WO2016003166A1 - Surface-modified composite silica particles and polyimide film comprising same - Google Patents
Surface-modified composite silica particles and polyimide film comprising same Download PDFInfo
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- WO2016003166A1 WO2016003166A1 PCT/KR2015/006714 KR2015006714W WO2016003166A1 WO 2016003166 A1 WO2016003166 A1 WO 2016003166A1 KR 2015006714 W KR2015006714 W KR 2015006714W WO 2016003166 A1 WO2016003166 A1 WO 2016003166A1
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- WIPO (PCT)
- Prior art keywords
- polysiloxane
- formula
- group
- modified composite
- silica particles
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 129
- 239000002131 composite material Substances 0.000 title claims abstract description 53
- 229920001721 polyimide Polymers 0.000 title claims abstract description 46
- -1 polysiloxane Polymers 0.000 claims abstract description 49
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 46
- 239000002245 particle Substances 0.000 claims abstract description 29
- 229920000642 polymer Polymers 0.000 claims abstract description 21
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 29
- 239000000203 mixture Substances 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 19
- 239000009719 polyimide resin Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 125000004450 alkenylene group Chemical group 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000004419 alkynylene group Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000007542 hardness measurement Methods 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 239000004962 Polyamide-imide Substances 0.000 description 8
- 229920002312 polyamide-imide Polymers 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 229910010272 inorganic material Inorganic materials 0.000 description 6
- 239000011147 inorganic material Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- LTPSRQRIPCVMKQ-UHFFFAOYSA-N 2-amino-5-methylbenzenesulfonic acid Chemical compound CC1=CC=C(N)C(S(O)(=O)=O)=C1 LTPSRQRIPCVMKQ-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 102100027370 Parathymosin Human genes 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- VWGYKEZAYCHFSA-UHFFFAOYSA-N diethyl diphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OCC)(OCC)OC1=CC=CC=C1 VWGYKEZAYCHFSA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 2
- 238000004627 transmission electron microscopy Methods 0.000 description 2
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- WVOLTBSCXRRQFR-SJORKVTESA-N Cannabidiolic acid Natural products OC1=C(C(O)=O)C(CCCCC)=CC(O)=C1[C@@H]1[C@@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-SJORKVTESA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- WVOLTBSCXRRQFR-DLBZAZTESA-M cannabidiolate Chemical compound OC1=C(C([O-])=O)C(CCCCC)=CC(O)=C1[C@H]1[C@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-DLBZAZTESA-M 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- IEGCIDHTHXPHOI-UHFFFAOYSA-N dibutyl diphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OCCCC)(OCCCC)OC1=CC=CC=C1 IEGCIDHTHXPHOI-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000002338 electrophoretic light scattering Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000816 matrix-assisted laser desorption--ionisation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
Definitions
- the present invention relates to a surface-modified composite silica particles and a polyimide film comprising the same, and more particularly, surface-modified composite silica particles and organic-inorganic composite polyimide including the same to maximize compatibility and dispersibility with the organic polymer. It is about a film.
- polyimide (PI) resin is an insoluble and insoluble ultra high heat resistant resin, and has excellent characteristics such as heat oxidation resistance, heat resistance, radiation resistance, low temperature property, chemical resistance, and the like. It is used in a wide range of electronic materials such as advanced materials, insulating coating agents, insulating films, semiconductors, and electrode protective films of TFT-LCDs.
- a solution of an aromatic dianhydride and an aromatic diamine or an aromatic diisocyanate is used to prepare a polyamic acid derivative, followed by ring closure dehydration at high temperature for imidization.
- pyromellitic dianhydride (PMDA) or biphenyltetracarboxylic dianhydride (BPDA) or the like is used as an aromatic dianhydride component
- ODA oxydianiline
- p-PDA p-phenylene diamine
- m-PDA m-phenylene diamine
- MDA methylenedianiline
- HFDA bisaminophenylhexafluoropropane
- polyimides have high aromatic ring densities and are colored brown or dark, thereby giving transparency to brown and yellow polyimides for applications in advanced materials such as displays and semiconductors.
- a linkage group (-O-, -SO2-, -CO-, -CF3CCF3-, etc.) or a relatively free side branch is introduced into the main chain to minimize intermolecular and intramolecular charge transfer complexes to achieve transparency. do.
- the transparent polyimide In order to overcome the drawbacks of the transparent polyimide, it is necessary to include a material of a different form than the polymer, and the most representative example may be Si-based inorganic material.
- the filler is made of such an inorganic material is included in the production of the film may increase the runability, or if necessary, there are advantages such as increase in hardness, deformation of optical properties, enhanced heat resistance.
- Korean Patent No. 0652863 discloses “Silica-polyimide hybrid and its manufacturing method”, “Precursor solution for polyimide / silica composite material, and a manufacturing method thereof.
- Korean Patent No. 1246116 discloses a “polyimide / silica composite material having a low volume shrinkage rate”
- International Publication No. WO2005-080505 discloses a “polyimide siloxane solution composition”.
- the inorganic material when a large amount is used, there is a difference in degree depending on the size of the particles and the method of producing the particles, but it shows a limitation in that the haze (haze) is increased due to the aggregation of the inorganic materials during film formation.
- the inorganic material itself is not good compatibility with the polymer is poor dispersibility, so to prevent this physical dispersion through a Miller (Mill), a mixer, a high-speed stirrer homogenizer, an ultrasonic disperser. Accordingly, the technology that can further improve the compatibility with the polymer is a situation that is constantly required.
- the present invention is intended to improve the heat resistance, transparency and surface hardness of the polyimide film by improving the compatibility and dispersibility of the organic polymer through the surface modification of the silica particles, and further including the surface-modified silica particles.
- One embodiment of the present invention is a silica particle whose surface is modified with polysiloxane, the polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), containing a phenyl group in the side chain To provide a surface modified composite silica.
- R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof.
- R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
- the polysiloxane may be a polymer of a mixture of the compound represented by Formula 1 and the compound represented by Formula 2 in a 1: 1 to 1: 5 weight ratio.
- the polysiloxane according to one embodiment of the present invention may have a weight average molecular weight of 1,000 to 10,000.
- the surface modified composite silica according to one embodiment of the present invention may have an average particle diameter of 0.1 to 50 ⁇ m.
- the polysiloxane according to one embodiment of the present invention may be 0.1 to 10 parts by weight based on 100 parts by weight of silica particles.
- a polyimide resin and silica particles wherein the silica particles are surface modified composite silica particles whose surface is modified with polysiloxane, the polysiloxane is a compound represented by the following formula (1) or formula (2)
- the polymer of the mixture with the compound represented by this provides the polyimide film which contains a phenyl group in a side chain.
- R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof.
- R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
- the polysiloxane may be a polymer of a mixture of the compound represented by Formula 1 and the compound represented by Formula 2 in a 1: 1 to 1: 5 weight ratio.
- the polysiloxane may have a weight average molecular weight of 1,000 to 10,000.
- the surface modified composite silica may have an average particle diameter of 0.1 to 50 ⁇ m.
- the surface modified composite silica may be one containing 0.1 to 10 parts by weight of polysiloxane based on 100 parts by weight of silica particles.
- the film according to one embodiment of the present invention may include 1 to 10 parts by weight of surface modified composite silica particles based on 100 parts by weight of polyimide resin.
- the film according to one embodiment of the present invention may have a haze value of 0.5 to 2.0 based on ASTM D1003.
- the surface hardness may be one that satisfies the 2H to 3H standard pencil hardness measurement (load speed 180mm / min load 1kg).
- the surface-modified silica particles according to the present invention have a polysiloxane including a phenyl group bonded to the surface of the silica particles, so that the molecular behavior is very similar to a polymer containing a plurality of aromatic rings, such as polyimide, and thus the compatibility with the polymer
- the dispersibility is improved and at the same time, the improvement of the physical properties by the inorganic material is maximized, thereby making it possible to manufacture a polymer composite having excellent surface strength characteristics, in particular a polyimide film.
- polysiloxane is a silica particle whose surface is modified
- polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), containing a phenyl group in the side chain
- a surface modified composite silica is provided.
- R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof.
- R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
- Polysiloxane containing a phenyl group in the side chain as a polymer of a compound represented by the formula (1) alone or a mixture with the compound represented by the formula (2), by reacting with the silica particles react with -OH groups present on the surface of the silica bond Can be formed.
- the polysiloxane containing a phenyl group is bonded to the surface of the silica particles, compatibility and dispersibility with a polymer containing a large number of aromatic rings can be improved.
- the compound represented by Chemical Formula 1 is not limited thereto, but as an example, diphenylsilandiol (Diphenylsilandiol, DPSD), Diphenyl diethoxy silandiol ((Diphenyldiethoxysilandiol), diphenyl dibutoxy silandiol), etc. are mentioned.
- the compound represented by the formula (2) is not limited, but for example selected from the group consisting of phenyl trimethoxysilane (PTMS, Phenyl trimethoxysilane), phenyl triethoxysilane (PTES, Phenyl triethoxysilane) and mixtures thereof It may be more preferable which one.
- PTMS phenyl trimethoxysilane
- PTES phenyl triethoxysilane
- mixtures thereof It may be more preferable which one.
- the polysiloxane to modify the surface of the silica particles is a polymer of a mixture of the compound represented by the formula (1) and the compound represented by the formula (2) in a 1: 1 to 1: 5 weight ratio is added
- the degree of gap / packing between the silica mixtures is more advantageous, which may lead to better surface hardness.
- the compound represented by the formula (1) may play a role of decreasing yellowness by increasing the spacing of the main chain, and the compound represented by the formula (2) may increase the surface hardness by increasing the packing between silicas. have.
- the polysiloxane preferably has a weight average molecular weight of 1,000 to 10,000, in the present invention, the weight average molecular weight is used a device capable of measuring the molecular weight of the polymer, such as Matrix-Assisted Laser Desorption Ionization Mass Spectrometer (MALDS) or GPC Can be measured.
