WO2006030631A1 - 着色アルカリ現像性感光性樹脂組成物及び該着色アルカリ現像性感光性樹脂組成物を用いたカラーフィルタ - Google Patents
着色アルカリ現像性感光性樹脂組成物及び該着色アルカリ現像性感光性樹脂組成物を用いたカラーフィルタ Download PDFInfo
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- WO2006030631A1 WO2006030631A1 PCT/JP2005/015721 JP2005015721W WO2006030631A1 WO 2006030631 A1 WO2006030631 A1 WO 2006030631A1 JP 2005015721 W JP2005015721 W JP 2005015721W WO 2006030631 A1 WO2006030631 A1 WO 2006030631A1
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- WIPO (PCT)
- Prior art keywords
- resin composition
- group
- compound
- photosensitive resin
- alkali
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 105
- 239000003513 alkali Substances 0.000 title abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 73
- -1 amine compounds Chemical class 0.000 claims abstract description 48
- 239000004593 Epoxy Substances 0.000 claims abstract description 29
- 239000002253 acid Substances 0.000 claims abstract description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 21
- 239000003822 epoxy resin Substances 0.000 claims abstract description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 15
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 15
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 14
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 11
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 9
- 238000004040 coloring Methods 0.000 claims abstract description 8
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 230000001476 alcoholic effect Effects 0.000 claims abstract description 5
- 125000003277 amino group Chemical group 0.000 claims abstract description 5
- 150000002989 phenols Chemical class 0.000 claims abstract description 4
- 150000001298 alcohols Chemical class 0.000 claims abstract description 3
- 238000005886 esterification reaction Methods 0.000 claims abstract description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract 2
- 230000032050 esterification Effects 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 29
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 21
- 239000010432 diamond Substances 0.000 description 18
- 229910003460 diamond Inorganic materials 0.000 description 18
- 239000000049 pigment Substances 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 17
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 16
- 239000000975 dye Substances 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000006229 carbon black Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 8
- 239000012965 benzophenone Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 7
- 239000004305 biphenyl Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 239000011572 manganese Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 229940049920 malate Drugs 0.000 description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 4
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 4
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 3
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 description 2
- KAIRTVANLJFYQS-UHFFFAOYSA-N 2-(3,5-dimethylheptyl)phenol Chemical compound CCC(C)CC(C)CCC1=CC=CC=C1O KAIRTVANLJFYQS-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- RGCKGOZRHPZPFP-UHFFFAOYSA-N alizarin Chemical compound C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 235000013985 cinnamic acid Nutrition 0.000 description 2
- 229930016911 cinnamic acid Natural products 0.000 description 2
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical group 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 229960004592 isopropanol Drugs 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- XKMZOFXGLBYJLS-UHFFFAOYSA-L zinc;prop-2-enoate Chemical compound [Zn+2].[O-]C(=O)C=C.[O-]C(=O)C=C XKMZOFXGLBYJLS-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Definitions
- the present invention relates to a liquid crystal display, a plasma display, and an electoluminescence panel.
- the colored alkali-developable photosensitive resin composition includes an alkali-developable resin composition containing a specific compound having an ethylenically unsaturated bond, a coloring material such as a pigment or a dye, and photopolymerization initiation. Since this alkali-developable photosensitive resin composition can be polymerized and cured by irradiation with ultraviolet rays or electron beams, photocurable inks, photosensitive printing plates, printed wiring plates It is used in various photoresists, color filters, etc.
- an acrylic copolymer having a carboxyl group and an ethylenically unsaturated group in the side chain is used as a binder resin, and a coloring component and a polyfunctional thiol are added thereto.
- a coloring component and a polyfunctional thiol are added thereto.
- Examples thereof include photosensitive compositions containing a compound and a photoinitiator (for example, Patent Document 1), which has a polyfunctional thiol component as an essential component, so There was a problem with stability.
- Patent Document 2 proposes a colored photosensitive resin composition in which an unsaturated group-containing resin and a photopolymerization initiator are composed of a triazine compound, a acetophenone compound, and a biimidazole compound. ing. Patent Documents 3 and 4 listed below propose an alcohol-soluble unsaturated rosin and a radiation-sensitive rosin composition containing the rosin.
- these known alkali-developable photosensitive resin compositions are insufficient in sensitivity, and it is difficult to obtain an appropriate pattern shape and fine pattern, which is satisfactory for producing a high-quality color filter! / It was not a spider.
