WO2013061967A1 - Transparent conductive film and organic electroluminescent element - Google Patents

Abstract

Provided is a transparent conductive film which has excellent transparency, electrical conductivity and film strength and is suppressed in deterioration of the transparency, electrical conductivity and film strength even in a high-temperature high-humidity environment. A transparent conductive film (1) has a transparent second conductive layer (13), which is composed of an organic compound layer, on a transparent base (11). The organic compound layer is formed by applying and drying a dispersion liquid that contains a conductive polymer compound and a dissociative group-containing self-dispersible polymer that is dispersible in an aqueous solvent. In the dispersion liquid, the average particle diameter of particles that contain the conductive polymer compound and the dissociative group-containing self-dispersible polymer is 5-100 nm.

Description

Transparent conductive film and organic electroluminescence device

The present invention uses a transparent conductive film that can be suitably used in various fields such as a liquid crystal display element, an organic light emitting element, an inorganic electroluminescent element, a solar cell, an electromagnetic wave shield, electronic paper, and a touch panel, and the transparent conductive film. The present invention relates to an organic electroluminescence element (hereinafter also referred to as an organic EL element).

In recent years, various types of display technologies such as liquid crystal, plasma, organic electroluminescence, field emission, etc. have been developed in response to increasing demand for flat-screen TVs. In any of these displays with different display methods, the transparent electrode is an essential constituent technology. In addition, transparent electrodes are an indispensable technical element in touch panels other than televisions, mobile phones, electronic paper, various solar cells, various electroluminescence light control devices, and the like.

Conventionally, as transparent electrodes, ITO transparent electrodes in which an indium-tin composite oxide (ITO) film is formed on a transparent substrate such as glass or transparent plastic film by vacuum deposition or sputtering are mainly used. It has been. However, indium used in ITO is a rare metal and removal of indium is desired due to the rising price. In addition, with an increase in display screen and productivity, a roll-to-roll production technique using a flexible substrate is desired.

In recent years, a transparent electrode such as a conductive polymer has been laminated on a thin metal wire formed in a pattern so that it can be used for products that require such a large area and low resistance. A transparent conductive film having both properties has been developed (see, for example, Patent Documents 1 and 2).

However, in such a configuration, it is necessary to smooth the unevenness of the fine metal wires that cause leakage of the organic electronic device with a transparent electrode such as a conductive polymer, and it is essential to increase the thickness of the conductive polymer. However, since the conductive polymer has absorption in the visible light region, there is a problem that the transparency of the transparent electrode is remarkably lowered when the film is thickened.

As a method for achieving both conductivity and transparency, a technique of laminating a conductive polymer on a thin wire structure (for example, see Patent Document 3), a binder that can be uniformly dispersed in a conductive polymer and an aqueous solvent on a conductive fiber. A technique using a resin (for example, see Patent Document 4) and a technique for laminating a conductive polymer and a binder on a conductive layer are disclosed (for example, see Patent Document 5).

JP 2005-302508 A JP 2009-87843 A JP 2009-4348 A JP 2010-244746 A JP 2011-96437 A

However, even with these techniques, sufficient sheet resistance and transmittance cannot be obtained, and it is difficult to achieve both physical properties. In addition, in the technique described in Patent Document 5, a high drying temperature and a long drying time are required to sufficiently advance the crosslinking reaction, which not only increases the process load, There was a problem that the reaction-derived desorbents adversely affected the transparent electrode and the organic EL device during storage, and the desired storage performance could not be obtained. Furthermore, when a polymer having a low glass transition temperature is used as the material constituting the transparent electrode, the surface smoothness of the transparent electrode cannot be obtained, and the performance of the transparent electrode and the organic EL element after the environmental test is deteriorated. there were.

The present invention has been made in view of the above problems, and is excellent in transparency, conductivity and film strength, and also has a transparent conductive film with little deterioration in transparency, conductivity and film strength even under high temperature and high humidity environments, Another object of the present invention is to provide an organic EL element that uses the conductive film and has excellent light emission uniformity, little deterioration in light emission uniformity even in a high temperature and high humidity environment, and excellent light emission life.

The above-described problems of the present invention are solved by the following configuration.
1. A transparent conductive film having an organic compound layer on a transparent substrate, wherein the organic compound layer contains a conductive polymer compound and a self-dispersing polymer containing a dissociable group dispersible in an aqueous solvent. The dispersion is formed by coating and drying, and the average particle size of the dispersion containing the conductive polymer compound and the dissociable group-containing self-dispersing polymer is 5 to 100 nm. A transparent conductive film.

2. A first conductive layer made of a metal material formed in a pattern on the substrate, and a transparent layer made of the organic compound layer formed on the substrate and electrically connected to the first conductive layer. The transparent conductive film according to 1 above, comprising a second conductive layer.

3. 3. The transparent conductive film as described in 1 or 2 above, wherein the dissociable group-containing self-dispersing polymer has a glass transition temperature of 25 ° C. or higher and 80 ° C. or lower.

4). An organic electroluminescence device comprising the transparent conductive film according to any one of 1 to 3 as an electrode.

According to the present invention, the transparency, conductivity and film strength are excellent, and the transparent conductive film with little deterioration of transparency, conductivity and film strength even under high temperature and high humidity environment, and the transparent conductive film, It is possible to provide an organic EL element that is excellent in light emission uniformity, has little deterioration in light emission uniformity even under a high temperature and high humidity environment, and has an excellent light emission lifetime.

It is the schematic which shows an example of the transparent conductive film which concerns on embodiment of this invention, (a) is a top view, (b) is X arrow sectional drawing of (a).

Conventionally, as a coating liquid for forming a transparent conductive film, a water-dispersible conductive polymer such as 3,4-polyethylenedioxythiophene polysulfonate (PEDOT / PSS) and a binder resin are used in order to achieve both conductivity and transmittance. Compositions containing these have been developed.

As such a binder resin, a hydrophilic binder resin has been studied from the viewpoint of compatibility with a water-dispersible conductive polymer. However, there is an increasing demand for flexibility for transparent substrates, and when a resin film such as polyethylene terephthalate is used as the substrate, the drying temperature is lower than that of a glass substrate from the viewpoint of avoiding film deformation. Become. In addition, the hydroxyl group-containing binder resin that is known to be compatible with PEDOT / PSS undergoes a dehydration reaction under acidic conditions and crosslinks between polymer chains. As a result, the cross-linking reaction progressed during storage and water was generated, and the transparent conductive film and the device performance using the transparent conductive film were significantly deteriorated due to the residual water in the film. In order to solve this problem, it was necessary to reduce the interaction between the main skeleton of the binder and water, and further reduce or eliminate the number of hydroxyl groups in the binder resin. In addition, when a dispersion liquid in which a hydrophobic polymer is uniformly dispersed in an aqueous solvent using a surfactant is used, the transparent conductive film and device performance using the transparent conductive film are adversely affected. Furthermore, when a polymer dispersible in an aqueous solvent having an average particle size of 100 nm or more is used, the film surface after coating and drying becomes rough, and then the performance of the organic electroluminescence device produced by laminating an organic layer is deteriorated. there were.

As a result of intensive studies to improve these phenomena, the present inventors have used a self-dispersing polymer containing a dissociable group dispersible in an aqueous solvent (dissociable group-containing self-dispersing polymer), and coating. The composition of the present invention has been reached in which the average particle size in the dispersion of the conductive polymer compound that forms the organic layer after drying and the self-dispersing polymer is 5 to 100 nm.

That is, the object of the present invention is to use a dissociable group-containing self-dispersing polymer as a binder resin mixed with a conductive polymer, and to determine the average particle size of the conductive polymer compound and the self-dispersing polymer in the dispersion. It has been found that the problem can be solved by setting the thickness to 5 to 100 nm, and the present invention has been achieved.

The present invention uses a dissociable group-containing self-dispersing polymer as a binder resin, and the average particle size of a dispersion containing a conductive polymer compound and a self-dispersing polymer is 5 to 100 nm. The transparency and conductivity of the transparent conductive film are compatible, and the film strength is excellent, and it has both high conductivity, transparency and good film strength even after environmental testing under high temperature and high humidity environment. It has been found that by suppressing the generation of water, a transparent conductive film excellent in stability and a long-life organic EL element using the transparent conductive film can be obtained.

Hereinafter, embodiments of the present invention will be described. 1A and 1B are schematic views illustrating an example of a transparent conductive film according to an embodiment of the present invention, in which FIG. 1A is a top view and FIG. 1B is a cross-sectional view taken along the arrow X in FIG.

As shown in FIG. 1, the transparent conductive film 1 according to the embodiment of the present invention includes a base material 11, a first conductive layer 12, and a second conductive layer 13. The first conductive layer 12 is made of a metal material formed in a pattern, and the second conductive layer 13 contains a conductive polymer and a self-dispersing polymer containing a dissociable group dispersible in an aqueous solvent. A feature of the present invention is that the second conductive layer 13 contains a dissociable group-containing self-dispersing polymer that can be dispersed in an aqueous solvent.

[Dispersion made of conductive polymer compound and self-dispersing polymer containing dissociable group]
The present invention is a transparent conductive film 1 having, as a second conductive layer 13, a transparent conductive layer having a conductive polymer and a binder resin on a transparent substrate 11, wherein the self-dispersing polymer containing a dissociable group is used as the binder resin. And the average particle size of the dispersion composed of the conductive polymer compound and the self-dispersing polymer is 5 to 100 nm.

The dispersion comprising the conductive polymer compound and the dissociable group-containing self-dispersing polymer according to the present invention comprises a conductive polymer compound dispersed in an aqueous solvent and a dissociable group-containing self-dispersible type dispersible in the aqueous solvent. It consists of a polymer. The aqueous solvent is not only pure water (including distilled water and deionized water), but also an aqueous solution containing acid, alkali, salt, etc., a water-containing organic solvent, or a hydrophilic organic solvent. Examples of the aqueous solvent include pure water (including distilled water and deionized water), alcohol solvents such as methanol and ethanol, and mixed solvents of water and alcohol.

