WO2011019061A1 - Procédé de production de composé d'éther polyglycidylique - Google Patents
Procédé de production de composé d'éther polyglycidylique Download PDFInfo
- Publication number
- WO2011019061A1 WO2011019061A1 PCT/JP2010/063658 JP2010063658W WO2011019061A1 WO 2011019061 A1 WO2011019061 A1 WO 2011019061A1 JP 2010063658 W JP2010063658 W JP 2010063658W WO 2011019061 A1 WO2011019061 A1 WO 2011019061A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- compound
- ether compound
- producing
- polyglycidyl ether
- Prior art date
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- -1 ether compound Chemical class 0.000 title claims abstract description 81
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title claims abstract description 79
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 92
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 34
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims abstract description 22
- 150000003658 tungsten compounds Chemical class 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 19
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 19
- 239000011574 phosphorus Substances 0.000 claims abstract description 19
- 238000006735 epoxidation reaction Methods 0.000 claims abstract description 18
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 15
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims abstract description 11
- 239000007800 oxidant agent Substances 0.000 claims abstract description 7
- 239000007858 starting material Substances 0.000 claims abstract description 5
- 235000013824 polyphenols Nutrition 0.000 claims description 46
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 25
- 229920003986 novolac Polymers 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 20
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 150000008442 polyphenolic compounds Chemical class 0.000 claims description 17
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 15
- MGRVRXRGTBOSHW-UHFFFAOYSA-N (aminomethyl)phosphonic acid Chemical compound NCP(O)(O)=O MGRVRXRGTBOSHW-UHFFFAOYSA-N 0.000 claims description 14
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 13
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 claims description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims description 8
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 6
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- 150000002989 phenols Polymers 0.000 claims description 5
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 4
- 229930185605 Bisphenol Natural products 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- 239000005011 phenolic resin Substances 0.000 claims description 4
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 claims description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 4
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims description 4
- UIQSKEDQPSEGAU-UHFFFAOYSA-N 1-Aminoethylphosphonic Acid Chemical compound CC(N)P(O)(O)=O UIQSKEDQPSEGAU-UHFFFAOYSA-N 0.000 claims description 3
- UAEPDDGDPAPPHZ-UHFFFAOYSA-N 1-aminobutylphosphonic acid Chemical compound CCCC(N)P(O)(O)=O UAEPDDGDPAPPHZ-UHFFFAOYSA-N 0.000 claims description 3
- KUFXXIJLXFPIQU-UHFFFAOYSA-N 1-aminononylphosphonic acid Chemical compound CCCCCCCCC(N)P(O)(O)=O KUFXXIJLXFPIQU-UHFFFAOYSA-N 0.000 claims description 3
- NXTPDFMZKSLVRK-UHFFFAOYSA-N 1-aminopentylphosphonic acid Chemical compound CCCCC(N)P(O)(O)=O NXTPDFMZKSLVRK-UHFFFAOYSA-N 0.000 claims description 3
- ODMTWOKJHVPSLP-UHFFFAOYSA-N 1-azaniumylhexyl(hydroxy)phosphinate Chemical compound CCCCCC(N)P(O)(O)=O ODMTWOKJHVPSLP-UHFFFAOYSA-N 0.000 claims description 3
- YRCIJTKAYRSRQF-UHFFFAOYSA-N 1-azaniumyloctyl(hydroxy)phosphinate Chemical compound CCCCCCCC(N)P(O)(O)=O YRCIJTKAYRSRQF-UHFFFAOYSA-N 0.000 claims description 3
- DELJNDWGTWHHFA-UHFFFAOYSA-N 1-azaniumylpropyl(hydroxy)phosphinate Chemical compound CCC(N)P(O)(O)=O DELJNDWGTWHHFA-UHFFFAOYSA-N 0.000 claims description 3
- GUJZISPOCRVAMW-UHFFFAOYSA-N 2-[1-(2-hydroxyphenyl)-9h-fluoren-2-yl]phenol Chemical compound OC1=CC=CC=C1C1=CC=C(C=2C(=CC=CC=2)C2)C2=C1C1=CC=CC=C1O GUJZISPOCRVAMW-UHFFFAOYSA-N 0.000 claims description 3
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 3
- UXEWRRMZXMLRRS-UHFFFAOYSA-N [2-(2-phenylethenyl)phenyl]methanediol Chemical compound OC(O)C1=CC=CC=C1C=CC1=CC=CC=C1 UXEWRRMZXMLRRS-UHFFFAOYSA-N 0.000 claims description 3
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 claims description 3
- IMHDGJOMLMDPJN-UHFFFAOYSA-N dihydroxybiphenyl Natural products OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 claims description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 claims description 3
