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WO1986005784A1 - Antibiotics and preparation containing same - Google Patents

Antibiotics and preparation containing same Download PDF

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Publication number
WO1986005784A1
WO1986005784A1 PCT/JP1985/000160 JP8500160W WO8605784A1 WO 1986005784 A1 WO1986005784 A1 WO 1986005784A1 JP 8500160 W JP8500160 W JP 8500160W WO 8605784 A1 WO8605784 A1 WO 8605784A1
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WO
WIPO (PCT)
Prior art keywords
group
reaction
compound
tan
heavy water
Prior art date
Application number
PCT/JP1985/000160
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French (fr)
Japanese (ja)
Inventor
Hiroshi Shimadzu
Susumu Shinagawa
Isao Minamida
Original Assignee
Takeda Chemical Industries, Ltd.
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Filing date
Publication date
Application filed by Takeda Chemical Industries, Ltd. filed Critical Takeda Chemical Industries, Ltd.
Priority to PCT/JP1985/000160 priority Critical patent/WO1986005784A1/en
Priority to JP61063737A priority patent/JPS61257973A/en
Publication of WO1986005784A1 publication Critical patent/WO1986005784A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D491/00Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/08Bridged systems
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P31/00Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
    • A61P31/04Antibacterial agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D225/00Heterocyclic compounds containing rings of more than seven members having one nitrogen atom as the only ring hetero atom
    • C07D225/04Heterocyclic compounds containing rings of more than seven members having one nitrogen atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D225/08Heterocyclic compounds containing rings of more than seven members having one nitrogen atom as the only ring hetero atom condensed with carbocyclic rings or ring systems condensed with two six-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D513/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D513/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
    • C07D513/08Bridged systems

Definitions

  • the present invention relates to a novel ansamycin antibiotic having an antibacterial activity and a preparation containing the same.
  • Damavaricin D is known [Journal of Antibiotics, Vol. 29, No. 201]. ⁇ 203 (1976)].
  • the tansamycin antibiotic TAN-528A is produced and accumulated by culturing Streptomyces sp.
  • the present inventors synthesized various derivatives using the antibiotic TAN-528A as a raw material, and examined the pharmacological action thereof. As a result, they found that the derivatives had excellent antibacterial activity.
  • the present invention relates to (I) a compound represented by the general formula: [1]
  • R 1 and R 2 are the same or different and are each a hydrogen or carbon atom or
  • R 5 represents a divalent group via two carbon atoms which may have a substituent; This indicates that A— is bonded to the para-position of the 1 ⁇ 0 group of the benzene ring, and that Reiichi is bonded to the meta-position of the R group of the benzene ring in Formula [1].
  • R 6 is a group which can be derived from carboxy, carboxyl, or a group which can be derived from a 7- or 13-position mono-OH. That 0 H taractones may be formed, Y is one CO— or one? One (where
  • R 7 indicates that R 1 forms a 5-membered ring with one OR 1 where an organic residue through a carbon atom. )).
  • R 1 and R 2 are hydrogen, R 6 is methoxycarbonyl and Y is — C 0 —
  • X is not when R 1 is methyl and R 2 is hydrogen and R 6 is
  • X is when ,,, and are methoxycarbonyl and Y is —C 0—
  • organic residue via the carbon atom represented by R 1 or R 2 those having a molecular weight of up to 400 are preferable, and examples thereof include, for example, alkyl, alkenyl, alkynyl, aralkyl, acyl, and alkyloxy groups.
  • Luponyl and the like which may have 1 to 3 substituents.
  • one having a molecular weight of up to 300 is preferable, and for example, for example, a compound of the formula R 3 —S 0 2 — ( Wherein R 3 represents an alkyl, aryl or heterocyclic ring; These may have 1 to 3 substituents. ).
  • organic residue via the carbon atom represented by those having a molecular weight of up to 200 are preferable, and examples thereof include alkyl, alkenyl, alkynyl, acyl, alkoxycarbonyl, and acylboxycarbonyl. And these may have 1 to 3 substituents.
  • organic residue via the nitrogen atom represented by R 4 those having a molecular weight of up to 300 are preferable, and examples thereof include, for example, amino, secondary amino, and tertiary amino rings. Tertiary amino, etc., which may have 1 to 3 substituents.
  • secondary amino examples include monoalkylamino, dicycloalkylamino, monoarylamino, monoalkylamino, and the like.
  • tertiary amino examples include dialkylamino, dicycloalkylamino, diarylamino, diaralkylamino, X-alkyl-1: ⁇ : — arylamino, —alkiryl N-aralkylamino, and the like. No.
  • tertiary amino forming the ring examples include morpholino, pyrrolidino, piperazino, hexamethyleneimino and the like.
  • These primary amino, secondary amino, tertiary amino, and tertiary amino forming a ring may have 1 to 3 substituents.
  • organic residue via the oxygen atom represented by R 4 those having a molecular weight of up to 200 are preferable, and examples thereof include, for example, alkoxy, acyloxy, alkyloxycarbonyloxy, and aralkyloxy. Carbonyloxy, alkylsulfonyloxy, arylsulfonyloxy, etc. These may have 1 to 3 substituents.
  • R 3 ′ -S (O) n- (wherein, R 3 ′ represents alkyl, aryl, aralkyl, heterocycle, or heterocyclic alkyl, which has 1 to 3 substituents. N represents an integer of 0 to 2. Examples of the group include: In the above formula, examples of the halogen represented by R + include fluorine, chlorine, bromine, and iodine.
  • the divalent group via two carbon atoms which may have a substituent represented by R 5 is preferably a group having a molecular weight of up to 300, and is preferably a group having a molecular weight of up to 300 via the two carbon atoms.
  • Examples of the divalent group include ortho-to-phenylene, ortho-naphthylene, vinylene, ethylene and the like, and these may have a 1-3 value substituent.
  • ester examples include an alkyl ester, an aryl ester, an aralkyl acetyl, an alkoxyalkyl ester, an acyloxy alkyl ester, and the like. These have 1 to 3 substituents. b good 0
  • amides examples include ammonia, monoalkylamine, dialkylamin, penoarylamine, diallylamine, penoaralkylamine, dialkylamine, N-alkyl-N-arylamine, and N-alkyl.
  • Amides with amines such as N-aralkylamine and cyclic amine, which may have 1 to 3 substituents.
  • R 1 ′ is, for example, hydrogen, methyl, ethyl, propyl, butyl, pentyl, hexyl, cyclopropyl, cyclohexyl, phenyl, benzyl, etc.
  • R 7 ′ is, for example, acetyl or acetyl. Examples include propionyl, benzoyl, nitrile, ethoxycarbonyl, methoxycarbonyl, ethylsulfonyl, methylsulfonyl, phenylsulfonyl, tolynisulfonyl, a nitro group, and carboxy.
  • alkyl refers to alkyl in alkoxy, alkyl in alkyloxy, alkyl in alkoxy, alkyl in carbonyl, alkyl in alkylsulfonyloxy, alkyl in monoalkylamino, alkyl in dialkylamino, N— Alkyl-N-arylamino and N-alkyl-alkyl in N-aralkylamino, alkyl in alkyl esters, alkyl in alkoxyalkyl esters, alkyl in monoalkylamines, alkyl in dialkylamines, N-alkyl-N- Alkyl in arylamine, N-alkyl-alkyl in N-alkylalkylamine is preferably, for example, one having 1 to 20 carbon atoms.
  • the alkyl may be straight-chain or branched. Specific examples of the alkyl include, for example, methyl, ethyl, propyl, isopropyl, and petit. , Isobutyl, sec-butyl, te-butyl, pentyl, hexyl, heptyl, octyl, nonyl, 2-ethylhexyl, decyl, pendecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl, Nonadecyl and eicosyl are examples.
  • alkenyl preferably has 2 ⁇ 6 carbon atoms.
  • Specific examples of the alkenyl include, for example, vinyl, aryl, isopropyl, methallyl, 1,1-dimethylaryl, 2-butenyl, 3-butenyl, 2-pentenyl, 4-pentenyl, 5-hexenyl and the like.
  • alkynyl having 2 to 6 carbon atoms is preferable, and specific examples thereof include ethynyl, propargyl, 2-butyn-11-yl, and 3-butyn-11-yl.
  • 3 butin 1 -yl, 1 —pentin 1 -yl, 3 —pentin 1 -yl, 4 —pentin 2 -yl, 3 —hexine 1 -yl
  • cycloalkyl preferably has 3 to 3 carbon atoms, and examples thereof include cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.
  • acyl or in acyloxycarbonyl as acyl or in acyloxycarbonyl: as acyl in acyloxy, acyl in acyloxy, or acyl in acyloxyalkyl ester, for example, alkyl or alkenyl corresponding to R 1 or R 2
  • alkyl or alkenyl corresponding to R 1 or R 2 examples include phenyl, alkynyl, and aryl corresponding to R 3 (described below), and an acyl group obtained by introducing a carbonyl group or an oxycarbonyl group into a heterocyclic ring, and acetyl, propionyl, and butyryl.
  • Heterocyclic carbonyls such as alkylcarbonyl, such as carbonyl, hexanoyl, heptanyl, octanoyl, and decanol; arylcarbonyl, such as benzoyl and naphthoyl; thiophenecarbonyl, furancarbonyl, and pyridinecarbonyl.
  • Alkoxycarbonyl groups such as, methoxycarbonyl and ethoxycarbonyl; Wenoki Examples include aryloxycarbonyl groups such as cyclocarbonyl and naphthyloxycarbonyl, and arylalkoxycarbonyl groups such as benzyloxycarbonyl.
  • aryl in arylsulfonyloxy, aryl in monoarylamino, aryl in diarylamino, aryl in N-alkyl-1 aryl in N-arylamino, aryl in aryl ester.
  • aryl in monoarylamine, aryl in diarylamine, and aryl in N-alkyl-N-arylamine include, for example, phenyl and naphthyl. And the like.
  • examples of the heterocyclic ring represented by R 3 include phenyl, furyl, pyridyl and the like.
  • the heterocyclic ring represented by R 3 ′ or the heterocyclic ring in the heterocyclic alkyl includes, for example, chenyl, furyl, pyridyl, and an oxygen atom, a sulfur atom, and a heteroatom such as a nitrogen atom.
  • 5- to 8-membered rings or bonding rings having a bond on a carbon atom such as 2 — or 3 — pyrrolyl, 2 — or 3 — furyl, 2 — or 3 — phenyl, 2 — Or 3—pyrrolidinyl, 2—, 3— or 4-pyridyl, N—one oxide 2—, 3—or 4—pyridyl, 2—, 3— or 4-piperidinyl, 2—, 3— Or 4-pyranyl, 2-, 3- or 4-thioviranyl, pyrazinyl, 2-, 4-one or 5-thiazolyl, 2-, 4-one or 5-oxazolyl, 3-, 4_ or 5-isothiazolyl, 3 —, 4 mono or 5 — iso Oxazolyl, 2—, 4— or 5— imidazolyl, 3—, 4— or 5—pyrazolyl, 3— or 4 monopyridazinyl, N—oxydoh 3— or 4—pyrida
  • aralkyl is defined as aralkyl in aralkyloxycarbonyl, aralkyl in N-alkyl-N-aralkylamine, aralkyl in diaralkylamino, aralkyl in diaralkylamino, and N-aralkyl-1N.
  • aralkyl in aralkylamino, aralkyl in aralkyl ester, aralkyl in monoaralkylamine, and aralkyl in diaralkylamine include, for example, benzyl, 2-phenethyl and the like. Examples thereof include morpholino, pyrrolidino, piperazino, hexamethyleneimino and the like.
  • the formed tertiary amine may have a substituent.
  • substituents include a hydroxyl group, a C 3 -cycloalkyl group (which may have a substituent), C B - 1 0 ⁇ Li - Le group, C + alkoxy group, C 3 (which may have a substituent.) - + alkoxy group, C 3 - 6 cycloalkyl Ruokishi group, C s-i.
  • G 7 — 12 aralkylthio, amino, mono C + alkylamino, di
  • Examples include a heterocyclic thio group, a heterocyclic oxy group, and a heterocyclic amino group.
  • alkyl, alkenyl, alkynyl and aryl groups which may be substituted on the cycloalkyl group, aryl and heterocyclic groups may be, for example, a hydroxyl group.
  • Examples of the groups which may be substituted on the above-mentioned alkoxy, alkoxycarbonyl, alkoxycarbonyloxy, acyloxycarbonyl, acyloxy, alkyl ester, alkylsulfonyloxy, alkoxyalkyl ester and acyloxyalkyl ester include: For example, a hydroxyl group, C t - 4 ⁇ Rukokin, C alkylthio group, Amino group, mono C ⁇ Arukiruamino group, di C t - + Arukiruamino group, ⁇ 6 - 1 0 ⁇ Li - Ruamino group, C 7 - 1 2 Ararukiru Amino Group, nitro group, halogen atom, carboxy group, C-alkoxy-propanol group, C-alkynyl group, Ci-5-alkyloxy group, sulfo group, lbamoyl group, substitution rubamoyl group,
  • diaralkylamine, N-alkyl-aralkyl in N-aralkylamine, a heterocyclic ring represented by R 3 ′, and a group which may be substituted by a heterocyclic alkyl heterocyclic ring include, for example, a hydroxyl group, an alkyl group group (which may have a substituent), (which may have a substituent) C 8 one 1 0 Ariru group, C 3 - s consequent opening alkyl group Roh, androgenic atom, a carboxyl group, a sulfo group , ⁇ alkoxy groups, C alkylthio group, two preparative port groups, C t-+ alkoxy - carboxymethyl group, an amino group, a mono C - 4 alkylamino amino group, di C - 4 alkylamino groups, C Rukanoiruami de group, ⁇ 8 - 1 0 ⁇ Li - Ruokishi group, 0 7 - 1 2 Araru kill
  • Examples of the divalent substituent may have the groups represented by R 5, was example, if hydroxyl Bruno, androgenic, C ie alkyl group, 0 3 - 6 consequent opening alkyl, Ce-io ⁇ Li 'Lumpur group , C alkoxy, C t -alkylthio, amino, mono C + alkylamino, di C alkylamino, azide, ditro, cyano, carboxy, C 4 alkoxy-carbonyl, C alkyl I le group, C 2 one 5 Arca noisy Ruo alkoxy group, a sulfo group, a force Rubamoiru group, Cal Bamoiruokishi group, C t-+ Al force Noiruami de group, etc. Okiso group like et be.
  • Examples of the C- 4 alkyl group as a substituent include methyl, ethyl, propyl; isopropyl, butylisobuty), sec-butyl, tert-butyl, and the like.
  • C 3 - beta for example cyclopropyl cycloalkyl group, Shikuropuchi Le, cyclopentyl, cyclohexylene, etc. cyclohexyl force
  • C 0 aryl groups examples include phenyl and naphthyl.
  • the Ararukiru group such as benzyl, 1 Fuenechiru, 2-phenethyl, 1 - Fuwenirupuropiru, 2 Fuwenirupuropiru, 3-phenylene pulp outlet pills,
  • C alkoxy groups include methoxy, ethoxy.propoxy, isopropoxy, butoxy and tert-butoxy.
  • aryloxy groups include phenoxy and naphthoxy.
  • CL- + alkylthio groups include methylthio, ethylthio, propylthio, and butylthio.
  • C 3 - 6 cycloalkylthio The group e.g. cyclopropylthio, such as cyclohexylthio to shea click port,
  • the 2 Ararukiruchio group e.g. benzylthio and mono C Arukiruami amino group as, for example Mechiruami Bruno, Echirua amino, propylamino, Puchiruamino like,
  • dialkylamino group examples include dimethylamino, getylamino, dipropylamino, dibutylamino, and the like.
  • C G -t 0 arylamino groups include, for example, anilino,
  • the C 7 one 1 2 Ararukiruamino groups such Benjiruamino, such as 2-Hue Nechiruami Bruno is,
  • halogen atoms include fluorine, chlorine, bromine, and iodine.
  • C alkoxy-carbonyl groups include methoxycarbonyl, ethoxyquincarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, tert-butoxycarbonyl, and the like.
  • aryloxycarbonyl groups include phenoxycarbonyl, C 3 - 6 consequent opening alkyl O carboxymethyl
  • Examples of the C 7 -L 2 aralkyloxycarbonyl group include benzyloxycarbonyl and the like.
  • d-5 alkanoyl groups include, for example, formyl, acetyl, propionyl, butyryl phenol, pivalyl, etc.
  • Alkanoyloxy groups include, for example, formyloxy, acetoxy, butyryloxy, bivaloyloxy and the like.
  • substituent groups include N-methylcarbamoyl,, N-dimethylcarbamoyl, N-ethylcarbamoyl, N-phenylcarbamoyl, pyrrolidinocarbonyl, piperidinocarbonyl, piperazinocarbonyl, morpholinocarbonyl and the like. But,
  • substituted thiolvamoyl groups include —methylthio lvamoyl.
  • substituent groups include N-methylcarbamoyloxy, N, -dimethylcarbamoyloxy, and M-ethylcarbamoyloxy.
  • Examples of the C + alkanoylamide group include formylamino, acetoamide, propionamide, and butyrylamide.
  • Examples of the C alkoxy-carbonylamino group include methoxycarbonylamino, ethoxycarbonylamino, tert-butoxycarbonylamino, and the like.
  • C 7 - 1 such as 2 ⁇ Lal Kill O carboxymethyl
  • the carbonylamino group for example benzyl Ruo alkoxycarbonyl ⁇ Mino is,
  • Examples of the optionally substituted C alkyl group include, for example, methoxymethyl , 2-Methoxyxetil, hydroxymethyl, fluoromethyl, trifluoromethyl, difluoromethyl, carboxymethyl, ethoxycarbonylmethyl, potassium benzyl, cyanoethyl, acetylmethyl, etc.
  • heterocyclic group examples include a cyclic group containing one to four nitrogen atoms, one oxygen atom and one sulfur atom, such as pyrrolidino, 2-pyrrolyl, 3-pyrrolidinyl,
  • 3 pyrazolyl, 2 — imidazolyl, 2 — furyl, 2 — phenyl, 2- oxosazolyl, 3 — isoxazolyl, 4 — isothiazolyl, 4-thiazolyl, piperidino, 2 — pyridyl, 3 — pyridyl Jill, 4—pyridyl, piperazino, 2—pyrimidinyl, 5—pyrimidinyl, 2—viranyl, 2—tetrahydropyranil, 2—tetrahidrofril, 3—indrillyl, 2—quinolyl, 1 , 3,
  • R include, for example, hydrogen, hydroxy, halogen, and methyl.
  • 2-Etoquinol-Lupirylethylthio 2-Acetoxicetylthio, 2-Sulphoethylthio, 2-Lubamoylethylthio, 2-Dimethylcarbamoylthio, 2-Lubamoyloxethylthiol, 2 -Dimethylcarbazyloxy, 2-acetamidoethylthio, 2-ethoxycarbonylaminoethylthio, methylsulfinyl, ethylsulfinyl, propylsulfinyl, isopropylsulfinyl, butylsulfinyl, iso-butylsulfinyl, sec-butylsulfinyl , Tert-butylsulfinyl, benzylsulfinyl, phenylsulfinyl, naphthylsulfinyl, furylsulfinyl
  • R 5 specifically, for example, 1,2-phenylene, 4-methyl-1,0-l, 2-phenylene, 5-methyl-11,2-phenylene, 4-ethylene
  • R 8 specifically, for example carboxy, main butoxycarbonyl, ethoxycarbonyl, propyl O alkoxycarbonyl, butyl O propoxycarbonyl two , Methoxymethoxycarbonyl, 2-methoxyethoxycarbonyl, 1-methoxyethoxycarbonyl, methylthiomethoxycarbonyl, 2-methylthioethoxycarbonyl, acedoxymethoxycarbonyl, 1-acetomethoxycarbonyl, 1-ethoxy Quincarbonyloxyethoxycarbonyl, ethoxycarbonyloxymethoxycarbonyl, bivaloyloxymethoxycarbonyl, 1-pivaloyloxyethoxycarbonyl, aryloxycarbonyl, 2,2,2—tricycloethylethylo Xycarbonyl, phenoxycarbonyl, 4-methoxyphenyloxycarbonyl, 2,4-dimethoxyphenyloxycarbonyl, 412-nitrophenyloxycarbonyl
  • T A — 528 A carboxylic acid
  • the compound [1] of the present invention can be produced, for example, by the method described below5.
  • the compound [3] when the organic residue via the carbon atom is an alkyl, alkenyl, or alkynyl which may have a substituent, the compound [3] may be subjected to a reaction known per se, 2 performed by reaction with a reagent or basic reagent
  • Examples of the acidic reagent used include pentahydrohalic acids such as hydroiodic acid and hydrobromic acid, Lewis acids such as anhydrous trimethylsilane, anhydrous aluminum chloride, boron trifluoride and boron tribromide.
  • a basic reagent Is a power such as lithium iodide, magnesium iodide, sodium or lithium thiolate, lithium thiophenolate or the like, or a magnesium salt, especially Lewis acid, especially anhydrous Aluminum chloride is preferred.
  • the reaction is preferably carried out in a solvent
  • the solvent may be a halogenated hydrocarbon such as dichloromethane, an ether such as ether or tetrahydrofuran, or an aromatic hydrocarbon such as benzene, toluene, or xylene.
  • a halogenated hydrocarbon such as dichloromethane
  • an ether such as ether or tetrahydrofuran
  • an aromatic hydrocarbon such as benzene, toluene, or xylene.
  • the reaction temperature is appropriately selected from the range of about ⁇ 70 ° C. to 150 ° C.
  • the reaction temperature is selected from the range of about 50 ° C. to 120 ° C. Is good.
  • the reaction time is about 0.1 to 10 hours.
  • the compound [3] is converted to an acid [eg, Mineral acids such as hydrochloric acid, hydrobromic acid, sulfuric acid, phosphoric acid, etc., and strong organic acids such as trifluor ⁇ -acetic acid, toluenesulfonic acid, methanesulfonic acid, etc. or bases [(row, sodium carbonate, calcium carbonate) , Sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide, etc.] or tert-butoxy potassium, lithium iodide, lithium propyl.
  • an acid eg, Mineral acids such as hydrochloric acid, hydrobromic acid, sulfuric acid, phosphoric acid, etc., and strong organic acids such as trifluor ⁇ -acetic acid, toluenesulfonic acid, methanesulfonic acid, etc. or bases [(row, sodium carbonate, calcium carbonate) , Sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide,
  • the base When the base is used as the reaction reagent, if the reaction is performed in an anhydrous solvent, if necessary, add water to the reaction solution or transfer the reaction solution to water. After opening, acid (eg, Acid, and collecting the product After the neutralized or acidified with, etc. ⁇ acid).
  • acid eg, Acid
  • the solvent examples include lower alcohols such as methanol and ethanol, polar nonprotonic solvents such as dimethylformamide, dimethylsulfoxide, and hexamethylphosphorotriamide, or a mixture thereof.
  • a mixed solvent of water is frequently used.
  • the reaction temperature is not about -10 and 100 ° C, preferably about 1-5 It is not 7 0 '.
  • R 1 is also a carbon atom in the general formula: 1] properly: or - S 0 2 - compound is an organic residue through a [4], R 1 of the general formula [1] is hydrogen, Y is -
  • the compound can be produced by introducing an organic residue via a carbon atom or 1 S 0 2 — into a compound [5] that is CO— and, if necessary, subjecting the obtained compound to a cyclization reaction.
  • the introduction reaction include an alkylation reaction, an alkenylation reaction, an alkynylation reaction, an acylation reaction, and a sulfonylation reaction.
  • the alkylation, alkenylation or alkynylation reaction can be carried out by a method known per se or a method analogous thereto.
  • the alkyl, alkenyl or alkynylating agent to be used in the reaction the corresponding alkyl, alkenyl or alkynyl halide (eg, chloride, bromide, oxide, etc.) is most preferred, but other than that.
  • the amount of the alkyl, alkenyl or alkynylating agent to be used depends on the reactivity and the like, but is usually in the range of about 1 to 100 moles per mole of the compound: 5; High halides (eg, benzyl halide, phenacylharadono, ⁇ -genoketone, logenog, acid, arylaryl, propargylhalide, which generally has substituents, generally alk; le, alkenyl, or alkynylyo 5 to 10 times mol in the case of amide, etc., about 10 to 20 times when bromide is used, and about 10 to 50 times when chloride is used. Molar amounts are used. '
  • the solvent used in the alkyl, alkenyl or alkynylation reaction is not particularly limited as long as it can dissolve the reaction reagent in a relatively good manner.
  • examples thereof include alcohols such as methanol and ethanol, and dimethyl ether. Tell, Ethers such as tetrahydrofuran and dimethoxetane; ketones such as acetone and methylethylketone; amides such as dimethylformamide and dimethylacetamide; dimethylsulfoxide and sulfolane;
  • Examples include halogenated hydrocarbons such as sulfoxides and sulfones, dichloromethane, chloroform, and aromatic hydrocarbons such as benzene, toluene, and xylene. Of these, methanol is preferred.
  • the reaction temperature may be about ⁇ 10 ° C. to 50, and the reaction time may be about 1 to 24 hours.
  • silver salts such as silver oxide and bases (eg, inorganic bases such as carbonated lime, alkali metal alcohols such as sodium methylate and lithium methylate, triethylamine, pyridine, dimethylamide)
  • bases eg, inorganic bases such as carbonated lime, alkali metal alcohols such as sodium methylate and lithium methylate, triethylamine, pyridine, dimethylamide
  • the reaction rate can be increased and the yield can be improved by coexisting an amine such as pyridine.
  • crown ethers eg, 18-crown-6
  • quaternary ammonium salts eg, tetraethylammonium chloride, benzyltri'methylammonium chloride, cetyltrimethylammonium chloride
  • the reaction may be carried out not only in the above-mentioned solvents but also in a mixed two-phase system of these solvents and water.
  • an iodide ion source such as potassium iodide or sodium iodide to the reaction system.
  • the alkylation reaction can also be performed using a diazoalkane such as diazomethane as a reaction reagent.
  • the reaction is carried out in a solvent such as alcohols (eg, methanol), ethers (eg, getyl ether, tetrahydrofuran, etc.), and ester solvents (eg, ethyl citrate).
  • a solvent such as alcohols (eg, methanol), ethers (eg, getyl ether, tetrahydrofuran, etc.), and ester solvents (eg, ethyl citrate).
  • boron trifluoride, fluoroboron or the like may be added as a reaction accelerator.
  • the reaction is—20 ° C to 30 ° C. Performed at a temperature of C.
  • the alkylation reaction can also be carried out with 0-alkyl-X, -disubstituted isourea (eg,
  • 0- methyl, 0- Echiru, 0- benzyl -: ⁇ , ⁇ '- dicyclohexyl Kishiruiso urea, etc. can also be a carried out as a reaction reagent.
  • the solvent include ethers (eg, tetrahydrofuran, didioxane, etc.), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), esters (eg, ethyl acetate, etc.), aromatic hydrocarbons Hydrogen (eg, benzene, toluene, xylene, etc.) is used.
  • the reaction temperature is about 40 ° C to 150 ° C.
  • the alkylation and alkenylation reaction can also be carried out by reacting a compound [5] with a reactive reagent having an unsaturated bond [eg, argens (eg, isobutylene, methyl acrylate, ethyl acrylate, acrylate).
  • a reactive reagent having an unsaturated bond eg, argens (eg, isobutylene, methyl acrylate, ethyl acrylate, acrylate).
  • the reaction can also be performed by reacting lonitrile, methacrylonitrile, etc.), or alkyne granules (eg, methyl propiolate, cyanoacetylene, etc.).
  • the reaction is carried out in a solvent [eg, ether (eg, diethyl ether, dioxane, tetrahydrofuran, etc.), halogenated hydrocarbon (eg, dichloromethane, etc.)], acid (eg, sulfuric acid, etc.), Bases [eg, alkali metal alkoxides (eg, sodium methylate, etc.), tertiary amines (eg,. ⁇ '-Methylmo,' refolin, etc.), quaternary ammonium salts (eg, benzyltrimethyl) Such as ammonium hydroxide).
  • a solvent eg, ether (eg, diethyl ether, dioxane, tetrahydrofuran, etc.), halogenated hydrocarbon (eg, dichloromethane, etc.)]
  • acid eg, sulfuric acid, etc.
  • Bases eg, alkali metal alkoxides
  • acylating agent used in the acylation reaction acyl halide is preferable.
  • the amount of the acylating agent to be used is preferably an equimolar amount or more, and more preferably i.
  • the solvent used for the acylation reaction is not particularly limited as long as it can dissolve the compound [5] and the acylating agent, but is preferably a solvent such as methylene chloride, chloroform, tetrahydrofuran, and dioxane. And so on.
  • the reaction temperature is about --30 to 25 ° C and the reaction time Is about 0.1 to 3 hours.
  • coexisting amines such as triethylamine. Pyridine and dimethylamino pyridine in the present reaction system, side reactions can be suppressed and the yield can be improved.
  • Y is a group represented by the formula C— (where R 7 is as defined above)
  • the compound [6] which is a group represented by the formula (1) is a compound [4] wherein Y is —CO— and R 1 is an ⁇ -keto group—nitrile group, and —alkoxycarbonyl group, , Or an alkyl group having a monosulfonyl group or a carboxy group (which may be further substituted but has at least one hydrogen atom) [7] by intramolecular aldol condensation. it can.
  • the intramolecular aldol condensation reaction can proceed only by dissolving it in an organic solvent, especially benzene, phenol, and dichloromethane.
  • the catalyst is accelerated by using a catalytic amount of a base such as triethylamine or benzylamine as a catalyst. Is done. Silica gel or molecular sieve may be used as a catalyst.
  • the reaction is advantageously carried out at room temperature, the reaction time depending on the starting material: 7] and the structure of the base, but generally requires about Q.24 to 24 hours.
  • the compound [8] in which R 2 is a carbon atom or an organic residue via —S 0 2 — in the general formula [1] is different from the compound [9] in which R 2 is hydrogen in the general formula [1] by a carbon atom or — It can be produced by reacting a compound capable of introducing an organic residue via —SO 2 —.
  • the introduction reaction include an alkylation reaction, an alkenylation reaction, an alkynylation reaction, an acylation reaction, and a sulfonylation reaction.
  • the reaction reagent, reaction conditions, and the like in the introduction reaction are the same as those in the production of compound [4] from compound [5] described above, but more severe conditions are often required. In that case Use excessive amounts of reagents, raise the reaction temperature, and increase the reaction time.
  • the oxidizing agent meta-chloro ⁇ -perbenzoic acid, sodium metaperiodide, etc. are used.
  • a solvent for the reaction a solvent which dissolves the compound [10] and the oxidizing agent is desirable.
  • methachloroperbenzoic acid usually, dichloromethane, chloroform, ethyl acetate, methanol and the like are used. It is preferably used.
  • sodium metaperiodate is used as the oxidizing agent, a mixed solvent with water is preferable.
  • reaction time is about 0.1 to 24 hours.
  • the progress of the reaction can be monitored by thin layer chromatography (TLC) or the like.
  • the compound [1 2] in which R + is hydrogen in the general formula [1] is obtained by subjecting the compound [1 1] (supra) in which R + is -S— in the general formula [1] to a desulfurization reaction.
  • a desulfurization reaction It can be manufactured by the following.
  • the desulfurizing agent include organic compounds such as Raney Nigel and triptyl hydride and trivalent organic phosphorus compounds such as triphenylphosphine, trimethylphosphite and triethylphosphite.
  • the amount of desulfurizing agent used is about 1 equivalent or more when using an organic tin compound or a trivalent organic phosphorus compound. When Raney-Nigel is used, the amount used depends on its activity.
  • a desirable method is to observe the reaction status by TLC while introducing a small amount of Raney nickel into the reaction system, and if the raw material remains, add Raney nickel further, and do not use excess Raney nickel. is there.
  • a solvent used in the desulfurization reaction for example, when Raney nickel is used, methanol, ethanol and the like are used, and when an organic tin and an organic phosphorus compound are used, acetone, benzene, toluene and the like are preferably used. used.
  • the reaction temperature in the desulfurization reaction is about 30 to 100 ° C, and the reaction time is about 0.5 to 24 hours.
  • the compound [13] in which R + is hydroxy is, for example, a by-product when the dehydration reaction and the substitution reaction at the 25-position proceed in the same system, or as a compound [ 11] with sodium borohydride.
  • the amount of sodium borohydride is about 1 to ⁇ -fold molar amount, and tetrahydrofuran and dioxane are used as solvents. Etc. are preferably used.
  • the reaction temperature is generally about 25 ° to 100 ° C., and the reaction time is often about 0.1 to 3 hours.
  • Compound [14] in which R + is a halogen in general formula [1] can be produced by subjecting compound [12] in which R 4 is H in general formula [1] to a halogenation reaction. it can.
  • the lower alkyl of -4 includes, for example, methyl, ethyl, ⁇ -propyl, isopropyl, ⁇ -butyl, isoptyl, t-butyl, etc., as the ring formed by ⁇ 8: ⁇ Lysine, ⁇ Hexamethyleneimine and the like.
  • the amount of the methylene salt and manganese dioxide used is excessive, usually about 2 to 1 ⁇ m.
  • a solvent used for the halogenation for example, acetonitrile is used in the reaction with methyleneimmonium salt, and in the reaction with manganese dioxide, for example, dichloromethane or the like is used.
  • the reaction temperature is about 50 to 100 ° C for the reaction with the former, the reaction time is about G.5 to 10 hours, and those for the reaction with the latter are about —10 ° to 30 °. About 1 to 24 hours at C.
  • R 4 is an organic residue via a carbon atom in the general formula [1].
  • [15] can be produced by subjecting a compound [12] in which R + is hydrogen in the general formula [1] to an organic residue introduction reaction via a carbon atom.
  • a methyleneimmonium salt represented by Reaction.
  • an excess amount usually about 2 to 10 times, is used, and acetonitrile is often used as a solvent.
  • the reaction temperature is about 50 to 100 ° C, and the reaction time is often about 0.5 to 10 hours.
  • the thus obtained amino-substituted methyl derivative can be easily converted to a hydroxy-substituted methyl derivative if desired.
  • Mannich reaction When the Mannich reaction is used, it can be carried out in the same manner as a technique known in the field of rifamycin. Such techniques include those described in N. Maggi, V. Arioli and P. Sensi, Journal of Medicinal Chemistry, 8_790 (1965). .
  • the compound [I 6] in which R is an organic residue group via a nitrogen atom is a compound [12] in which R 4 is hydrogen in the general formula [1]. It can be produced by subjecting to a residue introduction reaction.
  • the reaction for introducing an organic residue also via the nitrogen atom can be carried out in the same manner as in the art known in the field of rifamycin and its analogous compound tribomycin. Examples of the technology include the technology described in the following document.
  • the compound [17] in which R + is an organic residue through an oxygen atom in the general formula [1:] is a compound [13] in which R + is a hydroxyl group in the general formula [1] is an organic residue through an oxygen atom.
  • the reaction for introducing an organic residue via an oxygen atom includes an alkylation reaction, an acylation reaction, a sulfonylation reaction, and an alkyloxycarbonylation reaction.
  • the alkylation reaction, acylation reaction and sulfonylation reaction can be carried out under the same conditions as those for the conversion reaction from compound [5] to compound [4].
  • a diazo compound can also be used as an alkylating agent.
  • the alkyloxycarbonylation reaction can be carried out under the same conditions by using an alkyloxycarbonyl compound instead of the aryl halide used in the acylation reaction.
  • Compound [18] is a compound represented by the general formula [
  • R 5 has the same meaning as described above.
  • the compound can be produced by subjecting the obtained compound to a reduction reaction, if necessary.
  • the reaction of the compound [10] with the compound [19] is a cyclization reaction in which a dehydration condensation reaction at the 24 position and a substitution reaction at the 25 position occur simultaneously.
  • the reaction reagent used in the reaction is a compound having an amino group and a thiol group at two adjacent carbon atoms in the molecule.
  • the amount of the reaction reagent is generally used in excess, and is often used in an amount of about 1 to 10 moles per mole of the compound [10].
  • Examples of the solvent used in the reaction include dichloromethane, chloroform and the like.
  • the reaction temperature is about 130 ° to 50 ° C, and the reaction time is about 0.5 to 10 hours.
  • the reduction reaction is performed by bringing compound [18] into contact with a reducing agent.
  • a reducing agent for example, high Dorosarufuai preparative sodium (Na 2 S 2 0 4) , such as Asukorubin acid and the like, which normally excess is used.
  • the solvent used for the reduction reaction for example, ethyl acetate, ethanol, methanol, tetrahydrofuran, dioxane and the like can be mentioned.
  • the reaction temperature is about 0 to 50 ° C, and the reaction time is about 0.1 to 1 hour.
  • R 6 General formula [1] in R 6 are the 7-position or one 3-position of 0 and rings that are formed one C 0-,
  • Compound [2 0], in the general formula [1] R e is a carboxylic acid ester can be prepared by subjecting a compound [2 1] or the compound R B is a carboxylic acid [2 2] lactone ring formation reaction.
  • the lactone ring formation reaction is an intramolecular dealcoholation reaction when the compound [21] is used, and an intramolecular dehydration reaction when the compound [22] is used.
  • the lactonizing agent used in the reaction includes, for example, mineral acids such as hydrochloric acid and sulfuric acid, organic acids such as methanesulfonic acid and ⁇ -toluenesulfonic acid, inorganic bases such as sodium hydroxide and hydroxide rim, and triethyl acetate.
  • Amin, benzylamine, pyri Examples include organic bases such as gin and piperidine, but in some cases the process proceeds simply by ripening.
  • the amount of the lactonizing agent used may be a catalytic amount or a solvent amount, and the solvent used in the reaction may be, for example, dichloromethane, chloroform, ethanol when using an organic acid or an organic base. When methanol or the like uses a mineral acid or inorganic base, ethanol or methanol
  • the reaction temperature is about 0 ° to 100 °. (The reaction time is about 0.1 to 10 hours.
  • the compound [22] in which R 6 is carboxy in the general formula [1] is a compound [22] in which R B is a carboxylic acid ester in the general formula [1]. 21] to a hydrolysis reaction.
  • the hydrolysis reaction can be carried out under the same conditions as ordinary ester hydrolysis reactions obvious to those skilled in the art.
  • the amount of the base is about 1 to 10 moles, preferably about 1.2 to 4 moles.
  • the reaction temperature and time largely depend on the type of alcohol component in the ester group, but are not about 120 to 70 ° C, respectively, preferably about -5 ° C, -30 and about 0.1 to 24 hours, preferably about 0.1 to 3 hours.
  • R 8 is a group that can be derived from carboxy, for example, a compound [21] which is a carboxylic acid ester, and a compound [23] which is an amide. It can be produced by subjecting it to a transesterification reaction or an amidation reaction in [21]. Alternatively, the lactone compound of compound [20] can be opened with an alcohol and an amine to produce compound [21] and compound [23], respectively.
  • the conversion to [21] can be achieved by (a) condensing compound [22] with the corresponding alcohol component by the action of an acid catalyst or a condensing agent, or (mouth) compound [22] or its carboxyl group.
  • an alkylating agent By reacting the salt in the above with an alkylating agent.
  • the reaction is usually carried out in a solvent.
  • the solvent used include ethers (eg, dimethyl ether, tetrahydrofuran, dimethoxetane), aromatic hydrocarbons (eg, 'benzene, toluene, etc.).
  • Acid catalysts or condensing agents that can be used include hydrochloric acid, sulfuric acid, phosphorus Mineral acids such as acids, organic acids such as benzenesulfonic acid, toluenesulfonic acid, etc., boron trifluoride, ferrous sulfate, Lewis acids such as anhydrous aluminum chloride, thionyl chloride, acetyl chloride, cuprate formate, chlorosulfone Acid, acid chlorides such as toluenesulfonic acid chloride, acid anhydrides such as trifluoroacetic anhydride, 2,2-dimethoxypro And acetal solvents such as dimethylformamide, dimethylacetate, etc.
  • the reaction temperature may be about 110-fold to about 110-fold, and the reaction temperature may be about 120-140 ° C (: preferably about 110-500 ° C). It is.
  • the salt may be a metal salt such as a sodium salt, a potassium salt, a calcium salt, a copper salt, a silver salt, or a triethyl ammonium salt.
  • a metal salt such as a sodium salt, a potassium salt, a calcium salt, a copper salt, a silver salt, or a triethyl ammonium salt.
  • Trialkylamines or quaternary ammonium salts such as pyridinium salts and tetraethylammonium salts are preferred.
  • These salts may be prepared before the esterification reaction, and may be a base corresponding to the solution of compound [22].
  • isonitriles eg, hexyl hexyl isonitrile, etc.
  • the base hydrolysis reaction solution in (a) may be used as it is.
  • those produced in the reaction solution may be used.
  • the alkylation reaction is preferably carried out in a solvent such as water, alcohols (eg, ethanol), ketones (eg, acetone), ethers (eg, methyl ether, tetrahydrogen).
  • amides eg, dimethylformamide, dimethylacetamide, hexamethyl phosphorotriamide, etc.
  • sulfoxides eg, dimethylsulfoxide, etc.
  • aromatics examples include hydrocarbons (eg, benzene, toluene, xylene, etc.), halogenated hydrocarbons (clean, dichloromethane, etc.), and these may be used alone or mixed to form a homogeneous or heterogeneous reaction system.
  • alkylating agent to be used include alkyl halides which may have a substituent (eg, chlorine, bromine, iodine, etc.
  • halogens eg, methyl iodide, benzyl chloride, benzyl chloride, benzyl chloride, hexyl chloride).
  • Trityl bromide, phenacyl bromide, etc. dialkyl sulfates (eg, dimethyl sulfate, getyl sulfate, etc.), trialkyl phosphinates (eg, trimethyl phosphate), trialkyl oxodimethyl salts (eg, triethyl) Oxonium tetrafluoroborate, etc.), phenol ethers (eg, butyl isopropenyl ether, etc.)
  • -Acetates eg, vinyl acetate, etc.
  • isobutylene with catalyst And sulfuric acid is preferred
  • diazoalkanes eg, diazomethane. Phenyldiazomethane, diphenyldiazomethane, etc.
  • the amount of the base used relative to the starting carboxylic acid is in the range of about 1 to 100 molar equivalents, preferably about 1 to 25 molar equivalents, and the alkylating agent (here, alkyl halide, dialkyl sulfate, etc.) is correspondingly used. Is used in an amount of about 0.8 to 120 molar equivalents, preferably about 1 to 30 molar equivalents.
  • the alkylation reaction may be carried out by adding a quaternary anidium compound as a so-called phase transfer catalyst (for example, the same as described above).
  • a carboxylic acid (compound [22] is selected as the starting material.
  • the alkylating agent is the compound [22]
  • the reaction may be carried out at room temperature, but the reaction proceeds at room temperature. Temperature, or a catalyst (eg, sulfuric acid, toluenesulfonic acid, acetic acid [mercury, tert-ethylamine], etc.) may be added.
  • the progress of the reaction can be controlled by an appropriate method (eg, thin-layer chromatography), since the diazoalkane itself may be unstable in the reaction solvent. It is advisable to use reagents that are necessary and sufficient for the reaction while tracing with various colors.
  • the reaction proceeds well at a temperature of about 0 to 30 ° C, but if necessary, it may be heated or heated (up to about 40-50 ° C) or a catalyst (eg, methanol, triethanol, etc.). (For example, boron fluoride).
  • the target compound [21] can also be obtained by transesterification of a certain compound [21].
  • an acid catalyst inorganic acids such as hydrobromic acid and sulfuric acid and perchloric acid, and organic acids such as benzenesulfonic acid, toluenesulfonic acid and methanesulfonic acid are preferred.
  • the reaction is carried out at room temperature to 200 ° C. (preferably at room temperature to 130 ° C.).
  • the amidation reaction of an ester form (compound [21]) or a lactone form (compound [20]) is carried out according to the general amidation of an ester, to a compound [21] or a compound [20].
  • the desired amino compound ie, ammonia (which can be introduced into the reaction system in the form of gaseous ammonia, concentrated aqueous ammonia, ammonia solution, ammonium chloride and bases) or amines, (Eg, methanol, ethanol, etc.), ethers (eg, tetrahydrofuran, etc.), sulfoxides (eg, dimethylsulfoxide, etc.) polar solvents or mixed solvents containing these solvents It is preferable to carry out the reaction by medium reaction.
  • base catalysts such as aluminum chloride, sodium methoxide, dimethylaminopyridine, and DBU (1,8-diazabicyclo [5,4,0] -7-indene) can be used.
  • the addition promotes the progress of the reaction and is sometimes preferred.
  • the reaction proceeds at a temperature within the range from room temperature to the boiling point of the solvent.
  • the amines may be ripened to a temperature of about 180 using amines themselves as a reaction medium. .
  • X is represented by the formula (wherein, R + has the same meaning as described above.
  • R has the same meaning as described above.
  • As a reagent for the reduction reaction ascorbic acid
  • the compound can be produced under the same conditions as in the above-mentioned reaction for producing the reduced form of the compound [18].
  • the target compound [1] thus obtained can be isolated and purified by a method known per se, such as concentration, solvent extraction, chromatography, crystallization, recrystallization and the like.
  • the compound [1] of the present invention may act with a base to form a salt.
  • the base include inorganic bases such as sodium, potassium, lithium, calcium, magnesium, and ammonia, and organic bases such as pyridine, collidine, triethylamine, and triethanolamine. ⁇ .
  • the compound [1] of the present invention When the compound [1] of the present invention is obtained in a free form, it may be formed into a salt using a conventional means, and the compound obtained as a salt may be converted into a free form using a conventional means. .
  • the compound [1] may form an inner salt, which is also included in the present invention.
  • Each of the stereoisomers of the compound [i] can be used alone or in a mixture as a medicament.
  • the compound [1] thus obtained is useful as a medicine, and has antibacterial activity against, for example, certain gram-positive and gram-negative bacteria.
  • Table 1 shows the antibacterial activity against (Mycobacterium tuberculos is H37Rv).
  • the minimum inhibitory concentration (MIC) was measured after 2 weeks of culture at 37 ° C by a dilution method using Kirchina medium supplemented with 5% bovine serum.
  • the toxicity of the compound [1] of the present invention is low.
  • the compound [1] of the present invention or a salt thereof exhibits antibacterial activity against certain gram-positive bacteria and gram-negative bacteria, and is also low in toxicity, thereby causing infection by bacteria. It can be used as a bacterial infection therapeutic or antibacterial agent for the treatment of bacterial infections in mammals (eg, mice, rats, dogs, cows, pigs, humans, etc.).
  • the daily dose of the compound [1: or a salt thereof is about 1200 mg / kg, more preferably about 10 to ⁇ 0 mg / kg of the compound [1: Is administered by mixing the compound [1] or a pharmaceutically acceptable salt thereof with a suitable pharmaceutically acceptable carrier, excipient, or diluent by conventional means. It can be administered orally in the form of granules, capsules, drops, or the like, or it can be formulated by conventional means, for example, into injections, and compounded into sterile carriers manufactured by conventional means. It can be administered orally.
  • a binder eg, hydroxypropyl propyl cellulose, hydroxypropyl methylcellulose, macro Gol, etc.
  • disintegrants eg, starch, carboxymethylcellulose calcium, etc.
