group as a functional group capable of forming a covalent bond with a nucleic acid molecule or a protein are aligned and immobilized on a substrate, characterized by being vacuum-packed.
Description
明 細 書 真空パック固体支持体ァレイ及びその製造方法 技術分野 Description Vacuum-packed solid support array and method for producing the same
本発明は、 基体上に複数の固体支持体が整列して固定化され、 これが真空パッ クされていることを特徴とする真空パック固体支持体ァレイに関する。 背景技術 The present invention relates to a vacuum-packed solid support array, in which a plurality of solid supports are aligned and fixed on a substrate, and are vacuum-packed. Background art
従来、 既存の配列から核酸配列を合成する方法として、 ポリメラーゼ連鎖反応 Conventionally, polymerase chain reaction has been used to synthesize nucleic acid sequences from existing sequences.
(P CR: Polymerase Chain Reaction ) がある。 ポリメラーゼ連鎖反応 ( P C R ) とは、 目的とする DNAを 1組のプライマーで挟み、 DNAポリメラーゼを作 用させることを繰り返し、 プライマーで挟んだ領域を無限に増幅させることがで きる方法である。 (PCR: Polymerase Chain Reaction). The polymerase chain reaction (PCR) is a method in which the target DNA is sandwiched between a set of primers, and DNA polymerase is repeatedly used to infinitely amplify the region sandwiched by the primers.
P CRによれば、 目的とする配列のみをかなり正確に多数増幅させることがで き、 しかも短時間で効率よく増幅することができるので、 現在、 生化学、 医療分 野等の各種研究、 試験、 検査等に広く用いられている。 According to PCR, it is possible to amplify a large number of target sequences with high accuracy, and to amplify efficiently in a short period of time. Widely used for inspection and inspection.
従来より、 PCRの原理は温度制御にあるとされ、 その反応は加熱及び冷却の 繰り返しにより進められている (サーマルサイクル) 。 即ち、 増幅対象である二 本鎮 D N A分子を相捕的一本鎖に高温変性させた後、 冷却して該 D N Aの一部に 相補するように選択されたプライマーを鎮にァニールさせ、 再び加熱して DNA ポリメラーゼによりプライマーの後ろに DNAを伸長させるという風に、 変性、 ァニール、 伸長のプロセスを 1サイクルとして複数サイクル繰り返すことにより 二本鎖 DN Aを多数増幅することができる。 Conventionally, the principle of PCR is based on temperature control, and the reaction is carried out by repeating heating and cooling (thermal cycle). That is, after the denatured double-stranded DNA molecule to be amplified is denatured to a single-stranded high-temperature, it is cooled and the primer selected to complement a part of the DNA is annealed, and then heated again. Then, the DNA polymerase is used to extend the DNA behind the primer. By repeating the denaturation, anneal, and elongation processes in multiple cycles, multiple double-stranded DNAs can be amplified.
具体的には、 1) 二本鎖 DNAの水素結合をほどくために試料の温度を 95 °C に上昇させる、 2) 次いで DNAを複製するためのプライマーと再結合させるた
めに試料の温度を 45°Cに下降させる、 3) 更に耐熱性ポリメラーゼによりプラ イマ一を伸長させて DNAを複製させるために試料の温度を 74°Cに上昇させる 、 といった 1) 〜3) のサーマルサイクルを幾度も操り返す必要があった。 この ような DNAの増幅反応では、 試料を合成樹脂の容器などに入れ、 この容器をァ ルミェゥムブロックに収容し前記サーマルサイクルを行っていた。 Specifically, 1) raising the temperature of the sample to 95 ° C to dissociate the hydrogen bonds of the double-stranded DNA, and 2) re-bonding with the primers for replicating the DNA. 3) Raise the temperature of the sample to 74 ° C in order to extend the primer with a thermostable polymerase and replicate the DNA. Had to be cycled many times. In such a DNA amplification reaction, a sample is placed in a container of a synthetic resin or the like, and the container is accommodated in an aluminum block to perform the thermal cycle.
し力 し、 前記サーマルサイクルは多大な時間がかかり、 目的とする量の DN A を得るには数時間を要していた。 また、 加熱、 冷却による温度制御により反応を 進めると、 一瞬にして温度を変化させるには限界があり、 各段階への切り替えが スムーズにいかず、 増幅される核酸の配列の正確性に影響が出たり、 目的とする 以外の DNAも複製される場合も考えられた。 また、 迅速な温度変化をさせるた めには、 特別の装置や技術が必要となるため、 設備投資等の経済的な問題や技術 的な問題があった。 However, the thermal cycling took a long time, and it took several hours to obtain a desired amount of DNA. In addition, if the reaction is advanced by controlling the temperature by heating and cooling, there is a limit to changing the temperature instantaneously, and switching to each step cannot be performed smoothly, affecting the accuracy of the amplified nucleic acid sequence. In some cases, DNA other than the target DNA was replicated. In addition, special equipment and technology are required to achieve rapid temperature changes, and there were economic and technical problems such as capital investment.
このような問題に鑑み、 例えば W〇 00/22108、 WO 02/1 289 1 あるいは特開 2002-821 1 6号公報には、 DN Aを容易に固定化できて、 DNA增幅反応により DNAを複製するために適する支持体として、 基板の表面 に、 表面処理層、 及び核酸分子と共有結合しうる官能基を有する化学修飾層を順 次設けてなる固体支持体が開示されている。 In view of such a problem, for example, WO 00/22108, WO 02/12891, or JP-A-2002-82116 discloses that DNA can be easily immobilized and DNA is replicated by a DNA amplification reaction. As a suitable support, a solid support in which a surface treatment layer and a chemically modified layer having a functional group capable of covalently binding to a nucleic acid molecule are sequentially provided on the surface of a substrate is disclosed.
更に、 特表 2000— 51 6727号公報には、 タンパク質を網羅的に解析す る目的で、 タンパク質を固定するための固体支持体も開示されている。 Furthermore, Japanese Patent Application Publication No. 2000-516727 also discloses a solid support for immobilizing a protein for the purpose of comprehensively analyzing the protein.
このような固体支持体は、 通常、 容器に収納し、 密封した形態で市販されてい る。 また、 このような固体支持体は、 容器から 1つ 1つ取り出して、 別々にスポ ッティングされ、 又はハイブリダィズ反応による検出等が行われている。 そのた め、 試料の分析効率及び便宜性において問題がある。 発明の開示 Such a solid support is usually commercially available in a container and sealed. Further, such solid supports are taken out one by one from a container and spotted separately, or detection by a hybridization reaction or the like is performed. Therefore, there is a problem in the analysis efficiency and convenience of the sample. Disclosure of the invention
本発明者らは、 核酸分子又はタンパク質と共有結合しうる官能基を有する固体
支持体の保存安定性について、 鋭意研究を重ねた結果、 核酸分子と共有結合しう る官能基として活性エステル基を有する固体支持体は、 空気中に放置したり、 又 は単に容器中に密封保存しただけでは、 固定化できる核酸分子又はタンパク質の 量が著しく低下することを見出した。 The present inventors have developed a solid having a functional group capable of covalently binding to a nucleic acid molecule or protein. After extensive studies on the storage stability of the support, solid supports having an active ester group as a functional group capable of covalently binding to nucleic acid molecules can be left in the air or simply sealed in a container. It has been found that storage alone significantly reduces the amount of nucleic acid molecules or proteins that can be immobilized.
本発明の課題は、 基板上に、 核酸分子又はタンパク質と共有結合しうる官能基 として活性エステル基を有する固体支持体の保存安定性を向上させ、 更にこのよ うな固体支持体を极う場合の効率性及び便宜性を向上させることにある。 An object of the present invention is to improve the storage stability of a solid support having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein on a substrate, and further improve the storage stability of such a solid support. It is to improve efficiency and convenience.
本発明者らは、 前記固体支持体を真空パックすることにより、 固体支持体の保 存安定性の低下を顕著に防止できることを見出した。 更に、 前記固体支持体を基 体上に複数整列して固定化し、 これを真空パックすることにより、 該固体支持体 を扱う際の効率性かつ便宜性が改善されることを見出した。 The present inventors have found that by vacuum-packing the solid support, a decrease in the storage stability of the solid support can be significantly prevented. Furthermore, it has been found that the efficiency and convenience in handling the solid support can be improved by aligning and fixing a plurality of the solid supports on a substrate and vacuum-packing the solid support.
即ち、 本発明は以下の発明を包含する。 That is, the present invention includes the following inventions.
( 1 ) 核酸分子又はタンパク質と共有結合しうる官能基として活性エステル基を 有する固体支持体が、 基体上に複数整列して固定化されてなる固体支持体アレイ であって、 真空パックされていることを特徴とする真空パック固体支持体ァレイ (1) A solid support array in which a plurality of solid supports having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or protein are aligned and immobilized on a substrate, and are vacuum-packed. Vacuum-packed solid support array characterized by:
( 2 ) 基体が凹部を有し、 固体支持体が該凹部に固定化されている (1 ) に記載 の真空パック固体支持体ァレイ。 (2) The vacuum-packed solid support array according to (1), wherein the substrate has a concave portion, and the solid support is fixed to the concave portion.
( 3 ) 固体支持体が、 更に核酸分子又はタンパク質を静電的に引き寄せるための 静電層を有する (1 ) 又は (2 ) に記載の真空パック固体支持体アレイ。 (3) The vacuum-packed solid support array according to (1) or (2), wherein the solid support further has an electrostatic layer for electrostatically attracting nucleic acid molecules or proteins.
( 4 ) 核酸分子が D N Aである (1 ) 〜 (3 ) のいずれかに記載の真空パック固 体支持体アレイ。 (4) The vacuum-packed solid support array according to any one of (1) to (3), wherein the nucleic acid molecule is DNA.
( 5 ) 活性エステル基が、 カルボキシル基がスクシンィミジル化されてなる活性 エステル基である (1 ) 〜 (4 ) のいずれかに記載の真空パック固体支持体ァレ ィ。 (5) The vacuum-packed solid support array according to any one of (1) to (4), wherein the active ester group is an active ester group obtained by succinimidylating a carboxyl group.
