WO2007022367A2 - Preparation of polyhedral oligomeric silsesquioxane silanols and siloxides functionalized with olefinic groups - Google Patents
Preparation of polyhedral oligomeric silsesquioxane silanols and siloxides functionalized with olefinic groups Download PDFInfo
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- WO2007022367A2 WO2007022367A2 PCT/US2006/032166 US2006032166W WO2007022367A2 WO 2007022367 A2 WO2007022367 A2 WO 2007022367A2 US 2006032166 W US2006032166 W US 2006032166W WO 2007022367 A2 WO2007022367 A2 WO 2007022367A2
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- WIPO (PCT)
- Prior art keywords
- reaction
- group
- silanol
- siloxide
- groups
- Prior art date
Links
- 125000005374 siloxide group Chemical group 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title description 16
- 150000004819 silanols Chemical class 0.000 title description 14
- 238000000034 method Methods 0.000 claims abstract description 29
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 125000003118 aryl group Chemical group 0.000 claims abstract description 8
- 150000001336 alkenes Chemical group 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims description 25
- 238000001212 derivatisation Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 238000006884 silylation reaction Methods 0.000 claims description 7
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 6
- 238000007259 addition reaction Methods 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 238000012986 modification Methods 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 238000005649 metathesis reaction Methods 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000012948 isocyanate Substances 0.000 claims description 2
- 150000002513 isocyanates Chemical class 0.000 claims description 2
- 150000002978 peroxides Chemical class 0.000 claims description 2
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 239000002638 heterogeneous catalyst Substances 0.000 claims 3
- 150000001413 amino acids Chemical class 0.000 claims 1
- 238000010924 continuous production Methods 0.000 claims 1
- 239000003814 drug Substances 0.000 claims 1
- 235000000346 sugar Nutrition 0.000 claims 1
- 150000008163 sugars Chemical class 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 11
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 abstract description 3
- 150000004760 silicates Chemical class 0.000 abstract description 2
- 239000013626 chemical specie Substances 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 48
- 239000000203 mixture Substances 0.000 description 31
- 239000000047 product Substances 0.000 description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 239000007787 solid Substances 0.000 description 22
- 239000000243 solution Substances 0.000 description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 14
- 238000003756 stirring Methods 0.000 description 13
- 239000011541 reaction mixture Substances 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 10
- 229910020381 SiO1.5 Inorganic materials 0.000 description 9
- 239000012074 organic phase Substances 0.000 description 9
- 125000005372 silanol group Chemical group 0.000 description 9
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 229910004738 SiO1 Inorganic materials 0.000 description 7
- GLXDVVHUTZTUQK-UHFFFAOYSA-M lithium;hydroxide;hydrate Chemical compound [Li+].O.[OH-] GLXDVVHUTZTUQK-UHFFFAOYSA-M 0.000 description 7
- 239000002086 nanomaterial Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 6
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 238000003828 vacuum filtration Methods 0.000 description 6
- 229910013596 LiOH—H2O Inorganic materials 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000010348 incorporation Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 238000002390 rotary evaporation Methods 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 3
- LULAYUGMBFYYEX-UHFFFAOYSA-N metachloroperbenzoic acid Natural products OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000001632 sodium acetate Substances 0.000 description 3
- 235000017281 sodium acetate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 239000003039 volatile agent Substances 0.000 description 3
- VOLGAXAGEUPBDM-UHFFFAOYSA-N $l^{1}-oxidanylethane Chemical compound CC[O] VOLGAXAGEUPBDM-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000006735 epoxidation reaction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007306 functionalization reaction Methods 0.000 description 2
- 238000007037 hydroformylation reaction Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- CXNIUSPIQKWYAI-UHFFFAOYSA-N xantphos Chemical compound C=12OC3=C(P(C=4C=CC=CC=4)C=4C=CC=CC=4)C=CC=C3C(C)(C)C2=CC=CC=1P(C=1C=CC=CC=1)C1=CC=CC=C1 CXNIUSPIQKWYAI-UHFFFAOYSA-N 0.000 description 2
