WO2007043337A1 - ACTIVATEUR D’ADSORPTION DE TYPE CATALYSEUR COLLOÏDAL Pd/Sn - Google Patents
ACTIVATEUR D’ADSORPTION DE TYPE CATALYSEUR COLLOÏDAL Pd/Sn Download PDFInfo
- Publication number
- WO2007043337A1 WO2007043337A1 PCT/JP2006/319151 JP2006319151W WO2007043337A1 WO 2007043337 A1 WO2007043337 A1 WO 2007043337A1 JP 2006319151 W JP2006319151 W JP 2006319151W WO 2007043337 A1 WO2007043337 A1 WO 2007043337A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- bromide
- catalyst
- palladium
- bromine
- plating
- Prior art date
Links
- 239000003054 catalyst Substances 0.000 title claims abstract description 78
- 238000001179 sorption measurement Methods 0.000 title claims abstract description 37
- 239000000084 colloidal system Substances 0.000 title claims abstract description 23
- 239000003623 enhancer Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 claims abstract description 35
- 238000007747 plating Methods 0.000 claims abstract description 32
- 239000012811 non-conductive material Substances 0.000 claims abstract description 30
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 22
- -1 bromine compound Chemical class 0.000 claims abstract description 18
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 14
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 claims abstract description 10
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims abstract description 10
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims abstract description 9
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 7
- 229910003767 Gold(III) bromide Inorganic materials 0.000 claims abstract description 5
- 229910021585 Nickel(II) bromide Inorganic materials 0.000 claims abstract description 5
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 claims abstract description 5
- 229910001622 calcium bromide Inorganic materials 0.000 claims abstract description 5
- WGEFECGEFUFIQW-UHFFFAOYSA-L calcium dibromide Chemical compound [Ca+2].[Br-].[Br-] WGEFECGEFUFIQW-UHFFFAOYSA-L 0.000 claims abstract description 5
- RJYMRRJVDRJMJW-UHFFFAOYSA-L dibromomanganese Chemical compound Br[Mn]Br RJYMRRJVDRJMJW-UHFFFAOYSA-L 0.000 claims abstract description 5
- OVWPJGBVJCTEBJ-UHFFFAOYSA-K gold tribromide Chemical compound Br[Au](Br)Br OVWPJGBVJCTEBJ-UHFFFAOYSA-K 0.000 claims abstract description 5
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical compound [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 claims abstract description 5
- IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 claims abstract description 5
- INIOZDBICVTGEO-UHFFFAOYSA-L palladium(ii) bromide Chemical compound Br[Pd]Br INIOZDBICVTGEO-UHFFFAOYSA-L 0.000 claims abstract description 5
- YJPVTCSBVRMESK-UHFFFAOYSA-L strontium bromide Chemical compound [Br-].[Br-].[Sr+2] YJPVTCSBVRMESK-UHFFFAOYSA-L 0.000 claims abstract description 5
- 229910001625 strontium bromide Inorganic materials 0.000 claims abstract description 5
- 229940074155 strontium bromide Drugs 0.000 claims abstract description 5
- ZOYIPGHJSALYPY-UHFFFAOYSA-K vanadium(iii) bromide Chemical compound [V+3].[Br-].[Br-].[Br-] ZOYIPGHJSALYPY-UHFFFAOYSA-K 0.000 claims abstract description 5
- 229910052755 nonmetal Inorganic materials 0.000 claims abstract description 4
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 claims abstract description 4
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 14
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 11
- 229910052763 palladium Inorganic materials 0.000 claims description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 239000004480 active ingredient Substances 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- QCRSVCCONBYMNL-UHFFFAOYSA-N [Zn].[Ra] Chemical compound [Zn].[Ra] QCRSVCCONBYMNL-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims 1
- 229920003023 plastic Polymers 0.000 abstract description 20
- 239000004033 plastic Substances 0.000 abstract description 20
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 abstract description 7
