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WO2008062662A1 - Method for producing glass substrate for information recording medium, glass substrate for information recording medium, and information recording medium - Google Patents

Method for producing glass substrate for information recording medium, glass substrate for information recording medium, and information recording medium Download PDF

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Publication number
WO2008062662A1
WO2008062662A1 PCT/JP2007/071540 JP2007071540W WO2008062662A1 WO 2008062662 A1 WO2008062662 A1 WO 2008062662A1 JP 2007071540 W JP2007071540 W JP 2007071540W WO 2008062662 A1 WO2008062662 A1 WO 2008062662A1
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WO
WIPO (PCT)
Prior art keywords
glass substrate
chemical strengthening
information recording
temperature
recording medium
Prior art date
Application number
PCT/JP2007/071540
Other languages
French (fr)
Japanese (ja)
Inventor
Yukitoshi Nakatsuji
Kenichi Sasaki
Original Assignee
Konica Minolta Opto, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto, Inc. filed Critical Konica Minolta Opto, Inc.
Publication of WO2008062662A1 publication Critical patent/WO2008062662A1/en

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73921Glass or ceramic substrates

Definitions

  • the present invention relates to a method for producing a glass substrate for an information recording medium used for an information recording medium having a recording layer utilizing properties such as magnetism, light, and magnetomagnetism, and an information recording medium produced by the production method.
  • the present invention relates to a glass substrate and an information recording medium.
  • magnetic disk As a representative one.
  • aluminum substrates have been widely used as magnetic disk substrates.
  • glass substrates that can reduce the flying height of the magnetic head have been found to have better surface smoothness and fewer surface defects than aluminum substrates.
  • the proportion used for magnetic disk substrates is increasing.
  • the impact resistance and vibration resistance of a glass substrate are improved, and the substrate is prevented from being damaged by impact or vibration.
  • the substrate is strengthened by applying a chemical strengthening treatment to the surface of the glass substrate.
  • a glass substrate is usually immersed in a heated chemical strengthening treatment solution, and alkali metal ions such as lithium ions and sodium ions, which are components of the glass substrate, are ionized from these ions.
  • alkali metal ions such as lithium ions and sodium ions, which are components of the glass substrate.
  • This is performed by an ion exchange method in which an alkali metal ion such as sodium ion or potassium ion having a large radius is substituted.
  • Patent Document 1 JP-A-7-29170
  • the temperature of the glass substrate decreases while the glass substrate is taken out of the preheating tank and transported to be immersed in the chemical strengthening treatment liquid.
  • the temperature that decreases at this time depends on many factors such as the ambient temperature at which the material is transported and the flow of air, so in the actual process, the temperature of the glass substrate at the time of immersion in the chemical strengthening solution is In general, it varied widely.
  • the chemical strengthening treatment is performed by ion exchange between the glass substrate and the chemical strengthening treatment liquid.
  • the ion exchange speed, the amount of ions exchanged, The depth of penetration into the glass substrate greatly depends on the temperature of the glass substrate and the chemical strengthening solution. For this reason, if the temperature of the glass substrate at the time of immersion in the chemical strengthening treatment liquid varies, there is a problem that the chemical strengthening treatment cannot be performed stably.
  • the present invention has been made in view of the technical problems as described above, and an object of the present invention is to provide information recording that can perform stable chemical strengthening treatment and can be manufactured at low cost.
  • the object is to provide a method for producing a glass substrate for a medium, a glass substrate for an information recording medium, and an information recording medium.
  • the present invention has the following features.
  • the method includes a step of chemically strengthening the glass substrate by immersing the glass substrate in a heated chemical strengthening treatment liquid. Prior to, the glass substrate is brought to a predetermined temperature in a preheating tank. A preheating step for heating;
  • the glass substrate is transported so that the temperature drop of the glass substrate is 10 ° C or less after the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid.
  • a process for producing a glass substrate for an information recording medium which is a process.
  • the transporting step is a step of transporting the glass substrate in an atmosphere heated to a temperature of 50 ° C or higher and lower than a heating temperature of the glass substrate in the preheating step.
  • the method for producing a glass substrate for an information recording medium as described in any one of 1 to 3 above.
  • a glass substrate for information recording medium manufactured by the method for manufacturing a glass substrate for information recording medium according to any one of 1 to 4 above.
  • the glass substrate is transported so that the temperature drop of the glass substrate after the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid is within 10 ° C. Of the temperature of the glass substrate at the time of being immersed in the chemical strengthening solution.
  • a glass substrate for an information recording medium is generally manufactured through processes such as a blank material manufacturing process, an inner and outer peripheral processing process, a polishing 1 ”-polishing process, a chemical strengthening process, and a cleaning process.
  • the blank material production process is a process for forming a blank material that is the basis of a glass substrate for an information recording medium.
  • There are a method for producing molten glass by press molding, and a method for producing by cutting sheet-like glass. are known.
  • the inner and outer peripheral machining process is a process of drilling the central hole, grinding to ensure the shape and dimensional accuracy of the inner and outer circumferences, and polishing the inner and outer circumferences.
  • the grinding / polishing step is a step of performing grinding and polishing to satisfy the flatness and surface roughness of the surface on which the recording layer is formed. Usually, it is often performed in several stages, such as rough grinding, fine grinding, primary polishing, and secondary polishing.
  • the chemical strengthening step is a step of strengthening the glass substrate by immersing the glass substrate in a heated chemical strengthening treatment solution.
  • the cleaning step is a step of removing foreign matters such as abrasives and chemical strengthening treatment liquid remaining on the surface of the glass substrate.
  • the method for producing a glass substrate for an information recording medium of the present invention is characterized by a chemical strengthening step among these steps.
  • the chemical strengthening step may be performed after the polishing polishing step is completed, or the polishing strengthening / polishing step may be performed after the chemical strengthening step is performed first.
  • the chemical strengthening process can be performed when the polishing polishing process reaches a certain stage, and then the remaining steps of the polishing
  • the method for producing a glass substrate for an information recording medium of the present invention may include various processes other than those described above. For example, it has an annealing process to alleviate internal distortion of the glass substrate, a dealkali treatment process to prevent the precipitation of alkali metal ions from the glass substrate, and various inspection / evaluation processes! Also good!
  • Chemical strengthening treatment liquids include molten salts such as potassium nitrate (KNO), sodium nitrate (NaNO), carbonated potassium (KCO), and mixtures thereof (for example, a mixture of potassium nitrate and sodium nitrate, potassium nitrate and A melt of potassium carbonate or the like) can be used. Further, another metal salt or the like may be mixed.
  • KNO potassium nitrate
  • NaNO sodium nitrate
  • KCO carbonated potassium
  • mixtures thereof for example, a mixture of potassium nitrate and sodium nitrate, potassium nitrate and A melt of potassium carbonate or the like
  • another metal salt or the like may be mixed.
  • the heating temperature of the chemical strengthening treatment liquid needs to be higher than the temperature at which the above components melt.
  • potassium nitrate when used as the chemical strengthening treatment solution, it may be heated to a temperature higher than 334 ° C., which is the melting point, and when it is used, it may be heated to a temperature higher than 306 ° C., which is the melting point.
  • the heating temperature of the chemical strengthening treatment liquid is preferably lower than the glass transition temperature of the glass substrate (hereinafter referred to as “Tg”). More preferred.
  • the thickness of the region strengthened by ion exchange (hereinafter referred to as“ strengthening layer ”) and the degree of strengthening are determined according to the hardness of the glass substrate. In addition to mechanical strength, it directly affects various performances as a glass substrate for information recording media, such as surface roughness and the amount of alkali metal ions deposited after the recording layer is formed on the substrate. .
  • the polishing step is further performed after the chemical strengthening step, the thickness of the reinforcing layer and the degree of strengthening are largely dependent on the conditions of the subsequent grinding and polishing. As a result, the performance of the finally obtained glass substrate for information recording media is greatly affected.
  • the thickness of the reinforcing layer and the degree of strengthening depend on the temperature of the glass substrate and the chemical strengthening treatment liquid, and the immersion. It depends on time. Since it is very difficult to easily measure the thickness of the reinforcing layer and the degree of strengthening during the manufacturing process, in the actual process, the temperature of the glass substrate and the chemical strengthening treatment liquid, and the immersion time By managing this, the chemical strengthening process is stabilized. In other words, in manufacturing a glass substrate for information recording media, it is important to perform stable chemical strengthening treatment, and for that purpose, temperature control between the glass substrate and the chemical strengthening treatment solution is a very important point. .
  • the thickness of the reinforcing layer is determined by performing the chemical strengthening step after the polishing and polishing steps are completed.
  • the range of 10 ⁇ m to 500 m is preferable when the polishing step is further performed after the chemical strengthening step.
  • the immersion time required to obtain such a reinforcing layer thickness is usually about 0.5 to 20 hours.
  • the temperature of the glass substrate at the time of being immersed in the chemical strengthening treatment liquid is stabilized, and the glass substrate is cracked or microcracked by thermal shock when immersed in the heated chemical strengthening treatment liquid.
  • a preheating step of heating the glass substrate to a predetermined temperature in a preheating tank is performed prior to immersion in the chemical strengthening treatment solution.
  • the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid is TS (° C)
  • the temperature of the chemical strengthening treatment liquid is TL (° When C)
  • TL—50 ° C ⁇ TS ⁇ TL + 50 ° C is preferable S
  • TL—30 ° C ⁇ TS ⁇ TL + 30 ° C is more preferable!
  • TL + 50 ° C the temperature of chemical strengthening treatment liquid by immersion of glass substrate is large, so chemical strengthening treatment liquid Temperature control becomes difficult, and chemical strengthening treatment tends to be unstable.
  • the preheating tank a known electric furnace or the like can be used as long as it can heat the glass substrate to a predetermined temperature.
  • the present invention includes a transporting step in which the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid.
  • the glass substrate that has been preheated between the time when the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid is used. The temperature will decrease. Therefore, in order to keep the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid within the above range, the preheating temperature in the preheating tank is set higher than the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid. It is necessary to set
  • the preheating temperature is preferably close to the temperature of the chemical strengthening treatment solution! /, Preferably in the range of 300 ° C to 400 ° C, preferably 330 ° C to 380 ° C. More preferably. This is because preheating at a temperature significantly different from the temperature of the actual chemical strengthening treatment liquid causes a sudden temperature change of the chemical strengthening treatment liquid when a large amount of glass substrate is immersed and chemically strengthened. This is because the state of the strengthening process becomes unstable, and it becomes difficult to uniformly control the thickness of the strengthening layer and the value of the compressive stress generated.
  • the temperature decrease in the transport process affects the influence of the ambient temperature, air flow, etc. Because it receives a large amount, the amount of variation in temperature drop when the process is repeated increases.
  • the preheating temperature in the preheating tank is too high, the temperature of the glass substrate may approach Tg and the glass substrate may be deformed.
  • the temperature drop of the glass substrate from the time the glass substrate is taken out of the preheating tank to the time when it is immersed in the chemical strengthening treatment liquid is set to 10 ° C or less, and the influence of the ambient temperature, air flow, etc. in the transfer process By making it less susceptible to heat, the temperature variation of the glass substrate at the time of immersion in the chemical strengthening solution is minimized.
  • the temperature of the glass substrate decreases with time. Therefore, it is necessary to complete the transfer process within a time shorter than the time when the temperature drop of the glass substrate reaches 10 ° C.
  • the temperature drop per unit time is affected by the ambient temperature at which the glass substrate is transported in the transport process. In order to reduce the temperature drop per unit time and to increase the time that can be spent on the transport process, it is preferable that the ambient temperature is high. On the other hand, if the ambient temperature is too high, the glass substrate tends to be deformed. From these viewpoints, it is preferable to transport the glass substrate in an atmosphere heated to 50 ° C. or higher and lower than the glass substrate heating temperature in the preheating step.
