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WO2007134183A3 - Chemical reagent delivery system utilizing ionic liquid storage medium - Google Patents

Chemical reagent delivery system utilizing ionic liquid storage medium Download PDF

Info

Publication number
WO2007134183A3
WO2007134183A3 PCT/US2007/068693 US2007068693W WO2007134183A3 WO 2007134183 A3 WO2007134183 A3 WO 2007134183A3 US 2007068693 W US2007068693 W US 2007068693W WO 2007134183 A3 WO2007134183 A3 WO 2007134183A3
Authority
WO
WIPO (PCT)
Prior art keywords
chemical reagent
reagent
ultrasonic energy
storage medium
liquid storage
Prior art date
Application number
PCT/US2007/068693
Other languages
French (fr)
Other versions
WO2007134183A2 (en
Inventor
Jose I Arno
Luping Wang
Emanuel I Cooper
Original Assignee
Advanced Tech Materials
Jose I Arno
Luping Wang
Emanuel I Cooper
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Tech Materials, Jose I Arno, Luping Wang, Emanuel I Cooper filed Critical Advanced Tech Materials
Publication of WO2007134183A2 publication Critical patent/WO2007134183A2/en
Publication of WO2007134183A3 publication Critical patent/WO2007134183A3/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C11/00—Use of gas-solvents or gas-sorbents in vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

A system (10) including a reagent supply container (12) in which a vessel (14) holds a composition including a chemical reagent dissolved or dispersed in a storage liquid (18) that is reversibly interactive with the chemical reagent to store the chemical reagent therein, and an ultrasonic energy source (19, 32, 34) adapted to introduce ultrasonic energy into the composition to liberate the chemical reagent therefrom for dispensing from the vessel of the reagent supply container. The ultrasonic energy source can be internally provided in the container, or may be provided as part of an external ultrasonic energy impingement unit (112), in which the stored chemical reagent, e.g., a microelectronic device manufacturing reagent, is extracted from the liquid storage medium for transport to a reagent-utilizing process or facility (38). The liquid storage medium may for example include an ionic liquid with which the chemical reagent is reversibly taken up, and subsequently released under ultrasonic energy exposure dispensing conditions.
PCT/US2007/068693 2006-05-13 2007-05-10 Chemical reagent delivery system utilizing ionic liquid storage medium WO2007134183A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79987706P 2006-05-13 2006-05-13
US60/799,877 2006-05-13

Publications (2)

Publication Number Publication Date
WO2007134183A2 WO2007134183A2 (en) 2007-11-22
WO2007134183A3 true WO2007134183A3 (en) 2008-01-17

Family

ID=38694707

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/068693 WO2007134183A2 (en) 2006-05-13 2007-05-10 Chemical reagent delivery system utilizing ionic liquid storage medium

Country Status (2)

Country Link
TW (1) TW200819200A (en)
WO (1) WO2007134183A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108796446A (en) * 2013-05-02 2018-11-13 普莱克斯技术有限公司 Source of supply and method for selenium-rich ion implanting

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5591470B2 (en) 2005-08-30 2014-09-17 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド Large boron hydride formation for boron ion implantation and implantation using alternative boron fluoride precursors
US20110021011A1 (en) 2009-07-23 2011-01-27 Advanced Technology Materials, Inc. Carbon materials for carbon implantation
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
TWI582836B (en) 2010-02-26 2017-05-11 恩特葛瑞斯股份有限公司 Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
US8779383B2 (en) 2010-02-26 2014-07-15 Advanced Technology Materials, Inc. Enriched silicon precursor compositions and apparatus and processes for utilizing same
KR20200098716A (en) 2012-02-14 2020-08-20 엔테그리스, 아이엔씨. Carbon dopant gas and co-flow for implant beam and source life performance improvement
KR102138400B1 (en) 2013-03-05 2020-07-27 엔테그리스, 아이엔씨. Ion implantation compositions, systems, and methods
JP2016534560A (en) 2013-08-16 2016-11-04 インテグリス・インコーポレーテッド Silicon implantation into a substrate and provision of a silicon precursor composition therefor
IL297179A (en) * 2020-05-11 2022-12-01 Praxair Technology Inc Storage and delivery of materials containing antimony to ion attractors

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5620524A (en) * 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US20020144642A1 (en) * 2000-12-26 2002-10-10 Hariprasad Sreedharamurthy Apparatus and process for the preparation of low-iron single crystal silicon substantially free of agglomerated intrinsic point defects
US20020179848A1 (en) * 2001-06-02 2002-12-05 Ilya Feygin Apparatus comprising a reagent atomization and delivery system
US20040206241A1 (en) * 2003-04-15 2004-10-21 Tempel Daniel Joseph Reactive liquid based gas storage and delivery systems
US20050003560A1 (en) * 2003-06-05 2005-01-06 Oakland Univesity Piezoimmunosensor
US6924376B2 (en) * 2002-04-17 2005-08-02 Cytokinetics, Inc. Compounds, compositions and methods
US20060076051A1 (en) * 2003-05-30 2006-04-13 Fujikura Ltd. Electrolyte composition and photoelectric conversion element using same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5620524A (en) * 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US20020144642A1 (en) * 2000-12-26 2002-10-10 Hariprasad Sreedharamurthy Apparatus and process for the preparation of low-iron single crystal silicon substantially free of agglomerated intrinsic point defects
US20020179848A1 (en) * 2001-06-02 2002-12-05 Ilya Feygin Apparatus comprising a reagent atomization and delivery system
US6924376B2 (en) * 2002-04-17 2005-08-02 Cytokinetics, Inc. Compounds, compositions and methods
US20040206241A1 (en) * 2003-04-15 2004-10-21 Tempel Daniel Joseph Reactive liquid based gas storage and delivery systems
US20060076051A1 (en) * 2003-05-30 2006-04-13 Fujikura Ltd. Electrolyte composition and photoelectric conversion element using same
US20050003560A1 (en) * 2003-06-05 2005-01-06 Oakland Univesity Piezoimmunosensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108796446A (en) * 2013-05-02 2018-11-13 普莱克斯技术有限公司 Source of supply and method for selenium-rich ion implanting
CN108796446B (en) * 2013-05-02 2021-08-06 普莱克斯技术有限公司 Supply source and method for selenium-enriched ion implantation

Also Published As

Publication number Publication date
WO2007134183A2 (en) 2007-11-22
TW200819200A (en) 2008-05-01

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