- BZRRQSJJPUGBAA-UHFFFAOYSA-L cobalt(ii) bromide Chemical compound Br[Co]Br BZRRQSJJPUGBAA-UHFFFAOYSA-L 0.000 abstract description 4
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 abstract description 3
- NKQIMNKPSDEDMO-UHFFFAOYSA-L barium bromide Chemical compound [Br-].[Br-].[Ba+2] NKQIMNKPSDEDMO-UHFFFAOYSA-L 0.000 abstract description 3
- 229910001620 barium bromide Inorganic materials 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- ZSUXOVNWDZTCFN-UHFFFAOYSA-L tin(ii) bromide Chemical compound Br[Sn]Br ZSUXOVNWDZTCFN-UHFFFAOYSA-L 0.000 abstract 2
- 229910021575 Iron(II) bromide Inorganic materials 0.000 abstract 1
- 229910021568 Manganese(II) bromide Inorganic materials 0.000 abstract 1
- 229910021605 Palladium(II) bromide Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 27
- JKNHZOAONLKYQL-UHFFFAOYSA-K tribromoindigane Chemical compound Br[In](Br)Br JKNHZOAONLKYQL-UHFFFAOYSA-K 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 229910000365 copper sulfate Inorganic materials 0.000 description 5
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000007772 electroless plating Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- KPWJBEFBFLRCLH-UHFFFAOYSA-L cadmium bromide Chemical compound Br[Cd]Br KPWJBEFBFLRCLH-UHFFFAOYSA-L 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- NGYIMTKLQULBOO-UHFFFAOYSA-L mercury dibromide Chemical compound Br[Hg]Br NGYIMTKLQULBOO-UHFFFAOYSA-L 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- ZMLDXWLZKKZVSS-UHFFFAOYSA-N palladium tin Chemical compound [Pd].[Sn] ZMLDXWLZKKZVSS-UHFFFAOYSA-N 0.000 description 2
- KGRJUMGAEQQVFK-UHFFFAOYSA-L platinum(2+);dibromide Chemical compound Br[Pt]Br KGRJUMGAEQQVFK-UHFFFAOYSA-L 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- JAAGVIUFBAHDMA-UHFFFAOYSA-M rubidium bromide Chemical compound [Br-].[Rb+] JAAGVIUFBAHDMA-UHFFFAOYSA-M 0.000 description 2
- LTSUHJWLSNQKIP-UHFFFAOYSA-J tin(iv) bromide Chemical compound Br[Sn](Br)(Br)Br LTSUHJWLSNQKIP-UHFFFAOYSA-J 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- CWGJBBRZFIPXNZ-UHFFFAOYSA-N [C-]#N.Br Chemical compound [C-]#N.Br CWGJBBRZFIPXNZ-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- RPJGYLSSECYURW-UHFFFAOYSA-K antimony(3+);tribromide Chemical compound Br[Sb](Br)Br RPJGYLSSECYURW-UHFFFAOYSA-K 0.000 description 1
- TXKAQZRUJUNDHI-UHFFFAOYSA-K bismuth tribromide Chemical compound Br[Bi](Br)Br TXKAQZRUJUNDHI-UHFFFAOYSA-K 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- XZQOHYZUWTWZBL-UHFFFAOYSA-L chromium(ii) bromide Chemical compound [Cr+2].[Br-].[Br-] XZQOHYZUWTWZBL-UHFFFAOYSA-L 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ZASWJUOMEGBQCQ-UHFFFAOYSA-L dibromolead Chemical compound Br[Pb]Br ZASWJUOMEGBQCQ-UHFFFAOYSA-L 0.000 description 1
- ZNRKKSGNBIJSRT-UHFFFAOYSA-L dibromotantalum Chemical compound Br[Ta]Br ZNRKKSGNBIJSRT-UHFFFAOYSA-L 0.000 description 1
- GBLDKMKYYYAAKD-UHFFFAOYSA-K dysprosium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Dy+3] GBLDKMKYYYAAKD-UHFFFAOYSA-K 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- KGOKDPWKDBWITQ-UHFFFAOYSA-K gadolinium(3+);tribromide Chemical compound Br[Gd](Br)Br KGOKDPWKDBWITQ-UHFFFAOYSA-K 0.000 description 1
- MZNSYJWLQLXLHE-UHFFFAOYSA-K holmium(3+);tribromide Chemical compound Br[Ho](Br)Br MZNSYJWLQLXLHE-UHFFFAOYSA-K 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- HTFVQFACYFEXPR-UHFFFAOYSA-K iridium(3+);tribromide Chemical compound Br[Ir](Br)Br HTFVQFACYFEXPR-UHFFFAOYSA-K 0.000 description 1
- XKUYOJZZLGFZTC-UHFFFAOYSA-K lanthanum(iii) bromide Chemical compound Br[La](Br)Br XKUYOJZZLGFZTC-UHFFFAOYSA-K 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LBWLQVSRPJHLEY-UHFFFAOYSA-K neodymium(3+);tribromide Chemical compound Br[Nd](Br)Br LBWLQVSRPJHLEY-UHFFFAOYSA-K 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- IPNPIHIZVLFAFP-UHFFFAOYSA-N phosphorus tribromide Chemical compound BrP(Br)Br IPNPIHIZVLFAFP-UHFFFAOYSA-N 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- PLKCYEBERAEWDR-UHFFFAOYSA-K praseodymium(3+);tribromide Chemical compound Br[Pr](Br)Br PLKCYEBERAEWDR-UHFFFAOYSA-K 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- WYRXRHOISWEUST-UHFFFAOYSA-K ruthenium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Ru+3] WYRXRHOISWEUST-UHFFFAOYSA-K 0.000 description 1
