WO2017010293A1 - Backing plate, sputtering target, and method for manufacturing same - Google Patents
Backing plate, sputtering target, and method for manufacturing same Download PDFInfo
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- WO2017010293A1 WO2017010293A1 PCT/JP2016/069346 JP2016069346W WO2017010293A1 WO 2017010293 A1 WO2017010293 A1 WO 2017010293A1 JP 2016069346 W JP2016069346 W JP 2016069346W WO 2017010293 A1 WO2017010293 A1 WO 2017010293A1
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- WIPO (PCT)
- Prior art keywords
- lid member
- backing plate
- main body
- thickness
- manufacturing
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
Definitions
- the present invention relates to a backing plate, a sputtering target, and manufacturing methods thereof.
- the backing plate is a member used for supporting the target material of the sputtering target used for sputtering and fixing the sputtering target to the sputtering apparatus.
- the backing plate also plays a role of radiating heat generated during sputtering.
- a backing plate for a sputtering apparatus used for forming an integrated circuit has, for example, a disk shape with a maximum diameter of about 500 to 600 mm, and is made from a plate material such as a copper alloy or an aluminum alloy. It is common to be done.
- a backing plate for a sputtering apparatus used for manufacturing a liquid crystal display has, for example, a plate-like (or panel-like) shape, and is made from a plate material such as copper or a copper alloy. It is common.
- the target material used in the sputtering apparatus for LCD production is usually larger than that for ICs, and the amount of heat generated during sputtering is very large. Since the generated heat affects the properties of the thin film formed by sputtering, a large backing plate that can efficiently cool the target material is used. When it has a plate-like shape, the dimension in the longitudinal direction may exceed 3 m.
- a backing plate used for LCD production or the like is generally a flow path through which a refrigerant fluid passes for the purpose of improving heat dissipation performance and cooling performance. Is often formed.
- a channel is formed, for example, by previously forming a channel groove in the main body constituting the backing plate, and the lid member manufactured to cover the groove is engaged with the groove portion of the main body, for example. In a state, it can form by joining by methods, such as welding.
- a backing plate used for LCD manufacture As a backing plate used for LCD manufacture, a large and long plate is generally used, and since relatively hard metals such as copper and copper alloys are used, warpage and distortion are required for the manufacture. There is a problem.
- a ridge part generally called a bead can be formed at the joint part, but by performing the cutting and removal, a flat surface with less unevenness is formed, and a desired backing plate shape is formed. If it is going to process to, due to the above-mentioned distortion and bending, the thickness of a lid member may become uneven.
- burrs may be formed at the joint, but if a flat surface is formed by cutting and removing it and processing is made into a desired backing plate shape, the lid member is similar to the above.
- the thickness may be non-uniform.
- the joined body such as a backing plate
- the joining when the joining is performed by electron beam welding or friction stir welding, the joined body may be gently warped on the joining surface side. Therefore, when the main body and the lid member are joined and then processed into a backing plate of a desired size by cutting, the portion where the lid member becomes thinner or thicker than the target thickness in the range of several tens to several hundred mm Is likely to occur.
- the pressure of the fluid for example, 0.2 to 0.7 MPa
- the lid member thickness is designed to be 5 mm or less. When doing so, it is necessary to pay attention to the uniformity of the lid member.
- such non-uniformity of the thickness of the lid member not only reduces the strength of the backing plate itself used by repeatedly bonding the target material, but also the thickness of the side on which the target material on the opposite side is pasted. It also causes non-uniformity.
- the opposite surface is processed so as to be parallel to the bonding surface of the lid member, if there is a non-uniformity in the thickness of the lid member due to distortion of the main body or bending, This is because non-uniformity of thickness occurs even when the surface is processed. Since the cooling efficiency is locally different due to such thickness non-uniformity, the target material may be locally peeled in the sputtering target in which the target material is bonded by solder.
- a method for manufacturing a backing plate capable of making the thickness of the lid member uniform, a provision of a backing plate having a uniform thickness of the lid member after manufacture, and sputtering including such a backing plate are provided.
- the target is to provide a target.
- the present inventor in the manufacturing method of a backing plate using a main body having a channel groove and its lid member, the joint surface between the main body and the lid member is the upper surface.
- the joint surface is processed by cutting, so that the lid member.
- the present invention provides the following backing plate manufacturing method and backing plate, and a sputtering target manufacturing method and sputtering target including the following backing plate, but the present invention is not limited to the following.
- a method of manufacturing a backing plate comprising joining a plate-like main body having a groove through which a fluid passes on one side and a plate-like lid member disposed on the main body so as to cover the groove of the main body, After joining and integrating the main body and the lid member, the difference between the maximum value and the minimum value of the height measured on the surface of the lid member with the joint surface between the main body and the lid member as the upper surface
- a method of manufacturing a backing plate comprising fixing the main body so that the thickness is less than 0.5 mm, and processing at least a part of the joint surface by cutting.
- a backing plate comprising a plate-like main body having a groove through which a fluid passes on one side, and a plate-like lid member disposed on the main body so as to cover the groove of the main body, the main body and the lid member Is a backing plate in which the difference between the maximum value and the minimum value of the thickness of the lid member is 0.4 mm or less.
- the backing plate obtained by the manufacturing method as described in said [1].
- [8] The backing plate according to [7] above, wherein a difference between the maximum value and the minimum value of the thickness of the lid member is 0.4 mm or less.
- a sputtering target wherein a target material is bonded onto the backing plate according to the above [6].
- a sputtering target manufacturing method including bonding a target material to a backing plate, wherein the backing plate is manufactured by the manufacturing method according to any one of [1] to [5] above.
- a method for producing a sputtering target is produced by the manufacturing method according to any one of
- a manufacturing method of a backing plate capable of making the thickness of the lid member uniform, and a backing plate having a uniform thickness of the lid member after manufacture, in particular, a maximum value and a minimum value of the thickness of the lid member, A backing plate having a difference of 0.4 mm or less and a sputtering target including such a backing plate can be provided.
- FIG. 2 is a cross-sectional view schematically showing a cross section at XX of the main body shown in FIG. It is the schematic which shows the manufacturing method of a backing plate typically. It is a top view from the base surface side which shows typically one Embodiment of a backing plate. It is a top view from the base surface side which shows typically one Embodiment (with a base part) of a backing plate. It is a side view which shows typically one Embodiment of a backing plate. It is a side view which shows typically one Embodiment (with a base part) of a backing plate.
- FIG. 9 is a cross-sectional view (a) schematically showing a cross section at AA of the joined body shown in FIG. 8 and a cross-sectional view (b) schematically showing a cross section at BB of the joined body shown in FIG.
- FIG. 9 is a cross-sectional view taken along the line CC of the joined body illustrated in FIG. It is a graph which shows the result (thickness of a lid member) of Example 1.
- the present invention mainly includes a main body and a lid member, and a method of manufacturing a backing plate capable of uniformly forming the thickness of the lid member, and a backing having a uniform thickness of the lid member after production. Regarding plates.
