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WO2018181409A1 - Appareil à faisceau de particules chargées - Google Patents

Appareil à faisceau de particules chargées Download PDF

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Publication number
WO2018181409A1
WO2018181409A1 PCT/JP2018/012609 JP2018012609W WO2018181409A1 WO 2018181409 A1 WO2018181409 A1 WO 2018181409A1 JP 2018012609 W JP2018012609 W JP 2018012609W WO 2018181409 A1 WO2018181409 A1 WO 2018181409A1
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WO
WIPO (PCT)
Prior art keywords
sample
charged particle
particle beam
tilt
axis
Prior art date
Application number
PCT/JP2018/012609
Other languages
English (en)
Japanese (ja)
Inventor
藤井　利昭
富松　聡
鈴木　浩之
Original Assignee
株式会社日立ハイテクサイエンス
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2018055231A external-priority patent/JP2018163878A/ja
Application filed by 株式会社日立ハイテクサイエンス filed Critical 株式会社日立ハイテクサイエンス
Priority to US16/495,506 priority Critical patent/US20200251303A1/en
Priority to KR1020197024232A priority patent/KR20190129839A/ko
Priority to CN201880021206.9A priority patent/CN110476220A/zh
Publication of WO2018181409A1 publication Critical patent/WO2018181409A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Definitions

  • the present invention relates to a charged particle beam apparatus.
  • the charged particle beam is a general term for an ion beam and an electron beam.
  • An apparatus capable of performing at least one of processing, observation, and analysis (hereinafter referred to as observation) using a focused charged particle beam is called a charged particle beam apparatus.
  • the charged particle beam apparatus is equipped with at least one of an ion beam column that forms an ion beam and an electron beam column that forms an electron beam.
  • the charged particle beam apparatus also includes a composite apparatus on which a plurality of charged particle beam barrels are mounted. Such a charged particle beam apparatus may be used, for example, to form a flake sample. When a structure such as a semiconductor device is exposed on the observation surface of the thin sample, the processing rate of the charged particle beam varies depending on the presence or absence of the structure.
  • Patent Document 1 describes a composite charged particle beam apparatus that can tilt a sample stage on which a sample is placed in two axial directions in order to suppress the curtain effect.
  • the conventional charged particle beam apparatus has the following problems.
  • the sample holder is arranged so that the tilt axis passes through one sample on the sample holder.
  • the sample arranged outside the tilt axis moves around the tilt axis when the sample holder is tilted. For this reason, there is a trouble of rearranging each sample at the beam irradiation position.
  • the sample holder is tilted, there is a possibility that the sample placed outside the tilt axis collides with a structure such as a lens barrel and the sample is damaged.
  • the present invention has been made in view of the above problems, and an object of the present invention is to provide a charged particle beam apparatus capable of safely and safely forming a sample even when processing a plurality of samples.
  • a charged particle beam apparatus includes a charged particle beam column that irradiates a sample with a charged particle beam, and a first sample holding unit that can hold the sample.
  • a first inclined base that holds the first sample holding portion so as to be rotatable about a first rotation axis, and a second sample holding portion that can hold the sample,
  • a second tilt base that holds the second sample holder so as to be rotatable about a second rotation axis parallel to the first rotation axis; the first tilt base; and the second tilt
  • a driving force supply unit that supplies a driving force for rotating the table in conjunction with the first tilting table and the second tilting table.
  • rotation means a movement around the rotation axis under the limitation of an angle range of less than 360 °.
  • the direction of “rotation” can be two directions around the rotation axis.
  • the first tilting table and the second tilting table may be arranged in a direction intersecting with the first rotation axis and the second rotation axis.
  • the charged particle beam apparatus further includes a sample stage including a rotation stage that is rotatable about a rotation axis that extends in a direction orthogonal to the first rotation axis and the second rotation axis.
  • the tilt table and the second tilt table may be provided on a removable sample holder on the upper surface of the sample stage.
  • rotation means a movement around a rotation axis. That is, it includes both the meaning of movement around the rotation axis within an angle range of less than 360 ° and movement around the rotation axis at an angle of 360 ° or more.
  • the “rotation” angle may or may not be limited.
  • the direction of “rotation” may be two directions around the rotation axis, or may be limited to one direction.
  • the first tilt table and the second tilt table are centered on a third rotation axis perpendicular to the first rotation axis and the second rotation axis. You may further provide the inclination stage which rotates.
  • the first tilt base includes a first gear having the first rotation axis as a center of a pitch circle
  • the second tilt base includes the second rotation base.
  • the driving force supply unit may have a third gear that meshes with the first gear and the second gear.
  • the first gear is a first worm wheel
  • the second gear is a second worm wheel
  • the third gear is the first worm wheel. It may be a worm that meshes with the wheel and the second worm wheel.
  • the driving force supply unit may include a driving rod that transmits a driving force to the first tilting table and the second tilting table.
  • the charged particle beam apparatus of the present invention it is possible to safely and safely form a sample even when processing a plurality of samples.
  • FIG. 1 is a schematic configuration diagram showing an example of the configuration of the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 2 is a schematic perspective view showing the configuration of the main part of the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 3 is a schematic perspective view showing the main configuration of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 4 is a detailed view of part A in FIG.
  • FIG. 5 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 6 is an explanatory view of the operation of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 1 is a schematic configuration diagram showing an example of the configuration of the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 2 is a schematic perspective view showing the configuration of the main part of the charged particle beam apparatus according to the first embodiment of
  • FIG. 7 is a schematic front view and side view showing a specimen holding form in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 8 is a schematic perspective view showing the relationship between the sample and the processing direction in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 9 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the second embodiment of the present invention.
  • FIG. 10 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the third embodiment of the present invention.
  • FIG. 11 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fourth embodiment of the invention.
  • FIG. 12 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the modification of the fourth embodiment of the invention.
  • FIG. 13 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fifth embodiment of the present invention.
  • FIG. 14 is a schematic front view showing an example of an internal structure of a sample holder in a charged particle beam apparatus according to a modification of the fifth embodiment of the invention.
  • FIG. 1 is a schematic configuration diagram showing an example of the configuration of the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 2 is a schematic perspective view showing the configuration of the main part of the charged particle beam apparatus according to the first embodiment of the present invention. Since each figure is a schematic diagram, the shape and dimensions are exaggerated (the same applies to the following drawings).
  • a charged particle beam apparatus 100 of the present embodiment includes a sample chamber 9, a sample stage 10, an FIB column 1 (charged particle beam column), an EB column 2 (charged particle beam column), A GIB column 3 (charged particle beam column), a gas gun 19 and a sample holder 6 are provided.
  • FIB is an abbreviation that stands for Focused Ion Beam.
  • EB is an abbreviation that stands for electron beam.
  • GOB is an abbreviation that stands for Gas Ion Beam.
  • the sample chamber 9 accommodates samples 7A and 7B in which at least one of processing, observation, and analysis is performed by the charged particle beam apparatus 100.
  • Samples 7A and 7B are minute slices. In FIG. 1, the sizes of the samples 7A and 7B are greatly exaggerated for easy viewing.
  • the sample chamber 9 is connected to a vacuum exhaust device (not shown) that changes and maintains the degree of vacuum inside the sample chamber 9.
  • the sample chamber 9 may be provided with a load lock chamber (not shown) so that the sample can be loaded and unloaded without changing the internal atmosphere and vacuum state.
