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WO2019033358A1 - Photosensitive chip and electronic device - Google Patents

Photosensitive chip and electronic device Download PDF

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Publication number
WO2019033358A1
WO2019033358A1 PCT/CN2017/097919 CN2017097919W WO2019033358A1 WO 2019033358 A1 WO2019033358 A1 WO 2019033358A1 CN 2017097919 W CN2017097919 W CN 2017097919W WO 2019033358 A1 WO2019033358 A1 WO 2019033358A1
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WO
WIPO (PCT)
Prior art keywords
photosensitive
photosensitive chip
light
die
chip according
Prior art date
Application number
PCT/CN2017/097919
Other languages
French (fr)
Chinese (zh)
Inventor
李问杰
Original Assignee
深圳信炜科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳信炜科技有限公司 filed Critical 深圳信炜科技有限公司
Priority to CN201790000146.3U priority Critical patent/CN209803814U/en
Priority to PCT/CN2017/097919 priority patent/WO2019033358A1/en
Publication of WO2019033358A1 publication Critical patent/WO2019033358A1/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00Pattern recognition

Definitions

  • the utility model relates to the field of photoelectric sensing, in particular to a photosensitive chip for realizing image information or biometric information sensing.
  • the optical fingerprint recognition module includes an optical fingerprint sensor 400 and a light source 402.
  • the optical fingerprint sensor 400 is disposed under the protective cover 401 of the mobile terminal.
  • the light source 402 is disposed adjacent to one side of the optical fingerprint sensor 400.
  • the light signal emitted by the light source 402 passes through the protective cover 401 and reaches the finger F, is reflected by the valleys and ridges of the finger F, and is received by the optical fingerprint sensor 400, and A fingerprint image of the finger F is formed.
  • optical fingerprint recognition module 400 is used when the ambient light is strong, and an accurate fingerprint image cannot be obtained, which still needs to be improved.
  • the embodiments of the present invention aim to at least solve one of the technical problems existing in the prior art. To this end, the embodiments of the present invention need to provide a photosensitive chip.
  • a photosensitive chip includes a photosensitive die and a filter film, and the filter film is disposed on the photosensitive die.
  • the filter film by setting the filter film, the interference of the ambient light is eliminated, and the image sensing accuracy of the photosensitive chip is improved.
  • the filter film is evaporated on the photosensitive die, or the filter film is adhered to the photosensitive die.
  • the filter film is used to filter out optical signals outside of a predetermined band.
  • the predetermined band is a short band signal in ambient light.
  • the predetermined band is a band corresponding to a blue or green light signal.
  • the photosensitive chip includes a plurality of photosensitive devices, and the photosensitive device is a photosensitive device having high sensitivity to sensing optical signals of the predetermined wavelength band.
  • the photosensitive device comprises any one or more of a photodiode, a photo resistor, a photodiode, and a phototransistor.
  • the sensor chip is a biosensor chip for sensing biometric information of a target object.
  • the biometric information includes any one or more of a fingerprint, a palm print, a pulse, a blood oxygen concentration, and a heart rate.
  • an anti-aliasing imaging element is also disposed over the photosensitive die.
  • the optical signals sensed between the adjacent photosensitive cells may be aliased, thereby causing the acquired sensing image to be blurred, so the embodiment of the present invention
  • the anti-aliasing imaging element is arranged on the chip to prevent aliasing of the optical signals received by the adjacent photosensitive devices, thereby improving the image sensing accuracy of the photosensitive chip.
  • the filter film and the anti-aliasing imaging element are stacked on the photosensitive die, wherein the filter film is disposed on the anti-aliasing imaging element and the photosensitive bare Between the sheets, or the anti-aliasing imaging element is disposed between the photosensitive film and the photosensitive die. .
  • the anti-aliasing imaging element includes a light absorbing wall and a plurality of light transmissive regions surrounded by a light absorbing wall.
  • the light absorbing wall is laminated from a plurality of light absorbing layers. Since the thickness of each light absorbing layer is smaller than the thickness of the light absorbing wall, the process of etching to form the light transmitting area is relatively easy, so that the process of anti-aliasing imaging element is easy, and the light transmission property of the light transmitting area is also ensured. .
  • a support layer is disposed between adjacent ones of the light absorbing layers.
  • the preparation speed of the anti-aliasing imaging element is accelerated by the transparent supporting layer, and the anti-aliasing effect of the anti-aliasing imaging element is also ensured by the distance setting between the adjacent two layers of the light absorbing layer. .
  • the light transmissive region is filled with a transparent material. Filling the transparent material in the light-transmitting region not only increases the strength of the anti-aliasing imaging element, but also prevents impurities from entering the light-transmitting region and affecting the light-transmitting effect.
  • the sensor chip further includes a package for encapsulating the photosensitive die, and the anti-aliasing imaging element and the filter film over the photosensitive die.
  • the sensor chip further includes a package for encapsulating the photosensitive die, and an anti-aliasing imaging element and a filter film over the photosensitive die, wherein the package The body fills the light transmissive area.
  • An electronic device includes the photosensitive chip of any of the above embodiments.
  • the electronic device further includes a display panel corresponding to a local area under the display panel, the sensing chip is configured to receive an optical signal transmitted from a display area of the display panel And acquiring corresponding biometric information according to the received optical signal.
  • the electronic device is a cell phone or tablet.
  • FIG. 1 is a schematic diagram of an optical image sensing structure applied to an electronic device in the prior art
  • FIG. 2 is a schematic front view showing an embodiment of an electronic device to which the photosensitive chip of the present invention is applied;
  • FIG. 3 is a cross-sectional structural view of the electronic device of FIG. 2 taken along line I-I, in which only a partial structure of the electronic device is shown;
  • FIG. 4 is a partial structural schematic view of a photosensitive chip according to an embodiment of the present invention.
  • FIG. 5 is a structural block diagram of a photosensitive chip according to another embodiment of the present invention.
  • FIG. 6 is a schematic circuit diagram of a photosensitive unit of an embodiment of the photosensitive chip shown in FIG. 5;
  • FIG. 7 is a schematic circuit diagram of a photosensitive unit of another embodiment of the photosensitive chip shown in FIG. 5;
  • FIG. 8 is a schematic structural view of a photosensitive chip according to still another embodiment of the present invention.
  • FIG. 9 is a schematic diagram of a range of optical signals through which an anti-aliasing imaging element of an embodiment of the photosensitive chip shown in FIG. 8 can pass;
  • FIG. 10 is a schematic diagram of a range of optical signals through which an anti-aliasing imaging element of another embodiment of the photosensitive chip shown in FIG. 8 can pass;
  • FIG. 11 is a schematic structural view of an anti-aliasing imaging element according to an embodiment of the present invention.
  • FIG. 12 is a schematic structural view of a photosensitive chip according to still another embodiment of the present invention.
  • first and second are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. .
  • features defining “first” or “second” may include one or more of the described features either explicitly or implicitly.
  • the meaning of "a plurality” is two or more unless specifically and specifically defined otherwise.
  • Contact or “touch” includes direct or indirect contact.
  • the photosensitive chip disclosed hereinafter is disposed inside the electronic device, such as under the display screen or the protective cover, and the user's finger indirectly contacts the photosensitive chip through the display screen or the protective cover.
  • connection is to be understood broadly, and may be, for example, a fixed connection or a Disassembling the connection, or connecting integrally; may be mechanical connection, electrical connection or communication with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or mutual interaction of two elements Role relationship.
  • installation is to be understood broadly, and may be, for example, a fixed connection or a Disassembling the connection, or connecting integrally; may be mechanical connection, electrical connection or communication with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or mutual interaction of two elements Role relationship.
  • the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
  • the embodiment of the present invention provides a photosensitive chip disposed in an electronic device having a display function, and the photosensitive chip realizes image sensing by using an optical signal emitted when the electronic device displays.
  • the photosensitive chip can be correspondingly disposed in the display area of the electronic device, or can be disposed in the non-display area of the electronic device.
  • the photosensitive chip is disposed in the display area, and the image sensing of the target object at a local position in the screen of the electronic device can be realized by the photosensitive chip.
  • an independent light source can also be disposed in the electronic device for the sensor chip. Perform image sensing use.
  • the above electronic devices are, for example, consumer electronic products, home-based electronic products, vehicle-mounted electronic products, and financial terminal products.
  • consumer electronic products such as mobile phones, tablets, notebook computers, desktop monitors, computer integrated machines and other electronic products using biometric identification technology.
  • Home-based electronic products such as smart door locks, televisions, refrigerators, wearable devices and other electronic products that use biometric technology.
  • Vehicle-mounted electronic products such as car navigation systems, car DVDs, etc.
  • Financial terminal products such as ATM machines, terminals for self-service business, etc.
  • the predetermined biometric information (or image information) of the target object is, for example but not limited to, skin texture information such as fingerprints, palm prints, ear prints, and soles, and other suitable biometric information such as heart rate, blood oxygen concentration, veins, and arteries. .
  • the predetermined biometric information may be any one or more of the aforementioned enumerated information.
  • the target object may be, for example but not limited to, a human body, and may be other suitable types of organisms.
  • FIG. 2 shows a front structure of an embodiment of an electronic device to which the photosensitive chip of the present invention is applied
  • FIG. 3 shows a partial cross-sectional structure of the electronic device of FIG. 2 along line II, wherein 3 shows only a partial structure of the electronic device.
  • the photosensitive chip 20 of the embodiment of the present invention is applied to a mobile terminal 100.
  • the front surface of the mobile terminal 100 is provided with a display screen 10, and a protective cover 30 is disposed above the display screen 10.
  • the screen of the display screen 10 is relatively high, for example, 80% or more.
  • the screen ratio refers to the ratio of the display area S1 of the display screen 10 to the front area of the mobile terminal 100.
  • the photosensitive chip 20 is disposed correspondingly below the display screen 10, and is disposed corresponding to a partial area of the display area S1 of the display screen 10.
  • the area corresponding to or facing the front side of the mobile terminal 100 is defined as the sensing area S2.
  • the sensor chip 20 is configured to sense predetermined biometric information contacting or approaching a target object above the sensing area S2.
  • the sensing area S2 can be any position on the display area.
  • the sensing area S2 is disposed at a mid-lower position corresponding to the display area of the display screen 10. It can be understood that the sensing area S2 is disposed at a middle-lower position corresponding to the display screen 10 for the convenience of the user. For example, when the user holds the mobile terminal 100, the thumb of the user can conveniently touch the location of the sensing area S2.
  • the sensing area S2 can also be placed at other suitable locations that are convenient for the user to touch.
  • the display screen 10 When the mobile terminal 100 is in a bright screen state and is in the biometric information sensing mode, the display screen 10 emits an optical signal.
  • the photosensitive chip 20 receives the light reflected by the object, converts the received light into a corresponding electrical signal, and acquires predetermined biometric information of the object according to the electrical signal. For example, fingerprint image information.
  • the photosensitive chip 20 can realize sensing of a target object that contacts or approaches a local area above the display area.
  • FIG. 4 shows the structure of a photosensitive chip according to an embodiment of the present invention.
  • the photosensitive chip 20 includes a photosensitive die 22 and a filter film 24, and the filter film 24 is disposed on the photosensitive die 22.
  • the filter film 24 is disposed on the photosensitive surface of the photosensitive die 22 for filtering the optical signal from above the photosensitive die 22.
  • the filter film 24 on the photosensitive die 22 the interference signal during image sensing is filtered, and the image sensing accuracy of the photosensitive chip 20 is improved.
  • the filter film 24 is formed on the photosensitive die 22 by evaporation.
  • the filter film 24 can be separately formed, and is, for example, but not limited to, disposed on the photosensitive die 22 by bonding, so that the structure of the existing filter film 24 can be utilized, and the process can be utilized. It is also simpler.
  • the filter film 24 is used to filter out optical signals outside of the predetermined band.
  • the preset band may be an optical signal in ambient light, and the optical signal is a short band signal.
  • the preset wavelength band may also be other signals that need to be filtered, and the filter film with different filtering effects may be set according to actual needs. For example, if the photosensitive chip 20 performs image sensing using an optical signal emitted from a separately disposed light source, and the light source emits an optical signal of a specific wavelength, the filter film 24 is used to filter out the optical signal other than the specific wavelength. In order to achieve the purpose of eliminating interference signals.
  • the filter film 24 is used to filter out interfering signals in ambient light.
  • the target object F when the target object F is located on the protective cover 30, if ambient light is irradiated onto the target object, taking the finger as an example, since the finger has many organizational structures, such as epidermis, bones, meat, blood vessels, etc. Therefore, part of the light signal in the ambient light will penetrate the finger, and part of the light signal will be absorbed by the finger. The light signal penetrating the finger will be transmitted to the protective cover 30 under the finger and reach the photosensitive chip 20. At this time, the photosensitive chip 20 not only senses the light signal reflected by the target object, but also senses that the ambient light penetrates the finger.