- MALDS Matrix-Assisted Laser Desorption Ionization Mass Spectrometer
- GPC GPC
- the surface modified composite silica has an average particle diameter of 0.1 to 50 ⁇ m, even though the surface is modified by polysiloxane groups, since the size of the polysiloxane is very small, it is almost no different from the size of the silica particles before modification. Can be. If the average particle diameter of the surface modified composite silica is within the above range, it may be advantageous to express the effect when applied to the film, and also to control when applying the particle.
- the polysiloxane may be advantageous in terms of effective surface modification, the content of which is included in 0.1 to 30 parts by weight based on 100 parts by weight of silica particles, more preferably 1 to 20 parts by weight, most preferably 5 to 10 parts by weight. It may be.
- the method for preparing the surface-modified composite silica as described above is not limited thereto.
- the compound represented by Chemical Formula 1 may be reacted alone, or the compound represented by Chemical Formula 1 and Chemical Formula 2 may be used.
- Preparing a polysiloxane by reacting the compound in a ratio of 1: 1 to 1: 5;
- it can provide a method for producing a surface-modified composite silica comprising the step of reacting by adding the polysiloxane obtained in the step (a) to a solvent in which silica particles are dispersed.
- the reaction in the step (a), is a reaction in which a hydrolysis and condensation reaction occurs in series to form a chain of polysiloxane, and is performed by stirring at a temperature of 70 to 90 ° C. for 5 to 12 hours. It may be. If the temperature is too low or too high, the reaction solvent and the raw material may be easily volatilized, and the reaction may occur sufficiently within this time.
- alcohol and water are generated as a result of the hydrolysis and condensation polymerization, and by removing them, it is possible to reduce the reverse reaction and induce a forward reaction, thereby controlling the reaction rate.
- alcohol and water remaining in the polysiloxane when the reaction is completed may be removed by applying a condition of 80 to 100 °C over 10 minutes under reduced pressure, but may not be limited thereto.
- the polysiloxane obtained in step (a) may have a weight average molecular weight of 1,000 to 10,000 for the same reason as described above.
- the silica particles in the step (b) is preferably a particle average particle diameter of 0.1 ⁇ m 50 ⁇ m.
- Silica is formed through hydrolysis and condensation of alkoxy silanes in the presence of water and a catalyst, and any silica particles obtained by conventional synthetic methods are possible.
- the average particle diameter of the silica particles is less than 0.1 ⁇ m, the particles may be too small, there may be a problem in the coating of the polysiloxane, and if the size exceeds 50 ⁇ m silica particles having a particle size within the above range because the particles are difficult to control It may be desirable to use.
- the solvent in which the silica particles are dispersed is water; At least one lower alcohol selected from the group consisting of methanol, ethanol, propanol, isopropanol and butanol; And any one of these mixed solvents, and more preferably water or a mixed solvent of water and a lower alcohol may be used.
- the polysiloxane in the step (b) may be advantageous in terms of effective surface modification of 0.1 to 30 parts by weight based on 100 parts by weight of silica particles, more preferably 1 to 20 parts by weight, most Preferably 5 to 10 parts by weight may be added.
- the reaction of step (b) is a reaction in which a condensation polymerization takes place between polysiloxane and OH on the surface of hydrolyzed silica particles dispersed in a solvent to form a network, yield of reaction
- the stirring speed may be appropriately adjusted depending on the content of silica and water used.
- Step (b) may be carried out under any one of the basic catalysts selected from the group.
- barium hydroxide or ammonia may be preferably used as the basic catalyst.
- the method for preparing a polyimide that can be applied is not limited to the present invention, but may be any conventional method, wherein the surface modified composite silica is dispersed in a solution in which a polyimide resin solid obtained during the polyimide manufacturing process is mixed with a solvent. It is preferable, and it can be physically dispersed using a mill, a mixer, a high speed stirrer, a homogenizer, and an ultrasonic disperser.
- the surface modified composite silica may be included in an amount of 1 to 10 parts by weight based on 100 parts by weight of the polyimide resin solids when the polyimide film is prepared. If the content of the surface-modified composite silica is less than 1 part by weight, the effect of increasing hardness may be insignificant, and the effect may be improved as the content is increased. Can be.
- the polyimide film including the surface modified composite silica has a haze value of 0.5 to 2.0 based on ASTM D1003, and a surface hardness of 2H to 3H based on pencil hardness measurement (load speed of 180 mm / min of 1 kg load).
- the haze value may be measured using a haze meter measuring instrument, and the surface hardness may be measured using an electric pencil hardness meter with Mitsubishi evaluation pencil (UNI) (see Examples below). Characteristics of the polyimide film of the present invention may be due to the surface modified composite silica contained in the polyimide film.
- the polysiloxane containing a large number of phenyl groups is present on the surface thereof, compatibility with a polymer resin including a plurality of aromatic rings is good. Excellent dispersibility, even if a large amount of particles are present, the film does not become cloudy and maintains a transparent state, and polysiloxanes, which hold the surface and the intermolecular molecules between polymers, increase the hardness, thereby finally including polyimide Haze values and surface hardness in the above range can be implemented in the film.
- the polyimide includes imide bonds in the repeating units of the main chain, which is understood to encompass polyamide-imides containing an acidamide bond (-CONH-) in a portion of the main chain. Will be.
- ethanol 300 g was added to a 500 ml beaker, and 7 g of tetraethylthoxysilane (TEOS, Si (OC 2 H 5 ) 4 , Sigma-Aldrich), which is a silane material, was added thereto and stirred at room temperature for 30 minutes. Subsequently, 25 g of NH 4 OH was slowly added to the reactor, followed by stirring at the same temperature for 6 hours. After the reaction was completed, the reaction product was filtered, washed three times with ethanol (50 ml), and then dried in an oven at 40 ° C. for 5 hours under reduced pressure to prepare 5 g of silica particles [SiO 2 ] having an average particle diameter of 0.2 ⁇ m.
- TEOS tetraethylthoxysilane
- the shape and size of the silica particles were observed through TEM (Transmission Electron Microscopy, 200 kV, JEM-2000EX, JEOL, Japan), and Zeta sizer (ELS-8000, Electrophoretic Light Scattering) method.
- the weight average molecular weight (unit: g / mol) of the polysiloxane was measured based on PS standard using GPC (Gel Permeation Chromatography, ViscoTek).
- the particle size of the surface modified composite silica was measured by the same method as the method for measuring the average particle diameter of the silica particles.
- 0.1 g (0.1 wt%) of the surface-modified composite silica particles prepared in Preparation Example 3 was added to 100 g of N, N-dimethylacetamide (DMAc), and then dispersed using an ultrasonic dispersion machine of 20 kHz using Qsonica (Misonix). To prepare a mixed composition.
- DMAc N, N-dimethylacetamide
- Qsonica Qsonica
- composition was prepared in the same manner as in Example 1, except that 0.5 g (0.5 wt%) and 1 g (1 wt%) of the surface-modified composite silica particles were used.
- a surface (Nippon shokubai, KE-P10, average particle size of 0.15 ⁇ m) whose surface is composed of -OH is 0.1 to 100 g of N, N-dimethylacetaamide (DMAc), respectively.
- the composition of Comparative Examples 1 to 3 was prepared in the same manner as in Example 1, except that g (0.1 wt%), 0.5 g (0.5 wt%), and 1 g (1 wt%) were added.
- Haze of the compositions prepared in Examples 1 to 3 and Comparative Examples 1 to 3 were measured and described in Table 1 below.
- the haze measurement method was measured based on ASTM D1003 standard using a Haze meter (HM-150 manufactured by Murakaml Color Research Laboratory).
- Haze value can be interpreted that the film is more transparent, haze measurement results, as shown in Table 1, in the case of Examples 1 to 3 in Comparative Examples due to the excellent dispersibility of the surface-modified composite silica particles in the solvent It was confirmed that the haze was significantly lower than 1 to 3.
- the copolymerized polyamide-imide of the 95 g solid powder was dissolved in 768 g of N, N-dimethylacetamide (DMAc) to obtain a 11 wt% solution, followed by adding 0.95 g of the surface-modified composite silica obtained in Preparation Example 3. It was.
- DMAc N, N-dimethylacetamide
- the solution thus obtained was applied to a stainless plate, cast at 100 ⁇ m, dried for 1 hour with a hot air of 150 ° C., 1 hour at 200 ° C., and 30 minutes at 300 ° C., and then slowly cooled to separate from the plate to form a poly of 10 ⁇ m. An amide-imide film was obtained. After the final heat treatment was further heat treated at 300 °C for 10 minutes.
- a polyamide-imide film having a thickness of 10 ⁇ m was obtained in the same manner as in Example 4, except that the amount of surface-loss composite silica particles was adjusted to 4.75 g.
- a 10 ⁇ m polyamide-imide film was prepared in the same manner as in Example 4 except that 0.95 g of the filler (Nippon shokubai, KE-P10, average particle size of 0.15 ⁇ m) used in the Comparative Example was used instead of the surface-modified composite silica particles. Obtained.
- a 10 ⁇ m polyamide-imide film was prepared in the same manner as in Example 4 except that 0.95 g of the filler (Nippon shokubai, KE-P10, average particle size of 0.15 ⁇ m) used in the Comparative Example was used instead of the surface-modified composite silica particles. Obtained.
- the surface hardness of the films prepared in Examples 4 to 5 and Comparative Examples 4 to 6 were measured and described in Table 2.
- the method of measuring the surface hardness of the film is a Mitsubishi evaluation pencil (UNI) using an electric pencil hardness tester, drawing 50 mm five times at a speed of 180 mm / min at a load of 1 kg, and then measuring the minimum pencil hardness without scratches on the surface. It was.
- the haze of the films prepared in Examples 4 to 5 was measured and described in Table 2 below.
- the haze measurement method was measured based on ASTM D1003 standard using a Haze meter (HM-150 manufactured by Murakaml Color Research Laboratory).
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Abstract
The present invention relates to surface-modified composite silica particles and a polyimide film comprising the same. The present invention provides: surface-modified composite silica particles which are modified with polysiloxane including a phenyl group to improve compatibility and dispersibility with respect to polymers; and a polymer composite with excellent surface hardness characteristics, manufactured using the particles, especially, a polyimide film.