  • emollients eg, lactose, starch, etc.
  • lubricants eg, magnesium stearate, talc, etc.
  • isotonic agents eg, glucose, D-sorbitol, D-mannitol, sodium chloride, etc.
  • preservatives eg, benzyl alcohol, cuprate butanol
  • Para-hydroxybenzoate e.g., benzyl para-benzoate, etc.
  • buffers eg, phosphate buffer, sodium acetate buffer, etc.
  • the antibiotic TAN-528A which is a raw material compound used in the method of the present invention, is obtained by culturing an antibiotic TAN-528A producing bacterium belonging to the genus Streptomyces in a culture medium, and adding the antibiotic TAN-528A to the culture. It can be produced by accumulating and accumulating and collecting it. Specific examples of the producing bacteria include Streptom ces al bolongus C-46366 strain.
  • the microorganism can be obtained from the Fermentation Research Institute ( ⁇ F 0, Osaka, Japan). It was deposited under the accession number IF 0 14280 on August 5, 1983 at 183-85, Jusanhoncho, Yodogawa-ku, Ishikawa.
  • microorganism was submitted to the Research Institute of Microorganisms and Technology (FRI, 1-3-1 Higashi-Yatabe-cho, Tsukuba-gun, Ibaraki, Japan) at the Institute of Industrial Technology, Ministry of International Trade and Industry of Japan in August 1983. Deposited on the 9th as accession number FERM 7—7198.
  • the cells were inoculated with Treptomyces' Arbolongs C-146366 (FERMP-7198, IF014280) and cultured on a reciprocating shaker at 28 ° C for 2 days.
  • 1.5 J2 of the resulting seed culture was transferred to a 50-volume stainless steel tank containing 30 J2 of the same composition as the above seed medium, and cultured at 28 ° C for 2 days with aeration and agitation (aeration of 100 J2; agitation at 280 rpm) Min).
  • 5 Jg of the resulting seed culture was inoculated into a 200 J2 tank containing 100% of the main culture medium consisting of 3% glycerol, 0.5% meat extract, 0.5% NaC, and 0.5% peptone (pH 7.0).
  • Aeration and agitation culture (aeration 100%; agitation 200 revolutions / minute) was performed for 2 days.
  • the resulting culture solution was filtered using Hyflo Supercell (4.5Kg), the filtrate (80.2) was extracted with PH 3 using ethyl acetate (40J2 X 2), and the extract was extracted with 2% hydrogen carbonate. After washing with sodium water (40 ⁇ 2), concentrating the ethyl acetate layer, washing the concentrated solution (820 ml) with water, then concentrating the ethyl acetate layer, adding n-hexane to the concentrate and precipitating, A coarse powder (1.16 g) was obtained. The coarse powder ( ⁇ .9 g) obtained in the same manner was subjected to force ram chromatography on a gel (95 g).
  • TAM-528A TAM-528A (683 mg).
  • This powder was subjected to column chromatography with Sephadex LH-20 (340 ml), and the fraction containing the antibiotic TAN-528A eluted with ethyl acetate was concentrated to give a crystalline powder of the antibiotic TAN-528A. (506 mg) was obtained.
  • the physicochemical properties of the antibiotic TAN-528A obtained above are as follows.
  • the main peaks are as follows.
  • TAN-528A 674 mg was dissolved in 30 ml of dichloromethane, cooled to 0 ° C, 172 mg of m-chloroperbenzoic acid was added, and the mixture was stirred for 30 minutes.
  • Dichloromethane was distilled off under reduced pressure, and the residue was extracted with 100 mL of AcOEt.
  • the AcOEt solution was washed with water, dried over anhydrous Na 2 S 04, concentrated under reduced pressure, and the residue was collected by filtration with hexane to give 660 mg of yellow. A powder was obtained.
  • the eluate fractions from 460 ml to 610 ml were collected by the silylation gel column chromatography in Example 2, and n-hexane was distilled off under reduced pressure.
  • the AcOEt solution was washed with water and dried over anhydrous Na 2 S 0 + .
  • Ac0Et was distilled off under reduced pressure, and the thus-obtained orange crystals were collected by filtration and recrystallized from Ac0Et to obtain 192 mg of the title compound.
  • TAN-528A 223 mg was dissolved in 30 ml of MeOH, cooled to 0 ° C, and 78 mg of m-chloroperbenzoic acid was added, followed by stirring for 2 hours. — The eOH was distilled off under reduced pressure, extracted with 50 ml of AcOEt, washed with water and dried over anhydrous Na 2 S 0 + .
  • TAN-528A 223 mg was dissolved in 10 ml of dichloromethane, cooled to 110 ° C, 57 mg of m-chloroperbenzoic acid was added, and the mixture was stirred for 30 minutes.
  • Dichloromethane 50 ml was added and the mixture was washed with water.
  • the dichloromethane layer was washed with water and dried over anhydrous Na 2 SO 4 , dichloromethane was distilled off under reduced pressure, and the residue was collected with hexane.
  • the AcOEt was distilled off under reduced pressure 'to the residue is dissolved in a small amount of CH C1 3 adsorbed on a column of silica force gel (6 g), and developed with -1% MeO H- CHC 1 3 solvent system, 30 m The eluted fractions from 1 to 55 mi were collected, concentrated under reduced pressure, and the residue was collected by n-hexane. Re-precipitation with Ac0Et-n-hexane gave 109 mg of the title compound.
  • Example 8 TAN—528 A lactone (an isomer having a different lactonization position from that of Example 7; a carboxylic acid at position 10 and a hydroxyl group at position 13 condensed)
  • TAN-528A 297 mg was dissolved in 10 ml of ethanol, cooled to 0 ° C, 2 ml of N-NaOH was added, and the mixture was stirred at room temperature for 40 minutes. Then, 2 ml of N—HC1 was added for neutralization, ethanol was distilled off under reduced pressure, and the mixture was extracted with 50 ml of AcOEt. The AcOEt layer was washed with water, dried over anhydrous Na 2 S 0 + , and AcOEt was distilled off under reduced pressure.
  • Alkylating agent 2-phenolic acid
  • Example 38 In the preparative TLC of Example 37, a band having an Rf value of around 0.1 was scraped off and eluted with 25-demethylthio-1.25-hydroxy TAN-528A to obtain 11.7 mg of the title compound. .
  • This benzothiazino compound was found to have the same melting point and N MR as that obtained in Example 37.
  • the melting point and NMR of this hydroxy compound were the same as those obtained in Example 38.
  • This product was found to be similar to the compound obtained in Example 38 in melting point and NR.
  • Example 47 Preparation of 25-demethylthio-25-ode-TAN-528A: 2 ⁇ -demethylthio-125-hydro-TAN-528 ⁇ li 3.2 mg was dissolved in acetonitrile 6 ml, and the mixture was dissolved in Ethylene Moser. 39 mg of a salt was added, and the mixture was refluxed for 2 hours. An additional 59 mg of the reagent was added, and the mixture was further refluxed for 1 hour. After the reaction product was concentrated to dryness, a mixture of ethyl acetate and water was added, and the mixture was separated. After washing with water, drying and drying, 99.6 mg of a brown solid was obtained.
  • the compound [1] of the present invention or a salt thereof has excellent antibacterial activity and can be used as an antibacterial agent. '

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Abstract

Compounds represented by general formula (I) (wherein R1 and R2, which may be the same or different, each represents hydrogen or an organic residue via a carbon atom or -SO2-, X represents (II), (III), (IV), (V), (wherein R4 represents hydrogen, hydroxy, halogen or an organic residue via a carbon, nitrogen, oxygen, or sulfur atom, R5 represents a divalent group via two carbon atoms which may optionally be substituted, $(1,4)$- is bound to the p-position of the benzene ring with respect to R1O-, and $(1,4)$- is bound to the m-position with respect to R1O-), R6 represents carboxy, a group derived from carboxy, or a delta-lactone together with -OH in position 7 or 13, and Y represents -CO- or (VI) (wherein R7 forms a 5-membered ring together with -OR1 when R1 represents an organic residue via a carbon atom), provided that X does not represent (VII), when R1 and R2 each represents H, R6 represents methoxycarbonyl, and Y represents -CO-, and that X does not represent (VIII) when R represents methyl, R2 is hydrogen, R6 is methoxycarbonyl, and Y is -CO-) and salts thereof have excellent antibacterial activity, and can be used as antibacterial agent.

Description

明 細 書  Specification
抗 生 物 質 お よ び 製 剤  Antibiotics and preparations
技術分野  Technical field
本発明は、 抗菌作用を有する新規アンサマイシン系抗生物質およびそ れを含有する製剤に関する。  The present invention relates to a novel ansamycin antibiotic having an antibacterial activity and a preparation containing the same.
従来技術  Conventional technology
抗菌作用を有するアンサマイシン系抗生物質としては、 たとえばダマ バリシン D (Damavaricin D )が知られている [ジャーナル .ォブ . ァ ンティ ビォテイ クス( J ournal of Antibiotics)第 2 9巻,第 2 0 1 〜 203頁(1976年)]。  As an ansamycin antibiotic having an antibacterial action, for example, Damavaricin D is known [Journal of Antibiotics, Vol. 29, No. 201]. ~ 203 (1976)].
発明の開示  Disclosure of the invention
ァンサマイシン系抗生物質 T AN— 528Aがストレプトミセス属菌の 培養により生成蓄積され、 その構造式は、  The tansamycin antibiotic TAN-528A is produced and accumulated by culturing Streptomyces sp.
Figure imgf000003_0001
である。
Figure imgf000003_0001
It is.
そこで、 本発明者らは、 抗生物質 TAN— 528Aを原料として種々の 誘導体を合成し、 その薬理作用を検討したところ、 該誘導体は、 優れた 抗菌活性を有することを見い出した。  Thus, the present inventors synthesized various derivatives using the antibiotic TAN-528A as a raw material, and examined the pharmacological action thereof. As a result, they found that the derivatives had excellent antibacterial activity.
本発明者らは、 これらの知見に基づき、 さらに研究した結果、 本発明 を完成した。  The present inventors have further studied based on these findings and completed the present invention.
本発明は、 (I )、 一般式 [1] The present invention relates to (I) a compound represented by the general formula: [1]
CH3 CH3 CH3 R6 CH 3 CH 3 CH 3 R 6
[式中、 R1および R2は同一または異なって水素または炭素原子もしく [Wherein R 1 and R 2 are the same or different and are each a hydrogen or carbon atom or
は一 Haichi
Figure imgf000004_0001
formula
Figure imgf000004_0001
ハロゲンまたは炭素原子,窒素原子,酸素原子もしくは硫黄原子を介する 有機残基を、 R5は置換基を有していてもよい 2個の炭素原子を介する 2価の基を示し、 式 [1 ]中のベンゼン環の 1^0基のパラ位に A—が結 合し、 式 [1 ]中のベンゼン環の R 基のメタ位に麗一が結合している ことをそれぞれ示す。 )で表わされる基を、 R6はカルボキシ,カルボキ シから誘導され得る基または 7位もしくは 1 3位の一 OHとの間でデル 0 H タラク トンを形成してもよいことを、 Yは一 C O—または一?一(式中、 A halogen or an organic residue via a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom; R 5 represents a divalent group via two carbon atoms which may have a substituent; This indicates that A— is bonded to the para-position of the 1 ^ 0 group of the benzene ring, and that Reiichi is bonded to the meta-position of the R group of the benzene ring in Formula [1]. R 6 is a group which can be derived from carboxy, carboxyl, or a group which can be derived from a 7- or 13-position mono-OH. That 0 H taractones may be formed, Y is one CO— or one? One (where
R7 R 7
R7は、 R1が炭素原子を介する有機残基である場合の一 OR1と共に 5 員環を形成していることを示す。 )で表わされる基をそれぞれ示す。 た だし、 R 1および R2が水素で R6がメ トキシカルボニルで Yが— C 0— R 7 indicates that R 1 forms a 5-membered ring with one OR 1 where an organic residue through a carbon atom. )). Where R 1 and R 2 are hydrogen, R 6 is methoxycarbonyl and Y is — C 0 —
であるとき Xは ではなく、 R 1がメチルで R 2が水素で R 6 入、 X is not when R 1 is methyl and R 2 is hydrogen and R 6 is
、tf CH:  , Tf CH:
0  0
ノ、.、 がメ トキシカルポニルで Yが— C 0—であるとき Xは X is when ,,, and are methoxycarbonyl and Y is —C 0—
S-CH; S-CH ;
Ύ Ύ
0  0
ではない。 ]で表わされる化合物またはその塩,および is not. Or a salt thereof, and
(Π)、 化合物 [1 ]またはその塩を含有する抗菌剤である。  (Ii) An antibacterial agent containing the compound [1] or a salt thereof.
上記式中、 R1または R2で表わされる炭素原子を介する有機残基とし ては、 分子量が 400までのものが好ましく、 その例としてはたとえばァ ルキル,アルケニル,アルキニル,ァラルキル,ァシル,アルキルォキシ力 ルポニルなどが挙げられ、 これらは 1〜 3個の置換基を有していてもよ In the above formula, as the organic residue via the carbon atom represented by R 1 or R 2 , those having a molecular weight of up to 400 are preferable, and examples thereof include, for example, alkyl, alkenyl, alkynyl, aralkyl, acyl, and alkyloxy groups. Luponyl and the like, which may have 1 to 3 substituents.
上記式中、 R1または R 2で表わされる一 S 02—を介する有機残基と しては、 分子量が 300までのものが好ましく、 その例としてはたとえば 式 R3— S 02—(式中、 R3はアルキル,ァリ—ルまたは複素環を示し、 これらは 1 ~ 3個の置換基を有していてもよい。 )で表わされる基が挙 げられる。 In the above formula, as the organic residue via one S 0 2 — represented by R 1 or R 2 , one having a molecular weight of up to 300 is preferable, and for example, for example, a compound of the formula R 3 —S 0 2 — ( Wherein R 3 represents an alkyl, aryl or heterocyclic ring; These may have 1 to 3 substituents. ).
上記式中、 で表わされる炭素原子を介する有機残基としては、 分 子量が 200までのものが好ましぐ、 その例としてはたとえばアルキル,ァ ルケニル, アルキニル,ァシル,アルコキシカルボニル,ァシルォキシ力 ルボニルなどが挙げられ、 これらは 1〜 3個の置換基を有していてもよ い。  In the above formula, as the organic residue via the carbon atom represented by, those having a molecular weight of up to 200 are preferable, and examples thereof include alkyl, alkenyl, alkynyl, acyl, alkoxycarbonyl, and acylboxycarbonyl. And these may have 1 to 3 substituents.
上記式中、 R 4で表わされる窒素原子を介する有機残基としては、 分 子量が 300までのものが好ましく、 その例としてはたとえばァミノ,二級 ァミノ,三級アミノ .環を形成している三級ァミノなどが挙げられ、 これ らは 1〜 3個の置換基を有していてもよい。 In the above formula, as the organic residue via the nitrogen atom represented by R 4 , those having a molecular weight of up to 300 are preferable, and examples thereof include, for example, amino, secondary amino, and tertiary amino rings. Tertiary amino, etc., which may have 1 to 3 substituents.
該二級ァミノ としてはたとえばモノアルキルァミノ ,乇ノ シクロアル キルァミノ,モノァリ一ルァミ ノ ,モノァラルキルァミ ノなどが挙げられ る。  Examples of the secondary amino include monoalkylamino, dicycloalkylamino, monoarylamino, monoalkylamino, and the like.
該三級ァミ ノ としてはたとえばジアルキルァミノ,ジシクロアルキル ァミ ノ, ジァリールァミノ , ジァラルキルァミノ , X —アルキル一: \:— ァリ—ルァミ ノ , —ァルキルー N—ァラルキルァミノなどが挙げられ る。 Examples of the tertiary amino include dialkylamino, dicycloalkylamino, diarylamino, diaralkylamino, X-alkyl-1: \ : — arylamino, —alkiryl N-aralkylamino, and the like. No.
該環を形成している三級ァミノ としてはたとえばモルホリノ,ピロリ ジノ ,ピペラジノ,へキサメチレンィミノなどが挙げられる。  Examples of the tertiary amino forming the ring include morpholino, pyrrolidino, piperazino, hexamethyleneimino and the like.
これらの一級ァミ ノ,二級ァミノ,三級ァミ ノ,環を形成している三級 アミノは、 1 ~ 3個の置換基を有していてもよい。  These primary amino, secondary amino, tertiary amino, and tertiary amino forming a ring may have 1 to 3 substituents.
上記式中、 R 4で表わされる酸素原子を介する有機残基としては分子 量が 200までのものが好ましく、 その例としてはたとえばアルコキシ,ァ シルォキシ,アルキルォキシカルボニルォキシ,ァラルキルォキシカルボ ニルォキシ,アルキルスルホニルォキシ,ァリ一ルスルホニルォキシなど が挙げられ、 これらは 1〜3個の置換基を有していてもよい。 In the above formula, as the organic residue via the oxygen atom represented by R 4 , those having a molecular weight of up to 200 are preferable, and examples thereof include, for example, alkoxy, acyloxy, alkyloxycarbonyloxy, and aralkyloxy. Carbonyloxy, alkylsulfonyloxy, arylsulfonyloxy, etc. These may have 1 to 3 substituents.
上記式中、 R +で表わされる硫黄原子を介する有機残基としては、 分 子量が 500までのものが好ましく、 その例としてはたとえば式 In the above formula, as the organic residue via the sulfur atom represented by R + , those having a molecular weight of up to 500 are preferable.
R 3' - S ( O )n - (式中、 R 3' はアルキル,ァリ ール,ァラルキル,複素 環,複素環アルキルを示し、 これらは 1 ~ 3個の置換基を有していても よい。 nは 0 ~ 2の整数を示す。 )で表わされる基などが挙げられる。 上記式中、 R +で表わされるハロゲンとしては、 フッ素,塩素,臭素,ョ ゥ素が挙げられる。 R 3 ′ -S (O) n- (wherein, R 3 ′ represents alkyl, aryl, aralkyl, heterocycle, or heterocyclic alkyl, which has 1 to 3 substituents. N represents an integer of 0 to 2. Examples of the group include: In the above formula, examples of the halogen represented by R + include fluorine, chlorine, bromine, and iodine.
上記式中、 R 5で表わされる置換基を有していてもよい 2個の炭素原 子を介する 2価の基としては、 分子量が 300までのものが好ましく、 該 2個の炭素原子を介する 2価の基としては、 たとえばオルトーフヱニレ ン,オルト一ナフチレン,ビニレン,エチレンなどが挙げられ、 これらは 1 - 3値の置換基を有していてもよい。 In the above formula, the divalent group via two carbon atoms which may have a substituent represented by R 5 is preferably a group having a molecular weight of up to 300, and is preferably a group having a molecular weight of up to 300 via the two carbon atoms. Examples of the divalent group include ortho-to-phenylene, ortho-naphthylene, vinylene, ethylene and the like, and these may have a 1-3 value substituent.
上記式中、 R 6で示されるカルボキンから誘導され得る基として;ま、 分子量が 200までのものが好ましく、 その例としてはたとえばエステル, ァミ ドなどが挙げられる。 In the above formula, as a group which can be derived from Karubokin represented by R 6; or, preferably has a molecular weight of up to 200, examples of which example esters, such as § mi de, and the like.
該エステルと しては、 たとえばアルキルエステル,ァリ ―ルエステル, ァラルキルエスチル,アルコキシアルキルエステル,ァシルォキシアルキ ルエステルなどが挙げられ、 これらは 1〜3個置換基を有していて bよ い 0 Examples of the ester include an alkyl ester, an aryl ester, an aralkyl acetyl, an alkoxyalkyl ester, an acyloxy alkyl ester, and the like. These have 1 to 3 substituents. b good 0
該アミ ドとしては、 たとえばアンモニア,モノアルキルアミ ン,ジアル キルアミ ン,乇ノ アリ ールアミ ン,ジァリ ールアミ ン,乇ノ アラルキルァ ミ ン,ジァラルキルアミ ン, N—アルキル一 N—ァリールアミ ン, N—ァ ルキル— N—ァラルキルァミ ン,環状ァミ ン等のァミ ン類とのァミ ドが 挙げられ、 これらは 1〜 3個の置換基を有していてもよい。  Examples of the amide include ammonia, monoalkylamine, dialkylamin, penoarylamine, diallylamine, penoaralkylamine, dialkylamine, N-alkyl-N-arylamine, and N-alkyl. — Amides with amines such as N-aralkylamine and cyclic amine, which may have 1 to 3 substituents.
上記式中、 R 7と一 O R 1との間で形成している 5員環は、 部分構造式 In the above formula, the 5-membered ring formed between R 7 and one OR 1 has a partial structural formula
Figure imgf000008_0001
として表わされる。 該部分構造式において、 R 1 ' としてはたとえば水 素,メチル,ェチル,プロピル,ブチル,ペンチル,へキシル,シクロプロピ ル,シクロへキンル,フエニル,ベンジル等が、 R 7 ' としてはたとえばァ セチル,プロピオニル,ベンゾィル,二トリル,エトキシカルボニル,メ ト キシカルボニル,ェチルスルホニル,メチルスルホニル,フヱニルスルホ ニル, トリルニスルホニル,ニト口基,カルボキシ等がそれぞれ挙げられ る。 - 上記一般式中、 アルキルとしては、 あるいは、 アルコキシにおけるァ ルキル,アルキルォキシ力ルポニルにおけるアルキル,ァルキルォキシ力 ルボニルォキシにおけるアルキル,アルキルスルホニルォキシにおける アルキル,モノアルキルァミ ノにおけるアルキル,ジアルキルァミ ノにお けるアルキル, N—アルキル— N—ァリールァミノおよび N—アルキル 一 N—ァラルキルァミノにおけるアルキル,アルキルエステルにおける ァルキル,アルコキシァルキルエステルにおけるアルキル,モノアルキル ァミ ンにおけるアルキル,ジアルキルアミ ンにおけるァルキル, N—ァル キル— N—ァリ—ルァミ ンにおけるアルキル, N—アルキル一 N—ァラ ルキルァミ ンにおけるアルキルとしては、 たとえば炭素数 1〜 2 0のも のが好ましく、 さらに炭素数 1〜 8のものがより好ましい。 該アルキル は、 直鎖状のものでもよいし、 分枝状のものでもよい。 該アルキルの具 体例としては、 たとえば、 メチル,ェチル,プロピル,イソプロピル,プチ ル,イソブチル, sec—ブチル, te —ブチル,ペンチル,へキシル,へプチ ル,ォクチル,ノニル, 2 —ェチルへキシル,デシル,ゥンデシル, ドデシル, ト リデシル,テ トラデシル,ペンタデシル,へキサデシル,ォクタデシル, ノ ナデシル,エイコシルなどがあげられる。
Figure imgf000008_0001
Is represented as In the partial structural formula, R 1 ′ is, for example, hydrogen, methyl, ethyl, propyl, butyl, pentyl, hexyl, cyclopropyl, cyclohexyl, phenyl, benzyl, etc., and R 7 ′ is, for example, acetyl or acetyl. Examples include propionyl, benzoyl, nitrile, ethoxycarbonyl, methoxycarbonyl, ethylsulfonyl, methylsulfonyl, phenylsulfonyl, tolynisulfonyl, a nitro group, and carboxy. -In the above general formula, alkyl refers to alkyl in alkoxy, alkyl in alkyloxy, alkyl in alkoxy, alkyl in carbonyl, alkyl in alkylsulfonyloxy, alkyl in monoalkylamino, alkyl in dialkylamino, N— Alkyl-N-arylamino and N-alkyl-alkyl in N-aralkylamino, alkyl in alkyl esters, alkyl in alkoxyalkyl esters, alkyl in monoalkylamines, alkyl in dialkylamines, N-alkyl-N- Alkyl in arylamine, N-alkyl-alkyl in N-alkylalkylamine is preferably, for example, one having 1 to 20 carbon atoms. Additionally having a carbon number of 1-8 is more preferable. The alkyl may be straight-chain or branched. Specific examples of the alkyl include, for example, methyl, ethyl, propyl, isopropyl, and petit. , Isobutyl, sec-butyl, te-butyl, pentyl, hexyl, heptyl, octyl, nonyl, 2-ethylhexyl, decyl, pendecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl, Nonadecyl and eicosyl are examples.
上記一般式中、アルケニルとしては、炭素数 2 ^ 6のものが好ま しい。 該ァルケニルの具体例としては、 たとえば、 ビニル,ァリル,イソプロ ぺニル,メタ リル, 1 , 1 —ジメチルァリル, 2 —ブテニル, 3 —ブテニル, 2 —ペンテニル, 4 一ペンテニル, 5 —へキセニルなどがあげられる。  In the above general formula, alkenyl preferably has 2 ^ 6 carbon atoms. Specific examples of the alkenyl include, for example, vinyl, aryl, isopropyl, methallyl, 1,1-dimethylaryl, 2-butenyl, 3-butenyl, 2-pentenyl, 4-pentenyl, 5-hexenyl and the like. Can be
上記一般式中、 アルキニルと しては、 炭素数 2 ~ 6のものが好ま し く、 その具体例としてはたとえばェチニル,プロパルギル, 2 —ブチン一 1 一 ィル, 3 —ブチン一 1 一ィル, 3 —ブチン一 2 —ィル, 1 —ペンチン一 3 一ィル, 3 —ペンチン一 1 —ィル, 4 —ペンチン一 2 —ィル, 3 —へキシ ン一 1 —ィルなどがあげられる。  In the above general formula, alkynyl having 2 to 6 carbon atoms is preferable, and specific examples thereof include ethynyl, propargyl, 2-butyn-11-yl, and 3-butyn-11-yl. , 3 —butin 1 -yl, 1 —pentin 1 -yl, 3 —pentin 1 -yl, 4 —pentin 2 -yl, 3 —hexine 1 -yl Can be
上記一般式中、 シクロアルキルとしては炭素数 3〜 の のが好ま し く、 その例としては、 たとえばシクロプロピル,シクロブチル,シクロべ ンチル,シクロへキシルが挙げられる。  In the above general formula, cycloalkyl preferably has 3 to 3 carbon atoms, and examples thereof include cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.
上記一般式中、 ァシルとして、 あるいは、 ァシルォキシカルボニルに お:トるァシル,ァシルォキシにおけるァシル,ァシルォキシアルキルエス テルにおけるァシルとしては、 例えば R 1 , R 2に対応するアルキル,アル ケニル,アルキニル基及び R 3に対応する(後述)ァリ —ル,複素環にカル ボニル基,ォキシカルボ二ル基を導入することによって得られるァシル 基等が挙げられ、 また、 ァセチル,プロピオニル,プチリル,へキサノ ィ ル,ヘプタ ノ ィル,ォクタノ ィル,デカノ ィル等のアルキルカルボニル, ベンゾィル,ナフ トイル等のァリ ールカルボニル,チオフヱンカルボニル, フランカルボニル,ピリ ジンカルボニル等の複素環カルボニル,メ トキシ カルボニル,ェトキシカルボニル等のアルコキシカルボニル基,フヱノキ シカルボニル,ナフチルォキシカルボニル等のァリールォキシカルボ二 ル基,ベンジルォキシカルボニル等のァラルキルォキシカルボ二ル基等 が挙げられる。 In the above general formula, as acyl or in acyloxycarbonyl: as acyl in acyloxy, acyl in acyloxy, or acyl in acyloxyalkyl ester, for example, alkyl or alkenyl corresponding to R 1 or R 2 Examples include phenyl, alkynyl, and aryl corresponding to R 3 (described below), and an acyl group obtained by introducing a carbonyl group or an oxycarbonyl group into a heterocyclic ring, and acetyl, propionyl, and butyryl. Heterocyclic carbonyls such as alkylcarbonyl, such as carbonyl, hexanoyl, heptanyl, octanoyl, and decanol; arylcarbonyl, such as benzoyl and naphthoyl; thiophenecarbonyl, furancarbonyl, and pyridinecarbonyl. Alkoxycarbonyl groups such as, methoxycarbonyl and ethoxycarbonyl; Wenoki Examples include aryloxycarbonyl groups such as cyclocarbonyl and naphthyloxycarbonyl, and arylalkoxycarbonyl groups such as benzyloxycarbonyl.
上記一般式中、 ァリールとして、 あるいはァリ—ルスルホニルォキシ におけるァリール,モノアリールァミノにおけるァリ一ル,ジァリールァ ミノにおけるァリール, N—アルキル一 N—ァリールァミノにおけるァ リール,ァリールエステルにおけるァリール,モノアリールアミ ンにおけ るァリール,ジァリールァミ ンにおけるァリール, N—アルキル— N—ァ リールァミ ンにおけるァリールとしては、 たとえばフヱニル,ナフチル 。 等が挙げられる。  In the above general formula, as aryl, aryl in arylsulfonyloxy, aryl in monoarylamino, aryl in diarylamino, aryl in N-alkyl-1 aryl in N-arylamino, aryl in aryl ester. Examples of aryl in monoarylamine, aryl in diarylamine, and aryl in N-alkyl-N-arylamine include, for example, phenyl and naphthyl. And the like.
上記一般式中、 R 3で表わされる複素環としてはチェニル,フリル,ピ リ ジル等が挙げられる。 In the above general formula, examples of the heterocyclic ring represented by R 3 include phenyl, furyl, pyridyl and the like.
上記一般式中、 R 3' で表わされる複素環として、 あるいは複素環ァ ルキルおける複素環としてはたとえばチェニル,フリル,ピリジルのほか 酸素原子,硫黄原子.窒素原子などのへテロ原子を 1〜4個含む 5〜8員 環またはその結合環などで炭素原子上に結合手を有するものが挙げられ、 たとえば 2 —または 3 —ピロリル、 2 —または 3 —フリル、 2 —または 3 —チェニル、 2 —または 3 —ピロリ ジニル、 2—、 3 —または 4ーピ リ ジル、 N—才キシ ド一 2—、 3 —または 4 —ピリジル、 2—、 3 —ま たは 4ーピペリジニル、 2—、 3 —または 4ーピラニル、 2—、 3—ま たは 4—チォビラニル、 ピラジニル、 2—、 4 一または 5 —チアゾリル、 2—、 4 一または 5 —ォキサゾリル、 3—、 4 _または 5 —イソチアゾ リル、 3—、 4 一または 5 —イソォキサゾリル、 2—、 4 —または 5— ィミダゾリル、 3—、 4—または 5—ピラゾリル、 3—または 4 一ピリ ダジニル、 N—ォキシ ドー 3 —または 4 —ピリダジニル、 2—、 4 一ま たは 5 —ピリ ミ ジニル、 N—ォキシ ドー 2—、 4 —または 5 —ピリ ミ ジ ニル、 ピペラジニル、 4 一または 5—(1 , 2 , 3—チアジアゾリル)、 3 一または 5— ( 1 , 2 , 4 —チアジアゾリル)、 1 , 3 , 4 —チアジアゾリル、 1 , 2 , 5 —チアジアゾリル、 4 —または 5— ( 1 , 2 , 3 —ォキサジァゾ リル)、 3 —または 5—( 1 , 2 , 4—ォキサジァゾリル)、 1 , 3 , 4 —ォ キサジァゾリル、 1 , 2 , 5 —ォキサジァゾリル、 1 , 2 , 3 —またはしIn the above general formula, the heterocyclic ring represented by R 3 ′ or the heterocyclic ring in the heterocyclic alkyl includes, for example, chenyl, furyl, pyridyl, and an oxygen atom, a sulfur atom, and a heteroatom such as a nitrogen atom. And 5- to 8-membered rings or bonding rings having a bond on a carbon atom, such as 2 — or 3 — pyrrolyl, 2 — or 3 — furyl, 2 — or 3 — phenyl, 2 — Or 3—pyrrolidinyl, 2—, 3— or 4-pyridyl, N—one oxide 2—, 3—or 4—pyridyl, 2—, 3— or 4-piperidinyl, 2—, 3— Or 4-pyranyl, 2-, 3- or 4-thioviranyl, pyrazinyl, 2-, 4-one or 5-thiazolyl, 2-, 4-one or 5-oxazolyl, 3-, 4_ or 5-isothiazolyl, 3 —, 4 mono or 5 — iso Oxazolyl, 2—, 4— or 5— imidazolyl, 3—, 4— or 5—pyrazolyl, 3— or 4 monopyridazinyl, N—oxydoh 3— or 4—pyridazinyl, 2—, 4 1 or 5 —Pyrimidinyl, N-oxydoxide 2—, 4 — or 5 —pyrimidin Nil, piperazinyl, 4 mono or 5— (1,2,3—thiadiazolyl), 3 mono or 5— (1,2,4—thiadiazolyl), 1,3,4—thiadiazolyl, 1,2,5—thiadiazolyl, 4—or 5— (1,2,3—oxaziazolyl), 3—or 5— (1,2,4-oxaziazolyl), 1,3,4—oxoxadiazolyl, 1,2,5—oxaziazolyl, 1, 2, 3 — or
2 , 4 — トリァゾリル、 1 H—または 2 H—テトラゾリル、 ピリ ド [ 2 ,2, 4 — triazolyl, 1 H— or 2 H—tetrazolyl, pyrido [2,
3— d]ピリ ミ ジル、 ベンゾピラニル、 1 , 8—, 1 , 5—, 1 , 6—, 1 , 7 — , 2 , 7 —または 2 , 6 —ナフチリ ジル、 キノ リル、 チエノ [ 2 , 3— d] ピリジルなどが繁用される。 3—d] pyrimidyl, benzopyranyl, 1,8—, 1,5—, 1,6—, 1,7—, 2,7—or 2,6—naphthyridyl, quinolyl, thieno [2,3 — D] Pyridyl is commonly used.
上記一般式中、 ァラルキルとしては、 あるいはァラルキルォキシカル ボニルォキシにおけるァラルキル, N—アルキル一 N—ァラルキルアミ ンにおけるァラルキル,乇ノアラルキルァミノにおけるァラルキル,ジァ ラルキルァミノにおけるァラルキル, N—ァルキル一 N ^ァラ.ルキルァ ミ ノにおけるァラルキル,ァラルキルエステルにおけるァラルキル,モノ ァラルキルァミ ンにおけるァラルキル,ジァラルキルァミ ンにおけるァ ラルキルとしては、 たとえばべンジル, 2—フヱネチルなどが挙げられ 上記一般式中、 環状ァミノ としては、 たとえばモルホリノ,ピロリ ジノ ,ピペラジノ,へキサメチレンィミノなどが挙げられる。  In the above general formula, aralkyl is defined as aralkyl in aralkyloxycarbonyl, aralkyl in N-alkyl-N-aralkylamine, aralkyl in diaralkylamino, aralkyl in diaralkylamino, and N-aralkyl-1N. Examples of aralkyl in aralkylamino, aralkyl in aralkyl ester, aralkyl in monoaralkylamine, and aralkyl in diaralkylamine include, for example, benzyl, 2-phenethyl and the like. Examples thereof include morpholino, pyrrolidino, piperazino, hexamethyleneimino and the like.
上記のアルキル基, アルケニル基, アルキニル基, ァシル基,二級ァ ミ ノ ,三級アミノ ,環を形成している三級ァミ ノ,二級ァミ ン,三級ァミ ン あるいは環を形成している三級ァミ ンは、 置換基を有していてもよく、 それらの置換基としては、 たとえば水酸基, C 3 - ンクロアルキル基 (置換基を有していてもよい。), C B- 1 0ァリ -ル基(置換基を有していて もよい。 ), C +アルコキシ基, C 3- +アルコキシ基, C 3- 6シクロアルキ ルォキシ基, C s- i。ァリールォキシ基,〇7- 1 2ァラルキルォキシ基, C 1 -+ ァルキルチオ基,〇3-6シクロアルキルチオ基, C 6-10ァリ—ルチオ基,The above alkyl group, alkenyl group, alkynyl group, acyl group, secondary amino, tertiary amino, tertiary amino, secondary amine, tertiary amine or ring forming a ring The formed tertiary amine may have a substituent. Examples of such a substituent include a hydroxyl group, a C 3 -cycloalkyl group (which may have a substituent), C B - 1 0 § Li - Le group, C + alkoxy group, C 3 (which may have a substituent.) - + alkoxy group, C 3 - 6 cycloalkyl Ruokishi group, C s-i. Ariruokishi group, 〇 7 - 1 2 Ararukiruokishi group, C 1 - + Arukiruchio group, 〇 3 - 6 cycloalkylthio group, C 6 - 10 § Li - thio group,
G712ァラルキルチオ基,アミ ノ基, モノ C +アルキルアミ ノ基, ジG 712 aralkylthio, amino, mono C + alkylamino, di
C +アルキルァミノ基, C 3 - 6シク口アルキルァミノ基,〇6-1 0ァリール アミ ノ基,〇7-12ァラルキルァミノ基,アジド基,ニト口基ノヽロゲン原子, シァノ基,カルボキシ基, C アルコキシカルボニル基, C 2- 5ァシルォ キシカルボニル基, Ce-10ァリ—ルォキシカルボニル基, C 3 - 8シクロア ルキルォキシカルボニル基, C 7 - 12ァラルキルォキシカルボニル基, d - 5アルカノィル基, C2 - 5アルカノィルォキシ基,スルホ基,カルバモ ィル基,置換力ルバモイル基,チォカルパモイル基,置換チォカルバモイ ル基,力ルバモイルォキシ基,置換カルパ乇ィルォキシ基,フタルイミ ド 基, C アルカノィルアミ ド基,〇8-10ァリールァシルアミ ド基,。 C + Arukiruamino groups, C 3 - 6 consequent opening Arukiruamino group, Rei_6- 1 0 Ariru amino group, 〇 7 - 12 Ararukiruamino group, azido group, nitro port group Nono androgenic atom, Shiano group, carboxy groups, C alkoxycarbonyl groups, C 2 - 5 Ashiruo alkoxycarbonyl group, C e - 10 § Li - Ruo alkoxycarbonyl group, C 3 - 8 Shikuroa Ruki Ruo alkoxycarbonyl group, C 7 - 12 § Lal kill O alkoxycarbonyl group, d - 5 Arukanoiru groups, C 2 - 5 alkanoylamino Noi Ruo alkoxy group, a sulfo group, Karubamo I group, substituted force Rubamoiru group, Chiokarupamoiru group, a substituted Chiokarubamoi group, forces Rubamoiruokishi group, a substituted Scarpa乇Iruokishi group, Futaruimi de groups, C Arukanoiruami de group, 〇 8 - 10 § reel § sill Ami de group.
アルコキシカルボニルァミノ'基,〇7-12ァラルキルォキシカルボニルァ ミノ基,ォキソ基,エポキシ基, チォキソ基,スルホンアミ ド基,複素環基 (置換基を有していてもよい。),複素環チォ基,複素環ォキシ基,複素環ァ ミ ノ基などが挙げられる。 Alkoxycarbonyl § amino 'group, 〇 7 - 12 § Lal Kill O alkoxycarbonyl § amino group, Okiso group, an epoxy group, Chiokiso group, sulfonamide de group, a Hajime Tamaki (which may have a substituent.) Examples include a heterocyclic thio group, a heterocyclic oxy group, and a heterocyclic amino group.
上記のアルキル,ァルケ二ル基,ァルキニル基あるいはァシル基に置換 していてもよい基であるシク σアルキル基,ァリール基あるいは複素環 基にさらに置換していてもよい基としては、 たとえば、 水酸基, ァ ルコキシ基, C +アルキルチオ基,ァミノ基,モノ C アルキルァミ ノ 基,ジ C アルキルァミノ基,〇8-10ァリ一ルァミノ基,アジド基,二ト 口基ノヽロゲン原子,シァノ基,カルボキシ基, C t-+アルコキシ一カルボ ニル基, C 6- 10ァリ―ルォキシカルボニル基, C アル力ノィル基,Examples of the above-mentioned alkyl, alkenyl, alkynyl and aryl groups which may be substituted on the cycloalkyl group, aryl and heterocyclic groups may be, for example, a hydroxyl group. , § alkoxy group, C + alkylthio group, Amino group, mono C Arukiruami amino group, di C Arukiruamino group, 〇 8 - 10 § Li one Ruamino group, azido group, two preparative mouth Nono androgenic atom, Shiano group, a carboxy group , C t-+ alkoxy one carboxy alkenyl groups, C 6- 10 § Li - Ruo alkoxycarbonyl groups, C Al force Noiru group,
C 2sアル力ノィルォキン基,スルホ基,力ルバ乇ィル基,置換力ルバモイ ル基,力ルバモイルォキシ基,置換力ルバモイルォキシ基, C i - 4アルカノ ィルアミ ド基, C t-+アルコキシ一カルボニルァミ ノ基,スルホンアミ ド 基等が挙げられる。 上記のアルコキシ,アルコキシカルボニル,アルコキシカルボニルォキ シ,ァシルォキシカルボニル,ァシルォキシ,アルキルエステル,アルキル スルホニルォキシ,アルコキシアルキルエステル,ァシルォキシアルキル エステルに置換していてもよい基としては、 たとえば、 水酸基, C t - 4ァ ルコキン, C アルキルチオ基,ァミノ基,モノ C ^アルキルァミノ基, ジ C t-+アルキルァミノ基,〇6- 1 0ァリ—ルァミノ基, C 7- 1 2ァラルキル ァミノ基,ニトロ基,ハロゲン原子,カルボキシ基, C アルコキシ—力 ルポ二ル基, C アル力ノィル基, C i - 5アル力ノィルォキシ基,スルホ 基,力ルバモイル基,置換力ルバモイル基,力ルバモイルォキシ基,置換力 ルバモイルォキシ基, C アルカノィルアミ ド基等が挙げられる。 C 2 one s Al force Noiruokin group, a sulfo group, a force Luba乇I group, substituted force Rubamoi group, forces Rubamoiruokishi group, a substituted force Rubamoiruokishi group, C i - 4 alkanol Iruami de group, C t - + alkoxy one Karuboniruami And a sulfonamide group. Examples of the groups which may be substituted on the above-mentioned alkoxy, alkoxycarbonyl, alkoxycarbonyloxy, acyloxycarbonyl, acyloxy, alkyl ester, alkylsulfonyloxy, alkoxyalkyl ester and acyloxyalkyl ester include: For example, a hydroxyl group, C t - 4 § Rukokin, C alkylthio group, Amino group, mono C ^ Arukiruamino group, di C t - + Arukiruamino group, 〇 6 - 1 0 § Li - Ruamino group, C 7 - 1 2 Ararukiru Amino Group, nitro group, halogen atom, carboxy group, C-alkoxy-propanol group, C-alkynyl group, Ci-5-alkyloxy group, sulfo group, lbamoyl group, substitution rubamoyl group, lbamoyloxy group , Substitution power rubamoyloxy group, C alkanoylamide group and the like.
前記のァリ—ル,ァリ—ルエステル,モノァリ—ルァミ ン,ジァリール アミ ン, N—アルキル— N—ァリールアミ ン中のァリ -ル,ァラルキル,ァ ラルキルォキシ力ルポニルォキシ,ァラルキルエステル,モノァラルキル ァミ ン,ジァラルキルァミ ン, N—アルキル一 N—ァラルキルァミ ン中の ァラルキル, R 3'で ¾わされる複素環,複素環アルキルの複素環に置換し ていてもよい基としては、 たとえば水酸基, アルキル基(置換基を 有していてもよい), C 81 0ァリール基(置換基を有していてもよい), C 3sシク口アルキル基ノ、ロゲン原子,カルボキシ基,スルホ基, ァ ルコキシ基, C アルキルチオ基,二ト口基, C t—+アルコキシ—カルボ ニル基,アミノ基, モノ C - 4アルキルアミ ノ基,ジ C - 4アルキルアミノ 基, C アルカノィルァミ ド基,〇8-1 0ァリ—ルォキシ基, 0 7- 1 2ァラル キル基, C 7- 1 2ァラルキルォキシ基, C 6 - 1 0ァリールアミノ基, C 7 - 1 2ァ ラルキルァミ ノ基,シァノ基,〇8-1 2ァリールォキシカルボニル基, C ?^Aryl, aralkyl, aralkyl, aralkyl esters, aralkyl esters, aralkyl esters in the above-mentioned aryl, aryl esters, monoarylamines, diarylamines, N-alkyl-N-arylamines. Min, diaralkylamine, N-alkyl-aralkyl in N-aralkylamine, a heterocyclic ring represented by R 3 ′, and a group which may be substituted by a heterocyclic alkyl heterocyclic ring include, for example, a hydroxyl group, an alkyl group group (which may have a substituent), (which may have a substituent) C 8 one 1 0 Ariru group, C 3 - s consequent opening alkyl group Roh, androgenic atom, a carboxyl group, a sulfo group , § alkoxy groups, C alkylthio group, two preparative port groups, C t-+ alkoxy - carboxymethyl group, an amino group, a mono C - 4 alkylamino amino group, di C - 4 alkylamino groups, C Rukanoiruami de group, 〇 8 - 1 0 § Li - Ruokishi group, 0 7 - 1 2 Araru kill group, C 7 - 1 2 Ararukiruokishi group, C 6 - 1 0 Ariruamino group, C 7 - 1 2 § Rarukiruami amino group, Shiano group, 〇 8 - 1 2 § reel O alkoxycarbonyl group, C ^?
2ァラルキルォキシカルボニル基, C アル力ノィル基, C 2 - 5アルカノ ィルォキシ基,力ルバ乇ィル基,置換カルパモイル基,置換カルパモィル ォキシ基, C 4アルコキシ一カルボニルァミノ基等が挙げられる。 前記のァリ —ルスルホニルォキシ中のァリール, R 3で表わされるァリ2 aralkyloxycarbonyl group, C alkenyl group, C 2-5 alkanoyloxy group, benzyl group, substituted carpamoyl group, substituted carbamoyloxy group, C 4 alkoxy-carbonylamino group, etc. Can be The above-mentioned aryls in rusulfonyloxy, represented by R 3
—ルおよび複素環に置換していてもよい基としては、 たとえば C【-+ァ ルキル基, C6-10ァリ—ル基ノヽロゲン原子, C +アルコキシ基,ニトロ 基, C3-eシク口アルキル基, C ,-+アルキルチオ基, C アルコキシ一力 ルポ二ル基, C 5アル力ノ ィル基等が挙げられる。 - As a group which may be substituted on Le and heterocyclic, such as C [- + § alkyl group, C 6 - 10 § Li - Le group Nono androgenic atom, C + alkoxy group, a nitro group, C 3 -e Sik port alkyl groups, C, - + alkylthio groups, C alkoxy Ichiriki Lupo alkenyl groups, C 5 Al force Roh I group, and the like.
上記 R5における 2価の基に有していてもよい置換基としては、 たと えば水酸基ノ、ロゲン, C i-eアルキル基, 03-6シク口アルキル基, Ce-io ァリ 'ール基, C アルコキシ基, C t - アルキルチオ基,ァミノ基,モノ C +アルキルァミノ基,ジ C アルキルァミノ基,アジ ド基,二トロ基, シァノ基,カルボキシ基, C 4アルコキシ—カルボニル基, C アル力 ノ ィル基, C 25アルカノィルォキシ基,スルホ基,力ルバモイル基,カル バモイルォキシ基, C t-+アル力ノィルアミ ド基,ォキソ基などが挙げら れる。 Examples of the divalent substituent may have the groups represented by R 5, was example, if hydroxyl Bruno, androgenic, C ie alkyl group, 0 3 - 6 consequent opening alkyl, Ce-io § Li 'Lumpur group , C alkoxy, C t -alkylthio, amino, mono C + alkylamino, di C alkylamino, azide, ditro, cyano, carboxy, C 4 alkoxy-carbonyl, C alkyl I le group, C 2 one 5 Arca Noi Ruo alkoxy group, a sulfo group, a force Rubamoiru group, Cal Bamoiruokishi group, C t-+ Al force Noiruami de group, etc. Okiso group like et be.
