+

WO2023197124A1 - Apparatus for testing surface state of sample to be tested - Google Patents

Apparatus for testing surface state of sample to be tested Download PDF

Info

Publication number
WO2023197124A1
WO2023197124A1 PCT/CN2022/086192 CN2022086192W WO2023197124A1 WO 2023197124 A1 WO2023197124 A1 WO 2023197124A1 CN 2022086192 W CN2022086192 W CN 2022086192W WO 2023197124 A1 WO2023197124 A1 WO 2023197124A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
sample
concave spherical
spherical mirror
tested
Prior art date
Application number
PCT/CN2022/086192
Other languages
French (fr)
Chinese (zh)
Inventor
高瑞彦
王海峰
Original Assignee
华为技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 华为技术有限公司 filed Critical 华为技术有限公司
Priority to CN202280094635.5A priority Critical patent/CN118974538A/en
Priority to PCT/CN2022/086192 priority patent/WO2023197124A1/en
Publication of WO2023197124A1 publication Critical patent/WO2023197124A1/en

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties

Definitions

  • the present application relates to the field of semiconductor manufacturing, and specifically to a device for detecting the surface state of a sample to be tested, a detection method thereof, and chemical mechanical grinding equipment.
  • Optical detection has been widely used in the field of industrial manufacturing.
  • the reflection or diffraction characteristics of light are usually used to detect sample defects; or in the use of chemical mechanical polishing to grind wafers.
  • the reflection characteristics of light are usually used to detect the grinding process of the sample to be tested, and then the detection results are used to adjust the grinding process or determine the grinding end point.
  • Chemical mechanical polishing systems often include but are not limited to laser reflection sensors, optical sensors, eddy current sensors, motor torque sensors, ultrasonic sensors, white light interferometers, spectral confocal rangefinders, and some back-end closed-loop control systems, zoned pressure control, and rotational speed. And grinding liquid flow rate adjustment, etc., this system is a necessary condition to ensure the quality of chemical mechanical grinding samples.
  • the laser reflection sensor and optical sensor of the above system are non-contact detection methods. Because of their fast detection speed and non-contact characteristics, they are very suitable for in-situ detection scenarios. In-situ detection means that there is no need to move the sample being tested. , detected during the grinding process.
  • the detection principle is to carry surface information of the sample to be measured through reflected light, such as the reflection intensity of the metal surface or dielectric layer. By using an optical sensor to identify the relative intensity change of the reflected light, the object to be measured can be identified. Some key information on the surface.
  • a plane mirror is used to reflect light into the sample to be tested. A plane mirror can only reflect light at one incident angle to the sample to be tested.
  • the incident angle of the light used to detect the sample to be tested is single.
  • a single angle. Light may cause errors in judgment; in addition, when there are some patterned metal traces or dielectric patterns on the sample to be tested, the size of the patterned metal or dielectric is relatively small, and the light at this incident angle is When diffraction occurs on its surface, it will also cause errors in judgment.
  • This application provides a device that uses multiple light rays at multiple incident angles to detect the surface state of a sample to be measured, which can effectively reduce judgment errors.
  • this application provides a device for detecting the surface state of a sample to be tested.
  • the device for detecting the surface state of a sample to be tested includes:
  • a light source component the light source component is used to emit multiple light rays with different exit angles
  • a first concave spherical mirror, the light emission position of the light source assembly is located at the first incident focus position of the first concave spherical mirror, and the sample to be measured is located at the first exit focus of the first concave spherical mirror;
  • the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror
  • An optical sensor is located at the second exit focus of the second concave spherical mirror.
  • the device for detecting the surface state of the sample to be tested uses a light source component to emit multiple light rays with different exit angles, and the light is incident on the sample to be tested through the first concave spherical mirror, so that the light incident on the sample to be tested is Light is light with multiple different incident angles.
  • the surface state of the sample to be tested changes, it will produce reflected light with multiple different intensity changes. That is to say, the light used to detect the surface state of the sample to be tested has multiple incidences. Angle, thereby generating reflected light with multiple intensity changes.
  • the intensity change of the emitted light can reflect the surface state of the sample to be measured.
  • the average of the multiple intensity change values of the multiple light rays is used to determine the light intensity compared with a single incident angle.
  • the intensity change value can reduce the measurement error; and these multiple reflected light beams with different intensity changes are incident on the second concave spherical mirror, and then are converged and reflected to the optical sensor. That is to say, only one optical sensor can obtain multiple Reflected light with different intensity changes can save space and simplify the processing circuit.
  • the light source assembly includes a light source and an emission auxiliary component, the emission auxiliary component being used to incident the light emitted by the light source into the first concave spherical mirror in a preset angle range.
  • the emission auxiliary component is an optical fiber
  • the light source is located at the first end of the optical fiber
  • the light emitted by the light source is incident into the optical fiber from the first end of the optical fiber
  • the second end of the optical fiber is the light exit end of the light source assembly.
  • the second end of the optical fiber is located at the first incident focus position of the first concave spherical mirror.
  • the light incident on the optical fiber is emitted from the optical fiber.
  • the second end emerges onto the first concave spherical mirror.
  • the light source assembly further includes a beam expander, the beam expander is located between the second end of the optical fiber and the first concave spherical mirror, and the beam expander is used to The light emitted from the second end of the optical fiber diverges to have the preset angle range.
  • the light source assembly further includes an optical coupler, the optical coupler is located between the light source and the first end of the optical fiber, and is used to couple the light emitted by the light source into The optical fiber.
  • the light source assembly further includes an optical filter, the optical filter is located between the light source and the first end of the optical fiber, and is used to filter the light emitted by the light source. , so that the light coupled into the optical fiber is light with a specific wavelength.
  • the emission auxiliary component is a light emitting component
  • the light emitting component is located between the light source and the first concave spherical mirror
  • the light emitting component is provided with a light emitting hole
  • the light emitting hole is the light exit position of the light source assembly
  • the light exit hole is located at the first incident focus position of the first concave spherical mirror
  • the part of the light exit component other than the light exit hole is used to block the light from the light source.
  • the light emitting component is one of a light emitting plate or a light emitting cover.
  • the light outlet hole is a through hole that penetrates the light outlet component.
  • the light outlet hole includes a through hole penetrating the light outlet component and a light-transmitting material filled in the through hole.
  • the first concave spherical mirror and the second concave spherical mirror have an integrated structure.
  • the first concave spherical mirror and the second concave spherical mirror are independent components.
  • the device for detecting the surface state of the sample to be measured also includes a processing circuit, the processing circuit is electrically connected to the optical sensor, and the processing circuit is used to obtain information based on the optical sensor. Use light to determine the surface condition of the sample to be tested.
  • Optical sensors include but are not limited to PD, APD, CCD or CMOS sensors.
  • Processing circuits include amplifier circuits, analog-to-digital conversion circuits, and calculation circuits.
  • the present application provides a chemical mechanical polishing equipment.
  • the chemical mechanical polishing equipment includes a polishing pad and a device for detecting the surface state of a sample to be tested as described in any one of the above.
  • the device for measuring the surface condition of the sample is located below the polishing pad, and the polishing pad is used to carry the sample to be tested.
  • the chemical mechanical polishing equipment further includes a grinding support column, and the polishing pad is located above the grinding support column.
  • the polishing pad includes a detection window that can transmit light, and the light reflected from the first concave spherical mirror passes through the detection window and is incident on the sample to be tested. .
  • the sample to be tested is a wafer.
  • the chemical mechanical polishing equipment further includes a grinding fluid for infiltrating the surface of the sample to be tested.
  • a grinding fluid for infiltrating the surface of the sample to be tested.
  • the chemical mechanical polishing equipment further includes a polishing head for pressing the sample to be tested.
  • this application also provides a method for detecting the surface state of a sample to be tested.
  • the method for detecting the surface state of a sample to be tested includes:
  • the plurality of light rays with different exit angles emitted by the light source assembly are incident on the first concave spherical mirror from a first incident focus position, wherein the light emission position of the light source assembly is located on the first side of the first concave spherical mirror. At the incident focus position;
  • the first concave spherical mirror to reflect the light onto the sample to be measured, wherein the sample to be measured is located at the first exit focus of the first concave spherical mirror;
  • the light reflected by the sample to be measured is reflected to the optical sensor through the second concave spherical mirror, wherein the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror, and the optical sensor The sensor is located at the second exit focus of the second concave spherical mirror.
  • the method for detecting the surface state of the sample to be tested further includes:
  • the optical sensor transmits the received light to a processing circuit
  • the processing circuit determines the surface state of the sample to be tested based on the light.
  • the light source component is used to emit multiple light rays with different exit angles, including:
  • the light emitted by the light source is incident on the first concave spherical mirror in a preset angle range using an emission auxiliary component.
  • the use of a light source component to emit multiple light rays with different exit angles also includes:
  • a beam expander is used to spread the light emitted from the emission auxiliary part to have the preset angle range, and the beam expander is located between the emission auxiliary part and the first concave spherical mirror.
  • the sample to be tested is a wafer.
  • the use of a light source component to emit multiple light rays with different exit angles also includes:
  • a beam expander is used to spread the light emitted from the emission auxiliary part to a preset angle range, and the beam expander is located between the emission auxiliary part and the first concave spherical mirror.
  • the use of a light source component to emit multiple light rays with different exit angles also includes:
  • An optical coupler is used to couple the light emitted by the light source into the optical fiber.
  • Figure 1 is a schematic structural diagram of chemical mechanical grinding equipment provided by an embodiment of the present application.
  • Figure 2 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application
  • Figure 3 is a schematic structural diagram of light incident on the sample to be tested in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 4 is a schematic structural diagram of light incident on the sample to be tested in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 5 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested in the prior art
  • Figure 6 is a schematic diagram of the positions of optical fibers and beam expanders in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 7 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application
  • Figure 8 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 9 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 10 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 11 is a schematic diagram of the positions of the light source, the light output component and the beam expander in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;
  • Figure 12 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application
  • Figure 13 is a schematic flow chart of a method for detecting the surface state of a sample to be tested according to an embodiment of the present application
  • Figure 14 is a sub-flow chart of step S100 of the present application.
  • PD Photo Diode, photodiode.
  • APD Avalanche Photo Diode, avalanche photodiode.
  • CCD Charge Coupled Device
  • CMOS sensor complementary metal oxide semiconductor sensor.
  • LED light-emitting diode, light-emitting diode.
  • This application provides a device for detecting the surface state of the sample to be tested, which can be used in chemical mechanical grinding equipment to detect the grinding end point of the sample to be tested.
  • the device for detecting the surface state of the sample to be tested includes a light source. component, a first concave spherical mirror, a second concave spherical mirror and an optical sensor, wherein the light source component is used to emit multiple light rays with different exit angles.
  • the light emission position of the light source component is located at the first incident focus of the first concave spherical mirror.
  • the sample to be measured Located at the first exit focus of the first concave spherical mirror, the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror, and the optical sensor is located at the second exit focus of the second concave spherical mirror.
  • a plurality of light rays with different exit angles are emitted through the light source component, and the light rays are incident on the sample to be tested through the first concave spherical mirror, so that the light rays incident on the sample to be tested are light rays with multiple different incident angles, and are then passed through the sample in sequence.
  • the measured sample and the second concave spherical mirror reflect and then enter the optical sensor.
  • the light used to detect the surface state of the sample to be measured has multiple incident angles, thereby generating reflected light with multiple intensity changes.
  • the intensity of the reflected light changes. It can reflect the status of the sample to be measured, and use the average of multiple intensity change values of multiple light rays to determine the intensity change value compared to a single incident angle of light, which can reduce measurement errors.
  • the chemical mechanical polishing equipment 1 includes a device 10 for detecting the surface state of a sample to be tested, a sample to be tested 20 and a polishing pad 30.
  • the device 10 for measuring the surface condition of the sample is located below the polishing pad 30 .
  • the polishing pad 30 is used to carry the sample 20 to be measured.
  • the sample 20 to be measured is located above the polishing pad 30 .
  • the chemical mechanical polishing equipment 1 also includes a grinding support column 40.
  • the polishing pad 30 is located above the grinding support column 40.
  • the device 10 for detecting the surface state of the sample to be tested is located In the accommodation space below the polishing pad 30 .
  • the sample 30 to be tested is a wafer.
  • the wafer includes multiple dielectric layers and multiple metal layers.
  • one metal layer needs to be removed to expose the dielectric layer; or one of the metal layers needs to be removed.
  • One dielectric layer exposes another dielectric layer; or one metal layer is removed to expose another metal layer.
  • the surface state of the sample 20 to be tested refers to the surface material of the sample 20 to be tested.
  • the polishing pad 30 includes a detection window 31 that can transmit light.
  • the light reflected from the first concave spherical mirror 200 in the device 10 for detecting the surface state of the sample to be tested is incident through the detection window 31 to the sample 20 to be tested.
  • the polishing pad 30 can be made of polymer material, such as polyurethane, and the detection window 31 can be made of light-transmitting material.
  • the chemical mechanical polishing equipment 1 further includes a polishing liquid 50 .
  • the polishing liquid 50 is dropped onto the polishing pad 30 and flows between the wafer 20 and the polishing pad 30 .
  • the reflection intensity of the light is affected by the surface material of the polishing fluid and the sample 20 to be tested and the incident angle.
  • the material of the polishing fluid and the incident angle remain unchanged. In the case of It is judged that the grinding end point has been reached and no further grinding is required at this time.
  • the light source assembly 100 is used to emit multiple light rays with different exit angles, and the light rays are incident on the sample to be tested 20 through the first concave spherical mirror 200, so that The light incident on the sample 20 to be tested is light with multiple different incident angles.
  • the surface material of the sample 20 to be tested changes, multiple reflected light rays with different intensity changes will be generated. These multiple reflected light rays with different intensity changes will be generated.
  • the light used to reflect the interface material of the sample 20 to be tested has multiple incident angles, and thus has multiple reflected light changes in intensity.
  • the average value of the multiple intensity change values of the multiple light rays is used to determine the comparison.
  • the intensity change value of light at a single incident angle can reduce measurement errors.
  • the specific structural components of the chemical mechanical polishing equipment 1 in this application are not limited to the structure shown in Figure 1, and may also include more structural components to achieve specific functions in the chemical mechanical polishing process.
  • it may also include a polishing head for pressing the sample 20 to be tested.
  • the sample 20 to be tested is not limited to wafers. As long as one of the materials is removed during the grinding process to expose the other material, the device 10 for detecting the surface state of the sample to be tested can be used. Detect grinding end point.
  • the surface state of the sample to be tested 20 is not limited to the surface material, but may also include the surface texture or fine structure of the sample to be tested 20 .
  • the fine structure includes protrusions, depressions, scratches, foreign matter, cracks, etc.
  • the device 10 for detecting the surface state of the sample to be tested can be used to detect product defects or yield, for example, to detect protrusions on the surface of the product 20. , dents, scratches, foreign objects and cracks and other defects.
  • the light information of the standard sample can be obtained in advance through the device 10 of the present application for detecting the surface state of the sample to be tested, and then the light information of the 100 samples to be tested 20 can be detected.
  • the product yield can be calculated.
  • multiple light rays with different exit angles are emitted, and the light rays are incident on the sample to be tested 20 through the first concave spherical mirror 200, so that the light rays incident on the sample to be tested 20 have multiple different incident angles.
  • a plurality of reflected light rays with different intensity changes will be generated.
  • the intensity change value of the light rays at a single incident angle is determined by averaging the intensity change values of the multiple rays of light, thereby reducing the measurement error.
  • the device 10 for detecting the surface state of the sample to be tested is introduced in detail below.
  • An embodiment of the present application provides a device 10 for detecting the surface state of a sample to be tested.
  • the device 10 for detecting the surface state of a sample to be tested includes a light source assembly 100 , a first concave spherical mirror 200 , a second concave spherical mirror 200 , and a second concave spherical mirror 200 .
  • Spherical mirror 300 and optical sensor 400 are examples of the present application.
  • the light source component 100 is used to emit multiple light rays with different exit angles. That is to say, the exit angle of the light rays emitted from the light source component 100 is not one angle value, but has multiple angle values, or the emitted light rays are fan-shaped. , the sector has a certain angle range.
  • the light emission position of the light source assembly 100 is located at the first incident focus 210 of the first concave spherical mirror 200 , and the sample 20 to be tested is located at the first exit focus 220 of the first concave spherical mirror 200 .
  • the light emitted from the first incident focus 210 will be reflected and converged to the first exit focus 220 after being incident on the first concave spherical mirror 200. Since the emitted light has multiple exit angles, the light incident on the first concave spherical mirror 200 will also be reflected. With multiple angles of incidence.
  • the first incident focus 210 refers to the incident focus where the light rays are incident on the first concave spherical mirror 200 with the same focus
  • the first exit focus 220 refers to the focus where the light rays converge after being reflected by the first concave spherical mirror 200.
  • the first incident focus 210 and the first exit focus 220 are adapted to each other.
  • the same first concave spherical mirror 200 has multiple first incident focus points 210 and multiple first exit focus points matching them. 220.
  • the sample 20 to be measured is located at the first exit focus 220 means that the focus point of the light after passing through the detection window 31 falls on the surface of the sample 20 to be measured facing the detection window 31, as long as the first exit focus 220 is located at the detection window 31.
  • the area on the surface of sample 20 that needs to be detected is sufficient.
  • the positions of the first incident focus 210 and the first exit focus 220 will also be different.
  • the light emission position and the placement position of the sample 20 to be measured can be determined in advance, and then the first concave spherical mirror 200 with appropriate curvature can be selected; the first concave spherical mirror 200 with a curvature can also be selected first, and then the first concave spherical mirror can be adjusted by adjusting the first concave spherical mirror 200 .
  • the light emitting position, and the sample to be tested 20 are placed so that the light emitting position is located at the first incident focus 210 and the sample 20 to be measured is located at the first exit focus 220.
  • the second incident focus 310 of the second concave spherical mirror 300 coincides with the first exit focus 220 of the first concave spherical mirror 200 .
  • Multiple light rays with different exit angles will be incident on the sample to be measured 20 at multiple different incident angles, and then reflected from the sample to be measured 20 to the second concave spherical mirror 300 at multiple different reflection angles.
  • the optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 .
  • the light incident on the second concave spherical mirror 300 also has multiple incident angles, is reflected by the second concave spherical mirror 300 and then converges into the optical sensor 400 .
  • the second incident focus 310 refers to the incident focus where the light rays are incident on the second concave spherical mirror 300 with the same focus
  • the second exit focus 320 refers to the focus where the light rays converge after being reflected by the second concave spherical mirror 300.
  • the second incident focus 310 and the second exit focus 320 are adapted to each other.
  • the same second concave spherical mirror 300 has multiple second incident focus points 310 and multiple second exit focus points matching them. 320.
  • the fact that the optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 means that the convergence point of the light reflected by the second concave spherical mirror 300 falls on the optical sensor 400, so that the light can be acquired by the optical sensor 400.
  • the optical sensor 400 includes a photosensitive area, the photosensitive area can be used to collect light, and the second exit focus 320 is located on the photosensitive area.
  • the curvature of the second concave spherical mirror 300 is different, and the positions of the second incident focus 310 and the second exit focus 320 may be different.
  • the placement positions of the sample to be tested 20 and the optical sensor 400 can be determined in advance, and then the second concave spherical mirror 300 with appropriate curvature can be selected.
  • a second concave spherical mirror 300 with a curvature can be selected first, and then the second concave spherical mirror can be adjusted by adjusting the second concave spherical mirror 300 .
  • the sample to be measured 20 and the optical sensor 400 are placed so that the sample to be measured 20 is located at the second incident focus 310 and the optical sensor 400 is located at the second exit focus 320.
  • the first concave spherical mirror 200 and the second concave spherical mirror 300 are integrated structures.
  • the first concave spherical mirror 200 and the second concave spherical mirror 300 can be independent structures.
  • the first concave spherical mirror 200 and the second concave spherical mirror 300 can be spherical or ellipsoidal, and the specific curvature can be set according to actual requirements.
  • the light propagation path in this embodiment is: multiple light rays L with different exit angles are incident from the first incident focus 210 to the first concave spherical mirror 200, are reflected by the first concave spherical mirror 200 to the sample 20 to be measured, and are reflected by the first concave spherical mirror 200.
  • the measured sample 20 reflects to the second concave spherical mirror 300 , is reflected by the second concave spherical mirror 300 , and then enters the optical sensor 400 .
  • the device 10 for detecting the surface state of the sample to be tested also includes a processing circuit 500.
  • the processing circuit 500 is electrically connected to the optical sensor 400.
  • the processing circuit 500 is used to determine the polishing end point based on the light acquired by the optical sensor 400.
  • the optical sensor 400 includes but is not limited to PD, APD, CCD or CMOS sensor.
  • the processing circuit 500 includes an amplification circuit, an analog-to-digital conversion circuit, a calculation circuit, etc.
  • the sample 20 to be tested is a wafer, which includes multiple dielectric layers and multiple metal layers.
  • a chemical mechanical polishing method is used to polish the dielectric layers.
  • the metal layer is removed, and the reflection intensity of light incident on the surface of different materials is different, so the grinding end point can be determined based on the change in reflection intensity.
  • the wafer 20 includes a dielectric layer 21 and a metal layer 22.
  • the metal layer 22 needs to be removed through chemical mechanical polishing in this embodiment.
  • the light L is always incident on the wafer 20.
  • the metal layer 22 is not completely removed, the light L is incident on the surface of the wafer 20 with the metal layer 22.
  • the surface of the wafer 20 reflects the reflected light L1 with the reflection intensity A1.
  • the metal layer 22 is completely removed by grinding After removal (as shown in Figure 4), the dielectric layer 21 will be exposed. Since the material of the surface where the light L is incident has changed, the surface of the wafer 20 reflects the reflected light L2 whose reflection intensity changes to A2.