Description
본 발명은 표면 개질 복합 실리카 입자 및 이를 포함하는 폴리이미드 필름에 관한 것으로, 보다 상세하게는 유기물인 고분자와의 상용성 및 분산성이 극대화된 표면 개질 복합 실리카 입자와 이를 포함하는 유무기 복합 폴리이미드 필름에 관한 것이다.The present invention relates to a surface-modified composite silica particles and a polyimide film comprising the same, and more particularly, surface-modified composite silica particles and organic-inorganic composite polyimide including the same to maximize compatibility and dispersibility with the organic polymer. It is about a film.
일반적으로 폴리이미드(PI) 수지는 불용, 불융의 초고내열성 수지로서 내열산화성, 내열특성, 내방사선성, 저온특성, 내약품성 등에 우수한 특성을 가지고 있어, 자동차 재료, 항공소재, 우주선 소재 등의 내열 첨단소재 및 절연코팅제, 절연막, 반도체, TFT-LCD의 전극 보호막 등 전자재료에 광범위한 분야에 사용되고 있다.In general, polyimide (PI) resin is an insoluble and insoluble ultra high heat resistant resin, and has excellent characteristics such as heat oxidation resistance, heat resistance, radiation resistance, low temperature property, chemical resistance, and the like. It is used in a wide range of electronic materials such as advanced materials, insulating coating agents, insulating films, semiconductors, and electrode protective films of TFT-LCDs.
이와 같은 폴리이미드의 경우는 방향족 디안하이드라이드와 방향족 디아민 또는 방향족 디이소시아네이트를 용액중합하여 폴리아믹산 유도체를 제조한 후, 고온에서 폐환탈수시켜 이미드화 하게 된다. 폴리이미드 수지를 제조하기 위하여 방향족 디안하이드라이드 성분으로서 피로멜리트산이무수물(PMDA) 또는 비페닐테트라카르복실산이무수물(BPDA) 등을 사용하고 있고, 방향족 디아민 성분으로서는 옥시디아닐린(ODA), p-페닐렌 디아민(p-PDA), m-페닐렌 디아민(m-PDA), 메틸렌디아닐린(MDA), 비스아미노페닐헥사플루오로프로판(HFDA) 등을 사용하고 있다. In the case of such a polyimide, a solution of an aromatic dianhydride and an aromatic diamine or an aromatic diisocyanate is used to prepare a polyamic acid derivative, followed by ring closure dehydration at high temperature for imidization. In order to prepare a polyimide resin, pyromellitic dianhydride (PMDA) or biphenyltetracarboxylic dianhydride (BPDA) or the like is used as an aromatic dianhydride component, and oxydianiline (ODA), p is used as an aromatic diamine component. -Phenylene diamine (p-PDA), m-phenylene diamine (m-PDA), methylenedianiline (MDA), bisaminophenylhexafluoropropane (HFDA) and the like are used.
일반적으로 폴리이미드는 방향족 고리 밀도가 높아 갈색 또는 확색으로 착색되어 있어 디스플레이나 반도체 등 첨단 소재 분야의 적용을 위하여 갈색 및 노란색의 폴리이미드에 투명성을 부여하게 된다. 이를 위하여 linkage group(-O-, -SO2-, -CO-, -CF3CCF3-, 등)이나 상대적으로 자유체적이 큰 곁가지를 주쇄에 도입 시켜 분자간, 분자내 전하이동 착물을 최소화하여 투명성을 구현하게 된다.In general, polyimides have high aromatic ring densities and are colored brown or dark, thereby giving transparency to brown and yellow polyimides for applications in advanced materials such as displays and semiconductors. To this end, a linkage group (-O-, -SO2-, -CO-, -CF3CCF3-, etc.) or a relatively free side branch is introduced into the main chain to minimize intermolecular and intramolecular charge transfer complexes to achieve transparency. do.
하지만 폴리이미드에 투명성을 부여한 필름의 경우 상기의 도입된 작용기로 인해 내열성이 감소하는 문제가 발생하기도 한다. 이로 인해 높은 공정온도를 요구하는 디스플레이 등 소재 공정분야의 적용에 한계가 생기며, 또한 기계적 물성이 낮을 경우 디스플레이 제조 공정에서 찢어지는 현상이 발생하여 제품의 수율을 떨어뜨리는 결과를 초래한다.However, in the case of a film provided with transparency to the polyimide, there is a problem that the heat resistance is reduced due to the introduced functional group. As a result, there is a limit in the application of the material processing field such as a display requiring a high process temperature, and when the mechanical properties are low, tearing occurs in the display manufacturing process, resulting in a drop in product yield.
이러한 투명 폴리이미드가 가지고 있는 단점을 극복하기 위하여 고분자가 아닌 다른 형태의 물질을 포함하게 되는데 가장 대표적인 예로서 Si 계열의 무기물을 들 수 있다. 필름 생산 시 이러한 무기물로 이루어진 필러가 포함되어 있는 경우는 주행성을 높여 주기도 하며 혹은 필요에 따라 경도 증가, 광학 물성의 변형, 내열성 강화 등의 장점이 있다.In order to overcome the drawbacks of the transparent polyimide, it is necessary to include a material of a different form than the polymer, and the most representative example may be Si-based inorganic material. When the filler is made of such an inorganic material is included in the production of the film may increase the runability, or if necessary, there are advantages such as increase in hardness, deformation of optical properties, enhanced heat resistance.
폴리이미드에 실리카를 도입한 기술과 관련된 종래 문헌으로는 “실리카-폴리이미드 하이브리드 및 그 제조방법”을 개시하고 있는 대한민국 등록특허 제 0652863 호, “폴리이미드/실리카 복합 재료용 전구체 용액, 이의 제조방법 및 낮은 부피수축율을 갖는 폴리이미드/실리카 복합재료”를 개시하고 있는 대한민국 등록특허 제 1246116 호, 및 “폴리이미드 실록산 용액 조성물”을 개시하고 있는 국제공개특허 WO2005-080505 등을 들 수 있다. Conventional literature related to the technology of introducing silica into polyimide is disclosed in Korean Patent No. 0652863, which discloses “Silica-polyimide hybrid and its manufacturing method”, “Precursor solution for polyimide / silica composite material, and a manufacturing method thereof. And Korean Patent No. 1246116, which discloses a “polyimide / silica composite material having a low volume shrinkage rate”, and International Publication No. WO2005-080505, which discloses a “polyimide siloxane solution composition”.
다만, 대부분의 무기물의 경우, 많은 양을 쓸 경우에는 입자의 크기, 입자의 제조 방법에 따라 정도의 차이가 있긴 하지만 필름 생성시 무기물의 응집현상으로 헤이즈(haze)가 높아지는 한계점을 드러내고 있다. 또한, 무기물 자체적으로는 고분자와의 상용성이 좋지 못하여 분산성이 떨어지므로 이를 방지하기 위하여 밀러(Mill)나 믹서, 고속 교반기 호모게나이저, 초음파 분산기 등을 통해 물리적으로 분산을 하게 된다. 이에 따라, 고분자와의 상용성을 보다 향상시킬 수 있는 기술은 꾸준히 요구되는 실정이다.However, in the case of most inorganic materials, when a large amount is used, there is a difference in degree depending on the size of the particles and the method of producing the particles, but it shows a limitation in that the haze (haze) is increased due to the aggregation of the inorganic materials during film formation. In addition, the inorganic material itself is not good compatibility with the polymer is poor dispersibility, so to prevent this physical dispersion through a Miller (Mill), a mixer, a high-speed stirrer homogenizer, an ultrasonic disperser. Accordingly, the technology that can further improve the compatibility with the polymer is a situation that is constantly required.
이에 본 발명은 실리카 입자의 표면 개질을 통해 유기물인 고분자에 대한 상용성 및 분산성을 높이고, 나아가 상기 표면개질된 실리카 입자를 포함함으로써 폴리이미드 필름의 내열성, 투명성 및 표면 경도를 향상시키고자 한다.Accordingly, the present invention is intended to improve the heat resistance, transparency and surface hardness of the polyimide film by improving the compatibility and dispersibility of the organic polymer through the surface modification of the silica particles, and further including the surface-modified silica particles.
본 발명의 일 구현예는, 폴리실록산으로 그 표면이 개질된 실리카 입자이며, 폴리실록산은 하기 화학식 1로 표시되는 화합물 단독 또는 하기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로, 측쇄에 페닐기를 포함하는 것인 표면 개질 복합 실리카를 제공한다. One embodiment of the present invention is a silica particle whose surface is modified with polysiloxane, the polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), containing a phenyl group in the side chain To provide a surface modified composite silica.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 또는 2에서 R은 각각 H, 할로겐 원자, 할로겐 원자로 치환 또는 치환되지 않은 1 내지 6의 알콕시기 및 이들의 조합으로 구성된 군에서 선택된 같거나 서로 다른 1종이다. 또한, 상기 R1는 규소에 벤젠 고리의 탄소가 직접 연결되어 있는 단일결합, 탄소수 1 내지 8의 알킬렌기, 탄소수 3 내지 12의 알케닐렌기, 탄소수 3 내지 12의 할로알케닐렌기, 탄소수 3 내지 8의 알키닐렌기 및 이들의 조합으로 구성된 군에서 선택되는 1종이다.R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof. In addition, R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
바람직한 일 구현예에서는, 상기 폴리실록산은 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5 중량비로 혼합한 혼합물의 중합물일 수 있다. In a preferred embodiment, the polysiloxane may be a polymer of a mixture of the compound represented by Formula 1 and the compound represented by Formula 2 in a 1: 1 to 1: 5 weight ratio.
본 발명의 일 구현예에 의한 상기 폴리실록산은 중량평균 분자량이 1,000 내지 10,000인 것일 수 있다. The polysiloxane according to one embodiment of the present invention may have a weight average molecular weight of 1,000 to 10,000.
본 발명의 일 구현예에 의한 상기 표면 개질 복합실리카는 평균 입경이 0.1 내지 50㎛인 것일 수 있다. The surface modified composite silica according to one embodiment of the present invention may have an average particle diameter of 0.1 to 50 μm.
