WO2009136920A1 - Multifunctional nitrones in non-radical systems - Google Patents
Multifunctional nitrones in non-radical systems Download PDFInfo
- Publication number
- WO2009136920A1 WO2009136920A1 PCT/US2008/062904 US2008062904W WO2009136920A1 WO 2009136920 A1 WO2009136920 A1 WO 2009136920A1 US 2008062904 W US2008062904 W US 2008062904W WO 2009136920 A1 WO2009136920 A1 WO 2009136920A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nitrone
- acrylate
- epoxy
- cyanate ester
- nltrone
- Prior art date
Links
- SQDFHQJTAWCFIB-UHFFFAOYSA-N n-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 claims abstract description 96
- 239000000203 mixture Substances 0.000 claims abstract description 67
- 239000004643 cyanate ester Substances 0.000 claims abstract description 48
- 239000004593 Epoxy Substances 0.000 claims abstract description 45
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 40
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 10
- 229910000679 solder Inorganic materials 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000004122 cyclic group Chemical group 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 4
- 239000001301 oxygen Substances 0.000 abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 abstract description 4
- 150000003254 radicals Chemical class 0.000 abstract description 4
- 238000007142 ring opening reaction Methods 0.000 abstract description 4
- 238000004132 cross linking Methods 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 230000001404 mediated effect Effects 0.000 abstract description 2
- -1 coatings Substances 0.000 description 31
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 22
- 239000000243 solution Substances 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 238000002411 thermogravimetry Methods 0.000 description 18
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 15
- 239000002244 precipitate Substances 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 14
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 239000011347 resin Substances 0.000 description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 239000000725 suspension Substances 0.000 description 12
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- 125000001931 aliphatic group Chemical group 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 235000019439 ethyl acetate Nutrition 0.000 description 8
- 239000000706 filtrate Substances 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 229920003192 poly(bis maleimide) Polymers 0.000 description 8
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 8
- 239000008393 encapsulating agent Substances 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 229920000728 polyester Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 239000012267 brine Substances 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 150000001299 aldehydes Chemical class 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- RGZRSLKIOCHTSI-UHFFFAOYSA-N hydron;n-methylhydroxylamine;chloride Chemical compound Cl.CNO RGZRSLKIOCHTSI-UHFFFAOYSA-N 0.000 description 5
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 4
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 4
- 0 CC1(C)N(C)O**1I Chemical compound CC1(C)N(C)O**1I 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 229910000027 potassium carbonate Inorganic materials 0.000 description 4
- 239000012265 solid product Substances 0.000 description 4
- 238000004809 thin layer chromatography Methods 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 3
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 150000001913 cyanates Chemical class 0.000 description 3
- 238000006352 cycloaddition reaction Methods 0.000 description 3
- 238000000113 differential scanning calorimetry Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000008107 starch Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 238000003828 vacuum filtration Methods 0.000 description 3
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 101100410148 Pinus taeda PT30 gene Proteins 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
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- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 238000000935 solvent evaporation Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229960000834 vinyl ether Drugs 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- GPHWXFINOWXMDN-UHFFFAOYSA-N 1,1-bis(ethenoxy)hexane Chemical compound CCCCCC(OC=C)OC=C GPHWXFINOWXMDN-UHFFFAOYSA-N 0.000 description 1
- CIKVTYVSUSJJAA-UHFFFAOYSA-N 1,1-difluoroethene;fluoroethene Chemical compound FC=C.FC(F)=C CIKVTYVSUSJJAA-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- CIISBYKBBMFLEZ-UHFFFAOYSA-N 1,2-oxazolidine Chemical compound C1CNOC1 CIISBYKBBMFLEZ-UHFFFAOYSA-N 0.000 description 1
- RQJCIXUNHZZFMB-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxypropoxy)propane Chemical compound C=COCC(C)OCC(C)OC=C RQJCIXUNHZZFMB-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BEYBDOCMMBYVKI-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-2-eneperoxoic acid Chemical compound CC(=C)C(O)=O.OOC(=O)C=C BEYBDOCMMBYVKI-UHFFFAOYSA-N 0.000 description 1
- VMKYTRPNOVFCGZ-UHFFFAOYSA-N 2-sulfanylphenol Chemical compound OC1=CC=CC=C1S VMKYTRPNOVFCGZ-UHFFFAOYSA-N 0.000 description 1
- DSSAWHFZNWVJEC-UHFFFAOYSA-N 3-(ethenoxymethyl)heptane Chemical compound CCCCC(CC)COC=C DSSAWHFZNWVJEC-UHFFFAOYSA-N 0.000 description 1
- 229960000549 4-dimethylaminophenol Drugs 0.000 description 1
- ZVTWZSXLLMNMQC-UHFFFAOYSA-N 4-phenylmethoxybenzaldehyde Chemical compound C1=CC(C=O)=CC=C1OCC1=CC=CC=C1 ZVTWZSXLLMNMQC-UHFFFAOYSA-N 0.000 description 1
- ODJICCNUNOIZBA-UHFFFAOYSA-N 4-prop-1-ynoxybenzaldehyde Chemical compound CC#COC1=CC=C(C=O)C=C1 ODJICCNUNOIZBA-UHFFFAOYSA-N 0.000 description 1
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- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
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- SUXGZGQKIFLKOR-UHFFFAOYSA-N [4-(2-phenylpropan-2-yl)phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=CC=C1 SUXGZGQKIFLKOR-UHFFFAOYSA-N 0.000 description 1
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 1
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- 150000001412 amines Chemical class 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- NMGFRGWSRHOQOP-UHFFFAOYSA-N carbamic acid;urea Chemical compound NC(N)=O.NC(O)=O NMGFRGWSRHOQOP-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- MALGCDOKXMEUNO-UHFFFAOYSA-N cyanic acid;prop-2-enoic acid Chemical compound OC#N.OC(=O)C=C MALGCDOKXMEUNO-UHFFFAOYSA-N 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 description 1
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CPQCSJYYDADLCZ-UHFFFAOYSA-N n-methylhydroxylamine Chemical compound CNO CPQCSJYYDADLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- HGEVGSTXQGZPCL-UHFFFAOYSA-N nonanedioyl dichloride Chemical compound ClC(=O)CCCCCCCC(Cl)=O HGEVGSTXQGZPCL-UHFFFAOYSA-N 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001692 polycarbonate urethane Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- YORCIIVHUBAYBQ-UHFFFAOYSA-N propargyl bromide Chemical compound BrCC#C YORCIIVHUBAYBQ-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DSROZUMNVRXZNO-UHFFFAOYSA-K tris[(1-naphthalen-1-yl-3-phenylnaphthalen-2-yl)oxy]alumane Chemical class C=1C=CC=CC=1C=1C=C2C=CC=CC2=C(C=2C3=CC=CC=C3C=CC=2)C=1O[Al](OC=1C(=C2C=CC=CC2=CC=1C=1C=CC=CC=1)C=1C2=CC=CC=C2C=CC=1)OC(C(=C1C=CC=CC1=C1)C=2C3=CC=CC=C3C=CC=2)=C1C1=CC=CC=C1 DSROZUMNVRXZNO-UHFFFAOYSA-K 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
Definitions
- This invention relates to the use of nitro ⁇ es in the cure of non-raclica! mediated organic chemistry systems, and in particular in the cure of formulations for adhesives, coatings, and encapsulants.
- the adhesives, coatings, and encapsulants are used in electronic applications.
- Radical cure has the disadvantages of oxygen sensitivity before and during cure, and significant shrinkage after cure, creating a need for a chemistry that avoids these problems.