  • A2 is not equal to A1, and is The light reflected by the wafer 20 is reflected into the optical sensor 400 through the second concave spherical mirror 300.
  • the optical sensor 400 then sends the light with different reflection intensities to the processing circuit 500.
  • the processing circuit 500 can determine the wafer according to the change in the light reflection intensity. Whether the circle reaches the grinding end point. In this application, multiple light rays with different incident angles are incident on the surface of the wafer 20 . When the material of the surface of the wafer 20 changes, multiple light rays with changing reflection intensity will be generated. The changed multiple light rays are incident on the surface of the wafer 20 .
  • the optical sensor 400 is then processed by the processing circuit 500 to obtain the average value of the intensity changes of multiple light rays. The error in determining whether the wafer 20 has reached the polishing end point through the average value is smaller, making the determination result of the polishing end point more accurate.
  • the detection device includes a light source 11, a plane mirror 12, a sample to be tested 20 and an optical sensor 13. Since the angle of light reflected by the plane mirror to the sample to be tested 20 is single, the incident angle of the light incident on the sample to be tested 20 is one. , the reflection angle is only one, and the reflection intensity value that reflects the change of the wafer surface material is also only one.
  • the optical sensor 13 There is only one light intensity change value after reflection from the sample 20 to be measured to the optical sensor 13, which makes the detection effect error larger, especially They are two layers with little change in the material properties of the wafer surface.
  • the wafer 20 includes a first dielectric layer 23 and a second dielectric layer 24, and the material properties of the first dielectric layer 23 and the second dielectric layer 24 are not much different.
  • the second dielectric layer 24 is removed by chemical mechanical polishing, the reflection intensity of the light incident on the second dielectric layer 24 and the first dielectric layer 23 does not change much at one of the incident angles, causing errors in the determination of the polishing end point. .
  • the size of the patterned metal or dielectric is relatively small, and the light will be diffracted on the surface.
  • the method shown in Figure 5 if the light at this incident angle is not within its nth order diffracted light range, this light will be diffracted on the surface of the wafer 20 , which is likely to cause errors in detection and judgment.
  • multiple light rays with multiple incident angles are incident on the surface of the wafer 20.
  • the surface of the wafer 20 has patterned metal traces or dielectric patterns, if the light rays at one of the incident angles are diffracted. , light at other incident angles does not diffract, and non-diffracted light can effectively detect the grinding end point, thereby reducing detection errors.
  • the device 10 provided by this application for detecting the surface state of a sample to be tested uses a light source assembly 100 to emit multiple light rays with different exit angles, and the light rays are incident on the sample 20 to be tested through the first concave spherical mirror 200, so that the light rays are incident on the sample 20 to be tested.
  • the light of the sample to be tested 20 is light with multiple different incident angles.
  • reflected light with multiple different intensity changes will be generated, which is to say that it is used to detect the surface state of the sample to be tested.
  • the light has multiple incident angles, thereby producing reflected light with multiple intensity changes.
  • the intensity change of the emitted light can reflect the surface state of the sample to be tested, and the comparison is judged by the average of the multiple intensity change values of the multiple light rays.
  • the intensity change value of light at a single incident angle can reduce measurement errors; in this application, these multiple reflected light rays with different intensity changes are incident on the second concave spherical mirror 300, and then are converged and reflected to the optical sensor 400, that is, It is said that only one optical sensor 400 can acquire multiple reflected lights with different intensity changes, which can save space and size and simplify the processing circuit.
  • the light source assembly 100 includes a light source 110 and an emission auxiliary component 120.
  • the emission auxiliary component 120 is used to incident the light emitted by the light source 110 into the first concave surface in a preset angle range.
  • the light source 110 may be one of a halogen light source, a laser light source, or an LED light source, and the light emitted by the laser light source may be a laser of any wavelength, for example, a laser with a wavelength of 670 nm is generated.
  • the light emitted by the general light source 110 will diverge to the surroundings with the light source 110 as the center.
  • the emission auxiliary member 120 allows the light emitted by the light source 110 to gather into a preset angle range.
  • the preset angle range can be set according to actual needs.
  • the emission auxiliary component 120 is an optical fiber 130
  • the light source 110 is located at the first end 131 of the optical fiber 130
  • the light emitted by the light source 110 is incident on the optical fiber from the first end 131 of the optical fiber 130.
  • the second end 132 of the optical fiber 130 is the light exit end of the light source assembly 100.
  • the second end 132 of the optical fiber 130 is located at the first incident focus 210 of the first concave spherical mirror 200.
  • the light incident on the optical fiber 130 is emitted from the optical fiber 130.
  • the second end 132 emerges onto the first concave spherical mirror 200 .
  • the optical fiber 130 is used as the emission auxiliary component 120.
  • the optical fiber 130 has certain bending properties, which makes the placement of the light source 110 more flexible.
  • the length of the optical fiber 130 can be long or short, for example, when placing the device 10 for detecting the surface state of the sample to be tested.
  • the light source 110 can be set at a position that can save size according to the actual situation, and then the light is introduced to the light emission position through the optical fiber 130 , that is, the second end 132 of the light 130 only needs to be placed on the first concave spherical mirror 200
  • the first emission focus is 210.
  • the light source 110 when the light source 110 is directly placed at the first emission focus 210 of the first concave spherical mirror 200, the light source 110 is relatively close to the sample to be measured 20 and the optical sensor 400, and the heat generated when emitting light will affect the surface state of the sample to be measured 20 or may cause damage to the surface of the sample 20. Affects the performance of the optical sensor 400 in collecting reflected light, thereby affecting the detection accuracy.
  • the optical fiber 130 is used to transmit light, and the light source 110 can be set at other positions, thereby reducing the heat generated by the light source 110 when emitting light on the surface of the sample 20 to be measured Or the influence of the optical sensor 400, thereby improving the detection accuracy.
  • the angular range of the light emitted by the second end 132 of the optical fiber 130 can be determined according to the numerical aperture of the optical fiber 130. Generally, the larger the numerical aperture of the optical fiber 130, the wider the angular range of the emitted light.
  • the light source assembly 100 further includes a beam expander 140.
  • the beam expander 140 is located between the second end 132 of the optical fiber 130 and the first concave spherical mirror 200.
  • the beam expander 140 is The light emitted from the second end 132 of the optical fiber 130 is diverged to a predetermined angle range.
  • the numerical aperture of the optical fiber 130 is small, and the angle range of the light emitted from the optical fiber 130 is narrow, which cannot meet the detection requirements.
  • the beam expander 140 can be used to spread the light emitted from the optical fiber 130 to a preset angle range. .
  • the light source assembly 100 further includes an optical coupler 150.
  • the optical coupler 150 is located between the light source 110 and the first end 131 of the optical fiber 130 and is used to transmit the light emitted by the light source 110. Light couples into optical fiber 130.
  • the optical coupler 150 may be composed of multiple lenses. Generally, the light emitted by the light source 110 has a wide range, and the light needs to be coupled into the optical fiber 130 through the optical coupler 150 to increase the intensity of the light incident on the optical fiber 130 .
  • the light source assembly 100 further includes an optical filter located between the light source 110 and the first end 131 of the optical fiber 130 for filtering the light emitted by the light source 110 so that the light coupled into the optical fiber 130 is light with a specific wavelength.
  • the wavelength of the light used to detect the surface state of the sample to be tested depends on the surface state of the sample to be tested 20 and the characteristics of the optical sensor 400 . That is to say, the surface state of the sample to be tested 20 is different, which can reflect the light at the end of the grinding process.
  • the wavelength range may be different, and different optical sensors 400 have different sensitivities to light in different wavelength ranges, which can be set according to actual needs. Light with specific wavelengths can be obtained through optical filters.
  • the optical filter can be disposed between the optical coupler 150 and the light source 110, or the optical filter can be disposed between the optical coupler 150 and the first end 131 of the optical fiber 130. .
  • the emission auxiliary component 120 is a light emitting component 160, and the light emitting component 160 is located between the light source 110 and the first concave spherical mirror 200.
  • the light-emitting component 160 is provided with a light-emitting hole 161.
  • the light-emitting hole 161 is the light emitting position of the light source assembly 100.
  • the light-emitting hole 161 is located at the first incident focus 210 of the first concave spherical mirror 200.
  • the part of the light-emitting component 160 other than the light emitting hole 161 It can be used to block light from other angles of the light source 110 .
  • the light emitted by the light source 110 emits part of the light through the light outlet 161 as the working light.
  • the part of the light outlet component 160 except the light outlet 161 can be used to block the light from other angles of the light source 110, thereby preventing other light from affecting the working light. interference.
  • the light-emitting hole 161 is a through-hole 162 that penetrates the light-emitting component 160 (as shown in FIG. 8 ).
  • the shape of the light-emitting hole 161 is not limited to a slit, a circle, a square, a triangle, or a polygon.
  • the light outlet hole 161 includes a through hole 162 penetrating the light outlet component 160 and a light-transmitting material 163 filled in the through hole 162 (as shown in FIG. 9 ).
  • the light emitting component 160 is one of the light emitting plate 164 or the light emitting cover 165 .
  • the light-emitting component 160 shown in Figures 7 to 9 is a light-emitting plate 164
  • the light-emitting component 160 shown in Figure 10 is a light-emitting cover 165.
  • the light-emitting cover 165 is located outside the light source 110 and can effectively block other unnecessary light to avoid Other lights generate more heat, which affects detection accuracy.
  • the light output mask 165 may only cover a part of the light source 110 , or the shape of the light mask 165 may be spherical or ellipsoidal.
  • a beam expander 140 (as shown in FIG. 11 ) may also be provided on the side of the light outlet 161 away from the light source 110 to diffuse the light emitted from the light outlet 161 to a preset angle range.
  • the difference from the embodiment shown in FIG. 1 is that the first concave spherical mirror 200 and the second concave spherical mirror 300 are independent components, rather than an integrated structure.
  • the separately provided first concave spherical mirror 200 and the second concave spherical mirror 300 have higher assembly flexibility and a wider curvature selection range.
  • each component of the device 10 for detecting the surface state of the sample to be tested in this application can be set according to the application scenario.
  • it when applied to chemical mechanical polishing equipment 1, it can be set according to the structural shape and space of chemical mechanical polishing equipment 1, as long as the above-mentioned light propagation path is satisfied to achieve the purpose of detecting the grinding end point, and it can be set additionally in actual products.
  • a support frame or an existing structural component can be used as a supporting position to fix each component of the device 10 for detecting the surface state of the sample to be tested.
  • the installation position of each component of the device 10 for detecting the surface state of the sample to be tested is not limited to this application.
  • the location diagram shown in the application drawing is attached.
  • one embodiment of the present application also provides a method for detecting the surface state of a sample to be tested.
  • the method for detecting the surface state of a sample to be tested includes step S100, step S200, step S300 and step S400. Detailed steps are described below.
  • Step S100 use the light source assembly 100 to emit multiple light rays with different exit angles.
  • Step S200 Inject multiple light rays with different exit angles emitted by the light source assembly 100 from the first incident focus 210 position to the first concave spherical mirror 200, where the light emission position of the light source assembly 100 is located at the first incident focus of the first concave spherical mirror 200. At position 210.
  • Step S300 use the first concave spherical mirror 200 to reflect light onto the sample 20 to be tested, where the sample 20 to be tested is located at the first exit focus 220 of the first concave spherical mirror 200 .
  • the sample 20 to be tested is a wafer, which includes multiple dielectric layers and multiple metal layers.
  • a chemical mechanical polishing method is used to polish the dielectric layers.
  • the metal layer is removed, and the reflection intensity of light incident on the surface of different materials is different, so the grinding end point can be determined based on the change in reflection intensity.
  • Step S400 the light reflected by the sample 20 to be measured is reflected to the optical sensor 400 through the second concave spherical mirror 300, where the second incident focus 310 of the second concave spherical mirror 300 coincides with the first exit focus 220 of the first concave spherical mirror 200.
  • the optical sensor 400 is located on the second exit focus 320 of the second concave spherical mirror 300 .
  • the first incident focus 210 refers to the incident focus where the light rays are incident on the first concave spherical mirror 200 with the same focus
  • the first exit focus 220 refers to the focus where the light rays converge after being reflected by the first concave spherical mirror 200.
  • the first incident focus point 210 and the first exit focus point 220 are adapted to each other.
  • the same first concave spherical mirror 200 has multiple first incident focus points 210 and multiple first exit focus points 220 matching them.
  • the sample 20 to be tested is located at the first exit focus 220 means that the focus point of the light after passing through the detection window 31 falls on the surface of the sample 20 to be tested facing the detection window 31, as long as the first exit focus 220 is located at the detection window 31.
  • the area on the surface of sample 20 that needs to be detected is sufficient.
  • the second incident focus 310 refers to the incident focus where the light rays enter the second concave spherical mirror 300 with the same focus.
  • the second exit focus 320 refers to the focus where the light rays converge after being reflected by the second concave spherical mirror 300.
  • the second incident focus 310 and the second exit focus 320 are adapted to each other.
  • the same second concave spherical mirror 300 has multiple second incident focus 310 and multiple second exit focus 320 matching them.
  • the fact that the optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 means that the convergence point of the light reflected by the second concave spherical mirror 300 falls on the optical sensor 400, so that the light can be acquired by the optical sensor 400.
  • the optical sensor 400 includes a photosensitive area, the photosensitive area can be used to collect light, and the second exit focus 320 is located on the photosensitive area.
  • the method for detecting the surface state of a sample to be tested uses the light source assembly 100 to emit multiple light rays with different exit angles, and the light is incident on the sample to be tested 20 through the first concave spherical mirror 200, so that the light is incident on the sample to be tested.
  • the light of the sample 20 to be tested is light with multiple different incident angles.
  • reflected light with multiple different intensity changes will be generated, which means that it is used to detect the surface state of the sample to be tested.
  • Light has multiple incident angles, thereby producing reflected light with multiple intensity changes.
  • the intensity change of the emitted light can reflect the surface state of the sample to be tested.
  • the average of the multiple intensity change values of the multiple light rays is used to determine the relative intensity of the light.
  • the intensity change value of light at a single incident angle can reduce measurement errors; in this application, these multiple reflected light rays with different intensity changes are incident on the second concave spherical mirror 300, and then are converged and reflected to the optical sensor 400, that is to say Only one optical sensor 400 can acquire multiple reflected lights with different intensity changes, which can save space and simplify the processing circuit.
  • the grinding end point of the sample 20 to be tested is determined by judging the material change on the surface of the sample 20 to be tested.
  • the surface state of the sample 20 to be tested is the surface texture or fine structure of the sample 20 to be tested.
  • the fine structures include protrusions, depressions, scratches, stains, foreign matter, cracks, etc.
  • the method for detecting the surface state of the sample to be tested 20 can also be applied to detect product defects.
  • the first concave spherical mirror 200 is used to detect the light incident on the sample 20 to be tested. For light with multiple different incident angles, when the surface texture or fine structure of the sample 20 to be tested is different from the standard sample, multiple reflected rays with different intensity changes will be generated. Compared with the light with a single incident angle, the reflected light can be reduced. Measurement error.
  • the method for detecting the surface state of the sample to be tested also includes step S500 and step S600. Detailed steps are described below.
  • step S500 the optical sensor 400 transmits the received light to the processing circuit 500.
  • the light beams with multiple different reflection intensities emitted from the second concave spherical mirror 300 are received by the optical sensor 400 and then transmitted to the processing circuit 500 .
  • the processing optical sensor 400 includes but is not limited to PD, APD, CCD or CMOS sensor.
  • the processing circuit 500 includes an amplification circuit, an analog-to-digital conversion circuit, a calculation circuit, etc.
  • step S600 the processing circuit 500 determines the surface state of the sample 20 to be tested based on the light.
  • the processing circuit 500 determines the surface material change of the sample to be tested 20 based on the light, and then determines the grinding end point of the sample to be tested 20 .
  • step S100 includes step S110 and step S120. Detailed steps are described below.
  • Step S110 use the light source 110 to emit light.
  • Step S120 use the emission auxiliary component 120 to make the light emitted by the light source 110 incident on the first concave spherical mirror 200 in a preset angle range.
  • the light source 110 may be one of a halogen light source, a laser light source, or an LED light source, and the light emitted by the laser light source may be a laser of any wavelength, for example, a laser with a wavelength of 670 nm is generated.
  • the light emitted by the general light source 110 will diverge to the surroundings with the light source 110 as the center.
  • there is no emission auxiliary component 120 there will also be light with a certain preset angle range incident on the first concave spherical mirror 200.
  • the incident light is incident on the first concave spherical mirror 200.
  • the light reflected from the first concave spherical mirror 200 to the sample 20 to be measured is called the working light.
  • the emission auxiliary member 120 is used to gather the light emitted by the light source 110 to a preset angle range.
  • the intensity of the light incident on the first concave spherical mirror 200 can be enhanced, and on the other hand, the impact of other light on the working light can be reduced. interference.
  • the preset angle range can be set according to actual needs.
  • step S100 also includes step S130.
  • Step S130 use the beam expander 140 to spread the light emitted from the emission auxiliary member 120 to a preset angle range.
  • the beam expander 140 is located between the emission auxiliary member 120 and the first concave spherical mirror 200 .
  • the beam expander 140 can be used to diffuse the light emitted from the emission auxiliary component 120 to a preset angle range.
  • step S100 further includes using an optical filter to filter the light emitted by the light source 110 so that the light coupled into the optical fiber 130 is light with a specific wavelength.
  • the optical filter is located between the light source 110 and the first end 131 of the optical fiber 130 .
  • the wavelength of the light used to detect the surface state of the sample to be tested depends on the surface state of the sample to be tested 20 and the characteristics of the optical sensor 400 . That is to say, the surface state of the sample to be tested 20 is different, which can reflect the light at the end of the grinding process.
  • the wavelength range may be different, and different optical sensors 400 have different sensitivities to light in different wavelength ranges, which can be set according to actual needs. Light with specific wavelengths can be obtained through optical filters.
  • the emission auxiliary component 120 is an optical fiber 130.
  • Step S120 is to use the optical fiber 130 to incident the light emitted by the light source 110 into the first concave spherical mirror 200 in a preset angle range.
  • Step S130 is to use the beam expander 140 to spread the light emitted from the optical fiber 130 to a preset angle range.
  • the beam expander 140 is located between the optical fiber 130 and the first concave spherical mirror 200 .
  • the light source 110 is located at the first end 131 of the optical fiber 130.
  • the light emitted by the light source 110 is incident from the first end 131 of the optical fiber 130 into the optical fiber 130.
  • the second end 132 of the optical fiber 130 is the light exit end of the light source assembly 100.
  • the optical fiber 130 The second end 132 is located at the first incident focus 210 of the first concave spherical mirror 200 , and the light incident on the optical fiber 130 is emitted from the second end 132 of the optical fiber 130 to the first concave spherical mirror 200 .
  • Optical fiber 130 is used as the launch auxiliary component 120.
  • the optical fiber 130 has certain bending properties, which makes the placement of the light source 110 more flexible.
  • the length of the optical fiber 130 can be long or short. For example, when the installation space is limited, the light source 110 can be placed according to the actual situation. It is set at a position that can save size, and then the light is introduced to the light emission position through the optical fiber 130, that is, the second end 132 of the light 130 only needs to be placed on the first emission focus 210 of the first concave spherical mirror 200.
  • the light source 110 when the light source 110 is directly placed at the first emission focus 210 of the first concave spherical mirror 200, the light source 110 is relatively close to the sample to be measured 20 and the optical sensor 400, and the heat generated when emitting light will affect the surface state of the sample to be measured 20 or may cause damage to the surface of the sample 20. Affects the performance of the optical sensor 400 in collecting reflected light, thereby affecting the detection accuracy.
  • the optical fiber 130 is used to transmit light, and the light source 110 can be set at other positions, thereby reducing the heat generated by the light source 110 when emitting light on the surface of the sample 20 to be measured Or the influence of the optical sensor 400, thereby improving the detection accuracy.
  • the angular range of the light emitted by the second end 132 of the optical fiber 130 can be determined according to the numerical aperture of the optical fiber 130. Generally, the larger the numerical aperture of the optical fiber 130, the wider the angular range of the emitted light.
  • step S100 further includes using an optical coupler 150 to couple the light emitted by the light source 110 into the optical fiber 130 .
  • the optical coupler 150 may be composed of multiple lenses. Generally, the light emitted by the light source 110 has a wide range, and the light needs to be coupled into the optical fiber 130 through the optical coupler 150 to increase the intensity of the light incident on the optical fiber 130 .
  • the emission auxiliary component 120 is a light emitting component 160 .
  • Step S120 is to use the light emitting component 160 to incident the light emitted by the light source 110 into the first concave spherical mirror 200 in a preset angle range.
  • Step S130 is to use the beam expander 140 to diffuse the light emitted from the light emitting component 160 to a preset angle range. The beam expander 140 is located between the light emitting component 160 and the first concave spherical mirror 200.
  • the light-emitting component 160 is provided with a light-emitting hole 161.
  • the light-emitting hole 161 is the light emitting position of the light source assembly 100.
  • the light-emitting hole 161 is located at the first incident focus 210 of the first concave spherical mirror 200.
  • the light-emitting component 160 is other than the light emitting hole 161.
  • the portion can be used to block light from other angles of the light source 110 .
  • part of the light emitted by the light source 110 passes through the light exit hole 161 as working light.
  • the part of the light exit component 160 except the light exit hole 161 can be used to block light from other angles of the light source 110 to avoid other light rays from affecting the working light. interference.
  • the light-emitting hole 161 is a through-hole 162 that penetrates the light-emitting component 160 (as shown in FIG. 8 ).
  • the shape of the light-emitting hole 161 is not limited to a slit, a circle, a square, a triangle, or a polygon.
  • the light outlet hole 161 includes a through hole 162 penetrating the light outlet component 160 and a light-transmitting material 163 filled in the through hole 162 (as shown in FIG. 9 ).
  • the light emitting component 160 is one of the light emitting plate 164 or the light emitting cover 165 .
  • the light-emitting component 160 shown in Figures 7 to 9 is a light-emitting plate 164
  • the light-emitting component 160 shown in Figure 10 is a light-emitting cover 165.
  • the light-emitting cover 165 is located outside the light source 110 and can effectively block other unnecessary light to avoid Other lights generate more heat, which affects detection accuracy.
  • the light output mask 165 may only cover a part of the light source 110 , or the shape of the light mask 165 may be spherical or ellipsoidal.
  • a beam expander 140 (as shown in FIG. 11 ) may also be provided on the side of the light outlet 161 away from the light source 110 to diffuse the light emitted from the light outlet 161 to a preset angle range.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