본 발명의 일 구현예에 의한 상기 폴리실록산은 그 함량이 실리카 입자 100중량부 기준 0.1 내지 10 중량부일 수 있다. The polysiloxane according to one embodiment of the present invention may be 0.1 to 10 parts by weight based on 100 parts by weight of silica particles.
본 발명의 다른 일 구현예에서는, 폴리이미드 수지 및 실리카 입자를 포함하고, 실리카 입자는 폴리실록산으로 그 표면이 개질된 표면 개질 복합 실리카 입자이며, 폴리실록산은 하기 화학식 1로 표시되는 화합물 단독 또는 하기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로, 측쇄에 페닐기를 포함하는 것인, 폴리이미드 필름을 제공한다. In another embodiment of the present invention, a polyimide resin and silica particles, wherein the silica particles are surface modified composite silica particles whose surface is modified with polysiloxane, the polysiloxane is a compound represented by the following formula (1) or formula (2) The polymer of the mixture with the compound represented by this provides the polyimide film which contains a phenyl group in a side chain.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 또는 2에서 R은 각각 H, 할로겐 원자, 할로겐 원자로 치환 또는 치환되지 않은 1 내지 6의 알콕시기 및 이들의 조합으로 구성된 군에서 선택된 같거나 서로 다른 1종이다. 또한, 상기 R1는 규소에 벤젠 고리의 탄소가 직접 연결되어 있는 단일결합, 탄소수 1 내지 8의 알킬렌기, 탄소수 3 내지 12의 알케닐렌기, 탄소수 3 내지 12의 할로알케닐렌기, 탄소수 3 내지 8의 알키닐렌기 및 이들의 조합으로 구성된 군에서 선택되는 1종이다.R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof. In addition, R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
본 발명의 일 구현예에 의한 필름에 있어서, 상기 폴리실록산은 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5 중량비로 혼합한 혼합물의 중합물일 수 있다. In the film according to an embodiment of the present invention, the polysiloxane may be a polymer of a mixture of the compound represented by Formula 1 and the compound represented by Formula 2 in a 1: 1 to 1: 5 weight ratio.
본 발명의 일 구현예에 의한 필름에 있어서, 상기 폴리실록산은 중량평균 분자량이 1,000 내지 10,000인 것일 수 있다. In the film according to one embodiment of the present invention, the polysiloxane may have a weight average molecular weight of 1,000 to 10,000.
본 발명의 일 구현예에 의한 필름에 있어서, 상기 표면 개질 복합실리카는 평균 입경이 0.1 내지 50㎛인 것일 수 있다. In the film according to one embodiment of the present invention, the surface modified composite silica may have an average particle diameter of 0.1 to 50㎛.
본 발명의 일 구현예에 의한 필름에 있어서, 상기 표면 개질 복합 실리카는 폴리실록산을 실리카 입자 100중량부 기준 0.1 내지 10 중량부로 포함하는 것일 수 있다. In the film according to the embodiment of the present invention, the surface modified composite silica may be one containing 0.1 to 10 parts by weight of polysiloxane based on 100 parts by weight of silica particles.
본 발명의 일 구현예에 의한 필름은 폴리이미드 수지 100중량부에 대하여 표면 개질 복합 실리카 입자를 1 내지 10중량부로 포함하는 것일 수 있다. The film according to one embodiment of the present invention may include 1 to 10 parts by weight of surface modified composite silica particles based on 100 parts by weight of polyimide resin.
본 발명의 일 구현예에 의한 필름은 헤이즈(Haze)값이 ASTM D1003 기준 0.5 내지 2.0을 만족하는 것일 수 있다. 또한 표면 경도가 연필경도 측정(하중 1kg의 하중 속도 180mm/min)기준 2H 내지 3H을 만족하는 것일 수 있다. The film according to one embodiment of the present invention may have a haze value of 0.5 to 2.0 based on ASTM D1003. In addition, the surface hardness may be one that satisfies the 2H to 3H standard pencil hardness measurement (load speed 180mm / min load 1kg).
본 발명에 따른 표면 개질된 실리카 입자는 실리카 입자 표면에, 페닐기를 포함하는 폴리실록산이 결합되어 있어, 폴리이미드와 같이 다수의 방향족 환이 포함된 고분자와 분자 거동이 매우 유사하므로, 고분자에 대한 상용성 및 분산성이 향상됨과 동시에 무기물에 의한 물성 향상이 극대화되어 이에 따라 표면 강도 특성이 우수한 고분자 복합체, 특히 폴리이미드 필름을 제조할 수 있다.The surface-modified silica particles according to the present invention have a polysiloxane including a phenyl group bonded to the surface of the silica particles, so that the molecular behavior is very similar to a polymer containing a plurality of aromatic rings, such as polyimide, and thus the compatibility with the polymer The dispersibility is improved and at the same time, the improvement of the physical properties by the inorganic material is maximized, thereby making it possible to manufacture a polymer composite having excellent surface strength characteristics, in particular a polyimide film.
본 발명의 일 양태에 따르면, 폴리실록산으로 그 표면이 개질된 실리카 입자이며, 폴리실록산은 하기 화학식 1로 표시되는 화합물 단독 또는 하기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로, 측쇄에 페닐기를 포함하는 것인 표면 개질 복합 실리카를 제공한다.According to an aspect of the present invention, polysiloxane is a silica particle whose surface is modified, polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), containing a phenyl group in the side chain To provide a surface modified composite silica.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 또는 2에서 R은 각각 H, 할로겐 원자, 할로겐 원자로 치환 또는 치환되지 않은 1 내지 6의 알콕시기 및 이들의 조합으로 구성된 군에서 선택된 같거나 서로 다른 1종이다. 또한, 상기 R1는 규소에 벤젠 고리의 탄소가 직접 연결되어 있는 단일결합, 탄소수 1 내지 8의 알킬렌기, 탄소수 3 내지 12의 알케닐렌기, 탄소수 3 내지 12의 할로알케닐렌기, 탄소수 3 내지 8의 알키닐렌기 및 이들의 조합으로 구성된 군에서 선택되는 1종이다.R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof. In addition, R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
상기 화학식 1로 표시되는 화합물 단독 또는 상기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로 측쇄에 페닐기를 포함하는 폴리실록산은, 실리카 입자와의 반응을 통해 실리카의 표면에 존재하는 -OH기와 반응하여 결합을 형성할 수 있다. 특히 실리카 입자의 표면에, 측쇄에 페닐기를 포함하는 폴리실록산이 결합됨에 따라 방향족 환을 다수 포함하는 고분자와의 상용성 및 분산성을 향상시킬 수 있다. Polysiloxane containing a phenyl group in the side chain as a polymer of a compound represented by the formula (1) alone or a mixture with the compound represented by the formula (2), by reacting with the silica particles react with -OH groups present on the surface of the silica bond Can be formed. In particular, as the polysiloxane containing a phenyl group is bonded to the surface of the silica particles, compatibility and dispersibility with a polymer containing a large number of aromatic rings can be improved.
상기 화학식 1로 표시되는 화합물에는 그 제한이 있는 것은 아니나, 일예로 다이페닐실란다이올(Diphenylsilandiol, DPSD), 다이페닐다이에톡시실란다이올((Diphenyldiethoxysilandiol) 및 다이페닐다이부톡시실란다이올((Diphenyldibuthoxysilandiol) 등을 들 수 있다. The compound represented by Chemical Formula 1 is not limited thereto, but as an example, diphenylsilandiol (Diphenylsilandiol, DPSD), Diphenyl diethoxy silandiol ((Diphenyldiethoxysilandiol), diphenyl dibutoxy silandiol), etc. are mentioned.
또한 상기 화학식 2로 표시되는 화합물에는 그 제한이 있는 것은 아니나, 일예로 페닐트리메톡시실란(PTMS, Phenyl trimethoxysilane), 페닐트리에톡시실란(PTES, Phenyl triethoxysilane) 및 이들의 혼합물로 구성된 그룹으로부터 선택된 어느 하나인 것이 보다 바람직할 수 있다.In addition, the compound represented by the formula (2) is not limited, but for example selected from the group consisting of phenyl trimethoxysilane (PTMS, Phenyl trimethoxysilane), phenyl triethoxysilane (PTES, Phenyl triethoxysilane) and mixtures thereof It may be more preferable which one.
바람직한 일 구현예에 따르면 실리카 입자의 표면을 개질하는 상기 폴리실록산은 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5 중량비로 혼합한 혼합물의 중합물인 것이 투입되는 실리카 혼합물간의 간극/Packing 정도가 더 유리하며, 이는 보다 우수한 표면경도를 얻어낼 수 있도록 할 수 있다. According to a preferred embodiment the polysiloxane to modify the surface of the silica particles is a polymer of a mixture of the compound represented by the formula (1) and the compound represented by the formula (2) in a 1: 1 to 1: 5 weight ratio is added The degree of gap / packing between the silica mixtures is more advantageous, which may lead to better surface hardness.
예측컨대, 화학식 1로 표시되는 화합물은 주쇄의 간격 증대를 통해 황색도를 저하시키는 역할을 할 수 있고, 화학식 2로 표시되는 화합물은 실리카들간의 Packing을 증대시켜 표면경도를 증대시키는 역할을 할 수 있다.
Predictably, the compound represented by the formula (1) may play a role of decreasing yellowness by increasing the spacing of the main chain, and the compound represented by the formula (2) may increase the surface hardness by increasing the packing between silicas. have.
한편, 상기 폴리실록산은 중량평균 분자량이 1,000 내지 10,000인 것이 바람직한데, 본 발명에서 중량평균 분자량은 MALDS(Matrix-Assisted Laser Desorption Ionization Mass Spectrometer) 또는 GPC와 같이 고분자의 분자량을 측정할 수 있는 기기를 사용하여 측정될 수 있다. 폴리실록산의 중량평균 분자량이 상기한 범위 내에 있는 경우 충분히 중합이 이루어져 경도향상 효과를 발휘할 수 있으면서 향후 고분자와의 엉김현상에 따른 백탁이 발생하는 것을 방지할 수 있는 측면에서 바람직하다. On the other hand, the polysiloxane preferably has a weight average molecular weight of 1,000 to 10,000, in the present invention, the weight average molecular weight is used a device capable of measuring the molecular weight of the polymer, such as Matrix-Assisted Laser Desorption Ionization Mass Spectrometer (MALDS) or GPC Can be measured. When the weight average molecular weight of the polysiloxane is in the above-described range, the polymerization is sufficiently performed, and thus, the hardness improvement effect can be exerted, and it is preferable in terms of preventing the occurrence of turbidity due to entanglement with the polymer in the future.
