WO2011076044A1 - Manufacturing method of led module - Google Patents
Manufacturing method of led module Download PDFInfo
- Publication number
- WO2011076044A1 WO2011076044A1 PCT/CN2010/078791 CN2010078791W WO2011076044A1 WO 2011076044 A1 WO2011076044 A1 WO 2011076044A1 CN 2010078791 W CN2010078791 W CN 2010078791W WO 2011076044 A1 WO2011076044 A1 WO 2011076044A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- film
- light
- luminescent
- curable adhesive
- emitting
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 239000000853 adhesive Substances 0.000 claims abstract description 42
- 230000001070 adhesive effect Effects 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 42
- 239000004065 semiconductor Substances 0.000 claims abstract description 30
- 239000002313 adhesive film Substances 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 239000013078 crystal Substances 0.000 claims description 54
- 239000003292 glue Substances 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 14
- 229910000679 solder Inorganic materials 0.000 claims description 12
- 229910052594 sapphire Inorganic materials 0.000 claims description 11
- 239000010980 sapphire Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000000084 colloidal system Substances 0.000 claims description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 7
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 7
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052596 spinel Inorganic materials 0.000 claims description 4
- 239000011029 spinel Substances 0.000 claims description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- YQNQTEBHHUSESQ-UHFFFAOYSA-N lithium aluminate Chemical compound [Li+].[O-][Al]=O YQNQTEBHHUSESQ-UHFFFAOYSA-N 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- -1 oxidized Substances 0.000 claims description 2
- 238000007650 screen-printing Methods 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 238000004806 packaging method and process Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 77
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 12
- 229910002601 GaN Inorganic materials 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 238000001723 curing Methods 0.000 description 8
- 230000017525 heat dissipation Effects 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 4
- 238000012858 packaging process Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
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- 238000000926 separation method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241001122315 Polites Species 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- QVMHUALAQYRRBM-UHFFFAOYSA-N [P].[P] Chemical compound [P].[P] QVMHUALAQYRRBM-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
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- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
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- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
Definitions
- the present invention relates to a method of fabricating a flip-chip light emitting diode module.
- LED Light Emitting Diode
- LED package also needs good heat dissipation and light extraction efficiency, especially in the aspect of heat dissipation. If the heat is not discharged in real time, hoarding The heat in the LED has a negative impact on its characteristics, service life and reliability.
- the conventional lead frame package structure can be mainly subjected to procedures such as die bonding, wire bonding, and molding, and the light-emitting die includes a sapphire substrate, an N-type gallium nitride ohm contact layer, a light-emitting layer, and a P-type.
- a gallium nitride ohm contact layer and a light-transmitting conductive layer, and a P-type electrode pad and an N-type electrode pad are respectively grown on the light-transmitting conductive layer and the N-type gallium nitride ohmic contact layer, wherein the solid crystal is first After one side surface of the sapphire substrate without the epitaxial layer is fixed on the lead frame by using a silver paste or a solder paste such as a high thermal conductivity solder paste or a gold tin solder, the both ends of the gold wire or the aluminum wire are thermally pressed.
- this kind of packaging method makes the heat dissipation of the luminescent film often limited by the sapphire substrate with low heat dissipation coefficient, and the thickness thereof is thicker, and the overall heat transfer difficulty is further improved, and part of the light emitted by the luminescent layer must be made of a P-type electrode.
- a manufacturer has improved the effective light-emitting area by using a Flip-Chip package, which is a sapphire of a gallium nitride-based light-emitting diode.
- a buffer layer and an N-type gallium nitride ohmic contact layer are sequentially grown on the substrate, and a light-emitting layer and a P-type gallium nitride ohmic contact layer are grown in the center, and the P-type gallium nitride ohmic contact layer is
- the P-type electrode pad is connected to the external heat-dissipating substrate, and the N-type electrode is grown on the two sides of the light-emitting layer, wherein an N-type electrode is connected to the external heat-dissipating substrate through the N-type electrode pad, because the main light-emitting surface is Unshielded light can increase the luminous efficiency of the LED; in addition, some companies can combine multiple illuminating dies on a gallium nitride (GaN) substrate or a silicon substrate, and silver can be used for the gallium nitride substrate or the silicon substrate.
- GaN gallium nitride
- the heat generated by the light-emitting diode can be quickly transmitted to the good heat dissipation coefficient by the electrode pad in the flip-chip structure through the gallium nitride substrate or the silicon substrate.
- the material is dissipated to the outside, which can replace the sapphire substrate, improve the heat transfer effect, etc., and improve the overall package heat dissipation effect.
- the material cost of this method is often much higher than that of the sapphire substrate, and the manufacturer still has cost considerations. The main use of sapphire substrates.
- the LED manufacturing process can be divided into epitaxial forming, cutting, crystal selecting, filming, detaching, die attaching and flip-chip packaging processes, in which tens of thousands of luminescent crystal grains can be cut after epitaxial forming, and then classified.
- the crystal is attached to the film (blue glue), and can be used as a wholesale optical grain stock, or can be subsequently separated from the film, and transported by a vacuum chuck to perform solid crystal bonding, adhesion, and coating of the subsequent light-emitting crystal grains.
- the process of crystal encapsulation, etc. except that the detachment process uses the ejector pin of the separating device to push the film on the film to separate the illuminating die and the film one by one.
- the metal material is made.
- the thimble must be subjected to a large pushing force to separate the luminescent film from the film, and due to the epitaxial layer on the luminescent film (such as buffer layer, N-type GaN ohmic contact layer, The luminescent layer and the P-type GaN ohmic contact layer are relatively thin compared to the thickness of the sapphire substrate.
- the pushing force is too large, or other parameters are poorly set, the epitaxial layer cannot be formed. From excessive impact energy (Impact Energy), which led to situations such as light-emitting grains rupture or damage occurs, the product defect rate will also increase significantly, while increasing costs on overall manufacturing.
- the inventors have in view of the above known light-emitting diodes in which the illuminating die and the film are separated by the ejector pin. It is easy to cause problems and defects in the process of rupture or damage. Through the collection of relevant materials through multi-party evaluation and consideration, and the continuous trial and modification of the industry's many years of experience, the design of such flip-chip LED modules is designed. method.
- An embodiment of the invention is a method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the glue a side of the film, and the luminescent film is adhered to the film by the curable adhesive; (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film; e) pushing the other side of the film to separate the light-emitting die and the film; and (f) packaging the light-emitting die to complete the light-emitting diode module.
- the method further includes: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a), thereby forming an epitaxial layer thereon. On the wafer substrate; (h) cutting the wafer substrate having the epitaxial layer into a plurality of single luminescent crystal grains; and (i) selecting one of the plurality of single luminescent dies cut by the step (h) The qualified luminescent crystal grains are obtained.
- the step (f) comprises: using a vacuum nozzle or a suction cup of a conveying device to adsorb the separated illuminating crystal grains, and then conveying the separated illuminating crystal grains with a conductive colloid or a solder.
- the circuit substrate is connected, and the predetermined circuit substrate can be a single-sided or double-sided circuit layout, wherein the light-emitting die is electrically connected to one or both sides of the predetermined circuit substrate in series or in parallel, and is coated.
- the phosphor phosphor is colloided to the separated luminescent crystal grains, and a baking process is performed to treat the luminescent crystal grains.
- Another embodiment of the present invention is a method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the a side of the film, and the luminescent film is adhered to the film by the curable adhesive; and (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film .
- a light emitting diode module preform includes: a film, a light emitting die, and a side of a curable adhesive attached to the film, and is bonded by the curable adhesive The luminescent crystal grains are on the film.
- FIG. 1 is a schematic view showing a change of a manufacturing state of an LED module according to an embodiment of the present invention
- FIG. 2 is a schematic structural view of a thimble according to an embodiment of the present invention
- FIG. 3 is a schematic diagram of a method for manufacturing an LED module according to an embodiment of the present invention
- FIG. 4 is a schematic diagram of a method for further manufacturing an LED module according to an embodiment of the present invention
- FIG. 5 is a schematic diagram of a pre-material for an LED module according to an embodiment of the present invention.
- FIG. 1 are respectively a manufacturing state diagram of the LED module of the present invention.
