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WO2018176629A1 - 显示面板及其制造方法 - Google Patents

显示面板及其制造方法 Download PDF

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Publication number
WO2018176629A1
WO2018176629A1 PCT/CN2017/086640 CN2017086640W WO2018176629A1 WO 2018176629 A1 WO2018176629 A1 WO 2018176629A1 CN 2017086640 W CN2017086640 W CN 2017086640W WO 2018176629 A1 WO2018176629 A1 WO 2018176629A1
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WO
WIPO (PCT)
Prior art keywords
protective layer
layer
substrate
display panel
disposed
Prior art date
Application number
PCT/CN2017/086640
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English (en)
French (fr)
Inventor
陈猷仁
Original Assignee
惠科股份有限公司
重庆惠科金渝光电科技有限公司
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Application filed by 惠科股份有限公司, 重庆惠科金渝光电科技有限公司 filed Critical 惠科股份有限公司
Priority to US15/550,660 priority Critical patent/US20190384127A1/en
Publication of WO2018176629A1 publication Critical patent/WO2018176629A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133371—Cells with varying thickness of the liquid crystal layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133368—Cells having two substrates with different characteristics, e.g. different thickness or material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40—Arrangements for improving the aperture ratio

Definitions

  • the present application relates to a display panel and a method of fabricating the same, and more particularly to a display panel having protective layers of different thicknesses and a method of fabricating the same.
  • liquid crystal displays In recent years, with the advancement of technology and the diversification of people's needs, liquid crystal displays (LCDs) have been widely used in all aspects of public life. Most of the liquid crystal displays are backlight type liquid crystal displays, which are composed of a liquid crystal display panel and a backlight module.
  • the liquid crystal display panel usually comprises a color filter substrate (CF), a thin film transistor array substrate (Thin Film Transistor Array Substrate, TFT Array Substrate), and a liquid crystal layer (Liquid Crystal Layer, LC Layer) disposed between the two substrates.
  • CF color filter substrate
  • TFT Array Substrate thin film transistor array substrate
  • LC Layer liquid crystal layer
  • the vertical alignment type (VA) mode liquid crystal display such as a Pattern Vertical Alignment (PVA) liquid crystal display or a Multi-domain Vertical Alignment (MVA) liquid crystal display device, wherein
  • PVA Pattern Vertical Alignment
  • MVA Multi-domain Vertical Alignment
  • the MVA type divides a single pixel into a plurality of regions, and uses a protrusion or a specific pattern structure to tilt liquid crystal molecules located in different regions toward different directions to achieve a wide viewing angle and enhance the transmittance.
  • the current mainstream is to distinguish the pixels into bright and dark areas. Therefore, the optical performance can be mixed by two VT characteristics. In addition, the proportion of bright and dark areas can be appropriately adjusted, and the medium gray can be effectively suppressed at a large viewing angle. The problem of whitening.
  • an object of the present invention is to provide a display panel having a protective layer of different thicknesses and a manufacturing method thereof, which can not only improve the aperture ratio of the pixel but also improve the color shift of the display panel.
  • a display panel includes: a first substrate; a plurality of pixel units disposed on the first substrate; a protective layer disposed on the first substrate and covering the pixel unit In each pixel unit, the protective layer is divided into a plurality of transparent regions of different thicknesses; a transparent electrode layer is disposed on the protective layer and covers the transparent regions of different thicknesses of the protective layer.
  • the light transmissive area of each of the pixel units is divided into a main light transmissive area having a first thickness, a sub-transparent area having a second thickness, and having a third thickness according to different thicknesses.
  • the second light transmission zone of thickness is divided into a main light transmissive area having a first thickness, a sub-transparent area having a second thickness, and having a third thickness according to different thicknesses.
  • a difference in thickness between the primary light transmitting region and the second light transmitting region, and between the secondary light transmitting region and the second light transmitting region is equal to or greater than 1 um.
  • the protective layer is a flat layer or a passivation layer of silicon nitride and a compound material thereof.
  • Another object of the present application is a method of manufacturing a display panel, comprising: providing a first substrate, wherein the first substrate has a plurality of pixel units; providing a color resist layer on the first substrate; and providing a protection Layered on the first substrate and covering the color resist layer; patterning the protective layer such that the protective layer is formed on a plurality of different thicknesses on each of the pixel units; and a transparent electrode layer is disposed on the pattern The protective layer is patterned; and the transparent electrode layer is patterned to expose a portion of the protective layer, and a black matrix layer and a plurality of photo spacers are disposed on the exposed protective layer.
