WO2018120743A1 - Procédé de fabrication de métamatériaux - Google Patents
Procédé de fabrication de métamatériaux Download PDFInfo
- Publication number
- WO2018120743A1 WO2018120743A1 PCT/CN2017/092063 CN2017092063W WO2018120743A1 WO 2018120743 A1 WO2018120743 A1 WO 2018120743A1 CN 2017092063 W CN2017092063 W CN 2017092063W WO 2018120743 A1 WO2018120743 A1 WO 2018120743A1
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- WO
- WIPO (PCT)
- Prior art keywords
- composite substrate
- soft template
- ots
- metamaterial
- manufacturing
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
Definitions
- the present invention relates to the field of metamaterial technology, and more particularly to a method of manufacturing a metamaterial.
- metamaterial processing mainly relies on lithography and other flat etching processes (such as ion beam etching, electron beam etching, X-ray etching, etc.).
- lithography and other flat etching processes such as ion beam etching, electron beam etching, X-ray etching, etc.
- screen printing, inkjet printing, etc. are prepared by solution processing to prepare metamaterials, which are compatible with the roll-to-roll process, and are potential metamaterial manufacturers.
- Metamaterials consist of a dielectric substrate and a microstructure.
- the key technology for the manufacture of metamaterials is the processing of microstructures.
- the defects of the existing manufacturing processes are as follows:
- an object of the present invention is to provide a method for producing a metamaterial having high performance, high manufacturing efficiency, and accurate microstructural structure and excellent electromagnetic corresponding characteristics.
- the OTS self-assembled single layer side of the soft template with the OTS self-assembled monolayer formed in step b is closely attached to the surface of the composite substrate after the process in step c, and maintains a certain daytime And the OT s self-assembled monolayer is transferred from the soft template to the composite substrate, and then the soft template is removed to prepare a patterned composite substrate;
- the surface of the substrate corresponding to the soft template after the surface energy treatment process is improved has higher surface energy
- the soft template is a PDMS template.
- the step b further includes the following steps:
- a formulated OTS-n-hexane solution is applied to the soft template and the solvent component is completely volatilized to form an OTS self-assembled monolayer on the soft template.
- the volume ratio of OTS to n-hexane is 0.5: 1000-2:100
- the step c further includes the following steps:
- Curing was carried out continuously for 3-7 hours at a temperature of 0 °C.
- the surface to be patterned of the composite substrate is processed by a plasma treatment technique.
- step d Preferably, in the step d,
- the step e further includes the following steps: [0028] Weigh a certain amount of gold nanoparticles, add it to acetone, make a gold nanoparticle-acetone solution, and perform ultrasonic dispersion of a certain length;
- the obtained gold nano-dispersion is applied to the surface of the composite substrate, and the solvent component is completely volatilized, thereby depositing gold nanoparticles in the non-patterned region of the patterned composite substrate.
- the gold nanoparticle-acetone solution has a mass concentration of 0.05-3 g/ml.
- the method for manufacturing a metamaterial in the present application the process for preparing a metamaterial by making a large surface energy difference between a soft template and a composite substrate, and between the OTS assembly layer and the composite substrate during the process It has strong implementability, high manufacturing efficiency, and the obtained microstructure structure is accurate in size and has excellent electromagnetic corresponding characteristics.
- FIG. 1 is a schematic view showing the structure of a pre-coupling of a metamaterial and a soft template for preparing a metamaterial, respectively, according to an embodiment of the present invention.
- FIG. 2 shows a schematic structural view of a metamaterial according to an embodiment of the present invention.
- FIG. 3 shows a schematic structural diagram of a soft template according to an embodiment of the present invention.
- metamaterial 1 soft template 2
- substrate 11 microstructure layer 12
- mouth resonance ring 131 groove 21.
- the metamaterial 1 includes a substrate 11 and a microstructure layer 12 disposed on the substrate 11.
- the microstructure layer 12 includes a metal microstructure pattern.
