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WO2012033326A3 - Dense rare earth metal oxide coating film for sealing porous ceramic surface, and preparation method thereof - Google Patents

Dense rare earth metal oxide coating film for sealing porous ceramic surface, and preparation method thereof Download PDF

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Publication number
WO2012033326A3
WO2012033326A3 PCT/KR2011/006586 KR2011006586W WO2012033326A3 WO 2012033326 A3 WO2012033326 A3 WO 2012033326A3 KR 2011006586 W KR2011006586 W KR 2011006586W WO 2012033326 A3 WO2012033326 A3 WO 2012033326A3
Authority
WO
WIPO (PCT)
Prior art keywords
coating film
porous ceramic
metal oxide
rare earth
earth metal
Prior art date
Application number
PCT/KR2011/006586
Other languages
French (fr)
Korean (ko)
Other versions
WO2012033326A2 (en
Inventor
박동수
이병국
한병동
이정환
변응선
Original Assignee
한국기계연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국기계연구원 filed Critical 한국기계연구원
Publication of WO2012033326A2 publication Critical patent/WO2012033326A2/en
Publication of WO2012033326A3 publication Critical patent/WO2012033326A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

The present invention relates to a dense rare earth metal oxide coating film for sealing a porous ceramic surface, and a preparation method thereof. Particularly, the present invention relates to a rare earth metal oxide coating film formed on a porous ceramic film of a substrate, wherein the porous ceramic film has an average surface roughness of 0.4 to 2.3 m. The dense rare earth metal oxide coating film for sealing a porous ceramic surface, and the preparation method thereof, according to the present invention, can provide not only the effect of ensuring withstand voltage characteristics due to the porous ceramic coating film having a sufficient thickness but also the effect of ensuring plasma resistivity due to the dense rare earth metal oxide coating film, and can therefore be applied to various parts of a semiconductor apparatus including a semiconductor etching apparatus.
PCT/KR2011/006586 2010-09-06 2011-09-06 Dense rare earth metal oxide coating film for sealing porous ceramic surface, and preparation method thereof WO2012033326A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20100087099 2010-09-06
KR10-2010-0087099 2010-09-06
KR1020110089675A KR101108692B1 (en) 2010-09-06 2011-09-05 Dense rare earth metal oxide coating film for sealing porous ceramic surface and its manufacturing method
KR10-2011-0089675 2011-09-05

Publications (2)

Publication Number Publication Date
WO2012033326A2 WO2012033326A2 (en) 2012-03-15
WO2012033326A3 true WO2012033326A3 (en) 2012-05-03

Family

ID=45614653

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006586 WO2012033326A2 (en) 2010-09-06 2011-09-06 Dense rare earth metal oxide coating film for sealing porous ceramic surface, and preparation method thereof

Country Status (2)

Country Link
KR (1) KR101108692B1 (en)
WO (1) WO2012033326A2 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
KR101932429B1 (en) * 2012-05-04 2018-12-26 (주)코미코 Plasma resistant coating layer, method of manufacturing the same and Plasma resistant unit
WO2013176168A1 (en) * 2012-05-22 2013-11-28 株式会社東芝 Component for plasma processing apparatus, and method for manufacturing component for plasma processing apparatus
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US9440886B2 (en) * 2013-11-12 2016-09-13 Applied Materials, Inc. Rare-earth oxide based monolithic chamber material
US9725799B2 (en) 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US9976211B2 (en) 2014-04-25 2018-05-22 Applied Materials, Inc. Plasma erosion resistant thin film coating for high temperature application
US20180240649A1 (en) * 2017-02-17 2018-08-23 Lam Research Corporation Surface coating for plasma processing chamber components
KR102016615B1 (en) 2017-09-14 2019-08-30 (주)코미코 Member Having Exellent Resistance Against Plasmacorrosion for Plasma Etching device and Method for Producing the Same
KR20190057753A (en) 2017-11-20 2019-05-29 (주)코미코 Method for Producing Plasma-Resistant Coating Layer and Plasma-Resistant Member Formed by the Same
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN111164237A (en) 2018-07-17 2020-05-15 Ｋｏｍｉｃｏ有限公司 Aerogel Deposition Coating Method for Plasma Resistant Coatings
CN110158032B (en) * 2019-05-09 2021-09-28 成都超纯应用材料有限责任公司 Corrosion-resistant coating and preparation method thereof
CN110643993B (en) * 2019-10-18 2023-11-28 山东大学 Steel surface Sm 2 O 3 Modified laser cladding material, composite coating and preparation method thereof
KR102522277B1 (en) 2022-03-24 2023-04-17 주식회사 펨빅스 Anti-plasma Double-layered Coating Structure and Method of Making the Same
KR20240145684A (en) 2023-03-28 2024-10-07 에이씨에스(주) Coating method for workpieces of MLCC inspection equipment

Citations (6)

* Cited by examiner, † Cited by third party
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KR20050008855A (en) * 2002-06-27 2005-01-21 램 리서치 코포레이션 Thermal sprayed yttria-containing coating for plasma reactor
KR20050039565A (en) * 2003-10-24 2005-04-29 도시바세라믹스가부시키가이샤 Plasma resistant member, manufacturing method for the same and method of forming a thermal spray coat
KR20070090531A (en) * 2006-03-03 2007-09-06 가부시키가이샤 히다치 하이테크놀로지즈 Plasma Etching Apparatus and Method of Forming Members in Plasma Treatment Chamber
KR20080036530A (en) * 2006-10-23 2008-04-28 어플라이드 머티어리얼스, 인코포레이티드 Low Temperature Aerosol Deposition of Plasma Protective Layer
KR20090086896A (en) * 2008-11-07 2009-08-14 주식회사 코미코 Manufacturing method of baffle plate for plasma processing apparatus
KR20100011582A (en) * 2008-07-25 2010-02-03 주식회사 코미코 Apparatus for forming ceramic coated layer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050008855A (en) * 2002-06-27 2005-01-21 램 리서치 코포레이션 Thermal sprayed yttria-containing coating for plasma reactor
KR20050039565A (en) * 2003-10-24 2005-04-29 도시바세라믹스가부시키가이샤 Plasma resistant member, manufacturing method for the same and method of forming a thermal spray coat
KR20070090531A (en) * 2006-03-03 2007-09-06 가부시키가이샤 히다치 하이테크놀로지즈 Plasma Etching Apparatus and Method of Forming Members in Plasma Treatment Chamber
KR20080036530A (en) * 2006-10-23 2008-04-28 어플라이드 머티어리얼스, 인코포레이티드 Low Temperature Aerosol Deposition of Plasma Protective Layer
KR20100011582A (en) * 2008-07-25 2010-02-03 주식회사 코미코 Apparatus for forming ceramic coated layer
KR20090086896A (en) * 2008-11-07 2009-08-14 주식회사 코미코 Manufacturing method of baffle plate for plasma processing apparatus

Also Published As

Publication number Publication date
WO2012033326A2 (en) 2012-03-15
KR101108692B1 (en) 2012-01-25

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