WO2008153287A1 - Low temperature processable substituted alicyclic polyimide photo-alignment layers and method for preparing liquid crystal cells - Google Patents
Low temperature processable substituted alicyclic polyimide photo-alignment layers and method for preparing liquid crystal cells Download PDFInfo
- Publication number
- WO2008153287A1 WO2008153287A1 PCT/KR2008/003155 KR2008003155W WO2008153287A1 WO 2008153287 A1 WO2008153287 A1 WO 2008153287A1 KR 2008003155 W KR2008003155 W KR 2008003155W WO 2008153287 A1 WO2008153287 A1 WO 2008153287A1
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- WIPO (PCT)
- Prior art keywords
- photo
- alignment layers
- low temperature
- liquid crystal
- soluble polyimide
- Prior art date
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 137
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 28
- 125000002723 alicyclic group Chemical group 0.000 title claims abstract description 23
- 210000002858 crystal cell Anatomy 0.000 title claims description 20
- 239000004642 Polyimide Substances 0.000 title abstract description 112
- 230000008569 process Effects 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 239000000126 substance Substances 0.000 claims description 30
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 28
- 239000009719 polyimide resin Substances 0.000 claims description 24
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000001072 heteroaryl group Chemical group 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 52
- 150000004984 aromatic diamines Chemical class 0.000 abstract description 28
- 239000002253 acid Substances 0.000 abstract description 18
- 125000006159 dianhydride group Chemical group 0.000 abstract description 10
- 238000010528 free radical solution polymerization reaction Methods 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 72
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 70
- 239000010409 thin film Substances 0.000 description 40
- 239000007787 solid Substances 0.000 description 38
- 238000006243 chemical reaction Methods 0.000 description 36
- 238000011010 flushing procedure Methods 0.000 description 28
- 229910052757 nitrogen Inorganic materials 0.000 description 28
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 24
- 229940100630 metacresol Drugs 0.000 description 24
- 230000000704 physical effect Effects 0.000 description 22
- 239000011521 glass Substances 0.000 description 19
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 18
- 239000011347 resin Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000007788 liquid Substances 0.000 description 15
- 229910001873 dinitrogen Inorganic materials 0.000 description 14
- 229920005575 poly(amic acid) Polymers 0.000 description 14
- 239000000376 reactant Substances 0.000 description 14
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 13
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 238000010992 reflux Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000010287 polarization Effects 0.000 description 5
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 4
- -1 aromatic tetracarboxylic acid Chemical class 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 3
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 3
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- QGMGHALXLXKCBD-UHFFFAOYSA-N 4-amino-n-(2-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC=C1N QGMGHALXLXKCBD-UHFFFAOYSA-N 0.000 description 2
- WVOLTBSCXRRQFR-SJORKVTESA-N Cannabidiolic acid Natural products OC1=C(C(O)=O)C(CCCCC)=CC(O)=C1[C@@H]1[C@@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-SJORKVTESA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 229920006015 heat resistant resin Polymers 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- QOTJMVZNBRECOZ-UHFFFAOYSA-N 1,2-diphenylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound C1(=CC=CC=C1)C1(C(C(C1(C(=O)O)C1=CC=CC=C1)C(=O)O)C(=O)O)C(=O)O QOTJMVZNBRECOZ-UHFFFAOYSA-N 0.000 description 1
- RVXQQUAZTXDLNA-UHFFFAOYSA-N 1,3-diethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound CCC1(C(O)=O)C(C(O)=O)C(CC)(C(O)=O)C1C(O)=O RVXQQUAZTXDLNA-UHFFFAOYSA-N 0.000 description 1
- SBHHKGFHJWTZJN-UHFFFAOYSA-N 1,3-dimethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical group OC(=O)C1(C)C(C(O)=O)C(C)(C(O)=O)C1C(O)=O SBHHKGFHJWTZJN-UHFFFAOYSA-N 0.000 description 1
- ULAFJDYDLJSYLI-UHFFFAOYSA-N 1,3-diphenylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound C1(=CC=CC=C1)C1(C(C(C1C(=O)O)(C(=O)O)C1=CC=CC=C1)C(=O)O)C(=O)O ULAFJDYDLJSYLI-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GYFUIPAIOWWVFV-UHFFFAOYSA-N 1-phenoxycyclohexa-3,5-diene-1,3-diamine Chemical compound C1C(N)=CC=CC1(N)OC1=CC=CC=C1 GYFUIPAIOWWVFV-UHFFFAOYSA-N 0.000 description 1
- AXGOOCLYBPQWNG-UHFFFAOYSA-N 3-ethylfuran-2,5-dione Chemical compound CCC1=CC(=O)OC1=O AXGOOCLYBPQWNG-UHFFFAOYSA-N 0.000 description 1
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 1
- LPFJFXRQANKTRA-UHFFFAOYSA-N 3-propylfuran-2,5-dione Chemical compound CCCC1=CC(=O)OC1=O LPFJFXRQANKTRA-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- NYQBRJSZBZNLAM-UHFFFAOYSA-N 4-phenoxycyclohexa-1,5-diene-1,4-diamine Chemical compound C1=CC(N)=CCC1(N)OC1=CC=CC=C1 NYQBRJSZBZNLAM-UHFFFAOYSA-N 0.000 description 1
- HHQAWLLBQUGIFN-UHFFFAOYSA-N 6-(1,1,1,3,3,3-hexafluoro-2-phenylpropan-2-yl)oxycyclohexa-2,4-diene-1,1-diamine Chemical compound NC1(C(OC(C(F)(F)F)(C(F)(F)F)C2=CC=CC=C2)C=CC=C1)N HHQAWLLBQUGIFN-UHFFFAOYSA-N 0.000 description 1
- BZWUYTRSEXHNEX-UHFFFAOYSA-N 6-(1,1,1,3,3,3-hexafluoropropan-2-yl)cyclohexa-2,4-diene-1,1-diamine Chemical compound NC1(C(C=CC=C1)C(C(F)(F)F)C(F)(F)F)N BZWUYTRSEXHNEX-UHFFFAOYSA-N 0.000 description 1
- GGDKNFCCHJCIIO-UHFFFAOYSA-N 6-(1-phenylpropoxy)cyclohexa-2,4-diene-1,1-diamine Chemical compound C=1C=CC=CC=1C(CC)OC1C=CC=CC1(N)N GGDKNFCCHJCIIO-UHFFFAOYSA-N 0.000 description 1
- YCEWISUPRHCAEC-UHFFFAOYSA-N C(CC)C1(C(C(C1C(=O)O)(C(=O)O)CCC)C(=O)O)C(=O)O Chemical compound C(CC)C1(C(C(C1C(=O)O)(C(=O)O)CCC)C(=O)O)C(=O)O YCEWISUPRHCAEC-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- JLJWIVHYUCBSRC-UHFFFAOYSA-N benzene;9-[fluoren-9-ylidene(phenyl)methyl]fluorene Chemical compound C1=CC=CC=C1.C1=CC=CC=C1C([C]1C2=CC=CC=C2C2=CC=CC=C21)=C1C2=CC=CC=C2C2=CC=CC=C21 JLJWIVHYUCBSRC-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- KRDOSDPABCAONA-UHFFFAOYSA-N n-anilinooxyaniline Chemical compound C=1C=CC=CC=1NONC1=CC=CC=C1 KRDOSDPABCAONA-UHFFFAOYSA-N 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000807 solvent casting Methods 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1078—Partially aromatic polyimides wholly aromatic in the diamino moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/20—Manufacture of shaped structures of ion-exchange resins
- C08J5/22—Films, membranes or diaphragms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
Definitions
- the present invention relates to a method for the preparation of alicyclic polyimide photo-alignment layers with high hardness that can be used for a low temperature process. More specifically, the present invention provides a novel soluble polyimide that is prepared from the solution polymerization of acid dianhydrides comprising alicyclic acid dianhydrides at certain ratio or more and aromatic diamines comprising an aromatic diamine at certain ratio or more, photo-alignment layers prepared thereof, a liquid crystal cell prepared from said photo-alignment layers, and a method of producing said photo-alignment layers.
