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WO2018190326A1 - Pest control composition containing pyridone compound and quinoline-based compound and pest control method, and new quinoline-based compound - Google Patents

Pest control composition containing pyridone compound and quinoline-based compound and pest control method, and new quinoline-based compound Download PDF

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Publication number
WO2018190326A1
WO2018190326A1 PCT/JP2018/015011 JP2018015011W WO2018190326A1 WO 2018190326 A1 WO2018190326 A1 WO 2018190326A1 JP 2018015011 W JP2018015011 W JP 2018015011W WO 2018190326 A1 WO2018190326 A1 WO 2018190326A1
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group
substituent
optionally substituted
formula
compound represented
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PCT/JP2018/015011
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French (fr)
Japanese (ja)
Inventor
健志 福元
豪毅 梅谷
伊藤 寛之
敏明 小原
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三井化学アグロ株式会社
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Publication of WO2018190326A1 publication Critical patent/WO2018190326A1/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • A01N43/42Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond

Definitions

  • the present invention relates to a pest control composition containing a pyridone compound and one or more quinoline compounds as active ingredients, and a novel quinoline compound.
  • 1,3,5,6-substituted-2-pyridone compounds for example, 1,3,5,6-substituted-2 having an aryl group or heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand.
  • -Pyridone compounds have been disclosed (see eg WO 98/55480).
  • 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (see, for example, European Patent No. 0308020).
  • the uses of the compounds described in WO 98/55480 and EP 0308020 are all related to medicines and are different from the technical field to which the pest control composition according to the present invention belongs. To do.
  • Patent Documents 3 and 4 disclose that rice blasts of rice blast (Pyricularia oryzae) and tomato, cucumber and kidney beans are gray as quinoline compounds as fungicides. It has been disclosed that a disease control such as fungus disease (Botrytis cinerea), cucumber vine split disease (Fusarium oxysporum) and the like can be controlled by treatment methods such as foliage spraying, soil treatment, seed treatment, and the like.
  • Patent Documents 5 and 6 disclose mixing of the quinoline compound represented by the formula (2a) or the formula (2b) with a certain fungicide, but mixing with the pyridone compound of the present invention. Is not disclosed.
  • An object of the present invention is to provide a pest control composition having a useful control effect including a combination of a novel pyridone compound or a salt thereof and a quinoline compound, a method of using the same, and a novel quinoline compound having a useful control effect Is to provide.
  • a pest control composition comprising, as active ingredients, a compound group having an aryl group or heteroaryl group having a substituent at the ortho position with respect to the 6-position in the 2-pyridone skeleton, and one or more quinoline compounds;
  • the present inventors have found that a novel quinoline compound exhibits excellent pest control activity and has completed the present invention. That is, the present invention is as follows.
  • R1 is a hydroxyl group, A cyano group, A C1-C6 alkyl group optionally substituted with substituent A, A C1-C6 haloalkyl group, A C3-C8 cycloalkyl group optionally substituted with the substituent A, A C2-C6 alkenyl group optionally substituted with the substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with substituent A, A C2-C6 haloalkynyl group, A C1-C6 alkoxy group optionally substituted with the substituent A, A C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group optionally substituted with the substituent A, A C2-C6 alkenyloxy group optionally substituted with the substituent A, A C2-C6 haloalkenyloxy group, A C3-C6 alkynyloxy group
  • R20C ( ⁇ O) O— (wherein R20 has the same meaning as above), A 3- to 6-membered group containing 1 to 2 oxygen atoms, R23-L2- (wherein, R23 represents a C1 alkyl group ⁇ C6 or C1 ⁇ C6 haloalkyl group,, L2 represents S, SO, or SO 2.), R21R22N- (wherein R21 and R22 are as defined above), Or R24C ( ⁇ O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optional
  • Substituent B1 is At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group
  • Substituent C is Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds
  • Substituent D is At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C
  • R1 is a cyano group, A C1-C6 alkyl group optionally substituted with substituent A, A C1-C6 haloalkyl group, A C3-C8 cycloalkyl group optionally substituted with the substituent A, A C2-C6 alkenyl group optionally substituted with the substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with substituent A, Or R10R11N- (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group); R2 is a halogen atom, Hydroxyl group, A cyano group, A C1-C6 alkyl group optionally substituted with the substituent B, A C1-C6 haloalkyl group, A C1-C6 alkoxy group optionally substituted with the substituent B, A C1-C6
  • R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A
  • R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B
  • R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C.
  • R2a and R2b are each independent, A C1-C6 alkyl group optionally substituted with a substituent E1; R2c and R2d are each independent, A hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent E1, or a halogen atom, R2e is a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent E1, X1 is a halogen atom, X2 is a halogen atom, n1 represents an integer of 0 to 4, The pest control composition according to [1], wherein n2 represents an integer of 0 to 6.
  • the quinoline compound represented by formula (2a) or formula (2b) is represented by formula (2c) or formula (2d).
  • R2f represents a hydrogen atom or a methyl group
  • X3, X4 and X5 each independently represent a hydrogen atom or a fluorine atom
  • X6 and X7 each independently represent a hydrogen atom, a methyl group or a fluorine atom.
  • the pesticidal composition according to [1] which is a quinoline compound represented by the formula:
  • the quinoline compound represented by the formula (2a) or the formula (2b) is 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline, 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline, 8-Fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline and 8-fluoro-3- (5-fluoro-).
  • the pest control composition according to [4] which is at least one selected from the group consisting of 3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline.
  • [7] A method for controlling pests by applying the pest control composition according to [1].
  • a composition containing, as an active ingredient, a pyridone compound represented by the formula (1) according to [1] or a salt thereof, and a quinoline system represented by the formula (2a) or the formula (2b) according to [1] A method for controlling pests by simultaneously applying a compound or a salt thereof as an active ingredient.
  • a composition containing, as an active ingredient, a pyridone compound represented by formula (1) according to [1] or a salt thereof, or a quinoline system represented by formula (2a) or formula (2b) according to [1] A method of controlling pests by applying one of the compositions containing a compound or a salt thereof as an active ingredient and then applying the other composition.
  • a method for controlling pests comprising a compound of the formula (I) or a salt thereof and the formula (2a) or formula described in [1] on a plant individual, seed, soil, seedling box, or cell tray in need thereof
  • a method comprising applying an effective amount of the quinoline compound represented by (2b) or a salt thereof.
  • a pest control composition useful for controlling pests containing a novel active ingredient a method for using the same, and a novel quinoline compound.
  • Cx-Cy has x to y carbon atoms.
  • optionally substituted means substituted or unsubstituted. When this term is used, the number of substituents is 1 when the number of substituents is not specified.
  • the C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl.
  • the halogen atom is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or the like.
  • the C1-C6 haloalkyl group represents a group in which the hydrogen in the C1-C6 alkyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C1-C6 haloalkyl group examples include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2
  • the C1-C6 fluoroalkyl group represents a group in which hydrogen in the C1-C6 alkyl group is optionally substituted with one or more fluorine atoms.
  • Specific examples of the C1-C6 fluoroalkyl group include monofluoromethyl group, difluoromethyl group, trifluoromethyl group, 1-fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2- Difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group, pentafluoroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl Group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobut
  • the C3-C8 cycloalkyl group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and the like.
  • the C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched.
  • C2 to C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, and 3-pentenyl.
  • the C2-C6 haloalkenyl group represents a group in which the hydrogen atom in the C2-C6 alkenyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkenyl group examples include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
  • the C2-C6 alkynyl group represents an unsaturated hydrocarbon group having one or more triple bonds and being linear or branched. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, and 3-pentynyl.
  • the C2-C6 haloalkynyl group represents a group in which the hydrogen atom in the C2-C6 alkynyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkynyl group examples include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-Di
  • the C1-C6 alkoxy group represents a C1-C6 alkyl group bonded through an oxygen atom.
  • Specific examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group, and an isopentyloxy group.
  • the C1-C6 haloalkoxy group represents a group in which the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C1-C6 haloalkoxy group examples include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pent
  • the C3-C8 cycloalkoxy group represents a group in which the C3-C8 cycloalkyl group is bonded via an oxygen atom.
  • Specific examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.
  • the C2-C6 alkenyloxy group is a group in which the C2-C6 alkenyl group is bonded through an oxygen atom.
  • E-form and Z-form or a mixture of E-form and Z-form in an arbitrary ratio, is not particularly limited as long as it is within the specified carbon number range. None happen.
  • C2-C6 alkenyloxy group examples include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group 3-pentenyloxy group, 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
  • the C2-C6 haloalkenyloxy group represents a group in which the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • Specific examples of the C2-C6 haloalkenyloxy group include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro.
  • the C3-C6 alkynyloxy group represents a group in which the C3-C6 alkynyl group is bonded via an oxygen atom among the C2-C6 alkynyl groups.
  • Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1 -Dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
  • the C3-C6 haloalkynyloxy group represents a group in which the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C3-C6 haloalkynyloxy group examples include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6
  • the C2-C6 alkoxyalkoxy group is a group in which the hydrogen atom in the C1-C5 alkoxy group in the C1-C6 alkoxy group is optionally substituted with one or more C1-C5 alkoxy groups Represents. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range.
  • C2-C6 alkoxyalkoxy groups include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group, and an isopropyloxypropyloxy group.
  • the C2-C12 alkoxyalkyl group represents a group in which the C1-C6 alkoxy group is bonded to the C1-C6 alkyl group. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range. Specific examples of the C2-C12 alkoxyalkyl group include a methoxymethyl group, an ethoxymethyl group, a 2-methoxyethyl group, and a 2-ethoxyethyl group.
  • the C2-C7 alkyloxycarbonyl group represents a carbonyl group bonded to the C1-C6 alkoxy group.
  • Specific examples of the C2-C7 alkyloxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, a propyloxycarbonyl group, an isopropyloxycarbonyl group, a 1-butyloxycarbonyl group, a 2-butyloxycarbonyl group, and a 1-pentyloxycarbonyl group. Group, 1-ethylpropyloxycarbonyl group, 1-hexylcarbonyl group and the like.
  • the C1-C6 alkylthio group is a group in which a sulfur atom is bonded to the C1-C6 alkyl group.
  • Specific examples of the C1-C6 alkylthio group include methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec-butylthio group, t-butylthio group, pentylthio group, isopentylthio group, 2 -Methylbutylthio group, neopentylthio group, 1-ethylpropylthio group, hexylthio group, 4-methylpentylthio group, 3-methylpentylthio group, 2-methylpentylthio group, 1-methylpentylthio group, 3 , 3-dimethylbutylthio group, 2,2-dimethylbutylthio group, 1,1-
  • the C2-C7 acyl group represents a carbonyl group bonded to the C1-C6 alkyl group.
  • Specific examples of the C2 to C7 acyl group include acetyl group, propanoyl group, 1-butanoyl group, 2-methylpropanoyl group, 1-pentanoyl group, 2-methylbutanoyl group, 1-hexanoyl group, 2-methylpenta Examples include noyl group and 2-ethylbutanoyl group.
  • the C3-C8 alkylsulfonylethyl group represents a group in which the C1-C6 alkyl group is bonded to the sulfur atom of the sulfonylethyl group. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range.
  • Examples of the C3-C8 alkylsulfonylethyl group include 2-methylsulfonylethyl group, 2-ethylsulfonylethyl group, 2- (1-propylsulfonyl) ethyl group, 2- (2-propylsulfonyl) ethyl group, 1-methyl- 2-methylsulfonylethyl group, 1-ethyl-2-methylsulfonylethyl group, 2-methyl-2-methylsulfonylethyl group, 2-ethyl-2-ethylsulfonylethyl group, 1-methyl-2-methyl-2-methyl A sulfonylethyl group etc. are mentioned.
  • the aryl group represents a C6 to C14 1 to 3 aromatic ring.
  • Specific examples of the aryl group include a phenyl group, a naphthyl group, and an anthracenyl group.
  • the heteroaryl group represents a 5- to 14-membered 1 to 3 ring aromatic ring containing one or two or more identical or different ring-constituting heteroatoms.
  • the kind of hetero atom is not specifically limited, A nitrogen atom, an oxygen atom, a sulfur atom, etc. can be illustrated.
  • heteroaryl groups include furyl, thienyl, pyrrolyl, oxazolyl, isoxazolyl, dihydroisoxazolyl, thiazolyl, isothiazolyl, imidazolyl, pyrazolyl, oxadiazolyl, thiadiazolyl, triazolyl , Tetrazolyl group, pyridyl group, azepinyl group, oxazepinyl group, etc.
  • the aralkyl group represents a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted with the aryl group.
  • Specific examples of the aralkyl group include benzyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, anthracenylmethyl group, phenanthrenylmethyl group, acenaphthylenylmethyl group, diphenylmethyl group, 1-phenethyl group.
  • 2-phenethyl group 1- (1-naphthyl) ethyl group, 1- (2-naphthyl) ethyl group, 2- (1-naphthyl) ethyl group, 2- (2-naphthyl) ethyl group, 3-phenylpropyl Group, 3- (1-naphthyl) propyl group, 3- (2-naphthyl) propyl group, 4-phenylbutyl group, 4- (1-naphthyl) butyl group, 4- (2-naphthyl) butyl group, 5- Phenylpentyl group, 5- (1-naphthyl) pentyl group, 5- (2-naphthyl) pentyl group, 6-phenylhexyl group, 6- (1-naphthyl) hexyl group, 6- (2-naphthyl) ) Hexyl group
  • the C3-C10 cycloalkyl ring includes a cyclopropyl ring, a cyclobutyl ring, a cyclopentyl ring, a cyclohexyl ring, a cycloheptyl ring, a cyclooctyl ring, and the like.
  • the N-hydroxyalkaneimidoyl group includes a hydroxyiminomethyl group, an N-hydroxyethaneimidoyl group, an N-hydroxypropanimidyl group, an N-hydroxybutanimidoyl group, and the like.
  • 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyethanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include a dioxanyl group and a 1,4-dioxanyl group.
  • the pest control composition of the present invention (hereinafter sometimes simply referred to as the composition of the present invention) is a pyridone compound represented by the following formula (1) or a salt thereof (herein, simply represented by the formula (1)).
  • R1 in the formula (1) is a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-C8 optionally substituted with a substituent A.
  • a hydrogen atom or an alkyl group C1 ⁇ C6,) represents a.
  • R1 is a cyano group, a C1-C6 alkyl group optionally substituted with the substituent A, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with the substituent A, a substituted group.
  • a C1-C6 alkyl group or a C1-C6 haloalkyl group which may be optionally substituted with the substituent A is preferable.
  • the “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, R12R13N.
  • R12 and R13 are each independently a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 are , Together with the nitrogen atom to which it is attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (where R14 is represents a C1 alkyl group ⁇ C6 or C1 ⁇ C6 haloalkyl group,, L1 is, S, SO, or SO 2 Represents at least one selected from the group consisting of:
  • the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or R14-L1- (wherein R14 and L1 are as defined above), In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent A examples include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclo
  • substituent A a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; R12R13N- (wherein R12 and R13 have the same meanings as described above), dimethylamino group, ethylmethylamino group, and diethylamino group; And R14-L1- (wherein R14 and L1 are as defined above) include a methylthio
  • R1 in the formula (1) includes a hydroxyl group and a cyano group.
  • the C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkyl group” in R1 of the formula (1) has the same definition as described above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, a 2,2,2-trifluoro group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group of the “C2-C6 alkenyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyl group” in R1 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or A 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, more preferably a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkynyl group” in R1 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl Or a 4,4,4-trifluoro-2-butynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkoxy group” in R1 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group in the “C3-C8 cycloalkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted with the substituent A.
  • the C2-C6 alkenyloxy group of “C2-C6 alkenyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyloxy group” in R1 of the formula (1) has the same definition as above, preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro An allyloxy group or a 3,3-difluoroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
  • the C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
  • the “C3-C6 haloalkynyloxy group” in R1 of the formula (1) has the same definition as described above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- A difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 -Butynyloxy group or 4,4,4-trifluoro-2-butynyloxy group.
  • R10R11N— The C1-C6 alkyl group of “R10R11N—” in R1 of the formula (1) (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group) Synonymous with definition.
  • R10R11N— is preferably an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group, more preferably an amino group and a dimethylamino group.
  • R2 is a halogen atom, a hydroxyl group, a cyano group, a nitro group, a C1-C6 alkyl group that may be optionally substituted with a substituent B, a C1-C6 haloalkyl group, and a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent B, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent B, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent B, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent B, substituted C2-C6 alkenyloxy group optionally substituted with group B, C2-C6 haloalkenyloxy group, C3-
  • R24C ( ⁇ O) N (R25) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is a hydrogen atom or a substituent B1. Place Which may be C1 ⁇ C6 alkyl group, a cycloalkyl group of haloalkyl group having C1 ⁇ C6 or C3 ⁇ C8,. ).
  • R2 is a halogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C1-C6 optionally substituted with a substituent B.
  • Substituent B in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2 To C6 alkoxyalkoxy groups, R21R22N- (wherein R21 and R22 are as defined above), R23-L2- (wherein R23 and L2 are as defined above), R26R27R28Si- ( Here, R26, R27, and R28 are each independently a C1-C6 alkyl group.), R26R27R28Si— (CH 2 ) s—O— (wherein s is an integer of 1 to 3) R26, R27, and R28 are as defined above, R20C ( ⁇ O) — (wherein R20 is as defined above for R20), and ⁇ Represents at least one member selected from the group consist
  • the substituent B is a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C2-C6 alkoxyalkoxy group, R23-L2- (wherein R23 and L2 are as defined above).
  • R26R27R28Si— wherein R26, R27, and R28 are as defined above
  • R26R27R28Si— CH 2 ) s—O—
  • s, R26, R27, and R28 are R20C ( ⁇ O) —
  • R20 is as defined above
  • a 3- to 6-membered ring group containing 1 to 2 oxygen atoms is preferred, In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • Preferred specific examples of the substituent B include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a
  • substituent B a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; A methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group as the C2-C6 alkoxyalkoxy group; R21R22N— (wherein R21 and R22 have the same meanings as described above),
  • Examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,3-dioxolanyl group and a 1,3-dioxanyl group.
  • the “substituent B1” in the formula (1) is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group.
  • the substituent B1 is preferably a cyano group or a C1-C6 alkoxy group.
  • substituent B1 examples include a cyano group;
  • a C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
  • C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
  • examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
  • substituent B1 a cyano group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
  • the halogen atom in R2 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
  • R2 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
  • the C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group, or an isopropyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent B.
  • the “C1-C6 haloalkyl group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, and preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent B.
  • the C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent B” in R2 of formula (1) has the same definition as above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkenyl group” in R2 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkynyl group” in R2 of the formula (1) has the same definition as above, preferably 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, preferably a methoxy group, an ethoxy group Propyloxy group, isopropyloxy group, butoxy group, isobutoxy group or pentyloxy group, more preferably methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group or pentyloxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent B.
  • the “C1-C6 haloalkoxy group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group of the “C3-C8 cycloalkoxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent B.
  • the C2-C6 alkenyloxy group of the “C2-C6 alkenyloxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a vinyloxy group, A 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group, or a 3-butenyloxy group, and more preferably a vinyloxy group, a 1-propenyloxy group, or an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same definition as above, and preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or 2,2-difluoro It is a vinyloxy group.
  • the C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent B” in R2 of formula (1) is as defined above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent B.
  • the “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyloxy group, a 4-chloro-4,4-difluoro group.
  • R20C ( ⁇ O) — in R2 of the formula (1) (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently a hydrogen atom or a C1-C6 group optionally substituted with a substituent B1).
  • R20C ( ⁇ O) — is preferably an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, a 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinylcarbonyl group, and piperidinylcarbonyl group More preferably, acetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl
  • R20 of “R20C ( ⁇ O) O—” in R2 of the formula (1) has the same meaning as described above.
  • “R20C ( ⁇ O) O—” is preferably an acetyloxy group, a propionyloxy group, a difluoroacetyloxy group, a trifluoroacetyloxy group, a cyclopropanecarbonyloxy group, a methoxycarbonyloxy group, an ethoxycarbonyloxy group, 2 , 2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group Group, pyrrolidinylcarbonyloxy group, and piperidinylcarbonyloxy group, more preferably acetyloxy group,
  • Shi group methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylamino carbonyloxy groups, and diethylamino carbonyl group.
  • the “3- to 6-membered ring group containing 1 to 2 oxygen atoms” in R2 of the formula (1) has the same definition as above, and preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group Or a 1,3-dioxanyl group, and more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
  • R23-L2- in R2 of Formula (1) (wherein R23 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L2 represents S, SO, or SO 2 ). ) Are as defined above. “R23-L2-” is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, a trifluoromethanesulfonyl group, a (chloromethyl) thio group, or a (chloromethane) sulfinyl group.
  • chloromethane sulfonyl group, more preferably, methylthio group, methanesulfinyl group, methanesulfonyl group, (chloromethyl) thio group, (chloromethane) sulfinyl group, and (chloromethane) sulfonyl group. It is done.
  • R21 and R22 of “R21R22N-” in R2 of the formula (1) have the same meanings as described above.
  • “R21R22N—” preferably includes an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group, and more preferably a dimethylamino group, an ethylmethylamino group, and a diethylamino group. Is mentioned.
  • R24C ( ⁇ O) N (R25) — in R2 of the formula (1) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group) , C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are as defined above), and R25 represents hydrogen.
  • R24 is preferably a hydrogen atom, methyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy.
  • Group cyclopropyloxy group, amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group, and more preferably a hydrogen atom, a methyl group, a difluoromethyl group, a trifluoromethyl group.
  • R25 is preferably a hydrogen atom, methyl group, ethyl group, propyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, cyanomethyl group, 2-cyanoethyl group, 2,2-difluoroethyl.
  • Group, 2,2,2-trifluoroethyl group, and cyclopropyl group more preferably hydrogen atom, methyl group, ethyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, A cyanomethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group can be mentioned.
  • N in the formula (1) is an integer of 0 to 5.
  • n 2 or more
  • two or more R2s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • R3 in formula (1) may be optionally substituted with a hydrogen atom, a halogen atom, a nitro group, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, or a substituent C.
  • R3 is a hydrogen atom, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with a substituent C, a C3-C8 cycloalkyl group that may be optionally substituted with a substituent C, or a substituent C as appropriate.
  • a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C is preferable.
  • the “substituent C” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, R31R32N. -(Wherein R31 and R32 are as defined above for R21 and R22), and R30-L3- (wherein R30 is as defined above for R14, and L3 is as defined above for L1).
  • the substituent C is preferably a cyano group, a C1-C6 alkoxy group, or R30-L3- (wherein R30 and L3 are as defined above), In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent C examples include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a
  • substituent C a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; R31R32N— (wherein R31 and R32 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group; And R30-L3- (wherein R30 and L3 are as defined above) include
  • R3 in the formula (1) includes a hydrogen atom and a nitro group.
  • the “halogen atom” in R3 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
  • the C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with substituent C” in R3 of the formula (1) has the same definition as described above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, or a propyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkyl group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with the substituent C.
  • the “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent C” in R3 of formula (1) is as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyl group” in R3 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkynyl group” in R3 of the formula (1) has the same definition as described above, and is preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
  • R30-L3- in R3 of the formula (1), R30 has the same meaning as R23, and L3 has the same meaning as L2.
  • R30-L3- preferably includes a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group. Groups, and methanesulfonyl groups.
  • R31R32N— in R3 of the formula (1) has the same meaning as R21 and R22, and is preferably an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, or A piperidinyl group, more preferably a dimethylamino group, an ethylmethylamino group, or a diethylamino group.
  • R33C ( ⁇ O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group) in R3 of the formula (1).
  • Terminology is as defined above.
  • “R33C ( ⁇ O) —” preferably includes an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, and a cyclopropanecarbonyl group, and more preferably an acetyl group, a difluoroacetyl group, and a triphenyl group.
  • a fluoroacetyl group is mentioned.
  • X in the formula (1) represents an oxygen atom or a sulfur atom.
  • Preferred X is an oxygen atom.
  • Y in Formula (1) represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0-2.
  • “Substituent D” in formula (1) is selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group Represents at least one kind.
  • the substituent D is preferably a halogen atom or a C1-C6 alkyl group, In particular, a halogen atom is preferable.
  • substituent D As a preferable specific example of the substituent D, As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom; A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group; A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group; And C1-C6 haloalkoxy groups include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-d
  • examples of the C1-C6 haloalkoxy group include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group.
  • the “substituent D1” in formula (1) is a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 And at least one selected from the group consisting of C3-C8 cycloalkoxy groups.
  • the substituent D1 is preferably a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkyl group, More preferably, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkoxy group is preferable.
  • substituent D1 a hydroxyl group;
  • a halogen atom a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
  • a methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
  • a C3-C8 cycloalkyl group a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
  • a C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group,
  • substituent D1 a hydroxyl group; A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom; A methyl group and an ethyl group as the C1-C6 alkyl group; A difluoromethyl group and a trifluoromethyl group as a C1-C6 haloalkyl group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; As the C3-C8 cycloalkoxy
  • Y is a phenyl group
  • Y is represented by the formula (a) (Wherein D and D1 are as defined above, and ma represents an integer of 0 to 4).
  • ma represents an integer of 0 to 4.
  • 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • the ortho position means the position of the phenyl group having the substituent D as shown in the formula (a).
  • the phenyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • a preferred combination of the formula (a) is a 2-D-6-D1-phenyl group, a 2-D-4-D1-phenyl group, or a 2-D-4-D1-6-D1-phenyl group.
  • 2-D-6-D1-phenyl group means a disubstituted phenyl group having a substituent D at the 2-position and a substituent D1 at the 6-position, and the following description is also the same.
  • Y is a group represented by the formula (b) (Wherein D and D1 are as defined above, and mb represents an integer of 0 to 3).
  • G1, G2, G3 and G4 in the formula (b) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3 and G4 is a nitrogen atom. Preferred G1, G2, G3 and G4 are any one of G1, G2, G3 and G4 being a nitrogen atom. That is, it is a pyridyl group.
  • mb represents an integer of 0 to 3. When mb in the formula (b) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • the ortho position means a 6-membered ring having a substituent D as shown in the formula (b).
  • Means the position of Specific examples of the partial structure of the formula (b) are shown below.
  • a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • Preferred combinations of formula (b) are 3-D-2-pyridyl group, 3-D-5-D1-2-pyridyl group, 2-D-3-pyridyl group, 2-D-4-D1-3- Pyridyl group, 2-D-6-D1-3-pyridyl group, 2-D-4-D1-6-D1-3-pyridyl group, 4-D-3-pyridyl group, 4-D-2-D1- 3-pyridyl group, 4-D-6-D1-3-pyridyl group, 4-D-2-D1-6-D1-3-pyridyl group, 3-D-4-pyridyl group, or 3-D-5 -D1-4-pyridyl group.
  • Y is a group represented by the formula (c-1) Formula (c-2) Or the formula (c-3) (Wherein D and D1 are as defined above, and mc represents an integer of 0 to 2).
  • G5 and G6 in formula (c-1), formula (c-2) and formula (c-3) are each independently a carbon atom or a nitrogen atom.
  • mc represents an integer of 0 to 2.
  • D1 in 2 represents an independent substituent, and may be the same or different and arbitrarily selected can do.
  • the ortho position is represented by the formula (c-1), the formula (c-2), and the formula (c-3).
  • the thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • the bond including the broken line in Equation (1) is This represents the location represented by.
  • the bond including the broken line part in Formula (1) represents a double bond or a single bond.
  • R3 in the formula (1b) is a substituent other than hydrogen, only one of the R-form and S-form, or a mixture of the R-form and the S-form in an arbitrary ratio.
  • the compound represented by formula (1) may have one or two axial asymmetry.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by Formula (1) may contain an asymmetric atom.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by Formula (1) may contain geometric isomers.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by the formula (1) may be able to form a salt.
  • a salt examples thereof include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, and metal salts such as sodium, potassium and calcium, but are not particularly limited as long as they can be used as agricultural chemicals.
  • specific compounds of the pyridone compound represented by the formula (I) according to the present invention include the structural formula shown in Table 1, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. It is represented by the combination. These compounds are for illustrative purposes, and the present invention is not limited thereto.
  • the description “2-F—” in Table 2 means that a fluorine atom is bonded to the 2-position of the phenyl group to which (R2) n is bonded, and “2-F-3”
  • the description “—HO—” means that a fluorine atom is bonded to the 2-position and a hydroxyl group is bonded to the 3-position.
  • the description of “2,3-di-F” means that the 2-position and 3 This means that a fluorine atom is bonded to the position, and other descriptions are the same.
  • R4 is a hydrogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group that may be optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with the group A, a C2-C6 haloalkenyloxy group, a C3-C8
  • Production method A is a method for obtaining a compound represented by the formula (1b-a) containing the compound of the present invention and a production intermediate of the compound of the present invention, wherein the compound represented by formula (3) and R4NH 2 are obtained. , A production method comprising reacting in the presence of an acid.
  • R4NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product.
  • R4NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
  • R4NH 2 used in this reaction may if 1 equivalent or more relative to the compound represented by formula (3), but are not particularly limited as long as the reaction proceeds to the desired, preferably, 1 Equivalent to 200 equivalents.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid, and p-toluenesulfonic acid, and are particularly limited as long as the target reaction proceeds. Although not preferred, acetic acid is preferred. Further, when using salts with R4NH 2 and the acidic compound, the use of acid is not essential.
  • the amount of the acid used in this reaction may if 1 equivalent or more relative to the R4NH 2, is not limited in particular as long as the reaction proceeds to the desired, preferably, one or more equivalents 200 equivalent or less is there.
  • the acid to be used is a liquid, it can also be used as a solvent.
  • a solvent can be used for this reaction, it is not necessarily essential.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran, dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc.
  • Ester solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea systems such as 1,3-dimethyl-2-imidazolidinone solvent Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the solvent is preferably an acidic solvent, more preferably acetic acid.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the compound represented by formula (2) which can be produced when R4 represents a hydrogen atom in the compound represented by formula (1b-a), It can be a useful production intermediate for obtaining the compound represented by 1b).
  • a specific example of the production intermediate represented by the formula (2) is represented by a combination of the structural formula shown in Table 3, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
  • Lv represents a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a leaving group such as a halogen atom, and R1, R2, R3, X, Y, and n are as defined above.
  • Production method B is a method for obtaining a compound represented by formula (1b), which comprises reacting the production intermediate represented by formula (2) with R1Lv in a solvent in the presence of a base. It is a manufacturing method.
  • R1Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R1Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, but are particularly limited as long as the intended reaction proceeds. It will never be done.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Ch
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (2). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • SR represents a sulfurizing agent
  • R1, R2, R3, Y, and n are as defined above.
  • Production method C is a production method for obtaining a compound represented by formula (1b-c) among the compounds represented by formula (1b), wherein the compound represented by formula (1b-b) is sulfurated. It is a manufacturing method including making an agent (SR) react in a solvent.
  • SR agent
  • sulfurizing agent examples include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
  • the amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (1b-b), and is not particularly limited as long as the target reaction proceeds. However, it is preferably 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained after the solvent is distilled off can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3a is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C2-C6 alkenyl group optionally substituted with C, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, or C2-C6 haloalkynyl group , Lv, R1, R2, X, Y, and n are as defined above.
  • R3a is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • R3aLv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R3aLv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but is preferably Is 1 equivalent or more and 1.8 equivalent or less.
  • Bases used in this reaction include metal hydrides such as sodium hydride, organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane
  • metal hydrides such as sodium hydride
  • organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane
  • metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-d). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from ⁇ 80 ° C. to 100 ° C. or the boiling point of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent that is not compatible with water such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • Ox represents an oxidizing agent
  • R1, R2, R3, X, Y, and n are as defined above.
  • Production method E is a method for obtaining a compound represented by formula (1a), which comprises reacting a compound represented by formula (1b) with an oxidizing agent (Ox) in a solvent. is there.
  • oxidizing agent used in this reaction examples include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, and benzoyl peroxide.
  • the oxidizing agent is a metal oxide.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 200 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the oxidizing agent is a benzoquinone.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 20 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the oxidizing agent is a combination of a radical initiator and a halogenating agent. If the amount of the radical initiator and the halogenating agent used in this reaction is 0.01 equivalent or more and 1.0 equivalent or more with respect to the compound represented by the formula (1b), the target reaction proceeds. As long as it does, it will not specifically limit.
  • the radical initiator is 0.01 equivalent to 1 equivalent and the halogenating agent is 1 equivalent to 3 equivalent.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • halogenated benzene solvents such as chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • the solvent include halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent that is not compatible with water such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3b represents a halogen atom
  • HalR represents a halogenating agent
  • R1, R2, X, Y, and n are as defined above.
  • Production method F is a production method for obtaining a compound represented by formula (1a-b) in which R3b represents a halogen atom among the compounds represented by formula (1a), which is represented by formula (1a-a). And a halogenating agent (HalR) in a solvent.
  • selectfluoro N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-a). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
  • the halogenating agent used in this reaction is an iodinating agent
  • an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid.
  • the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1a-a), although it does not restrict
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-a). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3c is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C
  • J represents an oxygen atom or a sulfur atom
  • Q represents a hydrogen atom or a metal
  • R1, R2, R3b, X, Y, and n have the same meanings as described above.
  • R3c is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • C3-C8 cycloalkyl group C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C Or a haloalkynyl group of C2 to C6, wherein J is an oxygen atom or a sulfur atom, and is a method of synthesizing a compound represented by the formula (1a-b) A compound obtained by a coupling reaction in which R3c-JQ is reacted in the presence of a transition metal.
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • R3c-JQ used in this reaction is obtained as a commercial product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of R3c-JQ used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b).
  • Q is a hydrogen atom, it can also be used as a solvent.
  • the transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • a ligand such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • the amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. None happen.
  • triphenylphosphine 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t -A phosphine ligand such as butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the base used in this reaction is an inorganic base such as sodium carbonate, potassium carbonate or cesium carbonate, or an organic base such as triethylamine, tributylamine or diisopropylethylamine.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but R3c-JH (wherein R3c has the same meaning as described above and J is an oxygen atom).
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3d is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents an optionally substituted C2-C6 alkenyl group or C2-C6 haloalkenyl group, R3d-B represents an organic boronic acid, and R1, R2, R3b, X, Y and n are as defined above. It is.
  • R3d in the compound represented by the formula (1a) is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • a compound represented by the formula (1a-d) which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, or a C2-C6 haloalkenyl group.
  • a method of synthesis comprising obtaining a compound of formula (1a-b) and an organoboronic acid (R3d-B) by a Suzuki-Miyaura coupling in the presence of a transition metal and a base Is the method.
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • R3d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or produced by a known method.
  • the amount of R3d-B used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
  • the transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand.
  • Palladium is mentioned.
  • the amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. None happen.
  • phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • reaction mixture containing the compound represented by the formula (1a-d) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by formula (1a-d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C
  • R1, R2, R3b, X, Y and n are as defined above.
  • R3e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C (1a-)
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • the terminal alkyne compound used in this reaction can be obtained as a commercial product or produced by a known method. Trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to perform desilylation after introducing a trimethylsilylethynyl group into the compound represented by the formula (1a-b).
  • For the desilylation Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009), Journal of the American Chemical Society. And Journal of Organometallic Chemistry (Vol. 696, No. 25, pages 4039-4045 (2011)), Journal of Organometallic Chemistry (Journal of Organometallic Chemistry). It can carry out with reference to nonpatent literatures, such as.
  • the amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
  • the transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • a ligand such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
  • the amount of the transition metal used in this reaction may be 0.001 equivalent or more with respect to the compound represented by the formula (1a-b) for palladium and the like, respectively, and the target reaction proceeds. There is no particular limitation as long as it does. A preferable amount is 0.001 equivalent or more and 1 equivalent or less for both.
  • Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine
  • inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the organic base when it is liquid, it can be used as a solvent.
  • a phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to allow the reaction to proceed efficiently, but it is not essential. .
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, tri
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more of them can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-e) obtained after the solvent is distilled off can be purified with an appropriate solvent by washing, reprecipitation, recrystallization, column chromatography or the like. What is necessary is just to set suitably according to the target purity.
  • R2a represents a C1 to C6 alkoxy group
  • nb represents an integer of 0 to 4 (provided that when nb is 2 or more, each of R2 and 2 represents an independent substituent)
  • R1 , R2, R3, X, Y and the broken line part have the same meanings as described above.
  • Production method J is a method for synthesizing a compound represented by formula (1-b) having a hydroxyl group among the compounds represented by formula (1), wherein R2a is a C1-C6 alkoxy group ( This is a production method comprising obtaining the compound represented by 1-a) by reacting with an acid.
  • the acid used for this reaction includes boron halides such as boron trichloride and boron tribromide.
  • the amount of acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-a), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, and nitrile solvents such as acetonitrile. And halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-a). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from ⁇ 80 ° C. to 100 ° C. or the boiling point of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • a desiccant such as sodium sulfate or magnesium sulfate
  • the reaction mixture containing the compound represented by the formula (1-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2b—O— is a C1-C6 alkoxy group optionally substituted with the substituent B, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy optionally substituted with the substituent B.
  • R2b—O— may be optionally substituted with a substituent B, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a substituent C3-C8 cycloalkoxy group optionally substituted with B, C2-C6 alkenyloxy group optionally substituted with substituent B, C2-C6 haloalkenyloxy group, optionally substituted with substituent B
  • a process for synthesizing a compound represented by formula (1-b) comprising reacting a compound represented by formula (1-b) with R2b-Lv in a solvent in the presence of a base.
  • R2b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • R2b-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Ch
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2c represents a halogen atom
  • R2d is a C1-C6 alkyl group optionally substituted with the substituent B, a C1-C6 haloalkyl group, a C3-C8 optionally substituted with the substituent B
  • R2d-B represents an organic boronic acid, R1, R2, R3, nb, X, Y, and the broken line are as defined above.
  • R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B.
  • R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B.
  • the compound represented by the formula (1-e) which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with the substituent B, or a C2-C6 haloalkenyl group.
  • a synthesis method comprising obtaining by a Suzuki-Miyaura coupling in which a compound represented by the formula (1-d) and an organic boronic acid (R2d-B) are reacted.
  • R2c is preferably a chlorine atom, a bromine atom, or an iodine atom.
  • production method H By using the compound represented by formula (1a-b) and R3d-B in production method H instead of the compound represented by formula (1-d) and R2d-B, respectively, production method H
  • the production method L can be carried out according to the above.
  • R2e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with the substituent B, and R1, R2, R2c, R3, nb, X, Y and the broken line part It is synonymous with the above.
  • R2e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with a substituent B
  • a method for synthesizing the compound represented by f which comprises obtaining the compound represented by the formula (1-d) by Sonogashira coupling with a terminal alkyne compound.
  • R2c is a chlorine atom, a bromine atom, or an iodine atom.
  • the production method M can be carried out according to the production method I. .
  • Da represents a halogen atom
  • D1a represents a halogen atom
  • D1b represents a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group
  • E represents a halogen atom.
  • R 1, R 2, R 3, n, X, Q, and a broken line part are as defined above.
  • D1b is a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group
  • E is a halogen atom.
  • D1b-Q used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of D1b-Q used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). Preferably, it is 1 equivalent or more and 30 equivalent or less. Moreover, when Q represents a hydrogen atom, it can be used as a solvent.
  • the base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride. Further, when Q is an alkali metal, the use of a base is not essential.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). 1 equivalent or more and 30 equivalent or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but alcohol solvents represented by D1b-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, chloroform, carbon te
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-g). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2e represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B
  • R2f represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B
  • R2g represents a halogen atom.
  • HalR, R1, R3, X, Y and the broken line part are as defined above.
  • R2e is a C1-C6 alkoxy group which may be appropriately substituted with the substituent B
  • R2f may be appropriately substituted with the substituent B.
  • selectfluoro N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-i). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
  • the halogenating agent used in this reaction is an iodinating agent
  • an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid.
  • the halogenating agent used in this reaction is an iodinating agent
  • the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1-i), and the target reaction
  • it is 0.1 equivalent or more and 3 equivalent or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but usually 3 to 200 times by weight with respect to the compound represented by the formula (1-i). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • La represents S
  • Lb represents SO or SO 2
  • Ox ′ represents an oxidizing agent
  • Production method P during the compound represented by formula (1) a process for the preparation of a compound represented by R1, Lb contained in R2 and R3 is SO or SO 2 wherein (Lb), the formula ( In 1), it is a production method comprising reacting a compound represented by the formula (La) in which La contained in R1, R2 or R3 is S with an oxidizing agent (Ox ′) in a solvent.
  • oxidizing agent used in this reaction examples include peroxides such as hydrogen peroxide and meta-chloroperbenzoic acid.
  • transition metals such as sodium tungstate can be added.
  • the amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalent or less with respect to the compound represented by the formula (La) when producing SO, and produces SO 2 . When doing, it is usually 2 equivalents or more and 10 equivalents or less. Moreover, when adding transition metals, it is 0.001 equivalent or more and 1 equivalent or less normally.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • examples thereof include benzene solvents, nitrile solvents such as acetonitrile, and halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 times the weight of the compound represented by the formula (1) having the formula (La). More than 200 weight times.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 10 ° C. or higher and 120 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2, R3, R5, n, X and Y have the same meanings as described above.
  • Production method Q is a production method of a production intermediate represented by formula (3), in which a compound represented by formula (4) and a compound represented by formula (5) are mixed in a solvent in the presence of a base. It is a manufacturing method including making it react with.
  • the compound represented by the formula (4) used in this reaction is, for example, Green Chemistry, Vol. 41, pages 580-585, The Journal of Organic Chemistry, No. 65, No. 20, pages 6458-6461 (2000). Etc. can be synthesized by reference.
  • the compound represented by Formula (5) used for this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of the compound represented by the formula (5) used in this reaction is particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (4). However, it is preferably 1 equivalent or more and 3 equivalents or less.
  • the base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • the base used in this reaction can be carried out in a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but preferably the compound represented by formula (4) is used. On the other hand, it is 0.01 equivalent or more and 3 equivalent or less.
  • Solvents used in this reaction are ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea solvents such as imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, sulfur solvents such as dimethyl sulfox
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (4). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 50 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (3) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (3) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (3) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R5a represents a C1 to C6 alkyl group
  • R2, R3, n, X, and Y are as defined above.
  • Production method R is a production method of a production intermediate represented by formula (3b) among the compounds represented by formula (3), wherein the compound represented by formula (3a) is subjected to acidic conditions or a base. It is a manufacturing method including making it react in a solvent on sexual conditions.
  • the reaction under acidic conditions will be described.
  • the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid.
  • inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid
  • organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid.
  • the amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds.
  • the amount of the acid is 0. 0 with respect to the compound represented by the formula (3a). 01 equivalents or more.
  • liquid acids can be used as solvents.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-d
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 0 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, but are not particularly limited as long as the target reaction proceeds.
  • the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by formula (3a), but preferably 1 equivalent or more. 30 equivalents or less,
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Solvents alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Solvents, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 20 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • reaction under acidic conditions and the reaction under basic conditions can be performed by a common method.
  • a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. are dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, saline, etc. are optional.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (3b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (3b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by formula (3b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography, etc. with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the compound represented by the formula (3b) is represented by the formula (3b ′) (Wherein R2, R3, n, X and Y are as defined above.)
  • the compound represented by the formula (3b ′) can be handled in the same manner as the compound represented by the formula (3b), and the production method A can be applied. Further, the compound represented by the formula (3b ′) contains an asymmetric carbon, but the isomer mixing ratio may be single or a mixture of any ratio. Further, it may be a mixture of the compound represented by the formula (3b) and the compound represented by the formula (3b ′), and the isomer mixing ratio may be a single compound or a mixture of any ratio.
  • the compound represented by the formula (1) can be produced by arbitrarily combining the production methods A to R shown above. Alternatively, the compound represented by the formula (1) can also be produced by arbitrarily combining known methods and production methods A to R.
  • R2a and R2b in the formula (2a) and the formula (2b) are each independent, a C1-C6 alkyl group which may be appropriately substituted with a substituent E1, an aryl group which may be optionally substituted with a substituent E2, Represents a heteroaryl group optionally substituted with a substituent E3, or an aralkyl group optionally substituted with a substituent E2, or R2a and R2b together with the carbon atom to which they are bonded together A C3-C10 cycloalkyl ring optionally substituted with E4 may be formed.
  • R2a and R2b are independent of each other, and are preferably a C1-C6 alkyl group, particularly a C1-C6 alkyl group, and more preferably a methyl group, which may be appropriately substituted with the substituent E1.
  • R2c and R2d in the formula (2a) and the formula (2b) are each independently a hydrogen atom, a C1-C6 alkyl group, a halogen atom, a C1-C6 alkoxy group which may be optionally substituted with a substituent E1, Or a hydroxyl group, or R2c and R2d together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with a carbonyl group or substituent E4.
  • R2c and R2d are independent of each other, and are preferably a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent E1, particularly a C1-C6 alkyl group, or a halogen atom.
  • a group or a fluorine atom is more preferred.
  • R2e in the formulas (2a) and (2b) represents a hydrogen atom, a C2 to C7 acyl group, or a C1 to C6 alkyl group optionally substituted with a substituent E1.
  • R2e is preferably a hydrogen atom or a C1-C6 alkyl group which may be optionally substituted with a substituent E1, particularly a C1-C6 alkyl group, and more preferably a hydrogen atom or a methyl group. Most preferred is a hydrogen atom.
  • X1 in formula (2a) and formula (2b) is a halogen atom, a C1-C6 alkyl group optionally substituted with a substituent E5, a C2-C6 alkenyl group optionally substituted with a substituent E6, C2-C6 alkynyl group optionally substituted with substituent E7, aryl group optionally substituted with substituent E2, heteroaryl group optionally substituted with substituent E3, alkoxy group with C1-C6 Represents an amino group optionally substituted with a substituent E8, an acyl group of C2 to C7, a cyano group, or an N-hydroxyalkaneimidoyl group in which a hydrogen atom of a hydroxyl group may be substituted with a substituent E9.
  • X1 is preferably a halogen atom, more preferably a fluorine atom.
  • X2 in the formulas (2a) and (2b) represents a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group or a hydroxyl group.
  • X2 is preferably a halogen atom, more preferably a fluorine atom.
  • n1 represents an integer of 0 to 4
  • n2 represents an integer of 0 to 6.
  • n1 is preferably an integer of 0 to 1
  • n2 is preferably an integer of 0 to 2, particularly preferably an integer of 0 to 1.
  • the substituent E1 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C1-C6 alkylthio group, and a phenoxy group.
  • the substituent E2 in the formula (2a) and the formula (2b) is a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, or an amino optionally substituted with a substituent E8. And at least one selected from the group consisting of a group, a nitro group, a cyano group, a hydroxyl group, a mercapto group, and a C1-C6 alkylthio group.
  • the substituent E3 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, and a C1-C6 alkoxy group. .
  • the substituent E4 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, and a phenoxy group.
  • the substituent E5 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a hydroxyl group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group. .
  • the substituent E6 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group.
  • the substituent E7 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group and a phenoxy group.
  • the substituent E8 in the formulas (2a) and (2b) is at least one selected from the group consisting of C1-C6 alkyl groups and C2-C7 acyl groups.
  • Substituent E9 in formula (2a) and formula (2b) is selected from the group consisting of C1-C6 alkyl groups, C2-C6 alkenyl groups, C2-C6 alkynyl groups, aralkyl groups, aryl groups and heteroaryl groups Is at least one kind.
  • the quinoline compound represented by the formula (2a) or the formula (2b) is represented by the formula (2c) or the formula (2d).
  • R2f represents a hydrogen atom or a methyl group
  • X3, X4 and X5 each independently represent a hydrogen atom or a fluorine atom
  • X6 and X7 each independently represent a hydrogen atom, a methyl group or a fluorine atom.
  • the quinoline type compound represented by this is preferable.
  • a quinoline compound represented by the formula (2a) or (2b) 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (compound number: (2) -1), 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (compound number: (2) -2), 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline (compound number: (2) -3), Or 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (compound number: (2) -4) Most preferably.
  • the quinoline compound represented by the above formula (2c) or (2d), wherein X3 or X4, and particularly X3 is a fluorine atom, is gray mold disease, rice blast disease, apple black spot disease, cucumber anthracnose It has been found that the effect is remarkably improved against diseases such as diseases, which is preferable.
  • a certain quinoline compound or a salt thereof is preferable because it exhibits a remarkable effect on diseases such as gray mold disease, rice blast disease, apple black spot disease, and cucumber anthracnose.
  • the quinoline compounds (2) -2, (2) -3, and (2) -4 are preferable, and the quinoline compounds (2) -2 and (2) -3 are particularly preferable.
  • the quinoline compounds (2) -3 and (2) -4 have an environmental kinetic property that has a half-life of 7 to 55 days in a soil residual test in a container and a remarkably low soil residual property. This is also found and preferred.
  • quinoline-based compound represented by the formula (2a) or the formula (2b) its biological activity or a method for controlling pests using the component can be determined according to known literature (for example, International Publication No. 05/070917 or International Publication No. 08/0666148) may be referred to.
  • known literature for example, International Publication No. 05/070917 or International Publication No. 08/0666148
  • it is well-known literature for example, international publication 05/070917, international publication 08/066148, international Reference can be made to publication 13/047749, international publication 13/047750 or international publication 13/047751).
  • the pest control composition of the present invention can be produced according to a conventional method relating to the production of general agricultural chemicals. That is, the pest control composition contains two or more active ingredients of the compound of the present invention and a quinoline compound, and if necessary, a carrier and an auxiliary agent are mixed to contain both active ingredients. A composition can be produced. Moreover, after manufacturing the composition containing any one of this invention compound and a quinoline-type compound previously, the other may be added to it and the composition containing both active ingredients may be manufactured. Usually, the mixture containing both active ingredients is preferably prepared to produce the pest control composition. Alternatively, the pest control composition of the present invention can be produced by mixing a quinoline-based compound with an active ingredient, if necessary, a carrier and an auxiliary agent according to a conventional method for producing general agricultural chemicals. .
  • auxiliary agents such as surfactants, binders, disintegrants, stabilizers, pH adjusters, antibacterial antifungal agents (preservatives), thickeners, antifoaming agents, wetting agents, fixing agents, coloring agents, etc.
  • dosage forms such as wettable powder, flowable powder, wettable powder granule, OD drug, powder, liquid, emulsion, granule, pack, etc. in a timely manner according to conventional methods.
  • the form is not particularly limited as long as the effect is exhibited.
  • the pest control composition of the present invention may be an embodiment in which the compound of the present invention and the quinoline compound are formulated in one dosage form, or each is formulated in separate dosage forms. Alternatively, both sets may be used.
  • the carrier used in the composition of the present invention means a synthetic or natural inorganic compound formulated to help the active ingredient reach the site to be treated and to facilitate the storage, transport and handling of the active ingredient compound. Or it means an organic substance, and any solid, liquid or gas can be used as long as it is usually used for agricultural chemicals.
  • the carrier is not particularly limited as long as the effect is exhibited.
  • solid carrier examples include inorganic substances such as bentonite, montmorillonite, diatomaceous earth, white clay, talc, and clay, plant organic substances such as wood flour and sawdust, and urea. be able to.
  • liquid carriers examples include aromatic hydrocarbons such as xylene and toluene, aliphatic hydrocarbons such as naphthenes, n-paraffins, and liquid paraffin, acetone, methyl ethyl ketone, and the like. Ketones, dioxane, ethers such as diethylene glycol dimethyl ether, alcohols such as ethanol and ethylene glycol, carbonates such as ethylene carbonate, aprotic solvents such as dimethylformamide, water, and the like.
  • the gas carrier examples include nitrogen and carbon dioxide.
  • adjuvants can also be used to enhance the efficacy of the compounds in the compositions of the present invention.
  • the use form can be used alone or in combination depending on the purpose in consideration of the dosage form of the preparation, the treatment method, and the like.
  • adjuvants include surfactants, binders, disintegrants, stabilizers, pH adjusters, antibacterial and antifungal agents, thickeners, antifoaming agents, antifreeze agents, and the like.
  • a surfactant that is usually used for the purpose of emulsifying, dispersing, spreading or / and wetting the agricultural chemical preparation can be used.
  • the surfactant include sorbitan fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkyl ether, polyoxyethylene alkylphenyl ether, polyoxyethylene polyoxypropylene block polymer, alkyl polyoxyethylene polyoxypropylene block polymer ether
  • Nonionic surfactants such as polyoxyethylene alkylamines, polyoxyethylene fatty acid amides, polyoxyethylene bisphenyl ethers, polyoxyalkylene adducts of higher alcohols, polyoxyethylene ethers, ester type silicones, fluorosurfactants Agent; Alkyl sulfate, polyoxyethylene alkyl ether sulfate, polyoxyethylene benzyl phenyl ether sulfate, polyoxyethylene styryl
  • binder examples include sodium alginate, polyvinyl alcohol, gum arabic, sodium carboxymethyl cellulose, bentonite and the like.
  • disintegrant examples include carboxymethylcellulose CMC sodium and croscarmellose sodium.
  • stabilizer examples include hindered phenol-based antioxidants, benzotriazole-based and hindered amine-based ultraviolet absorbers, and the like.
  • Examples of the pH adjuster include phosphoric acid, acetic acid, sodium hydroxide and the like.
  • antibacterial / antifungal agent examples include industrial bactericides such as sodium benzoate, potassium sorbate, parahydroxybenzoate ester, 1,2-benzisothiazolin-3-one, and antibacterial / antifungal agents. .
  • thickener examples include xanthan gum, guar gum, sodium carboxymethylcellulose, gum arabic, polyvinyl alcohol, montmorillonite and the like.
  • antifoaming agents examples include silicone compounds.
  • antifreezing agent examples include propylene glycol and ethylene glycol.
  • the adjuvants described above are examples, and the adjuvants used in the composition of the present invention are not particularly limited as long as the effects are exhibited.
  • the content of the compound of the present invention in the composition of the present invention is not particularly limited as long as the effect is exhibited, but is usually in the range of 0.01 to 99% by weight, preferably It is in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
  • the content of the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but it is usually in the range of 0.01 to 99% by weight, preferably Is in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
  • the total content of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but is usually in the range of 0.01 to 99% by weight. Yes, preferably in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
  • the mixing ratio of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but the quinoline compound is usually in a weight ratio with respect to the compound of the present invention.
  • the ratio is 0.001 to 1000, and preferably the ratio is 0.01 to 100.
  • composition of the present invention can be used for pest control in fields, paddy fields, tea gardens, orchards, pastures, lawns, forests, gardens, roadside trees, and the like.
  • foliage spraying treatment to plant individuals for example, foliage spraying treatment to plant individuals, seedling box treatment, cell tray treatment, soil surface dispersion treatment, soil mixing after soil surface dispersion treatment, soil Infusion into soil, soil mixing after infusion treatment in soil, soil irrigation treatment, soil mixing after soil irrigation treatment, spraying treatment on plant seeds, smearing treatment on plant seeds, immersion treatment in plant seeds Or the dressing process etc. to a plant seed are mentioned.
  • application methods utilized by those skilled in the art can be used.
  • the method for controlling pests in the present invention includes a method for applying the pest control composition of the present invention, a composition containing the compound of the present invention as an active ingredient, and a composition containing a quinoline compound as an active ingredient. After applying either one of the method of applying at the same time, the composition containing the compound of the present invention as an active ingredient, or the composition containing a quinoline compound as an active ingredient, the other composition is applied. Methods and the like.
  • a method of applying the pest control composition of the present invention a method of applying the pest control composition manufactured to contain two or more kinds of active ingredients of the compound of the present invention and the quinoline compound, or the present invention.
  • a composition containing the compound of the present invention and a quinoline compound is prepared by a user mixing a composition containing the compound as an active ingredient and a composition containing a quinoline compound as an active ingredient before use. The method to use etc. are mentioned.
  • the time (period) until the other composition is applied is: Although it is not particularly limited as long as the effect is exhibited, for example, it is 1 minute to 2 weeks after applying any one of the compositions, preferably after applying any one of the compositions The period is 5 minutes to 1 week, and more preferably 10 minutes to 3 days after applying any one of the compositions.
  • the application amount and dilution rate of the composition of the present invention are appropriately selected according to the target crop, the target pest, the degree of occurrence of the pest, the dosage form of the composition of the present invention, the application method, various environmental conditions, and the like. Can be determined.
  • the application amount is not particularly limited as long as the effect is exhibited, but it is usually 1 to 10,000 g per hectare in terms of the amount of active ingredient, preferably 10 to 5000 g per hectare.
  • the application amount is not particularly limited as long as the effect is exhibited, but usually 0.001 per 1 kg of seed in terms of the amount of active ingredient. -100 g, preferably 0.01-50 g.
  • the dilution factor is particularly limited as long as the effect is exhibited. However, it is usually 5 to 50000 times, preferably 10 to 10000 times.
  • the plant means those that live without photosynthesis and exercise, for example, grains such as rice, wheat, barley, corn, grapes, apples, pears, peaches, sweet potatoes, oysters, citrus.
  • Fruit trees such as soybeans, green beans, green peas, fruits such as strawberries, watermelons, potatoes, sweet potatoes, taros, konjacs, etc., cabbage, lettuce, tomatoes, cucumbers, eggplant, sugar beet, spinach, pumpkins, Examples include, but are not limited to, vegetables such as peppers, rapes such as oilseed rape, cotton, sunflower, tulip, chrysanthemum, sugarcane, tobacco, turf, and the like.
  • seed means a nutrient stored for germination of a young plant and used for agricultural reproduction, for example, corn, soybean, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, Seeds such as cucumber, eggplant, spinach, sweet pea, pumpkin, sugar cane, tobacco, pepper and rape; seed pods such as taro, potato, sweet potato and konjac; seed balls such as edible lily, bulbs such as tulips and raccoons; or genes Is a plant produced by artificially manipulating, for example, soybean, corn, cotton, etc. imparted with herbicide resistance that does not naturally exist in nature; rice adapted to cold regions, Tobacco, etc .; transformed with maize, cotton, potato, etc., which have the ability to produce insecticides Child like although not limited thereto.
  • pests mean organisms that adversely affect the growth of plants such as pathogens such as bacteria, fungi and viruses, pests and weeds.
  • Pathogenic bacteria infect plants and cause plant diseases. Pests infest and infest plants. Weeds compete with plants in terms of photosynthesis and nutrient absorption by proliferating at or near the plant's growing location. For these reasons, pests are harmful to plants because they cause poor plant growth, wither and die, and decrease in yield.
  • the composition and control method of the present invention are effective against these pests.
  • specific pathogenic bacteria and pests to be controlled by the present invention are exemplified.
  • pathogens examples include rice blast fungus (Magnaporthe grisea), blight fungus (Thanatephorus cucumeris), brown sclerotia fungus (Ceratobasidium setariae), brown bacterium Bacterial rot fungus (Waitea citrus fungus), cucumeris, sclerotium hydrophilum, red sclerotia (Wairea circinata), staphylococcal fungus (Entyloma dactylidis), bacilli (Magneportorcium cerevisiae) Disease-causing bacteria (Cochliobolus Miyabeanus), Leaf blight fungus (Sphaerulina oryzina), Leaf seedling fungus (Gibberella fujikuroi), Seedling fungus (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp.
  • Tritici Tritici
  • rust fungus Pierinia graminis, Pucciria recondita, Puccinia recondita, Puccinaor fungus
  • Pyrenophora teres Fusarium mold fungus (Gibberella zeae), Fusarium culmorum, Fusarium avenaceum, Monographella phnephalis fungus (Typhila incarnathia) Stilago nuda), Tuna scab (Tilletia caries), Tilletia controversa (Pseudocercosporella phytotrophic) Phaeosphaeria nodorum), Fusarium spp., Pythium spp., Rhizoctonia spp., Septoria spp., Pyrenophorra spp.
  • Um graminicola ergot fungus (Claviceps purpurea), spot fungus (Cochliobolus sativus), black clause fungus (Pseudomonas syringae pv syringae); Corn fungus (Gibberella zeae, etc.), Seedling fungus (Fusarium avenaceum, Penicillium spp, Phythium spp.), Rhizoctonia sph.
  • Ustilago maydis, Anthracnose fungus (Colletotrichum graminicola), Northern spotted fungus (Cochliobolus caribonum), Brown rot fungus (Acidovorax avenae suburb), Staphylococcus aureus .
  • Mi pv zeae wilt bacterium fungus (Erwinia stewartii); Grape downy mildew (Plasmopara viticola), rust fungus (Physopella ampelopsidis), powdery mildew (Uncinula necator), black mold fungus (Elsinoe ampelina), late rot fungus (Glomerulumuleum, mullet) ), Vine split fungus (Phoropsis viticola), soot spot fungus (Zygophiala jamaicensis), gray mold fungus (Bottrytis cinerea), diatomote moss aid, trix), crown gall tumefaciens (Agrobacterium vitis); Apple powdery mildew (Podosphaera leukotricha), black rot (Venturia inaequalis), spot leaf rot (Alternaria mali), red rot (Gymnosporangium
  • Erwinia sp. Erwinia sp.
  • Agrobacterium tumefaciens Rust radish blight fungus (Erwinia chrysanthemi pv. Chrysanthemispiring), Pseudomonasy symptom Pesticides of pear (Phytophthoraca bacterium, Phytophthora syringae), bacterial wilt (Erwinia sp.); Peach black rot fungus (Cladosporium carpophilum), homoposis spoilage fungus (Phomopsis sp.), Plague fungus (Phytophthora sp.
  • Agrobacterium tumefaciens Sugar beetle fungus (Glomerella cingulata), larvae fungus (Monilinia kusanoi), Aspergillus fungus (ingi) aingacterial syrup (Agrobacterium tumefaciens); Oyster anthracnose fungus (Glomerella singulata), deciduous fungus (Cercospora kaki; Mycosphaerella nawae), powdery mildew (Phyllactinia kakikora), root cancer fungus (Agrobacteria) Citrus black spot fungus (Diaporthe citrus), green mold fungus (Penicillium digitatum), green mold fungus (Penicillium italicum), scab fungus (Elsinophatophanthocorii) Pseudomonas syringae pv.
  • Botrytis cinerea such as tomato, cucumber, beans, strawberry, potato, cabbage, eggplant, lettuce
  • Sclerotinia sclerotiorum such as tomato, cucumber, beans, strawberry, potato, rapeseed, cabbage, eggplant, lettuce, etc .
  • Seedling blight fungi (Rhizoctonia spp., Phythium spp., Phytophthora spp., Phytophthora spp., Sclerotrin, etc.) Ralstonia solanacerum, a solanaceous plant; Downy mildew of cucurbits (Pseudoperonospora cubensis), powdery mildew (Sphaerotheca fuliginea), anthracnose fungus (Colletotrichum orbiculare), vine blight (Didymella bryoniae), Fusarium fungus (Fusarium oxysporum), Phytophthora (Phytophthora parasitica, Phytophthora melonis , Phytophthora nicotianae, Phytophthora drechsleri, Phytophthora capsici, etc.), Xanthomonas campestris pv.
  • Brassicaceae black spot fungus (Alternaria brassicae, etc.), white spot fungus (Cercosporella brassicae), root rot fungus (Phoma lingam), root-knot fungus (Plasmodiophora brassicae), black mold fungus (Panthophora brassicae), mildew fungus (Panthophora brassicae) pv. campestris), black spot bacteria (Pseudomonas syringae pv. maculacola), soft rot fungus (Erwinia carotovora subsp.
  • Carotovora spot bacterial pathogen (Pseudomonas syringae pv. Syringae), Rot (Erwinia rhapontici), a scale-Rot (Burkholderia gladioli), yellows fungus (Phytoplasma asteris ); Soft rot of garlic (Erwinia carotovora subsp. Carotovora), spring rot (Pseudomonas marginalis pv.
  • Soybean purpura fungus (Cercospora kikuchii), black rot fungus (Elsinoe glycines), black spot fungus (Diaporthe phasororum), rhizobonia hormonal fungus (Rhizotonia soloni), Phygopsora pachyrhizi, Anthracnose fungus (Colletotrichum truncatum, etc.), leaf-burning fungus (Xhanthomonas campestris pv.
  • Kidney anthracnose fungus (Colletotrichum lindemuthianum), bacterial wilt fungus (Ralstonia solanacearum), bacterial wilt fungus (Pseudomonas syringae pv.
  • Groundnut black fungus Mycosphaerella berkeleyi
  • brown spot fungus Mycosphaerella arachidis
  • bacterial wilt (Ralstonia solanaceram)
  • Pea powdery mildew fungus (Erysiphe pisi), downy mildew fungus (Peronospora pisi), vine blight fungus (Pseudomonas syringae pv.
  • Pisi vine rot fungus
  • Xhanthomonas campestris pestis Broad bean fungus (Peronospora viciae), Phytophthora nicotianae; Potato summer blight fungus (Alternaria solani), black rot fungus (Thanatephorus cucumeris), blight fungus (Phytophthora infestans), silver rot fungus (Helminosporum solani), dry rot fungus (Fusarium sorghum) Spongospora subterranea, bacterial wilt (Ralstonia solanacearum), black rot (Erwinia carotovora subsp.
  • Atroseptica rot fungus (Streptomyces scabipes, rot fungi .. A subsp carotovora), viscous Rot (Crostridium spp), Wakusa Fungus (Clavibacter michiganensis subsp.sepedonicus); Streptomyces ipomoeae; Sugar beet blight fungus (Cercospora beticola), downy mildew fungus (Peronospora schachtii), black root fungus (Aphanomyces cochioides), snake eye blight fungus (Phomabecto sect) (Agrobacter fungus) , Pseudomonas syringae pv.
  • Carotovora Ralstonia solanacearum, tobacco mosaic virus (Tobaco mosaic virus); Coffee rust (Hemileia vastatrix); Banana black sigatoga disease (Mycosphaerella fijiensis), Panama disease (Fusarium oxysporum f. Cotton Fusarium oxysporum, Milulaia areola; Sunflower sclerotia (Sclerotinia sclerotiorum), Xanthomonas campestris pv. Malvacearum, cavernous fungus Erwinia carotovora subsp. carotovora), Pseudomonas syringae pv.
  • Myriosclerotinia borealis Fairy Ri Grayed Fungus (Marasmius Oreades etc.), (such as Pythium aphanidermatum) Pythium fungus, Pyricularia oryzae (Pyricularia grisea), and the like.
  • pests examples include, but are not limited to, Adoxophyes honmai, Adoxophies orana faciata, Apples burapipicanus, and Argops reptile. fuscocuppreanus, papaver (Grapholita molesta), chacha maki (Christoneura magnanima), bean thrips (Leguminivora glycinivolores), mulberry papaver (Olethia maki) Nkui (Argyresthia conjugella), Nashihosoga (Spulerrina astaurota), beans Hime Saya insect moth (Matsumuraeses phaseoli), Tobihamaki (Pandemis heparana), Nashichibiga (Bucculatrix pyrivorella), Momohamoguriga (Lyonetia clerkella), peach fruit moth (Carposina niponensis), Gin Mont leafminer ( Lyonetia punifoliella malinella), Chalothosiga (Caloptilia theivora), Golden
  • Coleoptera insects such as Onychiurus folsomi, Siberian whitebill (Onychiurus sibiricus), Bourletiella hortensis, etc., Cockroach (Periplaneta americana), Cockroach (Periplaneta americana), German cockroach (Blattella germanica), cockroach (Peliplaneta Americana), etc.
  • Termite insects such as the termites (Coptothermes formosanus), the Yamato termites (Reticulitermes speratus), the Taiwan termites (Odontotermes formosanus), Cat fleas (Ctenocephalidae felis), Dog fleas (Ctenocephalides canis), Chicken fleas (Echidnophaga gallinacea), Human fleas (Pulex irritans), Ceopus vulgaris (Xenopsylla, etc.) Dipteran insects such as chicken lice (Mecananthus stramineus), bovine lice (Bovicola bovis), Bovine lice (Haematopinus eurysternus), swine lice (Haematopinus suis), bovine white lice (Linognathus vitili), mosquito lice lice (Solenopotes capillus), sheep d Dust mites such as cyclamen dust mites (Phytonemus pallidus), chano mite mites (Polyphago
  • Rice spider mites (Oligonychus shinkajii), citrus red spider mite (Pananychus citri), red spider mite (Pananychus ulmi), tick mite (Tananychus urticae), Tetranichus kanzawai Tea Roh Naga rust mite (Acaphylla theavagrans), Tulip rust mite (Aceria tulipae), tomato rust mite (Aculops lycopersici), mandarin orange rust mite (Aculops pelekassi), apple rust mite (Aculus Lampendali), false pear rust mite (Eriophyes chibaensis), citrus last mite (Phyllocoptruta oleivora ) Coniferous mites such as Robin tick (Rhizoglyphus robini), Kenagakonadani mite (Tyrophagus putrescentiae), Spinach mites (Tyrophagus similis), Leopard mites, such
  • Ticks such as Rocky Mountain Forest Tick (Dermenteror andrsononi), West Coast Tick (Demercentor occidentalis), American Dog Tick (Dermentertor variabilis), Tick Tick (Dermenteror spp.), Crawfish ticks (Cheeletiella yasguri), crayfish ticks (Cheeletiella blackei), etc., Acne mites such as Inodemite mites (Demodex canis), Caterpillar mites (Demodex cati), Cucumber mites such as ovine cucumber mites (Psoroptes ovis), Mite mites such as Sarcoptes scabiei, catfish mite mite (Notoderes cati), chick mite mite (Knemidopoptes spp.), Crustaceans such as Armadillium vulgare, Pomacea caliculata, Achatina falica, slugs (Meghiatum
  • Worms such as Cestoda Ascaris, Toxocara, Toxacaris, Parascaris, Ascaridia, Heterakis, Oxyuris, Capillaria, Capillaria Caterpillars (Trichinella), roundworms (Strongylus, Tridontophorus), hairy nematodes (Trichonema), swine nematodes (Stephanurus), intestinal nodules (Desophagostomum), large intestinal nematodes (Chabertia), moths astragalus (A) , Uncinaria, Necator, Bunostom), Trichostromylus, Coober ciliate nematode (Coo) eria, nematoderus, torsion stomach nematode (Haemonchus), octer dark gastroworm (Ostertagia), lungworm (Dictyocaurus, Metastrungylus), dirofilariae (polyrofilaria) Parafilaria
  • Step 2 Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one (Compound No. 52)
  • the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 109 mg off-white solid.
  • the resulting white solid was the title compound, 2.24 g. Further, the filtrate produced when the precipitate was washed was evaporated under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The white solid obtained from the filtrate was also the title compound, 0.46 g. 1 H-NMR (CDCl 3 ) ⁇ : 7.28-7.26 (1H, m), 7.18 (1H, br s), 6.86-6.83 (1H, m), 6.74- 6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).
  • Step 2 Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one (compound Number 320)
  • Step 2 Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
  • Step 1 Synthesis of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone
  • Step 2 Synthesis of ethyl 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoate
  • Step 3 Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid
  • Step 1 Synthesis of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonyl hydrazide
  • Step 2 Synthesis of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone
  • Step 3 Synthesis of ethyl 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
  • Step 4 Synthesis of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
  • Step 1 Synthesis of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonyl hydrazide
  • Step 2 Synthesis of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone
  • Step 3 Synthesis of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
  • Step 4 Synthesis of 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
  • Structure B represents the following:
  • Structure C represents:
  • Structure D represents:
  • Step 1 Preparation of 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline
  • (Z) -2- (3,3-dimethyl-3 , 4-Dihydroisoquinolin-1-yl) -3-hydroxyacrylaldehyde (23 g, 0.1 mol) and 2-fluoroaniline (16.7 g, 0.16 mol) in xylene (300 ml) were heated to reflux for 3 hours.
  • Eaton's reagent (phosphorus pentoxide-methanesulfonic acid solution, weight ratio 1:10) (300 ml) was added dropwise, and the mixture was further heated to reflux for 3 hours. Water (500 ml) was added to the reaction solution under ice cooling, and the aqueous layer washed with xylene was made alkaline with potassium carbonate, extracted with ethyl acetate, dried over magnesium sulfate, filtered and concentrated.
  • Step 2 Preparation of 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline 3- (3,3-dimethyl in a 1 L three-necked flask To a solution of -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (17.7 g, 58 mmol) in chlorobenzene (400 ml), 1,3-dibromo-5,5-dimethylhydantoin (19.1 g, 66.
  • Step 3 Preparation of 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline Triethylamine trioxide in a 500 mL PFA (polytetrafluoroethylene) flask Hydrogen fluoride (18.7 g, 116 mmol) to 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (24.4 g, 58 mmol) Chlorobenzene (45 ml) solution was added, and the mixture was heated with stirring at 85 ° C. for 5 hours.
  • PFA polytetrafluoroethylene
  • Step 1 Preparation of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline
  • sulfuric acid 115 mL
  • 3-cyano-8-fluoroquinoline 20.6 g, 0.12 mol
  • 3- (2-fluorophenyl) -2,3-dimethylbutan-2-ol 28.3 g, 0.12 mol
  • 144 mmol) in dichloroethane (40 ml) was added dropwise and stirred at room temperature for 18 hours.
  • Step 2 Preparation of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline under nitrogen atmosphere
  • 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline (16.7 g, 47.7 mmol) in ethanol (477 mL).
  • Sodium borohydride (5.4 g, 0.14 mol) was added to the solution, and the mixture was stirred at room temperature for 0.5 hour and further heated to reflux for 3 hours.
  • reaction solution was poured into ice water, and the aqueous layer washed with ethyl acetate was made alkaline with aqueous ammonia and extracted with ethyl acetate. The organic layer was washed with water, dried over magnesium sulfate, filtered and concentrated. To the obtained residue was added 10% aqueous sodium hydroxide (50 ml), and the mixture was heated to reflux for 1 hour.
  • a spore suspension of each pathogen (spore density 1 ⁇ 10 5 spores / mL) were dispensed in appropriate amounts and mixed well.
  • the microtiter plate was cultured in a closed container at 18 ° C. in the dark, and the growth degree of the bacteria in the drug-treated group and the drug-untreated group was measured after 0 to 7 days.
  • the growth inhibition rate of bacteria by chemical treatment was calculated from the following formula.
  • Tomato gray mold: GM After sowing the test plant (tomato variety: large Fuju), it was cultivated until three true leaves were developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm. The seedlings one day after the spraying were spray-inoculated with conidia of Botrytis cinerea , and then left in an inoculation room at room temperature of 20-23 ° C. for about 48 hours to promote disease. The degree of illness 2 days after inoculation was investigated and the effect was evaluated. (Rice blast: B) After sowing the test plant (rice cultivar: Kofu), the plant was cultivated until the second leaf developed.
  • a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm.
  • the seedlings one day after the spraying were spray-inoculated with conidia of Colletotrichum orbiculare , and then left in an inoculation room at a room temperature of 20 to 23 ° C. for about 24 hours to promote disease.
  • the degree of disease on the 10th day after inoculation was investigated and the effect was evaluated. (Apple black spot disease: AS) After sowing the test plant (apple variety: Wang Lin), the plant was cultivated until four true leaves developed.
  • a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm.
  • the seedlings one day after spraying were spray-inoculated with conidia of Venturia inaequalis and then left in an inoculation room at room temperature of 18 to 20 ° C. for about 24 hours to promote disease.
  • the degree of disease on the 10th day after inoculation was investigated and the effect was evaluated.
  • Cabbage black soot disease: CA After sowing the test plant (cabbage variety: seasonal harvest), it was cultivated until the cotyledon developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 250 ppm.
  • the seedlings one day after the spraying were spray-inoculated with conidia of cabbage black soot fungus (Alternaria brassicicola) and then left in an inoculation room at room temperature of 20 to 23 ° C. for about 48 hours to promote the onset of disease.
  • the degree of illness 2 days after inoculation was investigated and the effect was evaluated.
  • compounds against tomato gray mold, rice blast, cucumber anthracnose, apple black spot, cabbage black soot (2) -2, (2) -3 and (2) -4 showed a high control effect with a control value of 95% or more.
  • Test Example 3 Antibacterial test against various pathogens
  • quinoline compounds Fusarium oxysporum f. Sp. Cucumerinum, Anthracnose fungus (Glomerella cingulata), rice Antibacterial activity against sesame leaf blight fungus (Cochrobulus Miyabeanus) and grape black rot fungus (Elinoe ampelina) was measured.
  • compound (2) -2, (2) -3, (2) -4 was found to be effective against cucumber vine split fungus, anthrax fungus, rice sesame leaf blight fungus, and grape black rot fungus. The growth of each pathogen was completely prevented.
  • the pest control composition and the novel quinoline compound according to the present invention have an excellent pest control effect and thus have utility value as an agrochemical.