  • the interference signal in the ambient light is a long-band signal that can penetrate the finger, such as a red light signal.
  • the filter film 24 is disposed in the embodiment for filtering the optical signal of the long wavelength band in the ambient light, that is, the short-band signal in the ambient light can pass through the Filter film 24.
  • the filter film 24 filters out the light signal passing through the finger in the ambient light to achieve the purpose of eliminating the interference signal of the ambient light, thereby improving the image sensing accuracy of the photosensitive chip 20.
  • the predetermined band is a band corresponding to the blue light signal, that is, the filter film 24 filters out the light signals other than the blue light signal.
  • the predetermined band is a band corresponding to the green light signal, that is, the filter film 24 filters out the light signal other than the green light signal.
  • a target object F such as a finger absorbs light signals of a long wavelength band, such as a red light signal, and absorbs light signals of a short wavelength band, such as a blue light signal or a green light signal. Therefore, selecting the filter film 24 for filtering the optical signal of the wavelength band other than the blue light signal or the green light signal can greatly eliminate the interference of the ambient light and improve The image sensing accuracy of the photosensitive chip 20.
  • the photosensitive die 22 includes a substrate 220 and a plurality of photosensitive cells 222 distributed in an array, and the plurality of photosensitive cells 222 are disposed on the substrate 220 .
  • a scan line group and a data line group electrically connected to the photosensitive unit 222 are disposed between the adjacent photosensitive units 222, wherein the scan line group includes a plurality of scan lines 201, and the data line group includes a plurality of data lines 202.
  • the plurality of photosensitive cells 222 are, for example but not limited to, a matrix distribution. Of course, it can also be distributed in other rule manners or in an irregular manner.
  • the plurality of scanning lines 201 and the plurality of data lines 202 electrically connected to the photosensitive unit 222 are disposed to cross each other and disposed between adjacent photosensitive units 222.
  • a plurality of scanning lines G1, G2, ..., Gm are arranged at intervals in the Y direction
  • a plurality of data lines S1, S2, ..., Sn are arranged at intervals in the X direction.
  • the plurality of scanning lines 201 and the plurality of data lines 202 are not limited to the vertical arrangement shown in FIG. 5, and may be disposed at an angle, for example, 30°, 60°, or the like.
  • the scan line 201 and the data line 202 are electrically conductive, the scan line 201 and the data line 202 at the intersection position are separated by an insulating material.
  • the distribution and the number of the scan lines 201 and the data lines 202 are not limited to the above-exemplified embodiments, and the corresponding scan line groups and data lines may be correspondingly set according to the structure of the photosensitive unit 222. group.
  • a scan driving signal is supplied through the scanning line 201 to drive the photosensitive unit 222 to perform light sensing.
  • the photosensitive unit 222 receives the optical signal reflected by the target object, and converts the received optical signal into a corresponding electrical signal, which is then output by the data line 202.
  • the photosensitive unit 222 includes a photosensitive device 224 and a switching device 226.
  • the switching device 226 has a control terminal C and two signal terminals, such as a first signal terminal Sn1 and a second signal terminal Sn2.
  • the control terminal C of the switching device 226 is connected to the scan line 201.
  • the first signal terminal Sn1 of the switching device 226 is connected to a reference signal L via the photosensitive device 224, and the second signal terminal Sn2 of the switching device 226 is connected to the data line 202.
  • the above-mentioned photosensitive device 224 is, for example but not limited to, any one or several of a photodiode, a phototransistor, a photodiode, a photo resistor, and a thin film transistor (TFT).
  • a photodiode as an example, a negative voltage is applied across the photodiode.
  • the photodiode receives the optical signal, a photocurrent is generated in a proportional relationship with the optical signal, and the received optical signal is more intense. Larger, the larger the photocurrent generated, the faster the voltage drop on the negative pole of the photodiode.
  • the intensity of the optical signal reflected from different parts of the target object is obtained, and the target is obtained.
  • Image information of the object It can be understood that in order to increase the photosensitive effect of the photosensitive device 224, a plurality of photosensitive devices 224 may be disposed.
  • the switching device 226 is, for example but not limited to, any one of a triode, a MOS transistor, and a thin film transistor. One or several. Of course, the switching device 226 may also include other types of devices, and the number may also be two, three, and the like.
  • the photosensitive device 224 having high sensitivity to the blue light signal may also be selected.
  • the light sensing is performed by selecting the photosensitive device 224 having high sensitivity to the optical signal of the preset wavelength band, for example, the sensing of the blue light signal or the green light signal is more sensitive, so that the red light signal in the ambient light is also avoided to some extent. The interference caused thereby improving the image sensing accuracy of the photosensitive chip 20.
  • the gate of the thin film transistor serves as the control terminal C of the switching device 226, and the source and the drain of the thin film transistor correspond to the first signal terminal Sn1 and the second of the switching device 226.
  • the gate of the thin film transistor is connected to the scanning line 201, the source of the thin film transistor is connected to the negative electrode of the photodiode D1, and the drain of the thin film transistor is connected to the data line 202.
  • the anode of the photodiode D1 is connected to a reference signal L, which is, for example, a ground signal or a negative voltage signal.
  • a driving signal is applied to the gate of the thin film transistor through the scanning line 201 to drive the thin film transistor to be turned on.
  • the data line 202 is connected to a positive voltage signal.
  • the positive voltage signal on the data line 202 is applied to the negative electrode of the photodiode D1 via the thin film transistor. Since the positive electrode of the photodiode D1 is grounded, the photodiode D1 is A reverse voltage will be applied across the terminals such that the photodiode D1 is in a reverse bias, ie, in operation.
  • the reverse current of the photodiode D1 rapidly increases, thereby causing a change in current on the photodiode D1, which can be obtained from the data line 202. Since the intensity of the optical signal is larger, the reverse current generated is also larger. Therefore, according to the current signal acquired on the data line 202, the intensity of the optical signal can be obtained, thereby obtaining image information of the target object.
  • the reference signal L may be a positive voltage signal, a negative voltage signal, a ground signal, or the like. As long as the electrical signal provided on the data line 202 and the reference signal L are applied across the photodiode D1 such that a reverse voltage is formed across the photodiode D1 to perform photo sensing, it is within the scope of protection defined by the present invention.
  • connection manner of the thin film transistor and the photodiode D1 in the photosensitive unit 222 is not limited to the connection manner shown in FIG. 6, and may be other connection methods.
  • FIG. 7 shows another connection structure of a photosensitive cell and a scan line and a data line.
  • the gate G of the thin film transistor is connected to the scan line 201, and the drain D and the photodiode of the thin film transistor are connected.
  • the anode of D1 is connected, and the source S of the thin film transistor TFT is connected to the data line 202.
  • the negative terminal of the photodiode D1 is connected to a positive voltage signal.
  • the photosensitive unit 222 is not limited to the above-described circuit configuration, and may include other circuit configurations, which are not exemplified herein.
  • the substrate 220 is, for example but not limited to, a silicon substrate, a metal substrate, or the like.
  • the substrate 220 can be a rigid material or a flexible material such as a flexible film. If the substrate 220 is a flexible material, the photosensitive chip 20 is not only thinner in thickness, but also applicable to an electronic device having a curved display.
  • a plurality of scan lines 201 are connected to a driving circuit 221, and a plurality of data lines 202 are connected to a signal processing circuit 223.
  • the driving circuit 221 is configured to provide a corresponding scan driving signal and transmit it to the corresponding photosensitive unit 222 through the corresponding scanning line 201 to activate the photosensitive unit 222 to perform light sensing.
  • the signal processing circuit 223 receives an electrical signal generated by the corresponding photosensitive unit 222 performing light sensing through the data line 202, and acquires image information of the target object based on the electrical signal.
  • the sensor chip 20 further includes a controller 225 for controlling the drive circuit 221 to output a corresponding scan drive signal, such as, but not limited to, progressively activating the photosensitive unit 222 to perform light sensing.
  • the controller 225 is further configured to control the signal processing circuit 223 to receive the electrical signal output by the photosensitive unit 222, and generate an image of the target object based on the electrical signal after receiving the electrical signals output by all of the photosensitive cells 222 that perform light sensing.
  • the driving circuit 221 can be directly formed on the substrate 220, and the driving circuit 221 and the photosensitive unit 222 are located on the same side of the substrate 220.
  • the connection line between the driving circuit 241 and the scanning line 201 is shortened, which not only facilitates the connection of the driving circuit 221 and the scanning line 201, but also reduces signal interference during signal transmission.
  • the driving circuit 221 can also be electrically connected to the photosensitive unit 222 through a flexible circuit board, that is, connected to the plurality of scanning lines 201.
  • the signal processing circuit 223 can also be directly formed on the substrate 220.
  • the signal processing circuit 223 can be electrically connected to the photosensitive unit 222 through a flexible circuit board, that is, connected to the plurality of data lines 202.
  • FIG. 8 shows the structure of a photosensitive chip according to another embodiment of the present invention.
  • an anti-aliasing imaging element 26 is disposed on the photosensitive die 22.
  • the anti-aliasing imaging element 26 serves to prevent aliasing of optical signals received by adjacent photosensitive cells 222, thereby improving image sensing accuracy of the photosensitive chip 20.
  • the filter film 24 and the anti-aliasing imaging element 26 are stacked on the photosensitive die 22.
  • the filter film 24 is located between the anti-aliasing imaging element 26 and the photosensitive die 22.
  • the anti-aliasing imaging element 26 can also be disposed between the filter film 24 and the photosensitive die 22.
  • the embodiment of the present invention provides an anti-aliasing imaging element 26 on the photosensitive die 22, so that the image obtained by the photosensitive unit 222 after performing light sensing is relatively clear, thereby improving the sensing accuracy of the photosensitive chip 20.
  • the anti-aliasing imaging element 26 has light absorbing properties that illuminate the optical signal on the anti-aliasing imaging element 26, only the optical signal that is approximately perpendicular to the photosensitive die 22 can pass through the anti-aliasing The imaging element 26 is received by the photosensitive unit 222, and the remaining optical signals are all absorbed by the anti-aliasing imaging element 26. In this way, aliasing of the optical signals received between the adjacent photosensitive cells 222 can be prevented.
  • the optical signal that is approximately perpendicular to the photosensitive die 22 includes an optical signal that is perpendicular to the photosensitive die 22, and is offset from the vertical direction of the photosensitive die 22 by a predetermined range of optical signals. The preset angle range is within ⁇ 20°.
  • the anti-aliasing imaging element 26 includes a light absorbing wall 261 and a plurality of light transmissive regions 262 surrounded by a light absorbing wall 261.
  • the light absorbing wall 261 is formed of a light absorbing material.
  • the light absorbing material includes a metal oxide, a carbon black paint, a black ink, and the like.
  • the metal in the metal oxide is, for example but not limited to, one of chromium (Cr), nickel (Ni), iron (Fe), tantalum (Ta), tungsten (W), titanium (Ti), molybdenum (Mo) or Several.
  • the extending direction of the light-transmitting region 262 is a direction perpendicular to the photosensitive die 22 such that an optical signal in a direction approximately perpendicular to the photosensitive die 22 can be transmitted through the light signal irradiated to the anti-aliasing imaging element 26. In region 262, the remaining optical signals are absorbed by the light absorbing wall 261.
  • FIG. 9 illustrates a range of optical signals that pass through the anti-aliasing imaging element 26. Due to the light absorption characteristics of the anti-aliasing imaging element 26, only the optical signal between the optical signal L1 and the optical signal L2 can reach the photosensitive unit 222 through the light-transmitting region 262, and the remaining optical signals are absorbed by the absorption wall 261 of the anti-aliasing imaging element 26. absorb. As can be seen from FIG. 9, the smaller the cross-sectional area of the light-transmitting region 262, the smaller the range of the angle ⁇ of the light signal passing through the light-transmitting region 262, and therefore the anti-aliasing effect of the anti-aliasing imaging element 26 is better.
  • the anti-aliasing effect of the anti-aliasing imaging element 26 can be improved by the relatively small area of the light-transmitting region 262 provided by the anti-aliasing imaging element 26.
  • the cross-sectional area of the light-transmitting region 262 of the anti-aliasing imaging element 26 is small, each photosensitive unit 222 will correspond to the plurality of light-transmitting regions 262, so that the photosensitive unit 222 can sense sufficient light signals, The sensing accuracy of the photosensitive chip 20 is improved.
  • the light absorbing wall 261 has a multi-layer structure, and the light absorbing wall includes a light absorbing block 261a and a height block 261b which are alternately stacked.
  • the light absorbing block 261a is formed of a light absorbing material.
  • the light absorbing material is, for example but not limited to, a metal oxide, a carbon black paint, a black ink, or the like.
  • the metal in the metal oxide is, for example but not limited to, one of chromium (Cr), nickel (Ni), iron (Fe), tantalum (Ta), tungsten (W), titanium (Ti), molybdenum (Mo) or Several.
  • the height block 261b is, for example but not limited to, a transparent layer formed of a transparent material such as a translucent material, a light absorbing material, or the like.
