WO2012004374A1

WO2012004374A1 - Reflector assembly for generating a homogeneous light beam

Info

Publication number: WO2012004374A1
Application number: PCT/EP2011/061588
Authority: WO
Inventors: Tilman Bucher
Original assignee: Check It Etc Gmbh
Priority date: 2010-07-09
Filing date: 2011-07-08
Publication date: 2012-01-12

Abstract

The invention relates to a reflector assembly for generating a reflection beam (10) that is as homogeneous as possible from a first incident beam (3) and a second incident beam (5) that is directed approximately in a V shape toward the first incident beam (3). The reflector assembly comprises at least one first reflector strip (6) and at least one second reflector strip (8). The first incident beam (3) from at least one first reflector strip (6) and the second incident beam (5) from at least one second reflector strip (8) can be reflected in a common radiation direction.

Description

Reflector arrangement for generating a homogeneous light beam

The invention relates to a reflector arrangement for generating a light beam as homogeneous as possible, a luminous system for generating a homogeneous as possible light beam from the incident rays of at least two radiation sources, and a method for generating a homogeneous as possible light beam.

It is known that bright illumination systems with homogeneous illumination, for example, for image projectors, are relatively large and expensive and produce a lot of heat in the operation, for their removal complex and expensive cooling systems are needed. A reduction of the size and the purchase price of an exposure system including a cooling system while at the same time increasing the performance and quality parameters represent demands on the developers of such a system, which up to now could not be fulfilled at the same time. It is an object of the invention to provide an effective apparatus and method for generating a homogeneous beam, for example in an exposure system.

The above object is solved by the subject matters of the independent claims. The dependent claims are directed to advantageous developments.

One aspect of the invention relates to a reflector arrangement for generating as homogeneous a reflection beam as possible from a first incident beam and to the first incident beam towards, for example, approximately V-shaped, second incident beam. In this case, a beam can be regarded as homogeneous if a radiation density over a cross-sectional area of the beam is the same everywhere. Typically, two beams are provided, but the reflector arrangement may also be used for three, four or more beams.

The reflector arrangement comprises at least a first reflector strip and at least one second reflector strip. A radiation of a first radiation source or the first incident beam can be reflected by the first reflector strip in an abstraction direction, and a radiation of a second radiation source or the second incident beam can be reflected by the second reflector strip in the same emission direction, ie parallel thereto. As a result, the radiation from both or from all available radiation sources can be emitted by the reflector arrangement in a common emission direction. The direction of the first incident beam, the direction of the second incident beam, and the emission direction may be in a plane, for example, where the emission direction is the bisector of the direction of the first incident beam and the direction of the second incident beam. This plane may be orthogonal or inclined to a longitudinal direction of a reflector strip which is defined by a length of the reflector strip or parallel to a straight line through the centroids of the cross-sectional areas of the reflector strip.

For example, emitting the incident rays in a common direction may mean that the directional characteristic of the radiated radiation is limelike and straight, or that the directional characteristic is lobe-shaped, preferably zero, with a lobe width. Radiating the incident rays in a uniform direction may also mean that the directional characteristic of the radiated radiation is lobe-shaped with a lobe width greater than zero.

According to one embodiment, the reflection surfaces of the first and / or the second Refiektorstreifen may be flat surfaces. The reflector arrangement formed in this way can emit rays emitted by the radiation sources, if these Radiation is parallel and homogeneous, combine to form a homogeneous reflection beam and redirect or reflect in the direction of radiation.

The first and / or the second reflector strips may also have gelmxmmte reflection surfaces. Thus, for example, the first reflector strip over its width have a parabolic profile, so that the radiation from the first radiation source incident on the reflection surface of the first reflector strip radiation, if it is designed as a cylindrical wave, stripwise into a plane wave or a parallel radiation, to a homogeneous reflection beam combined and deflected in Abstrahlrichtimg. Similarly, the second reflector strip may have a parabolic profile over its width.

A reflector strip may be longer than it is wide, that is, the length of a Refiektorstreifens may be greater than its width. Preferably, a reflector strip may be at least 2 times, or at least 10 times or at least 100 times longer than wide.