The present application provides an apparatus and method for testing a surface state of a sample to be tested, and a chemical mechanical polishing device. The apparatus for testing a surface state of a sample to be tested comprises a light source assembly, a first concave spherical mirror, a second concave spherical mirror and an optical sensor. The light source assembly emits multiple light rays with different angles of emergence from a first incident focal point of the first concave spherical mirror, the sample to be tested is located at a first emergent focal point of the first concave spherical mirror, a second incident focal point of the second concave spherical mirror coincides with the first emergent focal point, and the optical sensor is located on a second emergent focal point of the second concave spherical mirror. Light rays with different angles of emergence are emitted and incident on the sample by means of the first concave spherical mirror, so that the light rays used for testing the surface state of the sample have multiple angles of incidence, thereby generating reflected light rays with multiple changes in intensity. Compared with light rays with a single angle of incidence, the measurement error can be reduced.

Description

用于检测待测样品表面状态的装置Device for detecting the surface condition of the sample to be tested 技术领域Technical field

本申请涉及半导体制造领域,具体涉及一种用于检测待测样品表面状态的装置及其检测方法、化学机械研磨设备。The present application relates to the field of semiconductor manufacturing, and specifically to a device for detecting the surface state of a sample to be tested, a detection method thereof, and chemical mechanical grinding equipment.

背景技术Background technique

光学检测已经被广泛应用在工业制造领域中,例如在高精密产品的生产过程中,通常利用光线的反射或者衍射特性来对样品瑕疵进行检测;或者在采用化学机械研磨对晶圆进行研磨加工的生产过程中,通常利用光线的反射特性来对待测样品的研磨进程进行检测,进而通过检测结果来调整研磨过程的调整或者判定研磨终点。化学机械研磨系统往往包含但不限于激光反射传感器、光学传感器、电涡流传感器、电机扭矩传感器、超声波传感器、白光干涉仪、光谱共焦测距仪以及一些后端的闭环控制系统,分区压力控制,转速和研磨液流速调节等等,这套系统是保障化学机械研磨出样质量的必要条件。Optical detection has been widely used in the field of industrial manufacturing. For example, in the production process of high-precision products, the reflection or diffraction characteristics of light are usually used to detect sample defects; or in the use of chemical mechanical polishing to grind wafers. During the production process, the reflection characteristics of light are usually used to detect the grinding process of the sample to be tested, and then the detection results are used to adjust the grinding process or determine the grinding end point. Chemical mechanical polishing systems often include but are not limited to laser reflection sensors, optical sensors, eddy current sensors, motor torque sensors, ultrasonic sensors, white light interferometers, spectral confocal rangefinders, and some back-end closed-loop control systems, zoned pressure control, and rotational speed. And grinding liquid flow rate adjustment, etc., this system is a necessary condition to ensure the quality of chemical mechanical grinding samples.

其中,上述系统的激光反射传感器和光学传感器属于无接触的检测方法,因为其检测速度快,无接触的特性,很适合用于原位检测的场景,原位检测是指无需将被测样品移动,在研磨过程中检测,其检测原理是通过反射光线携带有待测样品表面信息,比如金属表面或者介质层的反射强度,通过利用光学传感器辨别反射光的相对强度变化,可以辨别出被测物表面的一些关键信息。现有技术中是采用平面镜将光线反射至待测样品中,一个平面镜只能反射一个入射角的光线至待测样品,也就是说用于检测待测样品的光线的入射角单一,单一角度的光线有可能会带来判断上的失误;另外,当待测样品上有一些图案化的金属走线或者介质图案时,这个图案化的金属或者介质的尺寸比较小,这一个入射角的光线在其表面发生衍射时,同样会造成判断失误。Among them, the laser reflection sensor and optical sensor of the above system are non-contact detection methods. Because of their fast detection speed and non-contact characteristics, they are very suitable for in-situ detection scenarios. In-situ detection means that there is no need to move the sample being tested. , detected during the grinding process. The detection principle is to carry surface information of the sample to be measured through reflected light, such as the reflection intensity of the metal surface or dielectric layer. By using an optical sensor to identify the relative intensity change of the reflected light, the object to be measured can be identified. Some key information on the surface. In the prior art, a plane mirror is used to reflect light into the sample to be tested. A plane mirror can only reflect light at one incident angle to the sample to be tested. That is to say, the incident angle of the light used to detect the sample to be tested is single. A single angle. Light may cause errors in judgment; in addition, when there are some patterned metal traces or dielectric patterns on the sample to be tested, the size of the patterned metal or dielectric is relatively small, and the light at this incident angle is When diffraction occurs on its surface, it will also cause errors in judgment.

发明内容Contents of the invention

本申请提供一种使用多个入射角的多条光线来检测待测样品表面状态的装置,可有效减小判断误差。This application provides a device that uses multiple light rays at multiple incident angles to detect the surface state of a sample to be measured, which can effectively reduce judgment errors.

第一方面,本申请提供一种用于检测待测样品表面状态的装置,所述用于检测待测样品表面状态的装置包括:In a first aspect, this application provides a device for detecting the surface state of a sample to be tested. The device for detecting the surface state of a sample to be tested includes:

光源组件,所述光源组件用于发射多条出射角度不同的光线;A light source component, the light source component is used to emit multiple light rays with different exit angles;

第一凹球面镜,所述光源组件的光线发射位置位于所述第一凹球面镜的第一入射焦点位置上,待测样品位于所述第一凹球面镜的第一出射焦点上;A first concave spherical mirror, the light emission position of the light source assembly is located at the first incident focus position of the first concave spherical mirror, and the sample to be measured is located at the first exit focus of the first concave spherical mirror;

第二凹球面镜,所述第二凹球面镜的第二入射焦点与所述第一凹球面镜的第一出射焦点重合;a second concave spherical mirror, the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror;

光学传感器,所述光学传感器位于所述第二凹球面镜的第二出射焦点上。An optical sensor is located at the second exit focus of the second concave spherical mirror.

本申请提供的用于检测待测样品表面状态的装置通过采用光源组件发射多条出射角度不同的光线,并将该光线通过第一凹球面镜入射至待测样品上,使得入射至待测样品的光线为具有多个不同入射角的光线,当待测样品表面状态发生变化时,会产生具有多个不同强度变化的反射光线,也就是说用于检测待测样品表面状态的光线具有多个入射角度,进而产生具有多个强度变化的反射光线,发射光线的强度变化能够反映出待测样品表面状态,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差;而这些多个不同强度变化的反射光线入射至第二凹球面镜后,再被会聚反射至光学传感器中,也就是说只需一个光学传感器就可以获取多个不同强度变化的反射光线,可节约空间尺寸和简化处理电路。The device for detecting the surface state of the sample to be tested provided by this application uses a light source component to emit multiple light rays with different exit angles, and the light is incident on the sample to be tested through the first concave spherical mirror, so that the light incident on the sample to be tested is Light is light with multiple different incident angles. When the surface state of the sample to be tested changes, it will produce reflected light with multiple different intensity changes. That is to say, the light used to detect the surface state of the sample to be tested has multiple incidences. Angle, thereby generating reflected light with multiple intensity changes. The intensity change of the emitted light can reflect the surface state of the sample to be measured. The average of the multiple intensity change values of the multiple light rays is used to determine the light intensity compared with a single incident angle. The intensity change value can reduce the measurement error; and these multiple reflected light beams with different intensity changes are incident on the second concave spherical mirror, and then are converged and reflected to the optical sensor. That is to say, only one optical sensor can obtain multiple Reflected light with different intensity changes can save space and simplify the processing circuit.

在一种可能的实现方式中,所述光源组件包括光源和发射辅助件,所述发射辅助件用于将所述光源发射的光线以具有预设角度范围入射至所述第一凹球面镜。In a possible implementation, the light source assembly includes a light source and an emission auxiliary component, the emission auxiliary component being used to incident the light emitted by the light source into the first concave spherical mirror in a preset angle range.

在一种可能的实现方式中,所述发射辅助件为光纤,所述光源位于所述光纤的第一端,所述光源发射的光线自所述光纤的第一端入射至所述光纤中,所述光纤的第二端为所述光源组件的光线出射端,所述光纤的第二端位于所述第一凹球面镜的第一入射焦点位置上,入射至所述光纤的光线自所述光纤的第二端出射至所述第一凹球面镜上。In a possible implementation, the emission auxiliary component is an optical fiber, the light source is located at the first end of the optical fiber, and the light emitted by the light source is incident into the optical fiber from the first end of the optical fiber, The second end of the optical fiber is the light exit end of the light source assembly. The second end of the optical fiber is located at the first incident focus position of the first concave spherical mirror. The light incident on the optical fiber is emitted from the optical fiber. The second end emerges onto the first concave spherical mirror.

在一种可能的实现方式中,所述光源组件还包括扩束器,所述扩束器位于所述光纤的第二端和所述第一凹球面镜之间,所述扩束器用于将所述光纤的第二端出射的光线发散至具有所述预设角度范围。In a possible implementation, the light source assembly further includes a beam expander, the beam expander is located between the second end of the optical fiber and the first concave spherical mirror, and the beam expander is used to The light emitted from the second end of the optical fiber diverges to have the preset angle range.

在一种可能的实现方式中,所述光源组件还包括光耦合器,所述光耦合器位于所述光源和所述光纤的第一端之间,用于将所述光源发射的光线耦合进入所述光纤。In a possible implementation, the light source assembly further includes an optical coupler, the optical coupler is located between the light source and the first end of the optical fiber, and is used to couple the light emitted by the light source into The optical fiber.

在一种可能的实现方式中,所述光源组件还包括滤光器,所述滤光器位于所述光源和所述光纤的第一端之间,用于对所述光源发射的光线滤光,使得耦合进入所述光纤的光线为具有特定波长的光。In a possible implementation, the light source assembly further includes an optical filter, the optical filter is located between the light source and the first end of the optical fiber, and is used to filter the light emitted by the light source. , so that the light coupled into the optical fiber is light with a specific wavelength.

在一种可能的实现方式中,所述发射辅助件为出光部件,所述出光部件位于所述光源和所述第一凹球面镜之间,所述出光部件上设有出光孔,所述出光孔为所述光源组件的光线出射位置,所述出光孔位于所述第一凹球面镜的第一入射焦点位置上,所述出光部件除所述出光孔以外的部分用于遮挡所述光源的光线。In a possible implementation, the emission auxiliary component is a light emitting component, the light emitting component is located between the light source and the first concave spherical mirror, the light emitting component is provided with a light emitting hole, and the light emitting hole is the light exit position of the light source assembly, the light exit hole is located at the first incident focus position of the first concave spherical mirror, and the part of the light exit component other than the light exit hole is used to block the light from the light source.

在一种可能的实现方式中,所述出光部件为出光板或者出光罩中的一种。In a possible implementation, the light emitting component is one of a light emitting plate or a light emitting cover.

在一种可能的实现方式中,所述出光孔为贯穿所述出光部件的通孔。In a possible implementation, the light outlet hole is a through hole that penetrates the light outlet component.

在一种可能的实现方式中,所述出光孔包括贯穿所述出光部件的通孔和填充在所述通孔中的透光材质。In a possible implementation, the light outlet hole includes a through hole penetrating the light outlet component and a light-transmitting material filled in the through hole.

在一种可能的实现方式中,所述第一凹球面镜和所述第二凹球面镜为一体化结构。In a possible implementation, the first concave spherical mirror and the second concave spherical mirror have an integrated structure.

在一种可能的实现方式中,所述第一凹球面镜和所述第二凹球面镜是各自独立的部件。In a possible implementation, the first concave spherical mirror and the second concave spherical mirror are independent components.

