+

WO2008115606A3 - Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment - Google Patents

Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment Download PDF

Info

Publication number
WO2008115606A3
WO2008115606A3 PCT/US2008/005544 US2008005544W WO2008115606A3 WO 2008115606 A3 WO2008115606 A3 WO 2008115606A3 US 2008005544 W US2008005544 W US 2008005544W WO 2008115606 A3 WO2008115606 A3 WO 2008115606A3
Authority
WO
WIPO (PCT)
Prior art keywords
window
chamber
flow
viewport
gas
Prior art date
Application number
PCT/US2008/005544
Other languages
French (fr)
Other versions
WO2008115606A2 (en
Inventor
Kenneth C Harvery
Original Assignee
Verity Instr Inc
Kenneth C Harvery
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/726,958 external-priority patent/US20080233016A1/en
Priority claimed from US11/799,516 external-priority patent/US7630859B2/en
Application filed by Verity Instr Inc, Kenneth C Harvery filed Critical Verity Instr Inc
Priority to CN200880016054A priority Critical patent/CN101681802A/en
Priority to KR1020097022041A priority patent/KR101198205B1/en
Publication of WO2008115606A2 publication Critical patent/WO2008115606A2/en
Publication of WO2008115606A3 publication Critical patent/WO2008115606A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Multichannel array for establishing viscous flow for preventing the flow of particulates causing window clouding. Process chamber for confining process pressure within a process volume with a viewport window along the chamber for viewing portion of process volume. Ingress port disposed in the process chamber for receiving flow of process gas and egress port for extracting flow rate of gas from the process volume. Multichannel array (MCA) disposed between viewport window and process volume of the process chamber. Window chamber separate viewport window from MCA with chamber window port for receiving gas. Viscous flow formed at window side of channels, prevents material from entering window chamber and adhering to window. Viscous flow established by increasing pressure in window chamber via chamber window port. Viscous flow rate substantially lower than rate of process gas flow into process volume.
PCT/US2008/005544 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment WO2008115606A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880016054A CN101681802A (en) 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment
KR1020097022041A KR101198205B1 (en) 2007-05-01 2008-04-29 Method and Apparatus for Reducing the Effects of Window Clouding on a Viewport Window in a Reactive Environment

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/726,958 US20080233016A1 (en) 2007-03-21 2007-03-21 Multichannel array as window protection
US11/726,958 2007-03-21
US11/799,516 2007-05-01
US11/799,516 US7630859B2 (en) 2007-05-01 2007-05-01 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment

Publications (2)

Publication Number Publication Date
WO2008115606A2 WO2008115606A2 (en) 2008-09-25
WO2008115606A3 true WO2008115606A3 (en) 2009-01-29

Family

ID=39766688

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/005544 WO2008115606A2 (en) 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment

Country Status (2)

Country Link
CN (1) CN101681802A (en)
WO (1) WO2008115606A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5456711B2 (en) * 2011-03-03 2014-04-02 住友重機械工業株式会社 Deposition equipment
CN103187225B (en) * 2011-12-28 2015-10-21 中微半导体设备(上海)有限公司 A kind of plasma processing apparatus of monitoring etching process
RU2521719C1 (en) * 2013-02-15 2014-07-10 Общество с ограниченной ответственностью "ВИНТЕЛ" Mercury monitor
EP3280995B1 (en) * 2015-04-10 2019-04-10 MyCartis NV Analysis system with spacing means
CN106816393A (en) * 2015-11-27 2017-06-09 中微半导体设备(上海)有限公司 Processing method for substrate and equipment
CN106756865A (en) * 2016-12-14 2017-05-31 文晓斌 A kind of magnetron sputtering reaction atmosphere self feed back control system and its application method
CN207793418U (en) * 2018-01-30 2018-08-31 北京铂阳顶荣光伏科技有限公司 A kind of filming equipment
CN108623144A (en) * 2018-07-10 2018-10-09 长飞光纤光缆股份有限公司 A kind of VAD prepares the precipitation equipment of preform
CN108926083A (en) * 2018-09-14 2018-12-04 深圳市旭隆珠宝首饰有限公司 A kind of gem processing preventing atomization observation device based on heating member

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188671A (en) * 1990-08-08 1993-02-23 Hughes Aircraft Company Multichannel plate assembly for gas source molecular beam epitaxy
US20050173375A1 (en) * 2002-09-30 2005-08-11 Tokyo Electron Limited Apparatus and method for use of optical system with a plasma processing system
US7074310B2 (en) * 2002-03-04 2006-07-11 William Marsh Rice University Method for separating single-wall carbon nanotubes and compositions thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188671A (en) * 1990-08-08 1993-02-23 Hughes Aircraft Company Multichannel plate assembly for gas source molecular beam epitaxy
US7074310B2 (en) * 2002-03-04 2006-07-11 William Marsh Rice University Method for separating single-wall carbon nanotubes and compositions thereof
US20050173375A1 (en) * 2002-09-30 2005-08-11 Tokyo Electron Limited Apparatus and method for use of optical system with a plasma processing system

Also Published As

Publication number Publication date
WO2008115606A2 (en) 2008-09-25
CN101681802A (en) 2010-03-24

Similar Documents

Publication Publication Date Title
WO2008115606A3 (en) Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment
TW200714898A (en) Apparatus and method for detecting an analyte
WO2008132939A1 (en) Process for producing glass plate and glass plate producing equipment
WO2009019415A3 (en) Determining flow rate
WO2009019414A3 (en) Determining pressure
WO2011090868A3 (en) Single pump focused sampling
WO2012159063A3 (en) Gravity flow fluidic device for nucleic acid extraction
WO2012018555A3 (en) Devices and methods for collecting and analyzing fluid samples from the oral cavity
FR2956149B1 (en) PROCESS FOR MANUFACTURING TRIPLE GLAZING FILLED WITH GAS
EP2232216A4 (en) Differential pressure based flow sensor assembly for medication delivery monitoring and method of using the same
WO2008002909A3 (en) Method and apparatus for multi-chamber exhaust control
WO2007100390A3 (en) Method for monitoring water quality
WO2009023507A3 (en) Devices and methods for producing a continuously flowing concentration gradient in laminar flow
WO2009120722A3 (en) Methods and apparatus for conserving electronic device manufacturing resources
WO2014070794A8 (en) Adaptive camouflage
MX2009013655A (en) Mass spectrometry method for measuring vitamin b6 in body fluid.
WO2012021638A3 (en) Apparatus for sorting objects, and associated method
WO2010024997A3 (en) A downhole sanding analysis tool
WO2009131645A3 (en) Methods and apparatus for segregation of particles
WO2010048054A3 (en) Apparatus and methods for collecting a downhole sample
EP2148975A4 (en) Flow hydraulic amplification for a pulsing, fracturing, and drilling (pfd) device
WO2006116361A3 (en) Methods and devices for monitoring platelet function
WO2006102258A3 (en) Particle sorting by fluidic vectoring
WO2008157707A3 (en) Modular filter and vacuum head assembly for a filtering apparatus
WO2010039685A3 (en) Method and apparatus for forming and sealing a hole in a sidewall of a borehole

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880016054.X

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08754144

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20097022041

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2010506306

Country of ref document: JP

122 Ep: pct application non-entry in european phase

Ref document number: 08754144

Country of ref document: EP

Kind code of ref document: A2

点击 这是indexloc提供的php浏览器服务，不要输入任何密码和下载