A first reflector strip and a second adjacent or adjoining reflector strip may be arranged against one another such that the reflector arrangement in a sectional plane arranged, for example, transversely to the reflector strip or orthogonal to the longitudinal direction of a reflector strip defined by the length of a reflector strip, is substantially V-shaped or sawtooth-shaped Profile. The V-shaped profile can describe a reflector arrangement with a first and a second reflector strip. The sawtooth-shaped profile can describe a reflector arrangement with one or more first and one or more second reflector strips. In this case, the sectional plane may be arranged at any point of the reflector array defined by the length of a reflector strip longitudinal direction of a reflector strip, so that the reflector assembly has on a side facing the incident radiation along the reflector strip furrows with sägezahnformigem profile. The substantially V-shaped or sawtooth-shaped profile may be formed so that the profile tips are open or rounded or irregularly shaped or that the profile is exactly V-shaped or sawtooth. According to one embodiment, the reflector arrangement may have at least two first reflector strips and at least two second reflector strips. Here, the first reflector strips may be parallel to each other, and the second reflector strips may also be parallel to each other. If the width of the reflector strips is smaller than the diameters of the rays incident on the reflector arrangement, the reflected radiation can advantageously have a uniform cross section.

The reflector strips may have approximately the same lengths and / or widths, they may optionally have different lengths and / or widths. The reflector assembly may be formed of discrete, juxtaposed, Refiektorstreifen, or of a solid material with, for example, incised or milled furrows. The reflector assembly may also be formed as a sheet or foil with sawtooth profile.

According to a further embodiment, a first Refiektorstreifen and a second adjacent Refiektorstreifen along one edge may be arranged adjacent to each other. In this case, the Refiektorstreifen the width, that is laterally, be arranged side by side. In this case, a first part of the edges, for example all upper edges, for instance in an upper edge surface, and a second part of the edges, for example all lower edges, for example in a lower edge surface opposite the upper edge surface, can be arranged. The edges may be arranged exactly or approximately in the upper edge surface or the lower edge surface. The upper edge surface may be arranged horizontally, vertically or inclined in space, wherein the lower edge surface to the upper edge surface, for example, parallel or may not be parallel.

According to an embodiment, the Oberkantenfiäche and the lower edge surface may be flat surfaces, possibly approximately flat surfaces. In this case, the Oberkantenfiäche and the lower edge surface parallel surfaces, possibly approximately parallel surfaces, be. The Oberkantenfiäche and the lower edge surface may also be curved surfaces, in particular parts of rotational bodies, such as paraboloids. According to a Ausführangsform, the reflector assembly may have a continuous reflective surface or surface as a reflection surface. Compared to a Reflekto arrangement in which the reflector strips are formed as discrete, separate elements, a continuous reflection surface has the advantage that the radiation is continuously reflected, whereby the reflected radiation has a higher homogeneity.

The reflection surface may also be formed so that it is not continuous, by being composed at least partially or partially of reflector strips, which are formed as discrete or separate elements.

Advantageously, the reflective surfaces of the reflector strips may be formed as a mirror. A mirror may, for example, be formed as a glass plate coated on the backside with a metal, for example aluminum or silver or gold, or as a lambda layer on a dielectric substrate. In this case, a common mirror, prepared according to one of the common production methods for mirrors, can be used.

According to a further embodiment, the reflection surface of one or each of the first reflector strips and the reflection surface of one or each of the second reflector strips may be arranged at an angle of 120 degrees to each other. For example, a first reflector strip and a second reflector strip may have an angle of 60 degrees to a projection of the emission direction of the reflector arrangement on a cutting plane arranged transversely to the longitudinal direction of a reflector strip defined by the length of a reflector strip, provided that they are flat reflecting surfaces.

Further, the reflecting surface of each of the reflector strips may be disposed at an angle of 30 degrees to the upper edge surface and / or lower edge surface. If the top edge surface and / or bottom edge surface are formed as curved surfaces, the angle of a reflector strip to one of these surfaces may be considered with respect to a tangent plane contacting one of these surfaces at one or more points of a top edge or bottom edge. The first reflector strips can have an angle of inclination of 60 degrees relative to a projection of the emission direction of the reflector arrangement on a cutting plane arranged transversely to the longitudinal direction of a reflector strip defined by the length of a reflector strip. Analogously, the second reflector strips can have an angle of inclination of 60 degrees with respect to the projection of the emission direction

According to one embodiment, the reflector arrangement may comprise a first holding path for a first radiation source designed to produce the first incident beam and a second holder for a second radiation source configured to generate the second incident beam.

