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WO2018185833A1 - Dispositif de traitement d'informations - Google Patents

Dispositif de traitement d'informations Download PDF

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Publication number
WO2018185833A1
WO2018185833A1 PCT/JP2017/014088 JP2017014088W WO2018185833A1 WO 2018185833 A1 WO2018185833 A1 WO 2018185833A1 JP 2017014088 W JP2017014088 W JP 2017014088W WO 2018185833 A1 WO2018185833 A1 WO 2018185833A1
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WO
WIPO (PCT)
Prior art keywords
plasma
unit
value
change value
power supply
Prior art date
Application number
PCT/JP2017/014088
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English (en)
Japanese (ja)
Inventor
神藤　高広
慎二 瀧川
陽大 丹羽
Original Assignee
株式会社Ｆｕｊｉ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社Ｆｕｊｉ filed Critical 株式会社Ｆｕｊｉ
Priority to PCT/JP2017/014088 priority Critical patent/WO2018185833A1/fr
Priority to CN201780089361.XA priority patent/CN110476486B/zh
Priority to JP2019510530A priority patent/JP6806883B2/ja
Publication of WO2018185833A1 publication Critical patent/WO2018185833A1/fr

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Definitions

  • the present invention relates to an information processing apparatus that monitors index values of current or voltage supplied to a plurality of electrodes of a plasma generator.
  • a processing gas is supplied to a reaction chamber, and power is supplied to a plurality of electrodes arranged in the reaction chamber. Thereby, discharge occurs in the reaction chamber, and the processing gas is turned into plasma. For this reason, it is possible to appropriately execute the plasma processing by the plasma generator by monitoring the index value of the current or voltage supplied to the plurality of electrodes of the plasma generator.
  • JP 2016-070447 A Japanese Patent Laying-Open No. 2015-149263
  • the present specification provides an index value for indexing current or voltage supplied to the plurality of electrodes of a plasma generator that generates plasma by discharge between the plurality of electrodes.
  • An acquisition unit to acquire a calculation unit that calculates a change value that is a numerical value related to a change in the index value based on the index value acquired by the acquisition unit, and the calculation unit that is calculated by the calculation unit at a predetermined timing
  • the change value is calculated by the storage unit that stores the change value as the specific change value and the calculation unit, the power supply state when the change value is calculated becomes the power supply state at the predetermined timing.
  • a first determination unit that determines whether or not the change value is calculated based on the change value and the specific change value, and the power supply state at the time of calculation of the change value by the first determination unit is the predetermined timing. If it is determined that has the power supply state in the grayed discloses an information processing apparatus including a control unit and a notification unit for notifying predetermined information.
  • whether or not the power supply state to the electrode is the power supply state at a predetermined timing is determined based on the change value related to the change in the index value of the supply current or voltage to the electrode. .
  • predetermined information is alert
  • FIG. 1 to FIG. 3 show an atmospheric pressure plasma generator 10.
  • the atmospheric pressure plasma generator 10 is an apparatus for generating plasma under atmospheric pressure, and includes a plasma gas ejection device 12, a heated gas ejection device 14, and a control device (see FIG. 4) 16.
  • FIG. 1 is a perspective view of the entire atmospheric pressure plasma generator 10 from a perspective from obliquely above.
  • FIG. 2 is a perspective view of the lower end portion of the atmospheric pressure plasma generator 10 from a perspective from obliquely below.
  • FIG. 3 is a cross-sectional view of a main part of the atmospheric pressure plasma generator 10.
  • the width direction of the atmospheric pressure plasma generator 10 is referred to as the X direction
  • the depth direction of the atmospheric pressure plasma generator 10 is referred to as the Y direction
  • the direction perpendicular to the X direction and the Y direction, that is, the vertical direction is referred to as the Z direction.
  • the plasma gas ejection device 12 includes a housing 20, a cover 22, and a pair of electrodes 24 and 26.
  • the housing 20 includes a main housing 30, a heat radiating plate 31, a ground plate 32, a lower housing 34, and a nozzle block 36.
  • the main housing 30 has a generally block shape, and a reaction chamber 38 is formed inside the main housing 30.
  • the main housing 30 is formed with a plurality of first gas passages (only one first gas passage is shown in FIG. 3) 50 so as to extend in the vertical direction.
  • the first gas flow paths 50 are arranged at a predetermined interval in the X direction. An upper end portion of each first gas channel 50 opens to the reaction chamber 38, and a lower end portion opens to the bottom surface of the main housing 30.
  • the heat sink 31 is disposed on one side surface of the main housing 30 in the Y direction.
  • the heat radiating plate 31 has a plurality of fins (not shown) and radiates heat from the main housing 30.
  • the ground plate 32 functions as a lightning rod, and is fixed to the lower surface of the main housing 30.
  • the ground plate 32 has a plurality of through holes 56 penetrating in the vertical direction corresponding to the plurality of first gas flow paths 50, and each through hole 56 is formed in the corresponding first gas flow path 50. It is connected.
  • the lower housing 34 has a block shape and is fixed to the lower surface of the ground plate 32.
  • a plurality of second gas flow paths 62 are formed in the lower housing 34 so as to extend in the vertical direction corresponding to the plurality of through holes 56.
  • the upper end portions of the second gas flow paths 62 are connected to the corresponding through holes 56, and the lower end portions are open to the bottom surface of the lower housing 34.