  • a sample stage 10 is built in the sample chamber 9. In the sample chamber 9, the FIB column 1, the EB column 2, and the GIB column 3 are disposed at positions facing the sample stage 10.
  • the sample stage 10 includes a rotation stage 5.
  • the sample stage 10 includes a 5-axis moving stage.
  • the rotary stage 5 is disposed on the top of the sample stage 10.
  • an XYZ stage (not shown) and an inclined stage (not shown) are arranged below the rotary stage 5.
  • the tilt stage has a tilt drive unit 8 that tilts the sample stage 10 by rotating the rotary stage 5 about the axis 8 a in the horizontal plane.
  • the rotary stage 5 includes a sample stage 5a and a rotation driving unit 5b.
  • the sample stage 5a can arrange
  • the rotation drive unit 5b rotates the sample stage 5a around the rotation axis C.
  • the rotation driving unit 5b includes, for example, a rotation support unit (not shown) that rotatably holds the sample stage 5a, a motor (not shown) that supplies a driving force for rotating the sample stage 5a, and the driving force of the motor as a sample.
  • the FIB column 1 is disposed above the sample stage 10 so as to face the sample stage 10.
  • the FIB barrel 1 is arranged in parallel to the vertical axis.
  • the FIB column 1 irradiates the FIB 1b as the first charged particle beam along the FIB irradiation axis 1a parallel to the vertical axis.
  • the FIB column 1 includes, for example, a liquid metal ion source.
  • the EB column 2 is disposed above the sample stage 10 along an axis that is inclined with respect to the vertical axis.
  • the EB column 2 irradiates the EB 2b as the second charged particle beam along the EB irradiation axis 2a inclined with respect to the vertical axis.
  • the GIB column 3 is disposed above the sample stage 10 along an axis that is inclined in a direction different from the EB column 2 with respect to the vertical axis.
  • the GIB column 3 irradiates a GIB 3b as a third charged particle beam along a GIB irradiation axis 3a inclined in a direction different from that of the EB column 2 with respect to the vertical axis.
  • the GIB column 3 includes a PIG-type gas ion source. Examples of gaseous ion sources include helium, argon, xenon, oxygen and the like as ion source gas.
  • the FIB irradiation axis 1a and the GIB irradiation axis 3a intersect at a predetermined position above the sample stage 10 on the plane P including the axis 8a and the vertical axis.
  • the EB irradiation axis 2a intersects the FIB irradiation axis 1a and the GIB irradiation axis 3a at a predetermined position where the FIB irradiation axis 1a and the GIB irradiation axis 3a intersect. That is, the FIB 1b, EB2b, and GIB3b are at a predetermined position. Interact with each other.
  • the charged particle beam apparatus 100 further includes a secondary electron detector 4 that detects secondary electrons generated from the sample 7A (7B) by irradiation with EB2b, FIB1b, or GIB3b. Furthermore, the charged particle beam apparatus 100 may include a backscattered electron detector that detects backscattered electrons generated from the sample by irradiation with the EB 2b.
  • the gas gun 19 supplies an etching gas in the vicinity of the irradiation areas of the FIB 1b, EB 2b, and GIB 3b.
  • the etching gas include halogen gas such as chlorine gas, fluorine-based gas (such as xenon fluoride and fluorine carbide), and iodine gas.
  • halogen gas such as chlorine gas, fluorine-based gas (such as xenon fluoride and fluorine carbide), and iodine gas.
  • an etching gas that reacts with the material of the sample 7A (7B) is supplied to the irradiation region of the FIB 1b, EB2b, or GIB3b by the gas gun 19, the gas from the FIB 1b, EB2b, or GIB3b is applied to the sample 7A (7B).
  • Assist etching is performed.
  • etching can be performed without damaging the sample 7A (7B) by ion sputtering
  • the sample holder 6 includes two inclined bases that rotate the samples 7A and 7B around the first and second rotation axes, respectively, and a third that is orthogonal to the first and second rotational axes. And a tilting stage that rotates about the rotation axis. A specific configuration example of the sample holder 6 will be described later.
  • the charged particle beam apparatus 100 includes a sample stage control unit 15, a sample holder control unit 40, an FIB control unit 11, an EB control unit 12, a GIB control unit 13, an image forming unit 14, and a control unit 17. Is provided.
  • the sample stage control unit 15 is communicably connected to each stage driving unit of the sample stage 10.
  • the stage drive unit includes a rotation drive unit 5b and an inclination drive unit 8.
  • the sample stage control unit 15 moves each stage of the sample stage 10 by controlling each stage drive unit based on a control signal from the control unit 17 described later.
  • the rotation driving unit 5b drives the sample stage 5a to rotate.
  • the tilt driving unit 8 drives a tilt stage (not shown) to tilt.
  • the sample holder control unit 40 is communicably connected to a drive unit in the sample holder 6 via a wiring (not shown) when a sample holder 6 to be described later is arranged on the sample stage 5a.
  • the sample holder control unit 40 inclines the tilt table and the tilt stage of the sample holder 6 based on a control signal from the control unit 17 described later in a connected state with the sample holder 6. Thereby, the sample holder control part 40 can change the inclination with respect to the rotation axis C of the samples 7A and 7B held on the sample holder 6 in the biaxial direction.
  • the FIB control unit 11 controls the FIB irradiation from the FIB column 1 based on a control signal from the control unit 17 described later.
  • the EB control unit 12 controls EB irradiation from the EB column 2 based on a control signal from the control unit 17 described later.
  • the GIB control unit 13 controls GIB irradiation from the GIB column 3 based on a control signal from the control unit 17 described later.
  • the image forming unit 14 forms an SEM image from a signal that the EB control unit 12 scans the EB and a secondary electron signal detected by the secondary electron detector 4.
  • the image forming unit 14 forms a SIM (Scanning Ion Microscope) image from the signal that the FIB control unit 11 scans the FIB and the secondary electron signal detected by the secondary electron detector 4.
  • SIM Sccanning Ion Microscope
  • the control unit 17 is communicably connected to the sample stage control unit 15, the sample holder control unit 40, the FIB control unit 11, the EB control unit 12, the GIB control unit 13, the image forming unit 14, the input unit 16, and the display unit 18. Is done.
  • the input unit 16 is an apparatus part for performing an operation input by an operator of the charged particle beam apparatus 100.
  • the operation input input to the input unit 16 is sent to the control unit 17.
  • the display unit 18 is a device part that displays information sent from the control unit 17.
  • the control unit 17 analyzes the operation input sent from the input unit 16 and generates a control signal for overall control of the charged particle beam device 100.
  • the control unit 17 sends the generated control signal to the sample stage control unit 15, the sample holder control unit 40, the FIB control unit 11, the EB control unit 12, the GIB control unit 13, and the image forming unit 14 as necessary. To do.
  • the control unit 17 sends information on observation images such as SEM images and SIM images sent from the image forming unit 14 and various control conditions of the charged particle beam device 100 to the display unit 18, and these information Is displayed on the display unit 18. Specific control performed by the control unit 17 will be described later together with the operation of the charged particle beam apparatus 100.
  • control system including the sample stage control unit 15, the sample holder control unit 40, the FIB control unit 11, the EB control unit 12, the GIB control unit 13, the image forming unit 14, and the control unit 17 described above is appropriately And a computer including a CPU, a memory, an input / output interface, an external storage device, and the like. A part or all of each control function of the control system may be realized by a computer executing a control program that realizes each control function.
  • FIG. 3 is a schematic perspective view showing the main configuration of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 4 is a detailed view of part A in FIG.