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 claims description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 2
- ZFEQSERZJMLTHK-UHFFFAOYSA-N 4-(4-hydroxyphenyl)-2,3,5,6-tetramethylphenol Chemical group CC1=C(O)C(C)=C(C)C(C=2C=CC(O)=CC=2)=C1C ZFEQSERZJMLTHK-UHFFFAOYSA-N 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 2
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract description 21
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 229920000090 poly(aryl ether) Polymers 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 description 83
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 57
- 239000000243 solution Substances 0.000 description 44
- 239000010410 layer Substances 0.000 description 24
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000012044 organic layer Substances 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- SCZZNWQQCGSWSZ-UHFFFAOYSA-N 1-prop-2-enoxy-4-[2-(4-prop-2-enoxyphenyl)propan-2-yl]benzene Chemical compound C=1C=C(OCC=C)C=CC=1C(C)(C)C1=CC=C(OCC=C)C=C1 SCZZNWQQCGSWSZ-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- MWSPFHZPVVWJCO-UHFFFAOYSA-M hydron;methyl(trioctyl)azanium;sulfate Chemical compound OS([O-])(=O)=O.CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC MWSPFHZPVVWJCO-UHFFFAOYSA-M 0.000 description 8
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 7
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 229930003836 cresol Natural products 0.000 description 5
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000011630 iodine Substances 0.000 description 4
- 229910000027 potassium carbonate Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 229940106691 bisphenol a Drugs 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000006266 etherification reaction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 150000004045 organic chlorine compounds Chemical class 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QWMFKVNJIYNWII-UHFFFAOYSA-N 5-bromo-2-(2,5-dimethylpyrrol-1-yl)pyridine Chemical compound CC1=CC=C(C)N1C1=CC=C(Br)C=N1 QWMFKVNJIYNWII-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- 244000061458 Solanum melongena Species 0.000 description 2
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- ICKNPJHUQGEMTH-UHFFFAOYSA-N 1-aminoheptylphosphonic acid Chemical compound CCCCCCC(N)P(O)(O)=O ICKNPJHUQGEMTH-UHFFFAOYSA-N 0.000 description 1
- DTPWJDGUXUESJD-UHFFFAOYSA-N 4-(4-hydroxyphenyl)-3-methylphenol Chemical group CC1=CC(O)=CC=C1C1=CC=C(O)C=C1 DTPWJDGUXUESJD-UHFFFAOYSA-N 0.000 description 1
- PDJVMTAFBHTRTK-UHFFFAOYSA-N 7-aminoheptylphosphonic acid Chemical compound NCCCCCCCP(O)(O)=O PDJVMTAFBHTRTK-UHFFFAOYSA-N 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- FJKFUXNMDLMIRM-UHFFFAOYSA-N aminooxy(methyl)phosphinic acid Chemical compound CP(O)(=O)ON FJKFUXNMDLMIRM-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- NEUSVAOJNUQRTM-UHFFFAOYSA-N cetylpyridinium Chemical compound CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 NEUSVAOJNUQRTM-UHFFFAOYSA-N 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 150000001987 diarylethers Chemical class 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- FBWKUAUBADFSOJ-UHFFFAOYSA-N ethyl(trioctyl)azanium Chemical compound CCCCCCCC[N+](CC)(CCCCCCCC)CCCCCCCC FBWKUAUBADFSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- ZRLVUNNBSSUWAC-UHFFFAOYSA-M hydrogen sulfate;tetraoctylazanium Chemical compound OS([O-])(=O)=O.CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC ZRLVUNNBSSUWAC-UHFFFAOYSA-M 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- RULHPTADXJPDSN-UHFFFAOYSA-M hydron;tetrahexylazanium;sulfate Chemical compound OS([O-])(=O)=O.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC RULHPTADXJPDSN-UHFFFAOYSA-M 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000199 molecular distillation Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000004967 organic peroxy acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005502 peroxidation Methods 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- DTIFFPXSSXFQCJ-UHFFFAOYSA-N tetrahexylazanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC DTIFFPXSSXFQCJ-UHFFFAOYSA-N 0.000 description 1
- CHYBTAZWINMGHA-UHFFFAOYSA-N tetraoctylazanium Chemical compound CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC CHYBTAZWINMGHA-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- YMZATHYBBBKECM-UHFFFAOYSA-N tris(sulfanylidene)tungsten Chemical compound S=[W](=S)=S YMZATHYBBBKECM-UHFFFAOYSA-N 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/26—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24