- OXVURNFPSRBLKA-UHFFFAOYSA-N (4-diphenylphosphanyl-10,10-dimethylbenzo[b][1,4]benzoxasilin-6-yl)-diphenylphosphane Chemical compound C=12OC3=C(P(C=4C=CC=CC=4)C=4C=CC=CC=4)C=CC=C3[Si](C)(C)C2=CC=CC=1P(C=1C=CC=CC=1)C1=CC=CC=C1 OXVURNFPSRBLKA-UHFFFAOYSA-N 0.000 description 1
- OXDPWVZSVXPOIM-UHFFFAOYSA-N 1-(cyclohexen-1-yl)-2-methylprop-2-en-1-one Chemical compound CC(=C)C(=O)C1=CCCCC1 OXDPWVZSVXPOIM-UHFFFAOYSA-N 0.000 description 1
- AOFBJTGHSYNINY-UHFFFAOYSA-N 2-cyclohex-3-en-1-ylethyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCC1CCC=CC1 AOFBJTGHSYNINY-UHFFFAOYSA-N 0.000 description 1
- QKVVKSWWHSAROK-UHFFFAOYSA-N 2-methyl-1-(7-oxabicyclo[4.1.0]heptan-6-yl)prop-2-en-1-one Chemical compound C1CCCC2OC21C(=O)C(=C)C QKVVKSWWHSAROK-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- HHKDWDAAEFGBAC-LAGVYOHYSA-N [(1s,4s)-5-bicyclo[2.2.1]hept-2-enyl]-triethoxysilane Chemical compound C1[C@@H]2C([Si](OCC)(OCC)OCC)C[C@H]1C=C2 HHKDWDAAEFGBAC-LAGVYOHYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- DSVRVHYFPPQFTI-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane;platinum Chemical compound [Pt].C[Si](C)(C)O[Si](C)(C=C)C=C DSVRVHYFPPQFTI-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- MIZPLDZQVGUDMR-UHFFFAOYSA-N cyclohexen-1-yl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1=CCCCC1 MIZPLDZQVGUDMR-UHFFFAOYSA-N 0.000 description 1
- 229960004132 diethyl ether Drugs 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000012407 engineering method Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- PQVSTLUFSYVLTO-UHFFFAOYSA-N ethyl n-ethoxycarbonylcarbamate Chemical compound CCOC(=O)NC(=O)OCC PQVSTLUFSYVLTO-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229940040692 lithium hydroxide monohydrate Drugs 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000006464 oxidative addition reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- -1 siloxide anions Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 125000004436 sodium atom Chemical group 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- FCMZRNUHEXJWGB-UHFFFAOYSA-N trichloro(cyclopentyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCC1 FCMZRNUHEXJWGB-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
Definitions
- This invention relates to a process for functionalization of polyhedral oligomeric silsesquioxane silanols and siloxides with olefinic groups, enhancing their physical, chemical, and electronic properties, and their suitability for incorporation into catalytic, metallic, polymeric, electronic, medical, cosmetic, and biological products.
- Nanostructured chemicals are best exemplified by those based on low-cost Polyhedral Oligomeric Silsesquioxanes (POSS) and Polyhedral Oligomeric Silicates (POS).
- POSS and POS systems contain hybrid (i.e. organic-inorganic) compositions in which the internal cage framework is primarily comprised of rigid inorganic silicon- oxygen bonds.
- the exterior of the nanostructure is covered by both reactive and nonreactive organic functionalities (R), which ensure compatibility and tailorability of the nanostructure with organic and inorganic materials.
- POSS silanols bearing one or more different R groups on the same POSS silanol cage molecule It is especially desirable to produce POSS cages with reactive olefinic groups R 2 which can participate in other chemistry than that available to the R 1 groups and the silanols or siloxides ( Figure 1).
- the present invention describes synthetic methods of preparing POSS or POS cage compositions bearing combinations of hydrophobic, hydrophilic, saturated, unsaturated, and biologically active R groups on the same molecule.
- a synthetic process that renders polyhedral oligomeric silsesquioxane and polyhedral oligomeric silsesquioxane silanols and siloxides rapidly, in high yield, and containing wholly olefinic groups, or mixtures of olefinic and aromatic or alkyl, or biologically compatible groups is provided.
- the process involves the use of hydroxide bases with silane coupling agents of the formula R 1 SiX 3 and R 2 SiX 3 to form POSS cages functionalized with silanols of the formula types [(R 1 SiOi.s) 7-
- the olefin groups can be subsequently derivatized though oxidative addition reactions, reductive addition reactions, metathesis, or polymerization as a means to afford additional properties such as polarity, hydrophobicity, lubrication, and biological compatibility or to immobilize to the POSS cage while rendering the silanols or siioxides for surface modification, reactive silation, or association with metals or other materials.
- FIG. 1 shows a representative formula of a POSS cage bearing silanol/siloxide groups and two types of organic groups where the R 1 and R 2 groups are randomly incorporated into the cage.