  • FIG. 5 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 6 is an explanatory view of the operation of the sample holder in the charged particle beam apparatus according to the first embodiment of the present invention.
  • the sample holder 6 includes a base 61, a support portion 62, a rotating base 63, an inclined base 64 ⁇ / b> A (first inclined base), an inclined base 64 ⁇ / b> B (second inclined base), and a drive unit. 66.
  • the xy coordinate system may be referred to in accordance with the arrangement posture of the sample holder 6 on the sample stage 5a.
  • the x and y axes in the xy coordinate system are orthogonal to each other.
  • the x-axis and y-axis are fixed on the upper surface of the sample stage 5a.
  • the base 61 can be placed on the upper surface of the sample table 5a, and has an outer shape that can be positioned in two axial directions within the upper surface of the sample table 5a by a positioning mechanism (not shown).
  • the base 61 has a rectangular plate-like outer shape that is long in the x-axis direction.
  • the side surfaces of the base 61 in the x-axis direction and the y-axis direction may be used as a positioning unit with the positioning mechanism.
  • a recess 61 a having a substantially rectangular shape in plan view is formed on the upper surface of the base 61.
  • Support portions 62 are provided upright at both ends in the x-axis direction in the recess 61a.
  • Each support portion 62 is provided with a support shaft 62a extending coaxially with an axis F (third rotation axis) parallel to the x-axis.
  • a rotation base 63 tilt stage
  • bearing portions 63b that are rotatably connected to the support shafts 62a of the support portions 62 are provided above the turntable 63, respectively.
  • the turntable 63 is supported so as to be rotatable around the axis F.
  • the turntable 63 is connected to a turntable drive unit (not shown) via a transmission mechanism (not shown).
  • the turntable drive unit is connected to the sample holder control unit 40 so as to be communicable.
  • the rotating table driving unit rotates the rotating table 63 around the axis F based on a control signal from the sample holder control unit 40.
  • the turntable 63 is inclined in the y-axis direction.
  • a hole 63a that opens upward is formed at the center of the turntable 63 in plan view.
  • Inclinations 64A and 64B are accommodated in the hole 63a side by side in the x-axis direction.
  • the positions in the y-axis direction of the inclined bases 64A and 64B are positioned by positioning portions (not shown) in the inner peripheral portion of the hole 63a.
  • the inclined bases 64A and 64B may have different shapes, but in the present embodiment, they have the same shape.
  • FIG. 4 shows an example of a detailed configuration of the tilting table 64A.
  • the tilting table 64 ⁇ / b> A has a substantially half-moon shape as viewed from the y-axis direction.
  • a worm wheel 64a is provided on the arc-shaped outer peripheral portion of the inclined base 64A.
  • a guide groove 64e that is concentrically curved with the pitch circle of the worm wheel 64a is formed on the side surface in the y-axis direction of the inclined base 64A.
  • a sample holder 64c for holding the sample 7A via the TEM grid 67 is disposed on the flat surface 64b facing the worm wheel 64a in the tilt table 64A.
  • a sample holder 64c that holds the sample 7B via the TEM grid 67 is disposed on the flat surface 64b that faces the worm wheel 64a in the tilt table 64B.
  • the sample holder 64c disposed on the tilt table 64A constitutes a first sample holder.
  • the sample holder 64c arranged on the tilt table 64B constitutes a second sample holder.
  • a worm 70 (third gear, driving force supply unit) is disposed below the inclined table 64A.
  • the worm 70 extends parallel to the x-axis and meshes with the worm wheels 64a of the inclined bases 64A and 64B from below. Both ends of the worm 70 in the axial direction are supported by bearing bases 63d and 63e inside the rotary base 63 via bearings 71, respectively.
  • the worm 70 is rotatably supported by each bearing 71.
  • the inter-axis distance between the worm 70 and each worm wheel 64a is regulated by each roller 65 that abuts against each guide groove 64e in a rollable manner. As shown in FIG.
  • the roller 65 that abuts on the guide groove 64 e of the inclined base 64 ⁇ / b> A is rotatably supported by a support shaft 65 a that extends in the positive y-axis direction from the support portion 63 c on the upper surface of the rotating base 63. For this reason, the roller 65 in contact with the guide groove 64e of the inclined base 64A can rotate around the axis G1 parallel to the y axis.
  • the roller 65 that abuts on the guide groove 64e of the inclined base 64B can also be rotated in the same manner as the roller 65 that abuts on the guide groove 64e of the inclined base 64A by a rotating base 63 and a support shaft 65a (not shown). It is supported by. However, the roller 65 in contact with the guide groove 64e of the inclined base 64B can rotate around the axis G2 parallel to the axis G1.
  • the inclined bases 64A and 64B rotate in a state in which the distance between the axes of the worm 70 and each worm wheel 64a is maintained by each roller 65.
  • the tilting tables 64A and 64B pass through the center of the pitch circle of each worm wheel 64a and are parallel to the y-axis with respect to the axis S1 (first rotation axis) and the axis S2 (second Rotate around the rotation axis).
  • the worm wheel 64a of the tilting table 64A is a first worm wheel and constitutes a first gear having the axis S1 as the first rotation axis as the center of the pitch circle.
  • the worm wheel 64a of the tilting table 64B is a second worm wheel, and constitutes a second gear whose center is the pitch circle about the axis S2 that is the second rotation axis.
  • the inclined bases 64 ⁇ / b> A and 64 ⁇ / b> B are each interlocked with the rotation of the worm 70, and the respective plane portions 64 b are inclined in the x-axis direction.
  • the tilt tables 64A and 64B tilt in the opposite direction.
  • the tilting tables 64A and 64B have the same shape, the tilting direction, tilting speed, and tilting angle of the tilting tables 64A and 64B are also the same.
  • the drive unit 66 has a drive source that supplies a driving force to the sample holder 6. Although the drive unit 66 may be disposed at the site of the sample holder 6, in this embodiment, as shown in FIG. 3, the drive unit 66 is attached to one end of the base 61 in the x-axis direction.
  • the drive unit 66 in the present embodiment includes two drive sources that supply driving force to the rotating table 63 and the inclined tables 64A and 64B independently of each other.
  • FIG. 5 shows an example of a configuration for supplying a driving force to the tilting tables 64A and 64B.
  • the drive unit 66 includes a drive motor 73 (drive force supply unit) and gears 74 and 72 (drive force supply unit).
  • the drive motor 73 is a drive source for driving the tilt tables 64A and 64B.
  • the type of the drive motor 73 is not limited as long as it is an appropriate motor capable of forward and reverse rotation.
  • the drive motor 73 is communicably connected to the sample holder control unit 40. The operation of the drive motor 73 is controlled according to a control signal from the sample holder control unit 40.
  • the gear 74 is coaxially attached to the output shaft 73 a of the drive motor 73.
  • the gear 72 is fixed coaxially with the central axis of the worm 70 at the end of the worm 70.
  • the gear 72 meshes with the gear 74.
  • As the gears 74 and 72 spur gears, helical gears, or the like may be used.
  • the gears 74 and 72 constitute a transmission mechanism that transmits the driving force of the driving motor 73 to the worm 70.
  • the gears 74 and 72 are examples of a transmission mechanism.
  • the transmission mechanism may include an appropriate speed reduction mechanism.
  • the transmission mechanism may include a transmission mechanism other than the gear.
  • the output shaft 73a of the drive motor 73 and the central axis of the worm 70 are parallel to each other.