これら置換基についてつぎに詳述する。 ·  These substituents will be described in detail below. ·
置換基としての C〖 - 4アルキル基としてはたとえばメチル,ェチル,プ ピ;レ,イソプロピル,ブチルィソブチ)レ, sec一ブチル , tert一ブチルな どが, Examples of the C- 4 alkyl group as a substituent include methyl, ethyl, propyl; isopropyl, butylisobuty), sec-butyl, tert-butyl, and the like.
C 3-βシクロアルキル基としてはたとえばシクロプロピル,シクロプチ ル,シクロペンチル,シクロへキシルなど力 C 3 - beta, for example cyclopropyl cycloalkyl group, Shikuropuchi Le, cyclopentyl, cyclohexylene, etc. cyclohexyl force
C 0ァリール基としてはたとえばフヱニル,ナフチルなどが, Examples of C 0 aryl groups include phenyl and naphthyl.
7-10ァラルキル基としてはたとえばベンジル, 1 ーフエネチル, 2― フェネチル, 1 ―フヱニルプロピル, 2—フヱニルプロピル, 3—フエ二 ルプ口ピルなどが, 7 - 10 The Ararukiru group such as benzyl, 1 Fuenechiru, 2-phenethyl, 1 - Fuwenirupuropiru, 2 Fuwenirupuropiru, 3-phenylene pulp outlet pills,
C アルコキシ基としてはたとえばメ トキシ,エトキシ.プロボキシ, イソプロポキシ,ブトキシ, tert—ブトキシなどが,  Examples of C alkoxy groups include methoxy, ethoxy.propoxy, isopropoxy, butoxy and tert-butoxy.
C 3 - 8シクロァルキルォキシ基としてはたとえばシクロプロピルォキ シ,シクロへキシルォキシなどが, C 3 - 8 cycloalkyl § Ruki Ruo carboxymethyl The group for example cyclopropyl O key And cyclohexyloxy,
。ァリ—ルォキシ基としてはたとえばフエノキシ,ナフチルォキ シなどが,  . Examples of aryloxy groups include phenoxy and naphthoxy.
C 7 - 1 2ァラルキルォキシ基としてはたとえばベンジルォキシ, 2—フエ ネチルォキシなどが, C 7 - 1 The 2 Ararukiruokishi groups such Benjiruokishi, 2 Hue Nechiruokishi is,
C L - +アルキルチオ基としてはたとえばメチルチオ,ェチルチオ,プロ ピルチオ,ブチルチォなどが, Examples of CL- + alkylthio groups include methylthio, ethylthio, propylthio, and butylthio.
C 3 - 6シクロアルキルチオ基としてはたとえばシクロプロピルチオ,シ ク口へキシルチオなどが, C 3 - 6 cycloalkylthio The group e.g. cyclopropylthio, such as cyclohexylthio to shea click port,
C 6- 1 0ァリ一ルチオ基としてはたとえばフェニルチオなどが, C 6 - 1 0 The § Li one thio group such as phenylthio, etc.,
C. 7 - i 2ァラルキルチオ基としてはたとえばベンジルチオなどが, モノ C アルキルァミ ノ基としてはたとえばメチルァミ ノ ,ェチルァ ミノ ,プロピルアミノ ,プチルァミノなどが, C. 7 - i The 2 Ararukiruchio group e.g. benzylthio and mono C Arukiruami amino group as, for example Mechiruami Bruno, Echirua amino, propylamino, Puchiruamino like,
ジ アルキルアミノ基としてはたとえばジメチルアミノ,ジェチル ァミノ,ジプロピルアミノ ,ジブチルァミ ノなどが,  Examples of the dialkylamino group include dimethylamino, getylamino, dipropylamino, dibutylamino, and the like.
C 3- 6シク口アルキルァミ ノ基としてはたとえばシク Όプロピルァミ ノ ,シクロへキシルアミ ノなどが, C 3 - 6 consequent opening Arukiruami amino group as, for example consequent Ό Puropiruami Bruno, cyclohexane, etc. Kishiruami Bruno is,
C G- t 0ァリールアミ ノ基としてはたとえばァニリノなどが, C G -t 0 arylamino groups include, for example, anilino,
C 71 2ァラルキルアミノ基としてはたとえばベンジルァミノ, 2—フエ ネチルァミ ノなどが, The C 7 one 1 2 Ararukiruamino groups such Benjiruamino, such as 2-Hue Nechiruami Bruno is,
ハロゲン原子としてはたとえばフッ素,塩素,臭素,ヨウ素が,  Examples of halogen atoms include fluorine, chlorine, bromine, and iodine.
C アルコキシ—カルボニル基としてはたとえばメ トキシカルボ二 ル,エトキンカルボニル,プロポキシカルボニル,イソプロポキシカルボ ニル,ブトキシカルボニル, tert—ブトキシカルボニルなどが,  Examples of C alkoxy-carbonyl groups include methoxycarbonyl, ethoxyquincarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, tert-butoxycarbonyl, and the like.
C 8- t。ァリールォキシカルボニル基としてはたとえばフヱノキシカル ボニルなどが, C 3 - 6シク口アルキルォキシカルボニル基としてはたとえばシク口プ 口ピルォキシカルボニル,シク口へキシルォキシカルボニルなどか',C 8 - t. Examples of aryloxycarbonyl groups include phenoxycarbonyl, C 3 - 6 consequent opening alkyl O carboxymethyl The group e.g. consequent opening flop port pills O alkoxycarbonyl, hexyl O alkoxycarbonyl or the like to the consequent opening '
C 7 - L 2ァラルキルォキシ力ルポニル基としてはたとえばベンジルォキ シカルボニルなどが, Examples of the C 7 -L 2 aralkyloxycarbonyl group include benzyloxycarbonyl and the like.
d- 5アルカノィル基としてはたとえばホルミル,ァセチル,プロピオ ニル,プチリルノくレリル,ピバロィルなどが,  d-5 alkanoyl groups include, for example, formyl, acetyl, propionyl, butyryl phenol, pivalyl, etc.
アルカノィルォキシ基としてはたとえばホルミルォキシ,ァセト キシ,プチリルォキシ,ビバロイルォキシなどが,  Alkanoyloxy groups include, for example, formyloxy, acetoxy, butyryloxy, bivaloyloxy and the like.
置換力ルバ乇ィル基としてはたとえば N—メチルカルバモイル, , N 一ジメチルカルバモイル, N—ェチルカルバモイル, N—フヱ二ルカルバ モイル,ピロリ ジノカルボニル,ピペリジノカルボニル,ピペラジノカル ボニル,モルホリノカルボニルなどが,  Examples of the substituent groups include N-methylcarbamoyl,, N-dimethylcarbamoyl, N-ethylcarbamoyl, N-phenylcarbamoyl, pyrrolidinocarbonyl, piperidinocarbonyl, piperazinocarbonyl, morpholinocarbonyl and the like. But,
置換チォ力ルバモイル基としてはたとえば —メチルチオ力ルバモイ ルなどが, . '  Examples of substituted thiolvamoyl groups include —methylthio lvamoyl.
置換力ルバモイルォキシ基としてはたとえば N—メチルカルバ乇ィル ォキシ, N , ―ジメチルカルバモイルォキシ, M—ェチルカルバモィル ォキシなどが,  Examples of the substituent groups include N-methylcarbamoyloxy, N, -dimethylcarbamoyloxy, and M-ethylcarbamoyloxy.
C +アルカノィルァミ ド基としてはたとえばホルミ ルァミノ ,ァセト アミ ド,プロピオンアミ ド,プチリルアミ ドなどが, Examples of the C + alkanoylamide group include formylamino, acetoamide, propionamide, and butyrylamide.
C 6- 1 0ァリ -ルァシルアミ ド基としてはたとえばベンズアミ ドなどカC 6 - 1 0 § Li - The Ruashiruami de group e.g. Benzuami Donado Ca
C アルコキシ一カルボニルアミノ基としてはたとえばメ トキシカ ルボニルァミノ ,ェトキシカルボニルァミノ,tert—ブトキシカルボニル ァミノなどが, Examples of the C alkoxy-carbonylamino group include methoxycarbonylamino, ethoxycarbonylamino, tert-butoxycarbonylamino, and the like.
C 7 - 1 2ァラルキルォキシカルボニルアミノ基としてはたとえばベンジ ルォキシカルボニルァミノなどが, C 7 - 1, such as 2 § Lal Kill O carboxymethyl The carbonylamino group for example benzyl Ruo alkoxycarbonyl § Mino is,
置換されていてもよい C アルキル基としては例えば、メ トキシメチ ル, 2 —メ トキシェチル,ヒ ドロキシメチル,フルォロメチル, ト リ フルォ ロメチル,ジフルォロメチル,カルボキシメチル,ェトキシカルボニルメ チル,力ルバ乇ィルメチル,シァノエチル,ァセチルメチルなど力《, Examples of the optionally substituted C alkyl group include, for example, methoxymethyl , 2-Methoxyxetil, hydroxymethyl, fluoromethyl, trifluoromethyl, difluoromethyl, carboxymethyl, ethoxycarbonylmethyl, potassium benzyl, cyanoethyl, acetylmethyl, etc.
また複素環基としては窒素一,酸素 -,硫黄原子 1 ないし 4個を含む環 状基があげられ、 たとえばピロリ ジノ , 2 —ピロリル, 3 —ピロ リ ジニル, Examples of the heterocyclic group include a cyclic group containing one to four nitrogen atoms, one oxygen atom and one sulfur atom, such as pyrrolidino, 2-pyrrolyl, 3-pyrrolidinyl,
3 —ピラゾリ ル, 2 —イ ミ ダゾリル, 2 —フ リル, 2 —チェニル, 2 --ォキ サゾリル, 3 —イソォキサゾリル, 4 —イソチアゾリル, 4 一チアゾリル, ピペリ ジノ , 2 —ピリ ジル, 3 —ピリ ジル, 4 —ピリ ジル,ピペラジノ , 2 —ピリ ミ ジニル, 5 —ピリ ミ ジニル, 2 —ビラニル, 2 —テ トラヒ ドロピ ラニル, 2 —テ トラヒ ドロフリル, 3 —イン ドリ ル, 2 —キノ リル, 1 , 3 ,3 — pyrazolyl, 2 — imidazolyl, 2 — furyl, 2 — phenyl, 2- oxosazolyl, 3 — isoxazolyl, 4 — isothiazolyl, 4-thiazolyl, piperidino, 2 — pyridyl, 3 — pyridyl Jill, 4—pyridyl, piperazino, 2—pyrimidinyl, 5—pyrimidinyl, 2—viranyl, 2—tetrahydropyranil, 2—tetrahidrofril, 3—indrillyl, 2—quinolyl, 1 , 3,
4 —ォキサジァゾ一ルー 2 —ィル,チエノ [ 2 , 3— d]ピリ ジルー 6 —ィ ル, 1 , 2, 3 —チアジアゾ—ルー 4 —ィル, 1 , 3 , 4: —チアジアゾ—ル— 2 —ィル, 1 , 2 , 3, 4 ーテ トラゾ―ル一 5 —ィル, 4 , 5 —ジヒ ドロー 1 , 3 —ジォキソ一ル一 2 —ィルなどがあげられる。 4 —Oxaziazolu 2 —Ir, Thieno [2,3—d] pyridyl 6 —Ir, 1, 2, 3 —Thiadiazolu 4 —Iro, 1,3,4: —Thiadiazole— 2-yl, 1, 2, 3, 4-tetrasol-1-5-yl, 4, 5-jihi draw 1, 3-dioxo-1-2-yl.
さ らに具体的には  More specifically,
R 1 0 —あるいは R 2 0 - -として:ま、 ヒ ド、コキシ,メ トキシ,エ トキン, プロボキシ,ィソプ σポキシ,ブトキシ,イソブトキシ,ベンチルォキシ, イソペンチルォキン,へキシルォキシ,へプチ /レォキシ,ォクチルォキシ, ノニルォキシ,デシルォキシ,ゥンデシルォキシ, ドデシルォキシ, ト リデ シルォキシ,テ トラデシルォキシ,ペンタデシルォキシ,へキサデシルォ キシ,ォクタデシルォキシ,シクロプロピルメ トキシ,メ トキシメ トキシ, メ トキシェ トキシ, 2 —クロ口エトキン, 2 —フルォロエトキン, 2 , 2 , 2 — ト リ フルォロエ トキン; 3 —クロ口プロポキシ, 2 —ヒ ドロキシエト キシ, 4 ーヒ ドロキシブトキシ, 2 —シァノエトキシ, 3 —シァノ プロボ キシ, 3 , 3 —ジエトキンプロポキシ, 2 —フヱノキシエトキン,ァリルォ キシ,クロチルォキン,ベンジルォキシ, ρ—キシリルォキシ, 4 一クロ口 ベンジルォキシ, 3 —フルォロベンジルォキシ, 4一二トロべンジルォキ シ,フエネチルォキシ,シンナミルォキシ,シクロペンチルォキン,シクロ へキシルォキシ, 2 —ォキソプロボキシ,フヱナシルォキシ, 2 '— , 3 '— および 4 '—メチルフエナシルォキシ, 4 ' 一クロ口フエナシルォキシ, 2 '—, 3 '—および 4 'ーメ トキシフエナシルォキシ, 4 '一二トロフエナ シルォキシ, 3 '—二ト σフエナシルォキシ,( 2—テトラヒ ドロビラニル) メ トキシ, 4 , 5 —ジヒ ドロー 1 , 3 —ジォキソール _ 2 —ィルメ トキシ 一 2 —フルフリルォキシ, 2—( 2—フリル)ェトキシ, 3—テニルォキシ, 2 - ( 2 一チェニル)ェチルォキシ,乇ルホリノエトキン,ピペリ ジノエト キシ,ピロリ ジノエトキシ,フロイルメ トキシ,テノィルメ トキシ, 2 —キ ノ リルメ トキシ, 2—(5 , 6 —ベンゾ一 1 , 4—ジォキサニル)メ トキシ, メ トキシカルボニルメ トキシ,力ルバモイルメ トキシ,メ トキシカルボ二 ルォキシ,イソプロピルォキシカルボニルォキシ,フヱノキシカルボニル ォキン,ベンジルォキシカルボニルォキシ,ビバロイルォキシカルボニル ォキシ,ァセトキシ,プロピオニルォキシ,プチリルォキシ,ィソプチリル ォキシ,ペンタノ ィルォキシ,へキサノィルォキシ,ヘプタノ ィルォキシ, ォクタノ ィルォキシ,ノナノィルォキシ,デカノィルォキシ,ゥンデカノ ィルオキシ, ドデカノ ィルォキシ,テトラデカノ ィルォキシ,へキサデ力 ノ ィルォキシ,ォクタデカノィルォキシ,ピバロイルォキシ,シク σプロ パノィルォキシ,シク σブタノィルォキシ,シクロペンタノィルォキシ, シクロへキサノィルォキシ,ァクリロイルォキシ,クロ トノィルォキシ, ベンゾィルォキシ,ナフ トィルォキシ,フヱ二ルァセチルォキシ, 2—メ トキシベンゾィルォキシ, 2 —メチルベンゾィルォキシ, 4 —メチルベン ゾィルォキシ, 4—フルォロベンゾィルォキシ, 3—フヱニルプロピオ二 ルォキシ,シンナモイルォキシ,クロロアセチルォキシ,プロモアセチル ォキシ, 3—クロ口プロパノィルォキシ, 4 一クロロブチリルォキシ,メ トキシァセチルォキシ, 3 _エ トキシプロパノ ィルォキシ,フエノキシァ セチルォキシ, 4 ーフヱノキシプチリルォキシ, 8 —ァセ トキシォクタノ ィルォキシ,シァノ アセチルォキシ, 4 —ニ トロベンゾィルォキシ, 3— メ トキシカルボニルプロパノ ィル, 3 · -エトキシカルポニルァク リ ロイ ルォキシ, 5 —ェトキシカルボ二ルペンタノ ィルォキシ,アジ ドアセ トキ シ,フロイルォキシ,テノ ィルォキシ, 2 —チェ二ルァセチルォキシ, 2— ピコ リルォキシ, 3 —ピコ リルォキシ, 4 —ピコ リルォキシ, 4 ーシクロ へキシルブチリルォキシ, 2 —ナフチルァセチルォキシ,フヱニルプロピ ノ ィルォキシ, 2 —チオフヱンカルボニルォキシ, 3 —チォフェンカルボ ニルォキシ, 2 —フランカルボニルォキシ, 3 —フランカルボニルォキシ, メチルスルホニルォキシ,ェチルスルホニルォキシ,イソプロピルスルホ ニルォキシ,ブチルスルホニルォキシ, 3 —クロ口プロピルスルホニルォ キシ,フヱニルスルホニルォキシ,ρ— ト リ ルス;.レホニルォキシ, 4ーァセ 夕 ミ ドフヱニルスルホニルォキシ, : — ト リ フルォロアセタ ミ ドフヱ二 ルスルホニルォキシ, 4 ーァ ミ ノ フエニルスルホニルォキン, 4 一クロ口 フェニルスルホニルォキシ, 4 ―ブ Ώ乇フエ二ルスルホ二ルォキシ, '1 - フルオロフェニルスルホニルォキシ, 4 — ョウ ドフエニルスルホ二ルォ キシ, 3 , 'I 一ジクロ フエニルスルホ二ルォキシ, 2 —ナフチルスルホ ニルォキシ, 2 —チオフヱンスルホニルォキシ, 5 —メチルー 2 —チォ フ ェ ンスルホニルォキン,メ トキシカルボニルォキシ,エトキシカルボ二 ルォキシ,イソプロポキシカルボニルォキシ,ブトキシカルボニルォキシ, へキシルォキシ力ルボニルォキシ, 2 —クロ口ェチルカルボニルォキシ, ァリ ルォキシカルボニルォキシ,ベンジルォキシカルボニルォキシ,フェ ノキシカルボニルォキシ, 4 一二トロフヱノキシカルボニルォキシ,シク 口へキシルォキシカルボニルォキシなどがあげられる。 R 10 — or R 20 — — as well: Hid, Coxy, Methoxy, Ethkin, Proboxy, Isop σ-Poxy, Butoxy, Isobutoxy, Bentiloxy, Isopentyloxy, Hexyloxy, Hepti / Roxy, Octyloxy, nonyloxy, decyloxy, pendecyloxy, dodecyloxy, tridecyloxy, tetradecyloxy, pentadecyloxy, hexadesiloxy, octadecyloxy, cyclopropyl methoxy, methoxy methoxy, methoxy ethoxy, 2-clocloethoxy , 2 — Fluoroethoxyquin, 2, 2, 2 — Trifluoroethoxy, 3 — Clopropoxy, 2 — Hydroxyethoxy, 4-Hydroxybutoxy, 2 — Cyanethoxy, 3 — Cyanpropoxy, 3, 3-die Tokin Propoxy, 2-Phono Xietokin, aryloxy, crotyloxy, benzyloxy, ρ-xylyloxy, 4 Benzyloxy, 3-fluorobenzyloxy, 412-trobenzoyloxy, phenethyloxy, cinnamyloxy, cyclopentyloquin, cyclohexyloxy, 2-oxopropoxy, phenacyloxy, 2'-, 3'- and 4'-methylphen Nasiloxy, 4 'monoclophenasiloxy, 2'-, 3'- and 4'-methoxyphenasiloxy, 4'12-trophenasiloxy, 3'-nitro-phenasiloxy, (2-tetrahydrobilanyl) Methoxy, 4, 5 —Dihidro 1, 3 —Dioxol — 2 —Ilmethoxy-1 2 —Furfuryloxy, 2- (2-furyl) ethoxy, 3-Tenyloxy, 2- (2-Cenyl) ethyloxy, Perholinoetkin, Piperi Dinoethoxy, pyrrolidinoethoxy, floylmethoxy, tenylmethoxy, 2—Quinolyl methoxy, 2- (5,6-Benzo-1,4-dioxanyl) methoxy, methoxycarbonyl methoxy, sorbamoyl methoxy, methoxycarboxy, isopropyloxycarbonyloxy, pheno Xycarbonyloxy, benzyloxycarbonyloxy, bivaloyloxycarbonyloxy, acetoxy, propionyloxy, butyryloxy, isoptyryloxy, pentanoyloxy, hexanoyloxy, heptanoyloxy, octanoyloxy, dexanoyloxy, decanyloxy, decanyloxy, decanoloxy, decanolyl , Tetradecanoyloxy, hexadenoyloxy, octadecanyloxy, pivaloyloxy, cy σpropanoyloxy, cy σbutanoyloxy, cyclope Nantanoloxy, cyclohexanoyloxy, acryloyloxy, crotonyloxy, benzoyloxy, naphthyloxy, phenylacetyloxy, 2-methoxybenzoyloxy, 2-methylbenzoyloxy, 4-methylbenzoyloxy, 4-fluroxy O-benzoyloxy, 3-phenylpropionyloxy, cinnamoyloxy, chloroacetyloxy, promoacetyloxy, 3-chloropropanoyloxy, 4-chlorobutyryloxy, methyl Toxiacetyloxy, 3_ethoxypropanoyloxy, phenoxyacetyloxy, 4-phenyloxybutyryloxy, 8—acetoxyoctanoyloxy, cyanoacetyloxy, 4-nitrobenzoyloxy, 3-methoxycarbonyl Propanoyl, 3 -ethoxycarbonylacryloyloxy, 5-ethoxyethoxycarbonylpentanoyloxy, azidoacetoxy, floyloxy, tenyloxy, 2-phenolicyloxy, 2-picolyloxy, 3-picolyloxy, 4 —Picolyloxy, 4-cyclohexylbutyryloxy, 2 —naphthylacetyloxy, phenylpropynyloxy, 2 —thiophenecarbonyloxy, 3 —thiophenecarbonyloxy, 2 —furancarbonyloxy, 3 —furancarboxy Leoxy, methylsulfonyloxy, ethylsulfonyloxy, isopropylsulfonyloxy, butylsulfonyloxy, 3-chloropropylsulfonyloxy, phenylsulfonyloxy, ρ-trilus; Midophenylsulfonyloxy, — — trifluoroacetamidylsulfonyloxy, 4-aminophenylsulfonyloxy, 4-monophenylphenylsulfonyloxy, 4-butylphenylsulfonyl Roxy, '1 -Fluorophenylsulfonyloxy, 4 — Iodophenylsulfonyloxy, 3, 2,' I-Dichlorophenylsulfonyloxy, 2 —Naphthylsulfonyloxy, 2 —Thiophopensulfonyloxy, 5 —Methyl-2 —Chemophensulfonyloquine, methoxycarbonyloxy Si, ethoxycarboxy, isopropoxycarbonyloxy, butoxycarbonyloxy, hexyloxycarbonyl, 2-cycloethylcarbonyloxy, aryloxycarbonyloxy, benzyloxycarbonyloxy, pheno Xycarbonyloxy, 4 12-trophinoxycarbonyloxy, cyclohexyloxycarbonyloxy and the like.
R としては、 具体的には、 たとえば、 水素,ヒ ドロキシ,ハロゲン,メ L チル,ェチル,プ-ロピル,ィソプロピル,プチル,ァミ ノ ,メチルァ ミ ノ ,ジ メチルァミ ノ ,ェチルァミ ノ ,ジェチルァミ ノ ,プロピルァミ ノ ,ジプロピ ルァミ ノ ,プチルァミ ノ ,ジブチルァミ ノ ,へキシルァミ ノ ,ジへキシルァ ミ ノ ,シクロプロピルアミ ノ ,ジシクロプロピルアミ ノ ,シクロブチルァ δ ミ ノ ,ジシクロブチルァミ ノ ,シクロぺンチルアミ ノ ,ジシクロペンチル ァ ミ ノ ,シクロへキシルアミ ノ ,ジシクロへキシルァミ ノ ,フヱニルアミ ノ ,ジフエニルアミ ノ ,ベンジルアミ ノ ,ジベンジルアミ ノ , Ν—メチルー Ν—フエニルアミ ノ , Ν—ェチルー Ν—フヱニルアミ ノ , Ν—メチル一 Ν 一ベンジルァミ ノ ,Ν—ェチルー Ν—ベンジルアミ ノ ,モルホリ ノ ,ピロ0 リ ジノ ,ピペラジノ , N '—メチルビペラジノ , N '—ェチルビペラジノ ,ジSpecific examples of R include, for example, hydrogen, hydroxy, halogen, and methyl. L-tyl, ethyl, propyl, isopropyl, butyl, amino, methylamino, dimethylamino, ethylamino, getylamino, propylamino, dipropylamino, butylamino, dibutylamino, hexylamino, hexylamino Xylamino, cyclopropylamino, dicyclopropylamino, cyclobutylamino, dicyclobutylamino, cyclopentylamino, dicyclopentylamino, cyclohexylamino, dicyclohexylamino, phenylamino , Diphenylamino, benzylamino, dibenzylamino, dimethylamino, phenylamino, diethylamino, phenylamino, methyl-benzylamino, benzylamino, morpholino , Pipera Zino, N'-methylbiperazino, N'-ethylbiperazino, di
— ( 2 —ヒ ドロキシェチル)ァミ ノ ,ジー(2 —ェトキシェチル)ァミ ノ ,ジ 一( 2 —メ トキシェチル)ァミ ノ ,ジー(カルボキシメチル)ァミ ノ ,ジェチ ルー(ェトキシカルボニルメチル)ァミ ノ ,ジー(2—ェチルチオェチル) ァミ ノ ,ジー(2 —ァミ ノェチ )ァミ ノ ,ジー(2 —ェチルァミ ノェチル)5 ァミ ノ ,ジ一(2 —ジェチルァミ ノェチル)ァ ミ ノ ,ジー(2 —フヱニルェ チル)ァミ ノ ,ジ一(2—ベンジルェチル)ァミ ノ ,ジー(2 —二 ト σェチル) ア ミ ノ ,ジ—( 2 —クロロェチル)アミ ノ ,ジ一( 2 —カルボキシェチル)ァ ミ ノ ,ジ—( 3 —ォキソプチル)ァミ ノ ,ジー( 2 —ァセトキシェチル)ァ ミ ノ ,ジ一(2 —スルホェチル)ァミ ノ ,ジー(2 —力ルバモイルェチル)ァミ0 ノ ,ジ一(Ν, 一ジメチルカルバモイルェチル)ァミ ノ ,ジー( 2 —力ルバ モイルォキシェチル)ァミ ノ ,ジ一(Ν . Ν—ジメチルカルバモイルォキシ ェチル)ァミ ノ ,ジ一(2 —ァセタ ミ ドエチル)ァミ ノ ,メ トキシ,エ トキシ, プロボキシ .ブトキシ, 2 —ヒ ドロキシエトキン, 2 —メ トキシエトキシ, 2—メチルチオエトキシ, 2 —アミ ノエトキシ, 2 —メチルアミ ノエトキ5 シ, 2 —ジメチルアミ ノエ トキシ . 2 —フエニルアミ ノエトキシ, 2 —ベ ンジルアミ ノエトキシ, 3 —ニトロプロポキシ, 3—クロ口プロポキシ, 2 —カルボキシエ トキン, 2 —ァセ トキシエ トキン, 3 —ォキソブトキシ, 2 —エトキシカルボニルエ トキシ, 2 —スルホエ トキン, 2 —力ルバモイ ルェ トキシ, 2 ―ジメチルアミ ノエトキシ, 2 —力ルバモイルォキシェト キシ, 2 —ジメチルア ミ ノ カルバモイルォキシエトキシ, 2 —ァセタ ミ ド エ トキン,ァセ トキシ,プロピオリルォキシ,プチ口キシ,ヒ ドロキシァセ トキシ,メ トキシァセ トキシ,メチルチオァセ トキシ,グリ シルォキシ,メ チルアミ ノ アセ トキシ,ジメチルアミ ノ アセ トキシ,フエニルアミ ノ アセ トキシ,ベンジルアミ ノ アセ トキシ,ニトロァセ トキシ,クロロアセ トキ シ,サクシノォキン,エトキシカルボニルァセ トキシ, 4 —ォキソバレロ キシ,ァセ トキシァセ トキシ, 3 —スルホプロピオリ ルォキシ,力ルバモ ィルァセ トキシ, M—ジメチルカルバモイルァセ トキシ,ァセタ ミ ドアセ トキシ,ベンゾィルォキシ,メ トキシカルボニルォキシ,エトキン力ルボ ニルォキシ,プロポキシカルボニルォキシ,ブトキシカルボニルォキシ, 2 , 2 , 2 - ト リ クロ口エ トキシカルボニルォキシ,ベンジルォキシカル ボニルォキシ,メチルスルホニルォキシ,ェチルスルホニルォキシ,プロ ピルスルホ二ルォキシ,ブチルスルホニルォキシ,フエ二ルスルホ二ル-ォ キシ, P— トルエンスルホニルォキン, 4 一クロ σフヱニルスルホニルォ キシ, 3 , -i — ジク σ 'コフヱ二ルスルホニルォキシ,メチルチォ,ェチルチ ォ,プロピルチオ,ィソプロピルチオ,プチルチオ, i so—プチルチオ, sec —プチルチオ, t er t—プチルチオ,ベンジルチオ,フヱニルチオ,ナフチル チォ,フ リ ルチォ,ピリ ジルチオ,( 5 —メチルー 1 , 3 , 4 —チアジアゾー ルー 2 —ィル)チォ, [ 5 _ ( 2 —ジメチルアミ ノエチル)一 1 , 3 , 4 —チ アジアゾ—ルー 2 —ィル]チォ,(し 3 , 4 —チアジアゾール— 2 —ィル) チオズ 1 ーメチルー 1 H—テ トラゾール一 5 —ィル)チォ, [ 1 —( 2 —ヒ ド σキシェチル)一 1 H—テ トラゾール— 5 —ィル]チォ, [ 1 — ( 2 —ジ メチルアミ ノエチル)一 1 Η —テ トラゾ一ル一 5 —ィル]チォ,( 1 —スル ホメチルー 1 H—テトラゾ—ルー 5 —ィル)チォ, [ 1 — ( 2 —スルホェチ ル)一 1 H —テ トラゾ―ル— 5 —ィル]チォ,( 1 一カルボキシメチル一 1 H—テトラゾ—ルー 5 —ィル)チォ, [ 1 — ( 2 —カルボキシェチル)— 1 H—テトラゾール— δ—ィル]チォ,(2 —メチルー 2 Η— 1 , 2 , 3 , 5 - テトラゾール一 4 —ィル)チォ,(4 —メチル一 4 Η— 1 , 2 , 4 — トリア ゾ—ルー 3 —ィル)チォ,(4 , 5 —ジメチル— 4 Η— 1 , 2 , 4 - トリァゾ —ルー 3 —ィル)チォ,(1 , 2 , 3 —チアジアゾ—ルー 5 —ィル)チォ,(3 ーヒ ドロキシ— 4 一カルボキシー 1 , 2 —チアゾール— 5 —ィル)チォ, ( 4ーメチルー 1 , 3 —チアゾ一ルー 2 —ィル)チォ,(4 一カルボキシメ チル— し 3 —チアゾール— 2 —ィル)チォ,(5—メチル— 1 , 3, 4一才 キサジァゾ—ルー 5—ィル)チォ, 2—ヒ ド πキシェチルチオ, 2 —メ ト キシェチルチオ, 2—フヱ二ルェチルチオ, 2—メチルチオェチルチオ, 2—フエ二ルメルカプトェチルチオ, 2—アミノエチルチオ, 2—メチル ァミ ノェチルチオ, 2—ジメチルァミノェチルチオ, 2—ベンジルァミ ノ. - ェチルチオ. 2 —フヱニルアミノエチルチオ, 2 —カルボキシェチルチオ,— (2—Hydroxyshetyl) amino, G (2—ethoxyxethyl) amino, Di (2—methoxyxethyl) amino, G (carboxymethyl) amino, Jetiru (ethoxycarbonylmethyl) Amino, Gee (2-ethylamchiethyl) Amino, Gee (2—ethylaminetyl) 5 Amino, Gee (2—ethylethylamine) G- (2-phenylethyl) amino, di- (2-benzylethyl) amino, g- (2-nitroethyl) amino, di- (2-chloroethyl) amino, di-1 (2-) Carboxyethyl) amino, di (3-oxoptyl) amino, g (2-acetoxicetyl) amino, di-1 (2-sulfoethyl) amino, gee (2—powerbamoylethyl) ami0ノ 、 ジ 一 (Ν 1-Dimethylcarbamoylethyl) amino, G- (2-hydroxycarbamoyloxyethyl) amino, di- (Ν.Ν-dimethylcarbamoyloxyethyl) amino, di- (2-acetamy) (Ethyl) amino, methoxy, ethoxy, propoxy.butoxy, 2-hydroxyethoxy, 2-methoxyethoxy, 2-methylthioethoxy, 2-aminoaminoethoxy, 2-methylaminoethoxy, 2-dimethylaminoethoxy. 2-phenylamino-ethoxy, 2-benzylamino-ethoxy, 3-nitropropoxy, 3-clopropoxy, 2-carboxyethoxy, 2-acetoethoxy, 3-oxobutoxy, 2-ethoxycarbonylethoxy, 2-sulphoethoxy, 2-rubamoyl ethoxy, 2-dimethylamino ethoxy, 2-dimethylaminoxetoxy , 2-dimethylaminocarbamoyloxyethoxy, 2-acetamidoethoxy, acetate, propiolyloxy, petit-mouth, hydroxyacetoxy, methoxyacetoxy, methylthioacetoxy, glycyloxy, methylaminoacetate Toxic, dimethylaminoacetoxy, phenylaminoacetoxy, benzylaminoacetoxy, nitroacetoxy, chloroacetoxy, succinoquine, ethoxycarbonylacetoxy, 4-oxovaleroxy, acetoethoxyacetoxy, 3-sulfo Loporioloxy, rubamoylacetoxy, M-dimethylcarbamoylacetoxy, acetamidoacetoxy, benzoyloxy, methoxycarbonyloxy, ethoxyquinylcarbonyl, propoxycarbonyloxy, butoxycarbonyloxy, 2,2,2- Tri-mouth ethoxycarbonyloxy, benzyloxycarbonyloxy, methylsulfonyloxy, ethylsulfonyloxy, propylsulfonyloxy, butylsulfonyloxy, phenylsulfonyloxy, P-toluenesulfonyl Quinine, 4-chloro succinylsulfonyloxy, 3, -i-dic σ'cophenylsulfonyloxy, methylthio, ethylthio, propylthio, isopropylthio, butylthio, iso-butylthio, sec —butylthio, t er t—butylthio Benzylthio, phenylthio, naphthylthio, furylthio, pyridylthio, (5-methyl-1,3,4—thiadiazol-2-yl) thio, [5_ (2-dimethylaminoethyl) 1-1,3,4—thio Asiazol 2 —yl] thio, (3,4 —thiadiazole-2 —yl) thios 1-methyl-1 H—tetrazol-1 5 —yl) thio, [1 — (2 —Hid σ-kissetil) 1 1 H—Tetrazol—5—yl] thio, [1— (2—Dimethylaminoethyl) 1 1Η—Tetrazol-1 5—yl] thio, (1—Sul) 1- (2-Sulfoethyl) -1H-Tetrazol-5- (yl) thio, (1-Carboxymethyl-1H-tetrazo) Lou 5 —yl) thio, [1 — (2-carboxyethyl) — 1 H-tetrazole—δ-yl] thio, (2 —methyl-2 Η— 1,2,3,5-tetrazole-1 4 — Yl) thio, (4-Methyl-1 4 Η— 1, 2, 4 — Triazo-Lou 3 — yl) thio, (4, 5 — Dimethyl—4 Η— 1, 2, 4 -triazo — Lou 3 — (Yl) thio, (1,2,3—thiadiazol-5—yl) thio, (3-hydroxy-4-1, carboxy-1,2, thiazol-5—yl) thio, (4-methyl-1,1, 3 — thiazo-l- 2- (yl) thio, (4-carboxymethyl)-3-thiazole-2-yl) thio, (5-methyl-1, 3, 4) L-5-yl) thio, 2-hid pi-xethylthio, 2-methoxethylthio, 2-phenylethylthio, 2-methylthioethylthio, 2-phenylmercaptoethylthio, 2-aminoethylthio , 2-Methylaminoethylthio, 2-dimethylaminoethylthio, 2-benzylamino. -Ethylthio. 2-phenylaminoethylthio, 2-carboxyethylthio,
2 --エトキン力ルポ二ルェチルチオ, 2ーァセトキシェチルチオ, 2—ス ルホェチルチオ, 2—力ルバモイルェチルチオ, 2 一ジメチルカルバモイ ルチオ, 2 —力ルバモイルォキシェチルチオ, 2 ―ジメチルカルバ乇ィル ォキシチォ, 2—ァセタミ ドエチルチオ, 2—ェトキシカルボニルァミノ ェチルチオ,メチルスルフィニル,ェチルスルフィニル,プロピルスルフィ ニル,イソプロピルスルフィニル,ブチルスルフィニル, i so—ブチルスル フィニル, sec—ブチルスルフィニル, t ert—ブチルスルフィニル,ベンジ ルスルフィニル,フヱニルスルフィニル,ナフチルスルフィニル,フリル スルフィニル,ピリジルスルフィニル,( 5—メチルー 1 , 3 , 4—チアジ ァゾール— 2 —ィル)スルフィニル,[ 5— ( 2 —ジメチルアミノエチル)2-Etoquinol-Lupirylethylthio, 2-Acetoxicetylthio, 2-Sulphoethylthio, 2-Lubamoylethylthio, 2-Dimethylcarbamoylthio, 2-Lubamoyloxethylthiol, 2 -Dimethylcarbazyloxy, 2-acetamidoethylthio, 2-ethoxycarbonylaminoethylthio, methylsulfinyl, ethylsulfinyl, propylsulfinyl, isopropylsulfinyl, butylsulfinyl, iso-butylsulfinyl, sec-butylsulfinyl , Tert-butylsulfinyl, benzylsulfinyl, phenylsulfinyl, naphthylsulfinyl, furylsulfinyl, pyridylsulfinyl, (5-methyl-1,3,4-thiadiazol-2-yl) sulfinyl, [5- (2 —Dimethylaminoethyl)
- 1 , 3 , 4—チアジアゾ—ルー 2—ィル Ίスルフィニル,( 1 , 3 , 4—チ アジアゾ—ルー 2 —ィル)スルフィニル,( 1 —メチル— 1 H—テ トラゾ ール— 5 —ィル)スルフィニル, [ 1 一(2 —ヒ ドロキシェチル)一 1 H— テ トラゾール— 5 —ィル]スルフィニル, [ 1 — ( 2 —ジメチルァミ ノェチ ル)一 1 H—テトラゾール— 5 —ィル]スルフィニル,( 1 一スルホメチル — 1 H—テ トラゾールー 5 —ィル)スルフィニル, [ 1 - ( 2 —スルホェチ ル)一 1 H—テ トラゾールー 5 —ィル]スルフィニル,( 1 一カルボキシメ チル— 1 H—テ トラゾ—ルー 5 —ィル)スルフィニル, [ 1 — ( 2 —カルボ キシェチル)— 1 H—テトラゾールー 5 —ィル]スルフィニル,(2 —メチ ルー 2 H— 1 , 2 , 3 , 5 —テ トラゾール— 4 一ィル)スルフィニル,(4― メチルー 4 H— 1 , 2 , 4 — ト リァゾール— 3 —ィル)スルフィニル,(4 ,-1, 3, 4 -thiadiazol 2-yl disulfinyl, (1, 3, 4 -th Asiazol-2—yl) sulfinyl, (1—methyl-1H—tetrazol—5—yl) sulfinyl, [1—1 (2—hydroxyxethyl) -1H—tetrazol—5—yl ] Sulfinyl, [1 — (2-dimethylamino) -1 1 H-tetrazol-5-yl] sulfinyl, (1-sulfomethyl — 1 H-tetrazol-5-yl) sulfinyl, [1-(2 —sulfetiyl) Le) 1 1-H-Tetrazol-5-yl] sulfinyl, (1-Carboxymethyl-1H-tetorazol-5-yl) sulfinyl, [1— (2—carboxicetyl) -1H-tetrazole 5—yl] sulfinyl, (2—methylol 2 H—1,2,3,5—tetorazol—41-yl) sulfinyl, (4-methyl-4H—1,2,4—triazole—3 — (Yl) sulfinyl, (4,
5 —ジメチルー 4 H— 1 , 2 , 4 - ト リ ァゾール一 3 —ィル)スルフィニ ル( 1 , 2 , 3 —チアジアゾール一 5 —ィル)スルフィニル,( 3 —ヒ ドロキ シー 4 一カルボキシ— 1 , 2 —チアゾール— 5 —ィル)スルフィニル,( 4 ーメチル— 1 , 3 —チアゾ—ルー 2 —ィル)スルフィニル,(4 一カルボキ シメチルー 1 , 3 —キアゾ—ルー 2 —ィル)スルフィニル,( 5 —メチルー5—Dimethyl-4H—1,2,4-triazole-3-yl) sulfinyl (1,2,3—thiadiazole-5-yl) sulfinyl, (3—hydroxy-4 monocarboxy-1) , 2—Thiazol-5-yl) sulfinyl, (4-methyl-1, 3-thiazo-lu-2-yl) sulfinyl, (4-Carboxymethyl-1, 3 —kiazo-lu-2-yl) sulfinyl, ( 5—Methyl
1 , 3 , 4 —ォキサジァゾ—ルー 5 —ィル)スルフィニル, 2 —ヒ ドロキシ ェチルスルフィニル, 2 —メ トキシェチルスルフィニル. 2 —フヱニルェ チルスルフィニル, 2 —メチルチオェチルスルフィニル, 2 —フヱニルメ ルカプトェチルスルフィニル, 2 —ァミ ノェチルスルフィニル, 2 —メチ ルアミ ノエチルスルフィニル, 2 —ジメチルアミ ノエチルスルフィニル,1, 3, 4 — oxaziazo-lu 5 — yl) sulfinyl, 2 — hydroxyethylsulfinyl, 2 — methoxysulfinyl. 2 — phenylethylsulfinyl, 2 — methylthioethylsulfinyl, 2 — phenylmercapto 2-ethylaminosulfinyl, 2-aminoaminosulfinyl, 2-methylaminoethylsulfinyl, 2-dimethylaminoethylsulfinyl,
2 一べンジルアミ ノエチルスルフィニル, 2 —フエニルアミ ノエチルス ルフィニル, 2 —カルボキシェチルスルフィニル, 2 ーェトキシカルボ二 ル チルスルフィニル, 2 —ァセ トキシェチルスルフィニル, 2 —スルホ ェチルスルフィニル, 2 —力ルバモイルェチルスルフィニル, 2 —ジメチ ルカルバモイルスルフィニル, 2 —力ルバモイルォキシェチルスルフィ ニル, 2 -ジメチルカルバモイルォキシスルフィニル, 2 —ァセタ ミ ドエ チルスルフィニル, 2 —ェトキシカルボニルァミ ノェチルスルフィニル, メチルスルホニル,ェチルスルホニル,プロピルスルホニル,イソプロピ ルスルホニル,ブチルスルホニル, iso—ブチルスルホニル, sec—ブチル スルホニル, t ert—プチルスルホニル,ベンジルスルホニル,フヱニルス ルホニル,ナフチルスルホニル,フ リルスルホニル,ピリ ジルスルホニル,2 Benzylaminoethylsulfinyl, 2-phenylaminoethylsulfinyl, 2-carboxyethylsulfinyl, 2-ethoxycarbonylsulfinyl, 2-acetoxysulfylsulfinyl, 2-sulfoethylsulfinyl, 2—caprolvayluele Tylsulfinyl, 2-dimethylcarbamoylsulfinyl, 2-carbamyloxysulfinyl, 2-dimethylcarbamoyloxysulfinyl, 2-acetamidoe Tylsulfinyl, 2-ethoxyethoxycarbonylaminoethylsulfinyl, methylsulfonyl, ethylsulfonyl, propylsulfonyl, isopropylsulfonyl, butylsulfonyl, iso-butylsulfonyl, sec-butylsulfonyl, tert-butylsulfonyl, benzylsulfonyl, Phenylsulfonyl, naphthylsulfonyl, furylsulfonyl, pyridylsulfonyl,
( 5 —メチルー 1 , 3 , 4 ーチアジアゾールー 2 —ィル)スルホニル, [ 5— ( 2 —ジメチルアミ ノエチル)一 1 , 3 , 4 —チアジアゾ一ルー 2 —ィル] スルホニル,( 1 , 3 , 4 —チアジアゾールー 2 —ィル)スルホニル,( 1 一 メチ。ル― 1 Η—テトラゾールー 5 —ィル)スルホニル, [ 1 — ( 2 —ヒ ドロ キシェチル)— 1 Η—テ トラゾール— 5 —ィル]スルホニル, [ 1 — ( 2— ジメチルアミ ノエチル)一 i Η—テ トラゾール— 5 —ィル]スルホニル,( 1 —スルホメチルー 1 Η—テ トラゾールー 5 —ィル)スルホ二ル, [ 1 一( 2 ースルホェチル)一 1 Η—テ トラゾ—ルー 5 —ィル]スルホニル,( 1 一力 ルボキシメチル— 1 Η—テ トラゾール— 5 —ィル)スルホニル, [ 1 — ( 2 一カルボキンェチル)— 1 Η—テ トラゾ―ル— 5 —ィル]スルホニル,( 2 ーメチルー 2 Η— 1 , 2 , 3 , 5 —テ トラゾールー 4 —ィル)スルホニル,( 4 ーメチルー 4 Η — し 2 . 4 — ト リァゾ—ルー 3 —ィル)スルホニル,(4 , 5 —ジメチルー ' 1 Η— 1 , 2 , 4 — ト リ アゾ- -ル— 3 —ィル)スルホニル, ( 1 , 2 , 3 —チアジアゾ—ル— 5 —ィル)スルホニル,(3 —ヒ ドロキシー 4 —ガルボキシー 1 , 2 —チアゾール— 5 —ィル)スルホニル,(4 ーメチ ル— 1 , 3 —チアゾ—ルー 2 —ィル)スルホニル,(4 —カルボキシメチル ― 1 , 3 —チアゾ—ルー 2 —ィル)スルホニル,( 5 —メチルー 1 , 3 , 4— ォキサジァゾール— 5 —ィル)スルホニル, 2 —ヒ ドロキシェチルスルホ ニル, 2 —メ トキシェチルスルホニル, 2 —フヱ二ルェチルスルホニル, 2 —メチルチオェチルスルホニル, 2 —フヱニルメルカプトェチルスル ホニル, 2 —ァミ ノェチルスルホニル, 2 —メチルァミ ノェチルスルホニ 1 ル, 2 —ジメチルアミ ノエチルスルホニル, 2 —ベンジルアミ ノエチルス ルホニル, 2—フエニルア ミ ノエチルスルホニル, 2—カルボキシェチル スルホニル, 2—ェ トキシカルボ二ルェチルスルホニル, 2—ァセ トキシ ェチルスルホニル, 2—スルホ二ルェチルスルホニル, 2—力ルバ乇ィル 5 ェチルスルホニル, 2—ジメチルカルバモイルスルホニル, 2—カルバモ ィルォキシェチルスルホニル, 2—ジメチルカルバモイルォキシスルホ ニル, 2—ァセタ ミ ドエチルスルホニル, 2—エトキシカルボニルァ ミ ノ ェチルスルホニルなどが挙げられる。 (5-Methyl-1,3,4-thiadiazol-2-yl) sulfonyl, [5- (2-dimethylaminoethyl) 1-1,3,4—thiadiazoyl-2-yl] sulfonyl, (1,3, 4 —Thiadiazol-2-yl) sulfonyl, (1-methyl-1-yl-1Η-tetrazol-5-yl) sulfonyl, [1— (2—hydroxicetyl) —1Η—tetrazol—5—yl ] Sulfonyl, [1- (2-dimethylaminoethyl) -1-i-tetrathrol-5-yl] sulfonyl, (1-sulfomethyl-1-tetrathrazol-5-yl) sulfonyl, [1-1- (2-sulfoethyl) ) -1 1Η-Tetrazol-5-yl] sulfonyl, (1 一 -ruboxymethyl-1 1- テ totrazol-5-yl) sulfonyl, [1 — (2 一 carboquinethyl) —1Η- テ totrazo Ru—5—yl] sulfonyl (2-Methyl-2 2—1,2,3,5—Tetrazol-4-yl) sulfonyl, (4-Methyl-4 4— and 2.4—Triazo-lu-3-yl) sulfonyl, (4,5— Dimethyl '1 Η— 1,2,4 — triazo--3-yl-3 —yl) sulfonyl, (1,2,3 —thiadiazol-5 —yl) sulfonyl, (3 —hydroxy 4 — Garboxy 1,2-thiazole-5-yl) sulfonyl, (4-methyl-1, 3-thiazo-lu-2-yl) sulfonyl, (4-carboxymethyl-1,3 -thiazo-lu-2-yl) ) Sulfonyl, (5-Methyl-1,3,4-oxoxadiazole-5-yl) sulfonyl, 2—Hydroxitytylsulfonyl, 2—Methoxyshetylsulfonyl, 2—Phenylethylsulfonyl, 2— Methylthioethylsulfonyl, 2-phenylmercaptoe Rusuru Honiru, 2 - § Mi Noe chill sulfonyl, 2 - Mechiruami Noechirusuruhoni 1, 2-dimethylaminoethylsulfonyl, 2-benzylaminoethylsulfonyl, 2-phenylaminoethylsulfonyl, 2-carboxyethylsulfonyl, 2-ethoxycarbenylethylsulfonyl, 2-acetoxyethylsulfonyl, 2 —Sulfonylethylsulfonyl, 2-dibutyl-5-ethylsulfonyl, 2-dimethylcarbamoylsulfonyl, 2-carbamoyloxshetylsulfonyl, 2-dimethylcarbamoyloxysulfonyl, 2-acetamidoethyl Sulfonyl, 2-ethoxycarbonylaminomethylsulfonyl and the like can be mentioned.
