WO2008028355A1 - Method for making surface antibacterial products utilizing physical vapor deposition technology - Google Patents
Method for making surface antibacterial products utilizing physical vapor deposition technology Download PDFInfo
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- WO2008028355A1 WO2008028355A1 PCT/CN2006/003275 CN2006003275W WO2008028355A1 WO 2008028355 A1 WO2008028355 A1 WO 2008028355A1 CN 2006003275 W CN2006003275 W CN 2006003275W WO 2008028355 A1 WO2008028355 A1 WO 2008028355A1
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- antibacterial
- vapor deposition
- physical vapor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Definitions
- the present invention relates to a method for preparing a surface antibacterial article, and more particularly to a method for producing a surface antibacterial article by physical vapor deposition.
- antibacterial ability of antibacterial products is mainly reflected on the surface of antibacterial products.
- Conventional antibacterial products are made by directly incorporating antibacterial materials into substrates such as metal materials, polymer materials, and glazes. 'This method causes a large amount of waste material to be wasted, and the manufacturing process is complicated and the processing cost is too high.
- some new technologies for manufacturing surface antibacterial products by physical vapor deposition technology have appeared, such as Chinese patent application "A surface antibacterial, wear-resistant stainless steel product and its preparation method" (application number: 200410027063. 2), The technology provides a method for preparing wear-resistant and antibacterial stainless steel products by magnetron sputtering.
- the method is purely used for the production of stainless steel products, and the use range is too small, and is not practical in many fields.
- Wear-resistant technology such as disposable antibacterial catheter, medical wound suture surface, and ventilator tube inner wall; 2 the antibacterial material used is only silver and copper, which cannot meet the requirements in special technical fields, such as photocatalysis.
- the existing photocatalytic material Ti0 2 can only have an antibacterial effect under ultraviolet light of 387. 5 nm or less, and it is not antibacterial at 387. 5 nm or more; 3
- This coating method has directionality and is not applicable. Plated parts on complex surfaces, such as the inner wall of a ventilator pipe.
- a reaction gas such as oxygen, nitrogen, acetylene gas or hydrogen sulfide is added to cause the target material to become an oxide, a carbide, a nitride, a sulfide or the like.
- Ion plating refers to the application of a bias current to the forged workpiece, so that the deposited material has directionality and high-speed kinetic energy, so that the plating material and the substrate are more closely combined.
- the material utilization rate of the sputtering plane target is only 20%, and the material utilization rate of the sputtering cylinder target is 80%.
- the precious metal materials such as silver are mostly used for the cylindrical target, which will be made.
- the silver tube is placed over the copper target. During the use, the silver sleeve will undergo lateral expansion and longitudinal shrinkage, that is, the silver tube becomes thicker and shorter, which separates the silver tube from the copper core and affects the sputtering effect.
- the reaction is not comprehensive, that is, the pure black product is not plated. This is because the multi-arc plating uses the arc method to evaporate the target and generate a large amount of ion gas flow. A large amount of ionic gas stream repels the reaction gas to the surface of the workpiece to be plated.
- Target poisoning is prone to occur during magnetron sputtering black plating. This is because the molten carbon gas is filled into the furnace cavity for the plating of pure black products, which causes the concentration of argon ions to decrease, which affects the sputtering effect.
- the object of the present invention is to overcome the above-mentioned drawbacks of the prior art, and to provide a method for manufacturing a surface antibacterial product by physical vapor deposition technology with low cost, wider use range and simple and convenient fabrication, and the method of the invention has 1 antibacterial method.
- the material is plated onto the surface of the complex surface to be plated; 2 to enhance the antibacterial effect of the photocatalytic antibacterial material; 3 to provide more antibacterial materials; 4 to solve the separation of the casing and the core of the cylindrical target; 5 with pure multi-arc plating Black film process; 6 magnetron sputtering is used to plate pure black film, and it also prevents target poisoning.
- a method for manufacturing a surface antibacterial article by using a physical vapor deposition technique comprising: using a physical vapor deposition technique to plate an antibacterial target or an evaporant onto a surface of a substrate to form a film layer, wherein: the antibacterial material is Ti, Zn, Among Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, nitrides, carbides
- One or more of the reaction gases charged in the physical vapor deposition technique are 0 2 , N 2 , M 3 , CH 4 , ( 2 or 3.;
- the physical vapor deposition technique is evaporative plating, magnetron sputtering, multi-arc plating or plasma plating; the plasma plating is immersion plasma plating, magnetron sputtering, ion plating, radio frequency plasma plating, microwave plasma plating, and heat.
- the ionized cluster deposition plasma plating apparatus is a heating source, an ionization device, an accelerating electrode and a substrate from bottom to top, and is installed inside the heating source, and is 3 to 5;
- the ionization device is a microwave ionization device
- the ratio of the antibacterial material in the film layer is 0.01% ⁇ 100%;
- the cylindrical target is composed of an inner core made of a copper tube and a jacket made of an antibacterial material, and the antibacterial material is made into a metal strip and wound around the inner core;
- the cylindrical target is composed of an inner core made of a copper tube and a jacket made of an antibacterial material, and the inner core and the outer sleeve are screwed;
- the substrate is a dry solid material, which may be a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material;
- the surface antibacterial product is a stainless steel cutter, and the manufacturing process is that the silver or copper-containing stainless steel plate is first welded or pasted on the blade edge of the cutter main body, and then the blade edge is ground, and then the physical vapor deposition coating is applied to the wear-resistant antibacterial surface layer. .
- the antimicrobial material can be plated onto the surface of a complex article, such as the inner wall of a ventilator tube.
- the present invention employs immersion plasma plating.
- a magnetron sputtering glow discharge plasma a pulse voltage is applied to a plated member at a voltage of several tens of kilovolts, and the plated member is immersed in the plasma, and ions in the plasma are applied to the surfaces of the workpiece. It can be plated in hooks and holes.
- magnetron sputtering plasma there is RF plasma, Microwave plasma, hot wire cathode assisted plasma, can be used for antibacterial coating.
- Photocatalytic antibacterial materials include: Ti0 2 , ZnO, CaO, Si0 2 , MgO, Zr0 2 , CdS , Se0 2 , SiC; These materials have low photocatalytic activity and show no antibacterial effect under natural light. When rare earth lanthanum, cerium or antibacterial materials such as Cu, Ag, Pb, etc. are added during the coating process, they have strong antibacterial effect under natural light.
- the material is one or more of elemental materials or compounds, and is added to rare earth lanthanum, cerium or Cu, Ag, One or more materials in Pb are mixed and plated, and the corresponding gas 02 is charged to deposit a specific photocatalytic composite antibacterial material.
