+

WO2007001977A3 - Systeme et procede pour une configuration cylindre a cylindre - Google Patents

Systeme et procede pour une configuration cylindre a cylindre Download PDF

Info

Publication number
WO2007001977A3
WO2007001977A3 PCT/US2006/023804 US2006023804W WO2007001977A3 WO 2007001977 A3 WO2007001977 A3 WO 2007001977A3 US 2006023804 W US2006023804 W US 2006023804W WO 2007001977 A3 WO2007001977 A3 WO 2007001977A3
Authority
WO
WIPO (PCT)
Prior art keywords
roll
methods
continuous
metallic
angstroms
Prior art date
Application number
PCT/US2006/023804
Other languages
English (en)
Other versions
WO2007001977A2 (fr
Inventor
W Dennis Slafer
Original Assignee
Microcontinuum Inc
W Dennis Slafer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microcontinuum Inc, W Dennis Slafer filed Critical Microcontinuum Inc
Priority to EP06773532.4A priority Critical patent/EP1905065B1/fr
Publication of WO2007001977A2 publication Critical patent/WO2007001977A2/fr
Publication of WO2007001977A3 publication Critical patent/WO2007001977A3/fr

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/28Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/28Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/286Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers using a temporary backing to which the coating has been applied
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/32Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/32Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B05D1/322Removable films used as masks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/40Distributing applied liquids or other fluent materials by members moving relatively to surface
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00Sheets
    • B05D2252/02Sheets of indefinite length
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • B05D3/0263After-treatment with IR heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065After-treatment
    • B05D3/067Curing or cross-linking the coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141Plasma treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0104Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0113Female die used for patterning or transferring, e.g. temporary substrate having recessed pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0104Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0143Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0264Peeling insulating layer, e.g. foil, or separating mask
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15Position of the PCB during processing
    • H05K2203/1545Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143Masks therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01Manufacture or treatment
    • H10D86/021Manufacture or treatment of multiple TFTs
    • H10D86/0241Manufacture or treatment of multiple TFTs using liquid deposition, e.g. printing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1002Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
    • Y10T156/1007Running or continuous length work
    • Y10T156/1023Surface deformation only [e.g., embossing]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1002Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
    • Y10T156/1039Surface deformation only of sandwich or lamina [e.g., embossed panels]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention porte sur des systèmes et sur des procédés selon lesquels des configurations de divers matériaux peuvent être obtenues sur des substrats flexibles par un processus de fabrication continu cylindre à cylindre. Les configurations peuvent comprendre des éléments métalliques, conducteurs transparents ou des éléments non métalliques dont les dimensions latérales sont comprises dans une plage allant de 100 nanomètres au millimètre et dont l'épaisseur est comprise dans une plage allant de 10 angströms à plus de 10,000 angströms. Le substrat peut être un matériau quelconque pouvant avoir une flexibilité suffisante pour être compatible avec un équipement de traitement à base de cylindres, tel que des films polymères, des feuilles métalliques et du verre fin, les films polymères représentant un champ d'application particulièrement vaste. L'invention porte également sur des procédés pouvant comprendre la formation continue cylindre à cylindre d'une structure polymère provisoire pourvue de zones sélectionnées donnant sur le substrat sous-jacent, l'ajout ou le retrait continu de matériaux constituants et l'élimination continue, si nécessaire, de la structure polymère et de tout matériau excédentaire.
PCT/US2006/023804 2005-06-20 2006-06-20 Systeme et procede pour une configuration cylindre a cylindre WO2007001977A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP06773532.4A EP1905065B1 (fr) 2005-06-20 2006-06-20 Formation de motifs rouleau à rouleau

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69207805P 2005-06-20 2005-06-20
US60/692,078 2005-06-20

Publications (2)

Publication Number Publication Date
WO2007001977A2 WO2007001977A2 (fr) 2007-01-04
WO2007001977A3 true WO2007001977A3 (fr) 2007-03-22

Family

ID=37595712

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/023804 WO2007001977A2 (fr) 2005-06-20 2006-06-20 Systeme et procede pour une configuration cylindre a cylindre