The dispersion according to the present invention is preferably transparent, and is not particularly limited as long as it is a medium for forming a film. In addition, there is no particular limitation as long as there is no problem in the bleed out to the surface of the transparent conductive film 1 and the element performance when the organic EL element is laminated, but the dispersion is not limited to a surfactant (emulsifier) or a structure that assists micelle formation. It is preferable not to include a plasticizer or the like for controlling the film temperature.

The pH of the dispersion according to the present invention is not particularly problematic as long as desired conductivity is obtained, but is preferably 0.1 to 7.0, more preferably 0.3 to 5.0.

In order to control the surface tension of the dispersion according to the present invention, an organic solvent may be added to the dispersion. The organic solvent is not particularly limited as long as a desired surface tension can be obtained, but a monovalent, divalent or polyvalent alcohol solvent is preferable. The boiling point of the organic solvent is preferably 200 ° C. or lower, more preferably 150 ° C. or lower.

The average particle size of the particles containing the conductive polymer compound and the dissociable group-containing self-dispersing polymer contained in the dispersion according to the present invention is preferably 5 to 100 nm, more preferably 10 to 50 nm. It is. When the average particle size of the dispersion is less than 5 nm, the particles are adsorbed and bonded to each other, so that aggregates are easily formed and the stability of the dispersion may be deteriorated. In addition, when the average particle size of the dispersion exceeds 100 nm, the average roughness of the film surface after coating and drying may be deteriorated, and the performance of the organic electroluminescence device produced by stacking the organic layers may be deteriorated thereafter. is there. When the average particle size of the dispersion is 10 to 50 nm, the particle stability of the dispersion is good and the haze value, which is one of the optical performances of the transparent conductive film 1, is good. Even if the average particle size is controlled, if the film-forming temperature of the dissociable group-containing self-dispersing polymer used is too high, the film shape remains without being formed within the drying temperature and the average roughness of the film surface remains. Therefore, it is desirable to control the film forming temperature.

Examples of a method for setting the average particle size of the dispersion to a desired range include a homogenizer, an ultrasonic disperser (US disperser), a dispersion technique using a ball mill, a reverse osmosis membrane, an ultrafiltration membrane, and a microfiltration membrane. The classification of the used particles can be used. Dispersion techniques using a homogenizer, an ultrasonic disperser (US disperser), a ball mill, etc. are all likely to increase in particle size at high temperatures. Therefore, the temperature of the dispersion during the dispersion operation is preferably 3 to 50. ° C, more preferably 5 to 30 ° C. When the temperature of the dispersion during the dispersion operation is less than 3 ° C., water as the composition solvent is solidified. Further, when the temperature of the dispersion during the dispersion operation exceeds 50 ° C., partial dedoping and decomposition of the conductive polymer compound in the dispersion gradually proceeds, and the conductivity may be deteriorated. In addition, when the temperature of the dispersion during the dispersion operation is 5 to 30 ° C., changes in physical properties such as particle diameter, conductivity, and transmittance accompanying the dispersion operation are relatively small. Classification is not particularly limited as long as a membrane to be used is selected as necessary.

The dissociable group-containing self-dispersing polymer particles and the conductive polymer particles in the dispersion according to the present invention are in a state in which each particle is dispersed independently and the particle size is the sum of the particle sizes. The particles having different compositions may be aggregated. Further, particles having different compositions may be partially mixed during the dispersion operation, or may be completely mixed to form particles.

The use amount (solid content) of the dissociable group-containing self-dispersing polymer is preferably 50 to 1000% by mass, more preferably 100 to 900% by mass, and still more preferably based on the solid content of the conductive polymer. Is from 200 to 800% by weight.

The particle size measurement method of the dispersion according to the present invention is not particularly limited, but is preferably a dynamic light scattering method, a laser diffraction method or an image imaging method, and more preferably a dynamic light scattering method. The self-dispersing polymer particles and conductive polymer particles containing a dissociable group do not use a surfactant, and the particle size becomes unstable by dilution, so that the measurement can be performed without dilution with a solvent. A concentrated particle size measuring device is preferable, and examples of the concentrated particle size measuring device include a concentrated particle size analyzer (manufactured by Otsuka Electronics Co., Ltd.), the Zetasizer Nano series (manufactured by Malvern), and the like.

[Dissociable group-containing self-dispersing polymer]
In the present invention, the dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent does not contain a surfactant or an emulsifier that assists micelle formation, and can be dispersed in an aqueous solvent by itself. In the present invention, “dispersible in an aqueous solvent” means that colloidal particles made of a binder resin are dispersed in the aqueous solvent without agglomeration. The size of the colloidal particles is generally about 0.001 to 1 μm (1 to 1000 μm). The size of the colloidal particles is preferably 3 to 500 nm, more preferably 5 to 300 nm, and still more preferably 10 to 100 nm. When the colloidal particles are large (when the colloidal particles are larger than 500 nm), the smoothness deteriorates when forming a film using the colloidal particles. In addition, when the colloidal particles are extremely small (smaller than 3 nm), there are limitations on the production of the colloidal particles and the cost is increased. The size of the colloidal particles is measured with a light scattering photometer. be able to.

The aqueous solvent is not only pure water (including distilled water and deionized water), but also an aqueous solution containing acid, alkali, salt, etc., a water-containing organic solvent, or a hydrophilic organic solvent. Examples of the aqueous solvent include pure water (including distilled water and deionized water), alcohol solvents such as methanol and ethanol, and mixed solvents of water and alcohol.

The dissociable group-containing self-dispersing polymer according to the present invention is preferably transparent. The dissociable group-containing self-dispersing polymer is not particularly limited as long as it is a medium that forms a film. In addition, there is no particular limitation as long as there is no problem in the bleed out to the surface of the transparent conductive film 1 and the element performance when the organic EL element is laminated, but the polymer dispersion controls the surfactant (emulsifier) and the film forming temperature. It is preferable not to contain a plasticizer or the like.

The average particle size of the dissociable group-containing self-dispersing polymer according to the present invention is 5 to 100 nm.

The glass transition temperature (Tg) of the dissociable group-containing self-dispersing polymer according to the present invention is preferably 25 to 80 ° C., more preferably 50 to 70 ° C. When Tg is less than 25 ° C., the surface smoothness of the transparent conductive film 1 is difficult to improve, and the performance of the organic EL element including the transparent conductive film 1 and the transparent conductive film 1 after an environmental test is likely to deteriorate. . On the other hand, when the temperature exceeds 80 ° C., the melting of the dissociable group-containing self-dispersing polymer particles does not sufficiently proceed at the drying temperature during the production of the transparent conductive film 1, and as a result, a uniform film cannot be obtained. Or it may cause the surface smoothness to deteriorate and may cause leakage of the organic EL element. Moreover, the haze value which is one of the optical performances of the transparent conductive film 1 is also deteriorated. On the other hand, when Tg is 50 to 70 ° C., melting of the dissociable group-containing self-dispersing polymer particles sufficiently proceeds at the drying temperature when the transparent conductive film 1 is produced. The glass transition temperature Tg can be measured according to JIS K7121 (1987) using a differential scanning calorimeter (DSC-7 model manufactured by Perkin Elmer) at a heating rate of 20 ° C./min.

The pH of the dispersion of the dissociable group-containing self-dispersing polymer used for the production of the transparent conductive film 1 is preferably 0.1 to 11.0 from the viewpoint of not separating from the conductive polymer solution to be separately compatible, More preferably, it is 3.0 to 9.0, and still more preferably 4.0 to 7.0.

Examples of the dissociable group used in the self-dispersing polymer containing a dissociable group include an anionic group (sulfonic acid and its salt, carboxylic acid and its salt, phosphoric acid and its salt, etc.), and a cationic group (ammonium salt, etc.). Etc. The dissociable group is not particularly limited, but an anionic group is preferable from the viewpoint of compatibility with the conductive polymer solution. The amount of the dissociable group is not particularly limited as long as the self-dispersing polymer can be dispersed in the aqueous solvent, and is preferably as small as possible because the drying load is reduced in a suitable manner in the process. The counter species used for the anionic group and the cationic group are not particularly limited, but are hydrophobic and small in amount from the viewpoint of performance when the organic EL device including the transparent conductive film 1 and the transparent conductive film 1 is laminated. It is preferable that

The main skeleton of the dissociable group-containing self-dispersing polymer includes polyethylene, polyethylene-polyvinyl alcohol (PVA), polyethylene-polyvinyl acetate, polyethylene-polyurethane, polybutadiene, polybutadiene-polystyrene, polyamide (nylon), polyvinylidene chloride, polyester. , Polyacrylate, polyacrylate-polyester, polyacrylate-polystyrene, polyvinyl acetate, polyurethane-polycarbonate, polyurethane-polyether, polyurethane-polyester, polyurethane-polyacrylate, silicone, silicone-polyurethane, silicone-polyacrylate, polyvinylidene fluoride -Polyacrylate, polyfluoroolefin-polyvinyl ether and the like. Further, based on these skeletons, copolymerization using another monomer may be the main skeleton. Among these, a polyester resin emulsion having an ester skeleton, a polyester-acrylic resin emulsion, and a polyethylene resin emulsion having an ethylene skeleton are preferable.