  • the light transmissive area of each of the pixel units is divided into a main light transmissive area having a first thickness, a second light transmissive area having a second thickness, and a third light thickness according to different thicknesses.
  • the second light transmission zone is divided into a main light transmissive area having a first thickness, a second light transmissive area having a second thickness, and a third light thickness according to different thicknesses.
  • a difference in thickness between the primary light transmitting region and the second light transmitting region, and between the secondary light transmitting region and the second light transmitting region is equal to or greater than 1 um.
  • the protective layer when the protective layer is patterned, the protective layer is patterned by using a halftone mask having a transmissive region, a half transmissive region, and a non-transmissive region.
  • the patterned protective layers are made to have different thicknesses.
  • the protective layer is a flat layer or a passivation layer of silicon nitride and a compound material thereof.
  • the display panel includes: a first substrate; a plurality of pixel units disposed on the first substrate; a protective layer disposed on the first substrate and covering the pixel unit, in each pixel unit
  • the protective layer is divided into a plurality of transparent regions of different thicknesses; a transparent electrode layer is disposed on the protective layer and covers the transparent regions of different thicknesses of the protective layer; a second substrate, and the The first substrate is oppositely disposed; a liquid crystal layer is disposed between the first substrate and the second substrate.
  • the application can not only improve the aperture ratio of the pixel, but also improve the color shift of the display panel.
  • FIG. 1a is a graph showing a transmittance-grayscale value corresponding to a color shift angle of a display device according to an embodiment of the present invention in a 0 degree angle view, a 45 degree angle view, and a 60 degree angle of view.
  • FIG. 1b is a brightness-gray scale curve corresponding to mixing two improved color shift angles according to an embodiment of the present application.
  • 2 is a hybrid low color shift region model according to an embodiment of the present application.
  • FIG. 3a is a schematic diagram of a gradient protection layer according to an embodiment of the present application.
  • FIG. 3b is a schematic diagram of a display panel with a gradient protection layer according to an embodiment of the present application.
  • FIG. 4 is a schematic view of a display panel of a gradient protection layer according to still another embodiment of the present application.
  • Figure 5a illustrates three GAMMA curves using a transmittance-voltage curve in accordance with an embodiment of the present application.
  • Figure 5b illustrates three GAMMA curves using the transmittance-grayscale values for an embodiment of the present application.
  • Figure 6 is a schematic view showing the manufacture of a gradient protective layer of the present application.
  • the word “comprising” is to be understood to include the component, but does not exclude any other component.
  • “on” means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.
  • a display panel and a manufacturing method thereof according to the present application have a specific embodiment and structure. , characteristics and efficacy, as detailed below.
  • the display device of the present application may include a backlight module and a display panel.
  • the display panel may include a thin film transistor (TFT) substrate, a color filter (CF) substrate, and a liquid crystal layer formed between the two substrates.
  • TFT thin film transistor
  • CF color filter
  • the display panel of the present application may be a curved display panel, and the display device of the present application may also be a curved display device.
  • the thin film transistor (TFT) or other active switch and color filter (CF) of the present application may be formed on the same substrate.
  • 1a is a transmittance-grayscale value curve corresponding to a color shift angle of a vertical alignment type liquid crystal display device in a case of a 0 degree angle of view, a 45 degree angle of view, and a 60 degree angle of view.
  • the transmittance-gray scale value curve 110 corresponding to the 0 degree color shift angle of view
  • the transmittance-gray scale value curve 120 corresponding to the 45 degree color shift angle of view
  • the 60 degree color shift angle view Corresponding penetration-grayscale value curve 130. Therefore, as the angle of view of the color shift is higher, the brightness transmittance is higher in the same gray scale value.
  • Figure 1b shows the brightness-grayscale curve corresponding to the two improved color shift angles. Please refer to Figure 1b.
  • the pixel is divided into a bright area and a dark area, so the optical performance can be mixed by two kinds of V-T characteristics, and the ratio of the area of the light and dark areas is appropriately adjusted, so that the problem of whitening of the gray scale can be effectively suppressed at a large viewing angle.