- This invention is a curable composition
- a multifunctional nitrone and another compound for purposes of this specification and the claims, compound is deemed to include monomers, oligomers, and polymers. Such compounds include acrylates, maleimides, cyanate esters, and epoxies The nitrone undergoes crosslinking with the other compound through cycloaddition or ring opening initiated by the nitrone dipole without the sensitivity to oxygen experienced by free radical curing or crosslinking.
- Nitrone chemistry can provide a wide range of curing temperatures in curable compositions comprising a nitrone and one or more other compounds.
- the curing temperature will depend on the particular compound Within the electronics packaging industry, lower cure temperatures would be useful, for example, in die attach operations (silicone dies attached to substrates), underfill operations (encapsulation of solder electrical connections within an electronic package ⁇ , and dual cure operations (B-staging one chemistry at a lower temperature than the curing temperature); higher cure temperatures would be useful, for example, in those applications where the curable composition is used in place of a metallic solder.
- Figure 1 depicts a semiconductor die on an array and metal leadframe showing the placement of a die attach adhesive.
- Figure 2 depicts a flip-chip semiconductor electrically joined to a substrate with solder and underfilled with an encapsulant composition.
- Nitrones are 1 ,3-dipolar species prepared through an easy one step, room temperature condensation reaction between an aldehyde and an alkylhydroxylamine as depicted here:
- Nitrones are known to participate in 1 ,3-d ⁇ polar cycloaddition reactions with dipoiarophiles (2 ⁇ -partners) to give cycloadducts.
- the cycloaddition reaction is insensitive to oxygen and moisture and generates a five-membered ring called an isoxazohdine:
- Nitrones also can initiate polymerization of heterocyclic monomers, such as epoxies, by ring opening: I ⁇ Polymer
- Exemplary compounds that are suitable for cure with nitrones include, but are not limited to, those compounds that contain functionality reactive with nitrone groups, such as, epoxy, acrylate (which includes methacrylate), maleimide (which includes multifunctional compounds, such as bis- and tris-maleimides), cyanate ester, and vinyl (such as in vinyl ethers and styrenes)
- Those functionalities can be appended to a wide variety of compounds, such as polyesters, poly(butadienes), siliconized olefins, silicone resins, siloxanes, and other such materials.
- the compounds are selected from the group consisting of epoxies, acryiates, maleimides, and cyanate esters.
- ⁇ O O j n which X is an aromatic group.
- Bismaleimide resins having these X bridging groups are commercially available, and can be obtained, for example, from Sartomer (USA) or HOS-Technic GmbH (Austria).
- X 1 entities include, poly(butadienes), poly(carbonates), poly(urethanes), poly(ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate, urea, or ether. These types of compounds are commercially available and can be obtained, for example, from National Starch and Chemical Company and Dainippon Ink and Chemical, Inc. [0013] Specific preferred maleimides
- C 36 represents a linear or branched chain (with or without cyclic moieties) of 36 carbon atoms
- Suitable acrylates for use in formulation with the inventive compounds include
- X 2 is an aromatic or aliphatic group
- Exemplary X 2 groups include poly(butadienes), poiy(carbonates), poly(urethanes), poly ⁇ ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyi, amide, carbamate, urea, or ether
- Commercially available materials include butyl (meth)acrylate, isobutyl (meth)acrylate, 2-ethyl hexyl (meth)acrylate, isodecyl (meth)acrylate, n-lauryl (meth)acrylate, alkyl (meth)acrylate, tridecyl (meth)acrylate, n-stearyl (meth)acrylate, cyclohexyl(meth)acrylate, tetrahydro-furfuryl(meth)acryiate, 2-
- Suitable epoxies for use in compositions with the nitrones include bisphenol, naphthalene, and aliphatic type epoxies
- Commercially available materials include bisphenol type epoxy resins (Epiclon 830LVP, 830CRP, 835LV, 850CRP) available from Dainippon Ink & Chemicals, Inc , naphthalene type epoxy (Epiclon HP4032) available from Dainippon Ink & Chemicals, Inc ; aliphatic epoxy resins (AraJdite CY179, 184, 192, 175, 179) available from Ciba Specialty Chemicals, (Epoxy 1234, 249, 206) available from Union Carbide Corporation, and (EHPE-3150) available from Daicel Chemical Industries, Ltd
- Other suitable epoxy resins include cycloaliphatic epoxy resins, bisphenol-A type epoxy resins, bisphenol-F type epoxy resins (e g RSL 1739 from Hexion Specialty Chemical
- Suitable cyanate esters for use m compositions with the nitrones include those
- N E CC-O-1 — ) having the generic structure ⁇ 'n tn which n is 1 or larger, and X 7 is a hydrocarbon group
- X 7 entities include bisphenol, phenol or cresol novolac, dicyclopentadiene, polybutadiene, polycarbonate, polyurethane, pofyether, or polyester
- Commercially available materials include, AroCy L-10, AroCy XU366, AroCy XU371 , AroCy XU378, XU71787 02L, and XU 71787 07L, available from Huntsman LLC, P ⁇ maset PT30, P ⁇ maset PT30 S75, P ⁇ maset PT60, P ⁇ maset PT60S, P ⁇ maset BADCY, P ⁇ maset DA230S, P ⁇ maset MethylCy, and P ⁇ maset LECY, available from Lonza Group Limited, 2-allyphenoi cyanate
- Suitable vinyl ethers for use in compositions with the nitrones include those having
- X entities include poly(butadienes), poly(carbonates), poly(urethanes), poly(ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate, urea, or ether.
- resins include cyclohenanedimethanol divinylether, dodecylvi ⁇ ylether, cyclohexyl vinylether, 2-ethylhexyl vinylether, dipropyleneglycol divinylether, hexanediol divinylether, octadecylvi ⁇ ylether, and butandiol divinylether available from International Speciality Products (ISP); Vectomer 4010, 4020, 4030, 4040, 4051 , 4210, 4220, 4230, 4060, 5015 available from Sigma-Aldrich, lnc
- Suitable poly(butadienes) for use in compositions with the nitrones include poly ⁇ butad ⁇ enes), epoxidized poly(butad ⁇ enes), maleic poly(butadienes), acryiated poly(butadienes), butadiene-styre ⁇ e copolymers, and butadiene-acrylomtrile copolymers.
- Suitable siliconized olefins for use in the compositions with the nitrones are obtained by the selective hydrosilation reaction of silicone and divinyl materials, having the generic structure,
- n-i is 2 or more, n 2 is 1 or more and n ! >n 2 .
- Suitable silicones for use in compositions with the nitrones include reactive silicone resins having the generic structure in which ⁇ is 0 or any integer, X 4 and X 5 are hydrogen, methyl, amine, epoxy, carboxyl, hydroxy acrylate methacrylate, mercapto, phenol, or vinyl functional groups R 2 and R 3 can be -H, -CH 3 , vinyl phenyl, or any hydrocarbon structure with more than two carbons
- Commercially available materials include KF8012, KF8002, KF8003, KF-1001 , X-22-3710, KF6001 X-22-164C, KF2001 , X- 22-170DX, X-22-173DX, X-22-174DX X-22-176DX KF-857 KF862, KF8001 , X-22-3367, and X-22-3939A available from Shin-Etsu Silicone International Trading (Shanghai) Co , Ltd
- Suitable styrenic compounds for use in compositions with the nitrones include
- X 3 entities include poly(butad ⁇ enes) polycarbonates), poly(urethanes), poly(ethers) poly(esters), simple hydrocarbons and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate urea, or ether These resins are commercially available and can be obtained, for example, from National Starch and Chemical Company or Sigma-Ald ⁇ ch Co
- one or more fillers or spacers, or both may be added to the curable composition and usually are added for improved Theological properties, stress reduction, and bondline control
- suitable ⁇ onconductive fillers include alumina, aluminum hydroxide, silica, vermicuiite, mica, wollastonite, calcium carbonate titania, sand, glass, barium sulfate, zirconium, carbon black, organic fillers, and organic polymers including but not limited to halogenated ethylene polymers, such as, tetrafluoroethylene, trifluoroethylene, vinylidene fluoride vinyl fluoride, vinylidene chloride, and vinyl chloride
- suitable conductive fillers include carbon black graphite, gold, silver, copper, platinum, palladium, nickel, aluminum, silicon carbide, boron nitride, diamond, and alumina The particles may be of any appropriate size ranging from nano size to several mm, depending on whether they are used as fillers or spacer
- Nitrone B may be prepared according to the same procedure for the synthesis of Nitrone A except that 1 ,3-be ⁇ zenedialdehyde will be used instead of 1 ,4-benzened ⁇ aldehyde.