- the invention prepares surface antibacterial products by physical vapor deposition technology, the process is simple and convenient to manufacture, high in efficiency, low in cost, and the invention arranges and combines antibacterial materials having different characteristics according to requirements. Therefore, surface antibacterial products suitable for different technical fields are obtained, such as surface antibacterial products such as human implant materials and utensils prepared by using Ag, Cu, Zn, Ce, Ca which are safe and non-toxic to human body; safe Co, Ni, Al , Fe, S to prepare surface antibacterial products such as human contact materials; use antibacterial materials As, Sb, Se, Hg with strong bactericidal ability, but toxic to human body to prepare other surface antibacterial products; strong antibacterial such as Ag and antifungal
- Cu mixed plating is used to prepare a broad-spectrum antibacterial product
- Zn, Ce and Cr are added to the silver plating material to solve the defect that silver is easily oxidized and blackened, and a surface antibacterial product with beautiful appearance and stable properties is obtained.
- the charged reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 , H 2 S, and the above-mentioned antibacterial material and reaction gas can be combined with each other as needed, and the antibacterial materials can also be combined with each other, such as A g S AgCeNi can also be combined with other metal non-metals such as AgW, CrAgN CuZnO, etc., and can be combined into thousands of new combined antibacterial materials. 01% ⁇ 100 ⁇ The proportion of the inorganic material in the coating layer is 0. 01% ⁇ 100%.
- the antibacterial target material of the invention is a cylindrical target, and the cylindrical target is an inner core made of a copper tube and a jacket made of an antibacterial material.
- the antibacterial material may be attached to the inner core by a metal strip or may be connected to the inner core by a screw connection. 5.
- the process of using a multi-arc plating pure black film is realized.
- the invention is applied to a small air hole around a multi-arc target, and directly passes CH 4 and C 2 H 6 gas into the hole to form high carbon in the plating area. It can be plated with pure black film.
- the present invention adopts a distribution line on the surface of the workpiece (substrate) to be plated, and gas CH 4 and C 2 are introduced therein.
- the surface of the workpiece to be plated forms a high carbonized zone, which can effectively prevent target poisoning and can be plated with pure black film.
- the invention also provides a combined ionizing cluster deposition technique.
- Ionized cluster deposition is the deposition of thin films using ionized radicals with a certain energy.
- the ionized atomic group may comprise hundreds or even thousands of atoms, which are deposited on the workpiece to be plated under the acceleration of the electric field. At the moment of contact with the working piece, the atomic group is broken, the atoms are dispersed and deposited on the lining. Bottom surface. This has a variety of materials deposited, the coating has good adhesion, low temperature and controllability.
- the technology of the present invention requires a plurality of evaporation enthalpy to meet the needs due to the need for composite material coating. Generally, the resistance heating method is used.
- the present invention designs a carbon-embedded crucible, and a set of emblem-wave heating method.
- the method has a great advantage.
- the microwave can give the ionized group a charge, accelerate the ionization effect, and accelerate the sputtering rate of the ionized atomic group.
- the coating quality is better.
- Figure 1 is a schematic diagram of a gas pipeline for distributing an arc source target, wherein 5 is an ion arc region;
- Figure 2 is a cutaway view of the arc source target
- FIG. 3 is a schematic structural view of a casing cylindrical target made by a metal strip winding method
- Figure 4 is a schematic view showing the structure of a casing cylindrical target made by screwing
- Figure 5 is a schematic view showing the principle of surface coating by immersion plasma plating
- FIG. 6 is a schematic view showing the principle of surface coating by ionizing cluster deposition plasma plating
- Figure 7 is a schematic diagram showing the structure of an antibacterial stainless steel table knife
- Figure 8 is a view of the A - ⁇ ⁇ of Figure 7.
- the surface of the object is coated with an antibacterial layer by evaporation coating technology.
- the coating technology is carried out in an existing activation reaction evaporation deposition apparatus: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material.
- a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material.
- the evaporation material is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of a nitride or a carbide, the amount of which is 0.01% to 100% by weight of the entire film layer, and the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 i H 2 S.
- the anti-bacterial layer is coated on the surface of the object by multi-arc plating technology.
- the coating technology is carried out in an existing multi-arc ion coating machine: wherein the substrate is selected from dry solid materials such as metal materials, non-metal materials, fiber products, polymer materials, dried plant materials or leather materials, and antibacterial materials.
- the target is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of nitrides and carbides, in an amount of 0.01% - 100% by weight of the entire film layer, as shown in Fig. 1.
- a magnetron sputtering antibacterial target is also disposed in the multi-arc coating furnace, and the antibacterial target 3 is a cylindrical target.
- the cylindrical target is made of a copper tube inner core 3-1 and made of an antibacterial material.
- the formed jacket is composed of 3 - 2, and the above-mentioned antibacterial material is formed into a metal strip and wound around the inner core; the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 or H 2 S.
- the coating technology is carried out in an existing magnetron sputtering ion plating machine: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material.
- the antibacterial target is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, and vulcanization.
- the antibacterial target 3 is a cylindrical target
- the cylindrical target shown in FIG. 4 is a cylindrical target composed of an inner core 3-1 made of a copper tube and a jacket 3 - 2 made of an antibacterial material, and the inner core and the outer sleeve are threaded. connection.
- the reaction gas is 0 2 , N 2 , 3 , CH 4 , C 2 H 6 or H 2 S.
- the preparation of surface antibacterial products is carried out by magnetron sputtering coating technology.
- the coating technology is carried out in a ionization beam deposition plasma plating apparatus: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material.
- a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material.
- the target is selected from Ti, Zn, Ca, Si, Mg Zr, Cd, As, Sb, Se, Ce, Re, 'Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of nitrides and carbides, used in an amount of 0.01% to 100% by weight of the entire film layer, and the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 or H 2 S.
- FIG. 6 shows the heating source 10, the ionization device 11, the accelerating electrode 12 and the substrate 13 in order from bottom to top, and the crucible 9 is mounted on the heating.
- the main difference is that there are a plurality of ⁇ 9, generally 3 to 5, which can hold a variety of targets.
- the coating technology is carried out in a dip plasma plating apparatus, as shown in Figure 5: wherein the substrate is selected Dry solid materials, such as metal materials, non-metallic materials, fiber products, polymer materials, dry plant materials or leather materials, antibacterial.
- Targets use Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb , Se, Ce, Re, Cu, Ag, Pb, Hg, Co, M, Al, Fe and one or more of its oxides, sulfides, nitrides, carbides, the amount of which is the entire film weight From 0.01% to 100%, it is necessary to provide a ventilation tube on the surface of the substrate.
- the reaction gas is 0 2 , N 2 , NH 3 , C , ( 2 11 6 or 3.
- the knife In the process of cutting, peeling and cutting, the knife is easy to passivate and the sharpness will decrease. It is necessary to grind the blade. In the process of grinding the blade, the antibacterial surface of the blade will be worn away, and the surface layer will be worn away. No antibacterial effect is achieved.
- Figure 8 that is, before the coating, the stainless steel knife needs to be pre-treated, specifically to first weld or paste the silver or copper-containing stainless steel plate 15 in the tool body.