The first holder may be arranged such that when the first radiation source is picked up by the first holder and the first radiation source can be generated, the first incident beam that can be generated by the first radiation source has a direction parallel or tangential to the reflection surface of the at least one second reflector strip, preferably one to a direction orthogonal to the longitudinal direction of a reflector strip defined by the length of a reflector strip. Characterized shading and / or a reflection of the radiation of the first radiation source by the second reflector strips may each be small, or small as possible, for example less than 10 percent or 3 percent or 1 percent or 10 ^"1 per cent or ^{10" 2} or 0 percent.

The same applies to the second H lterang, with a recording of the second Strahlungsqueile by the second holder and start-up of the second Strahlungsqueile.

Each reflector strip has a longitudinal direction defined by the length of a reflector strip, the longitudinal directions of the reflector strips, that is to say the first and the second reflector strips, being parallel to one another. Also, the Refiektoranordnung has a longitudinal direction, which is parallel to the longitudinal directions of the reflector strips. A tangential direction of a beam may be given when the beam is parallel to a tangent of the reflector strip, which beam may impinge on the concave and / or on the convex side of the reflector strip. A small shadowing and / or reflection of the radiation of the first radiation source by the second reflector strip can also be understood as meaning that no shading and / or reflection of the radiation of the first radiation source takes place through the second reflector strip. The radiation of the first radiation source can thus be reflected only or largely only by the first reflector strip. The same applies to shading and / or reflection of the radiation of the second radiation source through the first reflector strip.

The described arrangement of the first and second reflector strips ensures homogeneity of the radiation reflected by the reflector arrangement, provided that the radiation emitted by the first and the second radiation source is homogeneous. The first and second incident beams are mixed in the emitted beam by the stripe reflection by the reflector array, wherein radiation strips from the first and second radiation sources are alternately juxtaposed over the cross section of the reflected beam. If the reflection sites of the beams incident from the two radiation sources are spaced apart from each other by a smallest possible distance given by the geometry, the radiation reflected by the reflector arrangement may have a non-uniform cross-section. If exactly two reflector strips are used, a uniform reflection beam can be achieved in that the reflection points of the rays coming from the two radiation sources are as little as possible.

Advantageously, the first Halterang be arranged so that when receiving the first radiation source by the first holder and putting into operation of the first radiation source, which can be generated by the first radiation source first incident beam has an angle of 30 degrees to the upper edge surface and / or lower edge surface. The same applies to the arrangement of the second holder, wherein the second incident beam has an angle of 30 degrees to the upper edge surface and / or lower edge surface. The first holder can also be arranged such that the first incident beam generated by the first radiation source has a projection onto a sectional plane arranged transversely to the longitudinal direction of a reflector strip defined by the length of a reflector strip, which is opposite to a projection of the emission direction of the reflector arrangement onto the sectional plane has an inclination angle of 60 degrees. The same applies to the arrangement of the second holder, wherein the projection of the second incident beam on the cutting plane has an angle of 60 degrees to the projection of the emission direction of the reflector assembly on the cutting plane.

According to a further embodiment, the width of the second reflector strip may be larger, preferably substantially larger, than a wavelength of the radiation, for example at least 2 times or 1,000 times or 1,000,000 times the wavelength. The width of the first Refiektorstreifens may be greater, preferably substantially greater than the wavelength of the radiation, for example at least 2 times or 1,000 times or 1,000,000 times the wavelength. As a result, diffraction effects or interference of the incident radiation on the reflector strips can be avoided as far as possible. A width of the or of the first reflective strips may be smaller, preferably substantially smaller, than its diameter, a first of the light emitted from the first Strahlungsquelie radiation, for example less than 0.5 times or 10 ^"or 10-fold ^{^1" 2} times the first diameter. Further, a width of the second reflector or strip may be smaller, preferably substantially smaller, than a second diameter of the radiation emitted by the second radiation source, for example, less than 0.5 times or 10 times or 10 times ² times the Here, the smaller the ratio of the width of a Refiektorstreifens to the diameter of an incident beam, the more homogeneous the reflected beam, since the radiation strips emerging from the first and second incident beam by mixing or reflecting at the reflector assembly are the narrower. A further aspect of the invention relates to a lighting system with a reflector arrangement as described above and a first radiation source attached to the first support which can emit the first incident beam and a second radiation source attached to the second support which measures the beam incident to the first approximately V -shaped, preferably at an angle of 120 degrees to the first incident beam directed, second incident beam can emit. At the first and / or second holder and a plurality of radiation sources may be attached, the beams can be summarized or superimposed to a einlieitlichen first and / or second incident beam. The radiation of the first radiation source can be incident on the one or more reflector strips of the reflector arrangement and the radiation of the second radiation source can be incident on the second reflector strip or strips of the reflector arrangement.