- Patent Document 2 JP 2004-138950 A
- a phenyl group or a cycloalkyl group having 3 to 10 carbon atoms, Y and Z are each independently an alkyl group having 1 to 10 carbon atoms, carbon atom 1 to: L0 alkoxy group, carbon atom
- An alkenyl group having a number of 2 to 10 or a halogen atom, the alkyl group, the alkoxy group and the alkenyl group may be substituted with a halogen atom, n represents a number of 0 to 10; Represents a number from 0 to 5, and r represents a number from 0 to 4.
- the epoxy resin (component A) used in the preparation of the colored alkali-developable photosensitive resin composition of the present invention has a triarylmonocycloalkylmethane skeleton so that the cured product adheres to the substrate. Therefore, it is considered that a clear image can be accurately formed even if it is a fine pattern when developing and removing a non-cured portion because of its excellent properties, alkali resistance, workability, strength, and the like.
- the epoxy resin (A) in the above general formula (I), Cy is cyclohexyl; X is phenol; p and r force SO; n force ⁇ -5 Especially 0 ⁇ 1 Those are preferred.
- R represents OR, COR, SR, CONR
- the colored alkali-developable photosensitive resin composition of the present invention includes, if necessary, a thermal polymerization inhibitor such as ether, hydroquinone, pyrocatechol, tert-butylcatechol, phenothiazine; Conventional additives such as plasticizers; adhesion promoters; fillers; antifoaming agents; leveling agents can be exempted.
- a thermal polymerization inhibitor such as ether, hydroquinone, pyrocatechol, tert-butylcatechol, phenothiazine
- Conventional additives such as plasticizers; adhesion promoters; fillers; antifoaming agents; leveling agents can be exempted.
- the substrate that can be used in the color filter of the present invention needs to have more transparency when the color filter is used as a transmissive type as long as it has a certain degree of rigidity and smoothness. .
- Substrates that can be used include glass and PET (polyethylene terephthalate).
- a black matrix may be provided in advance using the colored alkali-developable photosensitive resin composition of the present invention, or other photosensitive resin composition, or a metal such as chromium. .
- the colored alkali-developable photosensitive resin composition of the present invention includes various color filters, such as a photocurable coating, a photocurable adhesive, a printing plate, and a photoresist for a printed wiring board. There are no particular restrictions on the application.
- Step 2 Synthesis of 1, 1-bis (4'-epoxypropyloxyphenyl) 1-biphenyl) 1-cyclohexylmethane
- Step 3> Preparation of alkali-developable resin composition No. 1 1,1 bis (4 'epoxypropyloxyphenyl) 1- (1 "-biphenyl)-1-cyclohexylmethane (hereinafter sometimes referred to as compound a) 43g obtained in step 2; Acrylic acid (hereinafter sometimes referred to as Compound b) llg, 2, 6 Di-tert-butyl-p-talezole 0.05 g, tetrabutylammonium acetate 0. llg and propylene glycol 1-monomethyl ether 2 23 g of acetate was charged and stirred for 16 hours at 120 ° C.
- Tetrahydrophthalic anhydride compound d -2
- 0 Add 7g and 120. 4 hours at C, 100. 3 hours at C, 80. 4 hours at C, 60.
- the reaction product contained in the alkali-developable resin composition No. 2 is an epoxy adduct hydroxide having a structure in which the compound (A) is added to the compound (A).
- Compound (D) component d-1 and compound d-2 have an acid anhydride structure of 0.74 in a ratio of one group to epoxy adduct and compound d-1 and compound d-2. It was obtained by subjecting the product d-2 to an ester reaction.
- the epoxy adduct has a structure in which the carboxyl group of compound b is added at a ratio of 1.0 to one epoxy group of compound a.
- Step 1 1, 1-bis (4'-hydroxyphenol) 1-biphenol) ethane synthesis
- 75 g of phenol and 50 g of 4-acetyl biphenyl were melted by heating at 60 ° C., 5 g of 3-mercaptopropionic acid was added and stirred, and hydrogen chloride gas was blown in for 24 hours, followed by reaction for 72 hours.
- the evaporated product was distilled off by heating to 180 ° C under reduced pressure.
- Xylene was added to the residue and cooled, and the precipitated crystals were collected by filtration and dried under reduced pressure to obtain 65 g of light yellow crystals (yield 68%).
- the melting point of the pale yellow crystals was 184 ° C, and it was confirmed that the pale yellow crystals were the target product.