- the steel plate 14 is cut at the cutting edge, and then the blade is ground, and then the physical vapor deposition is applied to the wear-resistant antibacterial surface layer.
- the specific coating technique can adopt any one of the above embodiments 1 to 4.
- the antibacterial stainless steel knife prepared by the above method has the following advantages: 1. The blade is still antibacterial after being ground. 2. Save on the use of silver-containing stainless steel.
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Abstract
Disclosed is a method for making surface antibacterial products utilizing physical vapor deposition technology, the method involves using physical vapor deposition technology to coat antibacterial target materials or vaporization materials onto a substrate surface to form an antibacterial film layer, wherein the antibacterial target materials or vaporization materials are one or more selected form the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe, and oxides, sulfides, nitrides, and carbides thereof, a reaction gas usedd in the physical vapor deposition technology is O2, N2, NH3, CH4, C2H6 or H2S. Holes (1) are drilled on the target (3) surface to feed a gas through gas passages (2), thereby preventing the target from poisoning efficiently to realize multi-arc coating and magnetron sputtering and improving coating efficiency and film layer quality.
Description
利用物理气相沉积技术制造表面抗菌制品的方法 技术领域 Method for manufacturing surface antibacterial products by physical vapor deposition technology
本发明涉及一种表面抗菌制品的制备方法,特别是涉及一种利用物理气相沉 积技术制造表面抗菌制品的方法。 The present invention relates to a method for preparing a surface antibacterial article, and more particularly to a method for producing a surface antibacterial article by physical vapor deposition.
背景技术 Background technique
抗菌制品的抗菌能力主要体现在抗菌制品的表面。 传统的抗菌制品采用在 金属材料、 高分子材料、 釉瓷等基材中直接掺入抗菌材料制成, '这种方法造成 大量抗菌材料的浪费, 且制造工艺复杂, 加工成本过高。 现有技术中出现了一 些釆用物理气相沉积技术制造表面抗菌制品的新技术,'如中国专利申请《一种 表面抗菌、 耐磨不锈钢制品及其制备方法》 (申请号: 200410027063. 2 ) , 该 技术提供了一种采用磁控溅射法制备耐磨、 抗菌不锈钢制品的方法, 此方法单 纯用于不锈钢制品的生产, 存在使用范围过小, 在许多领域不实用, ①有些技 术领域不需要耐磨技术, 如一次性抗菌导尿管、 医用伤口缝合线表面、 及呼吸 机管道内壁等; ②使用的抗菌材料仅有银和铜, 在特殊技术领域达不到要求, 如光催化领域就无法实现, 现有的光催化材料 Ti02仅能在 387. 5纳米以下的紫 外光照射下有抗菌作用, 在 387. 5纳米以上就不抗菌了; ③这种镀膜方法具有 方向性, 不适用于复杂表面的镀件, 如呼吸机管道内壁等。 The antibacterial ability of antibacterial products is mainly reflected on the surface of antibacterial products. Conventional antibacterial products are made by directly incorporating antibacterial materials into substrates such as metal materials, polymer materials, and glazes. 'This method causes a large amount of waste material to be wasted, and the manufacturing process is complicated and the processing cost is too high. In the prior art, some new technologies for manufacturing surface antibacterial products by physical vapor deposition technology have appeared, such as Chinese patent application "A surface antibacterial, wear-resistant stainless steel product and its preparation method" (application number: 200410027063. 2), The technology provides a method for preparing wear-resistant and antibacterial stainless steel products by magnetron sputtering. The method is purely used for the production of stainless steel products, and the use range is too small, and is not practical in many fields. Wear-resistant technology, such as disposable antibacterial catheter, medical wound suture surface, and ventilator tube inner wall; 2 the antibacterial material used is only silver and copper, which cannot meet the requirements in special technical fields, such as photocatalysis. Unachievable, the existing photocatalytic material Ti0 2 can only have an antibacterial effect under ultraviolet light of 387. 5 nm or less, and it is not antibacterial at 387. 5 nm or more; 3 This coating method has directionality and is not applicable. Plated parts on complex surfaces, such as the inner wall of a ventilator pipe.
物理气相沉积技术分四种: 真空蒸发镀、磁控溅射鍍、 多弧镀和等离子镀, 其中釆用上述等离子镀、 磁控溅射鍍和多弧镀三种方法镀膜时, 均需在镀膜腔 内加入氩气, 氩气在磁场和高压电流的作用下变成带电的氩离子, 氩离子高速 打击靶材, 从而将靶材击向被镀工件., 同时在反应镀膜时, 还须加入氧气、 氮 气、 乙炔气、 硫化氢等反应气体, 使靶材物质变成氧化物、 碳化物、 氮化物、 硫化物等。 而离子镀是指在被锻工件上加上偏压电流, 便沉积物质具有方向性 和高速动能,使镀材和基材更紧密结合。主要有多弧离子镀,离子束辅助沉积镀,
离化团束的沉积镀及等离子镀等。 There are four kinds of physical vapor deposition technologies: vacuum evaporation plating, magnetron sputtering, multi-arc plating and plasma plating. Among them, the above methods are applied by plasma plating, magnetron sputtering and multi-arc plating. Argon gas is added into the coating chamber, and argon gas becomes charged argon ions under the action of magnetic field and high-voltage current. The argon ions strike the target at high speed, thereby hitting the target against the workpiece to be plated. At the same time, in the reaction coating, A reaction gas such as oxygen, nitrogen, acetylene gas or hydrogen sulfide is added to cause the target material to become an oxide, a carbide, a nitride, a sulfide or the like. Ion plating refers to the application of a bias current to the forged workpiece, so that the deposited material has directionality and high-speed kinetic energy, so that the plating material and the substrate are more closely combined. There are mainly multi-arc ion plating, ion beam assisted deposition plating, Sediment plating and plasma plating of ionized clusters.
但是, 在实际工作中上述镀膜技术均存在不同的技术缺陷, 如: However, in the actual work, the above coating technologies have different technical defects, such as:
1.在实际工作中发现, 溅射平面靶的物质利用率仅为 20%, 而溅射园柱靶 的物质利用率为 80%, 象银等贵重金属材料多选用园柱靶, 将制成的银管套在 铜制的靶芯上。 在使用过程中银套管受热后会出现横向膨胀, 纵向收缩, 即银 管变粗变短, 使银管与铜芯分离, 影响溅射效果。 1. In actual work, it is found that the material utilization rate of the sputtering plane target is only 20%, and the material utilization rate of the sputtering cylinder target is 80%. The precious metal materials such as silver are mostly used for the cylindrical target, which will be made. The silver tube is placed over the copper target. During the use, the silver sleeve will undergo lateral expansion and longitudinal shrinkage, that is, the silver tube becomes thicker and shorter, which separates the silver tube from the copper core and affects the sputtering effect.