본 발명의 바람직한 양태에 따르면, 상기 표면 개질 복합 실리카는 평균 입경이 0.1 내지 50㎛인데, 표면이 폴리실록산기에 의해 개질되었다 할지라도 폴리실록산의 크기가 매우 작기 때문에 개질 전의 실리카 입자의 크기와 거의 다를 바 없을 수 있다. 표면 개질 복합 실리카의 평균입경이 상기 범위 이내인 경우 필름에 적용시 효과 발현에 유리하고 입자 적용시 컨트롤하는 것에 있어서도 유리할 수 있다. According to a preferred embodiment of the present invention, the surface modified composite silica has an average particle diameter of 0.1 to 50 μm, even though the surface is modified by polysiloxane groups, since the size of the polysiloxane is very small, it is almost no different from the size of the silica particles before modification. Can be. If the average particle diameter of the surface modified composite silica is within the above range, it may be advantageous to express the effect when applied to the film, and also to control when applying the particle.
상기 폴리실록산은 그 함량이 실리카 입자 100중량부 기준 0.1 내지 30 중량부로 포함하는 것이 효과적인 표면개질 측면에서 유리할 수 있고, 보다 바람직하게는 1 내지 20 중량부, 가장 바람직하게는 5 내지 10 중량부로 포함하는 것일 수 있다. The polysiloxane may be advantageous in terms of effective surface modification, the content of which is included in 0.1 to 30 parts by weight based on 100 parts by weight of silica particles, more preferably 1 to 20 parts by weight, most preferably 5 to 10 parts by weight. It may be.
상기와 같은 표면 개질 복합 실리카를 제조하는 방법에는 그 한정이 없으나, 일예로 (a) 상기 화학식 1로 표시되는 화합물을 단독으로 반응시키거나, 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5의 비율로 반응시켜 폴리실록산을 제조하는 단계; 및 (b) 실리카 입자가 분산되어 있는 용매에 상기 (a)단계에서 수득한 폴리실록산을 첨가하여 반응시키는 단계를 포함하는 표면 개질 복합 실리카의 제조방법을 제공할 수 있다.The method for preparing the surface-modified composite silica as described above is not limited thereto. For example, (a) the compound represented by Chemical Formula 1 may be reacted alone, or the compound represented by Chemical Formula 1 and Chemical Formula 2 may be used. Preparing a polysiloxane by reacting the compound in a ratio of 1: 1 to 1: 5; And (b) it can provide a method for producing a surface-modified composite silica comprising the step of reacting by adding the polysiloxane obtained in the step (a) to a solvent in which silica particles are dispersed.
본 발명의 바람직한 양태에 따르면, 상기 (a)단계에서 반응은 가수분해 및 축합반응이 연쇄적으로 일어나 폴리실록산의 사슬을 만드는 반응이며, 70 내지 90℃의 온도에서 5 내지 12시간동안 교반에 의해 수행되는 것일 수 있다. 온도가 지나치게 낮거나 높으면 반응 용매 및 원료가 쉽게 휘발될 수 있고, 반응은 상기 시간내에 충분히 일어날 수 있다.According to a preferred embodiment of the present invention, in the step (a), the reaction is a reaction in which a hydrolysis and condensation reaction occurs in series to form a chain of polysiloxane, and is performed by stirring at a temperature of 70 to 90 ° C. for 5 to 12 hours. It may be. If the temperature is too low or too high, the reaction solvent and the raw material may be easily volatilized, and the reaction may occur sufficiently within this time.
이때, 상기 반응 시 가수분해 및 축합중합 결과 부산물인 알코올 및 물이 생성되는데, 이를 제거함으로서 역반응을 줄이고 정반응을 유도할 수 있으며 이를 통해 반응속도를 조절이 가능하다. 또한, 반응이 종료되었을 시 폴리실록산 내에 잔존하는 알코올 및 물은 감압 하에서 10분 이상 80 내지 100℃의 조건을 가함으로써 제거될 수 있으나, 이에 제한되지 않을 수 있다.In this case, by-products of alcohol and water are generated as a result of the hydrolysis and condensation polymerization, and by removing them, it is possible to reduce the reverse reaction and induce a forward reaction, thereby controlling the reaction rate. In addition, alcohol and water remaining in the polysiloxane when the reaction is completed may be removed by applying a condition of 80 to 100 ℃ over 10 minutes under reduced pressure, but may not be limited thereto.
본 발명의 바람직한 양태에 따르면, 상기 (a)단계에서 수득된 폴리실록산은 상술한 것과 같은 이유로 중량평균 분자량이 1,000 내지 10,000 일 수 있다. According to a preferred embodiment of the present invention, the polysiloxane obtained in step (a) may have a weight average molecular weight of 1,000 to 10,000 for the same reason as described above.
한편, 본 발명의 바람직한 양태에 따르면, 상기 (b)단계에서 실리카 입자는 입자 평균 입경이 0.1㎛내지 50㎛인 것이 바람직하다. 실리카는 물과 촉매의 존재 하에 알콕시 실란의 가수분해와 축합 반응을 통하여 형성되며, 통상적인 합성방법에 의해 수득된 실리카 입자라면 모두 가능하다. 다만, 실리카 입자의 평균 입경이 0.1㎛미만일 경우, 입자가 너무 작아 폴리실록산의 코팅에 문제가 있을 수 있고, 50㎛를 초과할 경우 입자의 크기가 커서 컨트롤하기 힘들어지므로 상기 범위내의 입자크기를 갖는 실리카를 사용하는 것이 바람직할 수 있다. On the other hand, according to a preferred embodiment of the present invention, the silica particles in the step (b) is preferably a particle average particle diameter of 0.1㎛ 50㎛. Silica is formed through hydrolysis and condensation of alkoxy silanes in the presence of water and a catalyst, and any silica particles obtained by conventional synthetic methods are possible. However, when the average particle diameter of the silica particles is less than 0.1㎛, the particles may be too small, there may be a problem in the coating of the polysiloxane, and if the size exceeds 50㎛ silica particles having a particle size within the above range because the particles are difficult to control It may be desirable to use.
본 발명의 바람직한 양태에 따르면, 상기 실리카 입자가 분산된 용매로는 물; 메탄올, 에탄올, 프로판올, 이소프로판올 및 부탄올로 이루어진 그룹에서 선택된 1종 이상의 저급 알코올; 및 이들의 혼합용매 가운데 선택된 어느 하나인 것이 바람직하며, 보다 바람직하게는 물 또는 물과 저급 알코올의 혼합 용매가 사용될 수 있다.According to a preferred embodiment of the present invention, the solvent in which the silica particles are dispersed is water; At least one lower alcohol selected from the group consisting of methanol, ethanol, propanol, isopropanol and butanol; And any one of these mixed solvents, and more preferably water or a mixed solvent of water and a lower alcohol may be used.
본 발명의 바람직한 양태에 따르면, 상기 (b)단계에서 폴리실록산은 실리카 입자 100중량부 기준 0.1 내지 30 중량부 첨가하는 것이 효과적인 표면개질 측면에서 유리할 수 있고, 보다 바람직하게는 1 내지 20 중량부, 가장 바람직하게는 5 내지 10 중량부를 첨가할 수 있다.According to a preferred embodiment of the present invention, the polysiloxane in the step (b) may be advantageous in terms of effective surface modification of 0.1 to 30 parts by weight based on 100 parts by weight of silica particles, more preferably 1 to 20 parts by weight, most Preferably 5 to 10 parts by weight may be added.
본 발명의 바람직한 양태에 따르면, 상기 (b) 단계의 반응은 용매에 분산되면서 표면이 가수분해된 실리카 입자 표면의 OH기와 폴리실록산 사이에서 축합중합이 일어나 네트워크를 형성하는 형식의 반응이고, 반응의 수율을 고려할 경우 상온에서 5 내지 10시간동안 수행되는 것이 바람직하다. 또한, 사용되는 실리카 및 물의 함량에 따라 교반 속도는 적절히 조절될 수 있다. According to a preferred embodiment of the present invention, the reaction of step (b) is a reaction in which a condensation polymerization takes place between polysiloxane and OH on the surface of hydrolyzed silica particles dispersed in a solvent to form a network, yield of reaction In consideration of this, it is preferable to perform at room temperature for 5 to 10 hours. In addition, the stirring speed may be appropriately adjusted depending on the content of silica and water used.
특히, 상기 (b)단계의 반응을 더욱 촉진시키기 위해서, 본 발명의 바람직한 양태에 따르면, 바륨옥사이드, 암모니아(NH4OH), 수산화칼륨(KOH), 수산화나트륨(NaOH) 및 이들의 혼합물을 포함하는 그룹으로부터 선택된 어느 하나의 염기성 촉매 하에서 상기 (b)단계를 수행할 수 있다. 본 발명에서 특별히 한정하지는 않으나, 염기성 촉매로서 보다 바람직하기로는 바륨하이드록사이드 또는 암모니아를 사용할 수 있다.In particular, in order to further promote the reaction of step (b), according to a preferred embodiment of the present invention, barium oxide, ammonia (NH 4 OH), potassium hydroxide (KOH), sodium hydroxide (NaOH) and mixtures thereof Step (b) may be carried out under any one of the basic catalysts selected from the group. Although not specifically limited in the present invention, barium hydroxide or ammonia may be preferably used as the basic catalyst.