  • the glass substrate that can be used in the present invention is not particularly limited as long as it is a glass substrate that can be ion-exchanged by being immersed in a chemical strengthening treatment solution.
  • aluminosilicate glass soda lime glass, soda aluminosilicate glass, aluminoporosilicate glass, and polosilicate glass.
  • aluminosilicate glass is particularly preferred because of its excellent impact resistance and vibration resistance.
  • glass substrates of various sizes such as 2.5 inches, 1.8 inches, 1 inch, and 0.8 inches can be used.
  • thickness of the glass substrate For example, glass substrates having various thicknesses such as 2 mm, lmm, and 0.63 mm can be used.
  • An information recording medium can be obtained by forming at least a recording layer on a glass substrate for information recording medium obtained by the method of the present invention.
  • the recording layer is not particularly limited, and various recording layers utilizing properties such as magnetism, light, and magnetomagnetism can be used. However, the recording layer is particularly useful for manufacturing an information recording medium (magnetic disk) using the magnetic layer as a recording layer. Is preferred.
  • the magnetic material used for the magnetic layer is not particularly limited, and a known material can be appropriately selected and used.
  • a force S such as CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtSiO containing Co as a main component can be cited.
  • the magnetic layer can be divided into non-magnetic films (for example, Cr, CrMo, CrV, etc.) to reduce noise.
  • the magnetic layer in addition to the above Co-based materials, ferrite-based and iron-rare earth-based materials, SiO
  • a durailleur having a structure in which magnetic particles such as Fe, Co, CoFe, and CoNiPt are dispersed in a nonmagnetic film made of BN or the like.
  • the magnetic layer may be either an in-plane type or a vertical type.
  • a known method can be used. Examples include sputtering, electroless plating, and spin coating.
  • the magnetic disk may be further provided with an underlayer, a protective layer, a lubricating layer, and the like as necessary. Any of these layers can be used by appropriately selecting a known material.
  • the material for the underlayer include Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
  • Protective layer material examples thereof include Cr, Cr alloy, C, Zr 0 2 and SiO ⁇ .
  • PFPE perfluoropolyether
  • Aluminosilicate glass with a Tg of 480 ° C was used as the glass material, and a blank was produced by press-molding the molten glass.
  • a glass substrate having an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm was obtained through an inner and outer peripheral machining process and a grinding / polishing process.
  • the surface roughness was finished so that the arithmetic average height Ra (JIS B0601: 2001) force SO.
  • the flatness was less than 1.5 111 on both sides.
  • the flatness was measured by measuring interference fringes using a flat master finished to a level of 0.1 m or less.
  • a mixed molten salt of potassium nitrate (KNO) and sodium nitrate (NaNO) was prepared as a chemical strengthening treatment solution.
  • the mixing ratio was 1: 1 by mass ratio.
  • the temperature of the chemical strengthening solution was 40 ° C.
  • the temperature of the preheating tank was set to 409 ° C.
  • the atmospheric temperature in the transfer process was set to 150 ° C.
  • Ten glass substrates were set in one carrier and put into a preheating tank for preheating. After 30 minutes, the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening solution after 25 seconds.
  • the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 25 seconds was in the range of 399 ° C to 401 ° C, and the temperature decreased due to transportation. Ranged from 8 to 10 ° C.
  • the glass substrate was replaced and the same process was repeated 20 times to obtain 200 processed substrates.
  • a total of 20 glass substrates were extracted from each carrier, and the flatness was measured.
  • the flatness was measured by measuring interference fringes in the same manner as the substrate before the chemical strengthening treatment. If the flatness is smaller than 5 m, which is preferable, there will be a problem in terms of performance as a magnetic disk.
  • the evaluation criteria are
  • the thickness of the ion-exchanged reinforcing layer was measured.
  • the thickness of the reinforcing layer was measured by using a polarimeter SF-2C manufactured by Shinko Seiki Co., Ltd., immersed in a refractive liquid close to glass, and holding the substrate vertically. The thickness was measured.
  • the stability of the reinforcing layer was evaluated by the standard deviation ( ⁇ ) of the thickness of the reinforcing layer of the 20 glass substrates measured. If the standard deviation is less than 2 m, the chemical strengthening process is considered to have very high stability, which has almost no effect on practical performance. However, when the standard deviation is 2 m or more, the effects on the performance such as the hardness and mechanical strength of the glass substrate increase.
  • the evaluation criteria are
  • the annular bending strength of the same 20 glass substrates was measured.
  • the annular bending strength is a measure of the occurrence of fine cracks in the glass substrate called microcracks, and was performed using a testing machine called an annular bending tester.
  • the glass substrate is placed on the support base 23, the outer periphery of the glass substrate is supported in an annular shape, and the iron ball is placed on the inner periphery of the hole in the center of the glass substrate.
  • a pressure fracture test was performed by applying force to the inner periphery of the glass substrate from above. This method is hard This is the same as the method commonly used in the industry as a strength test for disk recording media.
  • the breaking strength is 150 N or more, the yield due to breakage such as cracking or chipping of the glass substrate will be good. Below that, the strength is insufficient, and the yield deteriorates due to breakage, chipping, etc. of the glass substrate.
  • the evaluation criteria are
  • 150-170N ⁇ This strength is practically satisfactory, and sufficient recording / reproduction characteristics can be obtained.
  • Example 1 The evaluation results of Example 1 are shown in Table 1.
  • the average value of the thickness of the strengthening layer was 85 m, and the standard deviation of 20 glass substrates was 1.5 111, confirming that there was no practical problem with the stability of the chemical strengthening process.
  • the average value of the flatness was also good at 1. 8 111.
  • the average bending strength was 181.4 N, which was very good.
  • the temperature of the preheating tank was set to 405 ° C.
  • Ten glass substrates produced in the same manner as in Example 1 were set in one carrier and put into a preheating tank for preheating. Half an hour Thereafter, the glass substrate together with the carrier was taken out from the preheating tank, and immersed in a chemical strengthening treatment solution after 10 seconds.
  • the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate, the temperature of the glass substrate after 10 seconds was in the range of 399.5 ° C to 40.5 ° C. The temperature drop ranged from 4.5 to 5.5 ° C.
  • Example 2 The evaluation results of Example 2 are shown in Table 1.
  • the average thickness of the reinforcing layer was 87 m, and the standard deviation of 20 glass substrates was 1.3 111, confirming that the chemical strengthening process is very stable.
  • the average flatness was 1.9 111, which was good.
  • the average value of the ring bending strength was very good at 178.5N.
  • a glass substrate was produced in the same manner as in Examples 1 and 2 using an aluminopolysilicate glass having a Tg of 495 ° C as the glass material.
  • KNO potassium nitrate
  • NaNO sodium nitrate
  • the temperature of the preheating tank was set to 350 ° C.
  • Ten glass substrates produced in the same manner as in Examples 1 and 2 were set in one carrier and put into a preheating tank for preheating. After 30 minutes, the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening solution after 22 seconds.
  • the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 2 seconds was in the range of 343 ° C to 345 ° C, and the temperature drop due to transportation was It was in the range of 5-7 ° C.
  • Example 3 The evaluation results of Example 3 are shown in Table 1.
  • the average thickness of the reinforcing layer was 25 m, and the standard deviation of 20 glass substrates was 1. O ⁇ m, confirming that the chemical strengthening process is very stable.
  • the average flatness was 1. O ⁇ m, which was very good.
  • the average value of the ring bending strength was 194.2N, which was very good.
  • Example 3 the temperature of the preheating tank was set to 330 ° C. Ten glass substrates produced in the same manner as in Example 3 were set in one carrier and put into a preheating tank for preheating.
  • the chemical strengthening treatment liquid was the same potassium nitrate (KNO) and sodium nitrate (NaNO) as in Example 3.
  • the glass substrate together with the carrier was taken out of the preheating tank and immersed in the chemical strengthening treatment solution after 25 seconds.
  • the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 25 seconds was 34.5 ° C-3
  • Example 4 The evaluation results of Example 4 are shown in Table 1.
  • the average value of the thickness of the reinforcing layer was 31 m, and the standard deviation of 20 glass substrates was 1.5 111, confirming that the stability of the chemical strengthening process has no practical problem.
  • the flatness was also good at 1.6 111.
  • the ring bending strength was also very good, with an average of 187.3 N. [0079] (Example 5)
  • the temperature of the preheating tank was set to 375 ° C.
  • Ten glass substrates produced in the same manner as in Examples 3 and 4 were set in one carrier and put into a preheating tank for preheating.
  • the chemical strengthening treatment liquid was the same potassium nitrate (KNO) and sodium nitrate (NaN) as in Examples 3 and 4.
  • a mixed molten salt of O 2) was used.
  • the mixing ratio was 2: 1 by mass.
  • the temperature of the chemical strengthening treatment liquid was also set to 350 ° C. as in Examples 3 and 4.
  • the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening treatment solution 20 seconds later.
  • the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 20 seconds was in the range of 367.5 ° C to 369 ° C. The decrease was in the range of 6 to 7.5 ° C.
  • Example 5 The evaluation results of Example 5 are shown in Table 1.
  • the average thickness of the reinforcing layer was 33 m, and the standard deviation of 20 glass substrates was 1. l ⁇ m, confirming that the stability of the chemical strengthening process was very high.
  • the average flatness was 0.9 m, which was very good.
  • the average bending strength of the ring was very good at 198.1 N.
  • Comparative Examples 1 and 2 were produced using a glass substrate of aluminosilicate glass having the same Tg of 480 ° C. as in Example 1.
  • a mixed molten salt having a mass ratio of potassium nitrate (KNO) and sodium nitrate (NaNO) of 1: 1 as in Example 1 was used as the chemical strengthening treatment liquid.
  • the temperature of the chemical strengthening treatment liquid was also set to 400 ° C. as in Example 1.
  • the temperature of the preheating tank was set to 420 ° C.
  • the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 50 seconds was in the range of 395 ° C to 405 ° C, and the temperature drop during transfer was In the range of 15-25 ° C I got it.
  • the temperature of the preheating tank was set to 450 ° C.
  • the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 150 seconds was in the range of 380 ° C to 420 ° C, and the temperature drop during transfer was It was in the range of 30-70 ° C.
  • Example 1 Ten glass substrates produced in the same manner as in Example 1 were set in one carrier, put into a preheating tank, and preheated. After 30 minutes, the glass substrate together with the carrier was taken out from the preheating tank and immersed in the chemical strengthening treatment solution after 50 seconds in Comparative Example 1 and after 150 seconds in Comparative Example 2. After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening solution was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. Other conditions are the same as in Example 1.
  • the glass substrate was replaced under the conditions of Comparative Examples 1 and 2, and the same process was repeated 20 times to obtain 200 processed substrates. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer and the annular bending strength were measured.
  • Comparative Examples 1 and 2 are also shown in Table 1.
  • the average thickness of the reinforcing layer is Comparative Example 1 with a force of 8 am
  • Comparative Example 2 is 82 ⁇ m
  • the standard deviation of 20 glass substrates is Comparative Example 1 with 3 ⁇ 1 ⁇ m and Comparative Example 2 with 3.8 m.
  • the average flatness was 2.3 111 in Comparative Example 1, insufficient surface accuracy, and 5.6 m in Comparative Example 2, which was a problematic level.
  • the average value of the annular bending strength was 135.3N in Comparative Example 1, which could be damaged in the process, and in Comparative Example 2, the strength was clearly insufficient at 106.9N.
  • the temperature drop of the glass substrate from when the glass substrate is taken out of the preheating tank to when it is immersed in the chemical strengthening treatment liquid is within 10 ° C.