- the microstructure pattern includes a plurality of pattern units, and the plurality of pattern units are arranged in accordance with a predetermined rule to form a structure having a specific electromagnetic response characteristic.
- the plurality of pattern elements are respectively the mouth ring resonance ring 131.
- FIG. 4 shows a flow chart of a method of manufacturing a metamaterial according to an embodiment of the present invention. As shown in Fig. 4, the preparation process of the metamaterial 1 is as shown in steps S01-S05.
- steps S01-S05 the preparation process of the metamaterial 1 is as shown in steps S01-S05.
- Embodiment 1 is a diagrammatic representation of Embodiment 1 :
- step S01 referring to FIG. 1, a soft template 2 having a pattern opposite to the microstructure of the metamaterial 1 is prepared.
- the pattern formed on the surface of the rigid substrate is a plurality of groove-shaped recesses 21 defined by the photoresist, which are matched to the shape of the mouthpiece resonance ring 131.
- step S02 an OTS self-assembled monolayer having the same microstructure pattern as the soft template is formed on the soft template 2.
- the step further includes the following steps:
- the formulated OTS-n-hexane solution is applied, for example, to the pattern of the soft template 2, which in this embodiment is the groove 21 of the weir-removing ring shown in FIG. Other parts outside.
- the solvent component is completely volatilized to form an OTS self-assembled monolayer on the soft template 2.
- the method further includes the following steps:
- the surface to be patterned of the composite substrate 11 is processed by a plasma treatment technique to improve the surface of the composite substrate 11. Can, thereby increasing the adhesion of its surface, such as adhesion to OTS. After the treatment, the surface energy of the composite substrate 11 is greatly improved, and the surface of the soft template 2 is more distinguished.
- step S04 the OTS self-assembled single layer side of the soft template 2 having the OTS self-assembled single layer formed in step S02 is closely attached to the surface of the composite substrate 11 after the process in step S03, And maintaining for 3 minutes until the OTS self-assembled monolayer is transferred from the soft template 2 onto the composite substrate 11, and then the soft template 2 is removed to prepare a patterned composite substrate 11.
- step S05 gold nanoparticles are deposited in the non-pattern area of the patterned composite substrate 11 to form the microstructure pattern.
- the step further includes the following steps:
- the prepared gold nano-dispersion is applied to the surface of the composite substrate 11, and the solvent component is completely volatilized, thereby depositing gold nanoparticles on the surface of the composite substrate 11.
- the coating process may specifically be spin coating or dispensing.
- the gold particles spontaneously deposit in the patterned groove 21 with a patterning compound having a strong surface energy.
- Table of substrate 11 After the gold nanoparticles are deposited in the patterned grooves 21 of the patterned composite substrate 11, a microstructure layer 12 formed of a gold material as shown in FIG. 2 is formed in the deposition region.
- the pattern structure is precisely dimensioned, so that the metamaterial 1 has a superb material 1 having excellent electromagnetic corresponding characteristics.
- the microstructure pattern is specifically a plurality of mouth-resonant resonant ring 131 patterns.
- step S01 a soft template 2 having a pattern opposite to the microstructure of the metamaterial 1 is prepared.
- the soft template 2 is a PDMS template, which is made of PDMS, that is, a polydimethylsiloxane material, has good flexibility, and has a low surface energy, such that its surface pair is, for example. Materials such as octadecyltrichlorosilane (OTS) have less adhesion.
- the soft template 2 is prepared by using a photolithography method to form a pattern opposite to the microstructure on the surface of the hard substrate.
- the pattern opposite to the microstructure in this embodiment means that patterned light is disposed on the surface of the hard substrate. Engraving, wherein a portion corresponding to the microstructure is left blank, and other portions are provided as a photoresist.
- step S02 an OTS self-assembled monolayer having the same microstructure pattern as the soft template is formed on the soft template 2.
- the step further includes the following steps:
- step S03 the composite substrate 11 is prepared, and the composite substrate 11 is subjected to a process for improving surface energy.