  • a gear that transmits the output shaft 73a of the drive motor 73 and the central axis of the worm 70 may be used for the transmission mechanism.
  • each flat surface portion 64b of the tilt tables 64A and 64B is a biaxial tilt stage tilted in the x-axis direction.
  • the worm 70, the gears 74 and 72, and the drive motor 73 constitute a drive force supply unit that supplies a drive force that rotates the tilt bases 64A and 64B in conjunction with each other.
  • FIGS. 7A and 7B are a schematic front view and a side view showing a sample holding form in the charged particle beam apparatus according to the first embodiment of the present invention.
  • FIG. 8 is a schematic perspective view showing the relationship between the sample and the processing direction in the charged particle beam apparatus according to the first embodiment of the present invention.
  • the TEM grid 67 is made of a thin plate, and a sample holder 67a is formed at the center. Five columns 67b1, 67b2, 67b3, 67b4, and 67b5 are formed on the sample holder 67a.
  • the sample 7A (7B) is formed by cutting out a part of a semiconductor device, for example.
  • Sample 7A (7B) has device structures 31, 32, and 33. The structures 31 and 33 are exposed on the cross section 7a as the observation surface.
  • the sample 7A (7B) is attached to the pillars 67b1 to 67b5 so that FIB, EB, and GIB are irradiated from the upper surface 7c side.
  • the normal direction of the cross section 7a of the sample 7A (7B) is substantially the y-axis direction. Attached to.
  • the sample 7A on the column 67b3 is disposed at the intersection of the axis F and the axis S1.
  • the sample 7B on the column 67b3 is disposed at the intersection of the axis F and the axis S2.
  • the charged particle beam apparatus 100 performs at least one of processing, observation, and analysis of the samples 7A and 7B (hereinafter, may be referred to as “processing or the like”) according to an operation input from the input unit 16. it can.
  • the samples 7A and 7B are shaped in advance to an appropriate size and then held on, for example, a TEM grid 67.
  • the TEM grid 67 holding the sample 7A is held by the sample holding portion 64c on the inclined base 64A of the sample holder 6 as shown in FIG.
  • the straight line T connecting the upper surface of the sample 7A is substantially parallel to the axis F (see FIGS. 7A and 7B), and the straight line T is substantially the same height as the axis S. It is held by the sample holder 64c so as to be positioned. Similarly, the TEM grid 67 holding the sample 7B is held by the sample holding portion 64c on the inclined base 64B of the sample holder 6. Such a placement operation of the TEM grid 67 is performed in a state where the sample holder 6 is carried out of the charged particle beam apparatus 100. For this reason, precise alignment is possible by using an appropriate jig, measuring device, or the like.
  • such an arrangement work of the TEM grid 67 may be performed by an operator different from the operator of the charged particle beam apparatus 100.
  • preparation for operation of the charged particle beam apparatus 100 is performed.
  • the control unit 17 sends a control signal to the sample stage control unit 15, and the sample stage 10 initializes the position of each stage to the reference position for each movement.
  • the sample holder 6 holding the samples 7A and 7B is placed on the sample stage 5a of the sample stage 10 of the charged particle beam apparatus 100.
  • the sample chamber 9 is evacuated.
  • evacuation may be completed when preparing for operation. In this case, the operator can install the sample holder 6 on the sample stage 5a through the load lock chamber while the sample chamber 9 is maintained in a vacuum state.
  • the control unit 17 controls each device portion of the charged particle beam device 100 based on an operation input from the input unit 16 of the operator, whereby the samples 7A and 7B are processed.
  • the operator causes the display unit 18 to display the SEM image or SIM image of the sample 7A.
  • the operator sets an irradiation area of the FIB 1b based on an observation image such as an SEM image or a SIM image displayed on the display unit 18.
  • the operator inputs a processing frame for setting an irradiation area on the observation image displayed on the display unit 18 through the input unit 16.
  • the control unit 17 transmits an irradiation region and a processing start signal to the FIB control unit 11, and the FIB control unit 11 sends the FIB to the designated irradiation region of the sample 7A. Is irradiated. As a result, the FIB 1b is irradiated onto the irradiation region input by the operator.
  • the FIB irradiation axis 1a and the EB irradiation axis 2a intersect each other.
  • the operator drives the sample stage 10 by an operation input from the input unit 16 so that the sample 7A (7B) is aligned at a position where the FIB irradiation axis 1a and the EB irradiation axis 2a intersect.
  • a control signal is sent from the control unit 17 to the sample stage control unit 15.
  • the rotary stage 5 is rotated under the control of the sample stage control unit 15.
  • the sample 7A (7B) is rotated around the rotation axis C in a state where the SEM image can be observed.
  • a control signal is sent from the control unit 17 to the sample holder control unit 40.
  • the tilt table 64A (64B) of the sample holder 6 is tilted in the y-axis direction or the x-axis direction under the control of the sample holder control unit 40.
  • the sample 7A (7B) is tilted in the y-axis direction or the x-axis direction in a state where the SEM image can be observed.
  • the inclination in the x-axis direction is an inclination caused by rotation in a direction represented by arrows SR1 and SR2 in FIG.
  • the inclination in the y-axis direction is an inclination due to rotation in a direction represented by arrows FR1 and FR2 in FIG.
  • the process which suppresses a curtain effect can be performed easily.
  • the position of the sample 7A (7B) is moved by the sample stage 10 and the sample holder 6, and the charged particle beam is irradiated from the direction of the arrow B1 to process the cross section 7a.
  • the etching rate is different between a portion where the structures 31 and 33 are exposed and a portion where the other semiconductor is exposed. Unevenness is formed on the cross section 7a. This phenomenon is known as the so-called curtain effect.
  • the observed image includes streaks due to the irregularities.
  • these streaks are formed by ion beam processing, they are not semiconductor device structures or defects. If a streak appears in the observed image, it may be indistinguishable from the structure or defect of the semiconductor device.
  • the irradiation direction of the charged particle beam is changed to the direction indicated by the arrow B2 while maintaining the eucentric state.
  • the unevenness generated by the curtain effect can be reduced by repeating the finishing process of checking the charged particle beam from a plurality of directions along the cross section 7a.
  • the operator inputs an operation to drive the sample stage 10, and translates the sample holder 6 in the x-axis direction by the distance of the sample 7B from the sample 7A. Move. In the sample holder 6, the distance of the sample 7B from the sample 7A is determined as the arrangement pitch of the tilting tables 64A and 64B in the x-axis direction. Therefore, such a movement operation is based on an operation input for starting movement by the operator.
  • the control unit 17 can automatically control.
  • the sample 7B is positioned in the irradiation region of the charged particle beam instead of the sample 7A.
  • the operator can start processing, observing, and analyzing the sample 7B immediately after the sample holder 6 is moved.
  • the posture of the sample 7B needs to be finely adjusted due to an attachment error of the sample 7B or the like, the operator holds the sample stage 10 or the sample holder 6 while observing the sample 7B before starting the processing.
  • the position of the sample 7B relative to the irradiation region may be finely adjusted by driving.
  • the sample 7B is processed in the same manner as the sample 7A.
  • the tilt table 64B that holds the sample 7B in the sample holder 6 is driven in the same manner as the tilt table 64A by the drive motor 73 that drives the tilt table 64A.
  • the tilt tables 64A and 64B are both disposed on the rotating table 63. Therefore, the tilt base 64B can be driven by the drive unit 66 in the same manner as the tilt base 64A. For this reason, when processing the sample 7B, processing that suppresses the curtain effect similar to the sample 7A can be performed.