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Abstract

Provided are a pest control composition containing a new active ingredient and being useful for preventing harmful organisms and a method of using same, and a new quinoline-based compound. Provided are a pest control composition containing, as active ingredients, a compound expressed by formula (1) or a salt thereof, and one or more kinds of ingredient selected from quinoline-based compounds and having pest control activity, and a new quinoline-based compound having pest control activity. In the formula, R1 represents a replaceable C1-C6 alkyl group, a C1-C6 haloalkyl group, etc., R2 represents a halogen atom, a replaceable C1-C6 alkyl group, a replaceable C1-C6 alkoxy group, etc., R3 represents a hydrogen atom, a halogen atom, a replaceable C1-C6 alkyl group, etc., n represents an integer in the range 0 to 5, X represents an oxygen atom or a sulfur atom, Y represents a phenyl group having a substituent at the ortho position, a pyridyl group, etc., and the bond including a broken line part represents a double bond or a single bond.

Description

ピリドン化合物とキノリン系化合物を含有する有害生物防除組成物および有害生物の防除方法、ならびに新規キノリン系化合物Pest control composition containing pyridone compound and quinoline compound, pest control method, and novel quinoline compound
 本発明は、ピリドン化合物と1種以上のキノリン系化合物を有効成分として含有する有害生物防除組成物、および新規キノリン系化合物に関する。 The present invention relates to a pest control composition containing a pyridone compound and one or more quinoline compounds as active ingredients, and a novel quinoline compound.
 農園芸場面において、従来から、害虫、病原菌、雑草等の有害生物を防除するため、それぞれの有害生物の防除に適した農薬を使用することが一般的に行われている。
 さらに、種々の有害生物を同時に防除すること等を目的として、複数の有効成分を含有する混合組成物を使用することが行われている。
In agricultural and horticultural scenes, conventionally, in order to control pests such as pests, pathogens, and weeds, it is a common practice to use pesticides suitable for pest control.
Furthermore, for the purpose of controlling various pests at the same time, a mixed composition containing a plurality of active ingredients has been used.
 一方、長年にわたる薬剤の使用により、薬剤に対する耐性を獲得した抵抗性害虫や耐性菌が出現し、従来の薬剤による防除が困難となる場面が増えてきているため、新規有害生物防除剤が絶えず必要とされている。また、抵抗性害虫や耐性菌の発生リスクを低減する目的で、異なる作用機作を有する有効成分を組合せた混合剤を使用することが行われている。 On the other hand, the use of drugs over many years has led to the emergence of resistant pests and resistant bacteria that have acquired resistance to drugs, making it difficult to control with conventional drugs, so new pest control agents are constantly needed. It is said that. Moreover, using the mixed agent which combined the active ingredient which has a different action mechanism is performed in order to reduce the generation | occurrence | production risk of a resistant pest and a resistant microbe.
 ところで、1,3,5,6-置換-2-ピリドン化合物に関して、例えば、GABAアルファー2/3リガンドとして、3位にアリール基またはヘテロアリール基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、国際公開第98/55480号参照)。また、細菌性感染症の治療薬として、3位にカルボキシル基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、欧州特許第0308020明細書参照)。しかしながら、国際公開第98/55480号および欧州特許第0308020明細書に記載されている化合物の用途は、いずれも医薬に関するものであり、本発明に係る有害生物防除組成物が属する技術分野とは相違する。 By the way, for 1,3,5,6-substituted-2-pyridone compounds, for example, 1,3,5,6-substituted-2 having an aryl group or heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand. -Pyridone compounds have been disclosed (see eg WO 98/55480). In addition, 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (see, for example, European Patent No. 0308020). However, the uses of the compounds described in WO 98/55480 and EP 0308020 are all related to medicines and are different from the technical field to which the pest control composition according to the present invention belongs. To do.
 式(2a)又は式(2b)で表されるキノリン系化合物に関して、特許文献3、4には、キノリン系化合物が殺菌剤として、イネのいもち病(Pyricularia oryzae)ならびにトマト、キュウリ及びインゲンの灰色かび病(Botrytis cinerea)、キュウリつる割病(Fusarium oxysporum)等の病害に対し、茎葉散布、土壌処理、種子処理等の処理方法で防除効果を示すことが開示されている。また、特許文献5、6には、式(2a)又は式(2b)で表されるキノリン系化合物とある種の殺菌剤との混合について開示されているが、本発明のピリドン化合物との混合については開示されていない。 Regarding the quinoline compounds represented by the formula (2a) or the formula (2b), Patent Documents 3 and 4 disclose that rice blasts of rice blast (Pyricularia oryzae) and tomato, cucumber and kidney beans are gray as quinoline compounds as fungicides. It has been disclosed that a disease control such as fungus disease (Botrytis cinerea), cucumber vine split disease (Fusarium oxysporum) and the like can be controlled by treatment methods such as foliage spraying, soil treatment, seed treatment, and the like. Patent Documents 5 and 6 disclose mixing of the quinoline compound represented by the formula (2a) or the formula (2b) with a certain fungicide, but mixing with the pyridone compound of the present invention. Is not disclosed.
国際公開第98/55480号International Publication No. 98/55480 欧州特許第0308020明細書EP 0308020 specification 国際公開第05/070917号International Publication No. 05/070917 国際公開第08/066148号International Publication No. 08/0666148 国際公開第11/077514号International Publication No. 11/077514 国際公開第15/141867号International Publication No. 15/141867
 しかしながら、前述した複数の有効成分を含有する混合組成物において、単剤で使用した場合に比べ有害生物に対する効果が低下する場合があるため、新規の有効成分を含有し、かつ有害生物に対し十分な防除効果を奏する混合組成物が切望されている。
 本発明の課題は、新規なピリドン化合物またはその塩とキノリン系化合物との組み合わせを含む有用な防除効果を奏する有害生物防除組成物、およびその使用方法、ならびに有用な防除効果を奏する新規キノリン系化合物を提供することにある。
However, in the mixed composition containing a plurality of active ingredients as described above, the effect on pests may be lower than when used alone, so it contains new active ingredients and is sufficient for pests. Therefore, a mixed composition that exhibits an excellent control effect is desired.
An object of the present invention is to provide a pest control composition having a useful control effect including a combination of a novel pyridone compound or a salt thereof and a quinoline compound, a method of using the same, and a novel quinoline compound having a useful control effect Is to provide.
 本発明者らは、前記課題を解決すべく、1,3,5,6-置換-2-ピリドン化合物群および1,5,6-置換-2-ピリドン化合物群について鋭意検討を行った結果、当該2-ピリドン骨格中の6位に関して、オルト位に置換基を有するアリール基またはヘテロアリール基を導入した化合物群と1種以上のキノリン系化合物を有効成分として含有する有害生物防除組成物、および新規キノリン系化合物が、優れた有害生物防除活性を発揮することを見出し、本発明を完成するに至った。
 即ち、本発明は、以下のとおりである。
In order to solve the above problems, the present inventors have conducted extensive studies on the 1,3,5,6-substituted-2-pyridone compound group and the 1,5,6-substituted-2-pyridone compound group. A pest control composition comprising, as active ingredients, a compound group having an aryl group or heteroaryl group having a substituent at the ortho position with respect to the 6-position in the 2-pyridone skeleton, and one or more quinoline compounds; The present inventors have found that a novel quinoline compound exhibits excellent pest control activity and has completed the present invention.
That is, the present invention is as follows.
[1]
 式(1)
Figure JPOXMLDOC01-appb-C000004

[式中、R1は、水酸基、
 シアノ基、
 置換基Aで適宜置換されてもよいC1~C6のアルキル基、
 C1~C6のハロアルキル基、
 置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
 置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
 C2~C6のハロアルケニル基、
 置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
 C2~C6のハロアルキニル基、
 置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
 C1~C6のハロアルコキシ基、
 置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
 置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
 C2~C6のハロアルケニルオキシ基、
 置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
 C3~C6のハロアルキニルオキシ基、
 またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)を表し;
R2は、ハロゲン原子、
 水酸基、
 シアノ基、
 ニトロ基、
 置換基Bで適宜置換されてもよいC1~C6のアルキル基、
 C1~C6のハロアルキル基、
 置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基、
 置換基Bで適宜置換されてもよいC2~C6のアルケニル基、
 C2~C6のハロアルケニル基、
 置換基Bで適宜置換されてもよいC2~C6のアルキニル基、
 C2~C6のハロアルキニル基、
 置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、
 C1~C6のハロアルコキシ基、
 置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、
 置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、
 C2~C6のハロアルケニルオキシ基、
 置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、
 C3~C6のハロアルキニルオキシ基、
 R20C(=O)-(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)、
 R20C(=O)O-(ここで、R20は、前記と同義である。)、
 1~2個の酸素原子を含む3~6員環の基、
 R23-L2-(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)、
 R21R22N-(ここで、R21およびR22は、前記と同義である。)、
 またはR24C(=O)N(R25)-(ここで、R24は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、前記と同義である。)を表し、R25は、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
R3は、水素原子、
 ハロゲン原子、
 ニトロ基、
 置換基Cで適宜置換されてもよいC1~C6のアルキル基、
 C1~C6のハロアルキル基、
 置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
 置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
 C1~C6のハロアルコキシ基、
 置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
 C2~C6のハロアルケニル基、
 置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
 C2~C6のハロアルキニル基、
 R30-L3-(ここで、R30は、前記のR23と同義であり、L3は、前記のL2と同義である。)、
 R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、
 またはR33C(=O)-(ここで、R33は、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
nは、0~5の整数(ただし、nが2以上のとき、2以上のR2は、それぞれ独立した置換基を表す。)を表し;
Xは、酸素原子、または硫黄原子を表し;
Yは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表し、
 該フェニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~4置換し、
 該ピリジル基、該ピラジニル基、該ピリミジニル基、該ピリダジニル基、該トリアジニル基、または該テトラジニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~3置換し、
 該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~2置換し;
破線部を含む結合は、二重結合、または単結合を表し、
 そして、置換基Aは、
 水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R12R13N-(ここで、R12およびR13は、それぞれ独立していて、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR12およびR13は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、およびR14-L1-(ここで、R14は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L1は、S、SO、またはSOを表す。)からなる群から選択される少なくとも1種であり;
置換基Bは、
 水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、R21R22N-(ここで、R21およびR22は、前記と同義である。)、R23-L2-(ここで、R23およびL2は、前記と同義である。)、R26R27R28Si-(ここで、R26、R27およびR28は、それぞれ独立していてC1~C6のアルキル基を表す。)、R26R27R28Si-(CH)s-O-(ここで、sは、1~3の整数を表し、R26、R27およびR28は、前記と同義である。)、R20C(=O)-(ここで、R20は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種であり;
置換基B1は、
 シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
置換基Cは、
 水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、およびR30-L3-(ここで、R30は、前記のR14と同義であり、L3は、前記のL1と同義である。)からなる群から選択される少なくとも1種であり;
置換基Dは、
 ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、およびC1~C6のハロアルコキシ基からなる群から選択される少なくとも1種であり;
置換基D1は、
 水酸基、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種である。]で表されるピリドン化合物またはその塩と、
式(2a)又は式(2b)
Figure JPOXMLDOC01-appb-C000005

[式中、R2a及びR2bはそれぞれ独立していて、
 置換基E1で適宜置換されてもよいC1~C6のアルキル基、
 置換基E2で適宜置換されてもよいアリール基、
 置換基E3で適宜置換されてもよいヘテロアリール基、
 または置換基E2で適宜置換されてもよいアラルキル基を表すか、
 あるいはR2aとR2bは、それらが結合する炭素原子と一緒になって置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよく;
R2c及びR2dはそれぞれ独立していて、
 水素原子、
 置換基E1で適宜置換されてもよいC1~C6のアルキル基、
 ハロゲン原子、
 C1~C6のアルコキシ基、
 または水酸基を表すか、
 あるいはR2cとR2dは、それらが結合する炭素原子と一緒になってカルボニル基又は置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよく;
R2eは、
 水素原子、
 C2~C7のアシル基、
 または置換基E1で適宜置換されてもよいC1~C6のアルキル基を表し;
X1は、ハロゲン原子、
 置換基E5で適宜置換されてもよいC1~C6のアルキル基、
 置換基E6で適宜置換されてもよいC2~C6のアルケニル基、
 置換基E7で適宜置換されてもよいC2~C6のアルキニル基、
 置換基E2で適宜置換されてもよいアリール基、
 置換基E3で適宜置換されてもよいヘテロアリール基、
 C1~C6のアルコキシ基、
 置換基E8で適宜置換されてもよいアミノ基、
 C2~C7のアシル基、
 シアノ基、
 または置換基E9で水酸基の水素原子が置換されてよいN-ヒドロキシアルカンイミドイル基を表し;、
X2は、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基又は水酸基を表し、
n1は0~4の整数を表し、
n2は0~6の整数を表し、
置換基E1は、
 ハロゲン原子、C1~C6のアルコキシ基、C1~C6のアルキルチオ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
置換基E2は、
 ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、置換基E8で適宜置換されてもよいアミノ基、ニトロ基、シアノ基、水酸基、メルカプト基及びC1~C6のアルキルチオ基からなる群から選択される少なくとも1種であり;
置換基E3は、
 ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基及びC1~C6のアルコキシ基からなる群から選択される少なくとも1種であり;
置換基E4は、
 ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
置換基E5は、
 ハロゲン原子、C1~C6のアルコキシ基、水酸基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種であり;
置換基E6は、
 ハロゲン原子、C1~C6のアルコキシ基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種であり;
置換基E7は、
 ハロゲン原子、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
置換基E8は、
 C1~C6のアルキル基及びC2~C7のアシル基からなる群から選択される少なくとも1種であり;
置換基E9は、
 C1~C6のアルキル基、C2~C6のアルケニル基、C2~C6のアルキニル基、アラルキル基、アリール基及びヘテロアリール基からなる群から選択される少なくとも1種である。]で表されるキノリン系化合物またはその塩から選ばれる1種以上の成分を有効成分として含有する有害生物防除組成物。
[1]
Formula (1)
Figure JPOXMLDOC01-appb-C000004

[Wherein R1 is a hydroxyl group,
A cyano group,
A C1-C6 alkyl group optionally substituted with substituent A,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent A,
A C2-C6 alkenyl group optionally substituted with the substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent A,
A C2-C6 haloalkynyl group,
A C1-C6 alkoxy group optionally substituted with the substituent A,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent A,
A C2-C6 alkenyloxy group optionally substituted with the substituent A,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with the substituent A,
A C3-C6 haloalkynyloxy group,
Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
R2 is a halogen atom,
Hydroxyl group,
A cyano group,
Nitro group,
A C1-C6 alkyl group optionally substituted with the substituent B,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent B,
A C2-C6 alkenyl group optionally substituted with the substituent B,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent B,
A C2-C6 haloalkynyl group,
A C1-C6 alkoxy group optionally substituted with the substituent B,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
A C2-C6 alkenyloxy group optionally substituted with the substituent B,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with the substituent B,
A C3-C6 haloalkynyloxy group,
R20C (═O) — (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, a C1-C6 Represents a haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Represents what is to be formed.)
R20C (═O) O— (wherein R20 has the same meaning as above),
A 3- to 6-membered group containing 1 to 2 oxygen atoms,
R23-L2- (wherein, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 represents S, SO, or SO 2.),
R21R22N- (wherein R21 and R22 are as defined above),
Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optionally substituted with a hydrogen atom or substituent B1. Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, which may be
R3 is a hydrogen atom,
Halogen atoms,
Nitro group,
A C1-C6 alkyl group optionally substituted with substituent C,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with substituent C,
A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
A C1-C6 haloalkoxy group,
A C2-C6 alkenyl group optionally substituted with substituent C,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent C,
A C2-C6 haloalkynyl group,
R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above),
R31R32N- (wherein R31 and R32 have the same meanings as R21 and R22 above),
Or R33C (═O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group);
n represents an integer of 0 to 5 (provided that when n is 2 or more, each R2 of 2 or more represents an independent substituent);
X represents an oxygen atom or a sulfur atom;
Y represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group;
In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
In the pyridyl group, the pyrazinyl group, the pyrimidinyl group, the pyridazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace
In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 2 appropriately;
A bond including a broken line part represents a double bond or a single bond,
And the substituent A is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R12R13N- (wherein R12 and R13 are each independently Each represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 together with the nitrogen atom to which they are attached, is an aziridinyl group , An azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (wherein R14 is a C1-C6 alkyl group or a C1-C6 haloalkyl group) represents a group, is selected L1 is, S, SO, or from the group consisting of.) representing the SO 2, At least one selected from;
Substituent B is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, C2-C6 alkoxyalkoxy group, R21R22N- R21 and R22 are as defined above), R23-L2- (where R23 and L2 are as defined above), R26R27R28Si— (wherein R26, R27 and R28 are each independently And represents an alkyl group of C1 to C6), R26R27R28Si— (CH 2 ) s—O— (wherein s represents an integer of 1 to 3, and R26, R27 and R28 are as defined above) ), R20C (═O) — (wherein R20 is as defined above), and a group of 3 to 6 membered ring containing 1 to 2 oxygen atoms. That is at least one selected from the group;
Substituent B1 is
At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
Substituent C is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds;
Substituent D is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group;
Substituent D1 is
Hydroxyl group, halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, and C3-C8 cycloalkoxy group Is at least one selected from the group consisting of A pyridone compound represented by the formula:
Formula (2a) or Formula (2b)
Figure JPOXMLDOC01-appb-C000005

[Wherein, R2a and R2b are independent of each other;
A C1-C6 alkyl group optionally substituted with a substituent E1,
An aryl group which may be optionally substituted with a substituent E2,
A heteroaryl group optionally substituted with a substituent E3;
Or an aralkyl group that may be optionally substituted with a substituent E2, or
Alternatively, R2a and R2b together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with substituent E4;
R2c and R2d are each independent,
Hydrogen atom,
A C1-C6 alkyl group optionally substituted with a substituent E1,
Halogen atoms,
A C1-C6 alkoxy group,
Or represents a hydroxyl group,
Alternatively, R2c and R2d together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with a carbonyl group or substituent E4;
R2e is
Hydrogen atom,
A C2-C7 acyl group,
Or a C1-C6 alkyl group optionally substituted with a substituent E1;
X1 is a halogen atom,
A C1-C6 alkyl group optionally substituted with the substituent E5,
A C2-C6 alkenyl group optionally substituted with a substituent E6,
A C2-C6 alkynyl group optionally substituted with a substituent E7,
An aryl group which may be optionally substituted with a substituent E2,
A heteroaryl group optionally substituted with a substituent E3;
A C1-C6 alkoxy group,
An amino group optionally substituted with a substituent E8;
A C2-C7 acyl group,
A cyano group,
Or an N-hydroxyalkaneimidoyl group in which the hydrogen atom of the hydroxyl group may be substituted with a substituent E9;
X2 represents a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group or a hydroxyl group,
n1 represents an integer of 0 to 4,
n2 represents an integer of 0 to 6,
Substituent E1 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C1-C6 alkylthio group, and a phenoxy group;
Substituent E2 is
Halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C1-C6 alkoxy group, amino group optionally substituted with substituent E8, nitro group, cyano group, hydroxyl group, mercapto group and C1- At least one selected from the group consisting of C6 alkylthio groups;
Substituent E3 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, and a C1-C6 alkoxy group;
Substituent E4 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group and a phenoxy group;
Substituent E5 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a hydroxyl group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group;
Substituent E6 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group;
Substituent E7 is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group and a phenoxy group;
Substituent E8 is
At least one selected from the group consisting of a C1-C6 alkyl group and a C2-C7 acyl group;
Substituent E9 is
It is at least one selected from the group consisting of C1-C6 alkyl groups, C2-C6 alkenyl groups, C2-C6 alkynyl groups, aralkyl groups, aryl groups, and heteroaryl groups. ] The pest control composition which contains 1 or more types of components chosen from the quinoline type compound represented by these, or its salt as an active ingredient.
[2]
 式(1)で表されるピリドン化合物においてR1が、シアノ基、
 置換基Aで適宜置換されてもよいC1~C6のアルキル基、
 C1~C6のハロアルキル基、
 置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
 置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
 C2~C6のハロアルケニル基、
 置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
 またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)であり;
R2が、ハロゲン原子、
 水酸基、
 シアノ基、
 置換基Bで適宜置換されてもよいC1~C6のアルキル基、
 C1~C6のハロアルキル基、
 置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、
 C1~C6のハロアルコキシ基、
 置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、
 置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、
 置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、
 R20C(=O)O-(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、
 またはR23-L2-(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)であり;
R3が、水素原子、
 ハロゲン原子、
 置換基Cで適宜置換されてもよいC1~C6のアルキル基、
 置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
 置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
 置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
 またはR30-L3-(ここで、R30は、前記のR23と同義であり、L3は、前記のL2と同義である。)であり;
Yが、フェニル基、またはピリジル基であり、
 該フェニル基は、置換基Dでオルト位が置換され、さらに置換基D1で、それぞれ独立して適宜0~4置換され、
 該ピリジル基は、置換基Dでオルト位が置換され、さらに置換基D1で、それぞれ独立して適宜0~3置換される、
[1]記載の有害生物防除組成物。
[2]
In the pyridone compound represented by the formula (1), R1 is a cyano group,
A C1-C6 alkyl group optionally substituted with substituent A,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent A,
A C2-C6 alkenyl group optionally substituted with the substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent A,
Or R10R11N- (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
R2 is a halogen atom,
Hydroxyl group,
A cyano group,
A C1-C6 alkyl group optionally substituted with the substituent B,
A C1-C6 haloalkyl group,
A C1-C6 alkoxy group optionally substituted with the substituent B,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
A C2-C6 alkenyloxy group optionally substituted with the substituent B,
A C3-C6 alkynyloxy group optionally substituted with the substituent B,
R20C (═O) O— (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group) , C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, C1-C6 Or a cycloalkyl group of C3 to C8, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group ),
Or R23-L2- (., Where, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 is, S, representing a SO or SO 2,) in there;
R3 is a hydrogen atom,
Halogen atoms,
A C1-C6 alkyl group optionally substituted with substituent C,
A C3-C8 cycloalkyl group optionally substituted with substituent C,
A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
A C2-C6 alkynyl group optionally substituted with substituent C,
Or R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above);
Y is a phenyl group or a pyridyl group;
The phenyl group is substituted at the ortho position with the substituent D, and further independently substituted with 0 to 4 substituents independently with the substituent D1,
The pyridyl group is substituted at the ortho position with the substituent D, and further independently substituted with 0 to 3 substituents independently with the substituent D1,
[1] The pest control composition as described in [1].
[3]
 式(1)で表されるピリドン化合物においてR1が、置換基Aで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基を表し;
R2が、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、または置換基Bで適宜置換されてもよいC1~C6のアルコキシ基を表し;
R3が、水素原子、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルキル基を表す、
[2]に記載の有害生物防除組成物。
[3]
In the pyridone compound represented by the formula (1), R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A;
R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B;
R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C.
The pest control composition according to [2].
[4]
 式(2a)又は式(2b)で表されるキノリン系化合物において、R2a及びR2bがそれぞれ独立していて、
置換基E1で適宜置換されてもよいC1~C6のアルキル基であり、
R2c及びR2dがそれぞれ独立していて、
水素原子、置換基E1で適宜置換されてもよいC1~C6のアルキル基又はハロゲン原子であり、
R2eが水素原子又は置換基E1で適宜置換されてもよいC1~C6のアルキル基であり、
X1がハロゲン原子であり、
X2がハロゲン原子であり、
n1が0~4の整数を表し、
n2が0~6の整数を表す[1]記載の有害生物防除組成物。
[4]
In the quinoline compound represented by the formula (2a) or the formula (2b), R2a and R2b are each independent,
A C1-C6 alkyl group optionally substituted with a substituent E1;
R2c and R2d are each independent,
A hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent E1, or a halogen atom,
R2e is a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent E1,
X1 is a halogen atom,
X2 is a halogen atom,
n1 represents an integer of 0 to 4,
The pest control composition according to [1], wherein n2 represents an integer of 0 to 6.
[5]
 式(2a)又は式(2b)で表されるキノリン系化合物が式(2c)又は式(2d)
Figure JPOXMLDOC01-appb-C000006

 [式中、R2fは水素原子又はメチル基を表し、X3、X4及びX5はそれぞれ独立して水素原子又はフッ素原子を表し、X6及びX7はそれぞれ独立して水素原子、メチル基又はフッ素原子を表す]で表されるキノリン系化合物である[1]記載の有害生物防除組成物。
[5]
The quinoline compound represented by formula (2a) or formula (2b) is represented by formula (2c) or formula (2d).
Figure JPOXMLDOC01-appb-C000006