- the novel soluble polyimide of the present invention provides characteristics including low temperature processability, excellent heat resistance, surface hardness and transparency, and an alignment property of a liquid crystal under polarized UV light, etc.
- the thin film made from said novel soluble polyimide for liquid crystal alignment layers is characterized in that it has low surface roughness, excellent printability on a conductive glass (ITO glass) , and excellent heat resistance and transparency, and the liquid crystal cell made therefrom has low pretilt angles in the range of 0.1 ⁇ 1.0°and excellent voltage holding ratio (VHR) of 98% or more at room temperature .
- VHR voltage holding ratio
- polyimide resin represents a highly heat- resistant resin which is prepared by polycondensation of aromatic tetracarboxylic acid or derivatives thereof and an aromatic diamine or an aromatic diisocyanate followed by imidation.
- Polyimide resin may have various molecular structures depending on the kind of monomers used. In general, pyromellitic acid dianhydride (PMDA) or biphthalic anhydride
- BDPA aromatic tetracarboxylic acid and para-phenylene diamine
- p-PDA para-phenylene diamine
- m-PDA meta-phenylene diamine
- ODA 4,4- oxydianiline
- MDA 4-methylene dianiline
- HFDA 2,2- bisaminophenyl hexafluoropropane
- m-BAPS metabisaminophenoxydiphenyl sulfone
- p-BAPS parabisaminophenoxydiphenyl sulfone
- TPE-Q 1,4- bisaminophenoxybenzene
- TPE-Q 1,4- bisaminophenoxybenzene
- TPE-Q 1,4- bisaminophenoxybenzene
- TPE-Q 1,4- bisaminophenoxybenzene
- TPE-Q 1,4- bisaminophenoxybenzene
- TPE-Q 1,4- bisaminophenoxybenzene
- polyimide resin is an insoluble, infusible and highly heat-resistant resin and has characteristics of (1) an excellent heat and oxidation resistance, (2) superior heat- resistance based on the utilization at high temperature, i.e., 260 ° C for short-term use and 480 ° C for long term use, (3) radiation resistance, (4) an excellent property at low temperature, and (5) an excellent chemical resistance, etc.
- the polyimide resin has a problem that, since it has low light transmittance in visible light region due to the formation of a charge transfer complex, it is hardly applied for a field which requires transparency.
- the present invention is to provide soluble polyimide having high hardness and a low temperature processability which can be used to solve the above-described problems and a method of preparing the same. Further, the present invention provides photo-alignment layers that are made from said soluble polyimide and a method for producing the same.
- the present invention provides a novel polyimide resin which has low temperature processability, excellent heat resistance, surface hardness and transparency, and a liquid crystal alignment property under polarized UV light and photo- alignment layers that are produced therefrom.
- the present invention provides a liquid crystal cell that is produced from the liquid crystal alignment layers that are based on the above-described soluble polyimide .
- the present invention provides soluble polyimide liquid crystal alignment layers, characterized in that the thin film made from the soluble polyimide for liquid crystal alignment layers has low surface roughness, excellent printability on a conductive glass (ITO glass) , excellent heat resistance and transparency, and the liquid crystal cell made therefrom has low pretilt angles in the range of 0.1 ⁇ 1.0°and excellent VHR of 98% or more at room temperature. Still further, the present invention provides novel photolytic-type liquid crystal alignment layers that are prepared by illuminating polarized UV light to a soluble polyimide thin film having heat resistance and high transparency in visible light region. In addition, a liquid crystal cell which is produced from said liquid crystal alignment layers and has low process temperature, excellent VHR and low pretilt angles is provided according to the present invention.
- one or more of acid anhydride that is selected from acid dianhydrides having alicyclic structure with a substituent such as 1, 3 -dimethyl- 1, 2, 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DM-CBDA), 1 , 3 -diethyl-1 , 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DE-CBDA), 1, 3-dipropy1-1, 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DP-CBDA), 1, 3-diphenyl- 1 , 2 , 3 , 4 -cyclobutane tetracarboxylic acid dianhydride (DPh- CBDA) and the like are polymerized with aromatic diamines that is selected from 1 , 4 -diaminobenzene, 1 , 3-diaminobenzene, 4,4'- di
- the present invention provides a soluble alicyclic polyimide resin for low temperature process, which is represented by the following chemical formula 1. [chemical formula l]
- m is a natural number in the range of from 1 to 500;
- Ri to R 4 are independently to each other a hydrogen, a linear or branched, saturated or unsaturated alkyl group of Ci - C 30 , an aryl group of C 6 - Ci 2 , an aryl group of C 6 - C 30 or a heteroaryl group of C 6 - C 30 which is substituted with an alkoxy group of C x - C 30 , wherein said aryl group may substituted with a linear or branched, saturated or unsaturated alkyl group of C] - C 30 , an ester group, a carbonyl group, a halogen or an amino group; comprises one or more of aromatic divalent groups which is selected from the following,-
- the above described group is a divalent group which is derived from an aromatic diamine having the chemical formulae 1-1 to 1-12 as follows.
- Preparation based on the polymerization between an acid dianhydride mixture comprising the acid dianhydrides with an alicyclic structure with one or more substituent that is selected from R 1 to R 4 of the following chemical formula 2 and an aromatic diamine mixture comprising one or more of the aromatic diamines that are selected from the above-described chemical formulae 1-1 to 1-12 also falls within the scope of the present invention.
- the compound represented by the following chemical formula 2 is used in an amount of 1-100 tnol% in total acid dianhydrides and one or more of the aromatic diamines that are selected from the above-described chemical formulae 1-1 to 1-12 can be also used in an amount that is suitably selected from the range of 1-100 mol%.
- the soluble polyimide resin that is represented by the above-described formula 1 or copolymer thereof in the present invention is a novel material and a soluble polyimide that is prepared from the acid dianhydrides with a substituted alicyclic structure and the aromatic diamines. It has low temperature processability, heat resistance, mechanical characteristics, and transparency, and a liquid crystal cell that is produced from said soluble polyimide has a favorable effect showing a significant improvement in pretilt angles and electro-optical properties.
