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WO2008101704A3 - Plasmadeponiertes elektrisch isolierendes, diffusionsdichtes und elastisches schichtsystem - Google Patents

Plasmadeponiertes elektrisch isolierendes, diffusionsdichtes und elastisches schichtsystem Download PDF

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Publication number
WO2008101704A3
WO2008101704A3 PCT/EP2008/001388 EP2008001388W WO2008101704A3 WO 2008101704 A3 WO2008101704 A3 WO 2008101704A3 EP 2008001388 W EP2008001388 W EP 2008001388W WO 2008101704 A3 WO2008101704 A3 WO 2008101704A3
Authority
WO
WIPO (PCT)
Prior art keywords
diffusion
plasma
resistant
electrically insulating
elastic layer
Prior art date
Application number
PCT/EP2008/001388
Other languages
English (en)
French (fr)
Other versions
WO2008101704A2 (de
Inventor
Heinz Werner Busch
Udo Heinrich Grabowy
Lisa Kleinen
Original Assignee
Univ Kaiserslautern Technische
Heinz Werner Busch
Udo Heinrich Grabowy
Lisa Kleinen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Kaiserslautern Technische, Heinz Werner Busch, Udo Heinrich Grabowy, Lisa Kleinen filed Critical Univ Kaiserslautern Technische
Priority to US12/528,320 priority Critical patent/US20110122486A1/en
Priority to EP08707792A priority patent/EP2137337A2/de
Publication of WO2008101704A2 publication Critical patent/WO2008101704A2/de
Publication of WO2008101704A3 publication Critical patent/WO2008101704A3/de

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/18—Applying electric currents by contact electrodes
    • A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
    • A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
    • A61N1/372—Arrangements in connection with the implantation of stimulators
    • A61N1/375—Constructional arrangements, e.g. casings
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/18—Applying electric currents by contact electrodes
    • A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
    • A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
    • A61N1/372—Arrangements in connection with the implantation of stimulators
    • A61N1/375—Constructional arrangements, e.g. casings
    • A61N1/37512—Pacemakers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/02—Details
    • A61N1/04—Electrodes
    • A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biomedical Technology (AREA)
  • Veterinary Medicine (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Materials Engineering (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Inorganic Chemistry (AREA)
  • Biophysics (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Laminated Bodies (AREA)
  • Fixing For Electrophotography (AREA)

Abstract

Vielfachschichtsystem auf einem Substrat, wobei das Vielfachschichtsystem auf das Substrat mit Hilfe von Plasmadeposition aufgebracht wird, dadurch gekennzeichnet, dass das Vielfachschichtsystem derart aufgebaut ist, dass es eine weitgehende Diffusionsdichtheit gegenüber Ionen in wässriger Lösung aufweist, wobei der durch die Diffusion der Ionen bei Anliegen eines elektrischen Feldgradienten von mehr als 104V/m, bevorzugt mehr als 105V/m, ganz bevorzugt von mehr als 107V/m erzeugte Strom IIon < 6,5x10-8 A/cm2, vorzugsweise IIon < 6,5x10 -10 A/cm2, insbesondere IIon < 1x10-12 A/cm2 ist.
PCT/EP2008/001388 2007-02-23 2008-02-22 Plasmadeponiertes elektrisch isolierendes, diffusionsdichtes und elastisches schichtsystem WO2008101704A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/528,320 US20110122486A1 (en) 2007-02-23 2008-02-22 Plasma-Deposited Electrically Insulating, Diffusion-Resistant and Elastic Layer System
EP08707792A EP2137337A2 (de) 2007-02-23 2008-02-22 Plasmadeponiertes elektrisch isolierendes, diffusionsdichtes und elastisches schichtsystem

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007008861.4 2007-02-23
DE102007008861 2007-02-23

Publications (2)

Publication Number Publication Date
WO2008101704A2 WO2008101704A2 (de) 2008-08-28
WO2008101704A3 true WO2008101704A3 (de) 2009-01-29

Family

ID=39636906

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/001388 WO2008101704A2 (de) 2007-02-23 2008-02-22 Plasmadeponiertes elektrisch isolierendes, diffusionsdichtes und elastisches schichtsystem

Country Status (3)