- the state change of the flip-chip LED module of the present invention is: in the first state, it is through epitaxial Schematic diagram of a plurality of single LED chips 1 after forming, cutting, crystallizing, and filming.
- the N-type semiconductor layer 12, the light-emitting layer 13 and the P-type semiconductor layer 14 are sequentially grown on the wafer substrate 11 of the light-emitting diode, and the surface of the P-type semiconductor layer 14 is grown with light-transmitting conductive After the layer (not shown), the portion of the transparent conductive layer An N-type electrode pad 121 and a P-type electrode pad 141 are grown on the surface.
- the dicing process is to diced the wafer substrate having the epitaxial layer into the plurality of single luminescent crystal grains 1.
- the crystallization process is to sort and pick up the applicable luminescent crystals 1.
- a UV (ultraviolet) glue 3 is applied on the side surface of the film 2 to form a coating layer, and the plurality of light-emitting crystal grains 1 are adhered to the film 2 through the UV glue 3 to be integrated.
- the second state it is a schematic diagram of UV (ultraviolet) exposure of the plurality of individual light emitting diode dies 1 .
- the coating layer is irradiated onto the film 2 by a UV exposure machine, and is quickly dried by the UV glue 3, and the viscosity of the luminescent film 1 adhered to the film 2 can be reduced.
- the third state it is a schematic diagram of the plurality of single LED die 1 .
- the ejector pin 41 of the separating device 4 is pushed up on the other side surface of the film 2, so that the respective luminescent crystal grains 1 are separated from the film 2 one by one.
- FIG. 2 it is a state of the ejector pin 41 of the separating device 4, and the ejector pin 41 can be of different types (such as a round head, a pointed head, etc.) depending on the size or weight of the illuminating die 1.
- the suction nozzles 51 of the transport device 5 for transport. After the die is transported to the appropriate processing line, other processes such as die attach, lamp package, etc. can be performed.
- the N-type electrode pad 121 and the P-type electrode pad 141 on the illuminating crystal 1 are respectively connected to the solder pad of the circuit substrate through the conductive paste or the solder, and the flip-chip LED module is formed. .
- the latter combines the LED module with an external luminaire package. It can be seen from the above steps that the epitaxial layer 15 is grown on the substrate 11, that is, the N-type semiconductor layer 12, the light-emitting layer 13, and the P-type semiconductor layer 14 are sequentially grown on the substrate 11.
- a light-transmissive conductive layer is grown on the surface of the P-type semiconductor layer 14 , and an N-type electrode pad 121 and a P-type electrode pad 141 are respectively grown on the surface of the light-transmitting conductive layer, but the portion of the epitaxial layer 15 is grown.
- N-type semiconductor layer 12, light-emitting layer 13, and P-type semiconductor layer 14, etc. are grown by exposure, development, and metal lift-off (Liff-Off) techniques, such as N-type electrode pad 121, P-type electrode pad 141, etc.
- the wafer substrate having the epitaxial layer can be cut into a plurality of individual light-emitting dies 1 and selected by Pick up) Applicable illuminating crystal 1;
- Another UV adhesive 3 is applied to the adhesive film 2 - a coating layer is formed on the side surface, and the UV adhesive 3 is applied on the adhesive film 2 in a manner that the screen can be utilized.
- Print Brush, roller type, spray type processing, etc., and the UV glue 3 can be UV Cure Resin or UV light curing polymer, and each of the luminescent crystal grains 1 can be transmitted through UV.
- the glue 3 is adhered to the film 2 to be integrated and arranged in an equidistant arrangement or array.
- the wholesale optical crystal 1 can be stocked or transported to a downstream manufacturer for subsequent packaging processes, and when the light-emitting die is used.
- the luminescent film 1 needs to be detached from the film 2, and at this time, the UV glue 3 coating layer on the film 2 can be irradiated by UV (ultraviolet) light generated by the UV exposure machine. After exposure, the UV glue 3 is quickly dried and light-cured to reduce the viscosity of the luminescent film 1 adhered to the film 2, that is, the characteristics of the UV glue 3 material are changed to become hard and brittle, and the separation device 4 is reused.
- the thimble (Push-up Needle, PUN for short) 41 is pushed up on the other side surface of the film 2, so that the thimble 41 made of metal material can be easily applied without a large pushing force.
- Each of the light-emitting crystal grains 1 and the film 2 are separated one by one, and can also be effectively prevented If the position of the needle 41 is not good, the pushing force is too large, or other parameters are poorly set, the epitaxial layer 15 is subjected to excessive impact energy, which causes damage and damage of the structure of the luminescent crystal 1 and improves the product. Quality and yield, reducing the cost of manufacturing. Therefore, the vacuum nozzle 51 or the suction cup of the conveying device 5 can be used to adsorb to the illuminating crystal grain.
- the circuit substrate is connected to each other, and the circuit substrate may be provided with a circuit layout on one or both sides, and each rectangular light-emitting die 1 is electrically connected to the circuit substrate in one or both sides through a circuit layout in series or in parallel.
- the flip-chip light-emitting diode By forming a single-sided or double-sided light-emitting type, thereby completing the crystallizing and adhesion of the light-emitting crystal 1, and then performing the phosphor colloid coating and baking process of the light-emitting crystal 1, the flip-chip light-emitting diode can be formed.
- the module then integrates the LED module into a package with an external luminaire (not shown).
- the substrate 11 on the luminescent crystal 1 of the present invention may be transparent sapphire, silicon carbide (SiC), oxidized.
- the N-type semiconductor layer 12 and the P-type semiconductor layer 14 may also be titanium, gold, titanium, aluminum, or one of or a combination of chromium, gold or chromium, aluminum, and sequentially grown on the substrate 11.
- the N-type semiconductor layer 12, the light-emitting layer 13, and the P-type semiconductor layer 14 constitute an epitaxial layer 15, which only needs to provide the light-emitting crystal grains 1 to pass through.
- the UV glue 3 When the UV glue 3 is adhered to the film 2, the UV light generated by the UV exposure machine can be irradiated to the UV glue 3 for exposure, and the UV film 3 can be light-cured to reduce the adhesion of the luminescent film 1 to the film 2
- the viscosity of the top, the thimble 41 (shown in FIG. 2) of the separation device 4 can be different according to the size or weight of the illuminating crystal 1 (such as a round head, a pointed end, etc.), and is pushed to the top.
- the thimble 41 easily breaks the thin N-type semiconductor layer 12, the luminescent layer 13, and the P-type semiconductor layer 14 of the epitaxial layer 15.
- FIG. 3 is a schematic diagram of a method for manufacturing an LED module.
- the method comprises: (a) preparing a film (step 301); (b) preparing a light-emitting die (step 303); (c) applying a curable adhesive to one side of the film, and passing the a curable adhesive is applied to the luminescent film on the film (step 305); (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film (step 307); e) pushing the other side of the film, thereby separating the light-emitting die and the film (step 309); and (f) packaging the light-emitting die (step 311) to complete the light-emitting diode module.
- the method for manufacturing the LED module further includes: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a), thereby forming a An epitaxial layer is on the wafer substrate (step 313); (h) cutting the wafer substrate having the epitaxial layer into a plurality of single light-emitting dies (step 315); and (i) from the step ( h) selecting the qualified luminescent crystal grains from the plurality of dicing light-emitting dies that are cut (step 317).
- the structure obtained in the foregoing steps may be integrated with the lamp through the external lamp packaging step (step 319). Please refer to FIG.
- step (f) includes: using a vacuum nozzle or a suction cup provided in a conveying device to adsorb the separated illuminating crystal grains and then conveying them (step 401), and separating the illuminating crystal grains by a conductive colloid or a solder.
- a predetermined circuit substrate Connected to a predetermined circuit substrate (step 403), and the predetermined circuit substrate can be a single-sided or double-sided circuit layout, wherein the light-emitting die is electrically connected to the preset circuit substrate in series or parallel manner.
- FIG. 5 is a schematic diagram of the LED module pre-material.
- the LED module pre-material comprises: a film 501, a light-emitting die 503, and a curable adhesive 505 connected to one side of the film, and the light-emitting die is adhered through the curable adhesive 503 is on the film 501.