  • the temperature variation of the glass substrate at the time of being immersed in the chemical strengthening treatment liquid can be minimized, and a stable chemical strengthening treatment can be performed at low cost.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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Abstract

Disclosed is a method for producing a glass substrate for information recording medium at low cost, wherein a stable chemical strengthening treatment can be performed by conveying a glass substrate in such a manner that the temperature decrease from the time when the glass substrate is taken out of a preheating vessel to the time when the glass substrate is immersed into a chemical strengthening treatment liquid is suppressed to 10˚C or less, thereby minimizing variations of temperature of the glass substrate at the time when it is immersed into the chemical strengthening treatment liquid. Also disclosed are a glass substrate for information recording medium, and an information recording medium.

Description

明 細 書  Specification
情報記録媒体用ガラス基板の製造方法、情報記録媒体用ガラス基板及 び情報記録媒体  Method for manufacturing glass substrate for information recording medium, glass substrate for information recording medium, and information recording medium
技術分野  Technical field
[0001] 本発明は、磁気、光、光磁気等の性質を利用した記録層を有する情報記録媒体に 用いられる情報記録媒体用ガラス基板の製造方法、該製造方法によって製造された 情報記録媒体用ガラス基板及び情報記録媒体に関する。  The present invention relates to a method for producing a glass substrate for an information recording medium used for an information recording medium having a recording layer utilizing properties such as magnetism, light, and magnetomagnetism, and an information recording medium produced by the production method. The present invention relates to a glass substrate and an information recording medium.
背景技術  Background art
[0002] 磁気、光、光磁気等の性質を利用した記録層を有する情報記録媒体のなかで、代 表的なものとして磁気ディスクがある。磁気ディスク用基板として、従来、アルミニウム 基板が広く用いられていた。しかし、近年、記録密度向上の要請に伴い、アルミユウ ム基板よりも表面の平滑性に優れ、し力、も表面欠陥が少ないことから、磁気ヘッドの 浮上量の低減を図ることができるガラス基板が磁気ディスク用基板として用いられる 割合が増えてきている。  Among information recording media having a recording layer using properties such as magnetism, light, and magnetomagnetism, there is a magnetic disk as a representative one. Conventionally, aluminum substrates have been widely used as magnetic disk substrates. However, in recent years, with the demand for higher recording density, glass substrates that can reduce the flying height of the magnetic head have been found to have better surface smoothness and fewer surface defects than aluminum substrates. The proportion used for magnetic disk substrates is increasing.
[0003] このような磁気ディスク等の情報記録媒体用ガラス基板の製造方法においては、ガ ラス基板の耐衝撃性ゃ耐振動性を向上させ、衝撃や振動によって基板が破損する のを防止する目的で、ガラス基板の表面に化学強化処理を施して基板を強化するこ とが一般的に行われている。  [0003] In such a method of manufacturing a glass substrate for information recording media such as a magnetic disk, the impact resistance and vibration resistance of a glass substrate are improved, and the substrate is prevented from being damaged by impact or vibration. In general, the substrate is strengthened by applying a chemical strengthening treatment to the surface of the glass substrate.
[0004] 化学強化処理は、通常、加熱された化学強化処理液にガラス基板を浸漬して、ガラ ス基板の成分であるリチウムイオン、ナトリウムイオン等のアルカリ金属イオンを、これ らのイオンよりイオン半径の大きなナトリウムイオン、カリウムイオン等のアルカリ金属ィ オンと置換するイオン交換法によって行われる。  [0004] In chemical strengthening treatment, a glass substrate is usually immersed in a heated chemical strengthening treatment solution, and alkali metal ions such as lithium ions and sodium ions, which are components of the glass substrate, are ionized from these ions. This is performed by an ion exchange method in which an alkali metal ion such as sodium ion or potassium ion having a large radius is substituted.
[0005] ガラス基板を加熱された化学強化処理液に浸漬する際の熱衝撃によるガラス基板 の割れを防止するため、化学強化処理液への浸漬に先立って、ガラス基板を予め所 定温度に加熱する予熱工程を設ける方法が知られている。更に、ガラス基板の平坦 度を上げるため、予熱温度をガラスの歪点より少なくとも 100°C低くする方法が提案さ れている(例えば、特許文献 1を参照。)。 特許文献 1 :特開平 7— 29170号公報 [0005] In order to prevent cracking of the glass substrate due to thermal shock when the glass substrate is immersed in a heated chemical strengthening treatment solution, the glass substrate is heated to a predetermined temperature in advance before being immersed in the chemical strengthening treatment solution. A method of providing a preheating step is known. Further, in order to increase the flatness of the glass substrate, a method has been proposed in which the preheating temperature is at least 100 ° C. lower than the strain point of the glass (see, for example, Patent Document 1). Patent Document 1: JP-A-7-29170
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0006] しかしながら、予熱槽においてガラス基板を所定温度に加熱した後、ガラス基板を 予熱槽から取り出して化学強化処理液に浸漬させるために搬送しているあいだに、 ガラス基板の温度は低下する。このとき低下する温度は、搬送が行われる雰囲気温 度や空気の流れ等の多くの因子によって左右されるため、実際の工程においては、 化学強化処理液に浸漬される時点におけるガラス基板の温度は大きくばらついてし まうのが一般的であった。  [0006] However, after the glass substrate is heated to a predetermined temperature in the preheating tank, the temperature of the glass substrate decreases while the glass substrate is taken out of the preheating tank and transported to be immersed in the chemical strengthening treatment liquid. The temperature that decreases at this time depends on many factors such as the ambient temperature at which the material is transported and the flow of air, so in the actual process, the temperature of the glass substrate at the time of immersion in the chemical strengthening solution is In general, it varied widely.
[0007] 上述の通り、化学強化処理は、ガラス基板と化学強化処理液との間でイオン交換す ることによって行われるものであり、このイオン交換の速度や交換されるイオンの量、 イオンがガラス基板に侵入する深さなどは、ガラス基板と化学強化処理液の温度に 大きく依存するものである。そのため、化学強化処理液に浸漬される時点におけるガ ラス基板の温度がばらつくと、化学強化処理を安定して行うことができないという問題 があった。  [0007] As described above, the chemical strengthening treatment is performed by ion exchange between the glass substrate and the chemical strengthening treatment liquid. The ion exchange speed, the amount of ions exchanged, The depth of penetration into the glass substrate greatly depends on the temperature of the glass substrate and the chemical strengthening solution. For this reason, if the temperature of the glass substrate at the time of immersion in the chemical strengthening treatment liquid varies, there is a problem that the chemical strengthening treatment cannot be performed stably.
[0008] また、化学強化処理液に浸漬される時点におけるガラス基板の温度のばらつきを 抑えるために、搬送が行われる雰囲気の温度や空気の流れ等の多くの因子を厳密 に制御しょうとすると、そのために多大な費用と労力が必要となり、ガラス基板のコスト アップの要因となるという問題があった。  [0008] Further, in order to suppress the variation in the temperature of the glass substrate at the time of being immersed in the chemical strengthening treatment liquid, when trying to strictly control many factors such as the temperature of the atmosphere in which the conveyance is performed and the air flow, For this purpose, a large amount of cost and labor are required, which causes a problem of increasing the cost of the glass substrate.
[0009] 本発明は上記のような技術的課題に鑑みてなされたものであり、本発明の目的は、 安定した化学強化処理を行うことができ、低コストで製造することができる、情報記録 媒体用ガラス基板の製造方法、情報記録媒体用ガラス基板及び情報記録媒体を提 供することである。  [0009] The present invention has been made in view of the technical problems as described above, and an object of the present invention is to provide information recording that can perform stable chemical strengthening treatment and can be manufactured at low cost. The object is to provide a method for producing a glass substrate for a medium, a glass substrate for an information recording medium, and an information recording medium.
課題を解決するための手段  Means for solving the problem
[0010] 上記の課題を解決するために、本発明は以下の特徴を有するものである。 In order to solve the above problems, the present invention has the following features.
[0011] 1.加熱された化学強化処理液にガラス基板を浸漬することによって前記ガラス基 板を化学強化する工程を含む情報記録媒体用ガラス基板の製造方法において、 前記化学強化処理液への浸漬に先立って、予熱槽で前記ガラス基板を所定温度に 加熱する予熱工程と、 [0011] 1. In a method for manufacturing a glass substrate for an information recording medium, the method includes a step of chemically strengthening the glass substrate by immersing the glass substrate in a heated chemical strengthening treatment liquid. Prior to, the glass substrate is brought to a predetermined temperature in a preheating tank. A preheating step for heating;
前記ガラス基板を前記予熱槽から取り出して前記化学強化処理液に浸漬させる搬送 工程とを有し、  A conveyance step of taking out the glass substrate from the preheating tank and immersing it in the chemical strengthening treatment liquid,
前記搬送工程は、前記ガラス基板を前記予熱槽から取り出してから前記化学強化処 理液に浸漬するまでの間の前記ガラス基板の温度低下が 10°C以内となるように前記 ガラス基板を搬送する工程であることを特徴とする情報記録媒体用ガラス基板の製 造方法。  In the transporting step, the glass substrate is transported so that the temperature drop of the glass substrate is 10 ° C or less after the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid. A process for producing a glass substrate for an information recording medium, which is a process.
[0012] 2.前記化学強化処理液に浸漬される時点における前記ガラス基板の温度を TS ( °C)、前記化学強化処理液の温度を TL (°C)としたとき、 TL- 50°C≤TS≤TL+ 50 °Cを満足することを特徴とする前記 1に記載の情報記録媒体用ガラス基板の製造方 法。  [0012] 2. When the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid is TS (° C) and the temperature of the chemical strengthening treatment liquid is TL (° C), TL-50 ° C 2. The method for producing a glass substrate for an information recording medium according to 1 above, wherein ≤TS≤TL + 50 ° C is satisfied.
3.前記化学強化処理液に浸漬される時点における前記ガラス基板の温度を TS (°C )、前記化学強化処理液の温度を TL (°C)としたとき、 TL- 30°C≤TS≤TL+ 30°C を満足することを特徴とする前記 1に記載の情報記録媒体用ガラス基板の製造方法  3.When the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid is TS (° C) and the temperature of the chemical strengthening treatment liquid is TL (° C), TL-30 ° C≤TS≤ 2. The method for producing a glass substrate for an information recording medium according to 1 above, wherein TL + 30 ° C. is satisfied
[0013] 4.前記搬送工程は、 50°C以上、且つ、前記予熱工程における前記ガラス基板の 加熱温度以下の温度に加熱された雰囲気下で前記ガラス基板を搬送する工程であ ることを特徴とする前記 1乃至 3の何れ力、 1項に記載の情報記録媒体用ガラス基板の 製造方法。 [0013] 4. The transporting step is a step of transporting the glass substrate in an atmosphere heated to a temperature of 50 ° C or higher and lower than a heating temperature of the glass substrate in the preheating step. The method for producing a glass substrate for an information recording medium as described in any one of 1 to 3 above.
[0014] 5.前記 1乃至 4の何れ力、 1項に記載の情報記録媒体用ガラス基板の製造方法によ つて製造されたことを特徴とする情報記録媒体用ガラス基板。  [0014] 5. A glass substrate for information recording medium manufactured by the method for manufacturing a glass substrate for information recording medium according to any one of 1 to 4 above.
[0015] 6.前記 5に記載された情報記録媒体用ガラス基板の上に、少なくとも記録層が形 成されて!/、ることを特徴とする情報記録媒体。 [0015] 6. An information recording medium characterized in that at least a recording layer is formed on the glass substrate for information recording medium described in 5 above!
[0016] 7.前記記録層は、磁性層であることを特徴とする前記 6に記載の情報記録媒体。 [0016] 7. The information recording medium as described in 6 above, wherein the recording layer is a magnetic layer.
