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WO2008101676A3 - Objectif de projection catadioptrique avec ouverture numérique ultra-élevée - Google Patents

Objectif de projection catadioptrique avec ouverture numérique ultra-élevée Download PDF

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Publication number
WO2008101676A3
WO2008101676A3 PCT/EP2008/001299 EP2008001299W WO2008101676A3 WO 2008101676 A3 WO2008101676 A3 WO 2008101676A3 EP 2008001299 W EP2008001299 W EP 2008001299W WO 2008101676 A3 WO2008101676 A3 WO 2008101676A3
Authority
WO
WIPO (PCT)
Prior art keywords
projection objective
transmissive
transmissive portion
catadioptric
image
Prior art date
Application number
PCT/EP2008/001299
Other languages
English (en)
Other versions
WO2008101676A2 (fr
Inventor
Aurelian Dodoc
Original Assignee
Zeiss Carl Smt Ag
Aurelian Dodoc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Aurelian Dodoc filed Critical Zeiss Carl Smt Ag
Publication of WO2008101676A2 publication Critical patent/WO2008101676A2/fr
Publication of WO2008101676A3 publication Critical patent/WO2008101676A3/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)

Abstract

Un objectif de projection catadioptrique comporte une pluralité d'éléments optiques disposés le long d'un axe optique pour représenter un motif, prévu dans une surface objet de l'objectif de projection, sur une surface image de l'objectif de projection. Lesdits éléments optiques comprennent un élément optique catadioptrique dont le corps est fait d'un matériau transparent; une première surface sur un côté objet du corps et une seconde surface opposée à la première surface. La seconde surface est munie d'une partie transmissive dans une zone centrale autour de l'axe optique et une partie réfléchissante concave dans une zone entourant la partie transmissive. La première surface comporte une zone transmissive configurée pour transmettre un rayonnement provenant de la surface objet vers la seconde surface et orientée par rapport à la seconde surface de telle sorte qu'au moins une partie du rayonnement réfléchi par la partie réfléchissante de la seconde surface est entièrement réfléchie par la partie transmissive de la première surface vers la partie transmissive de la seconde surface.
PCT/EP2008/001299 2007-02-23 2008-02-20 Objectif de projection catadioptrique avec ouverture numérique ultra-élevée WO2008101676A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US90284907P 2007-02-23 2007-02-23
US60/902,849 2007-02-23

Publications (2)

Publication Number Publication Date
WO2008101676A2 WO2008101676A2 (fr) 2008-08-28
WO2008101676A3 true WO2008101676A3 (fr) 2008-10-30

Family

ID=39365783

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/001299 WO2008101676A2 (fr) 2007-02-23 2008-02-20 Objectif de projection catadioptrique avec ouverture numérique ultra-élevée

Country Status (1)

Country Link
WO (1) WO2008101676A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8947775B2 (en) 2012-06-08 2015-02-03 The Arizona Board Of Regents On Behalf Of The University Of Arizona Catadioptric optical system with total internal reflection for high numerical aperture imaging
US8947773B2 (en) 2012-06-08 2015-02-03 Canon Kabushiki Kaisha Catadioptric optical element and optical system including same
US9329373B2 (en) 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2683394A (en) * 1951-09-08 1954-07-13 American Optical Corp Wide aperture optical projection lens system
US5930055A (en) * 1994-09-29 1999-07-27 Eisenberg; Yeshayahu S. Lens apparatus
US6493156B1 (en) * 1999-05-27 2002-12-10 Lg Electronics Inc. High resolution lens

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2683394A (en) * 1951-09-08 1954-07-13 American Optical Corp Wide aperture optical projection lens system
US5930055A (en) * 1994-09-29 1999-07-27 Eisenberg; Yeshayahu S. Lens apparatus
US6493156B1 (en) * 1999-05-27 2002-12-10 Lg Electronics Inc. High resolution lens

Also Published As

Publication number Publication date
WO2008101676A2 (fr) 2008-08-28

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