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WO2008129965A1 - Composition colorée et filtre coloré constitué de celle-ci - Google Patents

Composition colorée et filtre coloré constitué de celle-ci Download PDF

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Publication number
WO2008129965A1
WO2008129965A1 PCT/JP2008/057188 JP2008057188W WO2008129965A1 WO 2008129965 A1 WO2008129965 A1 WO 2008129965A1 JP 2008057188 W JP2008057188 W JP 2008057188W WO 2008129965 A1 WO2008129965 A1 WO 2008129965A1
Authority
WO
WIPO (PCT)
Prior art keywords
colored composition
color filter
colored
organic solvent
filter therefrom
Prior art date
Application number
PCT/JP2008/057188
Other languages
English (en)
Japanese (ja)
Inventor
Kazumichi Haraguchi
Takashi Kanoh
Kohei Matsui
Original Assignee
Toyo Ink Mfg. Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg. Co., Ltd. filed Critical Toyo Ink Mfg. Co., Ltd.
Priority to CN2008800115671A priority Critical patent/CN101652712B/zh
Priority to KR1020097016886A priority patent/KR101431499B1/ko
Publication of WO2008129965A1 publication Critical patent/WO2008129965A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

L'invention concerne une composition colorée comprenant (A) un composé avec une double liaison éthyléniquement insaturée, (B) un pigment, (C) un dispersant de pigment, (D) un initiateur de photopolymérisation et (E) un solvant organique contenant 25 % en poids or plus de solvant organique (S) d'une solubilité dans l'eau supérieure à 7,0 % en poids. La teneur en eau de la composition colorée est de l'ordre de 0,3 à 2,0 % en poids du poids total de la composition colorée. Elle prévoit un filtre coloré comprenant un substrat, et, superposé à celui-ci, un pixel coloré constitué de la composition colorée.
PCT/JP2008/057188 2007-04-16 2008-04-11 Composition colorée et filtre coloré constitué de celle-ci WO2008129965A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2008800115671A CN101652712B (zh) 2007-04-16 2008-04-11 着色组合物及使用该着色组合物的滤色器
KR1020097016886A KR101431499B1 (ko) 2007-04-16 2008-04-11 착색 조성물 및 그것을 사용한 컬러필터

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007106742A JP5142579B2 (ja) 2007-04-16 2007-04-16 着色組成物およびそれを用いたカラーフィルタ
JP2007-106742 2007-04-16

Publications (1)

Publication Number Publication Date
WO2008129965A1 true WO2008129965A1 (fr) 2008-10-30

Family

ID=39875493

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057188 WO2008129965A1 (fr) 2007-04-16 2008-04-11 Composition colorée et filtre coloré constitué de celle-ci

Country Status (5)