- EXAMPLE 3 SYNTHESIS OF NITRONE C
- the starting dialdehyde was first prepared according to the following reaction scheme:
- Nitrone C was prepared from the diaidehyde according to the following reaction scheme:
- Nitrone D was prepared according to the following reaction scheme starting from 4- hydroxybenzaldehyde:
- Nitro ⁇ e E was prepared according to the following reaction scheme starting from 3- hydroxybenzaldehyde:
- Nitrone G has a meiting point of 117°C and is miscible with other resins
- the starting dimesylate was prepared according to the following reaction scheme:
- the diaidehyde was prepared from the dimesyiate according to the following reaction scheme:
- R long chain alkyl group
- R long chain alkyl group
- the above nitrones were formulated into curable compositions comprising one or more of the following resins in various molar ratios.
- the compositions contained no solvent
- the neat resins and compositions were cured by Differential Scanning Calorimetry (DSC) and the cure temperatures (Cure T1 and Cure T2) and heats of polymerization ( ⁇ H) recorded in the table for each example. (Melting points noted above were also determined by DSC.) Th ermo-grava metric Analysis (TGA) was used to determine weight loss and was performed on TGA (TA 2950) instrument.
- DSC Differential Scanning Calorimetry
- ⁇ H heats of polymerization
- TMI TrisMaleimide
- C 36 represents a linear or branched chain (with or without cyclic moieties) of 36 carbon atoms
- EXAMPLE 9 DSC FOR COMPOSITIONS CONTAINING NITRONE A AND CYANATE ESTER Nitrone A was blended with cyanate ester (CE) in various molar ratios. The DSC scans indicated a two stage curing process and an increase in curing temperature as the amount of nitrone decreased. The results are reported in Table 1
- EXAMPLE 10 DSC FOR COMPOSITIONS CONTAINING NITRONE A 1 CYANATE ESTER
- Nitrone A in combination with epoxy was tested by TGA for weight loss at 200 0 C and compared to control samples of cyanate ester, epoxy, and a composition of a 1 : 1 molar ratio of cyanate ester and epoxy The results are reported in Table 3
- EXAMPLE 12 DSC FOR COMPOSITIONS CONTAINING NITRONE C, CYANATE ESTER, EPOXY, MALEIMIDE, AND ACRYLATE
- Nitrone C was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 4 and indicate that the introduction of an aliphatic backbone into the nitrone will decrease the heat of polymerization, for example, compared to Nitrone A [0051] TABLE 4: DSC DATA FOR NITRONE C, CYANATE ESTER, EPOXY, MALEIMIDE, AND
- EXAMPLE 13 DSC FOR COMPOSITIONS CONTAINING NITRONE D, CYANATE ESTER, EPOXY, ACRYLATE, AND MALEIMIDE
- Nitrone D has one nitrone functionality and one phenolic functionality Nitrone D was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 5 and indicate a two stage curing process Those formulations that did not show a second cure peak reacted completely in the first exotherm
- Nitrones D and E presents an opportunity to add additional functionality and/or molecular weight and/or aromaticity to these nitrones
- the phenolic group can be reacted with a compound or resin having a functionality reactive with the phenolic hydroxyl group That compound may contain an additional functionality not reactive with the phenolic hydroxyl, therebv adding that additional functionality to the nitrone
- the compound may be composed of aliphatic chains of various lengths and branching, or aliphatic groups in combination with aromatic groups to add molecular weight and/or aromaticity to the nitrone
- Such nitro ⁇ es are included in this invention
- EXAMPLE 14 DSC FOR COMPOSITIONS CONTAINING NITRONE E 1 CYANATE ESTER, EPOXY, ACRYLATE AND MALEIMIDE
- Nitrone E was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 6 and indicate that Nitrone E cures some compounds slower than Nitrone D
- EXAMPLE 15 DSC FOR COMPOSITIONS CONTAINING NITRONE AND EPOXY
- Nitrones are also capable of ring opening, and thus, for example, epoxy or oxetane rings will open initiated by the nitrone dipoie Several nitrones were used in combination with epoxy and cured by DSC The results are reported in Table 9
- EXAMPLE 16 PROPERTIES FOR COMPOSITIONS CONTAINING NITRONE F, ACRYLATE, EPOXY, MALEIMIDE, AND CYANATE ESTER
- Nitrone F exhibited a melting point of 132°C with a heat of polymerization of 1531 J/g in neat form, as measured by DSC. It was compatible with other resins. TLC analysis indicated Nitrone F to be appreciably non-polar DSC data is reported in Table 10.
- EXAMPLE 17 DSC AND TGA OF NITRONE G AND MALEIMIDE, ACRYLATE, AND CYANATE ESTER
- Nitrone G exhibited considerably less heat of polymerization than any of the Nitrones A to F indicating that the ⁇ H can be reduced by increasing the molecular weight of the nitrone All of the Nitrone G compositions exhibited good thermal stability showing less than 10% weight loss at 200 0 C.
- EXAMPLE 18 TGA AND DSC FOR COMPOSITIONS CONTAINING NITRONE H ACRYLATE, CYANATE ESTER, AND BISMALEIMIDE
- Nitrone H was evaluated by DSC (differential scanning calo ⁇ metry) and TGA (thermal gravimetric analysis) performance in various resin formulations TGA results indicated that Nitrone H exhibited good thermal stability and the blend with cyanate ester exhibited minimum weight loss at 0 37% at 200 0 C The results are disclosed in the Table 15
- Table 15 TGA AND DSC DATA FOR NITRONE H, ACRYLATE CYANATE ESTER, AND BISMALEIMIDE
- compositions are useful as adhesives and encapsulants particularly within the semiconductor packaging industry They can be used as attach adhesives for adhering a semiconductor die (which includes a semiconductor die package) to a substrate as shown in Figure 1 , and as encapsulants for underfilling the gap caused by solder joints connecting semiconductors to substrates or as an encapsulant for covering and protecting a semiconductor package as shown in Figure 2
- this invention is a semiconductor adhered to a substrate with a composition as herein described, and a semiconductor electrically connected to a substrate by solder joints in which a gap formed between the semiconductor and substrate by the solder joints is filled with a composition as herein described
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
This invention is a curable composition comprising a multifunctional nitrone and another compound, such as, acrylate, maleimide, cyanate ester, or epoxy. The nitrone undergoes crosslinking with the other compound through cycioaddition or by nitrone dipole mediated ring opening, without the sensitivity to oxygen suffered by free radical curing. Formula (I) and formula (II).
Description
MULTIFUNCTIONAL NITRONES IN NON-RADICAL SYSTEMS
BACKGROUND OF THE INVENTION
[0001] This invention relates to the use of nitroπes in the cure of non-raclica! mediated organic chemistry systems, and in particular in the cure of formulations for adhesives, coatings, and encapsulants. In one embodiment, the adhesives, coatings, and encapsulants are used in electronic applications.
