+

WO2008117719A1 - 表面凹凸の作製方法 - Google Patents

表面凹凸の作製方法 Download PDF

Info

Publication number
WO2008117719A1
WO2008117719A1 PCT/JP2008/055092 JP2008055092W WO2008117719A1 WO 2008117719 A1 WO2008117719 A1 WO 2008117719A1 JP 2008055092 W JP2008055092 W JP 2008055092W WO 2008117719 A1 WO2008117719 A1 WO 2008117719A1
Authority
WO
WIPO (PCT)
Prior art keywords
section
photosensitive film
light
exposed
light diffusing
Prior art date
Application number
PCT/JP2008/055092
Other languages
English (en)
French (fr)
Inventor
Hideki Etori
Original Assignee
Kimoto Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co., Ltd. filed Critical Kimoto Co., Ltd.
Priority to CN2008800089709A priority Critical patent/CN101636671B/zh
Priority to JP2009506304A priority patent/JPWO2008117719A1/ja
Priority to KR1020097022181A priority patent/KR101441721B1/ko
Priority to US12/530,992 priority patent/US8298752B2/en
Publication of WO2008117719A1 publication Critical patent/WO2008117719A1/ja

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278Diffusing elements; Afocal elements characterized by the use used in transmission
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/38Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/38Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842Manufacturing moulds, e.g. shaping the mould surface by machining
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0226Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0268Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70075Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/7035Proximity or contact printers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/42Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424Moulding surfaces provided with means for marking or patterning
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

 フォトマスクを用い、容易かつ高精度に所望の凹凸形状を形成することが可能な表面凹凸の作製方法を提供する。  感光性樹脂組成物からなる感光膜10の一方の側に、光透過部と光不透過部とを有するマスク部材20を感光膜10に対し間隔を持って配置し、マスク部材20の感光膜10とは反対側に光拡散部材30を配置する。光拡散部材30のマスク部材20とは反対側に配置された光源から光を照射し、光拡散部材30とマスク部材20の光透過部を通して感光膜10を露光する。感光膜10の露光部或いは未露光部を現像により除去し、感光膜10に露光部或いは未露光部の形状で決まる凹凸を作製する。露光する際に、光拡散部材30のヘーズなどの露光条件を制御し、露光部或いは未露光部の形状を制御する。
PCT/JP2008/055092 2007-03-26 2008-03-19 表面凹凸の作製方法 WO2008117719A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008800089709A CN101636671B (zh) 2007-03-26 2008-03-19 表面凹凸的制作方法
JP2009506304A JPWO2008117719A1 (ja) 2007-03-26 2008-03-19 表面凹凸の作製方法
KR1020097022181A KR101441721B1 (ko) 2007-03-26 2008-03-19 표면 요철의 제작방법
US12/530,992 US8298752B2 (en) 2007-03-26 2008-03-19 Method for producing surface convexes and concaves

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007078291 2007-03-26
JP2007-078291 2007-03-26

Publications (1)

Publication Number Publication Date
WO2008117719A1 true WO2008117719A1 (ja) 2008-10-02

Family

ID=39788455

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055092 WO2008117719A1 (ja) 2007-03-26 2008-03-19 表面凹凸の作製方法

Country Status (6)

Country Link
US (1) US8298752B2 (ja)
JP (1) JPWO2008117719A1 (ja)
KR (1) KR101441721B1 (ja)
CN (1) CN101636671B (ja)
TW (1) TWI437277B (ja)
WO (1) WO2008117719A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102540292A (zh) * 2012-03-23 2012-07-04 厦门大学 光扩散膜模版制备装置和光扩散膜模版的制备方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4811520B2 (ja) * 2009-02-20 2011-11-09 住友金属鉱山株式会社 半導体装置用基板の製造方法、半導体装置の製造方法、半導体装置用基板及び半導体装置
TWI577523B (zh) * 2011-06-17 2017-04-11 三菱麗陽股份有限公司 表面具有凹凸結構的模具、光學物品、其製造方法、面發光體用透明基材及面發光體
CN102520591A (zh) * 2011-12-15 2012-06-27 东南大学 一种基于负性光刻胶的扩散片光刻工艺方法
CN103353710B (zh) * 2013-06-26 2015-03-18 京东方科技集团股份有限公司 曝光装置、曝光系统及曝光方法
US9976039B1 (en) * 2013-10-04 2018-05-22 Hrl Laboratories, Llc Surface-structured coatings
CN110928146A (zh) * 2019-12-11 2020-03-27 北京工业大学 一种基于背面发散式光刻技术的弧形截面血管网络微通道模板及制作方法
CN113608407B (zh) * 2021-08-18 2023-12-05 业成科技(成都)有限公司 掩膜、其制备方法及曝光方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6356603A (ja) * 1986-08-28 1988-03-11 Fujitsu Ltd 光学装置
JPH1145455A (ja) * 1997-01-29 1999-02-16 Ricoh Co Ltd 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ
JP2003066615A (ja) * 2001-08-30 2003-03-05 Nec Toppan Circuit Solutions Inc パターン露光方法
JP2006003519A (ja) * 2004-06-16 2006-01-05 Hitachi Maxell Ltd 光学部品の製造方法およびマイクロレンズアレイの製造方法
JP2006162886A (ja) * 2004-12-06 2006-06-22 Fujikura Ltd 永久レジスト層の形成方法
JP2006308960A (ja) * 2005-04-28 2006-11-09 Hitachi Chem Co Ltd マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント
JP2006334987A (ja) * 2005-06-03 2006-12-14 Alps Electric Co Ltd 金型の製造方法及びそれにより得られた成型品