在一种可能的实现方式中,所述用于检测待测样品表面状态的装置还包括处理电路,所述处理电路与所述光学传感器电连接,所述处理电路用于根据所述光学传感器获取的光线判断待测样品表面状态。其中光学传感器包括但不限于PD、APD、CCD或者CMOS传感器。处理电路包括放大电路、模数转换电路和计算电路等。In a possible implementation, the device for detecting the surface state of the sample to be measured also includes a processing circuit, the processing circuit is electrically connected to the optical sensor, and the processing circuit is used to obtain information based on the optical sensor. Use light to determine the surface condition of the sample to be tested. Optical sensors include but are not limited to PD, APD, CCD or CMOS sensors. Processing circuits include amplifier circuits, analog-to-digital conversion circuits, and calculation circuits.

第二方面,本申请提供一种化学机械研磨设备,所述化学机械研磨设备包括研磨垫以 及如上面任一项所述的用于检测待测样品表面状态的装置,所述用于检测待测样品表面状态的装置位于所述研磨垫的下方,所述研磨垫用于承载待测样品。In a second aspect, the present application provides a chemical mechanical polishing equipment. The chemical mechanical polishing equipment includes a polishing pad and a device for detecting the surface state of a sample to be tested as described in any one of the above. The device for measuring the surface condition of the sample is located below the polishing pad, and the polishing pad is used to carry the sample to be tested.

在一种可能的实现方式中,所述化学机械研磨设备还包括研磨支撑柱,所述研磨垫位于所述研磨支撑柱的上方。In a possible implementation, the chemical mechanical polishing equipment further includes a grinding support column, and the polishing pad is located above the grinding support column.

在一种可能的实现方式中,所述研磨垫包括检测窗口,所述检测窗口能够透过光线,从所述第一凹球面镜反射的光线透过所述检测窗口入射至所述待测样品上。In a possible implementation, the polishing pad includes a detection window that can transmit light, and the light reflected from the first concave spherical mirror passes through the detection window and is incident on the sample to be tested. .

在一种可能的实现方式中,所述待测样品为晶圆。In a possible implementation, the sample to be tested is a wafer.

在一种可能的实现方式中,所述化学机械研磨设备还包括研磨液,用于浸润待测样品表面。通过借助研磨液中的纳米粒子的研磨作用,在被研磨的待测样品的表面形成光洁表面。In a possible implementation, the chemical mechanical polishing equipment further includes a grinding fluid for infiltrating the surface of the sample to be tested. By using the grinding action of nanoparticles in the grinding fluid, a smooth surface is formed on the surface of the ground sample to be tested.

在一种可能的实现方式中,所述化学机械研磨设备还包括抛光头,用于按压待测样品。In a possible implementation, the chemical mechanical polishing equipment further includes a polishing head for pressing the sample to be tested.

第三方面,本申请还提供一种检测待测样品表面状态的方法,所述检测待测样品表面状态的方法包括:In a third aspect, this application also provides a method for detecting the surface state of a sample to be tested. The method for detecting the surface state of a sample to be tested includes:

使用光源组件发射多条出射角度不同的光线;Use a light source component to emit multiple light rays with different exit angles;

将所述光源组件发射的所述多条出射角度不同的光线自第一入射焦点位置入射至第一凹球面镜,其中所述光源组件的光线发射位置位于所述第一凹球面镜的所述第一入射焦点位置上;The plurality of light rays with different exit angles emitted by the light source assembly are incident on the first concave spherical mirror from a first incident focus position, wherein the light emission position of the light source assembly is located on the first side of the first concave spherical mirror. At the incident focus position;

使用所述第一凹球面镜将所述光线反射至所述待测样品上,其中所述待测样品位于所述第一凹球面镜的第一出射焦点上;Use the first concave spherical mirror to reflect the light onto the sample to be measured, wherein the sample to be measured is located at the first exit focus of the first concave spherical mirror;

将被所述待测样品反射的光线,通过第二凹球面镜反射至光学传感器,其中所述第二凹球面镜的第二入射焦点与所述第一凹球面镜的第一出射焦点重合,所述光学传感器位于所述第二凹球面镜的第二出射焦点上。The light reflected by the sample to be measured is reflected to the optical sensor through the second concave spherical mirror, wherein the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror, and the optical sensor The sensor is located at the second exit focus of the second concave spherical mirror.

在一种可能的实现方式中,所述检测待测样品表面状态的方法还包括:In a possible implementation, the method for detecting the surface state of the sample to be tested further includes:

所述光学传感器将接收的所述光线传输至处理电路;The optical sensor transmits the received light to a processing circuit;

所述处理电路根据所述光线判断所述待测样品的表面状态。The processing circuit determines the surface state of the sample to be tested based on the light.

在一种可能的实现方式中,所述使用光源组件发射多条出射角度不同的光线,包括:In a possible implementation, the light source component is used to emit multiple light rays with different exit angles, including:

使用所述光源发射光线;using said light source to emit light;

使用发射辅助件将所述光源发射的光线以具有预设角度范围入射至所述第一凹球面镜。The light emitted by the light source is incident on the first concave spherical mirror in a preset angle range using an emission auxiliary component.

在一种可能的实现方式中,所述使用光源组件发射多条出射角度不同的光线,还包括:In a possible implementation, the use of a light source component to emit multiple light rays with different exit angles also includes:

使用扩束器将所述发射辅助件出射的光线发散至具有所述预设角度范围,所述扩束器位于所述发射辅助件和所述第一凹球面镜之间。A beam expander is used to spread the light emitted from the emission auxiliary part to have the preset angle range, and the beam expander is located between the emission auxiliary part and the first concave spherical mirror.

在一种可能的实现方式中,所述待测样品为晶圆。In a possible implementation, the sample to be tested is a wafer.

在一种可能的实现方式中,所述使用光源组件发射多条出射角度不同的光线,还包括:In a possible implementation, the use of a light source component to emit multiple light rays with different exit angles also includes:

使用扩束器将发射辅助件出射的光线发散至具有预设角度范围,扩束器位于发射辅助件和第一凹球面镜之间。A beam expander is used to spread the light emitted from the emission auxiliary part to a preset angle range, and the beam expander is located between the emission auxiliary part and the first concave spherical mirror.

在一种可能的实现方式中,所述使用光源组件发射多条出射角度不同的光线,还包括:In a possible implementation, the use of a light source component to emit multiple light rays with different exit angles also includes:

使用光耦合器将光源发射的光线耦合进入光纤。An optical coupler is used to couple the light emitted by the light source into the optical fiber.

附图说明Description of the drawings

图1为本申请一实施方式提供的化学机械研磨设备的结构示意图;Figure 1 is a schematic structural diagram of chemical mechanical grinding equipment provided by an embodiment of the present application;

图2为本申请一实施方式提供的用于检测待测样品表面状态的装置的结构示意图;Figure 2 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图3为本申请一实施方式提供的用于检测待测样品表面状态的装置中光线入射至待测样品的结构示意图;Figure 3 is a schematic structural diagram of light incident on the sample to be tested in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图4为本申请一实施方式提供的用于检测待测样品表面状态的装置中光线入射至待测样品的结构示意图;Figure 4 is a schematic structural diagram of light incident on the sample to be tested in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图5为现有技术中的用于检测待测样品表面状态的装置的结构示意图;Figure 5 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested in the prior art;

图6为本申请一实施方式提供的用于检测待测样品表面状态的装置中光纤和扩束器的位置示意图;Figure 6 is a schematic diagram of the positions of optical fibers and beam expanders in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图7为本申请一实施方式提供的用于检测待测样品表面状态的装置的结构示意图;Figure 7 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图8为本申请一实施方式提供的用于检测待测样品表面状态的装置中光源和出光部件的结构示意图;Figure 8 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图9为本申请一实施方式提供的用于检测待测样品表面状态的装置中光源和出光部件的结构示意图;Figure 9 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图10为本申请一实施方式提供的用于检测待测样品表面状态的装置中光源和出光部件的结构示意图;Figure 10 is a schematic structural diagram of a light source and a light-emitting component in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图11为本申请一实施方式提供的用于检测待测样品表面状态的装置中光源、出光部件和扩束器的位置示意图;Figure 11 is a schematic diagram of the positions of the light source, the light output component and the beam expander in a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图12为本申请一实施方式提供的用于检测待测样品表面状态的装置的结构示意图;Figure 12 is a schematic structural diagram of a device for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图13为本申请一实施方式提供的检测检测待测样品表面状态的方法的流程示意图;Figure 13 is a schematic flow chart of a method for detecting the surface state of a sample to be tested according to an embodiment of the present application;

图14为本申请步骤S100的子流程图。Figure 14 is a sub-flow chart of step S100 of the present application.

具体实施方式Detailed ways

本文中,术语“第一”、“第二”等仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中,除非另有说明,“多个”的含义是两个或两个以上。Herein, the terms “first”, “second”, etc. are used for descriptive purposes only and shall not be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, features defined as "first" and "second" may explicitly or implicitly include one or more of these features. In the description of this application, unless otherwise stated, "plurality" means two or more.

此外,本文中,“上”、“下”等方位术语是相对于附图中的结构示意置放的方位来定义的,应当理解到,这些方向性术语是相对的概念,它们用于相对于的描述和澄清,其可以根据结构所放置的方位的变化而相应地发生变化。In addition, in this article, directional terms such as "upper" and "lower" are defined relative to the schematic placement of the structure in the drawings. It should be understood that these directional terms are relative concepts and they are used relative to descriptions and clarifications, which may change accordingly depending on the orientation in which the structure is placed.

为方便理解,下面先对本申请实施例所涉及的英文简写和有关技术术语进行解释和描述。To facilitate understanding, the English abbreviations and related technical terms involved in the embodiments of the present application are first explained and described below.

PD:Photo Diode,光电二极管。PD: Photo Diode, photodiode.

APD:Avalanche Photo Diode,雪崩光电二极管。APD: Avalanche Photo Diode, avalanche photodiode.

CCD:电荷耦合元件。CCD: Charge Coupled Device.

CMOS传感器:互补金属氧化物半导体传感器。CMOS sensor: complementary metal oxide semiconductor sensor.

LED:light-emitting diode,发光二极管。LED: light-emitting diode, light-emitting diode.

本申请提供一种用于检测待测样品表面状态的装置,可应用于化学机械研磨设备中,用于检测待测样品的研磨终点,本申请的用于检测待测样品表面状态的装置包括光源组件、第一凹球面镜、第二凹球面镜以及光学传感器,其中光源组件用于发射多条出射角度不同的光线,光源组件的光线发射位置位于第一凹球面镜的第一入射焦点上,待测样品位于第一凹球面镜的第一出射焦点上,第二凹球面镜的第二入射焦点与第一凹球面镜的第一出射焦点重合,光学传感器位于第二凹球面镜的第二出射焦点上。通过光源组件发射多条出射角度不同的光线,并将该光线通过第一凹球面镜入射至待测样品上,使得入射至待测样品的光线为具有多个不同入射角的光线,然后依次经待测样品和第二凹球面镜反射后入射至光学传感器中,也就是说用于检测待测样品表面状态的光线具有多个入射角度,进而产生具有多个强度变化的反射光线,反射光线的强度变化能够反映出待测样品表状态,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差。This application provides a device for detecting the surface state of the sample to be tested, which can be used in chemical mechanical grinding equipment to detect the grinding end point of the sample to be tested. The device for detecting the surface state of the sample to be tested includes a light source. component, a first concave spherical mirror, a second concave spherical mirror and an optical sensor, wherein the light source component is used to emit multiple light rays with different exit angles. The light emission position of the light source component is located at the first incident focus of the first concave spherical mirror. The sample to be measured Located at the first exit focus of the first concave spherical mirror, the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror, and the optical sensor is located at the second exit focus of the second concave spherical mirror. A plurality of light rays with different exit angles are emitted through the light source component, and the light rays are incident on the sample to be tested through the first concave spherical mirror, so that the light rays incident on the sample to be tested are light rays with multiple different incident angles, and are then passed through the sample in sequence. The measured sample and the second concave spherical mirror reflect and then enter the optical sensor. That is to say, the light used to detect the surface state of the sample to be measured has multiple incident angles, thereby generating reflected light with multiple intensity changes. The intensity of the reflected light changes. It can reflect the status of the sample to be measured, and use the average of multiple intensity change values of multiple light rays to determine the intensity change value compared to a single incident angle of light, which can reduce measurement errors.

请参阅图1,本申请一实施方式提供一种化学机械研磨设备1,化学机械研磨设备1包括用于检测待测样品表面状态的装置10、待测样品20和研磨垫30,用于检测待测样品表面状态的装置10位于研磨垫30的下方,研磨垫30用于承载待测样品20,待测样品20位于研磨垫30的上方。在本实施方式中,化学机械研磨设备1还包括研磨支撑柱40,研磨垫30位于研磨支撑柱40的上方,研磨垫30的下方具有容纳空间,用于检测待测样品表面状态的装置10位于研磨垫30下方的容纳空间内。在本实施方式中,待测样品30为晶圆,一般的,晶圆包括多层介质层和多层金属层,在化学机械研磨过程中需要去除一层金属层,露出介质层;或者去除其中一层介质层,露出另一种介质层;或者去除其中一种金属层,露出另一层金属层,在化学机械研磨方法中将其中一种材质去除露出另一种材质时称为研磨终点。在本实施方式中,待测样品20表面状态是指待测样品20的表面材质。Please refer to Figure 1. One embodiment of the present application provides a chemical mechanical polishing equipment 1. The chemical mechanical polishing equipment 1 includes a device 10 for detecting the surface state of a sample to be tested, a sample to be tested 20 and a polishing pad 30. The device 10 for measuring the surface condition of the sample is located below the polishing pad 30 . The polishing pad 30 is used to carry the sample 20 to be measured. The sample 20 to be measured is located above the polishing pad 30 . In this embodiment, the chemical mechanical polishing equipment 1 also includes a grinding support column 40. The polishing pad 30 is located above the grinding support column 40. There is a receiving space below the polishing pad 30. The device 10 for detecting the surface state of the sample to be tested is located In the accommodation space below the polishing pad 30 . In this embodiment, the sample 30 to be tested is a wafer. Generally, the wafer includes multiple dielectric layers and multiple metal layers. During the chemical mechanical polishing process, one metal layer needs to be removed to expose the dielectric layer; or one of the metal layers needs to be removed. One dielectric layer exposes another dielectric layer; or one metal layer is removed to expose another metal layer. When one of the materials is removed to expose another material in the chemical mechanical polishing method, it is called the grinding end point. In this embodiment, the surface state of the sample 20 to be tested refers to the surface material of the sample 20 to be tested.

在本实施方式中,研磨垫30包括检测窗口31,检测窗口31能够透过光线,从用于检测待测样品表面状态的装置10中的第一凹球面镜200反射的光线透过检测窗口31入射至待测样品20上。其中研磨垫30可为聚合物材质构成,例如聚氨酯,检测窗口31为透光材质制成。In this embodiment, the polishing pad 30 includes a detection window 31 that can transmit light. The light reflected from the first concave spherical mirror 200 in the device 10 for detecting the surface state of the sample to be tested is incident through the detection window 31 to the sample 20 to be tested. The polishing pad 30 can be made of polymer material, such as polyurethane, and the detection window 31 can be made of light-transmitting material.

其中,化学机械研磨设备1还包括研磨液50,在进行研磨时,研磨液50滴加到研磨垫30上,并流动至晶圆20与研磨垫30之间。当光线透过检测窗口31入射至晶圆20朝向研磨垫30的表面上时,光线的反射强度受研磨液和待测样品20表面材质以及入射角度的影响,在研磨液材质和入射角度不变的情况下,光线的反射强度由待测样品20表面材质来决定,当待测样品20表面材质发生变化时,光线的反射强度也会发生变化,当检测的光线的强度发生变化时,即可判断已到达研磨终点,此时无需再进行研磨。采用本申请中的用于检测待测样品表面状态的装置10,通过采用光源组件100发射多条出射角度不同的光线,并将该光线通过第一凹球面镜200入射至待测样品20上,使得入射至待测样品20的光线为具有多个不同入射角的光线,当待测样品20表面材质发生变化时,会产生具有多个不同强度变化的反射光线,这些多个不同强度变化的反射光线入射至第二凹球面镜300后,再 被反射至光学传感器400中。也就是说用于反映待测样品20界面材质的光线是具有多个入射角度的,进而具有多个强度变化的反射光线,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差。The chemical mechanical polishing equipment 1 further includes a polishing liquid 50 . During polishing, the polishing liquid 50 is dropped onto the polishing pad 30 and flows between the wafer 20 and the polishing pad 30 . When light passes through the detection window 31 and is incident on the surface of the wafer 20 facing the polishing pad 30 , the reflection intensity of the light is affected by the surface material of the polishing fluid and the sample 20 to be tested and the incident angle. The material of the polishing fluid and the incident angle remain unchanged. In the case of It is judged that the grinding end point has been reached and no further grinding is required at this time. Using the device 10 for detecting the surface state of the sample to be tested in this application, the light source assembly 100 is used to emit multiple light rays with different exit angles, and the light rays are incident on the sample to be tested 20 through the first concave spherical mirror 200, so that The light incident on the sample 20 to be tested is light with multiple different incident angles. When the surface material of the sample 20 to be tested changes, multiple reflected light rays with different intensity changes will be generated. These multiple reflected light rays with different intensity changes will be generated. After being incident on the second concave spherical mirror 300, it is reflected into the optical sensor 400. That is to say, the light used to reflect the interface material of the sample 20 to be tested has multiple incident angles, and thus has multiple reflected light changes in intensity. The average value of the multiple intensity change values of the multiple light rays is used to determine the comparison. The intensity change value of light at a single incident angle can reduce measurement errors.

需要说明的是,本申请中的化学机械研磨设备1的具体结构部件不限于图1所示的结构,还可包括更多的结构部件,以用于实现在化学机械研磨过程中的特定功能,例如还可包括抛光头,用于按压待测样品20。It should be noted that the specific structural components of the chemical mechanical polishing equipment 1 in this application are not limited to the structure shown in Figure 1, and may also include more structural components to achieve specific functions in the chemical mechanical polishing process. For example, it may also include a polishing head for pressing the sample 20 to be tested.

还需要说明的是,待测样品20不限于晶圆,只要是在研磨过程中将其中一种材质去除露出另一中材质的产品均可用本申请的用于检测待测样品表面状态的装置10检测研磨终点。It should also be noted that the sample 20 to be tested is not limited to wafers. As long as one of the materials is removed during the grinding process to expose the other material, the device 10 for detecting the surface state of the sample to be tested can be used. Detect grinding end point.

还需要说明的是,待测样品20的表面状态不局限于表面材质,还可以包括待测样品20的表面纹理或者细微结构,细微结构包括凸起、凹陷、划痕、异物和裂纹等。当光线入射到待测样品20的表面上时,表面纹理或者表面细微结构不同,光线在其表面反射后的强度也会不同,进而可获得反映表面纹理或者细微结构的反射光线强度信息。It should also be noted that the surface state of the sample to be tested 20 is not limited to the surface material, but may also include the surface texture or fine structure of the sample to be tested 20 . The fine structure includes protrusions, depressions, scratches, foreign matter, cracks, etc. When light is incident on the surface of the sample 20 to be measured, if the surface texture or surface fine structure is different, the intensity of the light after reflection on the surface will also be different, and thus reflected light intensity information reflecting the surface texture or fine structure can be obtained.