  • the plurality of light absorbing blocks 261a located in the same layer are spaced apart, and the area corresponding to the interval between the light absorbing blocks 261a in the same layer is the light transmitting region 262.
  • the plurality of light absorption blocks 261a and the plurality of height blocks 261b of the same layer may be fabricated at one time. Specifically, by providing a mask, the mask is an integrally formed diaphragm, and the diaphragm forms an opening corresponding to the position of the light absorbing block 261a, and the shape and size of the opening are consistent with the shape and size of the light absorbing block 263. .
  • the light absorbing block 261a and the pad 261b which are alternately disposed are sequentially vapor-deposited on a carrier by the mask, thereby forming the anti-aliasing imaging element 26.
  • the padding block 261b By the arrangement of the padding block 261b, not only the process of the anti-aliasing imaging element 26 is accelerated, but also the anti-aliasing effect of the anti-aliasing imaging element 26 can be ensured by the height setting of the padding block 261b.
  • the transparent region 262 may be filled with a transparent material to increase the strength of the anti-aliasing imaging element layer, and also to prevent impurities from entering the light-transmitting region 262 to affect the light-transmitting effect.
  • a material having a relatively high light transmittance such as glass, PMMA (acrylic), PC (polycarbonate) or the like may be selected as the transparent material.
  • FIG. 11 illustrates the structure of an anti-aliasing imaging element of another embodiment of the present invention.
  • the anti-aliasing imaging element 26 is of a multi-layer structure, and the anti-aliasing imaging element 26 includes a light absorbing layer 263 and a transparent supporting layer 264 which are alternately stacked; the light absorbing layer 263 includes a plurality of spaced light absorbing blocks 263a; The transparent support layer 264 is formed by filling a transparent material and filling the space 263b between the light absorption blocks 263a together; wherein the area corresponding to the space 263b forms the light transmission area 262.
  • FIG. 12 illustrates a process of preparing an anti-aliasing imaging element according to an embodiment of the present invention.
  • a light absorbing material is first coated on a carrier, and a corresponding portion of the light transmitting region 262 is etched away on the light absorbing material layer, and the unetched portion is formed.
  • the etching technique is, for example but not limited to, photolithography, X-ray etching, electron beam etching, and ion beam etching.
  • the etching type may include both dry etching and wet etching.
  • the etched light absorbing block 263 is coated with a transparent material, and the transparent material covers not only the plurality of light absorbing blocks 263a but also the space 263b between the plurality of light absorbing blocks 263a, thereby forming the transparent supporting layer 264. . Then, a plurality of light absorbing blocks 263a are formed on the transparent supporting layer 264 in the manner in which the light absorbing layer 263 is formed, and the light absorbing layer 263 and the transparent supporting layer 264 which are alternately stacked in a plurality of layers are sequentially formed, thereby forming the anti-aliasing imaging element 26.
  • the transparent material forming the transparent supporting layer 264 may be selected from materials having a relatively high light transmittance, such as glass, PMMA, PC (polycarbonate), epoxy resin. Wait.
  • FIG. 13 illustrates the structure of an anti-aliasing imaging element of another embodiment of the present invention.
  • the anti-aliasing imaging element 26 includes a light absorbing layer 263 and a transparent support layer 264 which are alternately stacked, and the thickness of each of the transparent support layers 264 is unequal. That is, the values of the thicknesses h1, h2, and h3 in FIG. 13 are not equal.
  • the thickness of the transparent support layer 264 is increased layer by layer, that is, h1 ⁇ h2 ⁇ h3.
  • optical signals other than ⁇ 20° from the vertical direction of the substrate can be prevented from passing through the transparent supporting layer 264 between the light absorbing blocks 263a, thereby improving the sensing accuracy of the photosensitive chip 20.
  • the thickness parameter of each transparent support layer 264 and the width and height parameters of the light absorbing block 263a can be differently set and combined in various combinations to improve the sensing accuracy of the photosensitive chip 20.
  • the anti-aliasing imaging element 26 is formed directly on the photosensitive die 22, i.e., the carrier when the anti-aliasing imaging element 26 is formed is a photosensitive die 22 having a photosensitive unit 222.
  • the anti-aliasing imaging element 26 can be modified, for example, to be disposed on the photosensitive die 22 provided with the photosensitive unit 222, thereby speeding up the process of the photosensitive chip 20.
  • the plurality of light transmissive regions 262 in the anti-aliasing imaging element 26 are evenly distributed such that the fabrication process of the anti-aliasing imaging element 26 is relatively simple.
  • the anti-aliasing imaging element 26 can be, for example, an integrally formed film that is separately fabricated and then attached to the photosensitive die 22, thereby accelerating the process of the photosensitive chip 20.
  • the sensor chip 20 is a biosensor chip for sensing biometric information of a target object.
  • the biometric information includes any one or more of a fingerprint, a palm print, a pulse, a blood oxygen concentration, and a heart rate.
  • FIG. 14 illustrates the structure of a photosensitive chip 20 according to still another embodiment of the present invention.
  • the photosensitive chip 20 further includes a package 30 for packaging the photosensitive die 22 and all devices above the photosensitive die 22, for example, anti-aliasing.
  • the imaging element 26 and the filter film 24 are stacked.
  • the package 30 can fill the light-transmissive region 262 together.

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Abstract

Disclosed are a photosensitive chip and an electronic device. The photosensitive chip comprises a photosensitive bare chip and a filtering film, wherein the filtering film is arranged on the photosensitive bare chip. The electronic device also comprises the photosensitive chip.

Description

感光芯片及电子设备Photosensitive chip and electronic device 技术领域Technical field
本实用新型涉及光电传感领域,尤其涉及一种实现图像信息或生物特征信息感测的感光芯片。The utility model relates to the field of photoelectric sensing, in particular to a photosensitive chip for realizing image information or biometric information sensing.
背景技术Background technique
目前,生物信息传感器,尤其是指纹识别传感器,已逐渐成为移动终端等电子产品的标配组件。由于光学式指纹识别传感器比电容式指纹识别传感器具有更强的穿透能力,因此有人提出一种应用于移动终端的光学式指纹识别模组。如图1所示,该光学式指纹识别模组包括光学式指纹传感器400和光源402。其中,该光学式指纹传感器400设置于移动终端的保护盖板401下方。该光源402临近该光学式指纹识别传感器400的一侧设置。当用户的手指F接触保护盖板401时,光源402发出的光信号穿过保护盖板401并到达手指F,经过手指F的谷和脊的反射后,被光学式指纹识别传感器400接收,并形成手指F的指纹图像。At present, biometric information sensors, especially fingerprint recognition sensors, have gradually become the standard components of electronic products such as mobile terminals. Since the optical fingerprint recognition sensor has stronger penetration ability than the capacitive fingerprint recognition sensor, an optical fingerprint recognition module applied to the mobile terminal has been proposed. As shown in FIG. 1, the optical fingerprint recognition module includes an optical fingerprint sensor 400 and a light source 402. The optical fingerprint sensor 400 is disposed under the protective cover 401 of the mobile terminal. The light source 402 is disposed adjacent to one side of the optical fingerprint sensor 400. When the user's finger F contacts the protective cover 401, the light signal emitted by the light source 402 passes through the protective cover 401 and reaches the finger F, is reflected by the valleys and ridges of the finger F, and is received by the optical fingerprint sensor 400, and A fingerprint image of the finger F is formed.
然,上述光学指纹识别模组400在环境光较强时使用,无法获得准确的指纹图像,仍有待改进。However, the above optical fingerprint recognition module 400 is used when the ambient light is strong, and an accurate fingerprint image cannot be obtained, which still needs to be improved.
实用新型内容Utility model content
本实用新型实施方式旨在至少解决现有技术中存在的技术问题之一。为此,本实用新型实施方式需要提供一种感光芯片。The embodiments of the present invention aim to at least solve one of the technical problems existing in the prior art. To this end, the embodiments of the present invention need to provide a photosensitive chip.
本实用新型实施方式的一种感光芯片,包括感光裸片以及滤光膜,且所述滤光膜设置在所述感光裸片上。A photosensitive chip according to an embodiment of the present invention includes a photosensitive die and a filter film, and the filter film is disposed on the photosensitive die.
本实用新型实施方式,通过设置滤光膜,消除了环境光的干扰,提高了感光芯片的图像感测精度。According to the embodiment of the present invention, by setting the filter film, the interference of the ambient light is eliminated, and the image sensing accuracy of the photosensitive chip is improved.
在某些实施方式中,所述滤光膜蒸镀于所述感光裸片上,或者所述滤光膜黏贴于所述感光裸片上。In some embodiments, the filter film is evaporated on the photosensitive die, or the filter film is adhered to the photosensitive die.
在某些实施方式中,所述滤光膜用于将预设波段以外的光信号滤除。In some embodiments, the filter film is used to filter out optical signals outside of a predetermined band.
在某些实施方式中,所述预设波段为环境光中的短波段信号。 In some embodiments, the predetermined band is a short band signal in ambient light.
在某些实施方式中,所述预设波段为蓝色或绿色光信号对应的波段。In some embodiments, the predetermined band is a band corresponding to a blue or green light signal.
在某些实施方式中,所述感光芯片包括多个感光器件,且所述感光器件为对所述预设波段的光信号感测灵敏度高的感光器件。In some embodiments, the photosensitive chip includes a plurality of photosensitive devices, and the photosensitive device is a photosensitive device having high sensitivity to sensing optical signals of the predetermined wavelength band.
在某些实施方式中,所述感光器件包括光敏二极管、光电阻、光电二极管、光敏三极管中的任意一个或多个。In some embodiments, the photosensitive device comprises any one or more of a photodiode, a photo resistor, a photodiode, and a phototransistor.
在某些实施方式中,所述感光芯片为生物传感芯片,用于感测目标物体的生物特征信息。In some embodiments, the sensor chip is a biosensor chip for sensing biometric information of a target object.
在某些实施方式中,所述生物特征信息包括:指纹、掌纹、脉搏、血氧浓度、心率中的任意一种或几种。In some embodiments, the biometric information includes any one or more of a fingerprint, a palm print, a pulse, a blood oxygen concentration, and a heart rate.
在某些实施方式中,所述感光裸片上方还设有抗混叠成像元件。In some embodiments, an anti-aliasing imaging element is also disposed over the photosensitive die.
由于目标物体不同部位对光信号的反射存在差异,相邻的感光单元之间感测到的光信号会存在混叠,从而造成获取的感测图像模糊,因此本实用新型实施方式通过在感光裸片上设置抗混叠成像元件,防止了相邻的感光器件接收的光信号产生混叠,提高了感光芯片的图像感测精度。Since the reflection of the optical signal is different between different parts of the target object, the optical signals sensed between the adjacent photosensitive cells may be aliased, thereby causing the acquired sensing image to be blurred, so the embodiment of the present invention The anti-aliasing imaging element is arranged on the chip to prevent aliasing of the optical signals received by the adjacent photosensitive devices, thereby improving the image sensing accuracy of the photosensitive chip.
在某些实施方式中,所述滤光膜与所述抗混叠成像元件层叠设置在所述感光裸片上,其中,所述滤光膜设置在所述抗混叠成像元件与所述感光裸片之间,或,所述抗混叠成像元件设置所述滤光膜在与所述感光裸片之间。。In some embodiments, the filter film and the anti-aliasing imaging element are stacked on the photosensitive die, wherein the filter film is disposed on the anti-aliasing imaging element and the photosensitive bare Between the sheets, or the anti-aliasing imaging element is disposed between the photosensitive film and the photosensitive die. .
在某些实施方式中,所述抗混叠成像元件包括吸光墙以及由吸光墙围成的多个透光区域。In certain embodiments, the anti-aliasing imaging element includes a light absorbing wall and a plurality of light transmissive regions surrounded by a light absorbing wall.
在某些实施方式中,所述吸光墙由多层吸光层层叠而成。由于每层吸光层的厚度比吸光墙的厚度小,因此刻蚀形成透光区域的工艺相对较容易,如此使得抗混叠成像元件的工艺较容易,而且还能保证透光区域的透光性能。In some embodiments, the light absorbing wall is laminated from a plurality of light absorbing layers. Since the thickness of each light absorbing layer is smaller than the thickness of the light absorbing wall, the process of etching to form the light transmitting area is relatively easy, so that the process of anti-aliasing imaging element is easy, and the light transmission property of the light transmitting area is also ensured. .
在某些实施方式中,相邻的所述吸光层之间设有支撑层。本实用新型实施方式中,通过透明支撑层,加快了抗混叠成像元件的制备速度,而且通过相邻的两层吸光层之间的距离设置,还保证抗混叠成像元件的抗混叠效果。In some embodiments, a support layer is disposed between adjacent ones of the light absorbing layers. In the embodiment of the present invention, the preparation speed of the anti-aliasing imaging element is accelerated by the transparent supporting layer, and the anti-aliasing effect of the anti-aliasing imaging element is also ensured by the distance setting between the adjacent two layers of the light absorbing layer. .
