WO2008117719A1 - 表面凹凸の作製方法 - Google Patents
表面凹凸の作製方法 Download PDFInfo
- Publication number
- WO2008117719A1 WO2008117719A1 PCT/JP2008/055092 JP2008055092W WO2008117719A1 WO 2008117719 A1 WO2008117719 A1 WO 2008117719A1 JP 2008055092 W JP2008055092 W JP 2008055092W WO 2008117719 A1 WO2008117719 A1 WO 2008117719A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- section
- photosensitive film
- light
- exposed
- light diffusing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000000805 composite resin Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Dispersion Chemistry (AREA)
- Mathematical Physics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008800089709A CN101636671B (zh) | 2007-03-26 | 2008-03-19 | 表面凹凸的制作方法 |
JP2009506304A JPWO2008117719A1 (ja) | 2007-03-26 | 2008-03-19 | 表面凹凸の作製方法 |
KR1020097022181A KR101441721B1 (ko) | 2007-03-26 | 2008-03-19 | 표면 요철의 제작방법 |
US12/530,992 US8298752B2 (en) | 2007-03-26 | 2008-03-19 | Method for producing surface convexes and concaves |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007078291 | 2007-03-26 | ||
JP2007-078291 | 2007-03-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008117719A1 true WO2008117719A1 (ja) | 2008-10-02 |
Family
ID=39788455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055092 WO2008117719A1 (ja) | 2007-03-26 | 2008-03-19 | 表面凹凸の作製方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8298752B2 (ja) |
JP (1) | JPWO2008117719A1 (ja) |
KR (1) | KR101441721B1 (ja) |
CN (1) | CN101636671B (ja) |
TW (1) | TWI437277B (ja) |
WO (1) | WO2008117719A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102540292A (zh) * | 2012-03-23 | 2012-07-04 | 厦门大学 | 光扩散膜模版制备装置和光扩散膜模版的制备方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4811520B2 (ja) * | 2009-02-20 | 2011-11-09 | 住友金属鉱山株式会社 | 半導体装置用基板の製造方法、半導体装置の製造方法、半導体装置用基板及び半導体装置 |
TWI577523B (zh) * | 2011-06-17 | 2017-04-11 | 三菱麗陽股份有限公司 | 表面具有凹凸結構的模具、光學物品、其製造方法、面發光體用透明基材及面發光體 |
CN102520591A (zh) * | 2011-12-15 | 2012-06-27 | 东南大学 | 一种基于负性光刻胶的扩散片光刻工艺方法 |
CN103353710B (zh) * | 2013-06-26 | 2015-03-18 | 京东方科技集团股份有限公司 | 曝光装置、曝光系统及曝光方法 |
US9976039B1 (en) * | 2013-10-04 | 2018-05-22 | Hrl Laboratories, Llc | Surface-structured coatings |
CN110928146A (zh) * | 2019-12-11 | 2020-03-27 | 北京工业大学 | 一种基于背面发散式光刻技术的弧形截面血管网络微通道模板及制作方法 |
CN113608407B (zh) * | 2021-08-18 | 2023-12-05 | 业成科技(成都)有限公司 | 掩膜、其制备方法及曝光方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6356603A (ja) * | 1986-08-28 | 1988-03-11 | Fujitsu Ltd | 光学装置 |
JPH1145455A (ja) * | 1997-01-29 | 1999-02-16 | Ricoh Co Ltd | 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ |
JP2003066615A (ja) * | 2001-08-30 | 2003-03-05 | Nec Toppan Circuit Solutions Inc | パターン露光方法 |
JP2006003519A (ja) * | 2004-06-16 | 2006-01-05 | Hitachi Maxell Ltd | 光学部品の製造方法およびマイクロレンズアレイの製造方法 |
JP2006162886A (ja) * | 2004-12-06 | 2006-06-22 | Fujikura Ltd | 永久レジスト層の形成方法 |