  • the bright region gray scale 140 and the dark region pixel 150 they are mixed and adjusted into the pixels 160 in the luminance-gray scale pattern.
  • Figure 2 shows a mixed low color shift region model.
  • the main principle of the common Low Color Shift technology is to cut the conventional 4 regions into 8 regions by using partial pressure or extra driving. Therefore, there will be multi-domain compensation effects under a large viewing angle.
  • the sub-low color shift region 210 and the main low color shift region 220 are mixed into a low color shift region 200.
  • a display panel 30 includes: a first substrate 310; a plurality of pixel units disposed on the first substrate 310, wherein the pixels The unit includes a first color resist 321 in parallel, a second color resist 322 and a third color resist 323.
  • a protective layer 330 is disposed on the first substrate 310 and covers the pixel unit.
  • the protective layer 330 is divided into at least three transparent regions of different thicknesses; a black matrix layer 371 and a plurality of photo spacers 372 are disposed on the protective layer 330; a transparent electrode layer 340, disposed on the protective layer 330 and covering the transparent regions of different thicknesses of the protective layer 330; a second substrate 360 disposed opposite to the first substrate 310, a common electrode layer 350 disposed on On the second substrate 360, a liquid crystal layer 380 is disposed between the first substrate 310 and the second substrate 360.
  • the light transmissive area of each of the first color resist, each of the second color resist, and each of the third color resists may be Depending on the thickness, it is divided into a main light-transmissive region 001 having a first thickness 31, a secondary light-transmitting region 002 having a second thickness 32, and a second light-transmitting region 003 having a third thickness 33.
  • a difference in thickness between the primary light transmission region 001 and the secondary light transmission region 002 and between the secondary light transmission region 002 and the second light transmission region 003 is equal to Or greater than 1um.
  • the protective layer 330 is a flat layer or a passivation layer of silicon nitride and a compound material thereof.
  • the black matrix layer 371 and the plurality of photo spacers 372 are the same material, and are integrally formed on the protective layer 330 through the same photomask.
  • a display panel 40 includes: a first substrate, a plurality of data lines 410, and a plurality of scan lines 430 disposed on the first substrate, wherein The plurality of data lines 410 and the plurality of scan lines 430 define a plurality of pixel regions, each of the pixel regions including a first color resist 421, a second color resist 422, and a third color resist 423; a protective layer disposed on the first substrate; a black matrix layer 442 and a plurality of photo spacers 441 disposed on the first substrate and covering the plurality of data lines 410 and the plurality of scans Line 430.
  • the protective layer is divided into at least three transparent regions of different thickness; a transparent electrode layer, a second substrate is disposed opposite to the first substrate, and a common electrode layer is disposed on the second substrate; A liquid crystal layer is disposed between the first substrate and the second substrate.
  • the light transmissive region in each of the pixel units, may be divided into a main light transmissive region 004 having a first thickness and encompassing the color difference depending on the color resist and the thickness of the protective layer.
  • the first color resist 421 has a second light transmissive region 005 of a second thickness and covers the second color resist 422, and a second light transmissive region 006 having a third thickness and covers the third color resist 423.
  • a difference in thickness between the primary light transmitting region 004 and the secondary light transmitting region 005 and between the secondary light transmitting region 005 and the second light transmitting region 006 is equal to Or greater than 1um.
  • the protective layer is a flat layer or a passivation layer of silicon nitride and a compound material thereof.
  • the black matrix layer 442 and the plurality of photo spacers 441 are the same material, and are integrally formed on the protective layer through the same photomask.
  • the protective layer design having different thicknesses is different from the conventional liquid crystal deflection angle by dividing voltage, and the design can use only one active switch (for example, a thin film) under the same input voltage.
  • the transistor is used to drive the entire pixel, so that the deflection angles of the liquid crystal molecules located in different light-transmitting regions are different, thereby improving the color shift problem.
  • Figure 5a illustrates three GAMMA curves using a transmittance-voltage curve in accordance with an embodiment of the present application.
  • the transmittance-voltage value curve 510 corresponding to 3.6 liquid crystal layer gap (Cell Gap)
  • the transmittance-voltage value curve 520 corresponding to 3.9 liquid crystal layer gap (Cell Gap)
  • the penetration-voltage value curve 530 corresponding to the layer gap (Cell Gap).