- Example 1 A method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the film And affixing the luminescent film to the film by the curable adhesive; (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film; Pushing the other side of the film to separate the light-emitting die and the film; and (f) packaging the light-emitting die to complete the light-emitting diode module.
- Embodiment 2 The method of Embodiment 1, the method further comprising: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a) Forming an epitaxial layer on the wafer substrate; (h) cutting the wafer substrate having the epitaxial layer into a plurality of single light-emitting dies; and (i) passing the step (h) Among the plurality of single luminescent crystal grains that are cut, the qualified luminescent crystal grains are selected.
- the epitaxial layer of the step (g) further has a light-transmitting conductive layer on the surface of the P-type semiconductor layer, and the surface of the light-transmitting conductive layer is partially There is an N-type electrode pad and a P-type electrode pad respectively, and the wafer substrate can be transparent sapphire, silicon carbide, oxidized, magnesium oxide, gallium oxide, aluminum nitride, lithium gallium oxide, lithium aluminum oxide. Or spinel-based titanium, aluminum; chrome, gold or chromium, aluminum or one of them or a combination thereof.
- the curable adhesive in the step (c) is a UV glue
- the curing of the step (d) is exposed to UV light.
- the UV glue is applied to cure the UV glue.
- Embodiment 5 The method according to Embodiment 4, wherein the UV glue is a UV Cure Resin or an ultraviolet light curing polymer. And the UV light is generated by an exposure machine.
- step (f) comprises: using a vacuum nozzle or a suction cup provided in a conveying device to adsorb the separated luminescent crystal grains and then transporting
- the separate light emitting die is connected to a predetermined circuit substrate by a conductive paste or a solder, and the predetermined circuit substrate can be a single-sided or double-sided circuit layout for the light emitting die to be connected in series or in parallel
- the method is electrically connected to one or both sides of the preset circuit substrate, coating a phosphor colloid on the separated light emitting die, and performing a baking process to process the light emitting die.
- the package of step (f) is a flip chip package, and the light emitting diode module can be integrated with the external lamp package.
- the method for manufacturing the LED module comprising: (a) preparing a film; (b) preparing a light-emitting die; (c) applying a curable adhesive to one side of the film, and bonding the luminescent film to the film by the curable adhesive; and (d) curing the curable adhesive and lowering the The viscosity of the luminescent film adhered to the film.
- Embodiment 11 According to the method of any of Embodiments 1 - 10, it is further possible for a light emitting diode module preform to include: a film, a light emitting die, and a curable adhesive connection.
- the luminescent film is attached to the film by the curable adhesive.
- the method for manufacturing the above-described flip-chip type light-emitting diode module of the present invention can achieve its efficacy and purpose when used. Therefore, the present invention is an invention with excellent practicability, and is an application for conforming to the invention patent. To file an application, I hope that the trial committee will grant the case as soon as possible to protect the inventor's hard work. If there is any doubt in the trial committee, please do not hesitate to give instructions, the inventor will try his best to cooperate and feel polite.
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Abstract
Description
发光二极管模块的制造方法 LED module manufacturing method
技术领域 本发明涉及一种覆晶式发光二极管模块的制造方法。 TECHNICAL FIELD The present invention relates to a method of fabricating a flip-chip light emitting diode module.
背景技术 Background technique
一般市面上所使用的发光装置型式与种类相当多, 然就以次世代绿色环 保、 节能的趋势来说, 由于发光二极管 ( Light Emitting Diode, LED )具有更 加省电、体积小, 以及良好稳定性与可靠度的优势, 特别是白光发光二极管, 因而使发光二极管被广泛地应用在路灯、 隧道灯、 手电筒、 指示广告牌、 家 居照明及液晶面板的背光源等用途。 除此之外, 为了达到更亮更省电的目标, 发光二极管封装还需要有良好 的散热性及光萃取效率, 尤其是在散热方面更是受到重视, 若未能实时将热 量排出, 使囤积在发光二极管中的热对其特性、 使用寿命及可靠度都会产生 不良影响, 而光学设计也是封装程序中重要的一环,要如何有效地将光导出, 发光角度及方向都是设计的重点所在。 若以传统导线架封装结构为例, 主要可经过固晶、 打线键合及模造等程 序, 而发光晶粒为包括有蓝宝石基板、 N型氮化镓奥姆接触层、 发光层、 P 型氮化镓奥姆接触层及透光导电层,并于透光导电层与 N型氮化镓奥姆接触 层上分别成长有 P型电极衬垫、 N型电极衬垫, 其中固晶是先将蓝宝石基板 无磊晶层的一侧表面使用银胶或导热系数较高的锡膏、 金锡焊料等接合材料 固定在导线架上后, 利用热压合方式将金线或铝线的两端分别连接到发光晶 粒及导线架或基板上, 并以荧光粉均勾涂布于发光晶粒上, 再通过模造填充 环氧树酯保护芯片、 加热进行交联反应来增加硬度并降低吸湿性, 惟此种封 装方式使发光晶粒散热往往被低散热系数的蓝宝石基板所局限,其厚度较厚、 更加提高整体热传困难度, 且因发光层所发出的部份光线必须由 P型电极衬 垫的一侧穿过透光导电层而射向荧光粉及环氧树酯, 造成 P型电极衬垫本身 会遮蔽部分发光面、 降低发光二极管发光效率。 因此, 为了解决因电极衬垫遮蔽所导致发光效率降低的缺点, 便有业者 改釆用覆晶式(Flip-Chip )封装增加有效发光面积, 其是于氮化镓系发光二 极管所具有的蓝宝石基板上依序成长有緩冲层、 N型氮化镓奥姆接触层, 并 于中央成长有发光层及 P型氮化镓奥姆接触层, 且该 P型氮化镓奥姆接触层 为透过 P型电极衬垫与外部散热基板相连接,而发光层二侧边成长有 N型电 极,其中一 N型电极透过 N型电极衬垫与外部散热基板相连接, 由于主要出 光面并无遮蔽光线, 则可增加发光二极管发光效率; 再者, 亦有业者将多个 发光晶粒结合于氮化镓(GaN )基板或硅基板上, 即可将氮化镓基板或硅基 板使用银胶、 软焊金属等接合材料固定在镀银的铜材上后, 而使发光二极管 所产生的热量可由覆晶结构中的电极衬垫透过氮化镓基板或硅基板快速传导 至良好散热系数的铜材对外排散, 藉此可取代蓝宝石基板、 改善热传效果较 差等问题, 而提高整体封装散热效果, 惟此种方式材料成本往往较蓝宝石基 板贵上许多, 厂商碍于成本考虑, 一般仍以使用蓝宝石基板为主。 又发光二极管制作流程可分为磊晶成型、 切割、 选晶、 贴膜、 脱离、 晶 粒黏着以及覆晶式封装制程, 其中磊晶成型后即可切割成数万个发光晶粒, 再进行分类、 选晶贴至胶膜(蓝胶)上, 而可将成批发光晶粒库存, 或是进 行后续脱离胶膜, 同时藉由真空吸盘输送以进行后续发光晶粒的固晶、黏着, 以及覆晶式封装等制程, 惟该脱离过程是利用分离装置所具有的顶针推顶于 胶膜使发光晶粒与胶膜逐一分离,由于发光晶粒贴至胶膜上具有一定黏着度, 金属材质制成的顶针则必须施以较大推顶力量, 才能够将发光晶粒与胶膜分 离, 且因发光晶粒上的磊晶层 (如緩冲层、 N型氮化镓奥姆接触层、 发光层 及 P型氮化镓奥姆接触层等)相较于蓝宝石基板厚度相当的薄, 然若是顶针 位置不佳、 推顶力量过大或其它参数设定不良, 便会造成磊晶层无法承受过 大的冲击能量( Impact Energy ) , 进而导致发光晶粒的破裂或损伤等情况发 生, 使产品不良率大幅也将提高, 同时增加整体制造上的成本。 Generally speaking, there are quite a lot of types and types of illuminating devices on the market. However, in terms of the next generation of green environmental protection and energy saving, Light Emitting Diode (LED) has more power saving, small size, and good stability. With the advantages of reliability, especially white light-emitting diodes, LEDs are widely used in street lamps, tunnel lights, flashlights, signage billboards, home lighting and backlights for LCD panels. In addition, in order to achieve the goal of brighter and more power-saving, LED package also needs good heat dissipation and light extraction efficiency, especially in the aspect of heat dissipation. If the heat is not discharged in real time, hoarding The heat in the LED has a negative impact on its characteristics, service life and reliability. Optical design is also an important part of the packaging process. How to effectively derive the light, the angle of illumination and the direction are the key points of the design. . For example, the conventional lead frame package structure can be mainly subjected to procedures such as die bonding, wire bonding, and molding, and the light-emitting die includes a sapphire substrate, an N-type gallium nitride ohm contact layer, a light-emitting layer, and a P-type. a gallium nitride ohm contact layer and a light-transmitting conductive layer, and a P-type electrode pad and an N-type electrode pad are respectively grown on the light-transmitting conductive layer and the N-type gallium nitride ohmic contact layer, wherein the solid crystal is first After one side surface of the sapphire substrate without the epitaxial layer is fixed on the lead frame by using a silver paste or a solder paste such as a high thermal conductivity solder paste or a gold tin solder, the both ends of the gold wire or the aluminum wire are thermally pressed. They are respectively connected to the illuminating crystal grain and the lead frame or the substrate, and are coated