- the thickness of the lid member is uniform of the backing plate means that the maximum value and the minimum value of the thickness of the lid member measured in the backing plate after manufacture, as described in detail below. Difference of 0.4 mm or less, preferably 0.35 mm to 0 mm, more preferably 0.2 mm to 0 mm. When the difference in thickness exceeds 0.4 mm, the lid member locally yields during pressurization, and deformation may remain in the lid member. Further, if the strength of the material is reduced by repeatedly using the backing plate, the amount of deformation may increase, and the lid member may be damaged.
- the heat transfer efficiency changes locally, and there is a possibility that local delamination of the target material may occur in the soldered sputtering target.
- the target material is peeled off, the distance between the target material and the substrate is changed at that location, which may cause a problem such as adversely affecting the properties of the thin film formed by sputtering.
- the manufacturing method of the backing plate of the present invention includes, for example, a plate-like main body 1 having a groove 2 on one side thereof through which a fluid can pass, as schematically shown in FIGS.
- This includes joining a plate-like lid member 3 disposed on the main body 1 so as to cover (or close) the groove 2 of the main body 1 (hereinafter referred to as “step (a)”.
- FIG. See the step (a) shown), after the body 1 and the lid member 3 are joined and integrated (for example, see the joined body 4 of the body 1 and the lid member 3 shown in FIG. 4).
- step (b) The main body 1 (and as required) so that the difference between the maximum and minimum heights measured on the surface of the lid member 3 is less than 0.5 mm with the joint surface of the main body 1 and the lid member 3 as the upper surface. And fixing the lid member 3) and processing at least a part of the joint surface by cutting (hereinafter, Referred to as step (b). "For example, see step (b) shown in FIG. 4).
- the thickness of the lid member 3 after processing by cutting can be made uniform by the above-described steps (a) and (b), specifically, the maximum value of the thickness of the lid member and The difference from the minimum value can be 0.4 mm or less.
- a surface opposite to the joint surface between the main body 1 and the lid member 3 (hereinafter referred to as “pedestal on which a target material for a sputtering target can be disposed.
- the pedestal 5 may be formed on the “surface” in some cases.
- the pedestal portion 5 is a portion where a target material can be placed, and there is no particular limitation on the formation method thereof.
- the pedestal portion 5 excludes the pedestal portion 5 on the pedestal surface by cutting, preferably milling. It can be formed by cutting a part.
- the surface of the base part 5 should just be substantially parallel with the joint surface after a process, Preferably it is parallel.
- FIGS. 5 and 6 schematically show an embodiment of the backing plate of the present invention, but the backing plate of the present invention is not limited to such an embodiment.
- 5A (plan view) and FIG. 6A (side view) schematically show an embodiment of the backing plate that does not have the pedestal portion 5
- FIG. 4 schematically shows an embodiment of the backing plate on which the pedestal portion 5 is formed.
- the backing plates 10 and 20 basically have a plate-like main body 1 (for example, FIG. 1) and a plate-like lid member 3 (see, for example, FIG. 2) disposed on the main body 1 so as to cover the groove 2 of the main body 1, and the main body 1 and the lid member 3 are It has a structure integrated by bonding.
- a pedestal portion 5 on which a target material can be disposed may be formed on the pedestal surface of the backing plate 20.
- the lid member 3 on the joint surface may be formed with a hole 6 having an arbitrary size at an arbitrary location, and enables fluid connection with the groove (or channel) 2 formed in the main body 1. .
- the number of holes 6 is not particularly limited.
- a plurality of holes preferably through holes (not shown), for enabling attachment to the sputtering apparatus may be formed in the main body of the backing plates 10 and 20.
- the shape of the backing plate is not particularly limited, and for example, a plate-like (or panel-like) shape as described in the plan view of FIG. 5 is preferable.
- the size of the backing plate is not particularly limited.
- the length in the longitudinal direction is, for example, 400 mm to 4000 mm, preferably 500 mm to 3500 mm, more preferably 700 mm to 3200 mm.
- the length in the width direction perpendicularly crossing the length in the longitudinal direction is, for example, 100 mm to 2000 mm, preferably 150 mm to 1500 mm, more preferably 200 mm to 1500 mm.
- the length in the longitudinal direction and the length in the width direction may be the same or different.
- the thickness of the backing plate (that is, the maximum distance between the pedestal surface (or the pedestal surface of the pedestal part if it has a pedestal portion) and the joining surface) is, for example, 5 mm to 30 mm, preferably 7 mm. It is ⁇ 25 mm, more preferably 10 mm to 20 mm.
- the thickness of the backing plate is not particularly limited as long as a flow path can be formed in the interior.
- the shape of the flow path formed inside the backing plate is not particularly limited, and is not particularly limited as long as the target material arranged on the pedestal surface of the backing plate can be cooled.
- the dimension in the width direction is, for example, 10 mm to 100 mm.
- the height dimension is, for example, 1 mm to 20 mm, preferably 3 mm to 15 mm, and more preferably 4 mm to 10 mm.
- a space formed by the groove 2 of the main body 1 and the lid member 3 in a state where the lid member 3 is disposed and joined to the upper side of the groove 2 of the main body 1 is called a flow path.
- the bottom surface of the groove 2 and the back surface of the lid member 3 are preferably substantially parallel, and more preferably parallel.
- a plurality of flow paths may be formed depending on the size of the backing plate.
- the manufacturing method of the present invention includes a main body 1 made from a main body material 1 ′, and a lid member 3 made from a lid member material 3 ′. Are joined together to form a joined body 4 having a flow path therein. Thereafter, in the “step (b)”, the maximum value and the minimum value of the height measured on the surface of the lid member 3 with the joint surface of the main body 1 and the lid member 3 of the joined body 4 as the upper surface (or the upper side)
- the main body 1 is fixed together with the lid member 3 as necessary so that the difference is less than 0.5 mm, and at least a part, preferably the entire surface, of the joined body 4 is processed by cutting.
- the joined body 4 after processing thus obtained has a flow path through which a fluid such as cooling water can pass by joining the main body 1 and the lid member 3. Since the surface opposite to the surface has a cooling function and can function as a pedestal surface on which a target material can be arranged, it can be used as a backing plate for a sputtering target (for example, in FIG. 4). (See zygote 4 and backing plate 10 surrounded by dotted line). Furthermore, if necessary, the manufacturing method of the present invention may include a “post-processing step”, for example, to manufacture a backing plate having the base portion 5 on the base surface for placing the target material (for example, (See the backing plate 20 shown in FIGS. 4, 5B and 6B). In addition, in FIG. 4, in order to demonstrate the manufacturing method of this invention more simply, each member is shown with the perspective view which shows the shape of the cross section.
- the main body 1 can be formed by processing the material 1 ′ for the main body by a method such as cutting or grinding.
- the main body material 1 ′ it is sufficient that it is made of a conductive material, and it is preferable to use a plate-like (or panel-like) material made of a metal or an alloy thereof.