- the soluble polyimide resin according to the present invention has characteristics as follows; weight average molecular weight (Mw) of 10,000 to 500,000 g/mol, intrinsic viscosity in the range of 0.3 to 2.0 dL/g, a glass transition temperature in the range of 200 to 400 ° Q and the process temperature of less than 130 ° C preferably 40 to 130 ° C
- the soluble polyimide resin according to the present invention is freely soluble in aprotic polar solvent such as dimethylacetamine (DMAc) , dimethylformamide (DMF) , N- methyl-2 -pyrollidone (NMP) and in an organic solvent at room temperature.
- aprotic polar solvent such as dimethylacetamine (DMAc) , dimethylformamide (DMF) , N- methyl-2 -pyrollidone (NMP)
- organic solvent at room temperature such as dimethylacetamine (DMAc) , dimethylformamide (DMF) , N- methyl-2 -pyrollidone (NMP)
- DMAc dimethylacetamine
- DMF dimethylformamide
- NMP N- methyl-2 -pyrollidone
- the soluble polyimide resin according to the present invention has low temperature processability, favorable heat resistance and mechanical characteristics , an ⁇ excellent liquid crystal alignment characteristics, etc. while still maintaining the favorable properties of conventional polyimide resin of polyamic acid type, it can be used as a core heat-resistant material for a high-tech industry including various electric, electronic, space and aeronautical field.
- the polyimide thin film prepared from the above-described soluble polyimide resin can be formed into a photo-alignment layer by illuminating the film with polarized UV light having wavelength of 220 ⁇ 460 nm with intensity of 100 ⁇ 2,000 mJ/cm 2 .
- the electro-optical property of a liquid crystal cell which is produced from such photo- alignment layer was found to have pretilt angles in the range of 0.1 ⁇ l°and VHR of 98.0-99.5% at 25 ° Cand 3V voltage.
- the liquid crystal used was E- 7 that has been obtained from Merck. 5
- crystal alignment layers of the present invention are useful as liquid crystal alignment layers for IPS(In plane switching) -type TFT-TN and STN LCD and as a heat resistant material for various high-tech, heat-resisting structures.
- Figure 1 is a 1 H NMR spectrum of DM-SPI-I that is prepared according to Example 5 of the present invention.
- Figure 2 is a DSC spectrum of DM-SPI-I that is prepared according to Example 5 of the present invention.
- ⁇ o Figure 3 is a 1 H NMR spectrum of DM-CBDA that is prepared according to Preparation example 1 of the present invention.
- Figure 4 is a 1 H NMR spectrum of DM-CBDA that is prepared according to Preparation example 4 of the present invention.
- Examples 1 to 48 are related to the production of the soluble polyimide, that is used for preparing photo-alignment layers of the present invention, as described in the following Table 2. Specifically, polyimide was produced from the reaction between the aromatic diamine monomer which is selected from chemical formulae 1-1 to 1-12 and the substituted alicyclic acid dianhydride which is produced from Preparation examples 1 to 4 described above, present in a molar ratio of 50:50.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 ° C for 2 hours, at 160 ° C for 2 hours, and at 200 "C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 ° C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220- 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-I) .
- polarized UV light having wavelengths of 220- 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-I) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 ° C for 2
- the soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spm-coated on a ITO glass plate to 0.08 ⁇ m thickness. The plate was dried at the temperatures
- the soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 ⁇ m thickness.
- the plate was dried at the temperatures of 90 " C for 10 rain and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220- F) 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-3) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, 0 and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 ° Cfor 2 hours, and at 200 " C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 ° C for 10 min and 160 ° C for 30 min, followed by an xrradiation of polarized UV light having wavelengths of 220- 460nm (intensity ⁇ OOmJ/cm'') to obtain a photo-aligned polyimide thin film (DM-SPI-4) .
- polarized UV light having wavelengths of 220- 460nm (intensity ⁇ OOmJ/cm'') to obtain a photo-aligned polyimide thin film (DM-SPI-4) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 ° C for 2 hours, and at 200 ° C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 ° C for 2 min and 160 ° C for 10 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-5) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-5) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %
- soluble polyimide (SPI) resin in solid state.
- the soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room
- Example 7 Preparation of soluble polyimide photo-alignment 5 layers (DM-SPI-7) In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (2.27 g) of aromatic diamine of chemical formula 1-7 was dissolved in meta-cresol under slow nitrogen flushing. Then, T) 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing .
- DM-SPI-7 soluble polyimide photo-alignment 5 layers
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the0 reaction was carried out at 70 ° C for 2 hours, at 160 ° C for 2 hours, and at 200 ° C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 °C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI- 7) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI- 7) .
- Physical properties of the5 resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 ° C for 2
- the plate was dried at the temperatures 5 of 90 ° C for 10 min and 160 " C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-8) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-8) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 ° C for 2 hours, at 160 ° C for 2 hours, and at 200 ° C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 "C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-9) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-9) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the plate was dried at the temperatures of 90 "C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-10) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-10) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 ° C for 2 hours, at 160 ° C for 2 hours, and at 200 ° C under reflux for 2 hours to obtain soluble polyimxde m liquid state.
- the plate was dried at the temperatures of 90 " C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-Il) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-Il) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 ° C for 2 hours, at 160 °C for 2 hours, and at 200 ° C under reflux for 2 hours to obtain soluble polyimide in liquid state.
- the plate was dried at the temperatures of 90 " C for 10 min and 160 ° C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-12) .
- polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 600mJ/cm 2 ) to obtain a photo-aligned polyimide thin film (DM-SPI-12) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the resulting polyamic acid solution was spin- coated on a ITO glass plate to 0.08 ⁇ m thickness.
- the plate was heated at the temperatures of 90 ° C for 10 min and 230 ° C for 30 min for thermosetting, followed by illuminating with polarized UV light having wavelengths of 220 ⁇ 460nm (intensity l,000mJ/cm 2 ) to obtain photo-aligned polyamic acid (CPAA-I).
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- the resulting polyamic acid solution was spin-coated on a ITO glass plate to 0.08 ⁇ m thickness.
- the plate was heated at the temperatures of 90 ° C for 10 min and 230 " C for 30 min for thermosetting, followed by illuminating with polarized UV light having wavelengths of 220 ⁇ 460nm (intensity 1 , OOOmJ/cm 2 ) to obtain photo-aligned polyamic acid (CPAA-I) .
- Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
- MDT Maximum Decomposition Temperature indicates the temperature at which thermal decomposition occurs, while RW represents a residual amount after the thermal decomposition.
- the soluble polyimide resin of the present invention that had been obtained from the above-described Examples 1 to 48 was dissolved in a solution of gamma-butyrolactone and 2- butoxyethanol (4:1), and then spin-coated on a ITO glass plate to 0.08 (M ⁇ thickness while maintaining the viscosity of the solution at 30 cp at room temperature.
- the plate was subjected to thermosetting at 160 ° C for 30 min to obtain a thin film, which was then irradiated with polarized UV light to give a liquid crystal cell.
- Table 4 Each of the characteristics of the resulting liquid crystal cell are summarized in Table 4 described below.
- the wavelength was controlled to be in the range of 220 ⁇ 460nm and in accordance with the exposure dose of 600-1,000 mJ/cm 2 , homogeneous alignment of the liquid crystals was observed.
- VFR Voltage Holding Ratio
- the liquid crystal used for the test was E-7 by Merck. By inserting a polarization plate between the thin film and the UV lamp, polarized UV light was generated.
