WO2016163137A1 - Apparatus for manufacturing lamination device - Google Patents
Apparatus for manufacturing lamination device Download PDFInfo
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- WO2016163137A1 WO2016163137A1 PCT/JP2016/052931 JP2016052931W WO2016163137A1 WO 2016163137 A1 WO2016163137 A1 WO 2016163137A1 JP 2016052931 W JP2016052931 W JP 2016052931W WO 2016163137 A1 WO2016163137 A1 WO 2016163137A1
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- WIPO (PCT)
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- workpiece
- holding member
- holding surface
- work
- workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/0046—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by constructional aspects of the apparatus
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/33—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
- G09F9/335—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes being organic light emitting diodes [OLED]
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/35—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Definitions
- the present invention may be a flat panel display (FPD) or a sensor device such as a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), or a flexible display, or a touch panel type FPD or 3D (three-dimensional).
- a sensor device such as a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), or a flexible display, or a touch panel type FPD or 3D (three-dimensional).
- Another plate-like workpiece such as a touch panel, cover glass, cover film, or FPD is used for a plate-like workpiece such as a liquid crystal module (LCM) or flexible printed wiring board (FPC) such as a display or an electronic book. It is related with the manufacturing apparatus of the bonding device bonded together.
- the lift pins for transferring the upper substrate and the lower substrate can be moved up and down along the through holes provided in the upper substrate holder and the lower substrate holder, respectively.
- the upper and lower substrates held and transferred by the arm of the transfer robot at the time of carrying in at atmospheric pressure are lift pins that move up and down so as to protrude from the surfaces of the upper and lower substrate holders, respectively.
- the upper substrate holder holds the received upper substrate by vacuum suction, the lower substrate holder sucks and holds the lower substrate, and the upper substrate holder and the lower substrate holder move closer together.
- the upper substrate and the lower substrate are aligned and then superposed and temporarily fixed.
- the upper substrate holder is released from holding the upper substrate holder, and the upper substrate holder is moved to the original position. The substrate is transferred to the arm of the transfer robot by lift pins and unloaded.
- the peeling operation is performed in a sealed space in order to maintain a vacuum state, it is practically easy to remove the generated peeling charge using a blow ionizer or photo ionizer, unlike the peeling operation in the atmosphere. Under difficult conditions. As a result, arc discharge occurs in the conductive part due to the electric charge due to the peeling charge, and the characteristics change due to static electricity even if the electronic circuit etc. existing on the bonding surface of the substrate is broken or not destroyed. There was a problem. In addition, after the bonding of the substrates is completed and the pressure is returned to atmospheric pressure, the pair of bonded substrates is separated from the substrate holding surface of the lower substrate holder by lift pins, but the interface between the substrate holding surface and the substrate is smooth.
- the interface between the substrate holding surface and the substrate is attached.
- the substrate holding surface and the substrate are temporarily in a vacuum state, and the pair of substrates bonded is instantaneously
- the substrate is warped by being pulled by the lower substrate holder. Even if the substrates are bonded with high accuracy, if they are partially warped during peeling, there is a problem that the alignment accuracy deteriorates and the product becomes partially defective.
- the substrate holding surface and the substrate are formed by forming an uneven portion on the substrate holding surface of the upper substrate holder or the lower substrate holder so that the contact area with the substrate is reduced. It is conceivable to prevent static electricity generated at the interface between the substrate holding surface and the vacuum contact between the substrate and the substrate.
- the substrate holding surface of the upper substrate holder and the substrate holding surface of the lower substrate holder are formed of a metal such as aluminum that is softer than glass or silicon as the material of the substrate. Due to the friction that occurs each time the substrate repeatedly contacts the substrate holding surface of the upper substrate holder or the lower substrate holder, the convex portion gradually wears over time, and finally the substrate comes into surface contact. End up. As a result, there are problems in that static electricity generated at the interface between the substrate holding surface and the substrate over a long period of time cannot be prevented and vacuum contact between the substrate holding surface and the substrate cannot be prevented.
- a bonding device manufacturing apparatus holds a pair of workpieces on a first holding member and a second holding member, respectively, and the first holding member and the second holding member.
- a manufacturing apparatus for a bonding device that aligns and bonds the pair of workpieces by relative approach movement of the first workpiece holding surface of the first holding member or the second workpiece of the second holding member.
- One or both of the holding surfaces are opposed to one or both of the pair of workpieces, and the surface is uneven with a material harder than the material of the first holding member, the second holding member, and the pair of workpieces.
- a manufacturing apparatus A for a bonding device W includes a pair of workpieces W1 and W2 formed in a plate shape, and a first holding member 1 and a second holding member.
- This is a workpiece laminating apparatus that holds each of the members 2 and aligns and bonds the pair of workpieces W1 and W2 with high precision by the relative close movement of the first holding member 1 and the second holding member 2. It is preferable that the pair of workpieces W ⁇ b> 1 and W ⁇ b> 2 that have been bonded together are peeled from the first holding member 1 and the second holding member 2.
- the first holding member 1 and the second holding member 2 are arranged to face each other inside the variable pressure chamber B, and the first workpiece W1 and the second workpiece carried into the variable pressure chamber B are used.
- W2 is received by the holding chuck 3 provided on the first holding member 1 and the second holding member 2, respectively. Thereafter, either one or both of the first holding member 1 and the second holding member 2 are moved closer to each other in the facing direction in the decompressed variable pressure chamber B, and in a direction crossing the facing direction. After relatively aligning, the first workpiece W1 and the second workpiece W2 are bonded (attached) with high accuracy. Thereby, the bonding device W which has sealing space inside is created.
- the first work W1 and the second work W2 are normally arranged so as to face each other in the vertical direction, and the upper first work W1 and the lower second work W2 are arranged.
- the direction in which is attached is hereinafter referred to as the “Z direction”.
- a direction along the first workpiece W1 and the second workpiece W2 that intersects the Z direction is hereinafter referred to as an “XY direction”.
- the manufacturing apparatus A of the bonding device W which concerns on embodiment of this invention will be provided with the 1st holding member 1 and the 2nd holding member 2 which are provided facing the Z direction, the 1st holding member 1 and the 2nd.
- a holding chuck 3 for holding the pair of workpieces W1 and W2 detachably and immovably with respect to the holding member 2 and either one or both of the first holding member 1 and the second holding member 2 is Z.
- Alignment / separation driving unit 4 that moves relatively close to the direction, and one or both of first holding member 1 and second holding member 2 that are relatively adjusted and moved in the XY direction and XY ⁇ direction
- a control unit 6 for controlling the operation of at least the holding chuck 3, the contact / separation drive unit 4, the alignment drive unit 5 and the like as main components.
- a peeling member 7 for peeling the pair of workpieces W1, W2 that have been bonded together from the second holding member 2.
- the holding chuck 3 described later the first work W1 and the second work W2 are sucked toward the first work holding surface 1a of the first holding member 1 and the second work holding surface 2a of the second holding member 2.
- a suction chuck 31 it is also possible to use an adhesive chuck 32 or an electrostatic chuck that adheres and holds the first workpiece W1 and the second workpiece W2.
- the bonding device W is a thin plate-like structure in which components are integrally assembled, such as an FPD, a 3D (three-dimensional) display, an electronic book, or an organic EL display.
- the first work W1 is made of, for example, a glass touch panel or a cover glass, and is composed so as to cover the second work W2 made of LCM or a flexible printed wiring board (FPC), thereby forming an FPD, an OLED, or the like.
- a sealing material W3 is applied to one or both of the opposing surfaces of the first workpiece W1 and the second workpiece W2 using a quantitative discharge nozzle such as a dispenser.
- a photo-curing adhesive such as a UV curable optical transparent resin (OCR), which is cured by absorbing light energy such as ultraviolet rays and is cured by the progress of polymerization, is used.
- OCR UV curable optical transparent resin
- the first holding member 1 is composed of a plate such as a flat plate having a thickness that does not deform (bend) with a rigid body such as a metal, and faces the first workpiece W1 loaded in the Z direction on the surface thereof. And has a first work holding surface 1a in contact therewith.
- the second holding member 2 is composed of a plate such as a flat plate having a thickness that does not deform (bend) with a rigid body such as metal, and the surface thereof faces the second workpiece W2 loaded in the Z direction. And has a second work holding surface 2a that comes into contact.
- the first workpiece holding surface 1a and the second workpiece holding surface 2a in the case shown in FIGS.
- the entire surface of the first holding member 1 can be changed to the first workpiece holding surface 1a, or the entire surface of the second holding member 2 can be changed to the second workpiece holding surface 2a. It is.
- the first workpiece holding surface 1a and the second workpiece holding surface 2a are formed in a hard concavo-convex shape and have a holding chuck 3 in order to reduce the contact area with the first workpiece W1 and the second workpiece W2. Yes. That is, either one or both of the first workpiece holding surface 1a of the first holding member 1 and the second workpiece holding surface 2a of the second holding member 2 are opposed to one or both of the pair of workpieces W1 and W2.
- a hard coating layer 12 having at least the surface thereof formed in an uneven shape is provided.
- first work holding surface 1a of the first holding member 1 and the second work holding surface 2a of the second holding member 2 can be detachably attached to one or both of the pair of works W1, W2.
- a suction port 31a is provided as the holding chuck 3 to be held on.
- the suction port 31a serving as the holding chuck 3 is a suction hole of the suction chuck 31 that is opened to face the surfaces of the first workpiece W1 and the second workpiece W2 and sucks the first workpiece W1 and the second workpiece W2.
- the suction port 31a is connected to an air passage 31b and communicates with an intake source 31c.