- the method further includes the following steps: [0070] S031), in preparing the composite substrate 11 ⁇ , alternately stacking epoxy resin and glass fiber prepreg, and forming an angle of 90 degrees between the epoxy resin and the glass fiber prepreg of the adjacent layer Laying, that is, the laying of the epoxy resin and the glass fiber prepreg of the adjacent layers in a crisscross manner; placing the laid multilayer epoxy resin and the glass fiber prepreg in a vacuum environment, such as a vacuum bag, And curing at 5 ° C for 5 hours;
- the surface to be patterned of the composite substrate 11 is processed by a plasma treatment technique to increase the surface of the composite substrate 11. Can, thereby increasing the adhesion of its surface, such as adhesion to OTS. After the treatment, the surface energy of the composite substrate 11 is greatly improved, and the surface of the soft template 2 is more distinguished.
- step S04 the OTS self-assembled single layer side of the soft template 2 having the OTS self-assembled single layer formed in step S02 is closely attached to the surface of the composite substrate 11 after the process in step S03, And maintaining for 5 minutes until the OTS self-assembled monolayer is transferred from the soft template 2 onto the composite substrate 11, and then the soft template 2 is removed to prepare a patterned composite substrate 11.
- the OT S self-assembled monolayer is transferred from the soft template 2 to the composite substrate 11, and then compared. It is easy to separate from the soft template 2 so that blocking does not occur.
- step S05 gold nanoparticles are deposited in the non-pattern area of the patterned composite substrate 11 to form the microstructure pattern.
- the step further includes the following steps:
- the gold particles spontaneously deposit in the patterned groove 21 and have a strong surface energy patterning.
- a microstructure layer 12 formed of a gold material as shown in FIG. 2 is formed in the deposition region.
- the pattern structure is accurate in size.
- a metamaterial 1 having excellent electromagnetic corresponding characteristics is obtained.
- the microstructure pattern is specifically a plurality of mouth-resonant resonant ring 131 patterns.
- step S01 a soft template 2 having a pattern opposite to the microstructure of the metamaterial 1 is prepared.
- the pattern processed on the surface of the hard substrate matches the shape of the mouth resonant ring 131.
- a plurality of grooved annular grooves 21 defined by the photoresist After obtaining the hard substrate with the patterned photoresist, it was used as the original template for imprint transfer.
- the organic PDMS material is then applied to the surface of the hard substrate with the patterned photoresist and dried under vacuum.
- step S02 an OTS self-assembled monolayer having the same microstructure pattern as the soft template is formed on the soft template. Specifically, the step further includes the following steps:
- step S03 the composite substrate 11 is prepared, and the composite substrate 11 is subjected to a process of improving surface energy.
- the method further includes the following steps:
- the surface to be patterned of the composite substrate 11 is processed by a plasma treatment technique to increase the surface of the composite substrate 11. Can, thereby increasing the adhesion of its surface, such as adhesion to OTS. After the treatment, the surface energy of the composite substrate 11 is greatly improved, and the surface of the soft template 2 is more distinguished.
- the OT S self-assembled monolayer is transferred from the soft template 2 to the composite substrate 11, and then compared. It is easy to separate from the soft template 2 so that blocking does not occur.
- step S05 gold nanoparticles are deposited in the non-pattern area of the patterned composite substrate 11 to form the microstructure pattern.
- the step further includes the following steps:
- the prepared gold nano-dispersion is applied to the surface of the composite substrate 11, and the solvent component is completely volatilized, thereby depositing gold nanoparticles on the surface of the composite substrate 11.
- the coating process may specifically be spin coating or dispensing.
- the gold particles spontaneously deposit in the patterned groove 21 and have a patterning compound with strong surface energy.
- a microstructure layer 12 formed of a gold material as shown in FIG. 2 is formed in the deposition region.
- the microstructure pattern is specifically a plurality of mouth-resonant ring 131 patterns.