在某些实施方式中,所述透光区域内填充透明材料。通过透光区域内填充透明材料,不但增加抗混叠成像元件的强度,也可避免杂质进入透光区域内而影响透光效果。In some embodiments, the light transmissive region is filled with a transparent material. Filling the transparent material in the light-transmitting region not only increases the strength of the anti-aliasing imaging element, but also prevents impurities from entering the light-transmitting region and affecting the light-transmitting effect.
在某些实施方式中,所述感光芯片还包括封装体,用于将所述感光裸片、以及所述感光裸片上方的抗混叠成像元件以及滤光膜进行封装。In some embodiments, the sensor chip further includes a package for encapsulating the photosensitive die, and the anti-aliasing imaging element and the filter film over the photosensitive die.
在某些实施方式中,所述感光芯片还包括封装体,用于将所述感光裸片、以及所述感光裸片上方的抗混叠成像元件以及滤光膜进行封装,其中,所述封装体填充所述透光区域。In some embodiments, the sensor chip further includes a package for encapsulating the photosensitive die, and an anti-aliasing imaging element and a filter film over the photosensitive die, wherein the package The body fills the light transmissive area.
本实用新型实施方式的一种电子设备,包括上述任一实施方式的感光芯片。该电子 设备由于具有上述任一结构的感光芯片,因此具有感光芯片的上述所有有益效果。An electronic device according to an embodiment of the present invention includes the photosensitive chip of any of the above embodiments. The electron Since the device has the photosensitive chip of any of the above structures, it has all of the above-described advantageous effects of the photosensitive chip.
在某些实施方式中,所述电子设备进一步包括显示面板,所述感光芯片对应所述显示面板下方的局部区域设置,所述感测芯片用于接收从显示面板的显示区域透过的光信号,以根据接收到的光信号获取相应的生物特征信息。In some embodiments, the electronic device further includes a display panel corresponding to a local area under the display panel, the sensing chip is configured to receive an optical signal transmitted from a display area of the display panel And acquiring corresponding biometric information according to the received optical signal.
在某些实施方式中,所述电子设备为手机或平板电脑。In some embodiments, the electronic device is a cell phone or tablet.
本实用新型实施方式的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本实用新型实施方式的实践了解到。The additional aspects and advantages of the embodiments of the invention will be set forth in part in the description in the written description
附图说明DRAWINGS
本实用新型实施方式的上述和/或附加的方面和优点从结合下面附图对实施方式的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the embodiments of the invention will be apparent from the
图1是现有技术的一种应用于电子设备的光学图像感测结构的示意图;1 is a schematic diagram of an optical image sensing structure applied to an electronic device in the prior art;
图2是应用本实用新型感光芯片的电子设备一实施方式的正面结构示意图;2 is a schematic front view showing an embodiment of an electronic device to which the photosensitive chip of the present invention is applied;
图3是图2中的电子设备沿I-I线的剖面结构示意图,其中仅示出了电子设备的部分结构;3 is a cross-sectional structural view of the electronic device of FIG. 2 taken along line I-I, in which only a partial structure of the electronic device is shown;
图4是本实用新型一实施方式的感光芯片的局部结构示意图;4 is a partial structural schematic view of a photosensitive chip according to an embodiment of the present invention;
图5是本实用新型另一实施方式的感光芯片的结构框图;5 is a structural block diagram of a photosensitive chip according to another embodiment of the present invention;
图6是图5示出的感光芯片中一实施方式的感光单元的电路结构示意图;6 is a schematic circuit diagram of a photosensitive unit of an embodiment of the photosensitive chip shown in FIG. 5;
图7是图5示出的感光芯片中另一实施方式的感光单元的电路结构示意图;7 is a schematic circuit diagram of a photosensitive unit of another embodiment of the photosensitive chip shown in FIG. 5;
图8是本实用新型又一实施方式的感光芯片的结构示意图;8 is a schematic structural view of a photosensitive chip according to still another embodiment of the present invention;
图9是图8示出的感光芯片中一实施方式的抗混叠成像元件能穿过的光信号范围示意图;9 is a schematic diagram of a range of optical signals through which an anti-aliasing imaging element of an embodiment of the photosensitive chip shown in FIG. 8 can pass;
图10是图8示出的感光芯片中另一实施方式的抗混叠成像元件能穿过的光信号范围示意图;10 is a schematic diagram of a range of optical signals through which an anti-aliasing imaging element of another embodiment of the photosensitive chip shown in FIG. 8 can pass;
图11是本实用新型一实施方式的抗混叠成像元件的结构示意图;11 is a schematic structural view of an anti-aliasing imaging element according to an embodiment of the present invention;
图12是本实用新型又一实施方式的感光芯片的结构示意图。FIG. 12 is a schematic structural view of a photosensitive chip according to still another embodiment of the present invention.
具体实施方式Detailed ways
下面详细描述本实用新型的实施方式,所述实施方式的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通 过参考附图描述的实施方式是示例性的,仅用于解释本实用新型,而不能理解为对本实用新型的限制。The embodiments of the present invention are described in detail below, and the examples of the embodiments are illustrated in the drawings, wherein the same or similar reference numerals are used to refer to the same or similar elements or elements having the same or similar functions. Below The embodiments described with reference to the drawings are exemplified and are not to be construed as limiting the invention.
在本实用新型的描述中,需要理解的是,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本实用新型的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。“接触”或“触摸”包括直接接触或间接接触。例如,下文中揭示的感光芯片,其被设置在电子设备的内部,例如显示屏或保护盖板的下方,则用户手指通过显示屏或保护盖板间接接触该感光芯片。In the description of the present invention, it is to be understood that the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. . Thus, features defining "first" or "second" may include one or more of the described features either explicitly or implicitly. In the description of the present invention, the meaning of "a plurality" is two or more unless specifically and specifically defined otherwise. "Contact" or "touch" includes direct or indirect contact. For example, the photosensitive chip disclosed hereinafter is disposed inside the electronic device, such as under the display screen or the protective cover, and the user's finger indirectly contacts the photosensitive chip through the display screen or the protective cover.
在本实用新型的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通信;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本实用新型中的具体含义。In the description of the present invention, it should be noted that the terms "installation", "connected", and "connected" are to be understood broadly, and may be, for example, a fixed connection or a Disassembling the connection, or connecting integrally; may be mechanical connection, electrical connection or communication with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or mutual interaction of two elements Role relationship. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
下文的公开提供了许多不同的实施方式或例子用来实现本实用新型的不同结构。为了简化本实用新型的公开,下文中对特定例子的部件和设定进行描述。当然,它们仅仅为示例,并且目的不在于限制本实用新型。此外,本实用新型可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设定之间的关系。此外,本实用新型提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. In order to simplify the disclosure of the present invention, the components and settings of the specific examples are described below. Of course, they are merely examples and are not intended to limit the invention. In addition, the present invention may repeat reference numerals and/or reference numerals in different examples, which are for the purpose of simplicity and clarity, and do not in themselves indicate the relationship between the various embodiments and/or settings discussed. Moreover, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the use of other processes and/or the use of other materials.
进一步地,所描述的特征、结构可以以任何合适的方式结合在一个或更多实施方式中。在下面的描述中,提供许多具体细节从而给出对本实用新型的实施方式的充分理解。然而,本领域技术人员应意识到,没有所述特定细节中的一个或更多,或者采用其它的结构、组元等,也可以实践本实用新型的技术方案。在其它情况下,不详细示出或描述公知结构或者操作以避免模糊本实用新型。Further, the described features, structures may be combined in one or more embodiments in any suitable manner. In the following description, numerous specific details are set forth However, those skilled in the art will appreciate that the technical solution of the present invention may be practiced without one or more of the specific details or other structures, components, and the like. In other instances, well-known structures or operations are not shown or described in detail to avoid obscuring the invention.
本实用新型实施方式提出一种感光芯片,该感光芯片设置于一具有显示功能的电子设备中,该感光芯片利用电子设备显示时发出的光信号,实现图像感测。可以理解的是,该感光芯片可以对应设置在电子设备的显示区,也可以设置在电子设备的非显示区。而且,感光芯片设置于显示区,则通过该感光芯片,可以实现电子设备屏内局部位置的目标物体的图像感测。可以理解的是,该电子设备内也可以设置独立的光源,供感光芯片 执行图像感测使用。The embodiment of the present invention provides a photosensitive chip disposed in an electronic device having a display function, and the photosensitive chip realizes image sensing by using an optical signal emitted when the electronic device displays. It can be understood that the photosensitive chip can be correspondingly disposed in the display area of the electronic device, or can be disposed in the non-display area of the electronic device. Moreover, the photosensitive chip is disposed in the display area, and the image sensing of the target object at a local position in the screen of the electronic device can be realized by the photosensitive chip. It can be understood that an independent light source can also be disposed in the electronic device for the sensor chip. Perform image sensing use.
上述电子设备例如为消费性电子产品、家居式电子产品、车载式电子产品、金融终端产品。其中,消费性电子产品如为手机、平板电脑、笔记本电脑、桌面显示器、电脑一体机等各类应用生物识别技术的电子产品。家居式电子产品如为智能门锁、电视、冰箱、穿戴式设备等各类应用生物识别技术的电子产品。车载式电子产品如为车载导航仪、车载DVD等。金融终端产品如为ATM机、自助办理业务的终端等。The above electronic devices are, for example, consumer electronic products, home-based electronic products, vehicle-mounted electronic products, and financial terminal products. Among them, consumer electronic products such as mobile phones, tablets, notebook computers, desktop monitors, computer integrated machines and other electronic products using biometric identification technology. Home-based electronic products such as smart door locks, televisions, refrigerators, wearable devices and other electronic products that use biometric technology. Vehicle-mounted electronic products such as car navigation systems, car DVDs, etc. Financial terminal products such as ATM machines, terminals for self-service business, etc.
上述目标物体的预定生物特征信息(或为:图像信息)例如但不限于指纹、掌纹、耳纹、脚掌等皮肤纹路信息,以及心率、血氧浓度、静脉、动脉等其它合适的生物特征信息。该预定生物特征信息可为前述列举的信息中的任意一种或几种。该目标物体例如但不限于人体,也可以为其它合适类型的生物体。The predetermined biometric information (or image information) of the target object is, for example but not limited to, skin texture information such as fingerprints, palm prints, ear prints, and soles, and other suitable biometric information such as heart rate, blood oxygen concentration, veins, and arteries. . The predetermined biometric information may be any one or more of the aforementioned enumerated information. The target object may be, for example but not limited to, a human body, and may be other suitable types of organisms.
请参照图2以及图3,图2示出了应用本实用新型感光芯片的电子设备一实施方式的正面结构,图3示出了图2中的电子设备沿I-I线的部分剖面结构,其中图3仅示出了电子设备的部分结构。本实用新型实施方式的感光芯片20应用于一移动终端100,该移动终端100的正面设有一显示屏10,该显示屏10上方设有保护盖板30。可选地,该显示屏10的屏占比较高,例如80%以上。屏占比是指显示屏10的显示区域S1占移动终端100的正面区域的比例。该感光芯片20对应设置在该显示屏10的下方,对应该显示屏10的显示区域S1的局部区域设置。定义该移动终端100的正面对应或正对该感光芯片20的区域为感测区S2。该感光芯片20用于感测接触或接近该感测区S2上方的目标物体的预定生物特征信息。Referring to FIG. 2 and FIG. 3, FIG. 2 shows a front structure of an embodiment of an electronic device to which the photosensitive chip of the present invention is applied, and FIG. 3 shows a partial cross-sectional structure of the electronic device of FIG. 2 along line II, wherein 3 shows only a partial structure of the electronic device. The photosensitive chip 20 of the embodiment of the present invention is applied to a mobile terminal 100. The front surface of the mobile terminal 100 is provided with a display screen 10, and a protective cover 30 is disposed above the display screen 10. Optionally, the screen of the display screen 10 is relatively high, for example, 80% or more. The screen ratio refers to the ratio of the display area S1 of the display screen 10 to the front area of the mobile terminal 100. The photosensitive chip 20 is disposed correspondingly below the display screen 10, and is disposed corresponding to a partial area of the display area S1 of the display screen 10. The area corresponding to or facing the front side of the mobile terminal 100 is defined as the sensing area S2. The sensor chip 20 is configured to sense predetermined biometric information contacting or approaching a target object above the sensing area S2.
该感测区S2可为显示区上的任一位置。例如,该感测区S2对应该显示屏10的显示区的中下位置处设置。可以理解地是,该感测区S2对应该显示屏10的中下位置处设置是为了方便用户进行操作。例如,当用户手持移动终端100时,用户的大拇指可方便触摸该感测区S2的位置。当然,该感测区S2也可以放置于用户方便触摸的其它合适位置。The sensing area S2 can be any position on the display area. For example, the sensing area S2 is disposed at a mid-lower position corresponding to the display area of the display screen 10. It can be understood that the sensing area S2 is disposed at a middle-lower position corresponding to the display screen 10 for the convenience of the user. For example, when the user holds the mobile terminal 100, the thumb of the user can conveniently touch the location of the sensing area S2. Of course, the sensing area S2 can also be placed at other suitable locations that are convenient for the user to touch.
