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WO2010085764A3 - Procédé, appareil, et compositions de fabrication de revêtements anti-réfléchissants pour des substrats - Google Patents

Procédé, appareil, et compositions de fabrication de revêtements anti-réfléchissants pour des substrats Download PDF

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Publication number
WO2010085764A3
WO2010085764A3 PCT/US2010/022010 US2010022010W WO2010085764A3 WO 2010085764 A3 WO2010085764 A3 WO 2010085764A3 US 2010022010 W US2010022010 W US 2010022010W WO 2010085764 A3 WO2010085764 A3 WO 2010085764A3
Authority
WO
WIPO (PCT)
Prior art keywords
deposition
substrate
films
reflective coating
substrates
Prior art date
Application number
PCT/US2010/022010
Other languages
English (en)
Other versions
WO2010085764A2 (fr
Inventor
Chih-Hung Chang
Seung-Yeol Han
Brian K. Paul
Original Assignee
State Of Oregon Acting By Andthrough The State Board Of Higher Education On Behalf Of Oregon State University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by State Of Oregon Acting By Andthrough The State Board Of Higher Education On Behalf Of Oregon State University filed Critical State Of Oregon Acting By Andthrough The State Board Of Higher Education On Behalf Of Oregon State University
Publication of WO2010085764A2 publication Critical patent/WO2010085764A2/fr
Publication of WO2010085764A3 publication Critical patent/WO2010085764A3/fr
Priority to US13/189,411 priority Critical patent/US8553333B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/67—Particle size smaller than 100 nm
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/68—Particle size between 100-1000 nm
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Les modes de réalisation du présent système et du présent procédé sont utiles pour le dépôt chimique, notamment le dépôt continu de film anti-réfléchissants. La présente invention concerne des systèmes qui comprennent généralement un micromixeur et un applicateur de microcanaux. Un matériau ou des matériaux de dépôt sont appliqués à un substrat, tel que l'aluminium, le verre, le silicium, ou le polycarbonate, pour former un revêtement anti-réfléchissant nanostructuré. Les morphologies de surface uniformes et hautement orientées des films déposés à l'aide des modes de réalisation décrits sont clairement améliorées par rapport à celles des films déposés par un procédé discontinu habituel. Dans certains modes de réalisation, un revêtement anti-réfléchissant est appliqué à une surface d'un microréacteur catalytique solaire adapté pour réaliser des réactions endothermiques, l'énergie étant fournie au réacteur par absorption des rayons solaires. Le procédé peut être utilisé pour personnaliser la composition et la morphologie du matériau déposé sur un substrat. Le présent procédé peut être utilisé à des températures faibles lorsqu'une étape d'annelage post-dépôt à température élevée est évitée.
PCT/US2010/022010 2009-01-23 2010-01-25 Procédé, appareil, et compositions de fabrication de revêtements anti-réfléchissants pour des substrats WO2010085764A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/189,411 US8553333B2 (en) 2009-01-23 2011-07-22 Nanostructured anti-reflective coatings for substrates

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20576609P 2009-01-23 2009-01-23
US61/205,766 2009-01-23

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/189,411 Continuation-In-Part US8553333B2 (en) 2009-01-23 2011-07-22 Nanostructured anti-reflective coatings for substrates

Publications (2)

Publication Number Publication Date
WO2010085764A2 WO2010085764A2 (fr) 2010-07-29
WO2010085764A3 true WO2010085764A3 (fr) 2010-11-18

Family

ID=42356423

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/022010 WO2010085764A2 (fr) 2009-01-23 2010-01-25 Procédé, appareil, et compositions de fabrication de revêtements anti-réfléchissants pour des substrats

Country Status (1)

Country Link
WO (1) WO2010085764A2 (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8236599B2 (en) 2009-04-09 2012-08-07 State of Oregon acting by and through the State Board of Higher Education Solution-based process for making inorganic materials
US8753515B2 (en) 2009-12-05 2014-06-17 Home Dialysis Plus, Ltd. Dialysis system with ultrafiltration control
US8501009B2 (en) 2010-06-07 2013-08-06 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University Fluid purification system
US8801979B2 (en) 2010-06-10 2014-08-12 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University Apparatus and method for continuous production of materials
ES2640953T3 (es) 2011-10-07 2017-11-07 Outset Medical, Inc. Purificación de líquido de intercambio de calor para un sistema de diálisis
US20140009834A1 (en) * 2012-07-05 2014-01-09 Intermolecular, Inc. Novel antireflective coatings with graded refractive index
US20150314055A1 (en) 2014-04-29 2015-11-05 Michael Edward HOGARD Dialysis system and methods
HUP1600384A1 (hu) * 2016-06-15 2018-01-29 Hungaro Lux Light Kft Antireflexiós bevonat
WO2018035520A1 (fr) 2016-08-19 2018-02-22 Outset Medical, Inc. Système et procédés de dialyse péritonéale
US12201762B2 (en) 2018-08-23 2025-01-21 Outset Medical, Inc. Dialysis system and methods
CN110981208A (zh) * 2019-12-17 2020-04-10 河南豫科光学科技股份有限公司 一种超白玻璃基板的制备工艺
CN114163882A (zh) * 2021-12-06 2022-03-11 中科智清生态技术(苏州)有限公司 一种河道治理的光伏面板膜层及生产工艺
CN114524450B (zh) * 2022-03-21 2024-01-19 南京科技职业学院 一种纳米氧化铈紫外吸收剂的制备方法
CN114956592A (zh) * 2022-06-28 2022-08-30 河北光兴半导体技术有限公司 超薄柔性玻璃制造方法及制造系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001281411A (ja) * 2000-03-30 2001-10-10 Fuji Photo Film Co Ltd 防眩性反射防止フィルムおよび画像表示装置
KR20010106048A (ko) * 2000-05-20 2001-11-29 서정은 스타들로 구성된 상설 라이브 콘서트
US6343865B1 (en) * 1998-02-17 2002-02-05 Dai Nippon Printing Co., Ltd. Non-glare film, polarizing device and display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6343865B1 (en) * 1998-02-17 2002-02-05 Dai Nippon Printing Co., Ltd. Non-glare film, polarizing device and display device
JP2001281411A (ja) * 2000-03-30 2001-10-10 Fuji Photo Film Co Ltd 防眩性反射防止フィルムおよび画像表示装置
KR20010106048A (ko) * 2000-05-20 2001-11-29 서정은 스타들로 구성된 상설 라이브 콘서트

Also Published As

Publication number Publication date
WO2010085764A2 (fr) 2010-07-29

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