- the metal examples include copper, copper alloy, aluminum, aluminum alloy, titanium, titanium alloy, tungsten, tungsten alloy, molybdenum, molybdenum alloy, tantalum, tantalum alloy, niobium, niobium alloy, and stainless steel. From the viewpoints of mechanical strength, durability, heat dissipation, etc., it is preferable to use copper. Among them, oxygen-free copper (purity of 99.96% or more, particularly from the viewpoint of high thermal conductivity and high electrical conductivity) It is preferable to use an oxygen concentration of 10 ppm or less.
- the main body 1 is liquid refrigerant (for example, water, ethanol, ethylene glycol) after joining with a lid member (for example, the lid member 3 shown in FIG. 2) described in detail below.
- a fluid 2 such as a mixture of two or more of them
- the groove 2 has a shape capable of supporting (or placing) the lid member 3 described in detail below, for example, step portions 2 a and 2 b. Also good.
- channel 2 has a shape and a dimension so that the surface of the cover member 3 used as a joint surface after joining and the surface of the main body 1 used as a joint surface after joining may become flush.
- the main body 1 having the groove 2 is made of, for example, a plate-shaped (or panel-shaped) material 1 ′ having an appropriate size, with the surface on the side serving as a pedestal surface as an upper surface, It is fixed mechanically using a vice, vacuum chuck, etc., and is chamfered by milling using, for example, a rotary tool such as a face mill or a cutter.
- the main body having the groove 2 by, for example, chamfering by milling using a rotary tool such as a face mill or cutter, and then by cutting using, for example, a face mill or cutter, if necessary. 1 can be produced.
- the formed main body 1 has a substantially constant thickness, and the pedestal surface, the surface to be the bonding surface, and the bottom surface of the groove 2 may be substantially parallel, preferably parallel. Moreover, you may process the outer peripheral surface of the main body 1 by cutting or grinding
- the surface can be used as it is as a pedestal surface, and the groove 2 is formed on the opposite surface as described above. May be.
- the lid member 3 has a thickness of usually 2 to 6 mm, which can be disposed in the main body 1 so as to cover (or close) the groove 2 of the main body 1, for example, as shown in the perspective view of FIG. 2 and the schematic diagram of FIG. 4. It is a plate-shaped (or panel-shaped) member.
- the width of the lid member is larger than the width of the groove so that the lid member is placed on the stepped portions 2a and 2b of the main body shown in the cross-sectional view of FIG.
- the width of the lid member is the groove width + 30 mm or less
- the size is preferably +20 mm or less, more preferably +15 mm or less.
- the thickness of the lid member may be determined as appropriate, but the effect of the present invention can be easily achieved when the thickness of the lid member is 5 mm or less, preferably 3.5 mm or less, more preferably 3 mm or less.
- the lid member material 3 ′ capable of forming the lid member 3 is made of a conductive material, and a plate-like (or panel-like) material made of a metal or an alloy thereof is used. It is preferable to use it.
- the metal examples include copper, copper alloy, aluminum, aluminum alloy, titanium, titanium alloy, tungsten, tungsten alloy, molybdenum, molybdenum alloy, tantalum, tantalum alloy, niobium, niobium alloy, and stainless steel. From the viewpoints of mechanical strength, durability, heat dissipation, etc., it is preferable to use copper. Among them, oxygen-free copper (purity of 99.96% or more, particularly from the viewpoint of high thermal conductivity and high electrical conductivity) It is preferable to use an oxygen concentration of 10 ppm or less. Among oxygen-free coppers, it is more preferable to use oxygen-free copper having a high strength of 1 / 4H to H.
- the material 3 ′ may be the same as or different from the material 1 ′, but in the present invention, the lid member 3 and the main body 1 are integrated by bonding, and the strength of the bonded portion is kept high. It is preferable that they are the same material or a material having the same composition and purity.
- the lid member 3 is a mechanically fixed material 3 ′ having an appropriate size using a restraint such as a vise, for example, a band saw, a wire saw, a circular saw, a lathe, a milling machine, a band saw, a grinder, a water jet, etc. It can be formed by cutting or cutting.
- the formed lid member has a substantially constant thickness, and the front and back surfaces may be substantially parallel, preferably parallel. Moreover, you may process the outer peripheral surface of the cover member 3 by cutting or grinding
- a hole through which fluid can pass may be formed at any location of the lid member 3 (see, for example, the hole 6 shown in FIGS. 5 and 6).
- the number of holes 6 is not particularly limited. In particular, if the hole 6 is formed in the lid member 3 before joining to the main body 1, the air surrounded by the main body 1 and the lid member 3 at the time of fitting the lid member 3 into the main body 1 or at the time of joining them. It is preferable because it can be removed through the hole 6 and the occurrence of displacement at the joint can be suppressed.
- Step (a) includes integrating the main body 1 and the lid member 3 by bonding.
- the lid member 3 is disposed on the main body 1 so that the lid member 3 covers the groove 2 of the main body 1, and preferably the surface of the main body 1 and the surface of the lid member 3 are flush with each other. These members are arranged.
- the joining method of the main body 1 and the lid member 3 is not particularly limited.
- electron beam welding EBW
- friction stir welding FSW
- TIG welding TIG welding
- laser beam welding MIG welding
- MAG welding MAG welding
- electron beam welding and friction stir welding are preferred from the viewpoints of a small weld bead and small welding distortion.
- the joined body 4 obtained by integrating the main body 1 and the lid member 3 has excellent airtightness at the joined portion. For example, even when air pressurized to 0.1 MPa to 0.8 MPa is injected into the flow path, the air does not leak and the airtightness can be maintained.
- FIG. 7 shows a joining surface of the joined body 4
- FIG. 8 shows a pedestal surface of the joined body 4
- FIG. 9 shows a side surface of the joined body 4.
- 10 to 11 show a cross section of the joined body 4.
- FIG. More specifically, FIGS. 10A and 10B show cross sections taken along lines AA and BB in FIG. 8, respectively, and FIG. 11 shows a cross section taken along line CC in FIG.
- the joined body 4 is not limited to the illustrated embodiment.
- the “warping” of the joined body 4 refers to the longitudinal direction or width of the joined body 4 when the joined body 4 is allowed to stand on an arbitrary horizontal plane with the pedestal surface down.
- the lower edge of at least one end in the direction is located away from this horizontal plane, or the lower edge of all ends is horizontal
- the distance is expressed as the magnitude of “warp”.
- the lower edge portion of the end portion may be wavyly separated from the horizontal plane, and even in this case, the maximum distance between the horizontal plane and the edge portion is expressed as “ Expressed as the magnitude of “warp”.
- the thickness of the joined body 4 is subtracted from the height of the joined body 4 measured on the surface of the lid member 3. The maximum value of the difference is expressed as the magnitude of “warp”.
- the warp of at least one end in the longitudinal direction is preferably less than 5 mm, more preferably less than 1 mm.