- Step 2 Synthesis of 1, 1-bis (4'-epoxypropyloxyphenyl) 1-biphenyl-ethane
- 1,1-bis (4'-hydroxyphenol) 1-biphenol) obtained in Step 1 was charged with 37 g of ethane and 19.5 g of epichlorohydrin, and benzyltriethylamomum chloride 0 45 g was added and stirred at 64 ° C for 18 hours. Subsequently, the temperature was lowered to 54 ° C., 32.6 g of a 24 wt% aqueous sodium hydroxide solution was added dropwise, and the mixture was stirred for 30 minutes. Epichlorohydrin and water were distilled off, 140 g of methyl isobutyl ketone was added and washed with water, and 1.7 g of 24% by weight sodium hydroxide sodium hydroxide was added dropwise.
- the substrate was spin coated with r-glycidoxypropylmethylethoxysilane and spin-dried well, and then the colored alkali-developable photosensitive resin composition prepared according to Examples 1 to 4 and Comparative Examples 1 to 3 above.
- Product Nos. 1-7 were spin-coated (1000 rpm, 40 seconds) and dried. After pre-beta for 20 minutes at 70 ° C, exposure was performed using an ultra-high pressure mercury lamp as a light source using a mask with a pixel size of 30 m x 100 / z m. Next, after developing with a 2.5% aqueous sodium carbonate solution, it was washed thoroughly with water, further washed with water, dried, and beta-fixed at 230 ° C for 1 hour to evaluate the following. The results are shown in Table 1.
- the line width is less than 10 m, the pattern can be satisfactorily A. If the line width is 10-30 ⁇ m, the pattern can be satisfactorily. The power that was not able to form a good pattern was evaluated as C.
- the prepared colored alkali-developable photosensitive resin composition is allowed to stand in a 25 ° C environment for 1 month, and the viscosity of the colored alkaline-developable photosensitive resin composition remains unchanged after preparation and after standing. ⁇ , and those with increased or decreased viscosity were evaluated as X.
- the film was immersed under the conditions described above, and the appearance after immersion was visually evaluated. In each condition, “O” indicates that there is no change in appearance and the resist is completely peeled off, and “X” indicates that the resist is lifted or the resist is removed in any condition.
- the colored alkali-developable photosensitive resin composition of the present invention had high sensitivity, excellent resolution, and good storage stability. Further, the obtained coating film was excellent in adhesion to the substrate and alkali resistance (Examples 1 to 4).
- the colored alkali-developable photosensitive resin composition of Comparative Example had low sensitivity. Therefore, the amount of exposure had to be increased, the resolution was lowered, and the line width could not be formed unless it exceeded 30 m. Also, the storage stability was bad. Furthermore, the adhesion of the obtained coating film to the substrate and the alkali resistance were also remarkable (Comparative Examples 1 to 3).
- the colored alkali-developable photosensitive resin composition of the present invention is excellent in sensitivity, resolution, and storage stability, and the color filter formed with a film using this has good adhesion between the substrate and the film and alkali resistance. Color filter.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/660,981 US7846622B2 (en) | 2004-09-17 | 2005-08-30 | Alkali-developable, colored photosensitive resin composition and color filter using the alkali-developable, colored photosensitive resin composition |
JP2006535683A JP4198173B2 (ja) | 2004-09-17 | 2005-08-30 | 着色アルカリ現像性感光性樹脂組成物及び該着色アルカリ現像性感光性樹脂組成物を用いたカラーフィルタ |