- ICKYUJFKBKOPJT-UHFFFAOYSA-K samarium(3+);tribromide Chemical compound Br[Sm](Br)Br ICKYUJFKBKOPJT-UHFFFAOYSA-K 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- AZNZWHYYEIQIOC-UHFFFAOYSA-K terbium(iii) bromide Chemical compound [Br-].[Br-].[Br-].[Tb+3] AZNZWHYYEIQIOC-UHFFFAOYSA-K 0.000 description 1
- VJHDVMPJLLGYBL-UHFFFAOYSA-N tetrabromogermane Chemical compound Br[Ge](Br)(Br)Br VJHDVMPJLLGYBL-UHFFFAOYSA-N 0.000 description 1
- PGAPATLGJSQQBU-UHFFFAOYSA-M thallium(i) bromide Chemical compound [Tl]Br PGAPATLGJSQQBU-UHFFFAOYSA-M 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- LSWWNKUULMMMIL-UHFFFAOYSA-J zirconium(iv) bromide Chemical compound Br[Zr](Br)(Br)Br LSWWNKUULMMMIL-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Definitions
- the present invention relates to a rare-earths colloid for promoting adsorption of a palladium-tin colloid catalyst on the surface of a non-conductive material when a metal film is formed on a non-conductive material such as plastic by electroplating.
- the present invention relates to a catalyst adsorption accelerator, a catalyst imparting liquid containing the same, and a method for plating a non-conductive material.
- a so-called palladium-tin colloidal catalyst (hereinafter referred to as "PdZSn colloidal catalyst") is deposited on the surface of the nonconductive material.
- PdZSn colloidal catalyst a so-called palladium-tin colloidal catalyst
- a so-called plastic plating method has been carried out in which a metalizing process is performed after carrying out a catalyzing process, followed by a conductive process such as electroless plating or metallizing process if necessary.
- plating technology on non-conductive materials such as plastics is often used.
- the PdZSn colloidal catalyst is sufficiently and uniformly adsorbed and deposited in the catalyzing process in order to accurately form a metal film at the target portion in the subsequent process. It is needed.
- the concentration of the PdZSn colloidal catalyst solution to be used must be above a certain level.
- Patent Document 1 Japanese Patent Laid-Open No. 2003-13244
- Patent Document 2 JP 2001-152353 A
- the present invention has been made in view of the current state of the prior art described above, and forms a metal film on a surface of a nonconductive material, particularly a nonconductive polymer material such as plastic, using a plating technique.
- the purpose of the present invention is to provide a catalyst adsorption accelerator capable of increasing the adsorption and precipitation of the PdZSn colloidal catalyst on the material surface, a catalyst application liquid containing this adsorption accelerator, and a method for plating a non-conductive material. It is what.
- the present inventors have added a substance that generates bromide ions to the catalyst application liquid itself in the catalyst application process, thereby eliminating non-conductive materials.
- the present invention was completed by finding that the amount of adsorption of the PdZSn colloidal catalyst was greatly increased.
- the gist of the present invention is as follows.
- PdZSn colloidal catalyst adsorption promoter containing a bromine compound that generates bromine ions as an active ingredient.
- the bromine compound is either a typical metal element, a typical nonmetal element or a transition metal element
- Bromine compound is lithium bromide, sodium bromide, aluminum bromide, potassium bromide, calcium bromide, strontium bromide, odorous tin (11), cesium bromide, odorous barium, odorization Hydroacid, Cyanide bromide (IV), Vanadium bromide (III), Manganese bromide (II), Iron bromide (II), Cobalt bromide (II), Nickel bromide (II), Palladium bromide ( The PdZSn colloidal catalyst adsorption promoter according to (1) or (2) above, wherein the compound consisting of II) and gold bromide (III) is also selected.