- FIG. 2 shows a mass spectrum of products from Example 1. DEFINITION OF FORMULA REPRESENTATIONS FOR NANOSTRUCTURES
- Polysilsesquioxanes are materials represented by the formula [RSiO 1 5 ] ⁇
- R represents an organic substituent (H, siloxy, cyclic or linear aliphatic or aromatic groups that may additionally contain reactive functionalities such as alcohols, esters, amines, ketones, olefins, ethers or halides or which may contain fluorinated groups, silicones, or aliphatic and aromatic groups).
- Polysilsesquioxanes may be either homoleptic or heteroleptic.
- the designation R includes R 1 and R 2 functionalities. Homoleptic systems contain only one type of R group while heteroleptic systems contain more than one type of R group.
- POSS and POS nanostructure compositions are represented by the formula:
- R is the same as defined above and X includes but is not limited to OH, ONa, OLi, OK, OCs, Cl, Br, I, alkoxide (OR), formate (OCH), acetate (OCOR), acid (OCOH), ester (OCOR), peroxide (OOR), amine (NR 2 ), isocyanate (NCO), and R.
- m and n refer to the stoichiometry of the composition.
- # refers to the number of silicon atoms contained within the nanostructure.
- the value for # is usually the sum of m+n, where n ranges typically from 1 to 24 and m
- the present invention teaches a method for polyhedral oligomeric silsesquioxane (POSS) or polyhedral oligomeric silicate (POS) synthesis that renders mixtures of dissimilar R groups on the cage.
- a key feature of the invention is the use of synergistically tolerant stoichiometric ratios of R 1 SiX 3 and R 2 SiX 3 silane coupling agents which allow for statistical incorporation of two types of organic groups (R 1 and R 2 ) into the same cage while preserving the POSS silanol/siloxide groups. Additionally, the ability to prepare cages with R-groups bearing unsaturated functionality allows for the further functionalization of the POSS cage.
- Preferred POSS silanol formula types include [(R 1 SiO L s) 7 - X (R 2 SiO L5 )X(HOSiOL 5 )I] 18 , [(R 1 SiOLs) 6 -X(R 2 SiO 1 . 5 ) X (R 1 HOSiOi) 2- x(R 2 HOSiOi) x ] ⁇ 8) [(R 1 Si ⁇ L5 ) 2 -x(R 2 SiOi.
- POSS silanol/siloxides bearing a mixture of olefinic R 2 and aliphatic R 1 groups a valuable tool in the utility of this process is to maintain an approximately 15:85 to 25:75, and preferably a 20:80 molar ratio of the two R 1 SiX 3 and R 2 SiX 3 silane coupling agents. This is particularly effective when incorporating vinyl and isobutyl groups into the same POSS cage.
- POSS silanol/siloxide cages in which all R groups are olefinic can also be prepared in a similar manner through variation of the ratio to the extreme of 100:0. The process is valid for all conceivable compositional ranges of R 1 SiX 3 and R 2 SiX 3 .
- Olefinic groups on POSS cages can be subsequently derivatized though any number of oxidation or addition reactions. These include metathesis (U.S. Patent No. 5,942,638) or oxidation reactions (U.S. Patent Nos. 6,100,417 and 6,767,930), addition reactions (U.S. Patent Nos. 5,939,576 and 5,047,492), or polymerizations.
- This advancement in the art of POSS provides the ability to carry out chemical derivatization of the R groups while maintaining nonreactive R groups on the cage and reactive silanol/siloxide groups.
- Variables influencing the process include the size, polydispersity, and composition of the nanostructured chemicals, separation and isolation methods, and use of catalyst or cocatalysts, solvents and cosolvents. Additionally, kinetic and thermodynamic means of controlling the synthesis mechanism, rate, and product distribution are also known tools of the trade that can impact product quality and economics.
- the desired mixed R group POSS cages were then extracted into an organic layer through the addition of pentane (100 ml_), and aqueous NaCI.
- the organic layer was then washed with a 4 wt.-% HCI solution (3 x 100 ml_), and the volatiles were removed under reduced pressure.
- the desired products were collected as white solids and verified by MALDI-TOF and 1 H NMR spectroscopy.
- MALDI-TOF spectra include M/Z for the parent POSS formula and an associated sodium atom from the ablation matrix. See Figure 2.
- the desired product was extracted into an organic layer by addingiOOml of pentane and stirring for 30 minutes followed by addition of NaCI.
- the pentane layer was removed and washed three additional times with 100ml of a 4wt% HCL solution.