Advantageously, two homogeneous incident beams can be combined into a single homogeneous reflected beam by means of the lighting system. In economic terms, this is very advantageous because the price for two radiation sources with a certain radiation intensity is smaller than the price for a radiation source with double the radiation intensity. When using two radiation sources, which radiate, for example, conical or preferably approximately parallel rays with, for example, circular cross section, the cross section of the reflected beam has an oval, preferably elliptical shape. The length of the oval cross section of the reflected beam is greater than its width. According to one embodiment, the radiation emitted by the first and the second radiation source may be light, in particular visible light. The reflector assembly is thus in a variety of optical devices and devices, in particular in exposure systems used, for example in a projector or projector, a microscope, a headlight, or a lamp.

The radiation emitted by the radiation sources can also be in a spectral range outside the visible light, for example in the UV or IR range. The radiation emitted by the first and the second radiation source may be approximately parallel radiation, wherein the rays are approximately cylindrical. The diameter of the first incident beam emitted by the first radiation source and the diameter of the second incident beam emitted by the second radiation source may be approximately equal, preferably exactly equal.

The first and second radiation sources may generate homogeneous radiation to produce reflected radiation. The homogeneity of the reflected radiation or the uniformity of the radiation density over a cross section of the reflected beam can be improved by adjusting the diameters of the incident beams, the case where the first diameter of the second radiation emitted by the first radiation source is that of the second Radiation source emitted radiation is the most advantageous for the homogeneity of the reflected radiation from the reflector array. As a result, in particular a drop in intensity at the edge of the reflected beam can be avoided.

The light sources can be punctiform. The light sources may be diffuse light sources or thermal radiators or non-thermal radiators, such as light-emitting diodes or LEDs. The light sources can generate a homogeneous radiation, which is important for the realization of a high homogeneity of the reflected beam. Preferably, the incident radiation may be a ball or a cylindrical wave. In the case of a cylindrical shaft, its line-shaped, real or fictitious source may be parallel to the longitudinal direction of the reflector arrangement defined by the length of a reflector strip.

The widths of the first reflector strips may be smaller than a diameter of the first incident beam, for example less than 0.5 times or 0.1 times or 0.01 times the diameter of the first incident beam. Likewise, the widths of the second reflector strips may be smaller than a diameter of the second incident beam, for example, less than 0.5 times or 0.1 times or 0.01 times the diameter of the second incident beam. The radiation of the first radiation source may have a different wavelength from a wavelength of the radiation of the second radiation source. As a result, different wavelengths can be mixed or transmitted in the reflected beam, wherein the first and the second wavelength follow one another strip-wise alternately over the beam cross-section. In this way, a spatial multiplexing process can be realized.

The radiation of the first radiation source may also have a wavelength that is the same or approximately the same as the wavelength of the radiation of the second radiation source. Another aspect of the invention relates to a cascade with at least two lighting systems. A first radiation source may be formed as a first luminous system and a second radiation source as a second luminous system. The first and the second lighting system can be designed as radiation sources of a third lighting system. In this case, a longitudinal direction of the reflector arrangement of the first lighting system and a longitudinal direction of the reflector arrangement of the second lighting system may be mutually parallel and orthogonal to a longitudinal direction of the reflector arrangement of the third lighting system, the longitudinal direction of a reflector arrangement being defined by the length of a reflector strip of the reflector arrangement. Such an arrangement or two-stage cascade of lighting systems serves a Homogegen superposition of the beams of four radiation sources, each two radiation sources in the first and in the second lighting system, to a homogeneous beam with about four times the radiation intensity. The advantage of a multi-stage cascading of lighting systems, in which, for example, N homogeneous beams of N radiation sources are combined into a single homogeneous beam with N-fold radiation intensity is that N light sources with a certain radiation intensity are much cheaper than a light source with N-fold radiation intensity ,

Advantageously, the longitudinal direction of the reflector arrangement of the first lighting system and the longitudinal direction of the reflector arrangement of the second lighting system be mutually parallel and orthogonal to the longitudinal direction of the reflector assembly of the third lighting system. By this structure, the oval rays of the first and second lighting systems are caused to be approximately or exactly combined into a circle, the diameter of the reflection beam of the third lighting system being larger than the diameter of one of the incident rays of the radiation sources in the first or second lighting system.