R 5としては、 具体的には、 たとえば、 1 , 2—フエ二レン, 4—メチ 丄0 ルー 1 , 2—フヱニレン, 5—メチル一 1 , 2—フエ二レン, 4—ェチルー As R 5 , specifically, for example, 1,2-phenylene, 4-methyl-1,0-l, 2-phenylene, 5-methyl-11,2-phenylene, 4-ethylene
1 , 2—フ 二レン, 5—ェチルー 1 , 2—フエ二レン, 4—メ トキシ一 1 , 2—フヱニレン, 5—メ トキシー 1 , 2—フヱニレン, 4—クロロー 1 , 2 ' —フエ二レン, 5—クロロー 1 , 2—フエ二レン, 4—アミ ノ ー 1 , 2—マエ 二レン, 5—ア ミ ノ ー 1 , 2—フヱニレン, 4—ニトロ一 1 , 2—フヱニレ 1,2-phenylene, 5-ethyl-1,2-phenylene, 4-methoxy-1,2-phenylene, 5-methoxy-1,2-phenylene, 4-chloro-1,2'-phenyl Len, 5-chloro-1,2-phenylene, 4-amino1,2-maenylene, 5-amino1,2-phenylene, 4-nitro-1,2-phenylene
15 ン, 5—二 トロ一 1 , 2—フエ二レン, 4ーメ トキシカルポニル一 1 , 2— フエ二レン, ; —メ トキシカルボ二ル— 1 , 2 —フエ二レン, 4 一力ルボ キシー 1 , '2—フヱニレン, 5 —カルボキシー 1 , 2—フヱニレン, 4ージ メチルァ ミ ノ 一 1 , 2 —フエ二レン, 5 —ジメチルア ミ ノ ー 1 , 2—フエ 二レン, 4ーァセタ ミ ドー し 2—フエ二レン, 5—ァセタ ミ ド一 1 , 2—15-, 5-nitro-1, 2-phenylene, 4-methoxycarbonyl-1,1,2-phenylene;; -methoxycarbonyl-1, 2 -phenylene, 4 1, '2-phenylene, 5-carboxy-1,2-phenylene, 4-dimethylamino-1,2-phenylene, 5-dimethylamino-1,2-phenylene, 4-acetamido 2—Fenerene, 5—acetamid 1, 2—
20 フエ二レン, 4ーヒ ドロキシ一 1 , 2 —フエ二レン, 5—ヒ ドロキシー 1 , 20 Phenylene, 4-hydroxy-1, 2, 2-phenylene, 5-hydroxy1,
2—フヱニレン, 4 , 5 —ジメチル一 1 , 2—フエ二レン, 4 , 5—ジクロ a - 1 , 2—フヱニレン, 2 , 3—ナフタ レン, 6—クロロー 2 , 3—ナフ タ レン, 7—クロロー 2 , 3—ナフチレン,ビニレン, 1 , 2—ジメチルビ 二レン,ェチレン, 1 , 2—ジメチルェチレン等が挙げられる。  2-phenylene, 4, 5-dimethyl-1,2-phenylene, 4,5-dichloroa-1,2-phenylene, 2,3-naphthalene, 6-chloro-2,3-naphthalene, 7 —Chloro-2,3-naphthylene, vinylene, 1,2-dimethylvinylene, ethylene, 1,2-dimethylethylene, and the like.
25 R8としては、 具体的には、 たとえばカルボキシ,メ トキシカルボニル, エトキシカルボニル,プロピルォキシカルボニル,ブチルォキシカルボ二 ル,メ トキシメ トキシカルボニル, 2 —メ トキシエドキシカルボニル, 1 ーメ トキシェトキシカルボニル,メチルチオメ トキシカルボニル, 2 —メ チルチオェ トキシカルボニル,ァセドキシメ トキシカルボニル, 1 —ァセ トキシェトキシカルボニル, 1 一エトキンカルボニルォキシエトキシカ ルボニル,エ トキシカルボニルォキシメ トキシカルボニル,ビバロイルォ キシメ トキシカルボニル, 1 ーピバロィルォキシエトキシカルボニル,ァ リルォキシカルボニル, 2 , 2 , 2 — ト リ クロ口ェチルォキシカルボニル, フエノキシカルボニル, 4 ーメ トキシフヱニルォキシカルボニル, 2, 4 —ジメ トキシフヱニルォキシカルボニル, 4一二トロフヱニルォキシカ ルポニル, 2 , 4 —ジニトロフヱニルォキシカルボニル,ベンジルォキシ 力ルボニル, 4一二トロベンジルォキシカルボニル, 2 , 4 —ジニトロべ ンジルォキシカルボニル, 4ーメ トキシベンジルォキシカルボニル, 2, 4 ージメ トキシベンジルォキシカルボニル, 2 —アミ ノエチルォキシカ ルボニル, 2 —ジメチルアミ ノエチルォキシカルボニル, 2 —メチルスル ホニルェチルォキシカルボニル, 2 — ト リメチルシリルェチルォキシカ ルボ二;レ, 2 一シァノエチルォキシカルボニル, 2—二ト ェチルォキシ 力ルポニル,力ルバ乇ィル,メチルァミ ノ カルボニル,ジメチルァ ミ ノ 力 ルボ二;レ,ェチルァ ミ ノカルボニル,ジェチルァミ ノ カルボニル,プロピ ルァミ ノ力ルポニル,ジプロピルァミ ノ力ルボニル,ブチルァミ ノ 力ルボ ニル,ジブチルァミ ノ カルボニル,へキシルァミ ノカルボニル,ジへキシ ルアミ ノ カルボニル,シクロプロピルアミ ノ カルボニル,ジシクロプロピ ルァミ ノ カルボニル,シクロブチルァミ ノカルボニル,ジシクロブチルァ ミ ノカルボニル,シクロペンチルアミ ノカルボニル,ジシクロペンチルァ ミ ノカルボニル,シク口へキシルァミ ノカルボニル,ジシク口へキシルァ ミ ノカルボニル,フヱニルァミ ノ カルボニル,ジフヱニルァミ ノカルボ二 ル,ベンジルァミ ノカルボニル,ジベンジルァミ ノ力ルボニル, N—メチ I ル X—フヱニルァ ミ ノ カルボニル, X—ェチルー X—フエニルアミ ノ 力ルボニル,モルホリノ — X—力ルボニル,ピロ リ ジンー N—力ルボニル, ピぺリ ジン一 N—力ルポニル,ピペラジン一 N—カルボニル, N'—メチ ルビペラジン一 N—カルボニル,カルボキシメチルァミ ノカルボニル,ェ 5 トキシカルボニルメチルアミ ノカルボニル,力ルボキシェチルァミ ノ 力' ルボニル,ェトキシカルボニルェチルァミ ノ カルボニル ·, 2—ヒ ドロキン ェチルァ ミ ノカルボニル.ジ一(2—ヒ ドロキシェチル)ァミ ノカルボ二 ル, 2—ァ ミ ノェチルァミ ノカルボニル,ジー(2—ァミ ノェチル)ァミ ノ 力ルボニル, 3—アミ ノ プロピルアミ ノカルボニル, 2—メ トキシェチル0 ァ ミ ノ カルボニル, 2 —ェトキシェチルァミ ノカルボニルなどが挙げら れる。 25 The R 8, specifically, for example carboxy, main butoxycarbonyl, ethoxycarbonyl, propyl O alkoxycarbonyl, butyl O propoxycarbonyl two , Methoxymethoxycarbonyl, 2-methoxyethoxycarbonyl, 1-methoxyethoxycarbonyl, methylthiomethoxycarbonyl, 2-methylthioethoxycarbonyl, acedoxymethoxycarbonyl, 1-acetomethoxycarbonyl, 1-ethoxy Quincarbonyloxyethoxycarbonyl, ethoxycarbonyloxymethoxycarbonyl, bivaloyloxymethoxycarbonyl, 1-pivaloyloxyethoxycarbonyl, aryloxycarbonyl, 2,2,2—tricycloethylethylo Xycarbonyl, phenoxycarbonyl, 4-methoxyphenyloxycarbonyl, 2,4-dimethoxyphenyloxycarbonyl, 412-nitrophenyloxycarbonyl, 2,4-dinitrophenyl Niloxycarbonyl, benzyloxy Carbonyl, 2,2-dinitrobenzyloxycarbonyl, 4-methoxybenzyloxycarbonyl, 2,4-dimethoxybenzyloxycarbonyl, 2-aminoaminocarbonyl, 2- Dimethylaminoethyloxycarbonyl, 2-methylsulfonylethyloxycarbonyl, 2-trimethylsilylethyloxycarbonyl, 2-di-cyanoethyloxycarbonyl, 2-diethyloxycarbonyl, L-vinyl, methylamino carbonyl, dimethylamino carbonyl; les, ethylamino carbonyl, getylamino carbonyl, propylamino carbonyl, dipropylamino carbonyl, butylamino carbonyl, dibutylamino carbonyl, Kisilaminocarbonyl Dihexylaminocarbonyl, cyclopropylaminocarbonyl, dicyclopropylaminocarbonyl, cyclobutylaminocarbonyl, dicyclobutylaminocarbonyl, cyclopentylaminocarbonyl, dicyclopentylaminocarbonyl, hexahexylaminocarbonyl, dihexylaminocarbonyl, dicyclohexylaminocarbonyl Minocarbonyl, phenylaminocarbonyl, diphenylaminocarbonyl, benzylaminocarbonyl, dibenzylaminocarbonyl, N-methyl X-phenylamino carbonyl, X-ethyl-X-phenylamino carbonyl, morpholino-X-carbonyl, pyrrolidine-N-carbonyl, piperidine-N-carbonyl, piperazine-N-carbonyl, N'-Methylbiperazine N-carbonyl, carboxymethylaminocarbonyl, ethoxycarbonylmethylaminocarbonyl, ruboxshetylamino carbonyl, carbonyl, ethoxycarbonylethylaminocarbonyl, 2 —Hydroxyquinethylaminocarbonyl dicarbonyl (2-hydroxyhexyl) aminocarbonyl, 2-aminoethylaminocarbonyl, G- (2-aminoethyl) aminocarbonyl, 3-aminopropylamino Carbonyl, 2-methoxyhexyl 0-aminocarbonyl, 2-methoxyhexylaminocarbonyl It is like we are.
本発明の化合物 [〖 ]の好ましい具体例を以下に示す。  Preferred specific examples of the compound [〖] of the present invention are shown below.
2 5 -デメチルチオ一 2 5—メチルスルホニル一 T AN- 528 A(T A ― 528 Aスルホン), 25-demethylthio-1 25-methylsulfonyl-1 TAN-528A (TA-528A sulfone),
δ 2 5—デメチルチオ一 2 5—メチルスルフィニル— T AN— 528 A (T δ 25—demethylthio-25-methylsulfinyl—T AN— 528 A (T
Λ X 528 Αスルホキン ド) (異性 a ) ,  Λ X 528 Α sulfokind) (isomer a),
2 5 —デメチルチオ一 2 5—メチルスルフィ 二ルー T A X— 528 A (T A N --- 528 Aスルホキシ ド)(異性体 b),  25-demethylthio-l25-methylsulfuric acid TAX-528A (TAN --- 528A sulfoxide) (isomer b),
2 5—デメチルチオ一 2 5 —フエ二ルチオ一 T AN— 528 A,0 2 δ -デメチルチオ一 2 5—プロピルチオ一 T A 一 528 A ,  25-Demethylthio-1 25-phenylthio-1 TAN- 528 A, 0 2 δ-Demethylthio-1 25-propylthio-1 TA-1 528 A,
TAX— 528 Aラク ト ン(RGはラク ト ン環を形成), TAX- 528 A easier tons (R G forming a easy tons ring),
T A :— 528 Aカルボン酸,  T A: — 528 A carboxylic acid,
1 9 —デメ トキシ一 1 9ーヒ ドロキシ一 TAN— 528 A ,  1 9 — Demethoxy 1 9 Hydroxy TAN — 528 A,
1 9—デメ トキシ一 1 9一エトキシ一 T A Ν— 528 A , 1 9—Demethoxy 1 9 1 Ethoxy T A Ν— 528 A,
5 1 9—デメ トキシー 1 9—へキシルォキシ— T AN— 528 A , 5 1 9—Demethoxy 1 9—Hexyloxy—T AN— 528 A,
1 9ーデメ トキシ— 1 9—ヘプチルォキシー TAN— 528 A, 1 I 9ーデメ トキシー 1 9—ヘプチルォキシ一 T AN- 528Aラク トン,1 9-demethoxy- 19-heptyloxy TAN- 528 A, 1 I 9-demethoxy 19-heptyloxy TAN-528A lactone,
1 9ーデメ トキシー 1 9一(2—クロロェトキシ)一 T AN— 528 A , 1 9ーデメ トキシ— 1 9—(2 , 3—エポキシプロピルォキシ)一 T A N- 528 A, 1 9-demethoxy 19- (2-chloroethoxy) -TAN-528A, 19-demethoxy- 19- (2,3-epoxypropyloxy) -TAN-528A,
5 1 9ーデメ トキシ一 1 9—ァリルォキシ一TAN— 528 A ,  5 1 9-demethoxy-1 9-aryloxy TAN— 528 A,
1 9—デメ トキシ一 1 9— ρ—キシリルォキシ一 T AN— 528Α , 1 9ーデメ トキシー 1 9— (2—フヱニルェトキシ)一 T AN- 528 A , 1 9ーデメ トキシ一 1 9ーフヱナシルォキシ一 T AN— 528 A , 1 9ーデメ トキシ一 1 9—フエナシルォキシ一 T A N— 528 Aアルド 丄 0 —ル,  1 9—Demethoxy-1 9— ρ—Xyloxy 1 TAN— 528Α, 19-Demethoxy 1 9— (2-Phenylethoxy) 1 TAN-528 A, 19—Demethoxy 1 19-Panasiloxy 1 TAN— 528 A, 19-demethoxy 1 9—phenacyloxy TAN— 528 A aldo 丄 0 —
1 9ーデメ トキシ一 2 1 —デヒ ドロォキシ一 1 9 , 2 1 —ビス一フエ ナシルォキシ— T A 一 528 A ,  1 9-demethoxy 2 1 1-dehydro-doxy 1 9, 2 1 —bis-fuesyloxy-TA 1 528 A,
1 9—デメ トキシ— 1 9一力ルバモイルォキシ― T AN - 528 A , ' 1 9—デメ トキシ— 1 9ーァセトキシ— TAN— 528 A, · 1 9—Demethoxy— 1 9 Lumbamoyloxy TAN-528 A, '19 —Demethoxy — 19 9-acetoxy — TAN— 528 A, ·
1δ 1 9—デメ トキシ一 1 9—へキサノィルォキシ一 T AN— 528Α, 1δ 1 9—Demethoxy-1 9—Hexanoyloxy T AN— 528Α,
1 9 デメ トキシー 1 9 —ベンゾィルォキシ一 T A N— 528 A , 1 9 —デメ .トキシ— 1 9一 p— トシルォキシ― T A 一 528 A , 1 9 .デメ トキシ一 2 1 —デヒ ドロォキシ一 1 9 , 2 1 —ビス一 p— ト シルォキシ AM— 528 A ,  1 9 Demethoxy 1 9 —Benzoyloxy TAN— 528 A, 19 —Demethoxy. 19 9 p-Tosyloxy TA 1 528 A, 1 9 .Demethoxy 1 2 1 — Dehydroxy 1 19, 2 1 — bis-p — to siloxy AM— 528 A,
20 1 9—デメ トキシー 1 9一 p-トシルォキシ一 T AN- 528Aラク トン 20 1 9—Demethoxy 19 1 p-Tosyloxy T AN-528A lactone
1 9ーデメ トキシー 1 9—フヱノキシカルボニルォキシー T A N— 528A ,  1 9-demethoxy 1 9-phenoxycarbonyloxy T A N— 528A,
1 9—デメ トキシー 2 1 —デヒ ドロォキシ一 1 9 , 2 1 —ビス一フエ ノキシカルボニルォキシ一 T A N— 528 A,  1 9—Demethoxy 2 1 —Dehydroxy 1 9, 2 1 —Bis-phenoxycarbonyloxy T A N— 528 A,
25 1 9—デメ トキシ一 1 9—ヒ ドロキシ一T AN— 528Aラク トン, 25 19—Demethoxy 19—Hydroxy T AN—528A lactone,
1 9—デメ トキシー 1 9ーァセトキシ一 T AN— 528Aラク トン, 丄 2 5 —デメチルチオ一 2 5 , '2 4 —べンゾチアジノ ー T A X— 528 A ,1 9—Demethoxy 19-Acetoxy T AN—528A lactone, 5 2 5 —Demethylthio-1 25, '2 4 —Venzothiazino TAX— 528 A,
2 5 —デメチルチオ一 2 5—ヒ ドロキン一 T A Ν— 528 A, 2 5—デメチルチオ— 2 5—メ トキシ— TAN— 528 A , 25-demethylthio-25-hydroquinone T A Ν-528A, 25-demethylthio-25-methoxy-TAN-528A,
2 5—デメチルチオ一 2 5—ヒ ドロー T A N— 528 A,  25-Demethylthio-1 25-Hydro T AN— 528 A,
δ 2 5—デメチルチオ一 2 5—ジメチルァミ ノ メチル一 T AN- 528Α, δ 25-demethylthio-l 25-dimethylaminomethyl-T AN-528Α,
2 5一デメチルチオ一 2 5—ピロ リ ジノメチルー T AN— 528A, 2 5—デメチルチオ一 2 5—ヒ ドロキシメチルー T AN— 528A, 2 5—デメチルチオ— 2 5—ョ一 ドー T AN— 528 A ,  25-Demethylthio-1-25-pyrrolidinomethyl-TAN-528A, 25-Demethylthio-25-hydroxymethyl-TAN-528A, 25-Demethylthio-25-node TAN-528A,
1 9—デメ トキシー 1 9— (3—ヒ ドロキシプロピルォキン)一 TAN0 - 528A ,  1 9—Demethoxy 1 9— (3-Hydroxypropyl quinone) TAN0-528A,
1 9 —デメ トキシー 1 9— ( 2—フヱノキンエ トキン)一 T A N— 528 1 9 —Demethoxine 1 9— (2-Phenokinetokin) -TAN— 528
A , A,
1 9ーデメ トキシ一 1 9 ーシクロプロピルメ トキシ一 T A Ν— 528 A 本発明の化合物 [ 1 ]は、 たとえば以下に記載する方法で製造すること5 ができる。  19-Demethoxy-1-19-cyclopropylmethoxy-TA A-528A The compound [1] of the present invention can be produced, for example, by the method described below5.
一般式 [1:;において R 1が水素であり、 Yが C O -で る化合物: 2 : は、 一般式: 1 が炭素原子を介する有機残基であり、 Yがー C O -である化合物 [3「を炭素原子を介する有機残基を脱離する反応に付す ことにより製造することができる c In the general formula [1: a compound in which R 1 is hydrogen and Y is CO-: a compound in which the general formula: 1 is an organic residue via a carbon atom and Y is -CO- 3 "a can be prepared by subjecting to elimination reaction of the organic residue through a carbon atom c
0 該反応としては、 列えば、 該炭素原子を介する有機残基が置換基を有し ていて よいアルキル,アルケニル,アルキニルである場合には、 化合物 [3]を自体公知の反応により、 即ち酸性試薬ないし塩基性試薬と反応さ せることにより行なわれる 2 As the reaction, when the organic residue via the carbon atom is an alkyl, alkenyl, or alkynyl which may have a substituent, the compound [3] may be subjected to a reaction known per se, 2 performed by reaction with a reagent or basic reagent
用いられる酸性試薬としてはたとえば沃化水素酸,臭化水素酸などの5 ハロゲン化水素酸,ョ一 ドト リメチルシラン,無水塩化アルミ二ゥム,三 フッ化ホウ素,三臭化ホウ素などのルイス酸が、 また塩基性試薬として はたとえば沃化リチウム,沃化マグネシウムェ—テラ一 ト,ナ ト リ ウムあ るいはリチウム チォラー ト,リチウム チオフエノ ラー トなどのリチ ゥムあるいはマグネシウム塩などがあげられる力^ なかんずくルイス酸, とりわけ無水塩化アルミニゥムが好ましい。 一般に反応は溶媒中で行な うのがよく、 溶媒としてはジクロルメタ ンなどのハロゲン化炭化水素, エーテル,テ トラヒ ドロフランなどのエーテル類,ベンゼン, トルエン,キ シレンなどの芳香族炭化水素類が用いられるが、 無水塩化アルミニゥム を用いるときはベンゼン, トルエン,キシレンなどが好ましい。 反応温度 は約— 7 0 °Cないし 1 5 0 °Cの範囲から適宜選ばれるが、 無水塩化アル ミ二ゥムを用いる場合は約 5 0 °Cないし 1 2 0 °Cの範囲から選ぶのがよ い。 反応時間は約 0 . 1ないし 1 0時間である。 Examples of the acidic reagent used include pentahydrohalic acids such as hydroiodic acid and hydrobromic acid, Lewis acids such as anhydrous trimethylsilane, anhydrous aluminum chloride, boron trifluoride and boron tribromide. , And as a basic reagent Is a power such as lithium iodide, magnesium iodide, sodium or lithium thiolate, lithium thiophenolate or the like, or a magnesium salt, especially Lewis acid, especially anhydrous Aluminum chloride is preferred. In general, the reaction is preferably carried out in a solvent, and the solvent may be a halogenated hydrocarbon such as dichloromethane, an ether such as ether or tetrahydrofuran, or an aromatic hydrocarbon such as benzene, toluene, or xylene. However, when anhydrous aluminum chloride is used, benzene, toluene, xylene and the like are preferable. The reaction temperature is appropriately selected from the range of about −70 ° C. to 150 ° C. When using anhydrous aluminum chloride, the reaction temperature is selected from the range of about 50 ° C. to 120 ° C. Is good. The reaction time is about 0.1 to 10 hours.
また、 該炭素原子を介する有機残基が置換基を有していてもよぃァシ ル基ないしァシルォキシ力ルボニルである場合には、 自体公知の方法に より化合物 [ 3 ]を酸 [例、 塩酸,臭化水素酸,硫酸,リ ン酸などの鉱酸, ト リ フルォ σ酢酸, トルエンスルホン酸,メタ ンスルホン酸などの有機強酸 など あるいは塩基 [(列、 炭酸ナ ト リ ウム,炭酸カ リ ウム,水酸化ナトリ ゥム,水酸化カ リ ウム,水酸化リ チウム,ァンモニァなど]による加水分解 反^に付すか、 あるいは、 t er t—ブトキシカ リ ウム,沃化リチウム,リチ ゥム . プロピルスルフィ ドと溶媒中で反応させる。 反応試薬として塩基 を用いた場合には、 反応を無水溶媒中で行なった場合には要すれば、 反 応液に水を加えるかあるいは反応液を水にあけたのち、 酸(例、 塩酸,胙 酸など)で中和あるいは酸性としたのち生成物を採取する。  When the organic residue via the carbon atom is a substituted or unsubstituted acyl group or an acyloxycarbonyl, the compound [3] is converted to an acid [eg, Mineral acids such as hydrochloric acid, hydrobromic acid, sulfuric acid, phosphoric acid, etc., and strong organic acids such as trifluor σ-acetic acid, toluenesulfonic acid, methanesulfonic acid, etc. or bases [(row, sodium carbonate, calcium carbonate) , Sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide, etc.] or tert-butoxy potassium, lithium iodide, lithium propyl. When the base is used as the reaction reagent, if the reaction is performed in an anhydrous solvent, if necessary, add water to the reaction solution or transfer the reaction solution to water. After opening, acid (eg, Acid, and collecting the product After the neutralized or acidified with, etc. 胙 acid).
溶媒としては、 メ タノ ール,エタノ ールなどの低級アルコ一ル類,ジメ チルホルムァミ ド,ジメチルスルホキシ ド,へキサメチルホスホロ ト リァ ミ ドなどの極性非プロ ト ン性溶媒あるいはこれらと水の混合溶媒などが 繁用される。 反応温度は約— 1 0でないし 1 0 0 °C ,好まししは約一 5 てないし 7 0 'てである。 Examples of the solvent include lower alcohols such as methanol and ethanol, polar nonprotonic solvents such as dimethylformamide, dimethylsulfoxide, and hexamethylphosphorotriamide, or a mixture thereof. A mixed solvent of water is frequently used. The reaction temperature is not about -10 and 100 ° C, preferably about 1-5 It is not 7 0 '.
一般式:: 1 ]において R 1が炭素原子もしく:ま— S 0 2—を介する有機残 基である化合物 [ 4 ]は、 一般式 [ 1 ]の R 1が水素であり、 Yが— C O— である化合物 [ 5 ]に炭素原子もしくは一 S 0 2—を介する有機残基を導 入し、 必要ならば得られる化合物をさらに環化反応に付することにより 製造することができる。 該導入反応としては、 たとえばアルキル化反応. アルケニル化反応,アルキニル化反応,ァシル化反応,スルホニル化反応 などが挙げられる。 R 1 is also a carbon atom in the general formula: 1] properly: or - S 0 2 - compound is an organic residue through a [4], R 1 of the general formula [1] is hydrogen, Y is - The compound can be produced by introducing an organic residue via a carbon atom or 1 S 0 2 — into a compound [5] that is CO— and, if necessary, subjecting the obtained compound to a cyclization reaction. Examples of the introduction reaction include an alkylation reaction, an alkenylation reaction, an alkynylation reaction, an acylation reaction, and a sulfonylation reaction.
該アルキル化,アルケニル化またはアルキニル化反応は自体公知の方 法あるいはそれに準じた方法により行なうことができる。 反応に用いら れろアルキル,アルケニルまたはアルキニル化剤としてはそれぞれ対応 するアルキル,アルケニルまたはアルキニルハライ ド(例、 クロリ ド,ブ ロ ミ ド,ョージ ドなど)が最も好ましいものとして挙げられるが、 そのほ かジアルキル硫酸,アルキル スルフアー トなど 0適宜用いられる。  The alkylation, alkenylation or alkynylation reaction can be carried out by a method known per se or a method analogous thereto. As the alkyl, alkenyl or alkynylating agent to be used in the reaction, the corresponding alkyl, alkenyl or alkynyl halide (eg, chloride, bromide, oxide, etc.) is most preferred, but other than that. Dialkyl sulfate, alkyl sulfate, etc. 0 Used as appropriate.
これらアルキル,アルケニルまたはアルキニル化剤の使用量は、 これ ふ反応性などにもよるが化合物: 5 :に対し通常約 1 ないし 1 0 0 ίきモル の範囲であり、 好ましくは、 例えば反応性の高いハライ ド類(例、 置換 基を存していて 上いベンジルハライ ド,フヱナシルハラ ドノ、 σゲノ ケ トンノ、ロゲノ g乍酸,ァリルハライ ド,プロパルギルハラィ ドゃ一般に アルキ;レ,アルケニルまたはアルキニルョ一ジ ドなど)の場合には 5ない し 1 0倍モル程度,また一般にブロ ミ ドを用いる場合には約 1 0ないし 2 0倍,クロリ ドを用いる場合には約 1 0ないし 5 0倍モル量が用いら れる。 '  The amount of the alkyl, alkenyl or alkynylating agent to be used depends on the reactivity and the like, but is usually in the range of about 1 to 100 moles per mole of the compound: 5; High halides (eg, benzyl halide, phenacylharadono, σ-genoketone, logenog, acid, arylaryl, propargylhalide, which generally has substituents, generally alk; le, alkenyl, or alkynylyo 5 to 10 times mol in the case of amide, etc., about 10 to 20 times when bromide is used, and about 10 to 50 times when chloride is used. Molar amounts are used. '
アルキル,アルケニルまたはアルキニル化反応に用いられる溶媒とし ては、 反応試薬を比皎的よく溶かすものであれば特に限定きれないが、 たとえばメタノ ール,エタノ —ルなどのアルコ—ル類,ジェチルェ一テル, テ トラヒ ドロフラン,ジメ トキシェタ ンなどのエーテル類,アセ ト ン,メ チルェチルケ ト ンなどのケ ト ン類,ジメチルホルムァミ ド,ジメチルァセ トアミ ドなどのアミ ド類,ジメチルスルホキシ ド.スルホランなどのスル ホキシ ドおよびスルホン類,ジクロルメタン,クロ σホルムなどのハロゲ ン化炭化水素類またはベンゼン, トルエン,キシレンなどの芳香族炭化水 素などが挙げられる。 なかでもメタノールが好ましい。 The solvent used in the alkyl, alkenyl or alkynylation reaction is not particularly limited as long as it can dissolve the reaction reagent in a relatively good manner. Examples thereof include alcohols such as methanol and ethanol, and dimethyl ether. Tell, Ethers such as tetrahydrofuran and dimethoxetane; ketones such as acetone and methylethylketone; amides such as dimethylformamide and dimethylacetamide; dimethylsulfoxide and sulfolane; Examples include halogenated hydrocarbons such as sulfoxides and sulfones, dichloromethane, chloroform, and aromatic hydrocarbons such as benzene, toluene, and xylene. Of these, methanol is preferred.
反応温度は約— 1 0 °Cないし 5 0て,反応時間は約 1ないし 2 4時間 でよい。  The reaction temperature may be about −10 ° C. to 50, and the reaction time may be about 1 to 24 hours.
本反応は酸化銀などの銀塩や塩基(例、 炭酸力リゥムなどの無機塩基, ナトリウムメチラ一 ト,リチウムメチラ一 トなどのアルカリ金属アルコ ラ - - ト, ト リェチルァミ ン,ピ ύ ジン,ジメチルァミ ノ ピリ ジンなどのァ ミ ン類)を共存させることにより反応速度の上昇をはかり、 収率を向上 させることができる。 また、 さらに、 クラウンェ一テル(例、 1 8 —ク ラウン— 6 ) ,第 4級アン乇ニゥム塩(例、 テトラェチルアン乇ニゥムク ロ リ ド,ベンジルトリ'メチルアンモニゥムクロリ ド,セチルト リメチルァ ンモニゥムク口リ ドなど)を加えること 合目的的であることが多い c この場合、 反 Κは上記溶媒中のほか、 これら溶媒と水との混合 2相系で ί?なって よい。 また、 さらには、 繁用されるように、 とくに反応試薬 としてクロリ ドを用いる場合、 反応系中に沃化カリゥム,沃化ナトリウ ムなどのョー ドイオン源を加えるのもよい。  In this reaction, silver salts such as silver oxide and bases (eg, inorganic bases such as carbonated lime, alkali metal alcohols such as sodium methylate and lithium methylate, triethylamine, pyridine, dimethylamide) The reaction rate can be increased and the yield can be improved by coexisting an amine such as pyridine. In addition, crown ethers (eg, 18-crown-6), quaternary ammonium salts (eg, tetraethylammonium chloride, benzyltri'methylammonium chloride, cetyltrimethylammonium chloride) C) In this case, the reaction may be carried out not only in the above-mentioned solvents but also in a mixed two-phase system of these solvents and water. Further, as is often used, especially when chloride is used as a reaction reagent, it is preferable to add an iodide ion source such as potassium iodide or sodium iodide to the reaction system.
該アルキル化反応はまた反応試薬として、 ジァゾメタンなどのジァゾ アルカンを用いても行なえる。 反応はアルコ―ル類(例、 メタノ ールな ど),ェ—テル類(例、 ジェチルェ一テル,テ トラヒ ドロフランなど)およ びエステル鎮(例、 昨酸ェチルなど)などの溶媒中行なうのがよく、 反応 促進剤として三フッ化ホウ素,フルォロホウ素などを加えてもよい。 反 応は— 2 0 °Cないし 3 0。Cの温度で行なわれる。 該アルキル化反応はまた 0—アルキル- X , -ジ置換イソ尿素(例、The alkylation reaction can also be performed using a diazoalkane such as diazomethane as a reaction reagent. The reaction is carried out in a solvent such as alcohols (eg, methanol), ethers (eg, getyl ether, tetrahydrofuran, etc.), and ester solvents (eg, ethyl citrate). Preferably, boron trifluoride, fluoroboron or the like may be added as a reaction accelerator. The reaction is—20 ° C to 30 ° C. Performed at a temperature of C. The alkylation reaction can also be carried out with 0-alkyl-X, -disubstituted isourea (eg,
0—メチル, 0—ェチル, 0—ベンジル—: \, τ ' —ジシクロへキシルイソ 尿素など)を反応試薬として行なうこともできる。 溶媒としてはエーテ ル類(例、 テ トラヒ ドロフラン,ジジォキサンなど),ハロゲン化炭化水素 (例、 ジクロルメタ ン,クロ口ホルム,四塩化炭素),エステル類(例、 胙酸 ェチルなど),芳香族炭化水素(例、 ベンゼン, トルエン,キシレンなど)が 用いられる。 反応温度は約 4 0 °Cないし 1 5 0 °Cである。 0- methyl, 0- Echiru, 0- benzyl -: \, τ '- dicyclohexyl Kishiruiso urea, etc.) can also be a carried out as a reaction reagent. Examples of the solvent include ethers (eg, tetrahydrofuran, didioxane, etc.), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), esters (eg, ethyl acetate, etc.), aromatic hydrocarbons Hydrogen (eg, benzene, toluene, xylene, etc.) is used. The reaction temperature is about 40 ° C to 150 ° C.
該アルキルおよびアルケニル化反応はまた、 化合物 [ 5 ]に反応性の不 飽和結合を有する反応試薬 [例、 アルゲン類(例、 イソブチレン,メチル ァク リ レー ト,ェチル ァク リ レー ト,アク リ ロニト リル,メタァク リ ロニ ト リ ルなど),アルキン穎(例、 メチル プロピオレー ト,シァノ アセ チレンなど)]を反応させることによつても行なえる。 反応は溶媒中 [例、 エーテル額(例、 ジェチルェ—テル,ジォキサン,テ トラヒ ドロフランな ど),ハロゲン化炭化水素(例、 ジクロルメタンなど)など] ,酸(例、 硫酸 など),ま卜一は塩基 [例、 アルカリ金属アルコキシ ド(例、 ナトリウムメチ ラー トなど),三級ァミ ン(例、 .\'ーメチルモ ,'レホリ ンなど), 4級アンモ 二ゥム塩(例、 ベンジルト リ メチルアンモニゥム ヒ ドロキシ ドなど)な ど]を共存さ辻て行なうのがよい。 反応温度は約一 2 0 ないし 5 0 =C である。 The alkylation and alkenylation reaction can also be carried out by reacting a compound [5] with a reactive reagent having an unsaturated bond [eg, argens (eg, isobutylene, methyl acrylate, ethyl acrylate, acrylate). The reaction can also be performed by reacting lonitrile, methacrylonitrile, etc.), or alkyne granules (eg, methyl propiolate, cyanoacetylene, etc.). The reaction is carried out in a solvent [eg, ether (eg, diethyl ether, dioxane, tetrahydrofuran, etc.), halogenated hydrocarbon (eg, dichloromethane, etc.)], acid (eg, sulfuric acid, etc.), Bases [eg, alkali metal alkoxides (eg, sodium methylate, etc.), tertiary amines (eg,. \ '-Methylmo,' refolin, etc.), quaternary ammonium salts (eg, benzyltrimethyl) Such as ammonium hydroxide). The reaction temperature is about 120 to 50 = C.
該ァシル化反応に用いられるァシル化剤としては、 ァシルハライ ドが 好ましい。 該ハロゲンとしては臭素,塩素が簡便で好ましい。 ァシル化 剤の使用量は、 当モル量以上,好ましくは i . 0〜2 . 5モル当量用いること が望ましい。 ァシル化反応に用いられる溶媒としては、 化合物 [ 5 ]とァ シル化合物化剤を溶解するものであれば制限をうけ いが好ましくはメ チレン一クロライ ド,クロ口ホルム,テ トラヒ ドロフラン,ジォキサンな どが挙げられる。 反応温度は、 約— 3 0ないし 2 5 °Cであり、 反応時間 は約 0.1ないし 3時間である。 また本反応系中にトリェチルァミ ン.ピリ ジン,ジメチルァミノ ピリ ジン等のアミ ン類を共存させることによって、 副反応を抑制し収率を向上することができる。 As the acylating agent used in the acylation reaction, acyl halide is preferable. As the halogen, bromine and chlorine are preferred because they are simple. The amount of the acylating agent to be used is preferably an equimolar amount or more, and more preferably i. The solvent used for the acylation reaction is not particularly limited as long as it can dissolve the compound [5] and the acylating agent, but is preferably a solvent such as methylene chloride, chloroform, tetrahydrofuran, and dioxane. And so on. The reaction temperature is about --30 to 25 ° C and the reaction time Is about 0.1 to 3 hours. Also, by coexisting amines such as triethylamine. Pyridine and dimethylamino pyridine in the present reaction system, side reactions can be suppressed and the yield can be improved.
0 H  0 H
I  I
一般式 [1 ]において Yが式一 C— (式中、 R7は前記と同意義を有す In the general formula [1], Y is a group represented by the formula C— (where R 7 is as defined above)
R7 R 7
る。 )で表わされる基である化合物 [6]は、 化合物 [4]において Yがー C O—であり、 R1が α—ケト基 —二トリル基,び —アルコキシカル ボニル基, 一二ト口基,び 一スルホニル基あるいは 一カルボキシ基を 有するアルキル基(さらに置換していてもよいが少なく とも一つの - 水素を有する。 )である化合物 [7]を分子内アルドール縮合させること によって製造することができる。 You. The compound [6] which is a group represented by the formula (1) is a compound [4] wherein Y is —CO— and R 1 is an α-keto group—nitrile group, and —alkoxycarbonyl group, , Or an alkyl group having a monosulfonyl group or a carboxy group (which may be further substituted but has at least one hydrogen atom) [7] by intramolecular aldol condensation. it can.
分子内アルドール縮合反応は有機溶媒特にベンゼン,ク口口ホルム,ジ クロルメタンに溶かすだけで進行することもある力^ 触媒.として触媒量 のトリェチルァミ ン',ベンジルァミ ン等の塩基を用いると反応が促進さ れる。 シリカゲル,モレキュラー · シーブを触媒として用いてもよい。 本反 は有利には常温で行われ、 反応時間は出発物質: 7 ]及び塩基の構 造によって異なるが一般に約 Q .5〜 2 4時間を必要とする。  The intramolecular aldol condensation reaction can proceed only by dissolving it in an organic solvent, especially benzene, phenol, and dichloromethane. The catalyst is accelerated by using a catalytic amount of a base such as triethylamine or benzylamine as a catalyst. Is done. Silica gel or molecular sieve may be used as a catalyst. The reaction is advantageously carried out at room temperature, the reaction time depending on the starting material: 7] and the structure of the base, but generally requires about Q.24 to 24 hours.
一般式 [1 ]において R2が炭素原子もしくは— S 02—を介する有機残 基である化合物 [ 8 ]は、 一般式 [ 1 ]において R 2が水素である化合物 [ 9 ] に炭素原子もしくは— S 02—を介する有機残基を導入し得る化合物を 反応させることにより製造することができる。 該導入反応としては、 た とえばアルキル化反応,アルケニル化反応,ァルキニル化反応,ァシル化 反応,スルホニル化反応などが挙げられる。 該導入反応における反応試 薬,反応条件等は、 前記した化合物 [5]から化合物 [4]を製造する際の それらと同様であるがさらに激しい条件が必要な場合が多い。 その場合 は試薬を過剰に用い、 反応温度を高く し、 反応時間を長く行なう。 The compound [8] in which R 2 is a carbon atom or an organic residue via —S 0 2 — in the general formula [1] is different from the compound [9] in which R 2 is hydrogen in the general formula [1] by a carbon atom or — It can be produced by reacting a compound capable of introducing an organic residue via —SO 2 —. Examples of the introduction reaction include an alkylation reaction, an alkenylation reaction, an alkynylation reaction, an acylation reaction, and a sulfonylation reaction. The reaction reagent, reaction conditions, and the like in the introduction reaction are the same as those in the production of compound [4] from compound [5] described above, but more severe conditions are often required. In that case Use excessive amounts of reagents, raise the reaction temperature, and increase the reaction time.
一般式 Ϊ1 ]において R+が硫黄原子を介する有機残基で η= 1 , 2であ る化合物 [1 0]は、 一般式 [1 ]において がー S - R3'である化合物 [1 1 ]を酸化反応に付すことによって製造できる。 酸化剤としてはメタ —クロ α過安息香酸,メタ過ヨウ素ナトリウム等が用いられ、 η= 1であ る化合物を所望のときは約 1 当量かあるいは約 1当量より若干多い量の 酸化剤を用い、 η= 2である化合物を所望のときは、 約 2当量以上の酸 化剤を用いることが好ましい。 反応の溶媒としては、 化合物 [1 0]およ び酸化剤を溶解するものが望ましく、 メタークロロ過安息香酸を酸化剤 として用いる場合は、 通常ジクロルメタン,クロ口ホルム,酢酸ェチル, メタノ ール等が好適に用いられる。 酸化剤としてメタ過ヨウ素酸ナトリ ゥムを用いる場合は水との混合溶媒が望ましい。 反応の温度は η= 1で ある化合物を製造する場合、 低温〜室温,通常約- 3 0° 〜 2 5 °Cで行 なわれ、 反応時間は約 Ο..Γ~ 2 4時間である。 n= 2である化合物を製造 するときは、 上記よりやや高温で、 通常は約 0〜 1 0 0 °Cで行なわれる。 n= 2である化合物を製造する際は、 化合物 [1 1 =の代わりに化合物:: 1 0二において n= 1である化合物を用いてもよい。 この場合酸化剤の量は 約 1 当量以上を ¾いるのがよい。 In the general formula [1], the compound [10] in which R + is an organic residue via a sulfur atom and η = 1, 2 is a compound [11] in which the general formula [1] is -S—R 3 ′ ] To an oxidation reaction. As the oxidizing agent, meta-chloro α-perbenzoic acid, sodium metaperiodide, etc. are used. When the compound where η = 1 is desired, about 1 equivalent or slightly more than about 1 equivalent is used. When a compound where η = 2 is desired, it is preferable to use about 2 equivalents or more of the oxidizing agent. As a solvent for the reaction, a solvent which dissolves the compound [10] and the oxidizing agent is desirable. When using methachloroperbenzoic acid as the oxidizing agent, usually, dichloromethane, chloroform, ethyl acetate, methanol and the like are used. It is preferably used. When sodium metaperiodate is used as the oxidizing agent, a mixed solvent with water is preferable. When a compound having a reaction temperature of η = 1 is produced, the reaction is carried out at a low temperature to room temperature, usually at about −30 ° to 25 ° C., and the reaction time is about Ο..Γ to 24 hours. When the compound where n = 2 is produced, it is carried out at a slightly higher temperature than the above, usually at about 0 to 100 ° C. When producing a compound in which n = 2, a compound in which n = 1 in the compound: 102 may be used instead of the compound [1 1 =]. In this case, the amount of the oxidizing agent should be about 1 equivalent or more.
化合物 =1 1 ]は、 化合物 [1 0]において n= 1である化合物を R3'— S— Hで表わされる化合物あるいはその金属塩,ァミ ン塩等と置換反応 することによって製造することができる。 — S— Hを用いるときは トリェチルァミ ン,ジイソプロピルェチルァミ ン等の三級ァミ ンを共存 させることが望ましい。 S—Hあるいはその塩は約 1当量以上を 用いるのが望ましく、 反応の溶媒としては特に限定されない力^ 通常ジ クロルメタン,酢酸ェチル,テトラヒ ドロフラン,ジォキサン,ジメチルホ ルムアミ ド,ジメチルァセトアミ ド等が好適に用いられる。 反応の温度, 時間は化合物 [1 0]において n= 1である化合物および R3' - S— H あるいはその塩の構造によって変化する力^ 反応温度はおおむ、ね Compound = 1 1], the compound [1 0] R 3 'and n = 1 compound in the - S- compound or a metal salt thereof represented by H, can be produced by substitution reaction with § Mi emissions salt Can be. — When S—H is used, it is desirable to coexist tertiary amines such as triethylamine and diisopropylethylamine. It is preferable to use about 1 equivalent or more of S—H or a salt thereof, and the solvent for the reaction is not particularly limited. Usually, dichloromethane, ethyl acetate, tetrahydrofuran, dioxane, dimethylformamide, dimethylacetamide, and the like are used. It is preferably used. Reaction temperature, The time is a force that changes depending on the structure of compound [10] and n = 1 and the structure of R 3 '-S—H or a salt thereof.
