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WO1996033098A3 - Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication - Google Patents

Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication Download PDF

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Publication number
WO1996033098A3
WO1996033098A3 PCT/US1996/003815 US9603815W WO9633098A3 WO 1996033098 A3 WO1996033098 A3 WO 1996033098A3 US 9603815 W US9603815 W US 9603815W WO 9633098 A3 WO9633098 A3 WO 9633098A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
impermeable
chemically inert
gases
conducting
Prior art date
Application number
PCT/US1996/003815
Other languages
English (en)
Other versions
WO1996033098A2 (fr
Inventor
Manfred R Kuehnle
Arno Hagenlocher
Klaus Schuegraf
Hermann Statz
Original Assignee
Xmx Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xmx Corp filed Critical Xmx Corp
Priority to AU52576/96A priority Critical patent/AU5257696A/en
Publication of WO1996033098A2 publication Critical patent/WO1996033098A2/fr
Publication of WO1996033098A3 publication Critical patent/WO1996033098A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/206—Filters comprising particles embedded in a solid matrix

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention décrit un procédé de fabrication d'une structure de parois de conteneur imperméable aux gaz et chimiquement inerte, consistant à effectuer les étapes suivantes: préparer une couche de base dans un matériau polymère organique; apporter de préférence par injection de gaz pulsé un couple de gaz réactifs sur la surface de la couche de base; chauffer les gaz de préférence par impulsions d'énergie à ondes ultracourtes suffisamment pour créer un plasma qui amène la réaction des gaz à former un composé de vapeur inorganique qui se dépose sur la surface; continuer l'apport des gaz et leur chauffage jusqu'à ce que le dépôt du composé de vapeur sur la surface forme sur la surface une barrière chimiquement inerte et imperméable aux gaz et d'épaisseur désirée. L'invention décrit également diverses structures de parois et les dispositifs pour les fabriquer.
PCT/US1996/003815 1995-04-13 1996-03-21 Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication WO1996033098A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU52576/96A AU5257696A (en) 1995-04-13 1996-03-21 Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42153695A 1995-04-13 1995-04-13
US08/421,536 1995-04-13

Publications (2)

Publication Number Publication Date
WO1996033098A2 WO1996033098A2 (fr) 1996-10-24
WO1996033098A3 true WO1996033098A3 (fr) 1996-12-12

Family

ID=23670949

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/003815 WO1996033098A2 (fr) 1995-04-13 1996-03-21 Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication

Country Status (3)

Country Link
AU (1) AU5257696A (fr)
IL (1) IL117653A0 (fr)
WO (1) WO1996033098A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5384924A (en) * 1992-08-03 1995-01-31 Mallinckrodt Medical, Inc. Warming blanket having multiple inlets
FR2814382B1 (fr) * 2000-09-28 2003-05-09 Cebal Procede de depot d'un revetement interne dans un recipient en matiere plastique
US6514870B2 (en) 2001-01-26 2003-02-04 Applied Materials, Inc. In situ wafer heat for reduced backside contamination
DE10139305A1 (de) * 2001-08-07 2003-03-06 Schott Glas Verbundmaterial aus einem Substratmaterial und einem Barriereschichtmaterial
DE10258680B4 (de) * 2002-08-07 2008-09-11 Schott Ag Herstellen eines Verbundmaterials mit einem biologisch abbaubaren Kunststoffsubstrat und zumindest einer Beschichtung
DE10258678B4 (de) * 2002-12-13 2004-12-30 Schott Ag Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten
DE10242086A1 (de) * 2002-09-11 2004-04-15 Sig Technology Ltd. Behälter zur Verpackung von Produkten, Vorrichtung zur Verarbeitung von Kunstoff sowie Verfahren zur Behälterherstellung
JP2005280718A (ja) * 2004-03-26 2005-10-13 Yoshino Kogyosho Co Ltd 高いガスバリア性を有する合成樹脂製容器
DE102006048658B4 (de) 2006-10-14 2014-03-27 Khs Corpoplast Gmbh PICVD-Beschichtung für Kunststoffbehälter und Verfahren zu deren Herstellung
DE102019107660A1 (de) * 2019-03-26 2020-10-01 Krones Ag Verfahren und Vorrichtung zum Beschichten von Behältnissen
CN112030134A (zh) * 2020-07-22 2020-12-04 深圳市八六三新材料技术有限责任公司 一种基于微波等离子体化学气相沉积的阻隔容器

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4292342A (en) * 1980-05-09 1981-09-29 Motorola, Inc. High pressure plasma deposition of silicon
EP0289402A1 (fr) * 1987-04-22 1988-11-02 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Revêtement protecteur du type SiCxNyOzHt obtenu par traitement avec un plasma
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
JPH03236474A (ja) * 1989-11-02 1991-10-22 Mitsubishi Heavy Ind Ltd プラスチック表面の硬化保護膜形成方法及び装置
DE4113221A1 (de) * 1991-04-23 1992-10-29 Leybold Ag Flexible, transparente polymerfolien
WO1993024243A1 (fr) * 1992-05-28 1993-12-09 Polar Materials, Inc. Procedes et dispositif de depot de couches d'arret

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4292342A (en) * 1980-05-09 1981-09-29 Motorola, Inc. High pressure plasma deposition of silicon
EP0289402A1 (fr) * 1987-04-22 1988-11-02 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Revêtement protecteur du type SiCxNyOzHt obtenu par traitement avec un plasma
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
JPH03236474A (ja) * 1989-11-02 1991-10-22 Mitsubishi Heavy Ind Ltd プラスチック表面の硬化保護膜形成方法及び装置
DE4113221A1 (de) * 1991-04-23 1992-10-29 Leybold Ag Flexible, transparente polymerfolien
WO1993024243A1 (fr) * 1992-05-28 1993-12-09 Polar Materials, Inc. Procedes et dispositif de depot de couches d'arret

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 9148, Derwent World Patents Index; Class A32, AN 91-350965, XP002016317 *

Also Published As

Publication number Publication date
WO1996033098A2 (fr) 1996-10-24
AU5257696A (en) 1996-11-07
IL117653A0 (en) 1996-07-23

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