- B01J31/34—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24 of chromium, molybdenum or tungsten
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0235—Nitrogen containing compounds
- B01J31/0237—Amines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0235—Nitrogen containing compounds
- B01J31/0239—Quaternary ammonium compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0255—Phosphorus containing compounds
- B01J31/0257—Phosphorus acids or phosphorus acid esters
- B01J31/0259—Phosphorus acids or phosphorus acid esters comprising phosphorous acid (-ester) groups ((RO)P(OR')2) or the isomeric phosphonic acid (-ester) groups (R(R'O)2P=O), i.e. R= C, R'= C, H
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0271—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds also containing elements or functional groups covered by B01J31/0201 - B01J31/0231
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/12—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/28—Ethers with hydroxy compounds containing oxirane rings
- C07D303/30—Ethers of oxirane-containing polyhydroxy compounds in which all hydroxyl radicals are etherified with oxirane-containing hydroxy compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2231/00—Catalytic reactions performed with catalysts classified in B01J31/00
- B01J2231/70—Oxidation reactions, e.g. epoxidation, (di)hydroxylation, dehydrogenation and analogues
- B01J2231/72—Epoxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2531/00—Additional information regarding catalytic systems classified in B01J31/00
- B01J2531/60—Complexes comprising metals of Group VI (VIA or VIB) as the central metal
- B01J2531/66—Tungsten
Definitions
- the present invention relates to a polyglycidyl ether compound in which a carbon-carbon double bond of an allyl group of a compound having a plurality of phenolic hydroxyl groups is epoxidized using hydrogen peroxide as an oxidizing agent in the presence of a tungsten catalyst. It relates to the manufacturing method.
- Polyglycidyl ether known as an epoxy resin is widely used in various fields, and is industrially produced on a large scale.
- a method for producing polyglycidyl ether there is a method of obtaining glycidyl ether by reacting bisphenol-A or phenol novolac resin with epichlorohydrin in the presence or absence of a catalyst under basic conditions.
- the glycidyl ether produced by this production method has a high content of organochlorine compounds that are considered undesirable for electronics applications. Therefore, attempts have been made for a long time to epoxidize the corresponding double bond after allyl etherification of the starting phenolic compound using peracetic acid or hydrogen peroxide.
- Patent Document 1 discloses a method of performing epoxidation in the presence of molybdenum or a tungsten compound, a quaternary ammonium salt, and phosphoric acid, but the reaction rate, yield, and selectivity are not sufficient. .
- Patent Document 2 discloses an example in which epoxidation of allyl ether, which is subject to conformational restrictions, is successful, but there are restrictions on allyl ether that can be used, and it is not a method that can be universally adopted industrially. .
- Patent Document 3 discloses a method using peracid without using hydrogen peroxide.
- organic peracid which is frequently used in accidents such as explosions. Since the produced carboxylic acid easily reacts with the epoxy resin, there is a problem that it is difficult to isolate the product with a high yield.
- Patent Document 4 discloses a method of epoxidation using methanol or acetonitrile solvent in the presence of potassium carbonate.
- Patent Document 5 discloses a method for producing an epoxy compound in which an olefin is reacted with a hydrogen peroxide solution using ⁇ -aminomethylphosphonic acid having a specific structure.
- the olefins described in Patent Document 5 are mainly low molecular weight olefins, and there is no description or suggestion that they can be similarly applied to polyphenol ethers of polyphenols.
- the problem to be solved by the present invention is that an allyl group carbon-carbon double bond of a polyallyl ether compound having a plurality of phenolic hydroxyl groups is bonded to an epoxy using hydrogen peroxide as an oxidizing agent under mild conditions. It is an object to provide a method for efficiently converting to a corresponding polyglycidyl ether with less residual organochlorine compound.