- the warp of at least one end in the width direction is preferably less than 5 mm, more preferably less than 1 mm.
- the joining surface of the main body 1 and the lid member 3 of the joined body 4 is fixed as an upper surface (or upper side) on a horizontal plane (for example, see the joined body 4 shown in FIG. 4). ).
- the surface on which the joined body 4 is installed is preferably arranged as close to the horizontal plane as possible. Fix later.
- the difference between the maximum value and the minimum value of the height measured on the surface of the lid member 3 is less than 0.5 mm, preferably Is fixed to 0.4 mm to 0 mm, more preferably 0.3 mm to 0 mm, and if necessary, at least a part of the joint surface, preferably the entire joint surface, is processed horizontally by cutting together with the lid member 3. .
- the following method may be used as a method of fixing the joint body 4 in the step (b).
- the bonding surface between the main body 1 and the lid member 3 of the bonded body 4 is fixed as an upper surface (or upper side) so that the pedestal surface is in contact with the horizontal plane as much as possible.
- the maximum value of the distance between the horizontal plane and the bottom surface of the joined body 4 is less than 0.5 mm, preferably Is preferably fixed to 0.4 mm to 0 mm, more preferably 0.3 mm to 0 mm, and then at least a part of the joining surface, preferably the entire surface, is processed horizontally by cutting as described above. .
- a restraint such as a vise or a clamp
- a plurality of restraints are arranged in the length direction of the joined body 4 and the joined body 4 is held in a horizontal direction by pressing the side parts of the joined body. It can be fixed on a plane.
- the restraint tool is evenly distributed at least at three locations, ie, at both ends and the center in the length direction of the joined body 4, preferably at least 5 locations including 1/4 and 3/4 positions in the length direction. Deploy.
- the difference between the maximum value and the minimum value measured on the surface of the lid member 3 is not less than 0.5 mm, after temporarily fixing with a vice so that the joined body 4 does not move, a mallet or plastic hammer
- the surface of the lid member 3 can be fixed in a horizontal state by hitting with, for example, a ground surface on a horizontal plane.
- the pedestal surface side of the main body is cut to produce a flat surface so that the adsorption area is increased.
- An O-ring is arranged around the joined body so that the center is located within 30 mm from the edge, preferably 5 mm to 20 mm, and the vacuum level (gauge pressure) is -0.1 MPa with the pedestal surface side as the adsorption surface.
- the position at which the height is measured on the surface of the lid member 3. is preferably performed above the groove 2, and more preferably measured above the central portion of the groove 2.
- the measurement is preferably performed above the groove 2, and more preferably measured above the central portion of the groove 2.
- the height measurement method is not particularly limited, but can be measured using, for example, a height gauge, a dial gauge, or the like.
- the joining is performed so that the difference between the maximum value and the minimum value measured on the surface of the lid member 3 is less than 0.5 mm, preferably 0.4 mm to 0 mm, more preferably 0.3 mm to 0 mm.
- at least a part of the joining surface preferably the entire surface, is processed horizontally by cutting, preferably horizontally processed by chamfering, so that the thickness of the lid member after processing is uniform.
- the difference between the maximum value and the minimum value of the thickness of the lid member after processing can be 0.4 mm or less, preferably 0.35 mm to 0 mm, more preferably 0.3 mm to 0 mm.
- a joint surface will not be restrict
- the side surface of the joined body 4 may be processed by cutting or grinding at an arbitrary stage, for example, finishing may be applied to a mirror surface.
- the joined body 4 obtained after the step (b) (for example, the joined body 4 surrounded by a dotted line in FIG. 4 or the joined body 4 shown in FIGS. 7 to 11) can be used as it is as a backing plate.
- the backing plate 10 shown in FIGS. 4, 5A, and 6A for example, the backing plate 10 shown in FIGS. 4, 5A, and 6A).
- the bonded body 4 may be subjected to the following post-processing steps as necessary.
- Examples of the post-processing step include the following steps. (1) Processing by cutting the pedestal surface (2) Finishing processing of the joint surface (3) Finishing processing of the pedestal surface (4) Drilling processing (5) Warping correction
- the post-treatment step is preferably performed in the order of the above steps (1) to (5), but is not limited to the above order. Further, the above steps (1) to (5) are all optional steps and can be performed in an arbitrary order. Hereinafter, each process will be briefly described.
- the bonded body 4 is arranged with the pedestal surface on the upper side and fixed by, for example, a vacuum chuck, and the pedestal surface of the bonded body 4 is, for example, milled, ground, end milled, Further processing may be performed using lathe processing or the like.
- the machining by this cutting is for shaping the pedestal surface to be substantially parallel to the bonding surface of the bonded body 4, preferably parallel.
- the joint body 4 is arranged with the joint surface on the upper side and fixed with, for example, a vacuum chuck, and the joint surface of the joint body 4 is milled, ground, end milled, and turned, for example. You may finish using etc.
- This finishing process is for finishing the bonded surface of the bonded body 4 by cutting or polishing it to a mirror surface as required according to its use.
- the bonded body 4 is arranged with the pedestal surface on the upper side and fixed by, for example, a vacuum chuck, and the pedestal surface of the bonded body 4 is milled, ground, end milled, etc. You may finish using.
- the pedestal portion 5 may be formed on the pedestal surface as needed (for example, the backing plate 20 shown in FIGS. 5B and 6B).
- the formation method of the base part 5 For example, a milling process, a grinding process, an end mill process, a lathe process etc. can be used.
- the finishing process of the pedestal surface may be performed separately for the above-described pedestal part 5 and other peripheral parts.
- the pedestal surface of the joined body 4 (in some cases, both the above-described pedestal portion 5 and other peripheral portions) may be processed to a mirror surface.
- a through hole may be formed in a portion of the backing plate where the groove 2 or the pedestal 5 is not formed. By passing a bolt or the like through such a through hole, the main body 1 can be fixed to the sputtering apparatus.
- a through hole may be formed in a portion of the backing plate where the groove 2 or the pedestal 5 is not formed.
- Warpage correction During the post-processing step of the above backing plate, warpage may occur in the joined body 4. In that case, for example, using a corrector, the warpage may be corrected. It is preferable to correct the bonded body 4 until the size is less than 2 mm, preferably 1 mm to 0 mm, more preferably 0.5 mm to 0 mm.
- correction of warpage may be performed at any stage of manufacturing the backing plate.
- a sputtering target can be produced by bonding (or joining or bonding) a target material to the pedestal surface of the backing plate using a solder material to the backing plate thus obtained.
- the target material is not particularly limited as long as it is a material composed of ceramics or sintered bodies such as metals, alloys, oxides, nitrides and the like that can be normally used for film formation by sputtering.
- a target material may be selected as appropriate.
- a target material for example, aluminum, copper, titanium, molybdenum, silver, tungsten or an alloy containing them as a main component, tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide ( GZO), In—Ga—Zn-based composite oxide (IGZO), and the like.
- the target material can be processed into a substantially plate shape, but the method of processing into a plate shape is not particularly limited.