2.在多弧镀膜过程中, 特别是镀黑膜过程中出现反应不全面, 即镀不出纯 黑制品, 这是因为多弧镀是利用电弧方法蒸发靶材, 产生大量的离子气流, 这 种大量的离子气流排斥反应气体到达被镀工件表面。 2. In the process of multi-arc coating, especially in the process of black coating, the reaction is not comprehensive, that is, the pure black product is not plated. This is because the multi-arc plating uses the arc method to evaporate the target and generate a large amount of ion gas flow. A large amount of ionic gas stream repels the reaction gas to the surface of the workpiece to be plated.
3.在磁控溅射镀黑膜过程中易出现靶中毒现象,这是由于为镀制纯黑色制 品向炉腔内充入过量碳氢气体, 致氩离子浓度下降, 影响溅射效果。 3. Target poisoning is prone to occur during magnetron sputtering black plating. This is because the molten carbon gas is filled into the furnace cavity for the plating of pure black products, which causes the concentration of argon ions to decrease, which affects the sputtering effect.
发明内容 Summary of the invention
本发明的目的在于克服上述现有技术的缺陷, 提供一种成本低, 使用范围 更为广泛而且制作简单方便的利用物理气相沉积技术制造表面抗菌制品的方 法, 本发明的方法具有①可以将抗菌材料镀制到复杂表面被镀件上; ②加强光 催化抗菌材料的抗菌效果; ③提供出更多的抗菌材料; ④解决园柱靶的套管与 管芯相分离; ⑤用多弧镀纯黑膜工艺; ⑥磁控溅射镀纯黑膜, 又防止靶中毒等 优点。 The object of the present invention is to overcome the above-mentioned drawbacks of the prior art, and to provide a method for manufacturing a surface antibacterial product by physical vapor deposition technology with low cost, wider use range and simple and convenient fabrication, and the method of the invention has 1 antibacterial method. The material is plated onto the surface of the complex surface to be plated; 2 to enhance the antibacterial effect of the photocatalytic antibacterial material; 3 to provide more antibacterial materials; 4 to solve the separation of the casing and the core of the cylindrical target; 5 with pure multi-arc plating Black film process; 6 magnetron sputtering is used to plate pure black film, and it also prevents target poisoning.
本发明的技术方案为: The technical solution of the present invention is:
一种利用物理气相沉积技术制造表面抗菌制品的方法, 包括利用物理气相 沉积技术将抗菌靶材或蒸发物镀到基材表面形成膜层, 其特征是: 所述的抗菌 材料为 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce、 Re、 Cu、 Ag、 Pb、 Hg、 Co、 Ni、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳化物中的一种或几种, 其在 物理气相沉积技术中充入的反应气体为 02、 N2、 M3、 CH4、 (2 或 3.;
上述物理气相沉积技术为蒸发镀、 磁控溅射镀、 多弧镀或等离子镀; 所述的等离子镀为浸没式等离子体镀、磁控溅射等离子镀、射频等离子鍍、 微波等离子镀、 热丝阴极辅助等离子镀或离化团束沉积等离子镀; A method for manufacturing a surface antibacterial article by using a physical vapor deposition technique, comprising: using a physical vapor deposition technique to plate an antibacterial target or an evaporant onto a surface of a substrate to form a film layer, wherein: the antibacterial material is Ti, Zn, Among Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, nitrides, carbides One or more of the reaction gases charged in the physical vapor deposition technique are 0 2 , N 2 , M 3 , CH 4 , ( 2 or 3.; The physical vapor deposition technique is evaporative plating, magnetron sputtering, multi-arc plating or plasma plating; the plasma plating is immersion plasma plating, magnetron sputtering, ion plating, radio frequency plasma plating, microwave plasma plating, and heat. Wire cathode assisted plasma plating or ionized cluster deposition plasma plating;
所述离化团束沉积等离子镀装置由下至上依次为加热源、 离子化装置、 加 速电极及衬底, 坩埚安装在加热源内部, 且为 3 ~ 5个; The ionized cluster deposition plasma plating apparatus is a heating source, an ionization device, an accelerating electrode and a substrate from bottom to top, and is installed inside the heating source, and is 3 to 5;
所述的离子化装置为微波离化装置; The ionization device is a microwave ionization device;
在所述的多弧镀工艺中, 需要在上述抗菌靶材上钻有微小气孔, 并利用气 管向该气孔内通入反应气体; In the multi-arc plating process, it is required to drill a small pore on the antibacterial target, and use a gas pipe to introduce a reaction gas into the pore;
在所述的磁控溅射镀工艺中, 需要在基材表面设置通气线管; In the magnetron sputtering plating process, it is required to provide a ventilation line tube on the surface of the substrate;
所述的抗菌材料在膜层中所占的比例为 0. 01 % ~ 100 % ; The ratio of the antibacterial material in the film layer is 0.01% ~ 100%;
所述的圆柱靶是由铜管制成的内芯和抗菌材料制成的外套组成, 上迷抗菌 材料被制成金属带后绕贴在内芯上; The cylindrical target is composed of an inner core made of a copper tube and a jacket made of an antibacterial material, and the antibacterial material is made into a metal strip and wound around the inner core;
所述的圆柱靶是由铜管制成的内芯和抗菌材料制成的外套组成, 上述内芯 与外套采用螺紋连接; The cylindrical target is composed of an inner core made of a copper tube and a jacket made of an antibacterial material, and the inner core and the outer sleeve are screwed;
所述的基材为干燥的固体材料, 可以为金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的植物材料或皮革材料; ' The substrate is a dry solid material, which may be a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material;
所述的表面抗菌制品为不锈钢刀具, 其制作工艺为先将含银或含铜不锈钢 板焊接或粘贴在刀具主体钢板刀刃口处, 然后磨制刀锋, 再进行物理气相沉积 镀制耐磨抗菌表层。 The surface antibacterial product is a stainless steel cutter, and the manufacturing process is that the silver or copper-containing stainless steel plate is first welded or pasted on the blade edge of the cutter main body, and then the blade edge is ground, and then the physical vapor deposition coating is applied to the wear-resistant antibacterial surface layer. .
釆用本发明的技术方案可产生如下技术效果: The technical solution of the present invention can produce the following technical effects:
1.可将抗菌材料镀制到复杂制品表面, 如呼吸机管道内壁, 本发明采用浸 没式等离子体镀。 在磁控溅射辉光放电等离子体中, 给被镀件施加脉冲电压, 压高在数十千伏, 被镀件就被等离子体浸没, 等离子体中的离子将被到工件的 各表面, 在钩、 孔中都能被镀到。 除磁控溅射等离子体外还有射频等离子体、
微波等离子体, 热丝阴极辅助等离子体, 均可用于抗菌镀膜。 1. The antimicrobial material can be plated onto the surface of a complex article, such as the inner wall of a ventilator tube. The present invention employs immersion plasma plating. In a magnetron sputtering glow discharge plasma, a pulse voltage is applied to a plated member at a voltage of several tens of kilovolts, and the plated member is immersed in the plasma, and ions in the plasma are applied to the surfaces of the workpiece. It can be plated in hooks and holes. In addition to magnetron sputtering plasma, there is RF plasma, Microwave plasma, hot wire cathode assisted plasma, can be used for antibacterial coating.