Country Status (3)

Country Link
US (1) US8435373B2 (fr)
EP (1) EP1905065B1 (fr)
WO (1) WO2007001977A2 (fr)

Families Citing this family (84)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60325669D1 (de) * 2002-05-17 2009-02-26 Semiconductor Energy Lab Verfahren zum Transferieren eines Objekts und Verfahren zur Herstellung eines Halbleiterbauelements
US7554121B2 (en) * 2003-12-26 2009-06-30 Semiconductor Energy Laboratory Co., Ltd. Organic semiconductor device
US7833389B1 (en) * 2005-01-21 2010-11-16 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
US8535041B2 (en) * 2006-07-28 2013-09-17 Microcontinuum, Inc. Addressable flexible patterns
US9307648B2 (en) * 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
EP1849181A4 (fr) 2005-01-21 2009-03-18 Microcontinuum Inc Outils de replication et appareil et procedes de fabrication correspondants
US10421313B2 (en) * 2005-03-24 2019-09-24 Richard Lavosky Electron-beam coating device
EP1905065B1 (fr) 2005-06-20 2014-08-13 Microcontinuum, Inc. Formation de motifs rouleau à rouleau
US7666766B2 (en) * 2005-09-27 2010-02-23 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
US9174400B2 (en) * 2006-02-15 2015-11-03 Osram Opto Semiconductors Gmbh Method for producing structures in optoelectronic components and device for this purpose
CA2643510C (fr) 2006-02-27 2014-04-29 Microcontinuum, Inc. Formation d'outils de reproduction de motifs
US7521128B2 (en) * 2006-05-18 2009-04-21 Xtalic Corporation Methods for the implementation of nanocrystalline and amorphous metals and alloys as coatings
US8114248B2 (en) * 2007-01-03 2012-02-14 Asahi Kasei Kabushiki Kaisha Roll-to-roll method and system for micro-replication of a pattern of large relief three-dimensional microstructures
US7521270B2 (en) * 2007-02-19 2009-04-21 Eastman Kodak Company OLED patterning method
US8940117B2 (en) 2007-02-27 2015-01-27 Microcontinuum, Inc. Methods and systems for forming flexible multilayer structures
US7662663B2 (en) * 2007-03-28 2010-02-16 Eastman Kodak Company OLED patterning method
US7635609B2 (en) 2007-04-16 2009-12-22 Eastman Kodak Company Patterning method for light-emitting devices
KR101133835B1 (ko) * 2007-05-14 2012-04-06 가부시키가이샤 아루박 필름 반송 장치 및 권취식 진공 성막 방법
US20090004419A1 (en) * 2007-06-29 2009-01-01 Cok Ronald S Multi-layer masking film
US7656493B2 (en) * 2007-07-31 2010-02-02 Arthur Alan R Pixel well electrodes
US7966743B2 (en) * 2007-07-31 2011-06-28 Eastman Kodak Company Micro-structured drying for inkjet printers
US20090074955A1 (en) * 2007-09-17 2009-03-19 Rowland Harry D Methods for patterning electronic elements and fabricating molds
US7674712B2 (en) * 2007-10-22 2010-03-09 Cok Ronald S Patterning method for light-emitting devices
US8193018B2 (en) * 2008-01-10 2012-06-05 Global Oled Technology Llc Patterning method for light-emitting devices
WO2009094572A1 (fr) * 2008-01-23 2009-07-30 Microcontinuum, Inc. Formation de motifs rouleau à rouleau de couches transparentes et métalliques
KR101511584B1 (ko) * 2008-09-25 2015-04-13 해성디에스 주식회사 롤 투 롤 반도체부품 제조장치 및 그에 적용되는 이송방법
KR101120034B1 (ko) * 2008-10-08 2012-03-23 태양연마 주식회사 요철을 갖는 이형성 기재를 이용한 연마포지의 제조방법
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
US20110065282A1 (en) * 2009-09-11 2011-03-17 General Electric Company Apparatus and methods to form a patterned coating on an oled substrate
JP2011090055A (ja) * 2009-10-20 2011-05-06 Sony Corp 露光装置及び露光方法
TWI523088B (zh) * 2010-02-11 2016-02-21 校際微電子中心 用於單側粗糙化之方法