- the polarization plate used was Gran-taylor prism polarization plate which has a degree of polarization of 99.999% or more and UV transparency of 30% or more.
- the alignment state of the liquid crystal was visually measured by using a polarization microscope, and pretilt angles of each liquid crystal cell were determined based on a crystal rotation method.
- Example 5 and Example 12 which relate to the resin in which a methyl group is introduced both to the acid dianhydride and the diamine, show better VHR than Examples 1 to 4 and Examples 6 to 11 that are related to the resin in which a methyl group is introduced only to the acid dianhydride.
- liquid crystal cells that had been prepared by using the soluble polyimide of the present invention according to Examples 1 to 48 can be suitably used as liquid crystal alignment layers for IPS (in plane switching) -type TFT-TN and STN LCD, which require low pretilt angles and high VHR.
- IPS in plane switching
- the soluble alicyclic polyimide photo-alignment layers that are produced according to the present invention can be used in a broad range of application m various types such as a functional coating agent, etc., as an essential element for miniaturization, lightweighting, and reliability enhancement of various electric-electronic industrial products, in particular electronic products.
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Abstract
The present invention relates to a method for the preparation of alicyclic polyimide photo -alignment layers with high hardness that can be used for a low temperature process. More specifically, the present invention provides novel soluble polyimide photo-alignment layers that are prepared from the solution polymerization of acid dianhydrides comprising alicyclic acid dianhydrides at certain ratio or more and aromatic diamines comprising an aromatic diamine at certain ratio or more, and a method of producing them. Said compositions provide characteristics including low temperature processability, excellent heat resistance, surface hardness and transparency, and an alignment property of a liquid crystal under polarized UV light, etc.
Description
[DESCRIPTION]
[Invention Title]
LOW TEMPERATURE PROCESSABLE SUBSTITUTED ALICYCLIC POLYIMIDE PHOTO-ALIGNMENT LAYERS AND METHOD FOR PREPARING LIQUID CRYSTAL CELLS
[Technical Field]
The present invention relates to a method for the preparation of alicyclic polyimide photo-alignment layers with high hardness that can be used for a low temperature process. More specifically, the present invention provides a novel soluble polyimide that is prepared from the solution polymerization of acid dianhydrides comprising alicyclic acid dianhydrides at certain ratio or more and aromatic diamines comprising an aromatic diamine at certain ratio or more, photo-alignment layers prepared thereof, a liquid crystal cell prepared from said photo-alignment layers, and a method of producing said photo-alignment layers. The novel soluble polyimide of the present invention provides characteristics including low temperature processability, excellent heat resistance, surface hardness and transparency, and an alignment property of a liquid crystal under polarized UV light, etc.
In addition, the thin film made from said novel soluble polyimide for liquid crystal alignment layers is characterized
in that it has low surface roughness, excellent printability on a conductive glass (ITO glass) , and excellent heat resistance and transparency, and the liquid crystal cell made therefrom has low pretilt angles in the range of 0.1 ~ 1.0°and excellent voltage holding ratio (VHR) of 98% or more at room temperature .
[Background Art]
Generally, polyimide resin represents a highly heat- resistant resin which is prepared by polycondensation of aromatic tetracarboxylic acid or derivatives thereof and an aromatic diamine or an aromatic diisocyanate followed by imidation.
Polyimide resin may have various molecular structures depending on the kind of monomers used. In general, pyromellitic acid dianhydride (PMDA) or biphthalic anhydride
(BDPA) as an aromatic tetracarboxylic acid and para-phenylene diamine (p-PDA) , meta-phenylene diamine (m-PDA) , 4,4- oxydianiline (ODA), 4 , 4-methylene dianiline (MDA), 2,2- bisaminophenyl hexafluoropropane (HFDA) , metabisaminophenoxydiphenyl sulfone (m-BAPS) , parabisaminophenoxydiphenyl sulfone (p-BAPS) , 1,4- bisaminophenoxybenzene (TPE-Q), 1 , 3-bisaminophenoxybenzene (TPE-R), 2, 2-bisaminophenoxyphenylpropane (BAPP), 2,2- bisaminophenoxyphenylhexafluoropropane (HFBAPP) and the like
as an aromatic diamine are used for the polylcondensation. Most of the polyimide resin is an insoluble, infusible and highly heat-resistant resin and has characteristics of (1) an excellent heat and oxidation resistance, (2) superior heat- resistance based on the utilization at high temperature, i.e., 260 °C for short-term use and 480 °C for long term use, (3) radiation resistance, (4) an excellent property at low temperature, and (5) an excellent chemical resistance, etc.
However, in spite of having the above-mentioned characteristics, the polyimide resin has a problem that, since it has low light transmittance in visible light region due to the formation of a charge transfer complex, it is hardly applied for a field which requires transparency.
In addition, for the polyimide resin which has been developed until now and used for liquid crystal-alignment layers and comprises an alicyclic group introduced in the main skeleton, diamines having an aromatic cycle have been mainly used. However, in most of cases, it remains as a problem that an electric characteristic such as VHR, etc. is impaired due to the high polarizability of the aromatic diamines included therein.
In addition, there is another problem that the polyimide resin which has been developed until now and used for liquid crystal-alignment layers requires a high process temperature so that it is difficult to be applied for a plastic substrate
that is used for preparing a flexible liquid crystal display device .
[Disclosure of Invention] [Technical Subject]
Therefore, the present invention is to provide soluble polyimide having high hardness and a low temperature processability which can be used to solve the above-described problems and a method of preparing the same. Further, the present invention provides photo-alignment layers that are made from said soluble polyimide and a method for producing the same.
Further, the present invention provides a novel polyimide resin which has low temperature processability, excellent heat resistance, surface hardness and transparency, and a liquid crystal alignment property under polarized UV light and photo- alignment layers that are produced therefrom.
Still further, the present invention provides a liquid crystal cell that is produced from the liquid crystal alignment layers that are based on the above-described soluble polyimide .
More specifically, the present invention provides soluble polyimide liquid crystal alignment layers, characterized in that the thin film made from the soluble polyimide for liquid crystal alignment layers has low surface roughness, excellent
printability on a conductive glass (ITO glass) , excellent heat resistance and transparency, and the liquid crystal cell made therefrom has low pretilt angles in the range of 0.1 ~ 1.0°and excellent VHR of 98% or more at room temperature. Still further, the present invention provides novel photolytic-type liquid crystal alignment layers that are prepared by illuminating polarized UV light to a soluble polyimide thin film having heat resistance and high transparency in visible light region. In addition, a liquid crystal cell which is produced from said liquid crystal alignment layers and has low process temperature, excellent VHR and low pretilt angles is provided according to the present invention.
[Technical Solution]
In order to solve the problems described above, intensive studies had been carried out by the inventors of the present invention. As a result, by reacting an acid dianhydride having alicyclic structure with a substituent and an aromatic diamine, soluble polyimide was prepared and by using the same a soluble polyimide thin film was produced. Further, by illuminating polarized UV light to thus-obtained thin film, novel photo- alignment layers having excellent liquid crystal alignment property, excellent voltage holding ratio (VHR) , and low pretilt angles in the range of 0.1 ~ 1.0° were developed, and
therefore the present invention was completed.