2.利用抗菌材料的组合加强光催化抗菌材料的抗菌效果: 具有光催化抗菌 材料有: Ti02、 ZnO、 CaO、 Si02、 MgO、 Zr02、 CdS 、 Se02 、 SiC;。 这些材料光 催化作用较低,在自然光照下显示不出抗菌效果, 当在镀膜过程中加入稀土铈、 铼或抗菌材料 Cu、 Ag、 Pb等, 在自然光下就有很强的抗菌作用。 在物理气相沉 积过程中, 将 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Ca、 Se、 Si , 材料为单质材料或化合 物中的一种或多种,加入稀土铈、铼或 Cu、 Ag、 Pb中的一种或多种材料混合镀, 并充入相应的气体 02就可以镀出具体光催化作用的复合抗菌材料。 2. Enhance the antibacterial effect of photocatalytic antibacterial materials by using a combination of antibacterial materials: Photocatalytic antibacterial materials include: Ti0 2 , ZnO, CaO, Si0 2 , MgO, Zr0 2 , CdS , Se0 2 , SiC; These materials have low photocatalytic activity and show no antibacterial effect under natural light. When rare earth lanthanum, cerium or antibacterial materials such as Cu, Ag, Pb, etc. are added during the coating process, they have strong antibacterial effect under natural light. In the physical vapor deposition process, Ti, Zn, Ca, Si, Mg, Zr, Ca, Se, Si, the material is one or more of elemental materials or compounds, and is added to rare earth lanthanum, cerium or Cu, Ag, One or more materials in Pb are mixed and plated, and the corresponding gas 02 is charged to deposit a specific photocatalytic composite antibacterial material.
3.提供出更多的抗菌材料: 本发明釆用物理气相沉积技术制备表面抗菌制 品, 其工艺制作简单方便, 效率高, 成本低, 且本发明根据需要将具有不同特 性的抗菌材料排列组合, 从而获得适用于不同技术领域的表面抗菌制品, 如采 用对人体安全无毒的 Ag、 Cu、 Zn、 Ce、 Ca制备人体植入材料和食具等表面抗菌 制品; 釆用安全的 Co、 Ni、 Al、 Fe、 S制备人体接触材料等表面抗菌制品; 采 用具有强杀菌能力, 但对人体有毒的抗菌材料 As、 Sb、 Se、 Hg制备其它表面抗 菌制品;采用抗细菌强的如 Ag与抗霉菌强的如 Cu混合镀制备广谱性抗菌制品; 在银镀膜材料中加入 Zn、 Ce、 Cr解决银易氧化发黑的缺陷, 获得外观漂亮, 性 质稳定的表面抗菌制品。 充入的反应气体有 02、 N2、 NH3、 CH4、 C2H6、 H2S, 上述 抗菌材料与反应气体可以根据需要相互组合, 抗菌材料也可以相互组合, 如 AgS、 AgCeNi也可以与其它金属非金属相互组合如 AgW、 CrAgN CuZnO等可相 互组合成数千种新组合抗菌材料。 所述的单质的抗菌材料在被镀膜层中所占的 比例为 0. 01% ~ 100%。 3. Providing more antibacterial materials: The invention prepares surface antibacterial products by physical vapor deposition technology, the process is simple and convenient to manufacture, high in efficiency, low in cost, and the invention arranges and combines antibacterial materials having different characteristics according to requirements. Therefore, surface antibacterial products suitable for different technical fields are obtained, such as surface antibacterial products such as human implant materials and utensils prepared by using Ag, Cu, Zn, Ce, Ca which are safe and non-toxic to human body; safe Co, Ni, Al , Fe, S to prepare surface antibacterial products such as human contact materials; use antibacterial materials As, Sb, Se, Hg with strong bactericidal ability, but toxic to human body to prepare other surface antibacterial products; strong antibacterial such as Ag and antifungal For example, Cu mixed plating is used to prepare a broad-spectrum antibacterial product; Zn, Ce and Cr are added to the silver plating material to solve the defect that silver is easily oxidized and blackened, and a surface antibacterial product with beautiful appearance and stable properties is obtained. The charged reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 , H 2 S, and the above-mentioned antibacterial material and reaction gas can be combined with each other as needed, and the antibacterial materials can also be combined with each other, such as A g S AgCeNi can also be combined with other metal non-metals such as AgW, CrAgN CuZnO, etc., and can be combined into thousands of new combined antibacterial materials. 01%〜100百分比。 The proportion of the inorganic material in the coating layer is 0. 01% ~ 100%.
4. 解决了园柱靶的套管与管芯相分离缺陷, 本发明釆用上述抗菌靶材料为 圆柱靶, 所述的圆柱靶是由铜管制成的内芯和抗菌材料制成的外套组成, 上述 抗菌材料可以釆用金属带绕贴在内芯上,也可以釆用螺紋连接方式与内芯连接。
5. 实现了用多弧镀镀纯黑膜工艺, 本发明釆用在多弧靶周边打上微小气 孔, 直接向孔内通入 CH4、 C2H6气体, 在镀区形成高碳, 就可以镀制纯黑膜质。 4. The casing and the die phase separation defect of the cylindrical target are solved. The antibacterial target material of the invention is a cylindrical target, and the cylindrical target is an inner core made of a copper tube and a jacket made of an antibacterial material. The antibacterial material may be attached to the inner core by a metal strip or may be connected to the inner core by a screw connection. 5. The process of using a multi-arc plating pure black film is realized. The invention is applied to a small air hole around a multi-arc target, and directly passes CH 4 and C 2 H 6 gas into the hole to form high carbon in the plating area. It can be plated with pure black film.
6. 实现了磁控溅射镀既能镀纯黑膜, 又可防止靶中毒的弊端, 本发明采用 在被镀工件(基材)表面分布通气线管, 通入气体 CH4、 C2 在被镀工件表面形 成高碳化区, 可有效地防止靶中毒, 可以鍍制纯黑膜质。 6. Realizing the disadvantages of magnetron sputtering plating which can both plate pure black film and prevent target poisoning. The present invention adopts a distribution line on the surface of the workpiece (substrate) to be plated, and gas CH 4 and C 2 are introduced therein. The surface of the workpiece to be plated forms a high carbonized zone, which can effectively prevent target poisoning and can be plated with pure black film.