Country Link
JP (1) JP5142579B2 (fr)
KR (1) KR101431499B1 (fr)
CN (1) CN101652712B (fr)
TW (1) TWI443455B (fr)
WO (1) WO2008129965A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244408A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5083520B2 (ja) * 2007-07-17 2012-11-28 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示用スペーサーおよび液晶表示素子
TWI443458B (zh) * 2010-04-21 2014-07-01 Toyo Ink Sc Holdings Co Ltd 彩色濾光片用紅色著色組成物及彩色濾光片
JP4873101B2 (ja) * 2010-04-21 2012-02-08 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
JP5741141B2 (ja) * 2010-08-27 2015-07-01 東洋インキＳｃホールディングス株式会社 黒色樹脂組成物及びブラックマトリクス
JP5664171B2 (ja) * 2010-11-25 2015-02-04 凸版印刷株式会社 レジストの調整方法及びレジスト調整装置
JP5301596B2 (ja) * 2011-03-11 2013-09-25 富士フイルム株式会社 青色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、液晶表示装置、及び有機ｅｌ表示装置
JP5789847B2 (ja) * 2011-10-12 2015-10-07 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
JP6054824B2 (ja) 2013-08-01 2016-12-27 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6147134B2 (ja) 2013-08-01 2017-06-14 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6147133B2 (ja) 2013-08-01 2017-06-14 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
TWI731895B (zh) * 2015-12-08 2021-07-01 日商富士軟片股份有限公司 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置
JP6852474B2 (ja) * 2017-03-10 2021-03-31 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、固体撮像素子用カラーフィルタ及び固体撮像素子の製造方法
JP7263856B2 (ja) * 2019-03-14 2023-04-25 東洋インキＳｃホールディングス株式会社 感光性着色組成物、および、これを用いたカラーフィルタ、液晶表示装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10146806A (ja) * 1996-11-19 1998-06-02 Showa Highpolymer Co Ltd 木材処理用組成物
JP2003295427A (ja) * 2002-03-29 2003-10-15 Fuji Photo Film Co Ltd 着色感光性樹脂組成物、並びに、これを用いたカラーフィルター及びその製造方法
JP2006343648A (ja) * 2005-06-10 2006-12-21 Mitsubishi Chemicals Corp カラーフィルター用色材分散液、カラーフィルター用硬化性樹脂組成物及びその製造方法、並びにカラーフィルター及び液晶表示装置
JP2007256684A (ja) * 2006-03-23 2007-10-04 Fujifilm Corp 感光性組成物及び表示装置用遮光膜形成用材料
JP2007270147A (ja) * 2006-03-10 2007-10-18 Mitsubishi Chemicals Corp 硬化性組成物、カラーフィルター、及び液晶表示装置
JP2008007775A (ja) * 2006-06-02 2008-01-17 Fujifilm Corp 顔料分散組成物、それを用いた着色感光性樹脂組成物、感光性樹脂転写材料、およびインクジェットインク、並びにそれらを用いたカラーフィルタ、液晶表示装置、およびｃｃｄデバイス

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003156842A (ja) * 2001-11-22 2003-05-30 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
WO2007105649A1 (fr) * 2006-03-10 2007-09-20 Mitsubishi Chemical Corporation Composition durcissable, filtres colores et affichage a cristaux liquides

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10146806A (ja) * 1996-11-19 1998-06-02 Showa Highpolymer Co Ltd 木材処理用組成物
JP2003295427A (ja) * 2002-03-29 2003-10-15 Fuji Photo Film Co Ltd 着色感光性樹脂組成物、並びに、これを用いたカラーフィルター及びその製造方法
JP2006343648A (ja) * 2005-06-10 2006-12-21 Mitsubishi Chemicals Corp カラーフィルター用色材分散液、カラーフィルター用硬化性樹脂組成物及びその製造方法、並びにカラーフィルター及び液晶表示装置
JP2007270147A (ja) * 2006-03-10 2007-10-18 Mitsubishi Chemicals Corp 硬化性組成物、カラーフィルター、及び液晶表示装置
JP2007256684A (ja) * 2006-03-23 2007-10-04 Fujifilm Corp 感光性組成物及び表示装置用遮光膜形成用材料
JP2008007775A (ja) * 2006-06-02 2008-01-17 Fujifilm Corp 顔料分散組成物、それを用いた着色感光性樹脂組成物、感光性樹脂転写材料、およびインクジェットインク、並びにそれらを用いたカラーフィルタ、液晶表示装置、およびｃｃｄデバイス

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THE CHEMICAL SOCIETY OF JAPAN: "kagaku Benran Kisohen II, revisted edition no. 4", 30 September 1993, MARUZEN CO., LTD., pages: 184 - 185 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244408A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子

Also Published As

Publication number Publication date
JP2008268242A (ja) 2008-11-06
KR101431499B1 (ko) 2014-08-20
JP5142579B2 (ja) 2013-02-13
CN101652712A (zh) 2010-02-17
TW200905385A (en) 2009-02-01
TWI443455B (zh) 2014-07-01
KR20100014779A (ko) 2010-02-11
CN101652712B (zh) 2012-09-05

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