As commercial products, Polysol FP3000 (polyester resin, anion, core: acrylic, shell: polyester, manufactured by Showa Denko KK), Vironal MD1480 (polyester resin, anion, manufactured by Toyobo Co., Ltd.), Vironal MD1245 (polyester resin, anion, Toyobo Co., Ltd.) ), Bironal MD1500 (polyester resin, anion, manufactured by Toyobo Co., Ltd.), Bironal MD2000 (polyester resin, anion, manufactured by Toyobo Co., Ltd.), Bironal MD1930 (polyester resin, anion, manufactured by Toyobo Co., Ltd.), Plus Coat RZ105 (polyester resin, anion) Plus Coat RZ570 (polyester resin, anion, manufactured by Tatemono Chemical Co., Ltd.), Plus Coat RZ571 (polyester resin, anion, manufactured by Tatemono Chemical Co., Ltd.) Hitech S-9242 (polyethylene resin, anion, manufactured by Toho Chemical Co., Ltd.), Movinyl 7720 (acrylic resin, nonion, manufactured by Nippon Synthetic Chemical Co., Ltd.), Movinyl 7820 (acrylic resin, nonion, manufactured by Nippon Synthetic Chemical Co., Ltd.) can be used. . Further, the dissociable group-containing self-dispersing polymer may contain one kind of those described above, or may contain a plurality of kinds.

<Conductive polymer>
In the present invention, “conductive” refers to a state in which electricity flows, and the sheet resistance measured by a method in accordance with JIS K 7194 “Resistivity Test Method by Conductive Plastic Four-Probe Method” is 1 ×. It means lower than 10 ⁸ Ω / □.
In the present invention, the conductive polymer is a conductive polymer having a π-conjugated conductive polymer and a polyanion. Such a conductive polymer can be easily produced by chemical oxidative polymerization of a precursor monomer that forms a π-conjugated conductive polymer, which will be described later, in the presence of an appropriate oxidizing agent and an oxidation catalyst, and a poly anion, which will be described later. can do.

(Π-conjugated conductive polymer)
In the present invention, the π-conjugated conductive polymer is not particularly limited, and includes polythiophenes (including basic polythiophenes, the same applies hereinafter), polypyrroles, polyindoles, polycarbazoles, polyanilines, polyacetylenes, polyfurans. , Polyparaphenylene vinylenes, polyazulenes, polyparaphenylenes, polyparaphenylene sulfides, polyisothianaphthenes, or polythiazyl chain conductive polymers can be used. Among these, polythiophenes or polyanilines are preferable from the viewpoint of conductivity, transparency, stability, and the like, and polyethylenedioxythiophene is most preferable.

(Π-conjugated conductive polymer precursor monomer)
In the present invention, a precursor monomer used for forming a π-conjugated conductive polymer has a π-conjugated system in the molecule, and even when polymerized by the action of an appropriate oxidizing agent, A π-conjugated system is formed. Examples of such precursor monomers include pyrroles and derivatives thereof, thiophenes and derivatives thereof, anilines and derivatives thereof, and the like.

Specific examples of the precursor monomer include pyrrole, 3-methylpyrrole, 3-ethylpyrrole, 3-n-propylpyrrole, 3-butylpyrrole, 3-octylpyrrole, 3-decylpyrrole, 3-dodecylpyrrole, 3, 4-dimethylpyrrole, 3,4-dibutylpyrrole, 3-carboxylpyrrole, 3-methyl-4-carboxylpyrrole, 3-methyl-4-carboxyethylpyrrole, 3-methyl-4-carboxybutylpyrrole, 3-hydroxypyrrole 3-methoxypyrrole, 3-ethoxypyrrole, 3-butoxypyrrole, 3-hexyloxypyrrole, 3-methyl-4-hexyloxypyrrole, thiophene, 3-methylthiophene, 3-ethylthiophene, 3-propylthiophene, 3 -Butylthiophene, 3-hexyl Offene, 3-heptylthiophene, 3-octylthiophene, 3-decylthiophene, 3-dodecylthiophene, 3-octadecylthiophene, 3-bromothiophene, 3-chlorothiophene, 3-iodothiophene, 3-cyanothiophene, 3-phenyl Thiophene, 3,4-dimethylthiophene, 3,4-dibutylthiophene, 3-hydroxythiophene, 3-methoxythiophene, 3-ethoxythiophene, 3-butoxythiophene, 3-hexyloxythiophene, 3-heptyloxythiophene, 3- Octyloxythiophene, 3-decyloxythiophene, 3-dodecyloxythiophene, 3-octadecyloxythiophene, 3,4-dihydroxythiophene, 3,4-dimethoxythiophene, 3,4-diethoxythio , 3,4-dipropoxythiophene, 3,4-dibutoxythiophene, 3,4-dihexyloxythiophene, 3,4-diheptyloxythiophene, 3,4-dioctyloxythiophene, 3,4-didecyl Oxythiophene, 3,4-didodecyloxythiophene, 3,4-ethylenedioxythiophene, 3,4-propylenedioxythiophene, 3,4-butenedioxythiophene, 3-methyl-4-methoxythiophene, 3- Methyl-4-ethoxythiophene, 3-carboxythiophene, 3-methyl-4-carboxythiophene, 3-methyl-4-carboxyethylthiophene, 3-methyl-4-carboxybutylthiophene, aniline, 2-methylaniline, 3- Isobutylaniline, 2-anilinesulfonic acid, 3-anili Sulfonic acid and the like.

(Poly anion)
In the present invention, the poly anion used for the conductive polymer is substituted or unsubstituted polyalkylene, substituted or unsubstituted polyalkenylene, substituted or unsubstituted polyimide, substituted or unsubstituted polyamide, substituted or unsubstituted. Polyester and any of these copolymers, which are composed of a structural unit having an anionic group and a structural unit having no anionic group.

This poly anion is a solubilized polymer that solubilizes the π-conjugated conductive polymer in a solvent. The anion group of the polyanion functions as a dopant for the π-conjugated conductive polymer, and improves the conductivity and heat resistance of the π-conjugated conductive polymer.

The anion group of the polyanion may be a functional group that can cause chemical oxidation doping to the π-conjugated conductive polymer. Such an anion group is preferably a mono-substituted sulfate group, a mono-substituted phosphate group, a phosphate group, a carboxy group, a sulfo group, etc. from the viewpoint of ease of production and stability. Further, the anionic group is more preferably a sulfo group, a monosubstituted sulfate group, or a carboxy group from the viewpoint of the doping effect of the functional group on the π-conjugated conductive polymer.

Specific examples of polyanions include polyvinyl sulfonic acid, polystyrene sulfonic acid, polyallyl sulfonic acid, polyacrylic acid ethyl sulfonic acid, polyacrylic acid butyl sulfonic acid, poly-2-acrylamido-2-methylpropane sulfonic acid, poly Isoprene sulfonic acid, polyvinyl carboxylic acid, polystyrene carboxylic acid, polyallyl carboxylic acid, polyacryl carboxylic acid, polymethacryl carboxylic acid, poly-2-acrylamido-2-methylpropane carboxylic acid, polyisoprene carboxylic acid, polyacrylic acid, etc. Can be mentioned. Further, the polyanion may be a homopolymer of these, or two or more kinds of copolymers.

Further, the poly anion may further have F (fluorine atom) in the compound. Specific examples of such a polyanion include Nafion (manufactured by Dupont) containing a perfluorosulfonic acid group, Flemion (manufactured by Asahi Glass Co., Ltd.) made of perfluoro vinyl ether containing a carboxylic acid group, and the like. .

Among these, when a compound having a sulfonic acid as a polyanion is used, after forming a conductive polymer-containing layer by coating and drying, a heat drying treatment is further performed at 100 to 120 ° C. for 5 minutes or more. The microwaves may be irradiated. Such heat drying treatment and microwave irradiation are preferable from the viewpoint that the crosslinking reaction is accelerated and the washing resistance and solvent resistance of the coating film are remarkably improved.

Furthermore, among the compounds having sulfonic acid, polystyrene sulfonic acid, polyisoprene sulfonic acid, polyethyl acrylate sulfonic acid, or polybutyl acrylate is preferable. These poly anions have high compatibility with the hydroxy group-containing non-conductive polymer, and can further increase the conductivity of the obtained conductive polymer.

The degree of polymerization of the polyanion is preferably in the range of 10 to 100,000 monomer units from the viewpoint of dispersibility of the conductive polymer, and from 50 to 10,000 from the viewpoint of solvent solubility and conductivity. A range is more preferred.

Examples of the method for producing a polyanion include a method of directly introducing an anionic group into a polymer having no anionic group using an acid, a method of sulfonating a polymer having no anionic group with a sulfonating agent, and anionic group-containing polymerization. And the like, and the like.

Examples of the method for producing an anion group-containing polymerizable monomer by polymerization include a method for producing an anion group-containing polymerizable monomer in a solvent by oxidative polymerization or radical polymerization in the presence of an oxidizing agent and / or a polymerization catalyst. Specifically, a predetermined amount of the anionic group-containing polymerizable monomer is dissolved in a solvent, kept at a constant temperature, and a solution in which a predetermined amount of an oxidizing agent and / or a polymerization catalyst is dissolved in the solvent is added to the predetermined amount. React with time. The polymer obtained by the reaction is adjusted to a certain concentration by the solvent. In this production method, a polymerizable monomer having no anionic group may be copolymerized with the anionic group-containing polymerizable monomer.

The oxidizing agent, oxidation catalyst, and solvent used in the polymerization of the anionic group-containing polymerizable monomer are the same as those used in the polymerization of the precursor monomer that forms the π-conjugated conductive polymer.

When the obtained polymer is a polyanionic salt, it is preferably transformed into a polyanionic acid. Examples of the method for transforming into polyanionic acid include ion exchange method using ion exchange resin, dialysis method, ultrafiltration method and the like. Among these, ultrafiltration method is preferable from the viewpoint of easy work.

Ratio of π-conjugated conductive polymer and polyanion contained in conductive polymer, “π-conjugated conductive polymer”: “poly anion” is preferably a mass ratio from the viewpoint of conductivity and dispersibility The range is from 1: 1 to 20, and more preferably from 1: 2 to 10 by mass ratio.

