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WO2008153364A3 - Method for forming multi layer film using laser - Google Patents

Method for forming multi layer film using laser Download PDF

Info

Publication number
WO2008153364A3
WO2008153364A3 PCT/KR2008/003369 KR2008003369W WO2008153364A3 WO 2008153364 A3 WO2008153364 A3 WO 2008153364A3 KR 2008003369 W KR2008003369 W KR 2008003369W WO 2008153364 A3 WO2008153364 A3 WO 2008153364A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
metal thin
forming
irradiating
multi layer
Prior art date
Application number
PCT/KR2008/003369
Other languages
French (fr)
Other versions
WO2008153364A2 (en
Inventor
Il Ho Kim
Original Assignee
Cowindst Co Ltd
Il Ho Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cowindst Co Ltd, Il Ho Kim filed Critical Cowindst Co Ltd
Publication of WO2008153364A2 publication Critical patent/WO2008153364A2/en
Publication of WO2008153364A3 publication Critical patent/WO2008153364A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13458—Terminal pads
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G02F1/136263—Line defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laser Beam Processing (AREA)

Abstract

Disclosed is a method of forming a multi layer thin film, including forming first and second contact holes by irradiating a laser beam on a metal pattern having an open defect; filling the first and second contact holes with a metal thin film by irradiating a laser beam; forming a metal thin film between the first and second contact holes by irradiating a laser beam; and forming a passivation film made of SixNy or SiO2 to protect the metal thin film. The method further includes pre-cleaning the surface of a region of the metal pattern, on which the metal thin film is formed, before the formation of the metal thin film, thus increasing the adhesive force of the metal thin film and remarkably reducing a possibility that the metal thin film is arbitrarily removed.
PCT/KR2008/003369 2007-06-14 2008-06-16 Method for forming multi layer film using laser WO2008153364A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070058340A KR20080110053A (en) 2007-06-14 2007-06-14 Multilayer Thin Film Formation Method Using Laser
KR10-2007-0058340 2007-06-14

Publications (2)

Publication Number Publication Date
WO2008153364A2 WO2008153364A2 (en) 2008-12-18
WO2008153364A3 true WO2008153364A3 (en) 2009-02-19

Family

ID=40130330

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/003369 WO2008153364A2 (en) 2007-06-14 2008-06-16 Method for forming multi layer film using laser

Country Status (3)

Country Link
KR (1) KR20080110053A (en)
TW (1) TW200914922A (en)
WO (1) WO2008153364A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756181A (en) * 1993-08-19 1995-03-03 Fujitsu Ltd LCD display panel and wiring pattern repair method
US5600460A (en) * 1993-11-08 1997-02-04 Hitachi, Ltd. Method of repairing a signal line open circuit by connecting each side of the signal line to an adjacent pixel electrode
US20020027729A1 (en) * 2000-08-15 2002-03-07 Siew Liangsin Servo test method
KR20020091693A (en) * 2001-05-31 2002-12-06 주식회사 현대 디스플레이 테크놀로지 Method for manufacturing thin film transistor lcd
US20050110736A1 (en) * 2003-09-30 2005-05-26 Yushi Jinno Display device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756181A (en) * 1993-08-19 1995-03-03 Fujitsu Ltd LCD display panel and wiring pattern repair method
US5600460A (en) * 1993-11-08 1997-02-04 Hitachi, Ltd. Method of repairing a signal line open circuit by connecting each side of the signal line to an adjacent pixel electrode
US20020027729A1 (en) * 2000-08-15 2002-03-07 Siew Liangsin Servo test method
KR20020091693A (en) * 2001-05-31 2002-12-06 주식회사 현대 디스플레이 테크놀로지 Method for manufacturing thin film transistor lcd
US20050110736A1 (en) * 2003-09-30 2005-05-26 Yushi Jinno Display device

Also Published As

Publication number Publication date
WO2008153364A2 (en) 2008-12-18
TW200914922A (en) 2009-04-01
KR20080110053A (en) 2008-12-18

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