with the phosphor on the illuminating granules, and then the epoxy resin is used to protect the chip by heating, and the crosslinking reaction is heated to increase the hardness and reduce the hygroscopicity. However, this kind of packaging method makes the heat dissipation of the luminescent film often limited by the sapphire substrate with low heat dissipation coefficient, and the thickness thereof is thicker, and the overall heat transfer difficulty is further improved, and part of the light emitted by the luminescent layer must be made of a P-type electrode. Padded Through the light-transmitting conductive layer side toward the phosphor and an epoxy resin, resulting in the P-type electrode pad itself It will shield part of the light-emitting surface and reduce the luminous efficiency of the LED. Therefore, in order to solve the disadvantage of reduced luminous efficiency due to shielding of the electrode pad, a manufacturer has improved the effective light-emitting area by using a Flip-Chip package, which is a sapphire of a gallium nitride-based light-emitting diode. A buffer layer and an N-type gallium nitride ohmic contact layer are sequentially grown on the substrate, and a light-emitting layer and a P-type gallium nitride ohmic contact layer are grown in the center, and the P-type gallium nitride ohmic contact layer is The P-type electrode pad is connected to the external heat-dissipating substrate, and the N-type electrode is grown on the two sides of the light-emitting layer, wherein an N-type electrode is connected to the external heat-dissipating substrate through the N-type electrode pad, because the main light-emitting surface is Unshielded light can increase the luminous efficiency of the LED; in addition, some companies can combine multiple illuminating dies on a gallium nitride (GaN) substrate or a silicon substrate, and silver can be used for the gallium nitride substrate or the silicon substrate. After bonding materials such as glue and solder metal are fixed on the silver-plated copper material, the heat generated by the light-emitting diode can be quickly transmitted to the good heat dissipation coefficient by the electrode pad in the flip-chip structure through the gallium nitride substrate or the silicon substrate. of The material is dissipated to the outside, which can replace the sapphire substrate, improve the heat transfer effect, etc., and improve the overall package heat dissipation effect. However, the material cost of this method is often much higher than that of the sapphire substrate, and the manufacturer still has cost considerations. The main use of sapphire substrates. The LED manufacturing process can be divided into epitaxial forming, cutting, crystal selecting, filming, detaching, die attaching and flip-chip packaging processes, in which tens of thousands of luminescent crystal grains can be cut after epitaxial forming, and then classified. The crystal is attached to the film (blue glue), and can be used as a wholesale optical grain stock, or can be subsequently separated from the film, and transported by a vacuum chuck to perform solid crystal bonding, adhesion, and coating of the subsequent light-emitting crystal grains. The process of crystal encapsulation, etc., except that the detachment process uses the ejector pin of the separating device to push the film on the film to separate the illuminating die and the film one by one. Since the illuminating die has a certain adhesion to the film, the metal material is made. The thimble must be subjected to a large pushing force to separate the luminescent film from the film, and due to the epitaxial layer on the luminescent film (such as buffer layer, N-type GaN ohmic contact layer, The luminescent layer and the P-type GaN ohmic contact layer are relatively thin compared to the thickness of the sapphire substrate. However, if the position of the thimble is not good, the pushing force is too large, or other parameters are poorly set, the epitaxial layer cannot be formed. From excessive impact energy (Impact Energy), which led to situations such as light-emitting grains rupture or damage occurs, the product defect rate will also increase significantly, while increasing costs on overall manufacturing.
发明内容 发明人有鉴于上述已知的发光二极管于发光晶粒与胶膜利用顶针脱离过 程中容易造成破裂或损伤的问题与缺失, 通过搜集相关资料经由多方评估及 考虑, 并以从事此行业的多年经验不断的试作与修改, 才设计出此种覆晶式 发光二极管模块的制造方法。 本发明的一实施例是一种发光二极管模块的制造方法,其步骤包括: (a ) 预备一胶膜; ( b )预备一发光晶粒; ( c )涂布一可固化接着剂于该胶膜的 一侧, 并通过该可固化接着剂贴合该发光晶粒于该胶膜上; (d )固化该可固 化接着剂并降低该发光晶粒黏贴于该胶膜上的黏度; ( e )推顶该胶膜的另一 侧, 藉此分离该发光晶粒与胶膜; 以及(f )封装该发光晶粒, 以完成该发光 二极管模块。 且其上述步骤还包括: (g )在步骤(a )前依序成长一 N型半 导体层、 一发光层及一 P型半导体层于一晶圓基板上, 藉此形成一磊晶层于 该晶圓基板上; ( h )切割具有该磊晶层的该晶圓基板成为多个单颗发光晶粒; 以及 (i ) 由该经步骤(h )切割的多个单颗发光晶粒中挑选出合格的该发光 晶粒。 此外, 步骤(f ) 包含: 利用一输送装置所具有的真空吸嘴或吸盘来吸 附该分离的发光晶粒后进行输送、 通过一导电胶体或一焊料使该分离的发光 晶粒与一预设电路基板相连接,且该预设电路基板可为单面或双面电路布局, 以供该发光晶粒以串联或并联方式电性连接于该预设电路基板的单面或双面 上、 涂布荧光粉胶体于该分离的发光晶粒、 以及执行烘烤程序, 以处理该发 光晶粒。 本发明的另一实施例是一种发光二极管模块的制造方法, 其步骤包括: ( a )预备一胶膜; (b )预备一发光晶粒; (c )涂布一可固化接着剂于该胶 膜的一侧, 并通过该可固化接着剂贴合该发光晶粒于该胶膜上; 以及(d )固 化该可固化接着剂并降低该发光晶粒黏贴于该胶膜上的黏度。 本发明的再一实施例是一种发光二极管模块预材包括: 一胶膜、 一发光 晶粒、 以及一可固化接着剂连接于该胶膜的一侧, 并通过该可固化接着剂贴 合该发光晶粒于该胶膜上。 SUMMARY OF THE INVENTION The inventors have in view of the above known light-emitting diodes in which the illuminating die and the film are separated by the ejector pin. It is easy to cause problems and defects in the process of rupture or damage. Through the collection of relevant materials through multi-party evaluation and consideration, and the continuous trial and modification of the industry's many years of experience, the design of such flip-chip LED modules is designed. method. An embodiment of the invention is a method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the glue a side of the film, and the luminescent film is adhered to the film by the curable adhesive; (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film; e) pushing the other side of the film to separate the light-emitting die and the film; and (f) packaging the light-emitting die to complete the light-emitting diode module. The method further includes: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a), thereby forming an epitaxial layer thereon. On the wafer substrate; (h) cutting the wafer substrate having the epitaxial layer into a plurality of single luminescent crystal grains; and (i) selecting one of the plurality of single luminescent dies cut by the step (h) The qualified luminescent crystal grains are obtained. In addition, the step (f) comprises: using a vacuum nozzle or a suction cup of a conveying device to adsorb the separated illuminating crystal grains, and then conveying the separated illuminating crystal grains with a conductive colloid or a solder. The circuit substrate is connected, and the predetermined circuit substrate can be a single-sided or double-sided circuit layout, wherein the light-emitting die is electrically connected to one or both sides of the predetermined circuit substrate in series or in parallel, and is coated. The phosphor phosphor is colloided to the separated luminescent crystal grains, and a baking process is performed to treat the luminescent crystal grains. Another embodiment of the present invention is a method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the a side of the film, and the luminescent film is adhered to the film by the curable adhesive; and (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film . According to still another embodiment of the present invention, a light emitting diode module preform includes: a film, a light emitting die, and a side of a curable adhesive attached to the film, and is bonded by the curable adhesive The luminescent crystal grains are on the film.