[Wherein, R2f represents a hydrogen atom or a methyl group, X3, X4 and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group or a fluorine atom. The pesticidal composition according to [1], which is a quinoline compound represented by the formula:
[6]
 式(2a)又は式(2b)で表されるキノリン系化合物が
3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン、
3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン、
8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリンおよび
8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリンからなる群から選択される少なくとも1種である[4]記載の有害生物防除組成物。
[6]
The quinoline compound represented by the formula (2a) or the formula (2b) is 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline,
3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline,
8-Fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline and 8-fluoro-3- (5-fluoro- The pest control composition according to [4], which is at least one selected from the group consisting of 3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline.
[7]
 [1]に記載の有害生物防除組成物を施用して有害生物を防除する方法。
[7]
A method for controlling pests by applying the pest control composition according to [1].
[8]
 [1]に記載の式(1)で表されるピリドン化合物またはその塩を有効成分として含有する組成物と、[1]に記載の式(2a)又は式(2b)で表されるキノリン系化合物またはその塩を有効成分として含有する組成物とを同時に施用して有害生物を防除する方法。
[8]
A composition containing, as an active ingredient, a pyridone compound represented by the formula (1) according to [1] or a salt thereof, and a quinoline system represented by the formula (2a) or the formula (2b) according to [1] A method for controlling pests by simultaneously applying a compound or a salt thereof as an active ingredient.
[9]
 [1]に記載の式(1)で表されるピリドン化合物もしくはその塩を有効成分として含有する組成物、又は[1]に記載の式(2a)もしくは式(2b)で表されるキノリン系化合物もしくはその塩を有効成分として含有する組成物のいずれか一方を施用した後に、もう一方の組成物を施用して有害生物を防除する方法。
[9]
A composition containing, as an active ingredient, a pyridone compound represented by formula (1) according to [1] or a salt thereof, or a quinoline system represented by formula (2a) or formula (2b) according to [1] A method of controlling pests by applying one of the compositions containing a compound or a salt thereof as an active ingredient and then applying the other composition.
[10]
 [5]に記載の式(2c)又は式(2d)で表されるキノリン系化合物であって、R2fが水素原子又はメチル基であり、X3がフッ素原子であり、X4、X5、X6及びX7がそれぞれ独立して水素原子又はフッ素原子であるが、ただし式(2c)においてはX4、X5、X6又はX7のうち少なくとも1つがフッ素原子であり、式(2d)においてはX4又はX5のいずれかがフッ素原子であるキノリン系化合物又はその塩。
[10]
A quinoline compound represented by formula (2c) or formula (2d) according to [5], wherein R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, and X4, X5, X6 and X7 Are each independently a hydrogen atom or a fluorine atom, provided that in formula (2c) at least one of X4, X5, X6 or X7 is a fluorine atom, and in formula (2d), either X4 or X5 A quinoline compound or a salt thereof, wherein is a fluorine atom.
[11]
 式(2c)又は式(2d)で表されるキノリン系化合物が、
3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン、
8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリン、又は
8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリンである、
[10]記載のキノリン系化合物又はその塩。
[11]
A quinoline compound represented by formula (2c) or formula (2d)
3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline,
8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline, or 8-fluoro-3- (5-fluoro -3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline,
[10] The quinoline compound or salt thereof according to [10].
[12]
 式(2c)又は式(2d)で表されるキノリン系化合物が、
3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン又は
8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリンである、
[11]記載のキノリン系化合物又はその塩。
[12]
A quinoline compound represented by formula (2c) or formula (2d)
3- (4,4-Difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline or 8-fluoro-3- (5-fluoro-3,3,4,4 -Tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline,
[11] The quinoline compound or salt thereof according to [11].
[13]
 有害生物を防除する方法であって、それを必要とする植物個体、種子、土壌、苗箱、又はセルトレーに[1]に記載の式(I)の化合物またはその塩及び式(2a)又は式(2b)で表されるキノリン系化合物またはその塩の有効量を施用することを含む方法。
[13]
A method for controlling pests, comprising a compound of the formula (I) or a salt thereof and the formula (2a) or formula described in [1] on a plant individual, seed, soil, seedling box, or cell tray in need thereof A method comprising applying an effective amount of the quinoline compound represented by (2b) or a salt thereof.
[14]
 有害生物防除剤としての[1]に記載の式(I)の化合物またはその塩及び式(2a)又は式(2b)で表されるキノリン系化合物またはその塩の使用。
[14]
Use of the compound of formula (I) or a salt thereof according to [1] and a quinoline compound represented by formula (2a) or formula (2b) or a salt thereof as a pest control agent.
 本発明によれば、新規の有効成分を含有する有害生物を防除するのに有用な有害生物防除組成物およびその使用方法、ならびに新規キノリン系化合物を提供することができる。 According to the present invention, it is possible to provide a pest control composition useful for controlling pests containing a novel active ingredient, a method for using the same, and a novel quinoline compound.
 以下、本発明を実施するための形態について説明する。
 なお、特許請求の範囲および明細書中において用いられる各用語は、特に断らない限り、当該技術分野において一般的に用いられる定義によるものとする。
 本明細書において、使用する略号を以下に説明する。
DMF:N,N-ジメチルホルムアミド、THF:テトラヒドロフラン、Me:メチル基、Et:エチル基、Pr:プロピル基、Bu:ブチル基、Pentyl:ペンチル基、Hexyl:ヘキシル基、Ac:アセチル基、Ph:フェニル基、Py:ピリジル基、i:イソ、sec:セカンダリ、t:ターシャリ、c:シクロ、=:二重結合、≡:三重結合を表す。表のカラム中、単独の“-”は無置換を意味し、Pr、Bu、Pentyl、Hexylに関しては、接頭辞がない場合は、ノルマルを意味する。
Hereinafter, modes for carrying out the present invention will be described.
It should be noted that each term used in the claims and the specification is defined according to a definition generally used in the technical field unless otherwise specified.
In the present specification, abbreviations used are described below.
DMF: N, N-dimethylformamide, THF: tetrahydrofuran, Me: methyl group, Et: ethyl group, Pr: propyl group, Bu: butyl group, Pentyl: pentyl group, Hexyl: hexyl group, Ac: acetyl group, Ph: Phenyl group, Py: pyridyl group, i: iso, sec: secondary, t: tertiary, c: cyclo, =: double bond, ≡: triple bond. In the table columns, a single “-” means no substitution, and Pr, Bu, Pentyl, and Hexyl means normal when there is no prefix.
 以下に、本明細書中に使用される用語の定義を説明する。
 Cx~Cyとの記載は、x個からy個の炭素原子を有することを表す。
 用語「適宜置換されてもよい」とは、置換または無置換であることを意味する。この用語を用いる際、置換基の数が明示されていないときは、置換基の数は1であることを表す。
 C1~C6のアルキル基とは、直鎖状または分岐状でよく、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、ペンチル基、イソペンチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、ヘキシル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、1,3-ジメチルブチル基、2,3-ジメチルブチル基、または2-エチルブチル基等である。
The definitions of terms used in the present specification are explained below.
The description Cx-Cy has x to y carbon atoms.
The term “optionally substituted” means substituted or unsubstituted. When this term is used, the number of substituents is 1 when the number of substituents is not specified.
The C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl. Group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 2-ethylbutyl group and the like.
 ハロゲン原子とは、フッ素原子、塩素原子、臭素原子、またはヨウ素原子等である。 The halogen atom is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or the like.
 C1~C6のハロアルキル基とは、前記のC1~C6のアルキル基における水素が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルキル基の具体例として、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、モノクロロメチル基、モノブロモメチル基、モノヨードメチル基、クロロジフルオロメチル基、ブロモジフルオロメチル基、1-フルオロエチル基、2-フルオロエチル基、1,1-ジフルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,2,2-テトラフルオロエチル基、ペンタフルオロエチル基、2,2,2-トリクロロエチル基、3,3-ジフルオロプロピル基、3,3,3-トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エチル基、ノナフルオロブチル基、ノナフルオロ-sec-ブチル基、3,3,4,4,5,5,5-ヘプタフルオロペンチル基、ウンデカフルオロペンチル基、トリデカフルオロヘキシル基等が挙げられる。 The C1-C6 haloalkyl group represents a group in which the hydrogen in the C1-C6 alkyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C1-C6 haloalkyl group include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2 -Trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, nonafluoro sec- butyl group, 3,3,4,4,5,5,5-heptafluoro-pentyl group, undecyl decafluoropentyl, tridecafluorohexyl group, and the like.
 C1~C6のフルオロアルキル基とは、前記のC1~C6のアルキル基における水素が1個または2個以上のフッ素原子によって任意に置換されたものを表す。C1~C6のフルオロアルキル基の具体例として、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、1-フルオロエチル基、2-フルオロエチル基、1,1-ジフルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,2,2-テトラフルオロエチル基、ペンタフルオロエチル基、3,3-ジフルオロプロピル基、3,3,3-トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エチル基、ノナフルオロブチル基、ノナフルオロ-sec-ブチル基、3,3,4,4,5,5,5-ヘプタフルオロペンチル基、ウンデカフルオロペンチル基、トリデカフルオロヘキシル基等が挙げられる。 The C1-C6 fluoroalkyl group represents a group in which hydrogen in the C1-C6 alkyl group is optionally substituted with one or more fluorine atoms. Specific examples of the C1-C6 fluoroalkyl group include monofluoromethyl group, difluoromethyl group, trifluoromethyl group, 1-fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2- Difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group, pentafluoroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl Group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, nonafluoro-sec-butyl group, 3,3,4,4 , 5,5,5-heptafluoropentyl group, undecafluoropentyl group, tridecafluorohexyl group, etc. .
 C3~C8のシクロアルキル基とは、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、またはシクロオクチル基等である。 The C3-C8 cycloalkyl group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and the like.
 C2~C6のアルケニル基とは、1個もしくは2個以上の二重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルケニル基の具体例として、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、1-ペンテニル基、2-ペンテニル基、3-ペンテニル基、4-ペンテニル基、3-メチル-2-ブテニル基、1-ヘキセニル基、2-ヘキセニル基、3-ヘキセニル基、4-ヘキセニル基、5-ヘキセニル基、4-メチル-3-ペンテニル基、3-メチル-2-ペンテニル基等が挙げられる。 The C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched. In addition, when there is a geometric isomer, only one of E-form and Z-form, or a mixture of E-form and Z-form in an arbitrary ratio, it is particularly limited as long as it is in the range of the designated carbon number. Never happen. Specific examples of C2 to C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, and 3-pentenyl. Group, 4-pentenyl group, 3-methyl-2-butenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, 4-methyl-3-pentenyl group, And 3-methyl-2-pentenyl group.
 C2~C6のハロアルケニル基とは、前記のC2~C6のアルケニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニル基の具体例として、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、3,3-ジクロロアリル基、4,4-ジフルオロ-3-ブテニル基、5,5-ジフルオロ-4-ペンテニル基、6,6-ジフルオロ-5-ヘキセニル基等が挙げられる。 The C2-C6 haloalkenyl group represents a group in which the hydrogen atom in the C2-C6 alkenyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyl group include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
 C2~C6のアルキニル基とは、1個もしくは2個以上の三重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。C2~C6のアルキニル基の具体例として、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、1-ペンチニル基、2-ペンチニル基、3-ペンチニル基、4-ペンチニル基、1,1-ジメチル-2-プロピニル基、1-ヘキシニル基、2-ヘキシニル基、3-ヘキシニル基、4-ヘキシニル基、5-ヘキシニル基等が挙げられる。 The C2-C6 alkynyl group represents an unsaturated hydrocarbon group having one or more triple bonds and being linear or branched. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, and 3-pentynyl. Group, 4-pentynyl group, 1,1-dimethyl-2-propynyl group, 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group and the like.
 C2~C6のハロアルキニル基とは、前記のC2~C6のアルキニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルキニル基の具体例として、2-フルオロエチニル基、2-クロロエチニル基、2-ブロモエチニル基、2-ヨードエチニル基、3,3-ジフルオロ-1-プロピニル基、3-クロロ-3,3-ジフルオロ-1-プロピニル基、3-ブロモ-3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-1-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-1-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、4,4,4-トリフルオロ-2-ブチニル基、5,5-ジフルオロ-3-ペンチニル基、5-クロロ-5,5-ジフルオロ-3-ペンチニル基、5-ブロモ-5,5-ジフルオロ-3-ペンチニル基、5,5,5-トリフルオロ-3-ペンチニル基、6,6-ジフルオロ-4-ヘキシニル基、6-クロロ-6,6-ジフルオロ-4-ヘキシニル基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニル基、6,6,6-トリフルオロ-4-ヘキシニル基等が挙げられる。 The C2-C6 haloalkynyl group represents a group in which the hydrogen atom in the C2-C6 alkynyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkynyl group include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, 4,4,4-trifluoro-2-butynyl group 5 5-difluoro-3-pentynyl group, 5-chloro-5,5-difluoro-3-pentynyl group, 5-bromo-5,5-difluoro-3-pentynyl group, 5,5,5-trifluoro-3- Pentynyl group, 6,6-difluoro-4-hexynyl group, 6-chloro-6,6-difluoro-4-hexynyl group, 6-bromo-6,6-difluoro-4-hexynyl group, 6,6,6- And a trifluoro-4-hexynyl group.
  C1~C6のアルコキシ基とは、前記のC1~C6のアルキル基が酸素原子を介して結合したものを表す。C1~C6のアルコキシ基として、具体的には、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、t-ブトキシ基、ペンチルオキシ基、イソペンチルオキシ基、2-メチルブトキシ基、ネオペンチルオキシ基、1-エチルプロピルオキシ基、ヘキシルオキシ基、4-メチルペンチルオキシ基、3-メチルペンチルオキシ基、2-メチルペンチルオキシ基、1-メチルペンチルオキシ基、3,3-ジメチルブトキシ基、2,2-ジメチルブトキシ基、1,1-ジメチルブトキシ基、1,2-ジメチルブトキシ基、1,3-ジメチルブトキシ基、2,3-ジメチルブトキシ基、および2-エチルブトキシ基等が挙げられる。 The C1-C6 alkoxy group represents a C1-C6 alkyl group bonded through an oxygen atom. Specific examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group, and an isopentyloxy group. Group, 2-methylbutoxy group, neopentyloxy group, 1-ethylpropyloxy group, hexyloxy group, 4-methylpentyloxy group, 3-methylpentyloxy group, 2-methylpentyloxy group, 1-methylpentyloxy group Group, 3,3-dimethylbutoxy group, 2,2-dimethylbutoxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group, And 2-ethylbutoxy group.
 C1~C6のハロアルコキシ基とは、前記のC1~C6のアルコキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルコキシ基の具体例として、ジフルオロメトキシ基、トリフルオロメトキシ基、クロロジフルオロメトキシ基、ブロモジフルオロメトキシ基、2-フルオロエトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、1,1,2,2-テトラフルオロエトキシ基、ペンタフルオロエトキシ基、2,2,2-トリクロロエトキシ基、3,3-ジフルオロプロピルオキシ基、3,3,3-トリフルオロプロピルオキシ基、ヘプタフルオロプロピルオキシ基、ヘプタフルオロイソプロピルオキシ基、2,2,2-トリフルオロ-1-(トリフルオロメチル)-エトキシ基、ノナフルオロブトキシ基、ノナフルオロ-sec-ブトキシ基、3,3,4,4,5,5,5-ヘプタフルオロペンチルオキシ基、ウンデカフルオロペンチルオキシ基、トリデカフルオロヘキシルオキシ基等が挙げられる。 The C1-C6 haloalkoxy group represents a group in which the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C1-C6 haloalkoxy group include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group, tridecafluorohexyl group, and the like.
 C3~C8のシクロアルコキシ基とは、前記のC3~C8のシクロアルキル基が酸素原子を介して結合したものを表す。C3~C8のシクロアルコキシ基として、具体的には、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、およびシクロオクチルオキシ基等が挙げられる。 The C3-C8 cycloalkoxy group represents a group in which the C3-C8 cycloalkyl group is bonded via an oxygen atom. Specific examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.
 C2~C6のアルケニルオキシ基とは、前記のC2~C6のアルケニル基が酸素原子を介して結合したものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に制限されることはない。C2~C6のアルケニルオキシ基の具体例として、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、1-ペンテニルオキシ基、2-ペンテニルオキシ基、3-ペンテニルオキシ基、4-ペンテニルオキシ基、3-メチル-2-ブテニルオキシ基、1-ヘキセニルオキシ基、2-ヘキセニルオキシ基、3-ヘキセニルオキシ基、4-ヘキセニルオキシ基、5-ヘキセニルオキシ基、4-メチル-3-ペンテニルオキシ基、3-メチル-2-ペンテニルオキシ基等が挙げられる。 The C2-C6 alkenyloxy group is a group in which the C2-C6 alkenyl group is bonded through an oxygen atom. In addition, when there is a geometric isomer, only one of E-form and Z-form, or a mixture of E-form and Z-form in an arbitrary ratio, is not particularly limited as long as it is within the specified carbon number range. Never happen. Specific examples of the C2-C6 alkenyloxy group include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group 3-pentenyloxy group, 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
 C2~C6のハロアルケニルオキシ基とは、前記のC2~C6のアルケニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニルオキシ基の具体例として、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、3,3-ジクロロアリルオキシ基、4,4-ジフルオロ-3-ブテニルオキシ基、5,5-ジフルオロ-4-ペンテニルオキシ基、6,6-ジフルオロ-5-ヘキセニルオキシ基等が挙げられる。 The C2-C6 haloalkenyloxy group represents a group in which the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyloxy group include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro. Allyloxy group, 3,3-dichloroallyloxy group, 4,4-difluoro-3-butenyloxy group, 5,5-difluoro-4-pentenyloxy group, 6,6-difluoro-5-hexenyloxy group, etc. It is done.
 C3~C6のアルキニルオキシ基とは、前記のC2~C6のアルキニル基のうち、C3~C6のアルキニル基が酸素原子を介して結合したものを表す。C3~C6のアルキニルオキシ基の具体例として、プロパルギルオキシ基、2-ブチニルオキシ基、3-ブチニルオキシ基、2-ペンチニルオキシ基、3-ペンチニルオキシ基、4-ペンチニルオキシ基、1,1-ジメチル-2-プロピニルオキシ基、、2-ヘキシニルオキシ基、3-ヘキシニルオキシ基、4-ヘキシニルオキシ基、5-ヘキシニルオキシ基等が挙げられる。 The C3-C6 alkynyloxy group represents a group in which the C3-C6 alkynyl group is bonded via an oxygen atom among the C2-C6 alkynyl groups. Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1 -Dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
 C3~C6のハロアルキニルオキシ基とは、前記のC3~C6のアルキニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C3~C6のハロアルキニルオキシ基の具体例として、1,1-ジフルオロ-2-プロピニルオキシ基、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、4,4,4-トリフルオロ-2-ブチニルオキシ基、5,5-ジフルオロ-3-ペンチニルオキシ基、5-クロロ-5,5-ジフルオロ-3-ペンチニルオキシ基、5-ブロモ-5,5-ジフルオロ-3-ペンチニルオキシ基、5,5,5-トリフルオロ-3-ペンチニルオキシ基、6,6-ジフルオロ-4-ヘキシニルオキシ基、6-クロロ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6,6,6-トリフルオロ-4-ヘキシニルオキシ基等が挙げられる。 The C3-C6 haloalkynyloxy group represents a group in which the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C3-C6 haloalkynyloxy group include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6,6-difluoro-4-hexynyloxy group, 6,6,6- Trifluoroacetic 4- hexynyloxy group.
 C2~C6のアルコキシアルコキシ基とは、前記のC1~C6のアルコキシ基のうちC1~C5のアルコシキ基における水素原子が、1個または2個以上のC1~C5アルコキシ基で任意に置換されたものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルコキシアルコキシ基の具体例として、メトキシメトキシ基、エトキシメトキシ基、プロピルオキシメトキシ基、イソプロピルオキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、プロピルオキシエトキシ基、イソプロピルオキシエトキシ基、メトキシプロピルオキシ基、エトキシプロピルオキシ基、プロピルオキシプロピルオキシ基、イソプロピルオキシプロピルオキシ基等が挙げられる。 The C2-C6 alkoxyalkoxy group is a group in which the hydrogen atom in the C1-C5 alkoxy group in the C1-C6 alkoxy group is optionally substituted with one or more C1-C5 alkoxy groups Represents. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range. Specific examples of C2-C6 alkoxyalkoxy groups include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group, and an isopropyloxypropyloxy group.
 C2~C12のアルコキシアルキル基とは、前記のC1~C6のアルキル基に、前記のC1~C6のアルコキシ基が結合したものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。C2~C12のアルコキシアルキル基の具体例として、メトキシメチル基、エトキシメチル基、2-メトキシエチル基、2-エトキシエチル基等が挙げられる。 The C2-C12 alkoxyalkyl group represents a group in which the C1-C6 alkoxy group is bonded to the C1-C6 alkyl group. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range. Specific examples of the C2-C12 alkoxyalkyl group include a methoxymethyl group, an ethoxymethyl group, a 2-methoxyethyl group, and a 2-ethoxyethyl group.
 C2~C7のアルキルオキシカルボニル基とは、カルボニル基に前記のC1~C6のアルコキシ基が結合したものを表す。C2~C7のアルキルオキシカルボニル基の具体例として、メトキシカルボニル基、エトキシカルボニル基、プロピルオキシカルボニル基、イソプロピルオキシカルボニル基、1-ブチルオキシカルボニル基、2-ブチルオキシカルボニル基、1-ペンチルオキシカルボニル基、1-エチルプロピルオキシカルボニル基、1-ヘキシルカルボニル基等が挙げられる。 The C2-C7 alkyloxycarbonyl group represents a carbonyl group bonded to the C1-C6 alkoxy group. Specific examples of the C2-C7 alkyloxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, a propyloxycarbonyl group, an isopropyloxycarbonyl group, a 1-butyloxycarbonyl group, a 2-butyloxycarbonyl group, and a 1-pentyloxycarbonyl group. Group, 1-ethylpropyloxycarbonyl group, 1-hexylcarbonyl group and the like.
 C1~C6のアルキルチオ基とは、前記のC1~C6のアルキル基に硫黄原子が結合したものを表す。C1~C6のアルキルチオ基の具体例として、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、ブチルチオ基、イソブチルチオ基、sec-ブチルチオ基、t-ブチルチオ基、ペンチルチオ基、イソペンチルチオ基、2-メチルブチルチオ基、ネオペンチルチオ基、1-エチルプロピルチオ基、ヘキシルチオ基、4-メチルペンチルチオ基、3-メチルペンチルチオ基、2-メチルペンチルチオ基、1-メチルペンチルチオ基、3,3-ジメチルブチルチオ基、2,2-ジメチルブチルチオ基、1,1-ジメチルブチルチオ基、1,2-ジメチルブチルチオ基、1,3-ジメチルブチルチオ基、2,3-ジメチルブチルチオ基、2-エチルブチルチオ基等が挙げられる。 The C1-C6 alkylthio group is a group in which a sulfur atom is bonded to the C1-C6 alkyl group. Specific examples of the C1-C6 alkylthio group include methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec-butylthio group, t-butylthio group, pentylthio group, isopentylthio group, 2 -Methylbutylthio group, neopentylthio group, 1-ethylpropylthio group, hexylthio group, 4-methylpentylthio group, 3-methylpentylthio group, 2-methylpentylthio group, 1-methylpentylthio group, 3 , 3-dimethylbutylthio group, 2,2-dimethylbutylthio group, 1,1-dimethylbutylthio group, 1,2-dimethylbutylthio group, 1,3-dimethylbutylthio group, 2,3-dimethylbutyl group Examples thereof include a thio group and a 2-ethylbutylthio group.
 C2~C7のアシル基とは、カルボニル基に前記のC1~C6アルキル基が結合したものを表す。C2~C7のアシル基の具体例として、アセチル基、プロパノイル基、1-ブタノイル基、2-メチルプロパノイル基、1-ペンタノイル基、2-メチルブタノイル基、1-ヘキサノイル基、2-メチルペンタノイル基、2-エチルブタノイル基等が挙げられる。 The C2-C7 acyl group represents a carbonyl group bonded to the C1-C6 alkyl group. Specific examples of the C2 to C7 acyl group include acetyl group, propanoyl group, 1-butanoyl group, 2-methylpropanoyl group, 1-pentanoyl group, 2-methylbutanoyl group, 1-hexanoyl group, 2-methylpenta Examples include noyl group and 2-ethylbutanoyl group.
 C3~C8のアルキルスルホニルエチル基とは、スルホニルエチル基の硫黄原子上に前記のC1~C6アルキル基が結合したものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。C3~C8のアルキルスルホニルエチル基として、2-メチルスルホニルエチル基、2-エチルスルホニルエチル基、2-(1-プロピルスルホニル)エチル基、2-(2-プロピルスルホニル)エチル基、1-メチル-2-メチルスルホニルエチル基、1-エチル-2-メチルスルホニルエチル基、2-メチル-2-メチルスルホニルエチル基、2-エチル-2-エチルスルホニルエチル基、1-メチル-2-メチル-2メチルスルホニルエチル基等が挙げられる。 The C3-C8 alkylsulfonylethyl group represents a group in which the C1-C6 alkyl group is bonded to the sulfur atom of the sulfonylethyl group. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range. Examples of the C3-C8 alkylsulfonylethyl group include 2-methylsulfonylethyl group, 2-ethylsulfonylethyl group, 2- (1-propylsulfonyl) ethyl group, 2- (2-propylsulfonyl) ethyl group, 1-methyl- 2-methylsulfonylethyl group, 1-ethyl-2-methylsulfonylethyl group, 2-methyl-2-methylsulfonylethyl group, 2-ethyl-2-ethylsulfonylethyl group, 1-methyl-2-methyl-2-methyl A sulfonylethyl group etc. are mentioned.
 アリール基とは、C6~C14の1~3環性の芳香族の環を表す。アリール基の具体例として、フェニル基、ナフチル基、アントラセニル基等が挙げられる。 The aryl group represents a C6 to C14 1 to 3 aromatic ring. Specific examples of the aryl group include a phenyl group, a naphthyl group, and an anthracenyl group.
 ヘテロアリール基とは、1個又は2個以上の同一又は異なる環構成ヘテロ原子を含む5乃至14員の1~3環性の芳香族の環を表す。ヘテロ原子の種類は特に限定されないが、窒素原子、酸素原子、硫黄原子などを例示することができる。ヘテロアリール基の具体例として、フリル基、チエニル基、ピロリル基、オキサゾリル基、イソオキサゾリル基、ジヒドロイソオキサゾリル基、チアゾリル基、イソチアゾリル基、イミダゾリル基、ピラゾリル基、オキサジアゾリル基、チアジアゾリル基、トリアゾリル基、テトラゾリル基、ピリジル基、アゼピニル基、オキサゼピニル基などの5乃至7員の単環式ヘテロアリール基、ベンゾフラニル基、イソベンゾフラニル基、ベンゾチエニル基、インドリル基、イソインドリル基、インダゾリル基、ベンゾオキサゾリル基、ベンゾイソオキサゾリル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、ベンゾオキサジアゾリル基、ベンゾチアジアゾリル基、ベンゾトリアゾリル基、キノリル基、イソキノリル基、シンノリニル基、キナゾリニル基、キノキサリニル基、フタラジニル基、ナフチリジニル基、プリニル基、プテリジニル基、カルバゾリル基、カルボリニル基、アクリジニル基、2-アクリジニル、3-アクリジニル、4-アクリジニル、9-アクリジニル、フェノキサジニル基、フェノチアジニル基、フェナジニル基などの8乃至14員の多環性ヘテロアリール基が挙げられる。 The heteroaryl group represents a 5- to 14-membered 1 to 3 ring aromatic ring containing one or two or more identical or different ring-constituting heteroatoms. Although the kind of hetero atom is not specifically limited, A nitrogen atom, an oxygen atom, a sulfur atom, etc. can be illustrated. Specific examples of heteroaryl groups include furyl, thienyl, pyrrolyl, oxazolyl, isoxazolyl, dihydroisoxazolyl, thiazolyl, isothiazolyl, imidazolyl, pyrazolyl, oxadiazolyl, thiadiazolyl, triazolyl , Tetrazolyl group, pyridyl group, azepinyl group, oxazepinyl group, etc. 5- to 7-membered monocyclic heteroaryl group, benzofuranyl group, isobenzofuranyl group, benzothienyl group, indolyl group, isoindolyl group, indazolyl group, benzooxa Zolyl group, benzoisoxazolyl group, benzothiazolyl group, benzisothiazolyl group, benzoxiadiazolyl group, benzothiadiazolyl group, benzotriazolyl group, quinolyl group, isoquinolyl group, cinnolinyl group, quinazol Nyl group, quinoxalinyl group, phthalazinyl group, naphthyridinyl group, purinyl group, pteridinyl group, carbazolyl group, carbolinyl group, acridinyl group, 2-acridinyl, 3-acridinyl, 4-acridinyl, 9-acridinyl, phenoxazinyl group, phenothiazinyl group, Examples thereof include 8- to 14-membered polycyclic heteroaryl groups such as a phenazinyl group.
 アラルキル基とは、前記のC1~C6のアルキル基の1つ又は2つ以上の水素原子が前記アリール基で置換された基を表す。アラルキル基の具体例として、ベンジル基、1-ナフチルメチル基、2-ナフチルメチル基、アントラセニルメチル基、フェナントレニルメチル基、アセナフチレニルメチル基、ジフェニルメチル基、1-フェネチル基、2-フェネチル基、1-(1-ナフチル)エチル基、1-(2-ナフチル)エチル基、2-(1-ナフチル)エチル基、2-(2-ナフチル)エチル基、3-フェニルプロピル基、3-(1-ナフチル)プロピル基、3-(2-ナフチル)プロピル基、4-フェニルブチル基、4-(1-ナフチル)ブチル基、4-(2-ナフチル)ブチル基、5-フェニルペンチル基、5-(1-ナフチル)ペンチル基、5-(2-ナフチル)ペンチル基、6-フェニルヘキシル基、6-(1-ナフチル)ヘキシル基、6-(2-ナフチル)ヘキシル基が挙げられる The aralkyl group represents a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted with the aryl group. Specific examples of the aralkyl group include benzyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, anthracenylmethyl group, phenanthrenylmethyl group, acenaphthylenylmethyl group, diphenylmethyl group, 1-phenethyl group. 2-phenethyl group, 1- (1-naphthyl) ethyl group, 1- (2-naphthyl) ethyl group, 2- (1-naphthyl) ethyl group, 2- (2-naphthyl) ethyl group, 3-phenylpropyl Group, 3- (1-naphthyl) propyl group, 3- (2-naphthyl) propyl group, 4-phenylbutyl group, 4- (1-naphthyl) butyl group, 4- (2-naphthyl) butyl group, 5- Phenylpentyl group, 5- (1-naphthyl) pentyl group, 5- (2-naphthyl) pentyl group, 6-phenylhexyl group, 6- (1-naphthyl) hexyl group, 6- (2-naphthyl) ) Hexyl group
 C3~C10のシクロアルキル環とは、シクロプロピル環、シクロブチル環、シクロペンチル環、シクロヘキシル環、シクロヘプチル環、またはシクロオクチル環等である。 The C3-C10 cycloalkyl ring includes a cyclopropyl ring, a cyclobutyl ring, a cyclopentyl ring, a cyclohexyl ring, a cycloheptyl ring, a cyclooctyl ring, and the like.
 N-ヒドロキシアルカンイミドイル基とは、ヒドロキシイミノメチル基、N-ヒドロキシエタンイミドイル基、N-ヒドロキシプロパンイミドイル基、N-ヒドロキシブタンイミドイル基等である。 The N-hydroxyalkaneimidoyl group includes a hydroxyiminomethyl group, an N-hydroxyethaneimidoyl group, an N-hydroxypropanimidyl group, an N-hydroxybutanimidoyl group, and the like.
 1~2個の酸素原子を含む3~6員環の基の具体例として、1,2-エポキシエタニル基、オキセタニル基、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、1,3-ジオキサニル基、1,4-ジオキサニル基等が挙げられる。 Specific examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyethanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include a dioxanyl group and a 1,4-dioxanyl group.
 本発明の有害生物防除組成物(以下、単に本発明の組成物ということがある)は、下記式(1)で表されるピリドン化合物またはその塩(本明細書において、単に式(1)で表される化合物、本発明化合物と呼ぶことがある)と式(2a)又は式(2b)で表されるキノリン系化合物またはその塩(本明細書において、単に式(2a)又は式(2b)で表される化合物、あるいは総称してキノリン系化合物と呼ぶことがある)から選ばれる1種以上の成分を有効成分として組み合わせることを特徴とする。 The pest control composition of the present invention (hereinafter sometimes simply referred to as the composition of the present invention) is a pyridone compound represented by the following formula (1) or a salt thereof (herein, simply represented by the formula (1)). A compound represented by the present invention) and a quinoline compound represented by formula (2a) or formula (2b) or a salt thereof (in this specification, simply represented by formula (2a) or formula (2b) 1 or more components selected from the compounds represented by the formula (or generically referred to as quinoline compounds).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007

Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 以下、式(1)について説明する。
 式(1)のR1は、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)を表す。
Hereinafter, Formula (1) is demonstrated.
R1 in the formula (1) is a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-C8 optionally substituted with a substituent A. A C2-C6 alkenyl group optionally substituted with a substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent A, C2-C6 Haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituent C2-C6 alkenyloxy group optionally substituted with A, C2-C6 haloalkenyloxy group, C3-C6 alkynyloxy group optionally substituted with substituent A, C3-C6 Halo alkynyloxy group, or R10R11N- (wherein, R10, and R11 are each independent represent. A hydrogen atom or an alkyl group C1 ~ C6,) represents a.
 中でもR1は、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはR10R11N-(ここで、R10およびR11は、前記と同義である。)が好ましく、
 特に、置換基Aで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基が好ましい。
Among them, R1 is a cyano group, a C1-C6 alkyl group optionally substituted with the substituent A, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with the substituent A, a substituted group. A C2-C6 alkenyl group optionally substituted with a group A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent A, or R10R11N- (where R10 and R11 is as defined above.)
In particular, a C1-C6 alkyl group or a C1-C6 haloalkyl group which may be optionally substituted with the substituent A is preferable.
 式(1)の「置換基A」とは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R12R13N-(ここで、R12およびR13は、それぞれ独立していて、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR12およびR13は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、およびR14-L1-(ここで、R14は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L1は、S、SO、またはSOを表す。)からなる群から選択される少なくとも1種を表す。 The “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, R12R13N. -(Wherein R12 and R13 are each independently a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 are , Together with the nitrogen atom to which it is attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (where R14 is represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L1 is, S, SO, or SO 2 Represents at least one selected from the group consisting of:
 中でも置換基Aは、シアノ基、C1~C6のアルコキシ基、またはR14-L1-(ここで、R14およびL1は、前記と同義である。)が好ましく、
 特に、シアノ基、またはC1~C6のアルコキシ基が好ましい。
Among them, the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or R14-L1- (wherein R14 and L1 are as defined above),
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
 置換基Aの好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
R12R13N-(ここで、R12およびR13は、前記と同義である。)として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基;
ならびにR14-L1-(ここで、R14およびL1は、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられる。
Preferred specific examples of the substituent A include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
R12R13N— (wherein R12 and R13 have the same meanings as described above), an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
And R14-L1- (wherein R14 and L1 are as defined above), a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group Can be mentioned.
 置換基Aのさらに好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基;
R12R13N-(ここで、R12およびR13は、前記と同義である。)として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基;
ならびにR14-L1-(ここで、R14およびL1は、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。
As more preferred specific examples of the substituent A, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
R12R13N- (wherein R12 and R13 have the same meanings as described above), dimethylamino group, ethylmethylamino group, and diethylamino group;
And R14-L1- (wherein R14 and L1 are as defined above) include a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
 式(1)のR1には、水酸基、およびシアノ基が含まれる。
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Aを有する場合、C1~C6のアルキル基における水素原子が、置換基Aによって任意に置換される。
R1 in the formula (1) includes a hydroxyl group and a cyano group.
The C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group. In the case of having the substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R1 of the formula (1) has the same definition as described above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, a 2,2,2-trifluoro group. An ethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, and more preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, or a 2,2,2- A trifluoroethyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Aを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Aによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、またはアリル基であり、さらに好ましくは、ビニル基、またはアリル基である。置換基Aを有する場合、C2~C6のアルケニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyl group of the “C2-C6 alkenyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、3-フルオロアリル基、または3,3-ジフルオロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R1 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or A 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、プロパルギル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、プロパルギル基である。置換基Aを有する場合、C2~C6のアルキニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, more preferably a propargyl group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基である。 The “C2-C6 haloalkynyl group” in R1 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl Or a 4,4,4-trifluoro-2-butynyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、またはエトキシ基である。置換基Aを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group or an ethoxy group. In the case of having the substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R1 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Aを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C3-C8 cycloalkoxy group in the “C3-C8 cycloalkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. In the case of having the substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted with the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基であり、さらに好ましくは、ビニルオキシ基である。置換基Aを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyloxy group of “C2-C6 alkenyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニルオキシ基」とは、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、3-フルオロアリルオキシ基、または3,3-ジフルオロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” in R1 of the formula (1) has the same definition as above, preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro An allyloxy group or a 3,3-difluoroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Aを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group. In the case of having the substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C3~C6のハロアルキニルオキシ基」とは、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R1 of the formula (1) has the same definition as described above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- A difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 -Butynyloxy group or 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR1における「R10R11N-」(ここで、R10およびR11は、それぞれ独立していて、水素原子またはC1~C6のアルキル基を表す。)のC1~C6のアルキル基は、前記の定義と同義である。「R10R11N-」として、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられ、さらに好ましくは、アミノ基、およびジメチルアミノ基が挙げられる。 The C1-C6 alkyl group of “R10R11N—” in R1 of the formula (1) (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group) Synonymous with definition. “R10R11N—” is preferably an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group, more preferably an amino group and a dimethylamino group.
 R2は、ハロゲン原子、水酸基、シアノ基、ニトロ基、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Bで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Bで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、R20C(=O)-(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)、R20C(=O)O-(ここで、R20は、前記と同義である。)、1~2個の酸素原子を含む3~6員環の基、R23-L2-(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)、R21R22N-(ここで、R21およびR22は、前記と同義である。)、またはR24C(=O)N(R25)-(ここで、R24は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、前記と同義である。)を表し、R25は、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表す。 R2 is a halogen atom, a hydroxyl group, a cyano group, a nitro group, a C1-C6 alkyl group that may be optionally substituted with a substituent B, a C1-C6 haloalkyl group, and a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent B, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent B, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent B, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent B, substituted C2-C6 alkenyloxy group optionally substituted with group B, C2-C6 haloalkenyloxy group, C3-C6 alkynyloxy group optionally substituted with substituent B A C3 to C6 haloalkynyloxy group, R20C (═O) — (wherein R20 is a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 cycloalkyl group, An alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently substituted with a hydrogen atom or a substituent B1). Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group , Represents a piperidinyl group, a homopiperidinyl group, or an azocanyl group.), R 0C (═O) O— (where R20 is as defined above), a 3- to 6-membered ring group containing 1 to 2 oxygen atoms, R23-L2- (where R23 is Represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, L2 represents S, SO, or SO 2 ), R21R22N— (wherein R21 and R22 are as defined above). Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is a hydrogen atom or a substituent B1. Place Which may be C1 ~ C6 alkyl group, a cycloalkyl group of haloalkyl group having C1 ~ C6 or C3 ~ C8,. ).
 中でもR2は、ハロゲン原子、水酸基、シアノ基、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、R20C(=O)O-(ここで、R20は、前記と同義である。)、またはR23-L2-(ここで、R23およびL2は、前記と同義である。)が好ましく、
 特に、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、または置換基Bで適宜置換されてもよいC1~C6のアルコキシ基が好ましい。
Among them, R2 is a halogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C1-C6 optionally substituted with a substituent B. An alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group optionally substituted with the substituent B, a C2-C6 alkenyloxy group optionally substituted with the substituent B, a substituent B Or an optionally substituted C3-C6 alkynyloxy group, R20C (═O) O— (wherein R20 is as defined above), or R23-L2- (wherein R23 and L2 are , As defined above) is preferred,
In particular, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with the substituent B, or a C1-C6 alkoxy group that may be optionally substituted with the substituent B is preferable.
 式(1)の「置換基B」とは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、R21R22N-(ここで、R21およびR22は、前記と同義である。)、R23-L2-(ここで、R23およびL2は、前記と同義である。)、R26R27R28Si-(ここで、R26、R27、およびR28は、それぞれ独立していて、C1~C6のアルキル基を表す。)、R26R27R28Si-(CH)s-O-(ここで、sは、1~3の整数を表し、R26、R27、およびR28は、前記と同義である。)、R20C(=O)-(ここで、R20は、前記のR20と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種を表す。 “Substituent B” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2 To C6 alkoxyalkoxy groups, R21R22N- (wherein R21 and R22 are as defined above), R23-L2- (wherein R23 and L2 are as defined above), R26R27R28Si- ( Here, R26, R27, and R28 are each independently a C1-C6 alkyl group.), R26R27R28Si— (CH 2 ) s—O— (wherein s is an integer of 1 to 3) R26, R27, and R28 are as defined above, R20C (═O) — (wherein R20 is as defined above for R20), and ~ Represents at least one member selected from the group consisting of groups 3 to 6-membered ring containing two oxygen atoms.
 中でも置換基Bは、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C2~C6のアルコキシアルコキシ基、R23-L2-(ここで、R23およびL2は、前記と同義である。)、R26R27R28Si-(ここで、R26、R27、およびR28は、前記と同義である。)、R26R27R28Si-(CH)s-O-(ここで、s、R26、R27、およびR28は、前記と同義である。)、R20C(=O)-(ここで、R20は、前記と同義である。)、または1~2個の酸素原子を含む3~6員環の基が好ましく、
 特に、シアノ基、またはC1~C6のアルコキシ基が好ましい。
Among them, the substituent B is a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C2-C6 alkoxyalkoxy group, R23-L2- (wherein R23 and L2 are as defined above). ), R26R27R28Si— (wherein R26, R27, and R28 are as defined above), R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27, and R28 are R20C (═O) — (wherein R20 is as defined above), or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms is preferred,
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
 置換基Bの好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、およびメトキシプロピルオキシ基;
R21R22N-(ここで、R21およびR22は、前記のと同義である。)として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基;
R23-L2-(ここで、R23およびL2は、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基;
R26R27R28Si-(ここで、R26、R27、およびR28は、前記と同義である。)として、トリメチルシリル基、およびトリエチルシリル基;
R26R27R28Si-(CH)s-O-(ここで、s、R26、R27、およびR28は、前記と同義である。)として、2-(トリメチルシリル)エトキシ基、および2-(トリエチルシリル)エトキシ基;
R20C(=O)-(ここで、R20は、前記と同義である。)として、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、および1,3-ジオキサニル基が挙げられる。
Preferred specific examples of the substituent B include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
Methoxymethoxy, ethoxymethoxy, methoxyethoxy, ethoxyethoxy, and methoxypropyloxy groups as C2-C6 alkoxyalkoxy groups;
R21R22N— (wherein R21 and R22 have the same meanings as described above), and include amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group;
R23-L2- (wherein R23 and L2 have the same meanings as described above), methylthio group, methanesulfinyl group, methanesulfonyl group, trifluoromethylthio group, trifluoromethanesulfinyl group, and trifluoromethanesulfonyl group;
R26R27R28Si- (wherein R26, R27, and R28 are as defined above), a trimethylsilyl group, and a triethylsilyl group;
R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27, and R28 have the same meanings as described above), 2- (trimethylsilyl) ethoxy group, and 2- (triethylsilyl) ethoxy group ;
R20C (═O) — (wherein R20 has the same meaning as above), acetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinyl A carbonyl group and a piperidinylcarbonyl group;
In addition, examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, and a 1,3-dioxanyl group.
 置換基Bのさらに好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、およびエトキシエトキシ基;
R21R22N-(ここで、R21およびR22は、前記と同義である。)として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基;
R23-L2-(ここで、R23およびL2は、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基;
R26R27R28Si-(ここで、R26、R27、およびR28は、前記と同義である。)として、トリメチルシリル基;
R26R27R28Si-(CH)s-O-(ここで、s、R26、R27、およびR28は、前記と同義である。)として、2-(トリメチルシリル)エトキシ基;
R20C(=O)-(ここで、R20は、前記と同義である。)として、アセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、およびジエチルアミノカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、1,3-ジオキソラニル基、および1,3-ジオキサニル基が挙げられる。
As more preferred specific examples of the substituent B, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
A methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group as the C2-C6 alkoxyalkoxy group;
R21R22N— (wherein R21 and R22 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
R23-L2- (wherein R23 and L2 are as defined above), a methylthio group, a methanesulfinyl group, and a methanesulfonyl group;
R26R27R28Si- (wherein R26, R27, and R28 are as defined above), a trimethylsilyl group;
2- (trimethylsilyl) ethoxy group as R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27 and R28 are as defined above);
R20C (═O) — (wherein R20 has the same meaning as described above), and includes an acetyl group, a difluoroacetyl group, a trifluoroacetyl group, a methoxycarbonyl group, an ethoxycarbonyl group, an aminocarbonyl group, and a dimethylaminocarbonyl group. , Ethylmethylaminocarbonyl group, and diethylaminocarbonyl group;
Examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,3-dioxolanyl group and a 1,3-dioxanyl group.
 式(1)の「置換基B1」とは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種を表す。中でも置換基B1は、シアノ基、またはC1~C6のアルコキシ基が好ましい。 The “substituent B1” in the formula (1) is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group. To express. Among these, the substituent B1 is preferably a cyano group or a C1-C6 alkoxy group.
 置換基B1の好ましい具体例として、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。
Preferred specific examples of the substituent B1 include a cyano group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
In addition, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
 置換基B1のさらに好ましい具体例として、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。
As a more preferred specific example of the substituent B1, a cyano group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
 式(1)のR2におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。
 式(1)のR2には、水酸基、シアノ基、およびニトロ基が含まれる。
The halogen atom in R2 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
R2 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基である。置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。 The C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group, or an isopropyl group. In the case of having the substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent B.
 式(1)のR2における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Bを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Bによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, and preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent B, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent B.
 式(1)のR2における「置換基Bで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Bを有する場合、C2~C6のアルケニル基における水素原子が、置換基Bによって任意に置換される。 The C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent B” in R2 of formula (1) has the same definition as above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent B.
 式(1)のR2における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R2 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Bを有する場合、C2~C6のアルキニル基における水素原子が、置換基Bによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent B.
 式(1)のR2における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R2 of the formula (1) has the same definition as above, preferably 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、またはペンチルオキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはペンチルオキシ基である。置換基Bを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Bによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, preferably a methoxy group, an ethoxy group Propyloxy group, isopropyloxy group, butoxy group, isobutoxy group or pentyloxy group, more preferably methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group or pentyloxy group. In the case of having the substituent B, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent B.
 式(1)のR2における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Bを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Bによって任意に置換される。 The C3-C8 cycloalkoxy group of the “C3-C8 cycloalkoxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. In the case of having the substituent B, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent B.
 式(1)のR2における「置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Bを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Bによって任意に置換される。 The C2-C6 alkenyloxy group of the “C2-C6 alkenyloxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a vinyloxy group, A 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group, or a 3-butenyloxy group, and more preferably a vinyloxy group, a 1-propenyloxy group, or an allyloxy group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent B.
 式(1)のR2における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same definition as above, and preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or 2,2-difluoro It is a vinyloxy group.
 式(1)のR2における「置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Bを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Bによって任意に置換される。 The C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent B” in R2 of formula (1) is as defined above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group. In the case of having the substituent B, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent B.
 式(1)のR2における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyloxy group, a 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- A butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR2における「R20C(=O)-」(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)の各用語は、前記の定義と同義である。「R20C(=O)-」として、好ましくは、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基が挙げられ、さらに好ましくは、アセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、およびジエチルアミノカルボニル基が挙げられる。 “R20C (═O) —” in R2 of the formula (1) (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently a hydrogen atom or a C1-C6 group optionally substituted with a substituent B1). Represents a C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, are aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl Each of which represents a group, a homopiperidinyl group, or an azocanyl group). Righteousness and are synonymous. “R20C (═O) —” is preferably an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, a 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinylcarbonyl group, and piperidinylcarbonyl group More preferably, acetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethyl group Bruno carbonyl group, and a diethylamino group.
 式(1)のR2における「R20C(=O)O-」のR20は、前記と同義である。「R20C(=O)O-」として、好ましくは、アセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、およびピペリジニルカルボニルオキシ基が挙げられ、より好ましくは、アセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、およびジエチルアミノカルボニルオキシ基が挙げられる。 R20 of “R20C (═O) O—” in R2 of the formula (1) has the same meaning as described above. “R20C (═O) O—” is preferably an acetyloxy group, a propionyloxy group, a difluoroacetyloxy group, a trifluoroacetyloxy group, a cyclopropanecarbonyloxy group, a methoxycarbonyloxy group, an ethoxycarbonyloxy group, 2 , 2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group Group, pyrrolidinylcarbonyloxy group, and piperidinylcarbonyloxy group, more preferably acetyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group. Shi group, methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylamino carbonyloxy groups, and diethylamino carbonyl group.
 式(1)のR2における「1~2個の酸素原子を含む3~6員環の基」は、前記の定義と同義であり、好ましくは、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、または1,3-ジオキサニル基であり、さらに好ましくは、1,3-ジオキソラニル基、または1,3-ジオキサニル基である。 The “3- to 6-membered ring group containing 1 to 2 oxygen atoms” in R2 of the formula (1) has the same definition as above, and preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group Or a 1,3-dioxanyl group, and more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
 式(1)のR2における「R23-L2-」(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)の各用語は、前記の定義と同義である。「R23-L2-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、トリフルオロメタンスルホニル基、(クロロメチル)チオ基、(クロロメタン)スルフィニル基、および(クロロメタン)スルホニル基が挙げられ、さらに好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、(クロロメチル)チオ基、(クロロメタン)スルフィニル基、および(クロロメタン)スルホニル基が挙げられる。 “R23-L2-” in R2 of Formula (1) (wherein R23 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L2 represents S, SO, or SO 2 ). ) Are as defined above. “R23-L2-” is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, a trifluoromethanesulfonyl group, a (chloromethyl) thio group, or a (chloromethane) sulfinyl group. And (chloromethane) sulfonyl group, more preferably, methylthio group, methanesulfinyl group, methanesulfonyl group, (chloromethyl) thio group, (chloromethane) sulfinyl group, and (chloromethane) sulfonyl group. It is done.
 式(1)のR2における「R21R22N-」のR21およびR22は、前記と同義である。「R21R22N-」として、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基が挙げられ、さらに好ましくは、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられる。 R21 and R22 of “R21R22N-” in R2 of the formula (1) have the same meanings as described above. “R21R22N—” preferably includes an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group, and more preferably a dimethylamino group, an ethylmethylamino group, and a diethylamino group. Is mentioned.
 式(1)のR2における「R24C(=O)N(R25)-」(ここで、R24は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、前記と同義である。)を表し、R25は、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。R24として、好ましくは、水素原子、メチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、2,2-ジフルオロエトキシ、2,2,2-トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基が挙げられ、さらに好ましくは、水素原子、メチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられる。また、R25として、好ましくは、水素原子、メチル基、エチル基、プロピル基、メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、シアノメチル基、2-シアノエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、およびシクロプロピル基が挙げられ、さらに好ましくは、水素原子、メチル基、エチル基、メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、シアノメチル基、2,2-ジフルオロエチル基、および2,2,2-トリフルオロエチル基が挙げられる。 “R24C (═O) N (R25) —” in R2 of the formula (1) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group) , C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are as defined above), and R25 represents hydrogen. And each term of C1-C6 alkyl group, C1-C6 haloalkyl group, or C3-C8 cycloalkyl group optionally substituted with substituent B1 is as defined above. . R24 is preferably a hydrogen atom, methyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy. Group, cyclopropyloxy group, amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group, and more preferably a hydrogen atom, a methyl group, a difluoromethyl group, a trifluoromethyl group. Methoxy group, ethoxy group, amino group, dimethylamino group, ethylmethylamino group, and diethylamino group. R25 is preferably a hydrogen atom, methyl group, ethyl group, propyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, cyanomethyl group, 2-cyanoethyl group, 2,2-difluoroethyl. Group, 2,2,2-trifluoroethyl group, and cyclopropyl group, more preferably hydrogen atom, methyl group, ethyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, A cyanomethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group can be mentioned.
 式(1)のnは、0~5の整数である。ただし、nが2以上のとき、2以上のR2は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 N in the formula (1) is an integer of 0 to 5. However, when n is 2 or more, two or more R2s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
 式(1)のR3は、水素原子、ハロゲン原子、ニトロ基、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、R30-L3-(ここで、R30は、前記のR23と同義であり、L3は、前記のL2と同義である。)、R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、またはR33C(=O)-(ここで、R33は、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表す。 R3 in formula (1) may be optionally substituted with a hydrogen atom, a halogen atom, a nitro group, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, or a substituent C. Good C3-C8 cycloalkyl group, C1-C6 alkoxy group optionally substituted with substituent C, C1-C6 haloalkoxy group, C2-C6 alkenyl group optionally substituted with substituent C C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, C2-C6 haloalkynyl group, R30-L3- (wherein R30 has the same meaning as R23 above) L3 is as defined above for L2, and R31R32N— (wherein R31 and R32 are as defined above for R21 and R22), or R33C (═O) — ( In this, R33 represents represents.) An alkyl group of C1 ~ C6, haloalkyl group of C1 ~ C6, or C3 ~ C8 cycloalkyl group,.
 中でもR3は、水素原子、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはR30-L3-(ここで、R30およびL3は、前記と同義である。)が好ましく、
 特に、水素原子、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルキル基が好ましい。
Among them, R3 is a hydrogen atom, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with a substituent C, a C3-C8 cycloalkyl group that may be optionally substituted with a substituent C, or a substituent C as appropriate. An optionally substituted C1-C6 alkoxy group, a C2-C6 alkynyl group optionally substituted with a substituent C, or R30-L3- (wherein R30 and L3 are as defined above). Is preferred,
In particular, a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C is preferable.
 式(1)の「置換基C」とは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、およびR30-L3-(ここで、R30は、前記のR14と同義であり、L3は、前記のL1と同義である。)からなる群から選択される少なくとも1種を表す。中でも置換基Cは、シアノ基、C1~C6のアルコキシ基、またはR30-L3-(ここで、R30およびL3は、前記と同義である。)が好ましく、
 特に、シアノ基、またはC1~C6のアルコキシ基が好ましい。
The “substituent C” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, R31R32N. -(Wherein R31 and R32 are as defined above for R21 and R22), and R30-L3- (wherein R30 is as defined above for R14, and L3 is as defined above for L1). Represents at least one selected from the group consisting of: Among them, the substituent C is preferably a cyano group, a C1-C6 alkoxy group, or R30-L3- (wherein R30 and L3 are as defined above),
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
 置換基Cの好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基;
ならびにR30-L3-(ここで、R30は、前記のR14と同義であり、L3は、前記のL1と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられる。
Preferred specific examples of the substituent C include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
R31R32N— (wherein R31 and R32 have the same meanings as R21 and R22 above), an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group;
And R30-L3- (wherein R30 has the same meaning as R14, and L3 has the same meaning as L1), a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, Examples thereof include a trifluoromethanesulfinyl group and a trifluoromethanesulfonyl group.
 置換基Cのさらに好ましい具体例として、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基;
R31R32N-(ここで、R31およびR32は、前記と同義である。)として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基;
ならびにR30-L3-(ここで、R30およびL3は、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。
As more preferred specific examples of the substituent C, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
R31R32N— (wherein R31 and R32 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
And R30-L3- (wherein R30 and L3 are as defined above) include a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
 式(1)のR3には、水素原子、およびニトロ基が含まれる。
 式(1)のR3における「ハロゲン原子」は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。
R3 in the formula (1) includes a hydrogen atom and a nitro group.
The “halogen atom” in R3 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、またはプロピル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with substituent C” in R3 of the formula (1) has the same definition as described above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, or a propyl group. In the case of having the substituent C, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR3における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group. In the case of having the substituent C, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with the substituent C.
 式(1)のR3における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent C” in R3 of formula (1) is as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group. In the case of having the substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R3 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group. In the case of having the substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R3 of the formula (1) has the same definition as described above, and is preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR3における「R30-L3-」は、R30が前記のR23と同義であり、L3が前記のL2と同義である。「R30-L3-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられ、さらに好ましくは、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。 In “R30-L3-” in R3 of the formula (1), R30 has the same meaning as R23, and L3 has the same meaning as L2. “R30-L3-” preferably includes a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group. Groups, and methanesulfonyl groups.
 式(1)のR3における「R31R32N-」は、R31およびR32が、前記のR21およびR22と同義であり、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。 “R31R32N—” in R3 of the formula (1) has the same meaning as R21 and R22, and is preferably an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, or A piperidinyl group, more preferably a dimethylamino group, an ethylmethylamino group, or a diethylamino group.
 式(1)のR3における「R33C(=O)-」(ここで、R33は、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。「R33C(=O)-」として、好ましくは、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、およびシクロプロパンカルボニル基が挙げられ、さらに好ましくは、アセチル基、ジフルオロアセチル基、およびトリフルオロアセチル基が挙げられる。 Each of “R33C (═O) —” (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group) in R3 of the formula (1). Terminology is as defined above. “R33C (═O) —” preferably includes an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, and a cyclopropanecarbonyl group, and more preferably an acetyl group, a difluoroacetyl group, and a triphenyl group. A fluoroacetyl group is mentioned.
 式(1)のXは、酸素原子、または硫黄原子を表す。好ましいXは、酸素原子である。 X in the formula (1) represents an oxygen atom or a sulfur atom. Preferred X is an oxygen atom.
 式(1)のYは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表す。
 該フェニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~4置換する。
 該ピリジル基、該ピリダジニル基、該ピリミジニル基、該ピラジニル基、該トリアジニル基、または該テトラジニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~3置換する。
 該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~2置換する。
Y in Formula (1) represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group.
In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately.
In the pyridyl group, the pyridazinyl group, the pyrimidinyl group, the pyrazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace.
In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0-2.
 式(1)の「置換基D」とは、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、およびC1~C6のハロアルコキシ基からなる群から選択される少なくとも1種を表す。
 中でも置換基Dは、ハロゲン原子、またはC1~C6のアルキル基が好ましく、
 特に、ハロゲン原子が好ましい。
“Substituent D” in formula (1) is selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group Represents at least one kind.
Among them, the substituent D is preferably a halogen atom or a C1-C6 alkyl group,
In particular, a halogen atom is preferable.
 置換基Dの好ましい具体例として、
ハロゲン原子として、フッ素原子、塩素原子、臭素原子、およびヨウ素原子;
C1~C6のアルキル基として、メチル基、エチル基、およびプロピル基;
C1~C6のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、および2,2,2-トリフルオロエチル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびt-ブトキシ基;
ならびにC1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基が挙げられる。
As a preferable specific example of the substituent D,
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
And C1-C6 haloalkoxy groups include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3, A 3,3-trifluoropropyloxy group may be mentioned.
 置換基Dのさらに好ましい具体例として、
ハロゲン原子として、フッ素原子、塩素原子、および臭素原子;
C1~C6のアルキル基として、メチル基、およびエチル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
ならびにC1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基が挙げられる。
As a more preferred specific example of the substituent D,
A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom;
A methyl group and an ethyl group as the C1-C6 alkyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
In addition, examples of the C1-C6 haloalkoxy group include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group.
 式(1)の「置換基D1」とは、水酸基、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種を表す。
 中でも置換基D1は、水酸基、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基、またはC1~C6のハロアルキル基が好ましく、
 さらに好ましくは、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基、またはC1~C6のハロアルコキシ基が好ましい。
The “substituent D1” in formula (1) is a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 And at least one selected from the group consisting of C3-C8 cycloalkoxy groups.
Among them, the substituent D1 is preferably a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkyl group,
More preferably, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkoxy group is preferable.
 置換基D1の好ましい具体例として、水酸基;
ハロゲン原子として、フッ素原子、塩素原子、臭素原子、およびヨウ素原子;
C1~C6のアルキル基として、メチル基、エチル基、およびプロピル基;
C1~C6のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、および2,2,2-トリフルオロエチル基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびt-ブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。
As a preferable specific example of the substituent D1, a hydroxyl group;
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
In addition, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
 置換基D1のさらに好ましい具体例として、水酸基;
ハロゲン原子として、フッ素原子、塩素原子、および臭素原子;
C1~C6のアルキル基として、メチル基、およびエチル基;
C1~C6のハロアルキル基として、ジフルオロメチル基、およびトリフルオロメチル基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。
As a more preferred specific example of the substituent D1, a hydroxyl group;
A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom;
A methyl group and an ethyl group as the C1-C6 alkyl group;
A difluoromethyl group and a trifluoromethyl group as a C1-C6 haloalkyl group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
 以下、式(1)のYの具体的例を詳細に説明する。
 A) Yがフェニル基であるとき、Yは、式(a)
Figure JPOXMLDOC01-appb-C000009

