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WO1997008287A3 - Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions - Google Patents

Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions Download PDF

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Publication number
WO1997008287A3
WO1997008287A3 PCT/US1996/013939 US9613939W WO9708287A3 WO 1997008287 A3 WO1997008287 A3 WO 1997008287A3 US 9613939 W US9613939 W US 9613939W WO 9708287 A3 WO9708287 A3 WO 9708287A3
Authority
WO
WIPO (PCT)
Prior art keywords
polyamino monosuccinic
fluid
monosuccinic acid
copper
polyamino
Prior art date
Application number
PCT/US1996/013939
Other languages
English (en)
Other versions
WO1997008287A2 (fr
WO1997008287B1 (fr
Inventor
Alan D Strickland
David A Wilson
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Priority to JP51058397A priority Critical patent/JP2002515922A/ja
Priority to BR9610165A priority patent/BR9610165A/pt
Priority to EP96929807A priority patent/EP0871695A2/fr
Publication of WO1997008287A2 publication Critical patent/WO1997008287A2/fr
Publication of WO1997008287A3 publication Critical patent/WO1997008287A3/fr
Publication of WO1997008287B1 publication Critical patent/WO1997008287B1/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/33Amino carboxylic acids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/48Sulfur compounds
    • B01D53/52Hydrogen sulfide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/54Nitrogen compounds
    • B01D53/56Nitrogen oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Detergent Compositions (AREA)
  • Chemically Coating (AREA)

Abstract

Les acides polyamino-monosucciniques sont des chélatants efficaces utilisés dans le traitement de gaz (l'acide polyamino-monosucciniques se présentant de préférence sous la forme d'un chélate métallique, de préférence un complexe de fer). Du sulfure d'hydrogène peut être éliminé d'un fluide par la mise en contact de ce fluide avec une solution aqueuse à un pH adapté pour l'élimination de sulfure d'hydrogène, la solution contenant au moins un chélate de métal polyvalent de valence plus élevée d'au moins un acide polyamino-monosuccinique. Le NOx peut être éliminé d'un fluide par la mise en contact de ce fluide avec une solution aqueuse d'au moins un chélate de métal de niveau de valence inférieur d'au moins un acide polyamino-monosuccinique. Les chélates de cuivre sont également utiles au dépôt de cuivre chimique. Concernant le dépôt de cuivre chimique, on décrit un procédé de dépôt de cuivre chimique sur une surface non métallique réceptive au cuivre déposé, consistant notamment à mettre en contact la surface non métallique avec une solution aqueuse comportant un sel de cuivre soluble, au moins un acide polyamino-monosuccinique et des bains de plaquage appropriés pour cet usage. L'invention concerne par ailleurs l'utilisation d'acides polyamino-monosucciniques dans des compositions détergentes de blanchissage contenant un tensioactif détergent et un adjuvant.
PCT/US1996/013939 1995-08-30 1996-08-29 Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions WO1997008287A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP51058397A JP2002515922A (ja) 1995-08-30 1996-08-29 ポリアミノモノ琥珀酸誘導体分解性キレート化剤、その使用及びその組成物
BR9610165A BR9610165A (pt) 1995-08-30 1996-08-29 Composição adequada para uso como uma composição de limpeza processo para lavagem de tecido e processo para deposição de corre sem eletrólise
EP96929807A EP0871695A2 (fr) 1995-08-30 1996-08-29 Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US304195P 1995-08-30 1995-08-30
US60/300,041 1995-08-30

Publications (3)

Publication Number Publication Date
WO1997008287A2 WO1997008287A2 (fr) 1997-03-06
WO1997008287A3 true WO1997008287A3 (fr) 1997-05-15
WO1997008287B1 WO1997008287B1 (fr) 1997-07-24

Family

ID=21703828

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/013939 WO1997008287A2 (fr) 1995-08-30 1996-08-29 Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions

Country Status (4)