EP2609467A4 (fr) * 2010-08-23 2014-07-30 Rolith Inc Masque pour lithographie de champ proche et sa fabrication
US8845912B2 (en) 2010-11-22 2014-09-30 Microcontinuum, Inc. Tools and methods for forming semi-transparent patterning masks
CN103493258A (zh) * 2011-02-25 2014-01-01 应用材料公司 锂离子单元设计的设备与方法
SG185897A1 (en) * 2011-05-24 2012-12-28 Agency Science Tech & Res Method and apparatus for forming structures on a resin
US20120306124A1 (en) * 2011-06-01 2012-12-06 Oracle International Corporation UV Curing of Embossed Structures
TWI441940B (zh) * 2011-06-09 2014-06-21 Shih Hua Technology Ltd 圖案化導電元件的製備方法
RU2014112552A (ru) 2011-09-14 2015-10-20 Маховиа Текнолоджи Инновейшенз Уг Способ и устройство для изготовления бесшовной, закрытой по окружности, гибкой ленты для тиснения и лента для тиснения
US9953845B2 (en) * 2011-09-23 2018-04-24 Te Connectivity Corporation Methods and systems for forming electronic modules
US8771572B2 (en) * 2011-10-31 2014-07-08 Oracle International Corporation Methods for manufacturing an embosser drum for use in pre-formatting optical tape media
CA2858375A1 (fr) * 2011-12-09 2013-06-13 Redwave Energy, Inc. Systeme et procede pour convertir un rayonnement electromagnetique en energie electrique
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
WO2013158543A1 (fr) * 2012-04-17 2013-10-24 The Regents Of The University Of Michigan Procédés de fabrication de grilles conductrices à micro-échelle et à nano-échelle d'électrodes transparentes et de polariseurs par photolithographie rouleau à rouleau
DE102012021819A1 (de) * 2012-11-07 2014-05-08 Heidelberger Druckmaschinen Ag Verfahren zum Beschichten von Bogen mit einem Film in einer Druckmaschine
US9724849B2 (en) * 2012-11-30 2017-08-08 Microcontinuum, Inc. Fluid application method for improved roll-to-roll pattern formation
US9658155B2 (en) 2012-12-17 2017-05-23 Patrick K Brady System and method for identifying materials using a THz spectral fingerprint in a media with high water content
US10449568B2 (en) * 2013-01-08 2019-10-22 Hzo, Inc. Masking substrates for application of protective coatings
WO2014130896A2 (fr) 2013-02-22 2014-08-28 Brady Patrick K Structures, système et procédé de conversion de rayonnement électromagnétique en énergie électrique
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
US20150147684A1 (en) * 2013-11-22 2015-05-28 Wasatch Photonics, Inc. System and method for holography-based fabrication
EP3083251B1 (fr) * 2013-12-20 2023-06-07 Temicon GmbH Disposititif et procédé de production de surfaces structurées
KR102187138B1 (ko) * 2013-12-30 2020-12-07 삼성디스플레이 주식회사 도전 패턴 형성 방법 및 도전 패턴을 포함하는 전자 장치
US9244356B1 (en) 2014-04-03 2016-01-26 Rolith, Inc. Transparent metal mesh and method of manufacture
WO2015183243A1 (fr) 2014-05-27 2015-12-03 Rolith, Inc. Éléments anti-contrefaçon et procédés de fabrication et de détection
WO2015196161A1 (fr) 2014-06-20 2015-12-23 Brady Patrick K Système de conversion de rayonnement électromagnétique en énergie électrique à l'aide de métamatériaux
US9583426B2 (en) 2014-11-05 2017-02-28 Invensas Corporation Multi-layer substrates suitable for interconnection between circuit modules
US10283492B2 (en) 2015-06-23 2019-05-07 Invensas Corporation Laminated interposers and packages with embedded trace interconnects
DE102015114097A1 (de) * 2015-08-25 2017-03-02 Temicon Gmbh Aufbringen einer Struktur auf ein starres Substrat
US10040271B1 (en) * 2015-10-02 2018-08-07 Global Solar Energy, Inc. Metalization of flexible polymer sheets