当用于检测待测样品20的表面纹理或者细微结构时,本申请的用于检测待测样品表面状态的装置10可应用于检测产品瑕疵或者良率,例如用于检测产品20表面的凸起、凹陷、划痕、异物和裂纹等缺陷。例如,假设有100个样品需要检测,可预先通过本申请的用于检测待测样品表面状态的装置10获得标准样品的光线信息,然后再检测这100个待测样品20的光线信息,当待测样品20的光线信息与标准样品的光线信息不同或者相差值大于预设范围内时,判断为瑕疵样品,否则即为合格样品,进而可计算出产品良率。在本申请中,通过发射多条出射角度不同的光线,并将该光线通过第一凹球面镜200入射至待测样品20上,使得入射至待测样品20的光线为具有多个不同入射角的光线,当待测样品20表面纹理或者细微结构与标准样品不同时,会产生具有多个不同强度变化的反射光线,这些多个不同强度变化的反射光线入射至第二凹球面镜300后,再被反射至光学传感器400中,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差。When used to detect the surface texture or fine structure of the sample to be tested 20, the device 10 for detecting the surface state of the sample to be tested can be used to detect product defects or yield, for example, to detect protrusions on the surface of the product 20. , dents, scratches, foreign objects and cracks and other defects. For example, assuming that there are 100 samples that need to be tested, the light information of the standard sample can be obtained in advance through the device 10 of the present application for detecting the surface state of the sample to be tested, and then the light information of the 100 samples to be tested 20 can be detected. When the light information of the measured sample 20 is different from the light information of the standard sample or the difference is greater than a preset range, it is determined to be a defective sample; otherwise, it is a qualified sample, and the product yield can be calculated. In this application, multiple light rays with different exit angles are emitted, and the light rays are incident on the sample to be tested 20 through the first concave spherical mirror 200, so that the light rays incident on the sample to be tested 20 have multiple different incident angles. Light, when the surface texture or fine structure of the sample to be tested 20 is different from the standard sample, a plurality of reflected light rays with different intensity changes will be generated. After these multiple reflected light rays with different intensity changes are incident on the second concave spherical mirror 300, they will be reflected by the second concave spherical mirror 300. Reflected into the optical sensor 400, the intensity change value of the light rays at a single incident angle is determined by averaging the intensity change values of the multiple rays of light, thereby reducing the measurement error.

下面具体介绍用于检测待测样品表面状态的装置10。The device 10 for detecting the surface state of the sample to be tested is introduced in detail below.

请参阅图2,本申请一实施方式提供一种用于检测待测样品表面状态的装置10,用于检测待测样品表面状态的装置10包括光源组件100、第一凹球面镜200、第二凹球面镜300以及光学传感器400。Please refer to FIG. 2 . An embodiment of the present application provides a device 10 for detecting the surface state of a sample to be tested. The device 10 for detecting the surface state of a sample to be tested includes a light source assembly 100 , a first concave spherical mirror 200 , a second concave spherical mirror 200 , and a second concave spherical mirror 200 . Spherical mirror 300 and optical sensor 400.

其中,光源组件100用于发射多条出射角度不同的光线,也就是说从光源组件100中发射的光线的出射角度不是一个角度值,是具有多个角度值的,或者说发射的光线呈扇形,扇形具有一定角度范围。Among them, the light source component 100 is used to emit multiple light rays with different exit angles. That is to say, the exit angle of the light rays emitted from the light source component 100 is not one angle value, but has multiple angle values, or the emitted light rays are fan-shaped. , the sector has a certain angle range.

光源组件100的光线发射位置位于第一凹球面镜200的第一入射焦点210位置上,待测样品20位于第一凹球面镜200的第一出射焦点220上。其中自第一入射焦点210发射的光线入射至第一凹球面镜200上后会被反射汇聚到第一出射焦点220上,由于发射光线具有多个出射角度,入射至第一凹球面镜200的光线也具有多个入射角度。在本申请中,第一入射焦点210是指光线以同一个焦点入射至第一凹球面镜200时所在的入射焦点,第一出射焦点220是指光线被第一凹球面镜200反射后汇聚的焦点,对于第一凹球面镜200来 说第一入射焦点210和第一出射焦点220相互适配的,同一个第一凹球面镜200具有多个第一入射焦点210和与之匹配的多个第一出射焦点220。其中,待测样品20位于第一出射焦点220上是指,光线透过检测窗口31后的汇聚焦点落在待测样品20朝向检测窗口31的表面上,只要满足第一出射焦点220位于待测样品20表面需要检测的区域即可。The light emission position of the light source assembly 100 is located at the first incident focus 210 of the first concave spherical mirror 200 , and the sample 20 to be tested is located at the first exit focus 220 of the first concave spherical mirror 200 . The light emitted from the first incident focus 210 will be reflected and converged to the first exit focus 220 after being incident on the first concave spherical mirror 200. Since the emitted light has multiple exit angles, the light incident on the first concave spherical mirror 200 will also be reflected. With multiple angles of incidence. In this application, the first incident focus 210 refers to the incident focus where the light rays are incident on the first concave spherical mirror 200 with the same focus, and the first exit focus 220 refers to the focus where the light rays converge after being reflected by the first concave spherical mirror 200. For the first concave spherical mirror 200, the first incident focus 210 and the first exit focus 220 are adapted to each other. The same first concave spherical mirror 200 has multiple first incident focus points 210 and multiple first exit focus points matching them. 220. Wherein, the sample 20 to be measured is located at the first exit focus 220 means that the focus point of the light after passing through the detection window 31 falls on the surface of the sample 20 to be measured facing the detection window 31, as long as the first exit focus 220 is located at the detection window 31. The area on the surface of sample 20 that needs to be detected is sufficient.

其中,第一凹球面镜200的曲率不同,第一入射焦点210和第一出射焦点220的位置也会不同。在本申请中可预先确定光线发射位置和待测样品20的放置位置,再选择合适曲率的第一凹球面镜200;也可以先选择一个曲率的第一凹球面镜200,再通过调整第一凹球面镜200的放置位置、光线发射位置以及待测样品20的放置位置,来使光线发射位置位于第一入射焦点210位置上,待测样品20位于第一出射焦点220上。Wherein, if the curvature of the first concave spherical mirror 200 is different, the positions of the first incident focus 210 and the first exit focus 220 will also be different. In this application, the light emission position and the placement position of the sample 20 to be measured can be determined in advance, and then the first concave spherical mirror 200 with appropriate curvature can be selected; the first concave spherical mirror 200 with a curvature can also be selected first, and then the first concave spherical mirror can be adjusted by adjusting the first concave spherical mirror 200 . 200, the light emitting position, and the sample to be tested 20 are placed so that the light emitting position is located at the first incident focus 210 and the sample 20 to be measured is located at the first exit focus 220.

第二凹球面镜300的第二入射焦点310与第一凹球面镜200的第一出射焦点220重合。多条出射角度不同的光线会以多个不同入射角入射至待测样品20上,然后以多个不同反射角从待测样品20上反射至第二凹球面镜300上。光学传感器400位于第二凹球面镜300的第二出射焦点320上。入射至第二凹球面镜300的光线同样具有多个入射角度,被第二凹球面镜300反射后汇聚至光学传感器400中。The second incident focus 310 of the second concave spherical mirror 300 coincides with the first exit focus 220 of the first concave spherical mirror 200 . Multiple light rays with different exit angles will be incident on the sample to be measured 20 at multiple different incident angles, and then reflected from the sample to be measured 20 to the second concave spherical mirror 300 at multiple different reflection angles. The optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 . The light incident on the second concave spherical mirror 300 also has multiple incident angles, is reflected by the second concave spherical mirror 300 and then converges into the optical sensor 400 .

在本申请中,第二入射焦点310是指光线以同一个焦点入射至第二凹球面镜300时所在的入射焦点,第二出射焦点320是指光线被第二凹球面镜300反射后汇聚的焦点,对于第二凹球面镜300来说第二入射焦点310和第二出射焦点320相互适配的,同一个第二凹球面镜300具有多个第二入射焦点310和与之匹配的多个第二出射焦点320。其中,光学传感器400位于第二凹球面镜300的第二出射焦点320上是指,被第二凹球面镜300反射的光线的汇聚焦点落在光学传感器400上,而使光线能够被光学传感器400获取,只要满足第二出射焦点320位于光学传感器400上即可,例如光学传感器400包括光敏区,光敏区可用于收集光线,第二出射焦点320位于光敏区上。In this application, the second incident focus 310 refers to the incident focus where the light rays are incident on the second concave spherical mirror 300 with the same focus, and the second exit focus 320 refers to the focus where the light rays converge after being reflected by the second concave spherical mirror 300. For the second concave spherical mirror 300, the second incident focus 310 and the second exit focus 320 are adapted to each other. The same second concave spherical mirror 300 has multiple second incident focus points 310 and multiple second exit focus points matching them. 320. The fact that the optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 means that the convergence point of the light reflected by the second concave spherical mirror 300 falls on the optical sensor 400, so that the light can be acquired by the optical sensor 400. As long as the second exit focus 320 is located on the optical sensor 400, for example, the optical sensor 400 includes a photosensitive area, the photosensitive area can be used to collect light, and the second exit focus 320 is located on the photosensitive area.

其中,第二凹球面镜300的曲率不同,第二入射焦点310和第二出射焦点320的位置可能会不同。在本申请中可预先确定待测样品20和光学传感器400的放置位置,再选择合适曲率的第二凹球面镜300,也可以先选择一个曲率的第二凹球面镜300,再通过调整第二凹球面镜300的放置位置、待测样品20以及光学传感器400的放置位置,来使待测样品20位于第二入射焦点310上,光学传感器400位于第二出射焦点320上。在本实施方式中,第一凹球面镜200和第二凹球面镜300为一体化结构,在一些实施方式中,第一凹球面镜200和第二凹球面镜300可为各自独立的结构。其中,第一凹球面镜200和第二凹球面镜300可为球面或者椭球面,具体曲率可根据实际需求来设置。Wherein, the curvature of the second concave spherical mirror 300 is different, and the positions of the second incident focus 310 and the second exit focus 320 may be different. In this application, the placement positions of the sample to be tested 20 and the optical sensor 400 can be determined in advance, and then the second concave spherical mirror 300 with appropriate curvature can be selected. Alternatively, a second concave spherical mirror 300 with a curvature can be selected first, and then the second concave spherical mirror can be adjusted by adjusting the second concave spherical mirror 300 . 300, the sample to be measured 20 and the optical sensor 400 are placed so that the sample to be measured 20 is located at the second incident focus 310 and the optical sensor 400 is located at the second exit focus 320. In this embodiment, the first concave spherical mirror 200 and the second concave spherical mirror 300 are integrated structures. In some embodiments, the first concave spherical mirror 200 and the second concave spherical mirror 300 can be independent structures. The first concave spherical mirror 200 and the second concave spherical mirror 300 can be spherical or ellipsoidal, and the specific curvature can be set according to actual requirements.

在本实施方式中的光线传播路径为:多条出射角度不同的光线L自第一入射焦点210位置入射至第一凹球面镜200,被第一凹球面镜200反射至待测样品20上,被待测样品20上反射至第二凹球面镜300,被第二凹球面镜300反射后入射至光学传感器400。The light propagation path in this embodiment is: multiple light rays L with different exit angles are incident from the first incident focus 210 to the first concave spherical mirror 200, are reflected by the first concave spherical mirror 200 to the sample 20 to be measured, and are reflected by the first concave spherical mirror 200. The measured sample 20 reflects to the second concave spherical mirror 300 , is reflected by the second concave spherical mirror 300 , and then enters the optical sensor 400 .

在本实施方式中,用于检测待测样品表面状态的装置10还包括处理电路500,处理电路500与光学传感器400电连接,处理电路500用于根据光学传感器400获取的光线判断研磨终点。其中光学传感器400包括但不限于PD、APD、CCD或者CMOS传感器。处理电路500包括放大电路、模数转换电路和计算电路等。In this embodiment, the device 10 for detecting the surface state of the sample to be tested also includes a processing circuit 500. The processing circuit 500 is electrically connected to the optical sensor 400. The processing circuit 500 is used to determine the polishing end point based on the light acquired by the optical sensor 400. The optical sensor 400 includes but is not limited to PD, APD, CCD or CMOS sensor. The processing circuit 500 includes an amplification circuit, an analog-to-digital conversion circuit, a calculation circuit, etc.

在本实施方式中,待测样品20为晶圆,在晶圆中包括多层介质层和多层金属层,在将 晶圆制备成特定的产品时会采用化学机械研磨方法将其中的介质层或者金属层去除,光线入射到不同材料的表面上的反射强度不同,因此可根据反射强度变化来确定研磨终点。In this embodiment, the sample 20 to be tested is a wafer, which includes multiple dielectric layers and multiple metal layers. When preparing the wafer into a specific product, a chemical mechanical polishing method is used to polish the dielectric layers. Or the metal layer is removed, and the reflection intensity of light incident on the surface of different materials is different, so the grinding end point can be determined based on the change in reflection intensity.

如图3所示,晶圆20包括介质层21和金属层22,假设在本实施例中需要将金属层22通过化学机械研磨方式去除,在研磨过程中光线L一直入射在晶圆20上,在金属层22还未完全去除时,光线L入射到晶圆20具有金属层22的表面,此时晶圆20表面反射的是反射强度为A1的反射光线L1,当金属层22被完全研磨去除掉后(如图4所示),会露出介质层21,由于光线L入射表面材质发生变化,此时晶圆20表面反射的是反射强度变为A2的反射光线L2,A2不等于A1,被晶圆20反射的光线在通过第二凹球面镜300反射至光学传感器400中,光学传感器400再将具有不同反射强度的光线发送给处理电路500,处理电路500可根据光线反射强度的变化来确定晶圆是否达到研磨终点。在本申请中,具有多条不同入射角的光线入射至晶圆20表面,当晶圆20表面的材质发生变化时,会产生多条反射强度发生变化的光线,发生变化的多条光线入射至光学传感器400后被处理电路500处理可获得多条光线强度变化的平均值,通过平均值来确定晶圆20是否达到研磨终点的误差较小,使得研磨终点判断结果更准确。As shown in Figure 3, the wafer 20 includes a dielectric layer 21 and a metal layer 22. Assume that the metal layer 22 needs to be removed through chemical mechanical polishing in this embodiment. During the polishing process, the light L is always incident on the wafer 20. When the metal layer 22 is not completely removed, the light L is incident on the surface of the wafer 20 with the metal layer 22. At this time, the surface of the wafer 20 reflects the reflected light L1 with the reflection intensity A1. When the metal layer 22 is completely removed by grinding After removal (as shown in Figure 4), the dielectric layer 21 will be exposed. Since the material of the surface where the light L is incident has changed, the surface of the wafer 20 reflects the reflected light L2 whose reflection intensity changes to A2. A2 is not equal to A1, and is The light reflected by the wafer 20 is reflected into the optical sensor 400 through the second concave spherical mirror 300. The optical sensor 400 then sends the light with different reflection intensities to the processing circuit 500. The processing circuit 500 can determine the wafer according to the change in the light reflection intensity. Whether the circle reaches the grinding end point. In this application, multiple light rays with different incident angles are incident on the surface of the wafer 20 . When the material of the surface of the wafer 20 changes, multiple light rays with changing reflection intensity will be generated. The changed multiple light rays are incident on the surface of the wafer 20 . The optical sensor 400 is then processed by the processing circuit 500 to obtain the average value of the intensity changes of multiple light rays. The error in determining whether the wafer 20 has reached the polishing end point through the average value is smaller, making the determination result of the polishing end point more accurate.

而在现有技术中是采用平面镜来进行反射的,平面镜反射的光线入射至待测样品20的入射角只有一个,光线反射强度变化值也只有一个,使得研磨终点判断误差较大。如图5所示,检测装置包括光源11、平面镜12、待测样品20和光学传感器13,由于平面镜反射至待测样品20的光线角度单一,入射至待测样品20的光线的入射角为一个,反射角也只为一个,反映晶圆表面材质变化的反射强度值也只为一个,从待测样品20反射至光学传感器13后只有一个光线强度变化值,这使得检测效果误差较大,尤其是对于晶圆表面材料性质变化不大的两层,例如当晶圆20包括第一介质层23和第二介质层24,第一介质层23和第二介质层24的材质特性相差不大时,当通过化学机械研磨方法去除第二介质层24时,光线以其中一个入射角入射至第二介质层24和入射至第一介质层23后的反射强度变化不大,使得研磨终点判断出现误差。而当采用本申请中的方案,使得具有多个入射角的多条光线入射至第二介质层24和入射至第一介质层23后具有多个反射光线强度变化值,处理电路500可根据多个反射光线强度变化值的平均值或者强度变化值最大的值来判定研磨终点,相较于一个强度变化值的判断结果可减小误差。同样的,在一些情况下,晶圆20的研磨终点是从一种金属层到另一种金属层时,两种金属层的材质特性相差不大的情况下,本申请的用于检测待测样品表面状态的装置10的判断误差更小。In the prior art, a plane mirror is used for reflection. There is only one incident angle for the light reflected by the plane mirror to enter the sample 20 to be measured, and there is only one change value of the light reflection intensity, which results in a large error in determining the grinding end point. As shown in Figure 5, the detection device includes a light source 11, a plane mirror 12, a sample to be tested 20 and an optical sensor 13. Since the angle of light reflected by the plane mirror to the sample to be tested 20 is single, the incident angle of the light incident on the sample to be tested 20 is one. , the reflection angle is only one, and the reflection intensity value that reflects the change of the wafer surface material is also only one. There is only one light intensity change value after reflection from the sample 20 to be measured to the optical sensor 13, which makes the detection effect error larger, especially They are two layers with little change in the material properties of the wafer surface. For example, when the wafer 20 includes a first dielectric layer 23 and a second dielectric layer 24, and the material properties of the first dielectric layer 23 and the second dielectric layer 24 are not much different. , when the second dielectric layer 24 is removed by chemical mechanical polishing, the reflection intensity of the light incident on the second dielectric layer 24 and the first dielectric layer 23 does not change much at one of the incident angles, causing errors in the determination of the polishing end point. . When the solution in this application is adopted, multiple light rays with multiple incident angles are incident on the second dielectric layer 24 and have multiple reflected light intensity change values after being incident on the first dielectric layer 23. The average value of the reflected light intensity change values or the maximum intensity change value is used to determine the grinding end point. Compared with the judgment result of one intensity change value, the error can be reduced. Similarly, in some cases, when the polishing end point of the wafer 20 is from one metal layer to another metal layer, and the material properties of the two metal layers are not much different, the application is used to detect the test object. The judgment error of the device 10 for the surface condition of the sample is smaller.