( 6 ) 核酸分子又はタンパク質と共有結合しうる官能基として活性エステル基を
有する固体支持体を基体上に複数整列して固定化し、 これを真空パック用袋に入 れて真空パックすることを特徴とする、 (1 ) 〜 (5 ) のいずれかに記載の真空 パック固体支持体ァレイの製造方法。 ' (6) An active ester group as a functional group capable of covalently binding to a nucleic acid molecule or protein. The vacuum-packed solid according to any one of (1) to (5), wherein a plurality of the solid supports having the same are aligned and fixed on a substrate, and the solid support is placed in a vacuum-packing bag and vacuum-packed. A method for producing a support array. '
( 7 ) 前記固体支持体アレイを 5 0〜 2 0 0 °Cで減圧乾燥後、 真空パックする ( 6 ) に記載の製造方法。 (7) The production method according to (6), wherein the solid support array is dried under reduced pressure at 50 to 200 ° C. and vacuum-packed.
( 8 ) 前記固体支持体アレイを真空パック用袋に入れ、 真空引き後、 不活性ガス で圧戻しして再度真空引きする操作を少なくとも 1回行った後、 真空パックする (8) Put the solid support array in a bag for vacuum packing, evacuate, depressurize with inert gas, and evacuate again at least once, then vacuum pack
( 6 ) 又は (7 ) に記載の製造方法。 The production method according to (6) or (7).
本発明によれば、 核酸分子又はタンパク質と共有結合しうる官能基として活性 エステル基を有する固体支持体の保存安定性を向上させるとともに、 複数の固体 支持体を同時に処 According to the present invention, the storage stability of a solid support having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or protein is improved, and a plurality of solid supports can be simultaneously treated.
理することを可能とし、 固体支持体を用いる際の効率性及び便宜性を向上させる ことができる。 また、 複数の固体支持体が単一の形態で真空パックされているた め、 出荷形態として好適である。 図面の簡単な説明 Thus, efficiency and convenience in using a solid support can be improved. Also, since a plurality of solid supports are vacuum-packed in a single form, they are suitable as a shipping form. Brief Description of Drawings
'図 1は、 本発明の固体支持体アレイの一実施形態を表す平面図である。 図 2 ( a ) は本発明の固体支持体アレイの一実施形態を表す平面図である。 図 (b ) 〜 ( e ) は、 本発明の基体から固体支持体アレイを作るまでの製造工程を示す斜視 図である。 図 3は、 試験例 1の結果を示す図である。 発明を実施するための最良の形態 FIG. 1 is a plan view illustrating an embodiment of the solid support array of the present invention. FIG. 2A is a plan view illustrating an embodiment of the solid support array of the present invention. FIGS. (B) to (e) are perspective views showing a manufacturing process until a solid support array is formed from the substrate of the present invention. FIG. 3 is a diagram showing the results of Test Example 1. BEST MODE FOR CARRYING OUT THE INVENTION
本発明の固体支持体アレイにおける固体支持体は、 基板上に、 必要に応じて、 表面処理層及び _ /又は静電層を有する構造を有する。 The solid support in the solid support array of the present invention has a structure having a surface treatment layer and / or an electrostatic layer on a substrate, if necessary.
本発明に用いる基板の材料としては、 例えば、 シリコン、 ガラス、 繊維、 木材 、 紙、 セラミックス、 プラスチック (例えば、 ポリエステル樹脂、 ポリエチレン
樹脂、 ポリプロピレン樹脂、 A B S樹脂 (Acrylonitrile Butadiene Styrene樹脂)、 ナ ィロン、 アクリル樹脂、 フッ素樹脂、 ポリカーボネート樹脂、 ポリウレタン樹脂 、 メチルペンテン榭脂、 フエノール樹脂、 メラミン樹脂、 エポキシ樹脂、 塩化ビ ニル榭脂) 、 金属 (例えば、 ステンレス、 ニッケル、 チタン、 アルミニウム) が 挙げられる。 Examples of the material of the substrate used in the present invention include silicon, glass, fiber, wood, paper, ceramics, and plastics (eg, polyester resin, polyethylene Resin, polypropylene resin, ABS resin (Acrylonitrile Butadiene Styrene resin), nylon, acrylic resin, fluororesin, polycarbonate resin, polyurethane resin, methylpentene resin, phenol resin, melamine resin, epoxy resin, vinyl chloride resin), Metals (eg, stainless steel, nickel, titanium, aluminum).
基板の材料として前記のものを用いる場合には、 表面処理層を施さなくてもよ いが、 核酸分子と共有結合しうる官能基、 即ち活性エステル基を導入するための 化合物を基板上に強固に固定化するために、 表面処理を施すことがより好ましい 表面処理には、 合成ダイヤモンド、 高圧合成ダイヤモンド、 天然ダイヤモンド 、 軟ダイヤモンド (例えば、 ダイヤモンドライクカーボン) 、 アモルファスカー ボン、 炭素系物質 (例えば、 グラフアイ ト、 フラーレン、 カーボンナノチューブ ) のいずれか、 それらの混合物、 又はそれらを積層させたものを用いることが好 ましい。 また、 炭化ハフニウム、 炭化ニオブ、 炭化珪素、 炭化タンタル、 炭化ト リウム、 炭化チタン、 炭化ウラン、 炭化タングステン、 炭化ジルコニウム、 炭化 モリブデン、 炭化クロム、 炭化バナジウム等の炭化物を用いてもよい。 ここで、 軟ダイヤモンドとは、 いわゆるダイヤモンドライクカーボン (D L C : Diamond Like Carbon) 等の、 ダイャモンドとカーボンとの混合体である不完全ダイャモ ンド構造体を総称し、 その混合割合は、 特に限定されない。 When the above-mentioned material is used as the substrate material, it is not necessary to apply a surface treatment layer. It is more preferable to perform a surface treatment in order to immobilize on the surface. Synthetic diamond, high-pressure synthetic diamond, natural diamond, soft diamond (for example, diamond-like carbon), amorphous carbon, carbon-based material (for example, It is preferable to use any one of graphite, fullerene, and carbon nanotube), a mixture thereof, or a laminate thereof. Further, carbides such as hafnium carbide, niobium carbide, silicon carbide, tantalum carbide, thorium carbide, titanium carbide, uranium carbide, tungsten carbide, zirconium carbide, molybdenum carbide, chromium carbide, and vanadium carbide may be used. Here, soft diamond is a general term for an incomplete diamond structure, which is a mixture of diamond and carbon, such as so-called diamond-like carbon (DLC), and the mixing ratio is not particularly limited.
表面処理された基板の一例としては、 スライドガラスに軟ダイヤモンドを製膜 した基板が挙げられる。 このような基板は、 ダイヤモンドライクカーボンが、 水 素ガス 0〜 9 9体積0 /0、 残りメタンガス 1 0 0〜 1体積%を含んだ混合ガス中で 、 イオン化蒸着法により作成したものであることが好ましい。 As an example of the surface-treated substrate, there is a substrate in which soft diamond is formed on a slide glass. Such substrates may be diamond-like carbon, hydrogen gas 0 9 9 volume 0/0, the remaining methane 1 0 0 containing 1% by volume in the gas mixture, which was developed by ionization deposition Is preferred.
表面処理層の厚みは、 1 n m~ 1 0 0 μ mであることが好ましい。 The thickness of the surface treatment layer is preferably from 1 nm to 100 μm.
基板の表面処理層の形成は、 公知の方法、 例えば、 マイクロ波プラズマ C V D (Chemical Vapor Deposit、法、 E C R C V D (Electric Cvclotron Resonance Chemical
Vapor Deposit)法、 I C P (Inductive Coupled Plasma)法、 直流スパッタリング法、 E CR (Electric Cyclotron Resonance)スパッタリング法、 ィオンプレーティング法 、 アークイオンプレーティング法、 EB (Electron Beam)蒸着法、 抵抗加熱蒸着法 、 イオン化蒸着法、 アーク蒸着法、 レーザ蒸着法などにより行うことができる。 本発明に用いる基板としては、 前記のように表面処理層を形成した構造だけで なく、 合成ダイヤモンド、 高圧合成ダイヤモンド、 天然ダイヤモンド、 軟ダイヤ モンド (例えば、 ダイャモンドライク力一ボン) 、 アモルファスカーボン;金、 銀、 銅、 アルミニウム、 タングステン、 モリブデン等の金属 ; プラスチック (例 えば、 ポリエステル榭脂、 ポリエチレン樹脂、 ポリプロピレン樹脂、 AB S樹脂 、 ナイロン、 アクリル樹脂、 フッ素樹脂、 ポリカーボネート樹脂、 ポリウレタン 樹脂、 メチルペンテン樹脂、 フエノール樹脂、 メラミン樹脂、 エポキシ樹脂、 塩 化ビニル樹脂) ;前記金属粉末、 セラミック粉末等に、 前記樹脂をバインダーと して混合、 結合形成したもの;前記金属粉末やセラミックス粉末等の原料をプレ ス成形機で圧粉したものを高温で焼結したものが挙げられ、 また、 前記の材料の 積層体や複合体 (例えば、 ダイヤモンドと他の物質との複合体、 (例えば 2相体 ) ) であってもよレヽ。 The surface treatment layer of the substrate can be formed by a known method, for example, microwave plasma CVD (Chemical Vapor Deposit, method, ECRCVD (Electric Cvclotron Resonance Chemical Vapor Deposit) method, ICP (Inductive Coupled Plasma) method, DC sputtering method, ECR (Electric Cyclotron Resonance) sputtering method, ion plating method, arc ion plating method, EB (Electron Beam) evaporation method, resistance heating evaporation method It can be performed by ionization evaporation, arc evaporation, laser evaporation, or the like. As the substrate used in the present invention, not only the structure having the surface treatment layer formed as described above, but also synthetic diamond, high-pressure synthetic diamond, natural diamond, soft diamond (for example, diamond-like carbon), amorphous carbon Metals such as gold, silver, copper, aluminum, tungsten, and molybdenum; plastics (eg, polyester resin, polyethylene resin, polypropylene resin, ABS resin, nylon, acrylic resin, fluororesin, polycarbonate resin, polyurethane resin, methyl) Pentene resin, phenol resin, melamine resin, epoxy resin, vinyl chloride resin); a mixture of the above-mentioned metal powder, ceramic powder, etc., with the above-mentioned resin used as a binder, and bonding; raw materials of the above-mentioned metal powder, ceramic powder, etc. The And a sintered body at a high temperature, and a laminate or a composite of the above materials (for example, a composite of diamond and another substance, (for example, a two-phase body)) It may be.
基板の形状及びサイズは特に限定されないが、 形状としては、 平板状、 糸状、 球状、 多角形状、 粉末状などが挙げられ、 サイズは、 平板状のものを用いる場合 、 通常、 幅 0. :!〜 1 0 Omm、 長さ 0. 1〜; l O Omm、 厚み 0. 01〜: 1 0 mm程度である。 Although the shape and size of the substrate are not particularly limited, examples of the shape include a flat plate, a thread, a sphere, a polygon, and a powder. When a flat plate is used, the width is usually 0.:! ~ 10 Omm, length 0.1 ~; l O Omm, thickness 0.01 ~: about 10mm.