US10131998B2 (en) * 2015-10-02 2018-11-20 Global Solar Energy, Inc. Metalization of flexible polymer sheets
US10465307B2 (en) * 2015-11-19 2019-11-05 Fabric8Labs, Inc. Apparatus for electrochemical additive manufacturing
US9852994B2 (en) 2015-12-14 2017-12-26 Invensas Corporation Embedded vialess bridges
US10744690B2 (en) * 2017-10-05 2020-08-18 Ealnilam, Inc. Applying cymatics resonant frequencies for particle distribution and means of capturing for processing
JP7057788B2 (ja) * 2017-10-06 2022-04-20 株式会社瑞光 複合シートの製造装置及び製造方法
EP3720256B1 (fr) 2017-11-29 2024-08-07 Dai Nippon Printing Co., Ltd. Carte de câblage et procédé de production de carte de câblage
CN108231651B (zh) * 2017-12-26 2020-02-21 厦门市三安光电科技有限公司 微元件转移装置和转移方法
US11364566B2 (en) 2018-08-09 2022-06-21 The United States Of America As Represented By The Secretary Of The Army Complex laser folding and fabrication
US11602806B2 (en) 2019-02-28 2023-03-14 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for performing contactless laser fabrication and propulsion of freely moving structures
US10914000B1 (en) 2019-08-23 2021-02-09 Fabric8Labs, Inc. Method for manufacturing a printhead of an electrochemical additive manufacturing system
US11512404B2 (en) 2019-08-23 2022-11-29 Fabric8Labs, Inc. Matrix-controlled printhead for an electrochemical additive manufacturing system
EP4029037A4 (fr) * 2019-09-13 2024-01-10 Trackonomy Systems, Inc. Procédé et dispositif de fabrication additive de rouleau à rouleau
EP3851210A1 (fr) * 2020-01-14 2021-07-21 Jesús Francisco Barberan Latorre Rouleau applicateur
CN111112026A (zh) * 2020-01-20 2020-05-08 江苏雅恩新材料科技有限公司 卧式双电子束辐照固化金属卷材涂料装置及生产线
US20240235055A1 (en) * 2020-06-16 2024-07-11 3M Innovative Properties Company Patterned Article Including Metallic Bodies
EP3964355A1 (fr) 2020-09-03 2022-03-09 Boegli-Gravures S.A. Procédé et système de fabrication d'un dispositif de gaufrage
EP3964356A1 (fr) 2020-09-03 2022-03-09 Boegli-Gravures SA Procédé et système de fabrication d'un dispositif de gaufrage à l'aide d'un masque de gravure
US11680330B2 (en) 2021-07-22 2023-06-20 Fabric8Labs, Inc. Electrochemical-deposition apparatuses and associated methods of electroplating a target electrode
US11795561B2 (en) 2021-08-02 2023-10-24 Fabric8Labs, Inc. Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes
US11920251B2 (en) 2021-09-04 2024-03-05 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using multi-purpose build plate
US12264405B2 (en) 2021-09-20 2025-04-01 Fabric8Labs, Inc. Methods for electrochemical additive manufacturing while modifying electrolyte solutions
US11970783B2 (en) 2021-09-23 2024-04-30 Fabric8Labs, Inc. Systems and methods for manufacturing electrical components using electrochemical deposition
US11745432B2 (en) 2021-12-13 2023-09-05 Fabric8Labs, Inc. Using target maps for current density control in electrochemical-additive manufacturing systems
US12104264B2 (en) 2021-12-17 2024-10-01 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using capacitive sensing
CN119511432B (zh) * 2025-01-21 2025-04-08 宁波维真显示科技股份有限公司 一种复合光栅制备装置和方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040131779A1 (en) * 2002-04-24 2004-07-08 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
US6808646B1 (en) * 2003-04-29 2004-10-26 Hewlett-Packard Development Company, L.P. Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size
US20050214962A1 (en) * 2004-03-29 2005-09-29 Daniels John J Light active sheet and methods for making the same