で表される部分構造(ここで、DおよびD1は前記と同義であり、maは0~4の整数を表す。)を表す。
Hereinafter, a specific example of Y in formula (1) will be described in detail.
A) When Y is a phenyl group, Y is represented by the formula (a)
Figure JPOXMLDOC01-appb-C000009

(Wherein D and D1 are as defined above, and ma represents an integer of 0 to 4).
 式(a)のmaは、0~4の整数を表す。
 式(a)のmaが2以上の場合、2以上のD1は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。
 本明細書においてYがフェニル基の場合、オルト位とは、式(a)に示されるように、置換基Dがあるフェニル基の位置を意味する。
 置換基Dがオルト位に位置したフェニル基は、本発明の特徴をなしている。
In the formula (a), ma represents an integer of 0 to 4.
When ma in the formula (a) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
In the present specification, when Y is a phenyl group, the ortho position means the position of the phenyl group having the substituent D as shown in the formula (a).
The phenyl group in which the substituent D is located in the ortho position is a feature of the present invention.
 式(a)の好ましい組み合わせは、2-D-6-D1-フェニル基、2-D-4-D1-フェニル基、または2-D-4-D1-6-D1-フェニル基である。ここで、例えば、「2-D-6-D1-フェニル基」は、2位に置換基D、6位に置換基D1を有する二置換フェニル基を意味し、以下の記載も同様である。 A preferred combination of the formula (a) is a 2-D-6-D1-phenyl group, a 2-D-4-D1-phenyl group, or a 2-D-4-D1-6-D1-phenyl group. Here, for example, “2-D-6-D1-phenyl group” means a disubstituted phenyl group having a substituent D at the 2-position and a substituent D1 at the 6-position, and the following description is also the same.
 B) Yが、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基のとき、Yは、式(b)
Figure JPOXMLDOC01-appb-C000010

で表される部分構造(ここで、DおよびD1は前記と同義であり、mbは0~3の整数を表す。)を表す。
B) When Y is a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group, Y is a group represented by the formula (b)
Figure JPOXMLDOC01-appb-C000010

(Wherein D and D1 are as defined above, and mb represents an integer of 0 to 3).
 式(b)のG1、G2、G3およびG4は、それぞれ独立していて、炭素原子または窒素原子を表す。ただし、G1、G2、G3およびG4のうち、少なくとも一つは窒素原子である。好ましいG1、G2、G3およびG4は、G1、G2、G3およびG4のうち、いずれか一つが窒素原子である。すなわち、ピリジル基である。
 式(b)のmbは、0~3の整数を表す。
 式(b)のmbが2以上の場合、2以上のD1は、それぞれ独立した置換基を表し、同一、または異なっていてよく、任意に選択することができる。
G1, G2, G3 and G4 in the formula (b) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3 and G4 is a nitrogen atom. Preferred G1, G2, G3 and G4 are any one of G1, G2, G3 and G4 being a nitrogen atom. That is, it is a pyridyl group.
In the formula (b), mb represents an integer of 0 to 3.
When mb in the formula (b) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
 本明細書においてYがピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基の場合、オルト位とは、式(b)に示されるように、置換基Dがある6員環の位置を意味する。
 式(b)の部分構造の具体例を以下に示す。
In the present specification, when Y is a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group, the ortho position means a 6-membered ring having a substituent D as shown in the formula (b). Means the position of
Specific examples of the partial structure of the formula (b) are shown below.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 置換基Dがオルト位に位置したピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基は、本発明の特徴をなしている。 A pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group in which the substituent D is located in the ortho position is a feature of the present invention.
 式(b)の好ましい組み合わせは、3-D-2-ピリジル基、3-D-5-D1-2-ピリジル基、2-D-3-ピリジル基、2-D-4-D1-3-ピリジル基、2-D-6-D1-3-ピリジル基、2-D-4-D1-6-D1-3-ピリジル基、4-D-3-ピリジル基、4-D-2-D1-3-ピリジル基、4-D-6-D1-3-ピリジル基、4-D-2-D1-6-D1-3-ピリジル基、3-D-4-ピリジル基、または3-D-5-D1-4-ピリジル基である。 Preferred combinations of formula (b) are 3-D-2-pyridyl group, 3-D-5-D1-2-pyridyl group, 2-D-3-pyridyl group, 2-D-4-D1-3- Pyridyl group, 2-D-6-D1-3-pyridyl group, 2-D-4-D1-6-D1-3-pyridyl group, 4-D-3-pyridyl group, 4-D-2-D1- 3-pyridyl group, 4-D-6-D1-3-pyridyl group, 4-D-2-D1-6-D1-3-pyridyl group, 3-D-4-pyridyl group, or 3-D-5 -D1-4-pyridyl group.
 C) Yが、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基のとき、Yは、式(c-1)
Figure JPOXMLDOC01-appb-C000012
式(c-2)
Figure JPOXMLDOC01-appb-C000013
または、式(c-3)
Figure JPOXMLDOC01-appb-C000014

で表される部分構造(ここで、DおよびD1は前記と同義であり、mcは0~2の整数を表す。)を表す。
C) When Y is a thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group, Y is a group represented by the formula (c-1)
Figure JPOXMLDOC01-appb-C000012
Formula (c-2)
Figure JPOXMLDOC01-appb-C000013
Or the formula (c-3)
Figure JPOXMLDOC01-appb-C000014

(Wherein D and D1 are as defined above, and mc represents an integer of 0 to 2).
 式(c-1)、式(c-2)および式(c-3)におけるG5とG6は、それぞれ独立していて、炭素原子または窒素原子を表す。
 式(c-1)、式(c-2)および式(c-3)のmcは、0~2の整数を表す。
 式(c-1)、式(c-2)および式(c-3)のmcが2の場合、2のD1は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。
G5 and G6 in formula (c-1), formula (c-2) and formula (c-3) are each independently a carbon atom or a nitrogen atom.
In the formula (c-1), the formula (c-2) and the formula (c-3), mc represents an integer of 0 to 2.
When mc in formula (c-1), formula (c-2), and formula (c-3) is 2, D1 in 2 represents an independent substituent, and may be the same or different and arbitrarily selected can do.
 本明細書においてYがチエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基の場合、オルト位とは、式(c-1)、式(c-2)および式(c-3)に示されるように、置換基Dがある5員環の位置を意味する。
 式(c-1)の部分構造の具体例を以下に示す。
In the present specification, when Y is a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group, the ortho position is represented by the formula (c-1), the formula (c-2), and the formula (c-3). Means the position of the 5-membered ring having the substituent D.
Specific examples of the partial structure of the formula (c-1) are shown below.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 式(c-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000016
Specific examples of the partial structure of the formula (c-2) are shown below.
Figure JPOXMLDOC01-appb-C000016
 式(c-3)の部分構造の置換基の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000017
Specific examples of the substituent of the partial structure of the formula (c-3) are shown below.
Figure JPOXMLDOC01-appb-C000017
 置換基Dがオルト位に位置したチエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基は、本発明の特徴をなしている。 The thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group in which the substituent D is located in the ortho position is a feature of the present invention.
 式(1)における破線部を含む結合は、
Figure JPOXMLDOC01-appb-C000018

で表される箇所を表す。
 式(1)における破線部を含む結合は、二重結合または単結合を表す。
The bond including the broken line in Equation (1) is
Figure JPOXMLDOC01-appb-C000018

This represents the location represented by.
The bond including the broken line part in Formula (1) represents a double bond or a single bond.
 式(1)における破線部を含む結合が二重結合の場合は、式(1a)
Figure JPOXMLDOC01-appb-C000019
When the bond including the broken line in formula (1) is a double bond, formula (1a)
Figure JPOXMLDOC01-appb-C000019
(式中、R1、R2、R3、X、Yおよびnは、式(1)と同義である。)で表される化合物、またはその塩を表す。 (Wherein R1, R2, R3, X, Y and n are as defined in formula (1)), or a salt thereof.
 式(1)における破線部を含む結合が単結合の場合は、式(1b)
Figure JPOXMLDOC01-appb-C000020
When the bond including the broken line in Formula (1) is a single bond, Formula (1b)
Figure JPOXMLDOC01-appb-C000020
(式中、R1、R2、R3、X、Yおよびnは、式(1)と同義である。)で表される化合物、またはその塩を表す。 (Wherein R1, R2, R3, X, Y and n are as defined in formula (1)), or a salt thereof.
 式(1b)におけるR3が水素以外の置換基の場合、R体もしくはS体のどちらか一方のみ、またはR体とS体との任意の割合の混合物である。 When R3 in the formula (1b) is a substituent other than hydrogen, only one of the R-form and S-form, or a mixture of the R-form and the S-form in an arbitrary ratio.
 式(1)で表される化合物は、1個または2個の軸不斉を有することがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。
 式(1)で表される化合物は、不斉原子を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。
 式(1)で表される化合物は、幾何異性体を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。
The compound represented by formula (1) may have one or two axial asymmetry. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
The compound represented by Formula (1) may contain an asymmetric atom. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
The compound represented by Formula (1) may contain geometric isomers. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
 式(1)で表される化合物は、塩を形成できることがある。塩酸、硫酸、酢酸、フマル酸、マレイン酸のような酸塩や、ナトリウム、カリウム、カルシウムのような金属塩等が例示されるが、農薬として使用できる限り、特に限定されることはない。 The compound represented by the formula (1) may be able to form a salt. Examples thereof include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, and metal salts such as sodium, potassium and calcium, but are not particularly limited as long as they can be used as agricultural chemicals.
 次に、本発明に係る式(I)で表されるピリドン化合物の具体的な化合物は、表1に示す構造式と、表2に示す(R2)nと、酸素原子または硫黄原子であるXとの組み合わせによって表される。これらの化合物は例示のためのものであって、本発明はこれらに限定されるものではない。 Next, specific compounds of the pyridone compound represented by the formula (I) according to the present invention include the structural formula shown in Table 1, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. It is represented by the combination. These compounds are for illustrative purposes, and the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000040
 以下、例えば、表2中の「2-F-」との記載は、(R2)nが結合するフェニル基の2位にフッ素原子が結合していることを意味し、「2-F-3-HO-」との記載は、2位にフッ素原子が結合し、3位に水酸基が結合していることを意味し、「2,3-di-F」との記載は、2位と3位にフッ素原子が結合していることを意味し、他の記載も同様である。 Hereinafter, for example, the description “2-F—” in Table 2 means that a fluorine atom is bonded to the 2-position of the phenyl group to which (R2) n is bonded, and “2-F-3” The description “—HO—” means that a fluorine atom is bonded to the 2-position and a hydroxyl group is bonded to the 3-position. The description of “2,3-di-F” means that the 2-position and 3 This means that a fluorine atom is bonded to the position, and other descriptions are the same.
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000049
Figure JPOXMLDOC01-appb-T000049
Figure JPOXMLDOC01-appb-T000050
Figure JPOXMLDOC01-appb-T000050
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000068
 次に、式(1)で表されるピリドン化合物の製造方法について説明する。
 [製造方法A]
Next, the manufacturing method of the pyridone compound represented by Formula (1) is demonstrated.
[Production Method A]
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
 式中、R4は、水素原子、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)を表し、R5は、水素原子、またはC1~C6のアルキル基を表し、n、R2、R3、XおよびYは、前記と同義である。 In the formula, R4 is a hydrogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group that may be optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with the group A, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy group optionally substituted with the substituent A, Represents a 3-C6 haloalkynyloxy group, or R10R11N- (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group), R5 represents a hydrogen atom, Alternatively, it represents a C1-C6 alkyl group, and n, R2, R3, X and Y are as defined above.
 製造方法Aは、本発明化合物および本発明化合物の製造中間体を含む式(1b-a)で表される化合物を得る方法であって、式(3)で表される化合物とR4NHとを、酸存在下で反応させることを含む製造方法である。 Production method A is a method for obtaining a compound represented by the formula (1b-a) containing the compound of the present invention and a production intermediate of the compound of the present invention, wherein the compound represented by formula (3) and R4NH 2 are obtained. , A production method comprising reacting in the presence of an acid.
 本反応に使用するR4NHは、市販品として入手または公知の方法で製造することができる。R4NHは、塩酸、酢酸のような酸性化合物との塩を形成したものでもよく、目的とする反応が進行する限りにおいて特に限定されることはない。 R4NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product. R4NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
 本反応に使用するR4NHは、式(3)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上200当量以下である。 R4NH 2 used in this reaction may if 1 equivalent or more relative to the compound represented by formula (3), but are not particularly limited as long as the reaction proceeds to the desired, preferably, 1 Equivalent to 200 equivalents.
 本反応に使用する酸として、塩酸、硫酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸等の有機酸類が例示され、目的とする反応が進行する限りにおいて特に限定することはないが、好ましくは、酢酸である。また、R4NHと酸性化合物との塩を使用する際には、酸の使用は必須ではない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid, and p-toluenesulfonic acid, and are particularly limited as long as the target reaction proceeds. Although not preferred, acetic acid is preferred. Further, when using salts with R4NH 2 and the acidic compound, the use of acid is not essential.
 本反応に使用する酸の量は、R4NHに対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上200当量以下である。また、使用する酸が液体である場合には、溶媒として使用することも可能である。 The amount of the acid used in this reaction may if 1 equivalent or more relative to the R4NH 2, is not limited in particular as long as the reaction proceeds to the desired, preferably, one or more equivalents 200 equivalent or less is there. Moreover, when the acid to be used is a liquid, it can also be used as a solvent.
 本反応には溶媒を使用することができるが、必ずしも必須ではない。
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。溶媒として、好ましくは、酸性系溶媒が挙げられ、さらに好ましくは、酢酸が挙げられる。
Although a solvent can be used for this reaction, it is not necessarily essential.
The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran, dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc. Ester solvents, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea systems such as 1,3-dimethyl-2-imidazolidinone solvent Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more. The solvent is preferably an acidic solvent, more preferably acetic acid.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(3)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1b-a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1b-a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1b-a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1b-a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
 製造方法Aによると、式(1b-a)で表される化合物においてR4が水素原子を表すときに製造することができる式(2)で表される化合物は、本発明化合物のうち、式(1b)で表される化合物を得る有用な製造中間体となりうる。 According to production method A, the compound represented by formula (2), which can be produced when R4 represents a hydrogen atom in the compound represented by formula (1b-a), It can be a useful production intermediate for obtaining the compound represented by 1b).
 式(2)で表される製造中間体の具体例は、表3に示す構造式と、表2に示す(R2)nと、酸素原子または硫黄原子であるXとの組み合わせによって表される。これらの化合物は、例示のためのものであって、本発明はこれらに限定されるものではない。 A specific example of the production intermediate represented by the formula (2) is represented by a combination of the structural formula shown in Table 3, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000072
Figure JPOXMLDOC01-appb-T000072
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-T000074
Figure JPOXMLDOC01-appb-T000074
Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000076
Figure JPOXMLDOC01-appb-T000076
 この式(2)で表される化合物を製造中間体として利用し、本発明の式(1b)を得る方法を説明する。 A method for obtaining the formula (1b) of the present invention using the compound represented by the formula (2) as a production intermediate will be described.
[製造方法B]
Figure JPOXMLDOC01-appb-C000077
[Production method B]
Figure JPOXMLDOC01-appb-C000077
 式中、Lvはメタンスルホニル基、トリフルオロメタンスルホニル基、p-トルエンスルホニル基、ハロゲン原子等の脱離基を表し、R1、R2、R3、X、Yおよびnは、前記と同義である。 In the formula, Lv represents a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a leaving group such as a halogen atom, and R1, R2, R3, X, Y, and n are as defined above.
 製造方法Bは、式(1b)で表される化合物を得る方法であって、式(2)で表される製造中間体とR1Lvとを、塩基の存在下、溶媒中で反応させることを含む製造方法である。 Production method B is a method for obtaining a compound represented by formula (1b), which comprises reacting the production intermediate represented by formula (2) with R1Lv in a solvent in the presence of a base. It is a manufacturing method.
 本反応に使用するR1Lvは、市販品として入手または公知の方法で製造することができる。 R1Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用するR1Lvの量は、式(2)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of R1Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
 本反応に使用する塩基として、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, but are particularly limited as long as the intended reaction proceeds. It will never be done.
 本反応に使用する塩基の量は、式(2)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(2)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (2). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法C]
Figure JPOXMLDOC01-appb-C000078
[Production Method C]
Figure JPOXMLDOC01-appb-C000078
 式中、SRは硫黄化剤を表し、R1、R2、R3、Yおよびnは前記と同義である。 In the formula, SR represents a sulfurizing agent, and R1, R2, R3, Y, and n are as defined above.
 製造方法Cは、式(1b)で表される化合物のうち、式(1b-c)で表される化合物を得る製造方法であって、式(1b-b)で表される化合物と硫黄化剤(SR)とを、溶媒中で反応させることを含む製造方法である。 Production method C is a production method for obtaining a compound represented by formula (1b-c) among the compounds represented by formula (1b), wherein the compound represented by formula (1b-b) is sulfurated. It is a manufacturing method including making an agent (SR) react in a solvent.
 本反応に使用する硫黄化剤としては、ローソン試薬(2,4-ビス(4-メトキシフェニル)-1,3-ジチア-2,4-ジホスフェタン-2,4-ジスルフィド)等が挙げられる。 Examples of the sulfurizing agent used in this reaction include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
 本反応に使用する硫黄化剤の量は、式(1b-b)で表される化合物に対して0.5当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (1b-b), and is not particularly limited as long as the target reaction proceeds. However, it is preferably 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1b-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-b). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応においては、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(1b-c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1b-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1b-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1b-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-c) obtained after the solvent is distilled off can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法D]
Figure JPOXMLDOC01-appb-C000079
[Production Method D]
Figure JPOXMLDOC01-appb-C000079
 式中、R3aは、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、Lv、R1、R2、X、Yおよびnは前記と同義である。 In the formula, R3a is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C2-C6 alkenyl group optionally substituted with C, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, or C2-C6 haloalkynyl group , Lv, R1, R2, X, Y, and n are as defined above.
 製造方法Dは、式(1b)で表される化合物のうち、R3aが置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1b-e)で表される化合物の合成方法であって、式(1b-d)で表される化合物とR3aLvとを、塩基の存在下、溶媒中で反応させることを含む製造方法である。 In the production method D, in the compound represented by the formula (1b), R3a is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. C3-C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C A method for synthesizing a compound represented by the formula (1b-e), which is an alkynyl group or a C2-C6 haloalkynyl group, comprising the step of synthesizing a compound represented by the formula (1b-d) with R3aLv in the presence of a base It is a manufacturing method including making it react in a solvent below.
 本反応に使用するR3aLvは、市販品として入手または公知の方法で製造することができる。
 本反応に使用するR3aLvの量は、式(1b-d)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上1.8当量以下である。
R3aLv used in this reaction can be obtained as a commercial product or can be produced by a known method.
The amount of R3aLv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but is preferably Is 1 equivalent or more and 1.8 equivalent or less.
 本反応に使用する塩基として、水素化ナトリウム等の金属ヒドリド類、メチルリチウム、ブチルリチウム、sec-ブチルリチウム、t-ブチルリチウム、ヘキシルリチウム等の有機リチウム類や、リチウムジイソプロピルアミド、ヘキサメチルジシラザンリチウム、ヘキサメチルジシラザンナトリウム、ヘキサメチルジシラザンカリウム等の金属アミド類が例示される。 Bases used in this reaction include metal hydrides such as sodium hydride, organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane Examples thereof include metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
 本反応に使用する塩基の量は、式(1b-d)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1b-d)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-d). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from −80 ° C. to 100 ° C. or the boiling point of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl It is possible to add a solvent that is not compatible with water, such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane. Is possible. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1b-e)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-e) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1b-e)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1b-e)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1b-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-e) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法E]
Figure JPOXMLDOC01-appb-C000080
[Production Method E]
Figure JPOXMLDOC01-appb-C000080
 式中、Oxは酸化剤を表し、R1、R2、R3、X、Yおよびnは、前記と同義である。 In the formula, Ox represents an oxidizing agent, and R1, R2, R3, X, Y, and n are as defined above.
 製造方法Eは、式(1a)で表される化合物を得る方法であって、式(1b)で表される化合物と酸化剤(Ox)とを、溶媒中で反応させることを含む製造方法である。 Production method E is a method for obtaining a compound represented by formula (1a), which comprises reacting a compound represented by formula (1b) with an oxidizing agent (Ox) in a solvent. is there.
 本反応に使用する酸化剤としては、二酸化マンガン等の金属酸化物類、2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン等のベンゾキノン類、アゾビスイソブチロニトリル、過酸化ベンゾイル等のラジカル開始剤とN-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン等のハロゲン化剤とを組み合わせたもの等を使用することができる。 Examples of the oxidizing agent used in this reaction include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, and benzoyl peroxide. Radical initiators of N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3- A combination with a halogenating agent such as diiodo-5,5-dimethylhydantoin can be used.
 以下、酸化剤が金属酸化物類である方法について説明する。
 本反応に使用する酸化剤の量は、式(1b)に表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。
Hereinafter, a method in which the oxidizing agent is a metal oxide will be described.
The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 200 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to remove undissolved metals by filtering. Furthermore, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
 以下、酸化剤がベンゾキノン類である方法について説明する。
 本反応に使用する酸化剤の量は、式(1b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上20当量以下である。
Hereinafter, a method in which the oxidizing agent is a benzoquinone will be described.
The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 20 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
 以下、酸化剤がラジカル開始剤とハロゲン化剤との組み合わせである方法について説明する。
 本反応に使用するラジカル開始剤とハロゲン化剤の量は、それぞれ、式(1b)で表される化合物に対して0.01当量以上と1.0当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。好ましくは、ラジカル開始剤が0.01当量以上1当量以下であり、ハロゲン化剤が1当量以上3当量以下である。
Hereinafter, a method in which the oxidizing agent is a combination of a radical initiator and a halogenating agent will be described.
If the amount of the radical initiator and the halogenating agent used in this reaction is 0.01 equivalent or more and 1.0 equivalent or more with respect to the compound represented by the formula (1b), the target reaction proceeds. As long as it does, it will not specifically limit. Preferably, the radical initiator is 0.01 equivalent to 1 equivalent and the halogenating agent is 1 equivalent to 3 equivalent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate. Examples of the solvent include halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、20℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl It is possible to add a solvent that is not compatible with water, such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane. Is possible. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法F]
Figure JPOXMLDOC01-appb-C000081
[Production Method F]
Figure JPOXMLDOC01-appb-C000081
 式中、R3bはハロゲン原子を表し、HalRはハロゲン化剤を表し、R1、R2、X、Yおよびnは前記と同義である。 In the formula, R3b represents a halogen atom, HalR represents a halogenating agent, and R1, R2, X, Y, and n are as defined above.
 製造方法Fは、式(1a)で表される化合物のうち、R3bがハロゲン原子を表す式(1a-b)で表される化合物を得る製造方法であって、式(1a-a)で表される化合物とハロゲン化剤(HalR)とを、溶媒中で反応させることを含む製造方法である。 Production method F is a production method for obtaining a compound represented by formula (1a-b) in which R3b represents a halogen atom among the compounds represented by formula (1a), which is represented by formula (1a-a). And a halogenating agent (HalR) in a solvent.
 本反応に使用するハロゲン化剤としては、セレクトロフルオル(N-フルオロ-N’-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluoro (N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(1a-a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、好ましくは、1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-a). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。
 本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式(1a-a)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、0.1当量以上3当量以下である。
When the halogenating agent used in this reaction is an iodinating agent, add an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid. Can do.
When the halogenating agent used in this reaction is an iodinating agent, the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1a-a), Although it does not restrict | limit especially as long as it advances, Preferably it is 0.1 equivalent or more and 3 equivalent or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a-a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-a). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1a-b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1a-b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a-b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法G]
Figure JPOXMLDOC01-appb-C000082
[Production method G]
Figure JPOXMLDOC01-appb-C000082
 式中、R3cは置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、Jは酸素原子または硫黄原子を表し、Qは水素原子または金属を表し、R1、R2、R3b、X、Yおよびnは前記と同義である。 In the formula, R3c is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C A C2-C6 alkenyl group optionally substituted with C2, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group, J represents an oxygen atom or a sulfur atom, Q represents a hydrogen atom or a metal, and R1, R2, R3b, X, Y, and n have the same meanings as described above.
 製造方法Gは、式(1a)で表される化合物のうち、R3cが、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、Jが酸素原子または硫黄原子を表す式(1a-c)で表される化合物の合成法であって、式(1a-b)で表される化合物とR3c-J-Qとを、遷移金属類の存在下に反応させるカップリング反応によって得ることを含む製造方法である。 In the production method G, in the compound represented by the formula (1a), R3c is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. C3-C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C Or a haloalkynyl group of C2 to C6, wherein J is an oxygen atom or a sulfur atom, and is a method of synthesizing a compound represented by the formula (1a-b) A compound obtained by a coupling reaction in which R3c-JQ is reacted in the presence of a transition metal.
 式(1a-b)で表される化合物中、好ましいR3bは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
 本反応に使用するR3c-J-Qは、市販品として入手または公知の方法で製造できる。好ましいQは、水素原子、または、ナトリウム、カリウム等のアルカリ金属類である。
 本反応に使用するR3c-J-Qの量は、式(1a-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。Qが水素原子のときは、溶媒としても使用可能である。
R3c-JQ used in this reaction is obtained as a commercial product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
The amount of R3c-JQ used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). . When Q is a hydrogen atom, it can also be used as a solvent.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。 The transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
 本反応に使用する遷移金属類の量は、式(1a-b)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. Never happen.
 本反応を効率的に進行させるために、トリフェニルホスフィン、1,1’-ビス(ジフェニルホスフィノ)フェロセン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル、2-ジ-t-ブチルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができる。 In order to make this reaction proceed efficiently, triphenylphosphine, 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t -A phosphine ligand such as butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
 本反応に使用するホスフィン配位子の量は、式(1a-b)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウムのような無機塩基類やトリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の有機塩基類等である。 The base used in this reaction is an inorganic base such as sodium carbonate, potassium carbonate or cesium carbonate, or an organic base such as triethylamine, tributylamine or diisopropylethylamine.
 本反応に使用する塩基の量は、式(1a-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、R3c-J-H(式中、R3cは前記と同義であり、Jは酸素原子である)で表されるアルコール溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but R3c-JH (wherein R3c has the same meaning as described above and J is an oxygen atom). An alcohol solvent represented by the formula: Can be mentioned. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
 前記で得られた式(1a-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法H]
Figure JPOXMLDOC01-appb-C000083
[Production Method H]
Figure JPOXMLDOC01-appb-C000083
 式中、R3dは置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、R3d-Bは有機ボロン酸類を表し、R1、R2、R3b、X、Yおよびnは前記と同義である。 In the formula, R3d is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents an optionally substituted C2-C6 alkenyl group or C2-C6 haloalkenyl group, R3d-B represents an organic boronic acid, and R1, R2, R3b, X, Y and n are as defined above. It is.
 製造方法Hは、式(1a)で表される化合物のうち、R3dが置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(1a-d)で表される化合物の合成方法であって、式(1a-b)で表される化合物と有機ボロン酸類(R3d-B)とを遷移金属類および塩基の存在下で反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 In the production method H, R3d in the compound represented by the formula (1a) is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. A compound represented by the formula (1a-d), which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, or a C2-C6 haloalkenyl group. A method of synthesis comprising obtaining a compound of formula (1a-b) and an organoboronic acid (R3d-B) by a Suzuki-Miyaura coupling in the presence of a transition metal and a base Is the method.
 式(1a-b)中、好ましいR3bは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
 本反応に使用するR3d-Bは、有機ボロン酸や有機ボロン酸エステル等の有機ボロン酸類を表し、市販品として入手または公知の方法で製造できる。
 本反応に使用するR3d-Bの量は、式(1a-b)で表される化合物に対して、1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上10当量以下である。
R3d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or produced by a known method.
The amount of R3d-B used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する遷移金属類は、パラジウム、ニッケル、ルテニウム等であり、配位子を有してよい。好ましくは、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類が挙げられる。 The transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand. Preferably, palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride, etc. Palladium is mentioned.
 本反応に使用する遷移金属類の量は、式(1a-b)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. Never happen.
 本反応を効率的に進行させるために、トリフェニルホスフィン、トリシクロヘキシルホスフィン等のホスフィン配位子を添加することができる。
 本反応に使用するホスフィン配位子の量は、式(1a-b)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。
In order to advance this reaction efficiently, phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 The base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
 本反応に使用する塩基の量は、式(1a-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. And benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
 前記で得られた式(1a-d)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1a-d) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1a-d)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by formula (1a-d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法I]
Figure JPOXMLDOC01-appb-C000084
[Production Method I]
Figure JPOXMLDOC01-appb-C000084
 式中、R3eは置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、R1、R2、R3b、X、Yおよびnは前記と同義である。 In the formula, R3e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C, and R1, R2, R3b, X, Y and n are as defined above. .
 製造方法Iは、式(1a)で表される化合物のうち、R3eが置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1a-e)で表される化合物の合成方法であって、(1a-b)で表される化合物と末端アルキン化合物とを遷移金属類および塩基の存在下で反応させる園頭カップリングによって得ることを含む製造方法である。 In the production method I, in the compound represented by the formula (1a), R3e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C (1a- A method for synthesizing the compound represented by e), comprising obtaining the compound represented by (1a-b) and the terminal alkyne compound by Sonogashira coupling in the presence of a transition metal and a base. It is a manufacturing method.
 式(1a-b)中、好ましいR3bは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
 本反応に使用する末端アルキン化合物は、市販品として入手または公知の方法で製造することができる。また、末端アルキン化合物として、トリメチルシリルアセチレンも使用することができる。この場合は、式(1a-b)で表される化合物にトリメチルシリルエチニル基を導入後、脱シリル化を行う必要がある。脱シリル化については、ジャーナル オブ ザ アメリカン ケミカル ソサエティー(Journal of the American Chemical Society)、第131巻、2号、634-643頁(2009).およびジャーナル オブ オルガノメタリック ケミストリー(Journal of Organometallic Chemistry)、696巻、25号、4039-4045頁(2011).等の非特許文献を参考にして行うことができる。 The terminal alkyne compound used in this reaction can be obtained as a commercial product or produced by a known method. Trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to perform desilylation after introducing a trimethylsilylethynyl group into the compound represented by the formula (1a-b). For the desilylation, Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009), Journal of the American Chemical Society. And Journal of Organometallic Chemistry (Vol. 696, No. 25, pages 4039-4045 (2011)), Journal of Organometallic Chemistry (Journal of Organometallic Chemistry). It can carry out with reference to nonpatent literatures, such as.
 本反応に使用する末端アルキン化合物の量は、式(1a-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。また、塩化銅、臭化銅、ヨウ化銅等の銅類も同時に使用する。 The transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride. Further, coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
 本反応に使用する遷移金属類の量は、パラジウム類等および銅類が、それぞれ式(1a-b)で表される化合物に対して0.001当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはない。好ましい量は、双方ともに0.001当量以上1当量以下である。 The amount of the transition metal used in this reaction may be 0.001 equivalent or more with respect to the compound represented by the formula (1a-b) for palladium and the like, respectively, and the target reaction proceeds. There is no particular limitation as long as it does. A preferable amount is 0.001 equivalent or more and 1 equivalent or less for both.
 本反応に使用する塩基は、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン類や、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩基類等が挙げられる。 Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
 本反応に使用する塩基の量は、式(1a-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。また、有機塩基で液体状のものに関しては、溶媒として使用することができる。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less. In addition, when the organic base is liquid, it can be used as a solvent.
 本反応を効率的に進行させるために、トリt-ブチルホスフィン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができるが、必須ではない。 A phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to allow the reaction to proceed efficiently, but it is not essential. .
 本反応に使用するホスフィン配位子の量は、式(1a-b)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, triethylamine, Butylamine, isopropylamine, diethylamine, diisopropylamine, organic amine solvents such as diisopropylethylamine. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more of them can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
 前記で得られた式(1a-e)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1a-e)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1a-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-e) obtained after the solvent is distilled off can be purified with an appropriate solvent by washing, reprecipitation, recrystallization, column chromatography or the like. What is necessary is just to set suitably according to the target purity.
[製造方法J]
Figure JPOXMLDOC01-appb-C000085
[Production Method J]
Figure JPOXMLDOC01-appb-C000085
 式中、R2aはC1~C6のアルコキシ基を表し、nbは0~4の整数(ただし、nbが2以上のときは、2以上のR2はそれぞれ独立した置換基を表す。)を表し、R1、R2、R3、X、Yおよび破線部は前記と同義である。 In the formula, R2a represents a C1 to C6 alkoxy group, nb represents an integer of 0 to 4 (provided that when nb is 2 or more, each of R2 and 2 represents an independent substituent), R1 , R2, R3, X, Y and the broken line part have the same meanings as described above.
 製造方法Jは、式(1)で表される化合物のうち、水酸基を有する式(1-b)で表される化合物の合成方法であって、R2aがC1~C6のアルコキシ基である式(1-a)で表される化合物と酸とを反応させることによって得ることを含む製造方法である。 Production method J is a method for synthesizing a compound represented by formula (1-b) having a hydroxyl group among the compounds represented by formula (1), wherein R2a is a C1-C6 alkoxy group ( This is a production method comprising obtaining the compound represented by 1-a) by reacting with an acid.
 本反応に使用する酸として、三塩化ホウ素、三臭化ホウ素等のハロゲン化ホウ素類等がある。 The acid used for this reaction includes boron halides such as boron trichloride and boron tribromide.
 本反応に使用する酸の量は、式(1-a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-a), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, and nitrile solvents such as acetonitrile. And halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-a). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from −80 ° C. to 100 ° C. or the boiling point of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1-b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1-b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1-b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法K]
Figure JPOXMLDOC01-appb-C000086
[Production Method K]
Figure JPOXMLDOC01-appb-C000086
 式中、R2b-O-は、置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはR20C(=O)O-基を表し、Lv、R1、R2、R3、R20、X、Y、nbおよび破線部は前記と同義である。 In the formula, R2b—O— is a C1-C6 alkoxy group optionally substituted with the substituent B, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy optionally substituted with the substituent B. Group, C2 to C6 alkenyloxy group optionally substituted with substituent B, C2 to C6 haloalkenyloxy group, C3 to C6 alkynyloxy group optionally substituted with substituent B, C3 to C6 A haloalkynyloxy group or an R20C (═O) O— group, and Lv, R1, R2, R3, R20, X, Y, nb and the broken line are as defined above.
 製造方法Kは、式(1)で表される化合物のうち、R2b-O-が、置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはR20C(=O)O-基(R20は、前記と同義である。)を表す式(1-c)で表される化合物の合成方法であって、式(1-b)で表される化合物とR2b-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 In the production method K, in the compound represented by the formula (1), R2b—O— may be optionally substituted with a substituent B, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a substituent C3-C8 cycloalkoxy group optionally substituted with B, C2-C6 alkenyloxy group optionally substituted with substituent B, C2-C6 haloalkenyloxy group, optionally substituted with substituent B A C3-C6 alkynyloxy group, a C3-C6 haloalkynyloxy group, or an R20C (═O) O— group (wherein R20 is as defined above). A process for synthesizing a compound represented by formula (1-b) comprising reacting a compound represented by formula (1-b) with R2b-Lv in a solvent in the presence of a base.
 本反応に使用するR2b-Lvは、市販品として入手または公知の方法で製造することができる。
 本反応に使用するR2b-Lvは、式(1-b)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。
R2b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
R2b-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する塩基として、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類や、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン、ピリジン、4-ジメチルアミノピリジン、コリジン、ルチジン等の有機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine. However, there is no particular limitation as long as the target reaction proceeds.
 本反応に使用する塩基は、式(1-b)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-b). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-20℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法L]
Figure JPOXMLDOC01-appb-C000087
[Production method L]
Figure JPOXMLDOC01-appb-C000087
 式中、R2cはハロゲン原子を表し、R2dは置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Bで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、R2d-Bは有機ボロン酸類を表し、R1、R2、R3、nb、X、Yおよび破線部は前記と同義である。 In the formula, R2c represents a halogen atom, and R2d is a C1-C6 alkyl group optionally substituted with the substituent B, a C1-C6 haloalkyl group, a C3-C8 optionally substituted with the substituent B A cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent B, or a C2-C6 haloalkenyl group, R2d-B represents an organic boronic acid, R1, R2, R3, nb, X, Y, and the broken line are as defined above.
 製造方法Lは、式(1)で表される化合物のうち、R2dが置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Bで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(1-e)で表される化合物の合成方法であって、式(1-d)で表される化合物と有機ボロン酸類(R2d-B)とを反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 In the production method L, among the compounds represented by the formula (1), R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B. Of the compound represented by the formula (1-e), which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with the substituent B, or a C2-C6 haloalkenyl group. A synthesis method comprising obtaining by a Suzuki-Miyaura coupling in which a compound represented by the formula (1-d) and an organic boronic acid (R2d-B) are reacted.
 式(1-d)中、好ましいR2cは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1-d), R2c is preferably a chlorine atom, a bromine atom, or an iodine atom.
 製造方法Hにおける式(1a-b)で表される化合物とR3d-Bとを、それぞれ式(1-d)で表される化合物とR2d-Bとに代えて使用することにより、製造方法Hに準じて製造方法Lを実施することができる。 By using the compound represented by formula (1a-b) and R3d-B in production method H instead of the compound represented by formula (1-d) and R2d-B, respectively, production method H The production method L can be carried out according to the above.
[製造方法M]
Figure JPOXMLDOC01-appb-C000088
[Production method M]
Figure JPOXMLDOC01-appb-C000088
 式中、R2eは置換基Bで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、R1、R2、R2c、R3、nb、X、Yおよび破線部は前記と同義である。 In the formula, R2e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with the substituent B, and R1, R2, R2c, R3, nb, X, Y and the broken line part It is synonymous with the above.
 製造方法Mは、式(1)で表される化合物のうち、R2eが置換基Bで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1-f)で表される化合物の合成方法であって、式(1-d)で表される化合物と末端アルキン化合物とを反応させる園頭カップリングによって得ることを含む製造方法である。 In the production method M, among the compounds represented by the formula (1), R2e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with a substituent B (1- A method for synthesizing the compound represented by f), which comprises obtaining the compound represented by the formula (1-d) by Sonogashira coupling with a terminal alkyne compound.
 式(1-d)で表される化合物中、好ましいR2cは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-d), preferable R2c is a chlorine atom, a bromine atom, or an iodine atom.
 製造方法Iにおける式(1a-b)で表される化合物を式(1-d)で表される化合物に代えて使用することにより、製造方法Iに準じて製造方法Mを実施することができる。 By using the compound represented by the formula (1a-b) in the production method I instead of the compound represented by the formula (1-d), the production method M can be carried out according to the production method I. .
[製造方法N]
Figure JPOXMLDOC01-appb-C000089
[Production Method N]
Figure JPOXMLDOC01-appb-C000089
 式中、Daはハロゲン原子を表し、D1aはハロゲン原子を表し、D1bはC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、またはC3~C8のシクロアルコキシ基を表し、Eはハロゲンで置換された炭素原子または窒素原子を表し、R1、R2、R3、n、X、Qおよび破線部は前記と同義である。 In the formula, Da represents a halogen atom, D1a represents a halogen atom, D1b represents a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group, and E represents a halogen atom. Represents a carbon atom or a nitrogen atom, and R 1, R 2, R 3, n, X, Q, and a broken line part are as defined above.
 製造方法Nは、式(1)で表される化合物のうち、D1bがC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、またはC3~C8のシクロアルコキシ基であり、Eがハロゲン原子で置換された炭素原子または窒素原子である式(1-h)で表される化合物の合成方法であって、式(1-g)で表される化合物とD1b-Qとを、溶媒中で反応させることを含む製造方法である。 In the production method N, among the compounds represented by the formula (1), D1b is a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group, and E is a halogen atom. A method for synthesizing a compound represented by formula (1-h), which is a substituted carbon atom or nitrogen atom, comprising reacting a compound represented by formula (1-g) with D1b-Q in a solvent. Manufacturing method.
 本反応で使用されるD1b-Qは、市販品として入手または公知の方法で製造することができる。好ましいQは、水素原子、またはナトリウム、カリウム等のアルカリ金属類である。 D1b-Q used in this reaction can be obtained as a commercial product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
 本反応で使用されるD1b-Qの量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上30当量以下である。また、Qが水素原子を表すときは、溶媒として使用することができる。 The amount of D1b-Q used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). Preferably, it is 1 equivalent or more and 30 equivalent or less. Moreover, when Q represents a hydrogen atom, it can be used as a solvent.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が好ましい。また、Qがアルカリ金属類のときは、塩基の使用は、必須ではない。 The base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride. Further, when Q is an alkali metal, the use of a base is not essential.
 本反応に使用する塩基の量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上30当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). 1 equivalent or more and 30 equivalent or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、D1b-Hで表されるアルコール系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but alcohol solvents represented by D1b-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc Halogenated solvents, dimethylsulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-g). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1-h)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-h) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-h)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1-h)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1-h) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-h) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法O]
Figure JPOXMLDOC01-appb-C000090
[Production method O]
Figure JPOXMLDOC01-appb-C000090
 式中、R2eは置換基Bで適宜置換されてもよいC1~C6のアルコキシ基を表し、R2fは置換基Bで適宜置換されてもよいC1~C6のアルコキシ基を表し、R2gはハロゲン原子を表し、HalR、R1、R3、X、Yおよび破線部は前記と同義である。 In the formula, R2e represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B, R2f represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B, and R2g represents a halogen atom. In the formula, HalR, R1, R3, X, Y and the broken line part are as defined above.
 製造方法Oは、式(1)で表される化合物のうち、R2eが置換基Bで適宜置換されてもよいC1~C6のアルコキシ基であり、R2fが置換基Bで適宜置換されてもよいC1~C6のアルコキシ基であり、R2gがハロゲン原子である式(1-j)で表される化合物を得る製造方法であって、式(1-i)で表される化合物とハロゲン化剤(HalR)とを、溶媒中で反応させることを含む製造方法である。 In the production method O, among the compounds represented by the formula (1), R2e is a C1-C6 alkoxy group which may be appropriately substituted with the substituent B, and R2f may be appropriately substituted with the substituent B. A production method for obtaining a compound represented by the formula (1-j), which is a C1-C6 alkoxy group and R2g is a halogen atom, comprising a compound represented by the formula (1-i) and a halogenating agent ( HalR) in a solvent.
 本反応に使用するハロゲン化剤としては、セレクトロフルオル(N-フルオロ-N’-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluoro (N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(1-i)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、好ましくは1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-i). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。
 本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式(1-i)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、0.1当量以上3当量以下である。
When the halogenating agent used in this reaction is an iodinating agent, add an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid. Can do.
When the halogenating agent used in this reaction is an iodinating agent, the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1-i), and the target reaction Although it does not restrict | limit especially as long as it advances, Preferably it is 0.1 equivalent or more and 3 equivalent or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-i)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but usually 3 to 200 times by weight with respect to the compound represented by the formula (1-i). It is as follows.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(1-j)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-j) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(1-j)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(1-j)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-j) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法P]
Figure JPOXMLDOC01-appb-C000091
[Production method P]
Figure JPOXMLDOC01-appb-C000091
 式中、LaはSを表し、LbはSOまたはSOを表し、Ox’は酸化剤を表す。 In the formula, La represents S, Lb represents SO or SO 2 , and Ox ′ represents an oxidizing agent.
 製造方法Pは、式(1)で表される化合物中、R1、R2およびR3に含まれるLbがSOまたはSOである式(Lb)で表される化合物の製造方法であって、式(1)中、R1、R2またはR3に含まれるLaがSである式(La)で表される化合物と酸化剤(Ox’)とを、溶媒中で反応させることを含む製造方法である。 Production method P during the compound represented by formula (1), a process for the preparation of a compound represented by R1, Lb contained in R2 and R3 is SO or SO 2 wherein (Lb), the formula ( In 1), it is a production method comprising reacting a compound represented by the formula (La) in which La contained in R1, R2 or R3 is S with an oxidizing agent (Ox ′) in a solvent.
 本反応に使用する酸化剤は、過酸化水素水、メタ-クロロ過安息酸等の過酸化物類等が挙げられる。また、タングステン酸ナトリウムのような遷移金属類を添加することもできる。 Examples of the oxidizing agent used in this reaction include peroxides such as hydrogen peroxide and meta-chloroperbenzoic acid. In addition, transition metals such as sodium tungstate can be added.
 本反応に使用する酸化剤の量は、SOを製造する際には式(La)で表される化合物に対して、通常、1.0当量以上1.2当量以下であり、SOを製造する際には、通常、2当量以上10当量以下である。また、遷移金属類を添加する際には、通常、0.001当量以上1当量以下である。 The amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalent or less with respect to the compound represented by the formula (La) when producing SO, and produces SO 2 . When doing, it is usually 2 equivalents or more and 10 equivalents or less. Moreover, when adding transition metals, it is 0.001 equivalent or more and 1 equivalent or less normally.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸等の酸性系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc. Examples thereof include benzene solvents, nitrile solvents such as acetonitrile, and halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(La)を有する式(1)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 times the weight of the compound represented by the formula (1) having the formula (La). More than 200 weight times.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上120℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −10 ° C. or higher and 120 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(Lb)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (Lb) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(Lb)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(Lb)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (Lb) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
 次に製造方法Aに記載されている式(3)で表される化合物の合成方法について記載する。
[製造方法Q] 
Figure JPOXMLDOC01-appb-C000092
Next, a method for synthesizing the compound represented by Formula (3) described in Production Method A will be described.
[Production method Q]
Figure JPOXMLDOC01-appb-C000092
 式中、R2、R3、R5、n、XおよびYは、前記と同義である。 In the formula, R2, R3, R5, n, X and Y have the same meanings as described above.
 製造方法Qは、式(3)で表される製造中間体の製造方法であって、式(4)で表される化合物と式(5)で表される化合物とを、塩基存在下溶媒中で反応させることを含む製造方法である。 Production method Q is a production method of a production intermediate represented by formula (3), in which a compound represented by formula (4) and a compound represented by formula (5) are mixed in a solvent in the presence of a base. It is a manufacturing method including making it react with.
 本反応に使用する式(4)で表される化合物は、例えば、グリーン ケミストリー(Green Chemistry)、第41巻、580-585頁や、ザ ジャーナル オブ オルガニック ケミストリー(The Journal of Organic Chemistry)、第65巻、20号、6458-6461頁(2000).等を参照に合成することができる。 The compound represented by the formula (4) used in this reaction is, for example, Green Chemistry, Vol. 41, pages 580-585, The Journal of Organic Chemistry, No. 65, No. 20, pages 6458-6461 (2000). Etc. can be synthesized by reference.
 本反応に使用する式(5)で表される化合物は、市販品として入手または公知の方法で製造できることができる。
 本反応に使用する式(5)で表される化合物の量は、式(4)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは1当量以上3当量以下である。
The compound represented by Formula (5) used for this reaction can be obtained as a commercial product or can be produced by a known method.
The amount of the compound represented by the formula (5) used in this reaction is particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (4). However, it is preferably 1 equivalent or more and 3 equivalents or less.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 The base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
 本反応に使用する塩基は、触媒量で実施することが可能であり、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、式(4)で表される化合物に対して0.01当量以上3当量以下である。 The base used in this reaction can be carried out in a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but preferably the compound represented by formula (4) is used. On the other hand, it is 0.01 equivalent or more and 3 equivalent or less.
 本反応に使用する溶媒は、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 Solvents used in this reaction are ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea solvents such as imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, sulfur solvents such as dimethyl sulfoxide, sulfolane, acetone, methyl ethyl ketone, methyl Ketone solvents such as Sobuchiruketon like. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(4)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (4). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-50℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −50 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(3)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (3) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(3)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(3)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (3) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (3) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
[製造方法R]
Figure JPOXMLDOC01-appb-C000093
[Production method R]
Figure JPOXMLDOC01-appb-C000093
 式中、R5aはC1~C6のアルキル基を表し、R2、R3、n、XおよびYは前記と同義である。 In the formula, R5a represents a C1 to C6 alkyl group, and R2, R3, n, X, and Y are as defined above.
 製造方法Rは、式(3)で表される化合物のうち、式(3b)で表される製造中間体の製造方法であって、式(3a)で表される化合物を、酸性条件または塩基性条件下、溶媒中で反応させることを含む製造方法である。 Production method R is a production method of a production intermediate represented by formula (3b) among the compounds represented by formula (3), wherein the compound represented by formula (3a) is subjected to acidic conditions or a base. It is a manufacturing method including making it react in a solvent on sexual conditions.
 まず、酸性条件の反応について説明する。
 本反応に使用する酸は、塩酸、臭化水素酸、リン酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロ酢酸等の有機酸類が例示される。目的とする反応が進行する限り特に制限されることはない。
First, the reaction under acidic conditions will be described.
Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid. There is no particular limitation as long as the target reaction proceeds.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、式(3a)で表される化合物に対して0.01当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds. Preferably, the amount of the acid is 0. 0 with respect to the compound represented by the formula (3a). 01 equivalents or more. Further, liquid acids can be used as solvents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, etc. No A solvent, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(3a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 0 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 次に、塩基性条件の反応について説明する。
 本反応に使用する塩基は、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。
Next, the reaction under basic conditions will be described.
Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, but are not particularly limited as long as the target reaction proceeds.
 本反応に使用する塩基は、式(3a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上30当量以下である、 The base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by formula (3a), but preferably 1 equivalent or more. 30 equivalents or less,
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Solvents, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Solvents, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(3a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-20℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −20 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理は、酸性条件での反応と塩基性条件の反応は共通の方法で行える。反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As for the post-treatment of the reaction, the reaction under acidic conditions and the reaction under basic conditions can be performed by a common method. A liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. are dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, saline, etc. are optional. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
 前記で得られた式(3b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (3b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
 前記で得られた式(3b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
 溶媒留去後に得られた式(3b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。
The reaction mixture containing the compound represented by the formula (3b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by formula (3b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography, etc. with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
 式(3b)で表される化合物は、式(3b’)
Figure JPOXMLDOC01-appb-C000094