発明の効果  The invention's effect
[0017] 本発明によれば、ガラス基板を予熱槽から取り出してから化学強化処理液に浸漬 するまでの間のガラス基板の温度低下が 10°C以内となるようにガラス基板を搬送す ることによって、化学強化処理液に浸漬される時点におけるガラス基板の温度のばら つきを最小限に抑えて、安定した化学強化処理を行うことができ、低コストで製造する ことができる情報記録媒体用ガラス基板の製造方法、情報記録媒体用ガラス基板及 び情報記録媒体を提供することができる。 [0017] According to the present invention, the glass substrate is transported so that the temperature drop of the glass substrate after the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid is within 10 ° C. Of the temperature of the glass substrate at the time of being immersed in the chemical strengthening solution. Provide a method for manufacturing a glass substrate for information recording media, a glass substrate for information recording media, and an information recording medium that can be manufactured at low cost, capable of performing stable chemical strengthening treatment with minimal adhesion can do.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0018] 以下、本発明の実施の形態について詳細に説明する。  Hereinafter, embodiments of the present invention will be described in detail.
[0019] (情報記録媒体用ガラス基板の製造方法)  [0019] (Method for producing glass substrate for information recording medium)
情報記録媒体用ガラス基板は、一般的に、ブランク材作製工程、内外周加工工程 、研肖 1」·研磨工程、化学強化工程、洗浄工程などの工程を経て製造される。ブランク 材作製工程は情報記録媒体用ガラス基板の基になるブランク材を形成する工程であ り、溶融ガラスをプレス成形して作製する方法や、シート状のガラスを切断して作製す る方法が知られている。内外周加工工程は、中心孔の穿孔加工、内外周の形状や 寸法精度確保のための研削加工、内外周の研磨加工等を行う工程である。研削'研 磨工程は、記録層が形成される面の平坦度、表面粗さを満足させるための研削加工 、研磨加工を行う工程である。通常は、粗研削加工、精研削加工、 1次研磨加工、 2 次研磨加工といったように、いくつかの段階に分けて行われる場合が多い。化学強 化工程は、加熱された化学強化処理液にガラス基板を浸漬することでガラス基板を 強化する工程である。また、洗浄工程は、ガラス基板の表面に残った研磨剤や化学 強化処理液等の異物を除去する工程である。  A glass substrate for an information recording medium is generally manufactured through processes such as a blank material manufacturing process, an inner and outer peripheral processing process, a polishing 1 ”-polishing process, a chemical strengthening process, and a cleaning process. The blank material production process is a process for forming a blank material that is the basis of a glass substrate for an information recording medium. There are a method for producing molten glass by press molding, and a method for producing by cutting sheet-like glass. Are known. The inner and outer peripheral machining process is a process of drilling the central hole, grinding to ensure the shape and dimensional accuracy of the inner and outer circumferences, and polishing the inner and outer circumferences. The grinding / polishing step is a step of performing grinding and polishing to satisfy the flatness and surface roughness of the surface on which the recording layer is formed. Usually, it is often performed in several stages, such as rough grinding, fine grinding, primary polishing, and secondary polishing. The chemical strengthening step is a step of strengthening the glass substrate by immersing the glass substrate in a heated chemical strengthening treatment solution. The cleaning step is a step of removing foreign matters such as abrasives and chemical strengthening treatment liquid remaining on the surface of the glass substrate.
[0020] 本発明の情報記録媒体用ガラス基板の製造方法は、これらの工程の内、化学強化 工程に特徴を有するものである。本発明においては、研肖 研磨工程が完了した後 に化学強化工程を行っても良いし、先に化学強化工程を行ってから研肖 ϋ ·研磨工程 を行ってもよい。また、研肖 研磨工程がある段階まで進んだ時点で化学強化工程を 行い、その後に研肖 |J '研磨工程の残りの工程を行って仕上げることもできる。  [0020] The method for producing a glass substrate for an information recording medium of the present invention is characterized by a chemical strengthening step among these steps. In the present invention, the chemical strengthening step may be performed after the polishing polishing step is completed, or the polishing strengthening / polishing step may be performed after the chemical strengthening step is performed first. Alternatively, the chemical strengthening process can be performed when the polishing polishing process reaches a certain stage, and then the remaining steps of the polishing | J 'polishing process can be performed.
[0021] なお、本発明の情報記録媒体用ガラス基板の製造方法にお!/、ては、上記以外の 種々の工程を有していても良い。例えば、ガラス基板の内部歪みを緩和するための ァニール工程、ガラス基板からのアルカリ金属イオンの析出を防止するための脱アル カリ処理工程、種々の検査 ·評価工程等を有して!/、ても良!/、。  [0021] It should be noted that the method for producing a glass substrate for an information recording medium of the present invention may include various processes other than those described above. For example, it has an annealing process to alleviate internal distortion of the glass substrate, a dealkali treatment process to prevent the precipitation of alkali metal ions from the glass substrate, and various inspection / evaluation processes! Also good!
[0022] (化学強化工程) 化学強化工程は、加熱された化学強化処理液にガラス基板を浸漬することによつ て、ガラス基板の成分であるリチウムイオン、ナトリウムイオン等のアルカリ金属イオン を、これらのイオンよりイオン半径の大きなナトリウムイオン、カリウムイオン等のアル力 リ金属イオンと置換するイオン交換法によって行われる。イオン半径の違いによって 生じる歪みにより、イオン交換された領域に圧縮応力が発生することで、ガラス基板 の表面が強化される。 [0022] (Chemical strengthening process) In the chemical strengthening process, by immersing the glass substrate in a heated chemical strengthening treatment solution, alkali metal ions such as lithium ions and sodium ions, which are components of the glass substrate, have a larger ion radius than these ions. It is carried out by an ion exchange method in which it replaces the alkali metal ions such as sodium ions and potassium ions. The surface of the glass substrate is strengthened by generating compressive stress in the ion-exchanged region due to the strain caused by the difference in ion radius.
[0023] 化学強化処理液としては、硝酸カリウム(KNO )、硝酸ナトリウム(NaNO )、炭酸力 リウム(K CO )などの溶融塩や、これらの混合物(例えば、硝酸カリウムと硝酸ナトリウ ムの混合物、硝酸カリウムと炭酸カリウムの混合物など)の溶融液を用いることができ る。また、更に別の金属塩等を混合したものであっても良い。  [0023] Chemical strengthening treatment liquids include molten salts such as potassium nitrate (KNO), sodium nitrate (NaNO), carbonated potassium (KCO), and mixtures thereof (for example, a mixture of potassium nitrate and sodium nitrate, potassium nitrate and A melt of potassium carbonate or the like) can be used. Further, another metal salt or the like may be mixed.
[0024] 化学強化処理液の加熱温度は、上記の成分が融解する温度よりも高温にする必要 がある。例えば、化学強化処理液として硝酸カリウムを用いる場合には、融点である 3 34°Cよりも高温に、硝酸ナトリウムを用いる場合には、融点である 306°Cよりも高温に 加熱すればよい。  [0024] The heating temperature of the chemical strengthening treatment liquid needs to be higher than the temperature at which the above components melt. For example, when potassium nitrate is used as the chemical strengthening treatment solution, it may be heated to a temperature higher than 334 ° C., which is the melting point, and when it is used, it may be heated to a temperature higher than 306 ° C., which is the melting point.
[0025] 一方、化学強化処理液の加熱温度が高すぎると、ガラス基板の温度が上がりすぎ、 ガラス基板の変形を招く虞がある。このため、化学強化処理液の加熱温度は、ガラス 基板のガラス転移点(以下、「Tg」と言う)よりも低い温度が好ましぐ Tg— 50°Cよりも 低レ、温度とすることが更に好ましレ、。  [0025] On the other hand, if the heating temperature of the chemical strengthening treatment liquid is too high, the temperature of the glass substrate is excessively increased, which may cause deformation of the glass substrate. For this reason, the heating temperature of the chemical strengthening treatment liquid is preferably lower than the glass transition temperature of the glass substrate (hereinafter referred to as “Tg”). More preferred.
[0026] 研肖 1」·研磨工程が完了した後に化学強化工程を行う場合、イオン交換によって強化 された領域 (以下、「強化層」と言う)の厚みや強化の程度は、ガラス基板の硬さ、機 械的強度はもちろん、表面粗さや基板上に記録層が形成された後のアルカリ金属ィ オンの析出量といった、情報記録媒体用ガラス基板としての種々の性能に直接大き な影響を与える。  [0026] Sharpening 1 ”· When the chemical strengthening process is performed after the polishing process is completed, the thickness of the region strengthened by ion exchange (hereinafter referred to as“ strengthening layer ”) and the degree of strengthening are determined according to the hardness of the glass substrate. In addition to mechanical strength, it directly affects various performances as a glass substrate for information recording media, such as surface roughness and the amount of alkali metal ions deposited after the recording layer is formed on the substrate. .
[0027] また、化学強化工程の後に、更に研肖 1」·研磨工程を行う場合であっても、強化層の 厚みや強化の程度は、その後に行われる研削加工や研磨加工の条件に大きな影響 を与え、その結果、最終的に得られる情報記録媒体用ガラス基板の性能に大きく影 響するものである。  [0027] In addition, even if the polishing step is further performed after the chemical strengthening step, the thickness of the reinforcing layer and the degree of strengthening are largely dependent on the conditions of the subsequent grinding and polishing. As a result, the performance of the finally obtained glass substrate for information recording media is greatly affected.
[0028] 強化層の厚みや強化の程度は、ガラス基板と化学強化処理液の温度、及び浸漬 時間によって決まる。強化層の厚みや強化の程度を製造工程の中で簡易的に測定 することは非常に困難であることから、実際の工程においては、ガラス基板と化学強 化処理液との温度、及び浸漬時間を管理することで、化学強化工程の安定化を図つ ている。つまり、情報記録媒体用ガラス基板を製造する上では、安定した化学強化処 理を行うことが重要であり、そのためにはガラス基板と化学強化処理液との温度管理 が非常に重要なポイントとなる。 [0028] The thickness of the reinforcing layer and the degree of strengthening depend on the temperature of the glass substrate and the chemical strengthening treatment liquid, and the immersion. It depends on time. Since it is very difficult to easily measure the thickness of the reinforcing layer and the degree of strengthening during the manufacturing process, in the actual process, the temperature of the glass substrate and the chemical strengthening treatment liquid, and the immersion time By managing this, the chemical strengthening process is stabilized. In other words, in manufacturing a glass substrate for information recording media, it is important to perform stable chemical strengthening treatment, and for that purpose, temperature control between the glass substrate and the chemical strengthening treatment solution is a very important point. .
[0029] 情報記録媒体用ガラス基板として必要な硬さ、強度、表面粗さを備えるとレ、う観点 から、強化層の厚みは、研肖 ϋ ·研磨工程が完了した後に化学強化工程を行う場合は 5 H m〜200 11 m、化学強化工程の後に更に研肖 ij ·研磨工程を行う場合は 10 μ m〜 500 mの範囲が好ましい。このような強化層の厚みを得るために必要な浸漬時間 は、通常、 0. 5時間〜 20時間程度となる。  [0029] From the viewpoint of providing the necessary hardness, strength, and surface roughness as a glass substrate for information recording media, the thickness of the reinforcing layer is determined by performing the chemical strengthening step after the polishing and polishing steps are completed. In the case of 5 H m to 200 11 m, the range of 10 μm to 500 m is preferable when the polishing step is further performed after the chemical strengthening step. The immersion time required to obtain such a reinforcing layer thickness is usually about 0.5 to 20 hours.