附图说明 DRAWINGS
【图式简单说明】 图 1是本发明实施例发光二极管模块制造状态变化示意图; 图 2是本发明实施例顶针的结构示意图; [Simple description of the map] 1 is a schematic view showing a change of a manufacturing state of an LED module according to an embodiment of the present invention; FIG. 2 is a schematic structural view of a thimble according to an embodiment of the present invention;
图 3是本发明实施例发光二极管模块制造方法示意图; 图 4是本发明实施例发光二极管模块进一步制造方法示意图; 图 5是本发明实施例发光二极管模块预材示意图。 3 is a schematic diagram of a method for manufacturing an LED module according to an embodiment of the present invention; FIG. 4 is a schematic diagram of a method for further manufacturing an LED module according to an embodiment of the present invention; and FIG. 5 is a schematic diagram of a pre-material for an LED module according to an embodiment of the present invention.
【主要组件符号说明】 [Main component symbol description]
1 发光晶粒 1 luminescent crystal
11 基板 11 substrate
12 N型半导体层 12 N-type semiconductor layer
121 N型电极衬垫 121 N-type electrode pad
13 发光层 13 luminescent layer
14 P型半导体层 14 P type semiconductor layer
141 P型电极衬垫 141 P type electrode pad
15 晶层 15 crystal layer
胶膜 Film
UV胶 UV glue
分离装置 Separation device
1 顶针 1 thimble
输送装置 Conveyor
1 吸嘴 1 nozzle
01 预备胶膜步骤 01 Preparation film step
03 预备发光晶粒步骤 305 涂布可固化接着剂步骤 03 Preparing the luminescent grain step 305 Coating Curable Adhesive Steps
307 固化可固化接着剂步骤 307 curing curable adhesive step
309 推顶胶膜步骤 309 push film step
311 封装发光晶粒步骤 311 package luminescent grain step
313 形成磊晶层步骤 313 Step of forming an epitaxial layer
315 切割晶圓步骤 315 cutting wafer steps
317 挑选合格发光晶粒步骤 317 Steps for selecting qualified luminescent grains
319 结合灯具步骤 319 combined with luminaire steps
401 输送发光晶粒步骤 401 Step of transporting luminescent crystals
403 连接发光晶粒与预设电路基板步骤 403 Steps of connecting the light emitting die and the preset circuit substrate
405 涂布荧光粉胶体步骤 405 Coating Phosphor Colloid Step
407 烘烤发光晶粒步骤 407 baking luminescent grain step
501 胶膜 501 film
503 发光晶粒 503 illuminating crystal
505 可固化接着剂 505 curable adhesive
具体实施方式 为达成上述目的及功效, 本发明将结合附图来说明所釆用的技术手段及 其构造, 并就本发明的较佳实施例详加说明其特征与功能如下。 请参阅图 1所示, 分别为本发明发光二极管模块的制造状态图, 由图 1 中可清楚看出, 本发明覆晶式发光二极管模块状态变化为: 在第一状态时, 是经过磊晶成形、 切割、 选晶以及贴膜后的多个单颗发 光二极管晶粒 1示意图。 其中, 磊晶过程是于发光二极管所具有的晶圓基板 11上依序成长有 N型半导体层 12、 发光层 13及 P型半导体层 14, 且 P型 半导体层 14面上成长有透光导电层(图中未示出)后, 再于透光导电层部分 表面上分别成长有 N型电极衬垫 121、 P型电极衬垫 141。 切割过程是将具 有该磊晶层的该晶圓基板切割成为该多个单颗发光晶粒 1。选晶过程是分类、 挑选 ( Pick up ) 出适用的该发光晶粒 1。 而贴膜过程是将 UV (紫外线)胶 3 涂布于胶膜 2—侧表面上形成有涂布层, 并将该多个发光晶粒 1透过 UV胶 3黏贴于胶膜 2上成为一体。 在第二状态时, 是 UV (紫外线)曝光该多个单颗发光二极管晶粒 1示 意图。 其利用 UV曝光机照射于胶膜 2上的涂布层进行曝光, 并藉由 UV胶 3快速干燥、 光固化后可降低发光晶粒 1黏贴于胶膜 2上的黏度。 在第三状态时, 是脱离该多个单颗发光二极管晶粒 1示意图。 其利用分 离装置 4所具有的顶针 41推顶于胶膜 2另侧表面上,而使各发光晶粒 1为与 胶膜 2逐一分离。 请参见图 2 , 其是分离装置 4所具有的顶针 41的样态, 该 顶针 41可依该发光晶粒 1的尺寸或重量而可为不同的型态(如圓头、尖头等)。 此外在该发光晶粒 1被分离后,可由输送装置 5所具有的吸嘴 51吸附于发光 晶粒 1进行输送。 当输送该晶粒至适当处理加工线后, 可进行其它程序诸如: 晶粒黏着、 灯具封装等。前者是将发光晶粒 1上的 N型电极衬垫 121、 P型电极衬垫 141 透过导电胶体或焊料分别与电路基板所具有的焊料衬垫相连接, 而成型出覆 晶式发光二极管模块。 后者则是将发光二极管模块为与外部灯具封装结合成 为一体。 由上述步骤可得知, 其是于基板 11上先进行磊晶层 15成长, 也就是在 基板 11上为依序成长有 N型半导体层 12、 发光层 13及 P型半导体层 14 , 且该 P型半导体层 14表面上成长有透光导电层, 并于透光导电层部分表面 上则分别成长有 N型电极衬垫 121、 P型电极衬垫 141 , 惟此部分有关磊晶 层 15成长(如 N型半导体层 12、 发光层 13及 P型半导体层 14等)经由曝 光、 显影及金属剥离 (Liff-Off )技术成长有 N型电极衬垫 121、 P型电极衬 垫 141等因非本发明的重点所在, 所以在本说明书中仅作简单叙述, 以供了 解; 而后便可将具有该磊晶层的该晶圓基板切割成多个个单颗发光晶粒 1 , 且经由挑选(Pick up ) 出适用的发光晶粒 1 ; 另将 UV胶 3涂布于胶膜 2— 侧表面上形成有涂布层, 其 UV胶 3涂布于胶膜 2上的方式为可利用网版印 刷、 滚筒式、 喷涂式等加工涂布方式, 且该 UV胶 3可为紫外线光固化胶树 月旨 ( UV Cure Resin )或紫外线光固化聚合物, 而可将各发光晶粒 1透过 UV 胶 3来黏贴于胶膜 2上成为一体并呈等距排列或数组状, 如此, 便可将成批 发光晶粒 1予以库存, 或是运送至下游厂商进行后续封装制程, 而当发光晶 粒 1欲进行封装制程前, 即需要先将发光晶粒 1为与胶膜 2脱离, 此时, 可 利用 UV曝光机产生的 UV (紫外线) 光照射于胶膜 2上的 UV胶 3涂布层 进行曝光, 并藉由 UV胶 3快速干燥、 光固化后降低发光晶粒 1黏贴于胶膜 2上的黏度, 即改变 UV胶 3材质的特性而变得较为硬脆,再利用分离装置 4 所具有的顶针(Push-up Needle, 简称为 PUN ) 41来向上推顶于胶膜 2另侧 表面上, 而使金属材质制成的顶针 41不需施以较大推顶力量,得以轻易将各 发光晶粒 1与胶膜 2逐一分离, 同时亦可有效防止顶针 41位置不佳、推顶力 量过大或其它参数设定不良所造成磊晶层 15承受过大的冲击能量,进而导致 发光晶粒 1结构上的损伤与破坏等情况发生, 并提高产品的质量与良率、 减 少制造上所耗费的成本。 是以,便可利用输送装置 5所具有的真空吸嘴 51或吸盘吸附于发光晶粒DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In order to achieve the above objects and effects, the present invention will be described with reference to the accompanying drawings, and the features and functions thereof are described in detail in the preferred embodiments of the present invention. Please refer to FIG. 1 , which are respectively a manufacturing state diagram of the LED module of the present invention. As can be clearly seen from FIG. 1 , the state change of the flip-chip LED module of the present invention is: in the first state, it is through epitaxial Schematic diagram of a plurality of single LED chips 1 after forming, cutting, crystallizing, and filming. In the epitaxial process, the N-type semiconductor layer 12, the light-emitting layer 13 and the P-type semiconductor layer 14 are sequentially grown on the wafer substrate 11 of the light-emitting diode, and the surface of the P-type semiconductor layer 14 is grown with light-transmitting conductive After the layer (not shown), the portion of the transparent conductive layer An N-type electrode pad 121 and a P-type electrode pad 141 are grown on the surface. The dicing process is to diced the wafer substrate having the epitaxial layer into the plurality of single luminescent crystal grains 1. The crystallization process is to sort and pick up the applicable luminescent crystals 1. In the filming process, a UV (ultraviolet) glue 3 is applied on the side surface of the film 2 to form a coating layer, and the plurality of light-emitting crystal grains 1 are adhered to the film 2 through the UV glue 3 to be integrated. . In the second state, it is a schematic diagram of UV (ultraviolet) exposure of the plurality of individual light emitting diode dies 1 . The coating layer is irradiated onto the film 2 by a UV exposure machine, and is quickly dried by the UV glue 3, and the viscosity of the luminescent film 1 adhered to the film 2 can be reduced. In the third state, it is a schematic diagram of the plurality of single LED die 1 . The ejector pin 41 of the separating device 4 is pushed up on the other side surface of the film 2, so that the respective luminescent crystal grains 1 are separated from the film 2 one by one. Referring to