- the organic volatiles were removed under reduced pressure and the desired product was isolated (9.6g, 55.8%) as white solid in the compound was analyzed using MALDI-TOF-MS and identified as [((CH 3 ) 2 CHCH 2 )SiOi .5) 4 ((CH 2 CH)(OH)SiOi ,o)3] ⁇ 7 .
- reaction mixture was quenched into a solution of water (150 mL) and phosphoric acid (2.02 mL, 1.5 eq relative to LiOH » H 2 O).
- An oily phase separated and was stirred for 1 hr. Hexane/THF were added to the quench to give a homogeneous organic phase and the organic phase washed with successive portions. of water and saturated brine.
- the organic phase was separated, dried over MgSO 4 , filtered and then removed by rotary evaporation to provide a foamy solid which was dried by vacuum to provide 7.Og (98%) of a mixture of the desired
- polymeric resin [((C-C 6 H 9 )CH 2 CH 2 SiOi .5) 4 ((c-C 6 H 9 )CH 2 CH 2 (OH)SiOi .ofel ⁇ oo in a
- reaction mixture was then quenched into a solution of water (150 ml_) and phosphoric acid (1.82 imL, 1.5 eq relative to LiOH»H 2 O) and the heterogeneous quench mixture stirred for 1 hr. Hexane/THF were added to the quench to give a homogeneous organic phase and the organic phase washed with successive portions of water and saturated brine. The organic phase was separated, dried over MgSO 4 , filtered and then the solvent removed by rotary evaporation to provide a white solid which was stirred with acetone and collected by vacuum filtration to provide 5.4g (93%) of the desired product.
- reaction mixture was warmed to room temperature and allowed to stir for 16 hr.
- the reaction was quenched with 1 N HCI (1OmL) and hexane (10 mL) added.
- the mixture was stirred well and the organic phase separated and washed once with saturated brine.
- the solvent was removed by rotary evaporation to give a solid paste, which upon stirring with acetone (50 mL) and methanol (50 mL) gave a white solid which was collected by vacuum filtration, washed with methanol and dried to provide 4.01 g (72%) of the product as a white solid.
- MCM zeolite type catalyst materials were prepared under the same conditions with variation of the [(C4H 9 SiOi.5)4(C3H5SiOi.5)3((H3C) 2 HCOTiOi.5)i] ⁇ 8)/t ⁇ tra ⁇ thylorthosilicate (TEOS) molar ratio.
- Water 6.0 g (0.33 mol) was mixed with 4.77 g NH 4 OH (30 wt.-% NH 3 ; 0.07 mol NH 3 ) and stirred for 1 min.
- To this solution was added 0.33 g cetyltrimethylammonium bromide CTABr (0.91 mol) and the solution was stirred for 0.5 h at room temperature.
- Example 17 General procedure for Hydroformylation of Olefinic POSS.
- a solution of PtCI 2 (Sixantphos), (0.016 g, 0.019 mmol) and SnCI 2 (0.0036 g, 0.019 mmol) in CH 2 CI 2 (5 mL) was stirred for 1 hour, than transferred into a stainless steel autoclave (100 mL internal volume). Additional CH 2 CI 2 (15 mL) was added, followed by heating of the autoclave to 60 0 C and subsequent inlet of synthesis gas (CO / H 2 ratio 1 :1) to 40 bar.
- synthesis gas CO / H 2 ratio 1 :1
- the autoclave was allowed to equilibrate for one hour, than a solution of silsesquioxane in CH 2 CI 2 (total volume, 10 mL) was added, and the reaction was run at 60 °C/40 bar for 17 hours.
- the autoclave was cooled in ice and depressurized, after which the reaction mixture was evaporated to dryness. Pentane (20 mL) was added, and the catalyst was filtered off. Evaporation of the filtrate gave the hydroformylated POSS product.
- the products were characterized by multinuclear NMR spectroscopy.
- Other hydroformylation catalysts such as [Rh(Acac)/(CO) 2 ]/Xantphos can also be utilized.