[0030] (予熱工程、搬送工程)  [0030] (Preheating process, conveying process)
本発明においては、化学強化処理液に浸漬される時点におけるガラス基板の温度 の安定化を図ると共に、加熱された化学強化処理液に浸漬される際の熱衝撃による ガラス基板の割れや微細なクラックの発生を防止するため、化学強化処理液への浸 漬に先立って、予熱槽でガラス基板を所定温度に加熱する予熱工程を有してレ、る。  In the present invention, the temperature of the glass substrate at the time of being immersed in the chemical strengthening treatment liquid is stabilized, and the glass substrate is cracked or microcracked by thermal shock when immersed in the heated chemical strengthening treatment liquid. In order to prevent the occurrence of this, a preheating step of heating the glass substrate to a predetermined temperature in a preheating tank is performed prior to immersion in the chemical strengthening treatment solution.
[0031] 化学強化処理液の温度変化を最小限に抑えるという観点から、化学強化処理液に 浸漬される時点におけるガラス基板の温度を TS (°C)、化学強化処理液の温度を TL (°C)としたとき、 TL— 50°C≤TS≤TL+ 50°Cとすること力 S好ましく、 TL— 30°C≤T S≤TL+ 30°Cとすることが更に好まし!、。 TS力 STL— 50°Cよりも低!/、場合や、 TL + 50°Cよりも高い場合には、ガラス基板を浸漬することによる化学強化処理液の温度 変化が大きいために化学強化処理液の温度管理が困難になり、化学強化処理が不 安定になり易い。  [0031] From the viewpoint of minimizing the temperature change of the chemical strengthening treatment liquid, the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid is TS (° C), and the temperature of the chemical strengthening treatment liquid is TL (° When C), TL—50 ° C≤TS≤TL + 50 ° C is preferable S, TL—30 ° C≤TS≤TL + 30 ° C is more preferable! TS force STL—Lower than 50 ° C! / When higher than TL + 50 ° C, the temperature of chemical strengthening treatment liquid by immersion of glass substrate is large, so chemical strengthening treatment liquid Temperature control becomes difficult, and chemical strengthening treatment tends to be unstable.
[0032] 予熱槽は、ガラス基板を所定温度に加熱できるものであれば特に制限はなぐ公知 の電気炉等を用いることができる。  As the preheating tank, a known electric furnace or the like can be used as long as it can heat the glass substrate to a predetermined temperature.
[0033] また、本発明においては、ガラス基板を予熱槽から取り出して化学強化処理液に浸 漬させる搬送工程を有している。通常は、この搬送工程においてガラス基板を予熱 槽から取り出してから化学強化処理液に浸漬するまでの間に、予熱されたガラス基板 の温度が低下してしまう。そのため、化学強化処理液に浸漬される時点におけるガラ ス基板の温度を上記範囲に収めるためには、予熱槽における予熱温度を、化学強化 処理液に浸漬される時点におけるガラス基板の温度よりも高く設定しておく必要があ [0033] Further, the present invention includes a transporting step in which the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid. Usually, in this transfer process, the glass substrate that has been preheated between the time when the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid is used. The temperature will decrease. Therefore, in order to keep the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid within the above range, the preheating temperature in the preheating tank is set higher than the temperature of the glass substrate when immersed in the chemical strengthening treatment liquid. It is necessary to set
[0034] 本発明にお!/、ては、予熱温度を、化学強化処理液の温度と近!/、300°C〜400°Cの 範囲とすること力好ましく、 330°C〜380°Cとすることが更に好ましい。これは、実際の 化学強化処理液の温度と大きく異なる温度での予熱は、大量のガラス基板を浸漬し て化学強化処理する場合に、化学強化処理液の急激な温度変化を招いてしまい、 化学強化処理プロセスの状態が不安定となり、強化層の厚みや発生する圧縮応力 の値を均一に制御するのが困難となるからである。 [0034] In the present invention, the preheating temperature is preferably close to the temperature of the chemical strengthening treatment solution! /, Preferably in the range of 300 ° C to 400 ° C, preferably 330 ° C to 380 ° C. More preferably. This is because preheating at a temperature significantly different from the temperature of the actual chemical strengthening treatment liquid causes a sudden temperature change of the chemical strengthening treatment liquid when a large amount of glass substrate is immersed and chemically strengthened. This is because the state of the strengthening process becomes unstable, and it becomes difficult to uniformly control the thickness of the strengthening layer and the value of the compressive stress generated.
[0035] ガラス基板を予熱槽から取り出してから化学強化処理液に浸漬するまでの間のガラ ス基板の温度低下が大きい条件では、搬送工程における温度低下は雰囲気温度、 空気の流れ等の影響を大きく受けるため、工程を繰り返し行う場合の温度低下のバラ ツキ量が大きくなる。また、予熱槽における予熱温度が高すぎると、ガラス基板の温 度が Tgに近づいてガラス基板の変形が起こる虞もある。本発明においては、ガラス 基板を予熱槽から取り出してから化学強化処理液に浸漬するまでの間のガラス基板 の温度低下を 10°C以内として、搬送工程における雰囲気温度、空気の流れ等の影 響を受けにくくすることで化学強化処理液に浸漬される時点におけるガラス基板の温 度ばらつきを最小限に抑えている。  [0035] Under the condition that the temperature of the glass substrate is greatly decreased from the time when the glass substrate is taken out of the preheating tank to the time when the glass substrate is immersed in the chemical strengthening treatment liquid, the temperature decrease in the transport process affects the influence of the ambient temperature, air flow, etc. Because it receives a large amount, the amount of variation in temperature drop when the process is repeated increases. In addition, if the preheating temperature in the preheating tank is too high, the temperature of the glass substrate may approach Tg and the glass substrate may be deformed. In the present invention, the temperature drop of the glass substrate from the time the glass substrate is taken out of the preheating tank to the time when it is immersed in the chemical strengthening treatment liquid is set to 10 ° C or less, and the influence of the ambient temperature, air flow, etc. in the transfer process By making it less susceptible to heat, the temperature variation of the glass substrate at the time of immersion in the chemical strengthening solution is minimized.
[0036] ガラス基板を予熱槽から取り出すと、時間が経つにつれてガラス基板の温度が低下 する。そのため、ガラス基板の温度低下が 10°Cとなる時間よりも短い時間の間に搬送 工程を完了させる必要がある。単位時間当たりの温度低下は、搬送工程においてガ ラス基板が搬送される雰囲気温度に影響される。単位時間当たりの温度低下を小さく して搬送工程にかけることのできる時間を長くとるためには、雰囲気温度は高い方が 好ましい。一方、雰囲気温度が高すぎると、ガラス基板の変形を招きやすくなる。これ らの観点より、 50°C以上、且つ、予熱工程におけるガラス基板の加熱温度以下の温 度に加熱された雰囲気下でガラス基板を搬送することが好ましい。  [0036] When the glass substrate is removed from the preheating tank, the temperature of the glass substrate decreases with time. Therefore, it is necessary to complete the transfer process within a time shorter than the time when the temperature drop of the glass substrate reaches 10 ° C. The temperature drop per unit time is affected by the ambient temperature at which the glass substrate is transported in the transport process. In order to reduce the temperature drop per unit time and to increase the time that can be spent on the transport process, it is preferable that the ambient temperature is high. On the other hand, if the ambient temperature is too high, the glass substrate tends to be deformed. From these viewpoints, it is preferable to transport the glass substrate in an atmosphere heated to 50 ° C. or higher and lower than the glass substrate heating temperature in the preheating step.
[0037] (ガラス基板) 本発明で用いることのできるガラス基板は、化学強化処理液に浸漬することでィォ ン交換が可能なガラス基板であれば特に制限されない。例えば、アルミノシリケートガ ラス、ソーダライムガラス、ソーダアルミノケィ酸ガラス、アルミノポロシリケートガラス、 ポロシリケートガラスなどが挙げられる。中でも、アルミノシリケートガラスは、耐衝撃性 ゃ耐振動性に優れるため特に好ましレ、。 [0037] (Glass substrate) The glass substrate that can be used in the present invention is not particularly limited as long as it is a glass substrate that can be ion-exchanged by being immersed in a chemical strengthening treatment solution. Examples thereof include aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoporosilicate glass, and polosilicate glass. Of these, aluminosilicate glass is particularly preferred because of its excellent impact resistance and vibration resistance.
[0038] ガラス基板の大きさに限定はない。例えば、外径が 2. 5インチ、 1. 8インチ、 1イン チ、 0. 8インチなど種々の大きさのガラス基板を用いることができる。また、ガラス基板 の厚みにも限定はない。例えば、 2mm、 lmm、 0. 63mmなど種々の厚みのガラス 基板を用いることができる。  [0038] There is no limitation on the size of the glass substrate. For example, glass substrates of various sizes such as 2.5 inches, 1.8 inches, 1 inch, and 0.8 inches can be used. There is no limitation on the thickness of the glass substrate. For example, glass substrates having various thicknesses such as 2 mm, lmm, and 0.63 mm can be used.
[0039] (情報記録媒体)  [0039] (Information recording medium)
本発明の方法により得られた情報記録媒体用ガラス基板の上に、少なくとも記録層 を形成することで情報記録媒体を得ることができる。記録層は特に限定されず、磁気 、光、光磁気等の性質を利用した種々の記録層を用いることができるが、特に磁性層 を記録層として用いた情報記録媒体 (磁気ディスク)の製造に好適である。  An information recording medium can be obtained by forming at least a recording layer on a glass substrate for information recording medium obtained by the method of the present invention. The recording layer is not particularly limited, and various recording layers utilizing properties such as magnetism, light, and magnetomagnetism can be used. However, the recording layer is particularly useful for manufacturing an information recording medium (magnetic disk) using the magnetic layer as a recording layer. Is preferred.
[0040] 磁性層に用いる磁性材料としては、特に限定はなく公知の材料を適宜選択して用 いること力 Sできる。例えば、 Coを主成分とする CoPt、 CoCr、 CoNi、 CoNiCr、 CoCr Ta、 CoPtCr、 CoNiPt、 CoNiCrPt、 CoNiCrTa, CoCrPtTa, CoCrPtSiOなど 力 S挙げられる。また、磁性層を非磁性膜 (例えば、 Cr、 CrMo、 CrVなど)で分割して ノイズの低減を図った多層構成としてもょレ、。  [0040] The magnetic material used for the magnetic layer is not particularly limited, and a known material can be appropriately selected and used. For example, a force S such as CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtSiO containing Co as a main component can be cited. In addition, the magnetic layer can be divided into non-magnetic films (for example, Cr, CrMo, CrV, etc.) to reduce noise.
[0041] 磁性層として、上記の Co系材料の他、フェライト系や鉄 希土類系の材料や、 SiO  [0041] As the magnetic layer, in addition to the above Co-based materials, ferrite-based and iron-rare earth-based materials, SiO
、 BNなどからなる非磁性膜中に Fe、 Co、 CoFe、 CoNiPt等の磁性粒子が分散され た構造のダラ二ユラ一などを用いることもできる。磁性層は、面内型、垂直型の何れで あっても い。  It is also possible to use a durailleur having a structure in which magnetic particles such as Fe, Co, CoFe, and CoNiPt are dispersed in a nonmagnetic film made of BN or the like. The magnetic layer may be either an in-plane type or a vertical type.
[0042] 磁性膜の形成方法としては、公知の方法を用いることがでる。例えば、スパッタリン グ法、無電解メツキ法、スピンコート法などが挙げられる。  As a method for forming the magnetic film, a known method can be used. Examples include sputtering, electroless plating, and spin coating.