- a metal target material for example, a rectangular parallelepiped or cylindrical target material obtained by melting or casting is subjected to plastic processing such as rolling, extrusion, forging, and then cutting, milling, or end milling. By performing machining such as processing, it can be manufactured by finishing to a desired size and surface state.
- the target material is filled into a plate-shaped mold and sintered by a hot press or a hot isostatic press.
- a plate-like sintered body was obtained by atmospheric pressure sintering that sinters at atmospheric pressure. Then, it can be manufactured by finishing it to a desired size and surface state by performing machining such as cutting, milling, and end milling, and grinding.
- the solder material used for joining the target and the backing plate is not particularly limited, and a material containing a metal or alloy having a low melting point (for example, 723 K or less) is preferable.
- a material containing a metal or alloy having a low melting point for example, 723 K or less
- indium (In) tin (Sn), zinc ( A material containing a metal selected from the group consisting of Zn), lead (Pb), silver (Ag), copper (Cu), bismuth (Bi), cadmium (Cd) and antimony (Sb) or an alloy thereof.
- In, In alloys, and Sn alloys having a low melting point can be widely used as solder materials for sputtering targets.
- Example 1 The backing plate 10 shown in FIGS. 5A and 6A was produced using the main body and the lid member having the shapes shown in FIGS. In the joining in the step (a), the main body and the lid member were joined by electron beam welding using an electron beam welding machine manufactured by Steigerwald.
- Oxygen-free copper plate (Mitsubishi Shindoh Co., Ltd. rolled plate C1020-1 / 2H) Vickers hardness> 80 Tensile strength> 265 MPa Conductivity> 101% IACS (20 ° C)
- Lid member Oxygen-free copper plate (Mitsubishi Shindoh Co., Ltd. rolled plate C1020-1 / 2H) Vickers hardness> 80 Tensile strength> 265 MPa Conductivity> 101% IACS (20 ° C)
- the dial gauge is fixed to the portal machining center, and the dial gauge is moved along the straight lines L1 and L2 located at the center of the long straight portion of the lid member shown in FIG. The height was measured.
- the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joint surface was 0.4 mm, and then milled using a portal machining center (step (b) )).
- the joined body after milling was fixed with a vacuum chuck so that the pedestal surface was on the upper side, and the pedestal surface was milled using a portal machining center.
- the backing plate thus manufactured was cut along L1 and L2 shown in FIG. 7, and the “thickness of the lid member” was measured using a caliper. The results are shown in the graph of FIG.
- the uniform thickness of the lid member means that the difference between the maximum value and the minimum value of the thickness of the lid member is “0.4 mm or less”.
- Example 2 A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joint surface was 0.3 mm.
- the backing plate produced in this way was cut along L1 and L2 shown in FIG. 7, and the “thickness of the lid member” was measured. The results are shown in the graph of FIG. 13 and Table 1 below.
- Example 3 The main body and the lid member were joined by friction stir welding, and a backing plate was produced with the following design target values.
- the material of each member was the same as that in Example 1.
- a backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joining surface was 0.3 mm.
- the backing plate produced in this way was cut along L1 and L2 shown in FIG. 7, and the “thickness of the lid member” was measured. The results are shown in the graph of FIG. 16 and Table 1 below.
- Example 1 A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joining surface was 1.0 mm.
- the backing plate produced in this way was cut along L1 and L2 shown in FIG. 7, and the “thickness of the lid member” was measured. The results are shown in the graph of FIG. 14 and Table 1 below.
- Example 2 A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joining surface was 0.5 mm.
- the backing plate produced in this way was cut along L1 and L2 shown in FIG. 7, and the “thickness of the lid member” was measured. The results are shown in the graph of FIG. 15 and Table 1 below.
- the difference between the maximum value and the minimum value of the lid member thickness was 0.4 mm or less, indicating that the lid member thickness was uniform. . This is because, in the step (b), the difference between the maximum value and the minimum value of the height measured on the bonding surface when fixing the bonded body is less than 0.5 mm.
- the minimum and minimum values are less than 0.5 mm, the joined body is fixed, and at least a part of the joining surface is processed by cutting.
- the difference from the value is 0.4 mm or less, and the thickness of the lid member can be made uniform.
- step (b) at least a part of the joint surface is processed by cutting in a state where the joined body is fixed.
- the effect on the warping and distortion of the backing plate after the manufacture is hardly caused by such fixing. I can't see it.
- Example 4 A backing plate was prepared in the same manner as in Example 1, and a pressure test was performed by applying a water pressure of 0.5 MPa to the channel in the backing plate through a hole provided in the lid member connected to the channel. After holding for 30 minutes in the pressurized state, it was confirmed whether or not the lid member was deformed in the unloaded state, and no deformed portion was found. In addition, after the pressure resistance test, the He leak test of the flow path was performed using an UL leak He leak device, but the leak rate was 5.0 ⁇ 10 ⁇ 10 Pa ⁇ m 3 / s or less, and leakage was observed. There wasn't. By making the thickness of the lid member uniform, it is possible to obtain a backing plate that is resistant to deformation that does not cause plastic deformation of the lid member even under pressure.
- a sputtering target was prepared by bonding an aluminum target of 2250 mm ⁇ 200 mm ⁇ t15 mm using indium solder on a backing plate that was confirmed to be free from deformation or leak by the pressure resistance test and the He leak test of the flow path. During the bonding operation, the backing plate was heated to 240 ° C., but no significant warping occurred. When the bonding rate was inspected with an ultrasonic flaw detector, the bonding rate was 99% or more, and the entire target material was bonded uniformly. It was possible to produce a sputtering target.
- the sputtering target can be particularly utilized in the sputtering target that could be used in the manufacture of flat panel displays such as liquid crystal displays (LCD).