再例如,当晶圆20表面已经有一些图案化的金属走线或者介质图案时,这个图案化的金属或者介质的尺寸比较小,光线在其表面会发生衍射,当采用图5所示的方法,如果这一个入射角度的光线没有在其第n级别衍射光线区间内,这条光线会在晶圆20表面发生衍射,很可能会造成检测判断上的误差。而采用本申请的方案时,入射至晶圆20表面具有多个入射角度的多条光线,当晶圆20表面具有图案化的金属走线或者介质图案时,假使其中一个入射角度的光线发生衍射,其他入射角度的光线不发生衍射,不发生衍射的光线可有效检测研磨终点,进而可降低检测误差。For another example, when there are already some patterned metal traces or dielectric patterns on the surface of the wafer 20, the size of the patterned metal or dielectric is relatively small, and the light will be diffracted on the surface. When the method shown in Figure 5 is used, , if the light at this incident angle is not within its nth order diffracted light range, this light will be diffracted on the surface of the wafer 20 , which is likely to cause errors in detection and judgment. When using the solution of this application, multiple light rays with multiple incident angles are incident on the surface of the wafer 20. When the surface of the wafer 20 has patterned metal traces or dielectric patterns, if the light rays at one of the incident angles are diffracted. , light at other incident angles does not diffract, and non-diffracted light can effectively detect the grinding end point, thereby reducing detection errors.

另外,如果将图5所示的方案中增加多个平面镜12来增加多条具有不同入射角的光线时,一方面会增加成本,增加占用空间,使得用于检测待测样品表面状态的装置10体积变 大;另一方面需要匹配相同数量的光学传感器,多个光学传感器会占用电路板的面积,并且还会导致处理电路500规模更加冗杂。而本申请中仅需一个光学传感器400即可,大大节约了空间尺寸,简化电路。In addition, if multiple plane mirrors 12 are added to the solution shown in Figure 5 to add multiple light rays with different incident angles, on the one hand, it will increase the cost and increase the occupied space, making the device 10 for detecting the surface state of the sample to be tested The volume becomes larger; on the other hand, the same number of optical sensors needs to be matched. Multiple optical sensors will occupy the area of the circuit board, and will also cause the processing circuit 500 to become more complex. In this application, only one optical sensor 400 is needed, which greatly saves space and simplifies the circuit.

本申请提供的用于检测待测样品表面状态的装置10通过采用光源组件100发射多条出射角度不同的光线,并将该光线通过第一凹球面镜200入射至待测样品20上,使得入射至待测样品20的光线为具有多个不同入射角的光线,当待测样品20表面状态发生变化时,会产生具有多个不同强度变化的反射光线,也就是说用于检测待测样品表面状态的光线具有多个入射角度,进而产生具有多个强度变化的反射光线,发射光线的强度变化能够反映出待测样品表面状态,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差;本申请中这些多个不同强度变化的反射光线入射至第二凹球面镜300后,再被会聚反射至光学传感器400中,也就是说只需一个光学传感器400就可以获取多个不同强度变化的反射光线,可节约空间尺寸和简化处理电路。The device 10 provided by this application for detecting the surface state of a sample to be tested uses a light source assembly 100 to emit multiple light rays with different exit angles, and the light rays are incident on the sample 20 to be tested through the first concave spherical mirror 200, so that the light rays are incident on the sample 20 to be tested. The light of the sample to be tested 20 is light with multiple different incident angles. When the surface state of the sample to be tested 20 changes, reflected light with multiple different intensity changes will be generated, which is to say that it is used to detect the surface state of the sample to be tested. The light has multiple incident angles, thereby producing reflected light with multiple intensity changes. The intensity change of the emitted light can reflect the surface state of the sample to be tested, and the comparison is judged by the average of the multiple intensity change values of the multiple light rays. The intensity change value of light at a single incident angle can reduce measurement errors; in this application, these multiple reflected light rays with different intensity changes are incident on the second concave spherical mirror 300, and then are converged and reflected to the optical sensor 400, that is, It is said that only one optical sensor 400 can acquire multiple reflected lights with different intensity changes, which can save space and size and simplify the processing circuit.

请继续参阅图2,在一种可能的实现方式中,光源组件100包括光源110和发射辅助件120,发射辅助件120用于将光源110发射的光线以具有预设角度范围入射至第一凹球面镜200。其中光源110可为卤素光源、激光光源或者LED光源中的一种,其中激光光源发射的光线可为任意波长的激光,例如产生一束670nm波长的激光。一般的光源110发射的光线会以光源110为中心向周围发散,当没有发射辅助件120时,也会有多条出射角度不同的光线入射至第一凹球面镜200上,本申请中把入射到第一凹球面镜200上后反射到待测样品20的光线称为工作光线,除工作光线以后的其他角度范围的光线会对工作光线产生干扰,可能会影响判断精度。在本实施方式中,发射辅助件120使得光源110发射的光线聚集到具有预设角度范围,一方面可增强入射至第一凹球面镜200的光线强度,另一方面可减少其他光线对工作光线的干扰。其中预设角度范围可根据实际需求来设置。Please continue to refer to FIG. 2. In a possible implementation, the light source assembly 100 includes a light source 110 and an emission auxiliary component 120. The emission auxiliary component 120 is used to incident the light emitted by the light source 110 into the first concave surface in a preset angle range. Spherical mirror 200. The light source 110 may be one of a halogen light source, a laser light source, or an LED light source, and the light emitted by the laser light source may be a laser of any wavelength, for example, a laser with a wavelength of 670 nm is generated. The light emitted by the general light source 110 will diverge to the surroundings with the light source 110 as the center. When there is no emission auxiliary member 120, there will also be multiple light beams with different exit angles incident on the first concave spherical mirror 200. In this application, the incident light is incident on the first concave spherical mirror 200. The light reflected from the first concave spherical mirror 200 to the sample 20 to be measured is called the working light. In addition to the working light, light in other angle ranges will interfere with the working light and may affect the judgment accuracy. In this embodiment, the emission auxiliary member 120 allows the light emitted by the light source 110 to gather into a preset angle range. On the one hand, it can enhance the intensity of the light incident on the first concave spherical mirror 200, and on the other hand, it can reduce the influence of other light rays on the working light. interference. The preset angle range can be set according to actual needs.

请继续参阅图2,在一种可能的实现方式中,发射辅助件120为光纤130,光源110位于光纤130的第一端131,光源110发射的光线自光纤130的第一端131入射至光纤130中,光纤130的第二端132为光源组件100的光线出射端,光纤130的第二端132位于第一凹球面镜200的第一入射焦点210位置上,入射至光纤130的光线自光纤130的第二端132出射至第一凹球面镜200上。Please continue to refer to Figure 2. In one possible implementation, the emission auxiliary component 120 is an optical fiber 130, the light source 110 is located at the first end 131 of the optical fiber 130, and the light emitted by the light source 110 is incident on the optical fiber from the first end 131 of the optical fiber 130. In 130, the second end 132 of the optical fiber 130 is the light exit end of the light source assembly 100. The second end 132 of the optical fiber 130 is located at the first incident focus 210 of the first concave spherical mirror 200. The light incident on the optical fiber 130 is emitted from the optical fiber 130. The second end 132 emerges onto the first concave spherical mirror 200 .

采用光纤130作为发射辅助件120,光纤130具有一定的弯曲性能,使得光源110的放置位置更灵活,光纤130的长度可长可短,例如当放置用于检测待测样品表面状态的装置10的空间尺寸有限时,可根据实际情况将光源110设置在可节约尺寸的位置,然后通过光纤130将光线引入到光线发射位置,即只需将光线130的第二端132放置在第一凹球面镜200的第一发射焦点210上即可。The optical fiber 130 is used as the emission auxiliary component 120. The optical fiber 130 has certain bending properties, which makes the placement of the light source 110 more flexible. The length of the optical fiber 130 can be long or short, for example, when placing the device 10 for detecting the surface state of the sample to be tested. When the space size is limited, the light source 110 can be set at a position that can save size according to the actual situation, and then the light is introduced to the light emission position through the optical fiber 130 , that is, the second end 132 of the light 130 only needs to be placed on the first concave spherical mirror 200 The first emission focus is 210.

另外,将光源110直接放置在第一凹球面镜200的第一发射焦点210时,光源110离待测样品20和光学传感器400比较近,发光时产生的热量会影响待测样品20表面状态或者会影响光学传感器400采集反射光线的性能,进而影响检测精度,在本实施方式中,采用光纤130传输光线,光源110可设置在其他位置,进而可减小光源110发光时的热量对待测样品20表面或者光学传感器400的影响,进而提高检测精度。In addition, when the light source 110 is directly placed at the first emission focus 210 of the first concave spherical mirror 200, the light source 110 is relatively close to the sample to be measured 20 and the optical sensor 400, and the heat generated when emitting light will affect the surface state of the sample to be measured 20 or may cause damage to the surface of the sample 20. Affects the performance of the optical sensor 400 in collecting reflected light, thereby affecting the detection accuracy. In this embodiment, the optical fiber 130 is used to transmit light, and the light source 110 can be set at other positions, thereby reducing the heat generated by the light source 110 when emitting light on the surface of the sample 20 to be measured Or the influence of the optical sensor 400, thereby improving the detection accuracy.

其中,光纤130的第二端132发射的光线的角度范围可根据光纤130的数值孔径来确 定,一般的,光纤130数值孔径越大,发射光线的角度范围越宽。The angular range of the light emitted by the second end 132 of the optical fiber 130 can be determined according to the numerical aperture of the optical fiber 130. Generally, the larger the numerical aperture of the optical fiber 130, the wider the angular range of the emitted light.

请参阅图6,在一种可能的实现方式中,光源组件100还包括扩束器140,扩束器140位于光纤130的第二端132和第一凹球面镜200之间,扩束器140用于将光纤130的第二端132出射的光线发散至具有预设角度范围。在一些情况下,光纤130的数值孔径较小,光纤130出射的光线角度范围较窄,不能够满足检测需求,此时可通过扩束器140将光纤130出射的光线发散至具有预设角度范围。Referring to Figure 6, in a possible implementation, the light source assembly 100 further includes a beam expander 140. The beam expander 140 is located between the second end 132 of the optical fiber 130 and the first concave spherical mirror 200. The beam expander 140 is The light emitted from the second end 132 of the optical fiber 130 is diverged to a predetermined angle range. In some cases, the numerical aperture of the optical fiber 130 is small, and the angle range of the light emitted from the optical fiber 130 is narrow, which cannot meet the detection requirements. In this case, the beam expander 140 can be used to spread the light emitted from the optical fiber 130 to a preset angle range. .

请继续参阅图2,在一种可能的实现方式中,光源组件100还包括光耦合器150,光耦合器150位于光源110和光纤130的第一端131之间,用于将光源110发射的光线耦合进入光纤130。其中光耦合器150可由多个透镜组成。一般的,光源110发出的光具有较宽的范围,需要通过光耦合器150将光线耦合进入光纤130中,增加入射至光纤130中光线的强度。Please continue to refer to FIG. 2. In a possible implementation, the light source assembly 100 further includes an optical coupler 150. The optical coupler 150 is located between the light source 110 and the first end 131 of the optical fiber 130 and is used to transmit the light emitted by the light source 110. Light couples into optical fiber 130. The optical coupler 150 may be composed of multiple lenses. Generally, the light emitted by the light source 110 has a wide range, and the light needs to be coupled into the optical fiber 130 through the optical coupler 150 to increase the intensity of the light incident on the optical fiber 130 .

在一些实施方式中,光源组件100还包括滤光器,滤光器位于光源110和光纤130的第一端131之间,用于对光源110发射的光线滤光,使得耦合进入光纤130的光线为具有特定波长的光。其中用于检测待测样品表面状态的光线的波长取决于待测样品20的表面状态以及光学传感器400的特性,也就是说,待测样品20的表面状态不同,其能够反映研磨终点的光线的波长范围可能不同,不同的光学传感器400对不同波长范围的光的灵敏度不同,具体可根据实际需要来设置,通过滤光器可获得具有特定波长的光线。当光源组件100具有光耦合器150时,可将滤光器设置在光耦合器150和光源110之间,也可以将滤光器设置在光耦合器150和光纤130的第一端131之间。In some embodiments, the light source assembly 100 further includes an optical filter located between the light source 110 and the first end 131 of the optical fiber 130 for filtering the light emitted by the light source 110 so that the light coupled into the optical fiber 130 is light with a specific wavelength. The wavelength of the light used to detect the surface state of the sample to be tested depends on the surface state of the sample to be tested 20 and the characteristics of the optical sensor 400 . That is to say, the surface state of the sample to be tested 20 is different, which can reflect the light at the end of the grinding process. The wavelength range may be different, and different optical sensors 400 have different sensitivities to light in different wavelength ranges, which can be set according to actual needs. Light with specific wavelengths can be obtained through optical filters. When the light source assembly 100 has the optical coupler 150, the optical filter can be disposed between the optical coupler 150 and the light source 110, or the optical filter can be disposed between the optical coupler 150 and the first end 131 of the optical fiber 130. .

请参阅图7,与图2所示实施方式中不同的是,在一种可能的实现方式中,发射辅助件120为出光部件160,出光部件160位于光源110和第一凹球面镜200之间,出光部件160上设有出光孔161,出光孔161为光源组件100的光线出射位置,出光孔161位于第一凹球面镜200的第一入射焦点210位置上,出光部件160除出光孔161以外的部分可用于遮挡光源110其他角度的光线。在本实施方式中,光源110发射的光线通过出光孔161出射部分光线作为工作光线,出光部件160除出光孔161以外的部分可用于遮挡光源110其他角度的光线,进而可避免其他光线对工作光线的干扰。其中出光孔161为贯穿出光部件160的通孔162(如图8所示),出光孔161的形状不限于狭缝、圆形、方形、三角形或者多边形。在另一实施方式中,出光孔161包括贯穿出光部件160的通孔162和填充在通孔162中的透光材质163(如图9所示)。Please refer to Figure 7. Different from the embodiment shown in Figure 2, in one possible implementation, the emission auxiliary component 120 is a light emitting component 160, and the light emitting component 160 is located between the light source 110 and the first concave spherical mirror 200. The light-emitting component 160 is provided with a light-emitting hole 161. The light-emitting hole 161 is the light emitting position of the light source assembly 100. The light-emitting hole 161 is located at the first incident focus 210 of the first concave spherical mirror 200. The part of the light-emitting component 160 other than the light emitting hole 161 It can be used to block light from other angles of the light source 110 . In this embodiment, the light emitted by the light source 110 emits part of the light through the light outlet 161 as the working light. The part of the light outlet component 160 except the light outlet 161 can be used to block the light from other angles of the light source 110, thereby preventing other light from affecting the working light. interference. The light-emitting hole 161 is a through-hole 162 that penetrates the light-emitting component 160 (as shown in FIG. 8 ). The shape of the light-emitting hole 161 is not limited to a slit, a circle, a square, a triangle, or a polygon. In another embodiment, the light outlet hole 161 includes a through hole 162 penetrating the light outlet component 160 and a light-transmitting material 163 filled in the through hole 162 (as shown in FIG. 9 ).

在一种可能的实现方式中,出光部件160为出光板164或者出光罩165中的一种。其中图7至图9示出的出光部件160为出光板164,图10示出的出光部件160为出光罩165,出光罩165罩设在光源110外,可有效遮挡其他非必要的光线,避免其他光线产生较多的热量,而影响检测精度。在一些实施方式中,出光罩165也可只罩设光源110的一部分,或者说出光罩165的形状为球面形或者椭球面形。In a possible implementation, the light emitting component 160 is one of the light emitting plate 164 or the light emitting cover 165 . The light-emitting component 160 shown in Figures 7 to 9 is a light-emitting plate 164, and the light-emitting component 160 shown in Figure 10 is a light-emitting cover 165. The light-emitting cover 165 is located outside the light source 110 and can effectively block other unnecessary light to avoid Other lights generate more heat, which affects detection accuracy. In some embodiments, the light output mask 165 may only cover a part of the light source 110 , or the shape of the light mask 165 may be spherical or ellipsoidal.

在本实施方式中,还可在出光孔161远离光源110的一侧可设置扩束器140(如图11所示),用于将出光孔161出射的光线发散至具有预设角度范围。In this embodiment, a beam expander 140 (as shown in FIG. 11 ) may also be provided on the side of the light outlet 161 away from the light source 110 to diffuse the light emitted from the light outlet 161 to a preset angle range.

请参阅图12,与图1所示实施方式中不同的是,第一凹球面镜200和第二凹球面镜300是各自独立的部件,而不是一体化结构。在组装时,分开独立设置的第一凹球面镜200和 第二凹球面镜300的组装灵活性更高,曲率选择范围更宽。Referring to FIG. 12 , the difference from the embodiment shown in FIG. 1 is that the first concave spherical mirror 200 and the second concave spherical mirror 300 are independent components, rather than an integrated structure. During assembly, the separately provided first concave spherical mirror 200 and the second concave spherical mirror 300 have higher assembly flexibility and a wider curvature selection range.

需要说明的是,本申请中用于检测待测样品表面状态的装置10各部件的安装位置可根据应用场景来设置。例如当应用于化学机械研磨设备1中时,可根据化学机械研磨设备1的结构形状和空间来设置,只要满足上述光线传播路径以实现检测研磨终点的目的即可,在实际产品中可另外设置支撑架或者利用已有的结构部件作为支撑位置来固定用于检测待测样品表面状态的装置10各部件,在本申请用于检测待测样品表面状态的装置10各部件的安装位置不限于本申请附图所示的位置示意图。It should be noted that the installation positions of each component of the device 10 for detecting the surface state of the sample to be tested in this application can be set according to the application scenario. For example, when applied to chemical mechanical polishing equipment 1, it can be set according to the structural shape and space of chemical mechanical polishing equipment 1, as long as the above-mentioned light propagation path is satisfied to achieve the purpose of detecting the grinding end point, and it can be set additionally in actual products. A support frame or an existing structural component can be used as a supporting position to fix each component of the device 10 for detecting the surface state of the sample to be tested. The installation position of each component of the device 10 for detecting the surface state of the sample to be tested is not limited to this application. The location diagram shown in the application drawing is attached.

请参阅图13和图2,本申请一实施方式还提供检测待测样品表面状态的方法,检测待测样品表面状态的方法包括步骤S100、步骤S200、步骤S300和步骤S400。详细步骤如下所述。Referring to Figure 13 and Figure 2, one embodiment of the present application also provides a method for detecting the surface state of a sample to be tested. The method for detecting the surface state of a sample to be tested includes step S100, step S200, step S300 and step S400. Detailed steps are described below.