- the plurality of suction ports 31a are arranged so as to be dispersed in the XY direction with respect to the first workpiece holding surface 1a and the second workpiece holding surface 2a, and the number and interval of the suction ports 31a are the first workpiece W1 and the second workpiece W2. It is determined according to the size, thickness, material, weight, etc.
- the intake source 31c is composed of a pump, a compressor, and the like, and is ventilated from the time of receiving at least the first work W1 and the second work W2 carried into the variable pressure chamber B to the time of bonding by the control unit 6 described later. The operation is controlled so as to suck from the suction port 31a via 31b.
- the first workpiece W1 held on the first workpiece holding surface 1a of the first holding member 1 or the second workpiece holding surface of the second holding member 2 It is also possible to eject a fluid such as compressed air from the suction port 31a toward the second workpiece W2 held by 2a.
- an adsorption chuck 31 and an adhesive chuck 32 are installed on the first work holding surface 1 a of the first holding member 1 disposed above. Only the suction chuck 31 is provided on the second work holding surface 2a of the second holding member 2 disposed below.
- the adhesive chuck 32 passes through a through-hole 1h opened in the first holding member 1, and is provided with an elevating part 32a that can be reciprocated in the Z direction, and is opposed to the first work W1 in the Z direction at the tip of the elevating part 32a.
- the adhesive portion 32b is provided, the adhesive follower portion 32c is provided at the base end of the elevating portion 32a, and the adhesive drive portion 32d is linked to the adhesive follower portion 32c.
- a plurality of sets of elevating parts 32a and adhesive parts 32b are arranged so as to be dispersed in the XY direction, and the number and interval of the elevating parts 32a and adhesive parts 32b correspond to the size, thickness, material, weight, etc. of the first workpiece W1. Can be decided.
- the adhesion drive unit 32d is configured by an actuator or the like that can reciprocate in the Z direction, and the control unit 6 described later of the first workpiece W1 carried into the variable pressure chamber B as shown by the solid line in FIG.
- the operation is controlled so that the adhesive portion 32b is brought into contact with the surface to be adhesively held.
- the first workpiece holding surface 1a of the first holding member 1 is in contact with the surface of the first workpiece W1
- the operation is controlled so that the adhesive portion 32b is separated from the surface of the first workpiece W1 in the Z direction.
- the adhesive chuck 32 is not installed on the first work holding surface 1a of the first holding member 1, and an electrostatic chuck is installed in combination with the suction chuck 31 instead. It is also possible to install or change the adhesive chuck 32 or the electrostatic chuck on the second work holding surface 2a of the holding member 2 in combination with the suction chuck 31.
- the material of the first holding member 1 and the second holding member 2 precision processing is easy (excellent in workability), but is lightweight (excellent in workability) and inexpensive. Materials are commonly used. On the other hand, glass, silicon, or the like that is harder than a metal material such as an aluminum-based material is generally used as the material of the first workpiece W1 and the second workpiece W2 that constitute a substrate such as an LCD or an OLED.
- first workpiece W1 and the second workpiece W2 are brought into contact with the first workpiece holding surface 1a of the first holding member 1 and the second workpiece holding surface 2a of the second holding member 2 and repeatedly attached and detached,
- the soft first workpiece holding surface 1a and the second workpiece holding surface 2a are gradually worn by friction generated each time they come into contact.
- a hard material such as ceramic that is harder than glass and hard to wear.
- the first workpiece holding surface 1a and the second workpiece holding surface 2a are formed in a concavo-convex shape by blasting such as sand blasting, etching treatment or lapping, etc.
- blasting such as sand blasting, etching treatment or lapping, etc.
- the mountain-shaped tip of the convex portion may pierce when contacting the first workpiece W1 or the second workpiece W2.
- the first holding member is attached to the first work holding surface 1a of the first holding member 1 and the second work holding surface 2a of the second holding member 2.
- a hard coating layer 12 made of a material harder than that of the first and second holding members 2 and the pair of workpieces W1 and W2 is formed.
- the hard coating layer 12 is laminated with a predetermined thickness by coating a material harder than the material of the pair of workpieces W1 and W2 along the first workpiece holding surface 1a and the second workpiece holding surface 2a. Furthermore, it is preferable that the hard coating layer 12 is grounded (grounded) via the first work holding surface 1a and the second work holding surface 2a.
- Specific examples of the coating method of the hard coating layer 12 include painting, dipping, vapor deposition, plating, sputtering, and thermal spraying. 1 to 4 as specific examples of the hard coating layer 12, the first work holding surface 1a partially formed in the first holding member 1 and the entire surface including the outer surface 1b thereof.
- a panel 12P having the hard coating layer 12 is detachably laid.
- a panel 12P having a hard coating layer 12 is detachably laid on the entire surface including the second work holding surface 2a partially formed in the second holding member 2 and the outer surface 2b. ing.
- the panel 12P is formed in a thin plate shape with a metal such as aluminum, and the hard coating layer 12 is integrally formed on the surface thereof.
- the shape of the panel 12P is formed in a rectangular shape or the like, and one panel 12P having substantially the same size as the first work holding surface 1a or the second work holding surface 2a is attached, or the first work holding surface 1a or the second work holding surface.
- a plurality of panels 12P smaller than the size of the surface 2a are attached so as to be arranged in the XY direction.
- the hard coating layer 12 is partially formed only on the first work holding surface 1a from which the outer surface 1b is removed, or the second work holding surface 2a from which the outer surface 2b is removed.
- the hard coating layer 12 is formed only on one side of the first work holding surface 1a or the second work holding surface 2a, or the first without using the panel 12P. It is also possible to directly form or change the hard coating layer 12 along the surface of the one workpiece holding surface 1a or the second workpiece holding surface 2a.
- the hard coating layer 12 has a plurality of supports that project from one or both of the first workpiece holding surface 1a and the second workpiece holding surface 2a toward one or both of the pair of workpieces W1 and W2 to make point contact.
- the projection 12a has a plurality of intake grooves 12b formed so as to communicate with the suction ports 31a of the suction chuck 31 between the plurality of support projections 12a.
- the plurality of support protrusions 12a are provided so that their tips are brought into point contact with the surfaces of the first work W1 and the second work W2, respectively, so that the first work W1 and the second work W2 are in a smooth state. is there.
- a plurality of intake grooves 12b are formed so that minute space portions 12s are dispersed between the first work W1 and the second work W2, and the contact area with the first work W1 and the second work W2 is narrow. It is comprised so that it may become.
- the plurality of support projections 12a are preferably formed so as to protrude in a mountain shape toward one or both of the pair of workpieces W1, W2.
- the plurality of intake grooves 12b are preferably formed in a valley shape so as to be adjacent to the plurality of support protrusions 12a in the XY direction and the XY ⁇ direction.
- either one or both of the 1st work holding surface 1a or the 2nd work holding surface 2a have a plurality of peak-like convex parts 12c and a plurality of valley-like concave parts 12d formed by roughening processing, It is preferable to laminate the hard coating layer 12 along the plurality of mountain-shaped convex portions 12c and the plurality of valley-shaped concave portions 12d. It is preferable that a plurality of mountain-shaped convex portions 12c and a plurality of valley-shaped concave portions 12d are arranged in a large number so as to be dense per unit area, like the support projections 12a and the intake grooves 12b.
- a plurality of support protrusions 12a are formed on the outside of the plurality of mountain-shaped convex portions 12c, and a plurality of intake grooves 12b are formed on the outside of the plurality of valley-shaped recesses 12d.
- the roughening process include a blasting process such as sandblasting, an etching process, and a lapping process.
- the metal surface that becomes the surface of the panel 12P is roughened by blasting, and the hard coating layer 12 is laminated on the roughened surface. Yes.
- a plurality of ridges 12c and a plurality of valleys are formed by applying particles such as ceramic, glass, metal, etc. having a particle size of about # 60 to # 240 to the metal surface that is the surface of panel 12P at high speed.
- the recess 12d is formed simultaneously with a predetermined surface roughness.
- the roughening process may be performed instead of the blasting process by an etching process or a lapping process, or the first work holding surface 1a or the second work holding surface 2a may be used without using the panel 12P.
- the surface can be directly roughened, and the hard coating layer 12 can be laminated or changed on the rough surface.
- the surface roughness (Ra) is preferably about 0.1 to 3.0. According to experiments, when the surface roughness (Ra) of the plurality of support protrusions 12a and the plurality of intake grooves 12b is less than 0.1, the height difference between the support protrusions 12a and the intake grooves 12b becomes too small, and the suction is reduced. The suction force from the suction port 31a of the chuck 31 is not easily spread to the plurality of intake grooves 12b. Therefore, it has been found that the first workpiece W1 and the second workpiece W2 cannot be stably sucked and held by the entire first workpiece holding surface 1a and the second workpiece holding surface 2a.
- the point contact plate and the contact portion of the block, and the contact portion of the surface contact plate and the block are each evacuated, and then subjected to a friction measurement test (block-on-plate) while returning to atmospheric pressure. It was.
- the friction force of the point contact plate is “0.090 Kg”
- the friction force of the surface contact plate is “0.193 Kg”
- the friction coefficient of the point contact plate is that of the surface contact plate.
- the coefficient of friction was about 1 ⁇ 2.
- the contact / separation drive unit 4 includes an actuator that reciprocates one or both of the first holding member 1 and the second holding member 2 in the Z direction, and the operation is controlled by a control unit 6 described later. .
- a control unit 6 described later.
- the drive unit 4 moves either the first holding member 1 or the second holding member 2 relatively apart from the other in the Z direction, or both the first holding member 1 and the second holding member 2 are mutually moved. It is moved relatively apart in the Z direction. After that, as shown in the two-dot chain line in FIG. 1 and FIG.