- LCD liquid crystal displays
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Abstract
Description
流体が通過する溝を片面に有する板状の本体と、該本体の溝を覆うように該本体に配置される板状の蓋部材とを接合することを含むバッキングプレートの製造方法であって、該本体と該蓋部材とを接合して一体化した後、該本体と該蓋部材との接合面を上面として、該蓋部材の表面において測定される高さの最大値と最小値との差が0.5mm未満となるように該本体を固定し、該接合面の少なくとも一部を切削により加工することを含む、バッキングプレートの製造方法。
[2]
前記本体を力学的に固定する、上記[1]に記載の製造方法。
[3]
前記本体をバイス、クランプまたは真空チャックにより固定する、上記[1]または[2]に記載の製造方法。
[4]
前記加工がフライス加工である、上記[1]~[3]のいずれか1項に記載の製造方法。
[5]
前記本体と前記蓋部材とを電子ビーム溶接または摩擦撹拌接合により接合する、上記[1]~[4]のいずれか1項に記載の製造方法。
[6]
流体が通過する溝を片面に有する板状の本体と、該本体の溝を覆うように該本体に配置される板状の蓋部材とを含むバッキングプレートであって、該本体と該蓋部材とが接合により一体化されていて、該蓋部材の厚さの最大値と最小値との差が0.4mm以下である、バッキングプレート。
[7]
上記[1]に記載の製造方法により得られるバッキングプレート。
[8]
前記蓋部材の厚さの最大値と最小値との差が0.4mm以下である、上記[7]に記載のバッキングプレート。
[9]
上記[6]に記載のバッキングプレート上にターゲット材が結合されていることを特徴とするスパッタリングターゲット。
[10]
バッキングプレートにターゲット材を結合することを含むスパッタリングターゲットの製造方法であって、上記[1]~[5]のいずれか1項に記載の製造方法によって前記バッキングプレートを製造することを特徴とするスパッタリングターゲットの製造方法。 [1]
A method of manufacturing a backing plate comprising joining a plate-like main body having a groove through which a fluid passes on one side and a plate-like lid member disposed on the main body so as to cover the groove of the main body, After joining and integrating the main body and the lid member, the difference between the maximum value and the minimum value of the height measured on the surface of the lid member with the joint surface between the main body and the lid member as the upper surface A method of manufacturing a backing plate, comprising fixing the main body so that the thickness is less than 0.5 mm, and processing at least a part of the joint surface by cutting.
[2]
The manufacturing method according to [1], wherein the main body is mechanically fixed.
[3]
The manufacturing method according to [1] or [2], wherein the main body is fixed by a vise, a clamp, or a vacuum chuck.
[4]
The manufacturing method according to any one of [1] to [3], wherein the processing is milling.
[5]
The manufacturing method according to any one of [1] to [4], wherein the main body and the lid member are joined by electron beam welding or friction stir welding.
[6]
A backing plate comprising a plate-like main body having a groove through which a fluid passes on one side, and a plate-like lid member disposed on the main body so as to cover the groove of the main body, the main body and the lid member Is a backing plate in which the difference between the maximum value and the minimum value of the thickness of the lid member is 0.4 mm or less.
[7]
The backing plate obtained by the manufacturing method as described in said [1].
[8]
The backing plate according to [7] above, wherein a difference between the maximum value and the minimum value of the thickness of the lid member is 0.4 mm or less.
[9]
A sputtering target, wherein a target material is bonded onto the backing plate according to the above [6].
[10]
A sputtering target manufacturing method including bonding a target material to a backing plate, wherein the backing plate is manufactured by the manufacturing method according to any one of [1] to [5] above. A method for producing a sputtering target.
また、図5B(上面図)、図6B(側面図)に示す通り、バッキングプレート20の台座面には、ターゲット材を配置することのできる台座部5が形成されていてもよい。
接合面の蓋部材3には、その任意の場所において、任意の寸法の孔6が形成されていてもよく、本体1に形成された溝(または流路)2との流体接続を可能としている。なお、孔6の数に特に制限はない。 5 (plan view from the pedestal surface side) and FIG. 6 (side view), the
Further, as shown in FIG. 5B (top view) and FIG. 6B (side view), a
The
図4に示す通り、本体1は、本体用の材料1’を切削、研削などの方法により加工することによって形成することができる。 <Main body>
As shown in FIG. 4, the
なお、溝2の形状や寸法、ならびに本体1に占める割合や位置などに特に制限はない。溝2は、接合後に接合面となる蓋部材3の表面と、接合後に接合面となる本体1の表面とが面一になるような形状や寸法を有することが好ましい。 For example, as shown in the cross-sectional view of FIG. 3, the
In addition, there is no restriction | limiting in particular in the shape and dimension of the groove |
蓋部材3は、例えば図2の斜視図および図4の概略図に示す通り、本体1の溝2を覆うように(または塞ぐように)本体1に配置され得る通常2~6mmの厚さの板状(またはパネル状)の部材である。蓋部材の本体への設置のしやすさから、図3の断面図にて示される本体の段差部2a、2bに蓋部材を載置させるように、蓋部材の幅は溝の幅よりも大きい方がよいが、蓋部材の厚さを5mm以下、特に3.5mm以下に設計した場合には、流路への加圧で変形が生じやすいため、蓋部材の幅は溝の幅+30mm以下、好ましくは+20mm以下、より好ましくは+15mm以下のサイズとすることが好ましい。また、蓋部材の厚さは適宜決定すればよいが、蓋部材の厚さが5mm以下、好ましくは3.5mm以下、より好ましくは3mm以下の場合に本発明の効果を奏しやすい。 <Cover member>
The
工程(a)は、本体1と蓋部材3とを接合によって、これらを一体化することを含む。
例えば、図4に示す通り、蓋部材3が本体1の溝2を覆うように蓋部材3を本体1に配置し、好ましくは本体1の表面と蓋部材3の表面とが面一になるように、これらの部材を配置する。 <Process (a)>
Step (a) includes integrating the
For example, as shown in FIG. 4, the
工程(b)では、例えば水平な平面上に、接合体4の本体1と蓋部材3との接合面を上面(または上側)として固定する(例えば、図4に示す接合体4を参照のこと)。そして、この水平な平面上に接合体4を固定する際、好ましくは接合体4の設置する側の面(台座面となる側の面)を、できる限りこの水平な平面に近接して配置した後に固定する。そして、蓋部材3の表面において測定される高さ(すなわち、この水平な平面から、蓋部材3の表面の測定点までの距離)の最大値と最小値との差が0.5mm未満、好ましくは0.4mm~0mm、より好ましくは0.3mm~0mmとなるように固定し、必要に応じて蓋部材3とともに接合面の少なくとも一部、好ましくは接合面の全面を切削により水平に加工する。 <Step (b)>
In the step (b), for example, the joining surface of the
後処理工程としては、例えば、以下の工程などが挙げられる。
(1)台座面の切削による加工
(2)接合面の仕上げ加工
(3)台座面の仕上げ加工
(4)穴あけ加工
(5)反り矯正 <Post-processing process>
Examples of the post-processing step include the following steps.
