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WO2009011381A1 - Novel polymer - Google Patents

Novel polymer Download PDF

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Publication number
WO2009011381A1
WO2009011381A1 PCT/JP2008/062903 JP2008062903W WO2009011381A1 WO 2009011381 A1 WO2009011381 A1 WO 2009011381A1 JP 2008062903 W JP2008062903 W JP 2008062903W WO 2009011381 A1 WO2009011381 A1 WO 2009011381A1
Authority
WO
WIPO (PCT)
Prior art keywords
polymer
novel polymer
disclosed
alkali
copolymerizing
Prior art date
Application number
PCT/JP2008/062903
Other languages
French (fr)
Japanese (ja)
Inventor
Minoru Yamaguchi
Original Assignee
Nippon Shokubai Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co., Ltd. filed Critical Nippon Shokubai Co., Ltd.
Priority to KR1020117016376A priority Critical patent/KR101388818B1/en
Priority to KR1020107000778A priority patent/KR101089531B1/en
Publication of WO2009011381A1 publication Critical patent/WO2009011381A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/402—Alkyl substituted imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

Disclosed is a polymer having excellent heat resistance, which is reduced in the amount of a gas generated when it is heated. In addition, the polymer is quickly dissolved in an organic solvent or an alkali, while having excellent alkali developability. Specifically disclosed is a novel polymer which is obtained by copolymerizing an N-substituted maleimide and/or a compound having a specific structure which is an ether dimer of 2-(hydroxyalkyl) acrylate, vinyl toluene, and a monomer having an acid group as essential components.
PCT/JP2008/062903 2007-07-18 2008-07-17 Novel polymer WO2009011381A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020117016376A KR101388818B1 (en) 2007-07-18 2008-07-17 Novel polymer
KR1020107000778A KR101089531B1 (en) 2007-07-18 2008-07-17 New polymers

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007186577 2007-07-18
JP2007-186577 2007-07-18

Publications (1)

Publication Number Publication Date
WO2009011381A1 true WO2009011381A1 (en) 2009-01-22

Family

ID=40259713

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062903 WO2009011381A1 (en) 2007-07-18 2008-07-17 Novel polymer

Country Status (4)

Country Link
JP (1) JP4296225B2 (en)
KR (2) KR101388818B1 (en)
TW (2) TWI542604B (en)
WO (1) WO2009011381A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103163733A (en) * 2011-12-09 2013-06-19 株式会社日本触媒 Curable resin composition and its use
JP2013167786A (en) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp Curable resin composition for organic insulating film, cured material, tft active matrix substrate, and liquid-crystal display

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5250888B2 (en) * 2007-07-18 2013-07-31 東友ファインケム株式会社 Colored photosensitive resin composition, color filter obtained by using the colored photosensitive resin composition, and liquid crystal display device including the color filter
JP5615123B2 (en) * 2010-10-12 2014-10-29 株式会社日本触媒 Polymer and its use
JP6095416B2 (en) * 2012-10-08 2017-03-15 株式会社日本触媒 Styrene polymer solution
CN103848930A (en) * 2013-12-30 2014-06-11 苏州瑞红电子化学品有限公司 Synthesis of N-phenyl maleimide-containing photosensitive acrylic resin and application thereof in negative photoresist
TWI627504B (en) * 2015-08-11 2018-06-21 奇美實業股份有限公司 Photosensitive resin composition for color filters and uses thereof
WO2019059169A1 (en) * 2017-09-22 2019-03-28 東レ株式会社 Transparent photosensitive resin composition, photospacer, liquid crystal display device, method for producing photospacer, method for producing liquid crystal display device, and use of transparent photosensitive resin composition for lens scan exposure
CN111542554B (en) 2017-12-18 2022-03-18 株式会社日本触媒 Polymer, curable resin composition, and use thereof