[0043] 磁気ディスクには、更に必要により下地層、保護層、潤滑層等を設けても良い。これ らの層はいずれも公知の材料を適宜選択して用いることができる。下地層の材料とし ては、例えば、 Cr、 Mo、 Ta、 Ti、 W、 V、 B、 Al、 Niなどが挙げられる。保護層の材料 としては、例えば、 Cr、 Cr合金、 C、 Zr〇2、 SiO^どが挙げられる。また、潤滑層とし ては、例えば、パーフロロポリエーテル (PFPE)等からなる液体潤滑剤を塗布し、必 要に応じ加熱処理を行ったものなどが挙げられる。 [0043] The magnetic disk may be further provided with an underlayer, a protective layer, a lubricating layer, and the like as necessary. Any of these layers can be used by appropriately selecting a known material. Examples of the material for the underlayer include Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. Protective layer material Examples thereof include Cr, Cr alloy, C, Zr 0 2 and SiO ^. As the lubricating layer, for example, a liquid lubricant made of perfluoropolyether (PFPE) or the like is applied and heat-treated as necessary.
実施例  Example
[0044] (実施例 1)  [0044] (Example 1)
ガラス材料として Tgが 480°Cのアルミノシリケートガラスを用い、溶融ガラスをプレス 成形してブランク材を作製した。内外周加工工程、研削 ·研磨工程を経て、外径 65m m、内径 20mm、厚み 0. 635mmのガラス基板とした。表面粗さは、表裏ともに算術 平均高さ Ra (JIS B0601 : 2001)力 SO. 4〜0. 5nmとなるように仕上げた。また、平 坦度は、表裏とも 1. 5 111未満であった。平坦度の測定は、 0. 1 m以下のレベル に仕上げられた平面原器を用いた干渉縞の測定により行った。  Aluminosilicate glass with a Tg of 480 ° C was used as the glass material, and a blank was produced by press-molding the molten glass. A glass substrate having an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm was obtained through an inner and outer peripheral machining process and a grinding / polishing process. The surface roughness was finished so that the arithmetic average height Ra (JIS B0601: 2001) force SO. The flatness was less than 1.5 111 on both sides. The flatness was measured by measuring interference fringes using a flat master finished to a level of 0.1 m or less.
[0045] 化学強化処理液として、硝酸カリウム(KNO )と硝酸ナトリウム(NaNO )の混合溶 融塩を用意した。混合比は質量比で 1 : 1とした。また、化学強化処理液の温度は 40 o°cとした。  [0045] A mixed molten salt of potassium nitrate (KNO) and sodium nitrate (NaNO) was prepared as a chemical strengthening treatment solution. The mixing ratio was 1: 1 by mass ratio. The temperature of the chemical strengthening solution was 40 ° C.
[0046] 予熱槽の温度は 409°Cに設定した。また、搬送工程の雰囲気温度を 150°Cに設定 した。ガラス基板 10枚を 1つのキャリアにセットし、予熱槽に投入して予熱を行った。 3 0分後、予熱槽からキャリアごとガラス基板を取り出し、 25秒後に化学強化処理液に 浸漬させた。予め同様のガラス基板を用いて搬送中のガラス基板の温度を 20回繰り 返し測定したところ、 25秒後のガラス基板の温度は 399°C〜401°Cの範囲であり、搬 送による温度低下は 8〜; 10°Cの範囲であった。  [0046] The temperature of the preheating tank was set to 409 ° C. In addition, the atmospheric temperature in the transfer process was set to 150 ° C. Ten glass substrates were set in one carrier and put into a preheating tank for preheating. After 30 minutes, the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening solution after 25 seconds. When the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 25 seconds was in the range of 399 ° C to 401 ° C, and the temperature decreased due to transportation. Ranged from 8 to 10 ° C.
[0047] 2時間浸漬した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化 学強化処理液を洗浄して、キャリアからガラス基板を取り出した。  [0047] After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening treatment liquid was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier.
[0048] ガラス基板を入れ替えて同じ工程を 20回繰り返し、処理済みの基板 200枚を得た 。各キャリアから 1枚ずつ、合計 20枚のガラス基板を抜き取り、平坦度の測定を行つ た。平坦度の測定は、化学強化処理前の基板と同様に干渉縞の測定により行った。 平坦度は小さい方が好ましぐ 5 m以上になると磁気ディスクとしての性能上問題に なる。ここでは、評価基準を、  [0048] The glass substrate was replaced and the same process was repeated 20 times to obtain 200 processed substrates. A total of 20 glass substrates were extracted from each carrier, and the flatness was measured. The flatness was measured by measuring interference fringes in the same manner as the substrate before the chemical strengthening treatment. If the flatness is smaller than 5 m, which is preferable, there will be a problem in terms of performance as a magnetic disk. Here, the evaluation criteria are
l m以下 '. © 面精度が非常に高ぐ記録再生特性が非常に優れる。 [0049] 1 - 2 ^ 111 :〇 実用上全く問題ない面精度であり、十分な記録再生特性を出せ [0050] 2 - 5 ^ 111 : Δ 面精度が不十分であり、記録再生特性が若干低下する恐れがあ Less than lm '. © The surface accuracy is very high and the recording and playback characteristics are very good. [0049] 1-2 ^ 111: 〇 The surface accuracy is practically satisfactory, and sufficient recording / reproduction characteristics can be obtained. [0050] 2-5 ^ 111: Δ surface accuracy is insufficient and recording / reproduction characteristics are slightly There is a risk of decline
[0051] 5 111以上 :X 明らかに面精度不足であり、十分な記録再生特性が発揮できな い。 [0051] 5 111 or more: X Clearly, the surface accuracy is insufficient and sufficient recording / reproduction characteristics cannot be exhibited.
とした。  It was.
[0052] 次に、同じ 20枚のガラス基板について、イオン交換がされた強化層の厚みを測定 した。強化層の厚みの測定は、新港精機社製のポーラリメ一ター SF— 2Cを用いて、 ガラスに近い屈折液中に浸漬し、基板を垂直に保持した状態で、基板厚み方向の強 化層の厚みを計測した。強化層の安定性は、測定した 20枚のガラス基板の強化層 の厚みの標準偏差( σ )によって評価した。標準偏差が 2 m未満であれば、実用上 の性能にほとんど影響はなぐ化学強化工程の安定性は非常に高いと考えられる。し かし、標準偏差が 2 m以上になるとガラス基板の堅さ、機械的強度といった性能に 与える影響が大きくなる。ここでは、評価基準を、  [0052] Next, for the same 20 glass substrates, the thickness of the ion-exchanged reinforcing layer was measured. The thickness of the reinforcing layer was measured by using a polarimeter SF-2C manufactured by Shinko Seiki Co., Ltd., immersed in a refractive liquid close to glass, and holding the substrate vertically. The thickness was measured. The stability of the reinforcing layer was evaluated by the standard deviation (σ) of the thickness of the reinforcing layer of the 20 glass substrates measured. If the standard deviation is less than 2 m, the chemical strengthening process is considered to have very high stability, which has almost no effect on practical performance. However, when the standard deviation is 2 m or more, the effects on the performance such as the hardness and mechanical strength of the glass substrate increase. Here, the evaluation criteria are
Ι . δ ΐη未満 :◎ 強化層の安定性が非常に高ぐ記録再生特性が非常に優 れる。  未 満 Less than δΐη: ◎ The stability of the reinforcing layer is very high, and the recording / reproduction characteristics are very good.
[0053] 1. 5 - 2 β χη :〇 実用上全く問題ない安定性であり、十分な記録再生特性を出 せる。 [0053] 1. 5-2 β χη: 〇 Stability with no problem in practical use and sufficient recording / reproduction characteristics.
[0054] 2 111以上 :Χ 明らかに強化層の安定性が不足であり、十分な記録再生特性 が発揮できない。  [0054] 2 111 or more: 明 ら か に Apparently the stability of the reinforcing layer is insufficient and sufficient recording / reproducing characteristics cannot be exhibited.
とした。  It was.
[0055] 更に、同じ 20枚のガラス基板について、円環曲げ強度の測定を行った。円環曲げ 強度とは、マイクロクラックと呼ばれるガラス基板の微細なひび割れの発生の目安とな るもので、円環曲げ試験機と呼ばれる試験機を用いて行った。  [0055] Further, the annular bending strength of the same 20 glass substrates was measured. The annular bending strength is a measure of the occurrence of fine cracks in the glass substrate called microcracks, and was performed using a testing machine called an annular bending tester.
[0056] 具体的には、支持台 23上にガラス基板を乗せて、ガラス基板の外周を円環状に支 持し、鉄球をガラス基板の中心の穴の内周に乗せ、鉄球を介して上からガラス基板 の内周に力を加えることによって、加圧 破壊試験を行った。この方法は、ハードデ イスク用記録媒体の強度試験として業界で一般的に用いられている方法と同じである [0056] Specifically, the glass substrate is placed on the support base 23, the outer periphery of the glass substrate is supported in an annular shape, and the iron ball is placed on the inner periphery of the hole in the center of the glass substrate. A pressure fracture test was performed by applying force to the inner periphery of the glass substrate from above. This method is hard This is the same as the method commonly used in the industry as a strength test for disk recording media.
[0057] 破壊強度が 150N以上であれば、ガラス基板の割れ、欠け等の破損による歩留まり が良好となる。それ以下では強度が不足であり、ガラス基板の割れ、欠け等の破損に よって歩留まりが悪化する。ここでは、評価基準を、 [0057] If the breaking strength is 150 N or more, the yield due to breakage such as cracking or chipping of the glass substrate will be good. Below that, the strength is insufficient, and the yield deteriorates due to breakage, chipping, etc. of the glass substrate. Here, the evaluation criteria are
170N以上 :◎ 強度信頼性が非常に高ぐ記録再生特性が非常に優れる。  170N or more: Excellent recording reliability with very high strength reliability.
[0058] 150- 170N :〇 実用上全く問題ない強度であり、十分な記録再生特性を出 せる。  [0058] 150-170N: 〇 This strength is practically satisfactory, and sufficient recording / reproduction characteristics can be obtained.
[0059] 120- 150N : Δ ある程度強度は高いが、プロセスで破損する恐れがある。  [0059] 120-150N: Δ Although the strength is somewhat high, the process may be damaged.
[0060] 120N以下 :X 強化状態が不十分であり、実用上の強度が不足して破損するリ スクが高い。 [0060] 120N or less: X The strengthened state is insufficient, and the risk of breakage due to insufficient practical strength is high.
とした。  It was.
[0061] 実施例 1の評価結果を表 1に示す。強化層の厚みの平均値は 85 m、ガラス基板 20枚における標準偏差は 1. 5 111であり、化学強化工程の安定性は実用上全く問 題ないことが確認された。平坦度も平均値が 1. 8 111と良好であった。また、円環曲 げ強度についても、平均値が 181. 4Nと非常に良好であった。  The evaluation results of Example 1 are shown in Table 1. The average value of the thickness of the strengthening layer was 85 m, and the standard deviation of 20 glass substrates was 1.5 111, confirming that there was no practical problem with the stability of the chemical strengthening process. The average value of the flatness was also good at 1. 8 111. In addition, the average bending strength was 181.4 N, which was very good.
[0062] [表 1] [0062] [Table 1]
Figure imgf000013_0001
Figure imgf000013_0001
(実施例 2) (Example 2)
実施例 1と異なり、予熱槽の温度は 405°Cに設定した。実施例 1と同様に作製した ガラス基板 10枚を 1つのキャリアにセットし、予熱槽に投入して予熱を行った。 30分 後、予熱槽からキャリアごとガラス基板を取り出し、 10秒後に化学強化処理液に浸漬 させた。予め同様のガラス基板を用いて搬送中のガラス基板の温度を 20回繰り返し 測定したところ、 10秒後のガラス基板の温度は 399. 5°C〜400. 5°Cの範囲であり、 搬送による温度低下は 4. 5〜5. 5°Cの範囲であった。 Unlike Example 1, the temperature of the preheating tank was set to 405 ° C. Ten glass substrates produced in the same manner as in Example 1 were set in one carrier and put into a preheating tank for preheating. Half an hour Thereafter, the glass substrate together with the carrier was taken out from the preheating tank, and immersed in a chemical strengthening treatment solution after 10 seconds. When the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate, the temperature of the glass substrate after 10 seconds was in the range of 399.5 ° C to 40.5 ° C. The temperature drop ranged from 4.5 to 5.5 ° C.
