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WO2003010809A1 - Dispositif de traitement au plasma et table de montage de substrat - Google Patents

Dispositif de traitement au plasma et table de montage de substrat Download PDF

Info

Publication number
WO2003010809A1
WO2003010809A1 PCT/JP2002/007507 JP0207507W WO03010809A1 WO 2003010809 A1 WO2003010809 A1 WO 2003010809A1 JP 0207507 W JP0207507 W JP 0207507W WO 03010809 A1 WO03010809 A1 WO 03010809A1
Authority
WO
WIPO (PCT)
Prior art keywords
treating
susceptor
mounting table
treating device
substrate mounting
Prior art date
Application number
PCT/JP2002/007507
Other languages
English (en)
French (fr)
Inventor
Hachishiro Iizuka
Taro Ikeda
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Priority to US10/484,430 priority Critical patent/US7513954B2/en
Priority to KR1020047001126A priority patent/KR100540052B1/ko
Publication of WO2003010809A1 publication Critical patent/WO2003010809A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
PCT/JP2002/007507 2001-07-27 2002-07-24 Dispositif de traitement au plasma et table de montage de substrat WO2003010809A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/484,430 US7513954B2 (en) 2001-07-27 2002-07-24 Plasma processing apparatus and substrate mounting table employed therein
KR1020047001126A KR100540052B1 (ko) 2001-07-27 2002-07-24 플라즈마 처리 장치 및 기판 탑재대

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001-227649 2001-07-27
JP2001227649 2001-07-27
JP2002199102A JP4219628B2 (ja) 2001-07-27 2002-07-08 プラズマ処理装置および基板載置台
JP2002-199102 2002-07-08

Publications (1)

Publication Number Publication Date
WO2003010809A1 true WO2003010809A1 (fr) 2003-02-06

Family

ID=26619426

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007507 WO2003010809A1 (fr) 2001-07-27 2002-07-24 Dispositif de traitement au plasma et table de montage de substrat

Country Status (4)

Country Link
US (1) US7513954B2 (ja)
JP (1) JP4219628B2 (ja)
KR (1) KR100540052B1 (ja)
WO (1) WO2003010809A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004097919A1 (ja) * 2003-05-02 2004-11-11 Tokyo Electron Limited 処理ガス導入機構およびプラズマ処理装置
CN100350569C (zh) * 2003-05-02 2007-11-21 东京毅力科创株式会社 处理气体导入机构和等离子体处理装置

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US20040139917A1 (en) * 2002-10-17 2004-07-22 Naoshi Yamaguchi Plasma processing apparatus
US6902646B2 (en) * 2003-08-14 2005-06-07 Advanced Energy Industries, Inc. Sensor array for measuring plasma characteristics in plasma processing environments
US20050196971A1 (en) * 2004-03-05 2005-09-08 Applied Materials, Inc. Hardware development to reduce bevel deposition
US7323116B2 (en) * 2004-09-27 2008-01-29 Lam Research Corporation Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
JP4672597B2 (ja) * 2005-06-02 2011-04-20 日本碍子株式会社 基板処理装置
JP4724487B2 (ja) * 2005-08-02 2011-07-13 横浜ゴム株式会社 タイヤ加硫成形用金型の洗浄方法及びその装置
JP4722669B2 (ja) * 2005-10-26 2011-07-13 株式会社日立ハイテクインスツルメンツ プラズマ洗浄装置
JP2007324295A (ja) * 2006-05-31 2007-12-13 Dainippon Screen Mfg Co Ltd ウエハ薄化装置及びウエハ処理システム
KR100804787B1 (ko) 2006-06-05 2008-02-20 주식회사 뉴파워 프라즈마 능동 바이어스 제어 회로를 갖는 플라즈마 처리 장치 및 그제어 방법
JP5111876B2 (ja) 2007-01-31 2013-01-09 東京エレクトロン株式会社 基板載置構造体及び基板処理装置
JP2008226514A (ja) * 2007-03-09 2008-09-25 Matsushita Electric Ind Co Ltd プラズマ処理装置
US8241457B2 (en) 2007-03-30 2012-08-14 Tokyo Electron Limited Plasma processing system, plasma measurement system, plasma measurement method, and plasma control system
JP2008277275A (ja) * 2007-03-30 2008-11-13 Tokyo Electron Ltd プラズマ処理装置、計測装置、計測方法および制御装置
JP5358165B2 (ja) * 2008-11-26 2013-12-04 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
DE102009015749B3 (de) * 2009-03-31 2011-01-20 Globalfoundries Dresden Module One Llc & Co. Kg Erhöhen der Haftung von dielektrischen Zwischenschichtmaterialien von Halbleiterbauelementen durch Unterdrücken der Silizidbildung am Substratrand
KR101071180B1 (ko) * 2009-04-03 2011-10-10 한국생산기술연구원 반도체 웨이퍼 관통 비아홀 내의 금속 필링장치 및 이를 이용한 필링방법
JP5698043B2 (ja) * 2010-08-04 2015-04-08 株式会社ニューフレアテクノロジー 半導体製造装置
DE102012200878B4 (de) * 2012-01-23 2014-11-20 Forschungsverbund Berlin E.V. Verfahren und Vorrichtung zum Erzeugen von Plasmapulsen
TWI476831B (en) * 2012-03-28 2015-03-11 Tgl tio2/sio2/nitride dry etch
US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
US9997381B2 (en) * 2013-02-18 2018-06-12 Lam Research Corporation Hybrid edge ring for plasma wafer processing
US11195756B2 (en) * 2014-09-19 2021-12-07 Applied Materials, Inc. Proximity contact cover ring for plasma dicing
US20160365261A1 (en) * 2015-06-11 2016-12-15 Lam Research Corporation Plasma etching device with doped quartz surfaces
WO2019096425A1 (en) * 2017-11-20 2019-05-23 Applied Materials, Inc. Substrate support for processing a substrate, vacuum processing apparatus and substrate processing system
JP6846384B2 (ja) 2018-06-12 2021-03-24 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理装置の高周波電源を制御する方法
KR20210125155A (ko) * 2020-04-07 2021-10-18 삼성디스플레이 주식회사 표시 장치의 제조방법
CN112951691A (zh) * 2021-02-10 2021-06-11 北京北方华创微电子装备有限公司 下电极组件及半导体设备

Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH0927395A (ja) * 1995-07-12 1997-01-28 Kobe Steel Ltd プラズマ処理装置及び該装置を用いたプラズマ処理方法
JP2000164712A (ja) * 1998-11-27 2000-06-16 Sony Corp 電子装置の製造方法
US6297165B1 (en) * 1998-06-26 2001-10-02 Matsushita Electric Industrial Co., Ltd. Etching and cleaning methods

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JPS60126832A (ja) * 1983-12-14 1985-07-06 Hitachi Ltd ドライエツチング方法および装置
JP2830978B2 (ja) 1990-09-21 1998-12-02 忠弘 大見 リアクティブイオンエッチング装置及びプラズマプロセス装置
JPH06232088A (ja) 1993-01-29 1994-08-19 Tokyo Electron Ltd プラズマ装置及びプラズマ処理方法
KR100290748B1 (ko) * 1993-01-29 2001-06-01 히가시 데쓰로 플라즈마 처리장치
US5811022A (en) * 1994-11-15 1998-09-22 Mattson Technology, Inc. Inductive plasma reactor
US5688358A (en) * 1995-03-08 1997-11-18 Applied Materials, Inc. R.F. plasma reactor with larger-than-wafer pedestal conductor
JP3208044B2 (ja) * 1995-06-07 2001-09-10 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JPH0923795A (ja) 1995-07-10 1997-01-28 Daiwa Seiko Inc 魚釣用電動リ−ル
GB9620151D0 (en) * 1996-09-27 1996-11-13 Surface Tech Sys Ltd Plasma processing apparatus
JP4151749B2 (ja) * 1998-07-16 2008-09-17 東京エレクトロンＡｔ株式会社 プラズマ処理装置およびその方法
US6364954B2 (en) * 1998-12-14 2002-04-02 Applied Materials, Inc. High temperature chemical vapor deposition chamber
US6409896B2 (en) * 1999-12-01 2002-06-25 Applied Materials, Inc. Method and apparatus for semiconductor wafer process monitoring
TW483037B (en) * 2000-03-24 2002-04-11 Hitachi Ltd Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
JP2001298020A (ja) * 2000-04-18 2001-10-26 Nhk Spring Co Ltd セラミックヒータ及びそれを用いた成膜処理装置
JP2001308065A (ja) * 2000-04-19 2001-11-02 Nec Corp ドライエッチング装置およびドライエッチング方法
US6494958B1 (en) * 2000-06-29 2002-12-17 Applied Materials Inc. Plasma chamber support with coupled electrode
US6521292B1 (en) * 2000-08-04 2003-02-18 Applied Materials, Inc. Substrate support including purge ring having inner edge aligned to wafer edge

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0927395A (ja) * 1995-07-12 1997-01-28 Kobe Steel Ltd プラズマ処理装置及び該装置を用いたプラズマ処理方法
US6297165B1 (en) * 1998-06-26 2001-10-02 Matsushita Electric Industrial Co., Ltd. Etching and cleaning methods
JP2000164712A (ja) * 1998-11-27 2000-06-16 Sony Corp 電子装置の製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004097919A1 (ja) * 2003-05-02 2004-11-11 Tokyo Electron Limited 処理ガス導入機構およびプラズマ処理装置
KR100756095B1 (ko) * 2003-05-02 2007-09-05 동경 엘렉트론 주식회사 처리가스도입기구 및 플라즈마처리장치
CN100350569C (zh) * 2003-05-02 2007-11-21 东京毅力科创株式会社 处理气体导入机构和等离子体处理装置
JP2009272657A (ja) * 2003-05-02 2009-11-19 Tokyo Electron Ltd プラズマ処理装置
JP2009283975A (ja) * 2003-05-02 2009-12-03 Tokyo Electron Ltd プラズマ処理装置
US8191505B2 (en) 2003-05-02 2012-06-05 Tokyo Electron Limited Process gas introducing mechanism and plasma processing device

Also Published As

Publication number Publication date
JP2003124201A (ja) 2003-04-25
JP4219628B2 (ja) 2009-02-04
US20040163762A1 (en) 2004-08-26
US7513954B2 (en) 2009-04-07
KR20040021653A (ko) 2004-03-10
KR100540052B1 (ko) 2006-01-11

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