7.本发明还提供一种组合离化团束沉积技术。 离化团束沉积是利用具 有一定能量的离化原子团实现薄膜的沉积。这种离化后的原子团可以包括几 百甚至几千个原子, 它在电场的加速下沉积在被镀工件上,在与工作件接触 的瞬间, 原子团发生破裂, 原子分散开来并沉积在衬底表面。 这具有沉积各 种材料,镀膜附着力好,温度低,可控制。本发明技术由于需复合材料镀膜, 各种物质的气化温度点不同需要有多个蒸发坩埚才能满足需要。一般釆用电 阻加热法。 为了控制方便, 本发明设计一种碳包埋坩, 一组徽波加热法, 本 方法有一大好处, 微波可以给予离化团带电荷, 加速离化效果,使离化原子 团溅射速度加快, 镀膜质量更好。 7. The invention also provides a combined ionizing cluster deposition technique. Ionized cluster deposition is the deposition of thin films using ionized radicals with a certain energy. The ionized atomic group may comprise hundreds or even thousands of atoms, which are deposited on the workpiece to be plated under the acceleration of the electric field. At the moment of contact with the working piece, the atomic group is broken, the atoms are dispersed and deposited on the lining. Bottom surface. This has a variety of materials deposited, the coating has good adhesion, low temperature and controllability. The technology of the present invention requires a plurality of evaporation enthalpy to meet the needs due to the need for composite material coating. Generally, the resistance heating method is used. For convenience of control, the present invention designs a carbon-embedded crucible, and a set of emblem-wave heating method. The method has a great advantage. The microwave can give the ionized group a charge, accelerate the ionization effect, and accelerate the sputtering rate of the ionized atomic group. The coating quality is better.
附图说明 DRAWINGS
图 1为弧源靶分布气体管道示意图, 其中 5为离子弧区; Figure 1 is a schematic diagram of a gas pipeline for distributing an arc source target, wherein 5 is an ion arc region;
图 2为弧源靶切面图; Figure 2 is a cutaway view of the arc source target;
图 3为采用金属带绕贴法制作的套管圆柱靶的结构示意图; 3 is a schematic structural view of a casing cylindrical target made by a metal strip winding method;
图 4为釆用螺紋连接制作的套管圆柱靶的结构示意图; Figure 4 is a schematic view showing the structure of a casing cylindrical target made by screwing;
图 5为釆用浸没式等离子体镀进行表面镀膜的原理示意图; Figure 5 is a schematic view showing the principle of surface coating by immersion plasma plating;
图 6为采用离化团束沉积等离子镀进行表面镀膜的原理示意图; 6 is a schematic view showing the principle of surface coating by ionizing cluster deposition plasma plating;
图 7为抗菌不锈钢餐刀的结构示意简图; Figure 7 is a schematic diagram showing the structure of an antibacterial stainless steel table knife;
图 8为图 7的 A - Α ή视图。 Figure 8 is a view of the A - ή 图 of Figure 7.
1.通气孔 2.通气管 3.靶材或蒸发物 4.被镀基材 · 5.等离子体炉 6.
热丝阴极 7.气体输入管 8.高压脉冲 9.坩埚 10.热源 11.离化源 12. 加速电极 13.衬底 14.刀体 15.含银不锈钢刃口刀体 16.抗菌镀膜层 1. Vent hole 2. Snorkel 3. Target or evaporant 4. Plated substrate · 5. Plasma furnace 6. Hot wire cathode 7. Gas input pipe 8. High pressure pulse 9. 坩埚 10. Heat source 11. Ionization source 12. Acceleration electrode 13. Substrate 14. Blade 15. Silver-containing stainless steel blade body 16. Antibacterial coating layer
具体实施方式 detailed description
实施例 1 Example 1
采用蒸发镀膜技术进行物体表面镀抗菌层。 The surface of the object is coated with an antibacterial layer by evaporation coating technology.
该镀膜技术是在现有的活化反应蒸发沉积装置中进行的: 其中基材选用干 燥的固体材料, 如金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的植 物材料或皮革材料, 抗菌蒸发材料选用 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce, Re、 Cu、 Ag、 Pb、 Hg、 Co、 Ni、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳化物中的一种或几种, 其用量为整个膜层重量的 0. 01 % ~ 100 %, 反应气体 为 02、 N2、 NH3、 CH4、 C2H6 i H2S。 The coating technology is carried out in an existing activation reaction evaporation deposition apparatus: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material. The evaporation material is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of a nitride or a carbide, the amount of which is 0.01% to 100% by weight of the entire film layer, and the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 i H 2 S.
实施例 2 Example 2
采用多弧镀技术进行物体表面镀抗菌层。 The anti-bacterial layer is coated on the surface of the object by multi-arc plating technology.
该镀膜技术是在现有的多弧离子镀膜机中进行的: 其中基材选用干燥的固 体材料, 如金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的植物材料 或皮革材料, 抗菌靶材选用 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce、 Re、 Cu、 Ag、 Pb、 Hg、 Co、 Ni、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳化物 中的一种或几种, 其用量为整个膜层重量的 0. 01 % - 100 % , 在图 1.图 2中所 示, 此时需要在抗菌靶材 3上钻有微小气孔 1 , 并利用气管 2向该气孔 1内通 入反应气体。 在多弧镀膜炉中还设置有磁控溅射抗菌靶材, 且抗菌靶材 3为圆 柱靶,图 3所示, 该圆柱靶是由铜管制成的内芯 3 - 1和抗菌材料制成的外套 3 - 2组成,上述抗菌材料被制成金属带后绕贴在内芯上;反应气体为 02、 N2、 NH3、 CH4、 C2H6或 H2S。
釆用磁控溅射镀膜技术进行表面抗菌制品的制备。 The coating technology is carried out in an existing multi-arc ion coating machine: wherein the substrate is selected from dry solid materials such as metal materials, non-metal materials, fiber products, polymer materials, dried plant materials or leather materials, and antibacterial materials. The target is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of nitrides and carbides, in an amount of 0.01% - 100% by weight of the entire film layer, as shown in Fig. 1. Fig. 2, at which time it is required to be drilled on the antimicrobial target 3 The small pores 1 are opened, and the reaction gas is introduced into the pores 1 by the gas pipe 2. A magnetron sputtering antibacterial target is also disposed in the multi-arc coating furnace, and the antibacterial target 3 is a cylindrical target. As shown in FIG. 3, the cylindrical target is made of a copper tube inner core 3-1 and made of an antibacterial material. The formed jacket is composed of 3 - 2, and the above-mentioned antibacterial material is formed into a metal strip and wound around the inner core; the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 or H 2 S. 磁Preparation of surface antibacterial products by magnetron sputtering coating technology.