[0002] Much of the curing chemistry used in current adhesives, coatings, and encapsulants involves initiation by radicals. Radical cure has the disadvantages of oxygen sensitivity before and during cure, and significant shrinkage after cure, creating a need for a chemistry that avoids these problems.
SUMMARY OF THE INVENTION
[0003] This invention is a curable composition comprising a multifunctional nitrone and another compound. For purposes of this specification and the claims, compound is deemed to include monomers, oligomers, and polymers. Such compounds include acrylates, maleimides, cyanate esters, and epoxies The nitrone undergoes crosslinking with the other compound through cycloaddition or ring opening initiated by the nitrone dipole without the sensitivity to oxygen experienced by free radical curing or crosslinking.
[0004] Nitrone chemistry can provide a wide range of curing temperatures in curable compositions comprising a nitrone and one or more other compounds. The curing temperature will depend on the particular compound Within the electronics packaging industry, lower cure temperatures would be useful, for example, in die attach operations (silicone dies attached to substrates), underfill operations (encapsulation of solder electrical connections within an electronic package}, and dual cure operations (B-staging one chemistry at a lower temperature than the curing temperature); higher cure temperatures would be useful, for example, in those applications where the curable composition is used in place of a metallic solder.
BRIEF DESCRIPTION OF THE DRAWINGS
[0005] Figure 1 depicts a semiconductor die on an array and metal leadframe showing the placement of a die attach adhesive. Figure 2 depicts a flip-chip semiconductor electrically joined to a substrate with solder and underfilled with an encapsulant composition.
DETAILED DESCRIPTION OF THE INVENTION
[0006] Nitrones are 1 ,3-dipolar species prepared through an easy one step, room temperature condensation reaction between an aldehyde and an alkylhydroxylamine as depicted here:
[0007] Nitrones are known to participate in 1 ,3-dιpolar cycloaddition reactions with dipoiarophiles (2π-partners) to give cycloadducts. The cycloaddition reaction is insensitive to oxygen and moisture and generates a five-membered ring called an isoxazohdine:
1,3 Dipole Isoxazolidine
[0008] Nitrones also can initiate polymerization of heterocyclic monomers, such as epoxies, by ring opening: I÷ Polymer
[0009] Complex compounds are prepared by the reaction of multifunctional nitrones with multifunctional 2π-partners. An example of such reaction is shown here in which a bismaleimide is reacted with a difunctiona! nitrone. The reaction was conducted in dimethylformamide (DMF) at 75QC:
[0010] Exemplary compounds that are suitable for cure with nitrones include, but are not limited to, those compounds that contain functionality reactive with nitrone groups, such as, epoxy, acrylate (which includes methacrylate), maleimide (which includes multifunctional compounds, such as bis- and tris-maleimides), cyanate ester, and vinyl (such as in vinyl ethers and styrenes) Those functionalities can be appended to a wide variety of compounds, such as polyesters, poly(butadienes), siliconized olefins, silicone resins, siloxanes, and other such materials. In one embodiment, the compounds are selected from the group consisting of epoxies, acryiates, maleimides, and cyanate esters.
[0011] Exemplary solid aromatic bismaleimide (BMI) powders for use in compositions
O O
with the nitrones are those having the structure { O O jn which X is an aromatic group. Bismaleimide resins having these X bridging groups are commercially available, and can be obtained, for example, from Sartomer (USA) or HOS-Technic GmbH (Austria).
[0012] Additional exemplary maleimides for use in compositions with the nitrones include
those having the generic structure N
' n in which n is 1 to 3 and X1 is an aliphatic or aromatic group Exemplary X1 entities include, poly(butadienes), poly(carbonates), poly(urethanes), poly(ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate, urea, or ether. These types of compounds are commercially available and can be obtained, for example, from National Starch and Chemical Company and Dainippon Ink and Chemical, Inc.
[0013] Specific preferred maleimides
include
in which C36 represents a linear or branched chain (with or without cyclic moieties) of 36 carbon atoms;
[0014] Suitable acrylates for use in formulation with the inventive compounds include
those having the generic structure
which n is 1 to 6, R1 is -H or -CH3. and X2 is an aromatic or aliphatic group Exemplary X2 groups include poly(butadienes), poiy(carbonates), poly(urethanes), poly{ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyi, amide, carbamate, urea, or ether Commercially available materials include butyl (meth)acrylate, isobutyl (meth)acrylate, 2-ethyl hexyl (meth)acrylate, isodecyl (meth)acrylate, n-lauryl (meth)acrylate, alkyl (meth)acrylate, tridecyl (meth)acrylate, n-stearyl (meth)acrylate, cyclohexyl(meth)acrylate, tetrahydro-furfuryl(meth)acryiate, 2-phenoxy ethyi(meth)acrylate, isobornyl(meth)acrylate, 1,4-butanediol dι(meth)acrylate, 1.6 hexanediol dι(meth)acrylate, 1 ,9-nonandιol dι(meth)acrylate, perfluorooctylethyl (meth)acrylate, 1 ,10 decandiol di(meth)acrylate, nonylphenol polypropoxylate (meth)acrylate, and poiypentoxylate tetrahydrofurfuryl acrylate, available from Kyoeisha Chemical Co., LTD; poiybutadiene urethane dimethacrylate (CN302, NTX6513) and poiybutadiene dimethacrylate (CN301 , NTX6039, PRO6270) available from Sartomer Company, Inc, polycarbonate urethane diacrylate (ArtResin UN9200A) available from Negami Chemical Industries Co., LTD;
acrylated aliphatic urethane oligomers (Ebecryl 230, 264, 265, 270,284, 4830, 4833, 4834 4835, 4866, 4881 , 4883, 8402, 8800-20R, 8803, 8804) available from Radcure Specialities, Inc, polyester acrylate oligomers (Ebecryl 657, 770, 810, 830, 1657, 1810, 1830) available from Radcure Specialities, Inc , and epoxy acrylate resins (CN104, 111 , 112, 115, 116, 117, 118, 119, 120, 124, 136) available from Sartomer Company, Inc In one embodiment the acrylate resins are selected from the group consisting of isobornyl acrylate, isobornyl methacrylate, lauryl acrylate, lauryl methacrylate, poiy(butadιene) with acrylate functionality and poly(butadιene) with methacrylate functionality
[0015] Suitable epoxies for use in compositions with the nitrones include bisphenol, naphthalene, and aliphatic type epoxies Commercially available materials include bisphenol type epoxy resins (Epiclon 830LVP, 830CRP, 835LV, 850CRP) available from Dainippon Ink & Chemicals, Inc , naphthalene type epoxy (Epiclon HP4032) available from Dainippon Ink & Chemicals, Inc ; aliphatic epoxy resins (AraJdite CY179, 184, 192, 175, 179) available from Ciba Specialty Chemicals, (Epoxy 1234, 249, 206) available from Union Carbide Corporation, and (EHPE-3150) available from Daicel Chemical Industries, Ltd Other suitable epoxy resins include cycloaliphatic epoxy resins, bisphenol-A type epoxy resins, bisphenol-F type epoxy resins (e g RSL 1739 from Hexion Specialty Chemicals), epoxy novolac resins, biphenyl type epoxy resins, naphthalene type epoxy resins, dicyclopentadiene-phenol type epoxy resins, reactive epoxy diluents, and mixtures thereof