- the contact / separation drive unit 4 moves in the Z direction with one of the first holding member 1 side and the second holding member 2 side facing the other.
- the first workpiece W1 and the second workpiece W2 are moved in the Z direction with the sealing material W3 interposed therebetween by moving the first holding member 1 side and the second holding member 2 side closer to each other in the Z direction. If necessary, further pressurize and bond.
- the contact / separation drive unit 4 in the example shown in FIGS. 1 to 4, only the first holding member 1 is linked to the contact / separation drive unit 4 so that the first holding member 1 side is connected. It is relatively moved in the Z direction toward the second holding member 2 side.
- the second holding member 2 is linked to the contact / separation driving unit 4 so that the second holding member 2 side is relatively close to the first holding member 1 side in the Z direction.
- the first holding member 1 and the second holding member 2 are respectively linked to the contact / separation driving unit 4 so that the first holding member 1 side and the second holding member 2 side simultaneously approach each other in the Z direction. It can also be moved and changed.
- the alignment drive unit 5 includes an actuator that adjusts and moves one or both of the first holding member 1 and the second holding member 2 in the XY direction and the XY ⁇ direction. The operation is controlled by the control unit 6 described later. ing. As an example of the control of the alignment drive unit 5 by the control unit 6, as shown in FIG. 2, the alignment drive unit immediately before the first work W1 and the second work W2 carried into the variable pressure chamber B are bonded together.
- both the first holding member 1 and the second holding member 2 are adjusted and moved relative to each other in the XY direction and the XY ⁇ direction to align the first workpiece W1 and the second workpiece W2.
- the alignment drive unit 5 in the example shown in FIGS. 1 to 4, only the first holding member 1 is linked to the alignment drive unit 5, and the first holding member 1 side is connected to the second holding unit 1 side. It is relatively adjusted and moved in the XY ⁇ direction toward the holding member 2 side.
- the second holding member 2 is linked to the alignment drive unit 5 so that the second holding member 2 side is directed toward the first holding member 1 side and is relative to the XY direction or the XY ⁇ direction.
- the first holding member 1 side and the second holding member 2 side at the same time by adjusting and moving the position and aligning the first holding member 1 and the second holding member 2 with the alignment drive unit 5 respectively. It is also possible to align or change by relatively moving in the XY direction or XY ⁇ direction.
- the control unit 6 not only electrically connects the suction source 31c of the suction chuck 31, the adhesion drive unit 32d of the adhesion chuck 32, the contact / separation drive unit 4, the alignment drive unit 5, and the like.
- An opening / closing part (not shown) for taking in and out the first work W1 and the second work W2 inside and outside, and a chamber pressure adjusting means (not shown) for adjusting the inside of the variable pressure chamber B from the atmospheric atmosphere AP to the reduced pressure atmosphere DP having a predetermined degree of vacuum. It is a controller that is electrically connected to the The controller serving as the controller 6 sequentially controls the operation at a preset timing in accordance with a preset program in its control circuit (not shown).
- the control unit 6 uses the suction chuck 31 and the adhesive chuck 32 to transfer the first work W1 carried into the variable pressure chamber B of the atmospheric atmosphere AP to the first holding member 1.
- the first workpiece holding surface 1a is received and the second workpiece W2 is controlled to be received by the suction chuck 31 on the second workpiece holding surface 2a of the second holding member 2.
- the inside of the variable pressure chamber B is switched to the reduced pressure atmosphere DP, as shown in the two-dot chain line in FIG. 1 and FIG.
- the adhesion drive unit 32 d and the contact separation drive unit 4 of the adhesion chuck 32 By moving the first holding member 1 and the adhesive portion 32b closer to the second holding member 2 in the Z direction, the first workpiece W1 and the second workpiece W2 are overlapped in the Z direction with the sealing material W3 interposed therebetween. The operation is controlled. At substantially the same time as this superposition, the alignment drive unit 5 adjusts and moves either the first holding member 1 or the second holding member 2 in the XY direction or the XY ⁇ direction with respect to the other, so that the first workpiece W1 and the second workpiece 2 The relative alignment (alignment) of the workpiece W2 is performed with high accuracy.
- the contact / separation drive unit 4 controls the operation so that the first workpiece W1 and the second workpiece W2 are bonded together. Further, after the first workpiece W1 and the second workpiece W2 are bonded, the first workpiece holding surface 1a of the first holding member 1 is moved by the contact / separation drive unit 4 as shown by the solid line in FIG. The state of contact with the surface of W1 is maintained, and the operation is controlled such that the adhesive drive part 32d of the adhesive chuck 32 moves the adhesive part 32b away from the first workpiece W1 and peels it off.
- the manufacturing apparatus A of the bonding device W which concerns on such embodiment of this invention, it forms in the 1st workpiece
- the plurality of support protrusions 12a are harder than the first holding member 1, the second holding member 2, and the workpiece (first workpiece W1, second workpiece W2), and therefore do not wear with time.
- the first holding member 1 and the second holding member 2 are formed of a metal material excellent in processing accuracy, workability, etc., only the distal end portion of the support projection 12a is smoothed without being worn down over a long period of time.
- the workpiece (first workpiece W1, second workpiece W2) can be point-contacted and held with high accuracy.
- the first work holding surface 1a and the second work over time are minimized while minimizing the contact area of the first work holding surface 1a and the second work holding surface 2a with respect to the work (first work W1, second work W2). Wear of the holding surface 2a can be prevented.
- the highly accurate bonding device W with submicron accuracy can be continuously manufactured over a long period of time.
- either one or both of the first workpiece holding surface 1a and the second workpiece holding surface 2a have a plurality of roughened ridges 12c on the outside of the plurality of ridges 12c.
- the plurality of support protrusions 12a are laminated by coating.
- the surface tension of the coating material can be increased by coating the outside of the plurality of mountain-shaped projections 12c even if the tips of the plurality of mountain-shaped projections 12c are sharpened by roughening.
- the mountain-shaped tips of the plurality of support protrusions 12a are spherical.
- first workpiece holding surface 1a and the second workpiece holding surface 2a includes a suction port 31a that sucks and holds one or both of the pair of workpieces (W1, W2), and is hard.
- the covering layer 12 preferably has a plurality of intake grooves 12b formed in a valley shape so as to communicate with the suction port 31a between the plurality of support protrusions 12a. In this case, even if the work (first work W1, second work W2) is repeatedly brought into contact with the hard coating layer 12, the intake groove 12b does not disappear over a long period of time.
- the suction force from the suction port 31a spreads over the entire first work holding surface 1a and the second work holding surface 2a, and the work (first work W1, second work W2) is reliably sucked and held. .
- a plurality of support protrusions 12a are used. Since the plurality of intake grooves 12b formed between the two do not adhere to the work (first work W1, second work W2), they are smoothly peeled off and hardly generate static electricity due to the peeling.
- the workpieces W1 and W2 are placed on the first workpiece holding surface 1a and the second workpiece holding surface 2a as compared to the conventional one in which a part of the substrate is bent and deformed toward the suction port when the suction is held.
- maintenance can be suppressed and it can bond in the surface in a uniform state especially also to the bonding for which submicron precision is requested
- the plurality of intake grooves 12b are preferably arranged close to each other so as to be adjacent to the plurality of support protrusions 12a.
- the support protrusions 12a and the intake grooves 12b are arranged with high density per unit area over the entire surface of the hard coating layer 12. Therefore, the workpieces (first workpiece W1, second workpiece W2) can be held more smoothly. As a result, it is possible to further improve the bonding accuracy of the workpieces (first workpiece W1, second workpiece W2).
- first workpiece holding surface 1a and the second workpiece holding surface 2a have a plurality of roughened valley-shaped recesses 12d, and a plurality of outer sides of the plurality of valley-shaped recesses 12d.
- the intake grooves 12b are laminated by coating.
- a plurality of mountain-shaped convex portions 12c and a plurality of valley-shaped concave portions 12d are formed simultaneously,
- a plurality of support protrusions 12a and intake grooves 12b are formed simultaneously by laminating the hard coating layer 12 as a post-treatment on the outside.
- mountain-shaped convex portions 12c and valley-shaped concave portions 12d can be formed substantially uniformly by a simple process.
- the mountain-shaped convex portion 12c and the valley-shaped concave portion 12d can be precisely formed in a short time and at a low cost.
- the surface roughness (Ra) of the plurality of support projections 12a formed on the outside of the plurality of mountain-shaped convex portions 12c and the plurality of intake grooves 12b formed on the outside of the plurality of valley-shaped recesses 12d It is preferable to roughen the surface to be about 0.1 to 3.0.
- the difference in height between the support projection 12a and the suction groove 12b spreads the suction force from the suction port 31a of the suction chuck 31 to each of the plurality of suction grooves 12b, so that the first work holding surface 1a or the second work holding surface 1a or The first workpiece W1 and the second workpiece W2 can be stably sucked and held by the entire workpiece holding surface 2a.
- the hard coating layer 12 is grounded (grounded) via the first work holding surface 1a and the second work holding surface 2a, and the material of the hard coating layer 12 is an oxide film on the surface of the hard coating layer 12. It is preferable to use a material containing a conductive material that does not cause a non-conductor such as. In this case, most of the electric charges present on the surfaces of the first workpiece W1 and the second workpiece W2 when they are carried into the variable pressure chamber B are brought into contact with the hard coating layer 12 so that the first workpiece holding surface 1a and the first workpiece It can escape through the two-work holding surface 2a.
- the panel 12P which has the hard coating layer 12 is attached to either one or both of the 1st workpiece holding surface 1a or the 2nd workpiece holding surface 2a.