  • Figure 5b illustrates three GAMMA curves using the transmittance-grayscale values for an embodiment of the present application.
  • FIG. 4a in the 3.6 liquid crystal layer gap (Cell Gap) corresponding transmittance-gray value curve 510, in the liquid crystal layer gap (Cell Gap) corresponding transmittance-gray value curve 520 and 4.2 Liquid crystal layer gap (Cell Gap) corresponding to the transmittance - gray scale value curve 530.
  • FIG. 6 is a schematic view showing the manufacture of a gradient protective layer of the present application.
  • a method for manufacturing a display panel includes: providing a first substrate (not shown), wherein the first substrate has a plurality of pixel units; and setting a color resistance
  • the layer 610 is disposed on the first substrate;
  • a protective layer 620 is disposed on the first substrate, and covers the color resist layer 610;
  • the protective layer 620 is patterned to form at least three types of the protective layer 620 Different thicknesses are formed on each of the pixel units; a transparent electrode layer 650 is disposed on the patterned protective layer 620.
  • the transparent electrode layer 650 is patterned to expose a portion of the protective layer 620, and a black matrix layer (not shown) and a plurality of photo spacers (not shown) are disposed.
  • the exposed protective layer 630 is described.
  • the light transmissive area of each of the pixel units is divided into a main light transmissive area having a first thickness, a second light transmissive area having a second thickness, and a third light thickness according to different thicknesses.
  • the second light transmission zone is divided into a main light transmissive area having a first thickness, a second light transmissive area having a second thickness, and a third light thickness according to different thicknesses.
  • the difference in thickness between the light zones is equal to or greater than 1 um.
  • the protective layer 620 when the protective layer 620 is patterned, the protective layer is patterned by a halftone mask 640 having a transmission region, a half transmission region, and a non-transparent layer.
  • the pass regions are such that the patterned protective layers have different thicknesses.