また、 基板の表面又は裏面に、 反射層として T i、 Au、 P t、 Nb、 C r、 T i C、 T i N等の単層又はこれらの複合膜を製膜してもよい。 反射層の厚みは 、 全体に均一であることが必要なため、 好ましくは 10 nm以上、 更に好ましく は 100 nm以上である。 Further, a single layer of Ti, Au, Pt, Nb, Cr, TiC, TiN, or the like or a composite film thereof may be formed as a reflective layer on the front or back surface of the substrate. The thickness of the reflective layer is preferably 10 nm or more, more preferably 100 nm or more, since it is necessary that the thickness of the reflective layer be uniform throughout.
基板としてガラスを用いる場合、 その表面は、 R a (J I S B 0601) で 1 nm〜l 000 n mの範囲で意図的に粗面化されていることも好ましい。 こ
のような粗面化表面は基板の表面積が増えて、 多量の D N Aプローブ等を高密度 で固定化できる点で好都合である。 When glass is used as the substrate, it is also preferable that the surface is intentionally roughened in Ra (JISB 0601) in the range of 1 nm to 1000 nm. This Such a roughened surface is advantageous in that the surface area of the substrate increases and a large amount of DNA probes and the like can be immobilized at a high density.
本発明の固体支持体には、 必要に応じて、 核酸分子又はタンパク質を静電的に 引き寄せるために静電層を設けてもよい。 The solid support of the present invention may be provided with an electrostatic layer, if necessary, for electrostatically attracting nucleic acid molecules or proteins.
タンパク質は、 水溶液中において、 等電点よりも酸性側では陰極側に、 塩基性 側では陽極側に引き寄せられる性質を有する。 この性質を利用して、 対象となる タンパク質の等電点に応じて、 水溶液の p H、 静電層の種類 (正荷電又は負荷電 のいずれか) を適宜選択することにより、 各種のタンパク質を静電的に引き寄せ ることができる。 例えば、 タンパク質の等電点よりも水溶液の p Hが塩基性側に ある場合 (例えば、 フィコシァニン (等電点 4 . 4 5〜4 . 7 5 ) 、 ]3—ラクト グロブリン B (等電点 5 . 1 ) 、 ゥシカルボニックアンヒドラーゼ (等電点 6 . 0 ) 、 ヒ トカルボ二ックアンヒドラーゼ (等電点 6 . 5 ) を p H 7 . 0の水溶液 中で反応させる場合) には、 静電層として正荷電を有するものを用いればよい。 静電層としては、 核酸分子又はタンパク質を静電的に引き寄せ、 核酸分子又は タンパク質の固定化量を向上させるものであれば、 特に制限はないが、 例えば、 ァミノ基含有化合物など正荷電を有する化合物を用いて形成することができる。 前記アミノ基含有化合物としては、 非置換のアミノ基 (一 N H2) 、 又は炭素 数 1〜6のアルキル基等で一置換されたァミノ基 (一N H R ; Rは置換基) を有 する化合物、 例えばエチレンジァミン、 へキサメチレンジァミン、 n—プロピル ァミン、 モノメチ ァミン、 ジメチルァミン、 モノェチルァミン、 ジェチ アミ ン、 ァリルァミン、 アミノアゾベンゼン、 ァミノアルコール (例えば、 エタノー ルァミン) 、 アタリノール、 ァミノ安息香酸、 アミノアントラキノン、 アミノ酸Proteins have the property of being attracted to the cathode side on the acidic side and to the anode side on the basic side in an aqueous solution. Utilizing this property, various proteins can be selected by appropriately selecting the pH of the aqueous solution and the type of the electrostatic layer (either positively charged or negatively charged) according to the isoelectric point of the target protein. It can be attracted electrostatically. For example, when the pH of the aqueous solution is more basic than the isoelectric point of the protein (for example, phycocyanin (isoelectric point 4.45 to 4.75)),] 3-lactoglobulin B (isoelectric point 5 1), calcium carbonate anhydrase (isoelectric point 6.0) and human carbonic anhydrase (isoelectric point 6.5) when reacted in an aqueous solution with a pH of 7.0. What is necessary is just to use what has a positive charge as an electrostatic layer. The electrostatic layer is not particularly limited as long as the nucleic acid molecule or the protein is electrostatically attracted and the amount of the nucleic acid molecule or the protein immobilized is not particularly limited.For example, the layer has a positive charge such as an amino group-containing compound. It can be formed using a compound. Examples of the amino group-containing compound include a compound having an unsubstituted amino group (mono NH 2 ) or an amino group monosubstituted by an alkyl group having 1 to 6 carbon atoms (one NHR; R is a substituent); For example, ethylenediamine, hexamethylenediamine, n-propylamine, monomethamine, dimethylamine, monoethylamine, cetamine, arylamine, aminoazobenzene, amino alcohol (for example, ethanolamine), atalinol, aminoaminobenzoic acid, aminoanthraquinone The amino acid
(グリシン、 ァラニン、 パリン、 ロイシン、 セリン、 トレオニン、 システィン、 メチォニン、 フエ二ルァラニン、 トリプトファン、 チロシン、 プロリン、 シスチ ン、 グルタミン酸、 ァスパラギン酸、 グルタミン、 ァスパラギン、 リシン、 アル ギニン、 ヒスチジン) 、 ァニリン、 又はこれらの重合体 (例えば、 ポリアリルァ
ミン、 ポリリシン) や共重合体; 4, 4 ' , 4 " ートリアミノトリフエニルメタ ン、 トリアムテレン、 スぺノレミジン、 スぺノレミン、 プトレシンなどのポリアミン (多価ァミン) が挙げられる。 (Glycine, alanine, palin, leucine, serine, threonine, cystine, methionine, fenylalanine, tryptophan, tyrosine, proline, cystine, glutamic acid, aspartic acid, glutamine, asparagine, lysine, arginine, histidine, histidine) These polymers (for example, polyallyl , Polylysine) and copolymers; and polyamines (polyvalent amines) such as 4,4 ', 4 "-triaminotriphenylmethane, triamterene, sponolemidine, sponolemin, and putrescine.
静電層は、 基板又は表面処理層と共有結合させずに形成してもよく、 基板又は 表面処理層と共有結合させて形成してもよい。 The electrostatic layer may be formed without being covalently bonded to the substrate or the surface treatment layer, or may be formed to be covalently bonded to the substrate or the surface treatment layer.
静電層を基板又は表面処理層と共有結合させずに形成する場合には、 例えば、 表面処理層を製膜する際に前記ァミノ基含有化合物を製膜装置内に導入すること によって、 アミノ基を含有する炭素系皮膜を製膜する。 製膜装置内に導入する化 合物として、 アンモニアガスを用いてもよい。 また、 表面処理層は、 密着層を形 成した後にアミノ基を含有する皮膜を形成するといつた、 複層であってもよく、 この場合もアンモニアガスを含んだ雰囲気で行つてもよい。 In the case where the electrostatic layer is formed without being covalently bonded to the substrate or the surface treatment layer, for example, the amino group-containing compound is introduced into the film forming apparatus when the surface treatment layer is formed, whereby the amino group is formed. Is formed into a carbon-based film. Ammonia gas may be used as the compound to be introduced into the film forming apparatus. Further, the surface treatment layer may be a multilayer in which a film containing an amino group is formed after forming the adhesion layer, and in this case, the surface treatment layer may be formed in an atmosphere containing ammonia gas.
また、 静電層を基板又は表面処理層と共有結合させずに形成する場合には、 静 電層と基板又は表面処理層との親和性、 即ち密着性を高める点で、 基板上に、 前 記の非置換又は一置換されたァミノ基を有する化合物及び炭素化合物を蒸着させ た後、 核酸分子と共有結合しうる官能基を導入することが好ましい。 ここで用い る炭素化合物としては、 気体として供給することができれば特に制限はないが、 例えば常温で気体であるメタン、 ェタン、 プロパンが好ましい。 蒸着の方法とし ては、 イオン化蒸着法が好ましく、 イオン化蒸着法の条件としては、 作動圧が 0 . l〜5 0 P a、 そして加速電圧が 2 0 0〜1 0 0 0 Vの範囲であることが好ま しい。 When the electrostatic layer is formed without being covalently bonded to the substrate or the surface treatment layer, the electrostatic layer is formed on the substrate in order to increase the affinity, that is, the adhesion between the electrostatic layer and the substrate or the surface treatment layer. It is preferable to introduce a functional group capable of covalently bonding to a nucleic acid molecule after depositing the compound having an unsubstituted or monosubstituted amino group and a carbon compound. The carbon compound used here is not particularly limited as long as it can be supplied as a gas. For example, methane, ethane, and propane, which are gases at normal temperature, are preferable. As the method of vapor deposition, the ionization vapor deposition method is preferable, and the conditions of the ionization vapor deposition method are an operating pressure of 0.1 to 50 Pa and an acceleration voltage of 200 to 100 V. It is preferable.
静電層を基板又は表面処理層と共有結合させて形成する場合には、 例えば、 基 板又は表面処理層を施した基板に、 塩素ガス中で紫外線照射して表面を塩素化し 、 次いで前記アミノ基含有化合物のうち、 例えば、 ポリアリルァミン、 ポリリシ ン、 4, 4 ' , 4 " 一トリアミノ トリフエ-ルメタン、 トリアムテレン等の多価 ァミンを反応させて、 基板と結合していない側の末端にァミノ基を導入すること により、 静電層を形成することができる。
また、 静電層が施された基板に核酸分子又はタンパク質と共有結合しうる官能 基を導入する反応 (例えば、 ジカルボン酸又は多価カルボン酸を用いるカルボキ シル基の導入) を溶液中で行う場合には、 基板を、 前記の非置換又は一置換され たアミノ基を有する化合物を含有する溶液中に浸漬した後、 核酸分子又はタンパ ク質と共有結合しうる官能基を導入することが好ましい。 前記溶液の溶媒として は、 例えば水、 N—メチルピロリ ドン、 エタノールが挙げられる。 When the electrostatic layer is formed by covalent bonding to a substrate or a surface treatment layer, for example, the surface of the substrate or the substrate to which the surface treatment layer has been applied is chlorinated by irradiating ultraviolet rays in chlorine gas to chlorinate the surface. Among the group-containing compounds, for example, polyamines such as polyallylamine, polylysine, 4,4 ′, 4 "-triaminotriphenylmethane, and triamterene are reacted to form an amino group at the end not bonded to the substrate. By introducing, an electrostatic layer can be formed. When a reaction for introducing a functional group capable of covalently binding to a nucleic acid molecule or a protein (for example, introduction of a carboxyl group using a dicarboxylic acid or a polycarboxylic acid) into a substrate provided with an electrostatic layer is performed in a solution. Preferably, the substrate is immersed in a solution containing the compound having an unsubstituted or monosubstituted amino group, and then a functional group capable of covalently bonding to a nucleic acid molecule or a protein is introduced. Examples of the solvent for the solution include water, N-methylpyrrolidone, and ethanol.