- a precise uneven structure composed of a plurality of support protrusions 12a and a plurality of intake grooves 12b is integrally assembled. It is done. Therefore, the plurality of support protrusions 12a and the plurality of intake grooves 12b can be easily installed by a simple attachment process. As a result, the assembly accuracy can be improved.
- the second holding member 2 peels off the pair of workpieces W1 and W2 that have been bonded, that is, the bonding device W from the second workpiece holding surface 2a. 7.
- the second workpiece W2 is pushed away from the second workpiece holding surface 2a by pressing with the peeling member 7.
- the peeling member 7 passes through the through hole 2h opened in the second holding member 2, and a plurality of lift pins 7a provided so as to be reciprocally movable in the Z direction so as to face the surface of the second workpiece W2 in the Z direction; It has a peeling follower 7b provided across the base ends of the plurality of lift pins 7a, and a peeling drive 7c linked to the peeling follower 7b.
- the lift pins 7a are arranged so as to be distributed in the XY direction with respect to the second work holding surface 2a, and the number and interval of the lift pins 7a depend on the size, thickness, material, weight of the bonding device W, etc. of the second work W2. Decided correspondingly.
- the peeling drive unit 7c is composed of an actuator that can reciprocate in the Z direction, and receives the second workpiece W2 carried into the variable pressure chamber B by the control unit 6 as shown in FIGS. From the time until the first work W1 and the second work W2 are bonded, the operation is controlled so that the tip of the lift pin 7a is immersed in the through hole 2h. After bonding the first workpiece W1 and the second workpiece W2, as shown in FIG. 4, the tip of the lift pin 7a protrudes from the through hole 2h toward the surface of the second workpiece W2, and the second workpiece holding surface The operation is controlled so that the second workpiece W2 is peeled off from 2a. Moreover, it is preferable to provide a workpiece holding chuck portion (not shown) at the tip of the lift pin 7a.
- the manufacturing apparatus A of the bonding device W according to the embodiment of the present invention, between the workpiece (second workpiece W2) and the second holding member 2 (a large number of minute space portions 12s). Since an air layer is generated, adhesion between the work (second work W2) and the second holding member 2 due to a pressure difference is lost. At the same time, the contact area between the workpiece (second workpiece W2) and the second holding member 2 is extremely small due to the plurality of intake grooves 12b.
- suction chucks 31 are installed on the first work holding surface 1 a of the first holding member 1 and the second work holding surface 2 a of the second holding member 2, respectively.
- the present invention is not limited to this, and the suction chuck 31 may not be installed on the first workpiece holding surface 1a and the second workpiece holding surface 2a, but an adhesive chuck 32, an electrostatic chuck, or the like may be installed.
- the pair of workpieces W1 and W2 that have been bonded together were peeled off from the second workpiece holding surface 2a by the peeling member 7 included in the second holding member 2, but this is not a limitation.
- the pair of workpieces W1 and W2 that have been pasted together may be peeled off from the second workpiece holding surface 2a by a peeling means provided regardless of the second holding member 2.
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Abstract
Description
その後、受け取った上側基板を上側基板保持具が真空吸着して保持し、下側基板保持具が下側基板を吸着して保持し、上側基板保持具と下側基板保持具が接近移動して両者間の真空容器内を真空状態にした後に、上側基板と下側基板をアライメントした後に重ね合わせて仮止めする。仮止めした後は、上側基板保持具による上側基板の保持を解除し、上側基板保持具を当初の位置まで離隔移動させ、次に真空容器内が大気圧になってから、貼り合わされた一対の基板をリフトピンにより搬送ロボットのアームに受け渡して搬出する。 Conventionally, as a manufacturing apparatus of this kind of bonding device, the lift pins for transferring the upper substrate and the lower substrate can be moved up and down along the through holes provided in the upper substrate holder and the lower substrate holder, respectively. The upper and lower substrates held and transferred by the arm of the transfer robot at the time of carrying in at atmospheric pressure are lift pins that move up and down so as to protrude from the surfaces of the upper and lower substrate holders, respectively. There is a substrate superimposing apparatus that receives and subsequently moves the lift pins in reverse to transfer the upper substrate and the lower substrate to the surfaces of the upper substrate holder and the lower substrate holder, respectively (for example, refer to Patent Document 1). .
Then, the upper substrate holder holds the received upper substrate by vacuum suction, the lower substrate holder sucks and holds the lower substrate, and the upper substrate holder and the lower substrate holder move closer together. After the inside of the vacuum vessel between the two is evacuated, the upper substrate and the lower substrate are aligned and then superposed and temporarily fixed. After temporarily fixing, the upper substrate holder is released from holding the upper substrate holder, and the upper substrate holder is moved to the original position. The substrate is transferred to the arm of the transfer robot by lift pins and unloaded.
さらに、上側基板保持具の基板保持面から上側基板を剥離する動作が、真空中の絶乾状態(湿度がほぼ0%の状態)で行われるため、基板保持面に対する基板の接触及び剥離に伴って絶縁体である基板に静電気が蓄積され、剥離帯電の影響が非常に大きくなる。また真空状態を保つために密閉空間内で剥離動作が行われるため、大気中での剥離動作とは異なり、ブローイオナイザーやフォトイオナイザーを用いて、発生した剥離帯電を簡単に除去するというも事実上困難な条件下にある。
それにより、剥離帯電による電荷によって導電部分へアーク放電が発生し、基板の貼り合わせ面に存在する電子回路などが断線を起こすか、或いは破壊までは至らなくとも、静電気によってその特性が変化するという問題があった。
また、基板の貼り合わせが完了して大気圧に戻した後に、下側基板保持具の基板保持面からリフトピンで、貼り合わされた一対の基板を離すが、基板保持面と基板の界面は互い平滑に形成されるため、基板保持面と基板の界面が貼り付いている場合がある。このような場合には、リフトピンで、貼り合わされた一対の基板の一部を強制的に押し離すと、基板保持面と基板の間が一時的に真空状態となり、貼り合わされた一対の基板が瞬間的に下側基板保持具に引っ張られて反りが起こる。基板の貼り合わせを高精度で行っても、剥離時において部分的に反ってしまうと、位置合わせ精度が悪化して製品が一部不良になるという問題があった。
そこで、このような問題の解決するため、上側基板保持具や下側基板保持具の基板保持面に、基板との接触面積が減少するように凹凸部を形成することにより、基板保持面と基板の界面に生ずる静電気を抑制すると同時に、基板保持面と基板の真空密着を防止することが考えられる。
しかし、この場合には、上側基板保持具の基板保持面や下側基板保持具の基板保持面が、基板の材質となるガラスやシリコンなどに比べて軟らかいアルミニウム等の金属で形成されると、上側基板保持具や下側基板保持具の基板保持面に対して基板が繰り返し接触する度に生ずる摩擦により、時間経過に伴って凸部が徐々に摩耗し、最終的には基板が面接触してしまう。
その結果として、長期間に亘り基板保持面と基板の界面に生ずる静電気の抑制と、基板保持面と基板の真空密着を防止できないという問題がある。 However, in such a conventional bonding device manufacturing apparatus, since the upper substrate holder holds the upper substrate by vacuum suction at the suction port, a part of the substrate is bent and deformed toward the suction port and is distorted. Is generated. Accordingly, the upper substrate and the lower substrate cannot be aligned and bonded with high accuracy.
Furthermore, since the operation of peeling the upper substrate from the substrate holding surface of the upper substrate holder is performed in an absolutely dry state in a vacuum (humidity is approximately 0%), the substrate is brought into contact with and peeled from the substrate holding surface. As a result, static electricity is accumulated on the substrate, which is an insulator, and the influence of peeling electrification becomes very large. In addition, since the peeling operation is performed in a sealed space in order to maintain a vacuum state, it is practically easy to remove the generated peeling charge using a blow ionizer or photo ionizer, unlike the peeling operation in the atmosphere. Under difficult conditions.
As a result, arc discharge occurs in the conductive part due to the electric charge due to the peeling charge, and the characteristics change due to static electricity even if the electronic circuit etc. existing on the bonding surface of the substrate is broken or not destroyed. There was a problem.
In addition, after the bonding of the substrates is completed and the pressure is returned to atmospheric pressure, the pair of bonded substrates is separated from the substrate holding surface of the lower substrate holder by lift pins, but the interface between the substrate holding surface and the substrate is smooth. In some cases, the interface between the substrate holding surface and the substrate is attached. In such a case, if a part of the pair of substrates bonded together is forcibly pushed away with the lift pins, the substrate holding surface and the substrate are temporarily in a vacuum state, and the pair of substrates bonded is instantaneously In particular, the substrate is warped by being pulled by the lower substrate holder. Even if the substrates are bonded with high accuracy, if they are partially warped during peeling, there is a problem that the alignment accuracy deteriorates and the product becomes partially defective.
Therefore, in order to solve such a problem, the substrate holding surface and the substrate are formed by forming an uneven portion on the substrate holding surface of the upper substrate holder or the lower substrate holder so that the contact area with the substrate is reduced. It is conceivable to prevent static electricity generated at the interface between the substrate holding surface and the vacuum contact between the substrate and the substrate.
However, in this case, when the substrate holding surface of the upper substrate holder and the substrate holding surface of the lower substrate holder are formed of a metal such as aluminum that is softer than glass or silicon as the material of the substrate, Due to the friction that occurs each time the substrate repeatedly contacts the substrate holding surface of the upper substrate holder or the lower substrate holder, the convex portion gradually wears over time, and finally the substrate comes into surface contact. End up.
As a result, there are problems in that static electricity generated at the interface between the substrate holding surface and the substrate over a long period of time cannot be prevented and vacuum contact between the substrate holding surface and the substrate cannot be prevented.