JP2006308960A (ja) * | 2005-04-28 | 2006-11-09 | Hitachi Chem Co Ltd | マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント |
JP2006334987A (ja) * | 2005-06-03 | 2006-12-14 | Alps Electric Co Ltd | 金型の製造方法及びそれにより得られた成型品 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1294470C (en) * | 1986-07-26 | 1992-01-21 | Toshihiro Suzuki | Process for the production of optical elements |
US6324149B1 (en) * | 1997-05-27 | 2001-11-27 | Ricoh Company, Ltd. | Optical-pick-up device achieving accurate positioning of objective lens and solid-immersion lens and method of forming same |
JP2001337208A (ja) * | 2000-03-23 | 2001-12-07 | Matsushita Electric Ind Co Ltd | 凹凸形状体、反射板及び反射型液晶表示素子、並びにその製造方法、製造装置 |
WO2003040781A1 (en) * | 2001-11-02 | 2003-05-15 | Mems Optical, Inc. | Processes using gray scale exposure processes to make microoptical elements and corresponding molds |
CN100373176C (zh) * | 2002-08-30 | 2008-03-05 | 木本股份有限公司 | 光控制薄膜 |
JP2004310077A (ja) | 2003-03-25 | 2004-11-04 | Nikon Corp | マイクロレンズの製造方法、マイクロレンズ及び露光装置 |
JP2004294745A (ja) | 2003-03-27 | 2004-10-21 | Nikon Corp | 拡散板の製造方法 |
US8603371B2 (en) * | 2006-03-30 | 2013-12-10 | Kimoto Co., Ltd. | Method for producing surface convexes and concaves |
-
2008
- 2008-03-19 WO PCT/JP2008/055092 patent/WO2008117719A1/ja active Application Filing
- 2008-03-19 JP JP2009506304A patent/JPWO2008117719A1/ja active Pending
- 2008-03-19 CN CN2008800089709A patent/CN101636671B/zh not_active Expired - Fee Related
- 2008-03-19 US US12/530,992 patent/US8298752B2/en not_active Expired - Fee Related
- 2008-03-19 KR KR1020097022181A patent/KR101441721B1/ko not_active Expired - Fee Related
- 2008-03-26 TW TW097110782A patent/TWI437277B/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6356603A (ja) * | 1986-08-28 | 1988-03-11 | Fujitsu Ltd | 光学装置 |
JPH1145455A (ja) * | 1997-01-29 | 1999-02-16 | Ricoh Co Ltd | 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ |
JP2003066615A (ja) * | 2001-08-30 | 2003-03-05 | Nec Toppan Circuit Solutions Inc | パターン露光方法 |
JP2006003519A (ja) * | 2004-06-16 | 2006-01-05 | Hitachi Maxell Ltd | 光学部品の製造方法およびマイクロレンズアレイの製造方法 |
JP2006162886A (ja) * | 2004-12-06 | 2006-06-22 | Fujikura Ltd | 永久レジスト層の形成方法 |
JP2006308960A (ja) * | 2005-04-28 | 2006-11-09 | Hitachi Chem Co Ltd | マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント |
JP2006334987A (ja) * | 2005-06-03 | 2006-12-14 | Alps Electric Co Ltd | 金型の製造方法及びそれにより得られた成型品 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102540292A (zh) * | 2012-03-23 | 2012-07-04 | 厦门大学 | 光扩散膜模版制备装置和光扩散膜模版的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101636671B (zh) | 2013-07-10 |
JPWO2008117719A1 (ja) | 2010-07-15 |
US8298752B2 (en) | 2012-10-30 |
KR20100015838A (ko) | 2010-02-12 |
TWI437277B (zh) | 2014-05-11 |
KR101441721B1 (ko) | 2014-09-17 |
US20100044913A1 (en) | 2010-02-25 |
TW200848799A (en) | 2008-12-16 |
CN101636671A (zh) | 2010-01-27 |
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