CN2005800313039A CN101023394B (zh) | 2004-09-17 | 2005-08-30 | 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片 |
KR1020077002631A KR101169822B1 (ko) | 2004-09-17 | 2005-08-30 | 착색 알칼리 현상성 감광성 수지조성물 및 상기 착색 알칼리 현상성 감광성 수지조성물을 이용한 컬러필터 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2004-271725 | 2004-09-17 | ||
JP2004271725 | 2004-09-17 |
Publications (1)
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WO2006030631A1 true WO2006030631A1 (ja) | 2006-03-23 |
Family
ID=36059886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2005/015721 WO2006030631A1 (ja) | 2004-09-17 | 2005-08-30 | 着色アルカリ現像性感光性樹脂組成物及び該着色アルカリ現像性感光性樹脂組成物を用いたカラーフィルタ |
Country Status (6)
Country | Link |
---|---|
US (1) | US7846622B2 (ja) |
JP (1) | JP4198173B2 (ja) |
KR (1) | KR101169822B1 (ja) |
CN (1) | CN101023394B (ja) |
TW (1) | TW200625003A (ja) |
WO (1) | WO2006030631A1 (ja) |
Cited By (10)
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JP2006317574A (ja) * | 2005-05-11 | 2006-11-24 | Adeka Corp | アルカリ現像性樹脂組成物 |
JP2006328343A (ja) * | 2004-12-09 | 2006-12-07 | Mitsubishi Chemicals Corp | 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置 |
WO2006137257A1 (ja) * | 2005-06-20 | 2006-12-28 | Toppan Printing Co., Ltd. | 着色アルカリ現像型感光性樹脂組成物、及び該着色アルカリ現像型感光性樹脂組成物を用いたカラーフィルタ |
JP2008003298A (ja) * | 2006-06-22 | 2008-01-10 | Tokyo Ohka Kogyo Co Ltd | 着色感光性樹脂組成物 |
JP2008003299A (ja) * | 2006-06-22 | 2008-01-10 | Tokyo Ohka Kogyo Co Ltd | 着色感光性樹脂組成物 |
WO2008078445A1 (ja) * | 2006-12-26 | 2008-07-03 | Adeka Corporation | 重合性化合物及び重合性組成物 |
JP2009275148A (ja) * | 2008-05-15 | 2009-11-26 | Adeka Corp | 新規化合物、アルカリ現像性樹脂組成物及びアルカリ現像性感光性樹脂組成物 |
JP2010059067A (ja) * | 2008-09-02 | 2010-03-18 | Kawasaki Kasei Chem Ltd | 1,4−ナフタレンジエーテル化合物及びその製造方法 |
WO2016129195A1 (ja) * | 2015-02-10 | 2016-08-18 | Jsr株式会社 | 感光性樹脂組成物および樹脂組成物、パターン化樹脂膜およびその製造方法、ならびに細胞培養装置 |
TWI620741B (zh) * | 2007-05-09 | 2018-04-11 | Adeka Corp | Novel epoxy compound |
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JP5311750B2 (ja) * | 2007-02-28 | 2013-10-09 | 株式会社Adeka | フェノール樹脂、エポキシ樹脂、アルカリ現像性樹脂組成物及びアルカリ現像性感光性樹脂組成物 |
JP5157522B2 (ja) * | 2008-02-28 | 2013-03-06 | Jsr株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 |
JP5544760B2 (ja) * | 2008-06-27 | 2014-07-09 | 凸版印刷株式会社 | 赤色着色組成物及びそれを用いたカラーフィルタ基板並びにその製造方法 |
US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
CN107748405B (zh) * | 2017-11-29 | 2020-12-25 | Tcl华星光电技术有限公司 | 彩色滤光片与背光模组 |
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- 2005-08-30 KR KR1020077002631A patent/KR101169822B1/ko active Active
- 2005-08-30 US US11/660,981 patent/US7846622B2/en active Active
- 2005-08-30 CN CN2005800313039A patent/CN101023394B/zh active Active
- 2005-08-30 WO PCT/JP2005/015721 patent/WO2006030631A1/ja active Application Filing
- 2005-08-30 JP JP2006535683A patent/JP4198173B2/ja active Active
- 2005-09-07 TW TW094130735A patent/TW200625003A/zh unknown
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WO2006137257A1 (ja) * | 2005-06-20 | 2006-12-28 | Toppan Printing Co., Ltd. | 着色アルカリ現像型感光性樹脂組成物、及び該着色アルカリ現像型感光性樹脂組成物を用いたカラーフィルタ |
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WO2016129195A1 (ja) * | 2015-02-10 | 2016-08-18 | Jsr株式会社 | 感光性樹脂組成物および樹脂組成物、パターン化樹脂膜およびその製造方法、ならびに細胞培養装置 |
Also Published As
Publication number | Publication date |
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KR20070050434A (ko) | 2007-05-15 |
TWI375860B (ja) | 2012-11-01 |
US7846622B2 (en) | 2010-12-07 |
JP4198173B2 (ja) | 2008-12-17 |
JPWO2006030631A1 (ja) | 2008-05-08 |
TW200625003A (en) | 2006-07-16 |
CN101023394B (zh) | 2011-12-21 |
KR101169822B1 (ko) | 2012-07-30 |
CN101023394A (zh) | 2007-08-22 |
US20070269720A1 (en) | 2007-11-22 |
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