- a PdZSn colloid catalyst-imparting solution comprising a PdZSn colloid catalyst and the PdZSn colloid catalyst adsorption accelerator described in any one of (1) to (3) above.
- a metal film is formed by plating on the surface of the non-conductive material using the catalyst application liquid in which the PdZSn colloid catalyst adsorption accelerator described in any one of (1) to (3) is added to the PdZSn colloid catalyst application liquid.
- the amount of PdZSn colloidal catalyst adsorbed on the surface of a non-conductive material such as plastic can be increased.
- a uniform and good conductive film on the non-conductive material in the subsequent conductive plating treatment process, and further improve the deposition properties such as copper sulfate plating in the subsequent electric plating. And good plating can be performed.
- the present invention provides a surface of a non-conductive material such as a plastic by adding a compound capable of generating bromide ions to the PdZSn colloid catalyst application liquid in the catalyst application process, that is, the catalyzing process. This is based on the finding that the amount of PdZSn colloidal catalyst adsorbed on the catalyst increases significantly.
- Examples of the plating method on the surface of non-conductive materials such as plastic include talit nitrile butadiene styrene resin (hereinafter referred to as “ ABS resin”), polycarbonate resin, and the like.
- ABS resin talit nitrile butadiene styrene resin
- ABS-based alloy polymer an oil blend 'acrylonitrile' butadiene 'styrene-resin-based alloy polymer
- the surface of a non-conductive material such as plastic is chemically etched using a mixed solution of chromic anhydride and sulfuric acid, a permanganate solution, or the like.
- the surface is roughened.
- a mixed solution of chromic anhydride and sulfuric acid is used for the etching process, the etched material is washed thoroughly with water, and then neutralized with a neutralizing solution (for example, ENILEX RD, manufactured by Ebara Eugleite Co., Ltd.). Reduce the hexavalent chromium used for etching.
- a PdZSn colloid catalyst is adsorbed by immersing a non-conductive material such as a plastic whose surface is roughened in a solution containing noradium and tin. Furthermore, Pd (II) ions on the nonconductive material with the PdZSn colloidal catalyst adsorbed on the surface are reduced to Pd metal with a reducing agent, and this is subjected to electroless plating or metallizing treatment on the surface. V, so-called conductive conductivity treatment, and the surface is plated with various metals by electroplating non-conductive materials such as plastic. Can be applied.
- PdZSn colloidal catalyst adsorption accelerator (hereinafter referred to as "PdZSn adsorption accelerator”) of the present invention is added to the catalyst application liquid containing palladium and tin in the catalyst application process in the series of processes described above.
- PdZSn adsorption accelerator specifically includes a typical metal element, a typical nonmetallic element or a transition metal element as a compound capable of producing bromide (hereinafter referred to as “bromine compound”). And a bromine compound.
- the compounds of typical metal elements and bromine include lithium bromide, sodium bromide, magnesium bromide, aluminum bromide, bromide Potassium, calcium bromide, germanium bromide (IV), rubidium bromide, strontium bromide, cadmium bromide, indium bromide (1), indium bromide (III), tin bromide (11), antimony bromide (111), cesium bromide, barium bromide, mercury bromide (1), mercury bromide (II), thallium bromide (I), lead bromide (II), bismuth bromide (III), etc. .
- compounds of atypical metal elements and bromine include hydrobromic acid, silicon bromide (IV), phosphorus bromide (V ) And tellurium bromide (IV).
- transition metal element and bromine compounds include titanium bromide (IV), vanadium bromide (111), chromium bromide ( III), manganese bromide (II), iron bromide (II), cobalt bromide (II), nickel bromide ( ⁇ ), zirconium bromide (IV), ruthenium bromide (III), rhodium bromide ( III), palladium bromide (II), silver bromide, tantalum bromide (V), iridium bromide (111), platinum bromide (11), platinum bromide (IV), gold bromide (III), odor Lanthanum bromide (111), praseodymium bromide (111), neodymium bromide (111), samarium bromide, gadolinium bromide (III), terbium bromide (III), dysprosium bromide (
- compounds of typical metal elements and bromine include lithium bromide, sodium bromide, potassium bromide, calcium bromide, strontium bromide, tin bromide (11), cesium bromide.
- Hydrobromic acid is a compound of bromine, barium bromide, etc.