  • the nozzle block 36 is fixed to the lower surface of the lower housing 34, and a plurality of third gas passages 66 are formed to extend in the vertical direction corresponding to the plurality of second gas passages 62 of the lower housing 34. Has been.
  • the upper end portion of each third gas flow channel 66 is connected to the corresponding second gas flow channel 62, and the lower end portion opens at the bottom surface of the nozzle block 36.
  • the cover 22 has a generally bowl shape, and is disposed on the lower surface of the ground plate 32 so as to cover the lower housing 34 and the nozzle block 36.
  • a through hole 70 is formed in the lower surface of the cover 22.
  • the through hole 70 is larger than the lower surface of the nozzle block 36, and the lower surface of the nozzle block 36 is located inside the through hole 70.
  • a through hole 72 is also formed in the side surface of the cover 22 on the heated gas ejection device 14 side so as to extend in the Y direction.
  • the pair of electrodes 24 and 26 are disposed so as to face each other inside the reaction chamber 38 of the main housing 30.
  • a processing gas supply device (see FIG. 4) 74 is connected to the reaction chamber 38.
  • the processing gas supply device 74 is a device that supplies at least one of an inert gas such as nitrogen and an active gas such as oxygen as a processing gas. As a result, the processing gas is supplied to the reaction chamber 38.
  • the heated gas ejection device 14 includes a protective cover 80, a gas pipe 82, a heater 83, and a connecting block 84.
  • the protective cover 80 is disposed so as to cover the heat radiating plate 31 of the plasma gas ejection device 12.
  • the gas pipe 82 is disposed so as to extend in the vertical direction inside the protective cover 80, and a heating gas supply device 86 (see FIG. 4) 86 is connected to the gas pipe 82.
  • the heating gas supply device 86 is a device that supplies an active gas such as oxygen or an inert gas such as nitrogen.
  • a generally cylindrical heater 83 is disposed on the outer peripheral surface of the gas pipe 82, and the gas pipe 82 is heated by the heater 83. Thereby, the gas supplied to the gas pipe 82 from the heating gas supply device 86 is heated.
  • the connecting block 84 is connected to the lower end of the gas pipe 82 and is fixed to the side surface of the cover 22 on the heated gas ejection device 14 side in the Y direction.
  • the connection block 84 is formed with a communication path 88 that is bent in an L-shape.
  • One end of the communication path 88 opens on the upper surface of the connection block 84 and the other end of the communication path 88 is Y. Open in the side surface on the plasma gas ejection device 12 side in the direction.
  • One end of the communication path 88 communicates with the gas pipe 82, and the other end of the communication path 88 communicates with the through hole 72 of the cover 22.
  • the control device 16 includes a controller 100, a plurality of drive circuits 102, and a control circuit 104.
  • the plurality of drive circuits 102 are connected to the electrodes 24, 26, the processing gas supply device 74, the heater 83, and the heating gas supply device 86.
  • the controller 100 includes a CPU, a ROM, a RAM, and the like, mainly a computer, and is connected to a plurality of drive circuits 102. Thereby, the operation of the plasma gas ejection device 12 and the heated gas ejection device 14 is controlled by the controller 100.
  • the controller 100 is connected to the display device 106 via the control circuit 104.
  • the controller 100 is connected to the input device 107.
  • the input device 107 is composed of operation buttons and the like, and outputs operation information by operating the operation buttons. Thereby, operation information obtained by operating the operation buttons is input to the controller 100.
  • the plasma gas ejection device 12 has a transformer (not shown), and 200 volt power supplied from the power source is boosted to 15 kvolt by the transformer, and the boosted power is supplied to the electrodes 24 and 26. Is done.
  • the control device 16 includes a detection sensor 108 that detects a current supplied from the power source to the transformer, that is, a transformer primary current, and the detection sensor 108 is connected to the controller 100. As a result, a value detected by the detection sensor 108, that is, a transformer temporary current supplied to the electrodes 24 and 26 is input to the controller 100.
  • the PC 110 is connected to the controller 100.
  • the PC 110 includes a display device 112 and a storage device 114, displays an image based on information transmitted from the controller 100 on the display device 112, and stores information transmitted from the controller 100 in the storage device 114.
  • the plasma gas ejection device 12 converts the processing gas into plasma inside the reaction chamber 38 by the above-described configuration, and the third nozzle block 36.
  • Plasma gas is ejected from the lower end of the gas flow channel 66. Further, the gas heated by the heated gas ejection device 14 is supplied into the cover 22. Then, the plasma gas is ejected from the through hole 70 of the cover 22 together with the heated gas, and the object to be processed is subjected to plasma processing.
  • the processing gas is supplied to the reaction chamber 38 by the processing gas supply device 74.
  • power is supplied to the pair of electrodes 24 and 26 in the reaction chamber 38, and a current flows between the pair of electrodes 24 and 26.
  • a discharge is generated between the pair of electrodes 24 and 26, and the processing gas is turned into plasma by the discharge.
  • the plasma generated in the reaction chamber 38 flows downward in the first gas channel 50 and flows into the second gas channel 62 through the through hole 56.
  • the plasma gas flows downward in the second gas channel 62 and the third gas channel 66. Thereby, plasma gas is ejected from the lower end of the third gas channel 66.
  • the gas is supplied to the gas pipe 82 by the heating gas supply device 86, and the gas pipe 82 is heated by the heater 83.