  • the protective layer 620 is a flat layer or a passivation layer of silicon nitride and a compound material thereof.
  • the black matrix layer and the plurality of photo spacers are the same material, and are integrally formed on the protective layer by the same photomask.
  • each layer is formed through a film forming step, an exposing step, a developing step, an etching step, and a stripping step, and the process is repeated 5 times to complete the substrate.
  • the film forming step is to deposit a film of a desired material (a color resist layer 610, a protective layer 620, a photoresist material layer (PR) 630) on a first substrate (not shown);
  • the desired pattern of photoresist 630 is developed;
  • the development step is to leave the photoresist 630 of the pattern portion of the upper stage photoresist 630;
  • the etching step is already in the photoresist
  • the stripping step removes the photoresist 630 overlying the pattern with a substrate that has been etched with the desired pattern for subsequent processing. Therefore, the protective layer 620 may have different thicknesses to form at least three light transmissive regions (
  • the application can not only improve the aperture ratio of the pixel, but also improve the color shift of the display panel.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
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  • Spectroscopy & Molecular Physics (AREA)
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Abstract

一种显示面板及其制造方法，此显示面板包括：一第一基板（310）；多个画素单元，设置于此第一基板上；一保护层（330），设置于此第一基板上，并覆盖此画素单元，在每一画素单元中，此保护层区分成多个不同厚度的透光区；一透明电极层（340），设置于此保护层上，并覆盖此保护层的不同厚度的透光区。

Description

显示面板及其制造方法 技术领域
本申请涉及一种显示面板及其制造方法，特别是涉及一种具有不同厚度保护层的显示面板及其制造方法。
背景技术
近年来，随着科技的进步，人们需求的多元化，液晶显示器(Liquid Crystal Display，LCD)已广泛地应用于大众生活的各方面。液晶显示器大部分为背光型液晶显示器，其是由液晶显示面板及背光模块(Backlight Module)所组成。
液晶显示面板通常是由一彩膜基板(Color Filter，CF)、一薄膜晶体管阵列基板(Thin Film Transistor Array Substrate，TFT Array Substrate)以及一配置于两基板间的液晶层(Liquid Crystal Layer，LC Layer)所构成，其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转，将背光模组的光线折射出来产生画面。
所述垂直配向型(Vertical Alignment，VA)模式的液晶显示，例如图形垂直配向型(Patterned Vertical Alignment，PVA)液晶显示器或多区域垂直配向型(Multi-domain Vertical Alignment，MVA)液晶显示装置，其中PVA型利用边缘场效应与补偿板达到广视角的效果。MVA型将一个画素分成多个区域，并使用突起物(Protrusion)或特定图案结构，使位于不同区域的液晶分子朝向不同方向倾倒，以达到广视角且提升穿透率的作用。