[0016] Suitable cyanate esters for use m compositions with the nitrones include those
N E=CC-O-1 — ) having the generic structure \ 'n tn which n is 1 or larger, and X7 is a hydrocarbon group Exemplary X7 entities include bisphenol, phenol or cresol novolac, dicyclopentadiene, polybutadiene, polycarbonate, polyurethane, pofyether, or polyester Commercially available materials include, AroCy L-10, AroCy XU366, AroCy XU371 , AroCy XU378, XU71787 02L, and XU 71787 07L, available from Huntsman LLC, Pπmaset PT30, Pπmaset PT30 S75, Pπmaset PT60, Pπmaset PT60S, Pπmaset BADCY, Pπmaset DA230S, Pπmaset MethylCy, and Pπmaset LECY, available from Lonza Group Limited, 2-allyphenoi cyanate ester, 4-methoxyphenol cyanate ester 2,2-bιs(4-cyanatophenol)-1 ,1 ,1 ,3,3,3- hexafluoropropane, bisphenol A cyanate ester, diallylbispheno! A cyanate ester, 4- phenylphenol cyanate ester, 1 ,1 ,1-trιs(4-cyanatophenyl)ethane, 4-cumylphenol cyanate ester, 1 ,1-bιs(4-cyanateophenyl)ethane, 2,2,3,4,4, 5, 5,6, 6,7, 7-dodecafluorooctanedιol dicyanate ester, and 4,4!-bιsphenol cyanate ester, available from Oakwood Products, Inc
[0017] Suitable vinyl ethers for use in compositions with the nitrones include those having
the generic structure
m which n is 1 to 6 and X3 is an aromatic or aliphatic
group. Exemplary X entities include poly(butadienes), poly(carbonates), poly(urethanes), poly(ethers), poly(esters), simple hydrocarbons, and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate, urea, or ether. Commercially available resins include cyclohenanedimethanol divinylether, dodecylviπylether, cyclohexyl vinylether, 2-ethylhexyl vinylether, dipropyleneglycol divinylether, hexanediol divinylether, octadecylviπylether, and butandiol divinylether available from International Speciality Products (ISP); Vectomer 4010, 4020, 4030, 4040, 4051 , 4210, 4220, 4230, 4060, 5015 available from Sigma-Aldrich, lnc
[0018] Suitable poly(butadienes) for use in compositions with the nitrones include poly{butadιenes), epoxidized poly(butadιenes), maleic poly(butadienes), acryiated poly(butadienes), butadiene-styreπe copolymers, and butadiene-acrylomtrile copolymers. Commercially available materials include homopolymer butadiene (Ricon130, 131, 134, 142, 150, 152, 153, 154, 156, 157, P30D} available from Sartomer Company, lnc, random copolymer of butadiene and styrene (Ricon 100, 181 , 184) available from Sartomer Company Inc.; maleinized poly(butadιene) (Ricon 130MA8, 130MA13, 130MA20, 131 MA5, 131MA10, 131 MA17, 131 MA20, 156MA17) available from Sartomer Company, Inc.; acryiated poiy(butadienes) (CN302, NTX6513, CN301 , NTX6039, PRO6270, Ricacryl 3100, Ricacryl 3500) available from Sartomer Inc., epoxydized poly(butadienes) (Polybd 600, 605) available from Sartomer Company. Inc. and Epolead PB3600 available from Daicel Chemical Industries, Ltd, and acrylonitrile and butadiene copolymers (Hycar CTBN series, ATBN series, VTBN series and ETBN series) available from Hanse Chemical.
[0019] Suitable siliconized olefins for use in the compositions with the nitrones are obtained by the selective hydrosilation reaction of silicone and divinyl materials, having the generic structure,
in which n-i is 2 or more, n2 is 1 or more and n!>n2. These materials are commercially available and can be obtained, for example, from National Starch and Chemical Company
[0020] Suitable silicones for use in compositions with the nitrones include reactive silicone resins having the generic structure
in which π is 0 or any integer, X4 and X5 are hydrogen, methyl, amine, epoxy, carboxyl, hydroxy acrylate methacrylate, mercapto, phenol, or vinyl functional groups R2 and R3 can be -H, -CH3, vinyl phenyl, or any hydrocarbon structure with more than two carbons Commercially available materials include KF8012, KF8002, KF8003, KF-1001 , X-22-3710, KF6001 X-22-164C, KF2001 , X- 22-170DX, X-22-173DX, X-22-174DX X-22-176DX KF-857 KF862, KF8001 , X-22-3367, and X-22-3939A available from Shin-Etsu Silicone International Trading (Shanghai) Co , Ltd
[0021] Suitable styrenic compounds for use in compositions with the nitrones include
H Or -CH3, and X6 is an aliphatic group Exemplary X3 entities include poly(butadιenes) polycarbonates), poly(urethanes), poly(ethers) poly(esters), simple hydrocarbons and simple hydrocarbons containing functionalities such as carbonyl, carboxyl, amide, carbamate urea, or ether These resins are commercially available and can be obtained, for example, from National Starch and Chemical Company or Sigma-Aldπch Co
[0022] For some applications, one or more fillers or spacers, or both, may be added to the curable composition and usually are added for improved Theological properties, stress reduction, and bondline control Examples of suitable πonconductive fillers include alumina, aluminum hydroxide, silica, vermicuiite, mica, wollastonite, calcium carbonate titania, sand, glass, barium sulfate, zirconium, carbon black, organic fillers, and organic polymers including but not limited to halogenated ethylene polymers, such as, tetrafluoroethylene, trifluoroethylene, vinylidene fluoride vinyl fluoride, vinylidene chloride, and vinyl chloride Examples of suitable conductive fillers include carbon black graphite, gold, silver, copper, platinum, palladium, nickel, aluminum, silicon carbide, boron nitride, diamond, and alumina The particles may be of any appropriate size ranging from nano size to several mm, depending on whether they are used as fillers or spacers (spacers typically being the larger size particles with more uniformity of size) The choice of such size for any particular end use is within the expertise of one skilled in the art Filler may be present in any amount determined by the practitioner to be suitable for the chosen end use
SYNTHETIC EXAMPLES
[0023] Melting points, curing temperatures, and heat of polymerization for the neat nitrones and for the curable compositions containing the nitrones and other compounds were determined by differential scanning calorimeter (DSC). Thermogravametric Analysis (TGA) was performed on a TGA (TA 2950) thermogravimetric analyzer instrument.
[0024] EXAMPLE 1 SYNTHESIS OF NITRONE A
A solution of potassium hydroxide (23.71 g, 0.3593 mol) in 108 ml_ of ethanol was added slowly to a solution of N-methylhydroxylamine hydrochloride (30 00 g, 0 3557 mol) in 18 mL of water The resulting precipitate was filtered by vacuum filtration and discarded A 50OmL 4-neck round-bottom flask was equipped with condenser and mechanical stirrer and charged with a suspension of 1 ,4-benzenedialdehyde (19.29 g, 0.1437mol) in 54 mL of ethanol. To this suspension was added N-methylhydroxylamine solution dropwise (filtrate). The mixture was stirred overnight, and the precipitate was then vacuum filtered and washed with water. The solid product was dried overnight under vacuum at room temperature. The yield was approximately 41 0%. 1H-NMR was recorded in DMSO (solvent) and evidenced the desired product. The melting point was 2520C. The heat of polymerization was determined to be 435 J/g when a sample was heated from 400C to 3000C at 100C per minute. TGA showed weight loss at 200°C to be 0.26%, at 240°C to be 0.44%, at 26O0C to be 77.1 %, and at 3000C to be 77 8%.
[0025] EXAMPLE 2. SYNTHESIS OF NITRONE B
Nitrone B may be prepared according to the same procedure for the synthesis of Nitrone A except that 1 ,3-beπzenedialdehyde will be used instead of 1 ,4-benzenedιaldehyde.