  • the gas supplied to the gas pipe 82 is heated to 600 ° C. to 800 ° C.
  • the heated gas flows into the cover 22 from the through hole 72 of the cover 22 through the communication path 88 of the connection block 84.
  • the heated gas flowing into the cover 22 is ejected from the through hole 70 of the cover 22.
  • the plasma gas ejected from the lower end of the third gas passage 66 of the nozzle block 36 is protected by the heated gas. Thereby, it becomes possible to perform a plasma process appropriately.
  • the object to be processed is placed at a predetermined distance from the jet outlet from which the plasma gas is jetted, and the plasma gas is jetted from the jet outlet to the target to be processed. That is, at the time of plasma treatment, the plasma gas is ejected into the air, and the object to be treated is irradiated with the plasma gas ejected into the air. At this time, the plasma gas reacts with an active gas such as oxygen in the air to generate ozone. For this reason, there exists a possibility that plasma gas may deactivate and a plasma processing cannot be performed appropriately.
  • the gas heated by the heated gas ejection device 14 is ejected into the cover 22 and ejected from the through hole 70 of the cover 22.
  • the plasma gas ejected from the lower end of the nozzle block 36 is protected by the heated gas. Since the heated gas is heated to 600 ° C. to 800 ° C. in the gas pipe 82, the heated gas ejected from the through hole 70 is 250 ° C. or higher. Since ozone is decomposed at 200 ° C. or higher, ozonization of the plasma gas covered with the heated gas is prevented. Thereby, the deactivation of plasma gas is prevented, and it becomes possible to perform a plasma process appropriately.
  • the heated gas of 200 ° C. or higher is ejected toward the object to be processed together with the plasma gas, the object to be processed is heated by the heating gas, and the heated object to be processed is subjected to plasma treatment.
  • the reactivity of a to-be-processed object improves and it becomes possible to perform a plasma process effectively.
  • the plasma processing capability may decrease.
  • the electrodes 24, 26, etc. deteriorate, even the discharge may not occur.
  • the operation time of the apparatus is managed by a timer, and maintenance, replacement, etc. of the electrodes 24, 26, etc. are performed every predetermined time.
  • the deterioration rates of the electrodes 24 and 26 and the like vary depending on the usage frequency of the user, the material of the object to be processed by plasma processing, the temperature during the plasma processing, and the like.
  • the predetermined time that serves as a guide for replacement is generally set shorter. For this reason, although the deterioration has not progressed so much and the plasma processing capacity has not decreased so much, maintenance and replacement of the electrodes 24 and 26 may be performed, which is useless.
  • the pair of electrodes 24 and 26 is subjected to 0.1 second. It is detected whether or not a state where no current flows continuously occurs. When no current flows through the electrodes 24 and 26 for 0.1 seconds and no current flows through the electrodes 24 and 26, no discharge occurs and plasma is not generated for 0.1 seconds. In addition, when no current flows for 0.1 seconds continuously, a state in which no current flows for less than 0.1 seconds occurs many times other than 0.1 seconds. In other words, if discharge does not occur continuously for 0.1 second of one second, that is, a time corresponding to 10%, a discharge of less than 0.1 second occurs during the time other than 0.1 second. Many situations that do not occur occur.
  • the atmospheric pressure plasma generator 10 a sign of a decrease is notified before the plasma processing capacity is significantly decreased.
  • the current supplied to the electrodes 24 and 26 is detected by the detection sensor 108, and the local maximum value, that is, the amplitude for each cycle is detected.
  • the current supplied to the electrodes 24 and 26 changes as shown in FIG. 5, the current waveform changes periodically, and the amplitude of the current is It becomes almost constant.
  • the current waveform is chipped, and the amplitude may be extremely reduced instantaneously. In this way, when the amplitude drops instantaneously, the discharge does not occur instantaneously, but since the stop of the discharge is instantaneous, it hardly affects the plasma processing capability.
  • the current waveform supplied to the electrodes 24 and 26 may increase or decrease as a whole and fluctuate as shown in FIG. That is, the maximum value of the current supplied to the electrodes 24 and 26 may increase or decrease, and the maximum value may vary. In such a case, the discharge state varies, but plasma is generated, so that the plasma processing capacity is not significantly affected.
  • the instantaneous decrease in the local maximum value of the current occurs more than once, and the instantaneous decrease in the local maximum value of the current generated multiple times continues. It will be in the state where electric power does not flow continuously.
  • an instantaneous decrease or variation in the maximum value of current is considered to be a sign of a decrease in plasma processing capability. Therefore, in the atmospheric pressure plasma generator 10, the maximum value for each cycle of the current detected by the detection sensor 108 is monitored. At this time, the maximum value X (hereinafter referred to as “average maximum value”) X for each period of the normal current is specified.
  • the average maximum value X is an average value of the local maximum values for each period of the normal current when the electrodes 24 and 26 are not deteriorated.
  • the detected maximum value (hereinafter referred to as “detected maximum value”) and the average maximum value X each time the maximum value for each cycle of the current is detected. It is compared, and it is determined whether or not the detected maximum value is within a predetermined range (for example, X ⁇ 0.3X) (hereinafter referred to as “average maximum value range”) centered on the average maximum value X. Is done. When it is determined that the detected maximum value is out of the average maximum value range, the number of waveform failures is counted up by one.