The oxidant used when the precursor monomer forming the π-conjugated conductive polymer is chemically oxidatively polymerized in the presence of the polyanion to obtain the conductive polymer according to the present invention is, for example, J. Org. Am. Soc. 85, 454 (1963), which is suitable for the oxidative polymerization of pyrrole. Such oxidants include, for practical reasons, cheap and easy to handle oxidants such as iron (III) salts (eg FeCl ₃ , Fe (ClO ₄ ) ₃ , organic acids and inorganic acids containing organic residues). Iron (III) salt), hydrogen peroxide, potassium dichromate, alkali persulfate (eg, potassium persulfate, sodium persulfate), ammonium, alkali perborate, potassium permanganate, or copper salts (eg, tetrafluoride). It is preferable to use copper borate). In addition, air or oxygen in the presence of catalytic amounts of metal ions (for example, iron ions, cobalt ions, nickel ions, molybdenum ions, vanadium ions) can be used as an oxidizing agent. Among these, the use of persulfate, iron (III) salts of inorganic acids including organic acids, or iron (III) salts of inorganic acids including organic residues has great application advantages.

Examples of iron (III) salts of inorganic acids containing organic residues include iron (III) salts of sulfuric acid half esters of alkanols having 1 to 20 carbon atoms (for example, lauryl sulfate), alkyl sulfonic acids having 1 to 20 carbon atoms (For example, methane, dodecanesulfonic acid), carboxylic acid having 1 to 20 aliphatic carbon atoms (for example, 2-ethylhexylcarboxylic acid), aliphatic perfluorocarboxylic acid (for example, trifluoroacetic acid, perfluorooctanoic acid), aliphatic dicarboxylic acid Acids (eg oxalic acid), in particular aromatic, optionally alkyl substituted sulfonic acids having 1 to 20 carbon atoms (eg Fe (III) salts of benzesenesulfonic acid, p-toluenesulfonic acid, dodecylbenzenesulfonic acid) Is mentioned.

As such a conductive polymer, a commercially available material can also be preferably used. For example, a conductive polymer (abbreviated as PEDOT-PSS) composed of poly (3,4-ethylenedioxythiophene) and polystyrenesulfonic acid is described in H.C. C. It is commercially available from Starck as the Clevios series, from Aldrich as PEDOT-PSS 483095 and 560596, and from Nagase Chemtex as the Denatron series. Polyaniline is also commercially available from Nissan Chemical as the ORMECON series. In the present invention, such an agent can also be preferably used.

The average particle size of the conductive polymer in the conductive polymer-containing dispersion used in the present invention is 1 to 500 nm, preferably 3 to 300 nm, and more preferably 5 to 100 nm.

The conductive polymer may contain an organic compound as the second dopant. There is no restriction | limiting in particular in the organic compound which can be used by this invention, It can select suitably from well-known things, For example, an oxygen containing compound is mentioned suitably. The oxygen-containing compound is not particularly limited as long as it contains oxygen, and examples thereof include a hydroxy group-containing compound, a carbonyl group-containing compound, an ether group-containing compound, and a sulfoxide group-containing compound. Examples of the hydroxy group-containing compound include ethylene glycol, diethylene glycol, propylene glycol, trimethylene glycol, 1,4-butanediol, glycerin and the like. Among these, ethylene glycol and diethylene glycol are preferable. Examples of the carbonyl group-containing compound include isophorone, propylene carbonate, cyclohexanone, γ-butyrolactone, and the like. Examples of the ether group-containing compound include diethylene glycol monoethyl ether. Examples of the sulfoxide group-containing compound include dimethyl sulfoxide. These may be used alone or in combination of two or more, but at least one selected from dimethyl sulfoxide, ethylene glycol, and diethylene glycol is preferably used.

(First conductive layer made of metal material)
In the present invention, it is preferable that a transparent electrode is formed by further providing a conductive layer made of a metal material on the base material 11 on the transparent conductive film 1 containing a conductive polymer and a binder resin dispersible in an aqueous solvent. . Here, the conductive layer made of a metal material is preferably made of a metal material formed in a pattern.
As shown in FIG. 1, a transparent electrode 1 according to an embodiment of the present invention includes a conductive layer (see FIG. 1) containing a conductive polymer compound and a dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent. In addition to the second conductive layer 13), it is preferable to have the first conductive layer 12 made of a metal material formed in a pattern on the substrate 11. In particular, the first conductive layer 12 is preferably formed using metal particles because it is advantageous for ease of pattern formation, stability over time, and densification of the metal pattern.

The metal material is not particularly limited as long as it has conductivity, and may be an alloy in addition to a metal such as gold, silver, copper, iron, nickel, or chromium. In particular, the shape of the metal material is preferably metal fine particles or metal nanowires from the viewpoint of ease of pattern formation as described later, and the metal material is preferably silver from the viewpoint of conductivity.

The first conductive layer 12 according to the present invention is formed on the substrate 11 so as to form a pattern having an opening 12a in order to constitute the transparent conductive film 1. The opening part 12a is a part which does not have a metal material on the base material 11, and is a translucent window part. Although there is no restriction | limiting in particular in a pattern shape, For example, it is preferable that they are stripe shape, mesh shape, or random mesh shape. The ratio of the opening 12a to the entire surface of the transparent conductive film 1, that is, the opening ratio is preferably 80% or more from the viewpoint of transparency. The aperture ratio is the ratio of the entire portion excluding the light-impermeable conductive portion. For example, when the light-impermeable conductive portion is striped or meshed, the aperture ratio of the striped pattern having a line width of 100 μm and a line interval of 1 mm is about 90%.

The line width of the pattern is preferably 10 to 200 μm from the viewpoint of transparency and conductivity. If the line width of the fine line is less than 10 μm, desired conductivity cannot be obtained, and if the line width of the fine line exceeds 200 μm, the transparency is lowered. The height of the fine wire is preferably 0.1 to 10 μm. If the height of the fine line is less than 0.1 μm, the desired conductivity cannot be obtained, and if the height of the fine line exceeds 10 μm, the cause of current leakage and poor distribution of the thickness of the functional layer in the formation of organic electronic devices It becomes.

The method for forming the stripe-shaped or mesh-shaped first conductive layer 12 is not particularly limited, and a conventionally known method can be used. For example, it can be formed by forming a metal layer on the entire surface of the substrate 11 and subjecting the metal layer to a known photolithography method. Specifically, a metal layer is formed on the entire surface of the substrate 11 using one or more physical or chemical forming methods such as printing, vapor deposition, sputtering, plating, etc., or a metal foil is used as an adhesive. The first conductive layer 12 processed into a desired stripe shape or mesh shape can be obtained by laminating the substrate 11 on the substrate 11 and then etching using a known photolithography method. The metal species is not particularly limited as long as it can be energized, and copper, iron, cobalt, gold, silver, and the like can be used. From the viewpoint of conductivity, silver or copper is preferable, and silver is more preferable. It is.

As another method, a method of printing an ink containing metal fine particles in a desired shape by screen printing, a method of applying a plating catalyst ink in a desired shape by gravure printing or an inkjet method, or a plating process, or A method using silver salt photography technology is mentioned.

A technique using silver salt photography technology can be implemented with reference to, for example, [0076]-[0112] of Japanese Patent Application Laid-Open No. 2009-140750 and examples. Further, a method for performing a plating process by gravure printing of the catalyst ink can be implemented with reference to, for example, Japanese Patent Application Laid-Open No. 2007-281290.

Further, as a random network structure, for example, a disordered network structure of conductive fine particles is spontaneously formed by applying and drying a liquid containing metal fine particles as described in JP-T-2005-530005. Techniques to do this are available. As another method, for example, a random network structure of metal nanowires is formed by applying and drying a coating solution (dispersion) containing metal nanowires as described in JP-T-2009-505358. Techniques are available.

Metal nanowire refers to a fibrous structure having a metal element as a main component. In particular, the metal nanowire in the present invention means a large number of fibrous structures having a minor axis from the atomic scale to the nm size.

As the metal nanowire, in order to form a long conductive path with one metal nanowire, the average length is preferably 3 μm or more, more preferably 3 to 500 μm, still more preferably 3 to 300 μm. . In addition, the relative standard deviation of the length is preferably 40% or less. Moreover, although there is no restriction | limiting in particular in an average breadth, it is preferable that it is small from a transparency viewpoint, and the larger one is preferable from a conductive viewpoint. Therefore, the average minor axis of the metal nanowire is preferably 10 to 300 nm, and more preferably 30 to 200 nm. In addition, the relative standard deviation of the minor axis is preferably 20% or less. The basis weight of the metal nanowire is preferably 0.005 to 0.5 g / m ² , and more preferably 0.01 to 0.2 g / m ² .

Examples of the metal used for the metal nanowire include copper, iron, cobalt, gold, and silver, and silver is preferable from the viewpoint of conductivity. In addition, although a single metal may be used, in order to achieve both conductivity and stability (sulfurization resistance, oxidation resistance, and migration resistance of metal nanowires), the metal as the main component and one or more other types are used. These metals may be included in any proportion.

The method for producing the metal nanowire is not particularly limited, and for example, a known method such as a liquid phase method or a gas phase method can be used. Moreover, there is no restriction | limiting in particular in a specific manufacturing method, A well-known manufacturing method can be used. For example, as a method for producing silver nanowires, Adv. Mater. , 2002, 14, 833-837, Chem. Mater. 2002, 14, 4736-4745, a method for producing gold nanowires is disclosed in Japanese Patent Application Laid-Open No. 2006-233252, a method for producing copper nanowires is disclosed in Japanese Patent Application Laid-Open No. 2002-266007, and the like. Reference can be made to 2004-149871. In particular, the method for producing silver nanowires disclosed in the above-mentioned literature can easily produce silver nanowires in an aqueous solution, and the electrical conductivity of silver is the highest among metals, so it is preferably applied to the present invention. can do.