(1) Processing by cutting the pedestal surface (2) Finishing processing of the joint surface (3) Finishing processing of the pedestal surface (4) Drilling processing (5) Warping correction
接合体4をその台座面を上側に配置して、例えば真空チャックなどで固定し、接合体4の台座面を、例えば、フライス加工、研削加工、エンドミル加工、旋盤加工などを用いてさらに加工してもよい。 (1) Processing by cutting of pedestal surface The bonded
接合体4をその接合面を上側に配置して、例えば真空チャックなどで固定して、接合体4の接合面を例えばフライス加工、研削加工、エンドミル加工、旋盤加工などを用いて仕上げ加工してもよい。 (2) Finishing processing of the joint surface The
接合体4をその台座面を上側に配置して、例えば真空チャックなどで固定して、接合体4の台座面を、例えば、フライス加工、研削加工、エンドミル加工などを用いて仕上げ加工してもよい。 (3) Finishing process of pedestal surface The bonded
必要に応じて、バッキングプレートの本体1の溝2や台座部5が形成されていない部分には貫通孔を形成してもよい。このような貫通孔にボルト等を通すことによって、本体1をスパッタリング装置に固定することができるようになる。貫通孔の形成方法に特に制限はなく、例えばドリル等を用いて形成することができる。また、貫通孔の寸法、位置、数などに特に制限はない。 (4) Drilling If necessary, a through hole may be formed in a portion of the backing plate where the
上記のバッキングプレートの後処理工程の間において、接合体4に反りが発生し得る場合もあり、その場合には、必要に応じて、例えば矯正機などを用いて、反りの大きさが2mm未満、好ましくは1mm~0mm、より好ましくは0.5mm~0mmになるまで、接合体4を矯正することが好ましい。 (5) Warpage correction During the post-processing step of the above backing plate, warpage may occur in the joined
図1、2に示す形状の本体および蓋部材を用いて、図5A、6Aに示すバッキングプレート10を作製した。なお、工程(a)での接合では、シュタイガーバルト社製の電子ビーム溶接機を用いて、電子ビーム溶接により本体と蓋部材とを接合した。 [Example 1]
The
ビッカース硬度 >80
引張強度 >265MPa
導電率 >101%IACS(20℃) Body: Oxygen-free copper plate (Mitsubishi Shindoh Co., Ltd. rolled plate C1020-1 / 2H)
Vickers hardness> 80
Tensile strength> 265 MPa
Conductivity> 101% IACS (20 ° C)
ビッカース硬度 >80
引張強度 >265MPa
導電率 >101%IACS(20℃) Lid member: Oxygen-free copper plate (Mitsubishi Shindoh Co., Ltd. rolled plate C1020-1 / 2H)
Vickers hardness> 80
Tensile strength> 265 MPa
Conductivity> 101% IACS (20 ° C)
バッキングプレートの長手方向の寸法:2500mm
バッキングプレートの幅方向の寸法:270mm
バッキングプレートの厚さ:16mm
本体の厚さ(溝部):8mm
蓋部材の厚さ:3mm
蓋部材の長手方向の寸法:2350mm
蓋部材の幅方向の寸法:175mm(全長)(=70mm(長尺直線部分の幅方向の寸法)+35mm(中間部分の幅方向の寸法)+70mm(長尺直線部分の幅方向の寸法))
流路の幅方向の寸法:165mm(全長)(=60mm(長尺直線部分の幅方向の寸法)+45mm(中間部分の幅方向の寸法)+60mm(長尺直線部分の幅方向の寸法))
流路の厚さ(または高さ):5mm Design target value of the backing plate Dimensions in the longitudinal direction of the backing plate: 2500 mm
Width dimension of backing plate: 270mm
Backing plate thickness: 16mm
Body thickness (groove): 8mm
Lid member thickness: 3mm
Longitudinal dimension of the lid member: 2350 mm
Dimension in the width direction of the lid member: 175 mm (full length) (= 70 mm (dimension in the width direction of the long straight portion) +35 mm (dimension in the width direction of the intermediate portion) +70 mm (dimension in the width direction of the long straight portion))
Dimensions in the width direction of the flow path: 165 mm (full length) (= 60 mm (dimension in the width direction of the long straight portion) +45 mm (dimension in the width direction of the intermediate portion) +60 mm (dimension in the width direction of the long straight portion))
Channel thickness (or height): 5 mm
接合面で測定した高さの最大値と最小値との差が0.4mmとなるように接合体をバイスで固定し、その後、門型マシニングセンタを用いて、フライス加工を行った(工程(b))。 At the joint surface, the dial gauge is fixed to the portal machining center, and the dial gauge is moved along the straight lines L1 and L2 located at the center of the long straight portion of the lid member shown in FIG. The height was measured.
The joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joint surface was 0.4 mm, and then milled using a portal machining center (step (b) )).
接合面で測定した高さの最大値と最小値との差が0.3mmとなるように接合体をバイスで固定したことを除いて、実施例1と同様にして、バッキングプレートを作製した。 [Example 2]
A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joint surface was 0.3 mm.
摩擦撹拌接合により本体と蓋部材とを接合し、以下に示す設計目標値でバッキングプレートを作製した。各部材の材料は実施例1と同様の材料を使用した。 [Example 3]
The main body and the lid member were joined by friction stir welding, and a backing plate was produced with the following design target values. The material of each member was the same as that in Example 1.
バッキングプレートの長手方向の寸法:2100mm
バッキングプレートの幅方向の寸法:270mm
バッキングプレートの厚さ:16mm
本体の厚さ(溝部):7.7mm
蓋部材の厚さ:3.3mm
蓋部材の長手方向の寸法:2000mm
蓋部材の幅方向の寸法:175mm(全長)(=70mm(長尺直線部分の幅方向の寸法)+35mm(中間部分の幅方向の寸法)+70mm(長尺直線部分の幅方向の寸法))
流路の幅方向の寸法:165mm(全長)(=60mm(長尺直線部分の幅方向の寸法)+45mm(中間部分の幅方向の寸法)+60mm(長尺直線部分の幅方向の寸法))
流路の厚さ(または高さ):5mm Design target value of the backing plate Dimensions in the longitudinal direction of the backing plate: 2100 mm
Width dimension of backing plate: 270mm
Backing plate thickness: 16mm
Body thickness (groove): 7.7 mm
Lid member thickness: 3.3 mm
Longitudinal dimension of the lid member: 2000 mm
Dimension in the width direction of the lid member: 175 mm (full length) (= 70 mm (dimension in the width direction of the long straight portion) +35 mm (dimension in the width direction of the intermediate portion) +70 mm (dimension in the width direction of the long straight portion))
Dimensions in the width direction of the flow path: 165 mm (full length) (= 60 mm (dimension in the width direction of the long straight portion) +45 mm (dimension in the width direction of the intermediate portion) +60 mm (dimension in the width direction of the long straight portion))
Channel thickness (or height): 5 mm
接合面で測定した高さの最大値と最小値との差が1.0mmとなるように接合体をバイスで固定したことを除いて、実施例1と同様にして、バッキングプレートを作製した。 [Comparative Example 1]
A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joining surface was 1.0 mm.
接合面で測定した高さの最大値と最小値との差が0.5mmとなるように接合体をバイスで固定したことを除いて、実施例1と同様にして、バッキングプレートを作製した。 [Comparative Example 2]
A backing plate was produced in the same manner as in Example 1 except that the joined body was fixed with a vice so that the difference between the maximum value and the minimum value measured on the joining surface was 0.5 mm.