Specifically, in the present invention one or more of acid anhydride that is selected from acid dianhydrides having alicyclic structure with a substituent such as 1, 3 -dimethyl- 1, 2, 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DM-CBDA), 1 , 3 -diethyl-1 , 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DE-CBDA), 1, 3-dipropy1-1, 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DP-CBDA), 1, 3-diphenyl- 1 , 2 , 3 , 4 -cyclobutane tetracarboxylic acid dianhydride (DPh- CBDA) and the like are polymerized with aromatic diamines that is selected from 1 , 4 -diaminobenzene, 1 , 3-diaminobenzene, 4,4'- diamino-3 , 3 ' -dimethyl-diphenylmethane, 4,4' -oxydianiline, 4,4' -methylenedianiline, 4,4'- (perfluloropropan-2, 2' - diyl) dianiline, 4 , 4 ' - (1 , 3-phenylenebis (oxy) ) dianiline, 4,4'- (1, 4 -phenylenebis (oxy) ) dianiline, 4-amino-N- (4- aminophenyDbenzamide, 4,4 ' - (4, 4 ' -sulfonylbis (4, 1- phenylene)bis (oxy) ) dianiline, 4, 4 ' - (4, 4 ' - (perfluoropropan-2 , 2- diyl) bis (4 , 1-phneylene) ) bis (oxy) dianiline, 4 , 4 ' - (4 , 4 ' - (propan- 2, 2-diyl) bis (4 , 1-phenylene) ) bis (oxy) dianiline and the like or mixture thereof to obtain the soluble polyimide, and therefore the present invention was completed.
When the soluble polyimide that is prepared from the acid dianhydride having alicyclic structure with the substituent and the aromatic diamine is formed into a thin film by a publicly known method and then illuminated with polarized UV
light, novel liquid crystal photo-alignment layers which have low temperature processability enabling an easy application to a low temperature process, excellent heat resistance and transparency, high surface hardness and VHR, and low pretilt angles are developed, and therefore the present invention was unexpectedly completed.
Hereinafter, the present invention is described in more detail .
The present invention provides a soluble alicyclic polyimide resin for low temperature process, which is represented by the following chemical formula 1. [chemical formula l]
In the above chemical formula 1, m is a natural number in the range of from 1 to 500;
Ri to R4 are independently to each other a hydrogen, a linear or branched, saturated or unsaturated alkyl group of Ci - C30, an aryl group of C6 - Ci2, an aryl group of C6 - C30 or a heteroaryl group of C6 - C30 which is substituted with an alkoxy group of Cx - C30, wherein said aryl group may substituted with a linear or branched, saturated or unsaturated alkyl group of C] - C30, an ester group, a carbonyl group, a halogen or an amino group;
comprises one or more of aromatic divalent groups which is selected from the following,-
The above described group is a divalent group which is derived from an aromatic diamine having the chemical formulae 1-1 to 1-12 as follows.
Preparation based on the polymerization between an acid dianhydride mixture comprising the acid dianhydrides with an alicyclic structure with one or more substituent that is selected from R1 to R4 of the following chemical formula 2 and an aromatic diamine mixture comprising one or more of the aromatic diamines that are selected from the above-described chemical formulae 1-1 to 1-12 also falls within the scope of the present invention. In this case, the compound represented by the following chemical formula 2 is used in an amount of 1-100 tnol% in total acid dianhydrides and one or more of the aromatic diamines that are selected from the above-described chemical formulae 1-1 to 1-12 can be also used in an amount that is suitably selected from the range of 1-100 mol%.
[ Chemical formula 2 ]
(wherein, R1 to R4 are the same as those described for the above-described chemical formula 1) . The soluble polyimide resin that is represented by the above-described formula 1 or copolymer thereof in the present invention is a novel material and a soluble polyimide that is prepared from the acid dianhydrides with a substituted alicyclic structure and the aromatic diamines. It has low temperature processability, heat resistance, mechanical characteristics, and transparency, and a liquid crystal cell that is produced from said soluble polyimide has a favorable effect showing a significant improvement in pretilt angles and electro-optical properties. The soluble polyimide resin according to the present invention has characteristics as follows; weight average molecular weight (Mw) of 10,000 to 500,000 g/mol, intrinsic viscosity in the range of 0.3 to 2.0 dL/g, a glass transition temperature in the range of 200 to 400 °Q and the process temperature of less than 130 °C preferably 40 to 130 °C
In addition, the soluble polyimide resin according to the present invention is freely soluble in aprotic polar solvent such as dimethylacetamine (DMAc) , dimethylformamide (DMF) , N-
methyl-2 -pyrollidone (NMP) and in an organic solvent at room temperature. In particular, even in low water-absorptive solvent such as garama-butyrolactone it has high solubility of at least 10 weight % at room temperature, and also has high solubility in a solvent mixture comprising the solvents described above.
Even for a mixture in which various soluble polyimide resins having different physical properties are mixed, it was found that the physical properties desired in the present invention can be obtained.
Because the soluble polyimide resin according to the present invention has low temperature processability, favorable heat resistance and mechanical characteristics , anύ excellent liquid crystal alignment characteristics, etc. while still maintaining the favorable properties of conventional polyimide resin of polyamic acid type, it can be used as a core heat-resistant material for a high-tech industry including various electric, electronic, space and aeronautical field. In addition, the polyimide thin film prepared from the above-described soluble polyimide resin can be formed into a photo-alignment layer by illuminating the film with polarized UV light having wavelength of 220 ~ 460 nm with intensity of 100 ~ 2,000 mJ/cm2. Further, the electro-optical property of a liquid crystal cell which is produced from such photo-
alignment layer was found to have pretilt angles in the range of 0.1~l°and VHR of 98.0-99.5% at 25 °Cand 3V voltage. In this case, the liquid crystal used was E- 7 that has been obtained from Merck. 5
[Advantageous Effect]
As explained in the above, a new type of liquid crystal alignment layers has been developed according to the present invention and it has lower temperature processability than
10 prior art processes, i.e., the process temperature of 130°Cor less, high surface hardness, excellent light transmittance, heat resistance and mechanical characteristics as well as excellent photo-alignment property, low pretilt angles and excellent VHR. In addition, it was confirmed that the liquid
15 crystal alignment layers of the present invention are useful as liquid crystal alignment layers for IPS(In plane switching) -type TFT-TN and STN LCD and as a heat resistant material for various high-tech, heat-resisting structures.
20 [Brief Description of Drawings]
Figure 1 is a 1H NMR spectrum of DM-SPI-I that is prepared according to Example 5 of the present invention.
Figure 2 is a DSC spectrum of DM-SPI-I that is prepared according to Example 5 of the present invention. ά^o Figure 3 is a 1H NMR spectrum of DM-CBDA that is prepared
according to Preparation example 1 of the present invention.
Figure 4 is a 1H NMR spectrum of DM-CBDA that is prepared according to Preparation example 4 of the present invention.