  • the number of waveform defects is counted up cumulatively for one minute, and is the number of times that the detected maximum value is determined to be outside the average maximum value range per unit time (1 minute).
  • the number of waveform failures counted up for one minute cumulatively shifts every time the detected maximum value and the average maximum value range are compared. That is, after the number of waveform failures is counted up for one minute, when the detected maximum value and the average maximum value range are compared, the comparison result between the detected maximum value and the average maximum value range is added to the number of waveform failures, The comparison result between the detected maximum value and the average maximum value range one minute ago is deleted from the number of waveform failures. As a result, the number of waveform failures when the detected maximum value is compared with the average maximum value range is determined to be outside the average maximum value range while the number of waveform failures is one minute after the comparison timing. Number of times.
  • the number of waveform failures exceeds the set number it is determined that there is a sign of a decrease in plasma processing capacity, and a screen showing a sign of a decrease in plasma processing capacity (hereinafter referred to as a “prediction notification screen”) Is displayed on the display device 106.
  • the number of settings is set by the operator by operating the input device 107. However, the operator does not know how many times the set number can be set so that a sign of a decrease in plasma processing capacity can be determined. For this reason, in order to find an appropriate setting number, the operator repeatedly performs setting of the setting number and measurement of actual plasma processing capability.
  • the operator first sets a small number, for example, 50 times. In other words, when the set number is set to 50 times, when a lack or the like occurs in the current waveform 50 times per minute, a predictive notification screen is displayed on the display device 106. Then, when the predictor notification screen is displayed on the display device 106, the operator measures the object to be processed by the plasma processing performed when the predictor notification screen is displayed, using a contact angle meter or the like. .
  • the wettability of the object to be processed is a physical property that changes according to the contact angle of the surface of the object to be processed, and the wettability of the object to be processed is evaluated by measuring the contact angle of the object to be processed with a contact angle meter. Can do. For this reason, it can be judged whether the plasma processing is performed appropriately by measuring the contact angle of a to-be-processed object with a contact angle meter. That is, it is possible to determine whether or not the plasma processing capacity is reduced.
  • the operator can measure the contact angle of the workpiece using a dyne pen. For this reason, it is also possible to determine whether or not the plasma processing capability is reduced by measuring the contact angle of the object to be processed with a dyne pen.
  • an indicator whose optical characteristics change due to plasma irradiation has been developed, and by using the indicator, it can be determined whether or not the plasma processing is being performed appropriately. Since the indicator changes its color by plasma irradiation and is a known one, it will be briefly described below.
  • Indicators that change color by plasma irradiation include, for example, viscous fluids containing compositions that change by reacting with hydrogen ions obtained by nitrogen oxides, azo-based dyes, nitrogen-containing polymers, and cationic surfactants A thin film layer is formed on the surface of the sheet by a viscous fluid containing a composition composed of an agent.
  • an indicator including a thin film layer that changes color when irradiated with plasma is formed. Note that details of the indicator whose color is changed by plasma irradiation are disclosed in JP2013-178922A, JP2013-95765A, JP2013-98196A, JP2013-95764A, and JP2015. -13982, JP-A-2015-205995, and the like.
  • the color of the indicator changes due to plasma irradiation, it is determined whether or not the plasma processing is appropriately performed based on the color difference between the indicator after plasma irradiation and the indicator not irradiated with plasma. .
  • an indicator value related to the color of an indicator not irradiated with plasma that is, an unprocessed indicator is set as a color sample.
  • the index value relating to color lightness L * in Lab color space and chromaticity a * and b * indicating hue and saturation are employed.
  • the indicator irradiated with the plasma together with the object to be processed is measured by the color difference meter, and the color difference ⁇ E * ab between the indicator irradiated with the plasma and the unprocessed indicator is calculated.
  • FIG. 8 shows a graph showing the color difference ⁇ E * ab of the indicator irradiated with plasma under the plasma irradiation conditions 1 to 6 and the color difference ⁇ E * ab of the untreated indicator.
  • the color difference ⁇ E * ab of the unprocessed indicator is naturally zero.
  • the larger the number indicating the condition the larger the plasma irradiation amount. That is, the larger the number indicating the condition, the shorter the plasma irradiation distance and the longer the plasma irradiation time.
  • the irradiation conditions 2 and 3 out of the plasma irradiation conditions 1 to 6 are the optimum plasma irradiation conditions. That is, the optimum value of the color difference ⁇ E * ab is about 4 to 6. For this reason, when the color difference ⁇ E * ab is less than 4, the plasma irradiation is insufficient, and when the color difference ⁇ E * ab is 6 or more, it is determined that the plasma irradiation is too much. When the plasma irradiation is insufficient, it is naturally determined that the plasma processing is not properly performed and the plasma processing capability is reduced.
  • the object to be processed becomes fragile by plasma irradiation when the object to be processed is a resin material.
  • the contact angle of the object to be processed is lowered, and it may be determined that the plasma processing has been appropriately performed.
  • the object to be processed is a resin material, the polymer resin in the object to be processed is divided by the excessive plasma irradiation and the molecular weight is lowered, so that the object to be processed becomes fragile. In such a fragile object to be processed, even if the contact angle is low, it is not preferable as a product.
  • the number of settings (50 times) set by the user is assumed to be too small. Therefore, the user resets a number larger than the previously set number (50 times), for example, 100 times as the set number.