当移动终端100处于亮屏状态、且处于生物特征信息感测模式时,该显示屏10发出光信号。当一物体接触或接近该感测区S2时,该感光芯片20接收由该物体反射回来的光线,转换接收到的光线为相应的电信号,并根据该电信号获取该物体的预定生物特征信息,例如,指纹图像信息。从而,该感光芯片20可实现对接触或接近显示区上方的局部区域的目标物体进行感测。When the mobile terminal 100 is in a bright screen state and is in the biometric information sensing mode, the display screen 10 emits an optical signal. When an object contacts or approaches the sensing area S2, the photosensitive chip 20 receives the light reflected by the object, converts the received light into a corresponding electrical signal, and acquires predetermined biometric information of the object according to the electrical signal. For example, fingerprint image information. Thereby, the photosensitive chip 20 can realize sensing of a target object that contacts or approaches a local area above the display area.
进一步地,请参照图4,图4示出了本实用新型一实施方式的感光芯片的结构。该感光芯片20包括一感光裸片22和滤光膜24,且滤光膜24设置在感光裸片22上。具体 地,该滤光膜24设置在感光裸片22具有感光的一面上,用于对感光裸片22上方来的光信号进行过滤。Further, please refer to FIG. 4. FIG. 4 shows the structure of a photosensitive chip according to an embodiment of the present invention. The photosensitive chip 20 includes a photosensitive die 22 and a filter film 24, and the filter film 24 is disposed on the photosensitive die 22. Specific The filter film 24 is disposed on the photosensitive surface of the photosensitive die 22 for filtering the optical signal from above the photosensitive die 22.
本实用新型实施方式通过在感光裸片22上设置滤光膜24,从而将执行图像感测时的干扰信号进行过滤,提高了感光芯片20的图像感测精度。In the embodiment of the present invention, by providing the filter film 24 on the photosensitive die 22, the interference signal during image sensing is filtered, and the image sensing accuracy of the photosensitive chip 20 is improved.
在某些实施方式中,滤光膜24通过蒸镀的方式形成于感光裸片22上。然,可变更地,该滤光膜24也可以独立制成后,在例如但不局限于通过粘贴的方式设置于感光裸片22上,如此可以利用现有的滤光膜24结构,而且工艺也较简单。In some embodiments, the filter film 24 is formed on the photosensitive die 22 by evaporation. However, the filter film 24 can be separately formed, and is, for example, but not limited to, disposed on the photosensitive die 22 by bonding, so that the structure of the existing filter film 24 can be utilized, and the process can be utilized. It is also simpler.
在某些实施方式中,滤光膜24用于将预设波段以外的光信号滤除。该预设波段可以为环境光中的光信号,且该光信号为短波段信号。然,可变更地,该预设波段也可以为其他需要过滤的信号,可根据实际需要而设置不同滤光效果的滤光膜。例如,若该感光芯片20利用独立设置的光源发出的光信号执行图像感测,且该光源发出特定波长的光信号,则该滤光膜24用于将该特定波长以外的光信号进行滤除,以达到消除干扰信号的目的。In some embodiments, the filter film 24 is used to filter out optical signals outside of the predetermined band. The preset band may be an optical signal in ambient light, and the optical signal is a short band signal. However, the preset wavelength band may also be other signals that need to be filtered, and the filter film with different filtering effects may be set according to actual needs. For example, if the photosensitive chip 20 performs image sensing using an optical signal emitted from a separately disposed light source, and the light source emits an optical signal of a specific wavelength, the filter film 24 is used to filter out the optical signal other than the specific wavelength. In order to achieve the purpose of eliminating interference signals.
在某些实施方式中,该滤光膜24用于将环境光中的干扰信号滤除。具体地,继续参照图3,当目标物体F位于保护盖板30时,若有环境光照射于目标物体上,以手指为例,由于手指具有很多组织结构,例如表皮、骨头、肉、血管等,因此环境光中的部分光信号会穿透手指,部分光信号则被手指吸收。穿透手指的光信号将向手指下方的保护盖板30传输并到达感光芯片20,此时感光芯片20不但感测到经目标物体反射回来的光信号,还感测到环境光穿透手指的光信号,如此无法进行准确地感测。因此,环境光中的干扰信号为能穿透手指的长波段信号,例如红色光信号。为了避免环境光影响感光芯片20对目标物体的图像感测,本实施方式中设置滤光膜24用于将环境光中长波段的光信号滤除,即环境光中的短波段信号可以通过该滤光膜24。通过该滤光膜24来滤除环境光中穿透手指的光信号,达到消除环境光的干扰信号的目的,从而提高感光芯片20的图像感测精度。In some embodiments, the filter film 24 is used to filter out interfering signals in ambient light. Specifically, with continued reference to FIG. 3, when the target object F is located on the protective cover 30, if ambient light is irradiated onto the target object, taking the finger as an example, since the finger has many organizational structures, such as epidermis, bones, meat, blood vessels, etc. Therefore, part of the light signal in the ambient light will penetrate the finger, and part of the light signal will be absorbed by the finger. The light signal penetrating the finger will be transmitted to the protective cover 30 under the finger and reach the photosensitive chip 20. At this time, the photosensitive chip 20 not only senses the light signal reflected by the target object, but also senses that the ambient light penetrates the finger. The optical signal is so impossible to accurately sense. Therefore, the interference signal in the ambient light is a long-band signal that can penetrate the finger, such as a red light signal. In order to prevent the ambient light from affecting the image sensing of the target object by the photosensitive chip 20, the filter film 24 is disposed in the embodiment for filtering the optical signal of the long wavelength band in the ambient light, that is, the short-band signal in the ambient light can pass through the Filter film 24. The filter film 24 filters out the light signal passing through the finger in the ambient light to achieve the purpose of eliminating the interference signal of the ambient light, thereby improving the image sensing accuracy of the photosensitive chip 20.
在某些实施方式中,预设波段为蓝色光信号对应的波段,即滤光膜24将蓝色光信号以外的光信号滤除。In some embodiments, the predetermined band is a band corresponding to the blue light signal, that is, the filter film 24 filters out the light signals other than the blue light signal.
在某些实施方式中,预设波段为绿色光信号对应的波段,即滤光膜24将绿色光信号以外的光信号滤除。In some embodiments, the predetermined band is a band corresponding to the green light signal, that is, the filter film 24 filters out the light signal other than the green light signal.
在环境光中,手指等目标物体F对长波段的光信号吸收较弱,例如红色光信号;对短波段的光信号吸收较强,例如蓝色光信号、绿色光信号。因此,选择对蓝色光信号或绿色光信号以外波段的光信号进行过滤的滤光膜24,可以大大消除环境光的干扰,提高 感光芯片20的图像感测精度。In ambient light, a target object F such as a finger absorbs light signals of a long wavelength band, such as a red light signal, and absorbs light signals of a short wavelength band, such as a blue light signal or a green light signal. Therefore, selecting the filter film 24 for filtering the optical signal of the wavelength band other than the blue light signal or the green light signal can greatly eliminate the interference of the ambient light and improve The image sensing accuracy of the photosensitive chip 20.
在某些实施方式中,请结合参照图4和图5,该感光裸片22包括基板220以及呈阵列分布的多个感光单元222,该多个感光单元222设置于基板220上。相邻的感光单元222之间设有与感光单元222电性连接的扫描线组和数据线组,其中扫描线组包括多条扫描线201,数据线组包括多条数据线202。该多个感光单元222例如但不限于矩阵分布。当然,也可以为其他规则方式分布或非规则方式分布。与感光单元222电性连接的多条扫描线201与多条数据线202则相互交叉设置,且设置在相邻的感光单元222之间。例如,多条扫描线G1、G2…Gm沿Y方向间隔布设,多条数据线S1、S2…Sn沿X方向间隔布设。然,可变更地,该多条扫描线201与多条数据线202不限定图5中示出的垂直设置,也可以呈一定角度的设置,例如30°、60°等。另外,由于扫描线201和数据线202具有导电性,因此处于交叉位置的扫描线201和数据线202之间将通过绝缘材料进行隔离。In some embodiments, referring to FIG. 4 and FIG. 5 , the photosensitive die 22 includes a substrate 220 and a plurality of photosensitive cells 222 distributed in an array, and the plurality of photosensitive cells 222 are disposed on the substrate 220 . A scan line group and a data line group electrically connected to the photosensitive unit 222 are disposed between the adjacent photosensitive units 222, wherein the scan line group includes a plurality of scan lines 201, and the data line group includes a plurality of data lines 202. The plurality of photosensitive cells 222 are, for example but not limited to, a matrix distribution. Of course, it can also be distributed in other rule manners or in an irregular manner. The plurality of scanning lines 201 and the plurality of data lines 202 electrically connected to the photosensitive unit 222 are disposed to cross each other and disposed between adjacent photosensitive units 222. For example, a plurality of scanning lines G1, G2, ..., Gm are arranged at intervals in the Y direction, and a plurality of data lines S1, S2, ..., Sn are arranged at intervals in the X direction. However, the plurality of scanning lines 201 and the plurality of data lines 202 are not limited to the vertical arrangement shown in FIG. 5, and may be disposed at an angle, for example, 30°, 60°, or the like. In addition, since the scan line 201 and the data line 202 are electrically conductive, the scan line 201 and the data line 202 at the intersection position are separated by an insulating material.
需要说明的是,上述扫描线201和数据线202的分布以及数量的设置并不局限于上述例举的实施方式,可以根据感光单元222的结构的不同而对应设置相应的扫描线组和数据线组。It should be noted that the distribution and the number of the scan lines 201 and the data lines 202 are not limited to the above-exemplified embodiments, and the corresponding scan line groups and data lines may be correspondingly set according to the structure of the photosensitive unit 222. group.
上述感光芯片20中,通过扫描线201提供一扫描驱动信号,以驱动感光单元222执行光感测。感光单元222接收目标物体反射回来的光信号,并将接收到的光信号转换为相应的电信号,再由数据线202输出。In the above-described photosensitive chip 20, a scan driving signal is supplied through the scanning line 201 to drive the photosensitive unit 222 to perform light sensing. The photosensitive unit 222 receives the optical signal reflected by the target object, and converts the received optical signal into a corresponding electrical signal, which is then output by the data line 202.
在某些实施方式中,如图6所示,示出了本实用新型一实施方式的感光单元222的电路结构。该感光单元222包括一感光器件224和一开关器件226。该开关器件226具有一控制端C以及两信号端,例如为第一信号端Sn1和第二信号端Sn2。其中,开关器件226的控制端C与扫描线201连接,开关器件226的第一信号端Sn1经感光器件224连接一参考信号L,开关器件226的第二信号端Sn2与数据线202连接。In some embodiments, as shown in FIG. 6, a circuit configuration of a photosensitive unit 222 according to an embodiment of the present invention is shown. The photosensitive unit 222 includes a photosensitive device 224 and a switching device 226. The switching device 226 has a control terminal C and two signal terminals, such as a first signal terminal Sn1 and a second signal terminal Sn2. The control terminal C of the switching device 226 is connected to the scan line 201. The first signal terminal Sn1 of the switching device 226 is connected to a reference signal L via the photosensitive device 224, and the second signal terminal Sn2 of the switching device 226 is connected to the data line 202.
具体地,上述感光器件224例如但不限于光敏二极管、光敏三极管、光电二极管、光电阻、薄膜晶体管(TFT)的任意一个或几个。以光电二极管为例,通过在光电二极管的两端施加负向电压,此时,若光电二极管接收到光信号时,将产生与光信号成一定比例关系的光电流,接收到的光信号强度越大,产生的光电流则越大,光电二极管负极上的电压下降的速度也就越快,因此通过采集光电二极管负极上的电压信号,从而获得目标物体不同部位反射的光信号强度,进而获得目标物体的图像信息。可以理解的是,为了增大感光器件224的感光效果,可以设置多个感光器件224。Specifically, the above-mentioned photosensitive device 224 is, for example but not limited to, any one or several of a photodiode, a phototransistor, a photodiode, a photo resistor, and a thin film transistor (TFT). Taking a photodiode as an example, a negative voltage is applied across the photodiode. At this time, if the photodiode receives the optical signal, a photocurrent is generated in a proportional relationship with the optical signal, and the received optical signal is more intense. Larger, the larger the photocurrent generated, the faster the voltage drop on the negative pole of the photodiode. Therefore, by collecting the voltage signal on the negative pole of the photodiode, the intensity of the optical signal reflected from different parts of the target object is obtained, and the target is obtained. Image information of the object. It can be understood that in order to increase the photosensitive effect of the photosensitive device 224, a plurality of photosensitive devices 224 may be disposed.