一 2 0° 〜 1 0 0。Cで、 反応時間は 0.1〜2 4時間程度である。 反応の 進行状態は薄層クロマトグラフィ—(T L C)等によって追跡することが できる。 One 20 ° to 100 °. In C, the reaction time is about 0.1 to 24 hours. The progress of the reaction can be monitored by thin layer chromatography (TLC) or the like.
一般式 [1 ]において R+が水素である化合物 [1 2]は、 一般式 [1 ]に おいて R+が - S—である化合物 [1 1 ] (前出)を脱硫化反応に付す ことにより製造することができる。 脱硫化剤としては、 たとえばラネー ニッゲル, トリプチル鍚ハイ ドラィ ド等の有機鍚化合物, トリフヱニルホ スフイン, トリメチルホスフアイ ト, トリェチルホスファィ ト等の三価の 有機リ ン化合物などが挙げられる。 脱硫化剤の使用量は、 有機錫化合物 や三価の有機リ ン化合物を用いる場合は約 1当量以上である。 ラネ—ニッ ゲルを用いる場合はその活性度 ·によって使用量が異なる。 望ましい方法 は少'量ずっラネーニッケルを反応系内に導入しながら反応状況を T L C で観察し、 原料が残'るようであればラネーニッケルをさらに追加すると いう手法で、 過剰のラネーニッケルを用いないことである。 脱硫化反応 に いられる溶媒としては、 たとえばラネーニッケルを用いる場合はメ タノ - レ,エタノ —ル等が、 有機錫,有機リ ン化合物を用いる場合はァセ ト ン,ベンゼン, トルエン等が好適に使用される。 脱硫化反応における反 応温度は、 約 3 0ないし 1 0 0°Cであり、 反応時間は約 0.5ないし 2 4 時間である。 The compound [1 2] in which R + is hydrogen in the general formula [1] is obtained by subjecting the compound [1 1] (supra) in which R + is -S— in the general formula [1] to a desulfurization reaction. It can be manufactured by the following. Examples of the desulfurizing agent include organic compounds such as Raney Nigel and triptyl hydride and trivalent organic phosphorus compounds such as triphenylphosphine, trimethylphosphite and triethylphosphite. The amount of desulfurizing agent used is about 1 equivalent or more when using an organic tin compound or a trivalent organic phosphorus compound. When Raney-Nigel is used, the amount used depends on its activity. A desirable method is to observe the reaction status by TLC while introducing a small amount of Raney nickel into the reaction system, and if the raw material remains, add Raney nickel further, and do not use excess Raney nickel. is there. As a solvent used in the desulfurization reaction, for example, when Raney nickel is used, methanol, ethanol and the like are used, and when an organic tin and an organic phosphorus compound are used, acetone, benzene, toluene and the like are preferably used. used. The reaction temperature in the desulfurization reaction is about 30 to 100 ° C, and the reaction time is about 0.5 to 24 hours.
一般式 [1 ]において、 R+がヒ ドロキシである化合物 [1 3]は、 例え ば脱水反応と 2 5位の置換反応が同一の系内で進行する場合の副生成物 として、 あるいは化合物 [1 1 ]に水素化ホウ素ナトリウムを作用させる ことによって製造することができる。 水素化ホウ素ナト リ ウムの量は約 1 ~ δ倍モル量を用い、 溶媒としてはテトラヒ ドロフラン,ジォキサン 等が好適に用いられる。 反応の温度は一般に約 2 5° 〜 1 0 0 °Cで、 反 応時間は約 0.1〜 3時間であることが多い。 In the general formula [1], the compound [13] in which R + is hydroxy is, for example, a by-product when the dehydration reaction and the substitution reaction at the 25-position proceed in the same system, or as a compound [ 11] with sodium borohydride. The amount of sodium borohydride is about 1 to δ-fold molar amount, and tetrahydrofuran and dioxane are used as solvents. Etc. are preferably used. The reaction temperature is generally about 25 ° to 100 ° C., and the reaction time is often about 0.1 to 3 hours.
一般式 [1 ]において R+がハロゲンである化合物 [1 4]は、 一般式 [1 ] において R 4が Hである化合物 [1 2 ]をハロゲン化反応に付すことによ り製造することができる。ハロゲン化反応に用いられるハロゲン化剤と しては、 たとえば式 C H2=Nく S"8 X 式中、 R8は C t+の低級アル キル基または Nく 8 で環を形成していてもよいことを、 Xは塩素,臭 素,ヨウ素等のハロゲンを表わす)で表わされるメチレンイン乇ニゥム塩 を反応させ、 つづいて二酸化マンガンを反応させることにより製造する ことができる。 該0 !-4の低級アルキルとしては、 たとえばメチル,ェチ ル,η プロピル,ィソプロピル,η—プチル,ィソプチル, t—ブチル等が、 < ^ 8 が形成している環として:ま、たとえばピロリ ジン,ピぺリジン, · へキサメチレンィミ ンなどが挙げ れる。 Compound [14] in which R + is a halogen in general formula [1] can be produced by subjecting compound [12] in which R 4 is H in general formula [1] to a halogenation reaction. it can. As the halogenating agent used in the halogenation reaction, for example, wherein CH 2 = N rather S "8 X type, R 8 is C t - in + the lower alk Kill group or N rather 8 to form a ring X may represent a halogen such as chlorine, bromine or iodine), followed by reaction with manganese dioxide, followed by reaction with manganese dioxide. The lower alkyl of -4 includes, for example, methyl, ethyl, η-propyl, isopropyl, η-butyl, isoptyl, t-butyl, etc., as the ring formed by <^ 8:ぺ Lysine, · Hexamethyleneimine and the like.
該メチレンィン乇ニゥム塩,二酸化マンガンの使用量は、 過剰量であ り通常は約 2〜 1 Ο ίきである。 ハロゲン化に用いられる溶媒としては、 たとえばメチレンィンモニゥム塩との反応ではたとえばァセトニトリル が用いられ、 二酸化マンガンとの反応ではたとえばジクロルメタンか'用 いられる。 反応温度は前者との反応では約 5 0ないし 1 0 0 °Cで、 反応 時間は約 G.5ないし 1 0時間であり、 後者との反応でのそれらは約 — 1 0 ° 〜 3 0 °Cで約 1 ~ 2 4時間である。  The amount of the methylene salt and manganese dioxide used is excessive, usually about 2 to 1 μm. As a solvent used for the halogenation, for example, acetonitrile is used in the reaction with methyleneimmonium salt, and in the reaction with manganese dioxide, for example, dichloromethane or the like is used. The reaction temperature is about 50 to 100 ° C for the reaction with the former, the reaction time is about G.5 to 10 hours, and those for the reaction with the latter are about —10 ° to 30 °. About 1 to 24 hours at C.
一般式 [ 1 ]において R 4が炭素原子を介する有機残基である化合物 . A compound in which R 4 is an organic residue via a carbon atom in the general formula [1].
[1 5]は、 一般式 [1 ]において R+が水素である化合物 [1 2]を炭素原 子を介する有機残基導入反応に付すことにより製造することができる。 該炭素原子を介する有機残基導入反応としては例えば式 C H 2 = N < 8 X (式中、 R 8および Xは前記と同意義を表わす。 )で で表わされるメチレンィンモニゥム塩を反応させ、 要すれば加水分解す ること、 あるいはマンニッヒ反応が挙げられる。 メチレンイン乇ニゥム 塩を使用する場合は過剰量、 通常約 2〜 1 0倍を用い、 溶媒としてァセ トニトリルを用いる場合が多い。 反応温度は約 5 0〜 1 0 0°Cで反応時 間は約 0.5〜 1 0時間である場合が多い。 かく して得られるなーァミノ 置換メチル体は所望によりひーヒ ドロキシ置換メチル体へ容易に導く こ とができる。 マンニッヒ反応を利用する場合はリファマイシンの分野で 公知になっている技術と同様に行なうことができる。 か、る技術として は N. Maggi , V. Arioli and P . S ensi, Journal of Medicinal Chemistry, 8_ 7 9 0 (1965)等に記載された技術が挙 げられる。 . [15] can be produced by subjecting a compound [12] in which R + is hydrogen in the general formula [1] to an organic residue introduction reaction via a carbon atom. The reaction for introducing an organic residue through the carbon atom includes, for example, CH 2 = N <8 X (wherein, R 8 and X have the same meanings as described above), and react with a methyleneimmonium salt represented by Reaction. When using a methylene indium salt, an excess amount, usually about 2 to 10 times, is used, and acetonitrile is often used as a solvent. The reaction temperature is about 50 to 100 ° C, and the reaction time is often about 0.5 to 10 hours. The thus obtained amino-substituted methyl derivative can be easily converted to a hydroxy-substituted methyl derivative if desired. When the Mannich reaction is used, it can be carried out in the same manner as a technique known in the field of rifamycin. Such techniques include those described in N. Maggi, V. Arioli and P. Sensi, Journal of Medicinal Chemistry, 8_790 (1965). .
一般式 [ 1 ]において R が窒素原子を介する有機残'基で &る化合物 [ I 6]は、 一般式 [1 ]において R 4が水素である化合物 [1 2]を窒素原 子を介する有機残基導入反応に付すことにより製造することができる。 該窒素原子も介する有機残基導入反応はリ フ ァマイ シン及ぴその類似化 合物トリボマイシンの分野で既知である技術と同様にして行なうことカ できる。 該技術としては、 たとえば次の文献に記載された技術が挙げら れる。 In the general formula [1], the compound [I 6] in which R is an organic residue group via a nitrogen atom is a compound [12] in which R 4 is hydrogen in the general formula [1]. It can be produced by subjecting to a residue introduction reaction. The reaction for introducing an organic residue also via the nitrogen atom can be carried out in the same manner as in the art known in the field of rifamycin and its analogous compound tribomycin. Examples of the technology include the technology described in the following document.
W. Kump and H . B ickel, Helv. Chim. Acta., 5 6 ,2348 (1973), H . B ickel, F . n'usel, W. ump and L . Neipp, Antimicrobial Agents and Chemotherapy, 3 5 2 (1967) , P . B ellomo, M. B rufani, E . Marchi, G . Mascellani, W.  W. Kump and H. Bickel, Helv. Chim. Acta., 56, 2348 (1973), H. Bickel, F. n'usel, W. ump and L. Neipp, Antimicrobial Agents and Chemotherapy, 3 5 2 (1967), P. Bellomo, M. B rufani, E. Marchi, G. Mascellani, W.
Melloni , L . Montecchi and L . S tanzani , Journal of Melloni, L. Montecchi and L. Stanzani, Journal of
Medicinal Chemistry, 2 0 , 1287(1977)。 一般式 [ 1:において R +が酸素原子を介する有機残基である化合物 [ 1 7 ]は、 一般式 [1 ]において R+が水酸基である化合物 [1 3]を酸素 原子を介する有機残基導入反応に付すことにより製造することができる 該酸素原子を介する有機残基導入反応としては、 アルキル化反応,ァシ ル化反応,スルホニル化反応,アルキルォキシ力ルボ二ル化反応が挙げら れる。 アルキル化反応,ァシル化反応,スルホニル化反応は既に述べた化 合物 [ 5 ]から化合物 [4 ]への変換反応と同様の条件下で実施することが できる。 アルキル化反応ではアルキル化剤としてジァゾ化合物も用いる ことができる。 アルキルォキシカルボニル化反応はァシル化反応で用い るアンルハライ ドに代えてハロゲン化アルキルォキシ力ルボニルを用い ることによって同様の条件下に行なうことができる。 Medicinal Chemistry, 20, 1287 (1977). The compound [17] in which R + is an organic residue through an oxygen atom in the general formula [1:] is a compound [13] in which R + is a hydroxyl group in the general formula [1] is an organic residue through an oxygen atom. The reaction for introducing an organic residue via an oxygen atom, which can be produced by subjecting to an introduction reaction, includes an alkylation reaction, an acylation reaction, a sulfonylation reaction, and an alkyloxycarbonylation reaction. The alkylation reaction, acylation reaction and sulfonylation reaction can be carried out under the same conditions as those for the conversion reaction from compound [5] to compound [4]. In the alkylation reaction, a diazo compound can also be used as an alkylating agent. The alkyloxycarbonylation reaction can be carried out under the same conditions by using an alkyloxycarbonyl compound instead of the aryl halide used in the acylation reaction.
-般式こ 1:において Xが式 でめ
Figure imgf000039_0001
-X is the formula in General Formula 1:
Figure imgf000039_0001
0  0
化合物 [ 1 8]は、 一般式 [ において Xが式 0 該 R 踵 Compound [18] is a compound represented by the general formula [
0 0
が R3 '— S一 [式中、 Π3Ίま前記と同意義を有する。]である化合物 0] に一般式 Is R 3 ′ —S—wherein { 3 } has the same meaning as described above. Is a compound of the general formula
SH SH
Η2Ν. [1 9] Η 2 Ν. [1 9]
[式中、 R5は前記と同意義を有する。 ]で表わされる化合物 [1 9]を反 応させ、 必要により、 得られた化合物を還元反応に付すことにより製造 できる。 [Wherein, R 5 has the same meaning as described above. To the compound [1 9] The compound can be produced by subjecting the obtained compound to a reduction reaction, if necessary.
該化合物 [1 0]に化合物[1 9]を作用させる反応は、 2 4位における 脱水縮合反応と 2 5位における置換反応が同時におこる環化反応である。 該反応に用いられる反応試薬は分子内の隣接する二つの炭素にそれぞれ ァミ ノ基,チオ-ル基を有する化合物である。 反応試薬の量は一般に過 剰量用いられ、 化合物 [1 0]に対して約 1〜 1 0倍モル量用いられるこ とが多い。 該反応に用いられる溶媒としては、 たとえばジクロルメタン, クロ口ホルムなどが挙げられる。 反応温度は約一 3 0° ないし 5 0°Cで あり、 反応時間は約 0.5ないし 1 0時間である。  The reaction of the compound [10] with the compound [19] is a cyclization reaction in which a dehydration condensation reaction at the 24 position and a substitution reaction at the 25 position occur simultaneously. The reaction reagent used in the reaction is a compound having an amino group and a thiol group at two adjacent carbon atoms in the molecule. The amount of the reaction reagent is generally used in excess, and is often used in an amount of about 1 to 10 moles per mole of the compound [10]. Examples of the solvent used in the reaction include dichloromethane, chloroform and the like. The reaction temperature is about 130 ° to 50 ° C, and the reaction time is about 0.5 to 10 hours.
該還元反応は、 化合物 [1 8]を還元剤と接触させることにより行なわ れる。 該還元剤としては、 たとえばハイ ドロサルフアイ トナトリウム (Na2 S 204) ,ァスコルビン酸などが挙げられ、 これらは通常過剰量が 用いられる。 該還元反応に用いられる溶媒としては、 たとえば酢酸ェチ ル,エタノ ール,メタ'ノール,テトラヒ ドロフラン,ジォキサンなどが挙げ られ、 一般に還元剂を水に溶かして用いることが多い。 反応温度は約 0 ないし 5 0°Cであり、 反応時間は約 0.1ないし 1時間である。 The reduction reaction is performed by bringing compound [18] into contact with a reducing agent. As the reducing agent, for example, high Dorosarufuai preparative sodium (Na 2 S 2 0 4) , such as Asukorubin acid and the like, which normally excess is used. As the solvent used for the reduction reaction, for example, ethyl acetate, ethanol, methanol, tetrahydrofuran, dioxane and the like can be mentioned. The reaction temperature is about 0 to 50 ° C, and the reaction time is about 0.1 to 1 hour.
一般式 [ 1 ]において R 6が 7位もしくは 1 3位の 0と環を形成してい る一 C 0—である化合物 [2 0 ]は、 一般式 [ 1 ]において R eがカルボン 酸エステルである化合物 [2 1 ]あるいは RBがカルボン酸である化合物 [2 2]をラク トン環形成反応に付すことにより製造できる。 該ラク トン 環形成反応としては、 化合物 [2 1 ]を用いた場合、 分子内脱アルコール 反応であり、 化合物 [2 2]を用いた場合分子内脱水反応である。 該反応 に用いられるラク トン化剤としては、 たとえば塩酸,硫酸などの鉱酸,メ タンスルホン酸,ρ— トルエンスルホン酸等の有機酸,水酸化ナトリウム, 水酸化力リゥム等の無機塩基,トリエチルアミ ン,ベンジルアミ ン,ピリ ジン,ピペリ ジン等の有機塩基などが挙げられるが、 単に加熟により進 行する場合もある。 該ラク ト ン化剤の使用量としては、 触媒量ないし溶 媒量で、 該反応に用いられる溶媒としては、 たとえば有機酸,有機塩基 を用いる場合はジクロルメタ ン,クロ口ホルム,エタノ ール,メタノ 一ル 等が、 鉱酸ゃ無機塩基を用いる場合は水と混合するエタノール,メタノGeneral formula [1] in R 6 are the 7-position or one 3-position of 0 and rings that are formed one C 0-, Compound [2 0], in the general formula [1] R e is a carboxylic acid ester can be prepared by subjecting a compound [2 1] or the compound R B is a carboxylic acid [2 2] lactone ring formation reaction. The lactone ring formation reaction is an intramolecular dealcoholation reaction when the compound [21] is used, and an intramolecular dehydration reaction when the compound [22] is used. The lactonizing agent used in the reaction includes, for example, mineral acids such as hydrochloric acid and sulfuric acid, organic acids such as methanesulfonic acid and ρ-toluenesulfonic acid, inorganic bases such as sodium hydroxide and hydroxide rim, and triethyl acetate. Amin, benzylamine, pyri Examples include organic bases such as gin and piperidine, but in some cases the process proceeds simply by ripening. The amount of the lactonizing agent used may be a catalytic amount or a solvent amount, and the solvent used in the reaction may be, for example, dichloromethane, chloroform, ethanol when using an organic acid or an organic base. When methanol or the like uses a mineral acid or inorganic base, ethanol or methanol
—ルを用いることが望ましい。 反応温度は約 0 ° ないし 1 0 0。( であり、 反応時間は約 0 . 1ないし 1 0時間である。 It is desirable to use The reaction temperature is about 0 ° to 100 °. (The reaction time is about 0.1 to 10 hours.
一般式 [ 1 ]において R 6がカルボキシである化合物 [ 2 2 ]は、 一般式 [ 1 ]において R Bがカルボン酸エステルである化合物 [。2 1 ]を加水分解 反応に付すことにより製造できる。該加水分解反応は、当該業者なら自明 の通常のエステル加水分解反応と同様条件下で行なうことができる。 即ち、一般に水,アルコール類(例、メタノ —ル,ェ夕ノ ール,プロパノ 一 ル,ブタノ ール,ジエチレングリ コール, 2 —メ トキシエタノ ールなど), ケ ト ン類(例、ァセ'ト ンなど),ェ一テル類(例、テ トラヒ ドロフラ ン,ジォ キサン,ジメ トキシェタ ンなど),アミ ド類(例、ジメチルホルムアミ ド,ジ メチルァセ トア ミ ド,へキサメチルホスホロ ト リア ミ ドなど),スルホキ シ ド類(例、 ジメチルスルホキシ ドなど),スルホン類(例、 スルホラン), 力ルボン酸頹(例、 ギ酸,詐酸など)などの溶媒(単独あるいは混合溶媒) 中、 酸(例、 塩酸,臭化水素酸,硫酸などの鉱酸,パラ トルエンスルホン酸 などの有機酸,強酸性イオン交換樹脂など)あるいは塩基(例、 水酸化ナ ト リ ゥム,水酸化力リ ゥム,炭酸力 リ ゥム,炭酸水素ナト リ ゥム,水酸化バ リ ウム,水酸化力ルシゥム,ナ トリ ウムメ トキシ ド,アンモニアなど)試薬 を用いて行なうことができるが塩基試薬による加水分解が好ましい。 塩 基の量は約 1〜 1 0倍モル、 好ましくは約 1 . 2— 4倍モル程度を用いる のがよい。 反応温度および時間はエステル基中のアルコール成分の種類 に大きく依存するがそれぞれ約一 2 0でないし 7 0 °C、 好ましくは約 - 5 °C , - 3 0 および約 0.1ないし 2 4時間好ましくは約 0.1— 3時間 である。 The compound [22] in which R 6 is carboxy in the general formula [1] is a compound [22] in which R B is a carboxylic acid ester in the general formula [1]. 21] to a hydrolysis reaction. The hydrolysis reaction can be carried out under the same conditions as ordinary ester hydrolysis reactions obvious to those skilled in the art. That is, generally, water, alcohols (eg, methanol, ethanol, propanol, butanol, diethylene glycol, 2-methoxyethanol, etc.), ketones (eg, acetone) ), Ethers (eg, tetrahydrofuran, dioxane, dimethoxetane, etc.), amides (eg, dimethylformamide, dimethylacetamide, hexamethylphosphoro Solvents (eg, triamide), sulfoxides (eg, dimethyl sulfoxide), sulfones (eg, sulfolane), and sulfonic acids (eg, formic acid, folic acid, etc.) (single or mixed solvents) ) Medium acid (eg, mineral acid such as hydrochloric acid, hydrobromic acid, sulfuric acid, organic acid such as paratoluenesulfonic acid, strong acid ion exchange resin, etc.) or base (eg, sodium hydroxide, water Oxidizing power ゥWater, carbonated sodium, sodium hydrogencarbonate, barium hydroxide, sodium hydroxide, sodium methoxide, ammonia, etc.). preferable. The amount of the base is about 1 to 10 moles, preferably about 1.2 to 4 moles. The reaction temperature and time largely depend on the type of alcohol component in the ester group, but are not about 120 to 70 ° C, respectively, preferably about -5 ° C, -30 and about 0.1 to 24 hours, preferably about 0.1 to 3 hours.
一般式 [1 ]において R 8がカルボキシから誘導され得る基たとえば力 ルボン酸エステルである化合物 [2 1 ],アミ ドである化合物 [2 3]は、 化合物 [2 2]もエステル化反応,化合物 [2 1 ]におけるエステル交換反 応またはアミ ド化反応に付すことにより製造できる。 また化合物 [2 0] であるラク トン体をアルコール,アミ ンで開環し各々化合物 [2 1 ],化合 物 [2 3]を製造することもできる。 In the general formula [1], R 8 is a group that can be derived from carboxy, for example, a compound [21] which is a carboxylic acid ester, and a compound [23] which is an amide. It can be produced by subjecting it to a transesterification reaction or an amidation reaction in [21]. Alternatively, the lactone compound of compound [20] can be opened with an alcohol and an amine to produce compound [21] and compound [23], respectively.
即ち、 化合物 [2 2]の化合物 [。2 1 ]への変換は、 (ィ)化合物 [2 2]を 対応するアルコ―ル成分と、 酸触媒もしくは縮合剤の作用により縮合さ せるか、 (口)化合物 [2 2]あるいはそのカルボキシル基における塩をァ ルキル化剤と反応させることにより行なうことができる。 (ィ)において、 反応は通常溶媒中で行なわれ、 用いられる溶媒としては、 エーテル類 (例、 ジェチルエーテル,テトラヒ ドロフラン,ジメ トキシェタンなど), 芳香族炭化水素(例、'ベンゼン, トルエンなど),ハロゲン化炭化水素(例、 四塩化炭素などがあげられる。 また(低級)アルコ —ル成分自体を溶媒と して用いてもよい。 用いうる酸触媒ないし縮合剤としては、 塩酸,硫酸, リン酸などの鉱酸,ベンゼンスルホン酸, トルエンスルホン酸などの有機 酸,三フッ化ホウ素,硫酸第 1鉄,無水塩化アルミニゥムなどのルイス酸, 塩化チォニル,塩化ァセチル,ク口ロギ酸エステル,クロロスルホン酸, ト ルエンスルホン酸クロリ ドなどの酸クロリ ド, トリフルォロ酢酸無水物 などの酸無水物, 2 , 2—ジメ トキシプロパン,ジメチルホルムァミ ド,ジ ェチルァセタ一ルなどのァセタール鎮などがあげられる。 これらの酸触 媒ないし縮合剤は多くの場合触媒量(化合物 [ 2 2 ]に対し 0.01ないし 0.1 当量)でよいが場合によっては約 1 一 1 0倍モル加えてもよい。 反応温 度は約一 2 0°Cないし約 1 4 0° (:、 好ましくは約一 1 0 °Cないし 5 0 °C である。 That is, the compound [22] of the compound [22]. The conversion to [21] can be achieved by (a) condensing compound [22] with the corresponding alcohol component by the action of an acid catalyst or a condensing agent, or (mouth) compound [22] or its carboxyl group. By reacting the salt in the above with an alkylating agent. In (ii), the reaction is usually carried out in a solvent. Examples of the solvent used include ethers (eg, dimethyl ether, tetrahydrofuran, dimethoxetane), aromatic hydrocarbons (eg, 'benzene, toluene, etc.). , Halogenated hydrocarbons (eg, carbon tetrachloride, etc.) The (lower) alcohol component itself may be used as a solvent. Acid catalysts or condensing agents that can be used include hydrochloric acid, sulfuric acid, phosphorus Mineral acids such as acids, organic acids such as benzenesulfonic acid, toluenesulfonic acid, etc., boron trifluoride, ferrous sulfate, Lewis acids such as anhydrous aluminum chloride, thionyl chloride, acetyl chloride, cuprate formate, chlorosulfone Acid, acid chlorides such as toluenesulfonic acid chloride, acid anhydrides such as trifluoroacetic anhydride, 2,2-dimethoxypro And acetal solvents such as dimethylformamide, dimethylacetate, etc. These acid catalysts or condensing agents can be used in most cases in catalytic amounts (0.01 to 0.1 equivalents relative to compound [22]). The reaction temperature may be about 110-fold to about 110-fold, and the reaction temperature may be about 120-140 ° C (: preferably about 110-500 ° C). It is.
(口)において、 カルボン酸(化合物 [ 2 2 ])の塩が用いられる場合、 当 該塩は、 ナトリウム塩,カリゥム塩,カルシウム塩,銅塩,銀塩などの金属 塩,あるいはトリェチルアンモニゥム塩.ピリジニゥム塩,テトラェチル アンモニゥム塩などの トリアルキルァミ ンもしくは第 4級アンモニゥム の塩が好ましく、 これらは、 エステル化反応前に調整してもよく、 また、 化合物 [ 2 2 ]の溶液に対応する塩基(要すれば脱水剤としてイソニトリ ル類 [例、 シク口へキシルイソ二トリルなど]などを添加してもよい)を 加えるかあるいは(ィ)における塩基加水分解反応液をそのま 、用いるこ とにより、 反応液中で生成しているものを用いてもよい。 該アルキル化 の反応は、 溶媒中で行なうのがよく、 溶媒としては水,アルコール類(例、 エタノ ールなど),ケ トン類(例、 アセトンなど),エーテル類(例、 ジェチ ルエーテル,テトラヒ ド σフラン,ジォキサンなど),アミ ド類(例、 ジメ チルホルムアミ ド,ジメチルァセトアミ ド,へキサメチルホスホロ トリァ ミ ドなど),スルホキシ ド類(例、 ジメチルスルホキシ ドなど),芳香族炭 化水素(例、 ベンゼン, トルェン,キシレンなど),ハロゲン化炭化水素(冽、 ジクロルメタンなど)などが挙げられ、 これらは単独あるい:ま混合して、 均一反応系または不均一反応系として使用しうる。 用いられるアルキル 化剤としては、 置換基を有していてもよいアルキルハラィ ド(ハロゲン としては塩素,臭素,沃素など:例、 沃化メチル,塩化ベンジル,塩化パラ 二ト口ベンジル,へキシルク口リ ド,臭化トリチル,臭化フヱナシルなど), ジアルキル硫酸(例、 ジメチル硫酸,ジェチル硫酸など), トリアルキルリ ン酸(例、 トリメチルホスフェー ト), トリアルキルォキソ二ゥム塩(例、 トリェチルォキソニゥム テトラフルォロボレ一 トなど)などのほか、 ェノ ールエーテル類(例、 ブチル イソプロぺニルエーテルなど),エノ When a salt of a carboxylic acid (compound [22]) is used in (mouth), the salt may be a metal salt such as a sodium salt, a potassium salt, a calcium salt, a copper salt, a silver salt, or a triethyl ammonium salt. Trialkylamines or quaternary ammonium salts such as pyridinium salts and tetraethylammonium salts are preferred. These salts may be prepared before the esterification reaction, and may be a base corresponding to the solution of compound [22]. (If necessary, isonitriles [eg, hexyl hexyl isonitrile, etc.] may be added as a dehydrating agent) or the base hydrolysis reaction solution in (a) may be used as it is. Alternatively, those produced in the reaction solution may be used. The alkylation reaction is preferably carried out in a solvent such as water, alcohols (eg, ethanol), ketones (eg, acetone), ethers (eg, methyl ether, tetrahydrogen). Sigma furan, dioxane, etc.), amides (eg, dimethylformamide, dimethylacetamide, hexamethyl phosphorotriamide, etc.), sulfoxides (eg, dimethylsulfoxide, etc.), aromatics Examples include hydrocarbons (eg, benzene, toluene, xylene, etc.), halogenated hydrocarbons (clean, dichloromethane, etc.), and these may be used alone or mixed to form a homogeneous or heterogeneous reaction system. Can. Examples of the alkylating agent to be used include alkyl halides which may have a substituent (eg, chlorine, bromine, iodine, etc. as halogens: eg, methyl iodide, benzyl chloride, benzyl chloride, benzyl chloride, hexyl chloride). , Trityl bromide, phenacyl bromide, etc.), dialkyl sulfates (eg, dimethyl sulfate, getyl sulfate, etc.), trialkyl phosphinates (eg, trimethyl phosphate), trialkyl oxodimethyl salts (eg, triethyl) Oxonium tetrafluoroborate, etc.), phenol ethers (eg, butyl isopropenyl ether, etc.)
—ルアセテー ト類(例、 ビニル ァセテ— トなど),イソプチレン(触媒と して硫酸が好ましい),ジァゾアルカン(例、 ジァゾメタン.フエ二ルジァ ゾメタン,ジフヱ二ルジァゾメタンなど)が挙げられる。 -Acetates (eg, vinyl acetate, etc.), isobutylene (with catalyst And sulfuric acid is preferred), and diazoalkanes (eg, diazomethane. Phenyldiazomethane, diphenyldiazomethane, etc.).
原料カルボン酸に対する塩基使用量は、 約 1 ないし 1 0 0モル当量、 好ましくは約 1 ないし 2 5モル当量の範囲であり、 それに対応してアル キル化剤(ここではアルキルハラィ ド.ジアルキル硫酸など)は約 0 . 8ない し 1 2 0モル当量、 好ましくは約 1ないし 3 0モル当量程度用いるのが よい。 また、 該アルキル化反応はいわゆる相関移動触媒としての 4級ァ ン乇ニゥム化合物(例、 前出に同じ)を添加して行なってもよい。  The amount of the base used relative to the starting carboxylic acid is in the range of about 1 to 100 molar equivalents, preferably about 1 to 25 molar equivalents, and the alkylating agent (here, alkyl halide, dialkyl sulfate, etc.) is correspondingly used. Is used in an amount of about 0.8 to 120 molar equivalents, preferably about 1 to 30 molar equivalents. Further, the alkylation reaction may be carried out by adding a quaternary anidium compound as a so-called phase transfer catalyst (for example, the same as described above).
エノ ールエーテル類,エノールァセテ— ト類,イソブチレンをアルキル 化剤として用いる場合には、 出発原料としてはカルボン酸(化合物 [ 2 2 ] が選ばれる。 これらの場合に、 アルキル化剤は化合物 [ 2 2 ]に対し約 1 ないし 5 0 0モル当量、 好ましくは約 1 ないし 1 0 0モル当量用いても ' よい。 反応は室温でも進行するが、 さらに促進のため加熟(約 1 5 0 °C までの温度に)してもよく、 また触媒(例、 硫酸ノ、。ラ トルエンスルホン 酸,酢酸第! [水銀,ト ')ェチルアミ ンなど)を添加してもよい。  When using enol ethers, enol acetates, or isobutylene as the alkylating agent, a carboxylic acid (compound [22] is selected as the starting material. In these cases, the alkylating agent is the compound [22] The reaction may be carried out at room temperature, but the reaction proceeds at room temperature. Temperature, or a catalyst (eg, sulfuric acid, toluenesulfonic acid, acetic acid [mercury, tert-ethylamine], etc.) may be added.
アルキル化剤としてジァゾアル力ンを使用する場合には、 (ジァゾァ ルカン自体が反応溶媒中で不安定な場合もあるので)反応の進行を適当 な方法(例、 薄層クロマトグラフィ -,試薬に特徵的な着色など)で追跡 しつつ、 反応に必要かつ十分な量の試薬を用いるのがよい。 反応は約 0 てないし 3 0 °Cの温度で十分進行するが、 必要によっては、 や、加温す る(約 4 0 - 5 0 °Cまで)かあるいは触媒(例、 メタノ—ル,三フッ化ホウ 素など)を加えて促進を計ってもよい。  When diazoal carboxylic acid is used as an alkylating agent, the progress of the reaction can be controlled by an appropriate method (eg, thin-layer chromatography), since the diazoalkane itself may be unstable in the reaction solvent. It is advisable to use reagents that are necessary and sufficient for the reaction while tracing with various colors. The reaction proceeds well at a temperature of about 0 to 30 ° C, but if necessary, it may be heated or heated (up to about 40-50 ° C) or a catalyst (eg, methanol, triethanol, etc.). (For example, boron fluoride).
さらに、 目的化合物 [ 2 1 ]は、 ある種の化合物 [ 2 1 ]のエステル変換 によっても得ることができる。 該反応は、 化合物 [ 2 1 ] (好ましくは R 6 = C 0 0 C H 3)を所望のエステル体に対応するアルコールあるいは それを含む他のエステル,オルトエステルと酸触媒共存下に反応させる。 酸触媒としては、 臭化水素酸.硫酸,過塩素酸などの無機酸,ベンゼンス ルホン酸, トルエンスルホン酸,メ タ ンスルホン酸などの有機酸が好まし い。 反応は室温、 ないし 2 0 0 ° (:、 好ましくは室温ないし 1 3 0ての温 度で行なわれる。 Further, the target compound [21] can also be obtained by transesterification of a certain compound [21]. In this reaction, the compound [21] (preferably R 6 = C 0 CH 3 ) is reacted with an alcohol corresponding to a desired ester, or another ester or orthoester containing the same in the presence of an acid catalyst. As the acid catalyst, inorganic acids such as hydrobromic acid and sulfuric acid and perchloric acid, and organic acids such as benzenesulfonic acid, toluenesulfonic acid and methanesulfonic acid are preferred. The reaction is carried out at room temperature to 200 ° C. (preferably at room temperature to 130 ° C.).
エステル体(化合物 [2 1 ])もしくはラク トン体(化合物 [2 0])のアミ ド化反応は、 一般のエステルのアミ ド化に準じ、 化合物 [2 1 ]または化 合物 [2 0]と所望のアミノ化合物即ちアンモニア(反応系内へは、 ガス 状ァン乇ニァ,濃アンモニア水,アンモニア溶液,塩化アン乇ニゥムと塩 基などの形で導入され得る)またはアミ ン類とをアルコール類(例、 メタ ノ ール,エタノ ールなど),エーテル類(例、 テ トラヒ ドロフランなど),ス ルホキシ ド額(例、 ジメチルスルホキシ ドなど)の極性溶媒あるいはこれ ら溶媒を含む混合溶媒中反応させることにより行なうのがよい。 要すれ ば、 塩化アン乇ニゥム,もし く はナ ト リ ウムメ トキシ ド,ジメチルァミ ノ ピリ ジン, D B U ( 1 , 8—ジァザビシクロ ·[ 5 , 4 , 0 ]— 7—ゥンデセン) などの塩基触媒などを添加すると反応の進行を促し好ましい場合もある。 反 ©は室温ないし溶媒の沸点までの範囲内の温度で進行ォ .る力 <、 たとえ ば、 アミ ン類自体を反応媒質としても用いて約 1 8 0てまでの温度に加 熟してもよい。 一般.式 [ 1 ]において Xが (式中、 R+は前記と同意義を有
Figure imgf000045_0001
The amidation reaction of an ester form (compound [21]) or a lactone form (compound [20]) is carried out according to the general amidation of an ester, to a compound [21] or a compound [20]. And the desired amino compound, ie, ammonia (which can be introduced into the reaction system in the form of gaseous ammonia, concentrated aqueous ammonia, ammonia solution, ammonium chloride and bases) or amines, (Eg, methanol, ethanol, etc.), ethers (eg, tetrahydrofuran, etc.), sulfoxides (eg, dimethylsulfoxide, etc.) polar solvents or mixed solvents containing these solvents It is preferable to carry out the reaction by medium reaction. If necessary, base catalysts such as aluminum chloride, sodium methoxide, dimethylaminopyridine, and DBU (1,8-diazabicyclo [5,4,0] -7-indene) can be used. The addition promotes the progress of the reaction and is sometimes preferred. The reaction proceeds at a temperature within the range from room temperature to the boiling point of the solvent. <For example, the amines may be ripened to a temperature of about 180 using amines themselves as a reaction medium. . General. In the formula [1], X is represented by the formula (wherein, R + has the same meaning as described above.
Figure imgf000045_0001
0H する。 )である化合物 [2 4]は、 一般式 [1 ]において Xが (式中-  0H. ) Is a compound of the general formula [1] wherein X is (-
0 0
R は前記と同意義を有する。 )である化合物 [2 5]を還元反応に付すこ とにより製造できる。 該還元反応の試薬てしては、 ァスコルビン酸ノヽ ィ ドロサルフアイ トナトリゥムなどが挙げられ、前記した化合物 [ 1 8 ] の還元型を製造する反応と同一条件下で製造することができる。 R has the same meaning as described above. ) Can be produced by subjecting compound [25] to a reduction reaction. As a reagent for the reduction reaction, ascorbic acid The compound can be produced under the same conditions as in the above-mentioned reaction for producing the reduced form of the compound [18].
かく して得られる目的物 [ 1 ]は、 自体公知の手段たとえば濃縮,溶媒 抽出,クロマトグラフィー,桔晶化,再結晶などにより単離,精製すること ができる。  The target compound [1] thus obtained can be isolated and purified by a method known per se, such as concentration, solvent extraction, chromatography, crystallization, recrystallization and the like.
本発明の化合物 [ 1 ]は、 塩基と作用して塩を形成することがあり得る。 該塩基としてはたとえばナトリウム,カリウム,リチウ A ,カルシウム,マ グネシゥム,アンモニアなどの無機塩基,たとえばピリジン,コリジン, ト リェチルァミ ン, トリエタノールアミ ンなどの有機塩基などが挙げられ る。 · .  The compound [1] of the present invention may act with a base to form a salt. Examples of the base include inorganic bases such as sodium, potassium, lithium, calcium, magnesium, and ammonia, and organic bases such as pyridine, collidine, triethylamine, and triethanolamine. ·.
本発明の化合物 [ 1 ]が遊離形で得られた場合にこれを常套手段を用い て塩を形成させてもよく、 また、 塩として得られたものを常套手段を用 いて遊離形としてもよい。  When the compound [1] of the present invention is obtained in a free form, it may be formed into a salt using a conventional means, and the compound obtained as a salt may be converted into a free form using a conventional means. .
また化合物 [ 1 ]ほ分子内塩を形成する場合もあり、 その場合も本発明 に含まれる。 '  The compound [1] may form an inner salt, which is also included in the present invention. '
化合物 [ i ]の立体異性体はそれぞれ単独で、 あるいは混合物のいずれ の状態でも医薬として使用することができる。  Each of the stereoisomers of the compound [i] can be used alone or in a mixture as a medicament.
このようにして得られた化合物 [ 1 ]は医薬として有用であり、 たとえ ばある種のグラム陽性菌,グラム陰性菌に対して抗菌力を有する。  The compound [1] thus obtained is useful as a medicine, and has antibacterial activity against, for example, certain gram-positive and gram-negative bacteria.
次に化合物 [ 1 ]の生物学的性状について述べる。  Next, the biological properties of compound [1] will be described.
本発明化合物 [ 1 ]のうち、 代表的な化'合物の人型結核菌  Among the compounds of the present invention [1], representative compounds of M. tuberculosis
(Mycobacterium t uberculos is H 37 R v)に対する抗菌活性を表 1 に 示す。 最小発育阻止濃度(M I C )は、 5 %牛血清添加キルヒナ-培地を 使用した稀釈法により、 3 7 °Cで 2週間培養後に測定した。 表 1 Table 1 shows the antibacterial activity against (Mycobacterium tuberculos is H37Rv). The minimum inhibitory concentration (MIC) was measured after 2 weeks of culture at 37 ° C by a dilution method using Kirchina medium supplemented with 5% bovine serum. table 1
Figure imgf000047_0001
本発明の化合物 [ 1 ]の毒性は低い。
Figure imgf000047_0001
The toxicity of the compound [1] of the present invention is low.
このように、 .本発明の化合物 [ 1 ]またはその塩は、 ある種のグラム陽 性菌,グラム陰性菌に対し抗菌力を示し、 その上毒性も低いので、 細菌 による感染もひきおこされた哺乳 ¾物(例、 マウス,ラッ ト,犬,牛,豚,人 など)の細菌感染症の治療に細菌感染症治療剤あるいは抗菌剤として用 いることができる。  As described above, the compound [1] of the present invention or a salt thereof exhibits antibacterial activity against certain gram-positive bacteria and gram-negative bacteria, and is also low in toxicity, thereby causing infection by bacteria. It can be used as a bacterial infection therapeutic or antibacterial agent for the treatment of bacterial infections in mammals (eg, mice, rats, dogs, cows, pigs, humans, etc.).
化^物 [ 1:またはその塩の 1 日投与量は、 化合物 [ 1:として約 1 2 0 0 mg/ kg,さらに好ましくは約 1 0 ~ δ 0 mg/ kgとなる量である 化合物 [ 1 ]を投与するには、 化合物 [ 1 ]またはその薬理学的に許容さ れ得る塩を常套手段によって、 適宜の薬理的許容される担体,陚形剤,希 釈剤と混合し、 たとえば錠剤,頼粒剤,カプセル剤, ドロヅプ剤などの剤 型にして経口的に投与することができ、 または常套手段によってたとえ ば注射剤に成型し、 常套手段によって製造された滅菌性担体中に配合し 非経口的に投与することができる。  The daily dose of the compound [1: or a salt thereof is about 1200 mg / kg, more preferably about 10 to δ0 mg / kg of the compound [1: Is administered by mixing the compound [1] or a pharmaceutically acceptable salt thereof with a suitable pharmaceutically acceptable carrier, excipient, or diluent by conventional means. It can be administered orally in the form of granules, capsules, drops, or the like, or it can be formulated by conventional means, for example, into injections, and compounded into sterile carriers manufactured by conventional means. It can be administered orally.
上記経口製剤、 例えば錠剤を製造する最には、 結合剤(例、 ヒ ドロキ シププロピルセルロース,ヒ ドロキシプロピルメチルセルロース,マクロ ゴ―ルなど),崩壌剤(例、 デンプン,カルボキシメチルセルロースカルシ ゥムなど),陚形剤(例、 乳糖,デンプンなど),滑沢剤(例、 ステアリ ン酸 マグネシウム,タルクなど)などを適宜配合することができる。 When producing the above oral preparations, for example, tablets, a binder (eg, hydroxypropyl propyl cellulose, hydroxypropyl methylcellulose, macro Gol, etc.), disintegrants (eg, starch, carboxymethylcellulose calcium, etc.), emollients (eg, lactose, starch, etc.), lubricants (eg, magnesium stearate, talc, etc.) They can be appropriately blended.
また、 非経口製剤、 たとえば注射剤を製造する際には、 等張化剤(例、 ブドウ糖, D —ソルビトール, D—マンニトール,塩化ナトリウムなど), 防腐剤(例、 ベンジルアルコール,ク口ロブタノール,パラォキシ安息香 酸メチル,パラォキシ安息香酸プロピルなど),緩衝剤(例、 リ ン酸塩鑀衝 液,酢酸ナトリゥム緩衝液など)などを適宜配合することができる。  In addition, when preparing parenteral preparations such as injections, use isotonic agents (eg, glucose, D-sorbitol, D-mannitol, sodium chloride, etc.), preservatives (eg, benzyl alcohol, cuprate butanol) , Para-hydroxybenzoate, propyl para-benzoate, etc.) and buffers (eg, phosphate buffer, sodium acetate buffer, etc.) can be appropriately added.
本発明方法において用いられる原料化合物である抗生物質 T A N— 528Aは、 ストレプト ミセス(S treptomyces)属に属する抗生物質 T A N 一 528 A生産菌を培地に培養し、 培養物中に抗生物質 T A N— 528 Aを生 成蓄積せしめ、 これを採取することにより製造することができる。 該生 産菌の具体例としては、 たとえばストレブト ミセス · アルポロングス ( S treptom ces al bolongus) C— 46366株が挙げられ、 該微生物は、 財 団法人発酵研究所( ί F 0 ,日本国大阪府大阪市淀川区十三本町 2丁目 1 7番 8 5号)に昭和 5 8年(西暦 1983年) 8月 5 日に受託番号 I F 0 14280として寄託されている。また該微生物は、日本国通商産業省工業技 術院微生物工業技術研究所(F R I ,日本国茨城県筑波郡谷田部町東 1丁 目 1番 3号)に昭和 5 8年 (西暦 1983年) 8月 9 日に受託番号 F E R M Ρ— 7198として寄託されている。  The antibiotic TAN-528A, which is a raw material compound used in the method of the present invention, is obtained by culturing an antibiotic TAN-528A producing bacterium belonging to the genus Streptomyces in a culture medium, and adding the antibiotic TAN-528A to the culture. It can be produced by accumulating and accumulating and collecting it. Specific examples of the producing bacteria include Streptom ces al bolongus C-46366 strain. The microorganism can be obtained from the Fermentation Research Institute (ίF 0, Osaka, Japan). It was deposited under the accession number IF 0 14280 on August 5, 1983 at 183-85, Jusanhoncho, Yodogawa-ku, Ishikawa. In addition, the microorganism was submitted to the Research Institute of Microorganisms and Technology (FRI, 1-3-1 Higashi-Yatabe-cho, Tsukuba-gun, Ibaraki, Japan) at the Institute of Industrial Technology, Ministry of International Trade and Industry of Japan in August 1983. Deposited on the 9th as accession number FERM 7—7198.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
次に参考例および実施例をもってさらに詳細に本発明の内容を説明す るカ、 これによつて本発明が限定されるものではない。 なお、 培地にお けるパ—セントは、特にことわりのないかぎり、 重量/容量%を示す。 参考例 1  Next, the content of the present invention will be described in more detail with reference to Reference Examples and Examples, which do not limit the present invention. In addition, the percentage in the medium is% by weight / volume unless otherwise specified. Reference example 1
グルコース 2 % ,可溶性澱粉 3 %,コーン · スチープ ' リカー 1 % ,生 大豆粉 1 % ,ペプト ン 0.5% , Ma C I 0.3%, CaC 03 0.5%(pH7.0)か らなる培地 500mlを 2 J2 容坂ロフラスコに入れ、 125°C,25分間滅菌した のち、 ス ト レプト ミ セス ' アルボロングス C一 46366(F E RM P - 7198, I F 0 14280)を接種し、 28°Cで 2 日間往復振盪機上で培養した。 得られた種培養液 1.5J2 を上記種培地と同一組成の培地 30J2 を含む 50 容ステンレス · スチール · タ ンクに移植し、 28°Cで 2 日間通気攪拌培養 (通気量 100J2 ;攪拌 280回転 毎分)を行なった。 得られた種培養 5 Jg を グリセロール 3 %,肉エキス 0.5% , NaC 1 0.5%,ペプト ン 0.5% (pH 7.0)からなる主培養培地 100£ を含む 200J2 容タンクに接種し、 24°C, 2 日間通気攪拌培養(通気量 100% ;攪拌 200回転/毎分)を行なった。 Glucose 2%, soluble starch 3%, corn steep liquor 1%, raw Soy flour 1%, Peputo down 0.5%, Ma CI 0.3% after CaC 0 Put 3 0.5% (pH 7.0) or Ranaru medium 500ml to 2 J2 Yozaka necked flask, and sterilized 125 ° C, 25 min, scan The cells were inoculated with Treptomyces' Arbolongs C-146366 (FERMP-7198, IF014280) and cultured on a reciprocating shaker at 28 ° C for 2 days. 1.5 J2 of the resulting seed culture was transferred to a 50-volume stainless steel tank containing 30 J2 of the same composition as the above seed medium, and cultured at 28 ° C for 2 days with aeration and agitation (aeration of 100 J2; agitation at 280 rpm) Min). 5 Jg of the resulting seed culture was inoculated into a 200 J2 tank containing 100% of the main culture medium consisting of 3% glycerol, 0.5% meat extract, 0.5% NaC, and 0.5% peptone (pH 7.0). Aeration and agitation culture (aeration 100%; agitation 200 revolutions / minute) was performed for 2 days.