나아가 본 발명의 또 다른 양태에 따르면, 상기 표면 개질 복합 실리카를 포함한 폴리이미드 필름을 제공할 수 있다. 이때, 적용될 수 있는 폴리이미드의 제조방법은 본 발명에 국한되지 않고 통상의 방법이라면 가능하되, 상기 표면 개질 복합 실리카는 폴리이미드 제조과정 중 수득된 폴리이미드 수지 고형분을 용매와 혼합한 용액에 분산되는 것이 바람직하며, 밀러(mill)나 믹서, 고속 교반기, 호모게나이저, 초음파 분산기를 이용하여 물리적으로 분산할 수 있다.Furthermore, according to another aspect of the present invention, it is possible to provide a polyimide film including the surface modified composite silica. In this case, the method for preparing a polyimide that can be applied is not limited to the present invention, but may be any conventional method, wherein the surface modified composite silica is dispersed in a solution in which a polyimide resin solid obtained during the polyimide manufacturing process is mixed with a solvent. It is preferable, and it can be physically dispersed using a mill, a mixer, a high speed stirrer, a homogenizer, and an ultrasonic disperser.
본 발명의 바람직한 양태에 따르면, 상기 표면개질 복합 실리카가 폴리이미드 필름 제조시 폴리이미드 수지 고형분 100 중량부 대비 1 내지 10 중량부로 포함될 수 있다. 표면 개질 복합 실리카의 함량이 1 중량부 미만일 경우 경도상승 효과가 미비할 수 있고, 함량이 증가함에 따라 효과가 향상될 수는 있으나 10중량부를 초과할 경우 오히려 필름이 뿌옇게 되어 광학적 특성으로서의 성질이 떨어질 수 있다.According to a preferred embodiment of the present invention, the surface modified composite silica may be included in an amount of 1 to 10 parts by weight based on 100 parts by weight of the polyimide resin solids when the polyimide film is prepared. If the content of the surface-modified composite silica is less than 1 part by weight, the effect of increasing hardness may be insignificant, and the effect may be improved as the content is increased. Can be.
더불어 궁극적으로 상기 표면개질 복합 실리카를 포함한 폴리이미드 필름은 헤이즈 값이 ASTM D1003 기준 0.5 내지 2.0 이고, 표면 경도가 연필경도 측정(하중 1kg의 하중 속도 180mm/min)기준 2H 내지 3H 인 것이 바람직하다. 본 발명에서 상기 헤이즈 값은 haze meter 측정기기를 사용하여 측정될 수 있고, 표면 경도는 미쯔비스 평가용 연필(UNI)로 전동식 연필경도측정기를 이용하여 측정될 수 있다(하기 실시예 참조). 본 발명의 상기 폴리이미드 필름의 특성은 폴리이미드 필름에 포함된 표면 개질 복합 실리카에 의한 것일 수 있다.Ultimately, the polyimide film including the surface modified composite silica has a haze value of 0.5 to 2.0 based on ASTM D1003, and a surface hardness of 2H to 3H based on pencil hardness measurement (load speed of 180 mm / min of 1 kg load). In the present invention, the haze value may be measured using a haze meter measuring instrument, and the surface hardness may be measured using an electric pencil hardness meter with Mitsubishi evaluation pencil (UNI) (see Examples below). Characteristics of the polyimide film of the present invention may be due to the surface modified composite silica contained in the polyimide film.
즉, 다른 작용기로서 개질된 실리카와는 달리, 본 발명의 따른 복합 실리카의 경우 그 표면에, 페닐기가 다수 포함된 폴리실록산이 존재함에 따라 다수의 방향족 환을 포함하는 고분자 수지와의 상용성이 좋기 때문에 분산성이 뛰어나 많은 양의 입자가 존재하여도 필름이 뿌옇게 되지 않고 투명한 상태를 유지할 수 있고, 고분자 사이에서 폴리실록산이 표면 및 고분자 분자간을 잡아주면서 경도를 높여주는 역할을 함으로써 최종적으로 이를 포함하는 폴리이미드 필름에서 상기 범위의 헤이즈 값과 표면경도가 구현될 수 있는 것이다.In other words, unlike silica modified with other functional groups, in the case of the composite silica according to the present invention, since the polysiloxane containing a large number of phenyl groups is present on the surface thereof, compatibility with a polymer resin including a plurality of aromatic rings is good. Excellent dispersibility, even if a large amount of particles are present, the film does not become cloudy and maintains a transparent state, and polysiloxanes, which hold the surface and the intermolecular molecules between polymers, increase the hardness, thereby finally including polyimide Haze values and surface hardness in the above range can be implemented in the film.
상기 및 이하의 기재에서, 폴리이미드는 주쇄의 반복단위내에 이미드 결합을 포함하는 것으로, 이는 주쇄의 일부에 산아미드 결합(-CONH-)을 포함하는 폴리아마이드-이미드까지를 포괄하는 것으로 이해될 것이다.In the description above and below, the polyimide includes imide bonds in the repeating units of the main chain, which is understood to encompass polyamide-imides containing an acidamide bond (-CONH-) in a portion of the main chain. Will be.
실시예Example
이하, 실시예를 통하여 본 발명을 더욱 상세히 설명 하고자 한다. 이들 실시예는 오로지 본 발명을 보다 구체적으로 설명하기 위한 것으로서, 이에 의해 본 발명이 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples. These examples are only for illustrating the present invention more specifically, and the present invention is not limited thereto.
제조예 1. 실리카 입자의 제조Preparation Example 1 Preparation of Silica Particles
500ml 비이커에 에탄올 300g을 첨가하고, 여기에 실란 물질인 테트라에틸트리에톡시실란(tetraethylthoxysilane, TEOS, Si(OC2H5)4, Sigma-Aldrich) 7g을 첨가하여 상온에서 30분 동안 교반하였다. 이어서, 상기 반응기에 NH4OH 를 25g 천천히 첨가한 후, 동일 온도에서 6시간 동안 교반을 수행하였다. 반응 완료 후 얻어진 반응물을 여과한 후, 에탄올 (50ml)로 3차례 세척한 다음, 감압 하에 40℃의 오븐에서 5시간 동안 건조하여 평균 입경이 0.2㎛인 실리카 입자 [SiO2] 5g를 제조하였다. 300 g of ethanol was added to a 500 ml beaker, and 7 g of tetraethylthoxysilane (TEOS, Si (OC 2 H 5 ) 4 , Sigma-Aldrich), which is a silane material, was added thereto and stirred at room temperature for 30 minutes. Subsequently, 25 g of NH 4 OH was slowly added to the reactor, followed by stirring at the same temperature for 6 hours. After the reaction was completed, the reaction product was filtered, washed three times with ethanol (50 ml), and then dried in an oven at 40 ° C. for 5 hours under reduced pressure to prepare 5 g of silica particles [SiO 2 ] having an average particle diameter of 0.2 μm.
여기서 실리카 입자의 형상 및 크기는 TEM (Transmission Electron Microscopy, 200 kV, JEM-2000EX, JEOL, Japan)을 통하여 관찰하였고, 전기영동광산란(Electrophoretic Light Scattering) 방식의 Zeta sizer (ELS-8000,The shape and size of the silica particles were observed through TEM (Transmission Electron Microscopy, 200 kV, JEM-2000EX, JEOL, Japan), and Zeta sizer (ELS-8000, Electrophoretic Light Scattering) method.
Otsuka electronics, Japan)로 입자의 평균입경을 측정하였다.Otsuka electronics, Japan) to measure the average particle diameter of the particles.
제조예 2. 폴리실록산의 제조Preparation Example 2 Preparation of Polysiloxane
3구 플라스크에 다이페닐실란다이올 (Diphenylsilandiol, DPSD, (C6H5)2Si(OH)2, Sigma-Aldrich) 40g과 페닐트리메톡시실란 (PTMS, C6H5Si(OCH)3, Sigma-Aldrich) 40g을 교반을 통해 같이 섞은 후 80℃에서 10시간 반응시켜 중량평균 분자량이 5,000인 폴리실록산 60g을 수득하였다. 40 g of diphenylsilandiol, DPSD, (C 6 H 5 ) 2 Si (OH) 2 , Sigma-Aldrich) and phenyltrimethoxysilane (PTMS, C 6 H 5 Si (OCH) 3 , Sigma-Aldrich) 40g were mixed together through stirring and reacted at 80 ° C. for 10 hours to obtain 60g of polysiloxane having a weight average molecular weight of 5,000.
여기서 폴리실록산의 중량평균분자량(단위: g/mol)의 측정은 GPC(Gel Permeation Chromatography, ViscoTek사)를 이용하여 PS standard를 기준으로 측정하였다.Here, the weight average molecular weight (unit: g / mol) of the polysiloxane was measured based on PS standard using GPC (Gel Permeation Chromatography, ViscoTek).
제조예 3. 표면 개질 복합 실리카 제조Preparation Example 3 Preparation of Surface Modified Composite Silica
상기 제조예 1에서 얻어진 실리카 입자 5g을 에탄올 300ml에 분산 후 상기 제조예 2에서 얻어진 폴리실록산 0.5g과 NH4OH 1ml를 넣고 상온에서 12시간 반응시켜 평균 입경이 0.2인 표면 개질 복합 실리카 입자를 제조하였다. 반응 완료 후 얻어진 반응물을 여과한 후, 에탄올 (50ml)로 3차례 세척하였다.After dispersing 5 g of the silica particles obtained in Preparation Example 1 in 300 ml of ethanol, 0.5 g of polysiloxane obtained in Preparation Example 2 and 1 ml of NH 4 OH were added thereto, and reacted at room temperature for 12 hours. With an average particle diameter of 0.2 Surface modified composite silica particles were prepared. After the reaction was completed, the reaction product was filtered and washed three times with ethanol (50 ml).
이때 표면 개질 복합 실리카의 입경은 상기 실리카 입자의 평균입경 측정방법과 동일한 방법으로 측정하였다. In this case, the particle size of the surface modified composite silica was measured by the same method as the method for measuring the average particle diameter of the silica particles.
실시예 1Example 1
상기 제조예 3에서 제조된 표면 개질 복합 실리카 입자를 N,N-디메틸아세타아미드(DMAc) 100g에 0.1g(0.1wt%)을 투입한 후 Qsonica(Misonix사) 20kHz의 초음파분산기를 이용하여 분산하여 혼합 조성물을 제조하였다.0.1 g (0.1 wt%) of the surface-modified composite silica particles prepared in Preparation Example 3 was added to 100 g of N, N-dimethylacetamide (DMAc), and then dispersed using an ultrasonic dispersion machine of 20 kHz using Qsonica (Misonix). To prepare a mixed composition.