进一步地,开关器件226例如但不限于三极管、MOS管、薄膜晶体管中的任意一 个或几个。当然,该开关器件226也可以包括其他类型的器件,数量也可以为2个、3个等。Further, the switching device 226 is, for example but not limited to, any one of a triode, a MOS transistor, and a thin film transistor. One or several. Of course, the switching device 226 may also include other types of devices, and the number may also be two, three, and the like.
在某些实施方式中,为了进一步提高感光芯片20的图像感测精度,也可以选择对蓝色光信号的感光灵敏度高的感光器件224。通过选择对预设波段的光信号的感光灵敏度高的感光器件224执行光感测,例如对蓝色光信号或绿色光信号的感测更灵敏,因此一定程度上也避免了环境光中红色光信号造成的干扰,从而提高了感光芯片20的图像感测精度。In some embodiments, in order to further improve the image sensing accuracy of the photosensitive chip 20, the photosensitive device 224 having high sensitivity to the blue light signal may also be selected. The light sensing is performed by selecting the photosensitive device 224 having high sensitivity to the optical signal of the preset wavelength band, for example, the sensing of the blue light signal or the green light signal is more sensitive, so that the red light signal in the ambient light is also avoided to some extent. The interference caused thereby improving the image sensing accuracy of the photosensitive chip 20.
以图6示出的感光单元222结构为例,该薄膜晶体管的栅极作为开关器件226的控制端C,薄膜晶体管的源极和漏极对应作为开关器件226的第一信号端Sn1和第二信号端Sn2。薄膜晶体管的栅极与扫描线201连接,薄膜晶体管的源极与光电二极管D1的负极连接,薄膜晶体管的漏极与数据线202连接。光电二极管D1的正极连接参考信号L,该参考信号L例如为地信号或负电压信号。Taking the structure of the photosensitive unit 222 shown in FIG. 6 as an example, the gate of the thin film transistor serves as the control terminal C of the switching device 226, and the source and the drain of the thin film transistor correspond to the first signal terminal Sn1 and the second of the switching device 226. Signal terminal Sn2. The gate of the thin film transistor is connected to the scanning line 201, the source of the thin film transistor is connected to the negative electrode of the photodiode D1, and the drain of the thin film transistor is connected to the data line 202. The anode of the photodiode D1 is connected to a reference signal L, which is, for example, a ground signal or a negative voltage signal.
在上述感光单元222执行光感测时,通过扫描线201给薄膜晶体管的栅极施加一驱动信号,以驱动薄膜晶体管导通。此时,数据线202连接一正电压信号,当薄膜晶体管导通后,数据线202上的正电压信号经薄膜晶体管施加至光电二极管D1的负极,由于光电二极管D1的正极接地,因此光电二极管D1两端将施加一反向电压,使得光电二极管D1处于反向偏置,即处于工作状态。此时,当有光信号照射到该光电二极管D1时,光电二极管D1的反向电流迅速增大,从而引起光电二极管D1上的电流变化,该变化的电流可以从数据线202上获取。由于光信号的强度越大,产生的反向电流也越大,因此根据数据线202上获取到的电流信号,可以获得光信号的强度,进而获得目标物体的图像信息。When the photosensitive unit 222 performs photo sensing, a driving signal is applied to the gate of the thin film transistor through the scanning line 201 to drive the thin film transistor to be turned on. At this time, the data line 202 is connected to a positive voltage signal. When the thin film transistor is turned on, the positive voltage signal on the data line 202 is applied to the negative electrode of the photodiode D1 via the thin film transistor. Since the positive electrode of the photodiode D1 is grounded, the photodiode D1 is A reverse voltage will be applied across the terminals such that the photodiode D1 is in a reverse bias, ie, in operation. At this time, when an optical signal is irradiated to the photodiode D1, the reverse current of the photodiode D1 rapidly increases, thereby causing a change in current on the photodiode D1, which can be obtained from the data line 202. Since the intensity of the optical signal is larger, the reverse current generated is also larger. Therefore, according to the current signal acquired on the data line 202, the intensity of the optical signal can be obtained, thereby obtaining image information of the target object.
在某些实施方式中,上述参考信号L可以为正电压信号、负电压信号、地信号等。只要数据线202上提供的电信号与该参考信号L施加在光电二极管D1两端,使得光电二极管D1两端形成反向电压,以执行光感测,均在本实用新型限定的保护范围内。In some embodiments, the reference signal L may be a positive voltage signal, a negative voltage signal, a ground signal, or the like. As long as the electrical signal provided on the data line 202 and the reference signal L are applied across the photodiode D1 such that a reverse voltage is formed across the photodiode D1 to perform photo sensing, it is within the scope of protection defined by the present invention.
可以理解的是,上述感光单元222中薄膜晶体管和光电二极管D1的连接方式并不局限于图6示出的连接方式,也可以为其他连接方式。例如,如图7所示,图7示出了一个感光单元与扫描线、数据线的另一种连接结构,薄膜晶体管的栅极G与扫描线201连接,薄膜晶体管的漏极D与光电二极管D1的正极连接,薄膜晶体管TFT的源极S与数据线202连接。光电二极管D1的负极连接正电压信号。另外,感光单元222并不局限于上述例举的电路结构,也可以包括其他的电路结构,在此不一一例举。It can be understood that the connection manner of the thin film transistor and the photodiode D1 in the photosensitive unit 222 is not limited to the connection manner shown in FIG. 6, and may be other connection methods. For example, as shown in FIG. 7, FIG. 7 shows another connection structure of a photosensitive cell and a scan line and a data line. The gate G of the thin film transistor is connected to the scan line 201, and the drain D and the photodiode of the thin film transistor are connected. The anode of D1 is connected, and the source S of the thin film transistor TFT is connected to the data line 202. The negative terminal of the photodiode D1 is connected to a positive voltage signal. Further, the photosensitive unit 222 is not limited to the above-described circuit configuration, and may include other circuit configurations, which are not exemplified herein.
在某些实施方式中,该基板220例如但不限于硅基板、金属基板等。另外,该基板 220可以为刚性材质,也可以为柔性材质,例如柔性薄膜。若基板220为柔性材质,则该感光芯片20不但厚度变薄,而且还可以适用于具有曲面显示屏的电子设备中。In some embodiments, the substrate 220 is, for example but not limited to, a silicon substrate, a metal substrate, or the like. In addition, the substrate 220 can be a rigid material or a flexible material such as a flexible film. If the substrate 220 is a flexible material, the photosensitive chip 20 is not only thinner in thickness, but also applicable to an electronic device having a curved display.
在某些实施方式中,继续参照图5,多条扫描线201均连接一驱动电路221,多条数据线202均连接一信号处理电路223。驱动电路221用于提供相应的扫描驱动信号,并通过对应的扫描线201传输给相应的感光单元222,以激活该感光单元222执行光感测。信号处理电路223通过数据线202接收相应的感光单元222执行光感测而产生的电信号,并根据该电信号来获取目标物体的图像信息。In some embodiments, with reference to FIG. 5, a plurality of scan lines 201 are connected to a driving circuit 221, and a plurality of data lines 202 are connected to a signal processing circuit 223. The driving circuit 221 is configured to provide a corresponding scan driving signal and transmit it to the corresponding photosensitive unit 222 through the corresponding scanning line 201 to activate the photosensitive unit 222 to perform light sensing. The signal processing circuit 223 receives an electrical signal generated by the corresponding photosensitive unit 222 performing light sensing through the data line 202, and acquires image information of the target object based on the electrical signal.
在某些实施方式中,感光芯片20还包括一控制器225,该控制器225用于控制驱动电路221输出相应的扫描驱动信号,例如但不局限于逐行激活感光单元222执行光感测。该控制器225还用于控制信号处理电路223接收感光单元222输出的电信号,并在接收执行光感测的所有感光单元222输出的电信号后,根据该电信号生成目标物体的图像。In some embodiments, the sensor chip 20 further includes a controller 225 for controlling the drive circuit 221 to output a corresponding scan drive signal, such as, but not limited to, progressively activating the photosensitive unit 222 to perform light sensing. The controller 225 is further configured to control the signal processing circuit 223 to receive the electrical signal output by the photosensitive unit 222, and generate an image of the target object based on the electrical signal after receiving the electrical signals output by all of the photosensitive cells 222 that perform light sensing.
在某些实施方式中,上述驱动电路221可直接形成在基板220上,且驱动电路221与感光单元222位于基板220的同一侧。如此,使得驱动电路241与扫描线201之间的连接线路变短,不但方便驱动电路221与扫描线201的连接,而且也减少了信号传输过程中的信号干扰。当然,驱动电路221也可以通过柔性电路板与所述感光单元222电性连接,即与多条扫描线201连接。In some embodiments, the driving circuit 221 can be directly formed on the substrate 220, and the driving circuit 221 and the photosensitive unit 222 are located on the same side of the substrate 220. Thus, the connection line between the driving circuit 241 and the scanning line 201 is shortened, which not only facilitates the connection of the driving circuit 221 and the scanning line 201, but also reduces signal interference during signal transmission. Of course, the driving circuit 221 can also be electrically connected to the photosensitive unit 222 through a flexible circuit board, that is, connected to the plurality of scanning lines 201.
在某些实施方式中,上述信号处理电路223也可以直接形成在基板220上,当然该信号处理电路223可以通过柔性电路板与感光单元222电性连接,即与多条数据线202连接。In some embodiments, the signal processing circuit 223 can also be directly formed on the substrate 220. Of course, the signal processing circuit 223 can be electrically connected to the photosensitive unit 222 through a flexible circuit board, that is, connected to the plurality of data lines 202.
在某些实施方式中,由于目标物体不同部位对光信号的反射存在差异,而且目标物体表面的不平整,目标物体有些部位与保护盖板30接触,有些部位与保护盖板30未接触,从而造成接触的位置发生漫反射,未接触的位置发生镜面反射,因此相邻的感光单元222之间感测到的光信号会存在混叠,从而造成获取的感测图像模糊。对此,请参照图8,图8示出了本实用新型另一实施方式的感光芯片的结构。本实用新型实施方式在感光裸片22上设置一抗混叠成像元件26。该抗混叠成像元件26用于防止相邻的感光单元222接收的光信号产生混叠,从而提高了感光芯片20的图像感测精度。本实用新型实施方式中,滤光膜24与抗混叠成像元件26层叠设置感光裸片22上。其中,滤光膜24位于抗混叠成像元件26与感光裸片22之间。然,可变更地,该抗混叠成像元件26也可设置滤光膜24与感光裸片22之间。In some embodiments, due to the difference in the reflection of the optical signal by different parts of the target object, and the unevenness of the surface of the target object, some parts of the target object are in contact with the protective cover 30, and some parts are not in contact with the protective cover 30, thereby The position causing the contact is diffusely reflected, and the untouched position is specularly reflected, so that the light signal sensed between the adjacent photosensitive cells 222 may be aliased, thereby causing the acquired sensing image to be blurred. In this regard, please refer to FIG. 8. FIG. 8 shows the structure of a photosensitive chip according to another embodiment of the present invention. In an embodiment of the present invention, an anti-aliasing imaging element 26 is disposed on the photosensitive die 22. The anti-aliasing imaging element 26 serves to prevent aliasing of optical signals received by adjacent photosensitive cells 222, thereby improving image sensing accuracy of the photosensitive chip 20. In the embodiment of the present invention, the filter film 24 and the anti-aliasing imaging element 26 are stacked on the photosensitive die 22. The filter film 24 is located between the anti-aliasing imaging element 26 and the photosensitive die 22. However, the anti-aliasing imaging element 26 can also be disposed between the filter film 24 and the photosensitive die 22.
由于目标物体不同部位对光信号的反射存在差异,而且目标物体表面的不平整,目标物体有些部位与保护盖板30(见图3)接触,有些部位与保护盖板30未接触,从而 造成接触的位置发生漫反射,未接触的位置发生镜面反射,因此相邻的感光单元222之间感测到的光信号会存在混叠,从而造成获取的感测图像模糊。对此,本实用新型实施方式在感光裸片22上设置一抗混叠成像元件26,因此感光单元222执行光感测后获得的图像较清晰,从而提高了感光芯片20的感测精度。Since the reflection of the light signal is different between different parts of the target object, and the surface of the target object is uneven, some parts of the target object are in contact with the protective cover 30 (see FIG. 3), and some parts are not in contact with the protective cover 30, thereby The position causing the contact is diffusely reflected, and the untouched position is specularly reflected, so that the light signal sensed between the adjacent photosensitive cells 222 may be aliased, thereby causing the acquired sensing image to be blurred. In this regard, the embodiment of the present invention provides an anti-aliasing imaging element 26 on the photosensitive die 22, so that the image obtained by the photosensitive unit 222 after performing light sensing is relatively clear, thereby improving the sensing accuracy of the photosensitive chip 20.