得られた培養液 :)をハイフロ · スーパーセル(4.5Kg)を用いてろ 過し、 ろ液(80.2 )を PH 3で舴酸ェチル(40J2 X 2 )で抽出し、 抽出液を 2 %炭酸水素ナ ト リ ウム水(40β Χ 2 )で洗い、 酢酸ェチル層を濃縮し、 濃縮液(820ml)を水洗後、 g乍酸ェチル層を濃縮、 濃縮物に n -へキサンを 加え、 沈殿化し、 粗粉末(1.16g)を得た。 同様の方法で得られた粗粉末 (丄.9g)をシリ力ゲル(95g)の力ラムクロマ ト グラフィ ーに付した。 酢酸 ェチル: トルエン(6 : 4 )の溶出画分を濃縮乾固すると T AM— 528 Aの 扮末(683mg)が得られた。 この粉末をセフアデツ クス L H— 20(340ml)の カラムクロマ トグラフィ —に付し、 詐酸ェチルで溶出された抗生物質 T AN— 528Aを含む画分を濃縮すると、 抗生物質 T A N— 528 Aの結晶状 粉末(506mg)が得られた。  The resulting culture solution :) was filtered using Hyflo Supercell (4.5Kg), the filtrate (80.2) was extracted with PH 3 using ethyl acetate (40J2 X 2), and the extract was extracted with 2% hydrogen carbonate. After washing with sodium water (40βΧ2), concentrating the ethyl acetate layer, washing the concentrated solution (820 ml) with water, then concentrating the ethyl acetate layer, adding n-hexane to the concentrate and precipitating, A coarse powder (1.16 g) was obtained. The coarse powder (丄 .9 g) obtained in the same manner was subjected to force ram chromatography on a gel (95 g). The fraction eluted with ethyl acetate: toluene (6: 4) was concentrated to dryness to obtain TAM-528A (683 mg). This powder was subjected to column chromatography with Sephadex LH-20 (340 ml), and the fraction containing the antibiotic TAN-528A eluted with ethyl acetate was concentrated to give a crystalline powder of the antibiotic TAN-528A. (506 mg) was obtained.
上記で得られた抗生物質 T AN - 528 Aの物理化学的性状はつぎの通 りである。  The physicochemical properties of the antibiotic TAN-528A obtained above are as follows.
( 1 )外観;橙黄色結晶性粉末  (1) Appearance; orange yellow crystalline powder
(2 )融点; 161~163°C (分解点) (3)比旋光度; [o;]2 D 5 910。 ±100° (2) Melting point: 161-163 ° C (decomposition point) (3) Specific rotation; [o;] 2 D 5 910. ± 100 °
(c = 0.10,クロロフオルム中) (c = 0.10 in chloroform)
(4) pKa' 値; 8.75(滴定法)  (4) pKa 'value; 8.75 (titration method)
(5)分子量測定値; 746(M+ 3 H)+ (S I MS法)  (5) Molecular weight measurement: 746 (M + 3H) + (S I MS method)
743(M+ )(E I - MS法) 743 (M + ) (EI-MS method)
(6)元素分圻値;(%)  (6) Elemental Ki value; (%)
実測値, C ;61.20, H;6.72, N ;1.89,  Actual value, C: 61.20, H; 6.72, N; 1.89,
0 ;26.11, S ;4.48,  0; 26.11, S; 4.48,
計算値, C ;61.36, H ;6.64, N ;1.88,  Calculated value, C; 61.36, H; 6.64, N; 1.88,
0 ;25.81, S ;4.31  0; 25.81, S; 4.31
(7)分子式 (分子量); - C38H+aN 0 i2S (743.865) . (7) molecular formula (molecular weight); - C 38 H + a N 0 i 2 S (743.865).
(8)紫外部吸収スペク トル;メタノ ール中. . λ 218±2nm(E =485 245, 270, 350ηπι(肩), 0±3nm(El =60±10) (8) Ultraviolet absorption spectrum; in methanol. .Lambda. 218 ± 2 nm (E = 485 245, 270, 350ηπι (shoulder), 0 ± 3 nm (El = 60 ± 10)
(9)赤外部吸収スぺク トル;臭化力リウム中, (9) Infrared absorption spectrum;
主要ピークはつぎの通りである。  The main peaks are as follows.
3450, 2970, 2930, 2880, 1730, 1670, 1620, 1560, 1460, 1405, 1370, 1290, 1250, 1200, 1165, 1140, 1105, 1050, 1035, 980, 925, 880, 820, 780, 750, 735, 630cm_13450, 2970, 2930, 2880, 1730, 1670, 1620, 1560, 1460, 1405, 1370, 1290, 1250, 1200, 1165, 1140, 1105, 1050, 1035, 980, 925, 880, 820, 780, 750, 735, 630cm _1.
(10) CMRスぺク トル(100MHz);重クロロフオルム中,  (10) CMR spectrum (100MHz);
少くとも下記のシグナルが認められる。  At least the following signals are observed.
195.19, 183.19, 180.41, 172.85, 164.40, 162.73, 161.98, 147.46, 144.54, 142.89, 140.70, 139.45, 137.09, 131.79,195.19, 183.19, 180.41, 172.85, 164.40, 162.73, 161.98, 147.46, 144.54, 142.89, 140.70, 139.45, 137.09, 131.79,
128.97(s), 128.97(d), 127.71, 123.89, 109.06, 82.79, 76.57, 73.14, 70.00, 62.86, 51.78, 46.92, 41.93, 38.80, 38.37, 36.96, 20.55, 18.90, 17.47, 16.04, 15.65, 12.09, 9.21, 9.10(ただし、 sは singletも、 dは doubletをそれぞれ表わす)。 128.97 (s), 128.97 (d), 127.71, 123.89, 109.06, 82.79, 76.57, 73.14, 70.00, 62.86, 51.78, 46.92, 41.93, 38.80, 38.37, 36.96, 20.55, 18.90, 17.47, 16.04, 15.65, 12.09, 9.21, 9.10 (where s represents singlet and d represents doublet, respectively).
(11)溶解性; · (11) solubility; ·
易溶,アセ ト ン,酢酸ェチル,ジクロロメタ ン,ジメチルスルフォキサ ィ ド,  Easily soluble, acetate, ethyl acetate, dichloromethane, dimethyl sulfoxide,
難溶,水,へキサン  Poorly soluble, water, hexane
(12)呈色反応;  (12) color reaction;
陽性ノく一 .ト ン,酢酸マグネシゥム反応  Positive knock-on, magnesium acetate reaction
' 陰性,ニンヒ ドリ ン, ドラ一ゲン ドルフ,エールリ ッ ヒ反応  '' Negative, ninhydrin, dragendorf, Ehrlich reaction
(13)安定性;有機溶媒中で安定 ·  (13) Stability; stable in organic solvents ·
(U)薄層クロマトグラフィ—;シリカゲル HF25 + (メルク社製,西独) 溶 媒 系 Rf値 (U) Thin layer chromatography; Silica gel HF 25 + (Merck, West Germany) Solvent system Rf value
酢酸ェチル:メタノ —ル 0.62  Ethyl acetate: methanol 0.62
(50: 1 )  (50: 1)
ジク Dロメタ ン:メタノ ール 0.44  Zic D rometan: methanol 0.44
( 9: 1 )  (9: 1)
実施例 1 ジヒ ドロ— TAN— 528 A (TAN— 528Aヒ ドロキノ ン体)の Example 1 Dihydro-TAN-528A (TAN-528A hydroquinone)
TA - 528 A 148mgを酢酸ェチル(AcO Et)20mlに溶かし、 これに 3 % Na2S 204—水 10mlを加えてかきまぜた。 AcOEt層を水洗 して無水 Na2S 04で乾燥し、 AcOEtを減圧留去して残留物をへキサ ンでかためろ取し、 標記化合物を得た。 収量 124mg。 融点: 158〜160°C 元素分 I1斤値 C38H51N 012S · 1Z2H20として TA - a 528 A 148 mg dissolved in acetic acid Echiru (AcO Et) 20ml, this 3% Na 2 S 2 0 4 - stirring by addition of water 10 ml. The AcOEt layer was washed with water, dried over anhydrous Na 2 SO 4 , AcOEt was distilled off under reduced pressure, and the residue was collected by filtration with hexane to obtain the title compound. Yield 124 mg. Melting point: 158-160 ° C Element I 1 loaf value C 38 H 51 N 0 12 S 1Z2H 20
計算値: C 60.46; H 6.94; 1.86; S 4.25  Calculated: C 60.46; H 6.94; 1.86; S 4.25
実測値: C 60.50; H 6.87; 1.88; S 4.28  Found: C 60.50; H 6.87; 1.88; S 4.28
実施例 2 2 5—デメチルチオ— 2 5—メチルスルホニルー T AN - 528Aの製造: Example 2 Preparation of 25-demethylthio-25-methylsulfonyl-TAN-528A:
TAN— 528 A 674mgをジクロルメタン 30mlに溶かし、 0°Cに冷却し て m—クロル過安息香酸 172mgを加えて 30分かきまぜた。 ジクロルメタン を減圧留去して残留物を AcOEt 100mlで抽出し、 AcOEt溶液を水 洗後無水 Na2S 04で乾燥し、 減圧濃縮して残留物をへキサンでかため ろ取して 660mgの黄色粉末を得た。 これを少量の AcO Etで溶解し、 あ らかじめ 1 %しゅう酸— AcOEtで前処理したシリ力ゲル(30g)の力ラ ムに吸着させ、 AcOEt— 11—へキサン(4: 6)の溶媒で展開し、 121ml から 190mlの溶出画分をあつめて水洗し、 無水 Na2S 04で乾燦後、 Ac 0 Etを留去して n—へキ.サンでかためてろ取し ll¼gの標記化合物を得 た。 融点: 165~168。C , [ ] 2 D 2 ナ 718.9。 (c = 0.18, C H C 13), S I MS m/e:( ^ 3 )+ 778, MR (90 Hz, C D C ) <5: 0.75, 0.78, 0.86 & 1.20(各311,(1,6.5 ), 2.04, 2.17 & 2·27(各 3H,s), 2.4- 2.7(〜2H,m), 2.81(lH,m), 3.28(3H, s , 25 - S 02CH3), 3.3-3.8 (~5H.br.ni), 3.70 & 3.83(各311,3), 4.0 - 4.3(2H, m) , 0.80(lH,d, 9Hz),5.80(lH,dd 16,9Hz), 6. o2(lH,d, 10Hz) , 7.07(lH,dd 16,10Hz), 8.73(lH,s), 11.73(lH,s) 674 mg of TAN-528A was dissolved in 30 ml of dichloromethane, cooled to 0 ° C, 172 mg of m-chloroperbenzoic acid was added, and the mixture was stirred for 30 minutes. Dichloromethane was distilled off under reduced pressure, and the residue was extracted with 100 mL of AcOEt. The AcOEt solution was washed with water, dried over anhydrous Na 2 S 04, concentrated under reduced pressure, and the residue was collected by filtration with hexane to give 660 mg of yellow. A powder was obtained. This was dissolved in a small amount of AcO Et and adsorbed on a force column of a silica gel (30 g) pretreated with 1% oxalic acid-AcOEt in advance, and AcOEt-11-hexane (4: 6) was added. and developed with a solvent, washed with water gathered eluted fractions of 190ml from 121 ml, Shi preparative Iro by hardening dried over anhydrous Na 2 S 0 4燦後, and evaporated to remove the Ac 0 Et to n- key. San ll¼g The title compound was obtained. Melting point: 165-168. C, [] 2 D 2 Na 718.9. (c = 0.18, CHC 1 3 ), SI MS m / e :( ^ 3) + 778, MR (90 Hz, CDC) <5: 0.75, 0.78, 0.86 & 1.20 ( each 311, (1,6.5), 2.04, 2.17 & 2, 27 (each 3H, s), 2.4- 2.7 ( ~2H, m), 2.81 (lH, m), 3.28 (3H, s, 25 - S 0 2 CH 3), 3.3-3.8 ( ~ 5H.br.ni), 3.70 & 3.83 (311, 3 each), 4.0-4.3 (2H, m), 0.80 (lH, d, 9Hz), 5.80 (lH, dd 16,9Hz), 6.o2 ( lH, d, 10Hz), 7.07 (lH, dd 16,10Hz), 8.73 (lH, s), 11.73 (lH, s)
元素分折値 C38H + 9NO 1 Sとして Elemental analysis value C 38 H + 9 NO 1 S
計算値: C 58.83; H 6.36; 1.81; S 4.13  Calculated: C 58.83; H 6.36; 1.81; S 4.13
実測値: C 58.96; H 6.39; N 1.95; S 4.32 実施例 3 2 5—デメチルチオ一 2 5—メチルスルフィ二ルー T AN— 528Aの製造: Found: C 58.96; H 6.39; N 1.95; S 4.32 Example 3 Preparation of 25-demethylthio-l25-methylsulfinyl TAN-528A:
実施例 2のシリカゲル力ラムクロマ トグラフィーに於て 240mlから 350mlまでの溶出画分をあつめて水洗し無水 Na2S 0+で乾燥し、 溶媒を 減圧留去してへキサンで粉末としろ取した。 このものを AcOEt— n— へキサンより再沈澱し、 113mgの標記化合物を橙色結晶状粉末として得 た。 融点: 161〜164て, [a]2 D 2 + 726.1° (c = 0.18, C H C 13), S I MS m/e:(M+ l )十 760, (M+ 2)+ 761, (M+ 3 )+ 762, NMR (90MHz, C D C 13)<5 : 0.76, 0.78, 0.86 & 1.18(各 3H,d, 6.5Hz) , 1.98, 2.15 & 2.27(各 3H's), 2.3—2.8(〜2H,m), 2.85(lH,m), 3.13(3H, s , 25- S 0 C H3), 3.4-3.7(2H,m), 3.70(3H,s), 3.8(~3H, br . ) , 3.84(3H, s), 3.9-4.2(2H(ra), δ .85(1H, d, 8Hz)'( 5.76(lH,dd 16,7Hz),. 6.42(1H, d.lOHz), 7.02(lH,dd 16,10Hz), 8.68(iH,s), 11.89(lH,s) The eluted fractions from 240 ml to 350 ml were collected and washed with water and dried over anhydrous Na 2 S 0 + in silica gel column chromatography in Example 2, and the solvent was distilled off under reduced pressure to obtain a powder with hexane and collected by filtration. . This was reprecipitated from AcOEt-n-hexane to give 113 mg of the title compound as an orange crystalline powder. Mp: 161 to 164 Te, [a] 2 D 2 + 726.1 ° (c = 0.18, CHC 1 3), SI MS m / e: (M + l) Ten 760, (M + 2) + 761, (M + 3) + 762, NMR (90MHz, CDC 1 3) <5: 0.76, 0.78, 0.86 & 1.18 ( each 3H, d, 6.5Hz), 1.98 , 2.15 & 2.27 ( each 3H's), 2.3-2.8 (~2H, m) , 2.85 (lH, m), 3.13 (3H, s, 25- S 0 CH 3), 3.4-3.7 (2H, m), 3.70 (3H, s), 3.8 (~ 3H, br.), 3.84 (3H , s), 3.9-4.2 (2H ( ra), δ .85 (1H, d, 8Hz) ' ( 5.76 (lH, dd 16, 7Hz), 6.42 (1H, d.lOHz), 7.02 (lH, dd 16,10Hz), 8.68 (iH, s), 11.89 (lH, s)
元素分圻値 C38H + sN'013SとしてElemental Ki value C 38 H + s N'0 13 S
;ト算値: C 60.07; H 6.50; 1.84; S 4.22  ; Calculated value: C 60.07; H 6.50; 1.84; S 4.22
実測値: C 60.34; H 6.58; N 1.95; S 4.49  Found: C 60.34; H 6.58; N 1.95; S 4.49
実施例 4 2 5—デメチルチオ一 2 5—メチルスルフィニル—T AN— Example 4 25-Demethylthio-1 25-methylsulfinyl-T AN—
528A (実施例 3の化合物のスルホキシ ド部分の異性体)の製 造:  Preparation of 528A (isomer of the sulfoxide moiety of the compound of Example 3):
実施例 2のシリ力ゲルカラムク口マトグラフィ —に於て 460mlから 610ml までの溶出画分をあつめて n—へキサンを減圧留去して AcOEt溶液を 水洗後無水 Na2S 0+で乾燥する。 Ac 0 Etを減圧留去して折出した橙 色結晶をろ取し、 A c 0 E tから再結晶して 192mgの標記化合物を得た。 融点: 186~189°C, [な]2 D 2 + 778.9° (c = 0.18, C H C 13), S I MS m/e:(M-r 1 )+ 760, (M+ 2)+ 761, (M+ 3)十 762, N R (90 Hz, CD Cl3)5 : 0.76, 0.80, 0.84, 1.23(各 3H, d, 6.5Hz), 2.05, 2.20 & 2.24(各 3H,s), 2.4-2.7(~2H,m), 2.83(lH,m), 3.26(3H, s , 25 - S O CHs), 3.4-3.7(2H,m), 3.72 & 3.83(各 3H,s), 4.0-4.3(2H, m), 5.75(lH,d,9Hz), 5.82(lH,dd 9,16Hz), 6.53(lH,d, 11Hz) , 7.22(1H, dd 11,16Hz), 8.80(lH,s), 11.89(lH,s) The eluate fractions from 460 ml to 610 ml were collected by the silylation gel column chromatography in Example 2, and n-hexane was distilled off under reduced pressure. The AcOEt solution was washed with water and dried over anhydrous Na 2 S 0 + . Ac0Et was distilled off under reduced pressure, and the thus-obtained orange crystals were collected by filtration and recrystallized from Ac0Et to obtain 192 mg of the title compound. Mp: 186 ~ 189 ° C, [Do] 2 D 2 + 778.9 ° ( c = 0.18, CHC 1 3), SI MS m / e: (Mr 1) + 760, (M + 2) + 761, (M + 3) 10 762, NR (90 Hz, CD Cl 3 ) 5: 0.76, 0.80, 0.84, 1.23 (3H, d, 6.5 each) Hz), 2.05, 2.20 & 2.24 (3H, s each), 2.4-2.7 (~ 2H, m), 2.83 (lH, m), 3.26 (3H, s, 25-SO CHs), 3.4-3.7 (2H, m), 3.72 & 3.83 (3H, s), 4.0-4.3 (2H, m), 5.75 (lH, d, 9Hz), 5.82 (lH, dd 9,16Hz), 6.53 (lH, d, 11Hz), 7.22 (1H, dd 11,16Hz), 8.80 (lH, s), 11.89 (lH, s)
元素分析値 C38H49NO 13Sとして Elemental analysis value C 38 H 49 NO 13 S
計算値: C 60.07 ; H 6.50; N 1.84; S 4.22  Calculated: C 60.07; H 6.50; N 1.84; S 4.22
実測値: C 80.11; H 6.56; N 1.80; S 4.31  Found: C 80.11; H 6.56; N 1.80; S 4.31
実施例 5 2 5—デメチルチオ— 2 5—フヱニルチオ— T AN— 528 A の製造: Example 5 Preparation of 25-demethylthio-25-phenylthio-TAN-528A
T AN - 528 A 223mgを MeOH 30mlに溶かし 0 °Cに冷却し、 m— クロル過安息香酸 78mgを加えて 2時間かきまぜた。 — eOHを減圧留去 して AcOEt 50mlで抽出し、水洗後無水 Na2S 0+で乾燥した。 223 mg of TAN-528A was dissolved in 30 ml of MeOH, cooled to 0 ° C, and 78 mg of m-chloroperbenzoic acid was added, followed by stirring for 2 hours. — The eOH was distilled off under reduced pressure, extracted with 50 ml of AcOEt, washed with water and dried over anhydrous Na 2 S 0 + .
AcOEtを留去し残留物をへキサンで粉末としろ取した。 この粉末 245m gのうち 120mgを AcOEt iOmlに'溶かし— 10°Cに冷却してチオフヱノ 一ル 22mgと 10%トリェチルアミ ン— AcOEt 0.28mlを加え—丄 (TCで 30 分かきまぜ、 反応液に水 50mlを加え N—塩酸で酸性として AcO Et 50mlで抽出した。 AcOEt層を水洗後無水 Na2S C で乾燦し減圧留去 し、 残留物を少量の CHG13に溶かし、 シリカゲル(8g)のカラムにか け、 C H C 13で展開し 85mlから U5mlまでの溶出画分をあつめて C H C 13 を減圧留去し残留物をへキサンで粉末としてろ取し、 標記化合物を得た。 収量 59mg。 AcOEt was distilled off and the residue was triturated with hexane and collected by filtration. Of 245 mg of this powder, 120 mg was dissolved in AcOEt iOml, cooled to 10 ° C, added with 22 mg of thiophenol and 0.28 ml of 10% triethylamine-AcOEt, and stirred for 30 minutes with TC. AcO and extracted with Et 50 ml acidified with an added N- hydrochloric acid. the AcOEt layer was Inui燦with washed with water anhydrous Na 2 SC was distilled off under reduced pressure, the residue was dissolved in a small amount of CHG1 3, a column of silica gel (8 g) Placing, were collected by filtration CHC 1 3 collecting fractions eluted expanded from 85ml to U5ml in CHC 1 3 as a powder with hexane f was distilled off under reduced pressure and the residue to give the title compound. yield 59 mg.
融点: 151~153°C (分解), S I MS m/e:(M+ 2 )+ 807, NMR (90MHz, CD Cl3)<5: 1.80(3H,s, - C旦 3), 2.02(3H,s, -CH3), 2.30(3H, s, -CH3), 3.70(3H,s,-OCH3), 3.82(3H,s, -0CH3), 7.24(5H, s, -C6H5) 元素分折値 C+3H51NO 12Sとして Mp: 151 ~ 153 ° C (decomposition), SI MS m / e: (M + 2) + 807, NMR (90MHz, CD Cl 3) <5: 1.80 (3H, s, - C Dan 3), 2.02 (3H , s, -CH 3 ), 2.30 (3H, s, -CH 3 ), 3.70 (3H, s, -OCH 3 ), 3.82 (3H, s, -0CH 3 ), 7.24 (5H, s, -C 6 H 5 ) Elemental analysis value C +3 H 51 NO 12 S
計算値: C 64.08; H 6.37; 1.73; S 3.98  Calculated: C 64.08; H 6.37; 1.73; S 3.98
実測値: C 63.6δ; H 6.04; N 1.57; S 3.53  Obtained: C 63.6δ; H 6.04; N 1.57; S 3.53
実施例 6 2 5—デメチルチオ— 2 5—プロピルチオ一 T AN— 528A の製造: Example 6 Preparation of 25-demethylthio-25-propylthio-TAN-528A:
T AN - 528 A 223mgをジクロルメタン 10mlに溶かして一 10°Cに冷却 し m—クロル過安息香酸 57mgを加えてそのまま 30分かきまぜた。 ジクロ ルメタン 50mlを加えて水洗し、ジクロルメタン層を水洗後無水 Na2S 04 で乾燥し、 ジクロルメタンを减圧留去して残留物をへキサンでかためろ 取した。 この粉末をジクロルメタン 20mlに溶かし一 10°Cに冷却して 1 一 プロパンチォ一ル 25 J2 と 10% トリェチルァミ ンージクロルメタン 0.88 mlを加えて 0 で 1時間かきまぜ、 ジクロルメタンを留去して残留物に AcOEt lOOmiと 0.1N H C1 20mlを加え、 AcOEt層を分液し、 1 %塩化第 2鉄水溶液、 次いで水で洗い無水 Na2S 0+で乾燥した。 223 mg of TAN-528A was dissolved in 10 ml of dichloromethane, cooled to 110 ° C, 57 mg of m-chloroperbenzoic acid was added, and the mixture was stirred for 30 minutes. Dichloromethane (50 ml) was added and the mixture was washed with water. The dichloromethane layer was washed with water and dried over anhydrous Na 2 SO 4 , dichloromethane was distilled off under reduced pressure, and the residue was collected with hexane. Dissolve the powder in 20 ml of dichloromethane, cool to 10 ° C, add 1.18 of propanediol 25J2 and 0.88 ml of 10% triethylamine dichloromethane, stir at 0 for 1 hour, distill off dichloromethane and remove the residue to the residue. And 20 mL of 0.1N HCl were added, and the AcOEt layer was separated, washed with a 1% aqueous ferric chloride solution, then with water, and dried over anhydrous Na 2 S 0 + .
AcOEtを減圧留去'して残留物を少量の CH C13に溶かしてシリ力ゲル (6 g)のカラムに吸着させ、 -1 % MeO H— CHC 13の溶媒系で展開し、 30 m 1から 55 m iまでの溶出画分をあつめて減圧濃縮し、 残留物を n—へキ サンてかためろ取した。 A c 0 E t— n—へキサンで再沈澱して 109mgの瘵 記化合物を得た。 The AcOEt was distilled off under reduced pressure 'to the residue is dissolved in a small amount of CH C1 3 adsorbed on a column of silica force gel (6 g), and developed with -1% MeO H- CHC 1 3 solvent system, 30 m The eluted fractions from 1 to 55 mi were collected, concentrated under reduced pressure, and the residue was collected by n-hexane. Re-precipitation with Ac0Et-n-hexane gave 109 mg of the title compound.
融点:U8~150°C (分解)  Melting point: U8 ~ 150 ° C (decomposition)
元素分折値 C+。H53N 012Sとして Elemental analysis value C + . H 53 N 0 12 S
. 計算値: C 62.24; H 6.92; 1.81; S 4.15  Calculated: C 62.24; H 6.92; 1.81; S 4.15
実測値: C 62.06; H 7.02; N 1.85; S 4.27  Found: C 62.06; H 7.02; N 1.85; S 4.27
NMROOMHz, CD C )(5: 2.02(3H, s , -CH3) , 2.20(3H, s , -CH3) , 2.28(3H,s, -CH3), 3.70(3H, s , -0CH3) , 3.82(3H,s, -0CH3), 0.70(3H,t, -S-CH2CH2CH3), 1.50(2H,m, -S-CH2-CH2CH3) NMROOMHz, CD C) (5: 2.02 (3H, s, -CH 3), 2.20 (3H, s, -CH 3), 2.28 (3H, s, -CH 3), 3.70 (3H, s, -0CH 3 ), 3.82 (3H, s, -0CH 3 ), 0.70 (3H, t, -S-CH2CH2CH3), 1.50 (2H, m, -S-CH2-CH2CH3)
- , 1 -, 1
5  Five
実施例 Ί T AN— 528Αラク トン体(10位のカルボン酸と 7位の水酸塞 が縮合したもの)の製造:  Example 製造 Preparation of T AN—528Α lactone (condensation of carboxylic acid at 10-position and hydroxyl-block at 7-position):
T AN - 528 A 446mgをテトラヒ ドロフラン 20mlに溶かし 0。Cに冷却 して N— NaOH 1.2mlを加えて 0 °Cで 20分かきまぜた。 反応液を 0.1 N - H C 1 12mlで中和し、 AcOEt 100mlで抽出し、 AcOEt層を水 洗して無水 Na2S 0+で乾燥後減圧濃縮した。 残留物を少量の CH C 13 に溶解し 8 gのシリ力ゲルを用いて力ラムクロマトグラフィ—を行ない、 ' 1 % MeO H— C H C 13で溶出し、 25mlから 57mlまでの溶出画分をあつ めて減圧濃縮し残留物をへキサンでかためろ取し、 標記化合物を得た。Dissolve 446 mg of TAN-528A in 20 ml of tetrahydrofuran. After cooling to C, 1.2 ml of N-NaOH was added and stirred at 0 ° C for 20 minutes. The reaction solution was neutralized with 12 ml of 0.1 N-HC1 and extracted with 100 ml of AcOEt. The AcOEt layer was washed with water, dried over anhydrous Na 2 S 0 + and concentrated under reduced pressure. The residue was force ram chromatography using silica force gel small amount of dissolved in CH C 1 3 8 g - is carried out for, and eluted with '1% MeO H- CHC 1 3 , eluted fractions from 25ml to 57ml The mixture was concentrated under reduced pressure, and the residue was collected by filtration with hexane to obtain the title compound.
10 収量 141mg。 融点 172~n5°C, [ ]2 D 5 + 857.9° (c = 0.14, C H C 13) , S I MS mZe:(M十 3)+ 714, NMR(90MHz, CD Cl3)<5 : 2.08(3H, s , -CH3) , 2.20(3H,s, -CH3), 2.25(3H,s, -CH3), 2.30(3H, s , -CH3) , 3.80(3H,s, -0CH3) . 10 Yield 141 mg. Mp 172 ~ n5 ° C, [] 2 D 5 + 857.9 ° (c = 0.14, CHC 1 3), SI MS mZe: (M tens 3) + 714, NMR (90MHz , CD Cl 3) <5: 2.08 ( 3H, s, -CH 3 ), 2.20 (3H, s, -CH 3 ), 2.25 (3H, s, -CH 3 ), 2.30 (3H, s, -CH 3 ), 3.80 (3H, s, -0CH 3 ).
元素分折値 C37H + 5NO l tSとして Elemental analysis value C 37 H + 5 NO lt S
計算値: C 62.43; H 6.37; 1.97; S 4.50  Calculated: C 62.43; H 6.37; 1.97; S 4.50
実測値: C 62.70; H 6.39; 2.24; S 4.98  Found: C 62.70; H 6.39; 2.24; S 4.98
実施例 8 T A N— 528 Aラク トン(実施例 7とラク トン化位置の異なる 異性体, 10位のカルボン酸と 13位の水酸基が縮合したもの)の Example 8 TAN—528 A lactone (an isomer having a different lactonization position from that of Example 7; a carboxylic acid at position 10 and a hydroxyl group at position 13 condensed)
20 20
製造:  Manufacturing:
実施例 7のシリ力ゲル力ラムクロマトグラフィ ーに於て 89mlから 120 mlまでの溶出画分をあつめて減圧濃縮し残留物をへキサンで粉末としろ 取し、 標記化合物を得た。 収量 152mg。 融点: 259〜263°C. [α] + 920.8° (c = 0.12 , C H C 13) , S I MSThe eluted fractions ranging from 89 ml to 120 ml were collected by the silica gel gel chromatography in Example 7, concentrated under reduced pressure, and the residue was triturated with hexane as a powder to obtain the title compound. Yield 152mg. Mp:. 259~263 ° C [α] + 920.8 ° (c = 0.12, CHC 1 3), SI MS
25 twenty five
m/e:(M+ 3 )+ 714, NMR(90MHz, CD Cl3)5: 2.08(3H, s , -CH3) , 2.16(3H,s,-CH3), 2.26(3H,s, -CHo), 2.35(3H, s , -CH3) , 3.82(3H,s, -O-CHs) m / e: (M + 3) + 714, NMR (90 MHz, CD Cl 3 ) 5: 2.08 (3H, s, -CH 3 ), 2.16 (3H, s, -CH 3 ), 2.26 (3H, s, -CHo), 2.35 (3H, s, -CH 3), 3.82 (3H, s, -O-CHs)
元素分忻値 C37H 5N 0 l t Sとして Elemental Xin value as C 37 H 5 N 0 lt S
計算値: C 62.43; H 6.37; N 1.97; S 4.50  Calculated: C 62.43; H 6.37; N 1.97; S 4.50
実測値: C 62.34; H 6.40; N 2.37; S 4.53  Found: C 62.34; H 6.40; N 2.37; S 4.53
実施例 9 T AN— 528A— 1 0—カルボン酸の製造: Example 9 Production of TAN-528A-10-carboxylic acid:
T AN - 528 A 297mgをエタノ ール 10mlに溶解して 0 °Cに冷却し、 N -NaOH 2 mlを加えて室温で 40分かきまぜた。 ついで N— HC1 2 mlを加えて中和し、 エタノールを減圧留去し、 AcOEt 50mlで抽出し た。 AcOEt層を水洗後無水 Na2S 0+で乾燥し、 AcOEtを減圧留去 した。 残留物を少量の C H C 13に溶解してシリカゲルの力ラム(シリ力 ゲル 6 g)に吸着させ、 C H C 13— 011—水(270:24 :1)の溶媒系で展 開し 40mlから 60mlまでの溶出画分をあつめて減圧濃縮し残留物を A c 0 E 150mlに溶解した。 この A c 0 E t溶液を水洗後無水 N a2 S 0 + で乾燥し、 AcOEtも減圧留去し、 残留物を AcOEt—ェチルエーテル で粉末にしてろ取し、 標記化合物を得た。 収量 110mg。 融点: n6~178°C, :α]2 +956.2° (c = 0.16, CHC13), S I MS m e:(M- 2)+ 731, 1 H - N R (90 Hz, C D Cl3)<5 : 2.00(3H,s, -CH3), 2.20(3H,s, -CH3), 2.26(3H, s , -CH3) , 2.38(3H, s , -CH3) , 3.82 (3H,s, -0CH3) 297 mg of TAN-528A was dissolved in 10 ml of ethanol, cooled to 0 ° C, 2 ml of N-NaOH was added, and the mixture was stirred at room temperature for 40 minutes. Then, 2 ml of N—HC1 was added for neutralization, ethanol was distilled off under reduced pressure, and the mixture was extracted with 50 ml of AcOEt. The AcOEt layer was washed with water, dried over anhydrous Na 2 S 0 + , and AcOEt was distilled off under reduced pressure. The residue was dissolved in a small amount of CHC 1 3 adsorbed on silica gel force ram (silica force gel 6 g), CHC 1 3 - 011- Water (270: 24: 1) from the solvent system deployment city 40ml of Elution fractions up to 60 ml were collected and concentrated under reduced pressure, and the residue was dissolved in 150 ml of ACOE. The A c 0 and dried E t solution in the washing after anhydrous N a 2 S 0 +, AcOEt also was distilled off under reduced pressure, was collected by Iro in the powder residue AcOEt- Echirueteru to give the title compound. Yield 110mg. Mp: n6 ~ 178 ° C,: α] 2 + 956.2 ° (c = 0.16, CHC1 3), SI MS me: (M- 2) + 731, 1 H - NR (90 Hz, CD Cl 3) <5 : 2.00 (3H, s, -CH 3), 2.20 (3H, s, -CH 3), 2.26 (3H, s, -CH 3), 2.38 (3H, s, -CH 3), 3.82 (3H, s , -0CH 3 )
元素分忻値 C37H + 7N 012S · 1Z2H20として Elemental Xin value C 37 H + 7 N 0 12 S · 1Z2H 20
計算値: C 60.15; H 6.55; N 1.89; S 4.34  Calculated: C 60.15; H 6.55; N 1.89; S 4.34
実測値: C 60.21; H 6.44; N 1.97; S 4.56  Found: C 60.21; H 6.44; N 1.97; S 4.56
実施例 10 1 9ーデメ トキシ— 1 9—ヒ ドロキシ— T A N— 528 Aの製 造: — οδ— Example 10 Preparation of 19-demethoxy-19-hydroxy-TAN-528A: — Οδ—
よく粉砕した無水塩化アルミニゥム 3.51gをベンゼンに懸歸し、 これ に T AN - 528A 2.00gを添加後、 油浴上 1時間加熟還流し、 ついで無 水塩化アルミニウム G.55gを追加し更に 1時間加熟還流した。 放冷後反 応液を 3 N塩酸中へ注ぎ、 ェチルエーテル 400mlを加えて分液し、 水層 を更にエ-テル抽出(lOOmlx 4)し、 有機層を合わせ飽和食塩水で洗浄、 乾燥(MgS 0+)後濃縮乾固して赤橙色固体 1.70gを得た。 このものをシ リ力ゲル力ラムクロマトグラフィ—(ζό 4 5 mmx 6 0 0 mm、 0.5%蓚酸含 有酢酸ェチルでカラム調製及び溶出、 溶出液は水冼後溶媒を留去する) に付して 9 7 6 mgの標記化合物を得た。 また、 3 7 7 mgの原料化合物を3.51 g of well-milled anhydrous aluminum chloride was suspended in benzene, 2.00 g of TAN-528A was added thereto, and the mixture was ripened and refluxed for 1 hour in an oil bath, and then G.55 g of anhydrous aluminum chloride was added. The mixture was refluxed for aging. After allowing to cool, the reaction solution was poured into 3 N hydrochloric acid, 400 ml of ethyl ether was added to separate the layers, the aqueous layer was further extracted with ether (100 ml × 4), the organic layers were combined, washed with saturated saline, and dried (MgS 0 +) was concentrated to dryness to give a red-orange solid 1.70g. This was subjected to silica gel gel column chromatography (ζό45 mm x 600 mm, column preparation and elution with 0.5% oxalic acid-containing ethyl acetate, and the eluate was diluted with water and the solvent was distilled off). 976 mg of the title compound were obtained. Also, 377 mg of the starting compound
10 回収した。 10 Collected.
分子量: S I MS m/e:(M+ 3 )+ 732 Molecular weight: SI MS m / e: ( M + 3) + 732
E . I . m/e M+ :729  E. I. M / e M +: 729
UVおよび可視スぺク トル: 221(ε = 42080),368(ε = 6420)  UV and visible spectrum: 221 (ε = 42080), 368 (ε = 6420)
I R v cm-1: 3450, 1655(sh), 1640(sh), 1620, 1480, 1380, max IR v cm -1 : 3450, 1655 (sh), 1640 (sh), 1620, 1480, 1380, max
0 ), r,
Figure imgf000058_0001
L 元素分折値 C37H 7N 012S . 1/2H20として
0), r,
Figure imgf000058_0001
L Elemental analysis value C 37 H 7 N 0 12 S. 1 / 2H 20
計算値 C 60.15; H 6.55; 1.90; S 4.34  Calculated value C 60.15; H 6.55; 1.90; S 4.34
実測値 C 60.19; H 6.59; N 1.87; S 4.43  Found C 60.19; H 6.59; N 1.87; S 4.43
実施例 11 1 9—デメ トキシ— 1 9一へキシルォキシ— T AN— 528A 5 の製造:  Example 11 Preparation of 19-demethoxy-19-hexyloxy-TAN-528A5:
1 9—デメ トキシー 1 9—ヒ ドロキシ一 T AN— 528A 47.6mgをメタ ノ ールに溶かし、 酸化銀 15mgを添加して 30分間かきまぜたのち沃化へキ シル 83.5mgを添加して室温で 45分間攪拌した。 反応液をろ過後濃縮乾固 し、 残留物をプレパラティブ— T L C (メルク Art NO. 5715, 200 x 2000 龍, 2枚,展開溶媒:クロ口ホルム/アセトン = 2/ 1 )に付し、 目的のバ ンドをかきとり、 クロ口ホルム/メタノール = 6 / 1で溶出し、 溶出液 をろ過後減圧乾固し、 30.8mgの目的物を得た。 このものをアセ ト ン—へ キサンから再沈殿して 16.2 m gの純品の標記化合物を得た。  1 9—Demethoxy 1 9—Hydroxy TAN—Dissolve 47.6 mg of TAN-528A in methanol, add 15 mg of silver oxide, stir for 30 minutes, add 83.5 mg of hexyl iodide and room temperature. Stir for 45 minutes. The reaction solution was filtered, concentrated to dryness, and the residue was subjected to preparative TLC (Merck Art NO. 5715, 200 x 2000 dragons, 2 sheets, developing solvent: Cloth form / acetone = 2/1). Was eluted with chloroform / methanol = 6/1, and the eluate was filtered and evaporated to dryness under reduced pressure to obtain 30.8 mg of the desired product. This was reprecipitated from acetone-hexane to obtain 16.2 mg of the pure title compound.
融点: i33〜135°C (分解) ' Melting point: i33 ~ 135 ° C (decomposition) ''
5 NMR(90 Hz, CD Cl3)<5: 0.7 - 0.9(12H, m) , 1.21(3H, d, J = 6.5Hz) , 5 NMR (90 Hz, CD Cl 3 ) <5: 0.7-0.9 (12H, m), 1.21 (3H, d, J = 6.5Hz),
1.28C6H.br. s), 1.70(2H,m)) 2.00(3H(s), 2.17(3H,s), 2.28(3H,s),1.28C6H.br.s), 1.70 (2H, m) ) 2.00 (3H ( s), 2.17 (3H, s), 2.28 (3H, s),
2.35(311, 3) , 2.5— 2.7(lH,m), 2.83(1H, dd, J = 2.5Hz & ca.2.5Hz), 3.4-3.65(2H,m), 3.70(3H,s), 3.8 - 4.3(4H, in, 19 -OCH2 - , 9 -H , 11 -H), 4.10(lH,s,重水添加で消失), 4.38(lH,dJ = 7,重水添加で消0 失), .67(lH,d, J = 9Hz, 重水添加で消失), 5.76(1H, d, J = 9Ηζ) , 2.35 (311, 3), 2.5-2.7 (lH, m), 2.83 (1H, dd, J = 2.5Hz & ca.2.5Hz), 3.4-3.65 (2H, m), 3.70 (3H, s), 3.8 -4.3 (4H, in, 19-OCH2-, 9-H, 11-H), 4.10 (disappears with lH, s, addition of heavy water), 4.38 (lH, dJ = 7, disappears with addition of heavy water),. 67 (lH, d, J = 9Hz, disappeared by adding heavy water), 5.76 (1H, d, J = 9Ηζ),
5.77(1H, dd,J=15Hz & 8Hz), 6.42(1H, d, J = 11Hz) , 6.95(lH,dd, J = 15Hz & 11Hz), 8.38(lH,s,重水添加で消失), 12.00(1H, s,重水 添加で消失)  5.77 (1H, dd, J = 15Hz & 8Hz), 6.42 (1H, d, J = 11Hz), 6.95 (lH, dd, J = 15Hz & 11Hz), 8.38 (lH, s, disappeared by adding heavy water), 12.00 (1H, s, disappeared by adding heavy water)
元素分圻値 C+3H53N012S · I/2H2OElement value C +3 H 53 N0 12 SI / 2H2O
5 計算値: C ,62. '75; H.7.35; N.1.70 5 Calculated: C, 62. '75; H.7.35; N.1.70
実測値: C, 62.81; H.7.36; N.1.80 実施例 12— 23 Found: C, 62.81; H.7.36; N.1.80 Example 12-23
実施例 1 i と同様の方法でそれぞれ下記の沃化ーまたは臭化アルキル を用いて対応する 1 9ーデメ トキシー 1 9一アルキルォキシ一 TAN— 528Aを得た。  In the same manner as in Example 1i, the corresponding 19-demethoxy-19-alkyloxy-1 TAN-528A was obtained using the following alkyl iodide or alkyl bromide, respectively.