- the present inventors have found that a polyglycidyl ether compound can be efficiently obtained by carrying out the reaction in the presence of a specific catalyst system.
- the invention has been completed. That is, the present invention includes the following [1] to [12].
- a carbon-carbon double bond of an allyl group of a polyallyl ether compound of a compound having a plurality of phenolic hydroxyl groups as a starting material is used as an oxidizing agent in the presence of a tungsten compound, a phosphorus compound and a quaternary ammonium salt.
- a method for producing a polyglycidyl ether compound comprising a step of epoxidation using hydrogen peroxide.
- the polyallyl ether compound of polyphenol is catechol, resorcinol, hydroquinone, bisphenol A (p, p′-isopropylidenediphenol), bisphenol F (p, p′-methylenediphenol), bisphenol K (p, p'-diphenolcarbonyl), dihydroxymethylstilbene, dihydroxybiphenyl, tetramethyldihydroxybiphenyl, dihydroxynaphthalene, bis (hydroxyphenyl) fluorene, methane type trisphenols, trisphenols, phenol-aldehyde novolac resin, alkyl-substituted phenol- At least one phenol selected from the group consisting of aldehyde novolac resin, polycyclopentadiene-modified phenolic resin, and polyvinylphenol
- the polyallyl ether compound of polyphenol is a methane type trisphenol obtained by condensing an aromatic hydrocarbon having a phenolic hydroxyl group and an aldehyde compound, a phenol-aldehyde novolak resin, and an alkyl-substituted phenol-aldehyde novolak resin.
- the polyallyl ether compound of polyphenol is composed of a polycyclopentadiene-modified phenol resin obtained by condensing an aromatic hydrocarbon having a phenolic hydroxyl group and dicyclopentadiene, and polyvinyl phenol obtained by polymerizing vinyl phenol.
- the phosphorus compound is phosphoric acid, aminomethylphosphonic acid, ⁇ -aminoethylphosphonic acid, ⁇ -aminopropylphosphonic acid, ⁇ -aminobutylphosphonic acid, ⁇ -aminopentylphosphonic acid, ⁇ -aminohexylphosphonic acid, ⁇ -At least one selected from the group consisting of aminoheptylphosphonic acid, ⁇ -aminooctylphosphonic acid, ⁇ -aminononylphosphonic acid, ⁇ -amino- ⁇ -phenylmethylphosphonic acid, and nitrilotris (methylene) trisphosphonic acid
- a method for producing a polyglycidyl ether compound according to any one of [1] to [5].
- tungsten compound is at least one selected from the group consisting of tungstic acid, alkali tungstate, ammonium tungstate, phosphotungstic acid, and silicotungstic acid.
- the molar ratio of the allyl group carbon-carbon double bond to hydrogen peroxide of the polyallyl ether compound of the compound having a plurality of phenolic hydroxyl groups is in the range of 1: 0.5 to 1: 4.
- -Glycidyl ether which is a useful substance widely used in various industrial fields including chemical industry as a raw material for resist materials) and as a raw material for various polymers such as intermediates for agricultural chemicals and pharmaceuticals, plasticizers, adhesives and paint resins.
- Type epoxy resin can be produced safely, with good yield and at low cost by a simple operation from the reaction of the corresponding polyallyl ether and hydrogen peroxide solution. Therefore, the present invention has a great industrial effect.
- the method for producing a polyglycidyl ether compound of the present invention comprises a polyallyl ether compound of a compound having a plurality of phenolic hydroxyl groups using hydrogen peroxide as an oxidizing agent in the presence of a tungsten compound, a phosphorus compound and a quaternary ammonium salt.
- the carbon-carbon double bond of the allyl group is epoxidized.
- the concentration of the hydrogen peroxide aqueous solution that is a supply source of hydrogen peroxide used as the oxidizing agent in the production method of the present invention is generally 1 to 80% by mass, preferably 20 to 65% by mass. Selected from a range.
- hydrogen peroxide is preferably a high concentration, but it is needless to say that it is preferable not to use a high concentration of hydrogen peroxide for safety.
- the amount of aqueous hydrogen peroxide used is not particularly limited, but at least the molar equivalent of hydrogen peroxide used cannot epoxidize the allyl group. Therefore, when all the carbon-carbon double bonds of the allyl group of the polyallyl ether compound of the compound having a plurality of phenolic hydroxyl groups are epoxidized, the peroxidation is more than equimolar with respect to the carbon-carbon double bond. Although hydrogen is required, when partially epoxidizing, the amount of hydrogen peroxide used may be less than an equimolar amount. In addition, because the reaction system is acidic, the hydrolysis of the epoxy group tends to proceed easily.