静電層が施された基板に、 ジカルボン酸又は多価カルボン酸を用いて力ルポキ シル基を導入する場合には、 予め N—ヒドロキシスクシンイミ ド及び/又はカル ポジイミ ド類で活性化させたり、 あるいは、 反応を N—ヒ ドロキシスクシンイミ ド及び Z又はカルポジィミ ド類の存在下に行うことが好ましい。 When a carboxylic acid group is introduced into a substrate on which an electrostatic layer has been formed using a dicarboxylic acid or a polycarboxylic acid, the substrate is activated in advance with N-hydroxysuccinimide and / or carposimides. Alternatively, the reaction is preferably carried out in the presence of N-hydroxysuccinimide and Z or carposides.
基板を、 非置換又は一置換されたアミノ基を有する化合物を含有する溶液中に 浸漬することにより、 静電層を形成する場合に、 アミノ基含有化合物としてポリ ァリルアミンを用いると、 基板との密着性に優れ、 核酸分子の固定化量がより向 上する。 When the substrate is immersed in a solution containing a compound having an unsubstituted or monosubstituted amino group to form an electrostatic layer, if a polyamine is used as the amino group-containing compound, adhesion to the substrate may occur. Excellent in immobility, and the amount of immobilized nucleic acid molecules is further improved.
静電層の厚みは、 1 η π!〜 5 0 0 μ mであることが好ましい。 The thickness of the electrostatic layer is 1 η π! Preferably it is ~ 500 μm.
基板表面には、 必要に応じて、 前記のようにして静電層を施した後、 カルボキ シル基を導入するため、 化学修飾を施す。 If necessary, the surface of the substrate is coated with an electrostatic layer as described above, and then chemically modified to introduce a carboxyl group.
カルボキシル基を導入するために用いられる化合物としては、 例えば、 式: X - R '- C O O H (式中、 Xはハロゲン原子、 R 1は炭素数 1〜 1 2の 2価の炭化 水素基を表す。 ) で示されるハロカルボン酸、 例えばクロ口酢酸、 フルォロ酢酸 、 ブロモ酢酸、 ョード酢酸、 2—クロ口プロピオン酸、 3—クロ口プロピオン酸 、 3—クロ口アクリル酸、 4一クロ口安息香酸;式: H O O C— R2— C O O HThe compound used to introduce a carboxyl group, for example, the formula: X - R '- COOH (wherein, X is a halogen atom, R 1 represents a divalent hydrocarbon group of from 1 to 1 2 carbon atoms )), For example, chloroacetic acid, fluoroacetic acid, bromoacetic acid, odoacetic acid, 2-chloropropionic acid, 3-chloropropionic acid, 3-chloroacrylic acid, 4-chlorobenzoic acid; Formula: HOOC— R 2 — COOH
(式中、 R2は単結合又は炭素数 1〜1 2の 2価の炭化水素基を表す。 ) で示さ れるジカルボン酸、 例えばシユウ酸、 マロン酸、 コハク酸、 マレイン酸、 フマル 酸、 フタル酸;ポリアクリル酸、 ポリメタクリル酸、 トリメリット酸、 ブタンテ トラカルボン酸などの多価カルボン酸;式: R3— C O— R4— C O O H (式中、
R3は水素原子又は炭素数 1〜 1 2の 2価の炭化水素基、 R4は炭素数 1〜 12の 2価の炭化水素基を表す。 ) で示されるケト酸又はアルデヒド酸;式: X— OC 一 R5— COOH (式中、 Xはハロゲン原子、 R5は単結合又は炭素数 1〜12の 2価の炭化水素基を表す。 ) で示されるジカルボン酸のモノハライド、 例えばコ ハク酸モノクロリ ド、 マロン酸モノクロリ ド;無水フタル酸、 無水コハク酸、 無 水シユウ酸、 無水マレイン酸、 無水ブタンテトラカルボン酸などの酸無水物が挙 げられる。 (In the formula, R 2 represents a single bond or a divalent hydrocarbon group having 1 to 12 carbon atoms.) A dicarboxylic acid represented by, for example, oxalic acid, malonic acid, succinic acid, maleic acid, fumaric acid, and phthalic acid Acids; polycarboxylic acids such as polyacrylic acid, polymethacrylic acid, trimellitic acid, butanetracarboxylic acid; formula: R 3 — CO— R 4 — COOH (wherein R 3 represents a hydrogen atom or a divalent hydrocarbon group having 1 to 12 carbon atoms, and R 4 represents a divalent hydrocarbon group having 1 to 12 carbon atoms. A) a keto acid or an aldehyde acid represented by the formula: X—OC—R 5 —COOH (wherein, X is a halogen atom, and R 5 represents a single bond or a divalent hydrocarbon group having 1 to 12 carbon atoms). ) Monohalides of dicarboxylic acids such as succinic monochloride, malonic monochloride; acid anhydrides such as phthalic anhydride, succinic anhydride, anhydrous oxalic acid, maleic anhydride, and butanetetracarboxylic anhydride. Are listed.
前記のようにして導入されたカルボキシル基は、 シァナミ ドゃカルポジィミ ド (例えば、 1一 [3— (ジメチルァミノ) プロピル] 一 3一ェチルカルボジィミ ド) などの脱水縮合剤と N—ヒ ドロキシスクシンイミ ドの化合物で活性エステル ィ匕 (スクシンィミジル化) することができる。 The carboxyl group introduced as described above can be combined with a dehydrating condensing agent such as cyanamide-d-carboimide (eg, 11- [3- (dimethylamino) propyl] -13-ethylcarbodiimide) and N-hydroxy. Active esterification (succinimidylation) can be carried out with a compound of succinimide.
また、 式: X— C (R6) H-COOR7 (式中、 Xはハロゲン原子、 R6は水素 原子、 フエニル基又は炭素数 1〜1 2のアルキル基、 R7は 1価の炭化水素基を 表す。 ) で示されるひーハロカルボン酸エステルと反応させることにより、 式: -COO-C (R6) H-COOR7 (式中、 R6及び R7は前記と同義である。 ) で 示される活性エステル基を導入することができる。 In the formula, X—C (R 6 ) H-COOR 7 (where X is a halogen atom, R 6 is a hydrogen atom, a phenyl group or an alkyl group having 1 to 12 carbon atoms, and R 7 is a monovalent carbon atom. by reacting with non Harokarubon acid ester represented by the hydrogen radical), the formula:. -COO-C (R 6 ) H-COOR 7 ( wherein, R 6 and R 7 are the same as defined above). An active ester group represented by the following formula can be introduced.
上記のようにして得られた固体支持体に核酸分子又はタンパク質をスポッティ ングにより固定化する場合、 あるいは固体支持体に固定化された核酸分子に別の 核酸分子をハイプリダイズさせる場合において、 1つ 1つの固体支持体について 処理していたのでは、 処理工程が煩雑となり大量の試料を分析することが難しい 。 本発明は、 複数の固体支持体を基体上に整列して固定化することにより、 複数 の固体支持体を同時に処理することを可能とし、 固体支持体を用いる際の効率性 及び便宜性を向上させるものである。 In the case where a nucleic acid molecule or protein is immobilized by spotting on the solid support obtained as described above, or in the case where another nucleic acid molecule is hybridized to the nucleic acid molecule immobilized on the solid support, one If one solid support is processed, the processing steps become complicated and it is difficult to analyze a large amount of sample. The present invention enables simultaneous processing of a plurality of solid supports by aligning and immobilizing the plurality of solid supports on a substrate, thereby improving the efficiency and convenience in using the solid supports. It is to let.
本発明において固体支持体 2を整列して固定化するための基体 1の材料は、 例 えば、 シリコン、 ガラス、 繊維、 木材、 紙、 セラミックス、 プラスチック (例え ば、 ポリエステル樹脂、 ポリエチレン樹脂、 ポリプロピレン樹脂、 AB S樹脂(
Acrylonitrile Butadiene Styrene樹脂)、 ナイロン、 アクリル樹脂、 フッ素樹脂、 ポ リカーボネート樹脂、 ポリウレタン樹脂、 メチルペンテン樹脂、 フエノール樹脂 、 メラミン樹脂、 エポキシ樹脂、 塩化ビュル樹脂) 、 金属 (例えば、 ステンレス 、 ニッケル、 チタン、 アルミニウム、 アルミニウム合金) が挙げられる。 In the present invention, the material of the substrate 1 for aligning and fixing the solid support 2 is, for example, silicon, glass, fiber, wood, paper, ceramics, plastic (for example, polyester resin, polyethylene resin, polypropylene resin). , ABS resin ( Acrylonitrile Butadiene Styrene resin), Nylon, Acrylic resin, Fluororesin, Polycarbonate resin, Polyurethane resin, Methylpentene resin, Phenol resin, Melamine resin, Epoxy resin, Chloride chloride resin), Metal (for example, Stainless steel, Nickel, Titanium, Aluminum, aluminum alloys).