  • the sample holder control unit 40 can also perform drive control during processing of the sample 7B by a drive control program for processing the sample 7A.
  • the operator takes out the sample holder 6 from the sample chamber 9 to take out the samples 7A and 7B to the outside of the sample stage 10. Further, when it is necessary to process another sample, the above-described processing or the like is performed by carrying another sample holder 6 holding another sample into the sample chamber 9 in the same manner as described above.
  • the charged particle beam apparatus 100 includes a load lock chamber
  • the sample chamber 9 is kept in a vacuum state during such unloading work. In this case, the operator can place the sample holder 6 holding the samples 7A and 7B whose positions are adjusted in advance outside the apparatus on the sample stage 10 without opening the sample chamber 9 to the atmosphere.
  • the operator can replace the sample holder 6 in the sample chamber 9 with another sample holder 6 without opening the sample chamber 9 to the atmosphere. For this reason, the operator can carry on the processing of the other samples 7A and 7B by using the charged particle beam apparatus 100 by immediately carrying the other sample holder 6 into the sample chamber 9.
  • a plurality of samples 7A and 7B positioned and held on the sample holder 6 can be collectively loaded into the sample chamber 9 and unloaded from the sample chamber 9. For this reason, by using the charged particle beam apparatus 100, the operator can quickly arrange and replace samples when processing a plurality of samples. In addition, the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • the charged particle beam apparatus 100 can process the samples 7A and 7B substantially continuously only by leaving a time for moving the samples 7A and 7B held on the sample holder 6 to the irradiation region of the charged particle beam. .
  • the throughput in processing the samples 7A and 7B and the operation efficiency of the charged particle beam apparatus 100 can be improved.
  • the sample holder 6 is carried out without releasing the vacuum state of the sample chamber 9, so that the sample replacement time associated with the replacement of the sample holder 6 is also increased. It can be further shortened.
  • the charged particle beam apparatus 100 when a complicated process such as a finishing process for suppressing the curtain effect is performed, a plurality of samples are arranged in the sample holder 6 including the tilting tables 64A and 64B interlocking with each other. Therefore, the control program for the sample holder 6 in each sample can be shared. Furthermore, since the tilt holders 64A and 64B can be interlocked with the sample holder 6, both the tilt tables 64A and 64B are driven by the drive motor 73 that is a single drive source. For this reason, the component cost of the sample holder 6 is reduced as compared with the case where the inclined bases 64A and 64B are driven by different driving sources. Furthermore, the sample holder 6 can be easily made compact.
  • FIG. 9 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the second embodiment of the present invention.
  • the charged particle beam apparatus 101 of the present embodiment includes a sample holder 106 instead of the sample holder 6 of the first embodiment. Further, as shown in FIG. 9, the charged particle beam apparatus 101 includes a sample holder 106 instead of the sample holder 6 of the first embodiment.
  • a description will be given centering on differences from the first embodiment.
  • the sample holder 106 has an inclined table 164A (first inclined table) and an inclined table 164B (second inclined table) instead of the inclined tables 64A and 64B and the worm 70 in the sample holder 6.
  • Table and a driving rod 170 (driving force supply unit).
  • the inclined bases 164A and 164B have the same shape.
  • the outer shape of the tilting table 164A (164B) has a substantially half-moon shape when viewed from the y-axis direction, and a flat surface portion 164a is formed at a position facing the arc portion.
  • a sample holding portion 64c (not shown) is disposed on the flat portion 164a, similarly to the flat portion 64b of the tilt table 64A (64B) of the first embodiment.
  • the inclined bases 164A, 164B are accommodated in the x-axis direction inside the hole 63a (not shown).
  • the positions of the inclined bases 164A, 164B in the y-axis direction are positioned by positioning portions (not shown) in the inner peripheral portion of the hole 63a.
  • the inclined base 164A (164B) includes a rotation support portion 164b and a locking portion 164c.
  • the rotation support portion 164b supports the tilt table 164A (164B) with respect to the rotation table 63 (not shown) so as to be rotatable about the axis S1 (S2) similar to that of the first embodiment.
  • the configuration of each rotation support portion 164b is not particularly limited as long as the tilt tables 164A and 164B can be supported so as to be rotatable about the axes S1 and S2, respectively.
  • the rotation support part 164b in FIG. 9 schematically represents a mechanism having a rotation support shaft coaxial with the axis S1 (S2) and a bearing provided on the rotation table 63.
  • the rotation support part 164b may be configured by a sliding engagement part formed on the inclined table 164A (164B) and the rotation table 63 along a track concentric with the axis S1 (S2).
  • the locking portion 164c is connected to a driving rod 170 for converting a driving force transmitted by a driving rod 170, which will be described later, into a turning force around the axis S1 (S2).
  • a driving rod 170 for converting a driving force transmitted by a driving rod 170, which will be described later, into a turning force around the axis S1 (S2).
  • an appropriate protrusion, hole, groove, or the like may be used according to the configuration of the drive rod 170.
  • the locking portion 164 c is configured by a pin member that protrudes in the y-axis direction in the outer peripheral side region of the inclined base 164 ⁇ / b> A (164 ⁇ / b> B).
  • the drive rod 170 is a rod-shaped member that extends in the x-axis direction.
  • the drive rod 170 is supported by a linear guide provided on a turntable 63 (not shown) so as to be able to advance and retreat in the x-axis direction.
  • the drive rod 170 includes engaging portions 170a that are connected to the respective locking portions 164c while being in contact with the respective locking portions 164c of the inclined bases 164A and 164B in the x-axis direction.
  • an appropriate configuration may be used in which the engaging portion 164c abuts in the x-axis direction and the engaging portion 164c is freely movable in a direction perpendicular to the x-axis and the y-axis.
  • the engaging portion 170a penetrates in the y-axis direction in the drive rod 170 and is orthogonal to the x-axis and the y-axis. You may comprise a long hole in a direction.
  • the engaging portion 164c made of a pin member is fitted to the engaging portion 170a made of a long hole so as to be slidable in the longitudinal direction.
  • the engaging portion 170a may be configured by a protrusion such as a pin.
  • the drive unit 166 includes a drive source 173 (drive power supply unit) instead of the drive motor 73 and the gears 74 and 72 of the drive unit 66 of the first embodiment.
  • the drive source 173 is connected to the sample holder control unit 40 so as to be communicable.
  • the drive source 173 moves the drive rod 170 forward and backward in the x-axis direction based on a control signal from the sample holder control unit 40.
  • the configuration of the driving source 173 is not particularly limited as long as a driving force for driving the driving rod 170 can be supplied.
  • the drive source 173 is configured by a linear motion motor that drives the output shaft 173a in the axial direction.
  • the output shaft 173a is disposed along the x-axis direction and is connected to the end of the drive rod 170.
  • the output shaft 173a of the drive source 173 is not directly connected to the drive rod 170, and may be connected to the drive rod 170 via a transmission mechanism such as a cam, a link, or a gear.
  • the drive source 173 may be configured by a rotary motor and a transmission mechanism that converts rotational motion into linear motion.
  • the drive rod 170 moves in the same direction.
  • the driving force in the same direction is transmitted to the inclined bases 164A and 164B via the locking portion 164c engaged with the engaging portion 170a.
  • the tilting table 164A (164B) rotates around the axis S1 (S2) in the arrow SR1 (SR2).
  • each flat surface portion 164a of the tilt tables 164A, 164B is tilted in the x-axis direction together with the sample holding portion 64c (not shown).