FIG. 2, it is a state of the ejector pin 41 of the separating device 4, and the ejector pin 41 can be of different types (such as a round head, a pointed head, etc.) depending on the size or weight of the illuminating die 1. Further, after the light-emitting crystal grains 1 are separated, they can be adsorbed to the light-emitting crystal grains 1 by the suction nozzles 51 of the transport device 5 for transport. After the die is transported to the appropriate processing line, other processes such as die attach, lamp package, etc. can be performed. In the former, the N-type electrode pad 121 and the P-type electrode pad 141 on the illuminating crystal 1 are respectively connected to the solder pad of the circuit substrate through the conductive paste or the solder, and the flip-chip LED module is formed. . The latter combines the LED module with an external luminaire package. It can be seen from the above steps that the epitaxial layer 15 is grown on the substrate 11, that is, the N-type semiconductor layer 12, the light-emitting layer 13, and the P-type semiconductor layer 14 are sequentially grown on the substrate 11. A light-transmissive conductive layer is grown on the surface of the P-type semiconductor layer 14 , and an N-type electrode pad 121 and a P-type electrode pad 141 are respectively grown on the surface of the light-transmitting conductive layer, but the portion of the epitaxial layer 15 is grown. (N-type semiconductor layer 12, light-emitting layer 13, and P-type semiconductor layer 14, etc.) are grown by exposure, development, and metal lift-off (Liff-Off) techniques, such as N-type electrode pad 121, P-type electrode pad 141, etc. The focus of the present invention is only briefly described in the present specification for understanding; then, the wafer substrate having the epitaxial layer can be cut into a plurality of individual light-emitting dies 1 and selected by Pick up) Applicable illuminating crystal 1; Another UV adhesive 3 is applied to the adhesive film 2 - a coating layer is formed on the side surface, and the UV adhesive 3 is applied on the adhesive film 2 in a manner that the screen can be utilized. Print Brush, roller type, spray type processing, etc., and the UV glue 3 can be UV Cure Resin or UV light curing polymer, and each of the luminescent crystal grains 1 can be transmitted through UV. The glue 3 is adhered to the film 2 to be integrated and arranged in an equidistant arrangement or array. Thus, the wholesale optical crystal 1 can be stocked or transported to a downstream manufacturer for subsequent packaging processes, and when the light-emitting die is used. 1 Before the packaging process is performed, the luminescent film 1 needs to be detached from the film 2, and at this time, the UV glue 3 coating layer on the film 2 can be irradiated by UV (ultraviolet) light generated by the UV exposure machine. After exposure, the UV glue 3 is quickly dried and light-cured to reduce the viscosity of the luminescent film 1 adhered to the film 2, that is, the characteristics of the UV glue 3 material are changed to become hard and brittle, and the separation device 4 is reused. The thimble (Push-up Needle, PUN for short) 41 is pushed up on the other side surface of the film 2, so that the thimble 41 made of metal material can be easily applied without a large pushing force. Each of the light-emitting crystal grains 1 and the film 2 are separated one by one, and can also be effectively prevented If the position of the needle 41 is not good, the pushing force is too large, or other parameters are poorly set, the epitaxial layer 15 is subjected to excessive impact energy, which causes damage and damage of the structure of the luminescent crystal 1 and improves the product. Quality and yield, reducing the cost of manufacturing. Therefore, the vacuum nozzle 51 or the suction cup of the conveying device 5 can be used to adsorb to the illuminating crystal grain.
1进行输送, 再将发光晶粒 1磊晶层 15上的 N型电极衬垫 121、 P型电极衬 垫 141透过导电胶体或焊料为分别与电路基板所具有的焊料衬垫 (图中未示 出)相连接, 且该电路基板亦可为单面或双面设有电路布局, 并将各矩形发 光晶粒 1透过电路布局串联或并联方式电性连接于电路基板单面或双面, 藉 以产生单面或双面发光型态, 从而完成发光晶粒 1固晶、 黏着后, 再进行发 光晶粒 1的荧光粉胶体涂布、烘烤程序,便可成型出覆晶式发光二极管模块, 再将发光二极管模块为与外部灯具(图中未示出)封装结合成为一体。 此外, 以上所述仅为本发明的较佳实施例而已, 非因此即局限本发明的 申请专利范围,本发明发光晶粒 1上的基板 11可为透光蓝宝石、碳化硅( SiC )、 氧化辞( Zn/O ) 、 氧化镁( MgO ) 、 氧化镓( Ga203 ) 、 氮化铝 ( AlGaN ) 、 氧化锂镓(GaLiO ) 、 氧化锂铝 (AlLiO )或尖晶石 (Spinel )基板, 且该 N 型半导体层 12及 P型半导体层 14亦可为钛、 金; 钛、 铝; 铬、 金或铬、 铝 其中之一或其组合而成, 并于基板 11上依序成长有 N型半导体层 12、 发光 层 13及 P型半导体层 14以构成磊晶层 15, 其仅只需提供发光晶粒 1透过 UV胶 3黏贴于胶膜 2上时,可利用 UV曝光机产生的 UV光照射于 UV胶 3 进行曝光, 则可藉由 UV胶 3光固化后降低发光晶粒 1黏贴于胶膜 2上的黏 度, 以利分离装置 4所具有的顶针 41 (如图 2所示)可依发光晶粒 1尺寸或 重量而可为不同的型态(如圓头、 尖头等), 并推顶于胶膜 2另侧的表面上, 而可避免发光晶粒 1脱离胶膜 2时,顶针 41轻易将磊晶层 15较薄的 N型半 导体层 12、 发光层 13及 P型半导体层 14顶破, 同时亦可有效防止顶针 41 位置不佳、推顶力量过大或其它参数设定不良所造成磊晶层 15承受过大的冲 击能量, 导致发光晶粒 1结构上的破坏等情况发生, 藉此提高产品良率、 减 少制造上的成本即可, 惟本发明技巧特征并不局限于此, 举凡任何熟悉该项 技艺者在本发明领域内, 可轻易想到的变化或修饰, 均应被涵盖在以下本案 的申请专利范围内, 合予陈明。 请参见图 3 , 其为发光二极管模块制造方法示意图。 该方法包括: (a ) 预备一胶膜(步骤 301 ); ( b )预备一发光晶粒(步骤 303 ); ( c )涂布一 可固化接着剂于该胶膜的一侧, 并通过该可固化接着剂贴合该发光晶粒于该 胶膜上(步骤 305 ) ; ( d ) 固化该可固化接着剂并降低该发光晶粒黏贴于该 胶膜上的黏度 (步骤 307 ) ; ( e )推顶该胶膜的另一侧, 藉此分离该发光晶 粒与胶膜 (步骤 309 ) ; 以及 ( f )封装该发光晶粒(步骤 311 ) , 以完成该 发光二极管模块。 此外, 该发光二极管模块的制造方法还包括: (g )在步骤 ( a )前依序成长一 N型半导体层、 一发光层及一 P型半导体层于一晶圓基 板上, 藉此形成一磊晶层于该晶圓基板上(步骤 313 ); ( h )切割具有该磊 晶层的该晶圓基板成为多个单颗发光晶粒(步骤 315 ) ; 以及(i ) 由该经步 骤(h )切割的多个单颗发光晶粒中挑选出合格的该发光晶粒(步骤 317 ) 。 此外, 尚可以前述步骤所的得的结构经外部灯具封装步骤而与灯具结合成为 一体(步骤 319 ) 。 请参见图 4, 为发光二极管模块进一步制造方法示意图。 此外, 步骤(f ) 包括: 利用一输送装置所具有的真空吸嘴或吸盘来吸附该分离的发光晶粒后 进行输送(步骤 401 ) 、 通过一导电胶体或一焊料使该分离的发光晶粒与一 预设电路基板相连接(步骤 403 ) , 且该预设电路基板可为单面或双面电路 布局, 以供该发光晶粒以串联或并联方式电性连接于该预设电路基板的单面 或双面上、 涂布荧光粉胶体于该分离的发光晶粒(步骤 405 ) 、 以及执行烘 烤程序, 以热处理该发光晶粒(步骤 407 ) 。 请参见图 5, 为发光二极管模块预材示意图。 一种发光二极管模块预材 包括: 一胶膜 501、一发光晶粒 503、 以及一可固化接着剂 505连接于该胶膜 的一侧, 并透过该可固化接着剂贴合该发光晶粒 503于该胶膜 501上。 