- the amount of hydrogen peroxide depends on the number of phenolic hydroxyl groups that are substrates to be epoxidized.
- the number of carbon-carbon double bonds of the allyl group of the polyallyl ether compound of the compound is preferably in the range of 0.5 to 10 molar equivalents, more preferably in the range of 0.5 to 4 molar equivalents. And even more preferably in the range of 1 to 4 molar equivalents.
- Tungsten compounds used as catalysts include compounds that generate tungstate anions in water, such as tungstic acid, tungsten trioxide, tungsten trisulfide, tungsten hexachloride, silicotungstic acid, phosphotungstic acid, ammonium tungstate, and alkali tungstate.
- tungstic acid tungsten trioxide
- tungsten trisulfide tungsten hexachloride
- silicotungstic acid phosphotungstic acid
- phosphotungstic acid ammonium tungstate
- alkali tungstate alkali tungstate
- ammonium tungstate for example, sodium tungstate dihydrate
- phosphotungstic acid silica Tungstic acid or the like is preferable.
- These tungsten compounds may be used alone or in combination of two or more.
- the amount used is 0.001 to 20 mol% of tungsten atoms based on the number of carbon-carbon double bonds of the allyl group of the polyallyl ether compound of the compound having a plurality of phenolic hydroxyl groups as the substrate, preferably 0.8.
- the range is 1 to 20 mol%.
- the tungsten compound As a method for adding the tungsten compound to the reaction solution, the tungsten compound is previously dissolved in pure water, and then added in a form mixed with a hydrogen peroxide aqueous solution in a range of 0.5 to 10 times moles of the tungsten compound. It is desirable. If this treatment is not performed, the tungsten compound exists in a solid state depending on the pH of the reaction solution, and the reaction does not proceed immediately after the dropwise addition of the aqueous hydrogen peroxide solution. After the addition, the tungsten compound dissolves and the reaction proceeds suddenly, so that the selectivity may deteriorate.
- the phosphorus compound examples include phosphoric acid, aminomethylphosphonic acid, ⁇ -aminoethylphosphonic acid, ⁇ -aminopropylphosphonic acid, ⁇ -aminobutylphosphonic acid, ⁇ -aminopentylphosphonic acid, ⁇ -aminohexylphosphonic acid, ⁇ -Aminoheptylphosphonic acid, ⁇ -aminooctylphosphonic acid, ⁇ -aminononylphosphonic acid, ⁇ -amino- ⁇ -phenylmethylphosphonic acid, nitrilotris (methylene) trisphosphonic acid and the like.
- phosphoric acid, aminomethylphosphonic acid and nitrilotris (methylene) trisphosphonic acid are preferable, aminomethylphosphonic acid and nitrilotris (methylene) trisphosphonic acid are more preferable, and nitrilotris (methylene) trisphosphonic acid is even more preferable.
- These phosphorus compounds may be used alone or in combination of two or more. If the amount used is small, the effect as an epoxidation catalyst is low, and if it is large, the remaining in the product becomes a problem. Therefore, the carbon-carbon double of the allyl group of the polyallyl ether of the compound having a plurality of phenolic hydroxyl groups of the substrate. A range of 0.001 to 10 mol% is preferable based on the number of bonds, and a range of 0.1 to 5 mol% is more preferable.
- the ratio of the amount of the tungsten compound and the phosphorus compound used is such that the molar ratio of the tungsten atom to the phosphorus compound in the tungsten compound is in the range of 1: 0.01 to 1: 100, and 1: 0.1 to 1
- the range of 10 is more preferable.
- the quaternary ammonium salt acts as a phase transfer catalyst.
- sulfate, hydrogen sulfate, and nitrate are preferable.
- examples of the quaternary ammonium ion include tetrahexyl ammonium ion, tetraoctyl ammonium ion, methyl trioctyl ammonium ion, tetrabutyl ammonium ion, ethyl trioctyl ammonium ion, cetyl pyridinium ion, and the like.