The reflection beam can be coupled into a lens system which increases or reduces the diameter of the reflection beam as required using known optical technology, while maintaining the homogeneity properties and / or improving the parallelism properties of the reflection beam coupled into the lens system.

The third lighting system, which converts the illustrated options for arranging the first and second lighting system within the third lighting system for Homogegen superposition of the beams of four radiation sources into a single homogeneous beam can also be manufactured and delivered without radiation sources. In such a two-stage reflector assembly brackets can be provided with power connections for the four radiation sources, the brackets allow positioning and orientation of the radiation sources, so that the conditions for mixing the incident rays are met to a homogeneous reflection beam _. for example, that the first incident beam has a direction parallel or tangential to the reflection surface of the second reflector strip, and the second incident beam has a direction parallel or tangential to the reflection surface of the first reflector strip. The brackets and power connectors may be configured to accommodate a variety of types of radiation sources. According to this principle, an N-stage cascade for 2 * N radiation sources can be produced.

A further aspect of the invention relates to a method for producing as homogeneous a reflection beam as possible from a first and a second incident beam by means of a reflector arrangement having at least one first and at least one second reflector strip. The method comprises the steps of: generating the first incident beam by means of a first radiation source, generating the beam incident to the first, for example, a V-shaped, second incident beam by means of a second radiation source, and mixing or superposing the first and the second reflection beam to a Überiagerungsstrahls. The first incident beam may be directed parallel or tangentially to the at least one second reflector strip for producing the first reflection beam by reflection by the at least one first reflector strip. As a result, less than 10 percent or 1 percent or 10 ^-15 percent or 0 percent of the radiation of the first radiation source can be reflected and / or shadowed by the second reflector strip.

The second incident beam may be directed parallel or tangentially to the at least one first reflector strip for generating a second reflection beam through reflection by the at least one second reflector strip. As a result, less than 10 percent or 3 percent or 1 percent or 10 ^-15 percent or 0 percent of the radiation of the second radiation source can be reflected and / or shadowed by the first reflector strip.

According to one embodiment, the following steps may be carried out: Lich and separate generation of two, for example V-shaped and directed to a new reflector arrangement, overlay beams for generating two new Refiexionsstrahlen, mixing or superimposing the two new reflection beams to a new overlay beam and repeating the previous two steps. The repetition of the steps corresponds to an askadierung and can be performed so often until, for example, a desired luminosity or luminance of the overlay beam is reached.

The present invention will be explained in more detail with reference to exemplary embodiments. It shows

1 shows an embodiment of a reflector arrangement with a first and a second radiation source in a side view,

FIG. 2 is a cross-sectional view of a beam reflected from a reflector assembly, and FIG 3 is a cross-section of a beam reflected by a third reflector arrangement, the incident beams being from a first and a second lighting system,

4a shows a second embodiment of a reflector assembly,

4b shows a third embodiment of a reflector arrangement,

4c shows a fourth exemplary embodiment of a reflector arrangement.

FIG. 1 shows a reflector arrangement for a first radiation source 2 and a second radiation source 4. The reflector arrangement comprises a plurality of first reflector strips 6 and a plurality of second reflector strips 8. The first reflector strips 6 and the second reflector strips 8 have planar reflection surfaces and are parallel to each other. The reflection surface is a continuous surface.

The first incident beam 3 is reflected by the first reflector strips 6 and the second incident beam 5 is reflected by the second reflector strips 8 in a common emission direction 10.

The rays emitted by one of the radiation sources 2, 4 are parallel to each other and each form a homogeneous beam. The beam emitted by the reflector arrangement in the emission direction 10 has an oval cross-section according to FIG. 2 and is homogeneous. The radiation sources 2, 4 are arranged symmetrically on the reflector arrangement. The directional characteristic of the radiation emitted in the emission direction 10 is linear and straight.