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EP06801756A EP1931687A4 (en) | 2005-08-16 | 2006-08-16 | Preparation of polyhedral oligomeric silsesquioxane silanols and siloxides functionalized with olefinic groups |
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JP2008138203A (en) * | 2006-11-29 | 2008-06-19 | Dongjin Semichem Co Ltd | Monomer, polymer, and organic composition containing the same for forming organic anti-reflection film |
EP1957563B1 (en) * | 2005-11-28 | 2010-04-28 | The Welding Institute | Process for the production of organosilsesquioxanes |
CN102492078A (en) * | 2011-11-27 | 2012-06-13 | 吉林大学 | Acrylic acid and polyhedral silsesquioxane copolymerized hydrogel, its preparation method and its purpose |
US9035009B2 (en) | 2007-04-17 | 2015-05-19 | Kaneka Corporation | Polyhedral polysiloxane modified product and composition using the modified product |
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US9698320B2 (en) | 2010-09-22 | 2017-07-04 | Kaneka Corporation | Modified product of polyhedral structure polysiloxane, polyhedral structure polysiloxane composition, cured product, and optical semiconductor device |
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JP5119843B2 (en) * | 2007-10-09 | 2013-01-16 | 宇部興産株式会社 | Method for producing cage-type silsesquioxane derivative |
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JPH08113648A (en) * | 1994-10-18 | 1996-05-07 | Showa Denko Kk | Production of silyl-terminated polysilsesquioxane |
JP3635180B2 (en) * | 1997-02-24 | 2005-04-06 | ダウ コーニング アジア株式会社 | Silylated polymethylsilsesquioxane, process for producing the same, and composition using the same |
US5942638A (en) * | 1998-01-05 | 1999-08-24 | The United States Of America As Represented By The Secretary Of The Air Force | Method of functionalizing polycyclic silicones and the resulting compounds |
WO2001010871A1 (en) * | 1999-08-04 | 2001-02-15 | Hybrid Plastics | Process for the formation of polyhedral oligomeric silsesquioxanes |
US6911518B2 (en) * | 1999-12-23 | 2005-06-28 | Hybrid Plastics, Llc | Polyhedral oligomeric -silsesquioxanes, -silicates and -siloxanes bearing ring-strained olefinic functionalities |
US6100417A (en) * | 1999-08-31 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Functionalizing olefin bearing silsesquioxanes |
JP2001089662A (en) * | 1999-09-22 | 2001-04-03 | Kanegafuchi Chem Ind Co Ltd | Curable composition and method of producing molding using the same |
JP2002088157A (en) * | 2000-09-12 | 2002-03-27 | Kanegafuchi Chem Ind Co Ltd | Ladder type silsesquioxane compound containing styryl group as substituent group and method for producing the same |
WO2003064490A2 (en) * | 2001-06-27 | 2003-08-07 | Hybrid Plastics Llp | Process for the functionalization of polyhedral oligomeric silsesquioxanes |
WO2003042292A2 (en) * | 2001-11-17 | 2003-05-22 | Creavis Gesellschaft Für Technologie Und Innovation Mbh | Polyolefin compositions, method for the production thereof and the use of these compositions |
JP4742212B2 (en) * | 2002-08-06 | 2011-08-10 | Jnc株式会社 | Process for producing silsesquioxane derivative and silsesquioxane derivative |
JP4256756B2 (en) * | 2002-09-30 | 2009-04-22 | 新日鐵化学株式会社 | Method for producing cage-type silsesquioxane resin having functional group |
JP4734832B2 (en) * | 2003-05-14 | 2011-07-27 | ナガセケムテックス株式会社 | Encapsulant for optical element |
JP2005187381A (en) * | 2003-12-25 | 2005-07-14 | Asahi Kasei Corp | Method for refining silicon compound |
JP4409397B2 (en) * | 2004-09-27 | 2010-02-03 | 新日鐵化学株式会社 | Silicone resin composition and molded body |
JP2006282725A (en) * | 2005-03-31 | 2006-10-19 | Kri Inc | Silicon-containing new optically active compound |
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JP2007015991A (en) * | 2005-07-08 | 2007-01-25 | Tokyo Univ Of Science | Method for producing cage silsesquioxane |
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EP1957563B1 (en) * | 2005-11-28 | 2010-04-28 | The Welding Institute | Process for the production of organosilsesquioxanes |
JP2008138203A (en) * | 2006-11-29 | 2008-06-19 | Dongjin Semichem Co Ltd | Monomer, polymer, and organic composition containing the same for forming organic anti-reflection film |
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US9698320B2 (en) | 2010-09-22 | 2017-07-04 | Kaneka Corporation | Modified product of polyhedral structure polysiloxane, polyhedral structure polysiloxane composition, cured product, and optical semiconductor device |
CN102492078A (en) * | 2011-11-27 | 2012-06-13 | 吉林大学 | Acrylic acid and polyhedral silsesquioxane copolymerized hydrogel, its preparation method and its purpose |
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