  • a predictive notification screen is displayed on the display device 106.
  • the operator determines whether or not the plasma processing object that has been executed when the predictor notification screen is displayed is suitable for plasma processing according to the above procedure. To do.
  • the worker sets the number greater than the previously set number (100 times) to the set number. Reset as.
  • the measurement value indicating the plasma processing capability gradually decreases. That is, for example, the contact angle of the object to be processed is gradually increased, and the color difference ⁇ E * ab is a value that gradually deviates from 5.
  • the measurement value indicating the plasma processing capability may be extremely lowered. For this reason, when the operator resets the set number, it is preferable to reset the set number that is somewhat larger than the previously set number.
  • first set number Specified number
  • first measured value the measured value indicating the plasma processing capability when the first set number is specified
  • the first measurement value by setting the first measurement value to a value close to the measurement value when it is determined that the plasma processing cannot be appropriately performed, in the final stage in a range where the appropriate plasma processing can be performed, It is possible to know a sign of a decrease in plasma processing capacity.
  • the first measurement value by setting the first measurement value to be a value far from the measurement value when it is determined that the plasma processing cannot be performed appropriately, the plasma processing capability is reduced at the initial stage of the plasma processing capability reduction. It becomes possible to know the signs of As described above, in the atmospheric pressure plasma generation apparatus 10, the operator can recognize the signs of various stages of the decrease in the plasma processing capability by arbitrarily specifying the first measurement value.
  • the degree of decrease in the plasma processing capability by repeatedly executing the setting of the set number and the measurement of the plasma processing capability. Specifically, after the first set number is specified, the set value and the measurement of the plasma processing capability are repeatedly performed, so that the measured value indicating the plasma processing capability further decreases. Therefore, the setting of the set number and the measurement of the plasma processing capacity are repeatedly performed until the measurement value indicating the plasma processing capacity reaches the measurement value when it is determined that the appropriate plasma processing is not performed. . Based on the relationship between the set number and the measured value indicating the plasma processing capability, the relationship between the number of waveform defects per unit time and the measured value indicating the plasma processing capability is formulated into a mathematical formula. As a result, it is possible to appropriately estimate the degree of decrease in the plasma processing capability according to the number of waveform defects per unit time, and it is possible to appropriately recognize a sign of a decrease in the plasma processing capability.
  • the atmospheric pressure plasma generator 10 each time the current maximum value is detected by the detection sensor 108, the current maximum value and the number of waveform defects per unit time are displayed on the display device 106. As a result, the operator recognizes the maximum value of the current and the number of waveform failures per unit time so that the atmospheric pressure plasma generator 10 can perform the operation even before the predictive notification screen is displayed on the display device 106. It becomes possible to estimate the plasma processing capability to some extent.
  • the maximum value of the current and the number of waveform defects per unit time are changed from the atmospheric pressure plasma generator 10 to the PC 110. Sent to.
  • the maximum value of the received current and the number of waveform failures per unit time are displayed on the display device 112. Thereby, for example, a factory manager or the like recognizes the maximum value of the current of the atmospheric pressure plasma generator 10 and the number of waveform failures per unit time, thereby improving the plasma processing capability of the atmospheric pressure plasma generator 10. It becomes possible to estimate to some extent.
  • the maximum value of the received current and the number of waveform failures per unit time are stored in the storage device 114. As a result, the relationship between the change in the current supplied to the electrodes 24 and 26 in the atmospheric pressure plasma generator 10 and the number of waveform defects per unit time can be analyzed and used for a sign of a decrease in plasma processing capability. .
  • the controller 100 of the atmospheric pressure plasma generation apparatus 10 includes an acquisition unit 120, a determination unit 122, a count unit 124, a display unit 126, and an output unit 128, as shown in FIG.
  • the acquisition unit 120 is a functional unit for acquiring a local maximum value, that is, an amplitude over time, as an index value indicating the current supplied to the electrodes 24 and 26.
  • the determination unit 122 is a functional unit for determining whether or not the maximum value of the current satisfies the setting condition, that is, a functional unit for determining whether or not the detected maximum value is within the average maximum value range. .
  • the counting unit 124 counts the number of times that the current maximum value is determined not to satisfy the set condition, that is, the number of times that the detected maximum value is determined to be outside the average maximum value range. It is a functional part.
  • the display unit 126 is a functional unit for displaying a predictive notification screen on the display device 106 when the count number counted by the count unit 124, that is, when the number of waveform failures is equal to or greater than the set number.
  • the output unit 128 is a functional unit for outputting the current maximum value and the number of waveform failures to the PC 110.
  • (B) Second Embodiment In the atmospheric pressure plasma generation apparatus 10 of the first embodiment, after the operator repeatedly executes the setting of the set number and the measurement of the plasma processing capacity and specifies the first set number, By setting the first set number with the input device 107, the predictive notification screen is displayed on the display device 106 at an appropriate timing.
  • the first set number is set by the operation of the control device 16 so that the predictive notification screen is displayed on the display device 106 at an appropriate timing.
  • the atmospheric pressure plasma generator 10 of the second embodiment is the same as the atmospheric pressure plasma generator 10 of the first embodiment except for the storage device and the interface. For this reason, the storage device and the interface will be described, description of other components will be omitted, and the reference numerals of the components of the first embodiment will be used.
  • the control device 16 includes an interface 150 and a storage device 151.