[0026] EXAMPLE 3. SYNTHESIS OF NITRONE C
The starting dialdehyde was first prepared according to the following reaction scheme:
A 500 mL, 4-neck round-bottom flask equipped with condenser, bubbler, and mechanical stirrer and was charged with 4-hydroxybenzaldehyde (11.12 g, 0.0911 mol), triethylamine (17.05 g, 0.1689 mol), DMAP (0.9476 g, 0.0078 mol), and 100 mL of CH2CI2. The contents were cooled to below 100C in an ice bath. Azelaoyl chloride (10.25 g, 0.0455 mol) was charged to an addition funnel and added dropwise to the reaction flask. The mixture was stirred under 1O0C, the condenser and ice bath were removed and the solution warmed to room temperature and stirred overnight. The mixture was then filtered and the filtrate was washed with water, brine and washed twice with sodium bicarbonate. To purify the product from the baseline spot on TLC, silica gel (10.0 g) was added and the solution stirred for one hour. Once the baseline was removed and checked by TLC the solvent was removed and 1H-NMR was performed in CDCI3 evidencing the presence of the dialdehyde.
[0027] Nitrone C was prepared from the diaidehyde according to the following reaction scheme:
A solution of potassium hydroxide (2.84 g, 0.0506 mol) in 11 mL of ethanol was added slowly to a solution of N-methylhydroxylamine hydrochloride (4.2Og, 0.0506mo!) in 2mL of water. The resulting solid precipitate was stirred for 15 minutes and then removed and discarded.
A 10OmL 3-neck round-bottom flask was equipped with condenser and stir bar and charged with a suspension of the difunctional aldehyde (10.0Og, 0.0253mol) (shown above in the reaction scheme) in 6mL of ethanoi Into the suspension was added the rest of the matter from the rwnethylhydroxylamine hydrochloride solution. A new product precipitated The new mixture with precipitate was stirred overnight, and then vacuum filtered and washed with water. The solid product was dried overnight under vacuum at room temperature. The yield was approximately 45.0%. 1H-NMR was performed in DMSO and evidenced the desired product. The melting point was 152°C.
[0028] EXAMPLE 4 SYNTHESIS OF NITRONE D
Nitrone D was prepared according to the following reaction scheme starting from 4- hydroxybenzaldehyde:
A solution of potassium hydroxide (20.14 g, 0 359 mol) in 108 mL of ethanoi was added slowly to a solution of n-methylhydroxySamine hydrochloride (30.00 g, 0.359 mol) in 18 mL of water. The resulting solid precipitate was stirred for 15 minutes and removed by vacuum filtration and discarded. A 500 mL 4-neck round-bottom flask was equipped with condenser and mechanical stirrer and charged with a suspension of 4-hydroxybenzaidehyde (36 55 g, 0 299 mol) in 71 mL of ethanoi. Into the suspension was added the rest of the matter from the n-methylhydroxyl-amine hydrochloride solution. A new product precipitated. The new mixture with precipitate was stirred overnight, and then vacuum filtered and washed with water The solid product was dried overnight under vacuum at room temperature. The yield was approximately 67.0% 1H-NMR was performed in DMSO and evidenced the desired product The melting point was 232°C.
[0029] EXAMPLE 5 SYNTHESIS OF NITRONE E
Nitroπe E was prepared according to the following reaction scheme starting from 3- hydroxybenzaldehyde:
A solution of potassium hydroxide (20. Ug, 0.359mol) in 108mL of ethanoi was added slowly to a solution of n-methylhydroxylamiπe hydrochloride (30.0Og, 0.359mol) in 18m L of water The resulting solid precipitate was stirred for 15 minutes and then removed by vacuum filtration and discarded A 50OmL 4-neck round-bottom flask was equipped with condenser and mechanical stirrer and charged with a suspension of 3-hydroxybenzaldehyde (36.55g, 0.299mol) in 71 mL of ethanoi. Into the suspension was added the rest of the matter from the n-methylhydroxyiamine hydrochloride solution. A new product precipitated The new mixture with precipitate was stirred overnight, and then vacuum filtered and washed with water. The solid product was dried overnight under vacuum at room temperature to give the Nitrone in good yield. 1H-NMR was performed in DMSO and evidenced the product. The melting point was 2050C.
[0030] EXAMPLE 6 SYNTHESIS OF NITRONE F
The starting 4-propynyloxy benzaldehyde was first prepared according to the following reaction scheme:
To a solution of 4-hydroxy benzaidehyde (24.5 g, 0.2 mol) in DMF was added K2CO3 (33.31 g, 0.2 mol) The mixture was stirred for 15 minutes. Propargyl bromide (15 12 ml) was added and the resulting solution was stirred at room temperature overnight. The mixture was diluted with ethyl acetate and filtered off to remove K2CO3. The filter cake was washed with ethyl acetate The filtrate was taken in a separatory funnel and washed with water (4 x 200 mL), brine, and dried over anhydrous MgSO4. Solvent evaporation followed by drying in a vacuum oven overnight provided the benzaidehyde, whose 1H NMR spectrum was clean (29.5 g, 92 %).
[0031] The benzaidehyde was then used to prepare the nitroπe, according to the following reaction scheme:
To a suspension of N-methylhydroxyJamine hydrochloride (15.66 g, 0.187 mol} in CH2CI2 (75 mL) was added triethylamine (26.14 mL, 0.187 mol). The resulting mixture was stirred for 15 minutes at room temperature. The precipitate was filtered off and washed with CH2CI2 (25 mL). The filtrate was added dropwise to a stirred solution of the aldehyde (20 g, 0.125 mol) in CH2CI2 (150 mL). The resulting mixture was stirred at room temperature overnight. CH2Cl2 was evaporated off; ice-cold water (50 mL) was added to the residue and the precipitate filtered off The solid was washed successively with cold water (20 mL), cold acetone (40 mL) and dried in a vacuum oven This afforded the nitrone product, whose 1H NMR spectrum was clean (DMSO) (14.2 g, 77%) The melting point was 132°C.
[0032] EXAMPLE 7 SYNTHESIS OF NITRONE G
To a solution of 4-hydroxybeπzaldehyde (1Og, 81.9 mmol) in DMF (75 mL) was added potassium carbonate (13.57g, 98.2 mmol). The mixture was stirred for 15 minutes at room temperature. Benzyl bromide (9 73mL, 81.9 mmol) was added and the mixture stirred at room temperature overnight. Ethyl acetate (500 mL) was added and the precipitate filtered off and washed with ethyl acetate (50 mL). The filtrate was washed with water (4χ200mL) and brine (10OmL). The organic layer was dried over anhydrous MgSO4 and the solvent evaporated. The product was dried in vacuum and submitted for 1H NMR The NMR indicated that the compound was pure (15.2g, 87%)
[0033] The 4-benzyloxybenzaldehyde was used to prepare the nitrone according to the following reaction scheme:
To a suspension of N-methylhydroxylamine hydrochloride (7 8g, 93.3 mmol) in dichloro- methane (5OmL) was added triethyiamine (13,02mL, 93.3mmol). The mixture was stirred for 20 minutes The precipitate was filtered and washed with dichloromethane (2OmL) The filtrate was added dropwise to a solution of aldehyde (13.2g, 62.2mL) in dichloromethane (8OmL) and stirred overnight at room temperature. Dichloromethane was evaporated and cold water was added to the residue (10OmL) and stirred for 15 minutes The precipitate was filtered and washed with water, 1 :1 CH2Ci2 : heptane (75mL) and dried under vacuum to give the solid nitrone (12.32g, 82%). Nitrone G has a meiting point of 117°C and is miscible with other resins
[0034] EXAMPLE 8. SYNTHESIS OF NITRONE H
99% R = long chain alkyl group
To a solution of dimerdiol (Uniqema) (9.07g, 16.2 mmol) in CH2CI2 (10OmL) at 00C was added triethylamine (6 8mL) followed by MeSO2CI (2.77mL, 35.7mmoi) dropwise over a period of 10 minutes After stirring for two hours at the same temperature, after the T.L.C indicated the disappearance of starting materia! (as visualized by UV chamber), water (10OmL) was added and the mixture was diluted with EtOAc (30OmL) The organic layer was washed with water (3χ10OmL)1 brine and dried over anhydrous MgSO4 for 30 minutes. The solvent was evaporated and the product was dried under vacuum for two hours to afford the mesylate (11.6g, 99%).