1 is carried out, and the N-type electrode pad 121 and the P-type electrode pad 141 on the epitaxial layer 15 of the light-emitting die 1 are transmitted through the conductive paste or solder to respectively form a solder pad with the circuit substrate (not shown) The circuit substrate is connected to each other, and the circuit substrate may be provided with a circuit layout on one or both sides, and each rectangular light-emitting die 1 is electrically connected to the circuit substrate in one or both sides through a circuit layout in series or in parallel. By forming a single-sided or double-sided light-emitting type, thereby completing the crystallizing and adhesion of the light-emitting crystal 1, and then performing the phosphor colloid coating and baking process of the light-emitting crystal 1, the flip-chip light-emitting diode can be formed. The module then integrates the LED module into a package with an external luminaire (not shown). In addition, the above description is only a preferred embodiment of the present invention, and thus is not limited to the scope of patent application of the present invention, the substrate 11 on the luminescent crystal 1 of the present invention may be transparent sapphire, silicon carbide (SiC), oxidized. (Zn/O), magnesium oxide (MgO), gallium oxide (Ga 2 0 3 ), aluminum nitride (AlGaN), lithium gallium oxide (GaLiO), lithium aluminum oxide (AlLiO) or spinel (Spinel) substrate The N-type semiconductor layer 12 and the P-type semiconductor layer 14 may also be titanium, gold, titanium, aluminum, or one of or a combination of chromium, gold or chromium, aluminum, and sequentially grown on the substrate 11. The N-type semiconductor layer 12, the light-emitting layer 13, and the P-type semiconductor layer 14 constitute an epitaxial layer 15, which only needs to provide the light-emitting crystal grains 1 to pass through. When the UV glue 3 is adhered to the film 2, the UV light generated by the UV exposure machine can be irradiated to the UV glue 3 for exposure, and the UV film 3 can be light-cured to reduce the adhesion of the luminescent film 1 to the film 2 The viscosity of the top, the thimble 41 (shown in FIG. 2) of the separation device 4 can be different according to the size or weight of the illuminating crystal 1 (such as a round head, a pointed end, etc.), and is pushed to the top. On the other side of the film 2, when the luminescent film 1 is prevented from being detached from the film 2, the thimble 41 easily breaks the thin N-type semiconductor layer 12, the luminescent layer 13, and the P-type semiconductor layer 14 of the epitaxial layer 15. At the same time, it can also effectively prevent the position of the thimble 41 from being poor, the pushing force is too large, or other parameters are poorly set, causing the epitaxial layer 15 to withstand excessive impact energy, resulting in structural damage of the illuminating crystal 1 and the like. This can improve product yield and reduce manufacturing cost, but the technical features of the present invention are not limited thereto, and any changes or modifications that can be easily conceived by those skilled in the art of the present invention should be covered. In the following patent application scope of this case, it is combined with Chen Ming. Please refer to FIG. 3 , which is a schematic diagram of a method for manufacturing an LED module. The method comprises: (a) preparing a film (step 301); (b) preparing a light-emitting die (step 303); (c) applying a curable adhesive to one side of the film, and passing the a curable adhesive is applied to the luminescent film on the film (step 305); (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film (step 307); e) pushing the other side of the film, thereby separating the light-emitting die and the film (step 309); and (f) packaging the light-emitting die (step 311) to complete the light-emitting diode module. In addition, the method for manufacturing the LED module further includes: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a), thereby forming a An epitaxial layer is on the wafer substrate (step 313); (h) cutting the wafer substrate having the epitaxial layer into a plurality of single light-emitting dies (step 315); and (i) from the step ( h) selecting the qualified luminescent crystal grains from the plurality of dicing light-emitting dies that are cut (step 317). In addition, the structure obtained in the foregoing steps may be integrated with the lamp through the external lamp packaging step (step 319). Please refer to FIG. 4 , which is a schematic diagram of a further manufacturing method of the LED module. In addition, the step (f) includes: using a vacuum nozzle or a suction cup provided in a conveying device to adsorb the separated illuminating crystal grains and then conveying them (step 401), and separating the illuminating crystal grains by a conductive colloid or a solder. Connected to a predetermined circuit substrate (step 403), and the predetermined circuit substrate can be a single-sided or double-sided circuit layout, wherein the light-emitting die is electrically connected to the preset circuit substrate in series or parallel manner. Applying a phosphor colloid to the separated luminescent crystal grains on one or both sides (step 405), and performing baking A baking process to heat treat the luminescent grains (step 407). Please refer to FIG. 5 , which is a schematic diagram of the LED module pre-material. The LED module pre-material comprises: a film 501, a light-emitting die 503, and a curable adhesive 505 connected to one side of the film, and the light-emitting die is adhered through the curable adhesive 503 is on the film 501.
实施例 实施例 1. 一种发光二极管模块的制造方法, 其步骤包括: (a )预备一 胶膜; ( b )预备一发光晶粒; (c )涂布一可固化接着剂于该胶膜的一侧, 并通过该可固化接着剂贴合该发光晶粒于该胶膜上; (d )固化该可固化接着 剂并降低该发光晶粒黏贴于该胶膜上的黏度; (e )推顶该胶膜的另一侧, 藉 此分离该发光晶粒与胶膜; 以及(f )封装该发光晶粒, 以完成该发光二极管 模块。 EXAMPLES Example 1. A method of fabricating an LED module, the steps comprising: (a) preparing a film; (b) preparing a luminescent film; (c) applying a curable adhesive to the film And affixing the luminescent film to the film by the curable adhesive; (d) curing the curable adhesive and reducing the viscosity of the luminescent film adhered to the film; Pushing the other side of the film to separate the light-emitting die and the film; and (f) packaging the light-emitting die to complete the light-emitting diode module.