- C (IV) bromide examples include vanadium bromide, manganese bromide (11), iron bromide (11), cobalt bromide (11), nickel bromide. (11) Palladium bromide ( ⁇ ), gold bromide (III), etc. are preferred.
- a compound of a typical metal element, a typical nonmetal element or a transition metal element and bromine as described above is added to a general PdZSn colloidal catalyst solution (hereinafter referred to as "catalyst solution”) to add a bromine compound.
- the PdZSn colloid catalyst-imparting liquid of the invention hereinafter referred to as “PdZSn catalyst-imparting liquid”.
- This catalyst solution has already been described in the literature or is commercially available, and usually a solution in which palladium metal and tin metal are dissolved in an acidic solution, particularly an aqueous hydrochloric acid solution in hydrochloric acid is preferred.
- the composition of the catalyst solution contains 10 to 500 ppm, preferably 150 to 300 ppm as palladium metal, and 1 to 50 gZL, preferably 10 to 30 gZL as tin metal, in an acidic solution such as hydrochloric acid.
- an acidic solution such as hydrochloric acid.
- the Pd / Sn catalyst application solution of the present invention is obtained. Can do.
- a catalyst application process (catalyzing process) is performed using the PdZSn catalyst application liquid as described above.
- the treatment conditions for the catalyst application treatment are a temperature of 10 to 50 ° C, preferably 25 to 45 ° C, and a treatment time (immersion time) of 1 to 10 minutes, preferably 2 to 5 minutes.
- a PdZSn colloid catalyst on the surface of a non-conductive material such as plastic is used in the catalyst application process (catalyzing process).
- the amount of adsorption of the catalyst is increased, and the amount of adsorption of the catalyst can be increased by about 1.1 to 2 times compared to the case where the PdZSn adsorption promoter of the present invention is not used. Therefore, the PdZSn colloidal catalyst can uniformly adhere to the surface of a non-conductive material such as plastic, and in the subsequent conductive treatment process by electroless plating or metalizing treatment, very good conductivity can be achieved.
- An adhesive film can be formed.
- the next object to be treated was subjected to a catalyst application treatment using the present invention bath and the comparative bath described below, and the surface was plated.
- An automotive ABS mirror cover with a surface area of about 8 dm 2 was used.
- the plating jig was supported at three points of contact with the workpiece, and other than the contacts, a jig that was baked and coated with a salty vinyl sol was used.
- ABS molding parts for automobiles with a surface area of approximately 6dm 2 were used.
- the plating jig was supported at two contact points with the workpiece, and other than the contact points, a jig that was baked and coated with a sol made of vinyl chloride and vinyl was used.
- the workpiece set in the jig was charged with 400 gZL of chromic anhydride and 400 gZL of sulfuric acid.
- the resin surface was roughened by immersing it in an etching solution containing aqueous solution at 68 ° C for 10 minutes.
- this material to be treated is washed with water and then immersed in a hexavalent chromium reducing solution (trade name: ENILEX RD, manufactured by Ebara Eugelite Co., Ltd.) for 2 minutes at room temperature. Was removed.
- a hexavalent chromium reducing solution (trade name: ENILEX RD, manufactured by Ebara Eugelite Co., Ltd.) for 2 minutes at room temperature. Was removed.
- the object to be treated was immersed in an aqueous solution containing 35% hydrochloric acid 3 OOmlZL for 2 minutes as a pre-dip treatment.
- the PdZSn colloid catalyst was applied on the object to be processed according to the catalyst application liquids and treatment conditions of the present invention and comparative baths shown in Tables 1 and 2.
- D-POP ACT-MU (trade name, manufactured by Ebara Eugilite Co., Ltd.) is a concentrated solution of a catalyst imparting solution mainly composed of palladium chloride, tin chloride and hydrochloric acid.
- the bromine ion concentration of each bromine compound in the inventive baths of Tables 1 and 2 above is 6 gZL.
- the treated material that has been subjected to the catalyst application treatment is further washed with water, and these non-conductive plastics are used.
- a metallizer solution (trade name: D—POP ME, manufactured by Ebara Eugleite Co., Ltd.) containing copper sulfate, alkali metal hydroxide and complexing agent as the main components Using this, the object to be treated was immersed in this metallizer for 3 minutes at 45 ° C to conduct a conductive treatment (metalizing).
- the electrolytic copper plating solution was prepared by adding the following to 1 liter of water.