在MVA模式目前主流是多是采用将画素区分为亮区与暗区，因此光学表现上可以由两种V-T特性混合，另外在适当调整亮暗区面积比例，在大视角时可有效压制中灰阶泛白的问题。
发明内容
为了解决上述技术问题，本申请的目的在于，提供一种具有不同厚度保护层的显示面板及其制造方法，不仅可提高画素开口率，同时可改善显示面板的色偏情况。
本申请的目的及解决其技术问题是采用以下技术方案来实现的。依据本申请提出的一种显示面板，包括：一第一基板；多个画素单元，设置于所述第一基板上；一保护层，设置于所述第一基板上，并覆盖所述画素单元，在每一画素单元中，所述保护层区分成多个不同厚度的透光区；一透明电极层，设置于所述保护层上，并覆盖所述保护层的不同厚度的透光区。
本申请的目的及解决其技术问题还可采用以下技术措施进一步实现。
在本申请的一实施例中，每一所述画素单元的所述透光区依厚度不同，区分为具有第一厚度的主透光区，具有第二厚度的次透光区和具有第三厚度的次二透光区。
在本申请的一实施例中，所述主透光区和所述次透光区之间，以及所述次透光区和所述次二透光区之间的厚度差等于或大于1um。
在本申请的一实施例中，所述保护层为氮化硅及其化合物材料的平坦层或钝化层。
本申请的另一目的为一种显示面板的制造方法，包括：提供一第一基板，其中所述第一基板具有多个画素单元；设置一色阻层于所述第一基板上；设置一保护层于所述第一基板上，并覆盖所述色阻层；图案化所述保护层，使所述保护层形成多个不同厚度于每一所述画素单元上；设置一透明电极层于图案化后的所述保护层上；以及图案化所述透明电极层，暴露出部分所述保护层，设置一黑矩阵层和多个光间隔物于所述暴露出的保护层上。
在本申请的一实施例中，每一所述画素单元的透光区依厚度不同，区分为具有第一厚度的主透光区，具有第二厚度的次透光区和具有第三厚度的次二透光区。
在本申请的一实施例中，所述主透光区和所述次透光区之间，以及所述次透光区和所述次二透光区之间的厚度差等于或大于1um。
在本申请的一实施例中，图案化所述保护层时，利用一半色调光罩图案化所述保护层，所述光罩具有一透过区、一半透过区和一非透过区，使得图案化后的所述保护层具有不同的厚度。
在本申请的一实施例中，所述保护层为氮化硅及其化合物材料的平坦层或钝化层。
本申请的又一目的为提供一种显示装置，包括背光模块及显示面板。其中所述显示面板包括：第一基板；多个画素单元，设置于所述第一基板上；保护层，设置于所述第一基板上，并覆盖所述画素单元，在每一画素单元中，所述保护层区分成多个不同厚度的透光区；透明电极层，设置于所述保护层上，并覆盖所述保护层的不同厚度的透光区；一第二基板，与所述第一基板相对设置；一液晶层，设置于所述第一基板和所述第二基板之间。
有益效果
本申请不仅可提高画素开口率，同时可改善显示面板的色偏情况。
附图说明
图1a为本申请一实施例的显示装置在0度视角、45度视角及60度视角的情形下，色偏角度所对应的穿透率-灰阶值曲线。
图1b为本申请一实施例的混合两种改善色偏角度所对应的亮度-灰阶曲线。
图2为本申请一实施例的混合低色偏区域模型。
图3a为本申请一实施例的具有梯度保护层的示意图。
图3b为本申请一实施例的具有梯度保护层的显示面板示意图。
图4为本申请又一实施例的梯度保护层的显示面板示意图。
图5a为本申请一实施例利用穿透率-电压曲线解释3种GAMMA曲线。
图5b为本申请一实施例利用穿透率-灰阶值解释3种GAMMA曲线。
图6为本申请具有梯度保护层的制造示意图。
具体实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是本申请不限于此。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中间组件。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效，以下结合附图及较佳实施例，对依据本申请提出的一种显示面板及其制造方法，其具体实施方式、结构、特征及其功效，详细说明如后。
本申请的显示装置可包括背光模块及显示面板。显示面板可包括薄膜晶体管(Thin Film Transistor，TFT)基板、彩色滤光片(Color Filter，CF)基板与形成于两基板之间的液晶层。
在一实施例中，本申请的显示面板可为曲面型显示面板，且本申请的显示装置亦可为曲面型显示装置。
在一实施例中，本申请的薄膜晶体管(TFT)或其他主动开关及彩色滤光片(CF)可形成于同一基板上。
图1a为垂直配向型液晶显示装置在0度视角、45度视角及60度视角的情形下，色偏角度所对应的穿透率-灰阶值曲线。请参照图1a，在0度色偏视角所对应的穿透率-灰阶值曲线110、在45度色偏视角所对应的穿透率-灰阶值曲线120及在60度色偏视角所对应的穿透率-灰阶值曲线130。因此随着色偏视角角度越高，在同一个灰阶值中，亮度穿透率就越高。
图1b为混合两种改善色偏角度所对应的亮度-灰阶曲线。请参照图1b，在MVA模式中，可采 用将画素区分为亮区与暗区，因此光学表现上可以由两种V-T特性混合，另外在适当调整亮暗区面积比例，所以在大视角时可有效压制中灰阶泛白的问题。而在亮区画素140与暗区画素150，彼此在亮度-灰阶图式中混合调整成画素160。
图2为混合低色偏区域模型。请参照图2，常见的低色偏(Low Color Shift)技术主要原理是将传统4区域利用分压或额外驱动方式再切割为8区域。因此在大视角观看下会有多范畴补偿的效果。如子低色偏区域210及主低色偏区域220相混合成低色偏区域200。