  • the sample holder 106 in the present embodiment is different from the sample holder 6 in the first embodiment in the drive mechanism for tilting the tilt tables 164A and 164B.
  • the sample holder 106 can tilt the tilt tables 164A and 164B in conjunction with the x-axis direction, similarly to the first embodiment, based on the control signal from the sample holder controller 40.
  • exchange of a sample can be performed rapidly like the said 1st Embodiment.
  • the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • the configuration of the inclined bases 164A and 164B is simpler than the case where the worm wheel is formed. It becomes. For this reason, according to the sample holder 106, the manufacturing cost of the sample holder 106 can be reduced, or the configuration of the sample holder 106 can be made compact.
  • FIG. 10 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the third embodiment of the present invention.
  • the charged particle beam apparatus 102 includes a sample holder 206 instead of the sample holder 6 according to the first embodiment. Furthermore, as shown in FIG. 10, the charged particle beam apparatus 102 includes a sample holder 206 instead of the sample holder 6 of the first embodiment.
  • a description will be given centering on differences from the first embodiment.
  • the sample holder 206 has an inclined table 264 A (first inclined table) and an inclined table 264 B (second inclined table) instead of the inclined tables 64 A and 64 B and the worm 70 in the sample holder 6.
  • Table an inclined table 264 A
  • second inclined table instead of the inclined tables 64 A and 64 B and the worm 70 in the sample holder 6.
  • Table a spur gear 270 (third gear, driving force supply unit).
  • the inclined bases 264A, 264B have the same shape.
  • the outer shape of the inclined base 264A (264B) has a substantially half-moon shape when viewed from the y-axis direction, and a flat surface portion 264a is formed at a position facing the arc portion.
  • a sample holding portion 64c (not shown) is disposed on the flat surface portion 264a, similarly to the flat surface portion 64b of the inclined base 64A (64B) of the first embodiment.
  • the inclined bases 264A, 264B are accommodated side by side in the x-axis direction inside a hole 63a (not shown).
  • the positions of the inclined bases 264A, 264B in the y-axis direction are positioned by positioning portions (not shown) in the inner peripheral portion of the hole 63a.
  • the inclined base 264A (264B) includes a rotation support portion 264b and a spur gear 264c.
  • the rotation support part 264b supports the inclined table 264A (264B) with respect to the rotation table 63 (not shown) so as to be rotatable about the axis S1 (S2) similar to the first embodiment.
  • the configuration of each rotation support portion 264b is not particularly limited as long as the tilt tables 264A and 264B can be supported so as to be rotatable about the axes S1 and S2, respectively.
  • the rotation support portion 264b may have the same configuration as the rotation support portion 164b of the second embodiment.
  • the rotation support portion 264b may have a configuration in which the roller 65 and the guide groove 64e are combined as in the first embodiment.
  • the spur gear 264c of the inclined base 264A (264B) is formed so that the center of the pitch circle is coaxial with the axis S1 (S2) in the arc-shaped outer periphery of the inclined base 264A (264B).
  • the spur gear 264c of the inclined base 264A constitutes a first gear having the axis S1 as the first rotation axis and the center of the pitch circle.
  • the spur gear 264c of the inclined base 264B constitutes a second gear having the axis S2 as the second rotation axis as the center of the pitch circle.
  • the spur gear 270 has a module that meshes with each spur gear 264c.
  • the spur gear 270 is disposed at a position where the spur gear 270 meshes with each spur gear 264c in an intermediate portion below the inclined bases 264A, 264B.
  • the drive unit 266 is configured by deleting the gears 74 and 72 from the drive unit 66 of the first embodiment. Further, the drive unit 266 is arranged such that at least the drive motor 73 is coaxial with the center of the pitch circle of the spur gear 270 inside the turntable 63.
  • the drive motor 73 in this embodiment is fixed to the spur gear 270 at the tip of the output shaft 73a.
  • the drive motor 73 of the present embodiment rotates the spur gear 270 counterclockwise (see solid line arrow) or clockwise (see broken line arrow) in the figure based on a control signal from the sample holder control unit 40.
  • the output shaft 173a of the drive motor 73 is not directly connected to the spur gear 270 but may be connected to the spur gear 270 via a transmission mechanism including an appropriate gear train, a speed reduction mechanism, and the like.
  • each spur gear 264c rotates in the direction of the arrow SR1 (SR2).
  • SR1 arrow SR2
  • the sample holder 206 in the present embodiment is different from the sample holder 6 in the first embodiment in the drive mechanism of the tilt bases 264A, 264B.
  • the sample holder 206 can tilt the tilt tables 264A and 264B in conjunction with the x-axis direction, similarly to the first embodiment, based on the control signal from the sample holder controller 40.
  • exchange of a sample can be performed rapidly like the said 1st Embodiment.
  • the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • FIG. 11 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fourth embodiment of the present invention.
  • the z-axis direction is a direction orthogonal to the x-axis direction and the y-axis direction.
  • configurations other than those described below are the same as those in the first or second embodiment.
  • the sample holder 406 includes a first tilting table 464A, a second tilting table 464B, and a driving force supply unit 470.
  • the first tilting table 464A includes a tilting table main body 464, a rotation support portion 468, and a locking portion 469.
  • the tilt base body 464 is formed in a substantially semicircular shape that is substantially semicircular when viewed from the y-axis direction.
  • the tilt base main body 464 has a flat surface portion FS and an arc portion RS on the outer periphery.
  • a sample 7A is arranged on the flat surface part FS via a sample holding part and a TEM grid.
  • the rotation support portion 468 is formed in a cylindrical pin shape, for example.
  • the rotation support portion 468 protrudes in the y-axis direction from the end surface in the y-axis direction of the tilt base body 464.
  • the central axis of the rotation support portion 468 coincides with the axis S1.
  • the rotation support portion 468 supports the tilt base body 464 so that the tilt base body 464 can rotate around the axis S1.
  • the locking part 469 is formed in a cylindrical pin shape, for example.
  • the locking portion 469 protrudes in the y-axis direction from the end surface in the y-axis direction of the inclined base body 464.
  • the locking portion 469 is spaced from the rotation support portion 468 and is disposed in the vicinity of the arc portion RS.
  • the separation direction of the rotation support part 468 and the locking part 469 is parallel to the plane part FS.
  • the configuration of the second tilting table 464B is the same as that of the first tilting table 464A.
  • the rotation support portion 468 of the second tilt table 464B supports the tilt table body 464 so that the tilt table body 464 can rotate around the axis S2.
  • a sample 7B is arranged on the flat surface part FS via a sample holding part and a TEM grid.
  • the driving force supply unit 470 includes a driving arm 475 and a driving source 473.
  • the drive arm 475 is formed in a substantially U-shaped plate shape when viewed from the y-axis direction.
  • the drive arm 475 is disposed in the y-axis direction of each of the inclined bases 464A and 464B.
  • the drive arm 475 is disposed with both tip portions directed in the z-axis direction.
  • Engaging portions 479 are formed at both ends of the drive arm 475. The positions in the z-axis direction of the engaging portions 479 at both ends are the same.
  • the engaging portion 479 is a through hole that penetrates the drive arm 475 in the y-axis direction, for example.
  • the engaging portion 479 is formed in an oval shape when viewed from the y-axis direction.
  • the major axis direction is the x-axis direction
  • the minor axis direction is the z-axis direction.
  • the engaging portion 479 is inserted with a locking portion 469 of each inclined base 464A, 464B.