在某些实施方式中,抗混叠成像元件26具有吸光特性,照射到抗混叠成像元件26上的光信号中,只有与所述感光裸片22近似垂直的光信号才能穿过抗混叠成像元件26并被感光单元222接收,其余的光信号则均被抗混叠成像元件26吸收。如此,可以防止相邻的感光单元222之间接收的光信号产生混叠。需要说明的是,与感光裸片22近似垂直的光信号包括垂直于所述感光裸片22的光信号,以及相对所述感光裸片22的垂直方向偏移预设角度范围内的光信号。该预设角度范围为±20°内。In some embodiments, the anti-aliasing imaging element 26 has light absorbing properties that illuminate the optical signal on the anti-aliasing imaging element 26, only the optical signal that is approximately perpendicular to the photosensitive die 22 can pass through the anti-aliasing The imaging element 26 is received by the photosensitive unit 222, and the remaining optical signals are all absorbed by the anti-aliasing imaging element 26. In this way, aliasing of the optical signals received between the adjacent photosensitive cells 222 can be prevented. It should be noted that the optical signal that is approximately perpendicular to the photosensitive die 22 includes an optical signal that is perpendicular to the photosensitive die 22, and is offset from the vertical direction of the photosensitive die 22 by a predetermined range of optical signals. The preset angle range is within ±20°.
具体地,该抗混叠成像元件26包括吸光墙261和由吸光墙261围合成的多个透光区域262。吸光墙261由吸光材料形成。该吸光材料包括金属氧化物、炭黑涂料、黑色油墨等。其中,金属氧化物中的金属例如但不限于铬(Cr)、镍(Ni)、铁(Fe)、钽(Ta)、钨(W)、钛(Ti)、钼(Mo)的一种或几种。透光区域262的延伸方向为与感光裸片22垂直的方向,以使照射到抗混叠成像元件26的光信号中,与感光裸片22近似垂直的方向上的光信号可以穿过透光区域262,其余的光信号则被吸光墙261吸收。Specifically, the anti-aliasing imaging element 26 includes a light absorbing wall 261 and a plurality of light transmissive regions 262 surrounded by a light absorbing wall 261. The light absorbing wall 261 is formed of a light absorbing material. The light absorbing material includes a metal oxide, a carbon black paint, a black ink, and the like. Wherein the metal in the metal oxide is, for example but not limited to, one of chromium (Cr), nickel (Ni), iron (Fe), tantalum (Ta), tungsten (W), titanium (Ti), molybdenum (Mo) or Several. The extending direction of the light-transmitting region 262 is a direction perpendicular to the photosensitive die 22 such that an optical signal in a direction approximately perpendicular to the photosensitive die 22 can be transmitted through the light signal irradiated to the anti-aliasing imaging element 26. In region 262, the remaining optical signals are absorbed by the light absorbing wall 261.
在某些实施方式中,如图9所示,图9示出了穿过抗混叠成像元件26的光信号范围。由于抗混叠成像元件26的吸光特性,只有光信号L1和光信号L2之间的光信号可以通过透光区域262到达感光单元222,其余的光信号均被抗混叠成像元件26的吸光墙261吸收。由图9可知,透光区域262的横截面积越小,通过透光区域262的光信号的角度α的范围越小,因此抗混叠成像元件26的抗混叠效果越好。如此,通过抗混叠成像元件26设置的较小面积的透光区域262,能提高抗混叠成像元件26的抗混叠效果。另外,由于抗混叠成像元件26的透光区域262的横截面积较小,因此每一感光单元222将对应多个透光区域262,从而使得感光单元222能感测到足够的光信号,提高了感光芯片20的感测精度。In certain embodiments, as shown in FIG. 9, FIG. 9 illustrates a range of optical signals that pass through the anti-aliasing imaging element 26. Due to the light absorption characteristics of the anti-aliasing imaging element 26, only the optical signal between the optical signal L1 and the optical signal L2 can reach the photosensitive unit 222 through the light-transmitting region 262, and the remaining optical signals are absorbed by the absorption wall 261 of the anti-aliasing imaging element 26. absorb. As can be seen from FIG. 9, the smaller the cross-sectional area of the light-transmitting region 262, the smaller the range of the angle α of the light signal passing through the light-transmitting region 262, and therefore the anti-aliasing effect of the anti-aliasing imaging element 26 is better. As such, the anti-aliasing effect of the anti-aliasing imaging element 26 can be improved by the relatively small area of the light-transmitting region 262 provided by the anti-aliasing imaging element 26. In addition, since the cross-sectional area of the light-transmitting region 262 of the anti-aliasing imaging element 26 is small, each photosensitive unit 222 will correspond to the plurality of light-transmitting regions 262, so that the photosensitive unit 222 can sense sufficient light signals, The sensing accuracy of the photosensitive chip 20 is improved.
进一步地,请参照图10,图10示出了本实用新型一实施方式的抗混叠成像元件26的结构。吸光墙261为多层结构,且该吸光墙包括交替层叠设置的吸光块261a和垫高块261b。一实施方式中,该吸光块261a由吸光材料形成。该吸光材料例如但不限于金属氧化物、炭黑涂料、黑色油墨等。其中,金属氧化物中的金属例如但不限于铬(Cr)、镍(Ni)、铁(Fe)、钽(Ta)、钨(W)、钛(Ti)、钼(Mo)的一种或几种。垫高块261b例如但不限于由透明材料形成的透明层,例如半透明材料、吸光材料等。 Further, please refer to FIG. 10, which shows the structure of the anti-aliasing imaging element 26 of an embodiment of the present invention. The light absorbing wall 261 has a multi-layer structure, and the light absorbing wall includes a light absorbing block 261a and a height block 261b which are alternately stacked. In one embodiment, the light absorbing block 261a is formed of a light absorbing material. The light absorbing material is, for example but not limited to, a metal oxide, a carbon black paint, a black ink, or the like. Wherein the metal in the metal oxide is, for example but not limited to, one of chromium (Cr), nickel (Ni), iron (Fe), tantalum (Ta), tungsten (W), titanium (Ti), molybdenum (Mo) or Several. The height block 261b is, for example but not limited to, a transparent layer formed of a transparent material such as a translucent material, a light absorbing material, or the like.
在某些实施方式中,位于同一层的多个吸光块261a间隔设置,且该同一层中各吸光块261a之间的间隔所对应的区域为透光区域262。进一步地,同一层的多个吸光块261a以及多个垫高块261b可以一次制成。具体地,通过提供一掩膜,所述掩膜为一体成型的膜片,且该膜片对应吸光块261a的位置形成开孔,且该开孔的形状与大小与吸光块263的形状大小一致。通过该掩膜依次在一承载物上蒸镀形成交替设置的吸光块261a以及垫高块261b,从而形成抗混叠成像元件26。In some embodiments, the plurality of light absorbing blocks 261a located in the same layer are spaced apart, and the area corresponding to the interval between the light absorbing blocks 261a in the same layer is the light transmitting region 262. Further, the plurality of light absorption blocks 261a and the plurality of height blocks 261b of the same layer may be fabricated at one time. Specifically, by providing a mask, the mask is an integrally formed diaphragm, and the diaphragm forms an opening corresponding to the position of the light absorbing block 261a, and the shape and size of the opening are consistent with the shape and size of the light absorbing block 263. . The light absorbing block 261a and the pad 261b which are alternately disposed are sequentially vapor-deposited on a carrier by the mask, thereby forming the anti-aliasing imaging element 26.
通过垫高块261b的设置,不但加快了抗混叠成像元件26的制程,而且通过垫高块261b的高度设置,能保证抗混叠成像元件26的抗混叠效果。By the arrangement of the padding block 261b, not only the process of the anti-aliasing imaging element 26 is accelerated, but also the anti-aliasing effect of the anti-aliasing imaging element 26 can be ensured by the height setting of the padding block 261b.
在某些实施方式中,上述透光区域262内均可以填充透明材料,以增加抗混叠成像元件层的强度,也可避免杂质进入透光区域262内而影响透光效果。为了保证透光区域262的透光效果,透明材料可以选用透光率较大的材料,例如玻璃、PMMA(亚克力)、PC(聚碳酸酯)等等。In some embodiments, the transparent region 262 may be filled with a transparent material to increase the strength of the anti-aliasing imaging element layer, and also to prevent impurities from entering the light-transmitting region 262 to affect the light-transmitting effect. In order to ensure the light transmissive effect of the light-transmitting region 262, a material having a relatively high light transmittance such as glass, PMMA (acrylic), PC (polycarbonate) or the like may be selected as the transparent material.
在某些实施方式中,请参照图11,图11示出了本实用新型另一实施方式的抗混叠成像元件的结构。该抗混叠成像元件26为多层结构,且该抗混叠成像元件26包括交替层叠设置的吸光层263和透明支撑层264;所述吸光层263包括多个间隔设置的吸光块263a;所述透明支撑层264由透明材料填充形成,且一并填充所述吸光块263a之间的间隔263b;其中所述间隔263b对应的区域形成所述透光区域262。In some embodiments, please refer to FIG. 11, which illustrates the structure of an anti-aliasing imaging element of another embodiment of the present invention. The anti-aliasing imaging element 26 is of a multi-layer structure, and the anti-aliasing imaging element 26 includes a light absorbing layer 263 and a transparent supporting layer 264 which are alternately stacked; the light absorbing layer 263 includes a plurality of spaced light absorbing blocks 263a; The transparent support layer 264 is formed by filling a transparent material and filling the space 263b between the light absorption blocks 263a together; wherein the area corresponding to the space 263b forms the light transmission area 262.
进一步地,请参照图12,图12示出了本实用新型一实施方式的抗混叠成像元件的制备过程。具体地,在制备抗混叠成像元件26时,在一承载物上先涂覆一层吸光材料,并在吸光材料层上将透光区域262对应的部分刻蚀掉,未被蚀刻的部分形成多个吸光块263a。该刻蚀技术例如但不局限于光刻蚀、X射线刻蚀、电子束刻蚀和离子束刻蚀。而且刻蚀类型可包括干法刻蚀和湿法刻蚀两种。然后,在蚀刻后的吸光块263上涂覆一层透明材料,且该透明材料不但覆盖多个吸光块263a,还一并填充多个吸光块263a之间的间隔263b,从而形成透明支撑层264。然后,按照吸光层263的形成方式在透明支撑层264上形成多个吸光块263a,依次类推形成多层交替层叠的吸光层263和透明支撑层264,从而形成抗混叠成像元件26。Further, please refer to FIG. 12, which illustrates a process of preparing an anti-aliasing imaging element according to an embodiment of the present invention. Specifically, in preparing the anti-aliasing imaging element 26, a light absorbing material is first coated on a carrier, and a corresponding portion of the light transmitting region 262 is etched away on the light absorbing material layer, and the unetched portion is formed. A plurality of light absorbing blocks 263a. The etching technique is, for example but not limited to, photolithography, X-ray etching, electron beam etching, and ion beam etching. Moreover, the etching type may include both dry etching and wet etching. Then, the etched light absorbing block 263 is coated with a transparent material, and the transparent material covers not only the plurality of light absorbing blocks 263a but also the space 263b between the plurality of light absorbing blocks 263a, thereby forming the transparent supporting layer 264. . Then, a plurality of light absorbing blocks 263a are formed on the transparent supporting layer 264 in the manner in which the light absorbing layer 263 is formed, and the light absorbing layer 263 and the transparent supporting layer 264 which are alternately stacked in a plurality of layers are sequentially formed, thereby forming the anti-aliasing imaging element 26.
进一步地,为了保证透光区域262的透光效果,形成透明支撑层264的透明材料可以选用透光率较大的材料,例如玻璃、PMMA(亚克力)、PC(聚碳酸酯)、环氧树脂等。Further, in order to ensure the light transmissive effect of the light-transmitting region 262, the transparent material forming the transparent supporting layer 264 may be selected from materials having a relatively high light transmittance, such as glass, PMMA, PC (polycarbonate), epoxy resin. Wait.
在某些实施方式中,请参照图13,图13示出了本实用新型另一实施方式的抗混叠成像元件的结构。该抗混叠成像元件26包括交替层叠设置的吸光层263和透明支撑层264,且每层透明支撑层264的厚度不相等。即图13中厚度h1、h2和h3的值不相等。 可选地,该透明支撑层264的厚度逐层增大,即h1<h2<h3。如此可以避免相对基底垂直方向偏移±20°以外的光信号穿过吸光块263a之间的透明支撑层264,从而提高了感光芯片20的感测精度。需要说明的是,每层透明支撑层264的厚度参数,以及吸光块263a的宽度和高度参数,可进行不同的设置以及多种设置组合方式,来提高感光芯片20的感测精度。In some embodiments, please refer to FIG. 13, which illustrates the structure of an anti-aliasing imaging element of another embodiment of the present invention. The anti-aliasing imaging element 26 includes a light absorbing layer 263 and a transparent support layer 264 which are alternately stacked, and the thickness of each of the transparent support layers 264 is unequal. That is, the values of the thicknesses h1, h2, and h3 in FIG. 13 are not equal. Optionally, the thickness of the transparent support layer 264 is increased layer by layer, that is, h1 < h2 < h3. In this way, optical signals other than ±20° from the vertical direction of the substrate can be prevented from passing through the transparent supporting layer 264 between the light absorbing blocks 263a, thereby improving the sensing accuracy of the photosensitive chip 20. It should be noted that the thickness parameter of each transparent support layer 264 and the width and height parameters of the light absorbing block 263a can be differently set and combined in various combinations to improve the sensing accuracy of the photosensitive chip 20.