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4125447A (en) 1978-03-24 1978-11-14 Bachert Karl R Means for plating the inner surface of tubes
US4286860A (en) * 1979-02-01 1981-09-01 Western Electric Co., Inc. Apparatus for making carrier tape
US4478769A (en) 1982-09-30 1984-10-23 Amerace Corporation Method for forming an embossing tool with an optically precise pattern
US4514345A (en) 1983-08-23 1985-04-30 The Procter & Gamble Company Method of making a foraminous member
US5147763A (en) 1988-10-19 1992-09-15 Canon Kabushiki Kaisha Process for producing molding stamper for data recording medium substrate
NL8802928A (nl) 1988-11-28 1990-06-18 Stork Screens Bv Werkwijze en inrichting voor het vormen van een weerstandspatroon op een cylindrisch voorwerp alsmede een onder toepassing van een dergelijk weerstandspatroon verkregen geetste metalen cylinder.
WO1992001973A2 (fr) 1990-07-20 1992-02-06 Mcgrew Stephen P Outil d'emboutissage
TW258811B (en) 1994-07-28 1995-10-01 Philips Electronics Nv manufacturing tape-like information carriers, web-like intermediate carrier
AU7377996A (en) 1995-09-29 1997-04-17 Sage Technology, Incorporated Optical digital media recording and reproduction system
US6106627A (en) 1996-04-04 2000-08-22 Sigma Laboratories Of Arizona, Inc. Apparatus for producing metal coated polymers
US5874363A (en) * 1996-05-13 1999-02-23 Kabushiki Kaisha Toshiba Polycide etching with HCL and chlorine
DE69842001D1 (de) * 1997-04-04 2010-12-30 Univ Southern California Galvanisches verfahren zur herstellung einer mehrlagenstruktur
ATE246345T1 (de) 1997-06-30 2003-08-15 Euratom Vorrichtung zur projektion eines definierten lichtbündels auf eine photoempfindliche oberfläche
ATE368239T1 (de) 1997-11-03 2007-08-15 Stork Prints Austria Gmbh Verfahren zum herstellen einer druckform
US6222157B1 (en) 1998-04-17 2001-04-24 L.A. Batchelder And Sons Consulting, Inc. Seamless holographic transfer using laser generated optical effect patterns
EP1003078A3 (fr) * 1998-11-17 2001-11-07 Corning Incorporated Procédé pour reproduire un motif nanométrique
WO2001063555A2 (fr) 2000-02-24 2001-08-30 Massachusetts Institute Of Technology Techniques de deconvolution d'images destinees a un appareil de balayage de sonde
US6420100B1 (en) 2000-10-24 2002-07-16 The Procter & Gamble Company Process for making deflection member using three-dimensional mask
JP2002177702A (ja) 2000-12-08 2002-06-25 Sony Corp カーボンナノ構造体の一段階精製用の超音波還流システム
JP2002231600A (ja) * 2001-01-30 2002-08-16 Nitto Denko Corp レジスト除去用接着テープとレジスト除去方法
US6858253B2 (en) * 2001-05-31 2005-02-22 3M Innovative Properties Company Method of making dimensionally stable composite article
EP1362682A1 (fr) * 2002-05-13 2003-11-19 ZBD Displays Ltd, Appareil et méthode pour l'alignement de cristaux liquides
DE10228103A1 (de) 2002-06-24 2004-01-15 Bayer Cropscience Ag Fungizide Wirkstoffkombinationen
WO2004101855A2 (fr) * 2003-05-07 2004-11-25 Microfabrica Inc. Procedes de fabrication electrochimique comprenant des operations de traitement de surface destinees a reduire les problemes de placage excedent et/ou de planarisation lors de la formation de structures tridimensionnelles multicouches
EP1594001B1 (fr) 2004-05-07 2015-12-30 Obducat AB Appareil et méthode pour la lithographie par empreinte
RU2346996C2 (ru) 2004-06-29 2009-02-20 ЮРОПИЭН НИКЕЛЬ ПиЭлСи Усовершенствованное выщелачивание основных металлов
EP1905065B1 (fr) 2005-06-20 2014-08-13 Microcontinuum, Inc. Formation de motifs rouleau à rouleau