  • the plane portions FS of the inclined bases 464A and 464B are arranged in the same plane or at the same inclination angle.
  • the samples 7A and 7B arranged on the flat surface portion FS of the inclined bases 464A and 464B have the same angle around the y axis.
  • the drive source 473 is connected to the proximal end portion of the drive arm 475.
  • the drive source 473 moves the drive arm 475 in the z-axis direction based on a control signal from the sample holder control unit 40.
  • the drive source 473 is, for example, a piezo element.
  • the drive source 473 may be a ball screw mechanism, for example.
  • the drive source 473 moves the drive arm 475 in the z-axis direction.
  • the engaging portion 479 of the drive arm 475 moves the locking portion 469 of each of the inclined bases 464A and 464B in the z-axis direction.
  • each inclination stand 464A, 464B rotates centering on axis line S1, S2.
  • the locking portion 469 moves in the x-axis direction. Since the engaging portion 479 of the driving arm 475 is formed in an oval shape, the locking portion 469 is allowed to move in the x-axis direction.
  • the angle around the y-axis of the samples 7A and 7B arranged on the flat surface portion FS is changed by the rotation of the inclined bases 464A and 464B. Thereby, processing and observation can be performed on the samples 7A and 7B from various angles. If the drive source 473 is driven in the same manner, the angles of the sample 7A and the sample 7B change similarly. Therefore, sample 7A and sample 7B can be processed similarly.
  • the charged particle beam apparatus including the sample holder 406 can quickly arrange and replace the sample, as in the first or second embodiment.
  • the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • the sample holder 406 is detachable from the upper surface of the sample stage 10 shown in FIG. That is, the driving source 473 supplies driving force in the z-axis direction that intersects (orthogonally) the upper surface of the sample stage 10.
  • the sample holder 406 is compact in the x-axis direction and the y-axis direction. Therefore, even when there are structures in the x-axis direction and the y-axis direction of the sample stage 10, the sample holder 406 that does not interfere with the structure can be provided.
  • the drive arm 475 is formed in a substantially U-shaped plate shape.
  • the drive arm 475 may be configured by a link mechanism.
  • the drive arm 475 may include a proximal arm connected to the drive source 473 and a pair of rotating arms that are pin-coupled to both ends of the proximal arm.
  • a circular through hole is formed at the tip of the rotating arm when viewed from the y-axis direction. Locking portions 469 of the inclined bases 464A and 464B are inserted into the through holes. As a result, when the tilt bases 464A and 464B are rotated by the drive source 473, the positional accuracy of the tilt bases 464A and 464B is improved.
  • FIG. 12 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fourth embodiment of the present invention.
  • the position of the locking portion 469m of the first inclined base 464A is different.
  • the configuration other than the configuration described below is the same as that of the fourth embodiment.
  • the locking portion 469m of the first inclined base 464A is spaced apart from the rotation support portion 468 and is disposed in the vicinity of the arc portion RS.
  • the separation direction of the rotation support part 468 and the locking part 469m is a direction intersecting (orthogonal) with the plane part FS.
  • the position of the locking portion 469 of the second inclined base 464B is the same as in the fourth embodiment.
  • the locking portions 469m of the inclined bases 464A and 464B are inserted into the engaging portions 479 of the drive arm 475.
  • the plane part FS of the first tilt table 464A and the plane part FS of the second tilt table 464B are arranged at different tilt angles (in an orthogonal state).
  • the samples 7A and 7B arranged on the plane part FS of the inclined bases 464A and 464B are greatly different in angle around the y axis.
  • the sample 7A and the sample 7B can be processed from greatly different angles.
  • one locking portion 469m is formed in the vicinity of the arc portion RS.
  • locking part 469m may be formed along circular arc part RS. In this case, if a different locking portion 469m is inserted into the engaging portion 479, the inclination angle of the flat surface portion FS changes. Thereby, the angle around the y-axis of the sample 7A can be changed.
  • FIG. 13 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fifth embodiment of the present invention.
  • configurations other than those described below are the same as those in the first or third embodiment.
  • the sample holder 506 includes a first tilting table 564A, a second tilting table 564B, and a driving force supply unit 570.
  • the first tilting table 564A includes a tilting table main body 564, a rotation support portion 568, and an arc gear (first gear) 569.
  • the inclined base body 564 is formed in a substantially semicircular shape that is substantially semicircular when viewed from the y-axis direction.
  • the tilt base main body 564 has a flat surface portion FS and an arc portion RS on the outer periphery.
  • a sample 7A is arranged on the flat surface part FS via a sample holding part and a TEM grid.
  • the rotation support part 568 is formed in a cylindrical pin shape, for example.
  • the rotation support portion 568 protrudes in the y-axis direction from the end surface in the y-axis direction of the tilt base body 564.
  • the central axis of the rotation support portion 568 coincides with the axis S1.
  • the rotation support portion 568 supports the tilt base body 564 so that the tilt base body 564 can rotate around the axis S1.
  • the arc gear 569 is a part of the outer periphery of the gear.
  • the arc gear 569 is formed in the arc portion RS of the tilt base body 564.
  • the center of the pitch circle of the arc gear 569 coincides with the axis S1.
  • the configuration of the second tilting table 564B is the same as that of the first tilting table 564A.
  • the rotation support part 568 of the second tilt table 564B supports the tilt table body 564 so that the tilt table body 564 can rotate around the axis S2.
  • the center of the pitch circle of the arc gear (second gear) 569 coincides with the axis S2.
  • a sample 7B is arranged on the flat surface part FS via a sample holding part and a TEM grid.
  • the driving force supply unit 570 includes a pinion gear (third gear) 579, a rack gear 575, and a driving source 573.
  • the pinion gear 579 is a spur gear.
  • the pinion gear 579 is disposed at an intermediate portion between the inclined bases 564A and 564B in the x-axis direction.
  • the pinion gear 579 meshes with the arc gear 569 of each of the inclined bases 564A and 564B. That is, one pinion gear 579 meshes with the arc gear 569 of each of the inclined bases 564A and 564B.
  • the rack gear 575 is disposed in parallel with the x-axis direction.
  • the rack gear 575 is disposed on the opposite side of the inclined bases 564A and 564B with the pinion gear 579 interposed therebetween.
  • Rack gear 575 meshes with pinion gear 579.
  • the plane portions FS of the inclined bases 564A and 564B are arranged in parallel or in the same plane.
  • the samples 7A and 7B arranged on the flat surface portion FS of the inclined bases 564A and 564B have the same angle around the y axis.
  • Drive source 573 is connected to rack gear 575.
  • the drive source 573 moves the rack gear 575 in the x-axis direction based on a control signal from the sample holder control unit 40.
  • the drive source 573 is, for example, a ball screw mechanism.
  • the drive source 573 moves the rack gear 575 in the x-axis direction.
  • the rack gear 575 rotates the pinion gear 579.
  • the pinion gear 579 rotates the inclined bases 564A and 564B in the same manner via the arc gear 569.
  • the angle around the y-axis of the samples 7A and 7B arranged on the flat surface portion FS is changed by the rotation of the inclined bases 564A and 564B. Thereby, processing and observation can be performed on the samples 7A and 7B from various angles. If the drive source 573 is driven in the same manner, the angles of the sample 7A and the sample 7B change similarly. Therefore, sample 7A and sample 7B can be processed similarly.
  • the charged particle beam apparatus provided with the sample holder 506 can quickly arrange and replace the sample as in the first or third embodiment.