실시예 2 및 실시예 3Example 2 and Example 3
표면 개질 복합 실리카 입자의 투입량을 각각 0.5g(0.5wt%) 및 1g(1wt%)으로 한 것을 제외하고 상기 실시예 1과 동일한 방법으로 조성물을 제조하였다. The composition was prepared in the same manner as in Example 1, except that 0.5 g (0.5 wt%) and 1 g (1 wt%) of the surface-modified composite silica particles were used.
비교예 1 내지 3Comparative Examples 1 to 3
상기 제조예 3에 의해 수득된 표면 개질 복합 실리카 대신 표면이 -OH성분으로 이루어진 필러(Nippon shokubai, KE-P10, 평균 입도 0.15㎛)를 N,N-디메틸아세타아미드(DMAc) 100g에 각각 0.1g(0.1wt%), 0.5g(0.5wt%) 및 1g(1wt%) 투입한 것을 제외하고 상기 실시예 1과 동일한 방법으로 비교예 1 내지 3의 조성물을 제조하였다. Instead of the surface modified composite silica obtained in Preparation Example 3, a surface (Nippon shokubai, KE-P10, average particle size of 0.15 µm) whose surface is composed of -OH is 0.1 to 100 g of N, N-dimethylacetaamide (DMAc), respectively. The composition of Comparative Examples 1 to 3 was prepared in the same manner as in Example 1, except that g (0.1 wt%), 0.5 g (0.5 wt%), and 1 g (1 wt%) were added.
상기 실시예 1 내지 3 및 비교예 1 내지 3에서 제조된 조성물의 헤이즈(Haze)를 측정하여 하기 표 1에 기재하였다. 이때, 상기 헤이즈 측정방법은 Haze meter(Murakaml Color Research Laboratory사의 HM-150 제품)를 이용하여 ASTM D1003 기준에 의거하여 측정하였다.Haze of the compositions prepared in Examples 1 to 3 and Comparative Examples 1 to 3 were measured and described in Table 1 below. In this case, the haze measurement method was measured based on ASTM D1003 standard using a Haze meter (HM-150 manufactured by Murakaml Color Research Laboratory).
표 1
Table 1
구분 | 실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 |
표면 개질 복합 실리카 입자 또는 필러 투입양(wt%) | 0.1 | 0.5 | 1 | 0.1 | 0.5 | 1 |
헤이즈(Haze) | 0.6 | 1.5 | 2.0 | 6.9 | 14.7 | 21.6 |
division | Example 1 | Example 2 | Example 3 | Comparative Example 1 | Comparative Example 2 | Comparative Example 3 |
Surface Modified Composite Silica Particle or Filler Input (wt%) | 0.1 | 0.5 | One | 0.1 | 0.5 | One |
Haze | 0.6 | 1.5 | 2.0 | 6.9 | 14.7 | 21.6 |
헤이즈는 값이 낮을수록 필름이 투명한 것으로 해석할 수 있는데, 헤이즈 측정결과, 상기 표 1에 나타난 바와 같이, 실시예 1 내지 3의 경우 용매에 대한 표면 개질 복합 실리카입자의 우수한 분산성으로 인하여 비교예 1 내지 3에 비해 헤이즈가 현저히 낮은 것을 확인할 수 있었다.Haze value can be interpreted that the film is more transparent, haze measurement results, as shown in Table 1, in the case of Examples 1 to 3 in Comparative Examples due to the excellent dispersibility of the surface-modified composite silica particles in the solvent It was confirmed that the haze was significantly lower than 1 to 3.
실시예 4Example 4
반응기로써 교반기, 질소주입장치, 적하깔때기, 온도조절기 및 냉각기를 부착한 1L 반응기에 질소를 통과시키면서 N,N-디메틸아세타아미드(DMAc) 716g을 채운 후, 반응기의 온도를 25℃로 맞춘 후 TFDB(2,2”-bis(trifluoromethyl)biphenyl-4,4”-diamine) 57.64g(0.18mol)을 용해하여 이 용액을 25℃로 유지하였다. 여기에 6FDA(4,4’-(hexaflouroisopropyllidene)diphathalic anhydride) 23.99g(0.054mol)과 CBDA(cyclobutane-1,2,3,4-tetracarboxylic dianhydride) 7.06g(0.036mol)을 투입 후 일정 시간 동안 교반하여 용해 및 반응시켰다. 이 후 용액의 온도를 15℃로 유지한 후 TPC(terephthaloyl chloride) 18.27g(0.09mol)을 첨가하였으며, 25℃에서 12시간 반응하여 고형분의 농도가 13중량%이고, 점도가 860 poise인 폴리아믹산 용액을 얻었다.After filling with 716g of N, N-dimethylacetaamide (DMAc) while passing nitrogen through a 1L reactor equipped with a stirrer, a nitrogen injection device, a dropping funnel, a temperature controller and a cooler as a reactor, the temperature of the reactor was adjusted to 25 ° C. 57.64 g (0.18 mol) of TFDB (2,2 ”-bis (trifluoromethyl) biphenyl-4,4” -diamine) was dissolved to maintain this solution at 25 ° C. 23.99 g (0.054 mol) of 6FDA (4,4 '-(hexaflouroisopropyllidene) diphathalic anhydride) and 7.06 g (0.036 mol) of CBDA (cyclobutane-1,2,3,4-tetracarboxylic dianhydride) were added thereto and stirred for a predetermined time. Dissolved and reacted. After the solution was maintained at 15 ° C., 18.27 g (0.09 mol) of terephthaloyl chloride (TPC) was added thereto. The reaction was carried out at 25 ° C. for 12 hours to obtain a solid content of 13 wt% and a viscosity of 860 poise. A solution was obtained.
이어서 상기 수득한 폴리아믹산 용액에 피리딘 34.17g, 아세틱 안하이드라이 44.12g을 투입하여 30분 교반 후 다시 70℃에서 1시간 교반하여 상온으로 식히고, 이를 메탄올 20L로 침전시키고, 침전된 고형분을 여과하여 분쇄한 후 100℃에서 진공으로 6시간 건조하여 95g의 고형분 분말의 공중합 폴리아마이드-이미드를 얻었다.Subsequently, 34.17 g of pyridine and 44.12 g of acetic anhydride were added to the obtained polyamic acid solution, stirred for 30 minutes, and then stirred at 70 ° C. for 1 hour, cooled to room temperature, precipitated with 20 L of methanol, and the precipitated solid was filtered. The resultant was pulverized and dried in vacuo at 100 ° C. for 6 hours to obtain 95 g of copolymerized polyamide-imide of solid powder.
상기 95g의 고형분 분말의 공중합 폴리아마이드-이미드를 768g의 N,N-디메틸아세타아미드(DMAc)에 녹여서 11wt%의 용액을 얻고, 이후 제조예 3에서 얻어진 표면 개질 복합 실리카 0.95g을 넣고 섞었다. The copolymerized polyamide-imide of the 95 g solid powder was dissolved in 768 g of N, N-dimethylacetamide (DMAc) to obtain a 11 wt% solution, followed by adding 0.95 g of the surface-modified composite silica obtained in Preparation Example 3. It was.
이렇게 수득된 용액을 스테인레스판에 도포한 후 100㎛로 캐스팅하고 150℃의 열풍으로 1시간, 200℃에서 1시간, 300℃에서 30분 열풍으로 건조한 후 서서히 냉각해 판으로부터 분리하여 10㎛의 폴리아마이드-이미드 필름을 수득하였다. 이후 최종 열처리 공정으로서 다시 300℃에서 10분 동안 열처리하였다.The solution thus obtained was applied to a stainless plate, cast at 100 μm, dried for 1 hour with a hot air of 150 ° C., 1 hour at 200 ° C., and 30 minutes at 300 ° C., and then slowly cooled to separate from the plate to form a poly of 10 μm. An amide-imide film was obtained. After the final heat treatment was further heat treated at 300 ℃ for 10 minutes.
실시예 5Example 5
표면 개실 복합 실리카 입자의 양을 4.75g으로 조절한 것을 제외하고 상기 실시예 4와 동일한 방법으로 10㎛의 폴리아마이드-이미드 필름을 수득하였다.A polyamide-imide film having a thickness of 10 μm was obtained in the same manner as in Example 4, except that the amount of surface-loss composite silica particles was adjusted to 4.75 g.
비교예 4Comparative Example 4
상기 실시예 4와 동일한 방법으로 제조하되, 표면 개질 복합 실리카를 전혀 투입하지 않고 10㎛의 폴리아마이드-이미드 필름을 수득하였다.Prepared in the same manner as in Example 4, to obtain a polyamide-imide film of 10 ㎛ without any surface-modified composite silica.
비교예 5Comparative Example 5
표면 개질 복합 실리카 입자 대신 상기 비교예에서 사용된 필러(Nippon shokubai, KE-P10, 평균 입도 0.15㎛)를 0.95g 넣은 것을 제외하고 상기 실시예 4와 동일한 방법으로 10㎛ 폴리아마이드-이미드 필름을 수득하였다.A 10 μm polyamide-imide film was prepared in the same manner as in Example 4 except that 0.95 g of the filler (Nippon shokubai, KE-P10, average particle size of 0.15 μm) used in the Comparative Example was used instead of the surface-modified composite silica particles. Obtained.
비교예 6Comparative Example 6
표면 개질 복합 실리카 입자 대신 상기 비교예에서 사용된 필러(Nippon shokubai, KE-P10, 평균 입도 0.15㎛)를 0.95g 넣은 것을 제외하고 상기 실시예 4와 동일한 방법으로 10㎛ 폴리아마이드-이미드 필름을 수득하였다.A 10 μm polyamide-imide film was prepared in the same manner as in Example 4 except that 0.95 g of the filler (Nippon shokubai, KE-P10, average particle size of 0.15 μm) used in the Comparative Example was used instead of the surface-modified composite silica particles. Obtained.