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227665A (en) * 1996-02-26 1997-09-02 Kobe Steel Ltd Heat-resistant unsaturated polyester resin composition, heat-resistant fiber reinforced composite material, and heat-resistant molding comprising the same
JP2003082073A (en) * 2001-09-11 2003-03-19 Nippon Petrochemicals Co Ltd Cyclic olefin monomer composition, production method thereof, cyclic olefin polymer composition and cyclic olefin polymer hydrogenated composition
JP2004300203A (en) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd Acid group-containing polymer
JP2004300204A (en) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd Curable resin composition and its use
JP2005097068A (en) * 2003-08-26 2005-04-14 Matsushita Electric Works Ltd Resin composition for artificial marble, and artificial marble obtained by heating and curing the composition
JP2005239999A (en) * 2004-01-27 2005-09-08 Nippon Shokubai Co Ltd Resin composition for forming visible light, near infrared ray or neon light absorbing layer
JP2006089528A (en) * 2004-09-21 2006-04-06 Nippon Shokubai Co Ltd Led sealant, light emitting diode including the same and curable composition
JP2007065155A (en) * 2005-08-30 2007-03-15 Mitsubishi Chemicals Corp Color material dispersion, colored resin composition, color filter, and liquid crystal display device
JP2007113000A (en) * 2005-09-26 2007-05-10 Mitsubishi Chemicals Corp Color material dispersion, colored resin composition, color filter, and liquid crystal display device
JP2007271727A (en) * 2006-03-30 2007-10-18 Mitsubishi Chemicals Corp Green pigment dispersion, colored resin composition, color filter, and liquid crystal display device
JP2008056867A (en) * 2006-09-04 2008-03-13 The Inctec Inc Pigment dispersion and colored photosensitive composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3867177B2 (en) * 1997-04-30 2007-01-10 Ｊｓｒ株式会社 Radiation sensitive composition for color filter
TWI250996B (en) * 1999-09-01 2006-03-11 Jsr Corp Curable composition and color filter protective film
JP2004224894A (en) * 2003-01-22 2004-08-12 Nippon Shokubai Co Ltd Maleimide copolymer

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227665A (en) * 1996-02-26 1997-09-02 Kobe Steel Ltd Heat-resistant unsaturated polyester resin composition, heat-resistant fiber reinforced composite material, and heat-resistant molding comprising the same
JP2003082073A (en) * 2001-09-11 2003-03-19 Nippon Petrochemicals Co Ltd Cyclic olefin monomer composition, production method thereof, cyclic olefin polymer composition and cyclic olefin polymer hydrogenated composition
JP2004300203A (en) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd Acid group-containing polymer
JP2004300204A (en) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd Curable resin composition and its use
JP2005097068A (en) * 2003-08-26 2005-04-14 Matsushita Electric Works Ltd Resin composition for artificial marble, and artificial marble obtained by heating and curing the composition
JP2005239999A (en) * 2004-01-27 2005-09-08 Nippon Shokubai Co Ltd Resin composition for forming visible light, near infrared ray or neon light absorbing layer
JP2006089528A (en) * 2004-09-21 2006-04-06 Nippon Shokubai Co Ltd Led sealant, light emitting diode including the same and curable composition
JP2007065155A (en) * 2005-08-30 2007-03-15 Mitsubishi Chemicals Corp Color material dispersion, colored resin composition, color filter, and liquid crystal display device
JP2007113000A (en) * 2005-09-26 2007-05-10 Mitsubishi Chemicals Corp Color material dispersion, colored resin composition, color filter, and liquid crystal display device
JP2007271727A (en) * 2006-03-30 2007-10-18 Mitsubishi Chemicals Corp Green pigment dispersion, colored resin composition, color filter, and liquid crystal display device
JP2008056867A (en) * 2006-09-04 2008-03-13 The Inctec Inc Pigment dispersion and colored photosensitive composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103163733A (en) * 2011-12-09 2013-06-19 株式会社日本触媒 Curable resin composition and its use
JP2013167786A (en) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp Curable resin composition for organic insulating film, cured material, tft active matrix substrate, and liquid-crystal display

Also Published As

Publication number Publication date
KR20100049007A (en) 2010-05-11
TW201428012A (en) 2014-07-16
JP2009040999A (en) 2009-02-26
TWI458744B (en) 2014-11-01
TWI542604B (en) 2016-07-21
JP4296225B2 (en) 2009-07-15
KR20110099315A (en) 2011-09-07
KR101388818B1 (en) 2014-04-23
TW200914474A (en) 2009-04-01
KR101089531B1 (en) 2011-12-05

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