Country Link
US (1) US20110122486A1 (de)
EP (1) EP2137337A2 (de)
WO (1) WO2008101704A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012200969A1 (de) * 2012-01-24 2013-07-25 BSH Bosch und Siemens Hausgeräte GmbH Bauteil für ein Haushaltsgerät
CN105556698B (zh) * 2013-06-29 2019-06-11 艾克斯特朗欧洲公司 用于高性能涂层的沉积的方法以及封装的电子器件
DE102013110394B4 (de) * 2013-09-20 2016-10-27 NMI Naturwissenschaftliches und Medizinisches Institut an der Universität Tübingen Chirurgisches Instrument mit einer spannungsfesten, elektrisch isolierenden Beschichtung
US9378941B2 (en) * 2013-10-02 2016-06-28 Applied Materials, Inc. Interface treatment of semiconductor surfaces with high density low energy plasma
US9984915B2 (en) 2014-05-30 2018-05-29 Infineon Technologies Ag Semiconductor wafer and method for processing a semiconductor wafer
TWI658943B (zh) * 2014-06-04 2019-05-11 日商琳得科股份有限公司 氣阻性層積體及其製造方法、電子裝置用元件以及電子裝置
JP6571389B2 (ja) * 2015-05-20 2019-09-04 シャープ株式会社 窒化物半導体発光素子およびその製造方法
KR102743683B1 (ko) * 2018-05-04 2024-12-18 지앙수 페이보레드 나노테크놀로지 컴퍼니., 리미티드 전기 디바이스에 대한 나노-코팅 보호 방법
CN108511629A (zh) * 2018-05-31 2018-09-07 京东方科技集团股份有限公司 Oled显示基板及其制作方法、显示装置
DE102019206388A1 (de) * 2019-05-03 2020-11-05 Neuroloop GmbH Implantierbare elektrische Kontaktanordnung
KR20220124305A (ko) * 2021-03-02 2022-09-14 삼성디스플레이 주식회사 표시 장치, 이의 제조 방법 및 이를 포함하는 타일형 표시 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006068992A (ja) * 2004-09-01 2006-03-16 Konica Minolta Holdings Inc ガスバリア性フィルム
US20060208634A1 (en) * 2002-09-11 2006-09-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5654084A (en) * 1994-07-22 1997-08-05 Martin Marietta Energy Systems, Inc. Protective coatings for sensitive materials
SE9601154D0 (sv) * 1996-03-26 1996-03-26 Pacesetter Ab Aktivt implantat
US5858477A (en) * 1996-12-10 1999-01-12 Akashic Memories Corporation Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon
US6066399A (en) * 1997-03-19 2000-05-23 Sanyo Electric Co., Ltd. Hard carbon thin film and method of forming the same
WO1999046765A1 (fr) * 1998-03-13 1999-09-16 Hitachi, Ltd. Support d'enregistrement magnetique et memoire magnetique
EP2261956A3 (de) * 2001-09-17 2011-03-30 Advion BioSystems, Inc. Dielektrische Schicht
DE10152055A1 (de) * 2001-10-25 2003-05-08 Nttf Gmbh Mechanisch und thermodynamisch stabile amorphe Kohlenstoffschichten für temperaturempfindliche Oberflächen
US6875664B1 (en) * 2002-08-29 2005-04-05 Advanced Micro Devices, Inc. Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material
DE10242086A1 (de) * 2002-09-11 2004-04-15 Sig Technology Ltd. Behälter zur Verpackung von Produkten, Vorrichtung zur Verarbeitung von Kunstoff sowie Verfahren zur Behälterherstellung
EP1589916A2 (de) * 2003-02-07 2005-11-02 Optobionics Corporation Implantat mit kristalliner kohlenstoff-beschichtung
TW579569B (en) * 2003-02-11 2004-03-11 Au Optronics Corp Multi-level diffusion barrier layer structure of TFT LCD and manufacturing method thereof
WO2005097673A1 (ja) * 2004-03-30 2005-10-20 Toyo Advanced Technologies Co., Ltd. 基材の表面処理方法及び表面処理された基材、医療用材料、医療用器具
US20070020451A1 (en) * 2005-07-20 2007-01-25 3M Innovative Properties Company Moisture barrier coatings

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060208634A1 (en) * 2002-09-11 2006-09-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
JP2006068992A (ja) * 2004-09-01 2006-03-16 Konica Minolta Holdings Inc ガスバリア性フィルム

Also Published As

Publication number Publication date
WO2008101704A2 (de) 2008-08-28
US20110122486A1 (en) 2011-05-26
EP2137337A2 (de) 2009-12-30

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