本発明の実施形態に係る貼合デバイスWの製造装置Aは、図1~図4に示すように、板状に形成された一対のワークW1,W2を、第一保持部材1と第二保持部材2にそれぞれ保持し、第一保持部材1と第二保持部材2の相対的な接近移動により一対のワークW1,W2を高精度に位置合わせして貼り合わせるワーク貼り合わせ装置である。貼り合わせが完了した一対のワークW1,W2は、第一保持部材1及び第二保持部材2から剥離することが好ましい。
このワーク貼り合わせ装置の具体例としては、変圧室Bの内部に第一保持部材1と第二保持部材2が対向して配置され、変圧室Bに搬入された第一ワークW1と第二ワークW2を第一保持部材1と第二保持部材2に設けられる保持チャック3でそれぞれ受け取る。その後、減圧された変圧室B内で第一保持部材1又は第二保持部材2のいずれか一方か若しくは両方を、前記対向方向へ相対的に接近移動させるとともに、前記対向方向と交差する方向へ相対的に位置合わせしてから、第一ワークW1と第二ワークW2を高精度に貼り合わせる(合着する)。これにより、内部に封止空間を有する貼合デバイスWが作成される。これに続いて、貼合デバイスWの第一ワークW1を第一保持部材1から剥離した後に、変圧室Bを大気圧に戻すことで、貼合デバイスWの封止空間の内圧と圧力差が生じ、この圧力差により貼合デバイスWを所定ギャップまで均等に加圧される。その後は、完成した貼合デバイスWを第二保持部材2から剥離して変圧室Bの外へ搬出することが好ましい。
なお、第一ワークW1及び第二ワークW2は、図1~図4に示されるように、通常、上下方向へ対向するように配置され、上側の第一ワークW1と下側の第二ワークW2が貼り合わされる方向を以下「Z方向」という。Z方向と交差する第一ワークW1及び第二ワークW2に沿った方向を以下「XY方向」という。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
A manufacturing apparatus A for a bonding device W according to an embodiment of the present invention, as shown in FIGS. 1 to 4, includes a pair of workpieces W1 and W2 formed in a plate shape, and a first holding member 1 and a second holding member. This is a workpiece laminating apparatus that holds each of the
As a specific example of this workpiece laminating apparatus, the first holding member 1 and the
As shown in FIGS. 1 to 4, the first work W1 and the second work W2 are normally arranged so as to face each other in the vertical direction, and the upper first work W1 and the lower second work W2 are arranged. The direction in which is attached is hereinafter referred to as the “Z direction”. A direction along the first workpiece W1 and the second workpiece W2 that intersects the Z direction is hereinafter referred to as an “XY direction”.
さらに、貼り合わせが完了した一対のワークW1,W2を第二保持部材2から剥がすための剥離部材7を備えることが好ましい。
また、後述する保持チャック3としては、第一保持部材1の第一ワーク保持面1aや第二保持部材2の第二ワーク保持面2aに向け第一ワークW1や第二ワークW2を吸引して保持する吸着チャック31を用いることが好ましい。それ以外には、第一ワークW1や第二ワークW2を粘着して保持する粘着チャック32や静電チャックなどを用いることも可能である。 If it demonstrates in detail, the manufacturing apparatus A of the bonding device W which concerns on embodiment of this invention will be provided with the 1st holding member 1 and the
Furthermore, it is preferable to include a
Further, as the
第一ワークW1は、例えばガラス製のタッチパネルやカバーガラスなどからなり、LCMやフレキシブルプリント配線板(FPC)などからなる第二ワークW2を覆うように接着されることで、FPDやOLEDなどを構成するものである。
さらに必要に応じて、第一ワークW1及び第二ワークW2の対向面のいずれか一方又は両方には、シール材W3がディスペンサなどの定量吐出ノズルを用いて塗布される。
シール材W3としては、紫外線などの光エネルギーを吸収して重合が進行することにより硬化して接着性を発現する、UV硬化性の光学透明樹脂(OCR)などの光硬化型接着剤を用いている。
また、その他の例として、シール材W3が熱エネルギーの吸収により重合が進行して硬化する熱硬化型接着剤、二液混合硬化型接着剤などを用いたり、シール材W3を介在させずに第一ワークW1と第二ワークW2の対向面同士を貼り合わせたり変更することも可能である。 The bonding device W is a thin plate-like structure in which components are integrally assembled, such as an FPD, a 3D (three-dimensional) display, an electronic book, or an organic EL display.
The first work W1 is made of, for example, a glass touch panel or a cover glass, and is composed so as to cover the second work W2 made of LCM or a flexible printed wiring board (FPC), thereby forming an FPD, an OLED, or the like. To do.
Further, if necessary, a sealing material W3 is applied to one or both of the opposing surfaces of the first workpiece W1 and the second workpiece W2 using a quantitative discharge nozzle such as a dispenser.
As the sealing material W3, a photo-curing adhesive such as a UV curable optical transparent resin (OCR), which is cured by absorbing light energy such as ultraviolet rays and is cured by the progress of polymerization, is used. Yes.
Further, as other examples, a thermosetting adhesive, a two-component mixed curable adhesive, or the like in which the sealing material W3 is cured by the absorption of heat energy and cured, or the sealing material W3 is not interposed. It is also possible to bond or change the facing surfaces of the first workpiece W1 and the second workpiece W2.
第二保持部材2は、金属などの剛体で歪み(撓み)変形しない厚さの平板状に形成された定盤などからなり、その表面には、搬入された第二ワークW2とZ方向へ対向して接触する第二ワーク保持面2aを有している。
第一ワーク保持面1a及び第二ワーク保持面2aの具体例として、図1~図4に示される場合には、第一保持部材1の略平滑な表面において第一ワークW1と接触する一部のみに第一ワーク保持面1aを形成し、第二保持部材2の略平滑な表面において第二ワークW2と接触する一部のみに第二ワーク保持面2aを形成している。
また、その他の例として図示しないが、第一保持部材1の表面全体を第一ワーク保持面1aとしたり、第二保持部材2の表面全体を第二ワーク保持面2aとしたり変更することも可能である。 The first holding member 1 is composed of a plate such as a flat plate having a thickness that does not deform (bend) with a rigid body such as a metal, and faces the first workpiece W1 loaded in the Z direction on the surface thereof. And has a first
The
As specific examples of the first
Although not shown as another example, the entire surface of the first holding member 1 can be changed to the first
すなわち、第一保持部材1の第一ワーク保持面1a又は第二保持部材2の第二ワーク保持面2aのいずれか一方か若しくは両方は、一対のワークW1,W2のうち一方或いは両方と対向して、少なくともその表面が凹凸形状に形成される硬質被覆層12を備えている。
さらに、第一保持部材1の第一ワーク保持面1a又は第二保持部材2の第二ワーク保持面2aのいずれか一方か若しくは両方は、一対のワークW1,W2のうち一方或いは両方を着脱自在に保持する保持チャック3として吸着口31aを備えることが好ましい。
保持チャック3となる吸着口31aとは、第一ワークW1や第二ワークW2の表面と対向するように開設されて、第一ワークW1や第二ワークW2を吸引する吸着チャック31の吸引孔であり、吸着口31aには通気路31bが接続されて吸気源31cに連通している。
吸着口31aは、第一ワーク保持面1aや第二ワーク保持面2aに対してXY方向へ分散するように複数配置され、吸着口31aの数及び間隔は、第一ワークW1や第二ワークW2のサイズや厚みや材質や重量などに対応して決められる。
吸気源31cは、ポンプや圧縮機などで構成され、後述する制御部6により、少なくとも変圧室B内に搬入された第一ワークW1及び第二ワークW2の受け取り時から貼り合わせ時まで、通気路31bを介して吸着口31aから吸引するように作動制御されている。
また、第一ワークW1及び第二ワークW2の貼り合わせ後には、第一保持部材1の第一ワーク保持面1aに保持された第一ワークW1や、第二保持部材2の第二ワーク保持面2aに保持された第二ワークW2に向け、吸着口31aから圧縮空気などの流体を噴出させることも可能である。 The first
That is, either one or both of the first
Further, either one or both of the first
The
The plurality of
The
Further, after the first workpiece W1 and the second workpiece W2 are bonded together, the first workpiece W1 held on the first
粘着チャック32は、第一保持部材1に開穿された貫通孔1hを通ってZ方向へ往復動自在に設けられる昇降部32aと、昇降部32aの先端に第一ワークW1とZ方向へ対向するように設けられる粘着部32bと、昇降部32aの基端に設けられる粘着用従動部32cと、粘着用従動部32cと連係する粘着用駆動部32dと、を有している。
昇降部32a及び粘着部32bは、XY方向へ分散するように複数組配置され、昇降部32a及び粘着部32bの数及び間隔は、第一ワークW1のサイズや厚みや材質や重量などに対応して決められる。
粘着用駆動部32dは、Z方向へ往復動可能なアクチュエーターなどで構成され、後述する制御部6により、図1の実線に示されるように、変圧室B内に搬入された第一ワークW1の表面に、粘着部32bを接触させて粘着保持するように作動制御されている。第一ワークW1及び第二ワークW2の貼り合わせ後には、図3の実線に示されるように、第一保持部材1の第一ワーク保持面1aが第一ワークW1の表面に接触した状態で、粘着部32bを第一ワークW1の表面からZ方向へ離隔させるように作動制御している。
また、その他の例として図示しないが、第一保持部材1の第一ワーク保持面1aに粘着チャック32を設置せず、それに代えて静電チャックを吸着チャック31と組み合わせて設置したり、第二保持部材2の第二ワーク保持面2aに粘着チャック32や静電チャックを吸着チャック31と組み合わせて設置したり変更することも可能である。 In the case of the example shown in FIGS. 1 to 4 as a specific example of the holding
The
A plurality of sets of elevating
The
Although not shown in the drawings as another example, the
これに対し、LCDやOLEDなどの基板を構成する第一ワークW1や第二ワークW2の材質としては、アルミニウム系などの金属材料よりも硬いガラスやシリコンなどが一般的に用いられている。
そのため、第一保持部材1の第一ワーク保持面1aや第二保持部材2の第二ワーク保持面2aに対して、第一ワークW1や第二ワークW2を接触させて着脱を繰り返し行うと、接触する度に生じる摩擦により、軟質な第一ワーク保持面1aや第二ワーク保持面2aが徐々に摩耗してしまう。
また、第一保持部材1や第二保持部材2の材質として、ガラスなどよりも硬度が高くて摩耗し難いセラミックなどの硬質材料を用いることも考えられる。しかし、この場合には、第一ワーク保持面1aや第二ワーク保持面2aをサンドブラスト等のブラスト処理やエッチング処理やラッピング処理などで凹凸形状に作成すると、凸部の山状先端が欠け易いだけでなく、第一ワークW1や第二ワークW2との接触時に凸部の山状先端が突き刺さるおそれもある。このため、金属材料に比べて、凹凸形状の加工精度及び加工性(加工時間や加工コスト)に劣り、且つ第一ワークW1や第二ワークW2にクラックなどの破損が生じる点からも不利であった。特にセラミック材料の場合には、焼成などの工程が必要になるため、大型化が困難であることも不利であった。
そこで、このような摩耗防止や加工性などの課題を同時に達成するため、第一保持部材1の第一ワーク保持面1aや第二保持部材2の第二ワーク保持面2aに、第一保持部材1や第二保持部材2や一対のワークW1,W2の材質よりも硬い材料からなる硬質被覆層12を形成している。 By the way, as the material of the first holding member 1 and the second holding
On the other hand, glass, silicon, or the like that is harder than a metal material such as an aluminum-based material is generally used as the material of the first workpiece W1 and the second workpiece W2 that constitute a substrate such as an LCD or an OLED.
