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WO1997008287A3 - Polyamino monosuccinic acid derivative degradable chelants, uses and compositions thereof - Google Patents

Polyamino monosuccinic acid derivative degradable chelants, uses and compositions thereof Download PDF

Info

Publication number
WO1997008287A3
WO1997008287A3 PCT/US1996/013939 US9613939W WO9708287A3 WO 1997008287 A3 WO1997008287 A3 WO 1997008287A3 US 9613939 W US9613939 W US 9613939W WO 9708287 A3 WO9708287 A3 WO 9708287A3
Authority
WO
WIPO (PCT)
Prior art keywords
polyamino monosuccinic
fluid
monosuccinic acid
copper
polyamino
Prior art date
Application number
PCT/US1996/013939
Other languages
French (fr)
Other versions
WO1997008287B1 (en
WO1997008287A2 (en
Inventor
Alan D Strickland
David A Wilson
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Priority to EP96929807A priority Critical patent/EP0871695A2/en
Priority to JP51058397A priority patent/JP2002515922A/en
Priority to BR9610165A priority patent/BR9610165A/en
Publication of WO1997008287A2 publication Critical patent/WO1997008287A2/en
Publication of WO1997008287A3 publication Critical patent/WO1997008287A3/en
Publication of WO1997008287B1 publication Critical patent/WO1997008287B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/33—Amino carboxylic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • B01D53/52—Hydrogen sulfide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/56—Nitrogen oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Detergent Compositions (AREA)
  • Chemically Coating (AREA)

Abstract

Polyamino monosuccinic acids are effective chelants for use in gas conditioning (preferably involving the polyamino monosuccinic acid in the form of a metal chelate, preferably an iron complex). Hydrogen sulfide can be removed from a fluid by contacting said fluid with an aqueous solution at a pH suitable for removing hydrogen sulfide wherein said solution contains at least one higher valence polyvalent metal chelate of at least one polyamino monosuccinic acid. NOx can be removed from a fluid by contacting the fluid with an aqueous solution of a least one lower valence state polyvalent metal chelate of at least one polyamino monosuccinic acid. The copper chelates are also useful in electroless copper plating. In electroless deposition, the invention includes a method of electroless deposition of copper upon a non-metallic surface receptive to the deposited copper including a step of contacting the non-metallic surface with an aqueous solution comprising a soluble copper salt and at least one polyamino monosuccinic acid and plating baths appropriate for such use. Another aspect of the invention includes the use of the polyamino monosuccinic acids in laundry detergent compositions containing a detergent surfactant and builder.
PCT/US1996/013939 1995-08-30 1996-08-29 Polyamino monosuccinic acid derivative degradable chelants, uses and compositions thereof WO1997008287A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP96929807A EP0871695A2 (en) 1995-08-30 1996-08-29 Polyamino monosuccinic acid derivative degradable chelants, uses and compositions thereof
JP51058397A JP2002515922A (en) 1995-08-30 1996-08-29 Polyaminomonosuccinic acid derivative-degradable chelating agent, its use and composition thereof
BR9610165A BR9610165A (en) 1995-08-30 1996-08-29 Composition suitable for use as a cleaning composition process for washing fabric and process for deposition of run without electrolysis

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US304195P 1995-08-30 1995-08-30
US60/300,041 1995-08-30

Publications (3)

Publication Number Publication Date
WO1997008287A2 WO1997008287A2 (en) 1997-03-06
WO1997008287A3 true WO1997008287A3 (en) 1997-05-15
WO1997008287B1 WO1997008287B1 (en) 1997-07-24

Family

ID=21703828

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/013939 WO1997008287A2 (en) 1995-08-30 1996-08-29 Polyamino monosuccinic acid derivative degradable chelants, uses and compositions thereof

Country Status (4)