该镀膜技术是在现有的磁控溅射离子镀膜机中进行的: 其中基材选用干燥 的固体材料, 如金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的植物 材料或皮革材料, 抗菌靶材选用 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce、 Re、 Cu、 Ag、 Pb、 Hg、 Co、 Ni、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳 化物中的一种或几种, 其用量为整个膜层重量的 0. 01 % ~ 100 % , 此时需要需 要在基材表面设置通气线管。 且抗菌靶材 3为圆柱靶, 图 4所示该圆柱靶是圆 柱靶是由铜管制成的内芯 3 - 1和抗菌材料制成的外套 3 - 2组成, 上述内芯与 外套采用螺紋连接。 反应气体为 02、 N2、 冊3、 CH4、 C2H6或 H2S。 The coating technology is carried out in an existing magnetron sputtering ion plating machine: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material. The antibacterial target is selected from the group consisting of Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, and vulcanization. One or more of the substance, the nitride, and the carbide are used in an amount of 0.01% to 100% by weight of the entire film layer, and it is necessary to provide a ventilating tube on the surface of the substrate. And the antibacterial target 3 is a cylindrical target, and the cylindrical target shown in FIG. 4 is a cylindrical target composed of an inner core 3-1 made of a copper tube and a jacket 3 - 2 made of an antibacterial material, and the inner core and the outer sleeve are threaded. connection. The reaction gas is 0 2 , N 2 , 3 , CH 4 , C 2 H 6 or H 2 S.
实施例 4 Example 4
采用磁控溅射镀膜技术进行表面抗菌制品的制备。 The preparation of surface antibacterial products is carried out by magnetron sputtering coating technology.
该镀膜技术是在离化团束沉积等离子镀装置中进行的: 其中基材选用干燥 的固体材料, 如金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的植物 材料或皮革材料, 抗菌靶材选用 Ti、 Zn、 Ca、 Si、 Mg Zr、 Cd、 As、 Sb、 Se、 Ce、 Re、' Cu、 Ag、 Pb、 Hg、 Co、 Ni、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳 化物中的一种或几种, 其用量为整个膜层重量的 0. 01 % ~ 100 % , 反应气体为 02、 N2、 NH3、 CH4、 C2H6或 H2S。 The coating technology is carried out in a ionization beam deposition plasma plating apparatus: wherein the substrate is selected from a dry solid material such as a metal material, a non-metal material, a fiber product, a polymer material, a dried plant material or a leather material, and an antibacterial material. The target is selected from Ti, Zn, Ca, Si, Mg Zr, Cd, As, Sb, Se, Ce, Re, 'Cu, Ag, Pb, Hg, Co, Ni, Al, Fe and their oxides, sulfides, One or more of nitrides and carbides, used in an amount of 0.01% to 100% by weight of the entire film layer, and the reaction gas is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 or H 2 S.
上述离化团束沉积等离子镀装置的基本结构同现有技术一致, 图 6所示为 由下至上依次为加热源 10、 离子化装置 11、 加速电极 12及衬底 13, 坩埚 9安 装在加热源 10内部, 主要区别在于坩埚 9为多个, 一般为 3 ~ 5个, 可以盛放 多种靶材。 The basic structure of the above-described ionized cluster deposition plasma plating apparatus is the same as that of the prior art. FIG. 6 shows the heating source 10, the ionization device 11, the accelerating electrode 12 and the substrate 13 in order from bottom to top, and the crucible 9 is mounted on the heating. Inside the source 10, the main difference is that there are a plurality of 坩埚9, generally 3 to 5, which can hold a variety of targets.
实施例 5 Example 5
釆用浸没式等离子体镀进行表面抗菌制品的制备。 浸 Preparation of surface antibacterial articles by immersion plasma plating.
该镀膜技术是在浸^式等离子体镀装置中进行的,图 5所示:其中基材选用
干燥的固体材料, 如金属材料、 非金属材料、 纤维制品、 高分子材料、 干燥的 植物材料或皮革材料, 抗菌.靶材选用 Ti、 Zn、 Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce、 Re、 Cu、 Ag、 Pb, Hg、 Co, M、 Al、 Fe及其氧化物、 硫化物、 氮化物、 碳化物中的一种或几种, 其用量为整个膜层重量的 0. 01 % - 100 % , 此时需要 需要在基材表面设置通气线管。 反应气体为 02、 N2、 NH3、 C 、 (2116或 3。 The coating technology is carried out in a dip plasma plating apparatus, as shown in Figure 5: wherein the substrate is selected Dry solid materials, such as metal materials, non-metallic materials, fiber products, polymer materials, dry plant materials or leather materials, antibacterial. Targets use Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb , Se, Ce, Re, Cu, Ag, Pb, Hg, Co, M, Al, Fe and one or more of its oxides, sulfides, nitrides, carbides, the amount of which is the entire film weight From 0.01% to 100%, it is necessary to provide a ventilation tube on the surface of the substrate. The reaction gas is 0 2 , N 2 , NH 3 , C , ( 2 11 6 or 3.
实施例 6 Example 6
抗菌不锈钢刀的制备: Preparation of antibacterial stainless steel knife:
餐刀在切、 剥、.砍过程中其锋口易钝化及锋利度会下降, 需要磨制刀锋, 在磨制刀锋过程中就会把刀锋处的抗菌表层磨掉, 磨掉表层部分就达不到抗菌 效果。 In the process of cutting, peeling and cutting, the knife is easy to passivate and the sharpness will decrease. It is necessary to grind the blade. In the process of grinding the blade, the antibacterial surface of the blade will be worn away, and the surface layer will be worn away. No antibacterial effect is achieved.
为了解决这一问题, 使用下述方案解决,图 7.图 8所示: 即在镀膜前需要 将不锈钢刀进行前处理,具体为先将含银或含铜不锈钢板 15焊接或粘貼在刀具 主体钢板 14刀刃口处,然后磨制刀锋,再进行物理气相沉积镀制耐磨抗菌表层, 具体镀膜技术可以采用上述实施例 1 ~ 4中的任何一种。 In order to solve this problem, use the following solution to solve, Figure 7. Figure 8: that is, before the coating, the stainless steel knife needs to be pre-treated, specifically to first weld or paste the silver or copper-containing stainless steel plate 15 in the tool body. The steel plate 14 is cut at the cutting edge, and then the blade is ground, and then the physical vapor deposition is applied to the wear-resistant antibacterial surface layer. The specific coating technique can adopt any one of the above embodiments 1 to 4.
通过上述方法制备的抗菌不锈钢刀具有以下优点: 1、刀刃被磨制后仍然 有抗菌性。 2、 节省含银不锈钢的使用量。
The antibacterial stainless steel knife prepared by the above method has the following advantages: 1. The blade is still antibacterial after being ground. 2. Save on the use of silver-containing stainless steel.