実施例1と同様にして、バッキングプレートを作製し、流路につながる蓋部材に設けた穴より0.5MPaの水圧をバッキングプレート内の流路に印加し、耐圧テストを行った。加圧状態で30分間保持した後、除荷状態で蓋部材が変形しているか確認したところ、変形した箇所は見られなかった。また、耐圧テスト後に、アルバック製のHeリーク装置を用い、流路のHeリークテストを行ったが、リークレートが5.0×10-10Pa・m3/s以下であり、漏洩は見られなかった。蓋部材の厚さを均一にすることによって、加圧によっても蓋部材の塑性変形が生じない変形に強いバッキングプレートを得ることができる。 [Example 4]
A backing plate was prepared in the same manner as in Example 1, and a pressure test was performed by applying a water pressure of 0.5 MPa to the channel in the backing plate through a hole provided in the lid member connected to the channel. After holding for 30 minutes in the pressurized state, it was confirmed whether or not the lid member was deformed in the unloaded state, and no deformed portion was found. In addition, after the pressure resistance test, the He leak test of the flow path was performed using an UL leak He leak device, but the leak rate was 5.0 × 10 −10 Pa · m 3 / s or less, and leakage was observed. There wasn't. By making the thickness of the lid member uniform, it is possible to obtain a backing plate that is resistant to deformation that does not cause plastic deformation of the lid member even under pressure.
2 溝(または流路)
3 蓋部材
4 接合体
5 台座部
6 孔
10 バッキングプレート
20 バッキングプレート(台座部あり) 1
3
Claims (10)
- 流体が通過する溝を片面に有する板状の本体と、該本体の溝を覆うように該本体に配置される板状の蓋部材とを接合することを含むバッキングプレートの製造方法であって、該本体と該蓋部材とを接合して一体化した後、該本体と該蓋部材との接合面を上面として、該蓋部材の表面において測定される高さの最大値と最小値との差が0.5mm未満となるように該本体を固定し、該接合面の少なくとも一部を切削により加工することを含む、バッキングプレートの製造方法。 A method of manufacturing a backing plate comprising joining a plate-like main body having a groove through which a fluid passes on one side and a plate-like lid member disposed on the main body so as to cover the groove of the main body, After joining and integrating the main body and the lid member, the difference between the maximum value and the minimum value of the height measured on the surface of the lid member with the joint surface between the main body and the lid member as the upper surface A method of manufacturing a backing plate, comprising fixing the main body so that the thickness is less than 0.5 mm, and processing at least a part of the joint surface by cutting.
- 前記本体を力学的に固定する、請求項1に記載の製造方法。 The manufacturing method according to claim 1, wherein the main body is mechanically fixed.
- 前記本体をバイス、クランプまたは真空チャックにより固定する、請求項1または2に記載の製造方法。 The manufacturing method according to claim 1 or 2, wherein the main body is fixed by a vise, a clamp or a vacuum chuck.
- 前記加工がフライス加工である、請求項1~3のいずれか1項に記載の製造方法。 The manufacturing method according to any one of claims 1 to 3, wherein the processing is milling.
- 前記本体と前記蓋部材とを電子ビーム溶接または摩擦撹拌接合により接合する、請求項1~4のいずれか1項に記載の製造方法。 The manufacturing method according to any one of claims 1 to 4, wherein the main body and the lid member are joined by electron beam welding or friction stir welding.
- 流体が通過する溝を片面に有する板状の本体と、該本体の溝を覆うように該本体に配置される板状の蓋部材とを含むバッキングプレートであって、該本体と該蓋部材とが接合により一体化されていて、該蓋部材の厚さの最大値と最小値との差が0.4mm以下である、バッキングプレート。 A backing plate comprising a plate-like main body having a groove through which a fluid passes on one side, and a plate-like lid member disposed on the main body so as to cover the groove of the main body, the main body and the lid member Is a backing plate in which the difference between the maximum value and the minimum value of the thickness of the lid member is 0.4 mm or less.
- 請求項1に記載の製造方法により得られるバッキングプレート。 A backing plate obtained by the production method according to claim 1.
- 前記蓋部材の厚さの最大値と最小値との差が0.4mm以下である、請求項7に記載のバッキングプレート。 The backing plate according to claim 7, wherein a difference between a maximum value and a minimum value of the thickness of the lid member is 0.4 mm or less.
- 請求項6に記載のバッキングプレート上にターゲット材が結合されていることを特徴とするスパッタリングターゲット。 A sputtering target, wherein a target material is bonded onto the backing plate according to claim 6.
- バッキングプレートにターゲット材を結合することを含むスパッタリングターゲットの製造方法であって、請求項1~5のいずれか1項に記載の製造方法によって前記バッキングプレートを製造することを特徴とするスパッタリングターゲットの製造方法。 A sputtering target manufacturing method comprising bonding a target material to a backing plate, wherein the backing plate is manufactured by the manufacturing method according to any one of claims 1 to 5. Production method.
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JP2017193779A (en) * | 2015-07-10 | 2017-10-26 | 住友化学株式会社 | Backing plate and sputtering target, and method of manufacturing the same |
CN110684951A (en) * | 2018-09-07 | 2020-01-14 | 住华科技股份有限公司 | Backing plate, sputtering target material using backing plate and using method of sputtering target material |
WO2020105558A1 (en) * | 2018-11-21 | 2020-05-28 | 住友化学株式会社 | Backing plate, sputtering target, and production methods therefor |
WO2023095022A1 (en) * | 2021-11-23 | 2023-06-01 | Pilatus Flugzeugwerke Ag | Aircraft component and aircraft |
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JP6677853B1 (en) * | 2019-02-07 | 2020-04-08 | 住友化学株式会社 | Sputtering target, method for joining target material and backing plate, and method for manufacturing sputtering target |
JP6801911B2 (en) * | 2020-09-07 | 2020-12-16 | 京浜ラムテック株式会社 | Backing plate and its manufacturing method |
CN112222553A (en) * | 2020-09-27 | 2021-01-15 | 宁波江丰电子材料股份有限公司 | Molybdenum target welding method |
CN112323026A (en) * | 2020-10-29 | 2021-02-05 | 珠海和泽科技有限公司 | Target material back plate and manufacturing method thereof |
US12217948B2 (en) | 2021-03-26 | 2025-02-04 | Sumitomo Chemical Company, Limited | Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target |
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JP2017193779A (en) * | 2015-07-10 | 2017-10-26 | 住友化学株式会社 | Backing plate and sputtering target, and method of manufacturing the same |
CN110684951A (en) * | 2018-09-07 | 2020-01-14 | 住华科技股份有限公司 | Backing plate, sputtering target material using backing plate and using method of sputtering target material |
WO2020105558A1 (en) * | 2018-11-21 | 2020-05-28 | 住友化学株式会社 | Backing plate, sputtering target, and production methods therefor |
JP2020084327A (en) * | 2018-11-21 | 2020-06-04 | 住友化学株式会社 | Backing plate, sputtering target and production method of the same |
US12057302B2 (en) | 2018-11-21 | 2024-08-06 | Sumitomo Chemical Company, Limited | Backing plate, sputtering target, and production methods therefor |
WO2023095022A1 (en) * | 2021-11-23 | 2023-06-01 | Pilatus Flugzeugwerke Ag | Aircraft component and aircraft |
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CN107849688B (en) | 2020-05-19 |
JP2018095971A (en) | 2018-06-21 |
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