图3a为本申请一实施例的具有梯度保护层的示意图及图3b为本申请一实施例的具有梯度保护层的显示面板示意图。所述保护层的梯度数及阶梯厚度可依设计人员的需求而定，在本实施例中，以三种阶梯厚度为例。请参考图3a和图3b，在本申请的一实施例中，一种显示面板30，包括：一第一基板310；多个画素单元，设置于所述第一基板310上，其中所述画素单元包含有平行配置的一第一色阻321，一第二色阻322和一第三色阻323；一保护层330，设置于所述第一基板310上，并覆盖所述画素单元，在每一所述色阻中，所述保护层330区分成至少三个不同厚度的透光区；一黑矩阵层371和多个光间隔物372设置于所述保护层330上；一透明电极层340，设置于所述保护层330上，并覆盖所述保护层330的不同厚度的透光区；一第二基板360，与所述第一基板310相对设置，一公共电极层350，设置于所述第二基板360上；一液晶层380，设置于所述第一基板310和所述第二基板360之间。
在本申请的一实施例中，每一所述画素单元中，每一所述第一色阻、每一所述第二色阻及每一所述第三色阻的所述透光区可依厚度不同，区分为具有第一厚度31的主透光区001，具有第二厚度32的次透光区002和具有第三厚度33的次二透光区003。
在本申请的一实施例中，所述主透光区001和所述次透光区002之间，以及所述次透光区002和所述次二透光区003之间的厚度差等于或大于1um。
在本申请的一实施例中，所述保护层330为氮化硅及其化合物材料的平坦层或钝化层。
在本申请的一实施例中，所述黑矩阵层371和所述多个光间隔物372为同一材料，通过同一道光罩，一体成型在所述保护层330上。
图4为本申请又一实施例的梯度保护层的显示面板示意图。请参考图4，在本申请的一实施例中，一种显示面板40，包括：一第一基板，多条数据线410和多条扫描线430，设置于所述第一基板上，其中所述多条数据线410与所述多条扫描线430定义出多个画素区，每一所述画素区，包括一第一色阻421、一第二色阻422和一第三色阻423；一保护层，设置于所述第一基板上；一黑矩阵层442和多个光间隔物441，设置于所述第一基板上，并覆盖所述多条数据线410与所述多条扫描线430。在每一所述画素单元中，所述保护层区分成至少三个不同厚度的透光区；一透明电极层， 设置于所述保护层上，并覆盖所述保护层的不同厚度的透光区；一第二基板，与所述第一基板相对设置，一公共电极层，设置于所述第二基板上；一液晶层，设置于所述第一基板和所述第二基板之间。
在本申请的一实施例中，在每一所述画素单元中，所述透光区可依色阻和保护层厚度的不同，区分为具有第一厚度的主透光区004并涵盖所述第一色阻421，具有第二厚度的次透光区005并涵盖所述第二色阻422，及具有第三厚度的次二透光区006并涵盖所述第三色阻423。
在本申请的一实施例中，所述主透光区004和所述次透光区005之间，以及所述次透光区005和所述次二透光区006之间的厚度差等于或大于1um。
在本申请的一实施例中，所述保护层为氮化硅及其化合物材料的平坦层或钝化层。
在本申请的一实施例中，所述黑矩阵层442和所述多个光间隔物441为同一材料，通过同一道光罩，一体成型在所述保护层上。
在本申请的一实施例中，通过所述具有不同厚度的保护层设计，与传统通过分压控制液晶偏向角不同，此设计可以在输入电压一样的情况下，仅使用一主动开关(例如薄膜晶体管)，用以驱动整个画素，使位于不同透光区的液晶分子的偏向角有所差异，进而改善色偏问题。
图5a为本申请一实施例利用穿透率-电压曲线解释3种GAMMA曲线。请参照图5a，在3.6液晶层间隙(Cell Gap)所对应的穿透率-电压值曲线510，在3.9液晶层间隙(Cell Gap)所对应的穿透率-电压值曲线520及在4.2液晶层间隙(Cell Gap)所对应的穿透率-电压值曲线530。
图5b为本申请一实施例利用穿透率-灰阶值解释3种GAMMA曲线。请参照图4a，在3.6液晶层间隙(Cell Gap)所对应的穿透率-灰阶值曲线510，在3.9液晶层间隙(Cell Gap)所对应的穿透率-灰阶值曲线520及在4.2液晶层间隙(Cell Gap)所对应的穿透率-灰阶值曲线530。
图6为本申请具有梯度保护层的制造示意图。请参考图6，在本申请的一实施例中，一种显示面板的制造方法，包括：提供一第一基板(图未示)，其中所述第一基板具有多个画素单元；设置一色阻层610于所述第一基板上；设置一保护层620于所述第一基板上，并覆盖所述色阻层610；图案化所述保护层620，使所述保护层620形成至少三种不同厚度于每一所述画素单元上；设置一透明电极层650于图案化后的所述保护层620上。
在本申请的一实施例中，图案化所述透明电极层650，暴露出部分所述保护层620，设置一黑矩阵层(图未示)和多个光间隔物(图未示)于所述暴露出的保护层630上。
在本申请的一实施例中，每一所述画素单元的透光区依厚度不同，区分为具有第一厚度的主透光区，具有第二厚度的次透光区和具有第三厚度的次二透光区。
在本申请的一实施例中，所述主透光区和所述次透光区之间，以及所述次透光区和所述次二透 光区之间的厚度差等于或大于1um。
在本申请的一实施例中，图案化所述保护层620时，利用一半色调光罩640图案化所述保护层，所述光罩640具有一透过区、一半透过区和一非透过区，使得图案化后的所述保护层具有不同的厚度。