実施例 12 1 9—デメ トキシ— 1 9—(2—クロ口エトキン)一 TAN— Example 12 19—Demethoxy—19— (2-Etoquinone) TAN—
528A  528A
アルキル化剤: 2—ク σσェチルプロミ ド  Alkylating agent: 2-k σσ-ethylpromide
NMR(90MHz, C D C 13)δ: 0.80, 0.93, 1.00(各 3H,d, J = 6.5Ηζ) , 1.23(3H,d,J = 6.5Hz)) 2.07, 2.13, 2.27, 2.33(各 3H, s) ,。 2.71(iH, d, J = 3Hz), 3.3-3.6(2H,ni)) 3.6- 4.0(4H,m, 19-0CH2CH2C1) , 3.83(3H, s), 4.1-4.4(2H,m), 5.65(lH,d, J= 11Hz) , 5.77(lH,dd, j = 15Hz & 6Hz), 6.38(-lH,d, J = llHz), 7.20(lH,dd, J- 15Hz & 11Hz), 8.10(1H, s,重水添加で消失), 12.17(lH,s,重水添加で消失) NMR (90MHz, CDC 1 3) δ: 0.80, 0.93, 1.00 ( each 3H, d, J = 6.5Ηζ) , 1.23 (3H, d, J = 6.5Hz)) 2.07, 2.13, 2.27, 2.33 ( each 3H, s),. 2.71 (iH, d, J = 3Hz), 3.3-3.6 (2H, ni) ) 3.6- 4.0 (4H, m, 19-0CH 2 CH 2 C1), 3.83 (3H, s), 4.1-4.4 (2H, ni m), 5.65 (lH, d, J = 11Hz), 5.77 (lH, dd, j = 15Hz & 6Hz), 6.38 (-lH, d, J = llHz), 7.20 (lH, dd, J-15Hz & 11Hz) ), 8.10 (1H, s, disappeared by adding heavy water), 12.17 (lH, s, disappeared by adding heavy water)
実施例 13 1 9—デメ トキシ— 1 9— p-キシリルォキシ - T A N -528A アルキル化剤: p—キシリルブロミ ド Example 13 19-demethoxy-19-p-xylyloxy-TAN-528A Alkylating agent: p-xylyl bromide
N MR (90 Hz, CD C ")ό、: 0.85 - 0.95(9Η, m) , 1.23(3Η, d, J = 6.5Hz) , 2.03, 2.20, 2.23, 2.36, 2.39(各 3H,s), 2.85(1Η, br. s) , 3.35- 3.65(2H,m), 3.70(3H,s), 3.7- .9(ca.4ΙΙ,ιη) , 5.75(1H, d, J = 12Hz) , 5.80(lH(dd, J = 15Hz & 9Hz), 6.43(1H, d, J = 10Hz) , ca.7.0(1H, m, 4- H), 7.21, 7.30(各 2H,d J=9Hz), 8.37(lH,s), 12.0CiH.br) N MR (90 Hz, CD C ") ό, 0.85-0.95 (9Η, m), 1.23 (3Η, d, J = 6.5Hz), 2.03, 2.20, 2.23, 2.36, 2.39 (3H, s), 2.85 (1Η, br.s), 3.35- 3.65 (2H, m), 3.70 (3H, s), 3.7-.9 (ca.4ΙΙ, ιη), 5.75 (1H, d, J = 12Hz), 5.80 ( lH ( dd, J = 15Hz & 9Hz), 6.43 (1H, d, J = 10Hz), ca.7.0 (1H, m, 4-H), 7.21, 7.30 (2H, d J = 9Hz each), 8.37 ( lH, s), 12.0CiH.br)
実施例 14 1 9—デメ トキシー 1 9ーァリルォキシ— T A N— 528 A アルキル化剤:沃化ァリル Example 14 19-Demethoxy 19-aryloxy-TAN-528A Alkylating agent: allyl iodide
融点:U6〜i48°C  Melting point: U6 ~ i48 ° C
N MR (90MHz, C D C 13)<5: 0 , 73, 0.79 , 0.87 J.22(各 3H, d, J = 6.5 ),2.00,2.18,2.25,2.37(各3!1,3),2.83 (lH.dd, J- 2.5Hz & ca.2.5 N MR (90MHz, CDC 1 3 ) <5: 0, 73, 0.79, 0.87 J.22 ( each 3H, d, J = 6.5) , 2.00,2.18,2.25,2.37 (! Each 3 1, 3), 2.83 (lH.dd, J-2.5Hz & ca.2.5
Hz), 3.35 - 3.65(2H,m)> 3.70(3H,s), 4.0-4.75(ca.7H,m,CH2 = CH- CH2 -0, 9-H, 11-H, 0HX3), 5.15 - 5.45(2H, m, CH2 = CHCH20) , 5.65 -Hz), 3.35-3.65 (2H, m) > 3.70 (3H, s), 4.0-4.75 (ca.7H, m, CH 2 = CH- CH 2 -0, 9-H, 11-H, 0HX3), 5.15-5.45 (2H, m, CH 2 = CHCH 20 ), 5.65-
6.3(3H, tn,CH2 = CHCH20, 15- , 5-H), 6.41(1H, dd, J = 10Hz & 1.5 Hz), 6.95 (lH.dd, J=15Hz &10Hz), 8.34(111, s ,重水添加で消失), 12.00(lH,s, 重水添加で消失) 6.3 (3H, tn, CH2 = CHCH 2 0, 15-, 5-H), 6.41 (1H, dd, J = 10Hz & 1.5 Hz), 6.95 (lH.dd, J = 15Hz & 10Hz), 8.34 (111, s, disappeared by adding heavy water), 12.00 (lH, s, disappeared by adding heavy water)
元素分折値 C+0H51N 012Sとして Elemental analysis value C +0 H 51 N 0 12 S
計算値 C 62.40; H 6.68; 1.82  Calculated value C 62.40; H 6.68; 1.82
実測値 C 62.15; H 6.68; N 1.89  Found C 62.15; H 6.68; N 1.89.
実施例 15 1 9ーデメ トキシ— 1 9—エトキジ— TAN— 528 A Example 15 19-Demethoxy-19-Ethoxy-TAN-528A
アルキル化剤:沃化工チル  Alkylating agent: iodide chill
融点:1_54~156°C (分解)  Melting point: 1_54 ~ 156 ° C (decomposition)
NMROOMHz, C D C 13)<5: 0.73, 0.79, 0.87 (各 3H. d, J = 6.5Ηζ) , i.l- 1.3(3H,m)( 1.33(3H)d,J = 6.5Hz)19-CH3CH20), 2.00, 2.17, 2.24, 2.37(各311,3), 2.83(1H, dd, J = 2.5Hz & ca.2.5Hz), 3.35- 3.7(2H,m), 3.70(3H,s), 3.8- 4.3(4H, m,"l9 -CH3CH20, 9-H, 11-H), 4.07(lH,s,重水 加で消失), SSdH.d.J^SHz,重水添加で消失), NMROOMHz, CDC 1 3) <5 : 0.73, 0.79, 0.87 (. Each 3H d, J = 6.5Ηζ), il- 1.3 (3H, m) (1.33 (3H) d, J = 6.5Hz) 19-CH 3 CH 2 0), 2.00, 2.17, 2.24, 2.37 (311, 3 each), 2.83 (1H, dd, J = 2.5Hz & ca.2.5Hz), 3.35-3.7 (2H, m), 3.70 (3H, s ), 3.8- 4.3 (4H, m , "l9 -CH 3 CH 2 0, 9-H, 11-H), 4.07 (lH, s, disappeared in heavy water pressure), SSdH.dJ ^ SHz, disappeared heavy water addition ),
4.63(iH,d, J = 9Hz, 重水添加で消失), 5.70(lH,dd, J = iOHz & 1.5Hz), 5.77(lH,dd, J = 15Hz & 9Hz), 6.42(lH,d, J = 11Hz) , 6.95 (LH.dd, J = 15Hz & 11Hz), 8.37(1H, s,重水添加で消失), 12.00(1H, s,重水添加で消失) 4.63 (iH, d, J = 9 Hz, disappeared by adding heavy water), 5.70 (lH, dd, J = iOHz & 1.5 Hz), 5.77 (lH, dd, J = 15 Hz & 9 Hz), 6.42 (lH, d, J = 11Hz), 6.95 (LH.dd, J = 15Hz & 11Hz), 8.37 (disappears when 1H, s, heavy water is added), 12.00 (disappears when 1H, s, heavy water is added)
元素分折値 C33HwNO 12Sとして Element analysis value C 33 HwNO 12 S
計算値 C 61.81; H 6.78; 1.85  Calculated value C 61.81; H 6.78; 1.85
実測値 C 62.05 ; H 6.95; 1.93  Found C 62.05; H 6.95; 1.93
実施例 16 1 9—デメ トキシー 1 9—力ルバモイルメ トキシー TAN— Example 16 19—Demethoxine 19—Power Rubamoyl Methoxy TAN—
528A  528A
アルキル化剤: 2—ョ— ドアセトアミ ド  Alkylating agent: 2-deacetamide
融点: 167〜170°C (分解) MR (90MHz, CD Cl3)5 : 0.7- 0.9 (9H, m) , 1.15 - 1.3(3H, m) ,Melting point: 167-170 ° C (decomposition) MR (90MHz, CD Cl 3 ) 5: 0.7- 0.9 (9H, m), 1.15-1.3 (3H, m),
2.00, 2.18, 2.28, 2.40(各 3H,s), 2.85(1H, dd, J = 2.5Hz & 2Hz) , 3.4-3.8(ca.2H,m), 3.70(3H,s), 4.0 - 4.3(ca.2H, m) , 4.24, 4.58 (各111,(1,】=15112,112^0^20-),4.3— 4.7 &.2}1,1)1>,重水添加で消失), 5.76(iH,dd, J=15Hz & 11Hz) , 5.82(1H, d, J = 11Hz) , ca.6.0 , ca.6.92.00, 2.18, 2.28, 2.40 (each 3H, s), 2.85 (1H, dd, J = 2.5Hz & 2Hz), 3.4-3.8 (ca.2H, m), 3.70 (3H, s), 4.0-4.3 ( ca.2H, m), 4.24, 4.58 ( each 111, (1,] = 15112,11 2 ^ 0 ^ 2 0 -), 4.3- 4.7 & .2} 1,1) 1>, disappeared in heavy water addition) , 5.76 (iH, dd, J = 15Hz & 11Hz), 5.82 (1H, d, J = 11Hz), ca.6.0, ca.6.9
Og"lH,br, 2NCO-),6.42(aH,ci,J = 10Hz), 6.95(1H, d, J = 15Hz &10Hz), 8.37(lH,s,重水添加で消失), 12.08(lH,br.s,重水添加で消失) 元素分折値 C39H50N2O 13S · 3/2H20として Og "lH, br, 2 NCO-), 6.42 (aH, ci, J = 10Hz), 6.95 (1H, d, J = 15Hz & 10Hz), 8.37 (lH, s, dissipated by adding heavy water), 12.08 (lH, br.s, disappeared by adding heavy water) Elemental analysis value C 39 H 50 N 2 O 13 S · 3 / 2H 20
計算値 C 57.55; H 6.56; N 3.44  Calculated C 57.55; H 6.56; N 3.44
実測値 C 57.28; H 6.37; N 3.39  Found C 57.28; H 6.37; N 3.39
実施例 Γ7 1 9 -デメ トキシ -1 9 -フヱナシルォキシ - T AN- 528A アルキル化剤:フヱナシルブロミ ド Example Γ7 19-Demethoxy-19-Panasiloxy-TAN-528A Alkylating agent: Panacil bromide
融点: 149〜150=C . .Melting point: 149-150 = C ...
MR (90MHz, CD Cl3)5: 0.69, 0.77, 0 · 86(各 3H, d, J = 7 · 5Hz) , 1.22(3H,d, J-6.5Hz), 1.97, 2.18(各 3H, br. s), 2.27 , 2.37(各 3H,s),MR (90MHz, CD Cl 3 ) 5: 0.69, 0.77, 0 · 86 (each 3H, d, J = 7.5Hz), 1.22 (3H, d, J-6.5Hz), 1.97, 2.18 (each 3H, br s), 2.27, 2.37 (3H, s each),
2.28(lH,br.s), 3.35 - 3.6δ(2Η, m) , 3.70(3H.s), 4.0 KlH, br. s ,重水 添加で消失), 4.1— 4.3(2H,m),4.37(lH,d, J = 7.5Hz,重水添加で消失), 4.62(lH,d, J = 9Hz,重水添加で消失), 5.01, 5.75(各 1H, d, J = 16Hz) , o.6-6.0(2H,m)) 6.42(1H, br .d, J= 10Hz) , 6.9.5(lH,dd, J = ΙδΗζ & 10Hz), 7.4—7.7(3H,m), 7.85- 8.0(2H, m) , 8.34(lH,s,重水添加で消 失), 12.00(iH,s,重水添加で消失) 2.28 (lH, br.s), 3.35-3.6δ (2Η, m), 3.70 (3H.s), 4.0 KlH, br.s, disappeared by adding heavy water), 4.1—4.3 (2H, m), 4.37 ( lH, d, J = 7.5 Hz, disappeared by adding heavy water), 4.62 (lH, d, J = 9 Hz, disappeared by adding heavy water), 5.01, 5.75 (1H, d, J = 16 Hz each), o.6-6.0 (2H, m) ) 6.42 (1H, br .d, J = 10Hz), 6.9.5 (lH, dd, J = ΙδΗζ & 10Hz), 7.4--7.7 (3H, m), 7.85-8.0 (2H, m ), 8.34 (dissipated by adding lH, s, heavy water), 12.00 (dissipated by adding iH, s, heavy water)
元素分折値 C45H53N 013S · H20として As elemental folding value C 45 H 53 N 0 13 S · H 2 0
計算値 C 62.41; H 6.40; N 1.62  Calculated value C 62.41; H 6.40; N 1.62
実測値 C 62.44; H 6.24; N 1.73  Found C 62.44; H 6.24; N 1.73
実施例 18 1 9—デメ トキシー 1 9ーフヱナシルォキシ一 T A N— 528 Example 18 19—Demethoxy 19-Panasiloxy TAN—528
Aアルドール(実施例 1 7の化合物と同時に得られた。 ) N R (90MHz, C D C l3)<5 : 0.70, 0.74, 0.87, 1.22(各 3H, d, J = 6.5 Hz), i.6G(ca.2H,br,重水添加で消失), 1.96, 2.17(各 3H, br. s) , 2.21, 2.34(各 3H,s), 2.82(lH,br.s), 3.3- 3.5(2H,m) , 3.69(3H,s), 4.06(lH,s,重水添加で消失), .05- 4.30(2Η,Μ), 4.42(lH,d, J = 6HZ, 重水添加で消失), SS lH.dJ-lQHz,重水添加で消失), .64(lH,d,A aldol (obtained simultaneously with the compound of Example 17) NR (90 MHz, CDC l 3 ) <5: 0.70, 0.74, 0.87, 1.22 (each 3H, d, J = 6.5 Hz), i.6G (ca.2H, br, disappeared by adding heavy water), 1.96, 2.17 ( 3H, br.s), 2.21, 2.34 (3H, s), 2.82 (lH, br.s), 3.3-3.5 (2H, m), 3.69 (3H, s), 4.06 (lH, s, heavy water .05- 4.30 (2Η, Μ), 4.42 (lH, d, J = 6HZ, disappeared with heavy water), SS lH.dJ-lQHz, disappeared with heavy water), .64 (lH, d ,
J = 10Hz), 5.50(lH,s,重水添加で消失, 17- Og), 5.73(lH,s, ^ COCH) , o.77(lH,dd, J = 16Hz & 9Hz), 6.41(1H, d, J = 10Hz) , 6.97(1H, dd, J = 16Hz & 10Hz), 7.3—7.7(3H,m), 7.8- 7.95(2H, m) , 8.50(lH,s,重水 添加で消失), 11.2— 11.6 (IH , b r ,重水添加で消失) J = 10Hz), 5.50 (lH, s, disappeared by adding heavy water, 17-Og), 5.73 (lH, s, ^ COCH), o.77 (lH, dd, J = 16Hz & 9Hz), 6.41 (1H, d, J = 10Hz), 6.97 (1H, dd, J = 16Hz & 10Hz), 7.3-7.7 (3H, m), 7.8-7.95 (2H, m), 8.50 (lH, s, disappeared by adding heavy water), 11.2— 11.6 (disappears when IH, br, heavy water is added)
実施例 19 1 9—デメ トキシー 2 1 —デヒ ドロキシー 1 9 , 2 1 —ビスExample 19 19-demethoxy 21-dehydroxy 19,21-bis
—フヱナシルォキシ— T A Ν— 528 Α (実施例 1 7 , 1 8の化 合物と同時に得られた。 ) —Panasiloxy—T A Ν—528 mg (obtained simultaneously with the compounds of Examples 17 and 18)
NxMR (90MHz, C D C 13) δ: 0.67(3H, d, J = 6Hz) , 0.77, 0.89(各3 (1, J = 7Hz), 1.23(3H,d, J = 6.5Hz), 1.6(ca.2H, br) , 2.00, 2.16(各 3H; br.s), 2.35, 2.4·0(各 3H,s), 2.82(1H, r . s) , 3.35 - 3.65(2H,m), NxMR (90MHz, CDC 1 3) δ: 0.67 (3H, d, J = 6Hz), 0.77, 0.89 ( each 3 (1, J = 7Hz) , 1.23 (3H, d, J = 6.5Hz), 1.6 (ca .2H, br), 2.00, 2.16 (each 3H; br.s), 2.35, 2.40 (each 3H, s), 2.82 (1H, r.s), 3.35-3.65 (2H, m),
3.71(3H,s), 4.05-4.3δ(2Η,(η), 4.43(1H, d, J = 8Hz) . 4.67(lH,d, J = 9Hz), 5.08, 5.25, 5.64, 5.72(各 1H, d, J = 16Hz) , 5.70(lH,d, J = 101I: , 5.85(iH,dd, J = loHz & 10Hz), 6.41(1H, d, J = 11Hz) , 6.91 (lH.dd, J = 15Hz & 11Hz), 7.4- 7.7(6H, m) , 7.85-8. l(4H,m), 8.60 (IH.s) 3.71 (3H, s), 4.05-4.3δ (2Η, (η), 4.43 (1H, d, J = 8Hz) .4.67 (lH, d, J = 9Hz), 5.08, 5.25, 5.64, 5.72 (each 1H , d, J = 16 Hz), 5.70 (lH, d, J = 101I), 5.85 (iH, dd, J = loHz & 10 Hz), 6.41 (1H, d, J = 11 Hz), 6.91 (lH.dd, J = 15Hz & 11Hz), 7.4- 7.7 (6H, m), 7.85-8.l (4H, m), 8.60 (IH.s)
実施例 20 1 9—デメ トキシ— 1 9一( 2—フヱノキシェトキシ)— T A Example 20 19-Demethoxy-191- (2-Phenoxhetoxy) -TA
N- 528A  N-528A
ァルキル化剤: 2—フヱノキシェチルョ—ジ ド  Alkylating agent: 2-phenolic acid
融点: 133〜135。C  Melting point: 133-135. C
NMR(90MHz, CD Cl3)(5: 0.73, 0.80, 0.88(各 3H. d, J = 6.5Hz) ,NMR (90 MHz, CD Cl 3 ) (5: 0.73, 0.80, 0.88 (each 3H.d, J = 6.5 Hz),
1.2-1.3(3H,m), 2.01, 2.18(各 3Η, br . s), 2.67, 2.71(各 3H,s), 2.83ClH,br.s), 3.4- 3.6δ(2Η, m) , 3.70(3H,s), 4.06(1H, s ,重水添加 で消失), 4.05 4.5(711,111,ぅち111分は重水添加で消失), 4.63(lH,d,J = 8Hz,重水添加で消失), 5.73(lH,d, J = llHz), 5.80(lH,dd, J = 14Hz &9Hz), 6.43(lH,br.d, J = llHz), 6.8 7.1(4H, m) , 7.2 - 7. (2H, m) , 8.36(lH,s,重水添加で消失), 12.00(lH,s,重水添加で消失) 1.2-1.3 (3H, m), 2.01, 2.18 (3Η, br.s), 2.67, 2.71 (3H, s), 2.83ClH, br.s), 3.4-3.6δ (2Η, m), 3.70 (3H, s), 4.06 (1H, s, disappeared by adding heavy water), 4.05 4.5 (711, 111, and 111 minutes are heavy water Addition), 4.63 (lH, d, J = 8 Hz, disappearance with heavy water addition), 5.73 (lH, d, J = llHz), 5.80 (lH, dd, J = 14 Hz & 9 Hz), 6.43 (lH, br. d, J = llHz), 6.8 7.1 (4H, m), 7.2-7. (2H, m), 8.36 (disappears when adding lH, s, heavy water), 12.00 (disappears when adding lH, s, heavy water)
元素分忻値 C45H5SNO 13S · 1/2H20として As elemental忻値 C 45 H 5S NO 13 S · 1 / 2H 2 0
計算値 C 62.92; H 6.57; N 1.63  Calculated value C 62.92; H 6.57; N 1.63
実測値 C 63.04; H 6.56; N 1.63  Found C 63.04; H 6.56; N 1.63
実施例 21 1 9ーデメ トキシ— 1 9—(2 , 3—エポキシプロボキシ)一 Example 21 19-demethoxy-19- (2,3-epoxypropoxy)
TAN - 528 A  TAN-528 A
アルキル化剤:ェピブロ乇ヒ ドリ ン  Alkylating agent: Epibrohydrin
融点: 150〜し 52°C (分解)  Melting point: 150 ~ 52 ° C (decomposition)
NMR(90MHz, CD Cl3)5: 0.70, 0.79, 0.87, 1.22(各 3H,d, J = 6.5 Hz), 1.7(ca.2H,br.重水添加で消失), 2.01, 2.19(各 3H, br. s), 2.29, 2.37(各 3H,s), 2.6- 2.7(1Η,πι), 2.8 - 2.9(2Ή, m) , 3.2 - 3.6(3H, m) ,NMR (90 MHz, CD Cl 3 ) 5: 0.70, 0.79, 0.87, 1.22 (each 3H, d, J = 6.5 Hz), 1.7 (ca.2H, disappeared by adding br. Heavy water), 2.01, 2.19 (each 3H, br.s), 2.29, 2.37 (3H, s), 2.6-2.7 (1Η, πι), 2.8-2.9 (2Ή, m), 3.2-3.6 (3H, m),
3.70(3H,s), 4.05(iH,s,重水添加で消失), 4.1一 4.7(6H,m,うち 2ίί分 ':ま重水添加で消失), .73(lH,br.d, J = 10Hz), 5.80(lH,dd, J= 15Hz . & SHz), 6.42(lH,br.d, J- lOIIz), 6.95(111, dd, J = 15Hz & 10Hz), 8.35(lH,s,重水添加で消失), 12.01(lH,br.重水添加で消失) 3.70 (3H, s), 4.05 (disappears when iH, s, heavy water is added), 4.1-4.7 (6H, m, of which 2 min ': disappears when heavy water is added), .73 (lH, br.d, J = 10Hz), 5.80 (lH, dd, J = 15Hz. & SHz), 6.42 (lH, br.d, J-lOIIz), 6.95 (111, dd, J = 15Hz & 10Hz), 8.35 (lH, s, heavy water Disappeared by addition), 12.01 (disappeared by adding lH, br. Heavy water)
元素分忻値 C+0H51N 013Sとして Elemental Xin value as C +0 H 51 N 0 13 S
計算値 C 61.13; H 6.54; N 1.78  Calculated C 61.13; H 6.54; N 1.78
"実測値 C 60.89 ; H 6.53; N 1.81  "Measured C 60.89; H 6.53; N 1.81
実施例 22 1 9ーデメ トキシー 1 9一へプチルォキシ— TAN— 528A アルキル化剤:臭化へプチル Example 22 19-demethoxy-19-heptyloxy-TAN-528A Alkylating agent: heptyl bromide
融点: 129〜; L31°C  Melting point: 129 ~; L31 ° C
NMR (90MHz, C D C 13) <5: 0.73(3H, d, J= 6. δΗζ) , 0.79(3H,d, J = 7.5Hz), 0.87. 1.23(各 3 H,d,J = 7Hz), 0.87(3H, t J = ca.7Hz,へプチ ル基の末端- C旦 3), 1.2— 1.4(8H,br.ヘプチル基のメチレンプロ ト ン), 1.65(ca.2H,br,重水添加で消失), 1.73(2H, m,ヘプチル基の /3 - (^2) . 2.01, 2.18(各 3H,br.s), 2.24, 2.37(各 3H,s). 2.83(lH,br.s), 3.35 -3.6(2H,m)) 3.7- .3(4H,m, 9-H, 11-H, ヘプチル基の a - C旦 2) , NMR (90MHz, CDC 1 3) <5: 0.73 (3H, d, J = 6. δΗζ), 0.79 (3H, d, J = 7.53), 0.87. 1.23 (3H, d, J = 7Hz each), 0.87 (3H, tJ = ca.7Hz, terminal of heptyl group-C3), 1.2-1.4 (8H, br. 1.65 (ca.2H, br, disappeared by addition of heavy water), 1.73 (2H, m, / 3 / (^ 2 ) of heptyl group) 2.01, 2.18 (3H, br.s ), 2.24, 2.37 (3H, s). 2.83 (lH, br.s), 3.35-3.6 (2H, m) ) 3.7- .3 (4H, m, 9-H, 11-H, a-C day 2 ),
4.08(lH,s,重水添加で消失), 4.38aH,d,J = 8Hz,重水添加で消失), 4.64(lH,d, J = 9Hz,重水添加で消失), 5.73(lH,d, J = 11Hz) , 5.77(1H, dd, J=15.5Hz & 10Hz), 6. 2(1H, br . d, J = lOHz) , 6.93(lH,dd, J = 15.5Hz & 10Hz), 8.34(lH,s,重水添加で消失), 11.97(1H, s,重水添 加で消失) 4.08 (lH, s, disappeared by adding heavy water), 4.38aH, d, J = 8 Hz, disappeared by adding heavy water), 4.64 (lH, d, J = 9 Hz, disappeared by adding heavy water), 5.73 (lH, d, J = 11Hz), 5.77 (1H, dd, J = 15.5Hz & 10Hz), 6.2 (1H, br.d, J = 10Hz), 6.93 (lH, dd, J = 15.5Hz & 10Hz), 8.34 (lH , s, disappeared by adding heavy water), 11.97 (1H, s, disappeared by adding heavy water)
元素分析値 C 4HeiN012S · 1/2H20として As Elemental analysis C 4 H ei N0 12 S · 1 / 2H 2 0
計算値 C 63.14; H 7.47; N 1.67  Calculated value C 63.14; H 7.47; N 1.67
実測値 C 62.74; H 7.34; 1.93  Found C 62.74; H 7.34; 1.93
実施例 23 1 9—デメ トキシ— 1 9—ヘプチルォキシー TAN— 528A ラク 卜 ン ' Example 23 19—Demethoxy—19—Heptyloxy TAN—528A lactone
実施例 2 2の化合物と同時に得られる。  Obtained simultaneously with the compound of Example 22.
融点:〖61~163°C  Melting point: 〖61 ~ 163 ° C
.\ MR (90MHz, C D C 13)(5: 0.80, 0.92, 1.00, 1.22(各 3H,d. J = 6.5 Hz), 0.90(3H,t, J = ca.7Hz, ヘプチル基の末端 C 3) , 1.2 - 1.4(8H, br, ヘプチル基のメチレンプロ ト ン), 1.5—1.8(2H,m,ヘプチル基の -プ 口 ト ン), 2.07, 2.13(各 3H,br.s), 2.25, 2·34(各 3H,s), 2.70(ca.4H, m,6-H, 8-H, 12-H, 14 -H), 3.4 - 4.4(ca.7H, m,うち 1H分は重水添加で 消失,ヘプチル基の α -プロ ト ン, 7- 1_, 10-H, 11-H, 13 -Η), 5.67(lH,d, J = 12Hz)(..5.79(lH,dd) J-15Hz & 6Hz) , 6.35(lH,d, J = 10Hz), 7.24 (lH,dd,J = 15Hz & 10Hz), 8.13(lH,s,重水添加で消失), 12.13(lH,s, 重水添加で消失) 元素分折値 C+3H57NO nS · 2 H20として . \ MR (90MHz, CDC 1 3) (5:. 0.80, 0.92, 1.00, 1.22 ( each 3H, d J = 6.5 Hz) , 0.90 (3H, t, J = ca.7Hz, terminal C 3 heptyl ), 1.2-1.4 (8H, br, methyleneproton of heptyl group), 1.5-1.8 (2H, m, -heptone of heptyl group), 2.07, 2.13 (3H, br.s), 2.25 , 2 · 34 (3H, s), 2.70 (ca.4H, m, 6-H, 8-H, 12-H, 14-H), 3.4-4.4 (ca.7H, m, of which 1H Disappears upon addition of heavy water, α-proton of heptyl group, 7-1_, 10-H, 11-H, 13-Η), 5.67 (lH, d, J = 12Hz) ( ..5.79 (lH, dd ) J-15Hz & 6Hz), 6.35 (lH, d, J = 10Hz), 7.24 (lH, dd, J = 15Hz & 10Hz), 8.13 (lH, s, disappeared by adding heavy water), 12.13 (lH, s, heavy water Disappears on addition) As elemental folding value C +3 H 57 NO nS · 2 H 2 0
計算値 C 62.08; H 7.39; 1.68  Calculated value C 62.08; H 7.39; 1.68
実測値 C 62.03; H 7.39; N 1.65  Found C 62.03; H 7.39; N 1.65
実施例 24 1 9ーデメ トキシー 1 9ーァセトキシー T AN— 528 Aの製 造: Example 24 Preparation of 19-demethoxy 19-acetoxy TAN-528A:
1 9ーデメ トキシー 1 9ーヒ ドロキシー TAN— 528 A 42,2mgを 5 mlのメチレンクロリ ドに溶かし、 室温でかきまぜながら塩化ァセチル 9.5mg、 ついでトリェチルァミ ン 7. Omgを添加した。 10分間かきまぜたの ち約 5mlの水を加えて有機層を分液してとり、 水洗、 乾燥(MgS O+)後 濃縮乾固して 40.3mgの赤橙色固体を得、 このものをプレパラティブ一 T L C (展開溶媒:へキサン Zァセトン = 1 / 1 )で精製して 22.9mgの標 記化合物を得た。 42,2 mg of 19-demethoxy 19-hydroxy TAN-528A was dissolved in 5 ml of methylene chloride, and 9.5 mg of acetyl chloride and then 7.O mg of triethylamine were added with stirring at room temperature. After stirring for 10 minutes, about 5 ml of water was added, and the organic layer was separated, washed with water, dried (MgS O + ), and concentrated to dryness to obtain 40.3 mg of a red-orange solid, which was prepared preparatively. Purification by one TLC (developing solvent: hexane Zacetone = 1/1) gave 22.9 mg of the title compound.
融点: 170〜173°C (分解) Melting point: 170-173 ° C (decomposition)
MR (90MHz, CD C13)(5: 0.73, 0.80, 0.83, 1.23(各 3H,d, J = 6.5 Hz), 1.8(ca.2H,br,重水添加で消失), 1.97, 2.20(各 3H, br . s) , 2.16 MR (90MHz, CD C1 3) (5: 0.73, 0.80, 0.83, 1.23 ( each 3H, d, J = 6.5 Hz ), 1.8 (ca.2H, br, disappeared in heavy water addition), 1.97, 2.20 (each 3H , br. s), 2.16
(3H,s,CH3C0-0)( 2.26, 2.38(各 3H,s), 2.83(lH,br.s), 3.35-3,7 (2H,m), 4.0-4.3δ(2Η,ιη), 4.06( , s ,重水添加で消失), 4. 2(lH,d, J = 7Hz,重水添加で消失), 4.65(lH.d, J = 9Hz,重水添加で消失), 5.72 (lH.d, J=llHz), 5.77(lH,dd, J=15Hz & 8Hz), 6. 2(1H, d, J = 10Hz) , 6.93(lH,dd,J-15Hz & 10Hz), 8.33(111, s,重水添加で消失), 11.07(3H, s, CH 3 C0-0) ( 2.26, 2.38 (3H, s each), 2.83 (lH, br.s), 3.35-3,7 (2H, m), 4.0-4.3δ (2Η, ιη ), 4.06 (, s, disappeared by adding heavy water), 4.2 (lH, d, J = 7 Hz, disappeared by adding heavy water), 4.65 (lH.d, J = 9 Hz, disappeared by adding heavy water), 5.72 (lH .d, J = llHz), 5.77 (lH, dd, J = 15Hz & 8Hz), 6.2 (1H, d, J = 10Hz), 6.93 (lH, dd, J-15Hz & 10Hz), 8.33 (111 , s, disappeared by adding heavy water), 11.07
(iH.br.s,重水添加で消失) (iH.br.s, disappeared by adding heavy water)
元素分折値 C33H49NO 13S ·Ή20として As elemental fold value C 33 H 49 NO 13 S · Ή 2 0
計算値 C 59.30 ; Η 6.51; Ν 1.77  Calculated value C 59.30; Η6.51; Ν1.77
実測値 C 59.61; Η 6.72; Ν 1.76  Found C 59.61; Η6.72; Ν1.76
実施例 25— 31 Example 25-31
実施例 2 と同様の方法で、 1 9ーデメ トキシ— 1 9—ヒ ドロキシ— T A N— 528 Aにァシルクロリ ドまたはスルホニルクロリ ドをトリェチ ルァミ ンまたはジメチルァミノ ピリ ジン存在下に反応させることにより 対応する 1 9ーデメ トキシ— 1 9一ァシルォキシ一または— 1 9ースル ホニルォキシ— T AN— 528Aを得た。 In the same manner as in Example 2, 19-demethoxy—19—hydroxy— TAN-528A is reacted with asilyl chloride or sulfonyl chloride in the presence of triethylamine or dimethylaminopyridine to give the corresponding 19-demethoxy--19-asiloxy- or -19-sulfonyloxy-TAN-528A. Obtained.
実施例 25 1 9 -デメ トキシ- 1 9 -ベンゾィルォキシ一 T AN— 528A ァシル化剤:塩化ベンゾィル Example 25 19-Demethoxy-19-benzoyloxy TAN-528A Acylating agent: benzoyl chloride
塩基:トリェチルァミ ン  Base: Triethylamine
融点: i71〜174°C (分解)  Melting point: i71-174 ° C (decomposition)
NMR(90MHz, C D C 13)δ: 0.75, 0.77, 0.87(各 3 H ,d, J = 6.5Ηζ) , 1.15- 1.3(ca.5H,m), 1.88(3H, br. s) , 2.19(6H, r . s) , 2.37(3H,s), NMR (90MHz, CDC 1 3) δ: 0.75, 0.77, 0.87 ( each 3 H, d, J = 6.5Ηζ ), 1.15- 1.3 (ca.5H, m), 1.88 (. 3H, br s), 2.19 ( 6H, r.s), 2.37 (3H, s),
2.5-2.7(ca.2H,m), 2.83(1H, br. s, 10-H) , 3. - 3.85(2H, m) , 3.70 (3H,s), 4.06(lH,s,重水添加で消失), .05 - 4.3(2H, tn) , 4.4-4.8 (2H,'br,重水添加で消失), 5.77(iH,dd, J=16Hz & 8Hz), 5.85(lH,d, J = 8Hz), 6.42(lH,d, J = 10.5Hz), 6.93(1H, dd, J = 16Hz & 10.5Hz), 7.35 - 7.75(3H,m)', 8.00 - 8.35(2H, m) , 8.39(iH,s,重水添加で消失),2.5-2.7 (ca.2H, m), 2.83 (1H, br.s, 10-H), 3.- 3.85 (2H, m), 3.70 (3H, s), 4.06 (lH, s, heavy water added Disappeared), .05-4.3 (2H, tn), 4.4-4.8 (disappeared by adding 2H, 'br, heavy water), 5.77 (iH, dd, J = 16Hz & 8Hz), 5.85 (lH, d, J = 8Hz ), 6.42 (lH, d, J = 10.5Hz), 6.93 (1H, dd, J = 16Hz & 10.5Hz), 7.35-7.75 (3H, m) ', 8.00-8.35 (2H, m), 8.39 (iH , s, disappeared by adding heavy water),
12.1Q(lH,s,重水添加で消失) 12.1Q (disappears when lH, s, heavy water is added)
元素分折値 C+ + H51NO 13Sとして Elemental analysis value C + + H 51 NO 13 S
計算値 C 63.37; H 6.16; 1.68  Calculated value C 63.37; H 6.16; 1.68
実測値 C 63.40; H 6.38; 1.60  Found C 63.40; H 6.38; 1.60
実施例 26 1 9—デメ トキシ— 1 9一力プロィルォキシ- TAN- 528 A 了シル化剤:塩化力プロィル Example 26 19-demethoxy-19-prolyloxy-TAN-528A
塩基:トリェチルァミ ン  Base: Triethylamine
融点: 138~140°C  Melting point: 138 ~ 140 ° C
NMROOMHz, CD Cl3)<5: 0.72, 0.77(各 3H,d, J = 7Hz) , 0.86, 1.22 (各 3H,d,J = 6.5Hz), ca.0.90(3H, t , J =不詳,力プロィル基の末端 C旦 3) ,NMROOMHz, CD Cl 3 ) <5: 0.72, 0.77 (each 3H, d, J = 7Hz), 0.86, 1.22 (each 3H, d, J = 6.5Hz), ca. 0.90 (3H, t, J = unknown, terminal C Dan 3 forces Puroiru group),
1.15— 1.4(ca.5H,in),:L.68(2H,quiiitet, J = 7Hz,力プロィル基の 3のメ チレンプロ ト ン), 1.95, 2.19(各 3H,br.s), 2.13, 2.37(各 3H, s),1.15—1.4 (ca.5H, in),: L.68 (2H, quiiitet, J = 7Hz, 1.95, 2.19 (each 3H, br.s), 2.13, 2.37 (each 3H, s),
2.50(2H,t,J = 7Hz,力プロィル基の α -メチレンプロ ト ン), 2.82(1Η, br.s), 3.4-3.6o(2H,m), 3.70(3H,s), 4.04(1H, s ,重水添加で消失), 4.05-4.3(2H)m), 4.40(lH,d, J= ·7Ηζ,重水添加で消失), 4.63(lH,d, J = 8Hz,重水添加で消失), 5.73(lH,d,J = 10Hz)) 5.76(lH,dd, J = 152.50 (2H, t, J = 7 Hz, α-methyleneproton of the propyl group), 2.82 (1Η, br.s), 3.4-3.6o (2H, m), 3.70 (3H, s), 4.04 ( 1H, s, disappeared by adding heavy water), 4.05-4.3 (2H ) m), 4.40 (lH, d, J = 7Ηζ, disappeared by adding heavy water), 4.63 (lH, d, J = 8Hz, disappeared by adding heavy water) ), 5.73 (lH, d, J = 10Hz) ) 5.76 (lH, dd, J = 15)
Hz & 9Hz), 6.40(lH,d,J = llHz), 6.92(1H, dd, J = 15Hz & 11Hz), 8.33(1H, s,重水添加で消失) , 12.04(1Η, s,重水添加で消失) Hz & 9Hz), 6.40 (lH, d, J = llHz), 6.92 (1H, dd, J = 15Hz & 11Hz), 8.33 (1H, s, disappeared by adding heavy water), 12.04 (1Η, s, heavy water added) Disappeared)
元素分忻修 C+3H57N 013S · 2 H20として As elemental忻修 C +3 H 57 N 0 13 S · 2 H 2 0
計算値 C 59.78; H 7.12; N 1.62  Calculated value C 59.78; H 7.12; N 1.62
実測値 C 59.59 ; H 6.83; N 1.52  Found C 59.59; H 6.83; N 1.52
実施例 27 1 9 —デメ トキシ— 1 9 -トルエンスルホニルォキシ- T AN Example 27 19-Demethoxy-19-toluenesulfonyloxy-TAN
-.528 A  -.528 A
Ύシル化剤: Ρ— トシルク σリ ド  ΎSilting agent: Ρ— Tosyl σ-lid
塩基:ジメチルアミ ノ ピリ ジン(あるいはおよびトリェチルアミ ン) 融点: 16Q〜163°C (分解)  Base: dimethylaminopyridine (or triethylamine) Melting point: 16Q-163 ° C (decomposition)
N MR (90MHz, C D C 13)<5 : 0.80(6H, d, J - 6.5Hz) , O.SKSH.d, J = N MR (90MHz, CDC 1 3 ) <5: 0.80 (6H, d, J - 6.5Hz), O.SKSH.d, J =
6.5Hz), 1.23(3Η,(ί, J = 6.5Hz), 1.64(ca.2H, br) , 1.77, 2.18(各; m, br.s), 2.34, 2.37(各 3H,s), 2. 6(3H, s , 25 -SCH3) , 2.84(1H, br . s) , 3.35-3.7(2H,m), 3.70(3H,s), 3.98(lH,s), 4.0 - 4.3(2H,ra) , 4.45 (lH,d, J = '7Hz), 4.67(lH,d, J = 8Hz), 5.79(1H, dd, J = 16Hz & 9Hz),6.5Hz), 1.23 (3Η, (ί, J = 6.5Hz), 1.64 (ca.2H, br), 1.77, 2.18 (each; m, br.s), 2.34, 2.37 (each 3H, s), 2 . 6 (3H, s, 25 -SCH 3), 2.84 (. 1H, br s), 3.35-3.7 (2H, m), 3.70 (3H, s), 3.98 (lH, s), 4.0 - 4.3 (2H , ra), 4.45 (lH, d, J = '7Hz), 4.67 (lH, d, J = 8Hz), 5.79 (1H, dd, J = 16Hz & 9Hz),
5.93(lH,d, J = 10Hz), 6.42(lH(d, J = llHz), 6.92(1H, dd, J = 16Hz & 11Hz), 7.32, 7.78(各 2H,d,J = 8Hz), 8.31(lH,s), 12.08(iH,s) 元素分圻値 CH53N 014S 2として 5.93 (lH, d, J = 10Hz), 6.42 (lH ( d, J = llHz), 6.92 (1H, dd, J = 16Hz & 11Hz), 7.32, 7.78 (2H, d, J = 8Hz each), 8.31 (lH, s), 12.08 (iH, s) Elemental Q value C + ÷ H 53 N 0 14 S 2
計算値 C 59.78 ; H 6.04; N 1.58  Calculated value C 59.78; H 6.04; N 1.58
実測値 C 59.74 ; H 6.17; N 1.49  Found C 59.74; H 6.17; N 1.49
実施例 28 1 9 —デメ トキシー 2 1 —デヒ ドロォキシ— 1 9 , 2 1 —ビ ス一 p— トシルォキシ一 TAN— 528 A Example 28 19—Demethoxy 21—Dehydroxy—19, 21—Bi S-1p—Tosyloxy-1 TAN—528A
ァシル化剤,塩基は実施例 2 7におけると同じ  The acylating agent and base are the same as in Example 27
融点:157~160°C (分解)  Melting point: 157 ~ 160 ° C (decomposition)
NMROOMHz.CD Cl3)5: 0.74(6H. t , J = 6.5Hz) , 0.86(3H,d,J = NMROOMHz.CD Cl 3 ) 5: 0.74 (6H.t, J = 6.5Hz), 0.86 (3H, d, J =
7.5Hz), 1.23(3H,d, J = 6.5Hz), 1.64(ca.3H, br) , 1.77(3H, br. s), 7.5Hz), 1.23 (3H, d, J = 6.5Hz), 1.64 (ca.3H, br), 1.77 (3H, br.s),
1.83(3H,s), 2.19(3H,br.s), 2.32(3H,s), 2.46(6H,s), 2.82(lH,br. s), 3.70(3H,s), 3.35-.3.7(2H,m), 4.12(lH,s), 4.1 - 4.3(2H, m) , 4.45(lH,d,J = 8Hz)( 4.70(1H, d, J = 9Hz) , 5.79(lH,dd, J = 15Hz & 1.83 (3H, s), 2.19 (3H, br.s), 2.32 (3H, s), 2.46 (6H, s), 2.82 (lH, br.s), 3.70 (3H, s), 3.35-.3.7 (2H, m), 4.12 (lH, s), 4.1-4.3 (2H, m), 4.45 (lH, d, J = 8Hz) ( 4.70 (1H, d, J = 9Hz), 5.79 (lH, dd, J = 15Hz &
8Hz), 5.84(lH,d, J = llHz), 6.40(1H, d, J = lOHz) , 6.86(1H, dd, J = 15Hz & 10Hz), 7.30, 7.35, 7.73, 7.77(各 2H,d, J = 8Hz) , 8.53(1H, s)  8Hz), 5.84 (lH, d, J = llHz), 6.40 (1H, d, J = 10Hz), 6.86 (1H, dd, J = 15Hz & 10Hz), 7.30, 7.35, 7.73, 7.77 (2H, d each) , J = 8Hz), 8.53 (1H, s)
元素分忻値 C51H53NO 18S 3として Elemental Xin value as C 51 H 53 NO 18 S 3
計算値 C 59.00; H 5.73; .1.35  Calculated value C 59.00; H 5.73; .1.35
実測値 C 59.21; H δ.97; N 1.32 - 実施例 29 1 9—デメ トキシー 1 9— トシルォキシ— T AN— 528Aラ  Found C 59.21; H δ.97; N 1.32-Example 29 19-demethoxy 19-tosyloxy-TAN-528A
ク 卜 ン  Croton
(実施例 2 7あるいは 2 8の化合物と同時に得られる。 )  (It is obtained simultaneously with the compound of Example 27 or 28.)
X MR (90MHz, CD Cl3)5: 0.85, 0.93, 1.02, i.20(各 3H,d, J-6.5 Hz), 1.77, 2.10 (各 3H,br.s), 2.37(6H,s), 2.47(3H,s), 2.6-2.75 (ca.3H,m), 3.45 - 4.35(ca.6H, m) , 5.75(lH,dd, J = 16Hz & 9Hz),X MR (90MHz, CD Cl 3 ) 5: 0.85, 0.93, 1.02, i.20 (each 3H, d, J-6.5 Hz), 1.77, 2.10 (each 3H, br.s), 2.37 (6H, s) , 2.47 (3H, s), 2.6-2.75 (ca.3H, m), 3.45-4.35 (ca.6H, m), 5.75 (lH, dd, J = 16Hz & 9Hz),
5.76(lH,d( J = llHz), 6.37(1H, dd, J = 11Hz & 2Hz), 7.20(1H, dd, J = 16Hz & UHz), 7.34, 7.79(各 2H,d, J = 8Hz), 8.04(lH,s), 12.27(1H, s) 5.76 (lH, d ( J = llHz), 6.37 (1H, dd, J = 11Hz & 2Hz), 7.20 (1H, dd, J = 16Hz & UHz), 7.34, 7.79 (2H, d, J = 8Hz each) , 8.04 (lH, s), 12.27 (1H, s)
実施例 30 1 9—デメ トキシ— 1 9一フヱノキシカルボニルォキシ一 Example 30 19-demethoxy-19-phenyloxycarbonyloxy
TAN - 528 A  TAN-528 A
ァシル化剤:クロロぎ酸フヱニル 塩基:トリェチルァミ ン Acylating agent: phenyl chloroformate Base: Triethylamine
融点:158〜161°C (分解)  Melting point: 158-161 ° C (decomposition)
NMR (90MHz, C D C 13) 5: 0.71, 0.79, 0.87, 1.23(各 3H,d, J = 6.5 Hz), 1.75(ca.2H.br), 2.01, 2.13(各 3H, br. s) , 2.30, 2.38(各 3H,s), 2.83(lH,br.s), 2.5- 2.7(ca.2H,m), 3.35- 3.7(2H,m) , 3.70(3H,s), NMR (90MHz, CDC 1 3) 5: 0.71, 0.79, 0.87, 1.23 ( each 3H, d, J = 6.5 Hz ), 1.75 (ca.2H.br), 2.01, 2.13 (. Each 3H, br s), 2.30, 2.38 (each 3H, s), 2.83 (lH, br.s), 2.5-2.7 (ca.2H, m), 3.35-3.7 (2H, m), 3.70 (3H, s),
4.05(lH,s), 4.0-4.35(2H,m), 4.42(lH,d, J-7Hz), 4.65(1H, d, j = 8 Hz)., 5.71(lH,d, J = 10Hz)( 5.77(1H, dd, J = 15Hz & 8Hz), 6.40(lH,d, J = UHz), 6.93(lH,dd, J = 15Hz & 11Hz), 7.34(5H,s), 8.31(lH,s), 12.10(lH,s) 4.05 (lH, s), 4.0-4.35 (2H, m), 4.42 (lH, d, J-7Hz), 4.65 (1H, d, j = 8 Hz)., 5.71 (lH, d, J = 10Hz) ( 5.77 (1H, dd, J = 15Hz & 8Hz), 6.40 (lH, d, J = UHz), 6.93 (lH, dd, J = 15Hz & 11Hz), 7.34 (5H, s), 8.31 (lH, s ), 12.10 (lH, s)
元素分析値 C"H51NO · 1/2H20として Elemental analysis value C "H 51 NO · 1 / 2H 20
計算値 C 61.55 H 6.10; N 1.63  Calculated value C 61.55 H 6.10; N 1.63
実測値 C 61.62; H 6.32; N 1.61  Found C 61.62; H 6.32; N 1.61
実施例 31 ' i .9ーデメ トキシ— 2 1—デヒ ドロォキシ一 1 9 , 2 1—ビ スーフ ノキシ力ルポニルォキシ一 T A 一 528 A (実施例 3 0の化合物と同時に得られる。 ) Example 31'i.9-Demethoxy-21-dehydrodroxy-l 19,21-bisulfonyloxylponyloxy-TA-528A (obtained simultaneously with the compound of Example 30)
X MR (90MHz, CD C 13)<5: 0.71, 0.80, 0.87(各 3H. d. J = 6.5Hz) , 1.2 -1.35(ca.5H,m), 1.6(ca.2Η, br) , 2.05, 2.19(各 3H, br.s), 2.37, 2.40(各311,3), 2.83(lH,br.s), 3.35 - 3.7(2H, m) , 3.70(3H,s), 4.03 (lH,s), 4.0-4.35(2H,m), 4.45(1H, d, J = 7.5Hz) , 4.67(lH,d, J = 8.5 Hz), 5.73(1H, d, J = llHz), 5.80(iH, dd, J = 15Hz & 9Ήζ), 6.43(1H, d, J = llHz), 6.93(lH,dd, J = 15Hz & 11Hz), 7.33, 7.40(各 5H,s), 8.47(lH,s) X MR (90MHz, CD C 1 3) <5: 0.71, 0.80, 0.87 (.. Each 3H d J = 6.5Hz), 1.2 -1.35 (ca.5H, m), 1.6 (ca.2Η, br), 2.05, 2.19 (3H, br.s), 2.37, 2.40 (311, 3), 2.83 (lH, br.s), 3.35-3.7 (2H, m), 3.70 (3H, s), 4.03 (lH , s), 4.0-4.35 (2H, m), 4.45 (1H, d, J = 7.5Hz), 4.67 (lH, d, J = 8.5Hz), 5.73 (1H, d, J = llHz), 5.80 ( iH, dd, J = 15Hz & 9Ήζ), 6.43 (1H, d, J = llHz), 6.93 (lH, dd, J = 15Hz & 11Hz), 7.33, 7.40 (5H, s), 8.47 (lH, s )
実施例 32 T AN— 52SAラク トンの製造: Example 32 Production of T AN—52SA lactone:
T AN - 528 A 52.8mgを 5 mlのアセトンに溶かし、 室温でかきまぜ た。 これに 0.05規定の水酸化ナトリウムのメタノ―ル溶液 1.42mlを加え た。 30分間かきまぜたのち反応液を濃縮乾固し、 残留物をプレパラティ ブ T L Cに付し(展開溶媒:へキサン/ァセトン = 1/1)34. lmgの標記化 合物を得た。 本品は実施例 8で得られたラク トン体と同一物と考えられ る。 52.8 mg of TAN-528A was dissolved in 5 ml of acetone and stirred at room temperature. To this, 1.42 ml of a 0.05 N sodium hydroxide solution in methanol was added. After stirring for 30 minutes, the reaction mixture is concentrated to dryness, and the residue is prepared. The product was subjected to TLC (developing solvent: hexane / acetone = 1/1) to obtain 34.1 mg of the title compound. This product is considered to be the same as the lactone obtained in Example 8.