The first holder 7 is arranged such that when the first radiation source 2 is put into operation, the first incident beam 3 generated by the first radiation source 2 has a direction parallel to the reflection surfaces of the second reflector strips 8. The first incident beam 3 furthermore has a direction orthogonal to a longitudinal direction of the reflector arrangement defined by the length of a reflector strip 6, 8.

The second holder 9 is arranged such that when the second radiation source 4 is started up, the second incident beam generated by the second radiation source 4 5 has a direction parallel to the reflection surfaces of the first reflector strip 6 direction. The second incident beam further has an orthogonal direction to the longitudinal direction of the reflector arrangement defined by the length of a reflector strip. The first reflector strip 6 is at an angle of 120 degrees to the second reflector strip 8. Opposite the emission direction 10, each of the first or the second reflector strips 6, 8 has an emission angle of 30 degrees. The angle of inclination of each of the Refiektorstreifen 6, 8 to a non-illustrated upper edge surface in which the upper edges of the Refiektorstreifen 6, 8, or to a non-subscribed lower edge surface in which the lower edges of the reflector strips 6, 8 are located, is 30 degrees , The angles of inclination of the beams 3, 5 emanating from the first and the second radiation source 2, 4 with respect to the upper edge surface or lower edge surface are also 30 degrees. In the present embodiment, the top edge surface and the bottom edge surface are flat, parallel surfaces.

FIG. 2 shows the cross section of the beam 12 reflected by the reflector arrangement and the cross section of a cylindrical beam 14 incident on the reflector arrangement of one of the two radiation sources 2, 4. The oval cross section of the reflected beam 12 has a width equal to the diameter of one of the incident beams Rays and about a factor of l / sin (30 °) greater length. The radiation reflected by the first Refiektorstreifen 6 in the reflection beam S6 and reflected by the second Refiektorstreifen 8 radiation in the reflection beam S8 fit together seamlessly and form the homogeneous reflection beam. FIG. 3 shows a cross-section through a reflection beam of a cascade, wherein the radiation sources of the cascade are formed as a first and a second luminous system. The longitudinal direction of the reflector arrangement of the first luminous system defined by the length of a reflector strip of the first luminous system and the longitudinal direction of the reflector arrangement of the second luminous system are mutually parallel and orthogonal to the longitudinal direction of the reflector arrangement of the cascade. By this construction, the oval rays of the first and second lighting systems are caused to be approximately or exactly combined into a circle, the diameter of the reflection beam 16 of the cascade by a factor of l / sin (30 °) is greater than the diameter of one of the incident rays of the radiation sources in the first or second lighting system.

FIG. 4a shows a second exemplary embodiment of a reflector arrangement which differs from the first exemplary embodiment shown in FIG. 1 in that the first reflector strips 6 have mutually different widths and the second reflector strips 8 have mutually different widths. The first reflector strips 6 are divided into two groups with reflector strips which each have a small and a larger width. The same applies to the second reflector strips 8. As a result, the teeth of the sawtooth-shaped profile of the reflector arrangement have different sizes in a sectional plane arranged transversely to the reflector strips 6, 8. The lengths of the reflector strips 6, 8 are approximately uniform.

FIG. 4b shows a third exemplary embodiment of a reflector arrangement, which differs from the first exemplary embodiment shown in FIG. 1 in that the upper edge surface and the lower edge surface are curved surfaces with an approximately wave-shaped cross section. As a result, substantially all the first reflector strips 6 have mutually different widths and all second reflector strips 8 have mutually different widths. Likewise, substantially all the teeth of the sawtooth-shaped profile of the reflector arrangement have different sizes in a sectional plane arranged transversely to the longitudinal direction of the reflector strips 6, 8.