- quaternary ammonium salt tetrahexylammonium hydrogen sulfate, tetraoctylammonium hydrogensulfate, methyltrioctylammonium hydrogensulfate and the like are preferable. These quaternary ammonium hydrogen sulfates may be used alone or in combination of two or more. If the amount used is small, the effect as a phase transfer catalyst is low, and if it is large, the remaining in the product becomes a problem. Therefore, the allyl group carbon-carbon two-carbon compound of the compound having a plurality of phenolic hydroxyl groups of the substrate is used. A range of 0.001 to 10 mol% is preferable based on the number of heavy bonds, and a range of 0.1 to 5 mol% is more preferable.
- the substrate to be epoxidized is a polyallyl ether compound of a compound having a plurality of phenolic hydroxyl groups, preferably a polyallyl ether compound of polyphenol, specifically catechol, resorcinol, Hydroquinone, bisphenol A (p, p'-isopropylidenediphenol), bisphenol F (p, p'-methylenediphenol), bisphenol K (p, p'-diphenolcarbonyl), dihydroxymethylstilbene, dihydroxybiphenyl, tetra Methyldihydroxybiphenyl, dihydroxynaphthalene, bis (hydroxyphenyl) fluorene, methane type trisphenols, trisphenols, phenol-aldehyde novolac resin, alkyl-substituted phenol- Aldehyde novolak resins, polycyclopentadiene modified phenol resin, and is obtained by allyl etherifying
- polyphenol polyallyl ether compounds having 3 or more phenolic hydroxyl groups are preferable.
- examples of such compounds include methane type trisphenols, trisphenols, phenol-aldehyde novolak resins, alkyl-substituted phenol-aldehyde novolak resins, Examples thereof include allyl etherified part or all of phenolic hydroxyl groups such as polycyclopentadiene-modified phenol resin and polyvinylphenol.
- (Methane-type) trisphenols and (alkyl-substituted) phenol-aldehyde novolak resins can be synthesized by, for example, condensing an aromatic hydrocarbon having a phenolic hydroxyl group with an aldehyde compound or a ketone compound, Widely manufactured industrially.
- Polycyclopentadiene-modified phenolic resin and polyvinylphenol can also be synthesized according to the following reaction formula and are industrially produced.
- the polyallyl ether compound of polyphenol can be obtained by allyl etherification of the polyphenol by a known method using allyl chloride, allyl alcohol, and allyl acetate.
- allyl alcohol Preference is given to using allyl acetate.
- solvents include aromatic hydrocarbons, aliphatic hydrocarbons, and alicyclic hydrocarbon solvents, among which toluene, o-xylene, m-xylene, p-xylene, hexane, octane, cyclohexane, methylcyclohexane Is preferred.
- concentration to be used if it is used excessively, the substrate concentration becomes dilute and the productivity is low, and the reaction rate is also slowed.
- the optimum concentration varies depending on the substrate, it is preferably in the range of 5 to 800 parts by weight, more preferably in the range of 30 to 300 parts by weight, based on 100 parts by weight of the polyphenol polyallyl ether compound used.
- the reaction temperature is usually in the range of 0 to 180 ° C., preferably in the range of 50 to 120 ° C.
- the addition time of the hydrogen peroxide and the phosphorus compound added as needed varies depending on the reaction scale, but in the case of a 1 liter glass scale, it takes 30 minutes to 2 hours and is 1 in the case of an industrial scale of 10 m 3. It is desirable to perform the addition over a period of 20 hours. After completion of the addition, the reaction is usually terminated by stirring for 1 to 4 hours.
- FIG. 1 is an example thereof, which can be implemented by the following procedure. (1) The reaction solution is allowed to stand after the epoxidation reaction.
- the container to be allowed to stand may be a reactor or another container.
- the container to be allowed to stand may be a reactor or another container.
- the upper organic layer and the aqueous layer are separated.
- the separated aqueous layer is concentrated to increase the tungsten catalyst concentration and / or a new catalyst is added.
- a catalyst is newly added, a phosphorus compound and / or a quaternary ammonium salt and further a tungsten compound are added to the separated aqueous layer as necessary.
- an aqueous layer containing a newly prepared catalyst can be used instead of the separated aqueous layer.
- the reason why it is preferable to separate the reaction solution into two layers during the reaction as described above, and to mix the separated organic layer and the aqueous layer with the catalyst concentration readjusted to repeat the reaction is that hydrogen peroxide is removed during the epoxidation reaction.