融点: 266〜269°C (分解) Melting point: 266-269 ° C (decomposition)
MR (90MHz, C D C l3)<5: 0.80, 0.90, 0.99, 1.20(各311,(1, J-6.5 Hz), 2.07, 2.12 , 2.27, 2.36(各 3H,s), 2.4 - 2.8(ca.3H, m) , 2.70 (iH.d, J = 3Hz), 3.52(lH,dd, J = 9Hz & 2Hz), 3.70(1H, d, J = 8Hz) , 3.7(ca,3H,l)r,重水添加で消失), 3.82(3H,s), 3.97(1H, dd, J = 2.5Hz & ca.2.5Hz), 4.30(1Η,(1(1, J = 9Hz & 5Hz,7-旦), 5.65(1H, d, J = 10 Hz), 5.77(lH,dd,J = 16Hz & 7Hz), 6.37(lH,d, J = 11Hz) , 7.23(1H, dd, J = 16Hz & 11Hz), 8.12(1H, s,重水添加で消失), 12.15(lH,s,重 水添加で消失) MR (90MHz, CDC l 3 ) <5: 0.80, 0.90, 0.99, 1.20 (311, (1, J-6.5 Hz), 2.07, 2.12, 2.27, 2.36 (3H, s), 2.4-2.8 (ca .3H, m), 2.70 (iH.d, J = 3Hz), 3.52 (lH, dd, J = 9Hz & 2Hz), 3.70 (1H, d, J = 8Hz), 3.7 (ca, 3H, l) r , Vanishes when heavy water is added), 3.82 (3H, s), 3.97 (1H, dd, J = 2.5Hz & ca.2.5Hz), 4.30 (1Η, (1 (1, J = 9Hz & 5Hz, 7-day) , 5.65 (1H, d, J = 10 Hz), 5.77 (lH, dd, J = 16 Hz & 7 Hz), 6.37 (lH, d, J = 11 Hz), 7.23 (1H, dd, J = 16 Hz & 11 Hz), 8.12 (1H, s, disappeared by adding heavy water), 12.15 (lH, s, disappeared by adding heavy water)
MS (m/z):711(M+ ), 693, 675, 664, 646, 628, 610 MS (m / z): 711 (M + ), 693, 675, 664, 646, 628, 610
元素分折値 'C37H + 5M O H S ' 1/2H'20として ' Elemental folding value 'C 37 H + 5 MOHS' 1 / 2H ' as 2 0'
計算値 C 61.65; H 6.43; N 1.94  Calculated C 61.65; H 6.43; N 1.94
実測値 C 61.70; H 6.50; 1.89  Found C 61.70; H 6.50; 1.89.
実施例 33 T A N— 528 Aラク ト ンの製造: Example 33 Production of TAN-528A lactone:
T A N一 528 A 79mgを 5 mlのピリジンに溶かし油浴上 3時間加熟還流 した。 反応液を濃縮乾固し、 残留物をプレパラティブ T L Cに付し標記 化合物 17.3mgを得た。 (他に原料化合物を 28.8mgを回収した)  79 mg of TAN-528A was dissolved in 5 ml of pyridine, and the mixture was refluxed for 3 hours in an oil bath. The reaction solution was concentrated to dryness, and the residue was subjected to preparative TLC to obtain 17.3 mg of the title compound. (In addition, 28.8 mg of raw material compound was recovered.)
本品は実施例 3 2で得られたラク ト ン体と融点および NMRがー致し た。  This product was found to have the same melting point and NMR as the lactone obtained in Example 32.
実施例 34 T AN— 528Aラク ト ンの製造: Example 34 Production of T AN—528A lactone:
T AN - 528 A 20mgをジクロロメタン 4 mlに溶かし、ピぺリジン 9 ί を添加して室温で終夜かきまぜる。 反応液を実施例 3 2に準じて後処理 し 15.2mgの標記化合物を得た。 本品は実施例 3 2で得られた T A N— 528 Aラク トンと融点およびDissolve 20 mg of TAN-528A in 4 ml of dichloromethane, add 9% of piperidine and stir at room temperature overnight. The reaction solution was worked up according to Example 32 to obtain 15.2 mg of the title compound. This product is compatible with the TAN-528A lactone obtained in Example 32 and the melting point.
N MRがー致した。 N MR
実施例 35 1 9—デメ トキシ一 1 9ーヒ ド σキシ一 T A — 528 Aラク トンの製造: Example 35 Preparation of 19-demethoxy-19-hydr σ-xi T A — 528 A lactone:
1 9ーデメ トキシー 1 9—ヒ ドロキシ— T AN— 528A 57.0mgを用い、 実施例 3 2と同様の方法で反応させ、 20.2mgの標記化合物を得た。  Using 57.0 mg of 19-demethoxy-19-hydroxy-TAN-528A, the reaction was carried out in the same manner as in Example 32 to obtain 20.2 mg of the title compound.
融点: 184〜187°C  Melting point: 184-187 ° C
N MR (90MHz, C D C 13) δ: 0.76, 0.93, 1.03, 1.20(各 3H,d, J = 6.5Hz) , 2.04, 2.13, 2.20, 2.40 (各 3H,s) , 2.5- 2.8(ca.3H, m) , 2.74(lH,d,J =3Hz), 3.62(iH,dd, J = 9Hz & 3Hz), 3.6— 3.8(1H, br.重水添加で消 失), 3.72(lH,d( J = 9Hz), 3.97(lH,dd, J = 2.5Hz & ca.2.5Hz), 4.13 (ca.2H,d, J=.7Hz,重水添加で消失), .23(1H, dd, J - 9Hz & 5Hz,7- ), 5.Do(lH,d, J = 10Hz), 5.74(lH,dd, J = 15Hz & 6 Hz) , 6.39(lH,d, J = 10Hz), 7.23(lH,dd, J = 15Hz & 10 Hz), 8.19(1H, s,重水添加で消失), 12.n(lH,br,重水添加で消失) N MR (90MHz, CDC 1 3 ) δ: 0.76, 0.93, 1.03, 1.20 ( each 3H, d, J = 6.5Hz) , 2.04, 2.13, 2.20, 2.40 ( each 3H, s), 2.5- 2.8 ( ca. 3H, m), 2.74 (lH, d, J = 3 Hz), 3.62 (iH, dd, J = 9 Hz & 3 Hz), 3.6—3.8 (1H, br.dissipated by adding heavy water), 3.72 (lH, d ( J = 9Hz), 3.97 (lH, dd, J = 2.5Hz & ca.2.5Hz), 4.13 (ca.2H, d, J = .7Hz, disappeared by adding heavy water), .23 (1H, dd, J- 9Hz & 5Hz, 7-), 5.Do (lH, d, J = 10Hz), 5.74 (lH, dd, J = 15Hz & 6Hz), 6.39 (lH, d, J = 10Hz), 7.23 (lH, dd, J = 15Hz & 10Hz), 8.19 (1H, s, disappeared by adding heavy water), 12.n (lH, br, disappeared by adding heavy water)
元素分圻値 C
Figure imgf000072_0001
O H S · 1/2Η20として
Elemental Ki value C
Figure imgf000072_0001
As OHS · 1 / 2Η 2 0
卜算値 C 61.18; H 6.27; 1.98  Subtracted value C 61.18; H 6.27; 1.98
実測値 C 61.30; H 6.25; X 1.97  Found C 61.30; H 6.25; X 1.97
実施例 36 1 9—デメ トキシ— 1 9ーァセ トキシ— T AN— 528Aラク ト ンの製造: Example 36 Preparation of 19-demethoxy-19-acetoxy-TAN-528A lactone:
1 9—デメ トキシ— 1 9—ヒ ドロキシ—T AN— 25.5mgのァセ トン(ca.3ml)溶液に 0.05規定の水酸化ナトリゥムのメタノール溶液 0.69 mlを加えた。 10分間かきまぜたのち溶媒を減圧留去し、 残留物を 4mlの THFに溶かし、 これに 4 mgのァセチルクロリ ドを加え 10分間かきまぜ た。 ついで、 反応液を 1 %重曹水 5 ml中に注ぎ、 酢酸ェチルで抽出した。 抽出液を飽和食塩水で洗浄後乾燥し、 溶媒を留去し、 残留物をプレパラ ティブ TL C (展開溶媒:へキサン/アセトン = i/l)に付し、 8.1mgの標 記化合物を得た。 To a solution of 19-demethoxy-19-hydroxy-TAN-25.5 mg in acetone (ca.3 ml) was added 0.69 ml of a 0.05N sodium hydroxide in methanol solution. After stirring for 10 minutes, the solvent was distilled off under reduced pressure, the residue was dissolved in 4 ml of THF, and 4 mg of acetyl chloride was added thereto and stirred for 10 minutes. Then, the reaction solution was poured into 5 ml of 1% aqueous sodium bicarbonate, and extracted with ethyl acetate. The extract was washed with saturated saline and dried, and the solvent was distilled off. The residue was subjected to TiV TLC (developing solvent: hexane / acetone = i / l) to obtain 8.1 mg of the title compound.
融点:186~189°C  Melting point: 186 ~ 189 ° C
NMR(90 Hz, CD Cl3)<5: 0.78, 0 JO (各 3H,d, J = 6.5Hz) , 0.99(3H,d, J = 7Hz), 1.20(3H,d, J = 6.5Hz), 2.02, 2.10(各 3H,br.s), 2.14(3H,s,NMR (90 Hz, CD Cl 3 ) <5: 0.78, 0 JO (3H, d, J = 6.5 Hz each), 0.99 (3H, d, J = 7 Hz), 1.20 (3H, d, J = 6.5 Hz) , 2.02, 2.10 (each 3H, br.s), 2.14 (3H, s,
CH3C0-0-)( 2.23, 2.36(各 3H,s), 2.5 - 2.7(ca.4H. m), 3.5-4.35(6H, mうち 1H分は重水添加で消失), 5.65(lH,d,J = 10Hz), 5.76(1H, dd, J = 15Hz & 8Hz), 6.36(lH,d,J=llHz), 7.20(1H, dd, J = 15Hz & 11Hz), 8.07(lH,s,重水添加で消失), 12.20(lH,s,重水添加で消失) CH 3 C0-0-) ( 2.23, 2.36 (3H, s each), 2.5-2.7 (ca.4H.m), 3.5-4.35 (1H of 6H, m disappears by adding heavy water), 5.65 (lH, d, J = 10Hz), 5.76 (1H, dd, J = 15Hz & 8Hz), 6.36 (lH, d, J = llHz), 7.20 (1H, dd, J = 15Hz & 11Hz), 8.07 (lH, s, 12.20 (lH, s, disappeared by adding heavy water)
元素分圻値 C38H45N012S · 1/2H20として As elemental圻値 C 38 H 45 N0 12 S · 1 / 2H 2 0
計算値 C 60.95; H 6.19; 1.87  Calculated C 60.95; H 6.19; 1.87
実測値 C 60.71; H 6.48; N 1.81  Found C 60.71; H 6.48; N 1.81
また同時に 4.5mgの 1 9—デメ トキシ— 1 9ーァセトキシ— TAN— 528Aを得た。  At the same time, 4.5 mg of 19-demethoxy-19-acetoxy-TAN-528A was obtained.
実施例 37 2 5—デ チルチオ一 24—デォキシ— 24 , 2 5—べンゾ チアジノ — Τ Λ — 528 Aの製造: Example 37 Preparation of 25-detylthio 24-24-doxy-24,25-benzothiazino — Τ Λ — 528 A:
2 ーデメチルチオ— 2 5—メチルスルフィ二ルー T AN— 528A 59 Jmgをジクロロメタン 5 miに溶かし、 氷冷下にかきまぜた。 これに、 0—アミノチオフエノ —ル 12. (kgおよびトリェチルァミ ン 9.5mgを順次加 え、 30分間かきまぜ、 ついで 0—アミ ノチオフヱノ ール 5.8mgを追加し、 室温で 30分間かきまぜた。 反応液を 10mlの水にあけ、 Q.9mlの Q.1N塩酸 を加えたのち分液し、 有機層を水洗、 乾燥(MgS 04)後溶媒を留去し、 残留物をプレパラティブ TL C (展開溶媒:へキサン/ァセトン = 1/1) に付し、 Rf値が 0.6付近のバンドをかきとり溶出して、 11.6mgの標記化 合物を得た。 59 Jmg of 2-demethylthio-25-methylsulfinyl TAN-528A was dissolved in 5 mi of dichloromethane, and the mixture was stirred under ice cooling. To this, 0-aminothiophenol 12. (kg and triethylamine 9.5 mg) were added sequentially, and the mixture was stirred for 30 minutes. Then, 5.8 mg of 0-aminothiophenol was added, and the mixture was stirred for 30 minutes at room temperature. the poured into water, and later partial solution was added Q.1N hydrochloric acid Q.9Ml, the organic layer is washed with water, dried distilled off (MgS 0 4) and the solvent, preparative TL C (developing solvent residue: Hexane / acetone = 1/1), and the band with an Rf value of around 0.6 was scraped and eluted to obtain 11.6 mg of the title compound.
融点:183〜185°C (分解) NT R(90MHz, C D C l3)<5 :0.53, 0.61, 0.82, 1.25(各 3H,d, J = 6.5Hz) , 1.83, 2.25, 2.32(各 3H,s), .73(1H, d, J = 2.5Hz) , 3.3- 3.6(2H, m) , 3.66, 3.94(各 3H,s), 4.0 - 4.3(2H, m) , 4.45(lH,d, J = 7Hz) , 4.63(1H, d, J = 8Hz), 5.55(lH,d, J = 10Hz), 5.78(lH,dd, J = 15Hz & 8Hz) . Melting point: 183-185 ° C (decomposition) N T R (90 MHz, CDC l 3 ) <5: 0.53, 0.61, 0.82, 1.25 (each 3H, d, J = 6.5 Hz), 1.83, 2.25, 2.32 (each 3H, s), .73 (1H, d , J = 2.5Hz), 3.3-3.6 (2H, m), 3.66, 3.94 (3H, s), 4.0-4.3 (2H, m), 4.45 (lH, d, J = 7Hz), 4.63 (1H, d, J = 8Hz), 5.55 (lH, d, J = 10Hz), 5.78 (lH, dd, J = 15Hz & 8Hz).
6. aH,d,J = lliiz), 7.06(lH,dd, J = 15Hz & 11Hz), 7.35- 7.55(3H, m), 7.75- 7.95(1H( IR)( 8.41(1H, S), 12.84(1H, S) 6.aH, d, J = lliiz), 7.06 (lH, dd, J = 15Hz & 11Hz), 7.35-7.55 (3H, m), 7.75-7.95 (1H ( IR) ( 8.41 (1H, S), 12.84 (1H, S)
MS (m/z):802(M+ ), 784, 770, 766, 752, 734 MS (m / z): 802 (M + ), 784, 770, 766, 752, 734
元素分圻値 C+sHwNsO S ' HzOとして Element value C + sHwNsO S 'HzO
計算値 C 62.91; H 6.38; N 3.41  Calculated value C 62.91; H 6.38; N 3.41
実測値 C 62.99; H 6.27; 3.49  Found C 62.99; H 6.27; 3.49
実施例 38 2 5—デメチルチオ一 2 5—ヒ ドロキシー T AN— 528Aの 実施例 3 7のプレパラティ ブ T L Cにおいて R f値が 0.1付近のバンド をかき取り溶出して、 11.7mgの標記化合物を得た。 Example 38 In the preparative TLC of Example 37, a band having an Rf value of around 0.1 was scraped off and eluted with 25-demethylthio-1.25-hydroxy TAN-528A to obtain 11.7 mg of the title compound. .
融点: 165〜L67°C  Melting point: 165 ~ L67 ° C
MR (90MHz, C D C 5 : 0.76, 0.79, 0.83, 1.23(各 3H, d J = 6.5 Hz), 2.02, 2.19, 2.26(各 3H,s), 2.4— 2.7(ca. 3H,m), 2.84(lH,br. s). 3.4-3.65(2H,m), 3.74, 3.84(各 3H,s). 3.95 - 4.3(2H, m) , 4.45(ca. 2H,hr,重水添加で消失), 5.80(1H, dd, J = ΙδΗζ & 8Hz), 5.83(iH,d( J = 10Hz), 6.52(lH,d, J = UHz), 7.26(1H, dd, J = loHz & 11Hz), 8.52(lH,s,重水添加により消失), 12.19(lH,s,重水添加によ り消失) MR (90MHz, CDC 5: 0.76, 0.79, 0.83, 1.23 (each 3H, dJ = 6.5 Hz), 2.02, 2.19, 2.26 (each 3H, s), 2.4—2.7 (ca.3H, m), 2.84 ( 3.4-3.65 (2H, m), 3.74, 3.84 (each 3H, s). 3.95-4.3 (2H, m), 4.45 (ca. 2H, hr, disappeared by adding heavy water), 5.80 (1H, dd, J = ΙδΗζ & 8Hz), 5.83 (iH, d ( J = 10Hz), 6.52 (lH, d, J = UHz), 7.26 (1H, dd, J = loHz & 11Hz), 8.52 (lH , s, disappeared by adding heavy water), 12.19 (lH, s, disappeared by adding heavy water)
MS (m/z):713(M+ ), 695, 677, 663, 659, 645, 627  MS (m / z): 713 (M +), 695, 677, 663, 659, 645, 627
元素分圻値 C37H47N 013 · H20として As elemental圻値 C 37 H 47 N 0 13 · H 2 0
計算値 C 60.73; H 6.75; N 1.91; S 0.00  Calculated value C 60.73; H 6.75; N 1.91; S 0.00
実測値 C 60.75; H 6.61; N 2.04; S 0.00 実施例 39 2 5一デメチルチオ一 2 4—デォキソ一 2 4 , 2 5—ベンゾ チアジノ一 T AN— 528Aおよび 2 5—デメチルチオ一 2 5 一ヒ ドロキシ— T AN— 528Aの製造: Found C 60.75; H 6.61; N 2.04; S 0.00 Example 39 Preparation of 25-demethylthio-l24-deoxo-l24,25-benzothiazino-TAN-528A and 25-demethylthio-l25-hydroxy-TAN-528A:
2 5—デメチルチオ— 2 5ーメチルスルフィ二ルー TAN— 528A 114.4mgを用いて、実施例 3 7および 3 8と同様の方法で反応を行ない、 ベンゾチアジノ体 26.9mgおよびヒ ドロキシ体 60. lmgを得た。  The reaction was carried out in the same manner as in Examples 37 and 38 using 114.4 mg of 25-demethylthio-25-methylsulfinyl TAN-528A to obtain 26.9 mg of a benzothiazino compound and 60.lmg of a hydroxy compound.
本べンゾチアジノ体は実施例 3 7で得たものと融点およぴ N MRがー 致した。 また、 本ヒ ドロキシ体は実施例 3 8で得たものと融点および N MRがー致した。  This benzothiazino compound was found to have the same melting point and N MR as that obtained in Example 37. The melting point and NMR of this hydroxy compound were the same as those obtained in Example 38.
実施例 40 2 5—デメチルチオ一 2 5—ヒ ドロキシ— T AN— 528Aの Example 40 25-Demethylthio-15-hydroxy-TAN-528A
T AN- 528A 102mgを T HF 4 mlに溶かし、 水素化ホウ素ナトリウ ム 14mgを加えて 1時間攪拌しながら加熱還流した。 反応液を冷水に注ぎ、 1 N塩酸約 5mlを加え、 クロ口ホルムで抽出し、 抽出液を水洗、 乾燥後 溶媒を留去し、 残留'物をブレパラティブ T L C (展開溶媒:クロロホルム /ァセトン = 2/1)に付し、標記化合物 10. imgを得、 T AN— 528 A 18.1m gを回収した。 102 mg of TAN-528A was dissolved in 4 ml of THF, 14 mg of sodium borohydride was added, and the mixture was heated under reflux with stirring for 1 hour. Pour the reaction mixture into cold water, add about 5 ml of 1 N hydrochloric acid, extract with chloroform, wash the extract with water, dry it, evaporate the solvent, and remove the residue with Breparative TLC (developing solvent: chloroform / acetone = 2 / 1) to obtain 10.img of the title compound, and 18.1 mg of TAN-528A was recovered.
本品は実施例 3 8で得た化合物と融点およぴ N Rがー致した。 This product was found to be similar to the compound obtained in Example 38 in melting point and NR.
実施例 41 2 5一デメチルチオ— 2 5—メ トキシ— T AN— 528Aの製 造: Example 41 Preparation of 25-Demethylthio-25-Methoxy-TAN-528A:
2 5—デメチルチオ一 2 5—ヒ ドロキシー T AN— 528A37.5mgをジ クロロメタン 5mlに溶かしこれにジァゾメタンのェ一テル溶液約 0.7ml を添加し、 10分後反応液を濃縮乾固した。 これをプレパラティブ TL C (展開溶媒:へキサン/ァセト ン = 1/1)に付し Rf 0.7の黄橙色パンドを かきとり溶出して 28mgの標記化合物を得た。  37.5 mg of 25-demethylthio-125-hydroxy TAN-528A was dissolved in 5 ml of dichloromethane, and about 0.7 ml of a diazomethane ether solution was added thereto. After 10 minutes, the reaction solution was concentrated to dryness. This was subjected to preparative TLC (developing solvent: hexane / aceton = 1/1), and a yellow-orange band with an Rf of 0.7 was scraped off and eluted to obtain 28 mg of the title compound.
融点: 155〜157°C N R (90MHz, C D C 13)5: 0.7δ(3Η, d, J = 7Hz) , 0.80, 0.83,1.22 (各 3H,d, J = 6.4Hz), 1.99, 2.17, 2.25(各 3H,s), 丄.8~2.8(5〜6H,m うち 1~2H分は重水添加で消失), 2.85(lH,br.s), 3.4- 3.7(2H, m) , 3.70, 3.84(各 3H,s), 4.03(3H,s), 3.9— 4.7(5H,mうち 3H分は重水添 加で消失), 5.73(lH,dd,J = 16Hz &8Hz), 5.82(lH,d, J = 9Hz) , 6.37(1Melting point: 155-157 ° C NR (90MHz, CDC 1 3) 5: 0.7δ (3Η, d, J = 7Hz), 0.80, 0.83,1.22 ( each 3H, d, J = 6.4Hz) , 1.99, 2.17, 2.25 ( each 3H, s) , 丄 .8 to 2.8 (5 to 6H, m of which 1 to 2H disappear by addition of heavy water), 2.85 (lH, br.s), 3.4-3.7 (2H, m), 3.70, 3.84 (3H, s for each ), 4.03 (3H, s), 3.9-4.7 (3H of 5H, m disappeared by adding heavy hydrogen), 5.73 (lH, dd, J = 16Hz & 8Hz), 5.82 (lH, d, J = 9Hz), 6.37 (1
H, d, J = 10Hz), 6.92(lH,dd, J-16Hz & 11Hz), 7.73(1H, s ,重水添加 で 消失), 12.18(lH,br.s,重水添加で消失) H, d, J = 10Hz), 6.92 (lH, dd, J-16Hz & 11Hz), 7.73 (1H, s, disappeared by adding heavy water), 12.18 (lH, br.s, disappeared by adding heavy water)
元素分析値 C38H43NO 13 · H20として As Elemental analysis C 38 H 43 NO 13 · H 2 0
計算値 C 61.20; H 6.89; N 1.88  Calculated C 61.20; H 6.89; N 1.88
実測値 C 60.98; H 7.06; N 1.93  Found C 60.98; H 7.06; N 1.93
実施例 42 2 5一デメチルチオ一 2 5—ヒドロ— T AN- 528Aの製造: T A - 528 A lOlmgをエタノ ール 15mlに溶かし、 これにラネ—ニヅ ゲル(W - 2型)のェタノ —ル懸蜀液(乾燥重量で 230mg)を加えてかきま '' ぜながら 3時間加熱還流した。 反応液をろ過し、 ろ液を濃縮乾固後残留 物をプレパラティブ T L C (展開溶媒:クロロホルム/ァセトン = 2/1) に付し、 10.3mgの標記化合物を得た。 また 14.2mgの Τ Αλ' - 52δΑを回 収した。  Example 42 Preparation of 25-demethylthio-l25-hydro-TAN-528A: TA-528AlOlmg was dissolved in 15 ml of ethanol, to which ethanol of a Raney-Nii gel (type W-2) was added. The suspension (230 mg by dry weight) was added, and the mixture was refluxed for 3 hours while stirring. The reaction solution was filtered, and the filtrate was concentrated to dryness. The residue was subjected to preparative TLC (developing solvent: chloroform / acetone = 2/1) to obtain 10.3 mg of the title compound. 14.2 mg of {{λ'-52δ} was also recovered.
標記化合物の物性:  Physical properties of the title compound:
MR (90MHz, C D C 13) 5: 0.75(3H, d, J - 6.5Hz) , 0.80(3H, d, J = 7Hz) , 0.88, 1.22(各311,(1,1[=6.51{2) , 2.06, 2.15, 2.27(各 3H,s), 1.8- MR (90MHz, CDC 1 3) 5: 0.75 (3H, d, J - 6.5Hz), 0.80 (3H, d, J = 7Hz), 0.88, 1.22 ( each 311, (1, 1 '= 6.51 {2) , 2.06, 2.15, 2.27 (3H, s each), 1.8-
2.7(4H,m)> 2.83(lH,br.s), 3.4— 3.6(3H, mうち lH分は重水添加で消 失), 3.73, 3.84(各311,3) , 3.9— 4.5(5H,mうち 3H分は重水添加で消 失), 5.75(lH,d, J = 10Hz), 5.78(1H, dd, J = 15Hz & 9Hz), 6.42(lH,d, J = 10Hz), 7.25(lH,dd, J = 15Hz & 10Hz), 7.69(lH,s), 8.56(lH,s, 重水添加で消失), 11.99(111, s,重水添加で消失) 2.7 (4H, m) > 2.83 (lH, br.s), 3.4-3.6 (3H, m of lH is lost by adding heavy water), 3.73, 3.84 (311,3), 3.9-4.5 (5H, m of 3m disappeared by adding heavy water), 5.75 (lH, d, J = 10Hz), 5.78 (1H, dd, J = 15Hz & 9Hz), 6.42 (lH, d, J = 10Hz), 7.25 (lH , dd, J = 15Hz & 10Hz), 7.69 (lH, s), 8.56 (lH, s, disappeared with heavy water), 11.99 (111, s, disappeared with heavy water)
実施例 43 2 5—デメチルチオ一 2 5—ジメチルァミノメチル— TAN — 528Aの製造: Example 43 25-Demethylthio-1-25-dimethylaminomethyl-TAN — Production of 528A:
2 5—デメチルチオ— 2 5—ヒ ドロ— TAN— 528 A 155mgのァセ ト 二ト リル(7ml)溶液にエツ シヱン乇—ザ塩(Eschenmoser S alt(C H2 (十) θ 25-Demethylthio-25-Hydroxy-TAN-528 A 155 mg of acetonitrile (7 ml) solution was added to a solution of Etsenzamoser Salt (CH 2 (10) θ
-NMe2 - I )55mgを添加して除湿攪拌下に油浴上還流した。 4時間後、 試薬を 30mg追加し更に 2時間還流した。 反応液を濃縮乾固したのち酢酸 ェチル及び水を加えて分液、 g乍酸ェチル層を食塩水で洗浄後乾燥し、 溶 媒を留去し乾固して黄橙色固体 144mgを得た。 これをプレパラティブ T L C (展開溶媒:クロ口ホルム/メタノ —ル = 11/1)に付し、 Rf値 0.4の 褐色バンドをかきとり溶出して 47.7mgの標記化合物を得た。 -NMe 2 -I) (55 mg) was added, and the mixture was refluxed on an oil bath under dehumidification and stirring. Four hours later, 30 mg of the reagent was added, and the mixture was refluxed for another 2 hours. After the reaction solution was concentrated to dryness, ethyl acetate and water were added thereto for liquid separation. The acid ethyl layer was washed with brine and dried, and the solvent was distilled off to dryness to obtain 144 mg of a yellow-orange solid. This was subjected to preparative TLC (developing solvent: chloroform / methanol = 11/1), and a brown band having an Rf value of 0.4 was scraped and eluted to obtain 47.7 mg of the title compound.
NMR(90MHz, CD Cl3)5: 0.75, 0.79, 0.90, 1.17 (各 3H, d, J = 6.5 Hz), 2.04(3H,s), 2.17(ca. 12H.br. s), 2.85(lH,br.s), 3.3-3.7 (ca. 5H,m,うち 1H分は重水添加で消失), 3.70(3H,s), 3.83(3H,s), 3.8-4.6(ca. 5H, m,うち 3H分は重水添加で消失), 5.76(lH,dd, J = 9Hz & 16Hz), 5.88(lH,d, J = llHz), 6.42(1H, d, J = 11Hz) , 7.02(1H, dd, J =llHz & 16Hz) · NMR (90 MHz, CD Cl 3 ) 5: 0.75, 0.79, 0.90, 1.17 (3H, d, J = 6.5 Hz each), 2.04 (3H, s), 2.17 (ca.12H.br.s), 2.85 (lH , br.s), 3.3-3.7 (ca.5H, m, of which 1H disappears with the addition of heavy water), 3.70 (3H, s), 3.83 (3H, s), 3.8-4.6 (ca.5H, m, Of which, 3H disappears by adding heavy water), 5.76 (lH, dd, J = 9 Hz & 16 Hz), 5.88 (lH, d, J = llHz), 6.42 (1H, d, J = 11 Hz), 7.02 (1H, dd) , J = llHz & 16Hz)
λί S (S I MS)m,/e:(M十 3 )+ 757 λί S (SI MS) m, / e: (M10 3) + 757
実施例 44 2 5—デメチルチオ— 2 5—ジメチルァミ ノ メチル一 T A N 一 528 Aの製造: Example 44 Preparation of 25-demethylthio-25-dimethylaminomethyl-TAN-528A:
2 5—デメチルチオ一 2 5—ヒ ドロ一 T AN— 528 A 65.7mgを THF 5 mUこ溶かしホルマリ ン 50 2、 ジメチルァミ ン(50%水溶液) 40," βを添 加後室温で終夜攪拌した。 反応液を胙酸ェチル-水の混合物中に注ぎ、 0.1 H C1を添加して水層の ΡΗを約 6とした。 有機層を乾燥乾固して 60.3mgの固型物を得た。 これをプレパラティブ TL C (展開溶媒:クロ口 ホルムノメタノ—ル = 12/1)に付し、 褐色バンドをかきとり溶出して 5. lmgの標記化合物を得た。 このものの T L C .NMRは実施例 4 3の生成 物と一致した。 実施例 45 2 5—デメチルチオ— 2 5—(1 -ピロ リ ジノ メチル) -TAN — 528Aの製造: 65.7 mg of 25-demethylthio-125-hydro-TAN-528A was dissolved in 5 mU of THF, and formalin 502 and dimethylamine (50% aqueous solution) 40, "β were added, followed by stirring at room temperature overnight. The reaction mixture was poured into a mixture of ethyl ethyl-water and 0.1 H C1 was added to adjust the aqueous layer to about 6. The organic layer was dried and dried to obtain 60.3 mg of a solid. The residue was subjected to preparative TLC (developing solvent: black formaldehyde = 12/1), and the brown band was scraped and eluted to give 5.1 mg of the title compound, which was analyzed by TLC and NMR in Example 43. Product. Example 45 Preparation of 25-demethylthio-25- (1-pyrrolidinomethyl) -TAN-528A:
実施例 44のジメチルァミ ンに代えてピロ リ ジンを用い、 2 5—デメ チルチオ一 2 5—ヒ ドロ— T AN— 528A 67.8mgから、標記化合物 4. lmg を得た。  Using pyrrolidine in place of dimethylamine of Example 44, 4.1 mg of the title compound was obtained from 67.8 mg of 25-demethylthio-l25-hydro-TAN-528A.
NMR(90MHz, CD Gl3)(5: 0.7-1.0(9 H.m.MeX 3 ), 1.20(3H,d, J = 6.5,Me), 2.05(3H,s,Me), 2.27(3H, s, Me) , 1.9 - 2.2(4H, m, pyrrolidiao methylenex 2 ) , 3.6- 3.9(4H,m,pyrrolidino NMR (90MHz, CD Gl 3) (5: 0.7-1.0 (9 HmMeX 3), 1.20 (3H, d, J = 6.5, Me), 2.05 (3H, s, Me), 2.27 (3H, s, Me) , 1.9-2.2 (4H, m, pyrrolidiao methylenex 2), 3.6- 3.9 (4H, m, pyrrolidino
methyleneX2), 3.69(3H,s,Me), 3.83(3H, s, Me)  methyleneX2), 3.69 (3H, s, Me), 3.83 (3H, s, Me)
実施例 46 2 o—デメチルチオ一 2 5—ヒ ドロキシメチルー TAN— Example 46 2o-Demethylthio-15-hydroxymethyl-TAN-
528Aの製造:  Production of 528A:
粗製の 2 5一.デメチルチオ一 2 5ージメチルアミ ノ メチル一TAN— 528A 45. Omgを大気中室温で 10分間放置後プレパラティブ T L C (展開 溶媒:ク口 σホルム //メタノ—ル = 11Ζ1)に付し、' Rf値 0.3の紅色のバ ンドをかきとり溶出し 6.4mgの標記化合物を得た。  Crude 25.1-demethylthio-l25-dimethylaminomethyl-TAN-528A 45. Omg was left in the air at room temperature for 10 minutes, and then subjected to preparative TLC (developing solvent: Kuguchi σ form // methanol = 11Ζ1) Then, a red band having an Rf value of 0.3 was scraped off and eluted to obtain 6.4 mg of the title compound.
MR (90MHz, C D C 13)δ: 0.75 - 0.95(9H, m) , 1.13(3H, d, J = 6Hz) , 2.01, 2.14(各 3H,br.s), 2.24(3H,s), 1.8-2.7(ca. 5H.ni), 2.77(111, br.s), 3.66(3H,s), 3.73(2H,s), 3.80(3H(s), 3.3-4.5(ca. 6H.m), 5.5-6.0(2H,m)> 6.37(111, d, J = 9Hz) , 7.1 - 7.4(1H, m) MR (90MHz, CDC 1 3) δ: 0.75 - 0.95 (9H, m), 1.13 (3H, d, J = 6Hz), 2.01, 2.14 ( each 3H, br.s), 2.24 (3H , s), 1.8 -2.7 (ca.5H.ni), 2.77 (111, br.s), 3.66 (3H, s), 3.73 (2H, s), 3.80 (3H ( s), 3.3-4.5 (ca.6H.m) , 5.5-6.0 (2H, m) > 6.37 (111, d, J = 9Hz), 7.1-7.4 (1H, m)
M S (E . I . ) 727 (M+ ), 713, 695, 677, 663, 659 MS (E.I.) 727 (M + ), 713, 695, 677, 663, 659
実施例 47 2 5—デメチルチオ— 2 5—ョ― ド— T AN - 528Aの製造: 2 δーデメチルチオ一 2 5—ヒ ドロ— T AN— 528Α li3.2mgをァセ トニト リル 6 mlに溶かしエツ シヱンモーザー塩 39mgを加え 2時間還流し た。 試薬を 59mg追加し、 更に 1時間還流した。 反応物を濃縮乾固後舴酸 ェチル-水の混合物を加え、 分液した。 水洗、 乾燥、 乾固して褐色固体 99.6mgを得た。 これをジクロロメタン 6 mlに溶かし、 蚱酸 4ml、 二酸化 マンガン lOOmgを添加して室温で終夜攪拌した。 590mgの炭酸水素ナ卜リ ゥムを含む水で洗浄、 乾燥、 乾固して褐色粉末 90.4mgを得た。 これをプ レパラティブ TL C (展開溶媒:へキサン/ァセトン = 5/6)に付し、 Rf 値 0.3の黄橙色バンドをかきとり溶出して標記化合物 18.8mgを得た。 Example 47 Preparation of 25-demethylthio-25-ode-TAN-528A: 2δ-demethylthio-125-hydro-TAN-528Α li 3.2 mg was dissolved in acetonitrile 6 ml, and the mixture was dissolved in Ethylene Moser. 39 mg of a salt was added, and the mixture was refluxed for 2 hours. An additional 59 mg of the reagent was added, and the mixture was further refluxed for 1 hour. After the reaction product was concentrated to dryness, a mixture of ethyl acetate and water was added, and the mixture was separated. After washing with water, drying and drying, 99.6 mg of a brown solid was obtained. Dissolve this in 6 ml of dichloromethane, add 4 ml of diacid, and dioxide Manganese lOOmg was added and stirred at room temperature overnight. The solid was washed with water containing 590 mg of sodium hydrogen carbonate, dried and dried to obtain 90.4 mg of a brown powder. This was subjected to Preparative TLC (developing solvent: hexane / acetone = 5/6), and the yellow-orange band having an Rf value of 0.3 was scraped off and eluted to obtain 18.8 mg of the title compound.
NMR (90MHz, CD Cl3)<5: 0.74, 0.79, 0.89, 1.17(各 3H, d, J = 6.5 Hz), 2.03, 2.17, 2.27 (各 3H,s), 2.87(1H, r . s) , 3.35- 3.6(2H,m) , 3.71, 3.84(各 3H,s), 4.0— 4.8(5H, m,うち 3H分は重水添加で消失), 5.74(lH,dd, J = 15Hz & 8Hz), 5.76(1H, d, J = 9Hz) , 6.45(lH,d, J = U Hz), 6.99(lH,dd,J = 15Hz & 11Hz), 8.35(1H, s ,重水添加で消失), 1 1.85(lH,s,重水添加で消失) NMR (90 MHz, CD Cl 3 ) <5: 0.74, 0.79, 0.89, 1.17 (each 3H, d, J = 6.5 Hz), 2.03, 2.17, 2.27 (each 3H, s), 2.87 (1H, r.s) , 3.35- 3.6 (2H, m), 3.71, 3.84 (3H, s each), 4.0—4.8 (5H, m, 3H disappears by adding heavy water), 5.74 (lH, dd, J = 15Hz & 8Hz) , 5.76 (1H, d, J = 9 Hz), 6.45 (lH, d, J = U Hz), 6.99 (lH, dd, J = 15 Hz & 11 Hz), 8.35 (1H, s, disappeared by adding heavy water), 1 1.85 (disappears when lH, s, heavy water is added)
MS(S I MS &E. I . )823(M+ ), 697 MS (SI MS & E.I.) 823 (M + ), 697
産業上の利用可能性 Industrial applicability
本発明の化合物 [1 ]またはその塩は、 優れた抗菌活性を有し、 抗菌剤' として用いることができる。 '  The compound [1] of the present invention or a salt thereof has excellent antibacterial activity and can be used as an antibacterial agent. '

Claims

請 求 の 範 囲 The scope of the claims
1 . 一般式 ο  1. General formula ο
Figure imgf000080_0001
Figure imgf000080_0001
/ H  / H
[式中、 R 1および R 2は同一または異なって水素または炭素原子もしく [Wherein R 1 and R 2 are the same or different and are each a hydrogen or carbon atom or
0 OH 入 0 with OH
は一 S 0 2—を介する有機残基を、 Xは式 , 一 式 Is an organic residue via S 0 2 —, X is a formula,
嬲- -R+ 、;,八 Tan- -R + , ; , 八
OH OH
OH または 式 (式中、 R *は水素,ヒ ドロキシ 讕 驪 OH or a formula (where R * is hydrogen, hydroxy)
ハロゲンまたは炭素原子,窒素原子,酸素原子もしくは硫黄原子を介する 有機残基を、 R 5は置換基を有していてもよい 2個の炭素原子を介する 2価の基を示し、 式中のベンゼン環の R 基のパラ位に A—が結合し、 式中のベンゼン環の R 1〇基のメタ位に騸一が桔合していることをそれ ぞれ示す。 )で表わされる基を、 R Bはカルボキシ,カルボキシから誘導 され得る基または 7位もしくは 1 3位の一 O Hとの間でデルタラク トン A halogen or an organic residue via a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom; R 5 represents a divalent group via two carbon atoms which may have a substituent; A— is bonded to the para-position of the R group of the ring, and the bond is bonded to the meta-position of the R 1 group of the benzene ring in the formula, respectively. R B is derived from carboxy, carboxy Group or a delta lactone between 1-OH and 7- or 13-position
0 H  0 H
を形成してもよいことを、 Y ':ま— C 0—または一 C—(式中、 R 7は、 Y ′: or — C 0 — or 1 C — (where R 7 is
R 7 R 7
R 1が炭素原子を介する有機残基である場合の一 0 R 1と共に 5員環を形 成していることを示す。 )で表わされる基をそれぞれ示す。 ただし、 R 1 および R 2が水素で R 6がメ トキシカルボニルで Yが— C O—であるとき When R 1 is an organic residue via a carbon atom, it indicates that it forms a 5-membered ring together with 10 R 1 . )). However, when R 1 and R 2 are hydrogen, R 6 is methoxycarbonyl and Y is —CO—
0 0
 ,
Xは ではなく、 R 1がメチルで R 2が水素で R 6X is not R 1 is methyl, R 2 is hydrogen and R 6 is
騸、 、CH:  騸,, CH:
0 0
 义
メ トキシカルボニルで Yがー C 0—であるとき Xは  When Y is —C 0— in methoxycarbonyl, X is
Ύ 、S— CH: 0 Ύ, S— CH : 0
ではない。 :で表わされろ化合物またはその塩 c is not. Compound represented by: or a salt thereof c
2 . 一般式  2. General formula
Figure imgf000081_0001
[式中、 Rにおよび R 2は同一または異なって水素または炭素原子もしく
Figure imgf000081_0001
Wherein R and R 2 are the same or different and each is hydrogen or carbon atom or
は— Ha—
シ 式
Figure imgf000082_0001
Expression
Figure imgf000082_0001
ハロゲンまたは炭素原子,窒素原子,酸素原子もしくは硫黄原子を介する 有機残基を、 R 5は置換基を有していてもよい 2個の炭素原子を介する 2価の基を示し、 式中のベンゼン環の R 基のパラ位に A—が結合し、 式中のベンゼン環の R 基のメタ位に騸—が結合していることをそれ ぞれ示す。 )で表わされる基を、 R 8はカルボキシ,カルボキンから誘導 され得る基または 7位もしくは 1 3位の— 0 Hとの間でデルタラク トン A halogen or an organic residue via a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom; R 5 represents a divalent group via two carbon atoms which may have a substituent; A- is bonded to the para-position of the R group of the ring, and 騸-is bonded to the meta-position of the R group of the benzene ring in the formula, respectively. R 8 is a group that can be derived from carboxy, carboxine or a delta lactone between —OH and 7- or 13-position
0 H  0 H
を形成してもよいことを、 Yは— C 0—または— C 一(式中、 R 7は、 That Y is — C 0 — or — C one (where R 7 is
R 7 R 7
R 1が炭素原子を介する有機残.基である場合の - 0 R 1と共に 5員環を形 成していることを示す。 )で表わされる基をそれぞれ示す。ただし、 R i fe よび R 2が水素で R 6がメ トキシカルボニルで Yが— C O —であるとき Xは ではなく、 R 1がメチルで R 2が水素で R 6
Figure imgf000083_0001
When R 1 is an organic residue via a carbon atom, -0 indicates that it forms a 5-membered ring together with R 1 . )). However, when R ife and R 2 are hydrogen, R 6 is methoxycarbonyl and Y is —CO— X is not R 1 is methyl, R 2 is hydrogen and R 6 is
Figure imgf000083_0001
メ トキシカルボニルで Yが一 C 0—であるとき XはWhen Y is one C 0— in methoxycarbonyl, X is
Figure imgf000083_0002
ではない。 ]で表わされる化合物またはその塩を含有する抗菌剤 (
Figure imgf000083_0002
is not. ] An antibacterial agent containing a compound represented by the formula (I) or a salt thereof (
PCT/JP1985/000160 1985-04-03 1985-04-03 Antibiotics and preparation containing same WO1986005784A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
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JP61063737A JPS61257973A (en) 1985-04-03 1986-03-20 Antibiotic and pharmaceutical preparation

Applications Claiming Priority (1)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107540682A (en) * 2017-08-09 2018-01-05 武汉大学 Streptovaricin derivative and its preparation method and application

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50160289A (en) * 1974-06-17 1975-12-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50160289A (en) * 1974-06-17 1975-12-25

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
The Journal of Antibiotics, Vol. 29, No.2, (February 1976) Pages 199 to 203 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107540682A (en) * 2017-08-09 2018-01-05 武汉大学 Streptovaricin derivative and its preparation method and application
WO2019029408A1 (en) * 2017-08-09 2019-02-14 武汉大学 Streptovaricin derivative, preparation method therefor, and application thereof

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