In addition, the surface specific resistance of the thin wire portion (first conductive layer 12) made of a metal material is preferably 100Ω / □ or less, and more preferably 20Ω / □ or less in order to increase the area. The surface specific resistance can be measured, for example, according to JIS K6911, ASTM D257, etc., and can be easily measured using a commercially available surface resistivity meter.

Further, it is preferable that the thin wire portion (first conductive layer 12) made of a metal material is subjected to heat treatment within a range in which the base material 11 is not damaged. As a result, fusion between the metal fine particles and the metal nanowires proceeds, and the thin wire portion made of the metal material becomes highly conductive.

(Base material)
The base material 11 is a plate-like body that can carry the conductive layers 12 and 13, and in order to obtain the transparent conductive film 1, JIS K 7361-1: 1997 (Testing method of total light transmittance of plastic-transparent material) ) Having a total light transmittance of 80% or more in the visible light wavelength region measured by a method in accordance with (1) is preferably used.

As the base material 11, a material that is excellent in flexibility, has a sufficiently low dielectric loss coefficient, and is a material that absorbs microwaves smaller than the conductive layers 12 and 13 is preferably used.

As the base material 11, for example, a resin substrate, a resin film, and the like are preferably exemplified, but it is preferable to use a transparent resin film from the viewpoint of productivity and performance such as lightness and flexibility. The transparent resin film is a film having a total light transmittance of 50% or more measured in a visible light wavelength region measured by a method in accordance with JIS K 7361-1: 1997 (plastic-transparent material total light transmittance test method). Say.

The transparent resin film that can be preferably used is not particularly limited, and the material, shape, structure, thickness, and the like can be appropriately selected from known ones. Examples of such transparent resin films include polyester resin films such as polyethylene terephthalate (PET), polyethylene naphthalate, and modified polyester, polyethylene (PE) resin films, polypropylene (PP) resin films, polystyrene resin films, and cyclic olefin resins. Polyolefin resin film such as polyvinyl chloride, vinyl resin film such as polyvinyl chloride and polyvinylidene chloride, polyether ether ketone (PEEK) resin film, polysulfone (PSF) resin film, polyether sulfone (PES) resin film, polycarbonate ( PC) resin film, polyamide resin film, polyimide resin film, acrylic resin film, triacetyl cellulose (TAC) resin film, etc. .

Any resin film having a total light transmittance of 80% or more is preferably used as a film substrate used as the base material 11 of the present invention. The film substrate is preferably a biaxially stretched polyethylene terephthalate film, a biaxially stretched polyethylene naphthalate film, a polyethersulfone film or a polycarbonate film from the viewpoint of transparency, heat resistance, ease of handling, strength and cost. An axially stretched polyethylene terephthalate film or a biaxially stretched polyethylene naphthalate film is more preferred.

The base material 11 used in the present invention can be subjected to a surface treatment or an easy adhesion layer in order to ensure the wettability and adhesion of the coating liquid (dispersion). A conventionally well-known technique can be used about surface treatment and an easily bonding layer.

For example, examples of the surface treatment include surface activation treatment such as corona discharge treatment, flame treatment, ultraviolet treatment, high frequency treatment, glow discharge treatment, active plasma treatment, and laser treatment.

Also, examples of the easy adhesion layer include polyester, polyamide, polyurethane, vinyl copolymer, butadiene copolymer, acrylic copolymer, vinylidene copolymer, epoxy copolymer and the like. The easy adhesion layer may be a single layer, but may be composed of two or more layers in order to improve adhesion.

In addition, an inorganic film, an organic film, or a hybrid film of both may be formed on the front or back surface of the film substrate. The film substrate on which such a film is formed conforms to JIS K 7129-1992. The barrier film having a water vapor permeability (25 ± 0.5 ° C., relative humidity (90 ± 2)% RH) measured by the above method is 1 × 10 ⁻³ g / (m ² · 24 h) or less. More preferably, the oxygen permeability measured by a method according to JIS K 7126-1987 is 1 × 10 ⁻³ ml / m ² · 24 h · atm or less, water vapor permeability (25 ± 0.5 ° C., relative humidity) (90 ± 2)% RH) is preferably a high barrier film having a value of 1 × 10 ⁻³ g / (m ² · 24 h) or less.

As a material for forming a barrier film formed on the front surface or the back surface of a film substrate in order to obtain a high barrier film, any material may be used as long as it has a function of suppressing invasion of elements such as moisture, oxygen, etc. For example, silicon oxide, silicon dioxide, silicon nitride, or the like can be used. Furthermore, in order to improve the brittleness of the barrier film, it is more preferable to have a laminated structure of these inorganic layers and layers made of organic materials. Although there is no restriction | limiting in particular about the lamination order of an inorganic layer and an organic layer, It is preferable to laminate | stack both alternately several times.

(Coating, heating, drying)
The second conductive layer 13 of the present invention is obtained by applying a coating liquid (dispersion) containing the above-described conductive polymer and a dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent onto the substrate 11. It is formed by heating and drying. When the transparent conductive film 1 has a fine wire portion made of a metal material as the first conductive layer 11, the above-described coating solution is applied onto the substrate 11 on which the thin wire portion made of the metal material is formed, and is heated and dried. Thus, the second conductive layer 13 is formed. Here, the second conductive layer 13 only needs to be electrically connected to the thin metal wire portion that is the first conductive layer 12, and may completely cover the patterned thin metal wire portion. A part of the part may be covered, or may be in contact with the fine metal wire part.

In addition to the printing methods such as the gravure printing method, flexographic printing method, and screen printing method, the application of the coating liquid comprising the conductive polymer and the dissociable group-containing self-dispersing polymer dispersible in the aqueous solvent is a roll coating method. , Bar coating method, dip coating method, spin coating method, casting method, die coating method, blade coating method, bar coating method, gravure coating method, curtain coating method, spray coating method, doctor coating method, ink jet method, etc. Either can be used.

In addition, the second conductive layer 13 containing a conductive polymer and a dissociable group-containing self-dispersing polymer that can be dispersed in an aqueous solvent covers or is in contact with a part of the fine metal wire portion (first conductive layer 12). As a method for producing the transparent conductive film 1, the first conductive layer 12 is formed on the transfer film by the method described above, and further contains a conductive polymer and a self-dispersing polymer containing a dissociable group dispersible in an aqueous solvent. A method in which the second conductive layer 13 laminated by the method described later is transferred to the substrate 11 described above.

In addition, as a method for producing the transparent conductive film 1, a self-dispersing group containing a dissociable group dispersible in a conductive polymer and an aqueous solvent by a known method such as an inkjet method on a non-conductive portion (opening portion 12a) of a thin metal wire portion. And a method of forming the second conductive layer 13 containing a mold polymer.

The second conductive layer 13 containing a conductive polymer and a self-dispersing polymer containing a dissociable group dispersible in an aqueous solvent is characterized by containing a self-dispersing polymer. Thereby, high electroconductivity, high transparency, and strong film | membrane intensity | strength can be obtained.
By forming the conductive layers 12 and 13 of the present invention having such a structure, the surface of the transparent conductive film 1 has high conductivity that cannot be obtained by a metal or metal oxide fine wire or a conductive polymer layer alone. Can be obtained uniformly in the inside.

In the second conductive layer 13 containing a conductive polymer and a dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent, a dissociable group-containing self-dispersing polymer dispersible in the conductive polymer and the aqueous solvent The ratio is preferably 30 to 900 parts by mass of the dissociable group-containing non-conductive polymer when the conductive polymer is 100 parts by mass, preventing current leakage and the conductivity of the dissociable group-containing non-conductive polymer. From the viewpoint of enhancing effect and transparency, the dissociable group-containing non-conductive polymer is more preferably 100 to 900 parts by mass. When the ratio is less than 30 parts by weight, it is necessary to reduce the film thickness in order to obtain desired transmittance and conductivity. If the film thickness is thin, the fine metal wire used for the first conductive layer 12 The unevenness on the portion or the thin metal wire portion cannot be covered, causing current leakage. On the other hand, when the ratio exceeds 900 parts by weight, the conductivity of the dispersion composed of the conductive polymer and the dissociable group-containing self-dispersing polymer dispersible in the aqueous solvent decreases, and the transparent conductive film 1 and the organic There is a possibility that desired performance as an EL element cannot be obtained. Further, when the ratio is 100 to 900 parts by weight, it is possible to prevent current leakage by increasing the film thickness, and desired performance as the transparent conductive film 1 and the organic EL element can be suitably obtained.

The dry film thickness of the second conductive layer 13 is preferably 30 to 2000 nm. When the dry film thickness is less than 30 nm, the metal thin wire portion used for the first conductive layer 12 or the unevenness on the metal thin wire portion cannot be covered, which may cause current leakage. Further, when the dry film thickness exceeds 2000 nm, the transmittance and the conductivity are lowered, and the desired performance as the transparent conductive film 1 cannot be obtained, and as a result, a highly efficient organic EL device may not be obtained. is there.

The second conductive layer 13 is formed by applying a coating liquid (dispersion liquid) containing a conductive polymer and a dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent, followed by drying treatment. Although there is no restriction | limiting in particular as conditions of a drying process, It is preferable to dry-process at the temperature of the range in which the base material 11 and the conductive layers 12 and 13 are not damaged. For example, a drying treatment can be performed at 80 to 120 ° C. for 10 seconds to 10 minutes. Thereby, the washing | cleaning tolerance and solvent tolerance of the transparent conductive film 1 improve remarkably, and element performance improves further. In particular, in an organic EL element provided with the transparent conductive film 1, effects such as reduction in driving voltage and improvement in life can be obtained.

The coating liquid described above contains, as additives, plasticizers, stabilizers (antioxidants, antioxidants, etc.), surfactants, dissolution accelerators, polymerization inhibitors, colorants (dyes, pigments, etc.) and the like. May be. Furthermore, from the viewpoint of improving workability such as coating properties, the coating liquid described above is a solvent (for example, water, alcohols, glycols, cellosolves, ketones, esters, ethers, amides, hydrocarbons). Or other organic solvents).