本発明の基体 1は、 通常平板状であり、 その大きさは複数の固体支持体 2を固 定化できるものであれば特に限定されないが、 通常、 幅 0 . l〜2 0 0 mm、 長 さ 0 . 1〜 2 0 O mm、 厚み 0 . 1〜 1 0 mm程度である。 本発明においては、 固体支持体 2を作成後、 これを切断分割して、 基体上に固定化してもよい。 基体 1は、 固体支持体 2を固定化するための粘着付与材を有するのが好ましい 。 粘着付与材とは粘着性を有する材料を意味し、 粘着付与材としては、 例えば、 タツキロール 1 0 1 (田岡化学) 、 ヒタノール 1 5 0 1 (日立化成) 、 変性アル キルフエノールホルムァノレデヒ ド樹脂 (タツキローノレ 1 3 0 ) 、 ヒタノール 5 0 1等が挙げられる。 あるいは、 固体支持体 2は、 粘着テープあるいは粘着剤によ り基体 1に固定化されていてもよい D 粘着テープとしてはアクリル系、 ポリイソ ブチレン、 S B R、 ブチルゴム、 クロロプレンゴム、 塩化ビ-ノレ-酢酸ビニル共 重合体、 ポリビュルプチラールが適用でき、 粘着剤として安息香酸樹脂、 ポリブ テン、 バミ ドチオンが適用できる。 The substrate 1 of the present invention is usually in the form of a flat plate, and its size is not particularly limited as long as it can fix a plurality of solid supports 2, but it is usually 0.1 to 200 mm in width and 0.2 to 200 mm in length. The thickness is about 0.1 to 20 mm and the thickness is about 0.1 to 10 mm. In the present invention, after the solid support 2 is prepared, the solid support 2 may be cut and divided and immobilized on a substrate. The substrate 1 preferably has a tackifier for immobilizing the solid support 2. The tackifier refers to a material having tackiness. Examples of the tackifier include Tatsukiroll 101 (Taoka Chemical), Hitachil 1501 (Hitachi Kasei), and denatured alkylphenol formaldehyde. Resin (Takikuronore 130), hitanol 501 and the like. Alternatively, the solid support 2, adhesive tape or acrylic as good D adhesive tape be immobilized by Ri substrate 1 in an adhesive, polyiso-butylene, SBR, butyl rubber, chloroprene rubber, chloride bi - Honoré - acetic acid Vinyl copolymer and polybutyral can be used, and benzoic acid resin, polybutene, and bamidothion can be used as the adhesive.
複数の固体支持体 2を、 1つの基体上に固定化することにより、 別種の固体支 持体を、 必要に応じて必要な組合せで使用することができる。 また、 別種の核酸 分子又はタンパク質を固定化した固体支持体 2を、 1つの基体上に複数固定化す ることもでき、 多様な試験を一度に実施することができる。 By immobilizing a plurality of solid supports 2 on one substrate, different kinds of solid supports can be used in a required combination as needed. Also, a plurality of solid supports 2 on which different kinds of nucleic acid molecules or proteins are immobilized can be immobilized on one substrate, and various tests can be performed at once.
固体支持体 2は、 複数のものが基体上に整列して固定化される。 整列して固定 化されるとは、 一定の秩序に基づいて配置されていること、 例えば、 スポッティ ング装置等の当技術分野において使用される装置において位置決めできるように 配置されていることを意味する。 例えば、 一列に、 格子状に、 又は放射線状に配 置されている場合である。 固体支持体 2が格子状に固定化されている場合、 固体
支持体相互間のピッチは、 通常、 0〜 10mm程度である。 複数の固体支持体 2 が、 基体上に整列して固定化されていることにより、 複数種の固体支持体 2を一 度にスポッティング装置等に設置し、 装置の位置決め設定を行うことにより、 そ のまま核酸分子等を複数の固体支持体上にスポッティングすることができ、 固体 支持体 2への核酸分子又はタンパク質の固定化操作を効率的かつ迅速に実施する ことができる。 核酸分子又はタンパク質が固定化された固体上の複数の固体支持 体 2は、 そのままハイプリダイズ反応、 抗原抗体反応又は PC R反応等に使用し てもよいし、 それぞれを取り外して別々に使用してもよい。 A plurality of solid supports 2 are aligned and immobilized on a substrate. To be aligned and fixed means to be arranged in a certain order, for example, to be positionable in a device used in the art such as a spotting device. . For example, when arranged in a line, in a grid, or in a radial pattern. If the solid support 2 is fixed in a grid, The pitch between the supports is usually about 0 to 10 mm. Since a plurality of solid supports 2 are aligned and immobilized on the substrate, a plurality of types of solid supports 2 are installed at once in a spotting device or the like, and the positioning of the device is set. Nucleic acid molecules and the like can be spotted on a plurality of solid supports as they are, and the operation of immobilizing nucleic acid molecules or proteins on the solid support 2 can be performed efficiently and quickly. A plurality of solid supports 2 on a solid on which nucleic acid molecules or proteins are immobilized may be used as such for a hybridization reaction, an antigen-antibody reaction or a PCR reaction, or may be removed and used separately. Is also good.
本発明の一実施形態では、 基体 1は凹部 3を有し、 この凹部 3に固体支持体 2 が固定化されていてもよい。 この実施形態の一例を図 1及び図 2 (a) 〜 (e) に示す。 図 1、 図 2 (b) 〜 (e) では、 黒色の部分が凹部 3に該当する。 この ような凹部 3に固体支持体 2が固定化されることにより、 固体支持体 2が基体 1 から剥離しにくくなる。 凹部 3の大きさは、 固体支持体 2をその内部に保持でき る大きさであれば特に制限されないが、 固体支持体 2の幅、 長さ及び厚みより、 それぞれ約 0. 1〜0. 5 mm程度大きいものが好ましい。 より具体的には、 幅 0. 2〜: L 00. 5 ram、 長さ 0. 2〜: L 00. 5 mm、 深さ 0. 01〜10m m程度であることが好ましい。 また、 この実施形態において基体 1は、 図 1に示 すように、 凹部 3と凹部 3を連結する溝からなる水平連絡路を有していてもよい 。 水平連絡路の幅は、 通常、 0. l~10mm程度である。 この水平連絡路によ り、 それぞれの固体支持体 2の基体 1からの取り出しが容易になる。 また、 この 水平連絡路により、 ハイプリダイズ反応等に使用する溶液がスムーズに固定支持 体 2にゆきわたるようになる。 In one embodiment of the present invention, the base 1 has the concave portion 3, and the solid support 2 may be fixed in the concave portion 3. One example of this embodiment is shown in FIGS. 1 and 2 (a) to (e). In FIGS. 1 and 2 (b) to (e), the black portion corresponds to the concave portion 3. By fixing the solid support 2 in such a concave portion 3, the solid support 2 becomes difficult to be separated from the base 1. The size of the concave portion 3 is not particularly limited as long as the solid support 2 can be held inside the solid support 2, but each of the recesses 3 has a width of about 0.1 to 0.5 depending on the width, length and thickness of the solid support 2. It is preferable that the diameter is about mm larger. More specifically, it is preferable that the width is about 0.2 to: L 00.5 ram, the length is 0.2 to: L 00.5 mm, and the depth is about 0.01 to 10 mm. Further, in this embodiment, as shown in FIG. 1, the base 1 may have a horizontal communication path composed of the recess 3 and the groove connecting the recess 3. The width of the horizontal communication channel is usually about 0.1 to 10 mm. This horizontal communication path facilitates the removal of each solid support 2 from the substrate 1. In addition, the horizontal communication path allows the solution used for the high pre-sidation reaction and the like to smoothly spread to the fixed support 2.
この凹部 3は、 当技術分野で通常用いられる方法で作成することができる。 例 えば、 第一層の上に粘着付与材を形成し、 更にその上に凹部 3を有する第三層を 形成することにより作成することができる。 このような三層からなる基体 1は、 当技術分野で通常用いられる方法により製造することができ、 例えば、 フォトリ
法、 プレス成形、 押出成形、 铸込成形、 三層張り合わせ、 射出成形 等により製造することができる。 また三層構造以外に、 金属性の基体にプレス成 形を施すことにより、 凹部 3を形成することもできる。 この場合、 プレスによつ て形成された凹部 3の底面に固体支持体 2を固定化するための粘着付与材を存在 させることが好ましい。 The recess 3 can be made by a method usually used in the art. For example, it can be formed by forming a tackifier on the first layer and further forming a third layer having the concave portion 3 thereon. Such a three-layer substrate 1 can be manufactured by a method commonly used in the art, for example, a photolithography. It can be manufactured by methods, press molding, extrusion molding, die molding, three-layer bonding, injection molding, etc. In addition to the three-layer structure, the concave portion 3 can be formed by performing press molding on a metallic base. In this case, it is preferable that a tackifier for fixing the solid support 2 be present on the bottom surface of the concave portion 3 formed by pressing.
基体 1は、 固体支持体 2を保持する部分に、 固体支持体 2の大きさよりも小さ い貫通穴を有するのが好ましい。 この貫通穴により、 活性化液の液切れが良くな り、 また、 固体支持体 2を取り出しやすくなる。 The substrate 1 preferably has a through hole smaller than the size of the solid support 2 in a portion holding the solid support 2. The through hole facilitates drainage of the activating liquid and facilitates removal of the solid support 2.
また、 上記のようにして活性エステル基が導入された固体支持体アレイ 6は、 空気中に放置したり、 又は単に容器中に密封保存しただけでは、 固定化できる核 酸分子又はタンパク質の量が著しく低下するため、 基体上に固体支持体 2が複数 固定化された固体支持体アレイ 6を真空パック用袋に入れ、 真空パックする。 真 空パックすることにより、 核酸分子等の固定化量の低下を顕著に防止することが できる。 Further, the solid support array 6 into which the active ester group has been introduced as described above is left alone in the air or simply sealed and stored in a container to reduce the amount of nucleic acid molecules or proteins that can be immobilized. Since the solid support 2 has a plurality of solid supports 2 immobilized on the substrate, the solid support array 6 is placed in a vacuum packing bag and vacuum-packed. By vacuum packing, it is possible to remarkably prevent a decrease in the amount of immobilized nucleic acid molecules and the like.
真空パック用袋の材料としては、 水及び酸素を通さないものであれば、 特に制 限はなく、 例えばポリエチレン、 ポリエステル等の単層フィルム、 ポリエチレン とポリエステルのラミネートフイルムあるいはこれらの樹脂にアルミニウムなど の金属をラミネートまたは蒸着したものが挙げられる。 There is no particular limitation on the material of the vacuum-packing bag as long as it does not allow water and oxygen to pass through.For example, a single-layer film of polyethylene or polyester, a laminated film of polyethylene and polyester, or a resin such as aluminum What laminated | stacked or vapor-deposited the metal is mentioned.
また、 真空パック用袋に用いるフィルムの厚みも特に限定されず、 内容物の重 量等に応じて適宜の機械的強度のものを用いることができるが、 通常 2 0〜3 0 0 μ πιの厚さのものが好適である。 2 0 μ ηι未満の場合、 機械的強度が不足する 傾向があるからであり、 また 3 0 0 / mを超えると、 取扱性が劣るからである。 真空パック用袋の形態としては、 真空パック用袋を構成するフィルムが 2枚重 なっていて、 その 3辺がラミネートされているような構造が好ましい。 The thickness of the film used for the vacuum bag is not particularly limited, and a film having an appropriate mechanical strength can be used according to the weight of the contents. Thick ones are preferred. If it is less than 20 μηι, mechanical strength tends to be insufficient, and if it exceeds 300 / m, handleability is poor. As the form of the bag for vacuum packing, a structure in which two films constituting the bag for vacuum packing are overlapped and three sides thereof are laminated is preferable.