- Brightener is the product name, and the product is a product name manufactured by Ebara Eugelite Co., Ltd.
- the liquid temperature was 25 ° C, and the current density was 3AZdm 2 after 5 minutes.
- the electroplating process was performed for a total of 25 minutes.
- the PdZSn catalyst of the present invention in which the PdZSn adsorption accelerator composed of the bromine compound of the present invention is added to a catalyst solution for conducting a conductive material such as plastic.
- the application bath showed much better performance than conventional catalyst solutions.
- plastics with a conductive coating on the surface can be used in various electronic parts, printed wiring boards, automotive front grills and emblems, and various decorative parts such as buttons used in mobile phones. It can also be used to improve the mechanical properties and appearance of products.
- FIG. 1 is a drawing showing general steps of a method for plating a surface of a non-conductive material.
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Abstract
La présente invention concerne : un activateur d’adsorption de type catalyseur colloïdal Pd/Sn qui peut être utilisé pour la formation d'un film de revêtement métallique sur la surface d'un matériau non-conducteur (par exemple, un plastique) par un dépôt métallique de grande efficacité ; une solution d’addition de catalyseur comprenant l’activateur d’adsorption ; et un procédé de dépôt métallique sur un matériau non-conducteur. L’activateur d’adsorption peut être utilisé pour le dépôt métallique sur un matériau non-conducteur et comprend un quelconque composé à base de brome choisi parmi un élément métallique typique, un élément non-métallique typique et un élément de métal de transition avec un atome de brome. Le composé à base de brome peut être le bromure de lithium, le bromure de sodium, le bromure d’aluminium, le bromure de potassium, le bromure de calcium, le bromure de strontium, le bromure d’étain (II), le bromure de césium, le bromure de baryum, l’acide bromhydrique, le bromure de silicium (IV), le bromure de vanadium (III), le bromure de manganèse (II), le bromure de fer (II), le bromure de cobalt (II), le bromure de nickel (II), le bromure de palladium (II), le bromure d’or (III) ou analogues. Le matériau non-conducteur peut être une résine ABS, une résine ABS mélangée à une résine PC ou analogues.
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KR1020087007599A KR101295578B1 (ko) | 2005-10-11 | 2006-09-27 | Pd/Sn 콜로이드 촉매 흡착 촉진제 |
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JP2005296163A JP4740711B2 (ja) | 2005-10-11 | 2005-10-11 | Pd/Snコロイド触媒吸着促進剤 |
JP2005-296163 | 2005-10-11 |
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JP (1) | JP4740711B2 (fr) |
KR (1) | KR101295578B1 (fr) |
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EP3168326B2 (fr) * | 2014-07-10 | 2023-09-20 | Okuno Chemical Industries Co., Ltd. | Procédé de placage de résine |
CN106245105B (zh) * | 2016-08-05 | 2018-07-13 | 广州三孚新材料科技股份有限公司 | Pa10t工程塑料的无铬表面微蚀方法 |
CN116313511B (zh) * | 2023-04-11 | 2025-05-16 | 南充三环电子有限公司 | 一种多层陶瓷电容器的制备方法 |
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JP2747321B2 (ja) * | 1989-04-19 | 1998-05-06 | 日清紡績株式会社 | 金属被覆された合成樹脂製構造物の製造方法 |
JP3054746B2 (ja) * | 1997-02-03 | 2000-06-19 | 奥野製薬工業株式会社 | 非導電性材料への電気めっき方法 |
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- 2005-10-11 JP JP2005296163A patent/JP4740711B2/ja active Active
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2006
- 2006-09-27 WO PCT/JP2006/319151 patent/WO2007043337A1/fr active Application Filing
- 2006-09-27 KR KR1020087007599A patent/KR101295578B1/ko active Active
- 2006-09-27 CN CNA2006800377247A patent/CN101283120A/zh active Pending
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JP2747321B2 (ja) * | 1989-04-19 | 1998-05-06 | 日清紡績株式会社 | 金属被覆された合成樹脂製構造物の製造方法 |
JP3054746B2 (ja) * | 1997-02-03 | 2000-06-19 | 奥野製薬工業株式会社 | 非導電性材料への電気めっき方法 |
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KR101295578B1 (ko) | 2013-08-09 |
CN101283120A (zh) | 2008-10-08 |
JP2007107022A (ja) | 2007-04-26 |
JP4740711B2 (ja) | 2011-08-03 |
KR20080060230A (ko) | 2008-07-01 |
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