[0035] The diaidehyde was prepared from the dimesyiate according to the following reaction scheme:
89%
R = long chain alkyl group
A suspension of K2CO3 (21.63g, 156 mmol) and 4-hydroxybenzaldehyde (15.66g, 128mmol) in DMF (50OmL) was stirred with a mechanical stirrer at room temperature for 30 minutes. A solution of the dimesyiate in DMF (5OmL) was added dropwise and the resulting mixture was heated at 8O0C for six hours. After T.L.C (thin layer chromatography) indicated the disappearance of starting material, the reaction mixture was cooled to room temperature and diluted with a 1 :1 mixture of ethyl acetate and heptane (50OmL) The precipitate was filtered off and washed with heptane:ethyl acetate(1 :1 , 20OmL) The filtrate was taken in a separatory funnel and washed with water several times (4χ400mL), followed by a wash with brine (30OmL). The organic layer was dried over anhydrous MgSO4 (30 minutes) and the solvent was evaporated at 500C for three hours. The resultant viscous liquid was dried under vacuum for two hours to give the diaidehyde (39 4g, 89%)
R = long chain alkyl group
To a suspension of N-methylhydroxylamine hydrochloride (3.75g, 44.9 mmol) in CH2CI2 (2OmL) was added triethylamine (6.26mL, 44.9 mmol). The mixture was stirred for 15 minutes. The precipitate was filtered and washed with CH2CI2 (15ml_) The filtrate was added dropwise to a solution of the aldehyde (4.3g, 5.6mmol) in CH2CI2 and stirred overnight at room temperature The mixture was diluted with EtOAc (25OmL) and the organic layer was washed with water (4χ50mL), brine, and dried over anhydrous MgSO4. Solvent evaporation furnished a viscous liquid, which was dried using a Kugelrohr at 6O0C for three hours to give the nitrone as a very viscous liquid (4 24g, 93%). The viscosity was 7000 mPa.s at 500C. This reaction was highly reproducible.
PERFORMANCE EXAMPLES AND DISCUSSION
[0037] The above nitrones were formulated into curable compositions comprising one or more of the following resins in various molar ratios. The compositions contained no solvent The neat resins and compositions were cured by Differential Scanning Calorimetry (DSC) and the cure temperatures (Cure T1 and Cure T2) and heats of polymerization (ΔH) recorded in the table for each example. (Melting points noted above were also determined by DSC.) Th ermo-grava metric Analysis (TGA) was used to determine weight loss and was performed on TGA (TA 2950) instrument.
[0038] TrisMaleimide (TMI)
[0040] Bis F Epoxy (Epoxy)
[0041] Acrylate
[0042] Bismaleimide (BMI)
in which C36 represents a linear or branched chain (with or without cyclic moieties) of 36 carbon atoms
[0043] EXAMPLE 9. DSC FOR COMPOSITIONS CONTAINING NITRONE A AND CYANATE ESTER Nitrone A was blended with cyanate ester (CE) in various molar ratios. The DSC scans indicated a two stage curing process and an increase in curing temperature as the amount of nitrone decreased. The results are reported in Table 1
[0044] TABLE 1 : DSC DATA FOR NITRONE A AND CYANATE ESTER
AND EPOXY
Nitrone A was blended with the cyanate ester (CE) and BisF epoxy shown above into compositions in various molar ratios The compositions were cured by DSC The results are reported in Table 2
[0046] TABLE 2: DSC DATA FOR NITRONE A, CYANATE ESTER AND EPOXY
[0047] The DSC peak for the second entry is very broad merging T1 and T2. For the third and fourth entries, most of the curing took place during the first exotherm, therefore, ΔH 2 is low for these cures
[0048] EXAMPLE 11 TGA OF COMPOSITIONS CONTAINING NITRONE A AND EPOXY
Nitrone A in combination with epoxy was tested by TGA for weight loss at 2000C and compared to control samples of cyanate ester, epoxy, and a composition of a 1 : 1 molar ratio of cyanate ester and epoxy The results are reported in Table 3
[0049] TABLE 3: TGA DATA FOR NITRONE A AND EPOXY
[0050] EXAMPLE 12 DSC FOR COMPOSITIONS CONTAINING NITRONE C, CYANATE ESTER, EPOXY, MALEIMIDE, AND ACRYLATE
Nitrone C was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 4 and indicate that the introduction of an aliphatic backbone into the nitrone will decrease the heat of polymerization, for example, compared to Nitrone A
[0051] TABLE 4: DSC DATA FOR NITRONE C, CYANATE ESTER, EPOXY, MALEIMIDE, AND
AC RYLATE
[0052] EXAMPLE 13 DSC FOR COMPOSITIONS CONTAINING NITRONE D, CYANATE ESTER, EPOXY, ACRYLATE, AND MALEIMIDE
Nitrone D has one nitrone functionality and one phenolic functionality Nitrone D was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 5 and indicate a two stage curing process Those formulations that did not show a second cure peak reacted completely in the first exotherm
[0053] TABLE 5: DSC DATA FOR NITRONE D1 CYANATE ESTER, EPOXY, ACRYLATE AND MALEIMIDE
[0054] The presence of the phenolic functionality on Nitrones D and E presents an opportunity to add additional functionality and/or molecular weight and/or aromaticity to these nitrones The phenolic group can be reacted with a compound or resin having a functionality reactive with the phenolic hydroxyl group That compound may contain an additional functionality not reactive with the phenolic hydroxyl, therebv adding that additional functionality to the nitrone Further, the compound may be composed of aliphatic chains of various lengths and branching, or aliphatic groups in combination with aromatic groups to
add molecular weight and/or aromaticity to the nitrone Such nitroπes are included in this invention
[0055] EXAMPLE 14 DSC FOR COMPOSITIONS CONTAINING NITRONE E1 CYANATE ESTER, EPOXY, ACRYLATE AND MALEIMIDE
Nitrone E was blended with cyanate ester, cyanate ester and epoxy, maleimide, and acrylate, and cured by DSC The results are reported in Table 6 and indicate that Nitrone E cures some compounds slower than Nitrone D
[0056] TABLE 6: DSC DATA FOR NITRONE E, CYANATE ESTER, EPOXY, ACRYLATE AND
MALEIMIDE
[0057] EXAMPLE 15 DSC FOR COMPOSITIONS CONTAINING NITRONE AND EPOXY
Nitrones are also capable of ring opening, and thus, for example, epoxy or oxetane rings will open initiated by the nitrone dipoie Several nitrones were used in combination with epoxy and cured by DSC The results are reported in Table 9
[0058] Table 9: DSC Data for Nitrone and Epoxy
[0059] EXAMPLE 16 PROPERTIES FOR COMPOSITIONS CONTAINING NITRONE F, ACRYLATE, EPOXY, MALEIMIDE, AND CYANATE ESTER
Nitrone F exhibited a melting point of 132°C with a heat of polymerization of 1531 J/g in neat form, as measured by DSC. It was compatible with other resins. TLC analysis indicated Nitrone F to be appreciably non-polar DSC data is reported in Table 10.