In the present invention, Ry and Ra representing the smoothness of the surface of the second conductive layer 13 that is a transparent conductive layer are Ry = maximum height (the difference in height between the top and bottom of the surface) and Ra = arithmetic mean roughness. This is a value corresponding to the surface roughness specified in JIS B601 (1994). In the transparent conductive film 1 according to the present invention, the smoothness of the surface of the second conductive layer 13 which is a transparent conductive layer is Ry ≦ 50 nm, and the smoothness of the surface of the second conductive layer 13 which is a transparent conductive layer is It is preferable that Ra ≦ 10 nm. When Ry exceeds 50 nm, or Ra exceeds 10 nm, when an organic EL device is manufactured, when the upper layer is laminated, the protrusions cannot be completely covered, which may cause partial light emission failure and current leakage. There is. In the present invention, a commercially available atomic force microscope (AFM) can be used for the measurement of Ry and Ra. For example, the measurement can be performed by the following method.

Using an SPI 3800N probe station manufactured by Seiko Instruments Inc. and a SPA400 multifunctional unit as the AFM, set a sample cut to a size of about 1 cm square on a horizontal sample table on a piezo scanner, and place the cantilever on the sample surface. When approaching and reaching the region where the atomic force works, scanning is performed in the XY direction, and the unevenness of the sample at that time is captured by the displacement of the piezo in the Z direction. A piezo scanner that can scan XY 20 μm and Z 2 μm is used. The cantilever is a silicon cantilever SI-DF20 manufactured by Seiko Instruments Inc., which has a resonance frequency of 120 to 150 kHz and a spring constant of 12 to 20 N / m, and is measured in a DFM mode (Dynamic Force Mode). A measurement area of 80 × 80 μm is measured at a scanning frequency of 1 Hz.

In the present invention, the value of Ry is more preferably 50 nm or less, and further preferably 30 nm or less. Similarly, the value of Ra is more preferably 10 nm or less, and further preferably 5 nm or less. This is because if the surface roughness of the transparent electrode film 1 is smooth, the upper layer can be thinned at the time of manufacturing the organic EL element, and as a result, the organic EL element can be thinned.

In the present invention, the transparent conductive film 1 preferably has a total light transmittance of 60% or more, more preferably 70% or more, and further preferably 80% or more. The total light transmittance can be measured according to a known method using a spectrophotometer or the like. In addition, the electrical resistance value of the second conductive layer 13 which is a transparent conductive layer in the transparent conductive film 1 of the present invention is preferably 1000Ω / □ or less, more preferably 100Ω / □ or less as the surface resistivity. preferable. Furthermore, in order to apply the transparent conductive film 1 to a current-driven optoelectronic device, the surface resistivity is preferably 50Ω / □ or less, and more preferably 10Ω / □ or less. That is, it is preferable that the surface resistivity is 10 ³ Ω / □ or less because the transparent conductive film 1 can suitably function as an electrode in various optoelectronic devices. In addition, when the surface resistivity is 100Ω / □ or less, the second conductive layer 13 can be thinned if the smoothness of the surface of the thin metal wire portion which is the first conductive layer 12 is very good. An organic EL element can be thinned. The above-mentioned surface resistivity can be measured in accordance with, for example, JIS K 7194: 1994 (resistivity test method by conductive probe four-probe method) or the like, or using a commercially available surface resistivity meter. It can be easily measured.

There is no restriction | limiting in particular in the thickness of the transparent conductive film 1 which concerns on this invention, Although it can select suitably according to the objective, Generally it is preferable that it is 10 micrometers or less, and transparency and a softness | flexibility are so thin that thickness is thin. It is more preferable because it improves.

<Organic EL device>
An organic EL device according to an embodiment of the present invention includes a transparent conductive film 1 as an electrode, and includes an organic layer including an organic light emitting layer and the transparent conductive film 1. The organic EL element according to the embodiment of the present invention preferably includes the transparent conductive film 1 as an anode, and the organic light-emitting layer and the cathode are arbitrarily selected from materials, configurations, and the like generally used for the organic EL element. Things can be used.

The element configuration of the organic EL element is as follows: anode / organic light emitting layer / cathode, anode / hole transport layer / organic light emitting layer / electron transport layer / cathode, anode / hole injection layer / hole transport layer / organic light emitting layer / electron transport layer / Cathode, anode / hole injection layer / organic light emitting layer / electron transport layer / electron injection layer / cathode, anode / hole injection layer / organic light emitting layer / electron injection layer / cathode, etc. it can.

In the present invention, the light emitting material or doping material that can be used for the organic light emitting layer includes anthracene, naphthalene, pyrene, tetracene, coronene, perylene, phthaloperylene, naphthaloperylene, diphenylbutadiene, tetraphenylbutadiene, coumarin, oxadiazole, bis. Benzoxazoline, bisstyryl, cyclopentadiene, quinoline metal complex, tris (8-hydroxyquinolinato) aluminum complex, tris (4-methyl-8-quinolinato) aluminum complex, tris (5-phenyl-8-quinolinato) aluminum complex Aminoquinoline metal complex, benzoquinoline metal complex, tri- (p-terphenyl-4-yl) amine, 1-aryl-2,5-di (2-thienyl) pyrrole derivative, pyran, quinaclide , Rubrene, distyrylbenzene derivatives, di still arylene derivatives, various fluorescent dyes, rare earth metal complex, but phosphorescent material and the like, but is not limited thereto. It is also preferable to include 90 to 99.5 parts by mass of a light emitting material selected from these compounds and 0.5 to 10 parts by mass of a doping material. When the light emitting material exceeds 90 parts by weight, the film may be thickened and the flexibility may be lowered. When the light emitting material is less than 9.5 parts by weight, a desired luminance may not be obtained. Further, when the doping material is less than 0.5 parts by weight, the desired luminance may not be obtained, and when it exceeds 10 parts by weight, the dopant concentration may increase and the concentration may be quenched. . An organic light emitting layer is manufactured by well-known methods, such as vapor deposition, application | coating, transcription | transfer, using the above-mentioned material. The thickness of the organic light emitting layer is preferably 0.5 to 500 nm and more preferably 0.5 to 200 nm from the viewpoint of light emission efficiency.

The transparent conductive film 1 according to the embodiment of the present invention has both high conductivity and transparency, and various optical options such as a liquid crystal display device, an organic light emitting device, an inorganic electroluminescent device, electronic paper, an organic solar cell, and an inorganic solar cell. It can be suitably used in the fields of electronics devices, electromagnetic wave shields, touch panels and the like. Among them, it can be particularly preferably used as a transparent electrode of an organic EL device or an organic thin film solar cell device in which the smoothness of the transparent electrode surface is strictly required.

Moreover, since the organic EL element according to the present invention can emit light uniformly and without unevenness, it is preferably used for lighting applications, and can be used for self-luminous displays, liquid crystal backlights, lighting, and the like. .

Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In addition, although the display of "part" and "%" is used in an Example, unless there is particular notice, "mass part" and "mass%" are represented.

<Synthesis Example 1 (Synthesis of Binder Resin P-1: Comparative Compound)>
[Synthesis of Poly-2-hydroxyethyl acrylate (P-1)]
In a 300 ml eggplant flask, 5.0 g (43.1 mmol, Fw 116.12) 2-hydroxyethyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.7 g (4.3 mmol, 2,2′-azobis (2-methylisopropionitrile), Fw164.21) and 100 ml of tetrahydrofuran were added, and the mixture was heated to reflux for 8 hours. The solution was then cooled to room temperature and added dropwise into 2.0 L of vigorously stirred methyl ethyl ketone. After stirring the reaction solution for 1 hour, methyl ethyl ketone was decanted and the polymer adhering to the wall surface was washed three times with 100 ml of methyl ethyl ketone. The polymer was dissolved in 100 ml of tetrahydrofuran, transferred to a 200 ml flask, and tetrahydrofuran was distilled off under reduced pressure using a rotary evaporator. Then, by reducing the pressure at 80 ° C. for 3 hours, the remaining THF was distilled off to obtain 4.1 g (yield 82%) of P-1 having a number average molecular weight of 57,800 and a molecular weight distribution of 1.24.
The structure and molecular weight were measured by ¹ H-NMR (400 MHz, manufactured by JEOL Ltd.) and GPC (Waters 2695, manufactured by Waters), respectively. The obtained P-14.0 g was dissolved in 16.0 g of pure water to prepare a 20% aqueous solution of P-1.

<GPC measurement conditions>
Device: Waters 2695 (Separations Module)
Detector: Waters 2414 (Refractive Index Detector)
Column: Shodex Asahipak GF-7M HQ
Eluent: Dimethylformamide (containing 20 mM LiBr)
Flow rate: 1.0 ml / min
Temperature: 40 ° C

<Production of substrate>
A UV curable organic / inorganic hybrid hard coat material: OPSTAR Z7501 manufactured by JSR Co., Ltd. was applied to a non-undercoated surface of a polyethylene terephthalate film (Cosmo Shine A4100, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm, and dried. After coating with a wire bar so that the average film thickness becomes 4 μm, after drying at 80 ° C. for 3 minutes, curing is performed under a curing condition of 1.0 J / cm ² using a high-pressure mercury lamp in an air atmosphere, and a smooth layer Formed.
Next, a gas barrier layer was formed on the sample provided with the smooth layer under the following conditions.

(Gas barrier layer coating solution)
A 20% by weight dibutyl ether solution of perhydropolysilazane (PHPS, AZ Electronic Materials Co., Ltd. Aquamica NN320) was applied with a wireless bar so that the (average) film thickness after drying was 0.30 μm. A coated sample was obtained.

(First step; drying treatment)
The obtained coated sample was treated for 1 minute in an atmosphere having a temperature of 85 ° C. and a humidity of 55% RH to obtain a dried sample.