Therefore, when the first workpiece W1 and the second workpiece W2 are brought into contact with the first
Further, as the material of the first holding member 1 and the second holding
Therefore, in order to simultaneously achieve such problems as wear prevention and workability, the first holding member is attached to the first
硬質被覆層12の材料の具体例としては、硬質被覆層12の表面に酸化被膜などの不導体が発生しないような、例えばチタンや炭化ケイ素又はタングステンやカーボン粒子などからなる導電材を含んだセラミックやガラス又は金属マトリクスからなる材料を用いることが好ましい。
硬質被覆層12のコーティング方法の具体例としては、塗装やディッピング、蒸着、めっき、スパッタリング、溶射などが挙げられる。
硬質被覆層12の具体例として図1~図4に示される場合には、第一保持部材1において部分的に形成される第一ワーク保持面1aと、その域外面1bを含んだ表面全体に対し、硬質被覆層12を有するパネル12Pが着脱自在に敷設されている。第二保持部材2において部分的に形成される第二ワーク保持面2aと、その域外面2bを含んだ表面全体に対しても、同様に硬質被覆層12を有するパネル12Pが着脱自在に敷設されている。
パネル12Pは、アルミニウム等の金属で薄板状に形成され、その表面に硬質被覆層12を一体形成している。パネル12Pの形状は、矩形などに形成され、第一ワーク保持面1aや第二ワーク保持面2aと略同じサイズのパネル12Pを一枚取り付けるか、又は第一ワーク保持面1aや第二ワーク保持面2aのサイズよりも小さなパネル12Pを複数枚それぞれXY方向へ並ぶように取り付ける。
また、その他の例として図示しないが、域外面1bが除かれた第一ワーク保持面1aのみに硬質被覆層12を部分的に形成したり、域外面2bが除かれた第二ワーク保持面2aのみに硬質被覆層12を部分的に形成したり、第一ワーク保持面1a又は第二ワーク保持面2aのいずれか一方側のみに硬質被覆層12を形成したり、パネル12Pを用いずに第一ワーク保持面1aや第二ワーク保持面2aの表面に沿って硬質被覆層12を直接的に形成したり変更することも可能である。 The
As a specific example of the material of the
Specific examples of the coating method of the
1 to 4 as specific examples of the
The
Although not shown as other examples, the
複数の支承突起12aは、その先端部を第一ワークW1や第二ワークW2の表面に対しそれぞれ点接触させて、第一ワークW1や第二ワークW2が平滑状態となるように保持するものである。そのため、第一ワークW1や第二ワークW2の点接触部位が重量で変形しないように、微小な支承突起12aを単位面積当たり密となるように多数配置して保持することが好ましい。
複数の吸気溝12bは、第一ワークW1や第二ワークW2との間に微小な空間部12sが分散するように多数形成して、第一ワークW1や第二ワークW2との接触面積が狭くなるように構成されている。
平滑なワーク保持を確実にする方法として、複数の支承突起12aは、一対のワークW1,W2のうち一方或いは両方に向けて山状に突出するようにそれぞれ形成することが好ましい。複数の吸気溝12bは、複数の支承突起12aとXY方向やXYθ方向へ隣り合うようにそれぞれ谷状に形成することが好ましい。 Furthermore, the
The plurality of
A plurality of
As a method for ensuring smooth workpiece holding, the plurality of
これにより、複数の山状凸部12cの外側に複数の支承突起12aが積層形成されるとともに、複数の谷状凹部12dの外側に複数の吸気溝12bが積層形成される。
粗面化処理としては、例えばサンドブラスト等のブラスト処理やエッチング処理やラッピング処理などが挙げられる。
粗面化処理の具体例として図1~図4に示される場合には、パネル12Pの表面となる金属面をブラスト処理して粗面化し、この粗面に硬質被覆層12が積層形成されている。詳しくは、パネル12Pの表面となる金属面に対し、粒度が♯60~♯240程度のセラミック、ガラス、金属等の粒子を高速で当てることにより、複数の山状凸部12cと複数の谷状凹部12dが、所定の表面粗さで同時に形成されるようにしている。
また、その他の例として図示しないが、粗面化処理としてブラスト処理に代え、エッチング処理やラッピング処理などに行ったり、パネル12Pを用いずに第一ワーク保持面1aや第二ワーク保持面2aの表面が直接的に粗面化処理され、この粗面に硬質被覆層12を積層形成したり変更することも可能である。 And either one or both of the 1st
As a result, a plurality of
Examples of the roughening process include a blasting process such as sandblasting, an etching process, and a lapping process.
In the case shown in FIGS. 1 to 4 as specific examples of the roughening treatment, the metal surface that becomes the surface of the
Although not shown in the drawings as other examples, the roughening process may be performed instead of the blasting process by an etching process or a lapping process, or the first
実験によれば、複数の支承突起12a及び複数の吸気溝12bの表面粗さ(Ra)が0.1未満の場合には、支承突起12aと吸気溝12bの高低差が小さくなり過ぎて、吸着チャック31の吸着口31aからの吸引力が複数の吸気溝12bへ十分に行き渡り難くなる。そのために、第一ワーク保持面1aや第二ワーク保持面2aの全体で第一ワークW1や第二ワークW2を安定的に吸引保持不能であることが解った。
また、複数の支承突起12a及び複数の吸気溝12bの表面粗さ(Ra)が3.0よりも大きい場合には、支承突起12aと吸気溝12bの高低差が大きくなり過ぎて、吸着チャック31の吸着口31aからの吸引力が複数の吸気溝12bへ必要以上に流れてしまう。特に図示例のように、第一ワーク保持面1aの域外面1bや第二ワーク保持面2aの域外面2bまで硬質被覆層12が形成されると、これら域外面1b,2bに漏れる量が多くなり過ぎる。そのために、第一ワーク保持面1aや第二ワーク保持面2aの全体で第一ワークW1や第二ワークW2を安定的に吸引保持不能であることが解った。 As the degree of the rough surface state by the roughening treatment described above, the surface roughness (Ra) is preferably about 0.1 to 3.0.
According to experiments, when the surface roughness (Ra) of the plurality of
When the surface roughness (Ra) of the plurality of
前述した支承突起12a及び吸気溝12bが分散配置された硬質被覆層12を有する点接触プレートと、アルミニウムの平滑面が露出する面接触プレートと、これら上に載置されるガラス製のブロックと、を用意した。前記点接触プレート及び前記ブロックの接触部分と、前記面接触プレート及び前記ブロックの接触部分をそれぞれ真空状態にし、その後、大気圧に戻した状態で摩擦測定試験(ブロック・オン・プレート)をそれぞれ行った。
摩擦測定試験の結果は、前記点接触プレートの摩擦力が「0.090Kg」、前記面接触プレートの摩擦力が「0.193Kg」であり、前記点接触プレートの摩擦係数が前記面接触プレートの摩擦係数の約1/2であった。これにより、前記点接触プレートの方が前記面接触プレートよりも摩擦力を半減できることが解った。 In order to demonstrate the improvement of the frictional force due to the point contact of the
A point contact plate having the
As a result of the friction measurement test, the friction force of the point contact plate is “0.090 Kg”, the friction force of the surface contact plate is “0.193 Kg”, and the friction coefficient of the point contact plate is that of the surface contact plate. The coefficient of friction was about ½. Thus, it was found that the point contact plate can halve the frictional force than the surface contact plate.