Country Link
EP (1) EP0871695A2 (en)
BR (1) BR9610165A (en)
CA (1) CA2230275A1 (en)
WO (1) WO1997008287A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60004502T2 (en) * 1999-03-26 2004-02-26 The Dow Chemical Co., Midland MANUFACTURE OF SUCCINIC ACID AND DERIVATIVES WITH POLYAMINO FUNCTIONALITIES
US20060189797A1 (en) * 2003-06-27 2006-08-24 Pal Songe Magnetic polymer particles
EP2784181B1 (en) * 2013-03-27 2015-12-09 ATOTECH Deutschland GmbH Electroless copper plating solution
WO2024210933A1 (en) * 2023-04-03 2024-10-10 Wella Operations Us Michael addition nail strengthening composition and method of use
CN116422130B (en) * 2023-04-13 2024-01-23 西安赫立盖斯新能源科技有限公司 Solvent, solvent production method and production device

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2761874A (en) * 1954-09-30 1956-09-04 Dow Chemical Co Amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
GB757704A (en) * 1952-04-22 1956-09-26 Dow Chemical Co Improvements in amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US3773510A (en) * 1971-06-26 1973-11-20 Minnesota Mining & Mfg Additives to bleach/fix baths
EP0267653A2 (en) * 1986-11-10 1988-05-18 The Procter & Gamble Company Detergent composition containing ethylenediamine-N,N' disuccinic acid
EP0361088A1 (en) * 1988-08-26 1990-04-04 TRIGON CHEMIE GmbH Aspartic-acid derivatives and process for their preparation
EP0567126A1 (en) * 1992-04-24 1993-10-27 Fuji Photo Film Co., Ltd. Processing composition for silver halide photographic material and processing method using same
WO1994003572A1 (en) * 1992-08-01 1994-02-17 Procter & Gamble Company Detergent compositions
WO1994028464A1 (en) * 1993-05-20 1994-12-08 The Dow Chemical Company Succinic acid derivative degradable chelants, uses and compositions thereof
WO1996015290A1 (en) * 1994-11-11 1996-05-23 The Associated Octel Company Limited Use of a compound
US5585226A (en) * 1995-08-30 1996-12-17 Eastman Kodak Company Polyamino monoesuccinates for use in photographic processes
EP0762203A1 (en) * 1995-08-30 1997-03-12 Eastman Kodak Company Succinic acid derivative degradable chelants, uses and compositions thereof

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB757704A (en) * 1952-04-22 1956-09-26 Dow Chemical Co Improvements in amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US2761874A (en) * 1954-09-30 1956-09-04 Dow Chemical Co Amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US3773510A (en) * 1971-06-26 1973-11-20 Minnesota Mining & Mfg Additives to bleach/fix baths
EP0267653A2 (en) * 1986-11-10 1988-05-18 The Procter & Gamble Company Detergent composition containing ethylenediamine-N,N' disuccinic acid
EP0361088A1 (en) * 1988-08-26 1990-04-04 TRIGON CHEMIE GmbH Aspartic-acid derivatives and process for their preparation
EP0567126A1 (en) * 1992-04-24 1993-10-27 Fuji Photo Film Co., Ltd. Processing composition for silver halide photographic material and processing method using same
WO1994003572A1 (en) * 1992-08-01 1994-02-17 Procter & Gamble Company Detergent compositions
WO1994028464A1 (en) * 1993-05-20 1994-12-08 The Dow Chemical Company Succinic acid derivative degradable chelants, uses and compositions thereof
WO1996015290A1 (en) * 1994-11-11 1996-05-23 The Associated Octel Company Limited Use of a compound
US5585226A (en) * 1995-08-30 1996-12-17 Eastman Kodak Company Polyamino monoesuccinates for use in photographic processes
EP0762203A1 (en) * 1995-08-30 1997-03-12 Eastman Kodak Company Succinic acid derivative degradable chelants, uses and compositions thereof

Also Published As

Publication number Publication date
EP0871695A2 (en) 1998-10-21
CA2230275A1 (en) 1997-03-06
BR9610165A (en) 1998-08-04
WO1997008287A2 (en) 1997-03-06

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