(Second step; dehumidification treatment)
The dried sample was further dehumidified by being held for 10 minutes in an atmosphere at a temperature of 25 ° C. and a humidity of 10% RH (dew point temperature −8 ° C.).

(Modification A)
The sample subjected to the dehumidification treatment was modified under the following conditions to form a gas barrier layer. The dew point temperature during the reforming process was -8 ° C.

(Modification equipment)
Excimer irradiation equipment MODEL: MECL-M-1-200, wavelength 172 nm, lamp filled gas Xe
The sample fixed on the operation stage was modified under the following conditions.

(Reforming treatment conditions)
Excimer light intensity 60 mW / cm ² (172 nm)
1mm distance between sample and light source
Stage heating temperature 70 ℃
Oxygen concentration in irradiation device 1%
Excimer irradiation time 3 seconds A film substrate (base material 11) for a transparent electrode (transparent conductive film 1) having gas barrier properties was produced as described above.

<Example 1>
<Preparation of transparent electrode>
<Preparation of transparent electrode TC-101>
The following coating liquid A was applied to a non-barrier surface on a transparent electrode film substrate having gas barrier properties by adjusting the slit gap of the extrusion head so as to have a dry film thickness of 300 nm using an extrusion method. A second conductive layer made of a binder resin dispersible in a conductive polymer and an aqueous solvent was formed by heating and drying at 110 ° C. for 5 minutes, and the obtained electrode was cut into 8 × 8 cm. The obtained electrode was heated in an oven at 110 ° C. for 30 minutes to produce a transparent electrode TC-101.

(Coating liquid A)
Conductive polymer: PEDOT-PSS CLEVIOS PH510 (solid content concentration 1.89%, manufactured by HC Starck) 1.59 g
Binder: Vylonal MD1245 (solid content 54.4% aqueous solution) 0.13 g
Dimethyl sulfoxide (DMSO, 1/10 of the conductive polymer solution mass) 0.16 g

(Preparation of transparent electrodes TC-102 to TC-106)
In the production of the transparent electrode TC-101, except that Byronal MD1245, which is the binder of the coating liquid A, was changed to the binder shown in Table 1, and the addition amount was changed so that the solid content added to the coating liquid A was 70 mg. Transparent electrodes TC-102 to TC-106 were produced in the same manner as the production of the transparent electrode TC-101.

(Preparation of transparent electrode TC-107)
In the production of the transparent electrode TC-101, Vironal MD1245 was changed to Plus Coat RZ570, and PEDOT-PSS CLEVIOS PH510 (solid content 1.89%, manufactured by HC Starck) of coating solution A was added to polyaniline M ( A transparent electrode TC-107 was produced in the same manner as the production of the transparent electrode TC-101, except that the solid content concentration was changed to 6.0%, and Tee-Chemical 0.5 g.

(Preparation of transparent electrodes TC-108 to TC-112)
In the production of the transparent electrode TC-101, the transparent electrode TC- of the comparative example was prepared in the same manner as the production of the transparent electrode TC-101, except that the binder of coating liquid A, Vylonal MD1245, was changed to the binder shown in Table 1. 108 to TC-112 were produced.
Note that the binders used in TC-108 to TC-110, Nypol LX430, LX433C, and LX435, are not a dissociable group-containing self-dispersing polymer according to the present invention, and a surfactant is used for dispersion.

(Preparation of comparative transparent electrode TC-113)
In the production of the transparent electrode TC-101, a transparent electrode TC-113 was produced in the same manner as the production of the transparent electrode TC-101 except that the binder in the coating solution A was not used.

<Evaluation of transparent electrode>
The glass transition temperature (Tg) of the binder resin was measured as follows. The film shape, transparency, surface resistance (conductivity), surface roughness and film strength of the obtained transparent electrode were evaluated as follows. In addition, in order to evaluate the stability of the transparent electrode, evaluation of the film shape, transparency, surface resistance, surface roughness and film strength of the transparent electrode sample after a forced deterioration test placed in an environment of 80 ° C. and 90% RH for 5 days Was done.

(Particle size measurement)
Using a particle size measuring machine (FPAR-1000, manufactured by Otsuka Electronics Co., Ltd.), the solution was measured as it was without dilution.

(Measurement of Tg)
Using a differential scanning calorimeter (DSC-7 manufactured by Perkin Elmer), the temperature was measured at a rate of temperature increase of 10 ° C./min, and determined according to JIS K7121 (1987).

(transparency)
Based on JIS K 7361-1: 1997, the total light transmittance was measured using HAZE METER NDH5000 manufactured by Tokyo Denshoku Co., Ltd., and evaluated according to the following criteria. Since it is used for an organic electronic device, it is preferably 75% or more.
◎: 80% or more ○: 75% to less than 80% △: 70% to less than 75% ×: less than 70% Evaluation criteria: Samples evaluated as ◎ and ○ pass the present invention.

(Surface resistance)
In accordance with JIS K 7194: 1994, the surface resistance was measured using a resistivity meter (Loresta GP (MCP-T610 type): manufactured by Dia Instruments Co., Ltd.). The surface resistance is preferably 100Ω / □ or less, and preferably 30Ω / □ or less in order to increase the area of the organic electronic device.
Evaluation criteria: Samples evaluated as 30Ω / □ or less after forced deterioration pass the present invention.

(Surface roughness (Ra, Ry))
Using AFM (SPI3800N probe station and SPA400 multifunctional unit manufactured by Seiko Instruments Inc.) and using a sample cut to a size of about 1 cm square, the surface roughness specified in the above method (JIS B601 (1994)). ).
Evaluation criteria: Samples evaluated as Ry ≦ 50 nm and Ra ≦ 10 nm passed the present invention.

(Membrane strength)
The strength of the conductive layer film was evaluated by a tape peeling method.
Crimping / peeling was repeated 10 times on the conductive layer using a Scotch tape manufactured by Sumitomo 3M Co., and the dropping of the conductive layer was visually observed and evaluated according to the following criteria.
◎: No change after 5 times of pressure bonding / peeling ○: No change after 3 times of pressure peeling / bonding △: Peeling is observed after 1 time of pressure peeling, but more than 80% pattern remains ×: 1 time of pressure peeling Peeling is observed, and the remaining pattern is less than 80%. Evaluation criteria: Samples evaluated as ◎ and ○ are acceptable as the present invention.

From Table 1, compared with the transparent electrodes TC-108 to TC-113 of the comparative examples, the transparent electrodes TC-101 to 109 of the present invention are excellent in smoothness, conductivity, light transmittance and film strength, It can be seen that even in a high humidity environment, there is little deterioration in smoothness, conductivity, light transmission and film strength, and the stability is excellent.

<Example 2>
<Preparation of transparent electrode>
<Formation of first conductive layer>
The 1st conductive layer was formed with the following method in the surface without the barrier on the film substrate (base material 11) for transparent electrodes (transparent conductive film 1) which has the gas barrier property obtained above.

(Thin wire grid)
The fine wire lattice (metal material) was produced by gravure printing or silver nanowire as shown below.

(Gravure printing)
Silver nanoparticle paste 1 (M-Dot SLP: manufactured by Mitsuboshi Belting Co., Ltd.) was printed on a fine wire grid having a line width of 50 μm, a height of 1.5 μm, and an interval of 1.0 mm using a gravure printing tester K303MULTICATOR manufactured by RK Print Coat Instruments Ltd. Thereafter, a drying treatment was performed at 110 ° C. for 5 minutes.

<Preparation of transparent electrode TC-201>
The following coating liquid A is extruded on the transparent electrode in which the first conductive layer is formed by gravure printing on the film substrate for the transparent electrode having gas barrier properties, using an extrusion method so as to have a dry film thickness of 300 nm. The slit gap was adjusted and applied, dried by heating at 110 ° C. for 5 minutes to form a second conductive layer composed of a conductive polymer and a binder resin dispersible in an aqueous solvent, and the obtained electrode was 8 × 8 cm. Cut out. The obtained electrode was heated in an oven at 110 ° C. for 30 minutes to produce a transparent electrode TC-101.

<Formation of Second Conductive Layer 13>
(Coating liquid A)
Conductive polymer: PEDOT-PSS CLEVIOS PH510 (solid content concentration 1.89%, manufactured by HC Starck) 1.59 g
Binder: Polysol FP3000 (solid content 54.4% aqueous solution) 0.13 g
Dimethyl sulfoxide (DMSO, 1/10 of the conductive polymer solution mass) 0.16 g

(Preparation of transparent electrodes TC-202 to TC-206)
In the production of the transparent electrode TC-201, except that Byronal MD1245, which is the binder of coating solution A, was changed to the binder shown in Table 2, and the addition amount was changed so that the solid content added to coating solution A was 70 mg. Transparent electrodes TC-202 to TC-206 were produced in the same manner as the production of the transparent electrode TC-201.

(Preparation of transparent electrode TC-207)
In the production of the transparent electrode TC-201, Vironal MD1245 was changed to Plus Coat RZ570, and PEDOT-PSS CLEVIOS PH510 (solid content 1.89%, manufactured by HC Starck) of coating solution A was added to polyaniline M ( A transparent electrode TC-207 was produced in the same manner as the production of the transparent electrode TC-201 except that the solid content was changed to 6.0%, and the chemical was 0.5 g.