接離用駆動部4の具体例として、図1~図4に示される例の場合には、第一保持部材1のみを接離用駆動部4と連係させて、第一保持部材1側を第二保持部材2側に向けてZ方向へ相対的に接近移動させている。
また、その他の例として図示しないが、第二保持部材2のみを接離用駆動部4と連係させて、第二保持部材2側を第一保持部材1側に向けZ方向へ相対的に接近移動したり、第一保持部材1及び第二保持部材2をそれぞれ接離用駆動部4と連係させて、第一保持部材1側と第二保持部材2側を同時にZ方向へ相対的に接近移動したり変更することも可能である。 The contact / separation drive unit 4 includes an actuator that reciprocates one or both of the first holding member 1 and the second holding
As a specific example of the contact / separation drive unit 4, in the example shown in FIGS. 1 to 4, only the first holding member 1 is linked to the contact / separation drive unit 4 so that the first holding member 1 side is connected. It is relatively moved in the Z direction toward the second holding
Although not shown as another example, only the second holding
アライメント用駆動部5の具体例として、図1~図4に示される例の場合には、第一保持部材1のみをアライメント用駆動部5と連係させて、第一保持部材1側を第二保持部材2側に向けてXYθ方向へ相対的に調整移動させている。
また、その他の例として図示しないが、第二保持部材2のみをアライメント用駆動部5と連係させることで、第二保持部材2側を第一保持部材1側に向けXY方向やXYθ方向へ相対的に調整移動して位置合わせしたり、第一保持部材1及び第二保持部材2をそれぞれアライメント用駆動部5と連係させることで、第一保持部材1側と第二保持部材2側を同時にXY方向やXYθ方向へ相対的に調整移動して位置合わせしたり変更することも可能である。 The alignment drive unit 5 includes an actuator that adjusts and moves one or both of the first holding member 1 and the second holding
As a specific example of the alignment drive unit 5, in the example shown in FIGS. 1 to 4, only the first holding member 1 is linked to the alignment drive unit 5, and the first holding member 1 side is connected to the second holding unit 1 side. It is relatively adjusted and moved in the XYθ direction toward the holding
Although not shown in the drawings as another example, only the second holding
制御部6となるコントローラーは、その制御回路(図示しない)に予め設定されたプログラムに従って、予め設定されたタイミングで順次それぞれ作動制御している。 The
The controller serving as the
その後に、変圧室B内が減圧雰囲気DPに切り替わった後は、図1の二点鎖線及び図2に示されるように、粘着チャック32の粘着用駆動部32d及び接離用駆動部4により、第一保持部材1及び粘着部32bを第二保持部材2に対し相対的にZ方向へ接近移動させることで、第一ワークW1と第二ワークW2がシール材W3を挟んでZ方向へ重ね合わされるように作動制御している。
この重ね合わせと略同時に、アライメント用駆動部5により第一保持部材1又は第二保持部材2のいずれか一方を他方に対しXY方向やXYθ方向へ調整移動して、第一ワークW1と第二ワークW2の相対的な位置合わせ(アライメント)が高精度に行われる。この位置合わせ完了後に、接離用駆動部4により第一ワークW1と第二ワークW2を貼り合わせるように作動制御している。
さらに、第一ワークW1及び第二ワークW2の貼り合わせ後は、図3の実線に示されるように、接離用駆動部4により第一保持部材1の第一ワーク保持面1aが第一ワークW1の表面に対し接触する状態を保持し、粘着チャック32の粘着用駆動部32dにより粘着部32bを第一ワークW1から離隔する方向へ移動させて引き剥がすように作動制御している。 Specifically, as shown by the solid line in FIG. 1, the
After that, after the inside of the variable pressure chamber B is switched to the reduced pressure atmosphere DP, as shown in the two-dot chain line in FIG. 1 and FIG. 2, the
At substantially the same time as this superposition, the alignment drive unit 5 adjusts and moves either the first holding member 1 or the second holding
Further, after the first workpiece W1 and the second workpiece W2 are bonded, the first
これに加えて、複数の支承突起12aは、第一保持部材1や第二保持部材2やワーク(第一ワークW1,第二ワークW2)よりも硬質であるため、経時的に摩耗しない。
これにより、第一保持部材1や第二保持部材2を加工精度や加工性などに優れた金属材料で形成しても、支承突起12aの先端部のみを長期に亘り磨り減ることなく平滑状のワーク(第一ワークW1,第二ワークW2)と点接触させて高精度に保持可能となる。
したがって、ワーク(第一ワークW1,第二ワークW2)に対する第一ワーク保持面1aや第二ワーク保持面2aの接触面積を極小にしながら、時間経過に伴う第一ワーク保持面1aや第二ワーク保持面2aの摩耗を防止することができる。
その結果、サブミクロン精度の高精度な貼合デバイスWを長期間に亘り製造し続けることができる。 According to the manufacturing apparatus A of the bonding device W which concerns on such embodiment of this invention, it forms in the 1st workpiece | work holding
In addition to this, the plurality of
As a result, even if the first holding member 1 and the second holding
Accordingly, the first
As a result, the highly accurate bonding device W with submicron accuracy can be continuously manufactured over a long period of time.
この場合には、粗面化で複数の山状凸部12cの先端が鋭角状に尖る形状になっても、複数の山状凸部12cの外側をコーティングすることにより、コーティング材料の表面張力で複数の支承突起12aの山状先端部が球面状になる。
したがって、ワーク(第一ワークW1,第二ワークW2)との接触時におけるワークの部分的な歪み発生防止と複数の支承突起12aの突き刺さり防止を同時に達成することができる。
その結果、第一ワーク保持面1aや第二ワーク保持面2aにワークW1,W2を保持した際の歪みを抑制することができ、ワーク(第一ワークW1,第二ワークW2)にクラックなどの破損が生じることがない。このため、特に厚みの薄い(第一ワークW1,第二ワークW2)に極めて有効である。 In particular, either one or both of the first
In this case, the surface tension of the coating material can be increased by coating the outside of the plurality of mountain-shaped
Therefore, it is possible to simultaneously prevent the occurrence of partial distortion of the workpiece and the piercing of the plurality of
As a result, it is possible to suppress distortion when the workpieces W1 and W2 are held on the first
この場合には、硬質被覆層12に対し、ワーク(第一ワークW1,第二ワークW2)を繰り返し接触させても、長期に亘り吸気溝12bが消滅しない。このため、吸着口31aからの吸引力が、第一ワーク保持面1aや第二ワーク保持面2aの全体に行き渡って、ワーク(第一ワークW1,第二ワークW2)が確実に吸引保持される。
また第一保持部材1の第一ワーク保持面1aや第二保持部材2の第二ワーク保持面2aからのワーク(第一ワークW1,第二ワークW2)の剥離時は、複数の支承突起12aの相互間に形成される複数の吸気溝12bでワーク(第一ワークW1,第二ワークW2)と密着しないため、スムーズに剥がれて剥離に伴う静電気がほとんど発生しない。
したがって、吸着保持によるワークW1,W2の部分的な歪み発生を確実に防止することができる。
その結果、吸引保持した際に基板の一部が吸着口に向け屈曲変形して歪みを発生する従来のものに比べ、第一ワーク保持面1aや第二ワーク保持面2aにワークW1,W2を保持した際の歪みを抑制することができ、特にサブミクロン精度を要求される貼り合せに対しても、面内を均一な状態で貼り合せることができる。そのため、高精度な貼合デバイスWを製造できる。
また、基板の剥離時に静電気が発生して帯電する従来のものに比べ、長期間に亘って一対のワークW1,W2を平行状態に保ちながら貼り合わせることが可能で、且つ剥離帯電の影響を確実に防止できる。それにより、長期的に亘り安定して高い精度の貼り合せを行うことができるとともに、貼合デバイスWの破壊や回路の断線だけでなく、静電気によるその特性変化を確実に防止できる。 Further, either one or both of the first
In this case, even if the work (first work W1, second work W2) is repeatedly brought into contact with the
Further, when the workpieces (first workpiece W1, second workpiece W2) are peeled from the first
Therefore, partial distortion of the workpieces W1 and W2 due to suction holding can be reliably prevented.
As a result, the workpieces W1 and W2 are placed on the first
Compared to conventional products that are charged by generating static electricity when the substrate is peeled off, it is possible to bond a pair of workpieces W1 and W2 in a parallel state over a long period of time, and the effect of peeling charging is ensured. Can be prevented. As a result, it is possible to stably perform high-accuracy bonding over a long period of time, and to reliably prevent changes in characteristics due to static electricity as well as destruction of the bonding device W and circuit breakage.
この場合には、硬質被覆層12の全面に亘って支承突起12a及び吸気溝12bが単位面積当たり高密度に配置される。
したがって、ワーク(第一ワークW1,第二ワークW2)をより平滑に保持することができる。
その結果、ワーク(第一ワークW1,第二ワークW2)の貼り合わせ精度の更なる向上が図れる。 In particular, the plurality of
In this case, the
Therefore, the workpieces (first workpiece W1, second workpiece W2) can be held more smoothly.
As a result, it is possible to further improve the bonding accuracy of the workpieces (first workpiece W1, second workpiece W2).