- the aqueous layer containing a catalyst such as tungsten is diluted with water contained in the aqueous hydrogen peroxide solution when dropped as an aqueous solution, and the catalytic activity decreases.
- ⁇ -aminoalkylphosphonic acids are used, they are consumed and decomposed during the reaction, so it is desirable to add them during recycling.
- FIG. 1 is an example of a method of intermittently separating the aqueous layer and the organic layer of the reaction solution, but the operation can also be carried out continuously using a continuous reactor as shown in FIG.
- a continuous reactor a tubular reactor can generally be used, and it is more preferable if the organic layer-water layer such as a microreactor is designed to be mixed well.
- it can implement similarly by extracting continuously, even in a stirring tank, supplying a reaction liquid continuously. After continuously extracting the reaction solution in this way, the organic layer and the aqueous layer are separated into two layers, and then the organic layer is recycled while adding new raw materials and solvents as necessary, and the aqueous layer is necessary.
- the catalyst components are added and hydrogen peroxide is added and recycled. In this case, a part of the reaction solution is extracted and sent to the next step (reaction tank for increasing the conversion rate to the target value, purification step).
- an organic solvent such as ethyl acetate, toluene, cyclohexane and hexane is further added as necessary, and the organic layer is treated with a reducing agent such as sodium bisulfite, sodium sulfite and sodium thiosulfate, After decomposing hydrogen peroxide, after washing, extraction, and purification as necessary, the solution is left as it is or in a solution with another solvent by exchanging the solvent, or without solvent.
- a polyglycidyl ether compound it can be used for a desired use.
- Example 1 A solution prepared by previously dissolving 0.409 g (1.24 mmol) of sodium tungstate in 0.409 g of pure water and 0.241 g (2.48 mmol) of 35% aqueous hydrogen peroxide was prepared.
- 10 g of the polyallyl cresol novolak resin obtained in Synthesis Example 1 (0.062 mol as the allyl group)
- 10 g of toluene 0.290 g (0.620 mmol) of methyl trioctylammonium hydrogen sulfate
- 0.0688 g (0.620 mmol) of aminomethylphosphonic acid and a tungstic acid solution prepared in advance were added, and the bath temperature was heated to 80 ° C.
- Examples 2-6 Comparative Examples 1-2
- the reaction was performed in the same manner as in Example 1 except that the catalysts shown in Table 1 below were used.
- the results are shown in Table 1 below.
- Example 7 A solution prepared by previously dissolving 0.438 g (1.33 mmol) of sodium tungstate in 0.438 g of pure water and 0.258 g (2.66 mmol) of 35% aqueous hydrogen peroxide solution was prepared.
- Example 8 A solution prepared by previously dissolving 0.409 g (1.24 mmol) of sodium tungstate in 0.409 g of pure water and 0.241 g (2.48 mmol) of 35% aqueous hydrogen peroxide was prepared.
- reaction solution was cooled to room temperature, transferred to a separatory funnel, the aqueous layer was separated, the toluene layer was returned to the reaction flask, 0.0344 g (0.310 mmol) of aminomethylphosphonic acid, The remaining one of the two parts was placed and the bath temperature was reheated to 80 ° C.
- the bath temperature reached 90 ° C, 12.1 g (0.124 mol) of an aqueous hydrogen peroxide solution was added dropwise over 30 minutes, and then the reaction was continued at a bath temperature of 80 ° C for 4 hours. A part of the reaction solution was sampled, toluene was distilled off, and then the epoxy equivalent was measured.
- Example 5 shows that epoxidation has progressed.
- Example 9 A solution prepared by previously dissolving 0.235 g (0.713 mmol) of sodium tungstate in 0.235 g of pure water and 0.139 g (1.43 mmol) of 35% aqueous hydrogen peroxide solution was prepared.
- 10 g (0.0357 mol) of the diallyl ether distillate of bisphenol-F obtained in Synthesis Example 3 10 g of toluene, 0.167 g (0.357 mmol) of methyltrioctylammonium hydrogensulfate ), 0.0396 g (0.357 mmol) of aminomethylphosphonic acid, and a previously prepared tungstic acid solution were added, and the bath temperature was heated to 80 ° C.