(式中、R2、R3、n、XおよびYは前記と同義である。)
The compound represented by the formula (3b) is represented by the formula (3b ′)
Figure JPOXMLDOC01-appb-C000094

(Wherein R2, R3, n, X and Y are as defined above.)
で表される異性体も含む。式(3b’)で表される化合物は、式(3b)で表される化合物と同様に取り扱うことが可能であり、製造方法Aを適応することができる。また、式(3b’)で表される化合物は不斉炭素を含むが、その異性体混合比は、単独でも任意の割合の混合物でもよい。さらに、式(3b)で表される化合物と式(3b’)で表される化合物との混合物でもよく、その異性体混合比は、単独でも任意の割合の混合物でもよい。 Is also included. The compound represented by the formula (3b ′) can be handled in the same manner as the compound represented by the formula (3b), and the production method A can be applied. Further, the compound represented by the formula (3b ′) contains an asymmetric carbon, but the isomer mixing ratio may be single or a mixture of any ratio. Further, it may be a mixture of the compound represented by the formula (3b) and the compound represented by the formula (3b ′), and the isomer mixing ratio may be a single compound or a mixture of any ratio.
 以上に示した、製造方法A~製造方法Rを任意に組み合わせて、式(1)で表される化合物を製造することができる。もしくは、公知の方法と製造方法A~製造方法Rとを任意に組み合わせても、式(1)で表される化合物を製造することができる。 The compound represented by the formula (1) can be produced by arbitrarily combining the production methods A to R shown above. Alternatively, the compound represented by the formula (1) can also be produced by arbitrarily combining known methods and production methods A to R.
 次に、式(2a)又は式(2b)で表されるキノリン系化合物について説明する。
 式(2a)及び式(2b)のR2a及びR2bはそれぞれ独立していて、置換基E1で適宜置換されてもよいC1~C6のアルキル基、置換基E2で適宜置換されてもよいアリール基、置換基E3で適宜置換されてもよいヘテロアリール基、または置換基E2で適宜置換されてもよいアラルキル基を表すか、あるいはR2aとR2bは、それらが結合する炭素原子と一緒になって置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよい。
Next, the quinoline compound represented by the formula (2a) or the formula (2b) will be described.
R2a and R2b in the formula (2a) and the formula (2b) are each independent, a C1-C6 alkyl group which may be appropriately substituted with a substituent E1, an aryl group which may be optionally substituted with a substituent E2, Represents a heteroaryl group optionally substituted with a substituent E3, or an aralkyl group optionally substituted with a substituent E2, or R2a and R2b together with the carbon atom to which they are bonded together A C3-C10 cycloalkyl ring optionally substituted with E4 may be formed.
 中でもR2a及びR2bはそれぞれ独立していて、置換基E1で適宜置換されてもよいC1~C6のアルキル基、特にC1~C6のアルキル基が好ましく、とりわけメチル基がより好ましい。 Among them, R2a and R2b are independent of each other, and are preferably a C1-C6 alkyl group, particularly a C1-C6 alkyl group, and more preferably a methyl group, which may be appropriately substituted with the substituent E1.
 式(2a)及び式(2b)のR2c及びR2dはそれぞれ独立していて、水素原子、置換基E1で適宜置換されてもよいC1~C6のアルキル基、ハロゲン原子、C1~C6のアルコキシ基、又は水酸基を表すか、あるいはR2cとR2dは、それらが結合する炭素原子と一緒になってカルボニル基又は置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよい。 R2c and R2d in the formula (2a) and the formula (2b) are each independently a hydrogen atom, a C1-C6 alkyl group, a halogen atom, a C1-C6 alkoxy group which may be optionally substituted with a substituent E1, Or a hydroxyl group, or R2c and R2d together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with a carbonyl group or substituent E4.
 中でもR2c及びR2dはそれぞれ独立していて、水素原子、置換基E1で適宜置換されてもよいC1~C6のアルキル基、特にC1~C6のアルキル基、又はハロゲン原子が好ましく、とりわけ水素原子、メチル基又はフッ素原子がより好ましい。 Among them, R2c and R2d are independent of each other, and are preferably a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent E1, particularly a C1-C6 alkyl group, or a halogen atom. A group or a fluorine atom is more preferred.
 式(2a)及び式(2b)のR2eは、水素原子、C2~C7のアシル基、又は置換基E1で適宜置換されてもよいC1~C6のアルキル基を表す。 R2e in the formulas (2a) and (2b) represents a hydrogen atom, a C2 to C7 acyl group, or a C1 to C6 alkyl group optionally substituted with a substituent E1.
 中でもR2eは、水素原子又は置換基E1で適宜置換されてもよいC1~C6のアルキル基、特にC1~C6のアルキル基が好ましく、とりわけ水素原子又はメチル基がより好ましい。最も好ましいのは水素原子である。 Among these, R2e is preferably a hydrogen atom or a C1-C6 alkyl group which may be optionally substituted with a substituent E1, particularly a C1-C6 alkyl group, and more preferably a hydrogen atom or a methyl group. Most preferred is a hydrogen atom.
 式(2a)及び式(2b)のX1は、ハロゲン原子、置換基E5で適宜置換されてもよいC1~C6のアルキル基、置換基E6で適宜置換されてもよいC2~C6のアルケニル基、置換基E7で適宜置換されてもよいC2~C6のアルキニル基、置換基E2で適宜置換されてもよいアリール基、置換基E3で適宜置換されてもよいヘテロアリール基、C1~C6のアルコキシ基、置換基E8で適宜置換されてもよいアミノ基、C2~C7のアシル基、シアノ基、又は置換基E9で水酸基の水素原子が置換されてよいN-ヒドロキシアルカンイミドイル基を表す。 X1 in formula (2a) and formula (2b) is a halogen atom, a C1-C6 alkyl group optionally substituted with a substituent E5, a C2-C6 alkenyl group optionally substituted with a substituent E6, C2-C6 alkynyl group optionally substituted with substituent E7, aryl group optionally substituted with substituent E2, heteroaryl group optionally substituted with substituent E3, alkoxy group with C1-C6 Represents an amino group optionally substituted with a substituent E8, an acyl group of C2 to C7, a cyano group, or an N-hydroxyalkaneimidoyl group in which a hydrogen atom of a hydroxyl group may be substituted with a substituent E9.
 中でもX1はハロゲン原子が好ましく、フッ素原子がより好ましい。 Of these, X1 is preferably a halogen atom, more preferably a fluorine atom.
 式(2a)及び式(2b)のX2は、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基又は水酸基を表す。 X2 in the formulas (2a) and (2b) represents a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group or a hydroxyl group.
 中でもX2はハロゲン原子が好ましく、フッ素原子がより好ましい。 Of these, X2 is preferably a halogen atom, more preferably a fluorine atom.
 式(2a)及び式(2b)において、n1は0~4の整数を表し、n2は0~6の整数を表す。 In formula (2a) and formula (2b), n1 represents an integer of 0 to 4, and n2 represents an integer of 0 to 6.
 中でもn1は0~1の整数が好ましく、n2は0~2の整数、特に0~1の整数が好ましい。 Among them, n1 is preferably an integer of 0 to 1, and n2 is preferably an integer of 0 to 2, particularly preferably an integer of 0 to 1.
 式(2a)及び式(2b)の置換基E1は、ハロゲン原子、C1~C6のアルコキシ基、C1~C6のアルキルチオ基及びフェノキシ基からなる群から選択される少なくとも1種である。 The substituent E1 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C1-C6 alkylthio group, and a phenoxy group.
 式(2a)及び式(2b)の置換基E2は、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、置換基E8で適宜置換されてもよいアミノ基、ニトロ基、シアノ基、水酸基、メルカプト基及びC1~C6のアルキルチオ基からなる群から選択される少なくとも1種である。 The substituent E2 in the formula (2a) and the formula (2b) is a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, or an amino optionally substituted with a substituent E8. And at least one selected from the group consisting of a group, a nitro group, a cyano group, a hydroxyl group, a mercapto group, and a C1-C6 alkylthio group.
 式(2a)及び式(2b)の置換基E3は、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基及びC1~C6のアルコキシ基からなる群から選択される少なくとも1種である。 The substituent E3 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, and a C1-C6 alkoxy group. .
 式(2a)及び式(2b)の置換基E4は、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種である。 The substituent E4 in the formulas (2a) and (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, and a phenoxy group.
 式(2a)及び式(2b)の置換基E5は、ハロゲン原子、C1~C6のアルコキシ基、水酸基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種である。 The substituent E5 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a hydroxyl group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group. .
 式(2a)及び式(2b)の置換基E6は、ハロゲン原子、C1~C6のアルコキシ基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種である。 The substituent E6 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group.
 式(2a)及び式(2b)の置換基E7は、ハロゲン原子、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種である。 The substituent E7 in the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group and a phenoxy group.
 式(2a)及び式(2b)の置換基E8は、C1~C6のアルキル基及びC2~C7のアシル基からなる群から選択される少なくとも1種である。 The substituent E8 in the formulas (2a) and (2b) is at least one selected from the group consisting of C1-C6 alkyl groups and C2-C7 acyl groups.
 式(2a)及び式(2b)の置換基E9は、C1~C6のアルキル基、C2~C6のアルケニル基、C2~C6のアルキニル基、アラルキル基、アリール基及びヘテロアリール基からなる群から選択される少なくとも1種である。 Substituent E9 in formula (2a) and formula (2b) is selected from the group consisting of C1-C6 alkyl groups, C2-C6 alkenyl groups, C2-C6 alkynyl groups, aralkyl groups, aryl groups and heteroaryl groups Is at least one kind.
 中でも式(2a)又は式(2b)で表されるキノリン系化合物が、式(2c)又は式(2d)
Figure JPOXMLDOC01-appb-C000095

 [式中、R2fは水素原子又はメチル基を表し、X3、X4及びX5はそれぞれ独立して水素原子又はフッ素原子を表し、X6及びX7はそれぞれ独立して水素原子、メチル基又はフッ素原子を表す]で表されるキノリン系化合物が好ましい。
Among them, the quinoline compound represented by the formula (2a) or the formula (2b) is represented by the formula (2c) or the formula (2d).
Figure JPOXMLDOC01-appb-C000095

[Wherein, R2f represents a hydrogen atom or a methyl group, X3, X4 and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group or a fluorine atom. ] The quinoline type compound represented by this is preferable.
 特に式(2a)又は(2b)で表されるキノリン系化合物が、
3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(化合物番号:(2)-1)、
Figure JPOXMLDOC01-appb-C000096

3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(化合物番号:(2)-2)、
Figure JPOXMLDOC01-appb-C000097

8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリン(化合物番号:(2)-3)、
Figure JPOXMLDOC01-appb-C000098

又は8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(化合物番号:(2)-4)
Figure JPOXMLDOC01-appb-C000099
であることが最も好ましい。
In particular, a quinoline compound represented by the formula (2a) or (2b)
3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (compound number: (2) -1),
Figure JPOXMLDOC01-appb-C000096

3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (compound number: (2) -2),
Figure JPOXMLDOC01-appb-C000097

8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline (compound number: (2) -3),
Figure JPOXMLDOC01-appb-C000098