[0060] Table 10: DSC DATA FOR NITRONE F
[0061] The TGA performance of Nitrone F with epoxy in different mole ratios was investigated and the results are shown in Table 11
[0062] TABLE 11 : TGA DATA FOR NITRONE F, EPOXY, ACRYLATE, AND CYANATE ESTER
[0063] The mechanical properties of Nitrone F in combination with epoxy and cyanate ester (cobalt acetoacetonate as catalyst, 1 wt.%) were evaluated, the results are reported in Table 12. Increasing the amount of Nitrone F from 0.2 mol to 0.4 mol in the composition resulted in increased ΔH, although the cure temperature was lowered by 100C. Nitrone F also improved the T9 (glass transition temperature) of the cured material by 200C on increased loading.
[0064] TABLE 12: MECHANICAL PROPERTIES OF NITRONE F AND EPOXY AND CYANATE ESTER
[0065] EXAMPLE 17. DSC AND TGA OF NITRONE G AND MALEIMIDE, ACRYLATE, AND CYANATE ESTER
The curing behavior and the TGA performance of Nitrone G with different resins were evaluated and the results are shown in Table 13. Nitrone G exhibited considerably less heat of polymerization than any of the Nitrones A to F indicating that the ΔH can be reduced by increasing the molecular weight of the nitrone All of the Nitrone G compositions exhibited good thermal stability showing less than 10% weight loss at 2000C.
[0066] TABLE 13: DSC AND TGA OF NITRONE G AND MALEIMIDE, ACRYLATE, AND CYANATE ESTER
[0067] The mechanical properties of Nitrone G also were investigated and the results are reported in the following table. Cobalt acetoacetonate was used as the curing initiator at 1 wt%.
[0068] TABLE 14: MECHANICAL PROPERTIES OF NITRONE G EPOXY, AND CYANATE ESTER
[0070] EXAMPLE 18 TGA AND DSC FOR COMPOSITIONS CONTAINING NITRONE H ACRYLATE, CYANATE ESTER, AND BISMALEIMIDE
Nitrone H was evaluated by DSC (differential scanning caloπmetry) and TGA (thermal gravimetric analysis) performance in various resin formulations TGA results indicated that Nitrone H exhibited good thermal stability and the blend with cyanate ester exhibited minimum weight loss at 0 37% at 2000C The results are disclosed in the Table 15
[0071] Table 15: TGA AND DSC DATA FOR NITRONE H, ACRYLATE CYANATE ESTER, AND BISMALEIMIDE
[0072] UTILITY
These compositions are useful as adhesives and encapsulants particularly within the semiconductor packaging industry They can be used as attach adhesives for adhering a semiconductor die (which includes a semiconductor die package) to a substrate as shown in Figure 1 , and as encapsulants for underfilling the gap caused by solder joints connecting semiconductors to substrates or as an encapsulant for covering and protecting a semiconductor package as shown in Figure 2 Thus in further embodiments this invention is a semiconductor adhered to a substrate with a composition as herein described, and a semiconductor electrically connected to a substrate by solder joints in which a gap formed between the semiconductor and substrate by the solder joints is filled with a composition as herein described
Claims
1. A curable composition comprising a πitrone and at least one other curable compound selected from the group consisting of epoxy, cyanate ester, acrylate, maleimide, and combinations of these.
2 The curable composition according to ciaim 1 in which the at least one other curable compound is selected from the group consisting of epoxy and cyanate ester.
3. The curable composition according to claim 1 in which the at least one other curable compound is selected from the group consisting of acrylate and maleimide.
4. The curable composition according to claim 1 in which the at least one other curable compound is selected from the group consisting of
o-° in which C36 represents a linear or branched chain (with or without cyclic moieties) of 36 carbon atoms
and combinations of these
5 The curable composition according to any one of claims 1 to 4 in which the nitrone is selected from the group consisting of
(Nitrone A)
(NITRONE B)
(NITRONE C)
(NlTRONE E)
(NlTRONE F)
(NlTRONE G)
and
(NlTRONE H)
6 A semiconductor package comprising a semiconductor adhered to a substrate with the composition comprising a nitrone and at least one other curable compound
7 The semiconductor package according to claim 6 in which the one other curable compound is selected from the group consisting of epoxy, cyanate ester, acrylate, maleimide, and combinations of these, and the nitrone is selected from the group consisting of
(NlTRONE G) and
(NiTRONE H). 8 A semiconductor package electrically connected to a substrate by solder joints, in which a gap formed between the semiconductor and substrate by the solder joints is filled with a composition comprising a nitrone and at least one other curable compound.
9 The semiconductor package according to claim 8 in which the one other curable compound is selected from the group consisting of epoxy, cyanate ester, acrylate, maieimtde, and combinations of these, and the nitrone is selected from the group consisting of
(Nitrone A)
(NITRONE B)
(NITRONE C)
(NITRONE D)
(NlTRONE G) and
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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PCT/US2008/062904 WO2009136920A1 (en) | 2008-05-07 | 2008-05-07 | Multifunctional nitrones in non-radical systems |
TW097120662A TW200946560A (en) | 2008-05-07 | 2008-06-04 | Multifunctional nitrones in non-radical systems |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/US2008/062904 WO2009136920A1 (en) | 2008-05-07 | 2008-05-07 | Multifunctional nitrones in non-radical systems |
Publications (1)
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WO2009136920A1 true WO2009136920A1 (en) | 2009-11-12 |
Family
ID=41264825
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PCT/US2008/062904 WO2009136920A1 (en) | 2008-05-07 | 2008-05-07 | Multifunctional nitrones in non-radical systems |
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WO (1) | WO2009136920A1 (en) |
Cited By (4)
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DE102011088787A1 (en) | 2011-12-16 | 2013-06-20 | Evonik Industries Ag | Siloxan lemon and its application |
WO2015052131A1 (en) | 2013-10-08 | 2015-04-16 | Compagnie Generale Des Etablissements Michelin | Tire tread rubber composition containing polynitrone |
WO2023148380A1 (en) * | 2022-02-07 | 2023-08-10 | Cinartis Gmbh | Powder coating composition |
FR3136776A1 (en) | 2022-06-20 | 2023-12-22 | Compagnie Generale Des Etablissements Michelin | Diene rubber composition comprising a polynitrone. |
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US3988229A (en) * | 1975-08-28 | 1976-10-26 | Eastman Kodak Company | Stabilized photopolymerizable polymeric compositions containing a photoinitiator and a nitrone derivative |
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Publication number | Priority date | Publication date | Assignee | Title |
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DE102011088787A1 (en) | 2011-12-16 | 2013-06-20 | Evonik Industries Ag | Siloxan lemon and its application |
EP2607437A1 (en) | 2011-12-16 | 2013-06-26 | Evonik Industries AG | Siloxane nitrones and their application |
US8722836B2 (en) | 2011-12-16 | 2014-05-13 | Evonik Industries Ag | Siloxane nitrones and use thereof |
WO2015052131A1 (en) | 2013-10-08 | 2015-04-16 | Compagnie Generale Des Etablissements Michelin | Tire tread rubber composition containing polynitrone |
WO2023148380A1 (en) * | 2022-02-07 | 2023-08-10 | Cinartis Gmbh | Powder coating composition |
FR3136776A1 (en) | 2022-06-20 | 2023-12-22 | Compagnie Generale Des Etablissements Michelin | Diene rubber composition comprising a polynitrone. |
WO2023247199A1 (en) | 2022-06-20 | 2023-12-28 | Compagnie Generale Des Etablissements Michelin | Diene rubber composition comprising a polynitrone |
Also Published As
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TW200946560A (en) | 2009-11-16 |
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