  • the interface 150 is for connecting a measuring device that measures physical properties that change due to plasma irradiation, and a contact angle meter 152 and a color difference meter 154 are connected to the interface 150.
  • the contact angle meter 152 and the color difference meter 154 are the same as those described in the first embodiment.
  • the interface 150 is connected to the controller 100, and values measured by the contact angle meter 152 and the color difference meter 154 are input to the controller 100.
  • the storage device 151 stores various information used for specifying the first set number, and is connected to the controller 100. As a result, various types of information used for specifying the first set number is input to the controller 100, and the first set number is specified in the controller 100.
  • the plasma processing capacity is lowered based on the measured values by the contact angle meter 152 and the color difference meter 154 and the information input to the input device 107 by the operator. Is estimated and the first set number is set. Then, when the number of waveform defects becomes equal to or greater than the first set number, a predictive notification screen is displayed on the display device 106.
  • the current flowing through the electrodes 24 and 26 is detected by the detection sensor 108, and each time the maximum value of the current is detected by the detection sensor 108, Then, it is determined whether or not the detected maximum value is within the average maximum value range.
  • the number of waveform failures is counted up by one. That is, also in the second embodiment, the number of waveform defects per unit time (1 minute) is counted as in the first embodiment.
  • the counted number of waveform failures is stored in the storage device 151 as the operation history of the atmospheric pressure plasma generator 10 together with the counted date and time.
  • the detected maximum value is also stored in the storage device 151 as the operation history of the atmospheric pressure plasma generator 10 together with the detected date and time each time it is detected by the detection sensor 108.
  • the operator measures the plasma processing ability of the workpiece at an arbitrary timing. That is, the contact angle of the workpiece irradiated with plasma by the atmospheric pressure plasma generator 10 is measured by the contact angle meter 152. Further, the color difference ⁇ E * ab of the indicator irradiated with plasma by the atmospheric pressure plasma generator 10 together with the object to be processed is measured by the color difference meter 154.
  • the measurement method of the contact angle of the object to be processed by the contact angle meter 152 and the measurement method of the color difference ⁇ E * ab of the indicator by the color difference meter 154 are the same as those in the first embodiment, and thus description thereof is omitted.
  • the operator estimates a decrease in the plasma processing capacity based on the measured value of the contact angle meter 152 and the like, but in the second embodiment, the contact angle meter 152 and the color difference meter 154 are estimated. Is connected to the interface 150 of the control device 16. For this reason, the measured values of the contact angle meter 152 and the color difference meter 154 are input to the controller 100 of the control device 16. Then, the measured values of the contact angle meter 152 and the color difference meter 154 (hereinafter referred to as “input measured value”) are stored in the storage device 151 together with the measurement date and time.
  • the input measurement value is the operation history so that the date and time included in the previously stored operation history of the atmospheric pressure plasma generator 10 and the date and time included in the input measurement value match within a predetermined range.
  • the data are stored in the storage device 151 in association with each other.
  • the controller 100 estimates the plasma processing capability based on the input measurement value. Specifically, threshold values corresponding to the measured values of the contact angle meter 152 and the color difference meter 154 are stored in the storage device 151. The threshold value of each measurement value does not reach the measurement value when it is determined that the plasma processing cannot be performed properly, and is set to a value within an allowable range in which the plasma processing can be performed appropriately. Then, the controller 100 determines whether or not the input measurement value has reached a threshold value.
  • the input measurement value does not reach the threshold value, it is estimated that the processing capability of the atmospheric pressure plasma generator 10 is appropriate.
  • the threshold value it is estimated that the processing capability of the atmospheric pressure plasma generator 10 is within the allowable range, but is reduced.
  • the number of waveform failures in the operation history stored in association with the input measurement value is registered as the first set number. That is, the number of waveform failures during the plasma processing, which is estimated to be a decrease in the processing capability of the atmospheric pressure plasma generator 10, is stored in the storage device 151 as the first set number. Then, when the number of waveform defects becomes equal to or greater than the first set number, a predictive notification screen is displayed on the display device 106.
  • the indication notification screen is displayed on the display device 106. Is done. That is, when the number of waveform defects is equal to or greater than the first set number, it is determined that the power supply state to the electrodes 24 and 26 is the power supply state when the processing capability is assumed to be reduced.
  • the predictive notification screen is displayed. As a result, the operator can appropriately recognize a sign of a decrease in the plasma processing capacity, and can adjust the work schedule and the like.
  • the threshold value used when specifying the first measurement value is set to a value close to the measurement value when it is determined that the plasma processing cannot be appropriately performed, so that the appropriate plasma processing can be performed. At the final stage, it is possible to know a sign of a decrease in plasma processing capacity.
  • the threshold value used when specifying the first measurement value is set to be a value far from the measurement value when it is determined that the plasma processing cannot be performed appropriately, it is possible to reduce the plasma processing capability at an early stage. It becomes possible to know a sign of a decrease in plasma processing capacity.
  • by adjusting the threshold value it is possible to recognize signs of various stages of the decrease in the plasma processing capacity.
  • the plasma treatment by the atmospheric pressure plasma generator 10 is generally performed as a pretreatment for the surface treatment of the workpiece.
  • the surface treatment of the object to be treated include adhesion treatment to the surface of the object to be treated, painting treatment, and coating treatment.