Country Link
EP (1) EP0871695A2 (fr)
BR (1) BR9610165A (fr)
CA (1) CA2230275A1 (fr)
WO (1) WO1997008287A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1165488B1 (fr) 1999-03-26 2003-08-13 The Dow Chemical Company Procede de preparation d'acides polyamino-monosucciniques et de leurs derives
AU2004251492B2 (en) * 2003-06-27 2011-03-17 Invitrogen Dynal As Conjugates of magnetic polymer particles and carboxymethylated aspartic acid
EP2784181B1 (fr) * 2013-03-27 2015-12-09 ATOTECH Deutschland GmbH Solution de dépôt de cuivre chimique
WO2024210933A1 (fr) * 2023-04-03 2024-10-10 Wella Operations Us Composition de renforcement des ongles par addition de michael et procédé d'utilisation
CN116422130B (zh) * 2023-04-13 2024-01-23 西安赫立盖斯新能源科技有限公司 一种溶剂、溶剂的生产方法和生产装置

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2761874A (en) * 1954-09-30 1956-09-04 Dow Chemical Co Amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
GB757704A (en) * 1952-04-22 1956-09-26 Dow Chemical Co Improvements in amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US3773510A (en) * 1971-06-26 1973-11-20 Minnesota Mining & Mfg Additives to bleach/fix baths
EP0267653A2 (fr) * 1986-11-10 1988-05-18 The Procter & Gamble Company Composition détergente contenant l'acide éthylènediamine N,N' disuccinique
EP0361088A1 (fr) * 1988-08-26 1990-04-04 TRIGON CHEMIE GmbH Dérivés de l'acide aspartique et procédé pour leur préparation
EP0567126A1 (fr) * 1992-04-24 1993-10-27 Fuji Photo Film Co., Ltd. Composition de traitement pour un produit photographique à l'halogénure d'argent et méthode de traitement l'utilisant
WO1994003572A1 (fr) * 1992-08-01 1994-02-17 Procter & Gamble Company Compositions detersives
WO1994028464A1 (fr) * 1993-05-20 1994-12-08 The Dow Chemical Company Chelateurs degradables derives de l'acide succinique, leurs utilisations et leurs compositions
WO1996015290A1 (fr) * 1994-11-11 1996-05-23 The Associated Octel Company Limited Emploi d'un compose
US5585226A (en) * 1995-08-30 1996-12-17 Eastman Kodak Company Polyamino monoesuccinates for use in photographic processes
EP0762203A1 (fr) * 1995-08-30 1997-03-12 Eastman Kodak Company Agents chélatants dégradables dérivés d'acide succinique, leurs emplois et compositions

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB757704A (en) * 1952-04-22 1956-09-26 Dow Chemical Co Improvements in amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US2761874A (en) * 1954-09-30 1956-09-04 Dow Chemical Co Amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US3773510A (en) * 1971-06-26 1973-11-20 Minnesota Mining & Mfg Additives to bleach/fix baths
EP0267653A2 (fr) * 1986-11-10 1988-05-18 The Procter & Gamble Company Composition détergente contenant l'acide éthylènediamine N,N' disuccinique
EP0361088A1 (fr) * 1988-08-26 1990-04-04 TRIGON CHEMIE GmbH Dérivés de l'acide aspartique et procédé pour leur préparation
EP0567126A1 (fr) * 1992-04-24 1993-10-27 Fuji Photo Film Co., Ltd. Composition de traitement pour un produit photographique à l'halogénure d'argent et méthode de traitement l'utilisant
WO1994003572A1 (fr) * 1992-08-01 1994-02-17 Procter & Gamble Company Compositions detersives
WO1994028464A1 (fr) * 1993-05-20 1994-12-08 The Dow Chemical Company Chelateurs degradables derives de l'acide succinique, leurs utilisations et leurs compositions
WO1996015290A1 (fr) * 1994-11-11 1996-05-23 The Associated Octel Company Limited Emploi d'un compose
US5585226A (en) * 1995-08-30 1996-12-17 Eastman Kodak Company Polyamino monoesuccinates for use in photographic processes
EP0762203A1 (fr) * 1995-08-30 1997-03-12 Eastman Kodak Company Agents chélatants dégradables dérivés d'acide succinique, leurs emplois et compositions

Also Published As

Publication number Publication date
BR9610165A (pt) 1998-08-04
WO1997008287A2 (fr) 1997-03-06
CA2230275A1 (fr) 1997-03-06
EP0871695A2 (fr) 1998-10-21

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