Claims
杈 利 要 求 书 要利要要
1. 一种利用物理气相沉积技术制造表面抗菌制品的方法,是利用物理气相 沉积技术将抗菌靶材或蒸发物质沉积到被镀基材表面形成抗菌膜层,其特征是: 所述的抗菌靶材或蒸发物质为 Ti、 Zn, Ca、 Si、 Mg、 Zr、 Cd、 As、 Sb、 Se、 Ce、 Re, Cu、 Ag、 Pb、 Hg、 Co、 κ Al、 Fe及其氧化物、 硫化物、 氮化物、 碳化物 中的一种或几种,其在物理气相沉积技术中充入的反应气体为 02、 N2、 NH3、 CH4、 C2H6或 H2S。 ' A method for fabricating a surface antibacterial article by using a physical vapor deposition technique, which comprises depositing an antibacterial target or an evaporating substance onto a surface of a substrate to be coated to form an antibacterial film layer by using a physical vapor deposition technique, wherein: the antibacterial target Or evaporating materials are Ti, Zn, Ca, Si, Mg, Zr, Cd, As, Sb, Se, Ce, Re, Cu, Ag, Pb, Hg, Co, κ Al, Fe and their oxides, sulfides One or more of a nitride, a carbide, and a reaction gas charged in the physical vapor deposition technique is 0 2 , N 2 , NH 3 , CH 4 , C 2 H 6 or H 2 S. '
2. 按照杈利要求 1 所述的利用物理气相沉积技术制造表亩抗菌制品的方 法, 其特征是: 上述物理气相沉积技术为蒸发镀、 磁控溅射镀、 多弧镀或等离 子镀。 2. A method for producing an antimicrobial substrate by physical vapor deposition according to the requirements of claim 1, wherein the physical vapor deposition technique is evaporation plating, magnetron sputtering, multi-arc plating or plasma plating.
3. 按照权利要求 2 所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征是: 所述的等离子镀为浸没式等离子体镀、 磁控溅射等离子鍍、 射 频等离子镀、微波等离子镀、热丝阴极辅助等离子镀或离化团束沉积等离子镀。 3. The method for manufacturing a surface antibacterial article by physical vapor deposition according to claim 2, wherein: the plasma plating is immersion plasma plating, magnetron sputtering, ion plating, radio frequency plasma plating, microwave plasma. Plating, hot wire cathode assisted plasma plating or ionizing cluster deposition plasma plating.
4. 按照杈利要求 3 所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征在于所述离化团束沉积等离子镀装置由下至上依次为加热源 U0 ) 、 离子化装置 ( 11 ) ,加速电极 ( 12 )及衬底 ( 13 ) , 坩埚( 9 )安装在加热源 ( 10 ) 内部, 且为 3 ~ 5个。 4. A method for producing a surface antibacterial article by physical vapor deposition technique according to claim 3, characterized in that the ionized cluster deposition plasma plating device is a heating source U0) and an ionization device in order from bottom to top (11) ), the accelerating electrode (12) and the substrate (13), and the crucible (9) are installed inside the heating source (10), and are 3 to 5.
5. 按照杈利要求 4 所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征在于所述的离子化装置(11 )为微波离子化装置。 5. A method of producing a surface antibacterial article by physical vapor deposition as described in claim 4, characterized in that said ionization device (11) is a microwave ionization device.
6.按照杈利要求 1或 2所述的利用物理气相沉积技术制造表面抗菌制品的 方法, 其特征是: 在所述的多弧镀工艺中, 薷要在上述靶材(图 3、 图 4所示) 6. A method of manufacturing a surface antibacterial article by physical vapor deposition according to claim 1 or 2, characterized in that: in said multi-arc plating process, said target is in said target (Fig. 3, Fig. 4) Shown)
( 3 )上钻有微小气孔( 1 ) , 并利用气管( 2 ) 向该气孔( 1 ) 内通入反应气体。 (3) A small air hole (1) is drilled, and a reaction gas is introduced into the air hole (1) by using the air pipe (2).
1.按照权利要求 1或 2所述的利用物理气相沉积技术制造表面抗菌制品的
方法, 其特征是: 在所述的磁控溅射镀工艺中, 需要在被镀基材表面设置通气 线管。 1. The method for manufacturing a surface antibacterial article by physical vapor deposition technique according to claim 1 or 2. The method is characterized in that: in the magnetron sputtering plating process, a ventilation line tube is disposed on a surface of the substrate to be plated.
8. 按照杈利要求 1 所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征在于所述的抗菌靶材在膜层中所占的比例为 0.01% ~100%。 8. A method of producing a surface antibacterial article by physical vapor deposition as described in claim 1, wherein the antibacterial target accounts for 0.01% to 100% of the film layer.
9. 按照权利要求 1所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征是: 上述抗菌靶材为圆柱靶或平面靶。 9. The method of manufacturing a surface antibacterial article by physical vapor deposition technique according to claim 1, wherein: said antibacterial target is a cylindrical target or a planar target.
10. 按照杈利要求 9所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征是: 所述的圆柱靶是由铜管制成的内芯 (3-1)和抗菌材料制成的 外套(3-2)组成, 上述抗菌材料被制成金属带后绕贴在内芯上。 10. A method of manufacturing a surface antibacterial article by physical vapor deposition according to claim 9, characterized in that: the cylindrical target is made of an inner core (3-1) made of a copper tube and an antibacterial material. The outer casing (3-2) is composed of the above-mentioned antibacterial material which is formed into a metal strip and wound around the inner core.
11. 按照权利要求 9所述的利用物理气相沉积技术制造表面抗菌制品的方 法, 其特征是: 所述的圆柱靶是由铜管制成的内芯 (3-1)和抗菌材料制成的 外套(3- 2)组成, 上述内芯与外套采用螺紋连接。 11. The method of manufacturing a surface antibacterial article by physical vapor deposition technique according to claim 9, wherein: said cylindrical target is made of an inner core (3-1) made of a copper tube and an antibacterial material. Composed of a jacket (3- 2), the inner core and the outer casing are screwed.
12. 按照权利要求 1所述的利用物理气相沉积技术制造表面抗菌制品的方 法, .其特征在于所述的被镀基材为金属材料、 非金属材料、 纤维制品、 高分子 材料、 干燥的植物材料或皮革材料。 12. The method of manufacturing a surface antibacterial article by physical vapor deposition according to claim 1, wherein said substrate to be plated is a metal material, a non-metal material, a fiber product, a polymer material, a dried plant. Material or leather material.
13. 按照权利要求 1 所述的利用物理气相沉积技术制造表面抗菌制品的 方法, 其特征在于所述的表面抗菌制品为不锈钢刀具, 其制作工艺为先将含 银或含铜不锈钢板(15)焊接或粘贴在刀具主体钢板(14)刀刃口处, 然后 磨制刀锋, 再进行物理气相沉积镀制耐磨抗菌表层 (16) 。
13. The method for manufacturing a surface antibacterial article by physical vapor deposition according to claim 1, wherein the surface antibacterial article is a stainless steel cutter, and the manufacturing process comprises first placing a silver-containing or copper-containing stainless steel plate (15). Solder or stick to the cutting edge of the tool body steel plate (14), then grind the blade edge, and then perform physical vapor deposition plating on the wear-resistant antibacterial surface layer (16).
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