FIG. 4 c shows a fourth exemplary embodiment of a reflector arrangement, which differs from the second exemplary embodiment shown in FIG. 4 a in that the reflector arrangement is formed from a solid material with milled out grooves. As a result, the reflector arrangement has a foundation 18. The sawtooth-shaped profile of the reflector arrangement in a cutting plane arranged transversely to the longitudinal direction of the reflector strips 6, 8 is identical to the profile of the reflector arrangement according to FIG. 4a. LIST OF REFERENCE NUMBERS

2 first radiation source

3 first incident beam

4 second radiation source

5 second incident beam

6 first reflector strip

7 holder for the first radiation source (first holder)

8 second reflector strips

9 holder for the second radiation source (second holder)

10 emission direction of the reflector assembly, reflection beam

12 cross section of the reflected beam from the reflector assembly

14 cross section of an incident on the reflector array beam

16 Cross section of the beam reflected by the cascade

18 Foundation of the reflector arrangement

S6 of the first reflector strip 6 reflected radiation in the reflection beam

S8 of the second reflector strips 8 reflected radiation in the reflection beam

Claims

5 claims

1. Reflector arrangement for generating a homogeneous as possible reflection beam (10) 10 from a first incident beam (3) and, for the first incident beam (3) towards approximately V-shaped, second incident beam (5), wherein

the reflector arrangement comprises at least one first reflector strip (6) and at least one second reflector strip (8), and

- The first incident beam (3) from at least one first reflector strip (6) and ί 5, the second incident beam (5) from the at least one second reflector strip (8) are reflected in a common emission direction.

2. Reflector arrangement according to claim 1, wherein

- The reflection surfaces of the at least one first and the at least one second reflector strip (6, 8) are flat surfaces, and / or

Is a reflector strip (6 _8?) Is longer than it is wide, preferably at least 2 times, or at least 10 times or at least 100 times longer than wide -; and or

- The widths of the first and / or second reflector strips (6, 8) have an approximately equal size; and / or 5 - a first reflector strip (6) and a second adjacent or adjacent reflector strip (8) are arranged against each other so that the reflector arrangement in a transverse to the reflector strips (6, 8) arranged cutting plane has an approximately V-shaped or sawtooth-shaped profile having.

3. Reflektoranordmmg according to one of the preceding claims, wherein

the reflector arrangement has at least two first reflector strips (6) and at least two second reflector strips (8),

- The reflection surfaces of the first reflector strips (6) are parallel to each other, and

- The reflection surfaces of the second reflector strips (8) are parallel to each other.

4. Refiektoranordnung according to one of the preceding claims, wherein

a first reflector strip (6) and a second adjacent reflector strip (8) are arranged adjacent to one another along an edge, so that a first part of the edges, for example all upper edges, approximately in an upper edge surface, and a second part of the edges, for example all lower edges, approximately in a, the upper edge surface opposite lower edge surface are arranged.

5. Reflector arrangement according to the preceding claim, wherein

- The upper edge surface and the lower edge surface are flat surfaces, and / or

the upper edge surface and the lower edge surface are parallel surfaces, and / or

- The upper edge surface and the lower edge surface are curved surfaces.

6. Reflector arrangement according to one of the preceding claims, wherein

- The reflector assembly has a continuous reflective surface as a reflection surface, and / or

- The reflection surfaces of the reflector strips (6, 8) are formed as a mirror.

7. Reflector arrangement according to one of the preceding claims, wherein

the reflection surface of one or each of the first reflector strips (6) and the reflection surface of each of the second reflector strips (8) are arranged at an angle of 120 degrees to each other, and / or

- The reflection surface of each of the reflector strips (6, 8) is arranged at an angle of 30 degrees to the upper edge surface and / or lower edge surface.

8. Reflector arrangement according to one of the preceding claims, wherein

the reflector arrangement comprises a first holder (7) for a first stray source (2) designed to produce the first incident beam (3) and a second holder (9) for a second radiation source (4) for generating the second incident beam (5). includes, and / or

- The first holder (7) is arranged so that when receiving the first radiation source (2) by the first holder (7) and commissioning of the first radiation source (2), the first Strahlungsqueile (2) producible first incident Beam (3) has a direction parallel or tangential to the reflection surface of the at least one second reflector strip (8), preferably a direction orthogonal to a transverse direction of the reflector arrangement defined by the width of a reflector strip (6, 8); and or

- The second holder (9) is arranged so that when receiving the second Strahlungsqueile (4) by the second holder (9) and commissioning of the second radiation source (4), of the second radiation source (4) producible second incident beam ( 5) has a direction parallel or tangential to the reflection surface of the at least one first reflector strip (6), preferably a direction orthogonal to the transverse direction of the reflector arrangement.