在本申请的一实施例中，所述保护层620为氮化硅及其化合物材料的平坦层或钝化层。
在本申请的一实施例中，所述黑矩阵层和所述多个光间隔物为同一材料，通过同一道光罩，一体成型在所述保护层上。
在本申请的一实施例中，具体而言，每一层的形成需经过成膜步骤、曝光步骤、显影步骤、蚀刻步骤及剥膜步骤，此流程需重复5次，才能完成基板。所述成膜步骤是在第一基板(图未示)上，铺上一层所需求材质的薄膜(色阻层610、保护层620、光阻材料层(PR)630)；所述曝光步骤是使用光罩640在光阻630上，显影出所需的光阻630图案；所述显影步骤是留下上阶段光阻630图案部分的光阻630；所述蚀刻步骤是在已经有光阻630图案的基板上，蚀刻出所需的图案；所述剥膜步骤用已经蚀刻出所需图案的基板，将覆盖于图案上的光阻630去除以便进行后续工程。因此，所述保护层620可具有不同的厚度，以形成至少三个不同厚度的透光区(或透光区)于每一所述画素单元中。
本申请不仅可提高画素开口率，同时可改善显示面板的色偏情况。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。所述用语通常不是指相同的实施例；但它也可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词，除非其前后文意显示出其它意思。
以上所述，仅是本申请的较佳实施例而已，并非对本申请作任何形式上的限制，虽然本申请已以较佳实施例揭露如上，然而并非用以限定本申请，任何熟悉本专业的技术人员，在不脱离本申请技术方案范围内，当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例，但凡是未脱离本申请技术方案的内容，依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本申请技术方案的范围内。

Claims (15)

  1. 一种显示面板，包括：
    一第一基板；
    多个画素单元，设置于所述第一基板上；
    一保护层，设置于所述第一基板上，并覆盖所述画素单元，在每一画素单元中，所述保护层区分成多个不同厚度的透光区；
    一透明电极层，设置于所述保护层上，并覆盖所述保护层的不同厚度的透光区。
  2. 如权利要求1所述的显示面板，每一所述画素单元的透光区依厚度不同，区分为具有第一厚度的主透光区，具有第二厚度的次透光区和具有第三厚度的次二透光区。
  3. 如权利要求2所述的显示面板，其中所述主透光区和所述次透光区之间，以及所述次透光区和所述次二透光区之间的厚度差等于或大于1um。
  4. 如权利要求1所述的显示面板，其中所述保护层为氮化硅及其化合物材料的平坦层。
  5. 如权利要求1所述的显示面板，其中所述保护层为氮化硅及其化合物材料的钝化层。
  6. 如权利要求1所述的显示面板，更包括一黑矩阵层与多个间隔物，设置于所述保护层上。
  7. 如权利要求6所述的显示面板，其中所述黑矩阵层和所述多个光间隔物为同一材料，通过同一道光罩，一体成型在所述保护层上。
  8. 一种显示面板的制造方法，包括：
    提供一第一基板，其中所述第一基板具有多个画素单元；
    设置一色阻层于所述第一基板上；
    设置一保护层于所述第一基板上，并覆盖所述色阻层；
    图案化所述保护层，使所述保护层形成多个不同厚度于每一所述画素单元上；
    设置一透明电极层于图案化后的所述保护层上；以及
    图案化所述透明电极层，暴露出部分所述保护层，设置一黑矩阵层和多个光间隔物于所述暴露出的保护层上。
  9. 如权利要求8所述的显示面板的制造方法，每一所述画素单元的透光区依厚度不同，区分为具有第一厚度的主透光区，具有第二厚度的次透光区和具有第三厚度的次二透光区。
  10. 如权利要求9所述的显示面板的制造方法，其中所述主透光区和所述次透光区之间，以及所述次透光区和所述次二透光区之间的厚度差等于或大于1um。
  11. 如权利要求8所述的显示面板的制造方法，图案化所述保护层时，利用一半色调光罩图案化所述保护层，所述光罩具有一透过区、一半透过区和一非透过区，使得图案化后的所述保护层具有不 同的厚度。
  12. 如权利要求8所述的显示面板的制造方法，其中所述保护层为氮化硅及其化合物材料的平坦层。
  13. 如权利要求8所述的显示面板的制造方法，其中所述保护层为氮化硅及其化合物材料的钝化层。
  14. 如权利要求8所述的显示面板的制造方法，通过同一道光罩，设置所述黑矩阵层与所述多个光间隔物于所述保护层上，其中，所述黑矩阵层和所述多个光间隔物为同一材料。
  15. 一种显示装置，包括；
    背光模块；
    显示面板，包括：
    第一基板；
    多个画素单元，设置于所述第一基板上；
    保护层，设置于所述第一基板上，并覆盖所述画素单元，在每一画素单元中，所述保护层区分成多个不同厚度的透光区；
    透明电极层，设置于所述保护层上，并覆盖所述保护层的不同厚度的透光区；
    一第二基板，与所述第一基板相对设置；
    一液晶层，设置于所述第一基板和所述第二基板之间。
PCT/CN2017/086640 2017-03-30 2017-05-31 显示面板及其制造方法 WO2018176629A1 (zh)

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