- Example 10 A solution prepared by previously dissolving 0.214 g (0.648 mmol) of sodium tungstate in 0.214 g of pure water and 0.126 g (1.30 mmol) of 35% aqueous hydrogen peroxide was prepared.
- Example 11 A solution prepared by previously dissolving 0.214 g (0.648 mmol) of sodium tungstate in 0.214 g of pure water and 0.126 g (1.30 mmol) of 35% aqueous hydrogen peroxide was prepared.
- Example 12 A solution prepared by previously dissolving 0.214 g (0.648 mmol) of sodium tungstate in 0.214 g of pure water and 0.126 g (1.30 mmol) of 35% aqueous hydrogen peroxide was prepared.
- Example 13 to 15 The reaction was carried out in the same manner as in Example 6 except that allyl compounds shown in Table 2 below were used. The results are shown in Table 2 below.
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Abstract
Dans le but de proposer un procédé de conversion d'une double liaison carbone-carbone dans un groupe aryle d'un composé d'éther polyarylique qui est un composé polyaryle éthérisé comprenant une pluralité de groupes hydroxyle phénoliques pour obtenir un éther polyglycidylique répondant efficacement au moyen d'une époxydation employant du peroxyde d'hydrogène comme catalyseur dans des conditions douces, l'invention concerne un procédé de production d'un composé d'éther polyglycidylique comprenant une étape d'époxydation d'une double liaison carbone-carbone dans un groupe aryle d'un composé éther polyarylique contenant une pluralité de groupes hydroxyle phénoliques qui est le matériau de départ, ladite époxydation employant du peroxyde d'hydrogène comme agent oxydant en présence d'un sel d'ammonium quaternaire, d'un composé de phosphore et d'un composé de tungstène.
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WO2015052925A1 (fr) * | 2013-10-09 | 2015-04-16 | 日本化薬株式会社 | Procédé de production de résine époxy, résine époxy, composition de résine durcissable, et produit durci |
JP2016094353A (ja) * | 2014-11-12 | 2016-05-26 | 昭和電工株式会社 | 多価グリシジル化合物の製造方法 |
KR20220157963A (ko) * | 2020-03-23 | 2022-11-29 | 닛뽄 가야쿠 가부시키가이샤 | 에폭시 수지, 에폭시 화합물, 에폭시 수지 조성물, 수지 시트, 프리프레그, 탄소 섬유 강화 복합 재료 및, 페놀 수지 |
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US9650353B2 (en) | 2012-03-30 | 2017-05-16 | Mitsubishi Chemical Corporation | Method for producing epoxy compound and catalyst composition for epoxidation reaction |
US10730846B2 (en) | 2012-03-30 | 2020-08-04 | Mitsubishi Chemical Corporation | Method of producing epoxy compound and catalyst composition for epoxidation reaction |
JP2014240376A (ja) * | 2013-05-13 | 2014-12-25 | 昭和電工株式会社 | 多価グリシジル化合物の製造方法 |
JP2014240377A (ja) * | 2013-05-13 | 2014-12-25 | 昭和電工株式会社 | 多価グリシジル化合物の製造方法 |
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JPWO2015052925A1 (ja) * | 2013-10-09 | 2017-03-09 | 日本化薬株式会社 | エポキシ樹脂の製造方法、エポキシ樹脂、硬化性樹脂組成物、及び、硬化物 |
JP2016094353A (ja) * | 2014-11-12 | 2016-05-26 | 昭和電工株式会社 | 多価グリシジル化合物の製造方法 |
KR20220157963A (ko) * | 2020-03-23 | 2022-11-29 | 닛뽄 가야쿠 가부시키가이샤 | 에폭시 수지, 에폭시 화합물, 에폭시 수지 조성물, 수지 시트, 프리프레그, 탄소 섬유 강화 복합 재료 및, 페놀 수지 |
EP4130088A4 (fr) * | 2020-03-23 | 2024-04-17 | Nippon Kayaku Kabushiki Kaisha | Résine époxyde, composés époxyde, composition de résine époxyde, feuille de résine, préimprégné, matériau composite renforcé par des fibres de carbone et résine phénolique |
KR102787108B1 (ko) | 2020-03-23 | 2025-03-25 | 닛뽄 가야쿠 가부시키가이샤 | 에폭시 수지, 에폭시 수지 조성물, 수지 시트, 프리프레그 및, 탄소 섬유 강화 복합 재료 |
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