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
US6324149B1 (en) * 1997-05-27 2001-11-27 Ricoh Company, Ltd. Optical-pick-up device achieving accurate positioning of objective lens and solid-immersion lens and method of forming same
JP2001337208A (ja) * 2000-03-23 2001-12-07 Matsushita Electric Ind Co Ltd 凹凸形状体、反射板及び反射型液晶表示素子、並びにその製造方法、製造装置
WO2003040781A1 (en) * 2001-11-02 2003-05-15 Mems Optical, Inc. Processes using gray scale exposure processes to make microoptical elements and corresponding molds
CN100373176C (zh) * 2002-08-30 2008-03-05 木本股份有限公司 光控制薄膜
JP2004310077A (ja) 2003-03-25 2004-11-04 Nikon Corp マイクロレンズの製造方法、マイクロレンズ及び露光装置
JP2004294745A (ja) 2003-03-27 2004-10-21 Nikon Corp 拡散板の製造方法
US8603371B2 (en) * 2006-03-30 2013-12-10 Kimoto Co., Ltd. Method for producing surface convexes and concaves

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6356603A (ja) * 1986-08-28 1988-03-11 Fujitsu Ltd 光学装置
JPH1145455A (ja) * 1997-01-29 1999-02-16 Ricoh Co Ltd 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ
JP2003066615A (ja) * 2001-08-30 2003-03-05 Nec Toppan Circuit Solutions Inc パターン露光方法
JP2006003519A (ja) * 2004-06-16 2006-01-05 Hitachi Maxell Ltd 光学部品の製造方法およびマイクロレンズアレイの製造方法
JP2006162886A (ja) * 2004-12-06 2006-06-22 Fujikura Ltd 永久レジスト層の形成方法
JP2006308960A (ja) * 2005-04-28 2006-11-09 Hitachi Chem Co Ltd マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント
JP2006334987A (ja) * 2005-06-03 2006-12-14 Alps Electric Co Ltd 金型の製造方法及びそれにより得られた成型品

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102540292A (zh) * 2012-03-23 2012-07-04 厦门大学 光扩散膜模版制备装置和光扩散膜模版的制备方法

Also Published As

Publication number Publication date
CN101636671B (zh) 2013-07-10
JPWO2008117719A1 (ja) 2010-07-15
US8298752B2 (en) 2012-10-30
KR20100015838A (ko) 2010-02-12
TWI437277B (zh) 2014-05-11
KR101441721B1 (ko) 2014-09-17
US20100044913A1 (en) 2010-02-25
TW200848799A (en) 2008-12-16
CN101636671A (zh) 2010-01-27

Similar Documents

Publication Publication Date Title
TW200739137A (en) Method for forming surface unevenness
WO2008117719A1 (ja) 表面凹凸の作製方法
TW200720835A (en) Method for preparing surface concaves and convexes
TW201203318A (en) Exposure method, exposure device, and device manufacturing method
TW200606179A (en) Material for forming resist protection film for liquid immersion lithography and method for forming resist pattern by using the protection film
EP2637062A3 (en) Pattern forming method
TW200611082A (en) Exposure system and device production method
TW200801801A (en) Process for producing patterned film and photosensitive resin composition
TW200628921A (en) Microlens array, method of fabricating microlens array, and liquid crystal display apparatus with microlens array
TW200641523A (en) Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter
EP2738791A3 (en) Method for correcting a photomask
WO2009078380A1 (ja) ネガ型感光性樹脂積層体を用いたレジスト硬化物の製造方法、ネガ型感光性樹脂積層体、及びネガ型感光性樹脂積層体の使用方法
TW200510495A (en) Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material and method for forming resist pattern using such resist-protection film
TW200732832A (en) Mask blank and photomask
EP2141534A4 (en) Liquid crystal display assembly method and liquid crystal display assembly
WO2008105531A1 (ja) ペリクルフレーム装置、マスク、露光方法及び露光装置並びにデバイスの製造方法
TW200702726A (en) Method of manufacturing microlens, microlens, optical film, screen for projection, projector system, electrooptical device and electronic equipment
WO2008005208A3 (en) Printing form precursor and process for preparing a stamp from the precursor
TW200802875A (en) Method for manufactruring an array substate of a transflective liquid crystal display
TW200700926A (en) Optical element, exposure apparatus, and device manufacturing method
TW200739248A (en) Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method
TW200600963A (en) Gray scale mask and method of manufacturing the same
TW200702801A (en) Method of forming bank, method of forming film pattern, semiconductor device, electro optic device, and electronic apparatus
TW200633791A (en) Method for fabricating nano-adhesive
TWI266373B (en) Pattern forming method and method of manufacturing semiconductor device

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880008970.9

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08722467

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009506304

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 12530992

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20097022181

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 08722467

Country of ref document: EP

Kind code of ref document: A1

点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载