5 [Best Mode]
Hereinafter, the present invention is described in more detail based on the preparation example and the example. But, these examples are not intended to limit the scope of the present invention. 10
Preparation of acid dianhydrides having alicyclic structure substituted with chemical formula 2
Preparation example 1. Preparation of 1, 3 -dimethyl- 1, 2, 3 , 4- IT) cyclobutane tetracarboxylic acid dianhydride (DM-CBDA)
To a 2L quartz glass photoreactor equipped with sixteen UV lamps (300nm) , a stirrer and a cooler were installed and 250ml of ethyl acetate and lOOg of citraconic anhydride were added thereto followed by stirring for complete mixing. To 0 avoid an excessive temperature increase by UV lamps, an air- cooling type cooler was first run and then UV lamps were turned on for a photoreaction for 150 hours with stirring so as not to have the reactants adhered to the reactor walls. As a result, 40 g of white solid was obtained. 5 After the filtration, the white solid was dried for 24
hours in a vacuum dryer at 60 °C Thus-obtained solid was then added to acetic anhydride, dissolved therein and slowly heated to 150 "C followed by the reaction for 24 hours. Hot reaction solution was filtered through a filter paper to remove 5 impurities and kept in a freezer at the temperature of 0 °C or less for recrystallization for 24 hours to obtain a yellow solid. Thus-obtained solid was filtered and washed three times with 1,4-dioxane to remove acetic anhydride, and then dried in a vacuum oven at 60°Cfor 48 hours to obtain 35 g of slightly 10 yellow-colored 1, 3-dimethyl-l , 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DM-CBDA) . Figure 3 is a 1H NMR spectrum of said DM-CBDA compound.
Preparation example 2. Preparation of 1, 3-diethyl-l, 2, 3, 4- 15 cyclobutane tetracarboxylic acid dianhydride (DE-CBDA)
The reaction was carried out with the same method described for above Preparation example 1 except that 3 -ethyl- 2 , 5-furandione was used instead of citraconic anhydride for the photoreaction for 200 hours under UV lamp illumination. As 20 a result, 27 g of 1, 3-diethyl-l , 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DE-CBDA) was obtained. The product was confirmed by 1H-NMR, similar to the above Preparation example 1.
?.h Preparation example 3. Preparation of 1, 3 -dipropyl-1, 2 , 3 , 4-
cyclobutane tetracarboxylic acid dianhydride (DPR-CBDA)
The reaction was carried out with the same method described for above Preparation example 1 except that 3- propyl-2 , 5-furandione was used instead of citraconic anhydride T for the photoreaction for 180 hours under UV lamp illumination. As a result, 24 g of 1 , 3-dipropyl-l, 2 , 3 , 4-cyclobutane tetracarboxylic acid dianhydride (DPR-CBDA) was obtained. The product was confirmed by 1H-NMR.
10 Preparation example 4. Preparation of 1, 4-diphenyl-l, 2 , 3 , 4- cyclobutane tetracarboxylic acid dianhydride (DP-CBDA)
To a 2L quartz glass photoreactor equipped with sixteen UV lamps (300nm) , a stirrer and a cooler were installed and 500ml of dichloromethane and lOOg of phenylmaleic anhydride
IS were added thereto followed by stirring for complete mixing. To avoid an excessive temperature increase by UV lamps, an air- cooling type cooler was first run and then UV lamps were turned on for a photoreaction for 200 hours with stirring so as not to have the reactants adhered to the reactor walls. As
20 a result, 55 g of white solid was obtained. After the filtration, the white solid was dried for 24 hours in a vacuum dryer at 60°C Thus -obtained solid was then added to acetic anhydride, dissolved therein and slowly heated to 150 °C followed by the reaction for 24 hours. Hot reaction solution
?">■ was filtered through a filter paper to remove impurities and
kept in a freezer at the temperature of 0°C or less for recrystallization for 24 hours to obtain a white solid. Thus- obtained solid was filtered and washed three times with toluene to remove acetic anhydride, and then dried in a vacuum oven at 60°Cfor 48 hours to obtain 35 g of white-colored 1,4- diphenyl-1 , 2 , 3 , 4 -cyclobutane tetracarboxylic dianhydride (DP- CBDA) . From 1H NMR spectrum, said DP-CBDA product was confirmed (Figure 4) .
[Table 1] Chemical structure of acid dianhydrides of chemical formula 2 for different preparation examples
Production of soluble polyimide photo-alignment layers
Examples 1 to 48 are related to the production of the soluble polyimide, that is used for preparing photo-alignment
layers of the present invention, as described in the following Table 2. Specifically, polyimide was produced from the reaction between the aromatic diamine monomer which is selected from chemical formulae 1-1 to 1-12 and the substituted alicyclic acid dianhydride which is produced from Preparation examples 1 to 4 described above, present in a molar ratio of 50:50.
Herein below, the preparation and the physical properties of the soluble polyimide of Examples 1 to 48, the preparation of photo-alignment layers using the same and their physical properties observed therefrom are explained in greater detail in view of specific examples.
[Table 2] Compositional ratio of the soluble polyimide produced in Examples 1 to 48
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole of aromatic diamine of chemical formula 1-1 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing.
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 "C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus-obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °Cto obtain 3.33 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 °C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220- 460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-I) . Physical properties of the resulting
soluble polyimide thin film are summarized in Table 3 described below.
Example 2. Preparation of soluble polyimide photo-alignment ^ layers (DM-SPI-2)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole of aromatic diamine of chemical formula 1-2 was dissolved m meta-cresol under slow nitrogen flushing. Then, 2.24 g
10 (O.Olmol) of DM-CBDA, which had been prepared m Preparation example 1, was slowly added thereto under nitrogen flushing.
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 °C for 2
15 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide m liquid state.
Thus-obtained reactant was precipitated m methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 3.29 g of soluble polyimide (SPI) resin
/0 m solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spm-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures
2" of 90 C for 10 mm and 160 °C for 30 min, followed by an
irradiation of polarized UV light having wavelengths of 220- 460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-2) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 3. Perparation of soluble polyimide photo-alignment layers (DM-SPI-3)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole of aromatic diamine of chemical formula 1-3 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g
(O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing. In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state. Thus -obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 "C to obtain 4.25 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room
temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 "C for 10 rain and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220- F) 460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-3) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
10 Examp1e 4. Preparation of soluble polyimide photo-alignment layers (DM-SPI-4)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (1.98 g) of aromatic diamine of chemical formula 1-4 was
If) dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, 0 and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 °Cfor 2 hours, and at 200 "C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus-obtained reactant was precipitated in methanol, 5 washed with methanol to remove meta-cresol, and dried in the
oven at 60 "C to obtain 4.22 g of soluble polyimide (SPI) resin m solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 °C for 10 min and 160 °C for 30 min, followed by an xrradiation of polarized UV light having wavelengths of 220- 460nm (intensity δOOmJ/cm'') to obtain a photo-aligned polyimide thin film (DM-SPI-4) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 5. Preparation of soluble polyimide photo-alignment layers (DM-SPI- 5)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (2.26 g) of aromatic diamine of chemical formula 1-5 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in
Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2
hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus -obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 4.14 g of soluble polyimide (SPI) resin in solid state. From the NMR spectrum of Figure 1 and DSC spectrum of Figure 2 measured for the resulting soluble polyimide, the production of the polymer was confirmed. The soluble polyimide powder was diluted in a solution of gamma- butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 °C for 2 min and 160 °C for 10 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-5) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 6. Preparation of soluble polyimide photo-alignment layers (DM-SPI-6)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (3.34 g) of aromatic diamine of chemical formula 1-6 was dissolved in meta-cresol under slow nitrogen flushing. Then,
2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %,
5 and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus -obtained reactant was precipitated in methanol,
10 washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 5.58 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room
If) temperature, which was then spin-coated on a ITO glass plate to 0.08 thickness. The plate was dried at the temperatures of 90 °C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned 0 polyimide thin film (DM-SPI-6) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 7. Preparation of soluble polyimide photo-alignment 5 layers (DM-SPI-7)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (2.27 g) of aromatic diamine of chemical formula 1-7 was dissolved in meta-cresol under slow nitrogen flushing. Then, T) 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the0 reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus -obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the ") oven at 60 °C to obtain 4.51 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate0 to 0.08 μm thickness. The plate was dried at the temperatures of 90 °C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI- 7) . Physical properties of the5 resulting soluble polyimide thin film are summarized in Table
3 described below.