[0064] 2時間浸漬した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化 学強化処理液を洗浄して、キャリアからガラス基板を取り出した。その他の条件は実 施例 1と同じである。 [0064] After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening treatment liquid was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. The other conditions are the same as in Example 1.
[0065] ガラス基板を入れ替えて同じ工程を 20回繰り返し、処理済みの基板 200枚を得た 。各キャリアから 1枚ずつ、合計 20枚のガラス基板を抜き取り、実施例 1と同様に、平 坦度、強化層の厚み及び円環曲げ強度を測定した。  [0065] The same process was repeated 20 times with the glass substrate replaced, and 200 processed substrates were obtained. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer, and the annular bending strength were measured in the same manner as in Example 1.
[0066] 実施例 2の評価結果を表 1に合わせて示す。強化層の厚みの平均値は 87 m、ガ ラス基板 20枚における標準偏差は 1. 3 111であり、化学強化工程の安定性が非常 に高いことが確認された。平坦度も平均 が 1. 9 111と良好であった。また、円環曲 げ強度についても、平均値が 178. 5Nと非常に良好であった。  [0066] The evaluation results of Example 2 are shown in Table 1. The average thickness of the reinforcing layer was 87 m, and the standard deviation of 20 glass substrates was 1.3 111, confirming that the chemical strengthening process is very stable. The average flatness was 1.9 111, which was good. Also, the average value of the ring bending strength was very good at 178.5N.
[0067] (実施例 3)  [0067] (Example 3)
ガラス材料として Tgが 495°Cのアルミノポロシリケートガラスを用い、実施例 1、 2と 同様にしてガラス基板を作製した。  A glass substrate was produced in the same manner as in Examples 1 and 2 using an aluminopolysilicate glass having a Tg of 495 ° C as the glass material.
[0068] 化学強化処理液として、硝酸カリウム(KNO )と硝酸ナトリウム(NaNO )の混合溶  [0068] As a chemical strengthening treatment solution, a mixed solution of potassium nitrate (KNO) and sodium nitrate (NaNO) is used.
3 3 融塩を用意した。混合比は質量比で 2 : 1とした。また、化学強化処理液の温度は 35 0°Cとした。  3 3 Prepared molten salt. The mixing ratio was 2: 1 by mass. The temperature of the chemical strengthening treatment liquid was 350 ° C.
[0069] 予熱槽の温度は 350°Cに設定した。実施例 1、 2と同様に作製したガラス基板 10枚 を 1つのキャリアにセットし、予熱槽に投入して予熱を行った。 30分後、予熱槽からキ ャリアごとガラス基板を取り出し、 22秒後に化学強化処理液に浸漬させた。予め同様 のガラス基板を用いて搬送中のガラス基板の温度を 20回繰り返し測定したところ、 2 2秒後のガラス基板の温度は 343°C〜345°Cの範囲であり、搬送による温度低下は 5 〜7°Cの範囲であった。  [0069] The temperature of the preheating tank was set to 350 ° C. Ten glass substrates produced in the same manner as in Examples 1 and 2 were set in one carrier and put into a preheating tank for preheating. After 30 minutes, the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening solution after 22 seconds. When the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 2 seconds was in the range of 343 ° C to 345 ° C, and the temperature drop due to transportation was It was in the range of 5-7 ° C.
[0070] 2時間浸漬した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化 学強化処理液を洗浄して、キャリアからガラス基板を取り出した。その他の条件は実 施例 1、 2と同じである。 [0070] After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening treatment liquid was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. Other conditions are real Same as Example 1 and 2.
[0071] ガラス基板を入れ替えて同じ工程を 20回繰り返し、処理済みの基板 200枚を得た 。各キャリアから 1枚ずつ、合計 20枚のガラス基板を抜き取り、実施例 1、 2と同様に、 平坦度、強化層の厚み及び円環曲げ強度を測定した。  [0071] The same process was repeated 20 times with the glass substrate replaced, and 200 processed substrates were obtained. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer, and the annular bending strength were measured in the same manner as in Examples 1 and 2.
[0072] 実施例 3の評価結果を表 1に合わせて示す。強化層の厚みの平均値は 25 m、ガ ラス基板 20枚における標準偏差は 1. O ^ mであり、化学強化工程の安定性が非常 に高いことが確認された。平坦度も平均 が 1. O ^ mと非常に良好であった。また、 円環曲げ強度についても、平均値が 194. 2Nと非常に良好であった。  [0072] The evaluation results of Example 3 are shown in Table 1. The average thickness of the reinforcing layer was 25 m, and the standard deviation of 20 glass substrates was 1. O ^ m, confirming that the chemical strengthening process is very stable. The average flatness was 1. O ^ m, which was very good. The average value of the ring bending strength was 194.2N, which was very good.
[0073] (実施例 4)  [0073] (Example 4)
実施例 3と異なり、予熱槽の温度は 330°Cに設定した。実施例 3と同様に作製した ガラス基板 10枚を 1つのキャリアにセットし、予熱槽に投入して予熱を行った。  Unlike Example 3, the temperature of the preheating tank was set to 330 ° C. Ten glass substrates produced in the same manner as in Example 3 were set in one carrier and put into a preheating tank for preheating.
[0074] 化学強化処理液は、実施例 3と同じ硝酸カリウム(KNO )と硝酸ナトリウム(NaNO  [0074] The chemical strengthening treatment liquid was the same potassium nitrate (KNO) and sodium nitrate (NaNO) as in Example 3.
3 3 3 3
)の混合溶融塩を用いた。混合比は質量比で 2 : 1とした。また、化学強化処理液の温 度も、実施例 3と同じ 350°Cとした。 ) Mixed molten salt was used. The mixing ratio was 2: 1 by mass. The temperature of the chemical strengthening treatment liquid was also set to 350 ° C. as in Example 3.
[0075] 予熱開始から 30分後に、予熱槽からキャリアごとガラス基板を取り出し、 25秒後に 化学強化処理液に浸漬させた。予め同様のガラス基板を用いて搬送中のガラス基板 の温度を 20回繰り返し測定したところ、 25秒後のガラス基板の温度は 324. 5°C〜3[0075] 30 minutes after the start of preheating, the glass substrate together with the carrier was taken out of the preheating tank and immersed in the chemical strengthening treatment solution after 25 seconds. When the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 25 seconds was 34.5 ° C-3
26°Cの範囲であり、搬送による温度低下は 4〜5. 5°Cの範囲であった。 It was in the range of 26 ° C, and the temperature drop due to conveyance was in the range of 4 to 5.5 ° C.
[0076] 2時間浸漬した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化 学強化処理液を洗浄して、キャリアからガラス基板を取り出した。その他の条件は実 施例 3と同じである。 [0076] After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening treatment liquid was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. The other conditions are the same as in Example 3.
[0077] ガラス基板を入れ替えて同じ工程を 20回繰り返し、処理済みの基板 200枚を得た 。各キャリアから 1枚ずつ、合計 20枚のガラス基板を抜き取り、実施例 3と同様に、平 坦度、強化層の厚み及び円環曲げ強度を測定した。  [0077] The same process was repeated 20 times with the glass substrate replaced, and 200 processed substrates were obtained. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer and the annular bending strength were measured in the same manner as in Example 3.
[0078] 実施例 4の評価結果を表 1に合わせて示す。強化層の厚みの平均値は 31 m、ガ ラス基板 20枚における標準偏差は 1. 5 111であり、化学強化工程の安定性は実用 上全く問題ないことが確認された。平坦度も 1. 6 111と良好であった。また、円環曲 げ強度についても、平均 187. 3Nと非常に良好であった。 [0079] (実施例 5) [0078] The evaluation results of Example 4 are shown in Table 1. The average value of the thickness of the reinforcing layer was 31 m, and the standard deviation of 20 glass substrates was 1.5 111, confirming that the stability of the chemical strengthening process has no practical problem. The flatness was also good at 1.6 111. The ring bending strength was also very good, with an average of 187.3 N. [0079] (Example 5)
実施例 3、 4と異なり、予熱槽の温度は 375°Cに設定した。実施例 3、 4と同様に作 製したガラス基板 10枚を 1つのキャリアにセットし、予熱槽に投入して予熱を行った。  Unlike Examples 3 and 4, the temperature of the preheating tank was set to 375 ° C. Ten glass substrates produced in the same manner as in Examples 3 and 4 were set in one carrier and put into a preheating tank for preheating.
[0080] 化学強化処理液は、実施例 3、 4と同じ硝酸カリウム(KNO )と硝酸ナトリウム(NaN[0080] The chemical strengthening treatment liquid was the same potassium nitrate (KNO) and sodium nitrate (NaN) as in Examples 3 and 4.
O )の混合溶融塩を用いた。混合比は質量比で 2 : 1とした。また、化学強化処理液 の温度も、実施例 3、 4と同じ 350°Cとした。 A mixed molten salt of O 2) was used. The mixing ratio was 2: 1 by mass. The temperature of the chemical strengthening treatment liquid was also set to 350 ° C. as in Examples 3 and 4.
[0081] 予熱開始から 30分後に、予熱槽からキャリアごとガラス基板を取り出し、 20秒後に 化学強化処理液に浸漬させた。予め同様のガラス基板を用いて搬送中のガラス基板 の温度を 20回繰り返し測定したところ、 20秒後のガラス基板の温度は 367. 5°C〜3 69°Cの範囲であり、搬送による温度低下は 6〜7. 5°Cの範囲であった。  [0081] 30 minutes after the start of preheating, the glass substrate together with the carrier was taken out of the preheating tank, and immersed in the chemical strengthening treatment solution 20 seconds later. When the temperature of the glass substrate being transported was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 20 seconds was in the range of 367.5 ° C to 369 ° C. The decrease was in the range of 6 to 7.5 ° C.
[0082] 2時間浸漬した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化 学強化処理液を洗浄して、キャリアからガラス基板を取り出した。その他の条件は実 施例 3、 4と同じである。  [0082] After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening treatment liquid was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. The other conditions are the same as in Examples 3 and 4.
[0083] ガラス基板を入れ替えて同じ工程を 20回繰り返し、処理済みの基板 200枚を得た 。各キャリアから 1枚ずつ、合計 20枚のガラス基板を抜き取り、実施例 3、 4と同様に、 平坦度、強化層の厚み及び円環曲げ強度を測定した。  [0083] The same process was repeated 20 times with the glass substrate replaced, and 200 processed substrates were obtained. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer and the annular bending strength were measured in the same manner as in Examples 3 and 4.
[0084] 実施例 5の評価結果を表 1に合わせて示す。強化層の厚みの平均値は 33 m、ガ ラス基板 20枚における標準偏差は 1. l ^ mであり、化学強化工程の安定性が非常 に高いことが確認された。平坦度も平均 が 0. 9 mと非常に良好であった。また、 円環曲げ強度についても、平均値が 198. 1Nと非常に良好であった。  [0084] The evaluation results of Example 5 are shown in Table 1. The average thickness of the reinforcing layer was 33 m, and the standard deviation of 20 glass substrates was 1. l ^ m, confirming that the stability of the chemical strengthening process was very high. The average flatness was 0.9 m, which was very good. The average bending strength of the ring was very good at 198.1 N.