この場合には、前加工として第一ワーク保持面1aや第二ワーク保持面2aを粗面化処理することにより、複数の山状凸部12cと複数の谷状凹部12dが同時に形成され、その外側に後処理として硬質被覆層12をコーティングで積層することにより、複数の支承突起12a及び吸気溝12bが同時に形成される。
したがって、簡単な処理で微小な山状凸部12cと谷状凹部12dを多数それぞれ略均一に作成することができる。
その結果、短時間で且つ低コストで山状凸部12cと谷状凹部12dを緻密に作成できる。 Furthermore, either one or both of the first
In this case, by roughening the first
Therefore, a large number of minute mountain-shaped
As a result, the mountain-shaped
この場合には、支承突起12aと吸気溝12bの高低差が、吸着チャック31の吸着口31aからの吸引力を複数の吸気溝12bへそれぞれ必要量行き渡って、第一ワーク保持面1aや第二ワーク保持面2aの全体で第一ワークW1や第二ワークW2を安定的に吸引保持することができる。 Further, the surface roughness (Ra) of the plurality of
In this case, the difference in height between the
この場合には、変圧室Bへ搬入された際に第一ワークW1や第二ワークW2の表面に存在する電荷のほとんどが、硬質被覆層12との接触により、第一ワーク保持面1aや第二ワーク保持面2aを介して逃がすことができる。
これに加えて、複数の支承突起12aが第一ワークW1や第二ワークW2と点接触して接触面積が極めて小さいため、剥離帯電も非常に起こり難い。
これにより、実質的に静電気の発生を完全に防止できる。 Furthermore, the
In this case, most of the electric charges present on the surfaces of the first workpiece W1 and the second workpiece W2 when they are carried into the variable pressure chamber B are brought into contact with the
In addition, since the plurality of
Thereby, generation | occurrence | production of static electricity can be prevented completely substantially.
この場合には、第一ワーク保持面1aや第二ワーク保持面2aに対し、パネル12Pを取り付けることにより、複数の支承突起12a及び複数の吸気溝12bからなる精密な凹凸構造が一体的に組み付けられる。
したがって、簡単な取り付け加工で複数の支承突起12a及び複数の吸気溝12bを容易に設置することができる。
その結果、組み付け精度の向上が図れる。 Furthermore, it is preferable that the
In this case, by attaching the
Therefore, the plurality of
As a result, the assembly accuracy can be improved.
この実施例は、図1~図4に示すように、第二保持部材2が、貼り合わせが完了した一対のワークW1,W2、すなわち貼合デバイスWを第二ワーク保持面2aから剥がす剥離部材7を有するものである。
図1~図4に示される例では、剥離部材7による押圧で、第二ワーク保持面2aから第二ワークW2を押し剥がしている。 Next, an embodiment of the present invention will be described with reference to the drawings.
In this embodiment, as shown in FIGS. 1 to 4, the second holding
In the example shown in FIGS. 1 to 4, the second workpiece W2 is pushed away from the second
リフトピン7aは、第二ワーク保持面2aに対してXY方向へ分散するように配置され、リフトピン7aの数及び間隔は、第二ワークW2のサイズや厚みや材質や貼合デバイスWの重量などに対応して決められる。
剥離用駆動部7cは、Z方向へ往復動可能なアクチュエーターなどで構成され、制御部6により、図1~図3に示されるように、変圧室B内に搬入された第二ワークW2の受け取り時から第一ワークW1及び第二ワークW2の貼り合わせ時まで、貫通孔2h内にリフトピン7aの先端部を没入させるように作動制御されている。第一ワークW1及び第二ワークW2の貼り合わせ後には、図4に示されるように、リフトピン7aの先端部を貫通孔2hから第二ワークW2の表面に向け突出させて、第二ワーク保持面2aから第二ワークW2が剥がれるように作動制御している。
また、リフトピン7aの先端部には、ワーク保持用のチャック部(図示しない)を設けることが好ましい。 The peeling
The lift pins 7a are arranged so as to be distributed in the XY direction with respect to the second
The peeling
Moreover, it is preferable to provide a workpiece holding chuck portion (not shown) at the tip of the
したがって、貼り合わされた一対のワーク(貼合デバイスW)を剥離部材7で反り変形させることなく剥離して位置合わせ精度の変化を防止することができる。
その結果、貼り合わされた一対の基板をリフトピンにより離す際に部分的な反りが発生し易い従来のものに比べ、高精細の液晶ディスプレイや有機ELディスプレイなどであっても、位置ずれによるムラや光抜けなどの一部不良を防止でき、歩留まりの向上が図れるという利点がある。 According to the manufacturing apparatus A of the bonding device W according to the embodiment of the present invention, between the workpiece (second workpiece W2) and the second holding member 2 (a large number of
Therefore, the pair of workpieces (bonding device W) bonded together can be peeled without being warped and deformed by the peeling
As a result, even when a high-definition liquid crystal display or organic EL display is used, the unevenness and light caused by misalignment is higher than that of a conventional display that tends to cause partial warping when a pair of bonded substrates are separated by lift pins. There is an advantage that partial defects such as omission can be prevented and the yield can be improved.
さらに、前示の実施例では、第二保持部材2が有する剥離部材7によって、貼り合わせが完了した一対のワークW1,W2を第二ワーク保持面2aから剥がしたが、これに限定されず、第二保持部材2と関係なく設けられる剥離手段で、貼り合わせが完了した一対のワークW1,W2を第二ワーク保持面2aから剥がしてもよい。 In the embodiment described above, as specific examples of the holding
Furthermore, in the previous embodiment, the pair of workpieces W1 and W2 that have been bonded together were peeled off from the second
1a 第一ワーク保持面 2 第二保持部材
2a 第二ワーク保持面 31a 吸着口
12 硬質被覆層 12a 支承突起
12b 吸気溝 12c 山状凸部
12d 谷状凹部 12P パネル
7 剥離部材
W 貼合デバイス W1 ワーク(第一ワーク)
W2 ワーク(第二ワーク) DESCRIPTION OF SYMBOLS 1 Manufacturing apparatus of a bonding device 1
W2 work (second work)
Claims (6)
- 一対のワークを第一保持部材と第二保持部材にそれぞれ保持し、前記第一保持部材と前記第二保持部材の相対的な接近移動により、前記一対のワークを位置合わせして貼り合わせる貼合デバイスの製造装置であって、
前記第一保持部材の第一ワーク保持面又は前記第二保持部材の第二ワーク保持面のいずれか一方か若しくは両方は、前記一対のワークのうち一方或いは両方と対向し且つ前記第一保持部材,前記第二保持部材及び前記一対のワークの材質よりも硬い材料で表面が凹凸形状に形成される硬質被覆層を備え、
前記硬質被覆層は、前記第一ワーク保持面又は前記第二ワーク保持面のいずれか一方か若しくは両方から、前記一対のワークのうち一方或いは両方に向け山状に突出して、前記一対のワークのうち一方の平滑な表面或いは両方の平滑な表面にそれぞれ点接触する複数の支承突起を有することを特徴とする貼合デバイスの製造装置。 A pair of workpieces are held by the first holding member and the second holding member, respectively, and the pair of workpieces are aligned and bonded together by relative movement of the first holding member and the second holding member. A device manufacturing apparatus,
Either one or both of the first workpiece holding surface of the first holding member and the second workpiece holding surface of the second holding member are opposed to one or both of the pair of workpieces and the first holding member. , Comprising a hard coating layer whose surface is formed in an uneven shape with a material harder than the material of the second holding member and the pair of workpieces,
The hard coating layer protrudes from one or both of the first workpiece holding surface and the second workpiece holding surface toward one or both of the pair of workpieces, An apparatus for manufacturing a bonding device, comprising: a plurality of support protrusions each in point contact with one smooth surface or both smooth surfaces. - 前記第一ワーク保持面又は前記第二ワーク保持面のいずれか一方か若しくは両方は、粗面化された複数の山状凸部を有し、前記複数の山状凸部の外側に前記複数の支承突起がコーティングによって積層形成されることを特徴とする請求項1記載の貼合デバイスの製造装置。 Either one or both of the first workpiece holding surface and the second workpiece holding surface have a plurality of roughened convex portions, and the plurality of convex portions are outside the plurality of convex portions. The apparatus for manufacturing a bonding device according to claim 1, wherein the support protrusions are laminated by coating.
- 前記第一ワーク保持面又は前記第二ワーク保持面のいずれか一方か若しくは両方は、前記一対のワークのうち一方或いは両方を吸引して保持する吸着口を備え、
前記硬質被覆層は、前記複数の支承突起の相互間に前記吸着口と連通するように谷状に形成される複数の吸気溝を有することを特徴とする請求項1又は2記載の貼合デバイスの製造装置。 Either one or both of the first workpiece holding surface and the second workpiece holding surface includes a suction port that sucks and holds one or both of the pair of workpieces,
The bonding device according to claim 1, wherein the hard coating layer has a plurality of intake grooves formed in a valley shape so as to communicate with the suction port between the plurality of support protrusions. Manufacturing equipment. - 前記第一ワーク保持面又は前記第二ワーク保持面のいずれか一方か若しくは両方は、粗面化された複数の谷状凹部を有し、前記複数の谷状凹部の外側に前記複数の吸気溝がコーティングによって積層形成されることを特徴とする請求項3記載の貼合デバイスの製造装置。 Either one or both of the first workpiece holding surface and the second workpiece holding surface have a plurality of roughened valley-shaped recesses, and the plurality of intake grooves outside the plurality of valley-shaped recesses. The laminated device manufacturing apparatus according to claim 3, wherein the layers are laminated by coating.
- 前記第一ワーク保持面又は前記第二ワーク保持面のいずれか一方か若しくは両方に、前記硬質被覆層を有するパネルが取り付けられることを特徴とする請求項3又は4記載の貼合デバイスの製造装置。 The panel which has the said hard coating layer is attached to any one or both of said 1st workpiece holding surface or said 2nd workpiece holding surface, The manufacturing apparatus of the bonding device of Claim 3 or 4 characterized by the above-mentioned. .
- 前記第二保持部材が、貼り合わせが完了した前記一対のワークを前記第二ワーク保持面から剥がす剥離部材を有することを特徴とする請求項3又は4記載の貼合デバイスの製造装置。 The apparatus for manufacturing a bonding device according to claim 3 or 4, wherein the second holding member has a peeling member that peels the pair of workpieces that have been bonded together from the second workpiece holding surface.
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