Example 8. Preparation of soluble polyimide photo-alignment layers (DM-SPI-8)
5 In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (2.92 g) of aromatic diamine of chemical formula 1-8 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in
10 Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 "C for 2 hours, at 160 °C for 2
If) hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus-obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 5.16 g of soluble polyimide (SPI) resin 0 in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 thickness. The plate was dried at the temperatures 5 of 90 °C for 10 min and 160 "C for 30 min, followed by an
irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-8) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 9. Preparation of soluble polyimide photo-alignment layers (DM-SPI-9)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (2.92 g) of aromatic diamine of chemical formula 1-9 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing.
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus-obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 5.16 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1)
until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 "C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-9) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 10. Preparation of soluble polyimide photo-alignment layers (DM-SPI-10)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (4.32 g) of aromatic diamine of chemical formula 1-10 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing . In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state. Thus-obtained reactant was precipitated in methanol,
washed with methanol to remove meta-cresol, and dried in the oven at 60 °C to obtain 6.56 g of soluble polyimide (SPI) resin in solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 "C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-10) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 11. Preparation of soluble polyimide photo-alignment layers (DM-SPI-Il)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (5.18 g) of aromatic diamine of chemical formula 1-11 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the
reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimxde m liquid state.
Thus -obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 °Cto obtain 7.42 g of soluble polyimide (SPI) resin m solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 urn thickness. The plate was dried at the temperatures of 90 "C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-Il) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 12. Preparation of soluble polyimide photo-alignment layers (DM-SPI-12)
In a 100ml reactor equipped with a stirrer, a nitrogen gas injector, a temperature controller, and a condenser, 0.01 mole (4.11 g) of aromatic diamine of chemical formula 1-12 was dissolved in meta-cresol under slow nitrogen flushing. Then, 2.24 g (O.Olmol) of DM-CBDA, which had been prepared in
Preparation example 1, was slowly added thereto under nitrogen flushing .
In this case, the solid content was fixed at 20 weight %, and while gradually increasing the reaction temperature the reaction was carried out at 70 °C for 2 hours, at 160 °C for 2 hours, and at 200 °C under reflux for 2 hours to obtain soluble polyimide in liquid state.
Thus-obtained reactant was precipitated in methanol, washed with methanol to remove meta-cresol, and dried in the oven at 60 "C to obtain 6.35 g of soluble polyimide (SPI) resin m solid state. The soluble polyimide powder was diluted in a solution of gamma-butyrolactone and 2-butoxyethanol (4:1) until the viscosity of the solution becomes 30 cp at room temperature, which was then spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was dried at the temperatures of 90 "C for 10 min and 160 °C for 30 min, followed by an irradiation of polarized UV light having wavelengths of 220~460nm (intensity 600mJ/cm2) to obtain a photo-aligned polyimide thin film (DM-SPI-12) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Example 13 - Example 24
As an example corresponding to the above Examples 1 to 12, the reaction was carried out similarly except that the same
number of moles of DE-CBMA of Preparation example 2 was used instead of DM-CBMA of Preparation example 1. As a result, photo-aligned soluble polyimide type DE-SPI-I to DE-SPI-12 polyimide thin films were obtained. Their physical properties are summarized in Table 3 described below.
Example 25 - Example 36
As an example corresponding to the above Examples 1 to 12 , the reaction was carried out similarly except that the same number of moles of DPR-CBMA of Preparation example 3 was used instead of DM-CBMA of Preparation example 1. As a result, photo-aligned soluble polyimide type DPR-SPI-I to DPR-SPI-12 polyimide thin films were obtained. Their physical properties are summarized in Table 3 described below.
Example 37 - Example 48
As an example corresponding to the above Examples 1 to 12, the reaction was carried out similarly except that the same number of moles of DP-CBMA of Preparation example 4 was used instead of DM-CBMA of Preparation example 1. As a result, photo-aligned soluble polyimide type DP-SPI-I to DP-SPI-12 polyimide thin films were obtained. Their physical properties are summarized in Table 3 described below.
Comparative example 1. Production of photo-alignment layers
made of pσlyamic acid (CPAA-I)
In a 100ml reactor equipped with a stirrer and a nitrogen gas injector, 0.01 mole (1.98 g) of methylene dianiline was dissolved in JV-methyl-2-pyrrolidone under slow nitrogen flushing. Then, 1.96 g (O.Olmol) of solid 1, 2 , 3 , 4 , -cyclobutane tetracarboxylic anhydride was slowly added thereto under nitrogen flushing. In this case, the solid content was fixed at 20 weight %, and while maintaining the reaction temperature at 0 "C or less the mixture was stirred for 24 hours to obtain a solution of polyamic acid (CPAA) . After adjusting the viscosity of the polyamic acid solution to 30 cp at room temperature, the resulting polyamic acid solution was spin- coated on a ITO glass plate to 0.08 μm thickness. The plate was heated at the temperatures of 90 °C for 10 min and 230 °C for 30 min for thermosetting, followed by illuminating with polarized UV light having wavelengths of 220~460nm (intensity l,000mJ/cm2) to obtain photo-aligned polyamic acid (CPAA-I). Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below.
Comparative example 2. Production of photo-alignment layers made of polyamic acid (CPAA-2)
In a 100ml reactor equipped with a stirrer and a nitrogen gas injector, 0.01 mole (2.00 g) of 4 , 4 ' -oxydianiline was dissolved in iV-methyl-2-pyrrolidone as a reaction solvent
under slow nitrogen flushing. Then, 1.96 g (O.Olmol) of solid 1, 2, 3 , 4 , -cyclobutane tetracarboxylic anhydride was slowly added thereto under nitrogen flushing. In this case, the solid content was fixed at 20 weight %, and while maintaining the reaction temperature at 0 °C or less the mixture was stirred for 24 hours to obtain a solution of polyamic acid (CPAA) . After adjusting the viscosity of the polyamic acid solution to 30 cp at room temperature, the resulting polyamic acid solution was spin-coated on a ITO glass plate to 0.08 μm thickness. The plate was heated at the temperatures of 90 °C for 10 min and 230 "C for 30 min for thermosetting, followed by illuminating with polarized UV light having wavelengths of 220~460nm (intensity 1 , OOOmJ/cm2) to obtain photo-aligned polyamic acid (CPAA-I) . Physical properties of the resulting soluble polyimide thin film are summarized in Table 3 described below. In Table 3, MDT (Maximum Decomposition Temperature) indicates the temperature at which thermal decomposition occurs, while RW represents a residual amount after the thermal decomposition.