步骤S100,使用光源组件100发射多条出射角度不同的光线。Step S100, use the light source assembly 100 to emit multiple light rays with different exit angles.

步骤S200,将光源组件100发射的多条出射角度不同的光线自第一入射焦点210位置入射至第一凹球面镜200,其中光源组件100的光线发射位置位于第一凹球面镜200的第一入射焦点210位置上。Step S200: Inject multiple light rays with different exit angles emitted by the light source assembly 100 from the first incident focus 210 position to the first concave spherical mirror 200, where the light emission position of the light source assembly 100 is located at the first incident focus of the first concave spherical mirror 200. At position 210.

步骤S300,使用第一凹球面镜200将光线反射至待测样品20上,其中待测样品20位于第一凹球面镜200的第一出射焦点220上。在本实施方式中,待测样品20为晶圆,在晶圆中包括多层介质层和多层金属层,在将晶圆制备成特定的产品时会采用化学机械研磨方法将其中的介质层或者金属层去除,光线入射到不同材料的表面上的反射强度不同,因此可根据反射强度变化来确定研磨终点。Step S300 , use the first concave spherical mirror 200 to reflect light onto the sample 20 to be tested, where the sample 20 to be tested is located at the first exit focus 220 of the first concave spherical mirror 200 . In this embodiment, the sample 20 to be tested is a wafer, which includes multiple dielectric layers and multiple metal layers. When preparing the wafer into a specific product, a chemical mechanical polishing method is used to polish the dielectric layers. Or the metal layer is removed, and the reflection intensity of light incident on the surface of different materials is different, so the grinding end point can be determined based on the change in reflection intensity.

步骤S400,将被待测样品20反射的光线,通过第二凹球面镜300反射至光学传感器400,其中第二凹球面镜300的第二入射焦点310与第一凹球面镜200的第一出射焦点220重合,光学传感器400位于第二凹球面镜300的第二出射焦点320上。Step S400, the light reflected by the sample 20 to be measured is reflected to the optical sensor 400 through the second concave spherical mirror 300, where the second incident focus 310 of the second concave spherical mirror 300 coincides with the first exit focus 220 of the first concave spherical mirror 200. , the optical sensor 400 is located on the second exit focus 320 of the second concave spherical mirror 300 .

其中,第一入射焦点210是指光线以同一个焦点入射至第一凹球面镜200时所在的入射焦点,第一出射焦点220是指光线被第一凹球面镜200反射后汇聚的焦点,对于第一凹球面镜200来说第一入射焦点210和第一出射焦点220相互适配的,同一个第一凹球面镜200具有多个第一入射焦点210和与之匹配的多个第一出射焦点220。其中,待测样品20是位于第一出射焦点220是指,光线透过检测窗口31后的汇聚焦点落在待测样品20朝向检测窗口31的表面上,只要满足第一出射焦点220位于待测样品20表面需要检测的区域即可。The first incident focus 210 refers to the incident focus where the light rays are incident on the first concave spherical mirror 200 with the same focus, and the first exit focus 220 refers to the focus where the light rays converge after being reflected by the first concave spherical mirror 200. For the first For the concave spherical mirror 200, the first incident focus point 210 and the first exit focus point 220 are adapted to each other. The same first concave spherical mirror 200 has multiple first incident focus points 210 and multiple first exit focus points 220 matching them. Wherein, the sample 20 to be tested is located at the first exit focus 220 means that the focus point of the light after passing through the detection window 31 falls on the surface of the sample 20 to be tested facing the detection window 31, as long as the first exit focus 220 is located at the detection window 31. The area on the surface of sample 20 that needs to be detected is sufficient.

第二入射焦点310是指光线以同一个焦点入射至第二凹球面镜300时所在的入射焦点,第二出射焦点320是指光线被第二凹球面镜300反射后汇聚的焦点,对于第二凹球面镜300来说第二入射焦点310和第二出射焦点320相互适配的,同一个第二凹球面镜300具有多个第二入射焦点310和与之匹配的多个第二出射焦点320。其中,光学传感器400位于第二凹球面镜300的第二出射焦点320上是指,被第二凹球面镜300反射的光线的汇聚焦点落在光学传感器400上,而使光线能够被光学传感器400获取,只要满足第二出射焦点320位于光学传感器400上即可,例如光学传感器400包括光敏区,光敏区可用于收集光线,第二出射焦点320位于光敏区上。The second incident focus 310 refers to the incident focus where the light rays enter the second concave spherical mirror 300 with the same focus. The second exit focus 320 refers to the focus where the light rays converge after being reflected by the second concave spherical mirror 300. For the second concave spherical mirror In 300, the second incident focus 310 and the second exit focus 320 are adapted to each other. The same second concave spherical mirror 300 has multiple second incident focus 310 and multiple second exit focus 320 matching them. The fact that the optical sensor 400 is located at the second exit focus 320 of the second concave spherical mirror 300 means that the convergence point of the light reflected by the second concave spherical mirror 300 falls on the optical sensor 400, so that the light can be acquired by the optical sensor 400. As long as the second exit focus 320 is located on the optical sensor 400, for example, the optical sensor 400 includes a photosensitive area, the photosensitive area can be used to collect light, and the second exit focus 320 is located on the photosensitive area.

本申请提供的用于检测待测样品表面状态的方法通过使用光源组件100发射多条出射 角度不同的光线,并将该光线通过第一凹球面镜200入射至待测样品20上,使得入射至待测样品20的光线为具有多个不同入射角的光线,当待测样品20表面状态发生变化时,会产生具有多个不同强度变化的反射光线,也就是说用于检测待测样品表面状态的光线具有多个入射角度,进而产生具有多个强度变化的反射光线,发射光线的强度变化能够反映出待测样品表面状态,通过多条光线的多个强度变化值的平均值来判断相较于单一入射角度的光线的强度变化值,可减小测量误差;本申请中这些多个不同强度变化的反射光线入射至第二凹球面镜300后,再被会聚反射至光学传感器400中,也就是说只需一个光学传感器400就可以获取多个不同强度变化的反射光线,可节约空间尺寸和简化处理电路。The method for detecting the surface state of a sample to be tested provided by this application uses the light source assembly 100 to emit multiple light rays with different exit angles, and the light is incident on the sample to be tested 20 through the first concave spherical mirror 200, so that the light is incident on the sample to be tested. The light of the sample 20 to be tested is light with multiple different incident angles. When the surface state of the sample to be tested 20 changes, reflected light with multiple different intensity changes will be generated, which means that it is used to detect the surface state of the sample to be tested. Light has multiple incident angles, thereby producing reflected light with multiple intensity changes. The intensity change of the emitted light can reflect the surface state of the sample to be tested. The average of the multiple intensity change values of the multiple light rays is used to determine the relative intensity of the light. The intensity change value of light at a single incident angle can reduce measurement errors; in this application, these multiple reflected light rays with different intensity changes are incident on the second concave spherical mirror 300, and then are converged and reflected to the optical sensor 400, that is to say Only one optical sensor 400 can acquire multiple reflected lights with different intensity changes, which can save space and simplify the processing circuit.

在本实施方式中,用于检测待测样品20的研磨终点,即通过判断待测样品20表面的材质变化来确定研磨终点。在一些实施方式中,待测样品20的表面状态为待测样品20的表面纹理或者细微结构,细微结构包括凸起、凹陷、划痕、色斑、异物和裂纹等。当光线入射到待测样品20的表面上时,表面纹理或者表面细微结构不同,光线在其表面反射后的强度也会不同,进而可获得反映表面纹理或者细微结构的反射光线强度信息。当用于检测待测样品20的表面纹理或者细微结构时,本申请的检测待测样品表面状态的方法还可以应用于检测产品瑕疵,使用第一凹球面镜200将入射至待测样品20的光线为具有多个不同入射角的光线,当待测样品20表面纹理或者细微结构与标准样品不同时,会产生具有多个不同强度变化的反射光线,相较于单一入射角度的光线,可减小测量误差。In this embodiment, it is used to detect the grinding end point of the sample 20 to be tested, that is, the grinding end point is determined by judging the material change on the surface of the sample 20 to be tested. In some embodiments, the surface state of the sample 20 to be tested is the surface texture or fine structure of the sample 20 to be tested. The fine structures include protrusions, depressions, scratches, stains, foreign matter, cracks, etc. When light is incident on the surface of the sample 20 to be measured, if the surface texture or surface fine structure is different, the intensity of the light after reflection on the surface will also be different, and thus reflected light intensity information reflecting the surface texture or fine structure can be obtained. When used to detect the surface texture or fine structure of the sample to be tested 20, the method for detecting the surface state of the sample to be tested 20 can also be applied to detect product defects. The first concave spherical mirror 200 is used to detect the light incident on the sample 20 to be tested. For light with multiple different incident angles, when the surface texture or fine structure of the sample 20 to be tested is different from the standard sample, multiple reflected rays with different intensity changes will be generated. Compared with the light with a single incident angle, the reflected light can be reduced. Measurement error.

请继续参阅图13和图2,在一种可能的实现方式中,检测待测样品表面状态的方法还包括步骤S500和步骤S600。详细步骤如下所述。Please continue to refer to Figure 13 and Figure 2. In a possible implementation, the method for detecting the surface state of the sample to be tested also includes step S500 and step S600. Detailed steps are described below.

步骤S500,光学传感器400将接收的光线传输至处理电路500。从第二凹球面镜300发射的具有多个反射强度不同的光线被光学传感器400接收后传输至处理电路500。其中处理光学传感器400包括但不限于PD、APD、CCD或者CMOS传感器。处理电路500包括放大电路、模数转换电路和计算电路等。In step S500, the optical sensor 400 transmits the received light to the processing circuit 500. The light beams with multiple different reflection intensities emitted from the second concave spherical mirror 300 are received by the optical sensor 400 and then transmitted to the processing circuit 500 . The processing optical sensor 400 includes but is not limited to PD, APD, CCD or CMOS sensor. The processing circuit 500 includes an amplification circuit, an analog-to-digital conversion circuit, a calculation circuit, etc.

步骤S600,处理电路500根据光线判断待测样品20的表面状态。在本实施方式中,处理电路500根据光线判断待测样品20的表面材质变化,进而判断待测样品20的研磨终点。In step S600, the processing circuit 500 determines the surface state of the sample 20 to be tested based on the light. In this embodiment, the processing circuit 500 determines the surface material change of the sample to be tested 20 based on the light, and then determines the grinding end point of the sample to be tested 20 .

请参阅图14和图2,在一种可能的实现方式中,步骤S100包括步骤S110和步骤S120。详细步骤如下所述。Referring to Figure 14 and Figure 2, in a possible implementation, step S100 includes step S110 and step S120. Detailed steps are described below.

步骤S110,使用光源110发射光线。Step S110, use the light source 110 to emit light.

步骤S120,使用发射辅助件120将光源110发射的光线以具有预设角度范围入射至第一凹球面镜200。Step S120 , use the emission auxiliary component 120 to make the light emitted by the light source 110 incident on the first concave spherical mirror 200 in a preset angle range.

其中光源110可为卤素光源、激光光源或者LED光源中的一种,其中激光光源发射的光线可为任意波长的激光,例如产生一束670nm波长的激光。一般的光源110发射的光线会以光源110为中心向周围发散,当没有发射辅助件120时,也会有一定预设角度范围的光线入射至第一凹球面镜200上,本申请中把入射到第一凹球面镜200上后反射到待测样品20的光线称为工作光线,除工作光线以后的其他角度范围的光线会对工作光线产生干扰,可能会影响判断精度。在本实施方式中,使用发射辅助件120将光源110发射的光线聚集到具有预设角度范围,一方面可增强入射至第一凹球面镜200的光线强度,另一方面 可减少其他光线对工作光线的干扰。其中预设角度范围可根据实际需求来设置。The light source 110 may be one of a halogen light source, a laser light source, or an LED light source, and the light emitted by the laser light source may be a laser of any wavelength, for example, a laser with a wavelength of 670 nm is generated. The light emitted by the general light source 110 will diverge to the surroundings with the light source 110 as the center. When there is no emission auxiliary component 120, there will also be light with a certain preset angle range incident on the first concave spherical mirror 200. In this application, the incident light is incident on the first concave spherical mirror 200. The light reflected from the first concave spherical mirror 200 to the sample 20 to be measured is called the working light. In addition to the working light, light in other angle ranges will interfere with the working light and may affect the judgment accuracy. In this embodiment, the emission auxiliary member 120 is used to gather the light emitted by the light source 110 to a preset angle range. On the one hand, the intensity of the light incident on the first concave spherical mirror 200 can be enhanced, and on the other hand, the impact of other light on the working light can be reduced. interference. The preset angle range can be set according to actual needs.

请继续参阅图14和图6,在一种可能的实现方式中,步骤S100还包括步骤S130。Please continue to refer to Figure 14 and Figure 6. In a possible implementation, step S100 also includes step S130.

步骤S130,使用扩束器140将发射辅助件120出射的光线发散至具有预设角度范围,扩束器140位于发射辅助件120和第一凹球面镜200之间。当发射辅助件120发射的光线不能满足检测要求时,可通过扩束器140将发射辅助件120出射的光线发散至具有预设角度范围。Step S130 , use the beam expander 140 to spread the light emitted from the emission auxiliary member 120 to a preset angle range. The beam expander 140 is located between the emission auxiliary member 120 and the first concave spherical mirror 200 . When the light emitted by the emission auxiliary component 120 cannot meet the detection requirements, the beam expander 140 can be used to diffuse the light emitted from the emission auxiliary component 120 to a preset angle range.

在一些实施方式中,步骤S100还包括使用滤光器对光源110发射的光线滤光,使得耦合进入光纤130的光线为具有特定波长的光。其中滤光器位于光源110和光纤130的第一端131之间。其中用于检测待测样品表面状态的光线的波长取决于待测样品20的表面状态以及光学传感器400的特性,也就是说,待测样品20的表面状态不同,其能够反映研磨终点的光线的波长范围可能不同,不同的光学传感器400对不同波长范围的光的灵敏度不同,具体可根据实际需要来设置,通过滤光器可获得具有特定波长的光线。In some embodiments, step S100 further includes using an optical filter to filter the light emitted by the light source 110 so that the light coupled into the optical fiber 130 is light with a specific wavelength. The optical filter is located between the light source 110 and the first end 131 of the optical fiber 130 . The wavelength of the light used to detect the surface state of the sample to be tested depends on the surface state of the sample to be tested 20 and the characteristics of the optical sensor 400 . That is to say, the surface state of the sample to be tested 20 is different, which can reflect the light at the end of the grinding process. The wavelength range may be different, and different optical sensors 400 have different sensitivities to light in different wavelength ranges, which can be set according to actual needs. Light with specific wavelengths can be obtained through optical filters.

请继续参阅2,在本实施方式中,发射辅助件120为光纤130,步骤S120为使用光纤130将光源110发射的光线以具有预设角度范围入射至第一凹球面镜200。步骤S130为使用扩束器140将光纤130出射的光线发散至具有预设角度范围,扩束器140位于光纤130和第一凹球面镜200之间。Please continue to refer to 2. In this embodiment, the emission auxiliary component 120 is an optical fiber 130. Step S120 is to use the optical fiber 130 to incident the light emitted by the light source 110 into the first concave spherical mirror 200 in a preset angle range. Step S130 is to use the beam expander 140 to spread the light emitted from the optical fiber 130 to a preset angle range. The beam expander 140 is located between the optical fiber 130 and the first concave spherical mirror 200 .

其中,光源110位于光纤130的第一端131,光源110发射的光线自光纤130的第一端131入射至光纤130中,光纤130的第二端132为光源组件100的光线出射端,光纤130的第二端132位于第一凹球面镜200的第一入射焦点210位置上,入射至光纤130的光线自光纤130的第二端132出射至第一凹球面镜200上。The light source 110 is located at the first end 131 of the optical fiber 130. The light emitted by the light source 110 is incident from the first end 131 of the optical fiber 130 into the optical fiber 130. The second end 132 of the optical fiber 130 is the light exit end of the light source assembly 100. The optical fiber 130 The second end 132 is located at the first incident focus 210 of the first concave spherical mirror 200 , and the light incident on the optical fiber 130 is emitted from the second end 132 of the optical fiber 130 to the first concave spherical mirror 200 .

采用光纤130作为发射辅助件120,光纤130具有一定的弯曲性能,使得光源110的放置位置更灵活,光纤130的长度可长可短,例如当安装空间尺寸有限时,可根据实际情况将光源110设置在可节约尺寸的位置,然后通过光纤130将光线引入到光线发射位置,即只需将光线130的第二端132放置在第一凹球面镜200的第一发射焦点210上即可。Optical fiber 130 is used as the launch auxiliary component 120. The optical fiber 130 has certain bending properties, which makes the placement of the light source 110 more flexible. The length of the optical fiber 130 can be long or short. For example, when the installation space is limited, the light source 110 can be placed according to the actual situation. It is set at a position that can save size, and then the light is introduced to the light emission position through the optical fiber 130, that is, the second end 132 of the light 130 only needs to be placed on the first emission focus 210 of the first concave spherical mirror 200.

另外,将光源110直接放置在第一凹球面镜200的第一发射焦点210时,光源110离待测样品20和光学传感器400比较近,发光时产生的热量会影响待测样品20表面状态或者会影响光学传感器400采集反射光线的性能,进而影响检测精度,在本实施方式中,采用光纤130传输光线,光源110可设置在其他位置,进而可减小光源110发光时的热量对待测样品20表面或者光学传感器400的影响,进而提高检测精度。In addition, when the light source 110 is directly placed at the first emission focus 210 of the first concave spherical mirror 200, the light source 110 is relatively close to the sample to be measured 20 and the optical sensor 400, and the heat generated when emitting light will affect the surface state of the sample to be measured 20 or may cause damage to the surface of the sample 20. Affects the performance of the optical sensor 400 in collecting reflected light, thereby affecting the detection accuracy. In this embodiment, the optical fiber 130 is used to transmit light, and the light source 110 can be set at other positions, thereby reducing the heat generated by the light source 110 when emitting light on the surface of the sample 20 to be measured Or the influence of the optical sensor 400, thereby improving the detection accuracy.

其中,光纤130的第二端132发射的光线的角度范围可根据光纤130的数值孔径来确定,一般的,光纤130数值孔径越大,发射光线的角度范围越宽。The angular range of the light emitted by the second end 132 of the optical fiber 130 can be determined according to the numerical aperture of the optical fiber 130. Generally, the larger the numerical aperture of the optical fiber 130, the wider the angular range of the emitted light.

在一些实施方式中,步骤S100还包括使用光耦合器150将光源110发射的光线耦合进入光纤130。其中光耦合器150可由多个透镜组成。一般的,光源110发出的光具有较宽的范围,需要通过光耦合器150将光线耦合进入光纤130中,增加入射至光纤130中光线的强度。In some embodiments, step S100 further includes using an optical coupler 150 to couple the light emitted by the light source 110 into the optical fiber 130 . The optical coupler 150 may be composed of multiple lenses. Generally, the light emitted by the light source 110 has a wide range, and the light needs to be coupled into the optical fiber 130 through the optical coupler 150 to increase the intensity of the light incident on the optical fiber 130 .

