+

WO2013068198A3 - Particle trap for euv source - Google Patents

Particle trap for euv source Download PDF

Info

Publication number
WO2013068198A3
WO2013068198A3 PCT/EP2012/070279 EP2012070279W WO2013068198A3 WO 2013068198 A3 WO2013068198 A3 WO 2013068198A3 EP 2012070279 W EP2012070279 W EP 2012070279W WO 2013068198 A3 WO2013068198 A3 WO 2013068198A3
Authority
WO
WIPO (PCT)
Prior art keywords
particle trap
hub
blades
euv source
anchoring portion
Prior art date
Application number
PCT/EP2012/070279
Other languages
French (fr)
Other versions
WO2013068198A2 (en
Inventor
Ivo Vanderhallen
Johannes Franken
Robert LANSBERGEN
Lambertus VAN DEN WILDENBERG
Original Assignee
Asml Netherlands B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B.V. filed Critical Asml Netherlands B.V.
Publication of WO2013068198A2 publication Critical patent/WO2013068198A2/en
Publication of WO2013068198A3 publication Critical patent/WO2013068198A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)

Abstract

There is disclosed a particle trap for a plasma EUV radiation source, a lithography apparatus comprising a particle trap and a device manufacturing method. In an embodiment, the particle trap includes a rotatable hub (44), and a plurality of blades (58) extending outwards from the hub. Each of the blades has an end anchoring portion (66) inserted into a complementary slot (68) in the hub, the end anchoring portion and slot being configured to hold the blades within the hub during rotation of the hub.
PCT/EP2012/070279 2011-11-10 2012-10-12 Particle trap for euv source WO2013068198A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161558203P 2011-11-10 2011-11-10
US61/558,203 2011-11-10

Publications (2)

Publication Number Publication Date
WO2013068198A2 WO2013068198A2 (en) 2013-05-16
WO2013068198A3 true WO2013068198A3 (en) 2013-10-03

Family

ID=47046589

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/070279 WO2013068198A2 (en) 2011-11-10 2012-10-12 Particle trap for euv source

Country Status (2)

Country Link
TW (1) TW201319763A (en)
WO (1) WO2013068198A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10495987B2 (en) * 2017-09-28 2019-12-03 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070023693A1 (en) * 2004-12-28 2007-02-01 Asml Netherlands B.V. Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
US20080309893A1 (en) * 2007-06-12 2008-12-18 Asml Netherlands B.V. Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
US20090045357A1 (en) * 2006-03-29 2009-02-19 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US20090073401A1 (en) * 2007-09-14 2009-03-19 Asml Netherlands B.V. Lithographic apparatus with rotation filter device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070023693A1 (en) * 2004-12-28 2007-02-01 Asml Netherlands B.V. Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
US20090045357A1 (en) * 2006-03-29 2009-02-19 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US20080309893A1 (en) * 2007-06-12 2008-12-18 Asml Netherlands B.V. Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
US20090073401A1 (en) * 2007-09-14 2009-03-19 Asml Netherlands B.V. Lithographic apparatus with rotation filter device

Also Published As

Publication number Publication date
WO2013068198A2 (en) 2013-05-16
TW201319763A (en) 2013-05-16

Similar Documents

Publication Publication Date Title
EP3264179A4 (en) Measurement device, lithography system and exposure device, and management method, superposition measurement method and device manufacturing method
IL266509B (en) Metrology method and apparatus, substrate, lithographic system and device manufacturing method
BR112013023264A2 (en) treatment planning system for the generation of patient-specific treatment margins, method and radiation therapy system.
EP2750165A4 (en) Electron beam lithography device and lithographic method
EP3065165A4 (en) Substrate-holding apparatus, exposure apparatus, and device manufacturing method
BRPI1011676A2 (en) method for reducing the magnitude of one or more harmonics of one or more uniformity parameters in a cured tire; and, uniformity correction system.
EP3001451A4 (en) Substrate holding method, substrate holding apparatus, exposure method, and exposure apparatus
IL245318A0 (en) Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
IL226055A0 (en) Metrology method and apparatus, lithographic system and device manufacturing method
HK1198786A1 (en) Method for a secured backup and restore of configuration data of an end-user device, and device using the method
WO2010127296A3 (en) Decontamination apparatus
EP3264030A4 (en) Measurement device, lithography system and exposure device, and device manufacturing method
PL2866246T3 (en) Vacuum coating and plasma treatment system, and method for coating a substrate
EP3011315A4 (en) Apparatus, devices and methods for obtaining omnidirectional viewing by a catheter
IL217843A (en) Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
SG11201402442UA (en) A method of generation and transmission of secure tokens based on tokens generated by trng and split into shares and the system thereof
BR112013015440A2 (en) method, and system for operating a printing device, and method for operating a capable printing device without application
EP2777766A4 (en) Particle beam treatment system, and beam position correction method therefor
BR112014002754A2 (en) method, system and apparatus for managing a football match
IL233540A0 (en) Device, lithographic apparatus, method for guiding radiation and device manufacturing method
EP2649526A4 (en) Server management apparatus, server management method, and program
EP2693458A4 (en) Method for correcting mask for euv exposure, and mask for euv exposure
EP2669931A4 (en) Driving system and driving method, light exposure device and light exposure method, and driving system designing method
BRPI0923371A2 (en) Loading devices for particle loading means the method for loading particles using a loading device.
EP2716223A4 (en) Device and method for acquiring radiation exposure level, and program

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12775222

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 12775222

Country of ref document: EP

Kind code of ref document: A2

点击 这是indexloc提供的php浏览器服务，不要输入任何密码和下载