Or 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (compound number: (2) -4)
Figure JPOXMLDOC01-appb-C000099
Most preferably.
 前記式(2c)又は式(2d)で表されるキノリン系化合物であって、X3又はX4、特にX3がフッ素原子である化合物は、灰色かび病、イネいもち病、リンゴ黒星病、キュウリ炭そ病等の病害に対して顕著に効果が向上することが見出され、好ましい。 The quinoline compound represented by the above formula (2c) or (2d), wherein X3 or X4, and particularly X3 is a fluorine atom, is gray mold disease, rice blast disease, apple black spot disease, cucumber anthracnose It has been found that the effect is remarkably improved against diseases such as diseases, which is preferable.
 とりわけ、式(2c)又は式(2d)で表されるキノリン系化合物であって、R2fが水素原子又はメチル基であり、X3がフッ素原子であり、X4、X5、X6及びX7がそれぞれ独立して水素原子又はフッ素原子であるが、ただし式(2c)においてはX4、X5、X6又はX7のうち少なくとも1つがフッ素原子であり、式(2d)においてはX4又はX5のいずれかがフッ素原子であるキノリン系化合物又はその塩が、灰色かび病、イネいもち病、リンゴ黒星病、キュウリ炭そ病等の病害に対して顕著な効果を示すので、好ましい。
 特に上記キノリン系化合物(2)-2、(2)-3、及び(2)-4が好ましく、とりわけ上記キノリン系化合物(2)-2及び(2)-3が好ましい。
Particularly, it is a quinoline compound represented by the formula (2c) or the formula (2d), wherein R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, and X4, X5, X6 and X7 are each independently In formula (2c), at least one of X4, X5, X6 or X7 is a fluorine atom, and in formula (2d), either X4 or X5 is a fluorine atom. A certain quinoline compound or a salt thereof is preferable because it exhibits a remarkable effect on diseases such as gray mold disease, rice blast disease, apple black spot disease, and cucumber anthracnose.
In particular, the quinoline compounds (2) -2, (2) -3, and (2) -4 are preferable, and the quinoline compounds (2) -2 and (2) -3 are particularly preferable.
 加えて、上記キノリン系化合物(2)-3及び(2)-4は、容器内土壌残留試験での半減期が7~55日であり、顕著に土壌残留性が低い環境動態的特性を有することも見出され、好ましい。 In addition, the quinoline compounds (2) -3 and (2) -4 have an environmental kinetic property that has a half-life of 7 to 55 days in a soil residual test in a container and a remarkably low soil residual property. This is also found and preferred.
 式(2a)又は式(2b)で表されるキノリン系化合物に関しては、その生物活性、またはその成分を用いた有害生物の防除方法は、公知の文献(例えば国際公開第05/070917号又は国際公開第08/066148号)を参照にできる。また、式(2a)又は式(2b)で表されるキノリン系化合物およびその製造中間体の製造方法については公知の文献(例えば国際公開第05/070917号、国際公開第08/066148号、国際公開第13/047749号、国際公開第13/047750号又は国際公開第13/047751号)を参照できる。 Regarding the quinoline-based compound represented by the formula (2a) or the formula (2b), its biological activity or a method for controlling pests using the component can be determined according to known literature (for example, International Publication No. 05/070917 or International Publication No. 08/0666148) may be referred to. Moreover, about the manufacturing method of the quinoline type compound and its manufacturing intermediate represented by Formula (2a) or Formula (2b), it is well-known literature (For example, international publication 05/070917, international publication 08/066148, international Reference can be made to publication 13/047749, international publication 13/047750 or international publication 13/047751).
 次に、本発明の有害生物防除組成物について説明する。
 本発明の有害生物防除組成物は、一般的な農薬の製造に関する常法に従って、製造することができる。すなわち、当該有害生物防除組成物は、本発明化合物およびキノリン系化合物の2種類以上の有効成分を混合し、これに必要に応じて担体および補助剤等を混合して、双方の有効成分を含有する組成物を製造することができる。また、本発明化合物およびキノリン系化合物のどちらか一方を含有する組成物を先に製造した後、それにもう一方を加え、双方の有効成分を含有する組成物を製造してもよい。
 通常、好ましくは双方の有効成分を混合した混合物を調製して、当該有害生物防除組成物を製造する。
 あるいは、本発明の有害生物防除組成物は、一般的な農薬の製造に関する常法に従って、キノリン系化合物のみの有効成分に必要に応じて担体および補助剤等を混合して、製造することができる。
Next, the pest control composition of the present invention will be described.
The pest control composition of the present invention can be produced according to a conventional method relating to the production of general agricultural chemicals. That is, the pest control composition contains two or more active ingredients of the compound of the present invention and a quinoline compound, and if necessary, a carrier and an auxiliary agent are mixed to contain both active ingredients. A composition can be produced. Moreover, after manufacturing the composition containing any one of this invention compound and a quinoline-type compound previously, the other may be added to it and the composition containing both active ingredients may be manufactured.
Usually, the mixture containing both active ingredients is preferably prepared to produce the pest control composition.
Alternatively, the pest control composition of the present invention can be produced by mixing a quinoline-based compound with an active ingredient, if necessary, a carrier and an auxiliary agent according to a conventional method for producing general agricultural chemicals. .
 本発明の有害生物防除組成物においては、本発明化合物およびキノリン系化合物の組み合わせのみ、あるいはキノリン系化合物のみを、そのまま使用してもかまわないが、通常、担体と混合して用いられ、必要に応じて、界面活性剤、結合剤、崩壊剤、安定剤、pH調整剤、抗菌防黴剤(防腐剤)、増粘剤、消泡剤、湿潤剤、固着剤、着色剤等の補助剤を添加して、常法に従って、適時、水和剤、フロアブル剤、顆粒水和剤、OD剤、粉剤、液剤、乳剤、粒剤、パック剤等の剤型に製剤化することができる。その形態は効果が発揮される限りにおいて、特に限定されることはない。
 なお、本発明の有害生物防除組成物は、本発明化合物とキノリン系化合物とを一つの剤型に製剤化された態様であってもよいし、あるいは、それぞれが別々の剤型に製剤化された両者のセットの態様であってもよい。
In the pest control composition of the present invention, only the combination of the compound of the present invention and the quinoline compound, or only the quinoline compound may be used as it is, but it is usually used by mixing with a carrier. Depending on the type, auxiliary agents such as surfactants, binders, disintegrants, stabilizers, pH adjusters, antibacterial antifungal agents (preservatives), thickeners, antifoaming agents, wetting agents, fixing agents, coloring agents, etc. In addition, it can be formulated into dosage forms such as wettable powder, flowable powder, wettable powder granule, OD drug, powder, liquid, emulsion, granule, pack, etc. in a timely manner according to conventional methods. The form is not particularly limited as long as the effect is exhibited.
The pest control composition of the present invention may be an embodiment in which the compound of the present invention and the quinoline compound are formulated in one dosage form, or each is formulated in separate dosage forms. Alternatively, both sets may be used.
 本発明の組成物に使用される担体とは、処理すべき部位への有効成分の到達を助け、また有効成分化合物の貯蔵、輸送、取扱いを容易にするために配合される合成もしくは天然の無機または有機物質を意味し、通常農薬に使用されるものであるならば固体、液体または気体のいずれでも使用することができる。その担体は、効果が発揮される限りにおいて、特に限定されるものではない。 The carrier used in the composition of the present invention means a synthetic or natural inorganic compound formulated to help the active ingredient reach the site to be treated and to facilitate the storage, transport and handling of the active ingredient compound. Or it means an organic substance, and any solid, liquid or gas can be used as long as it is usually used for agricultural chemicals. The carrier is not particularly limited as long as the effect is exhibited.
 本発明の組成物に使用することができる固体担体としては、例えば、ベントナイト、モンモリロナイト、珪藻土、白土、タルク、クレー等の無機物質、木粉、鋸屑等の植物性有機物質、または尿素等を挙げることができる。 Examples of the solid carrier that can be used in the composition of the present invention include inorganic substances such as bentonite, montmorillonite, diatomaceous earth, white clay, talc, and clay, plant organic substances such as wood flour and sawdust, and urea. be able to.
 本発明の組成物に使用することができる液体担体としては、例えば、キシレン、トルエン等の芳香族炭化水素類、ナフテン類、n-パラフィン、流動パラフィン等の脂肪族炭化水素類、アセトン、メチルエチルケトン等のケトン類、ジオキサン、ジエチレングリコールジメチルエーテル等のエーテル類、エタノール、エチレングリコール等のアルコール類、エチレンカーボネート等のカーボネート類、ジメチルホルムアミド等の非プロトン性溶媒、水等を挙げることができる。
 本発明の組成物に使用することができる気体担体としては、例えば、窒素、炭酸ガス等を挙げることができる。
Examples of liquid carriers that can be used in the composition of the present invention include aromatic hydrocarbons such as xylene and toluene, aliphatic hydrocarbons such as naphthenes, n-paraffins, and liquid paraffin, acetone, methyl ethyl ketone, and the like. Ketones, dioxane, ethers such as diethylene glycol dimethyl ether, alcohols such as ethanol and ethylene glycol, carbonates such as ethylene carbonate, aprotic solvents such as dimethylformamide, water, and the like.
Examples of the gas carrier that can be used in the composition of the present invention include nitrogen and carbon dioxide.
 さらに、本発明の組成物中の化合物の効力を増強するために、補助剤を使用することもできる。その使用形態は、製剤の剤型や処理方法等を考慮し、目的に応じて、単独または組み合わせ使用することができる。補助剤の例として、界面活性剤、結合剤、崩壊剤、安定剤、pH調整剤、防菌防黴剤、増粘剤、消泡剤、凍結防止剤等を挙げることができる。 Furthermore, adjuvants can also be used to enhance the efficacy of the compounds in the compositions of the present invention. The use form can be used alone or in combination depending on the purpose in consideration of the dosage form of the preparation, the treatment method, and the like. Examples of adjuvants include surfactants, binders, disintegrants, stabilizers, pH adjusters, antibacterial and antifungal agents, thickeners, antifoaming agents, antifreeze agents, and the like.
 本発明の組成物に使用することができる界面活性剤としては、通常、農薬製剤を乳化、分散、拡展または/および湿潤する等の目的で使用される界面活性剤が使用できる。該界面活性剤の例として、ソルビタン脂肪酸エステル、ポリオキシエチレン脂肪酸エステル、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンポリオキシプロピレンブロックポリマー、アルキルポリオキシエチレンポリオキシプロピレンブロックポリマーエーテル、ポリオキシエチレンアルキルアミン、ポリオキシエチレン脂肪酸アミド、ポリオキシエチレンビスフェニルエーテル、高級アルコールのポリオキシアルキレン付加物、ポリオキシエチレンエーテル、エステル型シリコーン、フッ素系界面活性剤等の非イオン性界面活性剤;
アルキルサルフェート、ポリオキシエチレンアルキルエーテルサルフェート、ポリオキシエチレンベンジルフェニルエーテルサルフェート、ポリオキシエチレンスチリルフェニルエーテルサルフェート、パラフィンスルホネート、アルカンスルホネート、AOS、ジアルキルスルホサクシネート、アルキルベンゼンスルホネート、リグニンスルホネート、ポリオキシエチレンアルキルフェニルエーテルスルホネート、脂肪酸塩、N-メチル-脂肪酸サルコシネート、ポリオキシエチレンアルキルエーテルホスフェート、ポリオキシエチレンフェニルエーテルホスフェート、ポリオキシエチレンポリオキシプロピレンブロックポリマーホスフェート、ホスファチジルコリン、ホスファチジルエタノールイミン、アルキルホスフェート、トリポリ燐酸ナトリウム等のアニオン性界面活性剤;
アルキルトリメチルアンモニウムクロライド、アルキルジメチルベンザルコニウムクロライド、ベンゼトニウムクロライド等のカチオン性界面活性剤;
ジアルキルジアミノエチルベンタイン、アルキルジメチルベンジルベンタイン等の両性界面活性剤等が挙げられる。
As the surfactant that can be used in the composition of the present invention, a surfactant that is usually used for the purpose of emulsifying, dispersing, spreading or / and wetting the agricultural chemical preparation can be used. Examples of the surfactant include sorbitan fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkyl ether, polyoxyethylene alkylphenyl ether, polyoxyethylene polyoxypropylene block polymer, alkyl polyoxyethylene polyoxypropylene block polymer ether Nonionic surfactants such as polyoxyethylene alkylamines, polyoxyethylene fatty acid amides, polyoxyethylene bisphenyl ethers, polyoxyalkylene adducts of higher alcohols, polyoxyethylene ethers, ester type silicones, fluorosurfactants Agent;
Alkyl sulfate, polyoxyethylene alkyl ether sulfate, polyoxyethylene benzyl phenyl ether sulfate, polyoxyethylene styryl phenyl ether sulfate, paraffin sulfonate, alkane sulfonate, AOS, dialkyl sulfosuccinate, alkylbenzene sulfonate, lignin sulfonate, polyoxyethylene alkylphenyl Ether sulfonate, fatty acid salt, N-methyl-fatty acid sarcosinate, polyoxyethylene alkyl ether phosphate, polyoxyethylene phenyl ether phosphate, polyoxyethylene polyoxypropylene block polymer phosphate, phosphatidylcholine, phosphatidylethanolimine, alkyl phosphate, tripoly Anionic surfactants such as sodium;
Cationic surfactants such as alkyltrimethylammonium chloride, alkyldimethylbenzalkonium chloride, benzethonium chloride;
Examples include amphoteric surfactants such as dialkyldiaminoethyl bentine and alkyl dimethyl benzyl bentine.
 結合剤としては、例えば、アルギン酸ナトリウム、ポリビニルアルコール、アラビアゴム、カルボキシメチルセルロースナトリウム、ベントナイト等が挙げられる。 Examples of the binder include sodium alginate, polyvinyl alcohol, gum arabic, sodium carboxymethyl cellulose, bentonite and the like.
 崩壊剤としては、例えば、カルボキシメチルセルロースCMCナトリウム、クロスカルメロースナトリウム等が挙げられる。 Examples of the disintegrant include carboxymethylcellulose CMC sodium and croscarmellose sodium.
 安定剤としては、例えば、ヒンダードフェノール系の酸化防止剤、またはベンゾトリアゾール系、ヒンダードアミン系の紫外線吸収剤等が挙げられる。 Examples of the stabilizer include hindered phenol-based antioxidants, benzotriazole-based and hindered amine-based ultraviolet absorbers, and the like.
 pH調整剤としては、例えば、リン酸、酢酸、水酸化ナトリウム等が挙げられる。 Examples of the pH adjuster include phosphoric acid, acetic acid, sodium hydroxide and the like.
 防菌防黴剤としては、例えば、安息香酸ナトリウム、ソルビン酸カリウム、パラヒドロキシ安息香酸エステル、1,2-ベンゾイソチアゾリン-3-オン等の工業用殺菌剤、防菌防黴剤等が挙げられる。 Examples of the antibacterial / antifungal agent include industrial bactericides such as sodium benzoate, potassium sorbate, parahydroxybenzoate ester, 1,2-benzisothiazolin-3-one, and antibacterial / antifungal agents. .
 増粘剤としては、例えば、キサンタンガム、グアーガム、カルボキシメチルセルロースナトリウム、アラビアゴム、ポリビニルアルコール、モンモリロナイト等が挙げられる。 Examples of the thickener include xanthan gum, guar gum, sodium carboxymethylcellulose, gum arabic, polyvinyl alcohol, montmorillonite and the like.
 消泡剤としては、例えば、シリコーン系化合物等が挙げられる。 Examples of antifoaming agents include silicone compounds.
 凍結防止剤としては、例えば、プロピレングリコール、エチレングリコール等が挙げられる。 Examples of the antifreezing agent include propylene glycol and ethylene glycol.
 以上記載した補助剤は例であって、本発明の組成物に使用される補助剤は効果が発揮される限りにおいて、特に限定されるものではない。 The adjuvants described above are examples, and the adjuvants used in the composition of the present invention are not particularly limited as long as the effects are exhibited.
 本発明の組成物における本発明化合物の含有量は、効果が発揮される限りにおいて特に制限されるものではないが、通常、重量比で、0.01~99%の範囲であり、好ましくは、0.1~90%の範囲であり、さらに好ましくは、1~80%の範囲である。
 また、本発明の組成物におけるキノリン系化合物の含有量は、効果が発揮される限りにおいて特に制限されるものではないが、通常、重量比で、0.01~99%の範囲であり、好ましくは、0.1~90%の範囲であり、さらに好ましくは、1~80%の範囲である。
 本発明の組成物における本発明化合物とキノリン系化合物の含有量の合計は、効果が発揮される限りにおいて特に制限されるものではないが、通常、重量比で0.01~99%の範囲であり、好ましくは、0.1~90%の範囲であり、さらに好ましくは、1~80%の範囲である。
The content of the compound of the present invention in the composition of the present invention is not particularly limited as long as the effect is exhibited, but is usually in the range of 0.01 to 99% by weight, preferably It is in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
Further, the content of the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but it is usually in the range of 0.01 to 99% by weight, preferably Is in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
The total content of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but is usually in the range of 0.01 to 99% by weight. Yes, preferably in the range of 0.1 to 90%, more preferably in the range of 1 to 80%.
 本発明の組成物における本発明化合物とキノリン系化合物の混合比は、効果が発揮される限りにおいて特に制限されるものではないが、通常、本発明化合物に対してキノリン系化合物が、重量比で0.001~1000の比率であり、好ましくは、0.01~100の比率である。 The mixing ratio of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect is exhibited, but the quinoline compound is usually in a weight ratio with respect to the compound of the present invention. The ratio is 0.001 to 1000, and preferably the ratio is 0.01 to 100.
 次に、本発明の有害生物防除組成物を用いた有害生物防除方法について説明する。 Next, a pest control method using the pest control composition of the present invention will be described.
 本発明の組成物は、畑地、水田、茶園、果樹園、牧草地、芝生、森林、庭園、街路樹等で、有害生物防除のために使用することができる。 The composition of the present invention can be used for pest control in fields, paddy fields, tea gardens, orchards, pastures, lawns, forests, gardens, roadside trees, and the like.
 本発明の組成物の農業場面における施用方法としては、例えば、植物個体への茎葉散布処理、苗箱処理、セルトレー処理、土壌表面への散布処理、土壌表面への散布処理後の土壌混和、土壌中への注入処理、土壌中での注入処理後の土壌混和、土壌潅注処理、土壌潅注処理後の土壌混和、植物種子への吹き付け処理、植物種子への塗沫処理、植物種子への浸漬処理または植物種子への粉衣処理等が挙げられる。通常、当業者が利用する施用方法を用いることができる。 As an application method in the agricultural scene of the composition of the present invention, for example, foliage spraying treatment to plant individuals, seedling box treatment, cell tray treatment, soil surface dispersion treatment, soil mixing after soil surface dispersion treatment, soil Infusion into soil, soil mixing after infusion treatment in soil, soil irrigation treatment, soil mixing after soil irrigation treatment, spraying treatment on plant seeds, smearing treatment on plant seeds, immersion treatment in plant seeds Or the dressing process etc. to a plant seed are mentioned. Usually, application methods utilized by those skilled in the art can be used.
 本発明における有害生物を防除する方法としては、本発明の有害生物防除組成物を施用する方法、本発明化合物を有効成分として含有する組成物、およびキノリン系化合物を有効成分として含有する組成物を同時に施用する方法、または、本発明化合物を有効成分として含有する組成物、もしくはキノリン系化合物を有効成分として含有する組成物のいずれか一方の組成物を施用した後に、他方の組成物を施用する方法等が挙げられる。 The method for controlling pests in the present invention includes a method for applying the pest control composition of the present invention, a composition containing the compound of the present invention as an active ingredient, and a composition containing a quinoline compound as an active ingredient. After applying either one of the method of applying at the same time, the composition containing the compound of the present invention as an active ingredient, or the composition containing a quinoline compound as an active ingredient, the other composition is applied. Methods and the like.
 本発明の有害生物防除組成物を施用する方法としては、本発明化合物およびキノリン系化合物の2種類以上の有効成分を含有するように製造された有害生物防除組成物を施用する方法、または本発明化合物を有効成分として含有する組成物およびキノリン系化合物を有効成分として含有する組成物を、使用者が使用前に混合することで、本発明化合物およびキノリン系化合物を含有する組成物を調製して使用する方法等が挙げられる。 As a method of applying the pest control composition of the present invention, a method of applying the pest control composition manufactured to contain two or more kinds of active ingredients of the compound of the present invention and the quinoline compound, or the present invention. A composition containing the compound of the present invention and a quinoline compound is prepared by a user mixing a composition containing the compound as an active ingredient and a composition containing a quinoline compound as an active ingredient before use. The method to use etc. are mentioned.
 本発明化合物を有効成分として含有する組成物またはキノリン系化合物を有効成分として含有する組成物のいずれか一方の組成物を施用した後に、他方の組成物を施用するまでの時間(期間)は、効果が発揮される限りにおいて特に制限されるものではないが、例えば、いずれか一方の組成物を施用した後、1分間~2週間であり、好ましくは、いずれか一方の組成物を施用した後、5分間~1週間であり、さらに好ましくは、いずれか一方の組成物を施用した後、10分間~3日である。 After applying any one of the composition containing the compound of the present invention as an active ingredient or the composition containing a quinoline compound as an active ingredient, the time (period) until the other composition is applied is: Although it is not particularly limited as long as the effect is exhibited, for example, it is 1 minute to 2 weeks after applying any one of the compositions, preferably after applying any one of the compositions The period is 5 minutes to 1 week, and more preferably 10 minutes to 3 days after applying any one of the compositions.
 本発明の組成物の施用量および希釈倍率は、対象の作物、対象の有害生物、有害生物の発生程度、本発明の組成物の剤型、施用方法および各種環境条件等に応じて、適宜選択して決定することができる。 The application amount and dilution rate of the composition of the present invention are appropriately selected according to the target crop, the target pest, the degree of occurrence of the pest, the dosage form of the composition of the present invention, the application method, various environmental conditions, and the like. Can be determined.
 本発明の組成物を散布する場合、その施用量は、効果が発揮される限りにおいて特に制限されるものではないが、通常、有効成分量換算で、1ヘクタール当たり1~10000gであり、好ましくは、1ヘクタール当り10~5000gである。
 また、本発明の組成物を種子消毒剤として使用する場合、その施用量は、効果が発揮される限りにおいて特に制限されるものではないが、通常、有効成分量換算で種子1kg当たり0.001~100gであり、好ましくは、0.01~50gである。
 また、本発明の組成物の水和剤、顆粒水和剤、液剤、OD剤、フロアブル剤または乳剤を水で希釈して散布する場合、その希釈倍率は、効果が発揮される限りにおいて特に制限されるものではないが、通常、5~50000倍であり、好ましくは、10~10000倍である。
When the composition of the present invention is sprayed, the application amount is not particularly limited as long as the effect is exhibited, but it is usually 1 to 10,000 g per hectare in terms of the amount of active ingredient, preferably 10 to 5000 g per hectare.
In addition, when the composition of the present invention is used as a seed disinfectant, the application amount is not particularly limited as long as the effect is exhibited, but usually 0.001 per 1 kg of seed in terms of the amount of active ingredient. -100 g, preferably 0.01-50 g.
When the wettable powder, granular wettable powder, liquid preparation, OD preparation, flowable preparation or emulsion of the composition of the present invention is diluted with water and sprayed, the dilution factor is particularly limited as long as the effect is exhibited. However, it is usually 5 to 50000 times, preferably 10 to 10000 times.
 本明細書において植物とは、光合成をして運動せずに生活するものを意味し、例えば、稲、小麦、大麦、トウモロコシ等の穀物類、ブドウ、リンゴ、ナシ、モモ、オウトウ、カキ、カンキツ等の果樹類、大豆、インゲン、サヤエンドウ等の豆類、イチゴ、スイカ等の果物類、ジャガイモ、サツマイモ、サトイモ、コンニャク等の芋類、キャベツ、レタス、トマト、キュウリ、ナス、テンサイ、ホウレンソウ、カボチャ、ピーマン等の野菜類、セイヨウアブラナ、綿、ヒマワリ、チューリップ、キク等の花卉類またはサトウキビ、タバコ、芝等が挙げられるが、これらに限定されるものではない。 In the present specification, the plant means those that live without photosynthesis and exercise, for example, grains such as rice, wheat, barley, corn, grapes, apples, pears, peaches, sweet potatoes, oysters, citrus. Fruit trees such as soybeans, green beans, green peas, fruits such as strawberries, watermelons, potatoes, sweet potatoes, taros, konjacs, etc., cabbage, lettuce, tomatoes, cucumbers, eggplant, sugar beet, spinach, pumpkins, Examples include, but are not limited to, vegetables such as peppers, rapes such as oilseed rape, cotton, sunflower, tulip, chrysanthemum, sugarcane, tobacco, turf, and the like.
 本明細書において種子とは、幼植物が発芽するための栄養分を蓄え農業上繁殖に用いられるものを意味し、例えば、トウモロコシ、大豆、綿、稲、サトウダイコン、小麦、大麦、ヒマワリ、トマト、キュウリ、ナス、ホウレンソウ、サヤエンドウ、カボチャ、サトウキビ、タバコ、ピーマンおよびセイヨウアブラナ等の種子;サトイモ、ジャガイモ、サツマイモ、コンニャク等の種芋;食用ゆり、チューリップ等の球根やラッキョウ等の種球等;または遺伝子等を人工的に操作することにより生み出された植物であり、該植物は、例えば、自然界に元来存在するものではない除草剤耐性を付与した大豆、トウモロコシ、綿等;寒冷地適応したイネ、タバコ等;殺虫物質生産能を付与したトウモロコシ、綿、バレイショ等の形質転換を受けた種子等が挙げられるが、これらに限定されるものではない。 In the present specification, seed means a nutrient stored for germination of a young plant and used for agricultural reproduction, for example, corn, soybean, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, Seeds such as cucumber, eggplant, spinach, sweet pea, pumpkin, sugar cane, tobacco, pepper and rape; seed pods such as taro, potato, sweet potato and konjac; seed balls such as edible lily, bulbs such as tulips and raccoons; or genes Is a plant produced by artificially manipulating, for example, soybean, corn, cotton, etc. imparted with herbicide resistance that does not naturally exist in nature; rice adapted to cold regions, Tobacco, etc .; transformed with maize, cotton, potato, etc., which have the ability to produce insecticides Child like although not limited thereto.
 本明細書において有害生物とは、細菌類、真菌類、ウイルス等の病原菌、害虫、雑草等の植物の生育に悪影響を与える生物を意味する。病原菌は、植物に感染して植物病害を引き起こす。害虫は植物に寄生、加害する。雑草は、植物の生育場所またはその近傍に繁茂することで、光合成および栄養吸収の点で植物と競合する。これらの理由から、有害生物は植物の生育不良や枯死、収量の低下等の原因となるため、植物に有害である。本発明の組成物および防除方法は、これらの有害生物に対して有効である。
 以下に、本発明が防除対象とする具体的な病原菌および害虫を例示する。
In this specification, pests mean organisms that adversely affect the growth of plants such as pathogens such as bacteria, fungi and viruses, pests and weeds. Pathogenic bacteria infect plants and cause plant diseases. Pests infest and infest plants. Weeds compete with plants in terms of photosynthesis and nutrient absorption by proliferating at or near the plant's growing location. For these reasons, pests are harmful to plants because they cause poor plant growth, wither and die, and decrease in yield. The composition and control method of the present invention are effective against these pests.
Hereinafter, specific pathogenic bacteria and pests to be controlled by the present invention are exemplified.
 病原菌としては、例えば、イネのいもち病菌(Magnaporthe grisea)、紋枯病菌(Thanatephorus cucumeris)、褐色菌核病菌(Ceratobasidium setariae)、褐色小粒菌核病菌(Waitea circinata)、褐色紋枯病菌(Thanatephorus cucumeris)、球状菌核病菌(Sclerotium hydrophilum)、赤色菌核病菌(Wairea circinata)、黒しゅ病菌(Entyloma dactylidis)、小球菌核病菌(Magnaporthe salvinii)、灰色菌核病菌(Ceratobasidium cornigerum)、ごま葉枯病菌(Cochliobolus miyabeanus)、条葉枯病菌(Sphaerulina oryzina)、ばか苗病菌(Gibberella fujikuroi)、苗立枯病菌(Pythium spp.、Fusarium spp.、Trichoderma spp.、Rhizopus spp.、Rhizoctonia solani、Mucor sp.)、苗腐病菌(Pythium spp.、Achlya spp.、Dictyuchus spp.)、稲こうじ病菌(Claviceps virens)、墨黒穂病菌(Tilletia barclayana)、褐色米病原菌(Curvularia spp.、Alternaria spp.)、黄化萎縮病菌(Sclerophthora macrospora)、白葉枯病菌(Xanthomonas oryzae pv. oryzae)、褐条病菌(Acidovorax avenae subsp. avenae)、内頴褐変病菌(Erwinia ananas)、苗立枯細菌病菌(Burkholderia plantarii)、もみ枯細菌病菌(Burkholderia glumae)、葉鞘褐変病菌(Pseudomonas fuscovaginae)、かさ枯病菌(Pseudomonas syringae pv.oryzae)、株腐病菌(Erwinia chrysanthemi)、黄萎病菌(Phytoplasma oryzae)、縞葉枯病菌(Rice stripe tenuivirus)、萎縮病菌(Rice dwarf reovirus);
ムギ類のうどんこ病菌(Blumeria graminis f.sp.hordei; f.sp.tritici)、さび病菌(Puccinia striiformis、 Puccinia graminis、Puccinia recondita、Puccinia hordei)、斑葉病菌(Pyrenophora graminea)、網斑病菌(Pyrenophora teres)、赤かび病菌(Gibberella zeae、Fusarium culmorum、Fusarium avenaceum、Monographella nivalis)、雪腐病菌(Typhula incarnata、Typhula ishikariensis、Monographella nivalis)、裸黒穂病菌(Ustilago nuda)、なまぐさ黒穂病菌(Tilletia caries、Tilletia controversa)、眼紋病菌(Pseudocercosporella herpotrichoides)、株腐病菌(Ceratobasidium gramineum)、雲形病菌(Rhynchosporium secalis)、葉枯病菌(Septoria tritici)、ふ枯病菌(Phaeosphaeria nodorum)、苗立枯病菌(Fusarium spp.、Pythium spp.、Rhizoctonia spp.、Septoria spp.、Pyrenophora spp.)、立枯病菌(Gaeumannomyces graminis)、炭疽病菌(Colletotrichum graminicola)、麦角病菌(Claviceps purpurea)、斑点病菌(Cochliobolus sativus)、黒節病菌(Pseudomonas syringae pv. syringae);
トウモロコシの赤かび病菌(Gibberella zeae等)、苗立枯病菌(Fusarium avenaceum、 Penicillium spp、 Pythium spp.、Rhizoctonia spp.)、さび病菌(Puccinia sorghi)、ごま葉枯病菌(Cochliobolus heterostrophus)、黒穂病菌(Ustilago maydis)、炭疽病菌(Colletotrichum graminicola)、北方斑点病菌(Cochliobolus carbonum)、褐条病菌(Acidovorax avenae subsp. avenae)、条斑細菌病菌(Burkholderia andropogonis)、倒伏細菌病菌(Erwinia chrysanthemi pv. zeae)、萎ちょう細菌病菌(Erwinia stewartii);
ブドウのべと病菌(Plasmopara viticola)、さび病菌(Physopella ampelopsidis)、うどんこ病菌(Uncinula necator)、黒とう病菌(Elsinoe ampelina)、晩腐病菌(Glomerella cingulata、 Colletotrichum acutatum)、黒腐病菌(Guignardia bidwellii)、つる割病菌(Phomopsis viticola)、すす点病菌(Zygophiala jamaicensis)、灰色かび病菌(Botrytis cinerea)、芽枯病菌(Diaporthe medusaea)、紫紋羽病菌(Helicobasidium mompa)、白紋羽病菌(Rosellinia necatrix)、根頭がんしゅ病菌(Agrobacterium vitis);
リンゴのうどんこ病菌(Podosphaera leucotricha)、黒星病菌(Venturia inaequalis)、斑点落葉病菌(Alternaria mali)、赤星病菌(Gymnosporangium yamadae)、モニリア病菌(Monilinia mali)、腐らん病菌(Valsa ceratosperma)、輪紋病菌(Botryosphaeria berengeriana)、炭疽病菌(Colletotrichum acutatum、Glomerella cingulata)、すす点病菌(Zygophiala jamaicensis)、すす斑病菌(Gloeodes pomigena)、黒点病菌(Mycosphaerella pomi)、紫紋羽病菌(Helicobasidium mompa)、白紋羽病菌(Rosellinia necatrix)、胴枯病菌(Phomopsis mali、Diaporthe tanakae)、褐斑病菌(Diplocarpon mali)、リンゴの火傷病菌(Erwinia amylovora)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、毛根病菌(Agrobacterium rhizogenes);
ナシの黒斑病菌(Alternaria kikuchiana)、黒星病菌(Venturia nashicola)、赤星病菌(Gymnosporangium asiaticum)、輪紋病菌(Botryosphaeria berengeriana f.sp. piricola)、胴枯病菌(Phomopsis fukushii)、枝枯細菌病菌(Erwinia sp.)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、さび色胴枯病菌(Erwinia chrysanthemi pv. chrysanthemi)、花腐細菌病菌(Pseudomonas syringae pv. syringae);
セイヨウナシの疫病菌(Phytophthora cactorum、 Phytophthora syringae)、枝枯細菌病菌(Erwinia sp.);
モモの黒星病菌(Cladosporium carpophilum)、ホモプシス腐敗病菌(Phomopsis sp.)、疫病菌(Phytophthora sp.)、炭疽病菌(Colletotrichum gloeosporioides)、縮葉病菌(Taphrina deformans)、穿孔細菌病菌(Xhanthomonas campestris pv. pruni)、根頭がんしゅ病菌(Agrobacterium tumefaciens);
オウトウの炭疽病菌(Glomerella cingulata)、幼果菌核病菌(Monilinia kusanoi)、灰星病菌(Monilinia fructicola)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、樹脂細菌病菌(Pseudomonas syringae pv. syringae);
カキの炭疽病菌(Glomerella cingulata)、落葉病菌(Cercospora kaki; Mycosphaerella nawae)、うどんこ病菌(Phyllactinia kakikora)、根頭がんしゅ病菌(Agrobacterium tumefaciens);
カンキツの黒点病菌(Diaporthe citri)、緑かび病菌(Penicillium digitatum)、青かび病菌(Penicillium italicum)、そうか病菌(Elsinoe fawcettii)、褐色腐敗病菌(Phytophthora citrophthora)、かいよう病菌(Xhanthomonas campestris pv. citri)、褐斑細菌病菌(Pseudomonas syringae pv. syringae)、グリーニング病菌(Liberibactor asiaticus)、根頭がんしゅ病菌(Agrobacterium tumefaciens);
トマト、キュウリ、豆類、イチゴ、ジャガイモ、キャベツ、ナス、レタス等の灰色かび病菌(Botrytis cinerea);
トマト、キュウリ、豆類、イチゴ、ジャガイモ、ナタネ、キャベツ、ナス、レタス等の菌核病菌(Sclerotinia sclerotiorum);
トマト、キュウリ、豆類、ダイコン、スイカ、ナス、ナタネ、ピーマン、ホウレンソウ、テンサイ等各種野菜の苗立枯病菌(Rhizoctonia spp.、Pythium spp.、Fusarium spp.、Phythophthora spp.、Sclerotinia sclerotiorum等);
ナス科植物の青枯病菌(Ralstonia solanacearum);
ウリ類のべと病菌(Pseudoperonospora cubensis)、うどんこ病菌(Sphaerotheca fuliginea)、炭疽病菌(Colletotrichum orbiculare)、つる枯病菌(Didymella bryoniae)、つる割病菌(Fusarium oxysporum)、疫病菌(Phytophthora parasitica、Phytophthora melonis、Phytophthora nicotianae、Phytophthora drechsleri、Phytophthora capsici等)、褐斑細菌病菌(Xhanthomonas campestris pv.cucurbitae)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑点細菌病菌(Pseudomonas syringae pv. lachrymans)、縁枯細菌病菌(Pseudomonas marginalis pv. marginalis)、がんしゅ病菌(Streptomyces sp.)、毛根病菌(Agrobacterium rhizogenes)、キュウリモザイクウィルス(Cucumber mosaic virus);
トマトの輪紋病菌(Alternaria solani)、葉かび病菌(Fulvia fulva)、疫病菌(Phytophthora infestans)、萎凋病菌(Fusarium oxysporum)、根腐病菌(Pythium myriotylum、Pythium dissotocum)、炭疽病菌(Colletotrichum gloeosporioides)、かいよう病菌(Clavibacter michiganensis)、茎えそ細菌病菌(Pseudomonas corrugata)、黒斑細菌病菌(Pseudomonas viridiflava)、軟腐病菌(Erwinia carotovora subsp. carotovora)、葉こぶ病菌(Crynebacterium sp.)、萎黄病菌(Phytoplasma asteris)、黄化萎縮病菌(Tabaco leaf curl subgroup III geminivirus);
ナスのうどんこ病菌(Sphaerotheca fuliginea等)、すすかび病菌(Mycovellosiella nattrassii)、疫病菌(Phytophthora infestans)、褐色腐敗病菌(Phytophthora capsici)、褐斑細菌病菌(Pseudomonas cichorii)、茎えそ細菌病菌(Pseudomonas corrugata)、茎腐細菌病菌(Erwinia chrysanthemi)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑点細菌病菌(Pseudomonas sp.);
ナタネの黒斑病菌(Alternaria brassicae)、黒腐病菌(Xhanthomonas campestris pv.  campestris)、黒斑細菌病菌(Pseudomonas syringae pv. maculicola)、軟腐病菌(Erwinia carotovora);
アブラナ科野菜の黒斑病菌(Alternaria brassicae等)、白斑病菌(Cercosporella brassicae)、根朽病菌(Phoma lingam)、根こぶ病菌(Plasmodiophora brassicae)、べと病菌(Peronospora parasitica)、黒腐病菌(Xhanthomonas campestris pv.  campestris)、黒斑細菌病菌(Pseudomonas syringae pv. maculicola)、軟腐病菌(Erwinia carotovora subsp. carotovora);
キャベツの株腐病菌(Thanatephorus cucumeris)、萎黄病菌(Fusarium oxysporum)、黒すす病菌(Alternaria brassisicola);
ハクサイの尻腐病菌(Rhizoctonia solani)、黄化病菌(Verticillium dahliae);
ネギのさび病菌(Puccinia allii)、黒斑病菌(Alternaria porri)、白絹病菌(Sclerotium rolfsii)、白色疫病菌(Phytophthora porri)、黒腐菌核病菌(Sclerotium cepivorum);
タマネギのかいよう病菌(Curtobacterium flaccumfaciens)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑点細菌病菌(Pseudomonas syringae pv. syringae)、腐敗病菌(Erwinia rhapontici)、鱗片腐敗病菌(Burkholderia gladioli)、萎黄病菌(Phytoplasma asteris);
ニンニクの軟腐病菌(Erwinia carotovora subsp. carotovora)、春腐病菌(Pseudomonas marginalis pv.marginalis);
ダイズの紫斑病菌(Cercospora kikuchii)、黒とう病菌(Elsinoe glycines)、黒点病菌(Diaporthe phaseolorum)、リゾクトニア根腐病菌(Rhizoctonia solani)、茎疫病菌(Phytophthora sojae)、べと病菌(Peronospora manshurica)、さび病菌(Phakopsora pachyrhizi)、炭疽病菌(Colletotrichum truncatum等)、葉焼病菌(Xhanthomonas campestris pv.  glycines)、斑点細菌病菌(Pseudomonas syringae pv. glycinea);
インゲンの炭疽病菌(Colletotrichum lindemuthianum)、青枯病菌(Ralstonia solanacearum)、かさ枯病菌(Pseudomonas syringae pv. phaseolicola)、褐斑細菌病菌(Pseudomonas viridiflava)、葉焼病菌(Xhanthomonas campestris pv. phaseoli);
ラッカセイの黒渋病菌(Mycosphaerella berkeleyi)、褐斑病菌(Mycosphaerella arachidis)、青枯病菌(Ralstonia solanacearum);
エンドウのうどんこ病菌(Erysiphe pisi)、べと病菌(Peronospora pisi)、つる枯細菌病菌(Pseudomonas syringae pv.pisi)、つる腐細菌病菌(Xhanthomonas campestris pv. pisi;
ソラマメのべと病菌(Peronospora viciae)、疫病菌(Phytophthora nicotianae);
ジャガイモの夏疫病菌(Alternaria solani)、黒あざ病菌(Thanatephorus cucumeris)、疫病菌(Phytophthora infestans)、銀か病菌(Helminthosporium solani)、乾腐病菌(Fusarium oxysporum、Fusarium solani)、粉状そうか病菌(Spongospora subterranea)、青枯病菌(Ralstonia solanacearum)、黒あし病菌(Erwinia carotovora subsp. atroseptica)、そうか病菌(Streptomyces scabies、Streptomyces acidiscabies)、軟腐病菌(Erwinia carotovora subsp. carotovora)、粘性腐敗病菌(Crostridium spp.)、輪腐病菌(Clavibacter michiganensis subsp.sepedonicus);
サツマイモの立枯病菌(Streptomyces ipomoeae);
テンサイの褐斑病菌(Cercospora beticola)、べと病菌(Peronospora schachtii)、黒根病菌(Aphanomyces cochioides)、蛇の目病菌(Phoma betae)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、そうか病菌(Streptomyces scabies)、斑点細菌病菌(Pseudomonas syringae pv. aptata);
ニンジンの黒葉枯病菌(Alternaria dauci)、こぶ病菌(Rhizobacter dauci)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、ストレプトミセスそうか病菌(Streptomyces spp.)、軟腐病菌(Erwinia carotovora subsp. carotovora);
イチゴのうどんこ病菌(Sphaerotheca aphanis var. aphanis)、疫病菌(Phytophthora nicotianae等)、炭疽病菌(Glomerella cingulata等)、果実腐敗病菌(Pythium ultimum)、青枯病菌(Ralstonia solanacearum)、角斑細菌病菌(Xhanthomonas campestris)、芽枯細菌病菌(Pseudomonas marginalis  pv. marginalis);
チャの網もち病菌(Exobasidium reticulatum)、白星病菌(Elsinoe leucospila)、炭疽病菌(Colletotrichum theae-sinensis)、輪斑病菌(Pestalotiopsis longiseta)、赤焼病菌(Pseudomonas syringae pv.theae)、かいよう病菌(Xhanthomonas campestris pv. theicola)、てんぐ巣病菌(Pseudomonas sp.);
タバコの赤星病菌(Alternaria alternata)、うどんこ病菌(Erysiphe cichoracearum)、炭疽病菌(Colletotrichum gloeosporioides)、疫病菌(Phytophthora nicotianae)、野火病菌(Pseudomonas syringae pv.tabaci)、黄がさ細菌病菌(Pseudomonas syringae pv.mellea)、空洞病菌(Erwinia carotovora subsp. carotovora)、立枯病菌(Ralstonia solanacearum)、タバコモザイクウィルス(Tobaco mosaic virus);
コーヒーのさび病菌(Hemileia vastatrix);
バナナの黒シガトガ病菌(Mycosphaerella fijiensis)、パナマ病菌(Fusarium oxysporum f.sp cubense);
ワタの立枯病菌(Fusarium oxysporum)、白かび病菌(Ramularia areola);
ヒマワリの菌核病菌(Sclerotinia sclerotiorum)、角点病菌(Xhanthomonas campestris pv.malvacearum)、空洞病菌Erwinia carotovora subsp. carotovora)、斑点細菌病菌(Pseudomonas syringae pv.helianthi);
バラの黒星病菌(Diplocarpon rosae)、うどんこ病菌(Sphaerotheca pannosa等)、疫病菌(Phytophthora megasperma)、べと病菌(Peronospora sparsa)、根頭がんしゅ病菌(Agrobacterium tumefaciens);
キクの褐斑病菌(Septoria obesa)、白さび病菌(Puccinia horiana)、疫病菌(Phytophthora cactorum)、斑点細菌病菌(Pseudomonas cichorii)、軟腐病菌(Erwinia carotovora subsp. carotovora)、根頭がんしゅ病菌(Agrobacterium tumefaciens)、毛根病菌(Agrobacterium rhizogenes)、緑化病菌(Phytoplasma aurantifolia);
芝のブラウンパッチ病菌(Rhizoctonia solani)、ダラースポット病菌(Sclerotinia homoeocarpa)、カーブラリア葉枯病菌(Curvularia sp.)、さび病菌 (Puccinia zoysiae)、ヘルミントスポリウム葉枯病菌(Cochliobolus sp.)、雲形病菌(Rhynchosporium secalis)、立枯病菌(Gaeumannomyces graminis)、炭疽病菌(Colletotrichum sp.)、雪腐褐色小粒菌核病菌(Typhula incarnata)、雪腐黒色小粒菌核病菌(Typhula ishikariensis)、雪腐大粒菌核病菌(Myriosclerotinia borealis)、フェアリーリング病菌(Marasmius oreades等)、ピシウム病菌(Pythium aphanidermatum等)、いもち病菌(Pyricularia grisea)等が挙げられる。
Examples of pathogens include rice blast fungus (Magnaporthe grisea), blight fungus (Thanatephorus cucumeris), brown sclerotia fungus (Ceratobasidium setariae), brown bacterium Bacterial rot fungus (Waitea citrus fungus), cucumeris, sclerotium hydrophilum, red sclerotia (Wairea circinata), staphylococcal fungus (Entyloma dactylidis), bacilli (Magneportorcium cerevisiae) Disease-causing bacteria (Cochliobolus Miyabeanus), Leaf blight fungus (Sphaerulina oryzina), Leaf seedling fungus (Gibberella fujikuroi), Seedling fungus (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp. spp., Achlya spp., Dictychus spp., Claviceps virens, Tilletia barclayana, Curvularia spp., Alternaria spro., Alteria spm. Xanthomonas oryzae pov. ), Pseudomonas syringae pv. Oryzae, strains of rot (Erwinia chrysanthemi), phytoplasma oryzae (Rice strivine disease)
Wheat powdery mildew (Blumeria graminis f. Sp. Hordei; f. Sp. Tritici), rust fungus (Puccinia graminis, Pucciria recondita, Puccinia recondita, Puccinaor fungus) Pyrenophora teres), Fusarium mold fungus (Gibberella zeae), Fusarium culmorum, Fusarium avenaceum, Monographella phnephalis fungus (Typhila incarnathia) Stilago nuda), Tuna scab (Tilletia caries), Tilletia controversa (Pseudocercosporella phytotrophic) Phaeosphaeria nodorum), Fusarium spp., Pythium spp., Rhizoctonia spp., Septoria spp., Pyrenophorra spp. . Um graminicola), ergot fungus (Claviceps purpurea), spot fungus (Cochliobolus sativus), black clause fungus (Pseudomonas syringae pv syringae);
Corn fungus (Gibberella zeae, etc.), Seedling fungus (Fusarium avenaceum, Penicillium spp, Phythium spp.), Rhizoctonia sph. Ustilago maydis, Anthracnose fungus (Colletotrichum graminicola), Northern spotted fungus (Cochliobolus caribonum), Brown rot fungus (Acidovorax avenae suburb), Staphylococcus aureus . Mi pv zeae), wilt bacterium fungus (Erwinia stewartii);
Grape downy mildew (Plasmopara viticola), rust fungus (Physopella ampelopsidis), powdery mildew (Uncinula necator), black mold fungus (Elsinoe ampelina), late rot fungus (Glomerulumuleum, mullet) ), Vine split fungus (Phoropsis viticola), soot spot fungus (Zygophiala jamaicensis), gray mold fungus (Bottrytis cinerea), diatomote moss aid, trix), crown gall tumefaciens (Agrobacterium vitis);
Apple powdery mildew (Podosphaera leukotricha), black rot (Venturia inaequalis), spot leaf rot (Alternaria mali), red rot (Gymnosporangium yamadae), Moni disease Botryosphaeria berengeriana, Colletotrichum acutatum, Glomerella singulata, Zyophiala jamaicensis, Black spotted fungus (Gloeodesporum) obasidium mompa), white leaf blight fungus (Rosellinia necatrix), blight fungus (Phomopsis mali, Diaporthane tanakae), brown spot fungus (Diplocarpon mali), burnt fungus of Aro indigo ), Agrobacterium rhizogenes;
Pear black spot fungus (Alternaria kikuchiana), black spot fungus (Venturia nashichicola), red sting fungus (Gymnosporangium asiaticum), rot fungus fungi (Bortyosphaeria p. Erwinia sp.), Agrobacterium tumefaciens, Rust radish blight fungus (Erwinia chrysanthemi pv. Chrysanthemispiring), Pseudomonasy symptom
Pesticides of pear (Phytophthoraca bacterium, Phytophthora syringae), bacterial wilt (Erwinia sp.);
Peach black rot fungus (Cladosporium carpophilum), homoposis spoilage fungus (Phomopsis sp.), Plague fungus (Phytophthora sp. ), Agrobacterium tumefaciens;
Sugar beetle fungus (Glomerella cingulata), larvae fungus (Monilinia kusanoi), Aspergillus fungus (ingi) aingacterial syrup (Agrobacterium tumefaciens);
Oyster anthracnose fungus (Glomerella singulata), deciduous fungus (Cercospora kaki; Mycosphaerella nawae), powdery mildew (Phyllactinia kakikora), root cancer fungus (Agrobacteria)
Citrus black spot fungus (Diaporthe citrus), green mold fungus (Penicillium digitatum), green mold fungus (Penicillium italicum), scab fungus (Elsinophatophanthocorii) Pseudomonas syringae pv. Syringae, Liberactor asiaticus, Agrobacterium tumefaciens;
Botrytis cinerea, such as tomato, cucumber, beans, strawberry, potato, cabbage, eggplant, lettuce;
Sclerotinia sclerotiorum such as tomato, cucumber, beans, strawberry, potato, rapeseed, cabbage, eggplant, lettuce, etc .;
Tomato, cucumber, beans, radish, watermelon, eggplant, rapeseed, green pepper, spinach, sugar beet, etc. Seedling blight fungi (Rhizoctonia spp., Phythium spp., Phytophthora spp., Phytophthora spp., Sclerotrin, etc.)
Ralstonia solanacerum, a solanaceous plant;
Downy mildew of cucurbits (Pseudoperonospora cubensis), powdery mildew (Sphaerotheca fuliginea), anthracnose fungus (Colletotrichum orbiculare), vine blight (Didymella bryoniae), Fusarium fungus (Fusarium oxysporum), Phytophthora (Phytophthora parasitica, Phytophthora melonis , Phytophthora nicotianae, Phytophthora drechsleri, Phytophthora capsici, etc.), Xanthomonas campestris pv. Cucurbitae, soft rot fungus (Erwino aerwin) ubsp. carotovora), spot bacterial bacterium (Pseudomonas syringae pv. mosaic virus);
Tomato ring-rot fungus (Alternaria solani), leaf mold fungus (Fulvia fulva), Phytophthora dystospirum (Phythium oxysporum), root rot fungus (Phythium oytospirocrum) Clavacter michiganensis, stem rot fungus (Pseudomonas corrugata), black spot bacterium (Pseudomonas viridiflavova), soft rot fungus (Erwinia carotovabola rotovabola bacterium) sp.), Phytoplasma asteris, Tabaco leaf curl subgroup III geminivirus;
Eggplant powdery mildew (Sphaerotheca fuliginea, etc.), Aspergillus fungus (Phytophthora infestans), Brown rot fungus (Phytophthora infestans) corrugata), stem rot fungus (Erwinia chrysanthemi), soft rot fungus (Erwinia carotovora subsp. carotovora), spot bacterial fungus (Pseudomonas sp.);
Rapeseed fungus (Alternaria brassicae), black rot fungus (Xhanthomonas campestris pv. Campestris), black spot bacteriomycosis (Pseudomonas syringae pv.
Brassicaceae black spot fungus (Alternaria brassicae, etc.), white spot fungus (Cercosporella brassicae), root rot fungus (Phoma lingam), root-knot fungus (Plasmodiophora brassicae), black mold fungus (Panthophora brassicae), mildew fungus (Panthophora brassicae) pv. campestris), black spot bacteria (Pseudomonas syringae pv. maculacola), soft rot fungus (Erwinia carotovora subsp. carotovora);
Strains of cabbage (Thanatephorus cucumeris), Fusarium oxysporum, Alternaria brassicicola;
Rhizoctonia solani, Verticillium dahliae;
Leek fungus (Puccinia allii), black spot fungus (Alternaria porri), white silk fungus (Sclerotium rolfsiii), white rot fungus (Phytophthora porri), black rot fungus (Sclerotium cepi);
Canker of onion (Curtobacterium flaccumfaciens), soft rot (Erwinia carotovora subsp. Carotovora), spot bacterial pathogen (Pseudomonas syringae pv. Syringae), Rot (Erwinia rhapontici), a scale-Rot (Burkholderia gladioli), yellows fungus (Phytoplasma asteris );
Soft rot of garlic (Erwinia carotovora subsp. Carotovora), spring rot (Pseudomonas marginalis pv. Marginalis);
Soybean purpura fungus (Cercospora kikuchii), black rot fungus (Elsinoe glycines), black spot fungus (Diaporthe phasororum), rhizobonia hormonal fungus (Rhizotonia soloni), Phygopsora pachyrhizi, Anthracnose fungus (Colletotrichum truncatum, etc.), leaf-burning fungus (Xhanthomonas campestris pv. Glycines);
Kidney anthracnose fungus (Colletotrichum lindemuthianum), bacterial wilt fungus (Ralstonia solanacearum), bacterial wilt fungus (Pseudomonas syringae pv.
Groundnut black fungus (Mycosphaerella berkeleyi), brown spot fungus (Mycosphaerella arachidis), bacterial wilt (Ralstonia solanaceram);
Pea powdery mildew fungus (Erysiphe pisi), downy mildew fungus (Peronospora pisi), vine blight fungus (Pseudomonas syringae pv. Pisi), vine rot fungus (Xhanthomonas campestris pestis.
Broad bean fungus (Peronospora viciae), Phytophthora nicotianae;
Potato summer blight fungus (Alternaria solani), black rot fungus (Thanatephorus cucumeris), blight fungus (Phytophthora infestans), silver rot fungus (Helminosporum solani), dry rot fungus (Fusarium sorghum) Spongospora subterranea, bacterial wilt (Ralstonia solanacearum), black rot (Erwinia carotovora subsp. Atroseptica), rot fungus (Streptomyces scabipes, rot fungi .. A subsp carotovora), viscous Rot (Crostridium spp), Wakusa Fungus (Clavibacter michiganensis subsp.sepedonicus);
Streptomyces ipomoeae;
Sugar beet blight fungus (Cercospora beticola), downy mildew fungus (Peronospora schachtii), black root fungus (Aphanomyces cochioides), snake eye blight fungus (Phomabecto sect) (Agrobacter fungus) , Pseudomonas syringae pv. Aptata;
Carrots of black leaf blight fungus (Alternaria dauci), koji fungus (Rhizobacter dauci), root cancer fungus (Agrobacterium tumefaciens), Streptomyces stomatos v.
Strawberry powdery mildew (Sphaerotheca aphanis var. Aphanis), plague (Phytophthora nicotiana, etc.), anthracnose fungus (Glomerella singulata), green rot fungus (Pytium ultimum), bacterial rot Xhanthomonas campestris), Pseudomonas marginalis pv. Marginalis;
Chamodium fungus (Exobasidium reticulatum), white rot (Elsinoe leucospila), anthracnose fungus (Esinoe leucospila), Xanthodesia seutheon, psoriasis disease (Pestlotiopsis ronseseta) pev.theicola), Tenge-choso fungus (Pseudomonas sp.);
Akahoshi Fungus tobacco (Alternaria alternata), powdery mildew (Erysiphe cichoracearum), anthracnose fungus (Colletotrichum gloeosporioides), Phytophthora (Phytophthora nicotianae), wildfire pathogen (Pseudomonas syringae pv.tabaci), Huang bacterially fungus (Pseudomonas syringae pv Mellea), Erwinia carotovora subsp. Carotovora, Ralstonia solanacearum, tobacco mosaic virus (Tobaco mosaic virus);
Coffee rust (Hemileia vastatrix);
Banana black sigatoga disease (Mycosphaerella fijiensis), Panama disease (Fusarium oxysporum f.
Cotton Fusarium oxysporum, Milulaia areola;
Sunflower sclerotia (Sclerotinia sclerotiorum), Xanthomonas campestris pv. Malvacearum, cavernous fungus Erwinia carotovora subsp. carotovora), Pseudomonas syringae pv. helianthi;
Rose black spot fungus (Diplocarpon rosae), powdery mildew fungus (Sphaerotheca pannosa etc.), blight fungus (Phytophthora megaspersa), downy mildew (Peronospora sparsa), tumella tum terum acter
Chrysanthemum brown spot fungus (Septoria obesa), white rust fungus (Puccinia horiana), plague fungus (Phytophthora rot fungus), soft rot fungus (Pseudomonas rot fungus) Agrobacterium tumefaciens, Agrobacterium rhizogenes, Phytoplasma aurantifolia;
Turf brown patch disease fungus (Rhizoctonia solani), Dollar spot disease fungus (Sclerotinia homoeocarpa), Carbaria leaf blight fungus (Curvularia sp.), Rust fungus (Puccinia zoysiae), Helicobacter boli fungus bacilli (Rhynchosporium secalis), Bacterial fungus (Gaemannomyces graminis), Anthrax fungus (Colletotrichum sp.), Snow rot, brown bacterium, Typhalis inc. Myriosclerotinia borealis, Fairy Ri Grayed Fungus (Marasmius Oreades etc.), (such as Pythium aphanidermatum) Pythium fungus, Pyricularia oryzae (Pyricularia grisea), and the like.
 また、害虫としては、例えば、チャノコカクモンハマキ(Adoxophyes honmai)、リンゴコカクモンハマキ(Adoxophyes orana faciata)、リンゴモンハマキ(Archips breviplicanus)、リンゴコシンクイガ(Grapholita inopinata)、ミダレカクモンハマキ(Archips fuscocupreanus)、ナシヒメシンクイ(Grapholita molesta)、チャハマキ(Choristoneura magnanima)、マメシンクイガ(Leguminivora glycinivorella)、クワヒメハマキ(Olethreutes mori)、リンゴハマキホソガ(Caloptilia zachrysa)、リンゴヒメシンクイ(Argyresthia conjugella)、ナシホソガ(Spulerrina astaurota)、マメヒメサヤムシガ(Matsumuraeses phaseoli)、トビハマキ(Pandemis heparana)、ナシチビガ(Bucculatrix pyrivorella)、モモハモグリガ(Lyonetia clerkella)、モモシンクイガ(Carposina niponensis)、ギンモンハモグリガ(Lyonetia prunifoliella malinella)、チャノホソガ(Caloptilia theivora)、キンモンホソガ(Phyllonorycter ringoniella)、ミカンハモグリガ(Phyllocnistis citrella)、ネギコガ(Acrolepiopsis sapporensis)、ヤマノイモコガ(Acrolepiopsis suzukiella)、コナガ(Plutella xylostella)、カキノヘタムシガ(Stathmopoda masinissa)、イモキバガ(Helcystogramma triannulella)、ワタアカミムシ(Pectinophora gossypiella)、モモシンクイガ(Carposina sasakii)、ニカメイガ(Chilo suppressalis)、コブノメイガ(Cnaphalocrocis medinalis)、チャマダラメイガ(Ephestia elutella)、モモノゴマダラノメイガ(Conogethes punctiferalis)、ワタヘリクロノメイガ(Diaphania indica)、シロイチモジマダラメイガ(Etiella zinckenella)、クワノメイガ(Glyphodes pyloalis)、イッテンオオメイガ(Scirpophaga incertulas)、ハイマダラノメイガ(Hellula undalis)、アワノメイガ(Ostrinia furnacalis)、アズキノメイガ(Ostrinia scapulalis)、シバツトガ(Parapediasia teterrella)、イチモンジセセリ(Parnara guttata)、オオモンシロチョウ(Pieris brassicae)、モンシロチョウ(Pieris rapae crucivora)、アゲハチョウ(Papilio xuthus)、ヨモギエダシャク(Ascotis selenaria)、ソイビーンルーパー(Pseudoplusia includens)、チャドクガ(Euproctis pseudoconspersa)、マイマイガ(Lymantria dispar)、ヒメシロモンドクガ(Orgyia thyellina)、アメリカシロヒトリ(Hyphantria cunea)、クワゴマダラヒトリ(Lemyra imparilis)、アケビコノハ(Adris tyrannus)、ナカジロシタバ(Aedia leucomelas)、タマナヤガ(Agrotis ipsilon)、カブラヤガ(Agrotis segetum)、タマナギンウワバ(Autographa nigrisigna)、ミツモンキンウワバ(Ctenoplusia agnata)、コドリンガ(Cydla pomonella)、オオタバコガ(Helicoverpa armigera)、タバコガ(Helicoverpa assulta)、コットンボールワーム(Helicoverpa zea)、タバコバッドワーム(Heliothis virescens)、ヨーロピアンコーンボーラー(Ostrinia nubilalis)、ヨトウガ(Mamestra brassicae)、アワヨトウ(Mythimna separata)、イネヨトウ(Sesamia inferens)、フタオビコヤガ(Naranga aenescens)、サザンアーミーワーム(Spodoptera eridania)、シロイチモジヨトウ(Spodoptera exigua)、フォールアーミーワーム(Spodoptera frugiperda)、コットンリーフワーム(Spodoptera littoralis)、ハスモンヨトウ(Spodoptera litura)、スジキリヨトウ(Spodoptera depravata)、イラクサギンウワバ(Trichoplusia ni)、グレープベリーモス(Endopiza viteana)、トマトホーンワーム(Manduca quinquemaculata)、タバコホーンワーム(Manduca sexta)等のチョウ目昆虫、
フタテンヒメヨコバイ(Arboridia apicalis)、ミドリナガヨコバイ(Balclutha saltuella)、フタテンオオヨコバイ(Epiacanthus stramineus)、ポテトリーフホッパー(Empoasca fabae)、カキノヒメヨコバイ(Empoasca nipponica)、チャノミドリヒメヨコバイ(Empoasca onukii)、マメノミドリヒメヨコバイ(Empoasca sakaii)、ヒメフタテンヨコバイ(Macrosteles striifrons)、ツマグロヨコバイ(Nephotettix cinctinceps)、コットンフリーホッパー(Psuedatomoscelis seriatus)、ヒメトビウンカ(Laodelphax striatella)、トビイロウンカ(Nilaparvata lugens)、セジロウンカ(Sogatella furcifera)、ミカンキジラミ(Diaphorina citri)、ナシキジラミ(Psylla pyrisuga)、ミカントゲコナジラミ(Aleurocanthus spiniferus)、シルバーリーフコナジラミ(Bemisia argentifolii)、タバココナジラミ(Bemisia tabaci)、ミカンコナジラミ(Dialeurodes citri)、オンシツコナジラミ(Trialeurodes vaporariorum)、ブドウコナジラミ(Aleurolobus taonabae)、ブドウネアブラムシ(Viteus vitifolii)、ニセダイコンアブラムシ(Lipaphis erysimi)、ワタアブラムシ(Aphis gossypii)、ユキヤナギアブラムシ(Aphis spiraecola)、モモアカアブラムシ(Myzus persicae)、コミカンアブラムシ(Toxoptera aurantii)、オオワラジカイガラムシ(Drosicha corpulenta)、イセリアカイガラムシ(Icerya purchasi)、ナスコナカイガラムシ(Phenacoccus solani)、ミカンワタカイガラムシ(Pulvinaria aurantii)、ミカンコナカイガラムシ(Planococcus citri)、ミカンマルカイガラムシ(Pseudaonidia duplex)、フジコナカイガラムシ(Planococcus kuraunhiae)、クワコナカイガラムシ(Pseudococcus comstocki)、ナシマルカイガラムシ(Comstockaspis perniciosa)、ツノロウムシ(Ceroplastes ceriferus)、ルビーロウムシ(Ceroplastes rubens)、アカマルカイガラムシ(Aonidiella aurantii)、ティースケール(Fiorinia theae)、チャノマルカイガラムシ(Pseudaonidia paeoniae)、クワシロカイガラムシ(Pseudaulacaspis pentagona)、ウメシロカイガラムシ(Pseudaulacaspis prunicola)、マサキナガカイガラムシ(Unaspis euonymi)、ヤノネカイガラムシ(Unaspis yanonensis)、トコジラミ(Cimex lectularius)、ブチヒゲカメムシ(Dolycoris baccarum)、ナガメ(Eurydema rugosum)、トゲシラホシカメムシ(Eysarcoris aeneus)、オオトゲシラホシカメムシ(Eysarcoris lewisi)、シラホシカメムシ(Eysarcoris ventralis)、ツヤアオカメムシ(Glaucias subpunctatus)、クサギカメムシ(Halyomorpha halys)、アオクサカメムシ(Nezara antennata)、ミナミアオカメムシ(Nezara viridula)、イチモンジカメムシ(Piezodorus hybneri)、チャバネアオカメムシ(Plautia crossota)、イネクロカメムシ(Scotinophora lurida)、ホソハリカメムシ(Cletus punctiger)、クモヘリカメムシ(Leptocorisa chinensis)、ホソヘリカメムシ(Riptortus clavatus)、アカヒメヘリカメムシ(Rhopalus msculatus)、カンシャコバネナガカメムシ(Cavelerius saccharivorus)、コバネヒョウタンナガカメムシ(Togo hemipterus)、アカホシカメムシ(Dysdercus cingulatus)、ツツジグンバイ(Stephanitis pyrioides)、クロトビカスミカメ(Halticus insularis)、ターニッシュドプラントバグ(Lygus lineolaris)、ナガムギカスミカメ(Stenodema sibiricum)、アカスジカスミカメ(Stenotus rubrovittatus)、イネホソミドリカスミカメ(Trigonotylus caelestialium)等のカメムシ目昆虫、
ドウガネブイブイ(Anomala cuprea)、ヒメコガネ(Anomala rufocuprea)、コアオハナムグリ(Gametis jucunda)、ナガチャコガネ(Heptophylla picea)、マメコガネ(Popillia japonica)、コロラドポテトビートル(Lepinotarsa decemlineata)、メキシカンビートビートル(Epilachna varivestis)、マルクビクシコメツキ(Melanotus fortnumi)、カンシャクシコメツキ(Melanotus tamsuyensis)、タバコシバンムシ(Lasioderma serricorne)、ヒラタキクイムシ(Lyctusbrunneus)、マツノキクイムシ(Tomicus piniperda)、ナガシンクイムシ(Rhizopertha dominica)、ヒメヒラタケシキスイ(Epuraea domina)、インゲンテントウ(Epilachna varivestis)、ニジュウヤホシテントウ(Epilachna vigintioctopunctata)、チャイロコメノゴミムシダマシ(Tenebrio molitor)、コクヌストモドキ(Tribolium castaneum)、ゴマダラカミキリ(Anoplophora malasiaca)、マツノマダラカミキリ(Monochamus alternatus)、キボシカミキリ(Psacothea hilaris)、ブドウトラカミキリ(Xylotrechus pyrrhoderus)、アズキゾウムシ(Callosobruchus chinensis)、ウリハムシ(Aulacophora femoralis)、イネドロオイムシ(Oulema oryzae)、テンサイトビハムシ(Chaetocnema concinna)、サザンコーンルートワーム(Diabrotica undecimpunctata)、ウエスタンコーンルートワーム(Diabrotica virgifera)、ノーザンコーンルートワーム(Diabrotica barberi)、キスジノミハムシ(Phyllotreta striolata)、ナスナガスネトビハムシ(Psylliodes angusticollis)、モモチョッキリゾウムシ(Rhynchites heros)、アリモドキゾウムシ(Cylas formicarius)、ワタミゾウムシ(Anthonomus grandis)、イネゾウムシ(Echinocnemus squameus)、イモゾウムシ(Euscepes postfasciatus)、アルファルファタコゾウムシ(Hypera postica)、イネミズゾウムシ(Lissorhoptrus oryzophilus)、キンケクチブトゾウムシ(Otiorhynchus sulcatus)、グラナリーウィービル(Sitophilus granarius)、コクゾウムシ(Sitophilus zeamais)、シバオサゾウムシ(Sphenophorus venatus vestitus)、アオバアリガタハネカクシ(Paederus fuscipes)等のコウチュウ目昆虫、
ヒラズハナアザミウマ(Frankliniella intonsa)、キイロハナアザミウマ(Thrips flavus)、ミカンキイロアザミウマ(Frankliniella occidentalis)、クロトンアザミウマ(Heliothrips haemorrhoidalis)、チャノキイロアザミウマ(Scirtothrips dorsalis)、ミナミキイロアザミウマ(Thrips palmi)、ネギアザミウマ(Thrips tabaci)、カキクダアザミウマ(Ponticulothrips diospyrosi)等のアザミウマ目昆虫、
ダイズサヤタマバエ(Asphondylia yushimai)、ムギアカタマバエ(Sitodiplosis mosellana)、ウリミバエ(Bactrocera cucurbitae)、ミカンコミバエ(Bactrocera dorsalis)、チチュウカイミバエ(Ceratitis capitata)、イネヒメハモグリバエ(Hydrellia griseola)、オウトウショウジョウバエ(Drosophila suzukii)、イネハモグリバエ(Agromyza oryzae)、ナモグリバエ(Chromatomyia horticola)、ナスハモグリバエ(Liriomyza bryoniae)、ネギハモグリバエ(Liriomyza chinensis)、トマトハモグリバエ(Liriomyza sativae)、マメハモグリバエ(Liriomyza trifolii)、タネバエ(Delia platura)、タマネギバエ(Delia antique)、テンサイモグリハナバエ(Pegomya cunicularia)、アップルマゴット(Rhagoletis pomonella)、ヘシアンフライ(Mayetiola destructor)、イエバエ(Musca domestica)、ノイエバエ(Musca hervei)、クロイエバエ(Musca bezzii)、サシバエ(Stomoxys calcitrans)、ノサシバエ(Haematobia irritans)、ヒツジシラミバエ(Melophagus ovinus)、ウシバエ(Hypoderma bovis)、キスジウシバエ(Hypoderma lineatum)、ヒツジバエ(Oestrus ovis)、ツェツェバエ(Glossina palpalis, Glossina morsitans)、キアシオオブユ(Prosimulium yezoensis)、ツメトゲブユ(Simulium iwatens)、ウシアブ(Tabanus trigonus)、オオチョウバエ(Telmatoscopus albipunctatus)、トクナガヌカカ(Leptoconops nipponensis)、ウシヌカカ(Culicoides oxystoma)、シナハマダラカ(Anopheles hyracanus sinesis)、ガンビエハマダラカ(Anopheles gambiae)、アラビアハマダラカ(Anopheles arabiensis)、アノフェレスフェネスタス(Anopheles funestus)、アノフェレスメラス(Anopheles melas)、コガタハマダラカ(Anopheles minimus)、アノフェレスディラス(Anopheles dirus)、ステフェンスハマダラカ(Anopheles stephensi)、アノフェレスアルビマナス(Anopheles albimanus)、アカイエカ(Culex pipiens pallens)、チカイエカ(Culex pipiens molestus)、ネッタイイエカ(Culex quinquefasciatus)、キュレックスレスタンス(Culex restuans)、キュレックスタルサリス(Culex tarsalis)、キュレックスモデスタス(Culex modestus)、コガタイエカ(Culex tritaeniorhynchus)、ネッタイシマカ(Aedes aegypti)、ヒトスジシマカ(Aedes albopicutus)、ヤマトヤブカ(Aedes japonicus)、キンイロヤブカ(Aedes vexans)等のハエ目昆虫、
クリハバチ(Apethymus kuri)、カブラハバチ(Athalia rosae)、チュウレンジハバチ(Arge pagana)、マツノキハバチ(Neodiprion sertifer)、クリタマバチ(Dryocosmus kuriphilus)、グンタイアリ(Eciton burchelli, Eciton schmitti)、クロオオアリ(Camponotus japonicus)、オオスズメバチ(Vespa mandarina)、ブルドックアント(Myrmecia spp.)、ファイヤーアント類(Solenopsis spp.)、ファラオアント(Monomorium pharaonis)等のハチ目昆虫、
エンマコオロギ(Teleogryllus emma)、ケラ(Gryllotalpa orientalis)、トノサマバッタ(Locusta migratoria)、コバネイナゴ(Oxya yezoensis)、サバクワタリバッタ(Schistocerca gregaria)等のバッタ目昆虫、
トゲナシシロトビムシ(Onychiurus folsomi)、シベリアシロトビムシ(Onychiurus sibiricus)、キボシマルトビムシ(Bourletiella hortensis)等のトビムシ目昆虫、
クロゴキブリ(Periplaneta fuliginosa)、ヤマトゴキブリ(Periplaneta japonica)、チャバネゴキブリ(Blattella germanica)、ワモンゴキブリ(Periplaneta Americana)等のゴキブリ目昆虫、
イエシロアリ(Coptotermes formosanus)、ヤマトシロアリ(Reticulitermes speratus)、タイワンシロアリ(Odontotermes formosanus)等のシロアリ目昆虫、
ネコノミ(Ctenocephalidae felis)、イヌノミ(Ctenocephalides canis)、ニワトリノミ(Echidnophaga gallinacea)、ヒトノミ(Pulex irritans)、ケオプスネズミノミ(Xenopsylla cheopis)等のノミ目昆虫、
ニワトリオオハジラミ(Menacanthus stramineus)、ウシハジラミ(Bovicola bovis)等のハジラミ目昆虫、
ウシジラミ(Haematopinus eurysternus)、ブタジラミ(Haematopinus suis)、ウシホソジラミ(Linognathus vituli)、ケブカウシジラミ(Solenopotes capillatus)、ヒツジジラミ(Damalinia ovis)等のシラミ目昆虫、
シクラメンホコリダニ(Phytonemus pallidus)、チャノホコリダニ(Polyphagotarsonemus latus)、スジブトホコリダニ(Tarsonemus bilobatus)等のホコリダニ類、
ハクサイダニ(Penthaleus erythrocephalus)、ムギダニ(Penthaleus major)等のハシリダニ類、
イネハダニ(Oligonychus shinkajii)、ミカンハダニ(Panonychus citri)、クワオオハダニ(Panonychus mori)、リンゴハダニ(Panonychus ulmi)、カンザワハダニ(Tetranychus kanzawai)、ナミハダニ(Tetranychus urticae)等のハダニ類、
チャノナガサビダニ(Acaphylla theavagrans)、チューリップサビダニ(Aceria tulipae)、トマトサビダニ(Aculops lycopersici)、ミカンサビダニ(Aculops pelekassi)、リンゴサビダニ(Aculus schlechtendali)、ニセナシサビダニ(Eriophyes chibaensis)、シトラスラストマイト(Phyllocoptruta oleivora)等のフシダニ類、
ロビンネダニ(Rhizoglyphus robini)、ケナガコナダニ(Tyrophagus putrescentiae)、ホウレンソウケナガコナダニ(Tyrophagus similis)等のコナダニ類、
ヤケヒョウヒダニ(Dermatophagoides pteronyssinus)、コナヒョウヒダニ(Dermatophagoides farinae)等のヒョウヒダニ類、
ミツバチヘギイタダニ(Varroa jacobsoni)等のハチダニ類、
オウシマダニ(Boophilus microplus)、クリイロコイタマダニ(Rhipicephalus sanguineus)、フタトゲチマダニ(Haemaphysalis longicornis)、キチマダニ(Haemaphysalis flava)、ツリガネチマダニ(Haemaphysalis campanulata)、ヤマトチマダニ(Haemaphysalis japonica)、オオトゲチマダニ(Haemaphysalis megaspinosa)、ヤマトマダニ(Ixodes ovatus)、シュルツェマダニ(Ixodes persulcatus)、タネガタマダニ(Ixodes nipponensis)、西部クロアシダニ(Ixodes pacifcus)、ヒツジダニ(Ixodes ricinus)、クロアシダニ(Ixodes scapularis)、ローン・スターマダニ(Amblyomma americanum)、メキシコ湾岸マダニ(Amblyomma maculatum)、オオマダニ(Amblyomma spp.)、アミメカクマダニ(Dermacentor recticulatus)、タイワンカクマダニ(Dermacentor taiwanesis)、ロッキー山脈森林マダニ(Dermacentor andersoni)、西海岸マダニ(Dermacentor occidentalis)、アメリカンドッグティック(Dermacentor variabilis)、アミメマダニ(Dermacentor spp.)等のマダニ類、
イヌツメダニ(Cheyletiella yasguri)、ネコツメダニ(Cheyletiella blakei)等のツメダニ類、
イヌニキビダニ(Demodex canis)、ネコニキビダニ(Demodex cati)等のニキビダニ類、
ヒツジキュウセンダニ(Psoroptes ovis)等のキュウセンダニ類、
センコウヒゼンダニ(Sarcoptes scabiei)、ネコショウセンコウヒゼンダニ(Notoedres cati)、ニワトリヒゼンダニ(Knemidocoptes spp.)等のヒゼンダニ類、
オカダンゴムシ(Armadillidium vulgare)等の甲殻類、
スクミリンゴガイ(Pomacea canaliculata)、アフリカマイマイ(Achatina fulica)、ナメクジ(Meghimatium bilineatum)、チャコウラナメクジ(Limax Valentiana)、ウスカワマイマイ(Acusta despecta sieboldiana)、ミスジマイマイ(Euhadra peliomphala)等の腹足類、
ミナミネグサレセンチュウ(Prathylenchus coffeae)、キタネグサレセンチュウ(Prathylenchus penetrans)、クルミネグサレセンチュウ(Prathylenchus vulnus)、ジャガイモシストセンチュウ(Globodera rostochiensis)、ダイズシストセンチュウ(Heterodera glycines)、キタネコブセンチュウ(Meloidogyne hapla)、サツマイモネコブセンチュウ(Meloidogyne incognita)、イネシンガレセンチュウ(Aphelenchoides besseyi)、マツノザイセンチュウ(Bursaphelenchus xylophilus)等の線虫類、
赤痢アメーバ等のアメーバ類(Rhizopoda)、リシュマニア、トリコモナス等の鞭毛虫類(Mastigophora)、マラリア原虫、トキソプラズマ等の胞子虫類(Sporozoea)、大腸バランチジウム等の繊毛虫類(Ciliophora)等の原虫類、
回虫、鉤虫等の線虫類(Nematoda)、大鉤頭虫等の鉤頭虫類(Acannthocephala)、ハリガネムシ等のハリガネムシ類(Nematomorpha)、肝吸虫等の吸虫類(Trematoda)、無鉤条虫等の条虫類(Cestoda)等の蠕虫類、
蛔虫(Ascaris)、犬蛔虫(Toxocara)、犬小蛔虫(Toxascaris)、馬蛔虫(Parascaris)、鶏蛔虫(Ascaridia)、鶏盲腸虫(Heterakis)、蟯虫(Oxyuris)、毛細線虫(Capillaria)、旋毛虫(Trichinella)、円虫(Strongylus、Triodontophorus)、毛線虫(Trichonema)、豚腎虫(Stephanurus)、腸結節虫(Desophagostomum)、大口腸線虫(Chabertia)、開嘴虫(Syngamus)、鉤虫(Ancylostoma、Uncinaria、Necator、Bunostomum)、毛様線虫(Trichostrongylus)、クーバー毛様線虫(Cooperia)、細類毛様線虫(Nematodirus)、捻転胃線虫(Haemonchus)、オクテルダーク胃虫(Ostertagia)、肺虫(Dictyocaulus、Metastrongylus)、犬糸条虫(Dirofilaria)、多乳頭糸条虫(Parafilaria)、馬糸条虫(Setaria)、オンコセルカ(Onchocerca)、胃虫(Habronema、Arduenna、Acuaria)等の線虫類、
裂頭条虫(Diphyllobothrium)、アノプロセハラ属(Anoplocephara)、モニイジア属(Moniezia)、犬条虫(Dipylidium)、無鉤条虫および有鉤条虫(Taenia)、嚢虫(Dithyridium)、レーリチナ属(Raillietina)、包虫(Echinococcus)等の条虫類、
住血吸虫(Schistosoma)、双口吸虫(Paramphistomum)、肝蛭(Fasciola)等の吸虫類等があげられる。
Examples of the pests include, but are not limited to, Adoxophyes honmai, Adoxophies orana faciata, Apples burapipicanus, and Argops reptile. fuscocuppreanus, papaver (Grapholita molesta), chacha maki (Christoneura magnanima), bean thrips (Leguminivora glycinivolores), mulberry papaver (Olethia maki) Nkui (Argyresthia conjugella), Nashihosoga (Spulerrina astaurota), beans Hime Saya insect moth (Matsumuraeses phaseoli), Tobihamaki (Pandemis heparana), Nashichibiga (Bucculatrix pyrivorella), Momohamoguriga (Lyonetia clerkella), peach fruit moth (Carposina niponensis), Gin Mont leafminer ( Lyonetia punifoliella malinella), Chalothosiga (Caloptilia theivora), Golden horned soga (Phyllonocycter lingonella), Citrus clover (Phylloclistis citrel) a), Negikoga (Acrolepiopsis sapporensis), yam Koga (Acrolepiopsis suzukiella), diamondback moth (Plutella xylostella), Kakinohetamushiga (Stathmopoda masinissa), Imokibaga (Helcystogramma triannulella), pink bollworm (Pectinophora gossypiella), peach fruit moth (Carposina sasakii), rice stem borer (Chilo suppressalis ), Cnaphalocrosis medinalis, Ephesia elutella, Conogethes puntifife ralis), cotton moth (Diaphania indica), white spotted moth (Etiella zinckenella), Glyphodes pylarois (Glyphodes pyloriis), Scirpophaga cylla Apricot moth (Ostrinia scapulalis), Shibata toga (Parapediasia teterrella), Dwarf grasshopper (Parnara guttata), Great white butterfly (Pieris brassicae), Pieris rapa ilio xuthus), mugwort Eda Shakti (Ascotis selenaria), soybean looper (Pseudoplusia includens), Arna Pseudoconspersa (Euproctis pseudoconspersa), gypsy moth (Lymantria dispar), orgyia thyellina (Orgyia thyellina), the United States white Arctiidae (Hyphantria cunea), mulberry tiger moth (Lemyra imparilis, Adritis tyrannus, Aedia leucomelas, Agrotis ipsilon, Agrotis segetum, Tamanaginuura Citnoplusia agnata, Cydla pomonella, Helicoverpa armigera, Helicoverpa assulta, Cotton ball worm (Helicoverbum) , Myostra (Mamestra brassicae), Ayayoto (Mythymna spartata), Sasamiya inferens, Nanaga aenescens, Southern army worm (Spodoidota dipoda) Tow (Spodoptera exigua), fall armyworm (Spodoptera frugiperda), cotton leaf worm (Spodoptera littoralis), common cutworm (Spodoptera litura), Sujikiriyotou (Spodoptera depravata), Trichoplusia ni (Trichoplusia ni), grape berry moth (Endopiza viteana), Lepidopterous insects such as tomato horn worms (Manduca quinquemaculata), tobacco horn worms (Manduca sexta),
Botten leafhopper (Arboridia apicalis), green leafhopper (Balcrutha saltuella), lipten leafhopper (Epicaanthus strakineus), potato leaf hopper (Empoasca pea) , Peanut leafhopper (Empoasca sakaii), leafhopper leafhopper (Macrosteles striifuns), leafhopper leafhopper (Nephottettis cinctinceps), cotton-free hopper (Psuedatomoscelis serimatoss) striatella), brown planthopper (Nilaparvata lugens), Sejirounka (Sogatella furcifera), Diaphorina citri (Diaphorina citri), Nashikijirami (Psylla pyrisuga), mandarin orange spiny whitefly (Aleurocanthus spiniferus), silverleaf whitefly (Bemisia argentifolii), tobacco whitefly (Bemisia tabaci), Citrus whitefly (Dialeurodes citri), Onite whitefly (Trialeurodes vaporiarum), Grape whiteflies (Aureurobus taonabae), Grape aphids (Viteus vitifoliai) Radish aphids (Lipaphis erysimi), cotton aphids (Aphis gossypii), Aphis auria siamese (Aphis spiraecola), peach aphids (Aphis dia sera) ), Pseudococcus solani, Pepperum aurantii, Prunococcus citri, Pseudaonidia duplexa Puplex nococcus kuraunhiae), mulberry mealybugs (Pseudococcus comstocki), no circle scale insects (Comstockaspis perniciosa), Tsunoroumushi (Ceroplastes ceriferus), Rubiroumushi (Ceroplastes rubens), Acamar scale insects (Aonidiella aurantii), tea scale (Fiorinia theae), living room Le scale insects ( Pseudaonidia paeoniae), Pseudouracapis pentagona, Pseudouracapsis prunicola, Unaspis eugalidae (Unaspis eu) nymi), mosquito leafworm (Unaspis yanonensis), bedbug (Cimex electrarius), spotted beetle (Dolicoris baccarum), sea turtle (Erydema rugosum), togeshirahoshime (Eysarcoris ventralis), Blue-headed stink bug (Glaucias subpunctus), Blue-headed stink bug (Halyomorpha halis), Blue-headed stink bug (Nezara antemata), Southern blue-headed bug (Nezara antemata) bneri), Chabane red beetle (Plautia crosssota), rice black beetle (Scotinophora lurida), white beetle (Cretus punsiger) lame beetle (Lepetocorisa pisti) ), Caveperius saccharivorus, Toba hemiterpus, Dysdercus singulatus, Stefanitisid piste ularis), Tha Danish de plant bug (Lygus lineolaris), Naga wheat Kasumi turtle (Stenodema sibiricum), red streaks Kasumi turtle (Stenotus rubrovittatus), rice caelestialium (Trigonotylus caelestialium) Hemiptera insects such as,
Cupreous chafer (Anomala cuprea), rufocuprea (Anomala rufocuprea), core Oh flower chafer (Gametis jucunda), Nagachakogane (Heptophylla picea), Japanese beetle (Popillia japonica), Colorado potato beetle (Lepinotarsa decemlineata), Mexican beat beetle (Epilachna varivestis), crew neck Melanotus fortnumi, Melanus tamsuyensis, Tobacco beetle (Lasioderma serricorne), Japanese horned beetle (Lyctusbrunneus), Matsunomushiku piniperda), Naga Shinkuimushi (Rhizopertha dominica), Hime Hirata Keshikisui (Epuraea domina), bean beetle (Epilachna varivestis), the beetle, Epilachna vigintioctopunctata (Epilachna vigintioctopunctata), Chai Loco Meno mealworm (Tenebrio molitor), red flour beetle (Tribolium castaneum), Japanese tiger beetle (Anoplophora malasiaca), Japanese pine moth beetle (Monochamus alternatus), Japanese pear beetle (Psacothea hilaris), Grape tiger beetle (Xylotrechus pyrrhod) Callibrochus chinensis, Auricophora femorialis, Oleema orizonae, Chaecocnemaconcina, Western corn root worm (Diabrotam) Diabrotica barberi, Phyllotreta striola, Nasunagetobisushi (Psyllodes angusticollis), Phyllchocerium weevil (Rhynchites heros), Arimodokisori formicarius), boll weevil (Anthonomus grandis), rice weevil (Echinocnemus squameus), Imozoumushi (Euscepes postfasciatus), alfalfa weevil (Hypera postica), rice water weevil (Lissorhoptrus oryzophilus), Kin Ke vine but-weevil (Otiorhynchus sulcatus), grana Lee weevil (Sitophilus granarius), weevil (Sitophilus zeamais), hornet beetle (Sphenophorus venatas vestitus), green scallop (Paederus fuscipes), etc. Insects of the order
Hirazuhanaazamiuma (Frankliniella intonsa), Yellow Hana thrips (Thrips flavus), western flower thrips (Frankliniella occidentalis), Croton thrips (Heliothrips haemorrhoidalis), yellow tea thrips (Scirtothrips dorsalis), southern thrips (Thrips palmi), green onion thrips (Thrips tabaci ), Thripidae insects such as Phytothripps diospyrosi,
Soybean pod gall midge (Asphondylia yushimai), wheat red gall midge (Sitodiplosis mosellana), melon fly (Bactrocera cucurbitae), oriental fruit fly (Bactrocera dorsalis), the Mediterranean fruit fly (Ceratitis capitata), rice Hime leafminer (Hydrellia griseola), cherry fruit fly (Drosophila suzukii), rice Leafhopper (Agromyza oryzae), Leafworm (Chromatomyia horticola), Eggplant leaffly (Liriomyza bryoniae), Leafhopper fly (Liriomyza chinensis), Tomato leafworm D (Liriomyza sativae), legume leafminer (Liriomyza trifolii), seedcorn maggot (Delia platura), onion maggot (Delia antique), sugar beet diving Hana fly (Pegomya cunicularia), Apple Maggot (Rhagoletis pomonella), Heshianfurai (Mayetiola destructor), housefly ( Musca domestica, Musca hervei, Musca bezzii, Stomys calcitras, Haematobia ius, Gulls ma bovis), Kisujiushibae (Hypoderma lineatum), Hitsujibae (Oestrus ovis), tsetse flies (Glossina palpalis, Glossina morsitans), Kiashioobuyu (Prosimulium yezoensis), Tsumetogebuyu (Simulium iwatens), gadfly (Tabanus trigonus), giant flies (Telmatoscopus albipunctatus), Toka Nagaka (Leptoconops nipponensis), Ushinukaka (Culicoides oxystoma), Sinohada araka (Anopheles hyracanus sinesis), Gambier anopheles (Anopheles gambia) e), Anopheles arabiensis, Anopheles fenestas, Anopheles melas, Diphne es, Anopheles elus, Anopheles elus , Anopheles albimanus, Culex pipiens pallens, Culex pipiens molestus, Culex quinquefacre, cuex, culex Culex tarsalis, Culex modedestus, Culex teretaienorhynchus, Insects, eds, Aedes, Aedes, Aedes, Aedes
Kurihabachi (Apethymus kuri), Kaburahabachi (Athalia rosae), Chu range sawfly (Arge pagana), Matsunokihabachi (Neodiprion sertifer), Kuritamabachi (Dryocosmus kuriphilus), army ant (Eciton burchelli, Eciton schmitti), Camponotus japonicus (Camponotus japonicus), Asian giant hornet (Vespa mandolina, bulldog ant (Myrmecia spp.), fire ant (Solenopsis spp.), pharaoh ant (Monomorium phalaonis), etc.,
Tuna cricket (Teleoglyllus emma), Kera (Gryllotalpa orientalis), Tosama grasshopper (Locusta migratoria), Oba yezoensis, etc.
Coleoptera insects such as Onychiurus folsomi, Siberian whitebill (Onychiurus sibiricus), Bourletiella hortensis, etc.,
Cockroach (Periplaneta americana), Cockroach (Periplaneta americana), German cockroach (Blattella germanica), cockroach (Peliplaneta Americana), etc.
Termite insects such as the termites (Coptothermes formosanus), the Yamato termites (Reticulitermes speratus), the Taiwan termites (Odontotermes formosanus),
Cat fleas (Ctenocephalidae felis), Dog fleas (Ctenocephalides canis), Chicken fleas (Echidnophaga gallinacea), Human fleas (Pulex irritans), Ceopus vulgaris (Xenopsylla, etc.)
Dipteran insects such as chicken lice (Mecananthus stramineus), bovine lice (Bovicola bovis),
Bovine lice (Haematopinus eurysternus), swine lice (Haematopinus suis), bovine white lice (Linognathus vitili), mosquito lice lice (Solenopotes capillus), sheep d
Dust mites such as cyclamen dust mites (Phytonemus pallidus), chano mite mites (Polyphagotarsononemus latus), and mites (Tarsonmus bilobatus),
Spider mites (Penthaleus erythrocephalus), wheat mites (Penthaleus major), etc.
Rice spider mites (Oligonychus shinkajii), citrus red spider mite (Pananychus citri), red spider mite (Pananychus ulmi), tick mite (Tananychus urticae), Tetranichus kanzawai
Tea Roh Naga rust mite (Acaphylla theavagrans), Tulip rust mite (Aceria tulipae), tomato rust mite (Aculops lycopersici), mandarin orange rust mite (Aculops pelekassi), apple rust mite (Aculus schlechtendali), false pear rust mite (Eriophyes chibaensis), citrus last mite (Phyllocoptruta oleivora )
