WO2003065024A3 - Gmr-sensoranordnung und synthetischer anti-ferromagnet dafür - Google Patents
Gmr-sensoranordnung und synthetischer anti-ferromagnet dafür Download PDFInfo
- Publication number
- WO2003065024A3 WO2003065024A3 PCT/EP2003/000605 EP0300605W WO03065024A3 WO 2003065024 A3 WO2003065024 A3 WO 2003065024A3 EP 0300605 W EP0300605 W EP 0300605W WO 03065024 A3 WO03065024 A3 WO 03065024A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- ferromagnet
- sensor assembly
- synthetic anti
- gmr sensor
- Prior art date
Links
- 230000005294 ferromagnetic effect Effects 0.000 abstract 4
- 230000005291 magnetic effect Effects 0.000 abstract 3
- 238000013517 stratification Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Hall/Mr Elements (AREA)
Abstract
Die Erfindung beschreibt eine GMR-Sensoranordnung mit einer GMR-Schichtung (2), welche eine ferromagnetische Schicht mit leicht drehbarer Magnetisierungsausrichtung die free layer (3) -, eine ferromagnetische Schicht mit einer festen magnetischen Ausrichtung - die pinned layer (4) - und eine dazwischen liegende nicht magnetische Zwischenchicht (5) umfasst, wobei die pinned layer (4) gleichzeitig die erste ferromagnetische Schicht eines synthetischen Anti-Ferromagnets (6) bildet, der weiterhin eine zweite ferromagnetische Schicht (8) und eine dazwischen liegende Zwischenschicht (7) aufweist, welche dadurch gekennzeichnet ist, dass die Zwischenschicht (7) des synthetischen Anti-Ferromagnets (6) aus einem elektrisch isolierenden bzw. Hochohmigen Material besteht.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2002103466 DE10203466A1 (de) | 2002-01-28 | 2002-01-28 | GMR-Sensoranordnung und synthetischer Anti-Ferromagnet dafür |
DE10203466.4 | 2002-01-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003065024A2 WO2003065024A2 (de) | 2003-08-07 |
WO2003065024A3 true WO2003065024A3 (de) | 2003-12-24 |
Family
ID=27588132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/000605 WO2003065024A2 (de) | 2002-01-28 | 2003-01-22 | Gmr-sensoranordnung und synthetischer anti-ferromagnet dafür |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10203466A1 (de) |
WO (1) | WO2003065024A2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7367109B2 (en) | 2005-01-31 | 2008-05-06 | Hitachi Global Storage Technologies Netherlands B.V. | Method of fabricating magnetic sensors with pinned layers with zero net magnetic moment |
US7554775B2 (en) | 2005-02-28 | 2009-06-30 | Hitachi Global Storage Technologies Netherlands B.V. | GMR sensors with strongly pinning and pinned layers |
FR2932593B1 (fr) * | 2008-06-13 | 2010-09-03 | Parkeon | Systeme et procede de verification de la validite d'un article de valeur, et horodateur comprenant un tel systeme |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5686838A (en) * | 1992-12-21 | 1997-11-11 | Siemens Aktiengesellschaft | Magnetoresistive sensor having at least a layer system and a plurality of measuring contacts disposed thereon, and a method of producing the sensor |
EP0971423A1 (de) * | 1998-07-10 | 2000-01-12 | Interuniversitair Micro-Elektronica Centrum Vzw | Spin-Valve-Struktur und Herstellungsverfahren |
WO2000017660A1 (de) * | 1998-09-22 | 2000-03-30 | Robert Bosch Gmbh | Elektronisches bauelement |
WO2000019226A1 (en) * | 1998-09-28 | 2000-04-06 | Seagate Technology Llc | Quad-layer gmr sandwich |
WO2000063714A1 (en) * | 1999-04-20 | 2000-10-26 | Seagate Technology Llc | GIANT MAGNETORESISTIVE SENSOR WITH A CrMnPt PINNING LAYER AND A NiFeCr SEED LAYER |
WO2001031357A1 (en) * | 1999-10-28 | 2001-05-03 | Seagate Technology Llc | Spin-valve sensor |
US6278592B1 (en) * | 1999-08-17 | 2001-08-21 | Seagate Technology Llc | GMR spin valve having a bilayer TaN/NiFeCr seedlayer to improve GMR response and exchange pinning field |
WO2001065269A1 (de) * | 2000-03-02 | 2001-09-07 | Forschungszentrum Jülich GmbH | Magnetfeldmessanordnung mittels einer brückenschaltung von spin-tunnel-elementen und herstellungsverfahren |
US6292336B1 (en) * | 1999-09-30 | 2001-09-18 | Headway Technologies, Inc. | Giant magnetoresistive (GMR) sensor element with enhanced magnetoresistive (MR) coefficient |
US6331773B1 (en) * | 1999-04-16 | 2001-12-18 | Storage Technology Corporation | Pinned synthetic anti-ferromagnet with oxidation protection layer |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0971424A3 (de) * | 1998-07-10 | 2004-08-25 | Interuniversitair Microelektronica Centrum Vzw | Spin-Valve Struktur und Herstellungsverfahren |
-
2002
- 2002-01-28 DE DE2002103466 patent/DE10203466A1/de not_active Withdrawn
-
2003
- 2003-01-22 WO PCT/EP2003/000605 patent/WO2003065024A2/de not_active Application Discontinuation
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5686838A (en) * | 1992-12-21 | 1997-11-11 | Siemens Aktiengesellschaft | Magnetoresistive sensor having at least a layer system and a plurality of measuring contacts disposed thereon, and a method of producing the sensor |
EP0971423A1 (de) * | 1998-07-10 | 2000-01-12 | Interuniversitair Micro-Elektronica Centrum Vzw | Spin-Valve-Struktur und Herstellungsverfahren |
WO2000017660A1 (de) * | 1998-09-22 | 2000-03-30 | Robert Bosch Gmbh | Elektronisches bauelement |
WO2000019226A1 (en) * | 1998-09-28 | 2000-04-06 | Seagate Technology Llc | Quad-layer gmr sandwich |
US6331773B1 (en) * | 1999-04-16 | 2001-12-18 | Storage Technology Corporation | Pinned synthetic anti-ferromagnet with oxidation protection layer |
WO2000063714A1 (en) * | 1999-04-20 | 2000-10-26 | Seagate Technology Llc | GIANT MAGNETORESISTIVE SENSOR WITH A CrMnPt PINNING LAYER AND A NiFeCr SEED LAYER |
US6278592B1 (en) * | 1999-08-17 | 2001-08-21 | Seagate Technology Llc | GMR spin valve having a bilayer TaN/NiFeCr seedlayer to improve GMR response and exchange pinning field |
US6292336B1 (en) * | 1999-09-30 | 2001-09-18 | Headway Technologies, Inc. | Giant magnetoresistive (GMR) sensor element with enhanced magnetoresistive (MR) coefficient |
WO2001031357A1 (en) * | 1999-10-28 | 2001-05-03 | Seagate Technology Llc | Spin-valve sensor |
WO2001065269A1 (de) * | 2000-03-02 | 2001-09-07 | Forschungszentrum Jülich GmbH | Magnetfeldmessanordnung mittels einer brückenschaltung von spin-tunnel-elementen und herstellungsverfahren |
Also Published As
Publication number | Publication date |
---|---|
WO2003065024A2 (de) | 2003-08-07 |
DE10203466A1 (de) | 2003-08-14 |
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