[Table 3] Physical properties of the polyimide prepared from Examples and Comparative examples
As it is shown in Table 3 above, it was confirmed that the polyamic acid resins according to the present invention have intrinsic viscosity of 0.30 dL/g or more. In addition, it was found that the resins of the present invention have excellent mechanical properties and film formability under solvent casting.
As it is shown in the above Table 3, pencil hardness of the polyimide thin films comprising an alkyl group in the soluble polyimide that had been prepared according to Examples 1 to 48 was 4H or more, indicating a significant improvement over the thin film produced from the polyamic acids of Comparative examples 1 and 2, which contain no such alkyl group. In particular, for Example 5 and Example 12 that are related to the resin in which a methyl group is introduced both to the acid dianhydride and the diamine, remarkably excellent surface hardness of 6H or so was observed.
Preparation of photo-alignment layers and characteristics measurement test for the liquid crystal cell made of the layers
The soluble polyimide resin of the present invention that had been obtained from the above-described Examples 1 to 48 was dissolved in a solution of gamma-butyrolactone and 2- butoxyethanol (4:1), and then spin-coated on a ITO glass plate
to 0.08 (M\ thickness while maintaining the viscosity of the solution at 30 cp at room temperature. The plate was subjected to thermosetting at 160 °C for 30 min to obtain a thin film, which was then irradiated with polarized UV light to give a liquid crystal cell. Each of the characteristics of the resulting liquid crystal cell are summarized in Table 4 described below. For the illumination, the wavelength was controlled to be in the range of 220~460nm and in accordance with the exposure dose of 600-1,000 mJ/cm2, homogeneous alignment of the liquid crystals was observed. In the following table, VFR stands for Voltage Holding Ratio.
The liquid crystal used for the test was E-7 by Merck. By inserting a polarization plate between the thin film and the UV lamp, polarized UV light was generated. The polarization plate used was Gran-taylor prism polarization plate which has a degree of polarization of 99.999% or more and UV transparency of 30% or more.
The alignment state of the liquid crystal was visually measured by using a polarization microscope, and pretilt angles of each liquid crystal cell were determined based on a crystal rotation method.
[Table 4] Characteristic of the liquid crystal cells that are produced under the illumination with polarized UV light
As it is shown in Table 4 above, the liquid crystal cells that had been prepared by using the soluble polyimide of the present invention according to Examples 1 to 48 all show an excellent alignment property and have an excellent VHR and pretilt angles that are relatively lower than those of Comparative examples 1 and 2 relating to the polyamic acid. Specifically, the pretilt angles were 0.10~1.0°or so, that are reduced compared to Comparative examples 1 and 2 relating to the polyamic acid. In addition, VHR at a room temperature of 98% or more is an increased value compared to that of Comparative examples 1 and 2. Moreover, Example 5 and Example 12, which relate to the resin in which a methyl group is introduced both to the acid dianhydride and the diamine, show better VHR than Examples 1 to 4 and Examples 6 to 11 that are related to the resin in which a methyl group is introduced only to the acid dianhydride.
In other words, it was confirmed that the liquid crystal cells that had been prepared by using the soluble polyimide of the present invention according to Examples 1 to 48 can be suitably used as liquid crystal alignment layers for IPS (in plane switching) -type TFT-TN and STN LCD, which require low pretilt angles and high VHR.
Although the present invention was explained in detail in view of the above-described examples, it would be evident to a skilled person in the art that a various modification and a
change can be made within the technical spirit of the present invention, and such modification and change absolutely fall within the scope of the claims attached herewith.
[industrial Applicability]
It is expected that the soluble alicyclic polyimide photo-alignment layers that are produced according to the present invention can be used in a broad range of application m various types such as a functional coating agent, etc., as an essential element for miniaturization, lightweighting, and reliability enhancement of various electric-electronic industrial products, in particular electronic products.
Claims
[CLAIMS]
[Claim l]
A soluble alicyclic polyimide resin for low temperature process comprising the unit of the following chemical formula 1. [Chemical formula 1]
[In the above chemical formula 1, m is a natural number in the range of from 1 to 500;
R1 to R/, are independently to each other a hydrogen, a linear or branched, saturated or unsaturated alkyl group of Ci - C30, an aryl group of C6 - C12, an aryl group of C5 - C30 or a heteroaryl group of C6 - C30 which is substituted with an alkoxy group of C1 - C30, wherein said aryl group may substituted with a linear or branched, saturated or unsaturated alkyl group of C1 - Cj0, an ester group, a carbonyl group, a halogen or an amino group;
comprises one or more of aromatic divalent groups which is selected from the following;
[ Claim 2 ]
The soluble alicyclic polyimide resin for low temperature process of claim 1, wherein R1 to R4 are independently to each other selected from a hydrogen, a alkyl group of Ci - C3, and a phenyl group . [Claim 3]
The soluble alicyclic polyimide resin for low temperature process of claim 1, wherein said soluble alicyclic polyimide resin for low temperature process has intrinsic viscosity of 0.
3 ~ 2.0 dL/g and weight average molecular weight (Mw) of 10,000 ~ 500,000 g/mol.
[Claim 4]
The soluble alicyclic polyimide resin for low temperature
process of claim 1, wherein the polyimide film can be prepared at 40 ~ 130 "C
[Claim 5]
The soluble alicyclic polyimide resin for low temperature T) process of claim 1, wherein said soluble alicyclic polyimide resin for low temperature process is soluble in an organic solvent selected from dimethylacetamide (DMAc) , dimethylformamide (DMF) , AT-methyl-2-pyrrolidone (NMP) and gamma- butyrolactone or their mixture. 10
[Claim 6]
Photo-alignment layers produced by coating the soluble alicyclic polyimide resin for low temperature process of any one selected of claims 1 to 5.
[Claim 7]
IT) The photo-alignment layers of claim 6, wherein said photo-alignment layers are produced by an irradiation of the polarized UV light of 220 ~ 460 nm. [Claim 8]
The photo-alignment layers of claim 7, wherein said 0 photo-alignment layers are produced by an irradiation of the polarized UV light of 100 ~ 2,000 mJ/cm2. [Claim 9]
The photo-alignment layers of claim 6, wherein said photo-alignment layers have a pencil hardness of 4 ~ 6H. o
[ Claim l θ ]
The liquid crystal cell comprising the photo-alignment layers of claim 6.
[Claim ll] The liquid crystal cell of claim 10, wherein said liquid crystal cell has a pretilt angle of 0.01 ~ 1°. [Claim 12]
The liquid crystal cell of claim 10, wherein said liquid crystal cell has VHR (voltage holding ratio) of 98 ~ 99.5% at the voltage of 3V at 25 °C .
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KR1020070057623A KR100902159B1 (en) | 2007-06-13 | 2007-06-13 | Aliphatic Ring Soluble Polyimide Photoalignment Film Having Substituent for Low Temperature Process and Liquid Crystal Cell Using the Same |
KR10-2007-0057623 | 2007-06-13 |
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