实施例 2. 根据实施例 1所述的方法, 其步骤还包括: (g )在步骤(a ) 前依序成长一 N型半导体层、 一发光层及一 P型半导体层于一晶圓基板上, 藉此形成一磊晶层于该晶圓基板上; (h )切割具有该磊晶层的该晶圓基板成 为多个单颗发光晶粒; 以及 (i ) 由该经步骤(h )切割的多个单颗发光晶粒 中挑选出合格的该发光晶粒。 实施例 3. 才艮据实施例 2中所述的方法, 其中该步骤(g ) 的磊晶层于该 P型半导体层表面上还具有一透光导电层, 且该透光导电层部分表面上分别 成长有一 N型电极衬垫及一 P型电极衬垫, 该晶圓基板可为透光蓝宝石、碳 化硅、 氧化辞、 氧化镁、 氧化镓、 氮化铝、 氧化锂镓、 氧化锂铝或尖晶石基 钛、 铝; 铬、 金或铬、 铝其中之一或其组合而成。 实施例 4. 根据实施例 1 - 3中任一实施例所述的方法, 其中该步骤(c ) 中的可固化接着剂是一 UV胶, 且步骤(d ) 的固化, 为以 UV光曝照该 UV 胶, 以固化该 UV胶。 实施例 5. 根据实施例 4中所述的方法其中该 UV胶可为紫外线光固化胶 树脂 (UV Cure Resin )或紫外线光固化聚合物。 且该 UV光由一曝光机 产生。 实施例 6. 根据实施例 1 - 5中任一实施例所述的方法, 其中该步骤(c ) 的涂布方式可利用网版印刷、 滚筒式、 喷涂式等加工。 Embodiment 2. The method of Embodiment 1, the method further comprising: (g) sequentially growing an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer on a wafer substrate before the step (a) Forming an epitaxial layer on the wafer substrate; (h) cutting the wafer substrate having the epitaxial layer into a plurality of single light-emitting dies; and (i) passing the step (h) Among the plurality of single luminescent crystal grains that are cut, the qualified luminescent crystal grains are selected. Embodiment 3. The method according to Embodiment 2, wherein the epitaxial layer of the step (g) further has a light-transmitting conductive layer on the surface of the P-type semiconductor layer, and the surface of the light-transmitting conductive layer is partially There is an N-type electrode pad and a P-type electrode pad respectively, and the wafer substrate can be transparent sapphire, silicon carbide, oxidized, magnesium oxide, gallium oxide, aluminum nitride, lithium gallium oxide, lithium aluminum oxide. Or spinel-based titanium, aluminum; chrome, gold or chromium, aluminum or one of them or a combination thereof. The method of any one of embodiments 1 - 3, wherein the curable adhesive in the step (c) is a UV glue, and the curing of the step (d) is exposed to UV light. The UV glue is applied to cure the UV glue. Embodiment 5. The method according to Embodiment 4, wherein the UV glue is a UV Cure Resin or an ultraviolet light curing polymer. And the UV light is generated by an exposure machine. The method of any one of embodiments 1 to 5, wherein the coating of the step (c) is performed by screen printing, drum type, spray coating or the like.
实施例 7. 根据实施例 1 - 6中任一实施例所述的方法, 其中该步骤(e ) 系利用一具有一顶针的分离装置推顶进行推顶, 且该顶针可为不同型态的圓 The method of any one of embodiments 1 - 6, wherein the step (e) is performed by pushing a top with a ejector, and the thimble can be of different types. Round
实施例 8. 根据实施例 1 - 7中任一实施例所述的方法, 其中步骤(f )包 含: 利用一输送装置所具有的真空吸嘴或吸盘来吸附该分离的发光晶粒后进 行输送、 通过一导电胶体或一焊料使该分离的发光晶粒与一预设电路基板相 连接, 且该预设电路基板可为单面或双面电路布局, 以供该发光晶粒以串联 或并联方式电性连接于该预设电路基板的单面或双面上、 涂布荧光粉胶体于 该分离的发光晶粒、 以及执行烘烤程序, 以处理该发光晶粒。 实施例 9. 根据实施例 1 - 8中任一实施例所述的方法, 其中步骤(f )的 封装是一覆晶式封装,且该发光二极管模块可与外部灯具封装结合成为一体。 The method of any one of embodiments 1-7, wherein the step (f) comprises: using a vacuum nozzle or a suction cup provided in a conveying device to adsorb the separated luminescent crystal grains and then transporting The separate light emitting die is connected to a predetermined circuit substrate by a conductive paste or a solder, and the predetermined circuit substrate can be a single-sided or double-sided circuit layout for the light emitting die to be connected in series or in parallel The method is electrically connected to one or both sides of the preset circuit substrate, coating a phosphor colloid on the separated light emitting die, and performing a baking process to process the light emitting die. The method of any one of embodiments 1-8, wherein the package of step (f) is a flip chip package, and the light emitting diode module can be integrated with the external lamp package.
实施例 10. 根据实施例 1 - 9中任一实施例所述的方法,一种发光二极管 模块的制造方法, 其步骤包括: (a )预备一胶膜; (b )预备一发光晶粒; ( c )涂布一可固化接着剂于该胶膜的一侧,并通过该可固化接着剂贴合该发 光晶粒于该胶膜上; 以及(d )固化该可固化接着剂并降低该发光晶粒黏贴于 该胶膜上的黏度。 实施例 11. 根据实施例 1 - 10中任一实施例所述的方法, 吾人更可得出 一种发光二极管模块预材包括: 一胶膜、 一发光晶粒、 以及一可固化接着剂 连接于该胶膜的一侧, 并通过该可固化接着剂贴合该发光晶粒于该胶膜上。 虽然本发明已以较佳实施例揭露如上, 然其并非用以限定本发明, 任何 熟习此技艺者, 在不脱离本案发明的精神和范围内, 当可作各种的更动与润 饰, 因此本发明的保护范围当视后附的申请专范围所界定者为准。 此外, 本 发明上述的覆晶式发光二极管模块的制造方法于使用时, 为确实能达到其功 效及目的,故本发明诚为一实用性优异的发明,为符合发明专利的申请要件, 将依法提出申请, 盼审委早日赐准本案, 以保障发明人的辛苦发明, 倘若钧 局审委有任何稽疑, 请不吝来函指示, 发明人定当竭力配合, 实感公便。 The method of any one of the embodiments 1-9, the method for manufacturing the LED module, the method comprising: (a) preparing a film; (b) preparing a light-emitting die; (c) applying a curable adhesive to one side of the film, and bonding the luminescent film to the film by the curable adhesive; and (d) curing the curable adhesive and lowering the The viscosity of the luminescent film adhered to the film. Embodiment 11. According to the method of any of Embodiments 1 - 10, it is further possible for a light emitting diode module preform to include: a film, a light emitting die, and a curable adhesive connection. On the side of the film, the luminescent film is attached to the film by the curable adhesive. Although the present invention has been described in the above preferred embodiments, it is not intended to limit the invention, and various modifications and refinements may be made without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims. In addition, the method for manufacturing the above-described flip-chip type light-emitting diode module of the present invention can achieve its efficacy and purpose when used. Therefore, the present invention is an invention with excellent practicability, and is an application for conforming to the invention patent. To file an application, I hope that the trial committee will grant the case as soon as possible to protect the inventor's hard work. If there is any doubt in the trial committee, please do not hesitate to give instructions, the inventor will try his best to cooperate and feel polite.
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CN103441101A (en) * | 2013-08-28 | 2013-12-11 | 中国科学院半导体研究所 | Method for preparing full-color light emitting diode module |
CN104485327B (en) * | 2014-12-11 | 2017-08-01 | 杭州杭科光电股份有限公司 | A kind of preparation method of LED/light source and LED illuminating module |
CN105324022A (en) * | 2015-09-21 | 2016-02-10 | 厦门三安光电有限公司 | Core particle grabbing apparatus and grabbing method therefor |
CN108565324B (en) * | 2018-01-05 | 2019-11-08 | 苏州芯脉智能电子科技有限公司 | A kind of manufacturing method of LED lamp and LED lamp |
CN112349642A (en) * | 2019-08-07 | 2021-02-09 | 亿光电子(中国)有限公司 | Stripping off device of electronic component granule |
CN111293197A (en) * | 2020-03-02 | 2020-06-16 | 宁波升谱光电股份有限公司 | A flip-chip LED chip bonding method and LED |
CN113764546A (en) * | 2021-08-30 | 2021-12-07 | 东莞市中麒光电技术有限公司 | Mini-LED device, LED display module and manufacturing method thereof |
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