本発明においては、 前記固体支持体アレイ 6を真空パックする前に、 前記固体 支持体アレイ 6を減圧乾燥することが好ましい。 減圧乾燥時の温度は、 好ましく
_ In the present invention, the solid support array 6 is preferably dried under reduced pressure before the solid support array 6 is vacuum-packed. The temperature during drying under reduced pressure is preferably _
14 14
は50〜200°〇、 更に好ましくは 70〜1 20°Cである。 減圧乾燥時の圧力は 、 好ましくは 1〜 1 X 10-storr、 更に好ましくは 1 X 10 -1〜 1 X 1 O_4torrであ る。 Is 50 to 200 ° C, more preferably 70 to 120 ° C. Vacuum drying pressure during preferably 1~ 1 X 10- s torr, more preferably 1 X 10 - Ru 1 ~ 1 X 1 O_ 4 torr der.
また、 真空パック時の温度は、 好ましくは 1 5〜100°C、 更に好ましくは 2 5〜50°Cである。 真空パック時の圧力は、 好ましくは 1〜 1 X 1 CTstorr、 更に 好ましくは 1 X 10 -1〜 1 X 1 CT4torrである。 The temperature during vacuum packing is preferably 15 to 100 ° C, more preferably 25 to 50 ° C. The pressure at the time of vacuum packing is preferably 1 to 1 × 1 CT s torr, more preferably 1 × 10 −1 to 1 × 1 CT 4 torr.
真空パック前に、 真空引き後、 不活性ガスで圧戻しして再度真空引きする操作 を少なくとも 1回行うことが好ましい。 ここで用いる不活性ガスとしては、 例え ば窒素ガス、 アルゴンガス、 ネォンガス又はこれらの混合物が挙げられる。 前記固体支持体 2は、 直接、 真空パック用袋中に空間容積が極力少なくなるよ うに封止することが好ましい。 It is preferable to perform at least one operation of evacuating, depressurizing with an inert gas, and evacuating again before vacuum packing. As the inert gas used here, for example, nitrogen gas, argon gas, neon gas or a mixture thereof can be mentioned. It is preferable that the solid support 2 is directly sealed in the bag for vacuum packing so as to minimize the space volume.
本発明の真空パックした固体支持体 2は、 開封後、 DNA、 RNAのいずれの 核酸分子の固定化にも用いることができる。 DNA、 RNAの塩基数は、 通常 1 〜200、 好ましくは 5〜1 50である。 また、 DNAは一本鎖、 二本鎖のいず れも固定化することができる。 また、 種々のタンパク質の固定化にも用いること ができる。 開封後、 基体上に複数固定化された固体支持体に対し、 そのまま固定 化反応を行ってもよいし、 基体 1から固体支持体 2をそれぞれ取り外してから個 別に固定化反応を行ってもよい。 After being opened, the vacuum-packed solid support 2 of the present invention can be used for immobilization of any nucleic acid molecule of DNA or RNA. The number of bases of DNA and RNA is usually 1 to 200, preferably 5 to 150. In addition, DNA can be immobilized in either single-stranded or double-stranded form. It can also be used for immobilizing various proteins. After opening, the solid support immobilized on a plurality of substrates may be directly subjected to the immobilization reaction, or the solid supports 2 may be separately removed from the substrate 1 and then individually subjected to the immobilization reaction. .
前記固体支持体アレイ 6を用い、 末端の活性エステル化されたカルボキシル基 に、 水素結合でオリゴ核酸の末端塩基を固定化し、 更に、 このオリゴ核酸と相補 的塩基配列を有する DNAを固定して、 DNAライブラリーチップとして用いる こともできる。 また、 DN Aの代わりに、 ヌクレオチド、 オリゴヌクレオチド、 DNAフラグメント、 タンパク質等を固定化して、 ライプラリーとすることもで きる。 Using the solid support array 6, the terminal base of the oligonucleic acid is immobilized to the active esterified carboxyl group by hydrogen bonding, and the DNA having a base sequence complementary to this oligonucleic acid is further immobilized. It can also be used as a DNA library chip. Also, instead of DNA, nucleotides, oligonucleotides, DNA fragments, proteins and the like can be immobilized to give a library.
核酸分子又はタンパク質を固定ィヒした固体支持体 2を、 基体上に複数固定化し て、 これを真空パックすることもできる。 このような固体支持体アレイ 6は、 開
封後そのまま又は固体支持体 2の 1つ 1つを基体から取り外して、 核酸分子等の 伸長反応又はハイブリダイズ反応に用いることもできる。 実施例 A plurality of solid supports 2 on which nucleic acid molecules or proteins are immobilized may be immobilized on a substrate and vacuum-packed. Such a solid support array 6 is open After the sealing, the solid support 2 can be used as it is or after removing each one of the solid supports 2 from the substrate and used for an elongation reaction or a hybridization reaction of a nucleic acid molecule or the like. Example
以下、 製造例、 実施例により本発明を説明するが、 本発明はこれらに限定され るものではない。 Hereinafter, the present invention will be described with reference to Production Examples and Examples, but the present invention is not limited thereto.
(製造例 1 ) (Production Example 1)
厚さが 0. 625mm、 直径が 2. 5ィンチのシリ コンウェハに N d— YAG レーザで、 深さが 0. 4mmの格子溝 (3mmX 3mm) を入れた。 このシリコ ンウェハにイオン化蒸着法によって、 メタンガス 95体積%と水素 5体積%を混 合したガスを原料として、 加速電圧 0. 5 k Vで DLC層を 10 nmの厚みに形 成した。 その後に、 アンモニアガスを 5 cm3/分の割合でチャンバ一に挿入し た。 作動圧を 2 P aとしてアンモニアプラズマで DLC表面を処理することによ りァミノ化した。 A 0.46 mm deep grating groove (3 mm x 3 mm) was formed on a silicon wafer with a thickness of 0.625 mm and a diameter of 2.5 inch using an Nd-YAG laser. A DLC layer was formed to a thickness of 10 nm on this silicon wafer at an accelerating voltage of 0.5 kV using a gas mixture of 95% by volume of methane gas and 5% by volume of hydrogen as a raw material. Thereafter, ammonia gas was inserted into the first chamber at a rate of 5 cm 3 / min. Amination was performed by treating the DLC surface with ammonia plasma at an operating pressure of 2 Pa.
その後、 表面処理層のアミノ基に多価カルボン酸として無水ブタンテトラカル ボン酸を縮合した後に、 0. IM ン酸緩衝液 (pH6) 300m lに 0. 1M の 1一 [3 - (ジメチノレアミノ) プロピル] - 3一ェチルカルボジィミ ドと 20 mMの N—ヒドロキシスクシンィミ ドを溶解した活性化液中に 30分間浸漬する ことによって活性エステル基を有する固体支持体を得、 100°C、 1 X 10"2torr で乾燥した。 このようにして得た固体支持体をダイシンダフイルムに貼り付け、 CHIP MATRIX E PANDER (TECHNOVISION. INC.)で個々の 3 mm角の固体支 持体に分割した。 Then, after condensing butanetetracarbonic anhydride as a polyvalent carboxylic acid to the amino group of the surface treatment layer, 0.1M of 1.1M in 300 ml of 0.1 M phosphate buffer (pH 6) was added. [Propyl] -31-ethylcarbodiimide and 20 mM N-hydroxysuccinimide were immersed in an activation solution for 30 minutes to obtain a solid support having active ester groups. C, dried at 1 X 10 " 2 torr. The solid support thus obtained was stuck on a Daishinda film, and each solid support of 3 mm square was mounted on a CHIP MATRIX E PANDER (TECHNOVISION. INC.). Divided into
(製造例 2 ) (Production Example 2)
2重量0 /0の 3—ァミノプロピルトリエトキシシランエタノール溶液にスラィド ガラスを 10分間浸漬した後、 取り出し、 エタノールで洗浄後、 1 10°Cで 10 分間乾燥した。 次に、 このアミノ基が導入された基板に無水コハク酸を縮合した
後に、 0. 1Mリン酸緩衝液 (pH6) 300m lに 0. 1 Mの 1一 [3— (ジ メチノレアミノ) プロピル] 一 3—ェチルカルボジイミ ドと 2 OmMの N—ヒ ドロ キシスクシンィミドを溶解した活性化液中に 30分間浸漬する.ことによって活性 エステル基を有する固体支持体を得、 100°C、 1 X 10— orrで乾燥した。 After immersing the Suraido glass 10 min 2 Weight 0/0 3 § amino propyltriethoxysilane ethanol solution was taken out, washed with ethanol, and dried for 10 minutes at 1 10 ° C. Next, succinic anhydride was condensed on the substrate having the amino group introduced. Later, 0.1 M of 1- [3- (dimethinoleamino) propyl] -13-ethylcarbodiimid and 2 OmM of N-hydroxylsk in 300 ml of 0.1 M phosphate buffer (pH 6) The solid support having an active ester group was obtained by immersing in a activating solution in which synimide was dissolved for 30 minutes, and dried at 100 ° C. and 1 × 10-orr.
(製造例 3 ) (Production Example 3)
スライドガラスに 5 %ポリアクリル酸水溶液を塗布乾燥後、 60分間紫外線照 射して不溶化した。 その後、 0. 1Mリン酸緩衝液 (pH6) 300m lに 0. 1Mの 1一 [3— (ジメチルァミノ) プロピル] _ 3—ェチルカルポジイミ ドと 20111]^の1^—ヒドロキシスクシンィミドを溶解した活性化液中に 30分間浸漬 することによって活性エステル基を有する固体支持体を得、 100°C、 1 X 10 _2torrで乾燥した。 A 5% aqueous solution of polyacrylic acid was applied to the slide glass and dried, and then insolubilized by ultraviolet irradiation for 60 minutes. Then, in 300 ml of 0.1M phosphate buffer (pH6), 0.1M of 1- [3- (dimethylamino) propyl] _3-ethylcarboimide and 1 ^ -hydroxysuccinyl of 20111] ^ to obtain a solid support having an active ester group by immersing for 30 minutes in the activation solution obtained by dissolving bromide was dried at 100 ° C, 1 X 10 _ 2 torr.