  • an adhesion process to the surface of the object to be processed, a coating process, a coating process, or the like is performed on the object to be processed after the plasma processing by the atmospheric pressure plasma generator 10 is completed.
  • a post-process such as a coating process is performed on the target object that has been subjected to the plasma process by the atmospheric pressure plasma generator 10. And after post-processing, such as a coating process, the quality of a to-be-processed object is confirmed. At this time, if there is no problem in the quality of the object to be processed, it is estimated that the plasma processing as the preprocessing is appropriately performed. On the other hand, when there is a problem in the quality of the object to be processed, it is estimated that the plasma processing as the preprocessing is not properly performed.
  • the operator inputs the date and time when the plasma process is performed on the object to be processed as input information. Input to 107.
  • the input information is input to the controller 100, and the controller 100 specifies the execution date and time of the plasma processing included in the input information.
  • the controller 100 refers to the operation history stored in the storage device 151 and extracts an operation history including the specified date and time and the date and time within a predetermined range. The number of waveform failures included in the operation history is registered as the first set number.
  • the number of waveform failures when the quality of an object to be processed after plasma processing is not good is registered as the first set number. Then, when the number of waveform defects becomes equal to or greater than the first set number, a predictive notification screen is displayed on the display device 106. That is, when the number of waveform defects is equal to or greater than the first set number, the power supply state to the electrodes 24 and 26 is a power supply state when post-processing cannot be performed properly due to a decrease in plasma processing capability. Is determined, and a predictive notification screen is displayed. Thereby, the operator can recognize a sign of a decrease in the plasma processing capability in consideration of the post-processing of the plasma processing.
  • the operator inputs not only the result of the post-processing of the plasma processing but also the input information to the input device 107 when the performance of the plasma processing is predicted to be reduced by another method and the performance of the plasma processing is predicted to be reduced.
  • the operator uses a dyne pen to measure the contact angle of the object to be processed after the plasma processing. At this time, when the contact angle is higher than the angle assumed in advance, it is estimated that the plasma processing capability is reduced. For this reason, the operator inputs the date and time when the plasma processing is performed on the workpiece to the input device 107 as input information.
  • the predictive notification screen is displayed on the display device 106.
  • the atmospheric pressure plasma generation device 10 each time the input measurement value is stored in the storage device 151 in association with the operation history, the input measurement value and the operation history are displayed on the display device 106. As a result, the operator recognizes the measured value of the contact angle meter 152 and the like, the maximum value of the current included in the operation history, and the number of waveform failures per unit time, whereby the predictive notification screen is displayed on the display device 106. Even before being performed, the plasma processing capability of the atmospheric pressure plasma generator 10 can be estimated to some extent.
  • the atmospheric pressure plasma generation device 10 each time the input measurement value is stored in the storage device 151 in association with the operation history, the input measurement value and the operation history are transmitted from the atmospheric pressure plasma generation device 10 to the PC 110.
  • the In the PC 110 the received input measurement value and operation history are displayed on the display device 112.
  • a factory manager can recognize the measured value of the contact angle meter 152, the maximum value of the current included in the operation history, and the number of waveform failures per unit time, thereby generating atmospheric pressure plasma. It becomes possible to estimate the plasma processing capability of the apparatus 10 to some extent.
  • the received input measurement values and operation history are stored in the storage device 114.
  • the relationship between the change in the current supplied to the electrodes 24 and 26 in the atmospheric pressure plasma generator 10, the number of waveform defects per unit time, and the measured value of the contact angle meter 152, etc. is analyzed, and the plasma processing capability is analyzed. It can be used to predict the decline.
  • the relationship between the measured value of the contact angle meter 152 or the like, that is, the measured value indicating the plasma processing capability, and the number of waveform defects can be formulated.
  • the degree of decrease in the plasma processing capability corresponding to the number of waveform failures can be estimated appropriately, and the plasma processing capability can be estimated. It is possible to appropriately recognize the signs of decline.
  • the controller 100 of the atmospheric pressure plasma generator 10 includes an acquisition unit 160, a calculation unit 162, a storage unit 164, a state determination unit 166, a display unit 168, and an output unit 170. It has.
  • the calculation unit 162 includes a condition determination unit 172.
  • the acquisition unit 160 is a functional unit for acquiring a local maximum value, that is, an amplitude over time, as an index value indicating the current supplied to the electrodes 24 and 26.
  • the condition determination unit 172 is a functional unit for determining whether or not the maximum value of the current satisfies the setting condition, that is, a functional unit for determining whether or not the detected maximum value is within the average maximum value range. is there.
  • the calculation unit 162 is a functional unit for counting the number of times determined by the condition determination unit 172 and calculating the number of waveform defects.
  • the storage unit 164 stores a predetermined timing, that is, the number of waveform failures when it is determined that the input measurement value has reached the threshold value or when input information is input to the input device 107 as the first set number. This is a functional unit for storing in the device 151.
  • the state determination unit 166 determines whether or not the power supply state to the electrodes 24 and 26 is a power supply state when the plasma processing capacity is reduced. It is a functional part for judging.
  • the display unit 168 is a functional unit for displaying a predictive notification screen on the display device 106 when the power supply state to the electrodes 24 and 26 is the power supply state when the plasma processing capacity is reduced. It is.
  • the output unit 170 is a functional unit for outputting input measurement values and operation history to the PC 110.