Coniferous mites such as Robin tick (Rhizoglyphus robini), Kenagakonadani mite (Tyrophagus putrescentiae), Spinach mites (Tyrophagus similis),
Leopard mites, such as Dermatophagoides pteronyssinus, Dermatophagoides farinae,
Bee mites such as honeybee mite (Varroa jacobsoni),
Boophilus microplus (Boophilus microplus), Rhipicephalus sanguineus (Rhipicephalus sanguineus), Haemaphysalis longicornis (Haemaphysalis longicornis), Haemaphysalis flava (Haemaphysalis flava), Adenophora chima tick (Haemaphysalis campanulata), Yamatochimadani (Haemaphysalis japonica), Ootogechimadani (Haemaphysalis megaspinosa), Ixodes ovatus (Ixodes ovatus), sulze tick (Ixodes persulcatus), scallop tick (Ixodes nipponensis), western black tick (Ixodes pacifcus), sheep Dick (Ixodes ricinus), Ixes scapularis, Lone star tick (Amblyomamma americanum), Amblyomamma maculatum, Dick tick (Amblyomamma ect. Ticks such as Rocky Mountain Forest Tick (Dermenteror andrsononi), West Coast Tick (Demercentor occidentalis), American Dog Tick (Dermentertor variabilis), Tick Tick (Dermenteror spp.),
Crawfish ticks (Cheeletiella yasguri), crayfish ticks (Cheeletiella blackei), etc.,
Acne mites such as Inodemite mites (Demodex canis), Caterpillar mites (Demodex cati),
Cucumber mites such as ovine cucumber mites (Psoroptes ovis),
Mite mites such as Sarcoptes scabiei, catfish mite mite (Notoderes cati), chick mite mite (Knemidopoptes spp.),
Crustaceans such as Armadillium vulgare,
Pomacea caliculata, Achatina falica, slugs (Meghiatumium bilineatum), Chaikoura slugs (Limax Valentiana), Uskawamai (Acusta despae)
South Negu Saleh nematode (Prathylenchus coffeae), Northern Negu Saleh nematode (Prathylenchus penetrans), walnut Negu Saleh nematode (Prathylenchus vulnus), potato cyst nematode (Globodera rostochiensis), soybean cyst nematode (Heterodera glycines), northern root-knot nematode (Meloidogyne hapla), sweet potato Nematodes such as Meloidogyne incognita, Rice scentless nematode (Aphelenchodes besseyi), and pinewood nematode (Bursaphelenchus xylophilus),
Protozoa such as amoebae such as dysentery (Rhizopoda), flagellates such as Rishmania and Trichomonas (Mastigophora), protozoa such as malaria parasite, Toxoplasma, and ciliates such as colonic barantidium (Ciliophora) ,
Nematodas such as roundworms and helminths (Nematoda), larvae such as Greater cephalus (Amanthocephala), rotifers (Nematomorpha) such as bark beetles, trematodes such as liver worms, trematodes, etc. Worms such as Cestoda
Ascaris, Toxocara, Toxacaris, Parascaris, Ascaridia, Heterakis, Oxyuris, Capillaria, Capillaria Caterpillars (Trichinella), roundworms (Strongylus, Tridontophorus), hairy nematodes (Trichonema), swine nematodes (Stephanurus), intestinal nodules (Desophagostomum), large intestinal nematodes (Chabertia), moths astragalus (A) , Uncinaria, Necator, Bunostom), Trichostromylus, Coober ciliate nematode (Coo) eria, nematoderus, torsion stomach nematode (Haemonchus), octer dark gastroworm (Ostertagia), lungworm (Dictyocaurus, Metastrungylus), dirofilariae (polyrofilaria) Parafilaria, nematodes such as horseshoe worms (Setaria), Onchocerca (Onchocerca), stomach worms (Habronema, Arduenna, Acuaria),
Diphyllobothrium, Anoprocehara, Moniezia, Dipylidium, Staphylococci and Taenia, Dithyridiliinia, Riritilium , Tapeworms such as Echinococcus,
Examples include flukes such as Schistosoma, Paraphistomum, and Fasciola.
 以下に具体的な製剤化例を示すが、これらに限定されるものではない。 Specific formulation examples are shown below, but are not limited thereto.
[製剤例1 フロアブル剤]
 本発明化合物(10質量部)、キノリン系化合物(10質量部)、ナフタレンスルホン酸のホルムアルデヒド縮合物ナトリウム塩(5質量部)、ポリオキシエチレンアリールフェニルエーテル(1質量部)、プロピレングリコール(5質量部)、シリコン系消泡剤(0.1質量部)、キサンタンガム(0.2質量部)、イオン交換水(68.7質量部)を混合してスラリーとなし、さらにダイノミルKDLで直径1.0mmのガラスビーズを用いて湿式粉砕しフロアブル剤を得る。
[Formulation Example 1 Flowable Agent]
Compound of the present invention (10 parts by mass), quinoline compound (10 parts by mass), sodium salt of formaldehyde condensate of naphthalenesulfonic acid (5 parts by mass), polyoxyethylene arylphenyl ether (1 part by mass), propylene glycol (5 parts by mass) Part), a silicon-based antifoaming agent (0.1 part by mass), xanthan gum (0.2 part by mass), and ion-exchanged water (68.7 parts by mass) to form a slurry, and further with a diameter of 1. A flowable agent is obtained by wet grinding using 0 mm glass beads.
[製剤例2 乳剤]
 本発明化合物(5質量部)、キノリン系化合物(5質量部)をキシレン(35質量部)とシクロヘキサン(35質量部)の混合溶液に溶解し、この溶液にTween20(20質量部)を添加混合し、乳剤を得る。
[Formulation Example 2 Emulsion]
The compound of the present invention (5 parts by mass) and the quinoline compound (5 parts by mass) are dissolved in a mixed solution of xylene (35 parts by mass) and cyclohexane (35 parts by mass), and Tween 20 (20 parts by mass) is added to and mixed with this solution. To obtain an emulsion.
[製剤例3 水和剤]
 本発明化合物(10質量部)、キノリン系化合物(10質量部)、ホワイトカーボン(10質量部)、ポリビニルアルコール(2質量部)、ジオクチルスルホコハク酸ナトリウム塩(0.5質量部)、アルキルベンゼンスルホン酸ナトリウム塩(5質量部)、焼成珪藻土(10質量部)およびカオリナイトクレー(52.5質量部)を充分に混合し、エアーミルで粉砕し、水和剤を得る。
[Formulation Example 3 wettable powder]
Compound of the present invention (10 parts by mass), quinoline compound (10 parts by mass), white carbon (10 parts by mass), polyvinyl alcohol (2 parts by mass), dioctyl sulfosuccinate sodium salt (0.5 parts by mass), alkylbenzene sulfonic acid Sodium salt (5 parts by mass), calcined diatomaceous earth (10 parts by mass) and kaolinite clay (52.5 parts by mass) are sufficiently mixed and pulverized with an air mill to obtain a wettable powder.
 以下に、本発明で用いられるピリドン化合物及びキノリン系化合物について合成例および試験例を挙げて、さらに具体的に説明する。ただし、本発明の内容は、これらの合成例および試験例にのみ限定されるものではない。 Hereinafter, the pyridone compounds and quinoline compounds used in the present invention will be described more specifically with reference to synthesis examples and test examples. However, the contents of the present invention are not limited only to these synthesis examples and test examples.
[合成例1]
 ステップ1:5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成
[Synthesis Example 1]
Step 1: Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000100
 4-(2-クロロ-5-メトキシフェニル)-5-(2,6-ジフルオロフェニル)-5-オキソペンタン酸 1.47gと酢酸アンモニウム 6.75gを含む酢酸溶液 10mlを、130℃にて14時間反応した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層に水を加え、さらに発砲がおさまるまで炭酸カリウムを加えた後に分液した。次いで、有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行った後に、ジイソプロピルエーテルにより析出物を洗浄した。得られた紫色固体は表題の化合物であり、0.98gであった。
H-NMR (CDCl) δ: 7.25-7.21 (1H, m), 7.19 (1H, d, J = 8.8 Hz), 6.83-6.76 (3H, m), 6.65 (1H, dd, J = 8.8, 3.4 Hz), 6.53 (1H, d, J = 3.4 Hz), 3.61 (3H, s), 2.91-2.76 (4H, m).
10 ml of an acetic acid solution containing 1.47 g of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid and 6.75 g of ammonium acetate was added at 130 ° C. Reacted for hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. Water was added to the obtained organic layer, and potassium carbonate was further added until the firing was stopped, followed by liquid separation. Next, the organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the precipitate was washed with diisopropyl ether. The resulting purple solid was the title compound, 0.98 g.
1 H-NMR (CDCl 3 ) δ: 7.25-7.21 (1H, m), 7.19 (1H, d, J = 8.8 Hz), 6.83-6.76 (3H, m ), 6.65 (1H, dd, J = 8.8, 3.4 Hz), 6.53 (1H, d, J = 3.4 Hz), 3.61 (3H, s), 2.91 -2.76 (4H, m).
 ステップ2:5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3,4-ジヒドロピリジン-2(1H)-オンの合成(化合物番号52) Step 2: Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one (Compound No. 52)
Figure JPOXMLDOC01-appb-C000101
Figure JPOXMLDOC01-appb-C000101
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 0.50gを含むDMF溶液 5mlに、ヨウ化エチル 346μlと炭酸セシウム 1.41gを加えて、60℃で2時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物は0.54gの白色固体として得られた。 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one in 5 ml of DMF solution containing 0.50 g and 346 μl of ethyl iodide And 1.41 g of cesium carbonate were added and stirred at 60 ° C. for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.54 g of a white solid.
[合成例2]
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号53)
[Synthesis Example 2]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 53)
Figure JPOXMLDOC01-appb-C000102
Figure JPOXMLDOC01-appb-C000102
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3,4-ジヒドロピリジン-2(1H)-オン 520mgを含む四塩化炭素溶液 20mlに、N-ブロモスクシンイミド 258mgとアゾビスイソブチロニトリル 23mgを加えて、80℃で90分間撹拌した。室温まで冷却した後に、反応混合物に水を加えて、減圧下で四塩化炭素を留去した。これに酢酸エチルを加えて分液した後に、得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が467mgの白色固体として得られた。 To 20 ml of a carbon tetrachloride solution containing 520 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one, N-bromosuccinimide (258 mg) and azobisisobutyronitrile (23 mg) were added, and the mixture was stirred at 80 ° C. for 90 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. Ethyl acetate was added thereto for liquid separation, and the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 467 mg of a white solid.
[合成例3]
 3-クロロ-5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号54)
[Synthesis Example 3]
Synthesis of 3-chloro-5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 54)
Figure JPOXMLDOC01-appb-C000103
Figure JPOXMLDOC01-appb-C000103
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 110mgを含むDMF溶液 2mlにN-クロロスクシンイミド 43mgを加えて、70℃で1時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層を飽和食塩水にて洗浄した後に、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製を行った。表題の化合物が114mgの白色固体として得られた。 Add 43 mg of N-chlorosuccinimide to 2 ml of DMF solution containing 110 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one , And stirred at 70 ° C. for 1 hour. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 114 mg of a white solid.
[合成例4]
 5-(2-クロロ-5-ヒドロキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号234)
[Synthesis Example 4]
Synthesis of 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 234)
Figure JPOXMLDOC01-appb-C000104
Figure JPOXMLDOC01-appb-C000104
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 4.0gを含むジクロロメタン溶液 40mlを氷冷し、1.0mol/lの三臭化ホウ素のジクロロメタン溶液 23.4mlを滴下した。氷冷下で30分間撹拌した後に、反応混合物に水を加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和炭酸水素ナトリウム水溶液で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をヘキサンで洗浄した。表題の化合物が3.9gの白色固体として得られた。 40 ml of a dichloromethane solution containing 4.0 g of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one was ice-cooled. 23.4 ml of a dichloromethane solution of 0 mol / l boron tribromide was added dropwise. After stirring for 30 minutes under ice cooling, water was added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with an aqueous sodium thiosulfate solution and a saturated aqueous sodium bicarbonate solution, and dried over sodium sulfate. After distilling off the solvent under reduced pressure, the resulting residue was washed with hexane. The title compound was obtained as 3.9 g of a white solid.
[合成例5]
 5-(2-クロロ-5-(メトキシメトキシ)フェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号97)
[Synthesis Example 5]
Synthesis of 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 97)
Figure JPOXMLDOC01-appb-C000105
Figure JPOXMLDOC01-appb-C000105
 水素化ナトリウム(約60重量%、流動パラフィンに分散した状態) 0.08gと5-(2-クロロ-5-ヒドロキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 0.62gを含むTHF溶液に、クロロメチルメチルエーテル 0.08gを加えて、室温で3時間撹拌した。反応混合物に水および酢酸エチルを加えて分液した後に、得られた有機層を硫酸マグネシウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が0.46gの白色固体として得られた。 Sodium hydride (approximately 60% by weight, dispersed in liquid paraffin) 0.08 g and 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 0.08 g of chloromethyl methyl ether was added to a THF solution containing 0.62 g of (1H) -one, and the mixture was stirred at room temperature for 3 hours. Water and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was dried over magnesium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.46 g of a white solid.
[合成例6]
 3-クロロ-5-(2-クロロ-5-(メトキシメトキシ)フェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号127)
[Synthesis Example 6]
Synthesis of 3-chloro-5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 127)
Figure JPOXMLDOC01-appb-C000106
Figure JPOXMLDOC01-appb-C000106
 5-(2-クロロ-5-(メトキシメトキシ)フェニル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 219mgとN-クロロスクシンイミド 79mgを含むDMF溶液 3mlを70℃にて1時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が203mgの黄色ガム状物質として得られた。 3-ml DMF solution containing 219 mg 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one and 79 mg N-chlorosuccinimide Was stirred at 70 ° C. for 1 hour. After cooling to room temperature, a saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 203 mg of a yellow gum.
[合成例7]
 5-(2-クロロ-5-メトキシフェニル)-1-(2,2-ジフルオロエチル)-6-(2,6-ジフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成(化合物番号192)
[Synthesis Example 7]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one Compound No. 192)
Figure JPOXMLDOC01-appb-C000107
Figure JPOXMLDOC01-appb-C000107
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 0.50g、p-トルエンスルホン酸2,2-ジフルオロエチル 0.68gと炭酸セシウム 1.40gを含むDMF溶液10mlを、80℃で4時間撹拌した。反応混合物に水と酢酸エチルを加えて分液した後に、得られた有機層を1規定の塩酸、飽和炭酸水素ナトリウム水溶液および飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が0.48gの白色固体として得られた。 5- (2-Chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.50 g, 2,2-difluoro p-toluenesulfonic acid 10 ml of a DMF solution containing 0.68 g of ethyl and 1.40 g of cesium carbonate was stirred at 80 ° C. for 4 hours. Water and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was washed successively with 1N hydrochloric acid, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.48 g of a white solid.
[合成例8]
 5-(2-クロロ-5-メトキシフェニル)-1-(2,2-ジフルオロエチル)-6-(2,6-ジフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号194)
[Synthesis Example 8]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (Compound No. 194)
Figure JPOXMLDOC01-appb-C000108
Figure JPOXMLDOC01-appb-C000108
 5-(2-クロロ-5-メトキシフェニル)-1-(2,2-ジフルオロエチル)-6-(2,6-ジフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 0.42gを含む四塩化炭素溶液 15mlに、N-ブロモスクシンイミド 190mgとアゾビスイソブチロニトリル 16mgを加えて、80℃で15分間撹拌した。室温まで冷却した後に、反応混合物に水を加えて、減圧下で四塩化炭素を留去した。これに酢酸エチルを加えて分液した後に、得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が0.38gの白色固体として得られた。 5- (2-Chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.42 g N-bromosuccinimide 190 mg and azobisisobutyronitrile 16 mg were added to a carbon tetrachloride solution containing 15 ml, and the mixture was stirred at 80 ° C. for 15 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. Ethyl acetate was added thereto for liquid separation, and the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.38 g of a white solid.
[合成例9]
 3-ブロモ-5-(2-クロロ-5-メトキシフェニル)-1-(2,2-ジフルオロエチル)-6-(2,6-ジフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号198)
[Synthesis Example 9]
Synthesis of 3-bromo-5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (compound Number 198)
Figure JPOXMLDOC01-appb-C000109
Figure JPOXMLDOC01-appb-C000109
 5-(2-クロロ-5-メトキシフェニル)-1-(2,2-ジフルオロエチル)-6-(2,6-ジフルオロフェニル)ピリジン-2(1H)-オン 125mgとN-ブロモスクシンイミド 65mgを含むDMF溶液 5mlを70℃で2時間撹拌した。これにN-ブロモスクシンイミド 27mgを追加して、さらに70℃で2時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が109mgのオフホワイト固体として得られた。 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (125 mg) and N-bromosuccinimide (65 mg) The DMF solution containing 5 ml was stirred at 70 ° C. for 2 hours. To this was added 27 mg of N-bromosuccinimide, and the mixture was further stirred at 70 ° C. for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 109 mg off-white solid.
[合成例10]
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3-メチル-3,4-ジヒドロピリジン-2(1H)-オンの合成
[Synthesis Example 10]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000110
Figure JPOXMLDOC01-appb-C000110
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3,4-ジヒドロピリジン-2(1H)-オン 500mgを含むTHF溶液 10mlを-78℃に冷却し、1.09mol/lのリチウムジイソプロピルアミドのTHF溶液 1.33mlを滴下して、同温で30分間撹拌した。次いで、これにヨウ化メチル 82μlを含むTHF溶液 2mlを滴下して-78℃で2時間撹拌した後に、室温まで昇温した。さらに室温で2時間撹拌した後に、反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が101mgの白色固体として得られた。また、得られた表題の化合物は立体異性混合物であった。
H-NMR (CDCl) δ: 7.24-7.17 (1H, m:mixture), 7.15-7.13 (1H, m:mixture), 6.87-6.71 (2H, m:mixture), 6.57-6.49 (2H, m:mixture), 3.70-3.14 (2H, m:mixture), 3.65 (3H, s:major), 3.58 (3H, s:minor), 2.98-2.70 (2H, m:mixture), 2.46-2.37 (1H, m:mixture), 1.35 (3H, d, J = 6.7 Hz:minor), 1.33 (3H, d, J = 7.0 Hz:major), 1.00-0.96 (3H, m).
立体異性混合物比:約57:43
10 ml of a THF solution containing 500 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one at −78 ° C. Then, 1.33 ml of a THF solution of 1.09 mol / l lithium diisopropylamide was added dropwise and stirred at the same temperature for 30 minutes. Next, 2 ml of a THF solution containing 82 μl of methyl iodide was added dropwise thereto, followed by stirring at −78 ° C. for 2 hours, and then the temperature was raised to room temperature. After further stirring at room temperature for 2 hours, a saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 101 mg of a white solid. The obtained title compound was a stereoisomeric mixture.
1 H-NMR (CDCl 3 ) δ: 7.24-7.17 (1H, m: mixure), 7.15-7.13 (1H, m: mixure), 6.87-6.71 (2H, m: mixture), 6.57-6.49 (2H, m: mixture), 3.70-3.14 (2H, m: mixture), 3.65 (3H, s: major), 3.58 ( 3H, s: minor), 2.98-2.70 (2H, m: mixture), 2.46-2.37 (1H, m: mixture), 1.35 (3H, d, J = 6.7). Hz: minor), 1.33 (3H, d, J = 7.0 Hz: major), 1.00-0.96 (3H, m).
Stereoisomeric mixture ratio: about 57:43
[合成例11]
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3-メチルピリジン-2(1H)-オンの合成(化合物番号329)
[Synthesis Example 11]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methylpyridin-2 (1H) -one (Compound No. 329)
Figure JPOXMLDOC01-appb-C000111
Figure JPOXMLDOC01-appb-C000111
 5-(2-クロロ-5-メトキシフェニル)-6-(2,6-ジフルオロフェニル)-1-エチル-3-メチル-3,4-ジヒドロピリジン-2(1H)-オン 413mgと二酸化マンガン 5.48gを含むジクロロメタン溶液 10mlを加熱還流下で11時間撹拌した。さらに二酸化マンガン 1.83gを追加して、加熱還流下で3時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が291mgの白色固体として得られた。 4. 413 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydropyridin-2 (1H) -one and manganese dioxide 10 ml of a dichloromethane solution containing 48 g was stirred for 11 hours under heating and reflux. Further, 1.83 g of manganese dioxide was added, and the mixture was stirred for 3 hours with heating under reflux. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 291 mg of a white solid.
[合成例12]
 ステップ1:5-(2-クロロ-5-フルオロフェニル)-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成
[Synthesis Example 12]
Step 1: Synthesis of 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000112
Figure JPOXMLDOC01-appb-C000112
 4-(2-クロロ-5-フルオロフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸 4.46gと酢酸アンモニウム 45.9gを含む酢酸溶液 25mlを130℃で2時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層に水を加え、さらに発泡がおさまるまで炭酸カリウムを加えた後に分液した。次いで、有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、ジイソプロピルエーテルで析出物を洗浄した。得られた白色固体は表題の化合物であり、2.24gであった。また、析出物を洗浄した際に生じた濾液を、減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。濾液から得た白色固体も表題の化合物であり、0.46gであった。
H-NMR (CDCl) δ: 7.28-7.26 (1H, m), 7.18 (1H, br s), 6.86-6.83 (1H, m), 6.74-6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).
25 ml of acetic acid solution containing 4.46 g of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid and 45.9 g of ammonium acetate at 130 ° C. Stir for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. Water was added to the obtained organic layer, and potassium carbonate was further added until foaming stopped, followed by liquid separation. Next, the organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the precipitate was washed with diisopropyl ether. The resulting white solid was the title compound, 2.24 g. Further, the filtrate produced when the precipitate was washed was evaporated under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The white solid obtained from the filtrate was also the title compound, 0.46 g.
1 H-NMR (CDCl 3 ) δ: 7.28-7.26 (1H, m), 7.18 (1H, br s), 6.86-6.83 (1H, m), 6.74- 6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).
 ステップ2:5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成(化合物番号320) Step 2: Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one (compound Number 320)
Figure JPOXMLDOC01-appb-C000113
Figure JPOXMLDOC01-appb-C000113
 5-(2-クロロ-5-フルオロフェニル)-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 2.70g、炭酸セシウム 7.42gとヨウ化エチル 3.55gを含むDMF溶液 32mlを、55℃で2時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が2.47gの赤紫色ガム状物質として得られた。 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 2.70 g, cesium carbonate 7.42 g and iodine 32 ml of DMF solution containing 3.55 g of ethyl chloride was stirred at 55 ° C. for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 2.47 g of a magenta gum.
[合成例13]
 5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号321)
[Synthesis Example 13]
Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 321)
Figure JPOXMLDOC01-appb-C000114
Figure JPOXMLDOC01-appb-C000114
 5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 0.21gと二酸化マンガン 1.42gを含むトルエン溶液 5mlを、90℃で5時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が0.14gの白色固体として得られた。 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.21 g and manganese dioxide 1 5 ml of a toluene solution containing .42 g was stirred at 90 ° C. for 5 hours. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.14 g of a white solid.
[合成例14]
 3-ブロモ-5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号381)
[Synthesis Example 14]
Synthesis of 3-bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 381)
Figure JPOXMLDOC01-appb-C000115
Figure JPOXMLDOC01-appb-C000115
 5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 0.60gとN-ブロモスクシンイミド 0.33gを含むDMF溶液 30mlを75℃で2.5時間撹拌した。さらに、N-ブロモスクシンイミド 0.10gを追加して、75℃で1.5時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水にて洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が0.64gの白色固体として得られた。 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (0.60 g) and N-bromosuccinimide (0.33 g) 30 ml of the DMF solution contained was stirred at 75 ° C. for 2.5 hours. Further, 0.10 g of N-bromosuccinimide was added and stirred at 75 ° C. for 1.5 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.64 g of a white solid.
[合成例15]
 5-(2-クロロ-5-フルオロフェニル)-1-エチル-3-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号461)
[Synthesis Example 15]
Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-3-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 461)
Figure JPOXMLDOC01-appb-C000116
Figure JPOXMLDOC01-appb-C000116
 3-ブロモ-5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 250mg、メチルボロン酸49mg、酢酸パラジウム(II)6mg、リン酸三カリウム403mgとトリシクロヘキシルホスフィン 15mgを含むトルエン 8mlと水 0.8mlの混合溶液を、100℃で7時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が116mgの白色固体として得られた。 3-Bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one 250 mg, methylboronic acid 49 mg, palladium acetate (II) A mixed solution of 8 ml of toluene and 0.8 ml of water containing 6 mg, 403 mg of tripotassium phosphate and 15 mg of tricyclohexylphosphine was stirred at 100 ° C. for 7 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 116 mg of a white solid.
[合成例16]
 3-ブロモ-5-(2-クロロ-5-フルオロフェニル)-6-(2,6-ジフルオロ-4-メトキシフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号476)
[Synthesis Example 16]
Synthesis of 3-bromo-5- (2-chloro-5-fluorophenyl) -6- (2,6-difluoro-4-methoxyphenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 476)
Figure JPOXMLDOC01-appb-C000117
Figure JPOXMLDOC01-appb-C000117
 3-ブロモ-5-(2-クロロ-5-フルオロフェニル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 300mgのメタノール溶液 8mlに28重量%のナトリウムメトキシドのメタノール溶液 0.63mlを加えて、加熱還流下で13時間撹拌した。室温まで冷却した後に、反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が271mgの白色固体として得られた。 3-Bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one 28 mg in 8 ml of 300 mg methanol solution 0.63 ml of a methanol solution of% sodium methoxide was added, and the mixture was stirred for 13 hours under heating and reflux. After cooling to room temperature, a saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 271 mg of a white solid.
[合成例17]
 ステップ1:5-(3,5-ジメトキシフェニル)-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成
[Synthesis Example 17]
Step 1: Synthesis of 5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000118
Figure JPOXMLDOC01-appb-C000118
 参考例3で得られた未精製の4-(3,5-ジメトキシフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸に、酢酸アンモニウム 14.18gと酢酸 15mlを加えて、120℃で10時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和炭酸水素ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体にイソプロピルエーテルを加えて洗浄した。表題の化合物が0.99gの褐色固体として得られた。
H-NMR (CDCl) δ: 6.68 (1H, s), 6.62 (2H, td, J = 8.7, 1.4 Hz), 6.26 (1H, t, J = 2.1 Hz), 6.16 (2H, d, J = 2.1 Hz), 3.65 (6H, s), 2.87-2.86 (2H, m), 2.73-2.71 (2H, m).
To the crude 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid obtained in Reference Example 3, 14.18 g of ammonium acetate and 15 ml of acetic acid And stirred at 120 ° C. for 10 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, isopropyl ether was added to the obtained solid and washed. The title compound was obtained as a 0.99 g brown solid.
1 H-NMR (CDCl 3 ) δ: 6.68 (1H, s), 6.62 (2H, td, J = 8.7, 1.4 Hz), 6.26 (1H, t, J = 2) .1 Hz), 6.16 (2H, d, J = 2.1 Hz), 3.65 (6H, s), 2.87-2.86 (2H, m), 2.73-2.71 (2H, m).
 ステップ2:5-(3,5-ジメトキシフェニル)-1-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成 Step 2: Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000119
Figure JPOXMLDOC01-appb-C000119
 5-(3,5-ジメトキシフェニル)-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 343mg、ヨウ化メチル 176μlと炭酸セシウム 1.85gを含むDMF溶液 6mlを室温で3時間撹拌した。反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を水、チオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が346mgの白色固体として得られた。
H-NMR (CDCl) δ: 6.62-6.60 (2H, m), 6.23 (1H, t, J = 2.1 Hz), 6.13 (2H, d, J = 2.1 Hz), 3.65 (6H, s), 2.87 (3H, s), 2.76-2.74 (4H, m).
5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 343 mg, methyl iodide 176 μl and cesium carbonate 1.85 g 6 ml of the DMF solution was stirred for 3 hours at room temperature. Water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with water, aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 346 mg of a white solid.
1 H-NMR (CDCl 3 ) δ: 6.62-6.60 (2H, m), 6.23 (1H, t, J = 2.1 Hz), 6.13 (2H, d, J = 2) .1 Hz), 3.65 (6H, s), 2.87 (3H, s), 2.76-2.74 (4H, m).
[合成例18]
 5-(3,5-ジメトキシフェニル)-1-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号134)
[Synthesis Example 18]
Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 134)
Figure JPOXMLDOC01-appb-C000120
Figure JPOXMLDOC01-appb-C000120
 5-(3,5-ジメトキシフェニル)-1-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 320mgと二酸化マンガン 4.42gを含むジクロロメタン溶液 12mlを、加熱還流下で5時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が263mgの白色固体として得られた。 Contains 320 mg of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one and 4.42 g of manganese dioxide 12 ml of a dichloromethane solution was stirred for 5 hours under heating to reflux. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 263 mg of a white solid.
[合成例19]
 5-(2-クロロ-3,5-ジメトキシフェニル)-1-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号136)
[Synthesis Example 19]
Synthesis of 5- (2-chloro-3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 136)
Figure JPOXMLDOC01-appb-C000121
Figure JPOXMLDOC01-appb-C000121
 5-(3,5-ジメトキシフェニル)-1-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 163mgとN-クロロスクシンイミド 64mgを含むDMF溶液 6mlを、80℃で5時間撹拌した。さらにN-クロロスクシンイミド 45mgを追加して、100℃で4時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が150mgの白色固体として得られた。 6 ml of a DMF solution containing 163 mg of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one and 64 mg of N-chlorosuccinimide, Stir at 80 ° C. for 5 hours. Further, 45 mg of N-chlorosuccinimide was added and stirred at 100 ° C. for 4 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 150 mg of a white solid.
〈参考例1〉
 ステップ1:2-(2-クロロ-5-メトキシフェニル)-1-(2,6-ジフルオロフェニル)エタノンの合成
<Reference Example 1>
Step 1: Synthesis of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000122
Figure JPOXMLDOC01-appb-C000122
 2-(2-クロロ-5-メトキシフェニル)酢酸 2.05gを含むTHF溶液 30mlを-78℃に冷却した後に、1.9mol/LのヘキサメチルジシラザンナトリウムのTHF溶液 17.21mlを-50℃以下で滴下して、-78℃で40分間撹拌した。これに2,6-ジフルオロ安息香酸メチル 1.76gを含むTHF溶液 10mlを-78℃で滴下した後に、室温まで昇温して1.5時間撹拌した。反応混合物に飽和塩化アンモニウム水溶液を加えて撹拌した後に、酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製することにより、表題の化合物を2.58gの黄色油状物質として得た。
H-NMR (CDCl) δ: 7.40-7.38 (1H, m), 7.28-7.27 (1H, m), 6.96-6.94 (2H, m), 6.83 (1H, d, J = 3.1 Hz), 6.78 (1H, dd, J = 8.9, 3.1 Hz), 4.27 (2H, s), 3.79 (3H, s).
After cooling 30 ml of a THF solution containing 2.05 g of 2- (2-chloro-5-methoxyphenyl) acetic acid to −78 ° C., 17.21 ml of a THF solution of 1.9 mol / L hexamethyldisilazane sodium was added to −50 The solution was added dropwise at not more than 0 ° C. and stirred at −78 ° C. for 40 minutes. To this was added dropwise 10 ml of a THF solution containing 1.76 g of methyl 2,6-difluorobenzoate at −78 ° C., and then the mixture was warmed to room temperature and stirred for 1.5 hours. A saturated aqueous ammonium chloride solution was added to the reaction mixture and stirred, and then ethyl acetate was added to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography to obtain the title compound as 2.58 g of a yellow oily substance.
1 H-NMR (CDCl 3 ) δ: 7.40-7.38 (1H, m), 7.28-7.27 (1H, m), 6.96-6.94 (2H, m), 6 .83 (1H, d, J = 3.1 Hz), 6.78 (1H, dd, J = 8.9, 3.1 Hz), 4.27 (2H, s), 3.79 (3H, s).
 ステップ2:4-(2-クロロ-5-メトキシフェニル)-5-(2,6-ジフルオロフェニル)-5-オキソペンタン酸エチルの合成 Step 2: Synthesis of ethyl 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoate
Figure JPOXMLDOC01-appb-C000123
Figure JPOXMLDOC01-appb-C000123
 2-(2-クロロ-5-メトキシフェニル)-1-(2,6-ジフルオロフェニル)エタノン 1.30gを含むTHF溶液 15mlに、カリウム t-ブトキシド 98mgとアクリル酸エチル 525μlを加えて、氷冷下で終夜で撹拌した。反応混合物に1規定の塩酸と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、表題の化合物を1.69gの黄色油状物質として得た。これ以上精製することなく、次の反応に使用した。
H-NMR (CDCl) δ: 7.36-7.25 (1H, m), 7.19 (1H, d, J = 8.9 Hz), 6.83 (2H, t, J = 8.1 Hz), 6.74-6.71 (2H, m), 4.91 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.1 Hz), 3.76 (3H, s), 2.57-2.53 (1H, m), 2.42-2.29 (2H, m), 2.16-2.07 (1H, m), 1.25 (3H, t, J = 7.1 Hz).
2- (2-Chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone To 15 ml of a THF solution containing 1.30 g, 98 mg of potassium t-butoxide and 525 μl of ethyl acrylate were added, and the mixture was ice-cooled. Stirred overnight. 1N Hydrochloric acid and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the title compound was obtained as 1.69 g of a yellow oil. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.36-7.25 (1H, m), 7.19 (1H, d, J = 8.9 Hz), 6.83 (2H, t, J = 8 .1 Hz), 6.74-6.71 (2H, m), 4.91 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.1 Hz), 3.76 (3H, s), 2.57-2.53 (1H, m), 2.42-2.29 (2H, m), 2.16-2.07 (1H, m), 25 (3H, t, J = 7.1 Hz).
 ステップ3:4-(2-クロロ-5-メトキシフェニル)-5-(2,6-ジフルオロフェニル)-5-オキソペンタン酸の合成 Step 3: Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid
Figure JPOXMLDOC01-appb-C000124
Figure JPOXMLDOC01-appb-C000124
 4-(2-クロロ-5-メトキシフェニル)-5-(2,6-ジフルオロフェニル)-5-オキソペンタン酸エチル 1.69gを含むTHF 40mlと水 10mlとの混合溶液に、水酸化リチウム1水和物 0.74gを加えて、60℃で3時間撹拌した。室温まで冷却した後に、液量が半分程度になるまで反応混合物の溶媒を留去した。これに水とジエチルエーテルを加えて分液し、得られた水層に濃塩酸と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。次いで、減圧下にて溶媒留去した後に、表題の化合物を1.47gの黄色ガム状物質として得た。これ以上精製することなく、次の反応に使用した。
H-NMR (CDCl) δ: 7.28-7.27 (1H, m), 7.19 (1H, d, J = 8.6 Hz), 6.83 (2H, t, J = 8.3 Hz), 6.75-6.74 (1H, m), 6.71 (1H, dd, J = 8.6, 3.1 Hz), 4.92 (1H, t, J = 7.3 Hz), 3.75 (3H, s), 2.60-2.34 (3H, m), 2.15-2.12 (1H, m).
4- (2-Chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid ethyl 1.69 g of THF mixed with 40 ml of THF and 10 ml of water were mixed with lithium hydroxide 1 The hydrate 0.74g was added and it stirred at 60 degreeC for 3 hours. After cooling to room temperature, the solvent of the reaction mixture was distilled off until the liquid volume became about half. Water and diethyl ether were added thereto for liquid separation, and the obtained aqueous layer was separated by adding concentrated hydrochloric acid and ethyl acetate. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. Then after distilling off the solvent under reduced pressure, the title compound was obtained as 1.47 g of a yellow gum. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.28-7.27 (1H, m), 7.19 (1H, d, J = 8.6 Hz), 6.83 (2H, t, J = 8 .3 Hz), 6.75-6.74 (1H, m), 6.71 (1H, dd, J = 8.6, 3.1 Hz), 4.92 (1H, t, J = 7. 3 Hz), 3.75 (3H, s), 2.60-2.34 (3H, m), 2.15-2.12 (1H, m).
〈参考例2〉
 ステップ1:N’-(2-クロロ-5-フルオロベンジリデン)-4-メチルベンゼンスルホニルヒドラジドの合成
<Reference Example 2>
Step 1: Synthesis of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonyl hydrazide
Figure JPOXMLDOC01-appb-C000125
Figure JPOXMLDOC01-appb-C000125
 2-クロロ-5-フルオロベンズアルデヒド 25.43gと4-メチルベンゼンスルホニルヒドラジド 29.87gを含むエタノール溶液 250mlを室温で4時間撹拌した。次いで、反応混合物を氷冷下で1時間撹拌した後に析出物を濾過し、表題の化合物を40.74gの白色固体として得た。
H-NMR (CDCl) δ: 8.27 (1H, s), 8.10 (1H, d, J = 1.8 Hz), 7.88 (2H, d, J = 8.2 Hz), 7.58 (1H, dd, J = 9.2, 3.1 Hz), 7.34 (2H, d, J = 8.2 Hz), 7.30-7.28 (1H, m), 7.02-6.99 (1H, m), 2.43 (3H, s).
250 ml of an ethanol solution containing 25.43 g of 2-chloro-5-fluorobenzaldehyde and 29.87 g of 4-methylbenzenesulfonyl hydrazide was stirred at room temperature for 4 hours. The reaction mixture was then stirred for 1 hour under ice cooling and the precipitate was filtered to give the title compound as 40.74 g of a white solid.
1 H-NMR (CDCl 3 ) δ: 8.27 (1H, s), 8.10 (1H, d, J = 1.8 Hz), 7.88 (2H, d, J = 8.2 Hz) 7.58 (1H, dd, J = 9.2, 3.1 Hz), 7.34 (2H, d, J = 8.2 Hz), 7.30-7.28 (1H, m), 7.02-6.99 (1H, m), 2.43 (3H, s).
 ステップ2:2-(2-クロロ-5-フルオロフェニル)-1-(2,4,6-トリフルオロフェニル)エタノンの合成 Step 2: Synthesis of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000126
Figure JPOXMLDOC01-appb-C000126
 水酸化ナトリウム 4.0gを含む水溶液 600mlに、N’-(2-クロロ-5-フルオロベンジリデン)-4-メチルベンゼンスルホニルヒドラジド 32.7gと2,4,6-トリフルオロベンズアルデヒド 8.0gを加えて、80℃で1時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと塩化アンモニウム 15.0gを加えて撹拌し、分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が6.13gの淡黄色固体として得られた。
H-NMR (CDCl) δ: 7.36-7.34 (1H, m), 7.04-7.02 (1H, m), 6.98-6.96 (1H, m), 6.76-6.72 (2H, m) 4.26 (2H, s).
To 600 ml of an aqueous solution containing 4.0 g of sodium hydroxide, 32.7 g of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonylhydrazide and 8.0 g of 2,4,6-trifluorobenzaldehyde were added. And stirred at 80 ° C. for 1 hour. After cooling to room temperature, ethyl acetate and 15.0 g of ammonium chloride were added to the reaction mixture, and the mixture was stirred and separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 6.13 g of a pale yellow solid.
1 H-NMR (CDCl 3 ) δ: 7.36-7.34 (1H, m), 7.04-7.02 (1H, m), 6.98-6.96 (1H, m), 6 .76-6.72 (2H, m) 4.26 (2H, s).
 ステップ3:4-(2-クロロ-5-フルオロフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸エチルの合成 Step 3: Synthesis of ethyl 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
Figure JPOXMLDOC01-appb-C000127
Figure JPOXMLDOC01-appb-C000127
 2-(2-クロロ-5-フルオロフェニル)-1-(2,4,6-トリフルオロフェニル)エタノン 6.13gを含むTHF溶液 75mlを氷冷し、カリウム t-ブトキシド 0.45gとアクリル酸エチル 2.23gを加えて、室温で8時間撹拌した。反応混合物に10%の塩酸を加えた後に、水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去して、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が4.97gの淡黄色油状物質として得られた。H-NMR (CDCl) δ: 7.30 (1H, dd, J = 8.9, 5.2 Hz), 7.01-6.98 (1H, m), 6.92-6.90 (1H, m), 6.66-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.2 Hz), 2.54-2.52 (1H, m), 2.35-2.31 (2H, m), 2.12-2.09 (1H, m), 1.25 (3H, t, J = 7.2 Hz). 75 ml of THF solution containing 6.13 g of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone was ice-cooled, 0.45 g of potassium t-butoxide and acrylic acid Ethyl 2.23g was added and it stirred at room temperature for 8 hours. After 10% hydrochloric acid was added to the reaction mixture, water and ethyl acetate were added to separate the layers. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 4.97 g of a pale yellow oil. 1 H-NMR (CDCl 3 ) δ: 7.30 (1H, dd, J = 8.9, 5.2 Hz), 7.01-6.98 (1H, m), 6.92-6.90 (1H, m), 6.66-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.2 Hz) , 2.54-2.52 (1H, m), 2.35-2.31 (2H, m), 2.12-2.09 (1H, m), 1.25 (3H, t, J = 7.2 Hz).
 ステップ4:4-(2-クロロ-5-フルオロフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸の合成 Step 4: Synthesis of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
Figure JPOXMLDOC01-appb-C000128
Figure JPOXMLDOC01-appb-C000128
 4-(2-クロロ-5-フルオロフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸エチル 4.97gを含むTHF溶液 100mlに、水 25mlと水酸化リチウム1水和物2.59gを加えて、60℃で2時間撹拌した。室温まで冷却した後に、反応混合物を減圧下で溶媒留去した。これに、水とジエチルエーテルを加えて分液を行った。次いで、得られた水層に濃塩酸を加えて酸性化した後に、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、表題の化合物が4.46gの無色透明ガム状物質として得られた。これ以上精製することなく、次の反応に使用した。
H-NMR (CDCl) δ: 7.32-7.29 (1H, m), 7.00-6.97 (1H, m), 6.94-6.89 (1H, m), 6.64-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 2.58-2.06 (4H, m).
4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate 4.97 g in THF solution 100 ml, water 25 ml and lithium hydroxide 1 2.59 g of hydrate was added and stirred at 60 ° C. for 2 hours. After cooling to room temperature, the reaction mixture was evaporated under reduced pressure. Water and diethyl ether were added thereto for liquid separation. Next, the obtained aqueous layer was acidified with concentrated hydrochloric acid, and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the title compound was obtained as 4.46 g of a colorless transparent gum. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.32-7.29 (1H, m), 7.00-6.97 (1H, m), 6.94-6.89 (1H, m), 6 .64-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 2.58-2.06 (4H, m).
〈参考例3〉
 ステップ1:N’-(3,5-ジメトキシベンジリデン)-4-メチルベンゼンスルホニルヒドラジドの合成
<Reference Example 3>
Step 1: Synthesis of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonyl hydrazide
Figure JPOXMLDOC01-appb-C000129
Figure JPOXMLDOC01-appb-C000129
 3,5-ジメトキシベンズアルデヒド 10.0gと4-メチルベンゼンスルホニルヒドラジド 11.2gを含むエタノール溶液 100mlを室温で5時間撹拌した。得られた反応混合物を減圧下で溶媒留去した後に、表題の化合物が20.0gの黄色固体として得られた。
H-NMR (CDCl) δ: 8.13 (1H, s), 7.87 (2H, d, J = 7.8 Hz), 7.68 (1H, s), 7.30 (2H, d, J = 7.8 Hz), 6.72 (2H, d, J = 2.4 Hz), 6.46 (1H, t, J = 2.4 Hz), 3.79 (6H, s), 2.40 (3H, s).
100 ml of an ethanol solution containing 10.0 g of 3,5-dimethoxybenzaldehyde and 11.2 g of 4-methylbenzenesulfonyl hydrazide was stirred at room temperature for 5 hours. The resulting reaction mixture was evaporated under reduced pressure to give the title compound as 20.0 g of a yellow solid.
1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.87 (2H, d, J = 7.8 Hz), 7.68 (1H, s), 7.30 (2H, d, J = 7.8 Hz), 6.72 (2H, d, J = 2.4 Hz), 6.46 (1H, t, J = 2.4 Hz), 3.79 (6H, s) , 2.40 (3H, s).
 ステップ2:2-(3,5-ジメトキシフェニル)-1-(2,4,6-トリフルオロフェニル)エタノンの合成 Step 2: Synthesis of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000130
Figure JPOXMLDOC01-appb-C000130
 N’-(3,5-ジメトキシベンジリデン)-4-メチルベンゼンスルホニルヒドラジド 6.68gを含む水溶液 100mlに、水酸化ナトリウム 0.80gを溶解した水溶液 20mlと 2,4,6-トリフルオロベンズアルデヒド 1.60gを加えて、80℃で90分間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルを加えて分液した。得られた有機層を飽和塩化アンモニウム水溶液と飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が1.85gの黄色油状物質として得られた。
H-NMR (CDCl) δ: 6.68-6.66 (2H, m), 6.35 (3H, s),4.06 (2H,s), 3.75 (6H, s).
20 ml of an aqueous solution in which 0.80 g of sodium hydroxide is dissolved in 100 ml of an aqueous solution containing 6.68 g of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonylhydrazide and 2,4,6-trifluorobenzaldehyde 60 g was added and stirred at 80 ° C. for 90 minutes. After cooling to room temperature, ethyl acetate was added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with saturated aqueous ammonium chloride solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 1.85 g of a yellow oil.
1 H-NMR (CDCl 3 ) δ: 6.68-6.66 (2H, m), 6.35 (3H, s), 4.06 (2H, s), 3.75 (6H, s).
 ステップ3:4-(3,5-ジメトキシフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸エチルの合成 Step 3: Synthesis of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
Figure JPOXMLDOC01-appb-C000131
Figure JPOXMLDOC01-appb-C000131
 2-(3,5-ジメトキシフェニル)-1-(2,4,6-トリフルオロフェニル)エタノン 1.85gを含むTHF溶液 18mlに、カリウム t-ブトキシド 67mgとアクリル酸エチル 714μlを加えて、氷冷下で終夜撹拌した。反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が1.51gの褐色油状物質として得られた。
H-NMR (CDCl) δ: 6.61-6.57 (2H, m), 6.31-6.29 (3H, m), 4.19 (1H, t, J = 7.3 Hz), 4.13 (2H, q, J = 7.1 Hz), 3.73 (6H, s), 2.49-2.47 (1H, m), 2.30 (2H, t, J = 7.5 Hz), 2.09-2.07 (1H, m), 1.25 (3H, t, J = 7.1 Hz)
To 18 ml of THF solution containing 1.85 g of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone, 67 mg of potassium t-butoxide and 714 μl of ethyl acrylate were added, and iced. Stir overnight under cold. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate the layers. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 1.51 g of a brown oil.
1 H-NMR (CDCl 3 ) δ: 6.61-6.57 (2H, m), 6.31-6.29 (3H, m), 4.19 (1H, t, J = 7.3 Hz ), 4.13 (2H, q, J = 7.1 Hz), 3.73 (6H, s), 2.49-2.47 (1H, m), 2.30 (2H, t, J = 7.5 Hz), 2.09-2.07 (1H, m), 1.25 (3H, t, J = 7.1 Hz)
 ステップ4:4-(3,5-ジメトキシフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸の合成 Step 4: Synthesis of 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
Figure JPOXMLDOC01-appb-C000132
Figure JPOXMLDOC01-appb-C000132
 4-(3,5-ジメトキシフェニル)-5-オキソ-5-(2,4,6-トリフルオロフェニル)ペンタン酸エチル 1.51gと濃塩酸3mlを含む酢酸溶液 15mlを60℃で3時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を水と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、表題の化合物が得られた。これ以上精製することなく、次工程の反応に使用した。 15 ml of acetic acid solution containing 1.51 g of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate and 3 ml of concentrated hydrochloric acid is stirred at 60 ° C. for 3 hours. did. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with water and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure to give the title compound. Used in the next step reaction without further purification.
 表4に、前記した実施例に準じて合成した化合物を示すが、本発明化合物はこれらに限定されるものではない。
 構造Aは以下を表す。
Although the compound synthesize | combined according to the above-mentioned Example is shown in Table 4, this invention compound is not limited to these.
Structure A represents:
Figure JPOXMLDOC01-appb-C000133
Figure JPOXMLDOC01-appb-C000133
構造Bは以下を表す。 Structure B represents the following:
Figure JPOXMLDOC01-appb-C000134
Figure JPOXMLDOC01-appb-C000134
構造Cは以下を表す。 Structure C represents:
Figure JPOXMLDOC01-appb-C000135
Figure JPOXMLDOC01-appb-C000135
構造Dは以下を表す。 Structure D represents:
Figure JPOXMLDOC01-appb-C000136
Figure JPOXMLDOC01-appb-C000136
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000143
Figure JPOXMLDOC01-appb-T000143
Figure JPOXMLDOC01-appb-T000144
Figure JPOXMLDOC01-appb-T000144
Figure JPOXMLDOC01-appb-T000145
Figure JPOXMLDOC01-appb-T000145
Figure JPOXMLDOC01-appb-T000146
Figure JPOXMLDOC01-appb-T000146
Figure JPOXMLDOC01-appb-T000147
Figure JPOXMLDOC01-appb-T000147
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000150
Figure JPOXMLDOC01-appb-T000150
Figure JPOXMLDOC01-appb-T000151
Figure JPOXMLDOC01-appb-T000151
Figure JPOXMLDOC01-appb-T000152
Figure JPOXMLDOC01-appb-T000152
Figure JPOXMLDOC01-appb-T000153
Figure JPOXMLDOC01-appb-T000153
Figure JPOXMLDOC01-appb-T000154
Figure JPOXMLDOC01-appb-T000154
Figure JPOXMLDOC01-appb-T000155
Figure JPOXMLDOC01-appb-T000155
Figure JPOXMLDOC01-appb-T000156
Figure JPOXMLDOC01-appb-T000156
 次に、表4に記載の化合物について、表5にそれらのH-NMRデータを示す。 Next, for the compounds described in Table 4, their 1 H-NMR data are shown in Table 5.
Figure JPOXMLDOC01-appb-T000157
Figure JPOXMLDOC01-appb-T000157
Figure JPOXMLDOC01-appb-T000158
Figure JPOXMLDOC01-appb-T000158
Figure JPOXMLDOC01-appb-T000159
Figure JPOXMLDOC01-appb-T000159
Figure JPOXMLDOC01-appb-T000160
Figure JPOXMLDOC01-appb-T000160
Figure JPOXMLDOC01-appb-T000161
Figure JPOXMLDOC01-appb-T000161
Figure JPOXMLDOC01-appb-T000162
Figure JPOXMLDOC01-appb-T000162
Figure JPOXMLDOC01-appb-T000163
Figure JPOXMLDOC01-appb-T000163
Figure JPOXMLDOC01-appb-T000164
Figure JPOXMLDOC01-appb-T000164
Figure JPOXMLDOC01-appb-T000165
Figure JPOXMLDOC01-appb-T000165
Figure JPOXMLDOC01-appb-T000166
Figure JPOXMLDOC01-appb-T000166
Figure JPOXMLDOC01-appb-T000167
Figure JPOXMLDOC01-appb-T000167
Figure JPOXMLDOC01-appb-T000168
Figure JPOXMLDOC01-appb-T000168
Figure JPOXMLDOC01-appb-T000169
Figure JPOXMLDOC01-appb-T000169
Figure JPOXMLDOC01-appb-T000170
Figure JPOXMLDOC01-appb-T000170
Figure JPOXMLDOC01-appb-T000171
Figure JPOXMLDOC01-appb-T000171
Figure JPOXMLDOC01-appb-T000172
Figure JPOXMLDOC01-appb-T000172
Figure JPOXMLDOC01-appb-T000173
Figure JPOXMLDOC01-appb-T000173
Figure JPOXMLDOC01-appb-T000174
Figure JPOXMLDOC01-appb-T000174
Figure JPOXMLDOC01-appb-T000175
Figure JPOXMLDOC01-appb-T000175
Figure JPOXMLDOC01-appb-T000176
Figure JPOXMLDOC01-appb-T000176
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000179
Figure JPOXMLDOC01-appb-T000179
Figure JPOXMLDOC01-appb-T000180
Figure JPOXMLDOC01-appb-T000180
Figure JPOXMLDOC01-appb-T000181
Figure JPOXMLDOC01-appb-T000181
Figure JPOXMLDOC01-appb-T000182
Figure JPOXMLDOC01-appb-T000182
Figure JPOXMLDOC01-appb-T000183
Figure JPOXMLDOC01-appb-T000183
Figure JPOXMLDOC01-appb-T000184
Figure JPOXMLDOC01-appb-T000184
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000191
Figure JPOXMLDOC01-appb-T000191
Figure JPOXMLDOC01-appb-T000192
Figure JPOXMLDOC01-appb-T000192
Figure JPOXMLDOC01-appb-T000193
Figure JPOXMLDOC01-appb-T000193
Figure JPOXMLDOC01-appb-T000194
Figure JPOXMLDOC01-appb-T000194
Figure JPOXMLDOC01-appb-T000195
Figure JPOXMLDOC01-appb-T000195
Figure JPOXMLDOC01-appb-T000196
Figure JPOXMLDOC01-appb-T000196
Figure JPOXMLDOC01-appb-T000197
Figure JPOXMLDOC01-appb-T000197
Figure JPOXMLDOC01-appb-T000198
Figure JPOXMLDOC01-appb-T000198
Figure JPOXMLDOC01-appb-T000199
Figure JPOXMLDOC01-appb-T000199
Figure JPOXMLDOC01-appb-T000200
Figure JPOXMLDOC01-appb-T000200
Figure JPOXMLDOC01-appb-T000201
Figure JPOXMLDOC01-appb-T000201
Figure JPOXMLDOC01-appb-T000202
Figure JPOXMLDOC01-appb-T000202
Figure JPOXMLDOC01-appb-T000203
Figure JPOXMLDOC01-appb-T000203
Figure JPOXMLDOC01-appb-T000204
Figure JPOXMLDOC01-appb-T000204
Figure JPOXMLDOC01-appb-T000205
Figure JPOXMLDOC01-appb-T000205
Figure JPOXMLDOC01-appb-T000206
Figure JPOXMLDOC01-appb-T000206
Figure JPOXMLDOC01-appb-T000207
Figure JPOXMLDOC01-appb-T000207
Figure JPOXMLDOC01-appb-T000208
Figure JPOXMLDOC01-appb-T000208
Figure JPOXMLDOC01-appb-T000209
Figure JPOXMLDOC01-appb-T000209
Figure JPOXMLDOC01-appb-T000210
Figure JPOXMLDOC01-appb-T000210
Figure JPOXMLDOC01-appb-T000211
Figure JPOXMLDOC01-appb-T000211
Figure JPOXMLDOC01-appb-T000212
Figure JPOXMLDOC01-appb-T000212
Figure JPOXMLDOC01-appb-T000213
Figure JPOXMLDOC01-appb-T000213
[合成例20〕
 3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(化合物番号:(2)-2)
[Synthesis Example 20]
3- (4,4-Difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (Compound No. (2) -2)
 ステップ1:3-(3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリンの製造
 2L三頸フラスコ中、(Z)-2-(3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-3-ヒドロキシアクリルアルデヒド(23g、0.1mol)及び2-フルオロアニリン(16.7g、0.16mol)のキシレン(300ml)溶液を3時間加熱還流した後、イートン試薬(五酸化リン-メタンスルホン酸溶液、重量比1:10)(300ml)を滴下し、更に3時間加熱還流した。反応液に氷冷下、水(500ml)を加え、キシレンで洗浄した水層を炭酸カリウムでアルカリ性とし、酢酸エチルで抽出し、硫酸マグネシウムで乾燥させ、ろ過及び濃縮した。得られた残渣をシリカゲルカラムクロマト(ヘキサン/酢酸エチル=7/3)により精製し、3-(3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(17.7g)の白色固体を収率58%で得た。
 H-NMR (CDCl) δ:9.14 (1H, d, J = 2.1 Hz),8.42 (1H, t, J = 1.7 Hz), 7.68 (1H, d, J = 8.0 Hz), 7.53 (1H, td, J = 8.0, 4.9 Hz), 7.47-7.41 (2H, m), 7.28 (1H, dd, J = 7.6, 0.6 Hz), 7.26-7.23 (1H, m), 7.17 (1H, dd, J = 7.8, 0.8 Hz), 2.88 (2H, s), 1.34 (6H, s)
Step 1: Preparation of 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline In a 2 L three-necked flask, (Z) -2- (3,3-dimethyl-3 , 4-Dihydroisoquinolin-1-yl) -3-hydroxyacrylaldehyde (23 g, 0.1 mol) and 2-fluoroaniline (16.7 g, 0.16 mol) in xylene (300 ml) were heated to reflux for 3 hours. Eaton's reagent (phosphorus pentoxide-methanesulfonic acid solution, weight ratio 1:10) (300 ml) was added dropwise, and the mixture was further heated to reflux for 3 hours. Water (500 ml) was added to the reaction solution under ice cooling, and the aqueous layer washed with xylene was made alkaline with potassium carbonate, extracted with ethyl acetate, dried over magnesium sulfate, filtered and concentrated. The obtained residue was purified by silica gel column chromatography (hexane / ethyl acetate = 7/3) to give 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (17. 7 g) of white solid was obtained in 58% yield.
1 H-NMR (CDCl 3 ) δ: 9.14 (1H, d, J = 2.1 Hz), 8.42 (1H, t, J = 1.7 Hz), 7.68 (1H, d, J = 8.0 Hz), 7.53 (1H, td, J = 8.0, 4.9 Hz), 7.47-7.41 (2H, m), 7.28 (1H, dd, J = 7.6, 0.6 Hz), 7.26-7.23 (1H, m), 7.17 (1H, dd, J = 7.8, 0.8 Hz), 2.88 (2H, s), 1.34 (6H, s)
 ステップ2:3-(4,4-ジブロモ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリンの製造
 1L三頸フラスコ中、3-(3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(17.7g、58mmol)のクロロベンゼン(400ml)溶液に1,3-ジブロモ-5,5-ジメチルヒダントイン(19.1g、66.8mmol)及びパーロイルTCP(ビス(4-t-ブチルシクロヘキシル)パーオキシジカーボネート)を加え、70℃で3時間加熱撹拌した。反応液をろ過し、ろ液を濃縮して3-(4,4-ジブロモ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリンを褐色固体として得、それをそのまま次の工程に用いた。
Step 2: Preparation of 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline 3- (3,3-dimethyl in a 1 L three-necked flask To a solution of -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (17.7 g, 58 mmol) in chlorobenzene (400 ml), 1,3-dibromo-5,5-dimethylhydantoin (19.1 g, 66. 8 mmol) and paroyl TCP (bis (4-t-butylcyclohexyl) peroxydicarbonate) were added, and the mixture was heated and stirred at 70 ° C. for 3 hours. The reaction was filtered and the filtrate was concentrated to give 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline as a brown solid, which Was used as is in the next step.
 ステップ3:3-(4,4-ジフルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリンの製造
 500mLのPFA(ポリテトラフルオロエチレン)フラスコ中、トリエチルアミン三フッ化水素(18.7g、116mmol)に3-(4,4-ジブロモ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(24.4g、58mmol)のクロロベンゼン(45ml)溶液を加え、85℃で5時間加熱撹拌した。反応液に20%水酸化カリウム(100ml)を加え、分液し、有機層を硫酸マグネシウムで乾燥させ、ろ過及び濃縮した。得られた残渣をシリカゲルカラムクロマト(ヘキサン/酢酸エチル=7/3)により精製し、3-(4,4-ジフルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン(18.4g)の白色固体を収率93%で得た。
H-NMR (CDCl) δ: 9.18 (1H, d, J = 2.1 Hz), 8.44 (1H, t, J = 1.7 Hz), 7.89 (1H, d, J = 7.6 Hz), 7.70-7.66 (2H, m), 7.59-7.53 (2H, m), 7.49 (1H, ddd, J = 10.4, 7.8, 1.4 Hz), 7.31 (1H, dd, J = 7.6, 0.9 Hz), 1.46 (6H, s)
Step 3: Preparation of 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline Triethylamine trioxide in a 500 mL PFA (polytetrafluoroethylene) flask Hydrogen fluoride (18.7 g, 116 mmol) to 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (24.4 g, 58 mmol) Chlorobenzene (45 ml) solution was added, and the mixture was heated with stirring at 85 ° C. for 5 hours. To the reaction solution was added 20% potassium hydroxide (100 ml), and the mixture was separated, and the organic layer was dried over magnesium sulfate, filtered and concentrated. The obtained residue was purified by silica gel column chromatography (hexane / ethyl acetate = 7/3) to give 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8. -A white solid of fluoroquinoline (18.4 g) was obtained in 93% yield.
1 H-NMR (CDCl 3 ) δ: 9.18 (1H, d, J = 2.1 Hz), 8.44 (1H, t, J = 1.7 Hz), 7.89 (1H, d, J = 7.6 Hz), 7.70-7.66 (2H, m), 7.59-7.53 (2H, m), 7.49 (1H, ddd, J = 10.4, 7. 8, 1.4 Hz), 7.31 (1H, dd, J = 7.6, 0.9 Hz), 1.46 (6H, s)
[合成例21]
 8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリン(化合物番号:(2)-3)
[Synthesis Example 21]
8-Fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline (compound number: (2) -3)
 ステップ1:8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-3,4-ジヒドロイソキノリン-1-イル)キノリンの製造
 500mL三頸フラスコ中、濃硫酸(115mL)に、氷冷下、3-シアノ-8-フルオロキノリン(20.6g、0.12mol)及び3-(2-フルオロフェニル)-2,3-ジメチルブタン-2-オール(28.3g、0.144mmol)のジクロロエタン(40ml)溶液を滴下し、室温で18時間攪拌した。反応液に氷と酢酸エチルを加え、水層をアンモニア水でアルカリ性とし、酢酸エチルで抽出し、硫酸マグネシウムで乾燥させ、ろ過及び濃縮した。得られた残渣をクロロホルムに溶かし、不溶物をろ別し、ろ液を濃縮して得た残渣をイソプロピルエーテルと酢酸エチルの混合液で晶析し、8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(16.7g)の白色固体を収率40%で得た。
 H-NMR (CDCl) δ: 9.06 (1H, d, J = 2.1 Hz), 8.36 (1H, t, J = 1.7 Hz), 7.67 (1H, d, J = 8.3 Hz), 7.53 (1H, td, J = 8.0, 4.9 Hz), 7.46 (1H, ddd, J = 10.5, 7.7, 1.3 Hz), 7.23-7.15 (2H, m), 6.94 (1H, dd, J = 7.0, 1.8 Hz), 1.46 (6H, s), 1.34 (6H, d, J = 13.1 Hz)
Step 1: Preparation of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline Concentrated sulfuric acid (115 mL) in a 500 mL three-necked flask Under ice-cooling, 3-cyano-8-fluoroquinoline (20.6 g, 0.12 mol) and 3- (2-fluorophenyl) -2,3-dimethylbutan-2-ol (28.3 g, 0.12 mol) were added. 144 mmol) in dichloroethane (40 ml) was added dropwise and stirred at room temperature for 18 hours. Ice and ethyl acetate were added to the reaction solution, and the aqueous layer was made alkaline with aqueous ammonia, extracted with ethyl acetate, dried over magnesium sulfate, filtered and concentrated. The obtained residue was dissolved in chloroform, insoluble matters were filtered off, the filtrate was concentrated, and the obtained residue was crystallized from a mixed solution of isopropyl ether and ethyl acetate to give 8-fluoro-3- (5-fluoro- A white solid of 3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline (16.7 g) was obtained in 40% yield.
1 H-NMR (CDCl 3 ) δ: 9.06 (1H, d, J = 2.1 Hz), 8.36 (1H, t, J = 1.7 Hz), 7.67 (1H, d, J = 8.3 Hz), 7.53 (1H, td, J = 8.0, 4.9 Hz), 7.46 (1H, ddd, J = 10.5, 7.7, 1.3 Hz) ), 7.23-7.15 (2H, m), 6.94 (1H, dd, J = 7.0, 1.8 Hz), 1.46 (6H, s), 1.34 (6H, d, J = 13.1 Hz)
 ステップ2:8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリンの製造
 窒素雰囲気下、2L三頸フラスコ中、8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(16.7g、47.7mmol)のエタノール(477mL)溶液に、水素化ホウ素ナトリウム(5.4g、0.14mol)を加え、室温で0.5時間攪拌し、更に3時間加熱還流させた。反応液に水を加えエタノールを留去し得られた残渣に、水と酢酸エチルを加え、有機層を硫酸マグネシウムで乾燥させ、ろ過及び濃縮した。得られた残渣をイソプロピルエーテルと酢酸エチルの混合液で晶析し、8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリン(8.7g)の淡黄色固体を収率52%で得た。 
 H-NMR (CDCl) δ:8.84 (1H, d, J = 2.1 Hz), 8.09 (1H, t, J = 1.8 Hz), 7.58 (1H, d, J = 8.3 Hz), 7.48 (1H, td, J = 8.0, 5.0 Hz), 7.38 (1H, ddd, J = 10.6, 7.7, 1.3 Hz), 6.95 (1H, td, J = 8.0, 5.2 Hz), 6.90-6.85 (1H, m), 6.43 (1H, d, J = 7.6 Hz), 5.41 (1H, s), 1.54 (3H, s), 1.46 (3H, d, J = 4.6 Hz), 1.31 (3H, s), 1.20 (3H, s)
Step 2: Preparation of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline under nitrogen atmosphere In a flask, 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline (16.7 g, 47.7 mmol) in ethanol (477 mL). ) Sodium borohydride (5.4 g, 0.14 mol) was added to the solution, and the mixture was stirred at room temperature for 0.5 hour and further heated to reflux for 3 hours. Water and ethyl acetate were added to the residue obtained by adding water to the reaction solution and distilling off ethanol, and the organic layer was dried over magnesium sulfate, filtered and concentrated. The obtained residue was crystallized with a mixed solution of isopropyl ether and ethyl acetate, and 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinoline). A light yellow solid of -1-yl) quinoline (8.7 g) was obtained in 52% yield.
1 H-NMR (CDCl 3 ) δ: 8.84 (1H, d, J = 2.1 Hz), 8.09 (1H, t, J = 1.8 Hz), 7.58 (1H, d, J = 8.3 Hz), 7.48 (1H, td, J = 8.0, 5.0 Hz), 7.38 (1H, ddd, J = 10.6, 7.7, 1.3 Hz) ), 6.95 (1H, td, J = 8.0, 5.2 Hz), 6.90-6.85 (1H, m), 6.43 (1H, d, J = 7.6 Hz) , 5.41 (1H, s), 1.54 (3H, s), 1.46 (3H, d, J = 4.6 Hz), 1.31 (3H, s), 1.20 (3H, s)
[合成例22]
 8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(化合物番号:(2)-4)
 窒素雰囲気下、200mL三頸フラスコ中、トリフルオロメタンスルホン酸(100g、0.67mol)に、氷冷下、3-シアノ-8-フルオロキノリン(9.3g、54mmol)及び1-(2-フルオロフェニル)-2-メチルプロパン-2-オール(10.9g、65mmol)を滴下し、18時間室温で攪拌した。反応液を氷水に空け、酢酸エチルで洗浄した水層をアンモニア水でアルカリ性とし、酢酸エチルで抽出し、有機層を水洗し、硫酸マグネシウムで乾燥させ、ろ過及び濃縮した。得られた残渣に10%水酸化ナトリウム水(50ml)を加え1時間加熱還流した。反応液を酢酸エチルで抽出し、硫酸マグネシウムで乾燥させ、ろ過及び濃縮し、8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン(10.2g)の白色固体を収率59%で得た。
 H-NMR (CDCl) δ: 9.12 (1H, d, J = 2.0 Hz), 8.41 (1H, t, J = 1.8 Hz), 7.68 (1H, d, J = 8.3 Hz), 7.53 (1H, td, J = 7.9, 4.9 Hz), 7.46 (1H, ddd, J = 10.4, 7.8, 1.3 Hz), 7.25-7.16 (2H, m), 7.00 (1H, dd, J = 6.6, 2.0 Hz), 2.89 (2H, s), 1.35 (6H, d, J = 9.5 Hz)
[Synthesis Example 22]
8-Fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (compound number: (2) -4)
Under a nitrogen atmosphere, in a 200 mL three-neck flask, trifluoromethanesulfonic acid (100 g, 0.67 mol) was added to 3-cyano-8-fluoroquinoline (9.3 g, 54 mmol) and 1- (2-fluorophenyl) under ice cooling. ) -2-Methylpropan-2-ol (10.9 g, 65 mmol) was added dropwise and stirred for 18 hours at room temperature. The reaction solution was poured into ice water, and the aqueous layer washed with ethyl acetate was made alkaline with aqueous ammonia and extracted with ethyl acetate. The organic layer was washed with water, dried over magnesium sulfate, filtered and concentrated. To the obtained residue was added 10% aqueous sodium hydroxide (50 ml), and the mixture was heated to reflux for 1 hour. The reaction was extracted with ethyl acetate, dried over magnesium sulfate, filtered and concentrated to 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline ( 10.2 g) of white solid was obtained in 59% yield.
1 H-NMR (CDCl 3 ) δ: 9.12 (1H, d, J = 2.0 Hz), 8.41 (1H, t, J = 1.8 Hz), 7.68 (1H, d, J = 8.3 Hz), 7.53 (1H, td, J = 7.9, 4.9 Hz), 7.46 (1H, ddd, J = 10.4, 7.8, 1.3 Hz) ), 7.25-7.16 (2H, m), 7.00 (1H, dd, J = 6.6, 2.0 Hz), 2.89 (2H, s), 1.35 (6H, d, J = 9.5 Hz)
[試験例1]コムギ葉枯病菌(Septoria tritici)および灰色かび病菌(Botrytis cinerera)に対する抗菌試験
 ジメチルスルホキシドを用いて、本発明化合物およびキノリン系化合物(2)-1、(2)-2、(2)-3、(2)-4の1000ppm溶液を作成した。次に、96ウェルのマイクロタイタープレートに対し、有効成分の終濃度が、本発明化合物が10ppm、またはキノリン系化合物が10ppm、またはそれらの組み合わせとなるように、作成した各種化合物の1000ppmジメチルスルホキシド溶液と各病原菌の胞子懸濁液(胞子密度1×10胞子/mL)を適量ずつ分注して良く混合した。マイクロタイタープレートは、暗所、18℃にて密閉容器中で培養し、0日後から7日後における薬剤処理区と薬剤無処理区の菌の増殖度を測定した。薬剤処理による菌の生育阻害率を、以下の計算式から算出した。
 生育阻害率=(1-薬剤処理区の増殖度/薬剤無処理区の増殖度)×100
 本発明化合物とキノリン系化合物を組み合わせた抗菌試験結果を、表6、表7、表8、および表9(コムギ葉枯病菌)、ならびに表10、表11、表12および表13(灰色かび病菌)に示す。表中、“H”は生育阻害率が75%より大きいこと表し、“M”は生育阻害率が40%以上75%以下であることを表し、“L”は生育阻害率が40%未満であることを表し、“ND”は生育阻害率が算出できないことを表す。また、表中の番号欄の“無処理”は、本発明化合物またはキノリン系化合物を含有しないことを表す。
[Test Example 1] Antibacterial test against wheat leaf blight fungus (Septoria tritici) and gray mold fungus (Botrytis cineera) Using dimethyl sulfoxide, the compound of the present invention and the quinoline compounds (2) -1, (2) -2, ( 1000 ppm solutions of 2) -3 and (2) -4 were prepared. Next, a 1000 ppm dimethyl sulfoxide solution of various compounds prepared so that the final concentration of the active ingredient is 10 ppm for the compound of the present invention, 10 ppm for the quinoline compound, or a combination thereof with respect to a 96-well microtiter plate. And a spore suspension of each pathogen (spore density 1 × 10 5 spores / mL) were dispensed in appropriate amounts and mixed well. The microtiter plate was cultured in a closed container at 18 ° C. in the dark, and the growth degree of the bacteria in the drug-treated group and the drug-untreated group was measured after 0 to 7 days. The growth inhibition rate of bacteria by chemical treatment was calculated from the following formula.
Growth inhibition rate = (1−Growth degree in drug-treated section / Growth degree in non-drug-treated section) × 100
The antibacterial test results obtained by combining the compound of the present invention and the quinoline compound are shown in Table 6, Table 7, Table 8, and Table 9 (wheat leaf blight fungus), and Table 10, Table 11, Table 12 and Table 13 (Gray mold fungus). ). In the table, “H” indicates that the growth inhibition rate is greater than 75%, “M” indicates that the growth inhibition rate is 40% or more and 75% or less, and “L” indicates that the growth inhibition rate is less than 40%. “ND” indicates that the growth inhibition rate cannot be calculated. Further, “no treatment” in the number column in the table indicates that the compound of the present invention or the quinoline compound is not contained.
Figure JPOXMLDOC01-appb-T000214
Figure JPOXMLDOC01-appb-T000214
Figure JPOXMLDOC01-appb-T000215
Figure JPOXMLDOC01-appb-T000215
Figure JPOXMLDOC01-appb-T000216
Figure JPOXMLDOC01-appb-T000216
Figure JPOXMLDOC01-appb-T000217
Figure JPOXMLDOC01-appb-T000217
Figure JPOXMLDOC01-appb-T000218
Figure JPOXMLDOC01-appb-T000218
Figure JPOXMLDOC01-appb-T000219
Figure JPOXMLDOC01-appb-T000219
Figure JPOXMLDOC01-appb-T000220
Figure JPOXMLDOC01-appb-T000220
Figure JPOXMLDOC01-appb-T000221
Figure JPOXMLDOC01-appb-T000221
[試験例2]病害防除試験
 本試験例では、キノリン系化合物(2)-2、(2)-3、(2)-4のトマト灰色かび病(GMと表記)、イネいもち病(Bと表記)、キュウリ炭そ病(Aと表記)、リンゴ黒星病(ASと表記)、キャベツ黒すす病(CAと表記)に対する防除試験を行った。以下に試験方法の詳細を示した。
[Test Example 2] Disease Control Test In this test example, quinoline compounds (2) -2, (2) -3, and (2) -4 were tested for tomato gray mold (noted as GM), rice blast (B and Control test was conducted against cucumber anthracnose (denoted as A), apple black spot disease (denoted as AS), and cabbage black soot disease (denoted as CA). Details of the test method are shown below.
(トマト灰色かび病:GM)
 供試植物(トマト品種:大型福寿)を播種後、本葉が3枚展開するまで栽培した。試験では、各化合物が50ppmの濃度となるように蒸留水で希釈した希釈液を散布した。散布1日後の苗に、灰色かび病菌(Botrytis cinerea)の分生胞子を噴霧接種した後、室温が20~23℃の接種室に約48時間放置し、発病を促した。接種2日後の発病程度を調査し、その効果を評価した。
(イネいもち病:B)
 供試植物(イネ品種:幸風)を播種後、第2葉が展開するまで栽培した。試験では、各化合物が50ppmの濃度となるように蒸留水で希釈した希釈液を散布した。散布1日後の苗に、イネいもち病菌(Magnaporthe grisea)の分生胞子を噴霧接種した後、室温が20~23℃の接種室に約24時間放置し、発病を促した。接種10日後の発病程度を調査し、その効果を評価した。
(キュウリ炭そ病:A)
 供試植物(キュウリ品種:相模半白)を播種後、本葉が1枚展開するまで栽培した。試験では、各化合物が50ppmの濃度となるように蒸留水で希釈した希釈液を散布した。散布1日後の苗に、キュウリ炭疽病菌(Colletotrichum orbiculare)の分生胞子を噴霧接種した後、室温が20~23℃の接種室に約24時間放置し、発病を促した。接種10日後の発病程度を調査し、その効果を評価した。
(リンゴ黒星病:AS)
 供試植物(リンゴ品種:王林)を播種後、本葉が4枚展開するまで栽培した。試験では、各化合物が50ppmの濃度となるように蒸留水で希釈した希釈液を散布した。散布1日後の苗に、リンゴ黒星病菌(Venturia inaequalis)の分生胞子を噴霧接種した後、室温が18~20℃の接種室に約24時間放置し、発病を促した。接種10日後の発病程度を調査し、その効果を評価した。
(キャベツ黒すす病:CA)
 供試植物(キャベツ品種:四季穫)を播種後、子葉が展開するまで栽培した。試験では、各化合物が250ppmの濃度となるように蒸留水で希釈した希釈液を散布した。散布1日後の苗に、キャベツ黒すす病菌(Alternaria brassicicola)の分生胞子を噴霧接種した後、室温が20~23℃の接種室に約48時間放置し、発病を促した。接種2日後の発病程度を調査し、その効果を評価した。
(Tomato gray mold: GM)
After sowing the test plant (tomato variety: large Fuju), it was cultivated until three true leaves were developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm. The seedlings one day after the spraying were spray-inoculated with conidia of Botrytis cinerea , and then left in an inoculation room at room temperature of 20-23 ° C. for about 48 hours to promote disease. The degree of illness 2 days after inoculation was investigated and the effect was evaluated.
(Rice blast: B)
After sowing the test plant (rice cultivar: Kofu), the plant was cultivated until the second leaf developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm. The seedlings one day after spraying were spray-inoculated with conidia of rice blast fungus ( Magnaporthe grisea ), and then left in an inoculation room at a room temperature of 20-23 ° C. for about 24 hours to promote onset. The degree of disease on the 10th day after inoculation was investigated and the effect was evaluated.
(Cucumber anthracnose: A)
After sowing the test plant (cucumber variety: Sagamihanjiro), it was cultivated until one true leaf developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm. The seedlings one day after the spraying were spray-inoculated with conidia of Colletotrichum orbiculare , and then left in an inoculation room at a room temperature of 20 to 23 ° C. for about 24 hours to promote disease. The degree of disease on the 10th day after inoculation was investigated and the effect was evaluated.
(Apple black spot disease: AS)
After sowing the test plant (apple variety: Wang Lin), the plant was cultivated until four true leaves developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 50 ppm. The seedlings one day after spraying were spray-inoculated with conidia of Venturia inaequalis and then left in an inoculation room at room temperature of 18 to 20 ° C. for about 24 hours to promote disease. The degree of disease on the 10th day after inoculation was investigated and the effect was evaluated.
(Cabbage black soot disease: CA)
After sowing the test plant (cabbage variety: seasonal harvest), it was cultivated until the cotyledon developed. In the test, a diluted solution diluted with distilled water was sprayed so that each compound had a concentration of 250 ppm. The seedlings one day after the spraying were spray-inoculated with conidia of cabbage black soot fungus (Alternaria brassicicola) and then left in an inoculation room at room temperature of 20 to 23 ° C. for about 48 hours to promote the onset of disease. The degree of illness 2 days after inoculation was investigated and the effect was evaluated.
 以上の方法で評価した病害防除試験について、以下を指標として発病程度を評価した。なお、防除価は発病程度から算出した。
[発病程度]
 0  :無発病
 0.1:発病面積が3%程度
 0.3:発病面積が10%程度
 0.8:発病面積が25%程度
 1.5:発病面積が50%程度
 2   :発病面積が70%程度
 3   :発病面積が95%以上
 [防除価]
 防除価=100{1-(n/N)}
 N=無処理区の発病程度, n=各区の発病程度
 キノリン系化合物の防除試験の結果、トマト灰色かび病、イネいもち病、キュウリ炭そ病、リンゴ黒星病、キャベツ黒すす病に対し、化合物(2)-2、(2)-3、(2)-4は、防除価95%以上の高い防除効果を示した。
About the disease control test evaluated by the above method, the onset degree was evaluated using the following as an index. The control value was calculated from the disease severity.
[Degree of disease]
0: No disease 0.1: Onset area is about 3% 0.3: Onset area is about 10% 0.8: Onset area is about 25% 1.5: Onset area is about 50% 2: Onset area is 70 About% 3: Disease area is 95% or more [control value]
Control value = 100 {1- (n / N)}
N = degree of disease in untreated group, n = degree of disease in each group As a result of quinoline compound control test, compounds against tomato gray mold, rice blast, cucumber anthracnose, apple black spot, cabbage black soot (2) -2, (2) -3 and (2) -4 showed a high control effect with a control value of 95% or more.
[試験例3]各種病原菌に対する抗菌試験
 試験例1と同様の方法、同様の濃度で、キノリン系化合物のキュウリつる割病菌(Fusarium oxysporum f.sp. cucumerinum)、炭そ病菌(Glomerella cingulata)、イネごま葉枯病菌(Cochlobolus miyabeanus)、ブドウ黒とう病菌(Elinoe ampelina)に対する抗菌活性を測定した。
 キノリン系化合物の抗菌試験の結果、キュウリつる割病菌、炭そ病菌、イネごま葉枯病菌、ブドウ黒とう病菌に対し、化合物(2)-2、(2)-3、(2)-4は各病原菌の生育を完全に阻止した。
[Test Example 3] Antibacterial test against various pathogens In the same manner and in the same concentration as in Test Example 1, quinoline compounds Fusarium oxysporum f. Sp. Cucumerinum, Anthracnose fungus (Glomerella cingulata), rice Antibacterial activity against sesame leaf blight fungus (Cochrobulus Miyabeanus) and grape black rot fungus (Elinoe ampelina) was measured.
As a result of the antibacterial test of quinoline compounds, compound (2) -2, (2) -3, (2) -4 was found to be effective against cucumber vine split fungus, anthrax fungus, rice sesame leaf blight fungus, and grape black rot fungus. The growth of each pathogen was completely prevented.
 本発明にかかる有害生物防除組成物および新規キノリン系化合物は、優れた有害生物防除効果を示すことから、農薬としての利用価値がある。 The pest control composition and the novel quinoline compound according to the present invention have an excellent pest control effect and thus have utility value as an agrochemical.