상기 실시예 4 내지 5 및 비교예 4 내지 6에서 제조된 필름의 표면경도를 측정하여 표 2에 기재하였다. 상기 필름의 표면경도 측정방법은 미쯔비시 평가용 연필(UNI)로 전동식 연필경도측정기를 이용하여 1kg의 하중 180mm/min의 속도로 50mm를 5회 그은 후, 표면에 스크레치가 전혀 없는 최소 연필경도를 측정하였다.The surface hardness of the films prepared in Examples 4 to 5 and Comparative Examples 4 to 6 were measured and described in Table 2. The method of measuring the surface hardness of the film is a Mitsubishi evaluation pencil (UNI) using an electric pencil hardness tester, drawing 50 mm five times at a speed of 180 mm / min at a load of 1 kg, and then measuring the minimum pencil hardness without scratches on the surface. It was.
또한 상기 실시예 4 내지 5에서 제조된 필름의 헤이즈(Haze)를 측정하여 하기 표 2에 기재하였다. 이때, 상기 헤이즈 측정방법은 Haze meter(Murakaml Color Research Laboratory사의 HM-150 제품)를 이용하여 ASTM D1003 기준에 의거하여 측정하였다.In addition, the haze of the films prepared in Examples 4 to 5 was measured and described in Table 2 below. In this case, the haze measurement method was measured based on ASTM D1003 standard using a Haze meter (HM-150 manufactured by Murakaml Color Research Laboratory).
표 2
TABLE 2
구분 | 실시예 4 | 실시예 5 | 비교예 4 | 비교예 5 | 비교예 6 |
폴리 아마이드이미드 고형분 분말 대비 표면 개질 복합 실리카 입자 또는 필러 투입양(wt%) | 1 | 5 | 0 | 1 | 5 |
표면경도 | 2H | 3H | H | H | H |
필름의 헤이즈(%) | 0.7 | 1.8 | 측정안함 |
division | Example 4 | Example 5 | Comparative Example 4 | Comparative Example 5 | Comparative Example 6 |
Surface Modified Composite Silica Particles or Filler Charges (wt%) Compared to Polyamide-imide Solid Powders | One | 5 | 0 | One | 5 |
Surface hardness | 2H | 3H | H | H | H |
Haze of film (%) | 0.7 | 1.8 | Do not measure |
표면 경도 측정 결과, 상기 표 2에 나타난 바와 같이, 비교예 5 및 6의 경우 필러를 투입하였음에도 불구하고 비교예 4(베이스 필름)와 동등한 경도를 나타내었으나, 실시예 4 및 5의 폴리이미드는 본 발명의 따른 표면 개질 복합 실리카 입자의 영향으로 인하여 필름경도가 월등히 향상되는 것을 확인할 수 있었다.As a result of surface hardness measurement, as shown in Table 2, in Comparative Examples 5 and 6, although the filler was added, the hardness was the same as that of Comparative Example 4 (base film), but the polyimide of Examples 4 and 5 Due to the influence of the surface modified composite silica particles according to the invention it was confirmed that the film hardness is significantly improved.
또한, 헤이즈 측정결과 실리카 입자를 첨가하였음에도 필름 자체의 헤이즈가 크게 증가되지 않았음을 확인할 수 있었다. In addition, it was confirmed that the haze of the film itself did not increase significantly even when the silica particles were added as a result of the haze measurement.
Claims (13)
- 폴리실록산으로 그 표면이 개질된 실리카 입자이며, Silica particles whose surface is modified with polysiloxane,폴리실록산은 하기 화학식 1로 표시되는 화합물 단독 또는 하기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로, 측쇄에 페닐기를 포함하는 것인 표면 개질 복합 실리카. Polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), the surface-modified composite silica containing a phenyl group in the side chain.[화학식 1][Formula 1][화학식 2][Formula 2]상기 화학식 1 또는 2에서 R은 각각 H, 할로겐 원자, 할로겐 원자로 치환 또는 치환되지 않은 1 내지 6의 알콕시기 및 이들의 조합으로 구성된 군에서 선택된 같거나 서로 다른 1종이다. 또한, 상기 R1는 규소에 벤젠 고리의 탄소가 직접 연결되어 있는 단일결합, 탄소수 1 내지 8의 알킬렌기, 탄소수 3 내지 12의 알케닐렌기, 탄소수 3 내지 12의 할로알케닐렌기, 탄소수 3 내지 8의 알키닐렌기 및 이들의 조합으로 구성된 군에서 선택되는 1종이다.R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof. In addition, R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
- 제 1 항에 있어서,The method of claim 1,상기 폴리실록산은 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5 중량비로 혼합한 혼합물의 중합물인 것을 특징으로 하는 표면 개질 복합 실리카. The polysiloxane is a surface modified composite silica, characterized in that the mixture of a mixture of the compound represented by the formula (1) and the compound represented by the formula (2) in a 1: 1 to 1: 5 weight ratio.
- 제 1 항에 있어서,The method of claim 1,상기 폴리실록산은 중량평균 분자량이 1,000 내지 10,000인 것을 특징으로 하는 표면 개질 복합 실리카.The polysiloxane has a weight average molecular weight of 1,000 to 10,000, characterized in that the surface modified composite silica.
- 제 1 항에 있어서,The method of claim 1,상기 표면 개질 복합실리카는 평균 입경이 0.1 내지 50㎛인 표면 개질 복합 실리카.The surface modified composite silica has an average particle diameter of 0.1 to 50㎛ surface modified composite silica.
- 제 1 항에 있어서,The method of claim 1,상기 폴리실록산은 그 함량이 실리카 입자 100중량부 기준 0.1 내지 10 중량부인 것을 특징으로 하는 표면 개질 복합 실리카.The polysiloxane has a surface modified composite silica, characterized in that the content of 0.1 to 10 parts by weight based on 100 parts by weight of silica particles.
- 폴리이미드 수지 및 실리카 입자를 포함하고, Polyimide resin and silica particles,실리카 입자는 폴리실록산으로 그 표면이 개질된 표면 개질 복합 실리카 입자이며, 폴리실록산은 하기 화학식 1로 표시되는 화합물 단독 또는 하기 화학식 2로 표시되는 화합물과의 혼합물의 중합물로, 측쇄에 페닐기를 포함하는 것인, 폴리이미드 필름. The silica particles are surface modified composite silica particles whose surfaces are modified with polysiloxane, and the polysiloxane is a polymer of a compound represented by the following formula (1) or a mixture with a compound represented by the following formula (2), wherein the side chain contains a phenyl group. , Polyimide film.[화학식 1][Formula 1][화학식 2][Formula 2]상기 화학식 1 또는 2에서 R은 각각 H, 할로겐 원자, 할로겐 원자로 치환 또는 치환되지 않은 1 내지 6의 알콕시기 및 이들의 조합으로 구성된 군에서 선택된 같거나 서로 다른 1종이다. 또한, 상기 R1는 규소에 벤젠 고리의 탄소가 직접 연결되어 있는 단일결합, 탄소수 1 내지 8의 알킬렌기, 탄소수 3 내지 12의 알케닐렌기, 탄소수 3 내지 12의 할로알케닐렌기, 탄소수 3 내지 8의 알키닐렌기 및 이들의 조합으로 구성된 군에서 선택되는 1종이다.R in Formula 1 or 2 is the same or different from each other selected from the group consisting of H, a halogen atom, a substituted or unsubstituted 1 to 6 alkoxy groups and combinations thereof. In addition, R 1 is a single bond in which carbon of the benzene ring is directly connected to silicon, an alkylene group having 1 to 8 carbon atoms, an alkenylene group having 3 to 12 carbon atoms, a haloalkenylene group having 3 to 12 carbon atoms, and having 3 to 3 carbon atoms. It is 1 type chosen from the group which consists of an alkynylene group of 8, and its combination.
- 제 6 항에 있어서,The method of claim 6,상기 폴리실록산은 상기 화학식 1로 표시되는 화합물과 상기 화학식 2로 표시되는 화합물을 1:1 내지 1:5 중량비로 혼합한 혼합물의 중합물인 것을 특징으로 하는 폴리이미드 필름. The polysiloxane is a polyimide film, characterized in that the mixture of a mixture of the compound represented by the formula (1) and the compound represented by the formula (2) in a 1: 1 to 1: 5 weight ratio.
- 제 6 항에 있어서,The method of claim 6,상기 폴리실록산은 중량평균 분자량이 1,000 내지 10,000인 것을 특징으로 하는 폴리이미드 필름. The polysiloxane has a weight average molecular weight of 1,000 to 10,000, characterized in that the polyimide film.
- 제 6 항에 있어서,The method of claim 6,상기 표면 개질 복합실리카는 평균 입경이 0.1 내지 50㎛인 폴리이미드 필름. The surface modified composite silica has an average particle diameter of 0.1 to 50㎛ polyimide film.
- 제 6 항에 있어서,The method of claim 6,상기 표면 개질 복합 실리카는 폴리실록산을 실리카 입자 100중량부 기준 0.1 내지 10 중량부로 포함하는 것을 특징으로 하는 폴리이미드 필름. The surface-modified composite silica polysiloxane film, characterized in that containing 0.1 to 10 parts by weight of polysiloxane based on 100 parts by weight of silica particles.
- 제 6 항에 있어서,The method of claim 6,폴리이미드 수지 100중량부에 대하여 표면 개질 복합 실리카 입자를 1 내지 10중량부로 포함하는 것을 특징으로 하는 폴리이미드 필름. A polyimide film comprising 1 to 10 parts by weight of surface modified composite silica particles based on 100 parts by weight of polyimide resin.
- 제 6 항에 있어서,The method of claim 6,상기 폴리이미드 필름은 헤이즈(Haze)값이 ASTM D1003 기준 0.5 내지 2.0 인 것을 특징으로 하는 폴리이미드 필름.The polyimide film has a haze value of 0.5 to 2.0 based on ASTM D1003.
- 제 6 항에 있어서,The method of claim 6,상기 폴리이미드 필름은 표면 경도가 연필경도 측정(하중 1kg의 하중 속도 180mm/min)기준 2H 내지 3H 인 것을 특징으로 하는 폴리이미드 필름.The polyimide film is a polyimide film, characterized in that the surface hardness is 2H to 3H based on pencil hardness measurement (load speed 180mm / min load 1kg).
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