(Preparation of transparent electrode TC-208)
(Random network structure)
Silver nanowire dispersions are described in Adv. Mater. , 2002, 14, 833 to 837 with reference to the method described in PVP K30 (molecular weight 50,000; manufactured by ISP), silver nanowires having an average minor axis of 75 nm and an average length of 35 μm were produced. Silver nanowires are filtered off using a filtration membrane, washed, and then redispersed in an aqueous solution containing 25% by mass of hydroxypropylmethylcellulose 60SH-50 (manufactured by Shin-Etsu Chemical Co., Ltd.) to prepare a silver nanowire dispersion. did.
The random network structure was prepared using silver nanowires as shown below.
The silver nanowire dispersion liquid is applied using a bar coating method so that the basis weight of the silver nanowires is 0.06 g / m ² , dried at 110 ° C. for 5 minutes, and heated to form a silver nanowire substrate. Produced.
On the transparent electrode in which a random network structure is formed by silver nanowires, a second coating solution is prepared in the same manner as in the production of the transparent electrode TC-201 using a coating solution in which Polysol FP3000, which is a binder of coating solution A, is changed to plus coat RZ570. A conductive layer was formed and cut into 8 × 8 cm. The obtained electrode was heated in an oven at 110 ° C. for 30 minutes to produce a transparent electrode TC-208.

(Preparation of transparent electrode TC-209)
(Copper mesh substrate)
A copper mesh was produced on the substrate as an auxiliary electrode by the following method, and patterned with a metal fine particle removing liquid BF to produce a copper mesh substrate.
The catalyst ink JISD-7 manufactured by Morimura Chemical Co. containing palladium nanoparticles is used, and the CAB-O-JET300 self-dispersing carbon black solution manufactured by Cabot is used, and the carbon black ratio to the catalyst ink becomes 10.0% by mass. Then, Surfynol 465 (Nisshin Chemical Industry Co., Ltd.) was further added to prepare a conductive ink having a surface tension at 25 ° C. of 48 mN / m.
Conductive ink as an ink jet recording head has a pressure applying means and an electric field applying means, and has a nozzle diameter of 25 μm, a driving frequency of 12 kHz, a number of nozzles of 128, a nozzle density of 180 dpi (dpi is 1 inch, that is, 2.54 cm per 2.54 cm). Fig. A-6 shows a grid-like conductive thin wire with a line width of 10 µm, a dried film thickness of 0.5 µm, and a line spacing of 300 µm on the substrate. After forming into parts, it was dried.
Next, using a high-speed electroless copper plating solution CU-5100 manufactured by Meltex, the substrate was immersed for 10 minutes at a temperature of 55 ° C., washed, and subjected to electroless plating to produce an auxiliary electrode having a plating thickness of 3 μm. .
On the transparent electrode on which the copper mesh is formed, a second conductive layer is formed by the same method as the production of the transparent electrode TC-201, using the coating liquid A in which Vylonal MD1245, which is the binder of the coating liquid A, is changed to the plus coat RZ570. And cut into 8 × 8 cm. The obtained electrode was heated in an oven at 110 ° C. for 30 minutes to produce a transparent electrode TC-209.

(Preparation of transparent electrodes TC-210 to TC-214)
In the production of the transparent electrode TC-101, the transparent electrode TC- of the comparative example was prepared in the same manner as the production of the transparent electrode TC-101, except that the binder of coating liquid A, Vylonal MD1245, was changed to the binder shown in Table 1. 210 to TC-214 were produced.
Note that the binders used for TC-110 to TC-112, Nypol LX430, LX433C, and LX435, are not dissociable group-containing self-dispersing polymers according to the present invention, and a surfactant is used for dispersion.

(Preparation of comparative transparent electrode TC-215)
In the production of the transparent electrode TC-201, a transparent electrode TC-215 was produced in the same manner as the production of the transparent electrode TC-201 except that the binder in the coating solution A was not used.

<Evaluation of transparent electrode>
The obtained transparent electrode was evaluated in the same manner as in Example 1.
The evaluation results are shown in Table 2.

From Table 2, compared with the transparent electrodes TC-210 to TC-215 of the comparative examples, the transparent electrodes TC-201 to 109 of the present invention are excellent in smoothness, conductivity, light transmittance and film strength, It can be seen that even in a high humidity environment, there is little deterioration in smoothness, conductivity, light transmission and film strength, and the stability is excellent.

<Example 3>
<Production of organic EL device>
After the transparent electrode substrate produced in Example 2 was washed with ultrapure water, it was cut into a 30 mm square so that one square tile-shaped transparent pattern with a pattern side length of 20 mm was placed in the center, and used for the anode electrode. The organic EL device was produced respectively. The hole transport layer and subsequent layers were formed by vapor deposition. Organic EL elements OEL-301 to OEL-315 were fabricated using transparent electrodes TC-201 to TC-215, respectively.

Each crucible for vapor deposition in a commercially available vacuum vapor deposition apparatus was filled with a constituent material of each layer in a necessary amount for device production. The evaporation crucible used was made of a resistance heating material made of molybdenum or tungsten.
First, an organic EL layer including a hole transport layer, an organic light emitting layer, a hole blocking layer, and an electron transport layer was sequentially formed.

<Formation of hole transport layer>
After reducing the vacuum to 1 × 10 ⁻⁴ Pa, the deposition crucible containing compound 1 was heated by energization, and deposited at a deposition rate of 0.1 nm / second to provide a 30 nm thick hole transport layer. It was.

<Formation of organic light emitting layer>
Next, each light emitting layer was provided in the following procedures.
Compound 2, Compound 3 and Compound 5 are deposited on the formed hole transport layer so that Compound 2 is 13.0% by mass, Compound 3 is 3.7% by mass, and Compound 5 is 83.3% by mass. Co-evaporation was performed in the same region as the hole transport layer at a speed of 0.1 nm / second to form a green-red phosphorescent organic light emitting layer having a maximum emission wavelength of 622 nm and a thickness of 10 nm.
Next, compound 4 and compound 5 are deposited in the same region as the organic light-emitting layer emitting green-red phosphorescence at a deposition rate of 0.1 nm / second so that compound 4 is 10.0% by mass and compound 5 is 90.0% by mass. Co-evaporation was performed to form a blue phosphorescent organic light emitting layer having an emission maximum wavelength of 471 nm and a thickness of 15 nm.

<Formation of hole blocking layer>
Further, a hole blocking layer was formed by depositing compound 6 in a thickness of 5 nm on the same region as the formed organic light emitting layer.

<Formation of electron transport layer>
Subsequently, in the same region as the formed hole blocking layer, CsF was co-evaporated with compound 6 so as to have a film thickness ratio of 10% to form an electron transport layer having a thickness of 45 nm.

<Formation of cathode electrode>
On the formed electron transport layer, a transparent electrode is used as an anode, an anode external takeout terminal and Al as a 15 mm × 15 mm cathode forming material are mask-deposited under a vacuum of 5 × 10 ⁻⁴ Pa, and a 100 nm thick anode Formed.
Further, a flexible seal in which an adhesive is applied around the anode except for the end portion, and polyethylene terephthalate is used as a base material and Al ₂ O ₃ is deposited in a thickness of 300 nm so that external terminals for the cathode and anode can be formed. After pasting the members, the adhesive was cured by heat treatment to form a sealing film, and an organic EL device having a light emitting area of 15 mm × 15 mm was produced.

<Evaluation of organic EL element>
About the obtained organic EL element, the light emission nonuniformity and lifetime were evaluated as follows.

(Emission uniformity)
For light emission uniformity, a KEITHLEY source measure unit 2400 type was used to apply a DC voltage to the organic EL element to emit light. With respect to the organic EL elements OEL-201 to OEL-217 that emitted light at 1000 cd / m ² , each light emission luminance unevenness was observed with a 50 × microscope. Further, the organic EL elements OEL-201 to OEL-217 were heated in an oven at 60% RH and 80 ° C. for 2 hours, and then conditioned again in the environment of 23 ± 3 ° C. and 55 ± 3% RH for 1 hour or more. Thereafter, the emission uniformity was observed in the same manner.
A: Completely uniform light emission, satisfactory O: Almost uniform light emission, no problem Δ: Some light emission unevenness is observed partially, but acceptable X: Light emission unevenness is observed over the entire surface, not acceptable Evaluation criteria: Samples evaluated as ◎, ○, △ after forced deterioration pass the present invention.

(lifespan)
The obtained organic EL device was continuously emitted at an initial luminance of 5000 cd / m ² , the voltage was fixed, and the time until the luminance was reduced by half was determined. An organic EL element having an anode electrode made of ITO was produced by the same method as described above, the ratio to this was determined, and evaluated according to the following criteria. 100% or more is preferable, and 150% or more is more preferable.
◎: 150% or more ○: 100 to less than 150% △: less than 80 to 100% ×: less than 80% Evaluation Criteria: Samples evaluated as ◎, ○, △ after forced deterioration pass the present invention.

Table 3 shows the evaluation results. In Table 3, “Invention” in the remarks indicates that it corresponds to an example of the present invention, and “Comparison” indicates that it is a comparative example.

From Table 3, the comparative organic EL elements OEL-310 to OEL-315 are significantly deteriorated in light emission uniformity after heating at 80 ° C. for 30 minutes, whereas the organic EL elements OEL-301 to OEL-309 of the present invention It can be seen that the light emission uniformity is stable even after heating and is excellent in durability.

DESCRIPTION OF SYMBOLS 1 Transparent conductive film 11 Base material 12 1st conductive layer 13 2nd conductive layer

Claims (4)

A transparent conductive film having an organic compound layer on a transparent substrate,
The organic compound layer is formed by applying and drying a dispersion containing a conductive polymer compound and a dissociable group-containing self-dispersing polymer dispersible in an aqueous solvent.
The transparent conductive film, wherein in the dispersion liquid, the average particle size of the particles containing the conductive polymer compound and the dissociable group-containing self-dispersing polymer is 5 to 100 nm. A first conductive layer made of a metal material formed in a pattern on the substrate;
A transparent second conductive layer made of the organic compound layer formed on the substrate and electrically connected to the first conductive layer;
The transparent conductive film according to claim 1, comprising: The transparent conductive film according to claim 1 or 2, wherein a glass transition temperature of the dissociable group-containing self-dispersing polymer is 25 ° C or higher and 80 ° C or lower. An organic electroluminescent element comprising the transparent conductive film according to any one of claims 1 to 3 as an electrode.

Images