(製造例 4) (Production Example 4)
3. 5 mm (幅) X 3 · 5 mm (長さ) X 1 mm (厚み) のスライドガラスに 、 イオン化蒸着法によって、 メタンガスをキャリアーガスとして 5 cm3Z分の 割合で 1 5。Cに保温したエチレンジァミン中を通してチャンバ一に導入した。 作 動圧を 2 P aとして加速電圧 0. 5 k Vでメタンとエチレンジァミンを原料とし て C、 N及び Hからなる層を 20 nmの厚みに形成した。 3. 15 mm (width) x 3.5 mm (length) x 1 mm (thickness) glass slides, using methane gas as a carrier gas, at a rate of 15 cm 3 Z by ionization deposition. C was introduced into the chamber through ethylenediamine kept warm. At an operating pressure of 2 Pa and an accelerating voltage of 0.5 kV, a layer composed of C, N and H was formed to a thickness of 20 nm using methane and ethylenediamine as raw materials.
その後、 メタンとエチレンジァミンからなる表面処理層のアミノ基に多価カル ボン酸としてポリアクリル酸を 0. 1Mの1ー [3— (ジメチルァミノ) プロピ ル] 一 3—ェチルカルポジィミドの存在下で縮合した後に、 0. 1 Mリン酸緩衝 液 (pH6) 300m lに 0. 1Mの1ー [3— (ジメチルァミノ) プロピル] 一 3—ェチルカルポジイミドと 20mMの N—ヒ ドロキシスクシンイミ ドを溶解 した活性化液中に 30分間浸漬することによって活性エステル基を有する固体支 持体を得、 100°C、 1 X 1 O'2torrで乾燥した。 Then, polyacrylic acid was added as polyvalent carboxylic acid to the amino group of the surface treatment layer composed of methane and ethylenediamine in the presence of 0.1M 1- [3- (dimethylamino) propyl] -13-ethylcarpo- imide. After condensing with 0.1 M phosphate buffer (pH 6) in 300 ml of 0.1 M 1- [3- (dimethylamino) propyl] -13-ethylcarbodiimide and 20 mM N-hydroxysuccinimide The solid support having an active ester group was obtained by immersing it in an activating solution in which the solid support was dissolved for 30 minutes, and dried at 100 ° C. and 1 × 1 O ′ 2 torr.
(製造例 5 ) (Production Example 5)
3. 5 mm (幅) X 3. 5 mm (長さ) X 1 mm (厚み) のスライ ドガラスに
、 ィオン化蒸着法によって、 メタンガス 95体積%と水素 5体積%を混合したガ スを原料として、 加速電圧 0. 5 k Vで DLC層を 10 nmの厚みに形成した。 その後、 塩素ガス中で 30分間紫外線照射して塩素化した。 その後、 ポリアリ ルァミン水溶液 (0. 1 g/1 ) に基板を浸漬して、 静電層を形成した。 3.5 mm (width) x 3.5 mm (length) x 1 mm (thickness) slide glass A 10-nm-thick DLC layer was formed at an accelerating voltage of 0.5 kV from a gas mixture of 95% by volume of methane gas and 5% by volume of hydrogen by ionization evaporation. Then, it was chlorinated by irradiating it with ultraviolet light for 30 minutes in chlorine gas. Thereafter, the substrate was immersed in an aqueous solution of polyallylamine (0.1 g / 1) to form an electrostatic layer.
その後、 静電層のアミノ基に多価カルボン酸としてポリアクリル酸を 0. 1M の 1一 [3 - (ジメチルァミノ) プロピル] ― 3一ェチルカルボジィミ ドの存在 下で縮合した後に、 0. 1Mリン酸緩衝液 (pH6) 300m lに 0. 11 の1 一 [3— (ジメチルァミノ) プロピル] 一 3一ェチルカルボジィミ ドと 20 mM の N—ヒドロキシスクシンイミドを溶解した活性化液中に 30分間浸漬すること によって活性エステル基を有する固体支持体を得、 100°C、 1 X 10—2torrで乾 燥した。 After that, polyacrylic acid was polycondensed to the amino group of the electrostatic layer as a polyvalent carboxylic acid in the presence of 0.1 M of 111- [3- (dimethylamino) propyl]-(3-ethylcarbodiimide). 0.1 M phosphate buffer (pH 6) in 300 ml of an activation solution containing 0.11-11- [3- (dimethylamino) propyl] -13-ethylcarbodiimide and 20 mM N-hydroxysuccinimide a solid support having an active ester group by immersing 30 minutes, which was drying at 100 ° C, 1 X 10- 2 torr.
(製造例 6) (Production Example 6)
DLCを 10 nmの厚みに形成したスライドガラスに、 5%ポリアクリル酸水 溶液を塗布乾燥後、 60分間紫外線照射して不溶化した。 その後、 0. 1Mリン 酸緩衝液 (pH6) 300m lに 0. 1 Mの 1一 [3— (ジメチルァミノ) プロ ピル] 一 3一ェチルカルボジィミ ドと 20mMの N—ヒ ドロキシスクシンィミ ド を溶解した活性化液中に 30分間浸漬することによつて活性エステル基を有する 固体支持体を得、 100°C、 1 X 1 (T2torrで乾燥した。 A 5% aqueous solution of polyacrylic acid was applied to a slide glass on which DLC was formed to a thickness of 10 nm, dried and then insolubilized by irradiation with ultraviolet light for 60 minutes. Then, in 300 ml of 0.1 M phosphate buffer (pH 6), 0.1 M of 1- [3- (dimethylamino) propyl] -131-ethylcarbodiimide and 20 mM of N-hydroxysuccinimide The solid support having an active ester group was obtained by immersing the substrate in an activation solution in which the medium was dissolved for 30 minutes, and dried at 100 ° C. and 1 × 1 (T 2 torr).
(実施例 1) 基体の製造方法 (Example 1) Manufacturing method of substrate
1) 板厚 0. 625 mmの J I S 3004のアルミニウム合金板に、 プレス機を 用い、 製造例で得た固体支持体 2より若干小さな複数の穴を格子状に打ち抜いた 。 そうして、 複数の貫通孔を格子状に有する上板 5を作成した。 1) A plurality of holes slightly smaller than the solid support 2 obtained in the production example were punched out in a grid shape using a press machine on a 0.625 mm thick JIS 3004 aluminum alloy plate. In this way, an upper plate 5 having a plurality of through holes in a lattice was prepared.
2) 板厚 0. 4mmの J I S 3004のアルミニウム合金板に、 プレス機を用い 、 製造例 1で得た固体支持体 2がおさまる大きさの複数の凹部 3を格子状に設け た。 基体 1における凹部 3の位置は、 上板 5における貫通孔の位置と合わせてお く。 さらに、 図 2 (a) に示すように、 この凹部 3には、 凹部 3の大きさより小
さい貫通孔 4を設けた。 この貫通孔 4により、 活性化液の液切れが良くなり、 ま た、 固体支持体 2をはずす際には裏の貫通孔 4から押し出すことにより容易に固 体支持体 2を取り出すことができる。 2) On a 0.4 mm thick JIS 3004 aluminum alloy plate, using a press machine, a plurality of concave portions 3 large enough to accommodate the solid support 2 obtained in Production Example 1 were provided in a grid pattern. The position of the concave portion 3 in the base 1 is aligned with the position of the through hole in the upper plate 5. Further, as shown in FIG. 2A, the size of the recess 3 is smaller than that of the recess 3. A through hole 4 was provided. The through-holes 4 make it easier for the activation liquid to run out, and when the solid support 2 is detached, the solid support 2 can be easily taken out by pushing it out from the through-hole 4 on the back.
3 ) 下板の凹部 3に両面テープを貼り、 基体 1を作成した。 3) A double-sided tape was applied to the concave portion 3 of the lower plate to prepare the base 1.
(実施例 2 ) 固体支持体ァレイの製造方法 (Example 2) Method for producing solid support array
製造例 1で得た 3 mm角の固体支持体 2を、 図 2 ( b ) 〜 (c ) に示すように 、 チップ移裁装置 S C H (三洋ハイテクノロジ --株式会社) により、 実施例 1の 基体 (図 2 ( a ) ) の凹部 3に配置した。 次に、 図 2 ( d ) 〜 (e ) に示すよう に、 この基体 1にカバーとして上板 5を重ね、 それぞれの固体支持体 2の端部 4 箇所を押さえ込むようにした。 上板 5の貫通穴は、 基体上に固定化された固体支 持体 2よりもやや小さいため、 固体支持体 2の表面を露出させた状態で固体支持 体 2の端部を押さえて固定することができる。 なお、 固体支持体 2の表面はでき るだけ露出するようにする。 The solid support 2 of 3 mm square obtained in Production Example 1 was subjected to chip transfer equipment SCH (Sanyo High-Technology Co., Ltd.) as shown in FIGS. 2 (b) to 2 (c). It was arranged in the recess 3 of the substrate (FIG. 2 (a)). Next, as shown in FIGS. 2 (d) to 2 (e), an upper plate 5 was placed as a cover on the substrate 1, and four end portions of each solid support 2 were pressed. Since the through-hole of the upper plate 5 is slightly smaller than the solid support 2 fixed on the base, the solid support 2 is fixed by pressing the end of the solid support 2 with the surface of the solid support 2 exposed. be able to. The surface of the solid support 2 is exposed as much as possible.
(実施例 3 ) (Example 3)
実施例 2で製造した、 図 2 ( e ) に示す固体支持体アレイ 6を、 アルミニウム をラミネ一トしたポリエチレンの袋に個別に入れて、 真空パック装置を用いて、 空間容積がないように 1 X 1 (T2torrまで真空に引いた後にパックをした。 この基 板を 4 0 °Cに設定したオーブン中に 3 0日間保管した後に、 オリゴヌクレオチド 固定化量を測定した。 その結果、 オリゴヌクレオチドの固定化性能は初期性能と ほぼ同等であった。 The solid support array 6 shown in FIG. 2 (e) manufactured in Example 2 was individually placed in a polyethylene bag laminated with aluminum, and was evacuated using a vacuum packing device so that there was no space. X1 (packed after evacuation to T 2 torr. The substrate was stored for 30 days in an oven set at 40 ° C., and the amount of immobilized oligonucleotide was measured. The nucleotide immobilization performance was almost the same as the initial performance.