9. Reflector arrangement according to one of the preceding claims, wherein

the reflector arrangement comprises a first holder (7) for a first radiation source (2) designed to produce the first incident beam (3) and a second holder (9) for a second radiation source (4) designed to generate the second incident beam (5) includes, and / or

the first holder (7) is arranged so that when the first radiation source (2) is received by the first holder (7) and the first radiation source (2) is put into operation, the first incident beam (1) which can be generated by the first radiation source (2) 3) has an angle of 30 degrees to the upper edge surface and / or lower edge surface, and / or

- The second holder (9) is arranged so that when receiving the second radiation source (4) by the second holder (9) and commissioning of the second radiation source (4), of the second radiation source (4) producible second incident beam ( 5) has an angle of 30 degrees to the upper edge surface and / or lower edge surface.

10. Reflector arrangement according to one of the preceding claims, wherein

- The width of one of the first and or second reflector strips (8) is greater, preferably substantially larger than a radiation wavelength of the first and / or second incident beam (3, 5), for example at least 10-fold or 1,000-fold or 1,000,000 times the radiation wavelength.

11th lighting system

with a reflector arrangement according to one of the preceding claims, and with a first radiation source (2) attached to the first holder (7) which can emit the first incident beam (3) and one on the second holder (9) mounted, second radiation source (4), which is the, for the first incident Sirahl (3) out approximately V-shaped, preferably at an angle of 120 degrees to the first incident beam (3), directed, second incident beam (5) can send out.

12. Lighting system according to the previous claim, wherein

the radiation emitted by the first and the second radiation source (2, 4) is light, and / or

- The radiation emitted by the first and the second radiation source (2, 4) each radiation is approximately parallel, and / or - the cross-sectional width of the first incident beam (3) and the Querschmttsbreite the second incident beam (5) is approximately equal, preferably exactly the same, are, and or

the widths of the first reflector strips (6) are smaller than a cross-sectional width of the first incident beam (3), for example less than 0.5 times or 0.1 times or 0.01 times the cross-sectional width of the first incident beam ( 3), and / or

the widths of the second Refiektorstreifen (8) are smaller than a cross-sectional width of the second incident beam (5), for example, less than 0.5 times or 0.1 times or 0.01 times the Querschmttsbreite the second incident beam ( 5), and / or

- The radiation sources (2, 4) are punctiform, and / or

- The radiation sources (2, 4) can generate a homogeneous radiation.

13. Cascade with at least two lighting systems according to one of the preceding two claims, wherein - a first radiation source (2) as a first luminous system according to one of the preceding two claims and a second radiation source (4) as a second luminous system according to one of the preceding two claims are formed, whereby the first and the second luminous system as radiation sources (2, 4 ) of a third lighting system according to one of the preceding two claims, and / or

the transverse direction of the reflector arrangement of the first luminous system and the transverse direction of the reflector arrangement of the second luminous system are mutually parallel and orthogonal to the quenching of the reflector arrangement of the third luminous system.

14. A projector or beamer or microscope or headlamp or lamp with a reflector assembly according to any one of claims 1 to 10 or a lighting system according to claim 11 or 12 with a cascade according to the preceding claim,

15, a method for generating a homogenous Refiexionsstrahls (10) from a first and a second incident beam (3, 5) by means of a reflector assembly according to one of claims 1 to 12 having at least a first and at least one second reflector strip (6, 8), comprising the steps of: a) generating the first incident beam (3) by means of a first radiation source (2) such that the first incident beam (3) generates a first reflection beam (10) by reflection through the at least one first reflector strip (6 ) to which at least one second reflector strip (8) is directed parallel or tangentially; b) generating, to the first incident beam (3) V-shaped, preferably at an angle of 120 degrees to the first incident beam (3), directed second incident beam (5) by means of a second radiation source (4), so that second incident beam (5) for generating a second reflection beam (10) by reflection by the at least one second reflector strip (8) to which at least one first reflector strip (6) is directed parallel or tangentially; and c) mixing or superimposing the first and second reflection beams (10) into a superposition beam.

Method according to the preceding claim, wherein the following steps are carried out: d) simultaneous and separate generation of two superimposing beams directed towards each other in a V-shape and directed to a new reflector arrangement for generating two new reflection beams (10); e) mixing or superimposing the two new reflection beams (10) into a new overlay beam; and f) repeating steps d) and e).