  • the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • FIG. 14 is a schematic front view showing an example of the internal structure of the sample holder in the charged particle beam apparatus according to the fifth embodiment of the present invention.
  • a separate pinion gear 579m meshes with the arc gear 569 of each of the inclined bases 564A, 564B.
  • the configuration other than the configuration described below is the same as that of the fifth embodiment.
  • the pinion gear 579m is disposed below the first inclined base 564A.
  • the pinion gear 579 meshes with the arc gear 569 of the first inclined base 564A.
  • Each pinion gear 579m has the same number of teeth.
  • the rack gear 575 meshes with each pinion gear 579m.
  • the plane portions FS of the inclined bases 564A and 564B are arranged in parallel or in the same plane.
  • the samples 7A and 7B arranged on the flat surface portion FS of the inclined bases 564A and 564B have the same angle around the y axis.
  • the charged particle beam apparatus including the sample holder 506m according to the modified example can quickly arrange and replace the sample as in the first or third embodiment.
  • the charged particle beam apparatus can form a sample safely and efficiently even when processing a plurality of samples.
  • the number of teeth of each pinion gear 579m is the same.
  • the number of teeth of each pinion gear 579m may be different.
  • the rack gear 575 is moved in the x-axis direction
  • the inclined bases 564A and 564B rotate at different angles.
  • the plane part FS of the first tilt table 564A and the plane part FS of the second tilt table 564B are arranged at different tilt angles.
  • the samples 7A and 7B arranged on the plane portions FS of the inclined bases 564A and 564B have different angles around the y axis. Therefore, the sample 7A and the sample 7B can be processed from different angles.
  • the FIB column 1 is arranged in the vertical direction, and the EB column 2 and the GIB column 3 are arranged in an inclined manner with respect to the vertical axis.
  • the positional relationship between the FIB column 1 and the EB column 2 or the FIB column 1 and the GIB column 3 may be interchanged.
  • the charged particle beam that can be irradiated in the charged particle beam apparatus is described as an example of three types of FIB, EB, and GIB.
  • the type of charged particle beam and the number of irradiations are not limited to this.
  • the type and number of charged particle beams are not particularly limited as long as they are 1 or more.
  • the sample holder is provided with a tilt stage that tilts the first tilt table and the second tilt table in the x-axis direction in the y-axis direction orthogonal to the x-axis direction.
  • the sample holder may not be provided with an inclined stage inclined in the y-axis direction.
  • the first tilt table and the second tilt table in the sample holder may be movably supported by a moving stage other than the tilt stage. Examples of the moving stage other than the tilt stage include a rotary stage and a translation stage.
  • first tilt table and the second tilt table may be tilted in opposite directions by being rotated in opposite directions around the respective rotation axes.
  • first embodiment if the twist direction of the teeth of the worm wheel 64a of the tilt base 64A and the twist direction of the teeth of the worm wheel 64a of the tilt base 64B are reversed, the tilt bases 64A, 64B.
  • the inclination directions are also opposite to each other.
  • first tilt base and the second tilt base are arranged on a straight line extending in a direction orthogonal to the first rotation axis and the second rotation axis.
  • first tilt table and the second tilt table may be arranged at positions separated from each other in the y-axis direction.
  • first tilt base and the second tilt base are interlocked so as to tilt at the same tilt angle.
  • first tilt table and the second tilt table can be interlocked, the tilt angles may be different.
  • the tilt angle range, the tilt speed, and the like of the first tilt table and the second tilt table can be made different from each other.
  • the 1st gear and the 2nd gear were each formed in the outer peripheral part of the 1st tilting table and the 2nd tilting table.
  • the first gear and the second gear are arranged coaxially with the first rotation axis and the second rotation axis, respectively, the first tilt table and the second tilt table side. It may be arranged in the direction.
  • the pitch circle diameters of the first gear and the second gear may be set regardless of the outer diameters of the first tilt base and the second tilt base.
  • the first gear and the second gear may be connected to the first tilt base and the main body of the second tilt base via a clutch or the like that releases transmission of the driving force.
  • the rotation of one of the first tilt table and the second tilt table may be selectively stopped by a clutch or the like.
  • the tilt table that is not processed or the like may be released from the driving force during the processing or the like.
  • the first tilt table and the second tilt table may be driven by a single drive source so as to be interlocked. That is, the first tilt table and the second tilt table need not always be tilted in conjunction with each other.
  • the tilt table provided in the sample holder may have three or more tilt tables tilted by the same drive source.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

La présente invention concerne un appareil à faisceau de particules chargées, comprenant : un barillet à faisceau de particules chargées servant à émettre des faisceaux de particules chargées sur un échantillon ; une base d'inclinaison (64A) comportant une première partie de maintien d'échantillon apte à maintenir l'échantillon et maintenant la première partie de maintien d'échantillon pour qu'elle puisse tourner autour d'un axe (S1) ; une base d'inclinaison (64B) comportant une seconde partie de maintien d'échantillon apte à maintenir l'échantillon et maintenant la seconde partie de maintien d'échantillon pour qu'elle puisse tourner autour d'un axe (S2) parallèle à l'axe (S1) ; et une partie d'application de force d'entraînement qui applique aux bases d'inclinaison (64A, 64B) une force d'entraînement servant à tourner les bases d'inclinaison (64A, 64B) en association l'une avec l'autre.
PCT/JP2018/012609 2017-03-27 2018-03-27 Appareil à faisceau de particules chargées WO2018181409A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US16/495,506 US20200251303A1 (en) 2017-03-27 2018-03-27 Charged particle beam apparatus
KR1020197024232A KR20190129839A (ko) 2017-03-27 2018-03-27 하전 입자 빔 장치
CN201880021206.9A CN110476220A (zh) 2017-03-27 2018-03-27 带电粒子束装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2017060903 2017-03-27
JP2017-060903 2017-03-27
JP2018-055231 2018-03-22
JP2018055231A JP2018163878A (ja) 2017-03-27 2018-03-22 荷電粒子ビーム装置

Publications (1)

Publication Number Publication Date
WO2018181409A1 true WO2018181409A1 (fr) 2018-10-04

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Application Number Title Priority Date Filing Date
PCT/JP2018/012609 WO2018181409A1 (fr) 2017-03-27 2018-03-27 Appareil à faisceau de particules chargées

Country Status (1)

Country Link
WO (1) WO2018181409A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01213945A (ja) * 1988-02-20 1989-08-28 Shimadzu Corp 薄層のｘ線分光分析方法
JP2006242796A (ja) * 2005-03-04 2006-09-14 Sii Nanotechnology Inc 加工用ステージ及び集束ビーム加工装置並びに集束ビーム加工方法
JP2006286514A (ja) * 2005-04-04 2006-10-19 Jeol Ltd ステージ傾斜機構
US20120074320A1 (en) * 2010-09-29 2012-03-29 Josef Biberger Particle beam device having a sample holder

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01213945A (ja) * 1988-02-20 1989-08-28 Shimadzu Corp 薄層のｘ線分光分析方法
JP2006242796A (ja) * 2005-03-04 2006-09-14 Sii Nanotechnology Inc 加工用ステージ及び集束ビーム加工装置並びに集束ビーム加工方法
JP2006286514A (ja) * 2005-04-04 2006-10-19 Jeol Ltd ステージ傾斜機構
US20120074320A1 (en) * 2010-09-29 2012-03-29 Josef Biberger Particle beam device having a sample holder

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