WO1996033098A3 - Gas-impermeable, chemically inert container structure and method of producingthe same - Google Patents
Gas-impermeable, chemically inert container structure and method of producingthe same Download PDFInfo
- Publication number
- WO1996033098A3 WO1996033098A3 PCT/US1996/003815 US9603815W WO9633098A3 WO 1996033098 A3 WO1996033098 A3 WO 1996033098A3 US 9603815 W US9603815 W US 9603815W WO 9633098 A3 WO9633098 A3 WO 9633098A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- impermeable
- chemically inert
- gases
- conducting
- Prior art date
Links
- 239000007789 gas Substances 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 230000004888 barrier function Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/206—Filters comprising particles embedded in a solid matrix
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Medicinal Chemistry (AREA)
- Laminated Bodies (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
A method of making a gas-impermeable, chemically inert container wall structure comprising the steps of providing a base layer of an organic polymeric material; conducting a pair of reactive gases to the surface of the base layer preferably by pulsed gas injection; heating the gases preferably by microwave energy pulses sufficiently to create a plasma which causes chemical reaction of the gases to form an inorganic vapor compound which becomes deposited on the surface, and continuing the conducting and heating until the compound vapor deposit on the surface forms a gas-impermeable, chemically inert barrier layer of the desired thickness on the surface. Various wall structures and apparatus for making them are also disclosed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU52576/96A AU5257696A (en) | 1995-04-13 | 1996-03-21 | Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42153695A | 1995-04-13 | 1995-04-13 | |
US08/421,536 | 1995-04-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1996033098A2 WO1996033098A2 (en) | 1996-10-24 |
WO1996033098A3 true WO1996033098A3 (en) | 1996-12-12 |
Family
ID=23670949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1996/003815 WO1996033098A2 (en) | 1995-04-13 | 1996-03-21 | Gas-impermeable, chemically inert container structure and method of producingthe same |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU5257696A (en) |
IL (1) | IL117653A0 (en) |
WO (1) | WO1996033098A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5384924A (en) * | 1992-08-03 | 1995-01-31 | Mallinckrodt Medical, Inc. | Warming blanket having multiple inlets |
FR2814382B1 (en) * | 2000-09-28 | 2003-05-09 | Cebal | METHOD FOR DEPOSITING AN INTERNAL COATING IN A PLASTIC CONTAINER |
US6514870B2 (en) | 2001-01-26 | 2003-02-04 | Applied Materials, Inc. | In situ wafer heat for reduced backside contamination |
DE10139305A1 (en) * | 2001-08-07 | 2003-03-06 | Schott Glas | Composite material made of a substrate material and a barrier layer material |
DE10258680B4 (en) * | 2002-08-07 | 2008-09-11 | Schott Ag | Producing a composite material with a biodegradable plastic substrate and at least one coating |
DE10258678B4 (en) * | 2002-12-13 | 2004-12-30 | Schott Ag | Fast process for the production of multilayer barrier layers |
DE10242086A1 (en) * | 2002-09-11 | 2004-04-15 | Sig Technology Ltd. | Containers for packaging products, device for processing plastic and methods for producing containers |
JP2005280718A (en) * | 2004-03-26 | 2005-10-13 | Yoshino Kogyosho Co Ltd | Synthetic resin container having high gas barrier property |
DE102006048658B4 (en) | 2006-10-14 | 2014-03-27 | Khs Corpoplast Gmbh | PICVD coating for plastic containers and process for their manufacture |
DE102019107660A1 (en) * | 2019-03-26 | 2020-10-01 | Krones Ag | Method and device for coating containers |
CN112030134A (en) * | 2020-07-22 | 2020-12-04 | 深圳市八六三新材料技术有限责任公司 | Barrier container based on microwave plasma chemical vapor deposition |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
EP0289402A1 (en) * | 1987-04-22 | 1988-11-02 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Protective coating of the SiCxNyOzHt-type obtained by plasma treatment |
US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
JPH03236474A (en) * | 1989-11-02 | 1991-10-22 | Mitsubishi Heavy Ind Ltd | Method and device for forming hardened protective film on plastic surface |
DE4113221A1 (en) * | 1991-04-23 | 1992-10-29 | Leybold Ag | Flexible transparent polymer film for e.g. packaging - has barrier layer on one side, produced by deposition of layer of silicon oxide under reactive atmos., pref. hydrogen@ |
WO1993024243A1 (en) * | 1992-05-28 | 1993-12-09 | Polar Materials, Inc. | Methods and apparatus for depositing barrier coatings |
-
1996
- 1996-03-21 AU AU52576/96A patent/AU5257696A/en not_active Abandoned
- 1996-03-21 WO PCT/US1996/003815 patent/WO1996033098A2/en active Application Filing
- 1996-03-26 IL IL11765396A patent/IL117653A0/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
EP0289402A1 (en) * | 1987-04-22 | 1988-11-02 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Protective coating of the SiCxNyOzHt-type obtained by plasma treatment |
US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
JPH03236474A (en) * | 1989-11-02 | 1991-10-22 | Mitsubishi Heavy Ind Ltd | Method and device for forming hardened protective film on plastic surface |
DE4113221A1 (en) * | 1991-04-23 | 1992-10-29 | Leybold Ag | Flexible transparent polymer film for e.g. packaging - has barrier layer on one side, produced by deposition of layer of silicon oxide under reactive atmos., pref. hydrogen@ |
WO1993024243A1 (en) * | 1992-05-28 | 1993-12-09 | Polar Materials, Inc. | Methods and apparatus for depositing barrier coatings |
Non-Patent Citations (1)
Title |
---|
DATABASE WPI Section Ch Week 9148, Derwent World Patents Index; Class A32, AN 91-350965, XP002016317 * |
Also Published As
Publication number | Publication date |
---|---|
WO1996033098A2 (en) | 1996-10-24 |
AU5257696A (en) | 1996-11-07 |
IL117653A0 (en) | 1996-07-23 |
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