在某些实施方式中,抗混叠成像元件26直接形成于感光裸片22上,即上述抗混叠成像元件26形成时的承载物为设有感光单元222的感光裸片22。然,可变更地,该抗混叠成像元件26例如独立制成后再设置于设有感光单元222的感光裸片22上,从而加快了感光芯片20的制程。In some embodiments, the anti-aliasing imaging element 26 is formed directly on the photosensitive die 22, i.e., the carrier when the anti-aliasing imaging element 26 is formed is a photosensitive die 22 having a photosensitive unit 222. However, the anti-aliasing imaging element 26 can be modified, for example, to be disposed on the photosensitive die 22 provided with the photosensitive unit 222, thereby speeding up the process of the photosensitive chip 20.
在某些实施方式中,抗混叠成像元件26中多个透光区域262均匀分布,从而使得抗混叠成像元件26的制备工艺较简单。而且,该抗混叠成像元件26例如可为一体成型的薄膜,独立制成后再贴合于感光裸片22上,从而加快了感光芯片20的制程。In some embodiments, the plurality of light transmissive regions 262 in the anti-aliasing imaging element 26 are evenly distributed such that the fabrication process of the anti-aliasing imaging element 26 is relatively simple. Moreover, the anti-aliasing imaging element 26 can be, for example, an integrally formed film that is separately fabricated and then attached to the photosensitive die 22, thereby accelerating the process of the photosensitive chip 20.
在某些实施方式中,所述感光芯片20为一生物传感芯片,用于感测目标物体的生物特征信息。具体地,该生物特征信息包括:指纹、掌纹、脉搏、血氧浓度、心率中的任意一种或几种。In some embodiments, the sensor chip 20 is a biosensor chip for sensing biometric information of a target object. Specifically, the biometric information includes any one or more of a fingerprint, a palm print, a pulse, a blood oxygen concentration, and a heart rate.
在某些实施方式中,请参照图14,图14示出了本实用新型又一实施方式的感光芯片20的结构。在某些实施方式中,所述感光芯片20进一步包括一封装体30,所述封装体30用于将所述感光裸片22以及所述感光裸片22上方的所有器件进行封装,例如抗混叠成像元件26以及滤光膜24。尤其地,当抗混叠成像元件26位于该滤光膜24上方时,该封装体30可以一并填充透光区域262。In some embodiments, please refer to FIG. 14, which illustrates the structure of a photosensitive chip 20 according to still another embodiment of the present invention. In some embodiments, the photosensitive chip 20 further includes a package 30 for packaging the photosensitive die 22 and all devices above the photosensitive die 22, for example, anti-aliasing. The imaging element 26 and the filter film 24 are stacked. In particular, when the anti-aliasing imaging element 26 is positioned above the filter film 24, the package 30 can fill the light-transmissive region 262 together.
在本说明书的描述中,参考术语“一个实施方式”、“某些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合所述实施方式或示例描述的具体特征、结构、材料或者特点包含于本实用新型的至少一个实施方式或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of the present specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiment", "example", "specific example", or "some examples", etc. The specific features, structures, materials or characteristics described in the embodiments or examples are included in at least one embodiment or example of the invention. In the present specification, the schematic representation of the above terms does not necessarily mean the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples.
尽管上面已经示出和描述了本实用新型的实施方式,可以理解的是,上述实施方式是示例性的,不能理解为对本实用新型的限制,本领域的普通技术人员在本实用新型的范围内可以对上述实施方式进行变化、修改、替换和变型。 While the embodiments of the present invention have been shown and described above, it is understood that the foregoing embodiments are illustrative and are not to be construed as limiting the scope of the invention Variations, modifications, substitutions and variations of the embodiments described above are possible.

Claims (20)

  1. 一种感光芯片,其特征在于:包括感光裸片以及滤光膜,且所述滤光膜设置在所述感光裸片上。A photosensitive chip characterized by comprising a photosensitive die and a filter film, and the filter film is disposed on the photosensitive die.
  2. 如权利要求1所述的感光芯片,其特征在于:所述滤光膜蒸镀于所述感光裸片上,或者所述滤光膜黏贴于所述感光裸片上。The photosensitive chip according to claim 1, wherein the filter film is evaporated on the photosensitive die, or the filter film is adhered to the photosensitive die.
  3. 如权利要求1所述的感光芯片,其特征在于:所述滤光膜用于将预设波段以外的光信号滤除。The photosensitive chip according to claim 1, wherein said filter film is for filtering out an optical signal other than a predetermined wavelength band.
  4. 如权利要求3所述的感光芯片,其特征在于:所述预设波段为环境光中的短波段信号。The photosensitive chip according to claim 3, wherein said predetermined wavelength band is a short-band signal in ambient light.
  5. 如权利要求4所述的感光芯片,其特征在于:所述预设波段为蓝色或绿色光信号对应的波段。The photosensitive chip according to claim 4, wherein the predetermined wavelength band is a wavelength band corresponding to a blue or green light signal.
  6. 如权利要求1所述的感光芯片,其特征在于:所述感光裸片包括多个感光器件,且所述感光器件为对所述预设波段的光信号感测灵敏度高的感光器件。The photosensitive chip according to claim 1, wherein said photosensitive die comprises a plurality of photosensitive devices, and said photosensitive device is a photosensitive device having high sensitivity to sensing an optical signal of said predetermined wavelength band.
  7. 如权利要求6所述的感光芯片,其特征在于,所述感光器件包括光敏二极管、光电阻、光电二极管、光敏三极管中的任意一个或多个。The photosensitive chip according to claim 6, wherein the photosensitive device comprises any one or more of a photodiode, a photo resistor, a photodiode, and a phototransistor.
  8. 如权利要求1所述的感光芯片,其特征在于:所述感光芯片为生物传感芯片,用于感测目标物体的生物特征信息。The photosensitive chip according to claim 1, wherein the photosensitive chip is a biosensor chip for sensing biometric information of a target object.
  9. 如权利要求8所述的感光芯片,其特征在于:所述生物特征信息包括:指纹、掌纹、脉搏、血氧浓度、心率中的任意一种或几种。The photosensitive chip according to claim 8, wherein the biometric information comprises any one or more of a fingerprint, a palm print, a pulse, a blood oxygen concentration, and a heart rate.
  10. 如权利要求1所述的感光芯片,其特征在于:所述感光裸片上方还设有抗混叠成像元件。A photosensitive chip according to claim 1, wherein an anti-aliasing imaging element is further disposed above said photosensitive die.
  11. 如权利要求10所述的感光芯片,其特征在于:所述滤光膜与所述抗混叠成像元件层叠设置在所述感光裸片上,其中,所述滤光膜设置在所述抗混叠成像元件与所述感光裸片之间,或,所述抗混叠成像元件设置所述滤光膜在与所述感光裸片之间。The photosensitive chip according to claim 10, wherein said filter film and said anti-aliasing imaging element are laminated on said photosensitive die, wherein said filter film is disposed in said anti-aliasing Between the imaging element and the photosensitive die, or the anti-aliasing imaging element is disposed between the photosensitive film and the photosensitive die.
  12. 如权利要求10-11任一项所述的感光芯片,其特征在于:所述抗混叠成像元件包括吸光墙以及由吸光墙围成的多个透光区域。The photosensitive chip according to any one of claims 10 to 11, wherein the anti-aliasing imaging element comprises a light absorbing wall and a plurality of light transmitting regions surrounded by the light absorbing walls.
  13. 如权利要求12所述的感光芯片,其特征在于:所述吸光墙由多层吸光层层叠而成。A photosensitive chip according to claim 12, wherein said light absorbing wall is formed by laminating a plurality of light absorbing layers.
  14. 如权利要求13所述的感光芯片,其特征在于:相邻的所述吸光层之间设有支撑层。The photosensitive chip according to claim 13, wherein a support layer is provided between adjacent ones of the light absorbing layers.
  15. 如权利要求12所述的感光芯片,其特征在于:所述透光区域内填充透明材料。The photosensitive chip according to claim 12, wherein said light transmitting region is filled with a transparent material.
  16. 如权利要求10所述的感光芯片,其特征在于:所述感光芯片还包括封装体,用于将 所述感光裸片、以及所述感光裸片上方的抗混叠成像元件以及滤光膜进行封装。The photosensitive chip according to claim 10, wherein said photosensitive chip further comprises a package for The photosensitive die, and the anti-aliasing imaging element above the photosensitive die and the filter film are packaged.
  17. 如权利要求12所述的感光芯片,其特征在于:所述感光芯片还包括封装体,用于将所述感光裸片、以及所述感光裸片上方的抗混叠成像元件以及滤光膜进行封装,其中,所述封装体填充所述透光区域。The photosensitive chip according to claim 12, wherein said photosensitive chip further comprises a package for performing said photosensitive die, and said anti-aliasing imaging element and said filter film over said photosensitive die a package, wherein the package fills the light transmissive area.
  18. 一种电子设备,其特征在于:所述电子设备包括权利要求1-17任一项所述的感光芯片。An electronic device, comprising: the photosensitive chip according to any one of claims 1-17.
  19. 如权利要求18所述的电子设备,其特征在于:所述电子设备进一步包括显示面板,所述感光芯片对应所述显示面板下方的局部区域设置,所述感测芯片用于接收从显示面板的显示区域透过的光信号,以根据接收到的光信号获取相应的生物特征信息。The electronic device according to claim 18, wherein the electronic device further comprises a display panel, wherein the photosensitive chip is disposed corresponding to a partial area under the display panel, and the sensing chip is configured to receive from the display panel The light signal transmitted through the display area is used to acquire corresponding biometric information according to the received optical signal.
  20. 如权利要求18所述的电子设备,其特征在于:所述电子设备为手机或平板电脑。 The electronic device of claim 18, wherein the electronic device is a mobile phone or a tablet.
PCT/CN2017/097919 2017-08-17 2017-08-17 Photosensitive chip and electronic device WO2019033358A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111104863A (en) * 2019-11-22 2020-05-05 深圳阜时科技有限公司 Method for manufacturing optical sensing device and optical sensing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113158873A (en) * 2017-08-17 2021-07-23 深圳信炜科技有限公司 Photosensitive chip and electronic equipment

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105631438A (en) * 2016-02-16 2016-06-01 格科微电子(上海)有限公司 Optical fingerprint recognition device
US20160254312A1 (en) * 2015-02-02 2016-09-01 Synaptics Incorporated Image sensor structures for fingerprint sensing
CN106529513A (en) * 2016-12-20 2017-03-22 北京小米移动软件有限公司 Color filter substrate, display module and electronic equipment
US20170169274A1 (en) * 2015-12-10 2017-06-15 Centraled Technology Co., Ltd. Sandwich type fingerprint recognition device
CN106873063A (en) * 2017-02-23 2017-06-20 京东方科技集团股份有限公司 A kind of display device
CN106886767A (en) * 2017-02-23 2017-06-23 京东方科技集团股份有限公司 A kind of optical fingerprint identification device and display panel
CN106897699A (en) * 2017-02-24 2017-06-27 京东方科技集团股份有限公司 A kind of fingerprint recognition device, OLED display
CN106991366A (en) * 2016-01-21 2017-07-28 上海箩箕技术有限公司 Optical fingerprint sensor

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160254312A1 (en) * 2015-02-02 2016-09-01 Synaptics Incorporated Image sensor structures for fingerprint sensing
US20170169274A1 (en) * 2015-12-10 2017-06-15 Centraled Technology Co., Ltd. Sandwich type fingerprint recognition device
CN106991366A (en) * 2016-01-21 2017-07-28 上海箩箕技术有限公司 Optical fingerprint sensor
CN105631438A (en) * 2016-02-16 2016-06-01 格科微电子(上海)有限公司 Optical fingerprint recognition device
CN106529513A (en) * 2016-12-20 2017-03-22 北京小米移动软件有限公司 Color filter substrate, display module and electronic equipment
CN106873063A (en) * 2017-02-23 2017-06-20 京东方科技集团股份有限公司 A kind of display device
CN106886767A (en) * 2017-02-23 2017-06-23 京东方科技集团股份有限公司 A kind of optical fingerprint identification device and display panel
CN106897699A (en) * 2017-02-24 2017-06-27 京东方科技集团股份有限公司 A kind of fingerprint recognition device, OLED display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111104863A (en) * 2019-11-22 2020-05-05 深圳阜时科技有限公司 Method for manufacturing optical sensing device and optical sensing device

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