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040131779A1 (en) * 2002-04-24 2004-07-08 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
US6808646B1 (en) * 2003-04-29 2004-10-26 Hewlett-Packard Development Company, L.P. Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size
US20050214962A1 (en) * 2004-03-29 2005-09-29 Daniels John J Light active sheet and methods for making the same

Also Published As

Publication number Publication date
US20060283539A1 (en) 2006-12-21
EP1905065A2 (fr) 2008-04-02
EP1905065B1 (fr) 2014-08-13
WO2007001977A2 (fr) 2007-01-04
EP1905065A4 (fr) 2011-05-11
US8435373B2 (en) 2013-05-07

Similar Documents

Publication Publication Date Title
WO2007001977A3 (fr) Systeme et procede pour une configuration cylindre a cylindre
EP2312426A3 (fr) Film conducteur transparent, son procédé de production et panneau tactile associé
WO2010120805A3 (fr) Modification des propriétés magnétiques de films par implantation par faisceaux d'ions et de neutres
WO2011109114A3 (fr) Films conducteurs transparents, articles, et procédés
SI1467873T1 (sl) Postopek izdelovanja substratov, po tem postopku izdelani substrati in zavarovani dokumenti
WO2008108255A1 (fr) Film conducteur transparent avec couche adhésive et son procédé de fabrication
WO2008133737A3 (fr) Dispositif électrochromique
WO2009069086A3 (fr) Matériaux composites comportant un polymère intrinsèquement conducteur, et procédés et dispositifs
WO2005000759A3 (fr) Substrat revetu d’une couche dielectrique et procede et installation pour sa fabrication
TW200706402A (en) Covert security coating
WO2010056500A3 (fr) Ouvertures métalliques sous-longueur d'onde utilisées comme amplificateurs de lumière
GB0605128D0 (en) Molecular electronic device structures and fabrication methods
WO2006132919A3 (fr) Indice de refraction eleve et faible et revetements en relief de surface metallique
EP2168933A4 (fr) Aggloméré d'oxydes, procédé pour le produire, cible, et film conducteur transparent et substrat conducteur transparent tous deux obtenus à partir de la cible
WO2007142167A8 (fr) Dispositif à semi-conducteurs comprenant une couche mince semi-conductrice d'oxyde de zinc, et son procédé de production
TW200708587A (en) Anisotropic conductive film and method for producing the same
WO2004012234A3 (fr) Nanoformation de super-reseaux de fils et de modeles complexes
WO2009001665A1 (fr) Stratifié comprenant des couches de métal ayant une couche de métal rendue rugueuse en surface et procédé servant à produire celui-ci
TW200715621A (en) Procedure for producing a semiconductor component with a planner contact and the semiconductor component
WO2008110883A3 (fr) Procédé de fabrication de stratifié, dispositif ainsi applique, stratifié ainsi obtenu, procédé d'enrobage de substrats et substrat enrobé ainsi obtenu
WO2008111949A3 (fr) Nanotechnologie de métal pour des applications d'affichage et optiques avancées
WO2008140591A3 (fr) Films minces à base de nanoparticules
TW200737589A (en) Electronic device and antenna structure thereof
WO2008139310A3 (fr) Procédé de fabrication de panneaux et panneau ainsi obtenu
TW200746456A (en) Nitride-based semiconductor device and production method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2006773532

Country of ref document: EP

点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载