WO2019078729A3 - Method for producing an icing protected arrangement and icing protected arrangement - Google Patents
Method for producing an icing protected arrangement and icing protected arrangement Download PDFInfo
- Publication number
- WO2019078729A3 WO2019078729A3 PCT/NO2018/050249 NO2018050249W WO2019078729A3 WO 2019078729 A3 WO2019078729 A3 WO 2019078729A3 NO 2018050249 W NO2018050249 W NO 2018050249W WO 2019078729 A3 WO2019078729 A3 WO 2019078729A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- icing
- protected arrangement
- producing
- icing protected
- arrangement
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Laminated Bodies (AREA)
Abstract
An Icing protected arrangement (10), comprising a substrate(11)coated by an anti- icing coating (12), is capable to at least reduce the need for additional deicing provisions like heating or spraying with deicing solutions, if said anti-icing coating (12) comprising a fluorinated graphene layer (15).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20171683 | 2017-10-20 | ||
NO20171683 | 2017-10-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2019078729A2 WO2019078729A2 (en) | 2019-04-25 |
WO2019078729A3 true WO2019078729A3 (en) | 2019-05-31 |
Family
ID=65895040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/NO2018/050249 WO2019078729A2 (en) | 2017-10-20 | 2018-10-19 | Method for producing an icing protected arrangement and icing protected arrangement |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2019078729A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114104299B (en) * | 2021-11-26 | 2024-03-12 | 中国人民解放军空军工程大学 | Device and method for preventing and removing ice by compounding superhydrophobic coating plasma and graphene electric heating |
CN114152365B (en) * | 2022-02-07 | 2022-04-12 | 中国空气动力研究与发展中心低速空气动力研究所 | Optical fiber icing sensor, system and method for critical anti-icing protection |
WO2024105038A1 (en) | 2022-11-15 | 2024-05-23 | Paragraf Limited | Methods of forming graphene on a substrate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160083621A1 (en) * | 2010-07-27 | 2016-03-24 | United Technologies Corporation | Composite article having protective coating |
US20170225233A1 (en) * | 2016-02-09 | 2017-08-10 | Aruna Zhamu | Chemical-free production of graphene-reinforced inorganic matrix composites |
-
2018
- 2018-10-19 WO PCT/NO2018/050249 patent/WO2019078729A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160083621A1 (en) * | 2010-07-27 | 2016-03-24 | United Technologies Corporation | Composite article having protective coating |
US20170225233A1 (en) * | 2016-02-09 | 2017-08-10 | Aruna Zhamu | Chemical-free production of graphene-reinforced inorganic matrix composites |
Non-Patent Citations (4)
Title |
---|
JEREMY T. ROBINSON ET AL: "Properties of Fluorinated Graphene Films", NANO LETTERS, vol. 10, no. 8, 11 August 2010 (2010-08-11), pages 3001 - 3005, XP055007080, ISSN: 1530-6984, DOI: 10.1021/nl101437p * |
WEI FENG ET AL: "Two-Dimensional Fluorinated Graphene: Synthesis, Structures, Properties and Applications", ADVANCED SCIENCE, vol. 3, no. 7, 1 July 2016 (2016-07-01), pages 1500413, XP055578410, ISSN: 2198-3844, DOI: 10.1002/advs.201500413 * |
X. LI ET AL: "Large-Area Synthesis of High-Quality and Uniform Graphene Films on Copper Foils", SCIENCE, vol. 324, no. 5932, 7 May 2009 (2009-05-07), US, pages 1312 - 1314, XP055259738, ISSN: 0036-8075, DOI: 10.1126/science.1171245 * |
XUESONG LI ET AL: "Large-area synthesis of high-quality and uniform graphene films on copper foils", SCIENCE, AAAS, AMERICAN ASSOC. FOR THE ADVANCEMENT OF SCIENCE, US, vol. 324, no. 5932, 5 June 2009 (2009-06-05), pages 1312 - 1314, XP008127472, ISSN: 0036-8075, [retrieved on 20090507], DOI: 10.1126/SCIENCE.1171245 * |
Also Published As
Publication number | Publication date |
---|---|
WO2019078729A2 (en) | 2019-04-25 |
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