(比較例 1 ) (Comparative Example 1)
製造例 1で得た活性ェステル基を、 スライドケースに 5枚入れ、 それをアルミ ユウムを蒸着したポリエチレンの袋に入れて、 室温で真空パックした。 この基板 を 4 0 °Cに設定したオーブン中に 3 0日間保管した後に、 オリゴヌクレオチド固 定化量を測定した。 その結果、 初期性能と比較して著しく性能が劣化していた。 (試験例 1 )
実施例 3で得た真空パック固体支持体ァレイ 6に、 C y 3標識したオリゴヌク レオチドが固定化される量 (富士写真フィルム社製蛍光スキャナー F LA800 0による蛍光強度) の経時変化を調べた。 Five activated ester groups obtained in Production Example 1 were placed in a slide case, and then placed in a polyethylene bag on which aluminum was deposited, followed by vacuum packing at room temperature. After this substrate was stored in an oven set at 40 ° C. for 30 days, the amount of immobilized oligonucleotide was measured. As a result, the performance was significantly deteriorated as compared with the initial performance. (Test Example 1) The time-dependent change in the amount of the Cy3-labeled oligonucleotide immobilized on the vacuum-packed solid support array 6 obtained in Example 3 (fluorescence intensity using a fluorescence scanner FLA8000, manufactured by Fuji Photo Film Co., Ltd.) was examined.
Cy 3標識したオリゴヌクレオチドの固定化は以下のように行った。 The Cy3-labeled oligonucleotide was immobilized as follows.
0. 1 μ g/μ 1に調製した; LDNAを铸型として P CRにより増幅した 50 0 b ρの Cy 3標識二本鎖 DNA約 1 n 1を、 マイクロアレイ作成装置を用いて 基板 (開封された固体支持体) 上にスポットした。 その後、 80°Cのオーブンで 3時間加熱後、 2 X S SCZ0. 2%SD Sで洗浄した後に、 スポッ トした DN Aの蛍光強度を測定した。 0.1 μg / μ1 was prepared; about 1 n1 of 500 bρ of Cy3-labeled double-stranded DNA amplified by PCR using LDNA as type 铸 was cut into a substrate (opened) using a microarray maker. On a solid support). Then, after heating in an oven at 80 ° C. for 3 hours, the plate was washed with 2 × S SCZ0.2% SDS, and the fluorescence intensity of the spotted DNA was measured.
結果を以下に示す。 The results are shown below.
(1) 活性化後、 40°Cで大気放置 (1) After activation, leave at 40 ° C in air
活性化直後: 37,000→ 1日後: 29,100→ 10日後: 20,500→30日後: 12,300 Immediately after activation: 37,000 → 1 day later: 29,100 → 10 days later: 20,500 → 30 days later: 12,300
(2) 活性化後、 ケース中真空パック、 40°Cで保存。 (2) After activation, store in a vacuum pack in a case at 40 ° C.
活性化直後: 37,200→ 1日後: 33,000→ 10日後: 29,400→30日後: 24,500 Immediately after activation: 37,200 → 1 day later: 33,000 → 10 days later: 29,400 → 30 days later: 24,500
(3) 活性化後、 直接フィルム中に真空パック、 40°Cで保存 (3) After activation, vacuum-pack directly into film and store at 40 ° C
活性化直後: 33,400→ 1日後: 31,700→ 10日後: 30,400→30日後: 31,000 なお、 比較のため、 市販の活性エステル基を有する固体支持体を空気中に放置 した。 Immediately after activation: 33,400 → 1 day later: 31,700 → 10 days later: 30,400 → 30 days later: 31,000 For comparison, a commercially available solid support having an active ester group was left in the air.
購入直後: 30,000→ 1日後: 22,600— 100後: 15,100→30日後: 5,700 Immediately after purchase: 30,000 → After 1 day: 22,600— After 100: 15,100 → After 30 days: 5,700
なお、 図 3に活性化直後あるいは購入直後の強度を 1として、 1日経時後、 1 0日経時後、 30日経時後のそれぞれの強度を活性化直後あるいは購入直後の強 度で割った残存率を示した。 図 3より、 直接フィルム中に真空パックしたサンプ ルは残存率が最も高く、 30日経時後でもほとんど変化してない。 それに対して 、 大気中で放置したサンプルは、 残存率が最も低く、 経時劣化が大きいことが判 明した。
産業上の利用可能性 In Fig. 3, the intensity immediately after activation or immediately after purchase is set to 1, and the intensity after 1 day, 10 days, or 30 days is divided by the intensity immediately after activation or immediately after purchase. Rate. According to Fig. 3, the sample that was vacuum-packed directly into the film had the highest residual ratio, and hardly changed even after 30 days. On the other hand, it was found that the sample left in the air had the lowest residual rate and a large deterioration with time. Industrial applicability
本発明によれば、 基板上に、 核酸分子又はタンパク質と共有結合しうる官能基 として活性エステル基を有する固体支持体 2の保存安定性を向上させることがで きる。
According to the present invention, the storage stability of the solid support 2 having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein on a substrate can be improved.
Claims
1 . 核酸分子又はタンパク質と共有結合しうる官能基として活性エステル基を 有する固体支持体が、 基体上に複数整列して固定化されてなる固体支持体ァレイ であって、 真空パックされていることを特徴とする真空パック固体支持体ァレイ 1. A solid support array in which a plurality of solid supports having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein are aligned and immobilized on a substrate, and are vacuum-packed. Characterized by a vacuum-packed solid support array
2 . 基体が凹部を有し、 固体支持体が該凹部に固定化されている請求項 1に記 载の真空パック固体支持体アレイ。 2. The vacuum-packed solid support array according to claim 1, wherein the substrate has a concave portion, and the solid support is fixed to the concave portion.
3 . 固体支持体が、 更に核酸分子又はタンパク質を静電的に引き寄せるための 静電層を有する請求項 1又は 2に記載の真空パック固体支持体ァレイ。 3. The vacuum-packed solid support array according to claim 1, wherein the solid support further has an electrostatic layer for electrostatically attracting nucleic acid molecules or proteins.
4 . 核酸分子が D N Aである請求項 1〜 3のいずれか 1項に記載の真空パック 固体支持体アレイ。 4. The vacuum-packed solid support array according to any one of claims 1 to 3, wherein the nucleic acid molecule is DNA.
5 . 活性エステル基が、 カルボキシル基がスクシンィミジル化されてなる活性 エステル基である請求項 1〜 4のいずれか 1項に記載の真空パック固体支持体ァ レイ。 5. The vacuum-packed solid support array according to any one of claims 1 to 4, wherein the active ester group is an active ester group obtained by succinimidylating a carboxyl group.
6 . 核酸分子又はタンパク質と共有結合しうる官能基として活性エステル基を 有する固体支持体を基体上に複数整列して固定化し、 これを真空パック用袋に入 れて真空パックすることを特徴とする、 請求項 1〜 5のいずれか 1項に記載の真 空パック固体支持体ァレイの製造方法。 6. A plurality of solid supports having an active ester group as a functional group capable of covalently binding to a nucleic acid molecule or a protein are aligned and immobilized on a substrate, and this is put in a vacuum packing bag and vacuum-packed. The method for producing a vacuum-packed solid support array according to any one of claims 1 to 5.
7 . 前記固体支持体アレイを 5 0〜 2 0 0 °Cで減圧乾燥後、 真空パックする請 求項 6に記載の製造方法。 7. The method according to claim 6, wherein the solid support array is vacuum-dried after drying at 50 to 200 ° C. under reduced pressure.
8 . 前記固体支持体アレイを真空パック用袋に入れ、 真空引き後、 不活性ガス で圧戻しして再度真空引きする操作を少なくとも 1回行った後、 真空パックする 請求項 6又は 7に記載の製造方法。
8. The vacuum packing method according to claim 6 or 7, wherein the solid support array is put in a bag for vacuum packing, and after evacuation, an operation of depressurizing with an inert gas and evacuating again is performed at least once, followed by vacuum packing. Manufacturing method.
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Cited By (2)
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US8455400B2 (en) | 2005-05-24 | 2013-06-04 | Hipep Laboratories | Substrate for biochip and biochip |
EP3581930A4 (en) * | 2017-02-08 | 2020-12-16 | Toyo Seikan Group Holdings, Ltd. | Carrier for immobilizing bio-related molecules |
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JP5041680B2 (en) * | 2005-06-17 | 2012-10-03 | 株式会社ハイペップ研究所 | Biochip substrate and biochip |
JP2008105973A (en) * | 2006-10-24 | 2008-05-08 | Toyo Kohan Co Ltd | Method of preserving polypeptide immobilized support |
KR101414232B1 (en) * | 2007-08-02 | 2014-08-06 | 삼성전자 주식회사 | Biochip package and biochip packaging substrate |
JP4999171B2 (en) * | 2007-08-06 | 2012-08-15 | 日本電信電話株式会社 | Protein function analyzer |
JP6931181B2 (en) * | 2016-12-20 | 2021-09-01 | 東洋製罐グループホールディングス株式会社 | Bio-related molecule immobilization carrier |
US11312831B2 (en) | 2016-11-18 | 2022-04-26 | Toyo Seikan Group Holdings, Ltd. | Carrier for bio-related molecule immobilization |
JP2018078864A (en) * | 2016-11-18 | 2018-05-24 | 東洋製罐グループホールディングス株式会社 | Carrier for immobilizing biological molecules |
FR3091703B1 (en) * | 2019-01-11 | 2021-02-12 | Fermentalg | PHYCOCYANIN EXTRACTION PROCESS |
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JP2000046832A (en) * | 1999-08-05 | 2000-02-18 | Dainabotto Kk | Chromatography immune analyzer |
JP2003344386A (en) * | 2002-05-21 | 2003-12-03 | Advanced Gene Technology Corp | Method to ascertain quality of herbs |
JP2004020328A (en) * | 2002-06-14 | 2004-01-22 | Toyo Kohan Co Ltd | Chemically modified solid support body, and use therefor |
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JP2000046832A (en) * | 1999-08-05 | 2000-02-18 | Dainabotto Kk | Chromatography immune analyzer |
JP2003344386A (en) * | 2002-05-21 | 2003-12-03 | Advanced Gene Technology Corp | Method to ascertain quality of herbs |
JP2004020328A (en) * | 2002-06-14 | 2004-01-22 | Toyo Kohan Co Ltd | Chemically modified solid support body, and use therefor |
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US8455400B2 (en) | 2005-05-24 | 2013-06-04 | Hipep Laboratories | Substrate for biochip and biochip |
EP3581930A4 (en) * | 2017-02-08 | 2020-12-16 | Toyo Seikan Group Holdings, Ltd. | Carrier for immobilizing bio-related molecules |
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