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Abstract
La présente invention concerne un procédé de fabrication de métamatériaux, comprenant les étapes suivantes consistant à : a. préparer un modèle souple qui est pourvu d'un motif qui est opposé à une microstructure d'un métamatériau; b. former une monocouche auto-assemblée d'octadécyltrichlorosilane (OTS), qui est pourvue d'un motif qui est le même que celui de la microstructure, sur le modèle souple; c. préparer un substrat composite et réaliser un traitement qui augmente l'énergie de surface sur le substrat composite; d. fixer étroitement un côté de la monocouche auto-assemblée OTS du modèle souple qui est pourvu de la monocouche auto-assemblée OTS et qui est formé à l'étape b sur une surface traitée du substrat composite à l'étape c, et le maintenir pendant une certaine durée jusqu'à ce que la monocouche auto-assemblée OTS soit transférée du modèle souple au substrat composite, puis détacher le modèle souple pour fabriquer et obtenir un substrat composite à motifs; e. déposer des nanoparticules d'or à l'intérieur d'une région sans motif du substrat composite à motifs. Le procédé de fabrication de métamatériaux est facile à mettre en œuvre, a une efficacité de fabrication élevée, et les microstructures obtenues ont des dimensions précises et ont d'excellentes caractéristiques électromagnétiques correspondantes.
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CN201611270527.1 | 2016-12-30 | ||
CN201611270527.1A CN108269656A (zh) | 2016-12-30 | 2016-12-30 | 超材料制造方法 |
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CN112261860B (zh) * | 2020-10-23 | 2023-05-16 | 航天特种材料及工艺技术研究所 | 一种可重复使用的微流体吸波超材料及其制备方法 |
CN113587692B (zh) * | 2021-06-25 | 2022-06-14 | 佛山华智新材料有限公司 | 微通道热沉及其制造方法 |
CN113937243B (zh) * | 2021-08-26 | 2024-01-30 | 福州大学 | 基于基板表面亲疏水性处理的高ppi量子点阵列制备方法 |
CN114084868B (zh) * | 2021-11-23 | 2024-12-10 | 清华大学 | 大面积图案化微纳米颗粒自组装结构及其制备方法 |
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US20020190416A1 (en) * | 2001-06-19 | 2002-12-19 | Birch William R. | Releasing agent for embossing mold with high pattern density |
CN1401685A (zh) * | 2002-09-15 | 2003-03-12 | 中国科学院兰州化学物理研究所 | 图案化导电聚合物膜的制备方法 |
CN1853270A (zh) * | 2003-10-09 | 2006-10-25 | 飞思卡尔半导体公司 | 增强光刻胶黏性的无定形碳层 |
CN101321614A (zh) * | 2005-09-30 | 2008-12-10 | 空客西班牙公司 | 使用常压等离子体束表面处理复合材料结构体的方法 |
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NO311797B1 (no) * | 1999-05-12 | 2002-01-28 | Thin Film Electronics Asa | Fremgangsmåter til mönstring av polymerfilmer og anvendelse av fremgangsmåtene |
CN104228087A (zh) * | 2014-09-01 | 2014-12-24 | 机械科学研究总院先进制造技术研究中心 | 一种复合材料预浸料制备方法 |
CN104238264A (zh) * | 2014-09-10 | 2014-12-24 | 清华大学 | 一种溶液辅助软压印方法 |
US20180217494A1 (en) * | 2015-06-23 | 2018-08-02 | The University Of North Carolina At Chapel Hill | Method for making an epoxy resin mold from a lithography patterned microstructure master |
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US20020190416A1 (en) * | 2001-06-19 | 2002-12-19 | Birch William R. | Releasing agent for embossing mold with high pattern density |
CN1401685A (zh) * | 2002-09-15 | 2003-03-12 | 中国科学院兰州化学物理研究所 | 图案化导电聚合物膜的制备方法 |
CN1853270A (zh) * | 2003-10-09 | 2006-10-25 | 飞思卡尔半导体公司 | 增强光刻胶黏性的无定形碳层 |
CN101321614A (zh) * | 2005-09-30 | 2008-12-10 | 空客西班牙公司 | 使用常压等离子体束表面处理复合材料结构体的方法 |
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