Claims (14)

  1.  式(1)
    Figure JPOXMLDOC01-appb-C000001

    [式中、R1は、水酸基、
     シアノ基、
     置換基Aで適宜置換されてもよいC1~C6のアルキル基、
     C1~C6のハロアルキル基、
     置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
     置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
     C2~C6のハロアルケニル基、
     置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
     C2~C6のハロアルキニル基、
     置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
     C1~C6のハロアルコキシ基、
     置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
     置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
     C2~C6のハロアルケニルオキシ基、
     置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
     C3~C6のハロアルキニルオキシ基、
     またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)を表し;
    R2は、ハロゲン原子、
     水酸基、
     シアノ基、
     ニトロ基、
     置換基Bで適宜置換されてもよいC1~C6のアルキル基、
     C1~C6のハロアルキル基、
     置換基Bで適宜置換されてもよいC3~C8のシクロアルキル基、
     置換基Bで適宜置換されてもよいC2~C6のアルケニル基、
     C2~C6のハロアルケニル基、
     置換基Bで適宜置換されてもよいC2~C6のアルキニル基、
     C2~C6のハロアルキニル基、
     置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、
     C1~C6のハロアルコキシ基、
     置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、
     置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、
     C2~C6のハロアルケニルオキシ基、
     置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、
     C3~C6のハロアルキニルオキシ基、
     R20C(=O)-(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)、
     R20C(=O)O-(ここで、R20は、前記と同義である。)、
     1~2個の酸素原子を含む3~6員環の基、
     R23-L2-(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)、
     R21R22N-(ここで、R21およびR22は、前記と同義である。)、
     またはR24C(=O)N(R25)-(ここで、R24は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、前記と同義である。)を表し、R25は、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
    R3は、水素原子、
     ハロゲン原子、
     ニトロ基、
     置換基Cで適宜置換されてもよいC1~C6のアルキル基、
     C1~C6のハロアルキル基、
     置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
     置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
     C1~C6のハロアルコキシ基、
     置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
     C2~C6のハロアルケニル基、
     置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
     C2~C6のハロアルキニル基、
     R30-L3-(ここで、R30は、前記のR23と同義であり、L3は、前記のL2と同義である。)、
     R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、
     またはR33C(=O)-(ここで、R33は、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
    nは、0~5の整数(ただし、nが2以上のとき、2以上のR2は、それぞれ独立した置換基を表す。)を表し;
    Xは、酸素原子、または硫黄原子を表し;
    Yは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表し、
     該フェニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~4置換し、
     該ピリジル基、該ピラジニル基、該ピリミジニル基、該ピリダジニル基、該トリアジニル基、または該テトラジニル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~3置換し、
     該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Dがオルト位に置換し、さらに置換基D1が、それぞれ独立して適宜0~2置換し;
    破線部を含む結合は、二重結合、または単結合を表し、
     そして、置換基Aは、
     水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R12R13N-(ここで、R12およびR13は、それぞれ独立していて、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR12およびR13は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、およびR14-L1-(ここで、R14は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L1は、S、SO、またはSOを表す。)からなる群から選択される少なくとも1種であり;
    置換基Bは、
     水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、R21R22N-(ここで、R21およびR22は、前記と同義である。)、R23-L2-(ここで、R23およびL2は、前記と同義である。)、R26R27R28Si-(ここで、R26、R27およびR28は、それぞれ独立していてC1~C6のアルキル基を表す。)、R26R27R28Si-(CH)s-O-(ここで、sは、1~3の整数を表し、R26、R27およびR28は、前記と同義である。)、R20C(=O)-(ここで、R20は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種であり;
    置換基B1は、
     シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
    置換基Cは、
     水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、R31R32N-(ここで、R31およびR32は、前記のR21およびR22と同義である。)、およびR30-L3-(ここで、R30は、前記のR14と同義であり、L3は、前記のL1と同義である。)からなる群から選択される少なくとも1種であり;
    置換基Dは、
     ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、およびC1~C6のハロアルコキシ基からなる群から選択される少なくとも1種であり;
    置換基D1は、
     水酸基、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種である。]で表されるピリドン化合物またはその塩と、
    式(2a)又は式(2b)
    Figure JPOXMLDOC01-appb-C000002

    [式中、R2a及びR2bはそれぞれ独立していて、
     置換基E1で適宜置換されてもよいC1~C6のアルキル基、
     置換基E2で適宜置換されてもよいアリール基、
     置換基E3で適宜置換されてもよいヘテロアリール基、
     または置換基E2で適宜置換されてもよいアラルキル基を表すか、
     あるいはR2aとR2bは、それらが結合する炭素原子と一緒になって置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよく;
    R2c及びR2dはそれぞれ独立していて、
     水素原子、
     置換基E1で適宜置換されてもよいC1~C6のアルキル基、
     ハロゲン原子、
     C1~C6のアルコキシ基、
     または水酸基を表すか、
     あるいはR2cとR2dは、それらが結合する炭素原子と一緒になってカルボニル基又は置換基E4で適宜置換されてもよいC3~C10のシクロアルキル環を形成してもよく;
    R2eは、
     水素原子、
     C2~C7のアシル基、
     または置換基E1で適宜置換されてもよいC1~C6のアルキル基を表し;
    X1は、ハロゲン原子、
     置換基E5で適宜置換されてもよいC1~C6のアルキル基、
     置換基E6で適宜置換されてもよいC2~C6のアルケニル基、
     置換基E7で適宜置換されてもよいC2~C6のアルキニル基、
     置換基E2で適宜置換されてもよいアリール基、
     置換基E3で適宜置換されてもよいヘテロアリール基、
     C1~C6のアルコキシ基、
     置換基E8で適宜置換されてもよいアミノ基、
     C2~C7のアシル基、
     シアノ基、
     または置換基E9で水酸基の水素原子が置換されてよいN-ヒドロキシアルカンイミドイル基を表し;、
    X2は、ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基又は水酸基を表し、
    n1は0~4の整数を表し、
    n2は0~6の整数を表し、
    置換基E1は、
     ハロゲン原子、C1~C6のアルコキシ基、C1~C6のアルキルチオ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
    置換基E2は、
     ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、置換基E8で適宜置換されてもよいアミノ基、ニトロ基、シアノ基、水酸基、メルカプト基及びC1~C6のアルキルチオ基からなる群から選択される少なくとも1種であり;
    置換基E3は、
     ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基及びC1~C6のアルコキシ基からなる群から選択される少なくとも1種であり;
    置換基E4は、
     ハロゲン原子、C1~C6のアルキル基、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
    置換基E5は、
     ハロゲン原子、C1~C6のアルコキシ基、水酸基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種であり;
    置換基E6は、
     ハロゲン原子、C1~C6のアルコキシ基、C2~C7のアルキルオキシカルボニル基及びフェノキシ基からなる群から選択される少なくとも1種であり;
    置換基E7は、
     ハロゲン原子、C1~C6のアルコキシ基及びフェノキシ基からなる群から選択される少なくとも1種であり;
    置換基E8は、
     C1~C6のアルキル基及びC2~C7のアシル基からなる群から選択される少なくとも1種であり;
    置換基E9は、
     C1~C6のアルキル基、C2~C6のアルケニル基、C2~C6のアルキニル基、アラルキル基、アリール基及びヘテロアリール基からなる群から選択される少なくとも1種である。]で表されるキノリン系化合物またはその塩から選ばれる1種以上の成分を有効成分として含有する有害生物防除組成物。
    Formula (1)
    Figure JPOXMLDOC01-appb-C000001

    [Wherein R1 is a hydroxyl group,
    A cyano group,
    A C1-C6 alkyl group optionally substituted with substituent A,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent A,
    A C2-C6 alkenyl group optionally substituted with the substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent A,
    A C2-C6 haloalkynyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent A,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent A,
    A C2-C6 alkenyloxy group optionally substituted with the substituent A,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with the substituent A,
    A C3-C6 haloalkynyloxy group,
    Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
    R2 is a halogen atom,
    Hydroxyl group,
    A cyano group,
    Nitro group,
    A C1-C6 alkyl group optionally substituted with the substituent B,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent B,
    A C2-C6 alkenyl group optionally substituted with the substituent B,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent B,
    A C2-C6 haloalkynyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent B,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
    A C2-C6 alkenyloxy group optionally substituted with the substituent B,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with the substituent B,
    A C3-C6 haloalkynyloxy group,
    R20C (═O) — (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, a C1-C6 Represents a haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Represents what is to be formed.)
    R20C (═O) O— (wherein R20 has the same meaning as above),
    A 3- to 6-membered group containing 1 to 2 oxygen atoms,
    R23-L2- (wherein, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 represents S, SO, or SO 2.),
    R21R22N- (wherein R21 and R22 are as defined above),
    Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optionally substituted with a hydrogen atom or substituent B1. Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, which may be
    R3 is a hydrogen atom,
    Halogen atoms,
    Nitro group,
    A C1-C6 alkyl group optionally substituted with substituent C,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with substituent C,
    A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
    A C1-C6 haloalkoxy group,
    A C2-C6 alkenyl group optionally substituted with substituent C,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent C,
    A C2-C6 haloalkynyl group,
    R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above),
    R31R32N- (wherein R31 and R32 have the same meanings as R21 and R22 above),
    Or R33C (═O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group);
    n represents an integer of 0 to 5 (provided that when n is 2 or more, each R2 of 2 or more represents an independent substituent);
    X represents an oxygen atom or a sulfur atom;
    Y represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group;
    In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
    In the pyridyl group, the pyrazinyl group, the pyrimidinyl group, the pyridazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace
    In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 2 appropriately;
    A bond including a broken line part represents a double bond or a single bond,
    And the substituent A is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R12R13N- (wherein R12 and R13 are each independently Each represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 together with the nitrogen atom to which they are attached, is an aziridinyl group , An azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (wherein R14 is a C1-C6 alkyl group or a C1-C6 haloalkyl group) represents a group, is selected L1 is, S, SO, or from the group consisting of.) representing the SO 2, At least one selected from;
    Substituent B is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, C2-C6 alkoxyalkoxy group, R21R22N- R21 and R22 are as defined above), R23-L2- (where R23 and L2 are as defined above), R26R27R28Si— (wherein R26, R27 and R28 are each independently And represents an alkyl group of C1 to C6), R26R27R28Si— (CH 2 ) s—O— (wherein s represents an integer of 1 to 3, and R26, R27 and R28 are as defined above) ), R20C (═O) — (wherein R20 is as defined above), and a group of 3 to 6 membered ring containing 1 to 2 oxygen atoms. That is at least one selected from the group;
    Substituent B1 is
    At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
    Substituent C is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds;
    Substituent D is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group;
    Substituent D1 is
    Hydroxyl group, halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, and C3-C8 cycloalkoxy group Is at least one selected from the group consisting of A pyridone compound represented by the formula:
    Formula (2a) or Formula (2b)
    Figure JPOXMLDOC01-appb-C000002

    [Wherein, R2a and R2b are independent of each other;
    A C1-C6 alkyl group optionally substituted with a substituent E1,
    An aryl group which may be optionally substituted with a substituent E2,
    A heteroaryl group optionally substituted with a substituent E3;
    Or an aralkyl group that may be optionally substituted with a substituent E2, or
    Alternatively, R2a and R2b together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with substituent E4;
    R2c and R2d are each independent,
    Hydrogen atom,
    A C1-C6 alkyl group optionally substituted with a substituent E1,
    Halogen atoms,
    A C1-C6 alkoxy group,
    Or represents a hydroxyl group,
    Alternatively, R2c and R2d together with the carbon atom to which they are attached may form a C3-C10 cycloalkyl ring that may be optionally substituted with a carbonyl group or substituent E4;
    R2e is
    Hydrogen atom,
    A C2-C7 acyl group,
    Or a C1-C6 alkyl group optionally substituted with a substituent E1;
    X1 is a halogen atom,
    A C1-C6 alkyl group optionally substituted with the substituent E5,
    A C2-C6 alkenyl group optionally substituted with a substituent E6,
    A C2-C6 alkynyl group optionally substituted with a substituent E7,
    An aryl group which may be optionally substituted with a substituent E2,
    A heteroaryl group optionally substituted with a substituent E3;
    A C1-C6 alkoxy group,
    An amino group optionally substituted with a substituent E8;
    A C2-C7 acyl group,
    A cyano group,
    Or an N-hydroxyalkaneimidoyl group in which the hydrogen atom of the hydroxyl group may be substituted with a substituent E9;
    X2 represents a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group or a hydroxyl group,
    n1 represents an integer of 0 to 4,
    n2 represents an integer of 0 to 6,
    Substituent E1 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C1-C6 alkylthio group, and a phenoxy group;
    Substituent E2 is
    Halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C1-C6 alkoxy group, amino group optionally substituted with substituent E8, nitro group, cyano group, hydroxyl group, mercapto group and C1- At least one selected from the group consisting of C6 alkylthio groups;
    Substituent E3 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, and a C1-C6 alkoxy group;
    Substituent E4 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group and a phenoxy group;
    Substituent E5 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a hydroxyl group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group;
    Substituent E6 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group, a C2-C7 alkyloxycarbonyl group, and a phenoxy group;
    Substituent E7 is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkoxy group and a phenoxy group;
    Substituent E8 is
    At least one selected from the group consisting of a C1-C6 alkyl group and a C2-C7 acyl group;
    Substituent E9 is
    It is at least one selected from the group consisting of C1-C6 alkyl groups, C2-C6 alkenyl groups, C2-C6 alkynyl groups, aralkyl groups, aryl groups, and heteroaryl groups. ] The pest control composition which contains 1 or more types of components chosen from the quinoline type compound represented by these, or its salt as an active ingredient.
  2.  式(1)で表されるピリドン化合物においてR1が、シアノ基、
     置換基Aで適宜置換されてもよいC1~C6のアルキル基、
     C1~C6のハロアルキル基、
     置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
     置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
     C2~C6のハロアルケニル基、
     置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
     またはR10R11N-(ここで、R10およびR11は、それぞれ独立していて、水素原子、またはC1~C6のアルキル基を表す。)であり;
    R2が、ハロゲン原子、
     水酸基、
     シアノ基、
     置換基Bで適宜置換されてもよいC1~C6のアルキル基、
     C1~C6のハロアルキル基、
     置換基Bで適宜置換されてもよいC1~C6のアルコキシ基、
     C1~C6のハロアルコキシ基、
     置換基Bで適宜置換されてもよいC3~C8のシクロアルコキシ基、
     置換基Bで適宜置換されてもよいC2~C6のアルケニルオキシ基、
     置換基Bで適宜置換されてもよいC3~C6のアルキニルオキシ基、
     R20C(=O)O-(ここで、R20は、C1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはR21R22N-(ここで、R21およびR22は、それぞれ独立していて、水素原子、置換基B1で適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはR21およびR22は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、
     またはR23-L2-(ここで、R23は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、L2は、S、SO、またはSOを表す。)であり;
    R3が、水素原子、
     ハロゲン原子、
     置換基Cで適宜置換されてもよいC1~C6のアルキル基、
     置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
     置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
     置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
     またはR30-L3-(ここで、R30は、前記のR23と同義であり、L3は、前記のL2と同義である。)であり;
    Yが、フェニル基、またはピリジル基であり、
     該フェニル基は、置換基Dでオルト位が置換され、さらに置換基D1で、それぞれ独立して適宜0~4置換され、
     該ピリジル基は、置換基Dでオルト位が置換され、さらに置換基D1で、それぞれ独立して適宜0~3置換される、
    請求項1記載の有害生物防除組成物。
    In the pyridone compound represented by the formula (1), R1 is a cyano group,
    A C1-C6 alkyl group optionally substituted with substituent A,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent A,
    A C2-C6 alkenyl group optionally substituted with the substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent A,
    Or R10R11N- (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
    R2 is a halogen atom,
    Hydroxyl group,
    A cyano group,
    A C1-C6 alkyl group optionally substituted with the substituent B,
    A C1-C6 haloalkyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent B,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
    A C2-C6 alkenyloxy group optionally substituted with the substituent B,
    A C3-C6 alkynyloxy group optionally substituted with the substituent B,
    R20C (═O) O— (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group) , C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, C1-C6 Or a cycloalkyl group of C3 to C8, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group ),
    Or R23-L2- (., Where, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 is, S, representing a SO or SO 2,) in there;
    R3 is a hydrogen atom,
    Halogen atoms,
    A C1-C6 alkyl group optionally substituted with substituent C,
    A C3-C8 cycloalkyl group optionally substituted with substituent C,
    A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
    A C2-C6 alkynyl group optionally substituted with substituent C,
    Or R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above);
    Y is a phenyl group or a pyridyl group;
    The phenyl group is substituted at the ortho position with the substituent D, and further independently substituted with 0 to 4 substituents independently with the substituent D1,
    The pyridyl group is substituted at the ortho position with the substituent D, and further independently substituted with 0 to 3 substituents independently with the substituent D1,
    The pest control composition according to claim 1.
  3.  式(1)で表されるピリドン化合物においてR1が、置換基Aで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基を表し;
    R2が、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、または置換基Bで適宜置換されてもよいC1~C6のアルコキシ基を表し;
    R3が、水素原子、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルキル基を表す、
    請求項2に記載の有害生物防除組成物。
    In the pyridone compound represented by the formula (1), R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A;
    R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B;
    R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C.
    The pest control composition according to claim 2.
  4.  式(2a)又は式(2b)で表されるキノリン系化合物において、R2a及びR2bがそれぞれ独立していて、
    置換基E1で適宜置換されてもよいC1~C6のアルキル基であり、
    R2c及びR2dがそれぞれ独立していて、
    水素原子、置換基E1で適宜置換されてもよいC1~C6のアルキル基又はハロゲン原子であり、
    R2eが水素原子又は置換基E1で適宜置換されてもよいC1~C6のアルキル基であり、
    X1がハロゲン原子であり、
    X2がハロゲン原子であり、
    n1が0~4の整数を表し、
    n2が0~6の整数を表す請求項1記載の有害生物防除組成物。
    In the quinoline compound represented by the formula (2a) or the formula (2b), R2a and R2b are each independent,
    A C1-C6 alkyl group optionally substituted with a substituent E1;
    R2c and R2d are each independent,
    A hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent E1, or a halogen atom,
    R2e is a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent E1,
    X1 is a halogen atom,
    X2 is a halogen atom,
    n1 represents an integer of 0 to 4,
    The pest control composition according to claim 1, wherein n2 represents an integer of 0 to 6.
  5.  式(2a)又は式(2b)で表されるキノリン系化合物が式(2c)又は式(2d)
    Figure JPOXMLDOC01-appb-C000003

     [式中、R2fは水素原子又はメチル基を表し、X3、X4及びX5はそれぞれ独立して水素原子又はフッ素原子を表し、X6及びX7はそれぞれ独立して水素原子、メチル基又はフッ素原子を表す]で表されるキノリン系化合物である請求項1記載の有害生物防除組成物。
    The quinoline compound represented by formula (2a) or formula (2b) is represented by formula (2c) or formula (2d).
    Figure JPOXMLDOC01-appb-C000003

    [Wherein, R2f represents a hydrogen atom or a methyl group, X3, X4 and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group or a fluorine atom. The pesticidal composition according to claim 1, which is a quinoline compound represented by the formula:
  6.  式(2a)又は式(2b)で表されるキノリン系化合物が
    3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリン、
    3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン、
    8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリンおよび
    8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリンからなる群から選択される少なくとも1種である請求項4記載の有害生物防除組成物。
    The quinoline compound represented by the formula (2a) or the formula (2b) is 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline,
    3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline,
    8-Fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline and 8-fluoro-3- (5-fluoro- The pest control composition according to claim 4, which is at least one selected from the group consisting of 3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline.
  7.  請求項1に記載の有害生物防除組成物を施用して有害生物を防除する方法。 A method for controlling pests by applying the pest control composition according to claim 1.
  8.  請求項1に記載の式(1)で表されるピリドン化合物またはその塩を有効成分として含有する組成物と、請求項1に記載の式(2a)又は式(2b)で表されるキノリン系化合物またはその塩を有効成分として含有する組成物とを同時に施用して有害生物を防除する方法。 A composition containing a pyridone compound represented by formula (1) according to claim 1 or a salt thereof as an active ingredient, and a quinoline system represented by formula (2a) or formula (2b) according to claim 1 A method for controlling pests by simultaneously applying a compound or a salt thereof as an active ingredient.
  9.  請求項1に記載の式(1)で表されるピリドン化合物もしくはその塩を有効成分として含有する組成物、又は請求項1に記載の式(2a)もしくは式(2b)で表されるキノリン系化合物もしくはその塩を有効成分として含有する組成物のいずれか一方を施用した後に、もう一方の組成物を施用して有害生物を防除する方法。 A composition containing a pyridone compound represented by formula (1) according to claim 1 or a salt thereof as an active ingredient, or a quinoline system represented by formula (2a) or formula (2b) according to claim 1 A method of controlling pests by applying one of the compositions containing a compound or a salt thereof as an active ingredient and then applying the other composition.
  10.  請求項5に記載の式(2c)又は式(2d)で表されるキノリン系化合物であって、R2fが水素原子又はメチル基であり、X3がフッ素原子であり、X4、X5、X6及びX7がそれぞれ独立して水素原子又はフッ素原子であるが、ただし式(2c)においてはX4、X5、X6又はX7のうち少なくとも1つがフッ素原子であり、式(2d)においてはX4又はX5のいずれかがフッ素原子であるキノリン系化合物又はその塩。 A quinoline compound represented by formula (2c) or formula (2d) according to claim 5, wherein R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, and X4, X5, X6 and X7. Are each independently a hydrogen atom or a fluorine atom, provided that in formula (2c) at least one of X4, X5, X6 or X7 is a fluorine atom, and in formula (2d), either X4 or X5 A quinoline compound or a salt thereof, wherein is a fluorine atom.
  11.  式(2c)又は式(2d)で表されるキノリン系化合物が、
    3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン、
    8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリン、又は
    8-フルオロ-3-(5-フルオロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)キノリンである、
    請求項10記載のキノリン系化合物又はその塩。
    A quinoline compound represented by formula (2c) or formula (2d)
    3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline,
    8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline, or 8-fluoro-3- (5-fluoro -3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline,
    The quinoline compound or a salt thereof according to claim 10.
  12.  式(2c)又は式(2d)で表されるキノリン系化合物が、
    3-(4,4-ジフロロ-3,3-ジメチル-3,4-ジヒドロイソキノリン-1-イル)-8-フルオロキノリン又は
    8-フルオロ-3-(5-フルオロ-3,3,4,4-テトラメチル-1,2,3,4-テトラヒドロイソキノリン-1-イル)キノリンである、
    請求項11記載のキノリン系化合物又はその塩。
    A quinoline compound represented by formula (2c) or formula (2d)
    3- (4,4-Difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline or 8-fluoro-3- (5-fluoro-3,3,4,4 -Tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline,
    The quinoline-type compound or its salt of Claim 11.
  13.  有害生物を防除する方法であって、それを必要とする植物個体、種子、土壌、苗箱、又はセルトレーに請求項1に記載の式(I)の化合物またはその塩及び式(2a)又は式(2b)で表されるキノリン系化合物またはその塩の有効量を施用することを含む方法。 A method for controlling pests, wherein the compound of formula (I) or a salt thereof and formula (2a) or formula of claim 1 are applied to a plant individual, seed, soil, seedling box or cell tray in need thereof. A method comprising applying an effective amount of the quinoline compound represented by (2b) or a salt thereof.
  14.  有害生物防除剤としての請求項1に記載の式(I)の化合物またはその塩及び式(2a)又は式(2b)で表されるキノリン系化合物またはその塩の使用。 Use of the compound of formula (I) according to claim 1 or a salt thereof and the quinoline compound represented by formula (2a) or formula (2b) or a salt thereof as a pest control agent.
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