  • the atmospheric pressure plasma generator 10 is an example of a plasma generator.
  • the control device 16 is an example of a control device and an information processing device.
  • the electrodes 24 and 26 are examples of electrodes.
  • the input device 107 is an example of an operation reception unit.
  • the PC 110 is an example of an external device.
  • the interface 150 is an example of a connection unit.
  • the contact angle meter 152 and the color difference meter 154 are examples of a measuring device.
  • the acquisition unit 160 is an example of an acquisition unit.
  • the calculation unit 162 is an example of a calculation unit.
  • the storage unit 164 is an example of a storage unit.
  • the state determination unit 166 is an example of a first determination unit.
  • Display unit 168 is an example of a notification unit.
  • the output unit 170 is an example of an output unit.
  • the condition determination unit 172 is an example of a second determination unit.
  • the number of waveform defects is an example of a change value and a count number.
  • the first set number is an example of a specific change value and a specific count number.
  • this invention is not limited to the said Example, It is possible to implement in the various aspect which gave various change and improvement based on the knowledge of those skilled in the art. Specifically, for example, in the above embodiment, the number of waveform failures is counted based on the maximum value of the current detected by the detection sensor 108, that is, the amplitude, but the waveform failure is counted based on the supplied power amount. The number of times may be counted. That is, for example, as shown in FIG. 10, when the current detected by the detection sensor 108 is changing, the integrated value of the current waveform, that is, the area (shaded portion in the figure) is the amount of supplied power. Become.
  • the power supply amount for each cycle is monitored, and when the power supply amount exceeds the set range, for example, in FIG. 10, the number of waveform defects is counted up by 1 when the power supply amount is extremely reduced.
  • the number of waveform defects can be appropriately counted. Note that the number of waveform defects may be counted based not only on the current supplied to the electrodes 24 and 26 but also on the voltage supplied to the electrodes 24 and 26.
  • the process for estimating the decrease in the plasma processing capability of the atmospheric pressure plasma generator 10 is executed in the control device 16, but may be executed by an information processing device such as the PC 110.
  • the information processing apparatus of the present invention is the PC 110.
  • a contact angle meter and a color difference meter are adopted as an apparatus for measuring physical properties that change due to plasma irradiation.
  • various devices can be used as long as they can measure physical properties that change due to plasma irradiation. It is possible to employ a device. For example, it is possible to employ an apparatus capable of measuring the surface free energy of the object to be processed.
  • the notification method is not limited to display on the screen, and various methods such as voice, lighting of a lamp, printing on a sheet, and the like can be employed.
  • the predictive notification screen is displayed based on the number of waveform defects and the first set number.
  • the predictive notification screen may be displayed in consideration of the input measurement value. . That is, the predictive notification screen may be displayed based on the number of waveform defects, the first set number, and the input measurement value. Specifically, when it is determined whether or not the number of waveform failures is equal to or greater than the first set number, the input measurement value stored in association with the operation history including the number of waveform failures is specified. Then, it is determined whether or not the input measurement value has reached a preset setting value. At this time, when the number of waveform failures is equal to or greater than the first set number and the input measurement value has reached the set value, the predictive notification screen may be displayed.
  • Atmospheric pressure plasma generator (plasma generator) 16: Control device (information processing device) 24: Electrode 26: Electrode 107: Input device (operation reception unit) 110: PC (external device) 150: Interface (connection unit) 152: Contact angle meter (measuring device) 154: Color difference meter (measuring device) 160: Acquisition unit 162: Calculation unit 164: Storage unit 166: State judgment unit (first judgment unit) 168: Display unit (notification unit) 170: Output unit 172: Condition determination unit (second determination unit)

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne un dispositif de traitement d'informations équipé d'un dispositif de commande comprenant : une unité d'acquisition qui acquiert successivement des valeurs d'indicateur qui indiquent le courant ou la tension fourni à une pluralité d'électrodes d'un dispositif de génération de plasma qui génère un plasma par décharge entre une pluralité d'électrodes ; une unité de calcul qui calcule une valeur de variation qui est une valeur numérique concernant un changement de valeurs d'indicateur, sur la base des valeurs d'indicateur acquises par l'unité d'acquisition ; une unité d'enregistrement qui stocke, sous forme de valeurs de variation de caractéristique, les valeurs de variation calculées par l'unité de calcul à un moment prédéterminé ; une première unité de détermination qui détermine, sur la base de la valeur de variation et de la valeur de variation de caractéristiques, si l'état d'alimentation électrique lorsque la valeur de variation est calculée est l'état d'alimentation électrique au moment prédéterminé, chaque fois que la valeur de variation est calculée par l'unité de calcul ; et une unité de notification qui communique des informations prédéterminées si l'état d'alimentation électrique lorsque la valeur de variation est calculée par la première unité de détermination est considérée comme étant l'état d'alimentation électrique au moment prédéterminé.
PCT/JP2017/014088 2017-04-04 2017-04-04 Dispositif de traitement d'informations WO2018185833A1 (fr)

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JP2002313729A (ja) * 2001-04-10 2002-10-25 Matsushita Electric Ind Co Ltd プラズマ処理装置の監視方法、プラズマ処理方法及び装置
JP2004128023A (ja) * 2002-09-30 2004-04-22 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
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JP7067516B2 (ja) 2019-03-26 2022-05-16 日本電産株式会社 プラズマ処理装置

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