请继续参阅图7,在一些实施方式中,发射辅助件120为出光部件160,步骤S120为使用出光部件160将光源110发射的光线以具有预设角度范围入射至第一凹球面镜200。请继续参阅图11,步骤S130为使用扩束器140将出光部件160出射的光线发散至具有预 设角度范围,扩束器140位于出光部件160和第一凹球面镜200之间。Please continue to refer to FIG. 7 . In some embodiments, the emission auxiliary component 120 is a light emitting component 160 . Step S120 is to use the light emitting component 160 to incident the light emitted by the light source 110 into the first concave spherical mirror 200 in a preset angle range. Please continue to refer to Figure 11. Step S130 is to use the beam expander 140 to diffuse the light emitted from the light emitting component 160 to a preset angle range. The beam expander 140 is located between the light emitting component 160 and the first concave spherical mirror 200.

其中,出光部件160上设有出光孔161,出光孔161为光源组件100的光线出射位置,出光孔161位于第一凹球面镜200的第一入射焦点210位置上,出光部件160除出光孔161以外的部分可用于遮挡光源110其他角度的光线。在本实施方式中,光源110发射的光线通过出光孔161出射部分光线作为工作光线,出光部件160除出光孔161以外的部分可用于遮挡光源110其他角度的光线进而可避免其他光线对工作光线的干扰。其中出光孔161为贯穿出光部件160的通孔162(如图8所示),出光孔161的形状不限于狭缝、圆形、方形、三角形或者多边形。在另一实施方式中,出光孔161包括贯穿出光部件160的通孔162和填充在通孔162中的透光材质163(如图9所示)。Among them, the light-emitting component 160 is provided with a light-emitting hole 161. The light-emitting hole 161 is the light emitting position of the light source assembly 100. The light-emitting hole 161 is located at the first incident focus 210 of the first concave spherical mirror 200. The light-emitting component 160 is other than the light emitting hole 161. The portion can be used to block light from other angles of the light source 110 . In this embodiment, part of the light emitted by the light source 110 passes through the light exit hole 161 as working light. The part of the light exit component 160 except the light exit hole 161 can be used to block light from other angles of the light source 110 to avoid other light rays from affecting the working light. interference. The light-emitting hole 161 is a through-hole 162 that penetrates the light-emitting component 160 (as shown in FIG. 8 ). The shape of the light-emitting hole 161 is not limited to a slit, a circle, a square, a triangle, or a polygon. In another embodiment, the light outlet hole 161 includes a through hole 162 penetrating the light outlet component 160 and a light-transmitting material 163 filled in the through hole 162 (as shown in FIG. 9 ).

在一种可能的实现方式中,出光部件160为出光板164或者出光罩165中的一种。其中图7至图9示出的出光部件160为出光板164,图10示出的出光部件160为出光罩165,出光罩165罩设在光源110外,可有效遮挡其他非必要的光线,避免其他光线产生较多的热量,而影响检测精度。在一些实施方式中,出光罩165也可只罩设光源110的一部分,或者说出光罩165的形状为球面形或者椭球面形。In a possible implementation, the light emitting component 160 is one of the light emitting plate 164 or the light emitting cover 165 . The light-emitting component 160 shown in Figures 7 to 9 is a light-emitting plate 164, and the light-emitting component 160 shown in Figure 10 is a light-emitting cover 165. The light-emitting cover 165 is located outside the light source 110 and can effectively block other unnecessary light to avoid Other lights generate more heat, which affects detection accuracy. In some embodiments, the light output mask 165 may only cover a part of the light source 110 , or the shape of the light mask 165 may be spherical or ellipsoidal.

在本实施方式中,还可在出光孔161远离光源110的一侧可设置扩束器140(如图11所示),用于将出光孔161出射的光线发散至具有预设角度范围。In this embodiment, a beam expander 140 (as shown in FIG. 11 ) may also be provided on the side of the light outlet 161 away from the light source 110 to diffuse the light emitted from the light outlet 161 to a preset angle range.

以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。The above are only specific embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application. should be covered by the protection scope of this application. Therefore, the protection scope of this application should be subject to the protection scope of the claims.

Claims (17)

一种用于检测待测样品表面状态的装置,其特征在于,所述用于检测待测样品表面状态的装置包括:A device for detecting the surface state of a sample to be tested, characterized in that the device for detecting the surface state of a sample to be tested includes: 光源组件,所述光源组件用于发射多条出射角度不同的光线;A light source component, the light source component is used to emit multiple light rays with different exit angles; 第一凹球面镜,所述光源组件的光线发射位置位于所述第一凹球面镜的第一入射焦点位置上,待测样品位于所述第一凹球面镜的第一出射焦点上;A first concave spherical mirror, the light emission position of the light source assembly is located at the first incident focus position of the first concave spherical mirror, and the sample to be measured is located at the first exit focus of the first concave spherical mirror; 第二凹球面镜,所述第二凹球面镜的第二入射焦点与所述第一凹球面镜的第一出射焦点重合;a second concave spherical mirror, the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror; 光学传感器,所述光学传感器位于所述第二凹球面镜的第二出射焦点上。An optical sensor is located at the second exit focus of the second concave spherical mirror. 如权利要求1所述的用于检测待测样品表面状态的装置,其特征在于,所述光源组件包括光源和发射辅助件,所述发射辅助件用于将所述光源发射的光线以具有预设角度范围入射至所述第一凹球面镜。The device for detecting the surface state of a sample to be tested according to claim 1, characterized in that the light source assembly includes a light source and an emission auxiliary part, and the emission auxiliary part is used to convert the light emitted by the light source to have a predetermined Assume that the angle range is incident on the first concave spherical mirror. 如权利要求2所述的用于检测待测样品表面状态的装置,其特征在于,所述发射辅助件包括光纤,所述光源位于所述光纤的第一端,所述光源发射的光线自所述光纤的第一端入射至所述光纤中,所述光纤的第二端为所述光源组件的光线出射端,所述光纤的第二端位于所述第一凹球面镜的第一入射焦点位置上,入射至所述光纤的光线自所述光纤的第二端出射至所述第一凹球面镜上。The device for detecting the surface state of a sample to be tested according to claim 2, wherein the emission auxiliary component includes an optical fiber, the light source is located at the first end of the optical fiber, and the light emitted by the light source is emitted from the optical fiber. The first end of the optical fiber is incident into the optical fiber, the second end of the optical fiber is the light exit end of the light source assembly, and the second end of the optical fiber is located at the first incident focus position of the first concave spherical mirror. on the optical fiber, the light incident on the optical fiber is emitted from the second end of the optical fiber to the first concave spherical mirror. 如权利要求3所述的用于检测待测样品表面状态的装置,其特征在于,所述光源组件还包括扩束器,所述扩束器位于所述光纤的第二端和所述第一凹球面镜之间,所述扩束器用于将所述光纤的第二端出射的光线发散至具有所述预设角度范围。The device for detecting the surface state of a sample to be tested according to claim 3, wherein the light source assembly further includes a beam expander, the beam expander is located at the second end of the optical fiber and the first end of the optical fiber. Between the concave spherical mirrors, the beam expander is used to spread the light emitted from the second end of the optical fiber to have the preset angle range. 如权利要求3所述的用于检测待测样品表面状态的装置,其特征在于,所述光源组件还包括光耦合器,所述光耦合器位于所述光源和所述光纤的第一端之间,用于将所述光源发射的光线耦合进入所述光纤。The device for detecting the surface state of a sample to be tested according to claim 3, wherein the light source assembly further includes an optical coupler, the optical coupler is located between the light source and the first end of the optical fiber. time for coupling the light emitted by the light source into the optical fiber. 如权利要求2所述的用于检测待测样品表面状态的装置,其特征在于,所述发射辅助件包括出光部件,所述出光部件位于所述光源和所述第一凹球面镜之间,所述出光部件上设有出光孔,所述出光孔为所述光源组件的光线出射位置,所述出光孔位于所述第一凹球面镜的第一入射焦点位置上,所述出光部件除所述出光孔以外的部分用于遮挡所述光源的光线。The device for detecting the surface state of a sample to be tested according to claim 2, wherein the emission auxiliary component includes a light emitting component located between the light source and the first concave spherical mirror, so The light-emitting component is provided with a light-emitting hole. The light-emitting hole is the light-emitting position of the light source assembly. The light-emitting hole is located at the first incident focus position of the first concave spherical mirror. In addition to the light-emitting component, the light-emitting component The part other than the hole is used to block the light from the light source. 如权利要求6所述的用于检测待测样品表面状态的装置,其特征在于,所述出光孔为贯穿所述出光部件的通孔。The device for detecting the surface state of a sample to be tested according to claim 6, wherein the light outlet hole is a through hole that penetrates the light outlet component. 如权利要求6所述的用于检测待测样品表面状态的装置,其特征在于,所述出光孔包括贯穿所述出光部件的通孔和填充在所述通孔中的透光材质。The device for detecting the surface state of a sample to be tested according to claim 6, wherein the light outlet hole includes a through hole that penetrates the light outlet component and a light-transmitting material filled in the through hole. 如权利要求1-8任一项所述的用于检测待测样品表面状态的装置,其特征在于,所述第一凹球面镜和所述第二凹球面镜为一体化结构。The device for detecting the surface state of a sample to be tested according to any one of claims 1 to 8, characterized in that the first concave spherical mirror and the second concave spherical mirror are integrated structures. 如权利要求1-9任一项所述的用于检测待测样品表面状态的装置,其特征在于,所述用于检测待测样品表面状态的装置还包括处理电路,所述处理电路与所述光学传感器电连接,所述处理电路用于根据所述光学传感器获取的光线确定所述待测样品表面状态。The device for detecting the surface state of the sample to be tested according to any one of claims 1 to 9, characterized in that the device for detecting the surface state of the sample to be tested further includes a processing circuit, and the processing circuit is connected to the surface state of the sample to be tested. The optical sensor is electrically connected, and the processing circuit is used to determine the surface state of the sample to be measured based on the light acquired by the optical sensor. 一种化学机械研磨设备,其特征在于,所述化学机械研磨设备包括研磨垫以及如权利要求1-10任一项所述的用于检测待测样品表面状态的装置,所述用于检测待测样品表面状态的装置位于所述研磨垫的下方,所述研磨垫用于承载所述待测样品。A kind of chemical mechanical polishing equipment, characterized in that the chemical mechanical polishing equipment includes a polishing pad and a device for detecting the surface state of the sample to be tested as described in any one of claims 1-10, the device for detecting the surface state of the sample to be tested is The device for measuring the surface condition of the sample is located below the polishing pad, and the polishing pad is used to carry the sample to be measured. 如权利要求11所述的化学机械研磨设备,其特征在于,所述研磨垫包括检测窗口,所述检测窗口能够透过光线,从所述第一凹球面镜反射的光线透过所述检测窗口入射至所述待测样品上。The chemical mechanical polishing equipment of claim 11, wherein the polishing pad includes a detection window, the detection window is capable of transmitting light, and the light reflected from the first concave spherical mirror is incident through the detection window. onto the sample to be tested. 一种检测待测样品表面状态的方法,其特征在于,所述检测待测样品表面状态的方法包括:A method for detecting the surface state of a sample to be tested, characterized in that the method for detecting the surface state of a sample to be tested includes: 使用光源组件发射多条出射角度不同的光线;Use a light source component to emit multiple light rays with different exit angles; 将所述光源组件发射的所述多条出射角度不同的光线自第一入射焦点位置入射至第一凹球面镜,其中所述光源组件的光线发射位置位于所述第一凹球面镜的所述第一入射焦点位置上;The plurality of light rays with different exit angles emitted by the light source assembly are incident on the first concave spherical mirror from a first incident focus position, wherein the light emission position of the light source assembly is located on the first side of the first concave spherical mirror. At the incident focus position; 使用所述第一凹球面镜将所述光线反射至所述待测样品上,其中所述待测样品位于所述第一凹球面镜的第一出射焦点上;Use the first concave spherical mirror to reflect the light onto the sample to be measured, wherein the sample to be measured is located at the first exit focus of the first concave spherical mirror; 将被所述待测样品反射的光线,通过第二凹球面镜反射至光学传感器,其中所述第二凹球面镜的第二入射焦点与所述第一凹球面镜的第一出射焦点重合,所述光学传感器位于所述第二凹球面镜的第二出射焦点上。The light reflected by the sample to be measured is reflected to the optical sensor through the second concave spherical mirror, wherein the second incident focus of the second concave spherical mirror coincides with the first exit focus of the first concave spherical mirror, and the optical sensor The sensor is located at the second exit focus of the second concave spherical mirror. 如权利要求13所述的检测待测样品表面状态的方法,其特征在于,所述检测待测样品表面状态的方法还包括:The method for detecting the surface state of a sample to be tested according to claim 13, wherein the method for detecting the surface state of a sample to be tested further includes: 所述光学传感器将接收的所述光线传输至处理电路;The optical sensor transmits the received light to a processing circuit; 所述处理电路根据所述光线判断所述待测样品的表面状态。The processing circuit determines the surface state of the sample to be tested based on the light. 如权利要求13或14所述的检测待测样品表面状态的方法,其特征在于,所述使用光源组件发射多条出射角度不同的光线,包括:The method for detecting the surface state of a sample to be tested according to claim 13 or 14, characterized in that the use of a light source component to emit multiple light rays with different exit angles includes: 使用所述光源发射光线;using said light source to emit light; 使用发射辅助件将所述光源发射的光线以具有预设角度范围入射至所述第一凹球面镜。The light emitted by the light source is incident on the first concave spherical mirror in a preset angle range using an emission auxiliary component. 如权利要求15所述的检测待测样品表面状态的方法,其特征在于,所述使用光源组件发射多条出射角度不同的光线,还包括:The method for detecting the surface state of a sample to be tested according to claim 15, wherein the use of a light source component to emit multiple light rays with different exit angles further includes: 使用扩束器将所述发射辅助件出射的光线发散至具有所述预设角度范围,所述扩束器位于所述发射辅助件和所述第一凹球面镜之间。A beam expander is used to spread the light emitted from the emission auxiliary part to have the preset angle range, and the beam expander is located between the emission auxiliary part and the first concave spherical mirror. 如权利要求13-16任一项所述的检测待测样品表面状态的方法,其特征在于,所述待测样品为晶圆。The method for detecting the surface state of a sample to be tested according to any one of claims 13 to 16, wherein the sample to be tested is a wafer.
PCT/CN2022/086192 2022-04-12 2022-04-12 Apparatus for testing surface state of sample to be tested WO2023197124A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202280094635.5A CN118974538A (en) 2022-04-12 2022-04-12 Device for detecting the surface state of a sample to be tested
PCT/CN2022/086192 WO2023197124A1 (en) 2022-04-12 2022-04-12 Apparatus for testing surface state of sample to be tested

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2022/086192 WO2023197124A1 (en) 2022-04-12 2022-04-12 Apparatus for testing surface state of sample to be tested

Publications (1)

Publication Number Publication Date
WO2023197124A1 true WO2023197124A1 (en) 2023-10-19

Family

ID=88328663

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2022/086192 WO2023197124A1 (en) 2022-04-12 2022-04-12 Apparatus for testing surface state of sample to be tested

Country Status (2)

Country Link
CN (1) CN118974538A (en)
WO (1) WO2023197124A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI886879B (en) 2024-03-29 2025-06-11 力晶積成電子製造股份有限公司 Detection device and detection method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0815130A (en) * 1994-06-29 1996-01-19 Jeol Ltd Fourier transform phase modulation spectroellipsometry
US6271916B1 (en) * 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
CN107367461A (en) * 2017-06-23 2017-11-21 展义胜 A kind of oil content analyzer
JP2021051074A (en) * 2019-09-19 2021-04-01 国立研究開発法人日本原子力研究開発機構 Spectroscopic analyzer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271916B1 (en) * 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
JPH0815130A (en) * 1994-06-29 1996-01-19 Jeol Ltd Fourier transform phase modulation spectroellipsometry
CN107367461A (en) * 2017-06-23 2017-11-21 展义胜 A kind of oil content analyzer
JP2021051074A (en) * 2019-09-19 2021-04-01 国立研究開発法人日本原子力研究開発機構 Spectroscopic analyzer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI886879B (en) 2024-03-29 2025-06-11 力晶積成電子製造股份有限公司 Detection device and detection method

Also Published As

Publication number Publication date
CN118974538A (en) 2024-11-15

Similar Documents

Publication Publication Date Title
KR100301067B1 (en) Method for detecting micro scratch and device adopting the same
US9354047B2 (en) Rotational misalignment measuring device of bonded substrate, rotational misalignment measuring method of bonded substrate, and method of manufacturing bonded substrate
US6937333B2 (en) Apparatus for measuring film thickness formed on object, apparatus and method of measuring spectral reflectance of object, and apparatus and method of inspecting foreign material on object
JP5079558B2 (en) Surface height detection method and apparatus
KR100795616B1 (en) Method and apparatus for detecting endpoints with light rays having different wavelengths
KR101815325B1 (en) System for directly measuring the depth of a high aspect ratio etched feature on a wafer
CN109540004B (en) Optical detection system and detection method thereof
TWI864270B (en) Imaging system for buried metrology targets
TW202246733A (en) Measuring apparatus and method for roughness and/or defect measurement on a surface
US20080137061A1 (en) Displacement Measurement Sensor Using the Confocal Principle
CN112748111B (en) Three-dimensional detection device and three-dimensional detection method
CN105277131B (en) Measuring device and measuring method of three-dimensional pore structure
KR102389680B1 (en) Characterizing tsv microfabrication process and products
WO2023197124A1 (en) Apparatus for testing surface state of sample to be tested
KR102248379B1 (en) Defect inspection equipment for semiconductor devices
TWI850214B (en) Inspecting an object that includes a photo-sensitive polyimide layer
CN112540044A (en) Elliptical polarization measuring equipment and focusing method and measuring method thereof
JP4756785B2 (en) Surface inspection method and apparatus
CN120160546A (en) Surface bump height difference measurement system
WO2024263745A2 (en) Reflective co-axial interferometer systems and methods thereof
CN118974891A (en) Optical reflectometer and method for detecting surface of sample to be detected
Gómez-Rosas et al. The dynamic angle-limited integrated scattering (DALIS) method for measuring scattering of light from optical surfaces with random roughness
CN112697039A (en) Detection device and detection equipment
JPH0688709A (en) Bump-electrode inspecting apparatus

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22936782

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 202280094635.5

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 22936782

Country of ref document: EP

Kind code of ref document: A1

点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载