[0085] (比較例 1、 2)  [0085] (Comparative Examples 1 and 2)
実施例との比較のために、実施例 1と同じ Tgが 480°Cのアルミノシリケートガラスの ガラス基板を用いて、比較例 1、 2を作製した。化学強化処理液は、実施例 1と同じ硝 酸カリウム(KNO )と硝酸ナトリウム(NaNO )の質量比で 1: 1の混合溶融塩を用い た。また、化学強化処理液の温度も、実施例 1と同じ 400°Cとした。  For comparison with Examples, Comparative Examples 1 and 2 were produced using a glass substrate of aluminosilicate glass having the same Tg of 480 ° C. as in Example 1. As the chemical strengthening treatment liquid, a mixed molten salt having a mass ratio of potassium nitrate (KNO) and sodium nitrate (NaNO) of 1: 1 as in Example 1 was used. The temperature of the chemical strengthening treatment liquid was also set to 400 ° C. as in Example 1.
[0086] 比較例 1では、予熱槽の温度は 420°Cに設定した。予め同様のガラス基板を用い て搬送中のガラス基板の温度を 20回繰り返し測定したところ、 50秒後のガラス基板 の温度は 395°C〜405°Cの範囲であり、搬送中の温度低下は 15〜25°Cの範囲であ つた。 [0086] In Comparative Example 1, the temperature of the preheating tank was set to 420 ° C. When the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 50 seconds was in the range of 395 ° C to 405 ° C, and the temperature drop during transfer was In the range of 15-25 ° C I got it.
[0087] 比較例 2では、予熱槽の温度は 450°Cに設定した。予め同様のガラス基板を用い て搬送中のガラス基板の温度を 20回繰り返し測定したところ、 150秒後のガラス基板 の温度は 380°C〜420°Cの範囲であり、搬送中の温度低下は 30〜70°Cの範囲であ つた。  [0087] In Comparative Example 2, the temperature of the preheating tank was set to 450 ° C. When the temperature of the glass substrate being transferred was measured 20 times in advance using the same glass substrate in advance, the temperature of the glass substrate after 150 seconds was in the range of 380 ° C to 420 ° C, and the temperature drop during transfer was It was in the range of 30-70 ° C.
[0088] 実施例 1と同様に作製したガラス基板 10枚を 1つのキャリアにセットし、予熱槽に投 入して予熱を行った。 30分後、予熱槽からキャリアごとガラス基板を取り出し、比較例 1では 50秒後、比較例 2では 150秒後に化学強化処理液に浸漬させた。 2時間浸漬 した後キャリアごとガラス基板を取り出し、超音波洗浄機により残った化学強化処理 液を洗浄して、キャリアからガラス基板を取り出した。その他の条件は実施例 1と同じ である。  [0088] Ten glass substrates produced in the same manner as in Example 1 were set in one carrier, put into a preheating tank, and preheated. After 30 minutes, the glass substrate together with the carrier was taken out from the preheating tank and immersed in the chemical strengthening treatment solution after 50 seconds in Comparative Example 1 and after 150 seconds in Comparative Example 2. After immersion for 2 hours, the glass substrate was taken out together with the carrier, the remaining chemical strengthening solution was washed by an ultrasonic cleaner, and the glass substrate was taken out from the carrier. Other conditions are the same as in Example 1.
[0089] 比較例 1、 2のそれぞれの条件でガラス基板を入れ替えて同じ工程を 20回繰り返し 、処理済みの基板 200枚を得た。各キャリアから 1枚ずつ、合計 20枚のガラス基板を 抜き取り、平坦度、強化層の厚みおよび円環曲げ強度を測定した。  [0089] The glass substrate was replaced under the conditions of Comparative Examples 1 and 2, and the same process was repeated 20 times to obtain 200 processed substrates. A total of 20 glass substrates were extracted from each carrier, and the flatness, the thickness of the reinforcing layer and the annular bending strength were measured.
[0090] 比較例 1、 2の評価結果を表 1に合わせて示す。強化層の厚みの平均値は比較例 1 力 8 a m、比較例 2が 82 μ m、ガラス基板 20枚における標準偏差は比較例 1が 3· 1 ^ m,比較例 2が 3. 8 mであり、化学強化工程の安定性は満足できるものではなか つた。平坦度の平均値も、比較例 1が 2. 3 111で、面精度が不十分であり、比較例 2 では 5. 6 mと問題となるレベルであった。また、円環曲げ強度の平均値についても 、比較例 1が 135. 3Nで、プロセスで破損する恐れがあり、比較例 2では 106. 9Nと 明らかに強度不足であった。  [0090] The evaluation results of Comparative Examples 1 and 2 are also shown in Table 1. The average thickness of the reinforcing layer is Comparative Example 1 with a force of 8 am, Comparative Example 2 is 82 μm, and the standard deviation of 20 glass substrates is Comparative Example 1 with 3 · 1 ^ m and Comparative Example 2 with 3.8 m. Yes, the stability of the chemical strengthening process was not satisfactory. The average flatness was 2.3 111 in Comparative Example 1, insufficient surface accuracy, and 5.6 m in Comparative Example 2, which was a problematic level. In addition, the average value of the annular bending strength was 135.3N in Comparative Example 1, which could be damaged in the process, and in Comparative Example 2, the strength was clearly insufficient at 106.9N.
[0091] 上述したように、表 1に示した結果から、本発明の実施例 1 5の比較例 1 2に対 する優位性が確認された。  [0091] As described above, from the results shown in Table 1, the superiority of Example 15 of the present invention over Comparative Example 12 was confirmed.
[0092] 以上に述べたように、本発明によれば、ガラス基板を予熱槽から取り出してから化 学強化処理液に浸漬するまでの間のガラス基板の温度低下が 10°C以内となるように ガラス基板を搬送することによって、化学強化処理液に浸漬される時点におけるガラ ス基板の温度のばらつきを最小限に抑えて、安定した化学強化処理を行うことができ 、低コストで製造することができる情報記録媒体用ガラス基板の製造方法、情報記録 媒体用ガラス基板及び情報記録媒体を提供することができる。 [0092] As described above, according to the present invention, the temperature drop of the glass substrate from when the glass substrate is taken out of the preheating tank to when it is immersed in the chemical strengthening treatment liquid is within 10 ° C. By transporting the glass substrate to the glass substrate, the temperature variation of the glass substrate at the time of being immersed in the chemical strengthening treatment liquid can be minimized, and a stable chemical strengthening treatment can be performed at low cost. Method for producing a glass substrate for an information recording medium, information recording A glass substrate for media and an information recording medium can be provided.

Claims

請求の範囲 The scope of the claims
[1] 加熱された化学強化処理液にガラス基板を浸漬することによって前記ガラス基板を 化学強化する工程を含む情報記録媒体用ガラス基板の製造方法において、 前記化学強化処理液への浸漬に先立って、予熱槽で前記ガラス基板を所定温度に 加熱する予熱工程と、  [1] In the method for manufacturing a glass substrate for an information recording medium including a step of chemically strengthening the glass substrate by immersing the glass substrate in a heated chemical strengthening treatment liquid, prior to the immersion in the chemical strengthening treatment liquid, A preheating step of heating the glass substrate to a predetermined temperature in a preheating tank;
前記ガラス基板を前記予熱槽から取り出して前記化学強化処理液に浸漬させる搬送 工程とを有し、  A conveyance step of taking out the glass substrate from the preheating tank and immersing it in the chemical strengthening treatment liquid,
前記搬送工程は、前記ガラス基板を前記予熱槽から取り出してから前記化学強化処 理液に浸漬するまでの間の前記ガラス基板の温度低下が 10°C以内となるように前記 ガラス基板を搬送する工程であることを特徴とする情報記録媒体用ガラス基板の製 造方法。  In the transporting step, the glass substrate is transported so that the temperature drop of the glass substrate is 10 ° C or less after the glass substrate is taken out of the preheating tank and immersed in the chemical strengthening treatment liquid. A process for producing a glass substrate for an information recording medium, which is a process.
[2] 前記化学強化処理液に浸漬される時点における前記ガラス基板の温度を TS (°C)、 前記化学強化処理液の温度を TL (°C)としたとき、 TL— 50°C≤TS≤TL+ 50°Cを 満足することを特徴とする請求の範囲第 1項に記載の情報記録媒体用ガラス基板の 製造方法。  [2] When the temperature of the glass substrate when immersed in the chemical strengthening treatment solution is TS (° C) and the temperature of the chemical strengthening treatment solution is TL (° C), TL—50 ° C≤TS 2. The method for producing a glass substrate for an information recording medium according to claim 1, wherein ≤TL + 50 ° C is satisfied.
[3] 前記化学強化処理液に浸漬される時点における前記ガラス基板の温度を TS (°C)、 前記化学強化処理液の温度を TL (°C)としたとき、 TL— 30°C≤TS≤TL + 30°Cを 満足することを特徴とする請求の範囲第 1項に記載の情報記録媒体用ガラス基板の 製造方法。  [3] When the temperature of the glass substrate at the time of immersion in the chemical strengthening treatment liquid is TS (° C) and the temperature of the chemical strengthening treatment liquid is TL (° C), TL—30 ° C≤TS 2. The method for producing a glass substrate for an information recording medium according to claim 1, wherein ≤TL + 30 ° C is satisfied.
[4] 前記搬送工程は、 50°C以上、且つ、前記予熱工程における前記ガラス基板の加熱 温度以下の温度に加熱された雰囲気下で前記ガラス基板を搬送する工程であること を特徴とする請求の範囲第 1項乃至第 3項の何れか 1項に記載の情報記録媒体用ガ ラス基板の製造方法。  [4] The transporting step is a step of transporting the glass substrate in an atmosphere heated to a temperature of 50 ° C. or higher and lower than the heating temperature of the glass substrate in the preheating step. 4. The method for producing a glass substrate for an information recording medium according to any one of items 1 to 3 of the above range.
[5] 請求の範囲第 1項乃至第 4項の何れか 1項に記載の情報記録媒体用ガラス基板の 製造方法によって製造されたことを特徴とする情報記録媒体用ガラス基板。  [5] An information recording medium glass substrate produced by the method for producing an information recording medium glass substrate according to any one of claims 1 to 4.
[6] 請求の範囲第 5項に記載された情報記録媒体用ガラス基板の上に、少なくとも記録 層が形成されていることを特徴とする情報記録媒体。  [6] An information recording medium, wherein at least a recording layer is formed on the glass substrate for information recording medium according to claim 5.
[7] 前記記録層は、磁性層であることを特徴とする請求の範囲第 6項に記載の情報記録 7. The information recording according to claim 6, wherein the recording layer is a magnetic layer.
。棚 . Shelf
O SUO/LOOZdT/lDd 6 V Z99Z90/800Z OAV O SUO / LOOZdT / lDd 6 V Z99Z90 / 800Z OAV
PCT/JP2007/071540 2006-11-21 2007-11-06 Method for producing glass substrate for information recording medium, glass substrate for information recording medium, and information recording medium WO2008062662A1 (en)

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US8602544B2 (en) 2009-12-11 2013-12-10 Canon Kabushiki Kaisha Ink set, ink cartridge, ink jet recording method, and ink jet recording apparatus
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US9884784B2 (en) 2013-07-19 2018-02-06 Asahi Glass Company, Limited Chemically strengthened glass
US10308549B2 (en) 2013-07-19 2019-06-04 AGC Inc. Chemically strengthened glass and method for producing same
US10450226B2 (en) 2013-07-19 2019-10-22 AGC Inc. Chemically strengthened glass
US10543218B2 (en) 2015-05-11 2020-01-28 Icosagen Cell Factory Oü Human papilloma virus replication inhibitors

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